200837400 95604 21863twf.doc/n 九、發明說明： 【發明所屬之技術領域】 • 本發明是有關於一種彩色濾光片，且特別是有關於一 種可以減少材料成本及製程步驟的彩色濾光片的製造方 • 法，以及使用此方法所製作的彩色濾光片。 【先前技術】 液晶顯示器（liquid crystal display，LCD)具有低操作 f) 電壓、無輻射線散射、重量輕以及體積小等傳統陰極射線 管(cathode my tube，簡稱CRT)所製造之顯示器無法達到 的優點，因此液晶顯示器已成為近年來顯示器研究的主要 課題’且朝向彩色化發展。 目别彩色化的液晶顯示器大多使用背光模組(back light module，簡稱BLM)與彩色濾光片（color fllter)的組合 來達到彩色化的功效。彩色濾光片的結構通常如圖1所示。 圖1疋習知一種彩色濾光片的剖面示意圖。請參照圖 1，在一玻璃基板10上並列有紅色(red)色塊丨2、綠色(green) ^ 色塊14、藍色(blue)色塊16。色塊之間配置有黑色矩陣ι8。 _ 此外，基板上有一層銦錫氧化物(IT0)透明電極11。 彩色濾光片的製作方法通常是先在玻璃基板1〇上塗 佈一層黑色感光樹脂材料。然後利用光罩進行曝光、顯影、 硬烤等黃光微影(lithography)製程，以形成黑色矩陣18。 接著’同樣利用黃光微影的方法形成紅色⑻、綠色(G)、 藍色(B)色塊12、14、16，並將這些色塊12、14、16間隔 均勻地排列在黑色矩陣18所形成的開口區域18a上。最 5 200837400 95604 21863twf.doc/n 後，將銦錫氧化物透明電極U沉積於玻璃基板1〇上，便 完成彩色濾、光片之製作。 • 然而，在彩色濾光片的實際製程中，常常會有色塊 12、14、16跨越黑色矩陣18而混合的跨牆現象，此跨牆 • 現象除了會使黑矩陣遮住色塊區域並影響其顯示之外， 跨牆現象嚴重者，還會有“牛角區域” 17的產生，也就是 如圖1中綠色色塊14與藍色色塊16頂面會有中間凹陷而200837400 95604 21863twf.doc/n IX. Description of the Invention: [Technical Field of the Invention] The present invention relates to a color filter, and more particularly to a color filter capable of reducing material cost and manufacturing steps Manufacturer's method, and color filters made using this method. [Prior Art] Liquid crystal display (LCD) has low operation f) voltage, no radiation scattering, light weight and small size, and can not be achieved by conventional cathode ray tube (CRT) Advantages, therefore, liquid crystal displays have become a major subject of display research in recent years' and are moving toward colorization. Most of the color-changing liquid crystal displays use a combination of a backlight module (BLM) and a color filter (color fllter) to achieve colorization. The structure of the color filter is generally as shown in FIG. Figure 1 is a schematic cross-sectional view of a color filter. Referring to FIG. 1, a red color block 丨2, a green color block 14, and a blue color block 16 are arranged side by side on a glass substrate 10. A black matrix ι8 is arranged between the color blocks. Further, the substrate has a layer of indium tin oxide (ITO) transparent electrode 11. The color filter is usually produced by first coating a black photosensitive resin material on the glass substrate 1 . Then, a yellow lithography process such as exposure, development, hard baking, or the like is performed using a photomask to form a black matrix 18. Then, the red (8), green (G), and blue (B) patches 12, 14, and 16 are formed by the method of yellow lithography, and the patches 12, 14, and 16 are evenly arranged in the black matrix 18. On the opening area 18a. After 5,200837400 95604 21863twf.doc/n, the indium tin oxide transparent electrode U is deposited on the glass substrate 1 to complete the color filter and the light sheet. • However, in the actual process of color filters, there is often a cross-wall phenomenon in which the color blocks 12, 14, 16 are mixed across the black matrix 18. This cross-wall phenomenon not only causes the black matrix to cover the color block area and affects In addition to the display, if the phenomenon of cross-wall is serious, there will be a "horn area" 17 generated, that is, as shown in Fig. 1, the green color block 14 and the top surface of the blue color block 16 will have an intermediate depression.
〇 邊緣尖突的情形，此現象更將使後續的導電層披覆不良而 降低良率。 K 為了避免導電層披覆不良而降低良率，通常在形成色 塊12、14、16之後，還會於玻璃基板1〇〇上塗佈一層表面 平整的披覆層19。然而，披覆層19覆蓋於色塊12、14、 16與黑色矩陣18上，會造成無法預測的RGB色間差出 現，也會增加彩色濾光片的製程複雜性。 此外，為了減少生產成本，習知另一種形成彩色滤光 片的方法是先形成黑色矩陣18做為屏障 C 的方法以形成色塊12、14、16。為了容置顏料及避免混 1， 因此黑色矩陣18的厚度較色塊12、14、16其中任一為厚。 • 但是，、因，喷墨技術的喷頭對準問題以及目前液晶顯示器 所追求的南解析度（思即小像素），反而會有顏料喷塗不易 及生產製程良率低的問題。 【發明内容】 本發明之目的是提供一種可以減少材料使用量之彩 濾光片的製作方法。 6 200837400 95604 21863twf.doc/n 本發明之另-目的是提供一種製程複雜度低且製程問 題較少之彩色濾光片的製作方法。 口-i發，ΐ另一目的是提供—種製程成本低且具有較高 口口質的形色濾光片。 制ί達上核是其他目的，本發明^—種彩色濾光片 的衣作方法，包括下列之步驟。首先，提供—透明基板， 巧剌基板至=有—可視區。然後，在透明基板上塗佈 ^第一:第二及第三感光材料，以於透明基板上形成多個 第一、第二及第三色塊。之後，選擇將第一、第二或第三 感光2料塗佈於透明基板之週邊，以形成一障壁作妨幻， 其中第一、第二及第三色塊皆位於障壁内。然後，利用噴 墨法將^色矩陣材料喷塗於第―、第二及第三色塊及障壁 間，並藉由其流動性均勻分佈在透明基板上，並形成一黑 矩陣。 在本發明之一實施例中，於形成黑矩陣後，更包括於情形 In the case of sharp edges, this phenomenon will make the subsequent conductive layer drape and reduce the yield. In order to prevent the conductive layer from being poorly coated and to reduce the yield, a flat surface coating layer 19 is usually applied to the glass substrate 1 after the formation of the color blocks 12, 14, and 16. However, the cladding layer 19 covers the color patches 12, 14, 16 and the black matrix 18, which causes an unpredictable RGB color difference to appear, which also increases the process complexity of the color filter. Further, in order to reduce the production cost, another conventional method of forming a color filter is to first form a black matrix 18 as a barrier C to form color patches 12, 14, 16. In order to accommodate the pigment and avoid mixing 1, the thickness of the black matrix 18 is thicker than any of the patches 12, 14, 16. • However, due to the problem of nozzle alignment in inkjet technology and the south resolution (think of small pixels) currently pursued by liquid crystal displays, there is a problem that pigment coating is difficult and production process yield is low. SUMMARY OF THE INVENTION An object of the present invention is to provide a method of fabricating a color filter that can reduce the amount of material used. 6 200837400 95604 21863 twf.doc/n Another object of the present invention is to provide a method of fabricating a color filter having low process complexity and fewer process problems. Oral-i, another purpose is to provide a color filter with low process cost and high mouth quality. The nucleus is used for other purposes, and the method for making a color filter of the present invention comprises the following steps. First, a transparent substrate is provided, and the substrate is tuned to a visible area. Then, the first: second and third photosensitive materials are coated on the transparent substrate to form a plurality of first, second and third color patches on the transparent substrate. Thereafter, the first, second or third photosensitive material is selected to be applied to the periphery of the transparent substrate to form a barrier wall, wherein the first, second and third color patches are located in the barrier. Then, the color matrix material is sprayed between the first, second and third color blocks and the barrier by ink jetting, and the fluidity is evenly distributed on the transparent substrate, and a black matrix is formed. In an embodiment of the present invention, after forming the black matrix, it is further included in
第一、第二及第三色塊及黑矩陣上形成平坦層的步驟。 在本發明之一實施例中，於形成黑矩陣後，更包括於 第一、第二及第三色塊、黑矩陣及平坦層上形成一透明電 極層。 在本發明之一實施例中，於形成黑矩陣後，更包括於 弟一、第一及第三色塊及黑矩陣上形成一透明電極層。 在本發明之一實施例中，是將一黑色感光樹脂材料喷 佈於第一、第二及第三色塊及障壁之間，以於透明基板上 形成黑矩陣。 7 200837400 95604 21863twf.doc/n 在本發明之一實施例中，形成第一、第二及第三色塊 之方法包括下列之步驟。首先，對塗佈於透明基板上的第 、第一或第三感光材料進行預烘製程。然後，利用光罩 進行曝光製程。之後，進行顯影製程。最後，進行硬烤製 程。 衣 在本發明之一實施例中，第一色塊的材質為彩色光阻。 在本發明之一實施例中，上述之彩色光阻為選自於由 紅色光阻、綠色光阻以及藍色光阻所組成的群組。 在本發明之一實施例中，第二色塊的材質為彩色光阻。 在本發明之一實施例中，上述之彩色光阻為選自於由 紅色光阻、綠色光阻以及藍色光阻所組成的群組。The steps of forming a flat layer on the first, second, and third color patches and the black matrix. In an embodiment of the invention, after forming the black matrix, a transparent electrode layer is further formed on the first, second and third color blocks, the black matrix and the flat layer. In an embodiment of the invention, after the black matrix is formed, a transparent electrode layer is formed on the first, first and third color patches and the black matrix. In one embodiment of the invention, a black photosensitive resin material is sprayed between the first, second and third color patches and the barrier to form a black matrix on the transparent substrate. 7 200837400 95604 21863 twf.doc/n In one embodiment of the invention, the method of forming the first, second and third color patches comprises the following steps. First, a pre-bake process is performed on the first, first or third photosensitive material coated on the transparent substrate. Then, the exposure process is performed using a photomask. Thereafter, a developing process is performed. Finally, a hard baking process is carried out. In an embodiment of the invention, the material of the first color block is a color photoresist. In an embodiment of the invention, the color photoresist is selected from the group consisting of a red photoresist, a green photoresist, and a blue photoresist. In an embodiment of the invention, the material of the second color block is a color photoresist. In an embodiment of the invention, the color photoresist is selected from the group consisting of a red photoresist, a green photoresist, and a blue photoresist.
c 在本發明之一實施例中，第三色塊的材質為彩色光阻。 么在本發明之一實施例中，上述之彩色光阻為選自於由 紅色光阻、綠色光阻以及藍色光阻所組成的群組。 在本發明之一實施例中，於透明基板上形成透明電極 層之方法包括物理氣相沉積法。 在t發明之一實施例中，物理氣相沉積法包括濺鍍。 本發明另提出—種以噴墨法製作的彩色濾光片，其包 透明基板、一黑矩陣以及多個色塊。透明基板至少有 區，，黑矩陣配置於透明基板上的可視區内，以在 祕上定義出多個晝素區域。色塊分別配置於晝素區 复7壁配置於透明基板上，並圍繞黑色矩陣與色塊， “中色塊的厚度高於或等於黑矩陣的厚度。 在本發明之—實施例中，更包括一配置於透明基板之 8 200837400 95604 21863twf.doc/n 上的透明電極層，且透明電極層並覆蓋色塊與黑矩陣。 在本發明之一實施例中，更包括一配置於基板之上的 平坦層，且平坦層並覆蓋色塊及黑矩陣。 在本發明之一實施例中，更包括一配置於基板之上的 透明電極層，且透明電極層並覆蓋色塊、黑矩陣及上述之 平坦層。 在本發明之一實施例中，黑矩陣的厚度低於色塊的厚 ΟIn one embodiment of the invention, the material of the third color patch is a color photoresist. In an embodiment of the invention, the color photoresist is selected from the group consisting of a red photoresist, a green photoresist, and a blue photoresist. In one embodiment of the invention, a method of forming a transparent electrode layer on a transparent substrate includes physical vapor deposition. In one embodiment of the invention, the physical vapor deposition process comprises sputtering. The present invention further provides a color filter produced by an ink jet method comprising a transparent substrate, a black matrix, and a plurality of color patches. The transparent substrate has at least a region, and the black matrix is disposed in the visible region on the transparent substrate to define a plurality of halogen regions in the secret. The color blocks are respectively disposed on the transparent substrate on the transparent substrate, and surround the black matrix and the color block. The thickness of the middle color block is higher than or equal to the thickness of the black matrix. In the embodiment of the present invention, The transparent electrode layer is disposed on the transparent substrate 8 200837400 95604 21863 twf.doc/n, and the transparent electrode layer covers the color block and the black matrix. In an embodiment of the invention, the method further comprises: disposing on the substrate The flat layer and the flat layer cover the color block and the black matrix. In an embodiment of the invention, the method further includes a transparent electrode layer disposed on the substrate, and the transparent electrode layer covers the color block, the black matrix and the above A flat layer. In one embodiment of the invention, the thickness of the black matrix is lower than the thickness of the color patch
度。 在本發明之一實施例中’色塊的材質為彩色光阻材料。 在本發明之一實施例中，彩色光阻材料為選自於由紅 色光阻、綠色光阻以及藍色光阻所組成的群組。 一 士發明之彩色濾光片及其製作方法是在形成第一、第 第三色塊後，選擇使用第―、第二或第三感光材料， 二在J明基板上形成包圍住第一、第二及第三色塊的障 二由於障壁可錄隔顏料的蔓延，便可以利时墨法以 使=基板上形成黑矩陣。因此，可以減少黑矩陣的材料 便用里，並且簡化彩色濾光片的製程。 為讓本發明之上述和其他目的、概和優點能更明顯 如下j下文特舉-實施例，她合騎圖式，作詳細說明 【實施方式】 圖2為本發明—實施例之彩色遽光片的 ^而圖3A〜3E為圖2之彩色濾光片的剖面製作流程圖。 ”考圖2，並依序參考圖3A〜3E。首先如步驟讓及 9 200837400 95604 21863twf.doc/n 圖3A不’提供一透明基板100，其中透明基板100有可視 區100a以及非可視區1〇〇b。然後，在透明基板1〇〇的可 • 視區100a内塗佈一感光材料，此感光材料可為紅、綠及藍 色二個顏色之其中一種顏色的感光材料。接著，對此感光 • 材料進行預烘製程，再利用一光罩200對預烘過的感光材 料進行曝光、顯影及硬烤製程，使其圖案化，以形成色塊 110。在本實施例中，色塊11〇可為紅色色塊。 ζχ 接著如步驟S110、圖3Β及3C示，將與上述之感光 材料不同顏色的感光材料，例如是綠色及藍色的感光材 料，塗佈在透明基板100的可視區l〇〇a内，並重覆上述的 步驟’以形成不同顏色的色塊120、130。在本實施例中， 色塊120可以是綠色色塊，而色塊130可以是藍色色塊。 此時，個別呈現紅、綠、藍色的色塊11〇、12〇、130，會 以陣列形式配置在透明基板100上，如圖4示。 之後如步驟S120’選擇上述三種顏色其中一種顏色的 感光材料，並將此感光材料塗佈在透明基板1〇〇的非可視 I 區l〇〇b内，同時經由預烘、曝光及硬烤等製程，讓塗佈在 透明基板100非可視區100b内的感光材料形成一障壁 . 140，且色塊110、120及130皆位於障壁14〇内。 值得注意的是’雖然本實施例是先形成三種顏色的色 塊110、120、130之後，再形成障壁140，但是熟習該項 技藝者也可以依照實際的製程需求，在形成色塊110、120 或130的製程中，讓障壁140是與色塊no、12〇或13〇 同時形成，如此更可以在不增加製程步驟的情況下，形成 200837400 95604 21863twf.doc/n 障壁140。 Οdegree. In one embodiment of the invention, the material of the color patch is a color photoresist material. In one embodiment of the invention, the color photoresist material is selected from the group consisting of a red photoresist, a green photoresist, and a blue photoresist. The color filter invented by the company and the manufacturing method thereof are characterized in that after forming the first and third color blocks, the first, second or third photosensitive material is selected, and the second substrate is formed on the J-shaped substrate to surround the first The second and third color block barriers can be used to form a black matrix on the substrate due to the spread of the spacers. Therefore, it is possible to reduce the material of the black matrix and simplify the process of the color filter. The above and other objects, advantages and advantages of the present invention will become more apparent from the following description. FIG. 3A to FIG. 3E are flowcharts showing the cross-section of the color filter of FIG. 2. Referring to Figure 2, and referring to Figures 3A to 3E in sequence, first, as shown in Figure 9A, the present invention provides a transparent substrate 100 in which the transparent substrate 100 has a visible area 100a and a non-visible area 1 Then, a photosensitive material is coated in the visible region 100a of the transparent substrate 1 , and the photosensitive material may be a photosensitive material of one of two colors of red, green and blue. The photosensitive material is pre-baked, and the pre-baked photosensitive material is exposed, developed and hard-baked by a mask 200 to be patterned to form a color patch 110. In this embodiment, the color block is formed. 11〇 may be a red color block. ζχ Next, as shown in step S110, FIGS. 3A and 3C, a photosensitive material different in color from the above-mentioned photosensitive material, for example, a green and blue photosensitive material, is coated on the transparent substrate 100. In the area l〇〇a, and repeating the above steps 'to form different color patches 120, 130. In this embodiment, the color block 120 may be a green color block, and the color block 130 may be a blue color block. When presented individually, red, green, and blue The color blocks 11〇, 12〇, 130 are arranged in an array on the transparent substrate 100, as shown in Fig. 4. Then, the photosensitive material of one of the above three colors is selected as in step S120', and the photosensitive material is coated. The photosensitive material coated in the non-visible area 100b of the transparent substrate 100 forms a barrier in the non-visible I region 10b of the transparent substrate 1 through the processes of prebaking, exposure and hard baking. 140, And the color blocks 110, 120 and 130 are all located in the barrier 14 。. It is worth noting that although the embodiment first forms the color blocks 110, 120, 130 of the three colors, the barrier 140 is formed, but the skilled person is familiar with the art. In the process of forming the color block 110, 120 or 130, the barrier rib 140 may be formed simultaneously with the color block no, 12 〇 or 13 , according to the actual process requirements, so that the process step can be further increased without increasing the process steps. Forms 200837400 95604 21863twf.doc/n barrier 140. Ο
之後如步驟S130及圖3D示，使用噴墨法於透明基板 100上形成一黑矩陣150。詳細地來說，是利用一喷墨頭 300將黑色感光樹脂材料噴灑於色塊11〇、120、130之間 的空隙，以及最外圍的色塊110、120、130與障壁140之 間的空隙(如圖4示），使黑色感光樹脂材料漫佈於空隙間。 黑色感光樹脂材料乾燥後會在透明基板100上形成一將色 塊110、120、130加以區隔的黑矩陣150。 特別的是 田％黑巳啟无樹脂材料為液狀，因此黑色 感光樹脂材料可以快速地流動擴散，因而黑矩陣15〇能夠 具有良好的平整度。更進一步地來解釋，使用喷墨法喷塗 黑色感光樹脂時’各個色塊11〇、12〇、13〇及障壁mo之 間的空隙為相互連通的開放空間，因此黑色感光樹脂材料 可以均勻地流通分佈在透明基板100上，且不會因為喷墨 技術及精準度的影響而受限，因此可喊少製㈣複雜度 及增加生產良率。此外，與習知顯影製程來形成黑矩 陣相較’使时墨法來形成黑矩陣15〇，可以減少光罩的 使用，並簡化製程步驟。 黑色感光樹脂材料費用較形成色塊110、 、13G的感光材料費用高，因此本 塊加、12〇或13。的感光材料來形= 、色感光樹脂材料的使用量，節省材料成本。 值得注意的是’與f知喷墨法她，本發 減的色塊作為黑矩陣材材料流動的屏障。因此，藉由控 200837400 95604 21863twf.doc/n 制噴墨頭3GG的噴墨量，可使黑矩陣15()的厚度低於或等 於色塊11G、12G、130的厚度。尤有甚者，藉由控制喷墨 f 300的噴墨量，不但可以使黑矩陣15()的厚度較薄以節 省材料成本，更可以藉由控制黑矩陣15〇的厚度進而決定 . 舰陣15G的遮光影響範圍，制用本發明之彩色濾光片 的衣作方法所製作出來的彩色濾光片，具有較習知良好的 光利用效率。 此外，與曝光顯影彩色濾光片製程的彩色濾光片相 車乂，本發明係藉由將黑色感光樹脂喷佈在色塊及障壁間的 空間，所以在製程中不會產生色塊與黑矩陣的跨牆現象， 進而讓彩色濾光片具有良好的開口率。 最後，如步驟S140及圖3Ε示，利用物理氣相沉積法 在色塊110、120、130及黑矩陣150上形成一透明電極層 16〇 ’便完成彩色濾光片400的製作。在本實施例中，此物 理氣相沉積法為濺鍍。此外，在形成透明電極層16〇之前， 也可以選擇性地在色塊110、120、130及黑矩陣150上先 ^ 形成一表面平整的彼覆層152,以使之後形成於彼覆層152 表面上的透明電極層160能夠具有均勻的厚度及平坦的表 面。值得一提的是，因為本發明係藉由將黑色感光樹脂嘴 佈在色塊間的空間’所以在製程中不會產生色塊與黑矩陣 的跨牆現象，所以更有利於此透明電極層16〇彼覆的製 程’進而提高彩色濾光片的良率，同時可以減少彼覆層152 的製程步驟，減少製程的複雜度。 4寸別的是’經由控制黑色感光樹脂材料的量，於本發 12 200837400 95604 21863twf.doc/n 明之彩色濾光片_中’可以形成厚度較習知之喷墨法所 =成的彩色濾光片薄的黑矩陣150，因此被黑矩陣150遮 敝=:交習知少，讓使用本發明之彩色濾光片 不為具有較高的光利用率。 、、、1*上所14本U之彩色濾的製作方法是利用喷 ί法來形成黑矩陣，不但可以減少光罩的使用、簡化製程 c雜度’還可以節省材料成本，更可以進_步的提Thereafter, as shown in steps S130 and 3D, a black matrix 150 is formed on the transparent substrate 100 by an ink jet method. In detail, a black photosensitive resin material is sprayed on the gap between the color patches 11 〇, 120, 130 by an ink jet head 300, and a gap between the outermost color patches 110, 120, 130 and the barrier rib 140 is used. (As shown in Fig. 4), a black photosensitive resin material is spread between the gaps. After the black photosensitive resin material is dried, a black matrix 150 which separates the color blocks 110, 120, 130 is formed on the transparent substrate 100. In particular, the field-free black resin material is liquid, so that the black photosensitive resin material can flow and diffuse rapidly, so that the black matrix 15 〇 can have a good flatness. To further explain, when the black photosensitive resin is sprayed by the inkjet method, the gaps between the respective color patches 11〇, 12〇, 13〇 and the barrier mo are open spaces that communicate with each other, so that the black photosensitive resin material can be uniformly The circulation is distributed on the transparent substrate 100, and is not limited by the influence of the inkjet technology and the accuracy, so that the system can be shouted less (four) complexity and increased production yield. In addition, the conventional method of forming a black matrix to form a black matrix 15 〇 can reduce the use of the mask and simplify the process steps. The cost of the black photosensitive resin material is higher than that of the photosensitive material forming the color patches 110, 13G, so the block is added, 12 〇 or 13. The photosensitive material is used to form the amount of photosensitive resin material used, which saves material cost. It is worth noting that, with the fact that she knows the inkjet method, the color block that is reduced is used as a barrier for the flow of the black matrix material. Therefore, by controlling the ink ejection amount of the ink jet head 3GG of 200837400 95604 21863 twf.doc/n, the thickness of the black matrix 15 () can be made lower than or equal to the thickness of the color patches 11G, 12G, 130. In particular, by controlling the amount of inkjet f 300, not only can the thickness of the black matrix 15 () be thinner to save material cost, but also can be determined by controlling the thickness of the black matrix 15 .. The color filter of 15G has a better light utilization efficiency than the color filter produced by the coating method of the color filter of the present invention. In addition, in contrast to the color filter of the exposure and development color filter process, the present invention does not generate color patches and blacks in the process by spraying a black photosensitive resin between the color block and the barrier. The cross-wall phenomenon of the matrix allows the color filter to have a good aperture ratio. Finally, as shown in step S140 and Fig. 3, the formation of the color filter 400 is completed by forming a transparent electrode layer 16?' on the patches 110, 120, 130 and the black matrix 150 by physical vapor deposition. In this embodiment, the physical vapor deposition method is sputtering. In addition, before the transparent electrode layer 16 is formed, a surface layer 152 may be selectively formed on the color blocks 110, 120, 130 and the black matrix 150 so as to be formed on the cladding layer 152. The transparent electrode layer 160 on the surface can have a uniform thickness and a flat surface. It is worth mentioning that, because the invention provides a black photosensitive resin nozzle in the space between the color blocks, the cross-wall phenomenon of the color block and the black matrix does not occur in the process, so that the transparent electrode layer is more advantageous. The 16-pass process further increases the yield of the color filter, while reducing the process steps of the overlay 152 and reducing the complexity of the process. The 4 inch is 'by controlling the amount of the black photosensitive resin material, in the color filter _ in the '12 200837400 95604 21863 twf. doc / n can be formed into a color filter than the conventional inkjet method = The thin black matrix 150 is thus concealed by the black matrix 150 =: less knowledge, so that the color filter using the present invention does not have a high light utilization efficiency. The method of making 14 U color filters on the 1st is to use the spray method to form the black matrix, which not only reduces the use of the mask, but also simplifies the process c noise. It also saves material costs, and can also enter _ Step mention
c 幵良率。 u. s明之耗濾以的製作方法所製作出 =的¥色濾光片因不會有跨牆現象，可以增加製程上的良 色渡光片應用於顯示面板中，因為黑矩 ，於色塊之後元成，不會影響色塊顯示範圍，所以可 頒示面板具有良好的開口率。 里外本發日狀％色濾光片之黑矩陣的厚度較習知之 …矩陣的厚度薄，因此被黑矩陣遮蔽的光線較f知少 :用：用本發明之彩色濾光片400的顯示器具有較佳的光 =本發明已以—實施例揭露如上，然其並非用以限 疋本表明，任何所屬技術領域中具有通常知識者， 離，發明之精神和範_，t可作些許之更顿潤飾 =本發明之賴翻當視後附之申請翻制所界定者= 【圖式簡單說明】 圖1是習知一種彩色濾光片的剖面示意圖。 13 200837400 95604 21863twf.doc/n 圖2為本發明一實施例之彩色濾光片的製作流程步驟 圖。 圖3A〜3E為圖2之彩色濾光片的剖面製作流程圖。 • 圖4為圖3D之透明基板的上視圖。 . 【主要元件符號說明】 10 ·玻璃基板 11 :透明電極 、 17 :牛角區域 ( 18 ··黑色矩陣 18a :開口區域 1〇〇 :透明基板 100a :可視區 100b :非可視區 12、14、16、11〇、120、130 ··色塊 140 :障壁 150 :黑矩陣 I) 19 ' 152 :披覆層 160 :透明電極層 - 200 :光罩 300 :噴墨頭 400 :彩色濾光片c 幵 yield. u. □ 明 之 耗 以 = = = = = = ¥ ¥ ¥ ¥ ¥ ¥ ¥ ¥ ¥ ¥ ¥ ¥ ¥ ¥ ¥ ¥ ¥ ¥ ¥ ¥ ¥ ¥ ¥ ¥ ¥ ¥ ¥ ¥ ¥ ¥ ¥ ¥ ¥ ¥ ¥ ¥ ¥ ¥ ¥ After the block is formed, it does not affect the display range of the color block, so the panel can be awarded with a good aperture ratio. The thickness of the black matrix of the inner and outer color filter is smaller than the conventional one. The thickness of the matrix is thin, so that the light blocked by the black matrix is less than f: using: the display using the color filter 400 of the present invention Having preferred light = the present invention has been disclosed in the above embodiments, but it is not intended to limit the present invention, and any one of ordinary skill in the art, and the spirit and scope of the invention may be made a little more.顿润饰=Defined by the application of the present invention as defined in the appended claims = [Simple Description of the Drawings] Figure 1 is a schematic cross-sectional view of a conventional color filter. 13 200837400 95604 21863 twf.doc/n FIG. 2 is a flow chart showing the manufacturing process of a color filter according to an embodiment of the present invention. 3A to 3E are flow charts showing the cross section of the color filter of Fig. 2. • Figure 4 is a top view of the transparent substrate of Figure 3D. [Description of main component symbols] 10 · Glass substrate 11 : Transparent electrode, 17 : Horn area ( 18 · Black matrix 18a: Open area 1〇〇: Transparent substrate 100a: Visual area 100b: Non-visible area 12, 14, 16 , 11 〇, 120, 130 · color block 140 : barrier 150 : black matrix I) 19 ' 152 : cladding layer 160 : transparent electrode layer - 200 : reticle 300 : inkjet head 400 : color filter
Sl〇〇、Sll〇、S120、S130、S140 :彩色濾光片的製作 14Sl〇〇, S11〇, S120, S130, S140: Production of color filters 14