JP2013047720A - Color filter and method for manufacturing color filter - Google Patents

Color filter and method for manufacturing color filter Download PDF

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JP2013047720A
JP2013047720A JP2011185798A JP2011185798A JP2013047720A JP 2013047720 A JP2013047720 A JP 2013047720A JP 2011185798 A JP2011185798 A JP 2011185798A JP 2011185798 A JP2011185798 A JP 2011185798A JP 2013047720 A JP2013047720 A JP 2013047720A
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pixel
color filter
color
pixels
conductive film
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Jiro Horiguchi
次郎 堀口
Mitsuru Suzuki
充 鈴木
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Toppan Inc
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Toppan Printing Co Ltd
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Abstract

PROBLEM TO BE SOLVED: To provide a color filter and a method for manufacturing the color filter, in which, when a plurality of colored transparent pixels constituting the color filter extend and overlap or adjoin to each other in a pixel boundary part, cracks are prevented from being generated in a transparent conductive film that covers the whole color array region of the colored transparent pixels, in particular, on the pixel boundary part.SOLUTION: A color filter comprises: three or more colors of monochromatic colored transparent pixels being arrayed in regular repetition of colors on a substrate; and a transparent conductive film provided to cover the whole surface of the color array region. Exclusively on a pixel boundary part where edges of pixels in two different colors from each other overlap or adjoin each other, an overcoat layer comprising a colored transparent pixel material in a color different from the above two colors constituting the pixel boundary part is disposed under the transparent conductive film.

Description

本発明は、液晶表示装置等に使用されるカラーフィルタに関する。   The present invention relates to a color filter used for a liquid crystal display device or the like.

カラー液晶表示装置は、コンピュータ端末やテレビ画像表示を中心に、多色カラー表示に必要な薄型軽量の表示装置として、急速に普及が進んでいる。カラー液晶表示装置を構成する主要部である液晶表示パネルとして種々の構成が提案されており、アクティブマトリクス駆動タイプのTN(Twisted Nematic)方式やVA(Vertical Alignment)方式の表示装置用の液晶表示パネルが一般的に多用されている。   Color liquid crystal display devices are rapidly spreading as thin and light display devices necessary for multicolor display, centering on computer terminals and television image displays. Various configurations have been proposed as a liquid crystal display panel that is a main part of a color liquid crystal display device, and a liquid crystal display panel for an active matrix drive type TN (Twisted Nematic) type or VA (Vertical Alignment) type display device. Is commonly used.

前記TN方式やVA方式の多色カラー表示装置用の液晶表示パネルは、液晶を挟む2枚の基板のそれぞれに設けた電極により多色の画素分割駆動を行い、液晶配向膜の機能により液晶を選択的に配向して、画像を表示する。カラーフィルタ(以下、CFと略称する)側の構造は、図2に代表的な例を部分拡大して模式断面図で示すと、透明な基板1上に遮光性を与えるブラックマトリクス2と、その開口部を選択的に埋めて色画素を構成する赤色画素3rや緑色画素3gや青色画素3b等の着色透明画素を設けて表示色を色分解し、それらの有効領域全体を覆う共通電極層として透明導電膜4を設ける構成となっている。さらに前記多色カラー表示装置用の液晶表示パネルを構成するには、CF上に液晶配向膜を覆って配向処理を施した後、液晶と接するように配置することにより達成できる。   The liquid crystal display panel for the TN type or VA type multicolor display device performs multicolor pixel division driving by the electrodes provided on each of the two substrates sandwiching the liquid crystal, and the liquid crystal is driven by the function of the liquid crystal alignment film. Selectively oriented to display the image. The structure on the side of the color filter (hereinafter abbreviated as CF) is, as shown in a schematic sectional view of a typical example in FIG. As a common electrode layer that provides colored transparent pixels such as red pixels 3r, green pixels 3g, and blue pixels 3b that selectively fill the openings to form color pixels to separate display colors and cover the entire effective area The transparent conductive film 4 is provided. Further, the liquid crystal display panel for the multicolor display device can be configured by covering the liquid crystal alignment film on the CF and performing alignment treatment, and then placing the liquid crystal display panel in contact with the liquid crystal.

一方、特に小型のカラー液晶表示装置の高精細化を実現するために、画素の狭ピッチ化とブラックマトリクス(以下、BMと略称する)の線幅の細線化が進んでいる。従来には、BM上にオーバーラップする着色透明画素は、隣り合う異なる色の着色透明画素と重なるまで延出することは少なく、BMの線幅内で隣の着色透明画素とギャップを隔てて配置されることが多かったが、BMの細線化に伴い、BM上で互いに異なる色の着色透明画素が重なることを許容する設計がなされるようになり、図2のように、BM上で比較的大きな凹凸を伴う断面形状を呈することが生じやすい。   On the other hand, in particular, in order to realize high definition of a small color liquid crystal display device, the pitch of pixels is reduced and the line width of a black matrix (hereinafter abbreviated as BM) is being reduced. Conventionally, a colored transparent pixel overlapping on a BM hardly extends until it overlaps with a colored transparent pixel of a different color, and is arranged with a gap from the adjacent colored transparent pixel within the line width of the BM. In many cases, however, with the thinning of the BM, a design that allows colored transparent pixels of different colors to overlap each other on the BM has been made. As shown in FIG. It is likely to exhibit a cross-sectional shape with large irregularities.

前記液晶表示パネルの構造において、パネルの表示品質を高く維持する上で、カラーフィルタ表面を平坦化することが好ましい。従って、上述のようにBM上で異なる着色透明画素が重なることを許容する場合は、重なり部分を後工程で研磨したり、重なり部分を構成する着色透明画素の縁辺部をBM面に対して緩やかな傾斜を持たせる工夫などにより、表面の凹凸の悪影響を軽減した(特許文献1および2を参照)。   In the structure of the liquid crystal display panel, it is preferable to flatten the surface of the color filter in order to maintain high display quality of the panel. Accordingly, when it is allowed that different colored transparent pixels overlap on the BM as described above, the overlapping portion is polished in a later process, or the edge portion of the colored transparent pixels constituting the overlapping portion is gently set with respect to the BM surface. The effect of unevenness on the surface was reduced by means of providing a gentle slope (see Patent Documents 1 and 2).

特開平9−230124号公報JP-A-9-230124 特開2006−227295号公報JP 2006-227295 A

カラーフィルタの着色透明画素がブラックマトリクス上で延出して互いに異なる着色透明画素同士が重なり合い、表面の凹凸を生じ易いことは、上述の対策をもってしても完全には避けられない。まして、着色透明画素の配列の形態によっては、2つの着色透明画素の重なりのみならず、3つの着色透明画素の重なりも発生し、盛り上がりがさらに大きくなる。また、重なり部の盛り上がりが大きくなった着色透明画素の縁辺部には微小な凹部
も発生し易い。
The fact that the colored transparent pixels of the color filter extend on the black matrix so that different colored transparent pixels overlap each other and are likely to cause surface irregularities is unavoidable even with the above measures. In addition, depending on the form of the arrangement of the colored transparent pixels, not only the overlapping of the two colored transparent pixels but also the overlapping of the three colored transparent pixels occurs, and the rise is further increased. In addition, a minute concave portion is likely to be generated at the edge portion of the colored transparent pixel in which the rising of the overlapping portion is increased.

このような表面の凹凸を有する着色透明画素の色配列領域全体をブラックマトリクスも含めて覆う共通電極層としての透明導電膜を形成すると、その製造工程の途中または、透明導電膜形成後の熱処理等の工程において、透明導電膜にクラックが発生することがある。クラックは、ブラックマトリクス表面の着色透明画素の重なり部または隣接する部分に起点を生じることが多い。また、生じた起点からブラックマトリクス開口部の画素面上にまで容易に延長増大することが多く、透明導電膜に発生するクラックを有するカラーフィルタを液晶表示パネルに組み込むと、液晶配向駆動に不均一が生じ、表示不良を引き起こす。   When a transparent conductive film is formed as a common electrode layer that covers the entire color arrangement region of the colored transparent pixels having such surface irregularities, including the black matrix, heat treatment during the production process or after the formation of the transparent conductive film, etc. In the step, cracks may occur in the transparent conductive film. In many cases, the crack starts from an overlapping portion or an adjacent portion of the colored transparent pixels on the black matrix surface. Also, it tends to easily extend from the starting point to the pixel surface of the black matrix opening, and when a color filter having cracks generated in the transparent conductive film is incorporated in the liquid crystal display panel, the liquid crystal alignment drive is not uniform. This causes display defects.

本発明は、前記の問題点に鑑みて提案するものであり、本発明が解決しようとする課題は、カラーフィルタを構成する複数の着色透明画素が画素境界部で互いに延出して重なりまたは隣接する場合に、着色透明画素の色配列領域の全表面を覆う透明導電膜の特に前記画素境界部上にクラックを発生させないカラーフィルタとその製造方法を提供することである。   The present invention is proposed in view of the above-mentioned problems, and the problem to be solved by the present invention is that a plurality of colored transparent pixels constituting a color filter extend or overlap each other at a pixel boundary portion. In such a case, the present invention provides a color filter that does not cause cracks on a transparent conductive film that covers the entire surface of the color array region of colored transparent pixels, particularly on the pixel boundary, and a method for manufacturing the same.

上記の課題を解決するための手段として、請求項1に記載の発明は、単一色の着色透明画素が基板上で3色以上の規則的な繰り返しにより色配列され、色配列領域の全表面を覆うように透明導電膜を設けたカラーフィルタであって、互いに異なる2色の画素縁辺部が重なりまたは隣接する画素境界部に限定して、画素境界部を構成する2色とは異なる色の着色透明画素材料からなるオーバーコート層を透明導電膜の下に設けたことを特徴とするカラーフィルタである。   As a means for solving the above-mentioned problems, the invention according to claim 1 is characterized in that colored transparent pixels of a single color are arranged in color by regular repetition of three or more colors on the substrate, and the entire surface of the color arrangement area is covered. A color filter provided with a transparent conductive film so as to cover, and is limited to a pixel boundary portion where two different pixel edge portions overlap or are adjacent to each other, and is colored in a color different from the two colors constituting the pixel boundary portion A color filter comprising an overcoat layer made of a transparent pixel material under a transparent conductive film.

また、請求項2に記載の発明は、画素境界部が、画素縁辺部の遮光性下地としてブラックマトリクスパターンによって予め規定されることを特徴とする請求項1に記載のカラーフィルタである。   According to a second aspect of the present invention, in the color filter according to the first aspect, the pixel boundary portion is defined in advance by a black matrix pattern as a light-shielding base of the pixel edge portion.

また、請求項3に記載の発明は、着色透明画素の色配列が、赤色、緑色、青色の3色からなり、オーバーコート層が、赤色画素と緑色画素との画素境界部上に青色材料で構成されることを特徴とする請求項1または2に記載のカラーフィルタである。   According to a third aspect of the present invention, the color arrangement of the colored transparent pixels consists of three colors of red, green and blue, and the overcoat layer is made of a blue material on the pixel boundary between the red pixel and the green pixel. The color filter according to claim 1, wherein the color filter is configured.

また、請求項4に記載の発明は、着色透明画素を、フォトリソグラフィ法により赤色、緑色の順にパターン形成した後、青色の画素形成に際して、青色画素の形成と同時に、同一材料によるオーバーコート層を赤色画素と緑色画素との画素境界部上にフォトリソグラフィ法により形成することを特徴とする請求項1〜3のいずれかに記載のカラーフィルタの製造方法である。   According to a fourth aspect of the present invention, after forming colored transparent pixels in the order of red and green by photolithography, an overcoat layer made of the same material is formed simultaneously with the formation of blue pixels. The color filter manufacturing method according to claim 1, wherein the color filter is formed on a pixel boundary portion between a red pixel and a green pixel by a photolithography method.

本発明は、透明導電膜を設けたカラーフィルタにおいて、互いに異なる2色の画素縁辺部が重なりまたは隣接する画素境界部に限定して、画素境界部を構成する2色とは異なる色の着色透明画素材料からなるオーバーコート層を透明導電膜の下に設けたので、画素境界部上の透明導電膜にクラックを発生させないカラーフィルタを提供することができる。   The present invention relates to a color filter provided with a transparent conductive film, and is limited to a pixel boundary portion where pixel edge portions of two different colors overlap or are adjacent to each other, and is colored transparently different from the two colors constituting the pixel boundary portion. Since the overcoat layer made of the pixel material is provided under the transparent conductive film, it is possible to provide a color filter that does not cause cracks in the transparent conductive film on the pixel boundary.

本発明のカラーフィルタの一例を示す模式断面図である。It is a schematic cross section which shows an example of the color filter of this invention. 従来のカラーフィルタの一例を示す模式断面図である。It is a schematic cross section showing an example of a conventional color filter. 本発明のカラーフィルタの構成を透明導電膜形成前の状態により詳細に説明するための模式図であって、(a)は拡大した平面図、(b)は(a)の点線円内をさらに拡大表示した断面図である。BRIEF DESCRIPTION OF THE DRAWINGS It is a schematic diagram for demonstrating in detail the structure of the color filter of this invention by the state before transparent conductive film formation, Comprising: (a) is the expanded top view, (b) is further in the dotted-line circle of (a). It is sectional drawing expanded.

以下、図面に従って、本発明を実施するための形態について説明する。
図1は、本発明のカラーフィルタの一例を部分拡大して示す模式断面図である。図の縦横比は誇張してあり、膜厚方向の縦の拡大を大きく示す。
Hereinafter, embodiments for carrying out the present invention will be described with reference to the drawings.
FIG. 1 is a schematic cross-sectional view showing an example of the color filter of the present invention in a partially enlarged manner. The aspect ratio in the figure is exaggerated and greatly shows the vertical expansion in the film thickness direction.

本発明のカラーフィルタは、単一色の着色透明画素が基板1上で3色以上の規則的な繰り返しにより色配列され、色配列領域の全表面を覆うように透明導電膜4を設けたカラーフィルタであって、互いに異なる2色の画素縁辺部が重なりまたは隣接する画素境界部に限定して、画素境界部を構成する2色とは異なる色の着色透明画素材料からなるオーバーコート層5を透明導電膜4の下に設けたことを特徴とする。   The color filter of the present invention is a color filter in which colored transparent pixels of a single color are arranged in color by regular repetition of three or more colors on the substrate 1 and a transparent conductive film 4 is provided so as to cover the entire surface of the color arrangement region. The overcoat layer 5 made of a colored transparent pixel material having a color different from the two colors constituting the pixel boundary portion is transparent, limited to the pixel boundary portion where the pixel edge portions of two different colors overlap or are adjacent to each other. It is provided below the conductive film 4.

本例では、画素境界部が、画素縁辺部の遮光性下地としてブラックマトリクス(BM)2のパターンによって予め規定される最も一般的な形態を示している。BMは、液晶表示パネルの各画素間を遮光して仕切ることにより、表示品質を高めることができるものであって、カーボン等の遮光性の顔料を含む感光性樹脂を塗布後に露光、現像するフォトリソグラフィー法により、あるいは金属や金属酸化物等の無機薄膜を成膜後にフォトリソグラフィ法とエッチング法により、パターン形成することができる。   In this example, the pixel boundary portion shows a most general form preliminarily defined by the pattern of the black matrix (BM) 2 as a light-shielding base at the pixel edge portion. BM can improve display quality by partitioning each pixel of a liquid crystal display panel by shading, and is a photo that is exposed and developed after applying a photosensitive resin containing a light-shielding pigment such as carbon. A pattern can be formed by a lithography method or by a photolithography method and an etching method after forming an inorganic thin film such as a metal or a metal oxide.

着色透明画素の色配列は、本例では赤色画素3r、緑色画素3g、青色画素3bの3色からなり、オーバーコート層5が、赤色画素3rと緑色画素3gとの画素境界部上に青色材料で構成される。着色透明画素は、材料として所望の着色顔料を用いて、BMのパターン形成について説明した第一の製法例と同様に、顔料を含む感光性を有する透明樹脂によるフォトリソグラフィー法により形成できる。各色画素の配置とBMの位置合わせ精度を考慮して、BM線幅の一部をオーバーラップさせて開口部に隙間を作らないようにする必要があるが、画素が狭ピッチ化しBMの細線化が進んだ場合に多く採用される本例のように、互いに異なる隣り合う着色透明画素がBM表面上に延出して互いに重なり合う重なり部を有するような設計も行われる。   In this example, the color arrangement of the colored transparent pixels is composed of three colors of a red pixel 3r, a green pixel 3g, and a blue pixel 3b, and the overcoat layer 5 has a blue material on the pixel boundary portion between the red pixel 3r and the green pixel 3g. Consists of. The colored transparent pixel can be formed by a photolithography method using a transparent resin having photosensitivity containing a pigment, in the same manner as in the first manufacturing method described for the BM pattern formation, using a desired coloring pigment as a material. In consideration of the arrangement of each color pixel and the alignment accuracy of the BM, it is necessary to overlap a part of the BM line width so as not to create a gap in the opening, but the pixels are narrowed and the BM is thinned. As in this example, which is often adopted when advancing, a design is also made in which different colored transparent pixels adjacent to each other extend on the BM surface and have overlapping portions.

透明導電膜4は、ITO(インジウム・錫・酸化物)等の薄膜で形成し、スパッタリング法や真空蒸着法等の一般的な薄膜形成方法が利用される。透明導電膜にクラックが発生する現象は、有機樹脂膜を含む着色層を下地としてその表面を覆う無機薄膜の透明導電膜が膜のストレスを解放する結果と見られており、特に無機薄膜の下地の有機層の微小な凹凸を起点として発生しやすい傾向が認められる。透明導電膜を成膜するスパッタリング法や真空蒸着法等の薄膜形成工程の成膜条件により膜の内部応力をできるだけ緩和して、クラックを低減することもある程度可能である。しかし、透明電極層の優れた電気的光学的特性とクラックの完全防止とを両立させる条件を選択することは難しい。   The transparent conductive film 4 is formed of a thin film such as ITO (indium / tin / oxide), and a general thin film forming method such as a sputtering method or a vacuum evaporation method is used. The phenomenon of cracks in the transparent conductive film is seen as a result of the inorganic thin film transparent film covering the surface with the colored layer containing the organic resin film as the base, especially the base of the inorganic thin film. It tends to occur easily starting from minute irregularities of the organic layer. It is also possible to reduce cracks to some extent by relaxing the internal stress of the film as much as possible depending on the film forming conditions of the thin film forming process such as sputtering or vacuum deposition for forming a transparent conductive film. However, it is difficult to select conditions that achieve both excellent electro-optical characteristics of the transparent electrode layer and complete prevention of cracks.

また、画素境界部上の透明導電膜4にクラックを発生させる要因として、前述の表面凹凸という形態的な要因の他に、透明導電膜の成膜工程の途中、または、透明導電膜形成後の熱処理等の処理工程中に、下地の着色透明画素を構成する樹脂が受ける熱による収縮が考えられる。特に、熱収縮率の高い樹脂の含有率が大きい場合に、下地から透明導電膜に及ぼすストレスが大きくなる。さらに、互いに異なる材料からなる2色の画素縁辺部が重なりまたは隣接する画素境界部においては、前記の形態的要因と熱収縮変化に伴う要因とが相俟って透明導電膜に最もクラックを発生させ易い箇所となる。   In addition to the above-described morphological factors such as surface irregularities, as a factor for generating cracks in the transparent conductive film 4 on the pixel boundary portion, during the transparent conductive film formation process or after the formation of the transparent conductive film During processing steps such as heat treatment, shrinkage due to heat received by the resin constituting the colored transparent pixels of the base can be considered. In particular, when the content of the resin having a high thermal contraction rate is large, the stress exerted on the transparent conductive film from the base is increased. Furthermore, at the pixel border where the two color pixel edges made of different materials overlap or are adjacent to each other, the morphological factors combined with the factors associated with the heat shrinkage change generate the most cracks in the transparent conductive film. It will be easy to do.

図3は、本発明のカラーフィルタの構成を透明導電膜形成前の状態により詳細に説明するための模式図であって、(a)は拡大した平面図、(b)は(a)の点線円内をさらに拡大表示した断面図である。
図3(a)に示すように、ブラックマトリクス2で規定される画素境界部の内、図中の縦方向のBM上で、ストライプ状の赤色、緑色、青色に分けて形成した着色透明画素3r、3g、3bの列のそれぞれの縁辺部が、互いに異なる2色の画素縁辺部が重なりまたは隣接する画素境界部を構成する。なお、画素境界部がBMで規定されない場合は、事実上BM幅に相当する画素縁辺部の重なり部または隣接領域を画素境界部と定義する。
3A and 3B are schematic views for explaining the configuration of the color filter of the present invention in more detail before the transparent conductive film is formed, in which FIG. 3A is an enlarged plan view, and FIG. 3B is a dotted line in FIG. It is sectional drawing which further enlargedly displayed the inside of the circle.
As shown in FIG. 3A, among the pixel boundaries defined by the black matrix 2, colored transparent pixels 3r formed in stripes of red, green, and blue on the vertical BM in the drawing. Each edge of the 3g and 3b columns constitutes a pixel boundary where two different pixel edges overlap or are adjacent. When the pixel boundary is not defined by the BM, an overlapping portion or an adjacent region of the pixel edge substantially corresponding to the BM width is defined as the pixel boundary.

また、図3(b)に示す着色透明画素の重なり部8は、本例では、基板1上のブラックマトリクス2上で、赤色画素3rの縁辺部と緑色画素3gの縁辺部とが重なり合い、矢印引き出し線で示す微小な凹部9を形成している。前述の説明のとおり、透明導電膜に最もクラックを発生させ易い箇所が凹部9であるので、青色画素3bと同一の材料でオーバーコート層5を形成する。   Further, in this example, the overlapping portion 8 of the colored transparent pixels shown in FIG. 3B is overlapped with the edge of the red pixel 3r and the edge of the green pixel 3g on the black matrix 2 on the substrate 1. A minute concave portion 9 indicated by a lead line is formed. As described above, since the concave portion 9 is the place where the crack is most likely to occur in the transparent conductive film, the overcoat layer 5 is formed of the same material as the blue pixel 3b.

次に、本発明のカラーフィルタを製造する方法について述べる。
基板1としては、一般の液晶表示装置に用いられる無アルカリガラス等の透明基板が使用できる。BMパターンを前述のフォトリソグラフィー法により形成する際に、例えば、三菱マテリアル電子化成(株)製のチタンブラック12Sを遮光性顔料として使用することができる。着色透明画素を前述のフォトリソグラフィー法により形成する際に使用される材料の内、各色の顔料としては、例えば、赤色用顔料として、C.I.Pigment Red 254、およびC.I.Pigment Red 177、緑色用顔料として、C.I.Pigment Green 36、およびC.I.Pigment Yellow 150、青色用顔料として、C.I.Pigment Blue 15、およびC.I.Pigment Violet 23を使用することができる。
Next, a method for producing the color filter of the present invention will be described.
As the substrate 1, a transparent substrate such as non-alkali glass used in a general liquid crystal display device can be used. When the BM pattern is formed by the above-described photolithography method, for example, titanium black 12S manufactured by Mitsubishi Materials Electronics Chemical Co., Ltd. can be used as a light-shielding pigment. Among the materials used when the colored transparent pixels are formed by the photolithography method described above, examples of the pigment of each color include C.I. I. Pigment Red 254, and C.I. I. Pigment Red 177, as a green pigment, C.I. I. Pigment Green 36, and C.I. I. Pigment Yellow 150, as a blue pigment, C.I. I. Pigment Blue 15, and C.I. I. Pigment Violet 23 can be used.

上記各色の着色顔料にアクリル樹脂を含むワニスを加えて各色の分散体を作製し、その後、光硬化性モノマー、光重合開始剤、増感剤、溶剤を適宜加えて均一に混合、濾過して塗布用の感光性着色材料を得る。通常のフォトリソグラフィー法の手段により、1色目に赤色画素3rを所定の位置に形成し、同様の手段を繰り返して、2色目に緑色画素3gを赤色画素3rと隣り合う所定の位置に形成する。3色目の形成に際しては、3色目の青色画素3bを赤色画素3rと緑色画素3gとに挟まれた所定の位置に形成すると同時に、同一工程で、オーバーコート層5を赤色画素と緑色画素との画素境界部上に形成する。本例の光硬化性の感光性材料を使用の場合、露光工程に使用するフォトマスクの開口部を、青色画素3bに相当する領域とオーバーコート層5に相当する領域とに設けておくことにより、同時形成が可能である。すなわち、工程上の負荷を何ら増大させないで、透明導電膜のクラックを防止する方策を施すことができる。   A varnish containing an acrylic resin is added to the color pigments of each color to prepare a dispersion of each color, and then a photocurable monomer, a photopolymerization initiator, a sensitizer, and a solvent are added as appropriate, and mixed and filtered uniformly. A photosensitive coloring material for coating is obtained. The red pixel 3r for the first color is formed at a predetermined position by means of ordinary photolithography, and the same means is repeated to form the green pixel 3g for the second color at a predetermined position adjacent to the red pixel 3r. When forming the third color, the blue pixel 3b of the third color is formed at a predetermined position between the red pixel 3r and the green pixel 3g, and at the same time, the overcoat layer 5 is formed between the red pixel and the green pixel in the same process. It is formed on the pixel boundary. In the case of using the photo-curable photosensitive material of this example, the openings of the photomask used in the exposure process are provided in a region corresponding to the blue pixel 3b and a region corresponding to the overcoat layer 5. Simultaneous formation is possible. That is, it is possible to take measures to prevent cracks in the transparent conductive film without increasing any load on the process.

次に、カラーフィルタ製造の最後の工程として、ブラックマトリクスと着色透明画素のパターンが形成されたカラーフィルタの清浄表面に、ITOの透明導電膜を約100nmの厚さに均一にスパッタリング成膜することができる。   Next, as the final step of manufacturing the color filter, an ITO transparent conductive film is uniformly sputtered to a thickness of about 100 nm on the clean surface of the color filter on which the black matrix and the colored transparent pixel pattern are formed. Can do.

なお、本例では、オーバーコート層5を赤色画素3rと緑色画素3gとの画素境界部上のみに設けて、他の種類の画素境界部上に設ける例を示していないが、他の、緑色画素3gと青色画素3bとの画素境界部上や、青色画素3bと赤色画素3rとの画素境界部上にオーバーコート層を設けることを妨げるものではない。但し複数種の画素境界部上に設ける場合には、製造工程が複雑になることは避けられない。   In this example, the overcoat layer 5 is provided only on the pixel boundary portion between the red pixel 3r and the green pixel 3g and is not provided on another type of pixel boundary portion. It does not prevent the overcoat layer from being provided on the pixel boundary between the pixel 3g and the blue pixel 3b or on the pixel boundary between the blue pixel 3b and the red pixel 3r. However, in the case of providing on a plurality of kinds of pixel boundary portions, it is inevitable that the manufacturing process becomes complicated.

一方、本例では、着色透明画素の形成順に都合の良い3色目の青色の材料によるオーバーコート層を形成しており、しかも青色材料は、前記分散体中の樹脂比率を他の着色材料の分散体に較べて低くできるので、相対的に熱収縮率を小さくして作製できる。このため、赤色画素3rと緑色画素3gとの画素境界部上に青色画素3bと同一の材料でオーバーコート層5を設けることで、最も効果の大きい対策を提供することができる。   On the other hand, in this example, an overcoat layer made of a blue material of the third color, which is convenient in the order of formation of the colored transparent pixels, is formed, and the blue material has a resin ratio in the dispersion dispersed in other colored materials. Since it can be made lower than the body, it can be produced with a relatively small thermal shrinkage. For this reason, providing the overcoat layer 5 with the same material as that of the blue pixel 3b on the pixel boundary portion between the red pixel 3r and the green pixel 3g can provide the most effective countermeasure.

1・・・基板
2・・・ブラックマトリクス
3r・・・赤色画素
3g・・・緑色画素
3b・・・青色画素
4・・・透明導電膜
5・・・オーバーコート層
8・・・着色透明画素の重なり部
9・・・凹部
DESCRIPTION OF SYMBOLS 1 ... Substrate 2 ... Black matrix 3r ... Red pixel 3g ... Green pixel 3b ... Blue pixel 4 ... Transparent conductive film 5 ... Overcoat layer 8 ... Colored transparent pixel Overlapping part 9 ... concave part

Claims (4)

単一色の着色透明画素が基板上で3色以上の規則的な繰り返しにより色配列され、色配列領域の全表面を覆うように透明導電膜を設けたカラーフィルタであって、互いに異なる2色の画素縁辺部が重なりまたは隣接する画素境界部に限定して、画素境界部を構成する2色とは異なる色の着色透明画素材料からなるオーバーコート層を透明導電膜の下に設けたことを特徴とするカラーフィルタ。   A color filter in which colored transparent pixels of a single color are arranged in a color by regularly repeating three or more colors on a substrate, and a transparent conductive film is provided so as to cover the entire surface of the color arrangement region. An overcoat layer made of a colored transparent pixel material having a color different from the two colors constituting the pixel boundary portion is provided under the transparent conductive film, limited to the pixel boundary portion where the pixel edge portions overlap or are adjacent to each other. Color filter. 画素境界部が、画素縁辺部の遮光性下地としてブラックマトリクスパターンによって予め規定されることを特徴とする請求項1に記載のカラーフィルタ。   The color filter according to claim 1, wherein the pixel boundary part is defined in advance by a black matrix pattern as a light-shielding base of the pixel edge part. 着色透明画素の色配列が、赤色、緑色、青色の3色からなり、オーバーコート層が、赤色画素と緑色画素との画素境界部上に青色材料で構成されることを特徴とする請求項1または2に記載のカラーフィルタ。   The color arrangement of the colored transparent pixels is composed of three colors of red, green, and blue, and the overcoat layer is formed of a blue material on a pixel boundary portion between the red pixel and the green pixel. Or the color filter of 2. 着色透明画素を、フォトリソグラフィ法により赤色、緑色の順にパターン形成した後、青色の画素形成に際して、青色画素の形成と同時に、同一材料によるオーバーコート層を赤色画素と緑色画素との画素境界部上にフォトリソグラフィ法により形成することを特徴とする請求項1〜3のいずれかに記載のカラーフィルタの製造方法。   After the colored transparent pixels are patterned in the order of red and green by photolithography, when forming the blue pixels, simultaneously with the formation of the blue pixels, an overcoat layer made of the same material is formed on the pixel boundary between the red and green pixels. The method for producing a color filter according to claim 1, wherein the color filter is formed by photolithography.
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9921426B2 (en) 2013-06-17 2018-03-20 Lg Display Co., Ltd. Display with blue pigment layer under black matrix
CN113466982A (en) * 2020-03-30 2021-10-01 佳能株式会社 Color filter array, electronic device, and method of manufacturing color filter array

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9921426B2 (en) 2013-06-17 2018-03-20 Lg Display Co., Ltd. Display with blue pigment layer under black matrix
CN113466982A (en) * 2020-03-30 2021-10-01 佳能株式会社 Color filter array, electronic device, and method of manufacturing color filter array

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