WO2020237928A1 - Oled显示面板及光罩 - Google Patents

Oled显示面板及光罩 Download PDF

Info

Publication number
WO2020237928A1
WO2020237928A1 PCT/CN2019/106892 CN2019106892W WO2020237928A1 WO 2020237928 A1 WO2020237928 A1 WO 2020237928A1 CN 2019106892 W CN2019106892 W CN 2019106892W WO 2020237928 A1 WO2020237928 A1 WO 2020237928A1
Authority
WO
WIPO (PCT)
Prior art keywords
area
opaque
stripe
stripes
photomask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/CN2019/106892
Other languages
English (en)
French (fr)
Inventor
张永晖
李鹏
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Wuhan China Star Optoelectronics Semiconductor Display Technology Co Ltd
Original Assignee
Wuhan China Star Optoelectronics Semiconductor Display Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Wuhan China Star Optoelectronics Semiconductor Display Technology Co Ltd filed Critical Wuhan China Star Optoelectronics Semiconductor Display Technology Co Ltd
Priority to US16/613,425 priority Critical patent/US11374203B2/en
Publication of WO2020237928A1 publication Critical patent/WO2020237928A1/zh
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/85—Arrangements for extracting light from the devices
    • H10K50/858—Arrangements for extracting light from the devices comprising refractive means, e.g. lenses
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/122—Pixel-defining structures or layers, e.g. banks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/131—Interconnections, e.g. wiring lines or terminals
    • H10K59/1315—Interconnections, e.g. wiring lines or terminals comprising structures specially adapted for lowering the resistance
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K2102/00—Constructional details relating to the organic devices covered by this subclass
    • H10K2102/301—Details of OLEDs
    • H10K2102/341—Short-circuit prevention
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/124—Insulating layers formed between TFT elements and OLED elements

Definitions

  • This application relates to the field of display technology, and in particular to an OLED display panel and a photomask.
  • the step slope angle a of the organic layer is a right angle or approximately a right angle.
  • the metal layer M2 is deposited, various This kind of problem: For example, as shown in Figure 1 (1), the thickness of the metal layer M2 at the corner of the step slope is much larger than the thickness of other areas, which will cause etching residue, etc., as shown in Figure 1 (2) , The thickness of the metal layer M2 on the step slope angle is much smaller than the thickness of other areas, which will cause the resistance of the metal layer M2 on the step slope angle to be significantly higher than that of the flat area.
  • the existing OLED display panel has a technical problem that the step slope angle of the organic layer is approximately a right angle, which needs to be improved.
  • the present application provides an OLED display panel and a photomask to alleviate the technical problem that the step slope angle of the organic layer of the existing OLED display panel is approximately right.
  • the present application provides an OLED display panel and a photomask to alleviate the technical problem that the step slope angle of the organic layer of the existing OLED display panel is approximately right.
  • An embodiment of the application provides an OLED display panel, which includes:
  • the first film layer is formed on the substrate
  • the second film layer is formed on the first film layer, and the material of the second film layer is an organic material;
  • the step slope angle of the second film layer is an acute angle and is less than a preset value.
  • the slope of the step slope angle of the second film layer is a straight line and an inner concave arc Any one or a combination of lines, polylines, and convex arcs.
  • the second film layer is any one of a transparent organic filling layer, a planarization layer, a pixel definition layer, and a barrier layer.
  • the embodiment of the present application provides a photomask, which includes a transparent substrate and an opaque pattern provided on the transparent substrate, and is used to prepare the second film layer in the OLED display panel provided by the embodiments of the present application;
  • the photomask includes :
  • the holographic area the area corresponding to the holographic area on the transparent substrate is covered with an opaque film, and the opacity of the opaque film to light of a preset color is greater than or equal to a first preset threshold ;
  • a fully transparent area, an area on the transparent substrate corresponding to the fully transparent area does not cover the opaque pattern, and the transmittance of the transparent substrate to the light of the preset color is greater than a second preset threshold;
  • the penumbra area is arranged between the total shadow area and the fully transparent area, and the area corresponding to the penumbra area on the transparent substrate is provided with a plurality of opaque stripes according to a preset rule.
  • the opacity of the stripes to the light of the preset color is greater than or equal to the first preset threshold.
  • the stripe width of the opaque stripe decreases from the full shadow area to the full transparent area.
  • the opaque stripes have the same stripe width.
  • the stripe gap between the opaque stripes decreases from the omni-shadow area to the omni-transmission area.
  • the stripe gap between the opaque stripes increases from the omni-shadow area to the omni-transmission area.
  • the stripe gaps between the opaque stripes are the same.
  • the stripe gaps between the opaque stripes are the same and the stripe widths are the same.
  • the stripe width of the opaque stripes decreases from the omni-shadow area to the omni-transmission area, and the stripe gap between the opaque stripes is from the full The shadow area decreases in the direction of the transparent area.
  • the stripe width of the opaque stripes decreases from the omni-shading area to the full-transmission area, and the stripe gap between the opaque stripes is from The shadow area increases in the direction of the transparent area.
  • the stripe width of the opaque stripes decreases from the omni-shadow area to the omni-transmission area, and the stripe gaps between the opaque stripes are the same.
  • the stripe widths of the opaque stripes are the same, and the stripe gap between the opaque stripes d decreases from the omnidirectional area to the omnidirectional area.
  • the stripe widths of the opaque stripes are the same, and the stripe gap between the opaque stripes d increases from the omnidirectional area to the omnidirectional area.
  • the opaque stripes are metal stripes.
  • the material of the opaque film is the same as the material of the opaque stripes.
  • the material of the opaque film and the material of the opaque stripes are chromium with a light opacity of 100%.
  • the material of the opaque film is at least one of silver and copper, and the material of the opaque stripes is chromium with a light opacity of 100%.
  • the opaque stripes are at least one of straight lines, fold lines, and curved lines.
  • the present application provides an OLED display panel and a photomask.
  • the OLED display panel includes a first film layer and a second film layer formed on the first film layer.
  • the material of the second film layer is an organic material.
  • the step slope angle of the second film layer is an acute angle and is less than a preset value; in this application, because the step slope angle of the second film layer is an acute angle and less than a preset value, the metal After layering, there will be no problems that the thickness of the metal layer at the corner of the step slope is much larger than the thickness of other regions, or the thickness of the metal layer at the corner of the step slope is much smaller than the thickness of other regions, which alleviates the existing OLED The technical problem that the step slope angle of the organic layer of the display panel is approximately right angle, which improves the panel yield.
  • FIG. 1 is a schematic diagram of the manufacturing process of a conventional OLED display panel.
  • FIG. 2 is a schematic diagram of film layers of an OLED display panel provided by an embodiment of the application.
  • FIG. 3 is a schematic diagram of the first preparation of the OLED display panel provided by the embodiment of the application.
  • FIG. 4 is a schematic diagram of a second preparation method of the OLED display panel provided by an embodiment of the application.
  • FIG. 5 is a schematic structural diagram of a photomask provided by an embodiment of the application.
  • FIG. 6 is a schematic diagram of the first design of the photomask provided by the embodiment of the application.
  • FIG. 7 is a schematic diagram of the second design of the photomask provided by the embodiment of the application.
  • FIG. 8 is a schematic diagram of a third preparation method of the OLED display panel provided by an embodiment of the application.
  • FIG. 9 is a schematic diagram of the third design of the photomask provided by the embodiment of the application.
  • the step slope angle refers to the angle between the slope of a certain film layer (the edge position of the film) and the bottom surface of the film, such as the angle a shown in Figure 1 and the angle shown in Figure 2 Indicates the included angle b and so on.
  • the embodiments of the present application can alleviate the technical problem.
  • the OLED display panel 20 provided by the present application includes:
  • the first film layer 21 is formed on the substrate 23;
  • the second film layer 22 is formed on the first film layer 21, and the material of the second film layer 22 is an organic material;
  • the step slope angle b of the second film layer 22 is an acute angle and is smaller than a preset value.
  • the OLED display panel includes a first film layer and a second film layer formed on the first film layer.
  • the material of the second film layer is an organic material.
  • the step slope angle of the second film layer is an acute angle and is less than the preset value; in this application, because the step slope angle of the second film layer is an acute angle and less than the preset value, so after the subsequent formation of the metal layer ,
  • the thickness of the metal layer at the corner of the step slope is much larger than the thickness of other regions, or the thickness of the metal layer at the corner of the step slope is much smaller than the thickness of other regions, etc., will not occur, alleviating the existing OLED display panel
  • the existing technical problem that the step slope angle of the organic layer is approximately a right angle improves the panel yield.
  • the slope m of the step slope angle b of the second film layer 21 Is a straight line.
  • the slope m of the step slope angle b of the second film layer 21 is a straight line and an inner concave arc Any one or a combination of lines, polylines, and convex arcs.
  • the second film layer 22 is any one of a transparent organic filling layer, a planarization layer, a pixel definition layer, and a barrier layer.
  • the preset value is any value from 45 degrees to 75 degrees.
  • the photomask 30 provided by the present application includes a transparent substrate 34 and an opaque pattern 35 provided on the transparent substrate 34, and is used to prepare the OLED display panel provided by the embodiment of the present application.
  • the second film layer in; the mask 20 includes:
  • the fully transparent region 33, the area corresponding to the fully transparent region on the transparent substrate 34 does not cover the opaque pattern 35, and the transparent substrate 34 has a higher transmittance to the predetermined color of light Preset threshold;
  • the penumbra area 32 is arranged between the omni-shadow area 31 and the full-transmission area 33, and the area corresponding to the penumbra area 32 on the transparent substrate 34 is provided with a plurality of opaque stripes d according to a preset rule , The opacity of the opaque stripes d to the light of the preset color is greater than or equal to the first preset threshold.
  • This embodiment provides a photomask. Based on the setting of the penumbra area, when the photomask is used to process the organic film layer of an OLED display panel, the step slope angle of the organic film layer is an acute angle and is less than a preset value; in this application.
  • the step slope angle of the organic film layer is an acute angle and is less than the preset value, after the metal layer is formed, the thickness of the metal layer at the step slope angle will not be much greater than the thickness of other areas, or the step The problem that the thickness of the metal layer on the slope angle is much smaller than the thickness of other areas, etc., alleviates the technical problem that the step slope angle of the organic layer of the existing OLED display panel is approximately a right angle, and improves the panel yield.
  • the light of the preset color refers to the light of the corresponding color required when the second film layer 22 is patterned.
  • the material of the second film layer 22 is different, and the light of the corresponding preset color is also different.
  • the first preset threshold value is any value from 90% to 100%.
  • the second preset threshold value is any value from 80% to 100%.
  • the stripe width of the opaque stripe d decreases from the full shadow area to the full transparent area.
  • the stripe widths of the opaque stripe d are the same.
  • the stripe gap between the opaque stripes d decreases from the omni-shadow area to the omni-transmission area.
  • the stripe gap between the opaque stripes d increases from the omni-shadow area to the omni-transmission area.
  • the stripe gaps between the opaque stripes d are the same.
  • the stripe gaps between the opaque strips d are the same and the stripe widths are the same.
  • the stripe width of the opaque stripe d decreases from the omni-shading area to the transparent area, and the stripe gap between the opaque stripes d is from the omni-shading area Decrease in the direction of the full penetration zone.
  • the stripe width of the opaque stripe d decreases from the omni-shading area to the transparent area, and the stripe gap between the opaque stripes d is from the omni-shading area Increasing in the direction of the full penetration zone.
  • the stripe width of the opaque stripe d decreases from the omni-shadow area to the transparent area, and the stripe gap between the opaque stripe d is the same.
  • the stripe widths of the opaque stripes d are the same, and the stripe gap between the opaque stripes d decreases from the omni-shadow area to the omni-transmission area.
  • the stripe widths of the opaque stripes d are the same, and the stripe gap between the opaque stripes d increases from the omni-shading area to the omni-transmitting area.
  • the opaque stripe d is at least one of a straight line, a broken line, and a curved line.
  • the opaque stripes d are metal stripes or the like.
  • the opaque film c in the omni-shading area 31 is an opaque metal film.
  • the material of the opaque film c in the total shadow area 31 is different from the material of the opaque stripes d in the penumbra area 32.
  • the material of the opaque film c in the total shadow area 31 is at least one of silver, copper, etc.
  • the material of the opaque stripe d in the penumbra area 32 is light and the opacity rate is 100% chromium.
  • the material of the opaque film c in the total shadow area 31 is the same as the material of the opaque stripes d in the penumbra area 32.
  • the material of the opaque film c in the holographic region 31 and the material of the opaque stripes d in the penumbra region 32 are chromium with a light opacity of 100%.
  • the material of the transparent substrate 34 is glass or the like.
  • a schematic diagram of metal residue appears at the position of the edge of the transparent organic filling layer M1 of the lower frame.
  • the step slope angle a of the transparent organic filling layer M1 is a right angle. Because the metal layer M2 is not completely anisotropic when deposited, it will inevitably form a thicker corner at the step slope angle a. Metal layer M2. When the metal layer M2 is etched with the same normal dose as the display area, the metal layer M2 will be incompletely etched at the corners, and the remaining metal may cause a short circuit near the electrode or become a path for electrostatic discharge , Will eventually significantly reduce the yield of OLED display panels.
  • step N the transparent organic filling layer M1 on the substrate M3 forms a right-angle step slope angle a after photolithography; after the deposition of the metal layer M2 in step N+1, the step slope angle A thicker metal layer M2 will be formed near the position a; after the subsequent N+2 metal layer etching process, a residual metal layer M2 will appear at the step slope angle a, and the residual metal layer M2 may be stripped.
  • the ultraviolet light 40 is incident on the mask 30 perpendicularly, and the ultraviolet light passing through the plenum area 31 is almost completely blocked, and the transparent organic filling layer 22 corresponding to the plenum area 31 can be completely retained; Almost all ultraviolet light is transmitted through, and the transparent organic filling layer 22 corresponding to the fully transparent area 33 can be completely removed; the intensity of the ultraviolet light passing through the penumbra area 32 gradually changes from 0 to 100% from left to right, corresponding to the penumbra area 32 The thickness of the transparent organic filling layer 22 gradually decreases from left to right to 0, and finally a transparent organic filling layer 22 with a gradually changing slope angle is formed on the substrate M3.
  • the mask 30 is shown in FIG. 6, and the opaque stripes b are straight lines.
  • the stripe width of the opaque stripe b is 5 ⁇ m, 4 ⁇ m, 3 ⁇ m, 2 ⁇ m, 1 ⁇ m, 0.5 ⁇ m, 0.1 ⁇ m
  • the stripe gap between the opaque stripes is successively 5 ⁇ m, 4 ⁇ m, 3 ⁇ m, 2 ⁇ m, 1 ⁇ m, 0.5 ⁇ m, 0.1 ⁇ m.
  • the second film layer as a planarization layer (or a pixel definition layer) as an example, this application will be further explained.
  • a first metal layer M2 is deposited on the insulating layer M3, and there are successively above the first metal layer M2.
  • the passivation layer M5 has holes and the planarization layer (or pixel definition layer) M1 has holes. Since the deposition of the second metal layer M4 is not completely isotropic, a thinner second metal layer M4 will inevitably be formed on the side of the opening of the planarization layer (or pixel definition layer) M1, resulting in the planarization layer (or pixel definition layer).
  • the resistance of the second metal layer M4 on the side of the M1 opening will be significantly higher than the resistance of the second metal layer M4 in the flat area of the planarization layer (or pixel definition layer) M1, which will be in the entire display area Produce a significant pressure drop effect.
  • the ultraviolet light 40 is incident on the mask 30 perpendicularly, and the ultraviolet light passing through the holographic region 31 is almost completely blocked, and the planarization layer 22 corresponding to the holographic region 31 can be completely retained; Almost all of the light is transmitted through, and the planarization layer 22 corresponding to the full transmission area 33 can be completely removed; the intensity of the ultraviolet light passing through the penumbra area 32 gradually changes from 0 to 100% from the full shadow area 31 to the full transmission area 33, corresponding to half
  • the thickness of the flattened layer 22 of the shadow area 32 gradually decreases to 0 from the full shadow area 31 to the transparent area 33, and finally a flattened layer 22 with a gradually changing slope angle is formed.
  • the mask 30 is shown in FIG. 7, and the opaque stripes b are straight lines.
  • the stripe width of the opaque stripe b is 0.5 ⁇ m, 0.4 ⁇ m, 0.3 ⁇ m, 0.2 ⁇ m, 0.1 ⁇ m in sequence from the omni-shading area to the full-transmission area, and between the opaque stripes
  • the stripe gap is 0.5 ⁇ m, 0.4 ⁇ m, 0.3 ⁇ m, 0.2 ⁇ m, 0.1 ⁇ m.
  • the retaining wall layer in the display area needs to be patterned to form a protruding retaining wall 81. If the step slope angle b of the retaining wall 81 is a right angle or approximately a right angle, the retaining wall 81 is likely to collapse.
  • the step slope angle b of the control retaining wall 81 is a predetermined value.
  • the ultraviolet light 40 is incident on the mask 30 perpendicularly, and the ultraviolet light passing through the holographic region 31 is almost completely blocked, and the barrier layer 22 corresponding to the holographic region 31 can be completely retained; Almost all light is transmitted through, and the barrier layer 22 corresponding to the full-transmission zone 33 can be completely removed; the intensity of the ultraviolet light passing through the penumbra zone 32 gradually changes from 0 to 100% from the full-shadow zone 31 to the full-transmission zone 33, corresponding to half
  • the thickness of the retaining wall layer 22 of the shadow area 32 gradually decreases to 0 from the full shadow area 31 to the permeable area 33, and finally a retaining wall 81 with a gradually changing step slope angle is formed.
  • the mask 30 is as shown in FIG. 9, and the opaque stripes b are closed rectangles formed by straight lines.
  • the stripe width of the opaque stripe b is 10 ⁇ m, 8 ⁇ m, and 6 ⁇ m in order from the omni-shadow area to the transparent area, and the stripe gap between the opaque stripe is 10 ⁇ m and 8 ⁇ m in order. 6 ⁇ m.
  • the present application provides an OLED display panel and a photomask.
  • the OLED display panel includes a first film layer and a second film layer formed on the first film layer.
  • the material of the second film layer is an organic material.
  • the step slope angle of the second film layer is an acute angle and is less than a preset value; in this application, because the step slope angle of the second film layer is an acute angle and less than a preset value, the metal After layering, there will be no problems that the thickness of the metal layer at the corner of the step slope is much larger than the thickness of other regions, or the thickness of the metal layer at the corner of the step slope is much smaller than the thickness of other regions, which alleviates the existing OLED The technical problem that the step slope angle of the organic layer of the display panel is approximately right angle, which improves the panel yield.

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Optics & Photonics (AREA)
  • Electroluminescent Light Sources (AREA)

Abstract

一种OLED显示面板及光罩，该OLED显示面板包括第一膜层(21)，第二膜层(22)，形成于所述第一膜层(21)上，所述第二膜层(22)的材料为有机材料，其中，所述第二膜层(22)的台阶坡面角为锐角，且小于预设值；因为第二膜层(22)的台阶坡面角为锐角，且小于预设值，缓解了现有OLED显示面板存在的有机层的台阶坡面角近似直角的技术问题。

Description

OLED显示面板及光罩 技术领域
本申请涉及显示技术领域，尤其涉及一种OLED显示面板及光罩。
 背景技术
在制备OLED显示面板时，往往需要对有机层进行光刻，以形成需要的图案，然后再形成金属层，最后对金属层进行刻蚀。
如图1所示，在现有技术中，对有机层M1进行光刻之后，有机层的台阶坡面角a为直角，或者近似直角，在此基础上，沉积金属层M2时，会出现各种问题：例如图1中（1）所示，位于台阶坡面角处金属层M2的厚度远大于其他区域的厚度，这就会导致刻蚀残留等，又如图1中（2）所示，位于台阶坡面角上金属层M2的厚度远小于其他区域的厚度，这就会导致台阶坡面角上金属层M2的电阻将显著高于平坦区等。
即，现有OLED显示面板存在有机层的台阶坡面角近似直角的技术问题，需要改进。
 技术问题
本申请提供一种OLED显示面板及光罩，以缓解现有OLED显示面板存在的有机层的台阶坡面角近似直角的技术问题。
 技术解决方案
本申请提供一种OLED显示面板及光罩，以缓解现有OLED显示面板存在的有机层的台阶坡面角近似直角的技术问题。
为解决上述问题，本申请提供的技术方案如下：
本申请实施例提供一种OLED显示面板，其包括：
衬底；
第一膜层，形成于所述衬底上；
第二膜层，形成于所述第一膜层上，所述第二膜层的材料为有机材料；
其中，所述第二膜层的台阶坡面角为锐角，且小于预设值。
在本申请实施例提供的OLED显示面板中，在垂直所述衬底及所述第二膜层边缘的截面上，所述第二膜层的台阶坡面角的坡面为直线、内凹弧线、折线、外凸弧线中的任一种或多种的组合。
在本申请实施例提供的OLED显示面板中，所述第二膜层为透明有机填充层、平坦化层、像素定义层、挡墙层中的任一种。
本申请实施例提供一种光罩，其包括透明基板和设置在透明基板上的不透光图案，用于制备本申请实施例提供的OLED显示面板中的第二膜层；所述光罩包括：
全影区，在所述透明基板上对应所述全影区的区域覆盖有不透光膜，所述不透光膜对预设颜色的光的不透光率大于或等于第一预设阈值；
全透区，在所述透明基板上对应所述全透区的区域未覆盖所述不透光图案，所述透明基板对所述预设颜色的光的透光率大于第二预设阈值；
半影区，设置在所述全影区和所述全透区之间，在所述透明基板上对应所述半影区的区域按预设规律设置有多条不透明条纹，所述不透光条纹对预设颜色的光的不透光率大于或等于所述第一预设阈值。
在本申请实施例提供的光罩中，所述不透明条纹的条纹宽度，从所述全影区向所述全透区的方向递减。
在本申请实施例提供的光罩中，所述不透明条纹的条纹宽度相同。
在本申请实施例提供的光罩中，所述不透明条纹之间的条纹间隙，从所述全影区向所述全透区的方向递减。
在本申请实施例提供的光罩中，所述不透明条纹之间的条纹间隙，从所述全影区向所述全透区的方向递增。
在本申请实施例提供的光罩中，所述不透明条纹之间的条纹间隙相同。
在本申请实施例提供的光罩中，所述不透明条纹之间的条纹间隙相同、且条纹宽度相同。
在本申请实施例提供的光罩中，所述不透明条纹的条纹宽度，从所述全影区向所述全透区的方向递减，且所述不透明条纹之间的条纹间隙，从所述全影区向所述全透区的方向递减。
在本申请实施例提供的光罩中，所述不透明条纹的条纹宽度，从所述全影区向所述全透区的方向递减，且所述不透明条纹之间的条纹间隙，从所述全影区向所述全透区的方向递增。
在本申请实施例提供的光罩中，所述不透明条纹的条纹宽度，从所述全影区向所述全透区的方向递减，且所述不透明条纹之间的条纹间隙相同。
在本申请实施例提供的光罩中，所述不透明条纹的条纹宽度相同，且所述不透明条纹d之间的条纹间隙，从所述全影区向所述全透区的方向递减。
在本申请实施例提供的光罩中，所述不透明条纹的条纹宽度相同，且所述不透明条纹d之间的条纹间隙，从所述全影区向所述全透区的方向递增。
在本申请实施例提供的光罩中，所述不透明条纹为金属条纹。
在本申请实施例提供的光罩中，所述不透光膜的材料，与所述不透明条纹的材料相同。
在本申请实施例提供的光罩中，所述不透光膜的材料、以及所述不透明条纹的材料均为光的不透光率为100%的铬。
在本申请实施例提供的光罩中，所述不透光膜的材料为银、铜中的至少一种，所述不透明条纹的材料为光的不透光率为100%的铬。
在本申请实施例提供的光罩中，所述不透明条纹为直线、折线、曲线中的至少一种。
 有益效果
本申请提供一种OLED显示面板及光罩，该OLED显示面板包括第一膜层，第二膜层，形成于所述第一膜层上，所述第二膜层的材料为有机材料，其中，所述第二膜层的台阶坡面角为锐角，且小于预设值；在本申请中，因为第二膜层的台阶坡面角为锐角，且小于预设值，这样在后续形成金属层之后，不会出现位于台阶坡面角处金属层的厚度远大于其他区域的厚度，或者位于台阶坡面角上金属层的厚度远小于其他区域的厚度等问题的出现，缓解了现有OLED显示面板存在的有机层的台阶坡面角近似直角的技术问题，提高了面板良率。
 附图说明
为了更清楚地说明实施例或现有技术中的技术方案，下面将对实施例或现有技术描述中所需要使用的附图作简单介绍，显而易见地，下面描述中的附图仅仅是申请的一些实施例，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他的附图。
图1为现有OLED显示面板的制备过程示意图。
图2为本申请实施例提供的OLED显示面板的膜层示意图。
图3为本申请实施例提供的OLED显示面板的第一种制备示意图。
图4为本申请实施例提供的OLED显示面板的第二种制备示意图。
图5为本申请实施例提供的光罩的结构示意图。
图6为本申请实施例提供的光罩的第一种设计示意图。
图7为本申请实施例提供的光罩的第二种设计示意图。
图8为本申请实施例提供的OLED显示面板的第三种制备示意图。
图9为本申请实施例提供的光罩的第三种设计示意图。
 本发明的实施方式
以下各实施例的说明是参考附加的图示，用以例示本申请可用以实施的特定实施例。本申请所提到的方向用语，例如[上]、[下]、[前]、[后]、[左]、[右]、[内]、[外]、[侧面]等，仅是参考附加图式的方向。因此，使用的方向用语是用以说明及理解本申请，而非用以限制本申请。在图中，结构相似的单元是用以相同标号表示。
在本申请实施例中，台阶坡面角指某膜层的台阶（该膜层的边缘位置）坡面与膜层底面的夹角，例如图1中所示的夹角a和图2中所示的夹角b等。
针对现有OLED显示面板存在有机层的台阶坡面角近似直角的技术问题，本申请实施例可以缓解。
在一种实施例中，如图2所示，本申请提供的OLED显示面板20包括：
衬底23；
第一膜层21，形成于所述衬底23上；
第二膜层22，形成于所述第一膜层21上，所述第二膜层22的材料为有机材料；
其中，所述第二膜层22的台阶坡面角b为锐角，且小于预设值。
本实施例提供一种OLED显示面板，该OLED显示面板包括第一膜层，第二膜层，形成于所述第一膜层上，所述第二膜层的材料为有机材料，其中，所述第二膜层的台阶坡面角为锐角，且小于预设值；在本申请中，因为第二膜层的台阶坡面角为锐角，且小于预设值，这样在后续形成金属层之后，不会出现位于台阶坡面角处金属层的厚度远大于其他区域的厚度，或者位于台阶坡面角上金属层的厚度远小于其他区域的厚度等问题的出现，缓解了现有OLED显示面板存在的有机层的台阶坡面角近似直角的技术问题，提高了面板良率。
在一种实施例中，如图2所示，在垂直所述衬底23及所述第二膜层边缘n的截面上，所述第二膜层21的台阶坡面角b的坡面m为直线。
在一种实施例中，在垂直所述衬底23及所述第二膜层边缘211的截面上，所述第二膜层21的台阶坡面角b的坡面m为直线、内凹弧线、折线、外凸弧线中的任一种或多种的组合。
在一种实施例中，所述第二膜层22为透明有机填充层、平坦化层、像素定义层、挡墙层中的任一种。
在一种实施例中，预设值为45度到75度中的任意一个数值。
在一种实施例中，如图5所示，本申请提供的光罩30包括透明基板34和设置在透明基板34上的不透光图案35，用于制备本申请实施例提供的OLED显示面板中的第二膜层；所述光罩20包括：
全影区31，在所述透明基板34上对应所述全影区31的区域覆盖有不透光膜c，所述不透光膜c对预设颜色的光的不透光率大于或等于第一预设阈值；
全透区33，在所述透明基板34上对应所述全透区的区域未覆盖所述不透光图案35，所述透明基板34对所述预设颜色的光的透光率大于第二预设阈值；
半影区32，设置在所述全影区31和所述全透区33之间，在所述透明基板34上对应所述半影区32的区域按预设规律设置有多条不透明条纹d，所述不透光条纹d对预设颜色的光的不透光率大于或等于所述第一预设阈值。
本实施例提供一种光罩，基于半影区的设置，使用该光罩处理OLED显示面板的有机膜层时，有机膜层的台阶坡面角为锐角，且小于预设值；在本申请中，因为有机膜层的台阶坡面角为锐角，且小于预设值，这样在形成金属层之后，不会出现位于台阶坡面角处金属层的厚度远大于其他区域的厚度，或者位于台阶坡面角上金属层的厚度远小于其他区域的厚度等问题的出现，缓解了现有OLED显示面板存在的有机层的台阶坡面角近似直角的技术问题，提高了面板良率。
在本申请实施例中，预设颜色的光是指对第二膜层22进行图案化处理时所需要的对应颜色的光，第二膜层22的材料不同，对应的预设颜色的光也不同。
在本申请实施例中，第一预设阈值为90%至100%中的任意一个取值。
在本申请实施例中，第二预设阈值为80%至100%中的任意一个取值。
在一种实施例中，所述不透明条纹d的条纹宽度，从所述全影区向所述全透区的方向递减。
在一种实施例中，所述不透明条纹d的条纹宽度相同。
在一种实施例中，所述不透明条纹d之间的条纹间隙，从所述全影区向所述全透区的方向递减。
在一种实施例中，所述不透明条纹d之间的条纹间隙，从所述全影区向所述全透区的方向递增。
在一种实施例中，所述不透明条纹d之间的条纹间隙相同。
在一种实施例中，不透明条纹d之间的条纹间隙相同、且条纹宽度相同。
在一种实施例中，所述不透明条纹d的条纹宽度，从所述全影区向所述全透区的方向递减，且所述不透明条纹d之间的条纹间隙，从所述全影区向所述全透区的方向递减。
在一种实施例中，所述不透明条纹d的条纹宽度，从所述全影区向所述全透区的方向递减，且所述不透明条纹d之间的条纹间隙，从所述全影区向所述全透区的方向递增。
在一种实施例中，所述不透明条纹d的条纹宽度，从所述全影区向所述全透区的方向递减，且所述不透明条纹d之间的条纹间隙相同。
在一种实施例中，所述不透明条纹d的条纹宽度相同，且所述不透明条纹d之间的条纹间隙，从所述全影区向所述全透区的方向递减。
在一种实施例中，所述不透明条纹d的条纹宽度相同，且所述不透明条纹d之间的条纹间隙，从所述全影区向所述全透区的方向递增。
在一种实施例中，所述不透明条纹d为直线、折线、曲线中的至少一种。
在一种实施例中，所述不透明条纹d为金属条纹等。
在一种实施例中，所述全影区31内不透光膜c为不透光金属膜。
在一种实施例中，所述全影区31内不透光膜c的材料，与半影区32内不透明条纹d的材料不同。
在一种实施例中，所述全影区31内不透光膜c的材料为银、铜等中的至少一种，半影区32内不透明条纹d的材料为光的不透光率为100%的铬。
在一种实施例中，所述全影区31内不透光膜c的材料，与半影区32内不透明条纹d的材料相同。
在一种实施例中，所述全影区31内不透光膜c的材料、以及半影区32内不透明条纹d的材料均为光的不透光率为100%的铬。
在一种实施例中，所述透明基板34的材料为玻璃等。
以第二膜层为透明填充层为例，对本申请做进一步的说明。
如图1中（1）所示，在下边框的透明有机填充层M1边沿的位置出现金属残留的示意图。
在图1中（1）中，透明有机填充层M1的台阶坡面角a为直角，由于金属层M2沉积时并非完全各向异性，必然会在台阶坡面角a的拐角位置形成较厚的金属层M2。当采用和显示区一样的正常剂量对金属层M2进行刻蚀时，在拐角位置会出现金属层M2刻蚀不完全的现象，残留的金属可能会导致临近电极的短路，或者成为静电放电的通道，最终会显著降低OLED显示面板的良品率。
在图1中（1）中，从下到上依次为基底M3、透明有机填充层M1、金属层M2。在第N步中，基底M3之上的透明有机填充层M1在经过光刻之后形成了直角的台阶坡面角a； 经过第N+1步的金属层M2的沉积过后，在台阶坡面角a的位置附近会形成较厚的金属层M2；随后的N+2步的金属层刻蚀工艺后，在台阶坡面角a位置会出现残留的金属层M2，残留的金属层M2可能会带来临近金属电极的短路风险，使面板电路无法使用。
如图3所示，紫外光40垂直入射到光罩30上，经过全影区31的紫外光几乎全部阻挡，对应全影区31的透明有机填充层22可以完全保留；经过全透区33的紫外光几乎全部透过，对应全透区33的透明有机填充层22可以完全去除；经过半影区32的紫外光的强度自左向右逐渐由0变为100%，对应半影区32的透明有机填充层22的厚度自左向右逐渐降为0，最终在衬底M3上形成具有缓变台阶坡面角的透明有机填充层22。
在本实施例中，光罩30如图6所示，不透明条纹b为直线。
在一种实施例中，从全影区到全透区方向，不透明条纹b的条纹宽度依次为5μm，4μm，3μm，2μm，1μm，0.5μm，0.1μm，不透明条纹之间的条纹间隙依次为5μm，4μm，3μm，2μm，1μm，0.5μm，0.1μm。
以第二膜层为平坦化层（或者像素定义层）为例，对本申请做进一步的说明。
如图1中（2）所示，在显示区的平坦化层（或者像素定义层）M1开孔位置，在绝缘层M3上沉积了第一金属层M2，在第一金属层M2上方依次有钝化层M5开孔和平坦化层（或者像素定义层）M1开孔。由于沉积第二金属层M4并非完全各向同性，必然会在平坦化层（或者像素定义层）M1开孔的侧边形成较薄的第二金属层M4，导致平坦化层（或者像素定义层）M1开孔侧边上的第二金属层M4的电阻，将显著高于平坦化层（或者像素定义层）M1的平坦区内第二金属层M4的阻值，这将会在整个显示区产生显著的压降效应。
如图4所示，紫外光40垂直入射到光罩30上，经过全影区31的紫外光几乎全部阻挡，对应全影区31的平坦化层22可以完全保留；经过全透区33的紫外光几乎全部透过，对应全透区33的平坦化层22可以完全去除；经过半影区32的紫外光的强度自全影区31向全透区33逐渐由0变为100%，对应半影区32的平坦化层22的厚度自全影区31向全透区33逐渐降为0，最终形成具有缓变台阶坡面角的平坦化层22。
在本实施例中，光罩30如图7所示，不透明条纹b为直线。
在一种实施例中，如图7所示，从全影区到全透区方向，不透明条纹b的条纹宽度依次为0.5μm，0.4μm，0.3μm，0.2μm，0.1μm，不透明条纹之间的条纹间隙依次为0.5μm，0.4μm，0.3μm，0.2μm，0.1μm。
以第二膜层22为挡墙层为例，对本申请做进一步的说明。
如图8所示，在显示区的挡墙层需要进行图案化处理形成突出的挡墙81，若挡墙81的台阶坡面角b为直角或者近似直角，则挡墙81容易坍塌，因此需要控制挡墙81的台阶坡面角b为预定值。
如图8所示，紫外光40垂直入射到光罩30上，经过全影区31的紫外光几乎全部阻挡，对应全影区31的挡墙层22可以完全保留；经过全透区33的紫外光几乎全部透过，对应全透区33的挡墙层22可以完全去除；经过半影区32的紫外光的强度自全影区31向全透区33逐渐由0变为100%，对应半影区32的挡墙层22的厚度自全影区31向全透区33逐渐降为0，最终形成具有缓变台阶坡面角的挡墙81。
在本实施例中，光罩30如图9所示，不透明条纹b为直线组成的封闭矩形等。
在一种实施例中，如图9所示，从全影区到全透区方向，不透明条纹b的条纹宽度依次为10μm， 8μm，6μm，不透明条纹之间的条纹间隙依次为10μm，8μm，6μm。
根据上述实施例可知：
本申请提供一种OLED显示面板及光罩，该OLED显示面板包括第一膜层，第二膜层，形成于所述第一膜层上，所述第二膜层的材料为有机材料，其中，所述第二膜层的台阶坡面角为锐角，且小于预设值；在本申请中，因为第二膜层的台阶坡面角为锐角，且小于预设值，这样在后续形成金属层之后，不会出现位于台阶坡面角处金属层的厚度远大于其他区域的厚度，或者位于台阶坡面角上金属层的厚度远小于其他区域的厚度等问题的出现，缓解了现有OLED显示面板存在的有机层的台阶坡面角近似直角的技术问题，提高了面板良率。
综上所述，虽然本申请已以优选实施例揭露如上，但上述优选实施例并非用以限制本申请，本领域的普通技术人员，在不脱离本申请的精神和范围内，均可作各种更动与润饰，因此本申请的保护范围以权利要求界定的范围为准。

Claims (20)

  1. 一种OLED显示面板，其包括：
    衬底；
    第一膜层，形成于所述衬底上；
    第二膜层，形成于所述第一膜层上，所述第二膜层的材料为有机材料；
    其中，所述第二膜层的台阶坡面角为锐角，且小于预设值。
  2. 根据权利要求1所述的OLED显示面板，其中，在垂直所述衬底及所述第二膜层边缘的截面上，所述第二膜层的台阶坡面角的坡面为直线、内凹弧线、折线、外凸弧线中的任一种或多种的组合。
  3. 根据权利要求1所述的OLED显示面板，其中，所述第二膜层为透明有机填充层、平坦化层、像素定义层、挡墙层中的任一种。
  4. 一种光罩，其包括透明基板和设置在透明基板上的不透光图案，用于制备如权利要求1所述的OLED显示面板中的第二膜层；所述光罩包括：
    全影区，在所述透明基板上对应所述全影区的区域覆盖有不透光膜，所述不透光膜对预设颜色的光的不透光率大于或等于第一预设阈值；
    全透区，在所述透明基板上对应所述全透区的区域未覆盖所述不透光图案，所述透明基板对所述预设颜色的光的透光率大于第二预设阈值；
    半影区，设置在所述全影区和所述全透区之间，在所述透明基板上对应所述半影区的区域按预设规律设置有多条不透明条纹，所述不透光条纹对预设颜色的光的不透光率大于或等于所述第一预设阈值。
  5. 根据权利要求4所述的光罩，其中，所述不透明条纹的条纹宽度，从所述全影区向所述全透区的方向递减。
  6. 根据权利要求4所述的光罩，其中，所述不透明条纹的条纹宽度相同。
  7. 根据权利要求4所述的光罩，其中，所述不透明条纹d之间的条纹间隙，从所述全影区向所述全透区的方向递减。
  8. 根据权利要求4所述的光罩，其中，所述不透明条纹之间的条纹间隙，从所述全影区向所述全透区的方向递增。
  9. 根据权利要求4所述的光罩，其中，所述不透明条纹之间的条纹间隙相同。
  10. 根据权利要求4所述的光罩，其中，所述不透明条纹之间的条纹间隙相同、且条纹宽度相同。
  11. 根据权利要求4所述的光罩，其中，所述不透明条纹的条纹宽度，从所述全影区向所述全透区的方向递减，且所述不透明条纹之间的条纹间隙，从所述全影区向所述全透区的方向递减。
  12. 根据权利要求4所述的光罩，其中，所述不透明条纹的条纹宽度，从所述全影区向所述全透区的方向递减，且所述不透明条纹之间的条纹间隙，从所述全影区向所述全透区的方向递增。
  13. 根据权利要求4所述的光罩，其中，所述不透明条纹的条纹宽度，从所述全影区向所述全透区的方向递减，且所述不透明条纹之间的条纹间隙相同。
  14. 根据权利要求4所述的光罩，其中，所述不透明条纹d的条纹宽度相同，且所述不透明条纹之间的条纹间隙，从所述全影区向所述全透区的方向递减。
  15. 根据权利要求4所述的光罩，其中，所述不透明条纹的条纹宽度相同，且所述不透明条纹之间的条纹间隙，从所述全影区向所述全透区的方向递增。
  16. 根据权利要求4所述的光罩，其中，所述不透明条纹为金属条纹。
  17. 根据权利要求4所述的光罩，其中，所述不透光膜的材料，与所述不透明条纹的材料相同。
  18. 根据权利要求4所述的光罩，其中，所述不透光膜的材料、以及所述不透明条纹的材料均为光的不透光率为100%的铬。
  19. 根据权利要求4所述的光罩，其中，所述不透光膜的材料为银、铜中的至少一种，所述不透明条纹的材料为光的不透光率为100%的铬。
  20. 根据权利要求4所述的光罩，其中，所述不透明条纹为直线、折线、曲线中的任一种或多种的组合。
PCT/CN2019/106892 2019-05-30 2019-09-20 Oled显示面板及光罩 Ceased WO2020237928A1 (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US16/613,425 US11374203B2 (en) 2019-05-30 2019-09-20 Mask capable of forming edge slope corner of organic film layer

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201910465027.0A CN110098246A (zh) 2019-05-30 2019-05-30 Oled显示面板及光罩
CN201910465027.0 2019-05-30

Publications (1)

Publication Number Publication Date
WO2020237928A1 true WO2020237928A1 (zh) 2020-12-03

Family

ID=67449658

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2019/106892 Ceased WO2020237928A1 (zh) 2019-05-30 2019-09-20 Oled显示面板及光罩

Country Status (3)

Country Link
US (1) US11374203B2 (zh)
CN (1) CN110098246A (zh)
WO (1) WO2020237928A1 (zh)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110098246A (zh) * 2019-05-30 2019-08-06 武汉华星光电半导体显示技术有限公司 Oled显示面板及光罩
CN113437087A (zh) 2020-03-23 2021-09-24 京东方科技集团股份有限公司 显示基板、显示基板母板及其制作方法、显示装置
CN111443565A (zh) * 2020-04-30 2020-07-24 京东方科技集团股份有限公司 掩膜板、显示基板及其制作方法、显示装置
CN115132098B (zh) * 2022-06-14 2023-12-15 Oppo广东移动通信有限公司 电子设备及其显示模组
CN119620530A (zh) * 2024-12-26 2025-03-14 合肥维信诺科技有限公司 掩膜板及掩膜装置、显示面板

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5725972A (en) * 1995-05-17 1998-03-10 Fujitsu Limited Mask with gradual increase in transmittance from opaque to transparent region
CN102736324A (zh) * 2012-06-25 2012-10-17 深圳市华星光电技术有限公司 框胶固化之光罩及液晶显示面板制作方法
CN104714363A (zh) * 2015-03-26 2015-06-17 南京中电熊猫液晶显示科技有限公司 一种灰阶掩膜版及利用其制造液晶显示器的方法
CN105511221A (zh) * 2016-01-05 2016-04-20 京东方科技集团股份有限公司 膜层及其制备方法、基板、显示装置
CN110098246A (zh) * 2019-05-30 2019-08-06 武汉华星光电半导体显示技术有限公司 Oled显示面板及光罩

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7001694B2 (en) * 2002-04-30 2006-02-21 Matsushita Electric Industrial Co., Ltd. Photomask and method for producing the same
JP4896671B2 (ja) * 2006-11-06 2012-03-14 三菱電機株式会社 ハーフトーンマスク及びこれを用いたパターン基板の製造方法
JP5377940B2 (ja) * 2007-12-03 2013-12-25 株式会社半導体エネルギー研究所 半導体装置
TWI440965B (zh) * 2011-09-05 2014-06-11 Au Optronics Corp 光罩、平面顯示面板之導線的製作方法以及平面顯示面板之導線結構
CN103034045B (zh) * 2012-12-12 2015-06-03 京东方科技集团股份有限公司 一种半色调掩模板及其制造方法
KR102502202B1 (ko) * 2015-06-29 2023-02-21 삼성디스플레이 주식회사 발광 표시 장치 및 그 제조 방법
WO2017077995A1 (ja) * 2015-11-06 2017-05-11 シャープ株式会社 表示基板、表示装置及び表示基板の製造方法
CN107908073A (zh) * 2017-12-28 2018-04-13 武汉华星光电技术有限公司 光罩、显示面板及其非显示部的制作方法
CN109136834B (zh) * 2018-09-07 2021-03-05 京东方科技集团股份有限公司 一种掩膜版、oled显示基板及其制备方法
CN208908224U (zh) * 2018-10-16 2019-05-28 合肥鑫晟光电科技有限公司 一种显示基板、显示装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5725972A (en) * 1995-05-17 1998-03-10 Fujitsu Limited Mask with gradual increase in transmittance from opaque to transparent region
CN102736324A (zh) * 2012-06-25 2012-10-17 深圳市华星光电技术有限公司 框胶固化之光罩及液晶显示面板制作方法
CN104714363A (zh) * 2015-03-26 2015-06-17 南京中电熊猫液晶显示科技有限公司 一种灰阶掩膜版及利用其制造液晶显示器的方法
CN105511221A (zh) * 2016-01-05 2016-04-20 京东方科技集团股份有限公司 膜层及其制备方法、基板、显示装置
CN110098246A (zh) * 2019-05-30 2019-08-06 武汉华星光电半导体显示技术有限公司 Oled显示面板及光罩

Also Published As

Publication number Publication date
CN110098246A (zh) 2019-08-06
US20210408490A1 (en) 2021-12-30
US11374203B2 (en) 2022-06-28

Similar Documents

Publication Publication Date Title
WO2020237928A1 (zh) Oled显示面板及光罩
KR102230485B1 (ko) 표시패널 및 이의 제조방법
US10175579B2 (en) Mask, glass substrate and manufacturing method thereof
CN205862051U (zh) 一种彩膜基板及显示装置
CN101840099B (zh) 液晶面板及其制造方法
TWI473147B (zh) 包括導電圖案之觸控面板
CN107093584B (zh) 阵列基板、显示面板、显示装置以及阵列基板的制作方法
WO2017067453A1 (zh) 曲面显示面板及其制作方法、曲面显示装置
US20020140895A1 (en) Liquid crystal display having transparent conductive film on interlayer insulating film formed by coating
WO2018157814A1 (zh) 触控屏的制作方法、触控屏和显示装置
WO2018082210A1 (zh) 一种液晶面板及其制造方法
CN101387799B (zh) 液晶显示器基板、液晶显示器及制造方法
US20140240624A1 (en) Touch panel, display device provided with touch panel, and method for manufacturing touch panel
WO2021042688A1 (zh) 显示面板及其制作方法
WO2015085772A1 (zh) 基板的制作方法
US12038660B2 (en) Array substrate and manufacturing method thereof
WO2019179339A1 (zh) 阵列基板及其制造方法、显示面板、显示装置
WO2020015083A1 (zh) 一种液晶显示面板及其制备方法
JP2000250021A (ja) カラー液晶表示パネルおよびその製造方法
WO2020042847A1 (zh) 液晶显示面板
WO2023202584A1 (zh) 显示面板、显示面板的制造方法以及显示装置
CN114137766B (zh) 液晶显示面板的制备方法
WO2020237903A1 (zh) 彩膜基板及其制作方法
US10527879B1 (en) Liquid crystal display panel and manufacturing method for the same
TW201833659A (zh) 光罩、近接曝光用光罩之製造方法及顯示裝置之製造方法

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 19930830

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 19930830

Country of ref document: EP

Kind code of ref document: A1