WO2020237903A1 - 彩膜基板及其制作方法 - Google Patents

彩膜基板及其制作方法 Download PDF

Info

Publication number
WO2020237903A1
WO2020237903A1 PCT/CN2019/105338 CN2019105338W WO2020237903A1 WO 2020237903 A1 WO2020237903 A1 WO 2020237903A1 CN 2019105338 W CN2019105338 W CN 2019105338W WO 2020237903 A1 WO2020237903 A1 WO 2020237903A1
Authority
WO
WIPO (PCT)
Prior art keywords
layer
color
color resist
black matrix
color filter
Prior art date
Application number
PCT/CN2019/105338
Other languages
English (en)
French (fr)
Inventor
潘于新
Original Assignee
Tcl华星光电技术有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tcl华星光电技术有限公司 filed Critical Tcl华星光电技术有限公司
Priority to US16/618,923 priority Critical patent/US20210325723A1/en
Publication of WO2020237903A1 publication Critical patent/WO2020237903A1/zh

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters

Definitions

  • This application relates to the field of display technology, in particular to a color filter substrate and a manufacturing method thereof.
  • a plurality of spacers are formed on the surface of the color filter substrate facing the side of the array substrate to separate the color filter substrate from the array substrate, and form a box and fill it. Liquid crystal, and then complete the production of the liquid crystal display.
  • the spacers are respectively in contact with the array substrate and the color filter substrate, and are used to support the array substrate and the color filter substrate, so that a space is formed between the array substrate and the color filter substrate, and the liquid crystal is located in the space.
  • the spacer between the array substrate and the color filter substrate will move under the action of the external force, causing the spacer to leave the preset position.
  • the light emitted by the backlight hits the liquid crystal display, since the position of the spacer is different from the preset position, stripes appear on the surface of the liquid crystal display, which affects the display effect.
  • the purpose of this application is to provide a color filter substrate with a spacer structure that is not easy to shift and fall off, so as to be stably supported on a correspondingly arranged array substrate and form a space for accommodating the liquid crystal layer.
  • the present application provides a color filter substrate for use in a liquid crystal display panel, wherein the color filter substrate includes: a transparent base layer; a black matrix layer is provided on the transparent base layer and includes A plurality of mutually spaced hollow regions; the color film layer includes a plurality of color resist blocks arranged at intervals, which respectively cover the plurality of hollow regions of the black matrix layer, and the adjacent color resist blocks have The conductive layer is arranged on the color filter layer; and the spacer layer includes a plurality of spacer elements, wherein part of each of the spacer elements is arranged in the gap of the color filter layer, and the other part Stacked on the conductive layers of the corresponding plurality of color resist blocks.
  • the present application additionally provides a method for manufacturing a color filter substrate, which is characterized by comprising: forming a black matrix layer on a transparent base layer, and forming a plurality of mutually spaced hollow regions on the black matrix layer through a photolithography process;
  • a color filter layer is formed on the transparent base layer, which includes a plurality of color resist blocks arranged at intervals, and the plurality of color resist blocks respectively cover a plurality of hollow regions of the black matrix layer, and the adjacent ones
  • a gap is formed between the color resist blocks;
  • a conductive layer is formed on the color film layer;
  • a photoresist layer is coated on the transparent base layer so that part of the photoresist layer is filled in the color film layer And the other part is covered on the conductive layer of the plurality of color resist blocks; and the photoresist layer is formed into a plurality of spacer elements through a photolithography process including exposure and development and a baking process, wherein each One part of the spacer element is filled in the gap, and
  • the present application additionally provides a color filter substrate for use in a liquid crystal display panel.
  • the color filter substrate includes: a transparent base layer; a black matrix layer, arranged on the transparent base layer, and including a plurality of photoresist bars, which are mutually
  • the color film layer includes a plurality of color resist blocks arranged at intervals, which respectively cover the plurality of hollow regions of the black matrix layer, and the adjacent color There is a gap between the blocking blocks, wherein each color blocking block includes a lip, which is stacked on the photoresist strip of the black matrix layer; a conductive layer is disposed on the color film layer; and a spacer layer, including multiple Spacer elements, wherein a part of each spacer element is arranged in the gap of the color filter layer, and the other part is stacked on the conductive layer of the corresponding plurality of color resist blocks;
  • the spacer element includes a root portion and an exposed portion, the root portion is filled in the gap, the exposed portion is exposed outside the gap, and is stacked on
  • the black matrix layer includes a plurality of photoresist strips, which are arranged in a staggered manner, and are provided with the plurality of hollow regions, wherein each of the color resists includes a lip, which It is stacked on the photoresist strip of the black matrix layer.
  • the lip of each of the color resist blocks overlaps the entire range of the photoresist strip on the cross section, which is smaller than the width of the corresponding photoresist strip on the cross section.
  • the lip of the color resist block is arranged along the periphery of the color resist block, wherein the gap between adjacent color resist blocks has a width of 5-40 microns.
  • the lip of the color resist block is made of a halftone mask, wherein the lip has a hypotenuse or a curved edge.
  • each of the spacer elements includes a root portion and an exposed portion, wherein the root portion is filled in the gap, and the exposed portion is exposed outside the gap and overlaps the corresponding On the conductive layer of the plurality of color resist blocks, and the width of the side of the exposed portion adjacent to the conductive layer is greater than the width of the side of the exposed portion away from the conductive layer.
  • the spacer element can be stably positioned in the corresponding gap on the black matrix layer through the gap between the plurality of color resist blocks, and The spacer element further increases the contact area of the spacer element corresponding to the conductive layer on the plurality of color resist blocks by overlapping the exposed portions protruding outward and the plurality of color resist blocks, thereby increasing Adhesion.
  • the overlapping arrangement of the lips of the plurality of color resist blocks and the black matrix layer can greatly increase the structural strength of the color filter substrate in the lateral direction, and further strengthen the structural strength of the black matrix layer in the longitudinal direction. .
  • the color filter substrate of the present application can effectively avoid the position shift of the spacer element caused by external force, prevent the color filter substrate from moving, and improve the display effect. Solve the problem that the traditional spacer cannot be stably supported on the array substrate, which causes poor display.
  • FIG. 1 is a schematic plan view of a color filter substrate according to an embodiment of the present application.
  • FIG. 2 is a schematic diagram of a partial cross-sectional structure of a color filter substrate according to an embodiment of the present application.
  • FIG. 3 is a schematic diagram of another part of the color filter substrate according to the embodiment of the present application.
  • 3A is a schematic cross-sectional structure diagram of the color filter substrate of FIG. 3.
  • FIG. 4 is a schematic cross-sectional structure diagram of another part of the color filter substrate according to the embodiment of the present application.
  • FIG. 5 is a schematic diagram of a cross-sectional structure of a color filter substrate according to an embodiment of the present application.
  • FIG. 6 is a schematic diagram of a cross-sectional structure of a color filter substrate according to another embodiment of the present application.
  • Fig. 7 is a flowchart of a method for manufacturing a color filter substrate according to the present application.
  • the present application is a color filter substrate of a liquid crystal display panel, wherein the liquid crystal display panel has a plurality of pixel units, and each pixel unit has the structure of a general pixel unit, that is, each pixel unit includes red sub-pixels and green sub-pixels. Sub-pixel and blue sub-pixel.
  • FIG. 1 is a schematic plan view of a color filter substrate according to an embodiment of the present application.
  • 2 to 4 are schematic diagrams of partial cross-sectional structures of a color filter substrate according to an embodiment of the present application, and can also be used as an illustration of the manufacturing process of the color filter substrate of the present application. As shown in FIG.
  • the color filter substrate 1 of the present application includes a transparent base layer 2, a black matrix layer 3, a color filter layer 4, a conductive layer 5 and a spacer layer 6.
  • the transparent base layer 2 is made of glass material and is provided corresponding to the array substrate (not shown) of the liquid crystal display panel.
  • the black matrix layer 3 of the present application is disposed on the base layer 2 and includes a plurality of hollow regions 30 spaced apart from each other.
  • the black matrix layer 3 includes a plurality of photoresist strips 31, which are made of photoresist material and are arranged alternately. That is, the plurality of photoresist strips 31 are arranged alternately in the horizontal and vertical directions, so that the plurality of hollow regions 30 are formed between the plurality of photoresist strips 31, which are arranged corresponding to the sub-pixel regions.
  • FIG. 3A is a schematic cross-sectional structure diagram of the color filter substrate of FIG. 3.
  • the color film layer 4 includes a plurality of color resist blocks 41 and 42 spaced apart from each other, which are made of light-transmitting materials and respectively cover a plurality of hollow regions 30 of the black matrix layer 3.
  • the plurality of color resist blocks 41 and 42 include red, green and blue color resist blocks, which act to make the light emitted by the backlight module (not shown) of the liquid crystal display pass through the color film Layer 4 presents the corresponding color.
  • each of the color resist blocks 41 and 42 is larger than the area of the corresponding hollow region 30, so that a gap 40 is formed between the adjacent color resist blocks 41 and 42 (as shown in FIG. 3A). Show). That is, each of the color resist blocks 41 and the adjacent color resist blocks 42 have the gap 40 on all four sides.
  • each of the color resist blocks 41 and 42 includes a lip 43 which is superimposed on the photoresist strip 31 of the black matrix layer 3. Specifically, the lip portion 43 of each color resist block 41 overlaps the entire range of the photoresist strip 31 on the cross section, which is smaller than the width of the corresponding photoresist strip 31 on the cross section.
  • the entire range of the color resist block 41 and the adjacent color resist block 42 covering the same photoresist strip 31 (that is, the lip portion 43) is smaller than the width of the photoresist strip 31 on the cross section.
  • the lips 43 of the color resist blocks 41 and 42 are arranged along the circumference of the color resist blocks 41 and 42, respectively, and the gap 40 between adjacent color resist blocks 41 and 42 has 5 Width of micron-40 microns.
  • a conductive layer 5 is further provided on the color filter layer 4, which is made of indium tin oxide, used as a metal electrode, and applied to the liquid crystal particles by voltage.
  • the color filter substrate 1 of the present application is further coated with an optical layer on the transparent base layer 2 to form the spacer layer 6 (as shown in FIG. 4), which is formed by a photolithography process and a baking process.
  • the spacer element 61 (shown in Figure 5). A part of each spacer element 61 is arranged in the gap 40 of the color filter layer 4, and the other part is laminated on the conductive layer 5 of the corresponding plurality of color resist blocks 41 and 42.
  • each of the spacer elements 61 includes a root portion 611 and an exposed portion 612, wherein the root portion 611 is filled in the gap 40, and the exposed portion 612 is exposed outside the gap 40 and overlaps It is arranged on the conductive layer 5 of the corresponding plurality of the color resist blocks 41 and 42.
  • the width of the side of the exposed portion 612 adjacent to the conductive layer 5 is greater than the width of the side of the exposed portion 612 away from the conductive layer 5. That is, the radial width of the exposed portion 612 of the spacer element 61 gradually extends toward the outside of the root portion 611, so that the exposed portion 612 has an approximately cone-shaped configuration.
  • FIG. 6 is a schematic diagram of a cross-sectional structure of a color filter substrate according to another embodiment of the present application.
  • FIG. 6 shows another structure of the color film layer 4 and the spacer layer 5 of this application.
  • the lips 43 of the color resist blocks 41 and 42 are made by a half-tone mask to control the thickness of the overlap between the color resist blocks 41 and 42 and the black matrix layer 3. This is the thickness of the lip 43.
  • the lip portion 43 may have a hypotenuse 431 or an arc-shaped side, wherein the root portion 611 of the spacer element 61 is arranged corresponding to the configuration of the lip portion 43 and fills the gap 40 Inside. With the aforementioned structure, the contact area between the root portion 611 and the color resist blocks 41 and 42 can be increased, thereby stabilizing the spacer element 61 in the gap 40.
  • the color filter substrate 1 of the present application passes through the gap 40 between the plurality of color resist blocks 41 and 42, so that the spacer element 61 is firmly positioned in the corresponding gap on the black matrix layer 3. 40, and supported on the corresponding array substrate.
  • the spacer element 61 is further stacked on the plurality of color resist blocks 41 and 42 through its outwardly protruding edges, and the spacer element 61 is further increased to correspond to the plurality of color resist blocks 41 and 42
  • the contact area of the conductive layer 5 on 42 improves the adhesion and avoids the movement of the spacer element 61 caused by external force.
  • Fig. 7 is a flowchart of a method for manufacturing a color filter substrate according to the present application. This application additionally provides a method for manufacturing a color filter substrate, including steps S10-S60, which are described as follows:
  • Step S10 forming a black matrix layer on the transparent base layer, and forming a plurality of mutually spaced hollow regions in the black matrix layer through a photolithography process.
  • Step S20 forming a color filter layer on the transparent base layer, which includes a plurality of color resist blocks arranged at intervals, and the plurality of color resist blocks respectively cover a plurality of hollow regions of the black matrix layer, wherein A gap is formed between the adjacent color resist blocks.
  • Step S30 forming a conductive layer on the color filter layer.
  • Step S40 Coating a photoresist layer on the transparent base layer, so that part of the photoresist layer is filled in the gaps of the color film layer, and the other part covers the conductive layers of the plurality of color resist blocks on.
  • Step S50 The photoresist layer is formed into a plurality of spacer elements through a photolithography process including exposure and development and a baking process, wherein a part of each spacer element is filled in the gap, and the other A part is stacked on the conductive layers of the corresponding plurality of color resist blocks.
  • the spacer element can be stably positioned in the corresponding gap on the black matrix layer through the gap between the plurality of color resist blocks, and The spacer element further increases the contact area of the spacer element corresponding to the conductive layer on the plurality of color resist blocks by overlapping the exposed portions protruding outward and the plurality of color resist blocks, thereby increasing Adhesion.
  • the overlapping arrangement of the lips of the plurality of color resist blocks and the black matrix layer can greatly increase the structural strength of the color filter substrate in the lateral direction, and further strengthen the structural strength of the black matrix layer in the longitudinal direction. .
  • the color filter substrate of the present application can effectively avoid the position shift of the spacer element caused by external force, prevent the color filter substrate from moving, and improve the display effect. Solve the problem that the traditional spacer cannot be stably supported on the array substrate, which causes poor display.

Abstract

一种用于液晶显示面板的彩膜基板（1），包括透明基体层（2）、黑矩阵层（3）、彩膜层（4）、导电层（5）及隔垫层（6）。黑矩阵层（3）设于透明基体层（2）上，并包括多个相互间隔的中空区（30）。彩膜层（4）包括多个相互间隔设置的色阻块（41），其分别覆盖于黑矩阵层（3）的多个中空区（30），且相邻的色阻块（41）之间具有间隙（40）。导电层（5）设于彩膜层（4）上。隔垫层（6）包括多个隔垫元件（61）。每一隔垫元件（61）的部分设于彩膜层（4）的间隙内，而另一部分叠设于对应的多个色阻块（41）的导电层（5）上。

Description

彩膜基板及其制作方法 技术领域
本申请涉及显示技术领域，特别是涉及一种彩膜基板及其制作方法。
 背景技术
在液晶显示面板的生产工艺中，彩膜基板面向阵列基板一侧的表面形成有多个隔垫物(post spacer, PS)，用以将彩膜基板与阵列基板隔开，进行成盒并填充液晶，进而完成该液晶显示器的制作。
该些隔垫物分别与该阵列基板和该彩膜基板相接触，用于支撑该阵列基板和该彩膜基板，使得该阵列基板和该彩膜基板之间形成空间，液晶位于该空间内。然而，传统液晶显示面板的表面受到外力挤压时，位于该阵列基板和该彩膜基板之间的隔垫物会在外力的作用下移动，使得隔垫物脱离预设位置。当背光源发出的光打在液晶显示器上时，由于隔垫物的位置与预设位置不同，因此，液晶显示器的表面会出现条纹，影响显示效果。
 技术问题
本申请的目的在于提供一种彩膜基板，其具有不易偏移及脱落的隔垫结构，用以稳固地支撑于相应设置的阵列基板上，并形成容置液晶层的空间。
 技术解决方案
为实现上述目的，本申请提供一种彩膜基板，用于液晶显示面板，其特征在于，所述彩膜基板包括：透明基体层；黑矩阵层，设于所述透明基体层上，并包括多个相互间隔的中空区；彩膜层，包括多个相互间隔设置的色阻块，其分别覆盖于所述黑矩阵层的多个中空区，且相邻的所述色阻块之间具有间隙；导电层，设于所述彩膜层上；以及隔垫层，包括多个隔垫元件，其中每一所述隔垫元件的部分设于所述彩膜层的间隙内，而另一部分叠设于对应的多个所述色阻块的导电层上。
本申请另外提供一种彩膜基板的制作方法，其特征在于，包括：在透明基体层上形成黑矩阵层，并通过光刻工艺在所述黑矩阵层形成多个相互间隔的中空区；在所述透明基体层上形成彩膜层，其包括多个相互间隔设置的色阻块，且所述多个色阻块分别覆盖于所述黑矩阵层的多个中空区，其中相邻的所述色阻块之间形成有间隙；在所述彩膜层上形成导电层；在所述透明基体层上涂布光阻层，使所述光阻层的部分填充于所述彩膜层的间隙内，而另一部分覆盖于所述多个色阻块的导电层上；以及通过包括曝光及显影的光刻工艺及烘烤制程，使所述光阻层形成多个隔垫元件，其中每一所述隔垫元件的部分填满于所述间隙内，而另一部分叠设于对应的多个所述色阻块的导电层上。
本申请另外提供一种彩膜基板，用于液晶显示面板，所述彩膜基板包括：透明基体层；黑矩阵层，设于所述透明基体层上，并包括多个光阻条，其相互交错设置，且其内设有多个中空区；彩膜层，包括多个相互间隔设置的色阻块，其分别覆盖于所述黑矩阵层的多个中空区，且相邻的所述色阻块之间具有间隙，其中每一色阻块包括唇部，其叠设于所述黑矩阵层的光阻条上；导电层，设于所述彩膜层上；以及隔垫层，包括多个隔垫元件，其中每一所述隔垫元件的部分设于所述彩膜层的间隙内，而另一部分叠设于对应的多个所述色阻块的导电层上；其中每一所述隔垫元件包括根部及外露部，所述根部填满于所述间隙内，所述外露部显露于所述间隙外，并叠设于对应的多个所述色阻块的导电层上，且所述外露部相邻于所述导电层的一面的宽度，大于所述外露部远离所述导电层的一面的宽度。根据本申请的一实施例，所述黑矩阵层包括多个光阻条，其相互交错设置，且其内设有所述多个中空区，其中每一所述色阻块包括唇部，其叠设于所述黑矩阵层的光阻条上。
根据本申请的另一实施例，每一所述色阻块的唇部在断面上叠设于所述光阻条的的全部范围，小于所对应的光阻条在断面上的宽度。
根据本申请的另一实施例，所述色阻块的唇部沿所述色阻块的周围设置，其中相邻所述色阻块之间的所述间隙具有5微米-40微米的宽度。
根据本申请的另一实施例，所述色阻块的唇部为半色调光罩所制，其中所述唇部具有斜边或弧形边。
根据本申请的另一实施例，每一所述隔垫元件包括根部及外露部，其中所述根部填满于所述间隙内，所述外露部显露于所述间隙外，并叠设于对应的多个所述色阻块的导电层上，且所述外露部相邻于所述导电层的一面的宽度，大于所述外露部远离所述导电层的一面的宽度。
 有益效果
本申请的彩膜基板及彩膜基板的制作方法，通过所述多个色阻块之间的间隙，使所述隔垫元件可稳固地定位于所述黑矩阵层上所对应的间隙，且所述隔垫元件更通过向外突出的外露部与所述多个色阻块的交叠，进一步增加所述隔垫元件相应于所述多个色阻块上的导电层的接触面积，提高附着力。此外，所述多个色阻块的唇部和所述黑矩阵层的交叠设置，可大幅提升所述彩膜基板在横向的结构强度，并进一步强化所述黑矩阵层在纵向的结构强度。因此，通过所述隔垫元件及所述多个色阻块的结构，本申请的彩膜基板可以有效地避免外力造成隔垫元件的位置偏移，防止彩膜基板移动，进而提高显示效果，解决传统隔垫物无法稳固支撑于阵列基板上，而造成显示不良的问题。
 附图说明
图1为根据本申请的一实施例的彩膜基板的平面示意图。
图2为根据本申请所述实施例的彩膜基板的部分剖面结构示意图。
图3为根据本申请所述实施例的彩膜基板的另一部分的结构示意图。
图3A为图3的彩膜基板的剖面结构示意图。
图4为根据本申请所述实施例的彩膜基板的另一部分的剖面结构示意图。
图5为根据本申请所述实施例的彩膜基板的剖面结构示意图。
图6为根据本申请另一实施例的彩膜基板的剖面结构示意图。
图7为根据本申请的彩膜基板的制作方法的流程图。
 本发明的最佳实施方式
以下各实施例的说明是参考附加的图式，用以例示本申请可用以实施的特定实施例。本申请所提到的方向用语，例如「上」、「下」、「前」、「后」、「左」、「右」、「内」、「外」、「侧面」等，仅是参考附加图式的方向。因此，使用的方向用语是用以说明及理解本申请，而非用以限制本申请。
本申请为一种液晶显示面板的彩膜基板，其中所述液晶显示面板具有多个像素单元，且每一像素单元具有一般像素单元的结构，亦即，每一像素单元包括红色子像素、绿色子像素及蓝色子像素。图1为根据本申请的一实施例的彩膜基板的平面示意图。图2至图4分别为根据本申请一实施例的彩膜基板的部分剖面结构示意图，亦可作为本申请彩膜基板的制作流程说明。如图1所示，本申请的彩膜基板1包括透明基体层2、黑矩阵层3、彩膜层4、导电层5及隔垫层6。所述透明基体层2为玻璃材质所制，并对应所述液晶显示面板的阵列基板(未图示)设置。
请参阅图2配合图1观之。本申请的黑矩阵层3设于所述基体层2上，并包括多个相互间隔的中空区30。具体而言，所述黑矩阵层3包括多个光阻条31，其为光阻材料所制，且相互交错设置。亦即，所述多个光阻条31以横向及纵向交错设置，使所述多个光阻条31之间形成有所述多个中空区30，其对应所述子像素区设置。
请参阅图3及图3A，其中图3A为图3的彩膜基板的剖面结构示意图。如图3所示，所述彩膜层4包括多个相互间隔设置的色阻块41及42，其为透光材料所制，并分别覆盖于所述黑矩阵层3的多个中空区30，其中所述多个色阻块41及42包括红色、绿色及蓝色的色阻块，其作用在使液晶显示器的背光模组(未图示)发出的光，能透过所述彩膜层4呈现对应的颜色。特别说明的是，每一所述色阻块41及42的面积大于相应的所述中空区30的面积，使相邻的所述色阻块41及42之间形成间隙40(如图3A所示)。亦即，每一所述色阻块41的四周围与相邻色阻块42的周围都具有所述间隙40。如图3A所示，每一所述色阻块41及42包括唇部43，其叠设于所述黑矩阵层3的光阻条31上。具体而言，每一所述色阻块41的唇部43在断面上叠设于所述光阻条31的的全部范围，小于所对应的光阻条31在断面上的宽度。亦即，所述色阻块41及相邻的色阻块42覆盖在同一光阻条31上的全部范围(即所述唇部43)，小于所述光阻条31在断面上的宽度。于此实施例中，所述色阻块41及42的唇部43分别沿所述色阻块41及42的周围设置，其中相邻所述色阻块41及42之间的间隙40具有5微米-40微米的宽度。
续请参阅图3A。在形成所述彩膜层4后，进一步在所述彩膜层4上设置导电层5，其由氧化铟锡所制，作为金属电极使用，并通过电压施加于液晶粒子。
请参阅图4及图5。本申请的彩膜基板1更在所述透明基体层2涂布光层层，用以形成所述隔垫层6(如图4所示)，其通过光刻工艺及烘烤制程形成多个隔垫元件61(如图5所示)。每一所述隔垫元件61的部分设于所述彩膜层4的间隙40内，而另一部分叠设于对应的多个所述色阻块41及42的导电层5上。具体而言，每一所述隔垫元61包括根部611及外露部612，其中所述根部611填满于所述间隙40内，而所述外露部612显露于所述间隙40外，并叠设于对应的多个所述色阻块41及42的导电层5上。于此实施例中，所述外露部612相邻于所述导电层5的一面的宽度，大于所述外露部612远离所述导电层5的一面的宽度。亦即，所述隔垫元件61的外露部612的径向宽度向所述根部611外逐渐延伸，使所述外露部612具有近似锥状构型。
图6为根据本申请另一实施例的彩膜基板的剖面结构示意图。图6所述为本申请的彩膜层4及隔垫层5的另一种结构。于此实施例中，所述色阻块41及42的唇部43通过半色调光罩所制，用以控制所述色阻块41及42及所述黑矩阵层3交叠处的厚度，其亦即所述唇部43的厚度。于此实施例中，所述唇部43可具有斜边431或弧形边，其中所述隔垫元件61的根部611对应所述唇部43的构型设置，并填满于所述间隙40内。藉由前述构造，可增加所述根部611与所述色阻块41及42的接触面积，从而稳固述隔垫元件61于所述间隙40。
如前所述，本申请彩膜基板1通过所述多个色阻块41及42之间的间隙40，使所述隔垫元件61稳固地定位于所述黑矩阵层3上所对应的间隙40，并支撑于相应的阵列基板。此外，所述隔垫元件61更通过其向外突出的边缘叠设于所述多个色阻块41及42上，进一步增加所述隔垫元件61相应于所述多个色阻块41及42上的导电层5的接触面积，提高附着力，避免外力造成所述隔垫元件61的移动。
图7为根据本申请的彩膜基板的制作方法的流程图。本申请另外提供一种彩膜基板的制作方法，包括步骤S10-S60，其说明如下：
步骤S10：在透明基体层上形成黑矩阵层，并通过光刻工艺在所述黑矩阵层形成多个相互间隔的中空区。
步骤S20：在所述透明基体层上形成彩膜层，其包括多个相互间隔设置的色阻块，且所述多个色阻块分别覆盖于所述黑矩阵层的多个中空区，其中相邻的所述色阻块之间形成有间隙。
步骤S30：在所述彩膜层上形成导电层。
步骤S40：在所述透明基体层上涂布光阻层，使所述光阻层的部分填充于所述彩膜层的间隙内，而另一部分覆盖于所述多个色阻块的导电层上。
步骤S50：通过包括曝光及显影的光刻工艺及烘烤制程，使所述光阻层形成多个隔垫元件，其中每一所述隔垫元件的部分填满于所述间隙内，而另一部分叠设于对应的多个所述色阻块的导电层上。
在本申请所述彩膜基板的制作方法中，有关所述彩膜基板的详细构造元件与前述实施例所述的彩膜基板相同，于此不再复述。
本申请的彩膜基板及彩膜基板的制作方法，通过所述多个色阻块之间的间隙，使所述隔垫元件可稳固地定位于所述黑矩阵层上所对应的间隙，且所述隔垫元件更通过向外突出的外露部与所述多个色阻块的交叠，进一步增加所述隔垫元件相应于所述多个色阻块上的导电层的接触面积，提高附着力。此外，所述多个色阻块的唇部和所述黑矩阵层的交叠设置，可大幅提升所述彩膜基板在横向的结构强度，并进一步强化所述黑矩阵层在纵向的结构强度。因此，通过所述隔垫元件及所述多个色阻块的结构，本申请的彩膜基板可以有效地避免外力造成隔垫元件的位置偏移，防止彩膜基板移动，进而提高显示效果，解决传统隔垫物无法稳固支撑于阵列基板上，而造成显示不良的问题。
综上所述，虽然本申请已以优选实施例揭露如上，但上述优选实施例并非用以限制本申请，本领域的普通技术人员，在不脱离本申请的范围内，均可作各种更动与润饰，因此本申请的保护范围以权利要求界定的范围为准。

Claims (14)

  1. 一种彩膜基板，用于液晶显示面板，所述彩膜基板包括：
    透明基体层；
    黑矩阵层，设于所述透明基体层上，并包括多个相互间隔的中空区；
    彩膜层，包括多个相互间隔设置的色阻块，其分别覆盖于所述黑矩阵层的多个中空区，且相邻的所述色阻块之间具有间隙；
    导电层，设于所述彩膜层上；以及
    隔垫层，包括多个隔垫元件，其中每一所述隔垫元件的部分设于所述彩膜层的间隙内，而另一部分叠设于对应的多个所述色阻块的导电层上。
  2. 如权利要求1的彩膜基板，其中所述黑矩阵层包括多个光阻条，其相互交错设置，且其内设有所述多个中空区，其中每一色阻块包括唇部，其叠设于所述黑矩阵层的光阻条上。
  3. 如权利要求2的彩膜基板，其中每一所述色阻块的唇部在断面上叠设于所述光阻条的的全部范围，小于所对应的光阻条在断面上的宽度。
  4. 如权利要求2的彩膜基板，其中所述色阻块的唇部沿所述色阻块的周围设置，其中相邻所述色阻块之间的所述间隙具有5微米-40微米的宽度。
  5. 如权利要求2的彩膜基板，其中所述色阻块的唇部为半色调光罩所制，其中所述唇部具有斜边或弧形边。
  6. 如权利要求1的彩膜基板，其中每一所述隔垫元件包括根部及外露部，其中所述根部填满于所述间隙内，所述外露部显露于所述间隙外，并叠设于对应的多个所述色阻块的导电层上，且所述外露部相邻于所述导电层的一面的宽度，大于所述外露部远离所述导电层的一面的宽度。
  7. 一种彩膜基板的制作方法，包括：
    在透明基体层上形成黑矩阵层，并通过光刻工艺在所述黑矩阵层形成多个相互间隔的中空区；
    在所述透明基体层上形成彩膜层，其包括多个相互间隔设置的色阻块，且所述多个色阻块分别覆盖于所述黑矩阵层的多个中空区，其中相邻的所述色阻块之间形成有间隙；
    在所述彩膜层上形成导电层；
    在所述透明基体层上涂布光阻层，使所述光阻层的部分填充于所述彩膜层的间隙内，而另一部分覆盖于所述多个色阻块的导电层上；以及
    通过包括曝光及显影的光刻工艺及烘烤制程，使所述光阻层形成多个隔垫元件，其中每一所述隔垫元件的部分填满于所述间隙内，而另一部分叠设于对应的多个所述色阻块的导电层上。
  8. 如权利要求7的彩膜基板的制作方法，其中所述黑矩阵层包括多个光阻条，其相互交错设置，且其内设有所述多个中空区，其中每一色阻块包括唇部，其叠设于所述黑矩阵层的光阻条上。
  9. 如权利要求8的彩膜基板的制作方法，其中每一所述色阻块的唇部在断面上叠设于所述光阻条的的全部范围，小于所对应的光阻条在断面上的宽度。
  10. 如权利要求8的彩膜基板的制作方法，其中所述色阻块的唇部沿所述色阻块的周围设置，其中相邻所述色阻块之间的所述间隙具有5微米-40微米的宽度。
  11. 一种彩膜基板，用于液晶显示面板，所述彩膜基板包括：
    透明基体层；
    黑矩阵层，设于所述透明基体层上，并包括多个光阻条，其相互交错设置，且其内设有多个中空区；
    彩膜层，包括多个相互间隔设置的色阻块，其分别覆盖于所述黑矩阵层的多个中空区，且相邻的所述色阻块之间具有间隙，其中每一色阻块包括唇部，其叠设于所述黑矩阵层的光阻条上；
    导电层，设于所述彩膜层上；以及
    隔垫层，包括多个隔垫元件，其中每一所述隔垫元件的部分设于所述彩膜层的间隙内，而另一部分叠设于对应的多个所述色阻块的导电层上；
    其中每一所述隔垫元件包括根部及外露部，所述根部填满于所述间隙内，所述外露部显露于所述间隙外，并叠设于对应的多个所述色阻块的导电层上，且所述外露部相邻于所述导电层的一面的宽度，大于所述外露部远离所述导电层的一面的宽度。
  12. 如权利要求11的彩膜基板，其中每一所述色阻块的唇部在断面上叠设于所述光阻条的的全部范围，小于所对应的光阻条在断面上的宽度。
  13. 如权利要求11的彩膜基板，其中所述色阻块的唇部为半色调光罩所制，其中所述唇部具有斜边或弧形边。
  14. 如权利要求11的彩膜基板，其中所述色阻块的唇部沿所述色阻块的周围设置，其中相邻所述色阻块之间的所述间隙具有5微米-40微米的宽度。
PCT/CN2019/105338 2019-05-24 2019-09-11 彩膜基板及其制作方法 WO2020237903A1 (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US16/618,923 US20210325723A1 (en) 2019-05-24 2019-09-11 Color filter substrate and fabrication method thereof

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201910440219.6A CN110221474A (zh) 2019-05-24 2019-05-24 彩膜基板及其制作方法
CN201910440219.6 2019-05-24

Publications (1)

Publication Number Publication Date
WO2020237903A1 true WO2020237903A1 (zh) 2020-12-03

Family

ID=67817911

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2019/105338 WO2020237903A1 (zh) 2019-05-24 2019-09-11 彩膜基板及其制作方法

Country Status (3)

Country Link
US (1) US20210325723A1 (zh)
CN (1) CN110221474A (zh)
WO (1) WO2020237903A1 (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110221474A (zh) * 2019-05-24 2019-09-10 深圳市华星光电技术有限公司 彩膜基板及其制作方法
CN114690471A (zh) * 2020-12-28 2022-07-01 上海仪电显示材料有限公司 彩色滤光基板及其制作方法、液晶显示装置
CN114509889A (zh) * 2022-02-08 2022-05-17 武汉华星光电技术有限公司 彩膜基板及其制作方法、显示面板

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010101935A (ja) * 2008-10-21 2010-05-06 Toppan Printing Co Ltd カラーフィルタ及び液晶表示装置
US20110080542A1 (en) * 2009-10-05 2011-04-07 Au Optronics Corporation Active device array substrate and display panel
JP2011128208A (ja) * 2009-12-15 2011-06-30 Toppan Printing Co Ltd カラーフィルタ基板及びその製造方法
CN105739185A (zh) * 2016-05-10 2016-07-06 深圳市华星光电技术有限公司 液晶面板的制作方法和液晶面板
CN106324919A (zh) * 2016-11-22 2017-01-11 京东方科技集团股份有限公司 一种彩膜基板及其制作方法、显示面板、显示装置
US9568775B2 (en) * 2012-07-23 2017-02-14 Samsung Display Co., Ltd. Display device and method of manufacturing the same
CN110221474A (zh) * 2019-05-24 2019-09-10 深圳市华星光电技术有限公司 彩膜基板及其制作方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5915188B2 (ja) * 2012-01-10 2016-05-11 凸版印刷株式会社 カラーフィルタ
CN103941466A (zh) * 2014-03-06 2014-07-23 京东方科技集团股份有限公司 彩膜基板及其制作方法、显示装置
CN105116601B (zh) * 2015-09-16 2018-12-11 武汉华星光电技术有限公司 彩膜基板及其制作方法
CN107884981B (zh) * 2017-12-26 2020-06-23 深圳市华星光电技术有限公司 彩膜基板及其制作方法、液晶面板

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010101935A (ja) * 2008-10-21 2010-05-06 Toppan Printing Co Ltd カラーフィルタ及び液晶表示装置
US20110080542A1 (en) * 2009-10-05 2011-04-07 Au Optronics Corporation Active device array substrate and display panel
JP2011128208A (ja) * 2009-12-15 2011-06-30 Toppan Printing Co Ltd カラーフィルタ基板及びその製造方法
US9568775B2 (en) * 2012-07-23 2017-02-14 Samsung Display Co., Ltd. Display device and method of manufacturing the same
CN105739185A (zh) * 2016-05-10 2016-07-06 深圳市华星光电技术有限公司 液晶面板的制作方法和液晶面板
CN106324919A (zh) * 2016-11-22 2017-01-11 京东方科技集团股份有限公司 一种彩膜基板及其制作方法、显示面板、显示装置
CN110221474A (zh) * 2019-05-24 2019-09-10 深圳市华星光电技术有限公司 彩膜基板及其制作方法

Also Published As

Publication number Publication date
US20210325723A1 (en) 2021-10-21
CN110221474A (zh) 2019-09-10

Similar Documents

Publication Publication Date Title
KR102230485B1 (ko) 표시패널 및 이의 제조방법
US20160370633A1 (en) Curved display device
US8547506B2 (en) Color filter substrate with black matrix on undercut groove and fabricating method thereof
TWI556045B (zh) 顯示面板
JP5151903B2 (ja) カラーフィルタ基板及びその製造方法並びに液晶表示装置
WO2020237903A1 (zh) 彩膜基板及其制作方法
US20220011629A1 (en) Color filter substrate, manufacturing method thereof, and display device
US20090167996A1 (en) Color filter substrate and liquid crystal display unit
KR20140139174A (ko) 표시 기판 및 이의 제조 방법
WO2021007951A1 (zh) 一种基板及液晶显示面板
WO2017193633A1 (zh) 显示基板及其制备方法、显示装置
WO2019085224A1 (zh) 阵列基板及显示面板
US9116297B2 (en) Color filter substrate, manufacturing method thereof and liquid crystal panel
CN110596936A (zh) 一种彩膜基板及其制造方法
US10317738B2 (en) Array substrate and a display panel
CN109814298B (zh) 液晶显示面板及其制造方法、液晶显示装置
TW201905551A (zh) 顯示裝置
WO2020206779A1 (zh) 彩膜基板以及显示面板
WO2014176904A1 (zh) 显示装置、彩膜基板及其制作方法
CN110632801A (zh) 显示面板及其制造方法
JP2015118150A (ja) 液晶表示装置
US10747046B2 (en) Display substrate, display panel and display apparatus having the same, and fabricating method thereof
JP2021002033A (ja) カラーフィルタ基板、液晶表示装置、及び、カラーフィルタ基板の製造方法
US10203561B2 (en) Display substrate, liquid crystal panel, display device and manufacturing method of display substrate
CN110928027A (zh) 彩膜基板及其制作方法

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 19930196

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 19930196

Country of ref document: EP

Kind code of ref document: A1