WO2020233481A1 - 疏水性的低介电常数膜及其制备方法 - Google Patents
疏水性的低介电常数膜及其制备方法 Download PDFInfo
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- WO2020233481A1 WO2020233481A1 PCT/CN2020/090120 CN2020090120W WO2020233481A1 WO 2020233481 A1 WO2020233481 A1 WO 2020233481A1 CN 2020090120 W CN2020090120 W CN 2020090120W WO 2020233481 A1 WO2020233481 A1 WO 2020233481A1
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- dielectric constant
- constant film
- hydrophobic low
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- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
- C23C16/45525—Atomic layer deposition [ALD]
- C23C16/45527—Atomic layer deposition [ALD] characterized by the ALD cycle, e.g. different flows or temperatures during half-reactions, unusual pulsing sequence, use of precursor mixtures or auxiliary reactants or activations
- C23C16/45534—Use of auxiliary reactants other than used for contributing to the composition of the main film, e.g. catalysts, activators or scavengers
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
- H01L21/02123—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon
- H01L21/02126—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon the material containing Si, O, and at least one of H, N, C, F, or other non-metal elements, e.g. SiOC, SiOC:H or SiONC
- H01L21/02131—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon the material containing Si, O, and at least one of H, N, C, F, or other non-metal elements, e.g. SiOC, SiOC:H or SiONC the material being halogen doped silicon oxides, e.g. FSG
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- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02203—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being porous
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02205—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being characterised by the precursor material for deposition
- H01L21/02208—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being characterised by the precursor material for deposition the precursor containing a compound comprising Si
- H01L21/02214—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being characterised by the precursor material for deposition the precursor containing a compound comprising Si the compound comprising silicon and oxygen
- H01L21/02216—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being characterised by the precursor material for deposition the precursor containing a compound comprising Si the compound comprising silicon and oxygen the compound being a molecule comprising at least one silicon-oxygen bond and the compound having hydrogen or an organic group attached to the silicon or oxygen, e.g. a siloxane
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
- H01L21/4814—Conductive parts
- H01L21/4846—Leads on or in insulating or insulated substrates, e.g. metallisation
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- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
- H01L23/532—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body characterised by the materials
- H01L23/5329—Insulating materials
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- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/0277—Bendability or stretchability details
- H05K1/028—Bending or folding regions of flexible printed circuits
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- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0091—Apparatus for coating printed circuits using liquid non-metallic coating compositions
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- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/14—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using spraying techniques to apply the conductive material, e.g. vapour evaporation
- H05K3/146—By vapour deposition
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- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D2401/00—Form of the coating product, e.g. solution, water dispersion, powders or the like
- B05D2401/30—Form of the coating product, e.g. solution, water dispersion, powders or the like the coating being applied in other forms than involving eliminable solvent, diluent or dispersant
- B05D2401/33—Form of the coating product, e.g. solution, water dispersion, powders or the like the coating being applied in other forms than involving eliminable solvent, diluent or dispersant applied as vapours polymerising in situ
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D2506/00—Halogenated polymers
- B05D2506/10—Fluorinated polymers
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D2518/00—Other type of polymers
- B05D2518/10—Silicon-containing polymers
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/04—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases
- B05D3/0486—Operating the coating or treatment in a controlled atmosphere
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/04—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases
- B05D3/0493—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases using vacuum
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
- B05D5/12—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain a coating with specific electrical properties
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- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/01—Dielectrics
- H05K2201/0137—Materials
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- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/03—Metal processing
- H05K2203/0392—Pretreatment of metal, e.g. before finish plating, etching
Definitions
- the present invention relates to the field of ultra-large-scale integrated circuit manufacturing. Specifically, it relates to a hydrophobic low-dielectric constant film and a preparation method thereof.
- the Clausius-Mossotti equation provides two directions for reducing the dielectric constant of materials: one is to reduce the polarity of the material itself, including electronic polarization, ion polarization, molecular dipolarization, and space charge polarization; the other is to reduce Material molecular density.
- the latter method is mainly to produce porous materials by introducing nano- and micro-sized pores into the material.
- this method often leads to a substantial decrease in the thermal conductivity and mechanical properties of the material. What is more serious is that due to the capillary effect, etc. Porous materials are easier to absorb water, making them unsuitable for use in the dielectric layer of electronic components.
- fluorocarbon materials have excellent heat resistance, chemical resistance and weather resistance.
- the bond energy of C-F bond (440kJ/mol) is higher than that of C-H, C-O, and C-C, and C-F bond has a smaller polarizability than C-H bond. This is mainly due to the small radius of the F atom and the concentration of negative charges, which enables it to tightly confine the electron cloud to a small area centered on the nucleus, resulting in a low polarization rate.
- the introduction of F atoms can also increase the free volume of the material.
- the unit constituting the fluorocarbon material has a symmetrical structure
- the polarities of the C-F bonds distributed on both sides of the C-C main chain are cancelled out, making the whole molecule in a non-polar state, which can further reduce the dielectric constant of the material.
- such materials often have the disadvantage of difficult processing.
- the dielectric constant of PTFE can be as low as about 2.1, and its water absorption and chemical stability are very good.
- PECVD plasma-enhanced chemical vapor deposition
- one or more organosilicon compounds are introduced into a plasma-enhanced chemical vapor deposition (PECVD) technology.
- PECVD plasma-enhanced chemical vapor deposition
- a porogen is introduced into the chamber, and the one or more organosilicon compounds react with the porogen under constant radio frequency power conditions to deposit a low-k film on one of the chambers.
- the low-k film is further subjected to high-temperature annealing post-treatment to substantially remove the porogen on the low-k film.
- polyarylene sulfide and a copolymer of tetrafluoroethylene and perfluoroethylenically unsaturated compound are used as raw materials, and after mixing and kneading, they are extruded containing fluororesin with a dielectric constant of 3.0. ⁇ 4.0 resin combined insulation layer.
- the low dielectric constant insulating layer prepared by this method is above the micron level, and is not suitable for application in large-scale integrated circuits.
- An advantage of the present invention is to provide a hydrophobic low-dielectric constant film and a preparation method thereof, which adopts a plasma enhanced chemical vapor deposition (PECVD) method and uses materials with low polarizability as reactants to form a non-porous structure
- the nano film has a low dielectric constant and has good hydrophobicity.
- An advantage of the present invention is to provide a hydrophobic low-dielectric constant film and a preparation method thereof.
- the fluoropolymer or fluorosilicon polymer with low surface energy has good hydrophobic properties.
- the static contact of water on its surface is The angle is large, suitable for use in electronic devices.
- One advantage of the present invention is to provide a hydrophobic low-dielectric constant film and a preparation method thereof.
- the units constituting the fluorocarbon material have an asymmetric structure, which is easy to process and easy to reshape.
- One advantage of the present invention is to provide a hydrophobic low-dielectric constant mode and a preparation method thereof, which adopts a PECVD process to form a nano-scale film with a small thickness and is suitable for application in large-scale integrated circuits.
- An advantage of the present invention is to provide a hydrophobic low-dielectric constant film and a preparation method thereof, which does not require high-temperature annealing treatment and will not affect electronic products, and is suitable for application in electronic products and large-scale integrated circuits.
- An advantage of the present invention is to provide a hydrophobic low-dielectric constant film and a preparation method thereof.
- the performance of the nano film prepared by the PECVD method is well controllable. It can finely adjust the amount of reactants and the number of reactants.
- the ratio between the two and the process parameters in the vapor deposition process can obtain nano-films with different properties.
- One advantage of the present invention is to provide a hydrophobic low-dielectric constant film and a preparation method thereof, which can adjust the mechanical properties, water resistance, and corrosion resistance of the low-dielectric constant film by selecting reactants.
- One advantage of the present invention is to provide a hydrophobic low-dielectric constant film and a preparation method thereof, which adopts a dynamic coating method, so that the low-dielectric constant film is more uniformly attached to the substrate, reducing the substrate coating at different positions The difference solves the problem of uneven thickness caused by different concentrations of deposits in different areas of the substrate.
- An advantage of the present invention is to provide a hydrophobic low-dielectric constant film and a preparation method thereof.
- a multifunctional cross-linking agent By adding a multifunctional cross-linking agent, the raw material of the low-dielectric constant film is directly cross-linked during the polymerization deposition process, and the density is High, good mechanical properties, saving the thermal annealing treatment process in the mass production process and the resulting costs.
- An advantage of the present invention is to provide a hydrophobic low-dielectric constant film and a preparation method thereof, which utilize plasma to excite chemical reactions, which can avoid the disadvantage of requiring high-specificity conditions for activation between raw materials in conventional chemical reactions.
- one aspect of the present invention provides a hydrophobic low-dielectric constant film, which is characterized in that it is formed by one or more fluorine-containing compounds A by a plasma-enhanced chemical vapor deposition method.
- the one or more fluorine-containing compounds comprise compounds having the general formula C x Si y O m H n F 2x+2y-n+2 or C x Si y O m H n F 2x+2y-n , Where x is an integer from 1-20, y is an integer from 0-8, m is an integer from 0-6, and n is 0, 3, 6, 7, 9, 10, 12, 13, 15, 16, 17, 19 .
- the hydrophobic low-dielectric constant film is formed by the vapor deposition reaction of the compound A and a crosslinker compound B.
- the hydrophobic low dielectric constant film is formed by the vapor deposition reaction of the compound A and a compound C with a large steric hindrance volume.
- the hydrophobic low dielectric constant film is formed by the vapor deposition reaction of the compound A, a crosslinker compound B, and a compound C with a large steric hindrance volume. Constant film.
- hydrophobic low-dielectric constant film wherein x is an integer of 1-10, y is an integer of 0-6, and m is an integer of 0-3.
- hydrophobic low dielectric constant film wherein the molar ratio of the compound A is greater than 35%.
- hydrophobic low-dielectric constant film wherein the compound A is selected from the group consisting of: tetrafluoroethylene, hexafluoropropylene, hexafluoroethane, hexafluoropropylene oxide, 1H, 1H, 2H, One or more of 2H-perfluorooctyltriethoxysilane, trimethylfluorosilane, and octafluorobutene.
- hydrophobic low dielectric constant film wherein the compound B is selected from the group consisting of butadiene, perfluorobutadiene, pentadiene, 1,2-epoxy-5-hexene One or more of hexadiene and heptadiene.
- hydrophobic low dielectric constant film wherein the compound C is selected from the group consisting of cyclohexane, toluene, xylene, vinylbenzene, divinylbenzene, dicyclopentadiene, naphthalene, One or more of pyridine.
- hydrophobic low-dielectric constant film according to an embodiment, wherein the compound B is a bifunctional or multifunctional molecule containing an unsaturated carbon-carbon double bond.
- the compound C is selected from the group consisting of cycloalkanes, aromatic hydrocarbons, fused ring aromatic hydrocarbons, and aromatic heterocycles.
- hydrophobic low dielectric constant film wherein the range of k value of the hydrophobic low dielectric constant film is selected from: 1.8-1.9, 1.9-2.0, 2.0-2.1, 2.1-2.2, 2.2 ⁇ 2.3, 2.3 ⁇ 2.4, 2.4 ⁇ 2.5, 2.5 ⁇ 2.6, 2.6 ⁇ 2.7 or 2.7 ⁇ 2.8.
- hydrophobic low-dielectric constant film according to an embodiment, wherein the static contact angle of the hydrophobic low-dielectric constant film is selected from: 110°-115°, 115°-120°, 120°-125 °, 125° ⁇ 130°, 130° ⁇ 135° or 135° ⁇ 140°.
- hydrophobic low-dielectric constant film wherein the range of Young's modulus of the hydrophobic low-dielectric constant film is selected from: 6-7GPa, 7-8GPa, 8-9GPa, 9 ⁇ 10GPa, 10-11GPa, 11-12GPa, 12-13GPa, 13-14GPa or 14-15GPa.
- Another aspect of the present invention provides a method for preparing a hydrophobic low dielectric constant film, which is characterized in that it comprises the steps of:
- a hydrophobic low dielectric constant film is vapor-deposited on a substrate in the chamber by the reaction of the one or more fluorine-containing compounds.
- the method for preparing a hydrophobic low-dielectric constant film further includes the step of introducing a crosslinker compound B into the reaction chamber of the reaction device.
- the method for preparing a hydrophobic low-dielectric constant film further includes the step of introducing a compound C with a large steric hindrance volume into the reaction chamber of the reaction device.
- the method for preparing a hydrophobic low-dielectric constant film further includes the step of introducing a crosslinker compound B and a compound C with a large steric hindrance volume into the reaction chamber of the reaction device.
- the method for preparing a hydrophobic low-dielectric constant film includes the step of operating the substrate so that the substrate is in a moving state in the reaction chamber.
- the method for preparing a hydrophobic low-dielectric constant film further includes the step of cleaning the substrate.
- the method further includes a step of: evacuating the reaction chamber.
- the plasma source gas is selected from: inert gas or fluorocarbon.
- the plasma source gas is selected from: helium or carbon tetrafluoride.
- the input power density of the reaction device ranges from 0.0001 W/L to 10 W/L.
- the temperature of the cavity of the reaction device ranges from 10 to 100°C.
- the substrate is selected from one of: a PCB board, a circuit board of a mobile phone antenna, and a mobile phone FPC.
- FIG. 1 is a block diagram of the preparation process of a low dielectric constant film according to an embodiment of the present invention.
- references to "one embodiment”, “embodiments”, “exemplary embodiments”, “various embodiments”, “some embodiments”, etc. indicate that such embodiments describing the invention may include specific features, structures, or characteristics , But not every embodiment must include this feature, structure or characteristic. In addition, some embodiments may have some, all, or none of the described features of other embodiments.
- the invention provides a hydrophobic low dielectric constant film and a preparation method thereof.
- the hydrophobic low dielectric constant film or coating contains oxygen, carbon and fluorine.
- the hydrophobic low dielectric constant film contains oxygen, carbon, fluorine and silicon.
- the hydrophobic low dielectric constant film contains hydrogen, oxygen, carbon, fluorine and silicon.
- the thickness of the hydrophobic low-dielectric constant film is nanometer-scale, and the thickness range is for example but not limited to 10 to 2000 nm.
- the hydrophobic low dielectric constant film has good dielectric properties.
- the k value of the hydrophobic low dielectric constant film is less than 3.2.
- the k value of the hydrophobic low dielectric constant film ranges from 1.8 to 2.8.
- the range of k value of the hydrophobic low-dielectric constant film is selected from: 1.8-1.9, 1.9-2.0, 2.0-2.1, 2.1-2.2, 2.2-2.3, 2.3-2.4, 2.4-2.5, 2.5- 2.6, 2.6 ⁇ 2.7 or 2.7 ⁇ 2.8.
- the dielectric loss of the hydrophobic low dielectric constant film is less than 0.0001.
- the hydrophobic low-dielectric constant film has good hydrophobic performance, and the static contact angle of water attached to the hydrophobic low-dielectric constant film is greater than 100°.
- the static contact angle of the hydrophobic low dielectric constant film ranges from 110° to 140°.
- the static contact angle of the hydrophobic low-dielectric constant film is selected from: 110°-115°, 115°-120°, 120°-125°, 125°-130°, 130°-135° or 135° ⁇ 140°.
- the static contact angle of the hydrophobic low dielectric constant film is 111°, 116°, 123°, 128°, 129°, 132°, 133°, thereby making the hydrophobic low dielectric constant
- the constant film has good corrosion resistance.
- the hydrophobic low-dielectric constant film has good mechanical properties, for example, the Young's modulus of the hydrophobic low-dielectric constant film is greater than 6 GPa.
- the range of Young's modulus of the hydrophobic low dielectric constant film is selected from: 6-7GPa, 7-8GPa, 8-9GPa, 9-10GPa, 10-11GPa, 11-12GPa, 12-13GPa, 13 ⁇ 14GPa or 14 ⁇ 15GPa.
- the hydrophobic low dielectric constant film is formed on the surface of a substrate by a plasma enhanced chemical vapor deposition (PECVD) method.
- PECVD plasma enhanced chemical vapor deposition
- the raw materials constituting the hydrophobic low-dielectric constant film are deposited on the surface of the substrate through a PECVD process, and the hydrophobic low-dielectric constant film is formed on the surface of the substrate.
- the hydrophobic low dielectric constant film is deposited on the surface of the LSI board, thereby improving the RC delay phenomenon of the LSI board.
- the hydrophobic low dielectric constant film is formed by a PECVD method by a plasma reaction device.
- the substrate is placed in the reaction chamber of the plasma reaction device, and then reactants are introduced into the reaction chamber, and plasma discharge is performed to generate plasma.
- the substrate is exposed to the reactant gas atmosphere, so that the hydrophobic low-dielectric constant film is deposited on the surface of the substrate.
- the substrate is exemplified but not limited to a PCB board, a circuit board of a mobile phone antenna, and a mobile phone FPC.
- the plasma enhanced chemical vapor deposition (PECVD) method generates plasma progeny through glow discharge, and the discharge method includes microwave discharge, radio frequency discharge, ultraviolet, and electric spark discharge.
- the use of the PECVD method can avoid the shortcomings of requiring highly specific conditions for activation between raw materials in conventional chemical reactions, and the PECVD method uses a wide range of materials.
- Plasma uses electrons and ions to directly bombard the active sites of the reactants for reactive activation.
- the activation capacity is closely related to the energy of the electrons and ions in the plasma, and this can be convenient by controlling the input power size, input power time and other parameters. To control.
- the reactant gas can be a chemical substance that is a gas at normal temperature and pressure, or it can be a vapor formed by a liquid substance with a boiling point below 350° C. under normal pressure through decompression, heating, and the like.
- the reactant gas is composed of two or more mixtures.
- the hydrophobic low-dielectric constant film uses a fluorine-containing compound A and a multifunctional compound B as reactants to form the hydrophobic low-dielectric constant through a PECVD process membrane.
- the compound A and the compound B may be passed in at the same time or sequentially.
- a plasma-enhanced chemical vapor deposition (PECVD) method is used to form a non-porous structured nano-film with a low-polarizability material as a reactant, which has a low dielectric constant, and Has good hydrophobicity.
- PECVD plasma-enhanced chemical vapor deposition
- the hydrophobic low-dielectric constant film has a low surface energy fluoropolymer or fluorosilicon polymer, has good hydrophobic characteristics, and has a large static contact angle when water is on its surface, and is suitable for application in electronic devices.
- the hydrophobic low-dielectric constant film constitutes the unit of the fluorocarbon material in an asymmetric structure, which is easy to process and easy to re-mold.
- the fluorine-containing compound A has the general formula C x Si y O m H n F 2x+2y-n+2 or C x Si y O m H n F 2x+2y-n , where x is 1-20 Integer, y is an integer of 0-8, m is an integer of 0-6, and n is 0, 3, 6, 7, 9, 10, 12, 13, 15, 16, 17, 19.
- the oxygen content in the low dielectric constant film should be controlled, and in order to reduce the dielectric constant in the low dielectric constant film, the fluorine content should be relatively high, preferably , X is an integer of 1-10, y is an integer of 0-6, and m is an integer of 0-3.
- the compound B is a bifunctional or multifunctional molecule, such as a diene, a perfluorodiene, or an olefin containing an epoxy group.
- the hydrophobic low dielectric constant film uses a fluorine-containing compound A and a compound C with a large steric hindrance volume as reactants, and the hydrophobic low dielectric constant film is formed through a PECVD process. Constant film.
- the compound A and the compound C may be passed in at the same time or sequentially.
- the compound C may be an aromatic hydrocarbon containing a benzene ring, a fluorine-substituted aromatic hydrocarbon, or cyclohexane.
- the compound C may be a cycloalkane, an aromatic hydrocarbon, a fused ring aromatic hydrocarbon, or an aromatic heterocycle.
- the hydrophobic low-dielectric constant film uses the fluorine-containing compound A, the compound B, and the compound C as reactants to form the hydrophobic Low dielectric constant film.
- the compound A, the compound B, and the compound C can be passed in simultaneously or sequentially.
- the total inflow of the compound A accounts for more than 35%, preferably, the total inflow of the compound A accounts for more than 40%, and the proportion here refers to the molar ratio.
- the compound A is selected from the combination: tetrafluoroethylene, hexafluoropropylene, hexafluoroethane, hexafluoropropylene oxide, 1H,1H,2H,2H-perfluorooctyltriethoxysilane, trimethyl One or more of fluorosilane and octafluorobutene.
- the compound B is selected from a combination: one or more of butadiene, perfluorobutadiene, pentadiene, 1,2-epoxy-5-hexene, hexadiene, and heptadienekind.
- the compound C is selected from a combination: one or more of cyclohexane, toluene, xylene, vinylbenzene, divinylbenzene, dicyclopentadiene, naphthalene, and pyridine.
- the compound B when used as a reactant, the compound acts as a cross-linking agent to enhance the density of the hydrophobic low-dielectric constant film.
- the bonds between the molecules of the compound A and the compound B or between the molecules of the reactant A, the compound B and the compound C are made closer, so that the The hydrophobic low dielectric constant film has good mechanical properties, such as a larger Young's modulus.
- the compound B is a multifunctional crosslinking agent, and the functional group can be a carbon-carbon double bond, a carbon-carbon triple bond, an epoxy group, etc., preferably a carbon-carbon double bond and an epoxy group as the crosslinking functional group. Since the carbon-carbon double bond and epoxy group have double bond reaction and ring-opening reaction respectively, the molecular structure remains saturated, which is beneficial to improve the hydrophobicity and symmetry of the molecule.
- the compound C when used as a reactant, the compound C has a large steric hindrance volume, which increases the free volume of the polymer in the hydrophobic low-dielectric constant film, which is beneficial to increase the molecular weight Hydrophobicity.
- the addition amount of the compound A, the compound B and/or the compound C and the ratio between the reactants can be adjusted. And the process parameters in vapor deposition to obtain nano-films with different properties.
- the requirements for their dielectric materials are often all-round and multi-level.
- the mechanical properties of the coating, the waterproofness of the coating, the corrosion resistance of the coating, and the chemical resistance of the coating are all required.
- different reactants can be selected and combined to meet this requirement.
- the hydrophobic low-permittivity nano film of the present invention does not need to undergo thermal annealing treatment to eliminate stress after the deposition is completed, so as to improve the density and density of the film.
- the invention uses a crosslinking agent with multifunctional groups to directly crosslink the low-dielectric constant coating material in the polymerization deposition process, which improves the compactness and saves the thermal annealing treatment process and the resulting cost in the large-scale production process. . It does not require high-temperature annealing treatment, will not affect electronic products, and is suitable for applications in electronic products and large-scale integrated circuits.
- the PECVD process is performed in a dynamic manner, that is, the substrate is moved in the reaction chamber.
- this movement can be a circular movement in the cavity.
- the operation mode of the substrate may include multiple modes.
- the substrate may revolve around the center of the substrate with the center point of the reaction chamber as a reference point or a predetermined axis. The axis or a predetermined axis rotates, or the base body rotates around two axes in the horizontal and vertical directions.
- the volume of the vacuum reaction chamber of the selected reaction device is not less than 100L, and the input power density of the plasma generation method used is in the range of 0.0001W/L to 10W/L, so that Adapt to large-scale production applications, and reduce production costs.
- the radio frequency discharge electrode of the reaction device is composed of a plurality of symmetrical electrode plates, so that the hydrophobic low dielectric constant film deposited on the surface of the substrate can be more uniform.
- a plasma source gas when preparing the hydrophobic low-dielectric constant film, a plasma source gas needs to be added to promote plasma generation.
- the plasma source gas is exemplified but not limited to inert gas and fluorocarbon.
- the type of the plasma source gas needs to be determined according to the added reactants, that is, the compound A, the compound B, and the compound C.
- the inert gas is helium.
- carbon tetrafluoride is selected as the fluorocarbon.
- FIG. 1 is a block diagram of the preparation process of a hydrophobic low dielectric constant film according to an embodiment of the present invention.
- the hydrophobic low dielectric constant film may be formed by vapor deposition by a plasma reaction device.
- the method for preparing the hydrophobic low dielectric constant film includes the steps:
- the one or more fluorine-containing compounds react to vapor-deposit a hydrophobic low-dielectric constant film on a substrate in the reaction chamber.
- the hydrophobic low dielectric constant film is formed by vapor deposition of a fluorine-containing compound A and a crosslinker compound B.
- the step 101 may include the step of introducing a fluorine-containing compound A and a crosslinker compound B into the reaction chamber of the reaction device.
- the fluorine-containing compound A is selected from combinations: tetrafluoroethylene, hexafluoropropylene, hexafluoroethane, hexafluoropropylene oxide, 1H,1H,2H,2H-perfluorooctyltriethoxysilane, trimethyl One or more of fluorosilane and octafluorobutene.
- the cross-linking agent compound B is selected from a combination: one or more of butadiene, perfluorobutadiene, pentadiene, 1,2-epoxy-5-hexene, hexadiene, and heptadienekind.
- the hydrophobic low-dielectric constant film is formed by vapor deposition of a fluorine-containing compound A and a compound C having a large steric hindrance volume.
- the step 101 may include the step of introducing the fluorine-containing compound A and the compound C with a large hindered volume into the reaction chamber of the reaction device.
- the fluorine-containing compound A is selected from combinations: tetrafluoroethylene, hexafluoropropylene, hexafluoroethane, hexafluoropropylene oxide, 1H,1H,2H,2H-perfluorooctyltriethoxysilane, trimethyl One or more of fluorosilane and octafluorobutene.
- the compound C with a large steric hindrance volume is selected from a combination: one or more of cyclohexane, toluene, xylene, vinylbenzene, divinylbenzene, dicyclopentadiene, naphthalene, and pyridine.
- the hydrophobic low-dielectric constant film is formed by vapor deposition of a fluorine-containing compound A, a crosslinker compound B, and a compound C having a large steric hindrance volume.
- the step 101 may include the step of introducing the fluorine-containing compound A, the cross-linking agent compound B, and the compound C with a large hindered volume into the reaction chamber of the reaction device.
- the fluorine-containing compound A is selected from combinations: tetrafluoroethylene, hexafluoropropylene, hexafluoroethane, hexafluoropropylene oxide, 1H,1H,2H,2H-perfluorooctyltriethoxysilane, trimethyl One or more of fluorosilane and octafluorobutene.
- the crosslinking agent compound B is selected from a combination: one or more of butadiene, perfluorobutadiene, pentadiene, 1,2-epoxy-5-hexene, hexadiene, and heptadienekind.
- the compound C with large steric hindrance volume is selected from the group consisting of one or more of cyclohexane, toluene, xylene, vinylbenzene, divinylbenzene, dicyclopentadiene, naphthalene, and pyridine.
- the plasma source gas introduced in the step 102 is exemplified but not limited to inert gas and fluorocarbon. Such as helium, carbon tetrafluoride.
- the method for preparing the hydrophobic low-dielectric constant film may further include the step of: 104: operating the substrate.
- the substrate is in a moving state in the reaction chamber. This movement can be a circular movement in the cavity.
- the operation mode of the substrate may include multiple modes.
- the substrate may revolve around the center of the substrate with the center point of the reaction chamber as a reference point or a predetermined axis.
- the axis or a predetermined axis rotates, or the base body rotates around two axes in the horizontal and vertical directions.
- the step 104 may be before the step 103.
- the substrate Before the step 101, the substrate may also be pre-treated.
- the substrate needs to be cleaned before the chemical vapor deposition is performed on the substrate. Dust, moisture, grease, etc. on the surface of the substrate will adversely affect the deposition effect.
- the substrate is cleaned with acetone or isopropanol first, and then placed in a drying oven to dry.
- the preparation process of the hydrophobic low-dielectric constant film may be: (1) Prepare the substrate, and clean the substrate before performing chemical vapor deposition on the substrate. Dust, moisture, grease, etc. on the surface of the substrate will adversely affect the deposition effect. First clean the substrate with acetone or isopropanol, and then put it in a drying oven to dry. (2) Chemical vapor deposition on the substrate to prepare nano-film.
- the reactant gas can be passed in simultaneously with the plasma source, or the substrate can be pretreated for 1-1200s after the plasma source is passed in, and then the reactant gas can be passed in according to the process parameters; (c) set the vacuum reaction The chamber pressure and temperature, and different reactant gases are introduced at the same time, the plasma generation power is adjusted to 1 ⁇ 500W, the cavity temperature is adjusted to 10 ⁇ 100°C, plasma chemical vapor deposition is performed, and the reaction is stopped after the reaction is completed Material gas, raise the cavity pressure to normal pressure.
- the volume of the selected vacuum reaction chamber is not less than 100L, and the input power density of the plasma generation method used is in the range of 0.0001W/L to 10W/L.
- a low dielectric constant nano film or nano coating applied to a PCB board and a preparation method thereof go through the following steps:
- the pre-treatment stage discharge frequency is 500 Hz
- discharge power is 10 W
- discharge time is 100 s.
- tetrafluoroethylene, butadiene, and toluene are simultaneously introduced, and chemical vapor deposition is performed on the surface of the substrate to prepare a nano-coating.
- the feed speeds of the three reactive monomers were 150 ⁇ L/min, 20 ⁇ L/min, 5 ⁇ L/min, and the feed time was 2000s respectively.
- a low-dielectric constant nano-coating applied to the protection of mobile phone antennas and a preparation method thereof go through the following steps:
- the discharge frequency is 433MHz
- the discharge power is 100W
- the discharge time is 100s.
- hexafluoroethane, butadiene, and vinylbenzene are simultaneously introduced, and chemical vapor deposition is performed on the surface of the substrate to prepare a nano-coating.
- the feed rate of the three reactive monomers were 250 ⁇ L/min, 10 ⁇ L/min, 5 ⁇ L/min, and the feed time was 3000s respectively.
- a low-dielectric constant nano-coating applied to the protection of mobile phone antennas and a preparation method thereof go through the following steps:
- the pre-treatment stage discharge frequency is 2450MHz, discharge power 400W, and discharge time 200s.
- hexafluoropropylene oxide, pentadiene, and cyclohexane are simultaneously introduced, and chemical vapor deposition is performed on the surface of the substrate to prepare a nano-coating.
- the feed rate of the three reactive monomers were 350 ⁇ L/min, 30 ⁇ L/min, 5 ⁇ L/min, and the feed time was 3000s respectively.
- a low-dielectric constant nano-coating applied to FPC protection of mobile phones and a preparation method thereof go through the following steps:
- the pre-treatment stage discharge frequency is 2450MHz, discharge power 400W, and discharge time 200s.
- hexafluoropropylene oxide, 1,2-epoxy-5-hexene, and dicyclopentadiene are simultaneously introduced, and chemical vapor deposition is performed on the surface of the substrate to prepare a nano-coating.
- the feed speeds of the three reactive monomers were 400 ⁇ L/min, 20 ⁇ L/min, and 10 ⁇ L/min, respectively, and the feed time was 3000 s.
- Example 1 Compared with Example 1, the monomer tetrafluoroethylene in step (4) was replaced with 1H, 1H, 2H, 2H-perfluorooctyltriethoxysilane, and other conditions were not changed.
- the monomer toluene flow rate in step (4) is changed to 0, that is, it is not passed through, and other conditions are not changed.
- Example 1 Compared with Example 1, the helium gas in step (3) is changed to carbon tetrafluoride, and other conditions are not changed.
- the tetrafluoroethylene in step (4) is changed to a mixture of tetrafluoroethylene and trimethylfluorosilane, the molar ratio is 2:1, and other conditions remain unchanged.
- the tetrafluoroethylene in step (4) is changed to a mixture of tetrafluoroethylene and trimethylfluorosilane, the molar ratio is 1:1, and other conditions remain unchanged.
- the PCB board, the circuit board of the mobile phone antenna, and the mobile phone FPC are used as the substrates as the examples of the formation process of the hydrophobic low-dielectric constant film described in the specification.
- plasma enhanced chemical vapor deposition can also be performed with other electronic devices as the substrate to form the hydrophobic low-dielectric constant film, and the present invention is not limited in this respect.
- the thickness of the nano-coating is measured by the American Filmetrics F20-UV-film thickness measuring instrument.
- the water contact angle of the nano coating is tested according to the GB/T 30447-2013 standard.
- the dielectric constant is tested according to the recommended method of GB/T 1409-2006 for measuring the permittivity and dielectric loss factor of electrical insulating materials at power frequency, audio frequency, and high frequency (including meter wave wavelength).
- the Young's modulus of the nano-coating is measured according to the technical specifications of JB/T 12721-2016 solid material in-situ nanoindentation/scratch tester.
- Example Thickness/nm Contact angle/° Dielectric constant Dielectric loss Young's modulus/GPa Example 1 186 129 1.92 ⁇ 0.0001 8.78
- Example 2 315 132 2.21 ⁇ 0.0001 9.63
- Example 3 340 116 2.03 ⁇ 0.0001 11.22
- Example 4 296 111 1.86 ⁇ 0.0001 6.95
- Example 5 192 116 2.33 ⁇ 0.0001 8.96
- Example 6 210 132 2.42 ⁇ 0.0001 13.5
- Example 7 152 128 2.37 ⁇ 0.0001 8.36
- Example 8 136 123 2.52 ⁇ 0.0001 12.36
- Example 9 123 133 2.65 ⁇ 0.0001 8.30
- Example 10 174 128 2.01 ⁇ 0.0001 3.12
- a waterproof nano-membrane that can be applied to large-scale integrated circuits can be obtained.
- a hydrophobic nano-film with a relative dielectric constant of about 2.0 is obtained; the density of the nano-film is increased by adding a cross-linking agent, which is embodied in the improvement of mechanical properties.
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Abstract
Description
实施例 | 厚度/nm | 接触角/° | 介电常数 | 介电损耗 | 杨氏模量/GPa |
实施例1 | 186 | 129 | 1.92 | <0.0001 | 8.78 |
实施例2 | 315 | 132 | 2.21 | <0.0001 | 9.63 |
实施例3 | 340 | 116 | 2.03 | <0.0001 | 11.22 |
实施例4 | 296 | 111 | 1.86 | <0.0001 | 6.95 |
实施例5 | 192 | 116 | 2.33 | <0.0001 | 8.96 |
实施例6 | 210 | 132 | 2.42 | <0.0001 | 13.5 |
实施例7 | 152 | 128 | 2.37 | <0.0001 | 8.36 |
实施例8 | 136 | 123 | 2.52 | <0.0001 | 12.36 |
实施例9 | 123 | 133 | 2.65 | <0.0001 | 8.30 |
实施例10 | 174 | 128 | 2.01 | <0.0001 | 3.12 |
Claims (44)
- 一疏水性的低介电常数膜,其由一种或多种含氟化合物A通过等离子体增强化学气相沉积方法形成,其中所述一种或多种含氟化合物包含具有通式C xSi yO mH nF 2x+2y-n+2或者C xSi yO mH nF 2x+2y-n的化合物,其中x为1-20的整数,y为0-8的整数,m为0-6的整数,n为0、3、6、7、9、10、12、13、15、16、17、19。
- 根据权利要求1所述的疏水性的低介电常数膜,其由所述化合物A和一交联剂化合物B气相沉积反应形成所述疏水性的低介电常数膜。
- 根据权利要求1所述的疏水性的低介电常数膜,其由所述化合物A和一具有大位阻体积的化合物C气相沉积反应形成所述疏水性的低介电常数膜。
- 根据权利要求1所述的疏水性的低介电常数膜,其由所述化合物A、一交联剂化合物B以及一具有大位阻体积的化合物C气相沉积反应形成所述疏水性的低介电常数膜。
- 根据权利要求1-4任一所述的疏水性的低介电常数膜,其中x为1-10的整数,y为0-6的整数,m为0-3的整数。
- 根据权利要求2-4任一所述的疏水性的低介电常数膜,其中所述化合物A的摩尔占比大于35%。
- 根据权利要求1-4任一所述的疏水性的低介电常数膜,其中所述化合物A选自组合:四氟乙烯、六氟丙烯、六氟乙烷、六氟环氧丙烷、1H,1H,2H,2H-全氟辛基三乙氧基硅烷、三甲基氟硅烷、八氟丁烯中的一种或几种。
- 根据权利要求1至4任一所述的疏水性的低介电常数膜,其中所述化合物A选自组合四氟乙烯、六氟乙烷、六氟环氧丙烷、1H,1H,2H,2H-全氟辛基三乙氧基硅烷中的一种或者几种。
- 根据权利要求1至4任一所述的疏水性的低介电常数膜,其中所述化合物A为四氟乙烯加三甲基氟硅烷的混合物。
- 根据权利要求2或4所述的疏水性的低介电常数膜,其中所述化合物B选自组合:丁二烯、全氟丁二烯、戊二烯、1,2-环氧-5-己烯、己二烯、庚二烯中的一种或几种。
- 根据权利要求2或4所述的疏水性的低介电常数膜,其中所述化合物B 选自组合丁二烯、戊二烯、1,2-环氧-5-己烯中的一种或者几种。
- 根据权利要求3或4所述的疏水性的低介电常数膜,其中所述化合物C选自组合:环己烷、甲苯、二甲苯、乙烯基苯、二乙烯基苯、双环戊二烯、萘、吡啶中的一种或几种。
- 根据权利要求3或4所述的疏水性的低介电常数膜,其中所述化合物C选自组合甲苯、乙烯基苯、环己烷、双环戊二烯中的一种或者几种。
- 根据权利要求2或4所述的疏水性的低介电常数膜,其中所述化合物B是含有不饱和碳碳双键的双官能团或者多官能团分子。
- 根据权利要求3或4所述的疏水性的低介电常数膜,其中所述化合物C选自:环烷烃、芳烃、稠环芳烃、芳杂环。
- 根据权利要求1-4任一所述的疏水性的低介电常数膜,其中所述疏水性的低介电常数膜的k值范围选自:1.8~1.9、1.9~2.0、2.0~2.1、2.1~2.2、2.2~2.3、2.3~2.4、2.4~2.5、2.5~2.6、2.6~2.7或2.7~2.8。
- 根据权利要求1-4任一所述的疏水性的低介电常数膜,其中所述疏水性的低介电常数膜的静态接触角选自:110°~115°、115°~120°、120°~125°、125°~130°、130°~135°或135°~140°。
- 根据权利要求1-4任一所述的疏水性的低介电常数膜,其中所述疏水性的低介电常数膜的杨氏模量范围选自:6~7GPa、7~8GPa、8~9GPa、9~10GPa、10~11GPa、11~12GPa、12~13GPa、13~14GPa或14~15GPa。
- 一疏水性低介电常数膜制备方法,包括步骤:(A)引入包含有通式结构C xSi yO mH nF 2x+2y-n+2或者C xSi yO mH nF 2x+2y-n的一种或多种含氟化合物A至反应装置的反应腔室内;(B)引入等离子源气体至所述反应腔室内;和(C)在预定功率下,由所述一种或多种含氟化合物反应而在反应腔室内的一基体上气相沉积疏水性的低介电常数膜。
- 根据权利要求19所述的疏水性的低介电常数膜的制备方法,其还包括步骤:引入一交联剂化合物B至反应装置的反应腔室内。
- 根据权利要求19所述的疏水性的低介电常数膜的制备方法,其还包括步骤:引入一具有大位阻体积的化合物C至反应装置的反应腔室内。
- 根据权利要求19所述的疏水性的低介电常数膜的制备方法,其中还包 括步骤:引入一交联剂化合物B和一具有大位阻体积的化合物C至反应装置的反应腔室内。
- 根据权利要求19所述的疏水性的低介电常数膜的制备方法,其包括步骤:运转所述基体,以使得所述基体在所述反应腔室内处于运动的状态。
- 根据权利要求19所述的疏水性的低介电常数膜的制备方法,其还包括步骤:清洁处理所述基体。
- 根据权利要求19所述的疏水性的低介电常数膜的制备方法,其中在步骤(A)之前还包括步骤:对所述反应腔室抽真空。
- 根据权利要求19-25任一所述的疏水性的低介电常数膜的制备方法,其中x为1-10的整数,y为0-6的整数,m为0-3的整数。
- 根据权利要求20-22任一所述的疏水性的低介电常数膜的制备方法,其中所述化合物A的摩尔占比大于35%。
- 根据权利要求19-25任一所述的疏水性的低介电常数膜的制备方法,其中所述化合物A选自组合:四氟乙烯、六氟丙烯、六氟乙烷、六氟环氧丙烷、1H,1H,2H,2H-全氟辛基三乙氧基硅烷、三甲基氟硅烷、八氟丁烯中的一种或几种。
- 根据权利要求19至25任一所述的疏水性的低介电常数膜的制备方法,其中所述化合物A选自组合四氟乙烯、六氟乙烷、六氟环氧丙烷、1H,1H,2H,2H-全氟辛基三乙氧基硅烷中的一种或者几种。
- 根据权利要求19至25任一所述的疏水性的低介电常数膜的制备方法,其中所述化合物A为四氟乙烯加三甲基氟硅烷的混合物。
- 根据权利要求20或22所述的疏水性的低介电常数膜的制备方法,其中所述化合物B选自组合:丁二烯、全氟丁二烯、戊二烯、1,2-环氧-5-己烯、己二烯、庚二烯中的一种或几种。
- 根据权利要求20或22所述的疏水性的低介电常数膜的制备方法,其中所述化合物B选自组合丁二烯、戊二烯、1,2-环氧-5-己烯中的一种或者几种。
- 根据权利要求21或22所述的疏水性的低介电常数膜的制备方法,其中所述化合物C选自组合:环己烷、甲苯、二甲苯、乙烯基苯、二乙烯基苯、双环戊二烯、萘、吡啶中的一种或几种。
- 根据权利要求21或22所述的疏水性的低介电常数膜的制备方法,其中所述化合物C选自组合甲苯、乙烯基苯、环己烷、双环戊二烯中的一种或者 几种。
- 根据权利要求20或22所述的疏水性的低介电常数膜的制备方法,其中所述化合物B是含有不饱和碳碳双键的双官能团或者多官能团分子。
- 根据权利要求21或22所述的疏水性的低介电常数膜的制备方法,其中所述化合物C选自:环烷烃、芳烃、稠环芳烃、芳杂环。
- 根据权利要求19-25任一所述的疏水性的低介电常数膜的制备方法,其中所述疏水性的低介电常数膜的k值范围选自:1.8~1.9、1.9~2.0、2.0~2.1、2.1~2.2、2.2~2.3、2.3~2.4、2.4~2.5、2.5~2.6、2.6~2.7或2.7~2.8。
- 根据权利要求19-25任一所述的疏水性的低介电常数膜的制备方法,其中所述疏水性的低介电常数膜的静态接触角选自:110°~115°、115°~120°、120°~125°、125°~130°、130°~135°或135°~140°。
- 根据权利要求19-25任一所述的疏水性的低介电常数膜的制备方法,其中所述疏水性的低介电常数膜的杨氏模量范围选自:6~7GPa、7~8GPa、8~9GPa、9~10GPa、10~11GPa、11~12GPa、12~13GPa、13~14GPa或14~15GPa。
- 根据权利要求19-25任一所述的疏水性的低介电常数膜的制备方法,其中所述等离子源气体选自:惰性气体或者碳氟化合物。
- 根据权利要求19-25任一所述的疏水性的低介电常数膜的制备方法,其中所述等离子源气体选自:氦气或四氟化碳。
- 根据权利要求19-25任一所述的疏水性的低介电常数膜的制备方法,其中所述反应装置的输入功率密度范围在0.0001W/L~10W/L。
- 根据权利要求19-25任一所述的疏水性的低介电常数膜的制备方法,其中所述反应装置的腔体温度范围为10~100℃。
- 根据权利要求19-25任一所述的疏水性的低介电常数膜的制备方法,其中所述基体选自:PCB板、手机天线的电路板、手机FPC中的一种。
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CN110158052B (zh) | 2019-05-17 | 2021-05-14 | 江苏菲沃泰纳米科技股份有限公司 | 低介电常数膜及其制备方法 |
CN110665768B (zh) * | 2019-07-26 | 2022-04-26 | 江苏菲沃泰纳米科技股份有限公司 | 防水纳米膜及其制备方法、应用和产品 |
CN111348840B (zh) * | 2020-02-24 | 2021-05-14 | 江苏菲沃泰纳米科技股份有限公司 | 疏水性表面涂层及其制备方法 |
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