WO2020232915A1 - 一种显示面板及其制作方法、智能终端 - Google Patents

一种显示面板及其制作方法、智能终端 Download PDF

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Publication number
WO2020232915A1
WO2020232915A1 PCT/CN2019/105189 CN2019105189W WO2020232915A1 WO 2020232915 A1 WO2020232915 A1 WO 2020232915A1 CN 2019105189 W CN2019105189 W CN 2019105189W WO 2020232915 A1 WO2020232915 A1 WO 2020232915A1
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Prior art keywords
display panel
photosensitive area
anode
array substrate
pixel definition
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PCT/CN2019/105189
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English (en)
French (fr)
Inventor
夏存军
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武汉华星光电半导体显示技术有限公司
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Priority to US16/623,103 priority Critical patent/US11665919B2/en
Publication of WO2020232915A1 publication Critical patent/WO2020232915A1/zh

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/805—Electrodes
    • H10K50/81—Anodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/805—Electrodes
    • H10K50/81—Anodes
    • H10K50/813—Anodes characterised by their shape
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/85—Arrangements for extracting light from the devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/122—Pixel-defining structures or layers, e.g. banks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/60—OLEDs integrated with inorganic light-sensitive elements, e.g. with inorganic solar cells or inorganic photodiodes
    • H10K59/65—OLEDs integrated with inorganic image sensors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/805—Electrodes
    • H10K50/81—Anodes
    • H10K50/818—Reflective anodes, e.g. ITO combined with thick metallic layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/1201—Manufacture or treatment

Definitions

  • the present invention relates to the technical field of display panels, in particular to a display panel, a manufacturing method thereof, and an intelligent terminal.
  • AMOLED active matrix organic light-emitting diode
  • the camera in a full-screen smartphone is generally placed under the screen (CUP), but the base polyimide (PI) film of the display, the metal film in the array layer, the anode, the organic functional film, the cathode, and the film
  • the encapsulation layer, polarizer, etc. affect the transmittance of light through the screen.
  • the PI film, anode, and polarizer have the most serious effects, resulting in poor light sensitivity of the camera under the screen.
  • the embodiment of the present invention provides a display panel to solve the problem of poor light transmittance of the existing display screen.
  • the embodiment of the present invention provides a display panel including a photosensitive area for placing a photoreceptor of a camera; the display panel includes:
  • An anode provided on the array substrate
  • the photosensitive area is located on a side of the array substrate away from the anode, and the anode corresponding to the position of the photosensitive area has a patterned structure.
  • the display panel further includes a pixel definition layer provided on the array substrate and the anode;
  • the surface of the pixel definition layer corresponding to the position of the photosensitive area is a convex structure.
  • the patterned structure includes a fan-shaped structure.
  • the protrusion structure includes at least one spherical protrusion.
  • the display panel further includes a polarizer arranged on a side of the pixel definition layer away from the photosensitive area;
  • the polarizer includes a hollow area corresponding to the position of the photosensitive area.
  • the display panel further includes an organic functional layer provided on the pixel definition layer and the anode, and an encapsulation layer provided on the organic functional layer; the polarizer is provided on the encapsulation layer .
  • an embodiment of the present invention also provides an intelligent terminal, including a camera and a display panel;
  • the display panel includes a photosensitive area, and the photoreceptor of the camera is arranged in the photosensitive area of the display panel;
  • the display panel includes:
  • An anode provided on the array substrate
  • the photosensitive area is located on a side of the array substrate away from the anode, and the anode corresponding to the position of the photosensitive area has a patterned structure.
  • the display panel further includes a pixel definition layer provided on the array substrate and the anode;
  • the surface of the pixel definition layer corresponding to the position of the photosensitive area is a convex structure.
  • the patterned structure includes a fan-shaped structure.
  • the protrusion structure includes at least one spherical protrusion.
  • the display panel further includes a polarizer arranged on a side of the pixel definition layer away from the array substrate;
  • the polarizer includes a hollow area corresponding to the position of the photosensitive area.
  • the display panel further includes an organic functional layer provided on the pixel definition layer and the anode, and an encapsulation layer provided on the organic functional layer; the polarizer is provided on the encapsulation layer .
  • an embodiment of the present invention also provides a manufacturing method of a display panel, including:
  • Patterning is performed on the anode corresponding to the position of the photosensitive area.
  • the method further includes:
  • a convex structure is formed on the surface of the pixel definition layer corresponding to the position of the photosensitive area.
  • the method further includes:
  • a photosensitive area for placing the photoreceptor of the camera is provided at the bottom of the array substrate, and the anode corresponding to the position of the photosensitive area is a patterned structure to increase the light transmission area at the anode and improve the display panel
  • the light transmittance of the light-sensitive area increases the amount of light reaching the photosensitive area
  • the surface of the pixel definition layer corresponding to the position of the light-sensitive area is a convex structure, which allows light with a large deflection angle to penetrate into the photosensitive area, further improving the light transmittance of the display panel
  • the polarizer corresponding to the position of the photosensitive area is a hollow area to maximize the amount of light reaching the photosensitive area.
  • FIG. 1 is a schematic structural diagram of a display panel provided by an embodiment of the present invention.
  • FIG. 2 is a schematic structural diagram of a patterned structure of an anode in a display panel provided by an embodiment of the present invention
  • FIG. 3 is another schematic structural diagram of the patterned structure of the anode in the display panel provided by the embodiment of the present invention.
  • FIG. 4 is another schematic structural diagram of the patterned structure of the anode in the display panel provided by the embodiment of the present invention.
  • FIG. 5 is a schematic diagram of a display panel provided by an embodiment of the present invention.
  • FIG. 6 is a schematic structural diagram of a smart terminal provided by an embodiment of the present invention.
  • FIG. 7 is a schematic flowchart of a manufacturing method of a display panel provided by an embodiment of the present invention.
  • FIG. 1 is a schematic structural diagram of a display panel provided by an embodiment of the present invention.
  • the display panel provided by this embodiment includes a photosensitive area 3, and the photosensitive area 3 is an area where a photoreceptor of a camera is placed.
  • the display panel includes an array substrate 1 and an anode 2.
  • the anode 2 is provided on the array substrate 1, and the photosensitive area 3 is located on the side of the array substrate 1 away from the anode 2, that is, the photosensitive area 3 is located at the bottom of the array substrate 1.
  • the photosensitive area 3 can be located on the bottom surface of the array substrate 1, that is, the photoreceptor of the camera can be arranged on the bottom surface of the array substrate 1; the photosensitive area 3 can also be a groove at the bottom of the array substrate 1, that is, the photoreceptor of the camera It can be arranged in a groove at the bottom of the array substrate 1 to thin the array substrate 1 at the photoreceptor of the camera and increase the amount of light reaching the photoreceptor of the camera.
  • the anode 2 includes an indium tin oxide (ITO) film, a metallic silver (Ag), and an ITO film that are stacked.
  • the metal Ag has a light reflection function, which makes the light transmittance of the anode 2 extremely low. Therefore, the anode 2 corresponding to the position of the photosensitive area 3 is patterned to make the anode 2 corresponding to the position of the photosensitive area 3 a patterned structure , In order to increase the light transmission area of the anode 2 corresponding to the position of the photosensitive area 3, increase the light transmittance of the display panel, and increase the amount of light reaching the photosensitive area.
  • the anode 2 on the array substrate 1 can be prepared by a physical vapor deposition method, and the patterned structure of the anode 2 can be prepared by coating, exposure, development and other processes of photolithography technology.
  • the patterned structure of the anode 2 may be a fan-shaped structure, for example, a three-leaf fan-shaped structure as shown in FIG. 2, a four-leaf fan-shaped structure as shown in FIG. 3, and a five-leaf fan-shaped structure as shown in FIG.
  • the patterned structure can also be a structure of other shapes, as long as the light-transmitting area of the anode 2 can be increased, which is not specifically limited here.
  • the display panel further includes a pixel definition layer 4 provided on the array substrate 1 and the anode 2, and the pixel definition layer 4 corresponds to the position of the photosensitive area 3.
  • the surface is convex structure.
  • a convex structure is provided on the surface of the pixel definition layer 4 corresponding to the position of the photosensitive area 3 to allow light with a large deflection angle to penetrate to the photosensitive area 3 to further increase the light transmittance of the display panel.
  • the convex structure on the surface of the pixel definition layer 4 can be prepared by coating, exposure, and development processes of photolithography technology.
  • the convex structure on the surface of the pixel defining layer 4 includes at least one spherical convex, as shown in FIG. 5, the light is irradiated on the spherical convex and then refracted into the light-transmitting area 3 to increase the amount of light in the photosensitive area 3.
  • the display panel further includes a polarizer 5 arranged on a side of the pixel defining layer 4 away from the array substrate 1, and the polarizer 5 includes a hollow area 8 corresponding to the position of the photosensitive area 3. Since the polarizer 5 filters out about 50% of the light, the area corresponding to the position of the polarizer 5 and the photosensitive area 3 is hollowed out, that is, the polarizer 5 corresponding to the position of the photosensitive area 3 is removed to maximize the reach The amount of light in the photosensitive area 3.
  • the display panel further includes an organic functional layer 6 provided on the pixel defining layer 4 and the anode 2, and an encapsulation layer 7 provided on the organic functional layer 6; the polarizer 5 is provided On the encapsulation layer 7.
  • the organic functional layer 6 and the encapsulation layer 7 can be sequentially prepared by thermal evaporation, chemical vapor deposition (CVD), inkjet printing and other processes, and then the polarizer is attached to On the encapsulation layer 7, the polarizer 5 corresponding to the position of the photosensitive area 3 is removed.
  • CVD chemical vapor deposition
  • the array substrate 1 includes a base substrate and a thin film transistor layer provided on the base substrate.
  • the photosensitive area 3 is arranged on the side of the base substrate away from the thin film transistor layer, and the anode 2 is arranged on the side of the thin film transistor layer away from the base substrate.
  • the thin film transistor layer includes a buffer layer, an active layer, a gate insulating layer, a gate electrode, an interlayer insulating layer, a source and drain electrode, and a planarization layer.
  • the buffer layer in the thin film transistor layer is provided on the base substrate, the active layer is provided on the buffer layer, the gate insulating layer is provided on the buffer layer and the active layer, and the gate is provided on the gate insulating layer,
  • the interlayer insulating layer is arranged on the gate insulating layer and the gate, the source and drain electrodes are arranged on the interlayer insulating layer, and the planarization layer is arranged on the interlayer insulating layer and the source and drain electrodes.
  • the anode 2 is arranged on the planarization layer and the source and drain in the thin film transistor layer to electrically connect with the source and drain in the thin film transistor layer.
  • the display panel provided in this embodiment can provide a photosensitive area for placing the photoreceptor of the camera at the bottom of the array substrate, and the anode corresponding to the position of the photosensitive area is a patterned structure to increase the transparency at the anode.
  • Light area increase the light transmittance of the display panel, and increase the amount of light reaching the photosensitive area;
  • the surface of the pixel definition layer corresponding to the position of the photosensitive area is a convex structure, allowing large deflection angle light to penetrate into the photosensitive area, further improving the display
  • the light transmittance of the panel; the polarizer corresponding to the position of the photosensitive area is a hollow area to maximize the amount of light reaching the photosensitive area.
  • FIG. 6 is a schematic structural diagram of a smart terminal provided by an embodiment of the present invention.
  • the smart terminal provided by the embodiment of the present invention includes a camera and a display panel 10.
  • the photoreceptor 11 of the camera is provided in the photosensitive area 3 of the display panel 10.
  • the display panel 10 is the display panel in the above embodiment. I won't repeat it in detail.
  • the photoreceptor 11 of the camera is set in the photoreceptor area 3 at the bottom of the display panel 10.
  • the amount of light reaching the photoreceptor area 3 is increased, and the photoreceptor effect of the camera is improved, thereby achieving the smart terminal Full screen.
  • FIG. 7 it is a schematic flowchart of a manufacturing method of a display panel provided by an embodiment of the present invention.
  • the manufacturing method of the display panel provided by the embodiment of the present invention includes:
  • the array substrate includes a base substrate and a thin film transistor layer provided on the base substrate.
  • An anode is formed on the array substrate; the side of the array substrate away from the anode is provided with a photosensitive area for placing a photoreceptor of a camera.
  • the photosensitive area 3 can be located on the bottom surface of the array substrate 1, that is, the photoreceptor of the camera can be arranged on the bottom surface of the array substrate 1; the photosensitive area 3 can also be a groove at the bottom of the array substrate 1, that is, the camera The photoreceptor can also be arranged in the groove at the bottom of the array substrate 1 to thin the array substrate 1 at the photoreceptor of the camera and increase the amount of light reaching the photoreceptor of the camera.
  • the anode 2 on the array substrate 1 can be prepared by a physical vapor deposition method.
  • the anode 2 corresponding to the position of the photosensitive area 3 is patterned into a patterned structure.
  • the patterned structure of the anode 2 can be prepared using photolithography techniques such as coating, exposure, and development.
  • the patterned structure of the anode 2 may be a fan-shaped structure, for example, a three-leaf fan-shaped structure as shown in FIG. 2, a four-leaf fan-shaped structure as shown in FIG. 3, and a five-leaf fan-shaped structure as shown in FIG.
  • the patterned structure can also be a structure of other shapes, as long as the light-transmitting area of the anode can be increased, which is not specifically limited here.
  • the anode 2 has a light reflection function, which makes the light transmittance of the anode 2 extremely low. Therefore, the anode 2 corresponding to the position of the photosensitive area 3 is patterned, so that the anode 2 corresponding to the position of the photosensitive area 3 has a patterned structure , In order to increase the light transmission area of the anode 2 corresponding to the position of the photosensitive area 3, increase the light transmittance of the display panel, and increase the amount of light reaching the photosensitive area.
  • the method further includes:
  • a convex structure is formed on the surface of the pixel definition layer corresponding to the position of the photosensitive area.
  • the pixel defining layer 4 is provided on the array substrate 1 and the anode 2, and the surface of the pixel defining layer 4 corresponding to the position of the photosensitive area 3 is a convex structure.
  • the protruding structure can be prepared by coating, exposure, development and other processes of photolithography technology.
  • the convex structure on the surface of the pixel defining layer 4 includes at least one spherical convex.
  • a convex structure is provided on the surface of the pixel definition layer 4 corresponding to the position of the photosensitive area 3 to allow light with a large deflection angle to penetrate to the photosensitive area 3 to further increase the light transmittance of the display panel.
  • the method further includes:
  • the polarizer 5 is provided on the side of the pixel definition layer 4 away from the array substrate 1.
  • the region of the polarizer 5 corresponding to the position of the photosensitive region 3 is hollowed out to remove the polarizer 5 corresponding to the position of the photosensitive region 3 to form a hollow region 8. Since the polarizer 5 filters out about 50% of the light, the polarizer 5 corresponding to the position of the photosensitive area 3 is removed to maximize the amount of light reaching the photosensitive area 3.
  • the manufacturing method of the display panel can provide a photosensitive area for placing the photoreceptor of the camera at the bottom of the array substrate, and the anode corresponding to the position of the photosensitive area is a patterned structure to increase the size of the anode.
  • the light-transmitting area of the display panel increases the light transmittance of the display panel and the amount of light reaching the photosensitive area; the surface of the pixel definition layer corresponding to the position of the photosensitive area is a convex structure, so that light with a large deflection angle can penetrate into the photosensitive area. Further improve the light transmittance of the display panel; the polarizer corresponding to the position of the photosensitive area is a hollow area to maximize the amount of light reaching the photosensitive area.

Abstract

一种显示面板及其制作方法、智能终端。所述显示面板包括用于放置摄像头的感光器的感光区（3）；所述显示面板包括：阵列基板（1）；设于所述阵列基板（1）上的阳极（2）；其中，所述感光区（3）位于所述阵列基板（1）远离所述阳极（2）的一侧，且与所述感光区（3）位置相对应的阳极（2）为图案化结构。

Description

一种显示面板及其制作方法、智能终端 技术领域
本发明涉及显示面板技术领域，尤其涉及一种显示面板及其制作方法、智能终端。
 背景技术
与液晶显示器相比，有源矩阵有机发光二极管（AMOLED）显示器具有高对比、高视角、运动图像响应速度等优点，越来越多的应用于智能手机屏上。智能手机为了保证视觉效果最大化，大力发展全面屏智能手机。
目前全面屏智能手机中的摄像头一般置于屏下（CUP），但显示屏的基底聚酰亚胺（PI）膜层、阵列层中的金属膜层、阳极、有机功能膜层、阴极、薄膜封装层、偏光片等影响光透过屏幕的透过率，其中PI膜层、阳极、偏光片等影响最为严重，导致屏下摄像头的感光效果较差。
 技术问题
本发明实施例提供一种显示面板，以解决现有显示屏光透过率差的问题。
 技术解决方案
本发明实施例提供了一种显示面板，包括用于放置摄像头的感光器的感光区；所述显示面板包括：
阵列基板；
设于所述阵列基板上的阳极；
其中，所述感光区位于所述阵列基板远离所述阳极的一侧，且与所述感光区位置相对应的阳极为图案化结构。
进一步地，所述显示面板还包括设于所述阵列基板和所述阳极上的像素定义层；
所述像素定义层与所述感光区位置相对应的表面为凸起结构。
进一步地，所述图案化结构包括扇叶形结构。
进一步地，所述凸起结构包括至少一个圆球型凸起。
进一步地，所述显示面板还包括设于所述像素定义层远离所述感光区一侧的偏光片；
所述偏光片包括与所述感光区位置相对应的镂空区。
进一步地，所述显示面板还包括设于所述像素定义层和所述阳极上的有机功能层，以及设于所述有机功能层上的封装层；所述偏光片设于所述封装层上。
相应地，本发明实施例还提供了一种智能终端，包括摄像头以及显示面板；
所述显示面板包括感光区，所述摄像头的感光器设于所述显示面板的感光区；
所述显示面板包括：
阵列基板；
设于所述阵列基板上的阳极；
其中，所述感光区位于所述阵列基板远离所述阳极的一侧，且与所述感光区位置相对应的阳极为图案化结构。
进一步地，所述显示面板还包括设于所述阵列基板和所述阳极上的像素定义层；
所述像素定义层与所述感光区位置相对应的表面为凸起结构。
进一步地，所述图案化结构包括扇叶形结构。
进一步地，所述凸起结构包括至少一个圆球型凸起。
进一步地，所述显示面板还包括设于所述像素定义层远离所述阵列基板一侧的偏光片；
所述偏光片包括与所述感光区位置相对应的镂空区。
进一步地，所述显示面板还包括设于所述像素定义层和所述阳极上的有机功能层，以及设于所述有机功能层上的封装层；所述偏光片设于所述封装层上。
相应地，本发明实施例还提供了一种显示面板的制作方法，包括：
提供阵列基板；
在所述阵列基板上形成阳极；所述阵列基板远离所述阳极的一侧设有用于放置摄像头的感光器的感光区；
对与所述感光区位置相对应的阳极进行图案化处理。
进一步地，所述方法还包括：
在所述阵列基板和所述阳极上形成像素定义层；
在与所述感光区位置相对应的像素定义层的表面形成凸起结构。
进一步地，所述方法还包括：
在所述像素定义层远离所述阵列基板的一侧形成偏光片；
去除与所述感光区位置相对应的偏光片。
 有益效果
本发明的有益效果为：在阵列基板的底部设置用于放置摄像头的感光器的感光区，与感光区位置相对应的阳极为图案化结构，以增大阳极处的透光面积，提高显示面板的光透过率，提高到达感光区的光量；与感光区位置相对应的像素定义层的表面为凸起结构，使大偏角的光透进感光区，进一步提高显示面板的光透过率；与感光区位置相对应的偏光片处为镂空区，以最大限度的增加到达感光区的光量。
 附图说明
为了更清楚地说明实施例或现有技术中的技术方案，下面将对实施例或现有技术描述中所需要使用的附图作简单介绍，显而易见地，下面描述中的附图仅仅是发明的一些实施例，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他的附图。
图1为本发明实施例提供的显示面板的结构示意图；
图2为本发明实施例提供的显示面板中阳极的图案化结构的结构示意图；
图3为本发明实施例提供的显示面板中阳极的图案化结构的另一结构示意图；
图4为本发明实施例提供的显示面板中阳极的图案化结构的又一结构示意图；
图5为本发明实施例提供的显示面板的原理图；
图6为本发明实施例提供的智能终端的结构示意图；
图7为本发明实施例提供的显示面板的制作方法的流程示意图。
 本发明的实施方式
以下参考说明书附图介绍本发明的优选实施例，用以举例证明本发明可以实施，这些实施例可以向本领域中的技术人员完整介绍本发明的技术内容，使得本发明的技术内容更加清楚和便于理解。然而本发明可以通过许多不同形式的实施例来得以体现，本发明的保护范围并非仅限于文中提到的实施例。
本发明说明书中使用的术语仅用来描述特定实施方式，而并不意图显示本发明的概念。除非上下文中有明确不同的意义，否则，以单数形式使用的表达涵盖复数形式的表达。在本发明说明书中，应理解，诸如“包括”、“具有”以及“含有”等术语意图说明存在本发明说明书中揭示的特征、数字、步骤、动作或其组合的可能性，而并不意图排除可存在或可添加一个或多个其他特征、数字、步骤、动作或其组合的可能性。附图中的相同参考标号指代相同部分。
参见图1，是本发明实施例提供的显示面板的结构示意图。
如图1所示，本实施例提供的显示面板包括感光区3，所述感光区3为放置摄像头的感光器的区域。所述显示面板包括阵列基板1和阳极2。阳极2设于阵列基板1上，感光区3位于阵列基板1远离阳极2的一侧，即感光区3位于阵列基板1的底部。其中，感光区3可以位于在阵列基板1底部的表面，即摄像头的感光器可以设置于阵列基板1底部的表面；感光区3还可以为阵列基板1底部的凹槽，即摄像头的感光器还可以设置在阵列基板1底部的凹槽中，以减薄摄像头的感光器处的阵列基板1，增大到达摄像头的感光器的光量。
阳极2包括层叠设置的铟锡氧化物（ITO）薄膜、金属银（Ag）和ITO薄膜。金属Ag具有光反射功能，使得阳极2的光透过率极低，因此对与感光区3位置相对应的阳极2进行图案化处理，使与感光区3位置相对应的阳极2为图案化结构，以增大与感光区3位置相对应的阳极2的透光面积，提高显示面板的光透过率，提高到达感光区的光量。
阵列基板1上的阳极2可采用物理气相沉积法进行制备，阳极2的图案化结构可利用光刻技术的涂布、曝光、显影等工艺制备。阳极2的图案化结构可以为扇叶形结构，例如，如图2所示的三叶扇形结构，如图3所示的四叶扇形结构，如图4所示的五叶扇形结构，阳极2的图案化结构还可以为其他形状的结构，只要能增大阳极2的透光面积即可，在此不做具体限定。
进一步地，如图1所示，所述显示面板还包括设于所述阵列基板1和所述阳极2上的像素定义层4，所述像素定义层4与所述感光区3位置相对应的表面为凸起结构。本实施例在与感光区3位置相对应的像素定义层4的表面设置凸起结构，使大偏角的光透入到达感光区3，以进一步提高显示面板的光透过率。
像素定义层4表面的凸起结构可利用光刻技术的涂布、曝光、显影等工艺制备。像素定义层4表面的凸起结构包括至少一个圆球型凸起，如图5所示，光照射到圆球型凸起后折射进透光区3，以增加感光区3的光量。
进一步地，所述显示面板还包括设于所述像素定义层4远离所述阵列基板1一侧的偏光片5，所述偏光片5包括与所述感光区3位置相对应的镂空区8。由于偏光片5会过滤掉50%左右的光，因此将偏光片5与感光区3位置相对应区域进行镂空处理，即去除与感光区3位置相对应的偏光片5，以最大限度的增加到达感光区3的光量。
进一步地，所述显示面板还包括设于所述像素定义层4和所述阳极2上的有机功能层6，以及设于所述有机功能层6上的封装层7；所述偏光片5设于所述封装层7上。
需要说明的是，在制备像素定义层4后，还可利用热蒸镀、化学气相沉积（CVD）、喷墨打印等工艺依次制备有机功能层6和封装层7，进而将偏光片贴附在封装层7上，再去除与感光区3位置相对应的偏光片5。
进一步地，阵列基板1包括衬底基板以及设于衬底基板上的薄膜晶体管层。感光区3设于衬底基板远离薄膜晶体管层的一侧，阳极2设于薄膜晶体管层远离衬底基板的一侧。
薄膜晶体管层包括缓冲层、有源层、栅极绝缘层、栅极、层间绝缘层、源漏极和平坦化层。具体地，薄膜晶体管层中的缓冲层设于衬底基板上，有源层设于缓冲层上，栅极绝缘层设于缓冲层和有源层上，栅极设于栅极绝缘层上，层间绝缘层设于栅极绝缘层和栅极上，源漏极设于层间绝缘层上，平坦化层设于层间绝缘层、源漏极上。阳极2设于薄膜晶体管层中的平坦化层和源漏极上，以与薄膜晶体管层中的源漏极电性连接。
由上述可知，本实施例提供的显示面板，能够在阵列基板的底部设置用于放置摄像头的感光器的感光区，与感光区位置相对应的阳极为图案化结构，以增大阳极处的透光面积，提高显示面板的光透过率，提高到达感光区的光量；与感光区位置相对应的像素定义层的表面为凸起结构，使大偏角的光透进感光区，进一步提高显示面板的光透过率；与感光区位置相对应的偏光片处为镂空区，以最大限度的增加到达感光区的光量。
参见图6，是本发明实施例提供的智能终端的结构示意图。
如图6所示，本发明实施例提供的智能终端包括摄像头和显示面板10，摄像头的感光器11设于显示面板10的感光区3，显示面板10为上述实施例中的显示面板，在此不再详细赘述。
本实施例将摄像头的感光器11设于显示面板10底部的感光区3，通过增加到达感光区3的光量，提高到达摄像头的感光器11的光量，提高摄像头的感光效果，从而实现智能终端的全面屏。
参见图7，是本发明实施例提供的显示面板的制作方法的流程示意图。
如图7所示，本发明实施例提供的显示面板的制作方法包括：
101、提供阵列基板。
其中，阵列基板包括衬底基板以及设于衬底基板上的薄膜晶体管层。
102、在所述阵列基板上形成阳极；所述阵列基板远离所述阳极的一侧设有用于放置摄像头的感光器的感光区。
如图1所示，感光区3可以位于在阵列基板1底部的表面，即摄像头的感光器可以设置于阵列基板1底部的表面；感光区3还可以为阵列基板1底部的凹槽，即摄像头的感光器还可以设置在阵列基板1底部的凹槽中，以减薄摄像头的感光器处的阵列基板1，增大到达摄像头的感光器的光量。阵列基板1上的阳极2可采用物理气相沉积法进行制备。
103、对与所述感光区位置相对应的阳极进行图案化处理。
如图1所示，与感光区3位置相对应的阳极2经图案化处理后为图案化结构。阳极2的图案化结构可利用光刻技术的涂布、曝光、显影等工艺制备。阳极2的图案化结构可以为扇叶形结构，例如，如图2所示的三叶扇形结构，如图3所示的四叶扇形结构，如图4所示的五叶扇形结构，阳极2的图案化结构还可以为其他形状的结构，只要能增大阳极的透光面积即可，在此不做具体限定。
阳极2具有光反射功能，使得阳极2的光透过率极低，因此对与感光区3位置相对应的阳极2进行图案化处理，使与感光区3位置相对应的阳极2为图案化结构，以增大与感光区3位置相对应的阳极2的透光面积，提高显示面板的光透过率，提高到达感光区的光量。
进一步地，所述方法还包括：
在所述阵列基板和所述阳极上形成像素定义层；
在与所述感光区位置相对应的像素定义层的表面形成凸起结构。
如图1所示，像素定义层4设于阵列基板1和阳极2上，与感光区3位置相对应的像素定义层4的表面为凸起结构。凸起结构可利用光刻技术的涂布、曝光、显影等工艺制备。像素定义层4表面的凸起结构包括至少一个圆球型凸起。本实施例在与感光区3位置相对应的像素定义层4的表面设置凸起结构，使大偏角的光透入到达感光区3，以进一步提高显示面板的光透过率。
进一步地，所述方法还包括：
在所述像素定义层远离所述阵列基板的一侧形成偏光片；
去除与所述感光区位置相对应的偏光片。
如图1所示，偏光片5设于像素定义层4远离阵列基板1的一侧。偏光片5与感光区3位置相对应的区域进行镂空处理，以去除感光区3位置相对应的偏光片5，形成镂空区8。由于偏光片5会过滤掉50%左右的光，因此去除与感光区3位置相对应的偏光片5，以最大限度的增加到达感光区3的光量。
由上述可知，本实施例提供的显示面板的制作方法，能够在阵列基板的底部设置用于放置摄像头的感光器的感光区，与感光区位置相对应的阳极为图案化结构，以增大阳极处的透光面积，提高显示面板的光透过率，提高到达感光区的光量；与感光区位置相对应的像素定义层的表面为凸起结构，使大偏角的光透进感光区，进一步提高显示面板的光透过率；与感光区位置相对应的偏光片处为镂空区，以最大限度的增加到达感光区的光量。
综上所述，虽然本发明已以优选实施例揭露如上，但上述优选实施例并非用以限制本发明，本领域的普通技术人员，在不脱离本发明的精神和范围内，均可作各种更动与润饰，因此本发明的保护范围以权利要求界定的范围为准。

Claims (15)

  1. 一种显示面板，其中，包括用于放置摄像头的感光器的感光区；所述显示面板包括：
    阵列基板；
    设于所述阵列基板上的阳极；
    其中，所述感光区位于所述阵列基板远离所述阳极的一侧，且与所述感光区位置相对应的阳极为图案化结构。
  2. 根据权利要求1所述的显示面板，其中，所述显示面板还包括设于所述阵列基板和所述阳极上的像素定义层；
    所述像素定义层与所述感光区位置相对应的表面为凸起结构。
  3. 根据权利要求1所述的显示面板，其中，所述图案化结构包括扇叶形结构。
  4. 根据权利要求2所述的显示面板，其中，所述凸起结构包括至少一个圆球型凸起。
  5. 根据权利要求2所述的显示面板，其中，所述显示面板还包括设于所述像素定义层远离所述阵列基板一侧的偏光片；
    所述偏光片包括与所述感光区位置相对应的镂空区。
  6. 根据权利要求5所述的显示面板，其中，所述显示面板还包括设于所述像素定义层和所述阳极上的有机功能层，以及设于所述有机功能层上的封装层；所述偏光片设于所述封装层上。
  7. 一种智能终端，其中，包括摄像头以及显示面板；
    所述显示面板包括感光区，所述摄像头的感光器设于所述显示面板的感光区；
    所述显示面板包括：
    阵列基板；
    设于所述阵列基板上的阳极；
    其中，所述感光区位于所述阵列基板远离所述阳极的一侧，且与所述感光区位置相对应的阳极为图案化结构。
  8. 根据权利要求7所述的智能终端，其中，所述显示面板还包括设于所述阵列基板和所述阳极上的像素定义层；
    所述像素定义层与所述感光区位置相对应的表面为凸起结构。
  9. 根据权利要求7所述的智能终端，其中，所述图案化结构包括扇叶形结构。
  10. 根据权利要求8所述的显示面板，其中，所述凸起结构包括至少一个圆球型凸起。
  11. 根据权利要求8所述的显示面板，其中，所述显示面板还包括设于所述像素定义层远离所述阵列基板一侧的偏光片；
    所述偏光片包括与所述感光区位置相对应的镂空区。
  12. 根据权利要求11所述的显示面板，其中，所述显示面板还包括设于所述像素定义层和所述阳极上的有机功能层，以及设于所述有机功能层上的封装层；所述偏光片设于所述封装层上。
  13. 一种显示面板的制作方法，其中，包括：
    提供阵列基板；
    在所述阵列基板上形成阳极；所述阵列基板远离所述阳极的一侧设有用于放置摄像头的感光器的感光区；
    对与所述感光区位置相对应的阳极进行图案化处理。
  14. 根据权利要求13所述的显示面板的制作方法，其中，所述方法还包括：
    在所述阵列基板和所述阳极上形成像素定义层；
    在与所述感光区位置相对应的像素定义层的表面形成凸起结构。
  15. 根据权利要求14所述的显示面板的制作方法，其中，所述方法还包括：
    在所述像素定义层远离所述阵列基板的一侧形成偏光片；
    去除与所述感光区位置相对应的偏光片。
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