WO2020215372A1 - Substrat de réseau - Google Patents

Substrat de réseau Download PDF

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Publication number
WO2020215372A1
WO2020215372A1 PCT/CN2019/086086 CN2019086086W WO2020215372A1 WO 2020215372 A1 WO2020215372 A1 WO 2020215372A1 CN 2019086086 W CN2019086086 W CN 2019086086W WO 2020215372 A1 WO2020215372 A1 WO 2020215372A1
Authority
WO
WIPO (PCT)
Prior art keywords
opening
interlayer insulating
insulating layer
substrate
layer
Prior art date
Application number
PCT/CN2019/086086
Other languages
English (en)
Chinese (zh)
Inventor
唐维
Original Assignee
武汉华星光电技术有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 武汉华星光电技术有限公司 filed Critical 武汉华星光电技术有限公司
Publication of WO2020215372A1 publication Critical patent/WO2020215372A1/fr

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133345—Insulating layers
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133357—Planarisation layers

Definitions

  • the present invention relates to the field of display technology, and in particular to an array substrate.
  • In-plane digging technology mainly includes blind holes and through holes. Among them, the through holes need to penetrate the glass on both sides of the array substrate and the color filter substrate, while the blind holes are to retain the glass on both sides. Both types of holes are subsequent Place the camera for use to achieve a high screen-to-body ratio.
  • the existing blind hole design is to open via holes on the interlayer insulating layer, the flat layer, and the passivation layer that are arranged in sequence, leaving the bottom buffer layer without openings, and opening large holes on the flat layer, interlayer insulating layer and passivation A small opening is formed on the layer and the opening directions of the two film layers coincide.
  • the blind hole is composed of an interlayer insulating layer, a flat layer and a via hole on the passivation layer. Since the total film thickness of the interlayer insulating layer and the passivation layer is about 9000 angstroms, and the film thickness of the flat layer is about 25000 angstroms, this opening method will form two thicker taper angles at the two positions. In the actual production process, when the alignment liquid is applied, the alignment liquid is easy to accumulate at two cone angles, and there are liquid crystals in the blind holes, which will cause uneven brightness of the display panel behind the cell.
  • the present invention provides an array substrate to solve the problem of the existing array substrate. Since the array substrate is provided with a blind hole for arranging the camera, the alignment liquid will accumulate at the cone angle in the blind hole, resulting in subsequent display after the box is aligned. The technical problem of uneven brightness of the panel.
  • the present invention also provides an array substrate, including a substrate, a buffer layer disposed on the substrate, a first interlayer insulating layer disposed on the buffer layer, and a first interlayer insulating layer disposed on the first interlayer insulating layer And a flat layer covering the first interlayer insulating layer, a second interlayer insulating layer disposed on the flat layer, and a passivation layer disposed on the second interlayer insulating layer.
  • the first interlayer insulating layer is provided with a first opening
  • the first flat layer is provided with a second opening
  • the second interlayer insulating layer is provided with a third opening
  • the passivation layer is opened There is a fourth opening.
  • the second opening, the third opening, and the fourth opening communicate with each other to form a blind hole, and the second opening, the third opening, and the fourth opening increase in sequence;
  • the side wall of the blind hole is stepped Climbing structure;
  • the orthographic projection of the first opening on the substrate covers the orthographic projection of the second opening on the substrate.
  • the side wall of the second opening is a slope, and the side wall of the second opening has a sawtooth structure.
  • the angle formed by the sidewall of the second opening and the buffer layer is 30 to 45 degrees.
  • the orthographic projection of the third opening on the substrate covers the orthographic projection of the second opening on the substrate.
  • the orthographic projection of the first opening on the substrate covers the orthographic projection of the third opening on the substrate.
  • the thickness of the flat layer is 24500-25500 angstroms.
  • the thickness of the first interlayer insulating layer is 5500-6500 angstroms.
  • the thickness of the second interlayer insulating layer is 1500-2500 angstroms.
  • the thickness of the passivation layer is 500-1500 angstroms.
  • the present invention also provides an array substrate, including a substrate, a buffer layer disposed on the substrate, a first interlayer insulating layer disposed on the buffer layer, and a first interlayer insulating layer disposed on the first interlayer insulating layer And a flat layer covering the first interlayer insulating layer, a second interlayer insulating layer disposed on the flat layer, and a passivation layer disposed on the second interlayer insulating layer.
  • the first interlayer insulating layer is provided with a first opening
  • the first flat layer is provided with a second opening
  • the second interlayer insulating layer is provided with a third opening
  • the passivation layer is opened
  • There is a fourth opening wherein, the second opening, the third opening and the fourth opening communicate with each other to form a blind hole, and the second opening, the third opening and the fourth opening increase in sequence.
  • the side wall of the blind hole has a stepped climbing structure.
  • the side wall of the second opening is a slope, and the side wall of the second opening has a sawtooth structure.
  • the angle formed by the sidewall of the second opening and the buffer layer is 30 to 45 degrees.
  • the orthographic projection of the first opening on the substrate covers the orthographic projection of the second opening on the substrate.
  • the orthographic projection of the third opening on the substrate covers the orthographic projection of the second opening on the substrate.
  • the orthographic projection of the first opening on the substrate covers the orthographic projection of the third opening on the substrate.
  • the thickness of the flat layer is 24500-25500 angstroms.
  • the thickness of the first interlayer insulating layer is 5500-6500 angstroms.
  • the thickness of the second interlayer insulating layer is 1500-2500 angstroms.
  • the thickness of the passivation layer is 500-1500 angstroms.
  • the beneficial effects of the present invention are as follows: by changing the design of the blind holes on the array substrate, the opening positions and opening sizes of the several film layers at the blind holes are adjusted, so that the taper angle at the blind holes becomes gentle, thereby making The subsequent coating of the alignment liquid uniformly transitions to prevent the alignment liquid from accumulating at the blind holes.
  • FIG. 1 is a schematic structural diagram of an array substrate in a specific embodiment of the present invention.
  • Figure 2 is a sectional view at A-A' in Figure 1;
  • Figure 3 is a top view of the flat layer.
  • the present invention is aimed at the existing array substrate. Since the array substrate is provided with blind holes for mounting the camera, the alignment liquid will accumulate at the cone angles in the blind holes, which will result in uneven brightness of the display panel after the subsequent alignment. Problem, this embodiment can solve the defect.
  • the present embodiment provides an array substrate 100, including a substrate 10, a buffer layer 20, a first interlayer insulating layer 30, a flat layer 40, a second interlayer insulating layer 50, and a passivation layer. ⁇ 60.
  • the buffer layer 20 is disposed on the substrate 10
  • the first interlayer insulating layer 30 is disposed on the buffer layer 20
  • the flat layer 40 is disposed on the first interlayer insulating layer 30
  • the second interlayer insulating layer 50 is disposed on the flat layer 40
  • the passivation layer 60 is disposed on the second interlayer insulating layer 50.
  • the array substrate 100 is provided with a blind hole 70, the blind hole 70 is arranged at the periphery of the display area on the array substrate 100, and the blind hole 70 is used for subsequent placement of a camera.
  • the blind holes 70 are obtained by digging holes in several film layers on the substrate 10.
  • the first interlayer insulating layer 30 is provided with a first opening 301, and in the thickness direction, the first opening 301 penetrates the first interlayer insulating layer 30.
  • the thickness of the first interlayer insulating layer 30 is 5500-6500 angstroms.
  • the flat layer 40 is provided with a second opening 401, the second opening 401 penetrates the flat layer 40, the side wall of the second opening 401 is a slope, and the side wall of the second opening is stepped.
  • the thickness of the flat layer 40 is 24500-25500 angstroms.
  • the second interlayer insulating layer 50 is provided with a third opening 501, the third opening 501 penetrates the second interlayer insulating layer 50, and the sidewall of the third opening 501 is stepped.
  • the thickness of the second interlayer insulating layer 50 is 1500-2500 angstroms.
  • a fourth opening 601 is opened on the passivation layer 60, and the fourth opening 601 penetrates the passivation layer 60, and the thickness of the passivation layer 60 is 500-1500 angstroms.
  • the second opening 401, the third opening 501, and the fourth opening 601 communicate with each other to form the blind hole 70, and the second opening 401, the third opening 501, and The fourth opening 601 increases sequentially.
  • the flat layer 40 covers the first interlayer insulating layer 30, that is, the orthographic projection of the first opening 301 on the first interlayer insulating layer 30 on the substrate 10 covers the flat layer 40 The orthographic projection of the second opening 401 on the substrate 10.
  • the orthographic projection of the first opening 301 on the substrate 10 covers the orthographic projection of the third opening 501 on the substrate 10.
  • the orthographic projection of the third opening 501 on the substrate 10 covers the orthographic projection of the second opening 401 on the substrate 10.
  • the sidewall of the blind hole 70 is a stepped climbing structure, the bottom of the blind hole 70 is the surface of the buffer layer 20 facing away from the substrate 10, and the sidewall of the blind hole 70 is formed by the The second opening 401, the third opening 501, and the exposed side walls of the fourth opening 601 are formed together.
  • the thickness of the first interlayer insulating layer 30 is 6000 angstroms
  • the thickness of the flat layer 40 is 25000 angstroms
  • the thickness of the second interlayer insulating layer 50 is 2000 angstroms
  • the passivation layer 60 The thickness is 1000 angstroms.
  • the first interlayer insulating layer 30 and the second The second interlayer insulating layer 50 and the passivation layer 60 have large holes
  • the flat layer 40 has small holes
  • the first opening 301 on the first interlayer insulating layer 30 and the third The opening 501 and the fourth opening 601 are staggered to avoid forming a higher cone angle.
  • the second interlayer insulating layer 50 and the passivation layer 60 form a taper angle, and the height of the taper angle formed by these two places is relatively low.
  • the PI solution can be uniformly transferred, which can greatly reduce the problem of liquid accumulation at the cone angle.
  • the side wall of the second opening 401 on the flat layer 40 is an inclined surface, the included angle formed by the inclined surface and the buffer layer is 30 to 45 degrees, and the slope of the side wall is relatively gentle, which facilitates Avoid accumulation of PI liquid.
  • the sidewall of the second opening 401 on the flat layer 40 is a zigzag inclined surface.
  • the flat layer 40 is an organic photoresist material.
  • the second opening 401 is formed by exposure and development. In this case, the formation of jagged sidewalls is beneficial to slow down the slope of the cone angle formed by the flat layer 40 and the buffer layer 20, thereby avoiding the accumulation of PI liquid at the cone angle.

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Solid State Image Pick-Up Elements (AREA)

Abstract

L'invention concerne un substrat de réseau (100), comprenant un substrat (10), une première couche isolante intermédiaire (30) pourvue d'une première ouverture (301), une couche de planarisation (40) pourvue d'une deuxième ouverture (401), une seconde couche isolante intermédiaire (50) pourvue d'une troisième ouverture (501), et une couche de passivation (60) pourvue d'une quatrième ouverture (601) : la deuxième ouverture (401), la troisième ouverture (501) et la quatrième ouverture (601) augmentant séquentiellement en taille et étant en communication l'une avec l'autre pour former un trou borgne (70). Au moyen de l'ajustement des positions et des tailles de trous ménagés dans une pluralité de couches de film au niveau d'un trou borgne dans le substrat de réseau, un angle de conicité au niveau du trou borgne devient progressif, ce qui permet d'éviter l'accumulation de liquide d'alignement au niveau du trou borgne.
PCT/CN2019/086086 2019-04-22 2019-05-09 Substrat de réseau WO2020215372A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201910321464.5 2019-04-22
CN201910321464.5A CN110109279B (zh) 2019-04-22 2019-04-22 阵列基板

Publications (1)

Publication Number Publication Date
WO2020215372A1 true WO2020215372A1 (fr) 2020-10-29

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Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2019/086086 WO2020215372A1 (fr) 2019-04-22 2019-05-09 Substrat de réseau

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CN (1) CN110109279B (fr)
WO (1) WO2020215372A1 (fr)

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CN110703505A (zh) * 2019-09-23 2020-01-17 武汉华星光电技术有限公司 转印版、显示面板的制作方法及显示面板
CN111367124B (zh) * 2020-02-12 2021-06-01 武汉华星光电技术有限公司 配向膜转印版以及配向膜制造方法
CN111650787B (zh) * 2020-06-11 2023-06-30 京东方科技集团股份有限公司 显示基板及其制作方法、显示装置
CN111665657A (zh) * 2020-06-29 2020-09-15 武汉华星光电技术有限公司 液晶显示面板
CN112099258B (zh) * 2020-09-29 2022-03-08 武汉华星光电技术有限公司 显示面板及显示装置
CN113341622B (zh) * 2021-05-31 2022-11-25 长沙惠科光电有限公司 阵列基板、阵列基板的加工工艺及显示面板
CN115020617B (zh) * 2022-06-23 2023-07-25 武汉华星光电半导体显示技术有限公司 显示面板及显示面板的制作方法
CN118103767A (zh) * 2022-09-23 2024-05-28 京东方科技集团股份有限公司 显示面板与制造显示面板的方法

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US20140368770A1 (en) * 2013-06-14 2014-12-18 Samsung Display Co., Ltd. Display panel and method of manufacturing the same
CN108155196A (zh) * 2017-12-28 2018-06-12 深圳市华星光电半导体显示技术有限公司 一种阵列基板及其制备方法
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CN110109279A (zh) 2019-08-09
CN110109279B (zh) 2021-04-02

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