WO2020200019A1 - Habi类混合光引发剂在uvled光固化中的应用 - Google Patents
Habi类混合光引发剂在uvled光固化中的应用 Download PDFInfo
- Publication number
- WO2020200019A1 WO2020200019A1 PCT/CN2020/081292 CN2020081292W WO2020200019A1 WO 2020200019 A1 WO2020200019 A1 WO 2020200019A1 CN 2020081292 W CN2020081292 W CN 2020081292W WO 2020200019 A1 WO2020200019 A1 WO 2020200019A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- meth
- bis
- habi
- application according
- compounds
- Prior art date
Links
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
Definitions
- the invention belongs to the technical field of organic chemistry and light curing, and specifically relates to the application of HABI-type mixed photoinitiators in UVLED light curing.
- UVLED technology is gradually replacing the traditional high-pressure mercury lamp technology.
- UVLED has many advantages, such as long service life, low energy consumption, cold light source, no mercury, stable light output, wide applicability, and almost zero maintenance cost.
- the most commonly used UVLED light source has a wavelength between 355-420nm. As a photoinitiator suitable for UVLED technology, it needs to have absorption in this wavelength region. At the same time, since UVLED applications usually require high concentrations of photoactive substances, the photoinitiator is also required to have good compatibility with other components in the photocuring system Sex. At present, thioxanthone (such as isopropyl thioxanthone ITX) and its derivatives, and acyl phosphine oxide are the most commonly used photoinitiators in this field. However, as a single-wavelength UVLED light source, high-sensitivity photoinitiators, such as ITX, TPO, etc., that match the wavelength are usually selected.
- ITX isopropyl thioxanthone ITX
- TPO acyl phosphine oxide
- the bisimidazole photoinitiator is formed by the coupling of two monoimidazoles. Under the condition of light or heating, the chemical bond connecting the two imidazole groups will be broken to generate monoimidazole radicals, which can be opposed to macromolecular radicals. The stable existence is not easily quenched by oxygen, and it is suitable for printing plate making, photosensitive imaging, printed circuit board and other fields. Bisimidazole photoinitiators can effectively solve the problems of surface dryness, odor and yellowing during use. However, due to the problems of solvent, poor sensitivity or difficulty in taking care of both at the same time, bisimidazole photoinitiators are used as the main initiator. The application in the field of UVLED light curing has not been reported yet. How to apply the bisimidazole photoinitiator to the formula system using LED as the light source to solve the problems of surface dryness, odor and yellowing existing in ITX and TPO has become an important research direction in this field.
- the purpose of the present invention is to provide an application of hexaarylbisimidazole (HABI) mixed photoinitiator in UVLED light curing.
- HABI hexaarylbisimidazole
- the photosensitive resin composition containing a specific HABI-type mixed photoinitiator has excellent comprehensive performance under LED light source, good compatibility and high sensitivity, can replace traditional TPO and ITX initiators, solve its surface dry problem, and has no Odor and low yellowing characteristics.
- the photosensitive resin composition used includes the following components:
- HABI-type mixed photoinitiator which has a structure as shown in general formula (I), which contains 2-1', 2-3', 2'-1 and 2'-3
- the bisimidazole compound at the connection position, and the total mass percentage of the four bisimidazole compounds at the connection position in the HABI mixed photoinitiator is more than 92%
- Ar 1 , Ar 2 , Ar 3 , Ar 4 , Ar 5 , and Ar 6 may be the same or different, and each independently represents a substituted or unsubstituted aryl group;
- At least one ortho-position substituent on the 2-position or 2'-position aryl group is an electron withdrawing substituent, the 4-position aryl group or the 4'-position aryl group or the 5-position aryl group or the 5'-position At least one substituent on the aryl group has an electron-donating substituent;
- the molar extinction coefficient of the HABI-type mixed photoinitiator at 355-420nm is greater than 6000 and less than 13000;
- the HABI-based mixed photoinitiator and other components form a photosensitive resin composition, which is used in the form of a composition.
- the HABI-type mixed photoinitiator of the present invention has a structure as shown in the general formula (I), which contains bisimidazole compounds with four connection positions of 2-1', 2-3', 2'-1 and 2'-3 , And the total mass percentage of the four bisimidazole compounds in the mixed photoinitiator is above 92%,
- Ar 1 , Ar 2 , Ar 3 , Ar 4 , Ar 5 , and Ar 6 may be the same or different, and each independently represents a substituted or unsubstituted aryl group.
- the electron-withdrawing substituents on the aryl group are selected from halogen, nitro, cyano, and amine groups, and the electron-donating substituents on the aryl group are selected from methoxy and C 3 -C 10 branched chains.
- the bisimidazole compounds satisfying the four connection positions 2-1', 2-3', 2'-1 and 2'-3 of the structure represented by the general formula (I) are specifically the following structures:
- the aryl group is preferably a phenyl group.
- the substituted aryl group may be mono-substituted or poly-substituted.
- the substituents on the aryl group can be halogen, nitro, cyano, amino, hydroxyl, C 1 -C 20 alkyl or alkenyl, C 1 -C 8 alkoxy, wherein each independently
- the methylene group in the variable ie, each substituent may be optionally substituted with oxygen, sulfur, or imino groups.
- the substituent on the aryl group can be fluorine, chlorine, bromine, nitro, cyano, amino, hydroxyl, C 1 -C 10 alkyl or alkenyl, C 1 -C 5 alkoxy Group, wherein the methylene group in each independent variable can be optionally substituted with oxygen, sulfur, or imino groups.
- At least one of Ar 1 , Ar 2 , Ar 3 , Ar 4 , Ar 5 , and Ar 6 is an aryl group containing a halogen substituent.
- the halogen substituent is chlorine.
- the HABI-type mixed photoinitiator mentioned in this application is formed by coupling two triarylimidazoles (which can be the same or different, depending on the substituents on the aryl group). Due to the inductive effect of the substituents on the benzene ring, the ⁇ electron cloud density of the benzene ring is reduced. The inductive effect promotes the distortion of the benzene ring, and the conjugate center on the imidazole ring is shifted, making the substituted phenyl and imidazole not in the same plane ( The three aryl imidazoles form a curved state). When the two imidazoles are finally coupled, the connection of N and C presents different spatial configurations, which greatly affects the performance of HABI.
- HABI compounds such as the general formula (I) may also There are 1-4', 1-5', 3-4', 3-5', 1-1', 1-3', 3-1', 3-3', 4-1', 4-3' , 5-1', 5-3' and other connection positions.
- the applicant’s research found that only when the four linking sites 2-1', 2-3', 2'-1, and 2'-3 exist and the total content accounts for more than 92% of the total amount of HABI, HABI can show the best performance. Excellent solubility and sensitivity.
- the solubility of a single substance of any kind of linking site is far less than the above-mentioned mixed photoinitiator, and if the total content of these four linking sites is less than 92%, the sensitivity will obviously become lower.
- CN1292892A mentioned a HABI photoinitiator used in photoresist photopolymerization systems, namely 2,2',5-tris(o-chlorophenyl)-4-( 3,4-Dimethoxyphenyl)-4',5'-diphenyl-1,2-diimidazole, commonly referred to as "TCDM-HABI", the document mentions that the use of at least one affinity HABI with water substituents (such as methoxy) can greatly reduce the amount of sludge in the recycled developer.
- TCDM-HABI 2,2',5-tris(o-chlorophenyl)-4-( 3,4-Dimethoxyphenyl)-4',5'-diphenyl-1,2-diimidazole
- the bisimidazoles satisfying the four connection positions of 2-1', 2-3', 2'-1 and 2'-3 of the general formula (I) are preferred.
- the total mass percentage of the compound in it is more than 95%, and it is particularly preferred to have four connection positions 2-1', 2-3', 2'-1 and 2'-3 satisfying the structure represented by the general formula (I) Composition of bisimidazole compound.
- HABI photoinitiators are well-known photoinitiators in the photoresist field. They can be prepared by oxidative coupling of triarylimidazoles or substituted triarylimidazoles. The specific preparation process can be referred to, for example, US3784557, US4622286 and US4311783. There are technical records (the full text is hereby incorporated as a reference). On the basis of the existing process, adding a solvent recrystallization process can easily obtain the HABI-type mixed photoinitiator meeting the above composition requirements of the present invention.
- the solvent may be one or a combination of two or more of toluene, methanol, ethyl acetate, dichloromethane, and water.
- the preparation of the HABI-type hybrid photoinitiator can also refer to the content recorded in the applicant's previous application (application number CN201811451262.4), which is hereby incorporated in its entirety for reference.
- the photo-initiated activity of HABI compounds is affected by the electronic and stereo effects of the substituents on the aromatic ring.
- at least one ortho-substituent on the 2-position or 2'-position aryl group in the triarylimidazole or substituted triarylimidazole compound used in the synthesis of the HABI-type hybrid photoinitiator of the present invention is adsorbed.
- Electron substituents, at least one substituent on the 4-position aryl group, 4'-position aryl group, 5-position aryl group, or 5'-position aryl group has an electron-donating substituent.
- the HABI-based mixed photoinitiator has a molar extinction coefficient greater than 6000 and less than 13000 at 355-420 nm.
- the molar extinction coefficient of the initiator is less than 6000, the absorbance of the initiator is insufficient, and the curing speed of the composition becomes slow; if the molar extinction coefficient of the initiator is greater than 13000, the surface layer is cured too fast, and the deep layer curing is insufficient to cause pattern defects.
- the main product is a mixture of the hydrogen-containing N on one imidazole and the 2-position C on the other imidazole.
- the monoimidazole has an asymmetric structure, such as TCTM as follows, the structure of the product obtained by coupling itself has the same structure of 2'-1 and 2-1', 2'-3 and 2-3 The structure of 'is also the same, so its main structure is the product of 2'-1 and 2-3'.
- the main product structure is 2-1', 2-3', Two bisimidazole compounds with 2'-1 and 2'-3 connection positions.
- the HABI-based hybrid photoinitiator of the present invention may be selected from or include at least one of the following combinations:
- the photosensitive resin composition containing the above-mentioned HABI-type mixed photoinitiator has high photosensitivity in the wavelength range of 355-420nm, so that it can adapt to existing LED light sources of different wavelengths, such as 365nm, 385nm , 395nm, 405nm, making the photocurable composition suitable for many types of optical imaging equipment.
- the content of the HABI-based mixed photoinitiator is 0.1-20 parts by weight, preferably 1-15 parts by weight, more preferably 2-10 parts by weight. Within this content range, the composition can exhibit good system compatibility and excellent curing performance.
- the compound having an ethylenically unsaturated double bond can promote the formation of a film of the photosensitive resin composition.
- the compound having an ethylenically unsaturated double bond is not particularly limited, as long as a photopolymerizable compound having at least one ethylenically unsaturated bond in the molecule can be used.
- examples include: compounds obtained by reacting ⁇ , ⁇ -unsaturated carboxylic acids with polyhydric alcohols, bisphenol A (meth)acrylate compounds, ⁇ , ⁇ -unsaturated carboxylic acids, and glycidyl-containing compounds
- urethane monomers such as (meth)acrylate compounds with urethane bonds in the molecule, nonylphenoxy polyvinyloxy acrylate, ⁇ -chloro- ⁇ -hydroxypropyl - ⁇ '-(meth)acryloyloxyethyl-phthalate, ⁇ -hydroxyethyl- ⁇ '-(meth)acryloyloxyethyl-phthalate, ⁇ -hydroxypropyl- ⁇ '-(meth)
- Examples of the compound obtained by reacting the above-mentioned ⁇ , ⁇ -unsaturated carboxylic acid with a polyhydric alcohol include polyethylene glycol di(meth)acrylate having an ethylene number of 2-14, and a propylene number of 2 Polypropylene glycol di(meth)acrylate of 14, ethylene number of 2-14 and propylene number of 2-14 polyethylene ⁇ polypropylene glycol di(meth)acrylate, trimethylol Propane di(meth)acrylate, trimethylolpropane tri(meth)acrylate, EO modified trimethylolpropane tri(meth)acrylate, PO modified trimethylolpropane tri(meth)acrylate Base) acrylate, EO, PO modified trimethylolpropane tri(meth)acrylate, tetramethylolmethane tri(meth)acrylate, tetramethylolmethane tetra(meth)acrylate, two Pentaerythritol penta
- EO means ethylene oxide
- PO means propylene oxide
- a PO-modified compound means a compound having a block structure of an oxypropylene group.
- Examples of the bisphenol A-based (meth)acrylate compound include: 2,2-bis ⁇ 4-[(meth)acryloxypolyethoxy]phenyl ⁇ propane, 2,2- Bis ⁇ 4-[(meth)acryloxypolypropoxy]phenyl ⁇ propane, 2,2-bis ⁇ 4-[(meth)acryloxypolybutoxy]phenyl ⁇ propane, 2,2-Bis ⁇ 4-[(meth)acryloyloxypolyethoxypolypropoxy]phenyl ⁇ propane and the like.
- 2,2-bis ⁇ 4-[(meth)acryloyloxypolyethoxy]phenyl ⁇ propane there may be mentioned: 2,2-bis ⁇ 4-[(meth)acryloyloxy Diethoxy]phenyl ⁇ propane, 2,2-bis ⁇ 4-[(meth)acryloxytriethoxy]phenyl ⁇ propane, 2,2-bis ⁇ 4-[(methyl )Acryloyloxytetraethoxy]phenyl ⁇ propane, 2,2-bis ⁇ 4-[(meth)acryloxypentaethoxy]phenyl ⁇ propane, 2,2-bis ⁇ 4- [(Meth)acryloyloxyhexaethoxy]phenyl ⁇ propane, 2,2-bis ⁇ 4-[(meth)acryloyloxyheptethoxy]phenyl ⁇ propane, 2,2- Bis ⁇ 4-[(meth)acryloyloxyoctaethoxy]phenyl ⁇ propane, 2,2-bis ⁇
- the number of oxyethylene groups in one molecule of the 2,2-bis ⁇ 4-[(meth)acryloyloxypolyethoxy]phenyl ⁇ propane is preferably 4-20, and more preferably 8-15. These compounds may be used alone or in combination of two or more kinds.
- the (meth)acrylate compound having a urethane bond in the molecule a (meth)acrylic monomer having an OH group at the ⁇ -position and a diisocyanate compound (isophorone diisocyanate, 2 ,6-toluene diisocyanate, 2,4-toluene diisocyanate, 1,6-hexamethylene diisocyanate, etc.) addition reaction product, tris((meth)acryloyloxytetraethylene glycol isocyanate) ] Hexamethylene isocyanurate, EO modified urethane di(meth)acrylate, PO modified urethane di(meth)acrylate, EO, PO modified urethane di(meth)acrylic acid Ester etc. These compounds may be used alone or in combination of two or more kinds.
- nonylphenoxy polyvinyloxy acrylate nonylphenoxy tetravinyloxy acrylate, nonylphenoxy pentavinyloxy acrylate, nonylphenoxy hexaethylene Oxyacrylate, nonylphenoxy heptavinyloxy acrylate, nonylphenoxy octavinyloxy acrylate, nonylphenoxy nonavinyloxy acrylate, nonylphenoxydecaethyleneoxy Acrylate, nonylphenoxyundecenyloxy acrylate, etc. These compounds may be used alone or in combination of two or more kinds.
- phthalic acid compound examples include: ⁇ -chloro- ⁇ -hydroxypropyl- ⁇ '-(meth)acryloyloxyethyl phthalate, ⁇ -hydroxyalkyl- ⁇ '-(Meth)acryloyloxyalkyl phthalate, etc. These compounds may be used alone or in combination of two or more kinds.
- the alkyl (meth)acrylate may, for example, be methyl (meth)acrylate, ethyl (meth)acrylate, n-propyl (meth)acrylate, isopropyl (meth)acrylate, N-Butyl (meth)acrylate, sec-butyl (meth)acrylate, tert-butyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, phenyl (meth)acrylate, (methyl) ) Isobornyl acrylate, hydroxymethyl (meth)acrylate, hydroxyethyl (meth)acrylate, hydroxypropyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, (meth)acrylic acid 2-hydroxypropyl ester, benzyl (meth)acrylate, amyl (meth)acrylate, tetrahydrofurfuryl (meth)acrylate, isooctyl (meth)
- These compounds may be used alone or in combination of two or more kinds.
- the compound having an ethylenically unsaturated double bond is preferably a bisphenol A-based (meth)acrylate compound and a (meth)acrylate compound having a urethane bond in the molecule. From the viewpoint of improving sensitivity and resolution, bisphenol A-based (meth)acrylate compounds are preferred.
- the content of the compound having an ethylenically unsaturated double bond is 25-99 parts by weight, preferably 55-90 parts by weight.
- the photosensitive resin composition of the present invention further includes a hydrogen donor.
- the bisimidazole compounds are cleaved after exposure to light, and the monoimidazole radicals produced are larger in volume. The steric hindrance makes the activity less, and it is difficult to initiate monomer polymerization alone. If used in conjunction with hydrogen donors, the monoimidazole radicals are easy The active hydrogen on the hydrogen donor is taken away to generate new active free radicals, which in turn initiates monomer polymerization.
- suitable hydrogen donors may be amines or amine-modified compounds, thiol-based compounds, which have available hydrogen connected to the carbon adjacent to the heteroatom. These compounds can be used alone or in combination of two or more of them.
- the amine compound may be an aliphatic amine, a cycloaliphatic amine, an aromatic amine, an aromatic-aliphatic amine, a heterocyclic amine, an oligomeric amine, or a polymeric amine.
- They can be primary, secondary or tertiary amines, such as butylamine, dibutylamine, tributylamine, cyclohexylamine, benzyldimethylamine, dicyclohexylamine, N-phenylglycine, tributylamine, Ethylamine, phenyl-diethanolamine, triethanolamine, piperidine, piperazine, morpholine, pyridine, quinoline, dimethylaminobenzoate, Michler'sketone (4,4'-di- Dimethylaminobenzophenone), and corresponding derivatives.
- primary, secondary or tertiary amines such as butylamine, dibutylamine, tributylamine, cyclohexylamine, benzyldimethylamine, dicyclohexylamine, N-phenylglycine, tributylamine, Ethylamine, phenyl-diethanolamine, triethanolamine
- Amine-modified compounds such as amine-modified acrylate compounds can be used as hydrogen donors.
- Examples of such amine-modified acrylate compounds include acrylates modified by reaction with primary or secondary amines, such as those disclosed in US3,844,916, EP280222, US5,482,649 or US5,734,002, here The full text is incorporated as a reference.
- preferred amines or amine-modified compounds are: EsacureA198 (bis-N,N-[4-dimethylaminobenzoyl)oxoethylene-1-yl]-methylamine) and EsacureEDB ( Ethyl-4-dimethylaminobenzoate) (both sold by Lamberti S.pA), 2-ethylhexyl-4-dimethylaminobenzoate and N-phenylglycine.
- the thiol compound may be a primary thiol, a secondary thiol, and a multifunctional thiol, and a secondary thiol and a multifunctional thiol are preferred.
- the thiol compound may be: 2-mercaptobenzothiazole (MBO), 2-mercaptobenzimidazole (MBI), dodecyl mercaptan, ethylene glycol bis(3-mercaptobutyrate) , 1,2-propanediol bis(3-mercaptobutyrate), diethylene glycol bis(3-mercaptobutyrate), butanediol bis(3-mercaptobutyrate), octanediol bis(3- Mercaptobutyrate), trimethylolpropane tris(3-mercaptobutyrate), pentaerythritol tetra(3-mercaptobutyrate), dipentaerythritol hexa(3-mercapto
- the content of the hydrogen donor is 0.01-15 parts by weight, preferably 0.1-15 parts by weight, more preferably 0.1-10 parts by weight, and the hydrogen donor is in accordance with the general formula (I
- the weight ratio of the HABI-based mixed photoinitiator shown in) is preferably 1:20-1:3.
- the photosensitive resin composition of the present invention may further contain other photoinitiators and/or sensitizers, so as to adjust the sensitivity of the photosensitive resin composition more flexibly through a common/synergistic effect.
- the other photoinitiators and/or sensitizers may include (but are not limited to): bisimidazoles, pyrazolines, aromatic ketones, anthraquinones, benzoin and benzoin alkyl ethers, Oxime esters, triazines, triphenylamines, coumarins, thioxanthones, acridines and other photoinitiators known to those skilled in the art. These compounds may be used alone or in combination of two or more kinds.
- bisimidazole compounds include: 2,2'-bis(o-chlorophenyl)-4,4',5,5'-tetraphenyl-diimidazole, 2,2',5-tris(ortho Chlorophenyl)-4-(3,4-dimethoxyphenyl)-4',5'-diphenyl-1,1'-diimidazole, 2,2',5-tris(2-fluoro Phenyl)-4-(3,4-dimethoxyphenyl)-4',5'-diphenyl-diimidazole, 2,2'-bis(2,4-dichlorophenyl)-4 ,4',5,5'-tetraphenyl-diimidazole, 2,2'-bis(2-fluorophenyl)-4-(o-chlorophenyl)-5-(3,4-dimethoxy Phenyl)-4',5'-diphenyl-diimidazole, 2,2'
- pyrazoline compounds include: 1-phenyl-3-(4-tert-butylstyryl)-5-(4-tert-butylphenyl)pyrazoline, 1-phenyl-3 -Biphenyl-5-(4-tert-butylphenyl)pyrazoline, ethoxylated (9) trimethylol pyrazoline ester, ethoxylated (10) bisphenol A pyrazoline ester And its analogues.
- These pyrazoline compounds may be used alone or in combination of two or more kinds.
- the aromatic ketone compounds include: acetophenone, 2,2-dimethoxy-2-phenylacetophenone, 2,2-diethoxy-2-phenylacetophenone, 1 ,1-Dichloroacetophenone, benzophenone, 4-benzoyl diphenyl sulfide, 4-benzoyl-4'-methyl diphenyl sulfide, 4-benzoyl-4'-ethyl Diphenyl sulfide, 4-benzoyl-4'-propyl diphenyl sulfide, 4,4'-bis(diethylamino)benzophenone, 4-p-toluene mercaptobenzophenone, 2 ,4,6-Trimethylbenzophenone, 4-methylbenzophenone, 4,4'-bis(dimethylamino)benzophenone, 4,4'-bis(methyl, ethyl Amino) benzophenone, acetophenone dimethyl ketal, benzil dimethyl ket
- anthraquinone compounds include: 2-phenylanthraquinone, 2,3-diphenylanthraquinone, 1-chloroanthraquinone, 2-methylanthraquinone, 2,3-dimethylanthraquinone, 2-ethylanthracene-9,10-diethyl, 1,2,3-trimethylanthracene-9,10-dioctyl, 2-ethylanthracene-9,10-bis(4-chlorobutyric acid Methyl ester), 2-(3-((3-ethyloxetan-3-yl)methoxy)-3-oxopropyl)anthracene-9,10-diethyl, 9,10 -Dibutoxyanthracene, 9,10-diethoxy-2-ethylanthracene, 9,10-bis(3-chloropropoxy)anthracene, 9,10-bis(2-hydroxyethylmer
- benzoin and benzoin alkyl ether compounds include: benzoin methyl ether, benzoin ethyl ether, benzoin phenyl ether and the like. These benzoin and benzoin alkyl ether compounds may be used alone or in combination of two or more kinds.
- the oxime ester compounds include: 1-(4-phenylthiophenyl)-n-octane-1,2-dione-2-benzoic acid oxime ester, 1-(6-(2-methyl Benzoyl)-9-ethylcarbazol-3-yl)-ethane-1-one-oxime acetate, 1-(6-(2-methylbenzoyl)-9-ethylcarbazole- 3-yl)-butane-1-one-oxime acetate, 1-(6-(2-methylbenzoyl)-9-ethylcarbazol-3-yl)-propan-1-one-acetic acid Oxime ester, 1-(6-(2-methylbenzoyl)-9-ethylcarbazol-3-yl)-1-cyclohexyl-methane-1-one-acetoxime ester, 1-(6- (2-methylbenzoyl)-9-ethylcarbazol-3-yl)-3-cyclopenty
- triazine compounds include: 2-(4-ethylbiphenyl)-4,6-bis(trichloromethyl)-1,3,5-triazine, 2-(3,4-ethylene Methoxyphenyl)-4,6-bis(trichloromethyl)-1,3,5-triazine, 3- ⁇ 4-[2,4-bis(trichloromethyl)-s-triazine -6-yl]phenylthio)propionic acid, 1,1,1,3,3,3-hexafluoroisopropyl-3- ⁇ 4-[2,4-bis(trichloromethyl)-s- Triazine-6-yl]phenylthio ⁇ propionate, ethyl-2- ⁇ 4-[2,4-bis(trichloromethyl)-s-triazin-6-yl]phenylthio ⁇ ethyl Ester, 2-ethoxyethyl-2- ⁇ 4-[2,4-bis(trichloromethyl)-s-triazin-6-y
- the triphenylamine compound includes: N,N-bis-[4-(2-styryl-1-yl)-phenyl]-N,N-bis(2-ethyl-6methylbenzene) Yl)-1,1-bisphenyl-4,4-diamine, N,N-bis-[4-(2-styryl-1-yl)-4′-methylphenyl]-N, N-bis(2-ethyl-6methylphenyl)-1,1-bisphenyl-4,4-diamine and its analogs.
- These triphenylamine compounds may be used alone or in combination of two or more kinds.
- the coumarin compound includes: 3,3'-carbonyl bis(7-diethylamine coumarin), 3-benzoyl-7-diethylamine coumarin, 3,3'-carbonyl Bis(7-methoxycoumarin), 7-(diethylamino)-4-methylcoumarin, 3-(2-benzothiazole)-7-(diethylamino)coumarin , 7-(diethylamino)-4-methyl-2H-1-benzopyran-2-one (7-(diethylamino)-4-methylcoumarin), 3-benzoyl- 7-Methoxycoumarin and its analogues.
- These coumarin compounds can be used alone or in combination of two or more kinds.
- thioxanthone compounds include: thioxanthone, 2,4-dimethylthioxanthone, 2,4-diethylthioxanthone, 2,4-diisopropylthioxanthone, 2 -Chlorothioxanthone, 1-chloro-4-propoxythioxanthone, isopropylthioxanthone, diisopropylthioxanthone and the like. These thioxanthone compounds may be used alone or in combination of two or more kinds.
- acridine compounds include: 9-phenyl acridine, 9-p-methylphenyl acridine, 9-m-methylphenyl acridine, 9-o-chlorophenyl acridine, 9-o-fluoro Phenyl acridine, 2-ethyl-2-(hydroxymethyl)-1,3-propanediol ether cycloethane ether [4-(9-acridinyl)phenoxy]acetate (ie PAD107, Produced by Changzhou Qiangli Electronic New Materials Co., Ltd.), 1,7-bis(9-acridinyl)heptane, 9-ethylacridine, 9-(4-bromophenyl)acridine, 9-(3 -Chlorophenyl) acridine, 1,7-bis(9-acridine)heptane, 1,5-bis(9-acridinepentane), 1,3
- the content of the other photoinitiator and/or sensitizer is not more than 8 parts by weight.
- the photosensitive resin composition of the present invention may also contain appropriate amounts of other auxiliary agents as needed.
- the auxiliary agent may include at least one of organic solvents, dyes, pigments, light developers, fillers, plasticizers, stabilizers, coating aids, peeling accelerators, and the like.
- the organic solvent it is sufficient if it can dissolve the aforementioned components.
- it may be glycol ether solvents, alcohol solvents, ester solvents, ketone solvents, amide solvents, chlorine-containing solvents, etc., and coloring is particularly preferred. The choice is based on factors such as the solubility, coating properties, and safety of the alkali-soluble polymer.
- the organic solvent may be ethyl cellosolve (ethylene glycol monoethyl ether), methyl cellosolve (ethylene glycol monomethyl ether), butyl cellosolve (ethylene glycol monobutyl ether), Methyl methoxybutanol (3-methyl-3-methoxybutanol), butyl carbitol (diethylene glycol monobutyl ether), ethylene glycol monoethyl ether acetate, ethylene two Alcohol mono-tert-butyl ether, propylene glycol monomethyl ether acetate, propylene glycol monomethyl ether (1-methoxy-2-propanol), propylene glycol monoethyl ether (1-ethoxy-2-propanol) ), propylene glycol monoethyl ether acetate, ethyl acetate, n-butyl acetate, isobutyl acetate, cellosolve acetate (ethylene glycol monomethyl ether), but
- dyes, pigments and light developer can be: tris(4-dimethylaminophenyl)methane, tris(4-dimethylamino-2-methylphenyl)methane, fluoran dye , Toluenesulfonic acid monohydrate, basic fuchsin, phthalocyanine green and phthalocyanine blue and other phthalocyanine series, auramine base, para-fuchsin, crystal violet, methyl orange, Nile blue 2B, Victoria blue, malachite green , Diamond Green, Basic Blue 20, Brilliant Green, Eosin, Ethyl Violet, Erythrosine Sodium B, Methyl Green, Phenolphthalein, Alizarin Red S, Thymolphthalein, Methyl Violet 2B, Quinidine Red , Rose Bengal Sodium Agar, Mitanil Yellow, Thymol Sulfophthalein, Xylenol Blue, Methyl Orange, Orange IV, Diphenyl Flow Carbach
- fillers such as silica, alumina, talc, calcium carbonate, and barium sulfate (not including the above-mentioned inorganic pigments).
- the filler can be used alone or in a mixture of two or more.
- phthalic acid such as dibutyl phthalate, diheptyl phthalate, dioctyl phthalate, diallyl phthalate, etc.
- Ester glycol esters such as triethylene glycol diacetate, tetraethylene glycol diacetate, sulfonamides such as p-toluenesulfonamide, benzenesulfonamide, n-butylbenzenesulfonamide, triphenyl phosphate, triphenyl Methyl phosphate, triethyl phosphate, triphenyl phosphate, tricresyl phosphate, tricresyl phosphate, tolyl diphenyl phosphate, tricresyl phosphate, 2-naphthyl phosphate Phenyl phosphate, tolyl di-2,6-xylyl phosphate, aromatic condensed phosphate, tris(chloropropyl esters, glycol
- a stabilizer for example, it can be: hydroquinone, 1,4,4-trimethyl-diazobicyclo(3.2.2)-non-2-ene-2,3-dioxide, 1- Phenyl-3-pyrazolidinone, p-methoxyphenol, alkyl and aryl substituted hydroquinone and quinone, tert-butylcatechol, 1,2,3-benzenetriol, copper resinate, naphthylamine , ⁇ -naphthol, cuprous chloride, 2,6-di-tert-butyl-p-cresol, phenothiazine, pyridine, nitrobenzene, dinitrobenzene, p-toluoquinone and chloranil.
- the stabilizer can be used singly or in combination of two or more.
- a coating aid considering safety and versatility, it can be: acetone, methanol, methyl alcohol, ethyl alcohol, isopropyl alcohol, methyl ethyl ketone, propylene glycol monomethyl ether acetate, Ethyl lactate, cyclohexanone, ⁇ -butyrolactone, dichloromethane, etc.
- the coating aids can be used alone or in combination of two or more.
- peeling accelerator exemplarily, benzenesulfonic acid, toluenesulfonic acid, xylenesulfonic acid, phenolsulfonic acid, methyl, propyl, heptyl, octyl, decyl, dodecyl Alkylbenzene sulfonic acid and so on.
- the peeling accelerator may be used alone or in combination of two or more.
- the total content of the auxiliary agent does not exceed 10 parts by weight.
- the wavelength of the LED light source is in the range of 355-420nm, which can be 365nm, 385nm, 395nm, 405nm, etc.
- the above-mentioned photosensitive resin composition of the present invention can be used as an ink and coating composition for coating metal surfaces, wood surfaces, paper surfaces, plastic surfaces, and the like.
- flexographic printing, offset printing, gravure printing or inkjet printing methods can be used to coat the ink or coating composition, and then be cured by radiation.
- the aforementioned photosensitive resin composition of the present invention can be cured in the presence of oxygen, thereby eliminating the need to provide an inert oxygen-free environment during curing to prevent oxygen inhibition.
- Figure 1 is a high performance liquid chromatogram of product A1.
- Figure 2 is the structure spectrum obtained by single crystal diffraction of BCIM.
- TAI 4-(4,5-Dimethoxyphenyl)-imidazole
- Figure 1 is a high performance liquid chromatogram of product A1. The analysis results show that the total peak content of the four connection positions of 2-1', 2-3', 2'-1 and 2'-3 is 92.5%.
- the product A1 is a mixture of two different monoimidazoles (ie INC, TAI) through self-coupling and mutual coupling, including BCIM, TCTM and TCDM.
- BCIM monoimidazoles
- TCTM TCTM
- TCDM TCDM
- BCIM has only one peak in the liquid phase, but two peak shapes are obtained by single crystal diffraction, see Figure 2. Combining the structural characteristics, it can be determined that the main product of the coupling of two monoimidazoles is a mixture of hydrogen-containing N on one imidazole and C on the 2 position of the other imidazole, which indicates that the structure of BCIM is the present invention.
- the imidazole used to synthesize BCIM is INC, which is a symmetrical imidazole, so the 2'-1 and 2'-3 obtained by coupling are similar in polarity, and it is difficult to separate the liquid phase.
- the structure of the product obtained by its own coupling has the same structure of 2'-1 and 2-1', and the structure of 2'-3 and 2-3' are also the same, so the main structure of BCIM is 2' -1 and 2'-3 two link products, the structural formulas are as follows, respectively BCIM1: 2,2'-bis(o-chlorophenyl)-4,4',5,5'-tetraphenyl- 1,2'-Diimidazole and BCIM2: 2,2'-bis(o-chlorophenyl)-4,4',5,5'-tetraphenyl-2',3-diimidazole;
- TCTM is synthesized by asymmetric monoimidazole coupling. There are theoretically eight main structures connected by 1-2 and 2-3 link positions, but for self-coupled monoimidazole, the 2'-1 and 2-1' structures in the structure are the same , 2'-3 and 2-3' have the same structure, so for TCTM, there are actually four main structures connected by 1-2 and 2-3 connection positions.
- TCTM1 2,2',5,5'-tetra(o-chlorophenyl)-4,4'-bis(3,4-dimethoxyphenyl)-2',3-diimidazole
- TCTM2 2 ,2',4,5'-Tetra(o-chlorophenyl)-4',5-bis(3,4-dimethoxyphenyl)-1,2'-diimidazole
- TCTM3 2,2' ,5,5'-Tetra(o-chlorophenyl)-4,4'-bis(3,4-dimethoxyphenyl)-1,2'-diimidazole
- TCTM4 2,2',4, 5'-Tetra(o-chlorophenyl)-4',5-bis(3,4-dimethoxyphenyl)-2',3-diimidazole, the structure is as follows:
- TCDM is formed by the coupling of INC and TAI.
- the main structure of the separated pure TCDM in the liquid phase is the product with four connection positions, and the LCMS confirms the structure of the product with the four connection positions.
- Mass spectrometry analysis uses the software attached to the instrument to obtain molecular fragment peaks of 755 and 756.
- the molecular weight of the product is 754, which is consistent with T+1 and T+2, which proves that the four products are similar in structure and have the same molecular weight.
- TCDM is formed by two-by-two connection of symmetrical imidazole INC and asymmetrical imidazole TAI. There are four main structures connected at the 1-2 and 2-3 connection positions, and their compositions are:
- TCDM1 2,2',5-tris(o-chlorophenyl)-4-(3,4-dimethoxyphenyl)-4',5'-diphenyl-1,2'-diimidazole
- TCDM2 2,2',5-tris(o-chlorophenyl)-4-(3,4-dimethoxyphenyl)-4',5'-diphenyl-2',3-diimidazole
- TCDM3 2,2',5-tris(o-chlorophenyl)-4-(3,4-dimethoxyphenyl)-4',5'-diphenyl-2,3'-diimidazole
- TCDM4 2,2',5-tris(o-chlorophenyl)-4-(3,4-dimethoxyphenyl)-4',5'-diphenyl-1',2-diimidazole
- the product A1 is a combination of BCIM (BCIM1, BCIM2), TCTM (TCTM1, TCTM2, TCTM3, TCTM4) and TCDM (TCDM1, TCDM2, TCDM3, TCDM4), which consists of 2-1', 2
- BCIM1, BCIM2 BCIM1
- TCTM1, TCTM2, TCTM3, TCTM4 TCDM1, TCDM2, TCDM3, TCDM4
- the test method of molar extinction coefficient is:
- IR spectra acquired by Fourier transform infrared spectroscopy, and assigned to the acrylic double bond at 1408cm -1 and 810cm -1 peak area peak area before and after the light was measured using IR software.
- the degree of reduction (%) of the peak area is calculated, thereby quantifying the degree of polymerization and further quantifying the efficiency of the photoinitiator.
- the greater the reduction (%) of the peak area the higher the double bond conversion rate per unit time and the better the sensitivity of the initiator.
- test results are shown in the following table, expressed as the reduction degree (%) of the peak area within 3S.
- the above-mentioned HABI-type mixed photoinitiators (A1, A2, A3, and A3) of the present invention have a sensitivity similar to that of TPO and ITX.
- the comparative examples (A4 and A) due to low solubility affect the In the formulation, although the solubility of the comparative examples (A6, A7, A8) is equivalent to that of the examples, the sensitivity is lower than that of the examples, and cannot achieve the effects of TPO and ITX; the comparative examples (A9, A10) are due to The substitution position does not comply with the substitution rule of the present invention, and the sensitivity is low under UVLED, and it is difficult to apply.
- N-PG hydrogen donor 1 part by weight.
- the sample of the composition to be tested was stirred evenly in the dark, sampled on the PET substrate, coated with 25# wire rod to form a coating film with a thickness of 25 ⁇ m, and then used an LED light source (radiation wavelength of 385nm, exposure 240mj/cm 2 ) The coating film is cured by radiation.
- the curing of each formula is examined from two aspects: surface dryness and bottom dryness.
- surface dryness Refer to the paint film drying time test standard GB/T 1728-1979 in the finger touch method to evaluate the surface curing, that is, lightly touch the coating with your fingers, and the surface is smooth, and the hands are not sticky to indicate that the surface is cured completely; the finger pull method is used to measure the bottom curing , That is, use your nails to gently pull the coating, and no peeling, no bottoming out indicates that the bottom layer is completely cured.
- Yellowing test Use UVA (340) lamp as the light source, and place the exposed cured film test panel at a temperature of (120 ⁇ 5)°C, irradiance of 0.68W/m2, and dry (non-condensing) fluorescent ultraviolet In the aging machine, the whole process maintains continuous light for 168 hours. After the light is over, take it out and compare it with the test panel after the initial TPO exposure. Use a colorimeter to measure the color change. The color change value unit is ⁇ E*. The smaller the measured value, the closer the color.
- the above-mentioned HABI-type mixed photoinitiator of the present invention has better surface drying effect, lower odor and lower yellowness, whether compared with A9 or the prior art TPO and ITX. Change, safer to use.
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Polymerisation Methods In General (AREA)
- Materials For Photolithography (AREA)
- Paints Or Removers (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
Abstract
Description
Claims (15)
- HABI类混合光引发剂在UVLED光固化中的应用,其特征在于,使用的感光性树脂组合物包含下列组分:(a)0.1-20重量份的HABI类混合光引发剂,具有如通式(I)所示结构,其中含有2-1’、2-3’、2’-1和2’-3四种连接位的双咪唑化合物,且该四种连接位的双咪唑化合物在HABI类混合光引发剂中的总质量百分含量为92%以上,其中,Ar 1、Ar 2、Ar 3、Ar 4、Ar 5、Ar 6可以相同也可以不同,各自独立地表示取代或未取代的芳基;并且其中,2-位或2’-位芳基上至少有一个邻位取代基为吸电子取代基,4-位芳基或4’-位芳基或5-位芳基或5’-位芳基上至少有一个取代基有供电子取代基;所述HABI类混合光引发剂在355-420nm处摩尔消光系数大于6000且小于13000;(b)25-99重量份的至少一种具有烯属不饱和双键的化合物;(c)0.01-15重量份的供氢体,所述供氢体与通式(I)所示的HABI类混合光引发剂的重量比为1:20-1:1。
- 根据权利要求1所述的应用,其特征在于:通式(I)中,所述芳基是苯基。
- 根据权利要求1所述的应用,其特征在于:通式(I)中,芳基上的吸电子取代基选自卤素、硝基、氰基、胺基,芳基上的供电子取代基选自甲氧基、C 3-C 10的支链烷基或链烯基。
- 根据权利要求1或2所述的应用,其特征在于:通式(I)中,Ar 1、Ar 2、Ar 3、Ar 4、Ar 5、Ar 6中至少一个是含有卤素取代基的芳基;优选地,卤素取代基为氯。
- 根据权利要求1所述的应用,其特征在于:作为HABI类混合光引发剂,满足通式(I)所示结构的2-1’、2-3’、2’-1和2’-3四种连接位的双咪唑化合物在其中的总质量百分含量为95%以上。
- 根据权利要求1或5所述的应用,其特征在于:所述HABI类混合光引发剂由满足通式(I)所示结构的2-1’、2-3’、2’-1和2’-3四种连接位的双咪唑化合物组成。
- 根据权利要求1所述的应用,其特征在于:所述具有烯属不饱和双键的化合物选自α,β-不饱和羧酸与多元醇反应而得的化合物、双酚A类(甲基)丙烯酸酯化合物、α,β-不饱和羧酸与含缩水甘油基的化合物反应而得的化合物、分子内具有氨酯键的(甲基)丙烯酸酯化合物、壬基苯氧基多乙烯氧基丙烯酸酯、γ-氯-β-羟基丙基-β’-(甲基)丙烯酰氧基乙基-邻苯二甲酸酯、β-羟基乙基-β’-(甲基)丙烯酰氧基乙基-邻苯二甲酸酯、β-羟基丙基-β’-(甲基)丙烯酰氧基乙基-邻苯二甲酸酯、苯二甲酸类化合物、(甲基)丙烯酸烷基酯。
- 根据权利要求1或7所述的应用,其特征在于:所述具有烯属不饱和双键的化合物选自双酚A类(甲基)丙烯酸酯化合物和分子内具有氨酯键的(甲基)丙烯酸酯化合物。
- 根据权利要求1所述的应用,其特征在于:所述供氢体是胺或胺改 性化合物、硫醇类化合物,它们具有与杂原子相邻的碳连接的有效氢。
- 根据权利要求9所述的应用,其特征在于:所述胺或胺改性化合物选自EsacureA198、EsacureEDB、2-乙基己基-4-二甲基氨基苯甲酸酯和N-苯基甘氨酸中的至少一种。
- 根据权利要求9所述的应用,其特征在于:所述硫醇类化合物选自乙二醇双(3-巯基丁酸酯)、1,2-丙二醇双(3-巯基丁酸酯)、乙二醇双(2-巯基异丁酸酯)、1,2-丙二醇双(2-巯基异丁酸酯)、季戊四醇四(3-巯基丙酸酯)中的至少一种。
- 根据权利要求1所述的应用,其特征在于:所述供氢体与通式(I)所示的HABI类混合光引发剂的重量份比值为1:20-1:3。
- 根据权利要求1所述的应用,其特征在于:所述感光性树脂组合物中还可含有其它光引发剂和/或增感剂。
- 根据权利要求1所述的应用,其特征在于:所述应用中,UVLED光源的波长在355-420nm范围内,包括365nm、385nm、395nm、405nm。
- 根据权利要求1所述的应用,其特征在于:所述感光性树脂组合物作为油墨和涂料组合物使用。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020217035062A KR102648080B1 (ko) | 2019-03-29 | 2020-03-26 | Habi계 혼합 광개시제의 uvled 광경화에서의 응용 |
JP2021557999A JP7223456B2 (ja) | 2019-03-29 | 2020-03-26 | Habi類混合光開始剤のuvled光硬化への応用 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201910248385.6 | 2019-03-29 | ||
CN201910248385.6A CN111752091B (zh) | 2019-03-29 | 2019-03-29 | Habi类混合光引发剂在uvled光固化中的应用 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2020200019A1 true WO2020200019A1 (zh) | 2020-10-08 |
Family
ID=72664946
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/CN2020/081292 WO2020200019A1 (zh) | 2019-03-29 | 2020-03-26 | Habi类混合光引发剂在uvled光固化中的应用 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP7223456B2 (zh) |
KR (1) | KR102648080B1 (zh) |
CN (1) | CN111752091B (zh) |
WO (1) | WO2020200019A1 (zh) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN114349886A (zh) * | 2022-01-13 | 2022-04-15 | 苏州大学 | 一种基于分子开关的光控自由基聚合方法 |
CN114751861A (zh) * | 2022-04-07 | 2022-07-15 | 浙江扬帆新材料股份有限公司 | 一种含有吡唑啉和n,n-二烷基苯甲酸酯的分子内敏化大分子光引发剂及其制备方法和用途 |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112062721B (zh) * | 2019-05-23 | 2023-06-30 | 常州正洁智造科技有限公司 | 能够提升体系稳定性的habi类光引发剂及其应用 |
CN115128899A (zh) * | 2021-03-26 | 2022-09-30 | 常州正洁智造科技有限公司 | 一种具有提升的体系色相稳定性的感光性树脂组合物 |
CN113121726A (zh) * | 2021-04-20 | 2021-07-16 | 优缔贸易(上海)有限公司 | 含有双咪唑类光引发剂的组合物及其应用 |
CN116014313A (zh) | 2021-10-22 | 2023-04-25 | 株式会社Lg新能源 | 圆筒形电池、包括它的电池组及汽车 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101135852A (zh) * | 2006-08-31 | 2008-03-05 | 富士胶片株式会社 | 图案形成材料及图案形成方法 |
CN101418051A (zh) * | 2008-12-01 | 2009-04-29 | 常州强力电子新材料有限公司 | 一种含有不对称性六芳基双咪唑光引发剂及其制备方法 |
CN102385246A (zh) * | 2010-09-01 | 2012-03-21 | 富士胶片株式会社 | 着色感光性组合物、滤色器的制造方法、滤色器及液晶显示装置 |
CN102888180A (zh) * | 2012-10-09 | 2013-01-23 | 深圳市深赛尔股份有限公司 | 抗菌紫外光固化涂料及其制备方法 |
JP2015038607A (ja) * | 2013-07-16 | 2015-02-26 | 三菱化学株式会社 | 感光性組成物、硬化物、スペーサー及び画像表示装置 |
CN108121159A (zh) * | 2016-11-29 | 2018-06-05 | 常州强力电子新材料股份有限公司 | 一种感光性树脂组合物及其应用 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH1036354A (ja) * | 1996-07-19 | 1998-02-10 | Nippon Kayaku Co Ltd | ヘキサアリールビスイミダゾール類の製造方法 |
US6180319B1 (en) * | 1998-03-11 | 2001-01-30 | E. I. Du Pont De Nemours And Company | Process for the continuous liquid processing of photosensitive compositions having reduced levels of residues |
JP4327413B2 (ja) * | 2002-06-07 | 2009-09-09 | 昭和電工株式会社 | 光重合開始剤組成物及びそれを含む光重合性組成物 |
CN101302257A (zh) * | 2008-06-03 | 2008-11-12 | 江南大学 | 一种紫外光敏复合引发体系及其应用 |
CN103339566B (zh) * | 2011-02-10 | 2016-04-13 | 富士胶片株式会社 | 化合物、着色硬化性组成物、彩色滤光片及其制造方法、液晶显示装置及固体摄像元件 |
WO2014045818A1 (ja) * | 2012-09-20 | 2014-03-27 | 富士フイルム株式会社 | 光重合方法、インクセット、画像形成方法、インク組成物並びにこれらに用いる光重合開始剤および水溶性ビイミダゾール |
JP6159309B2 (ja) * | 2014-01-31 | 2017-07-05 | 富士フイルム株式会社 | 着色組成物、硬化膜、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子および画像表示装置 |
EP3685231A4 (en) * | 2017-09-18 | 2021-06-09 | The Regents Of The University Of Colorado, A Body Corporate, A Colorado Non-Profit | 3D PRINTING WITH POLYMERIC NANOGEL PARTICLES |
-
2019
- 2019-03-29 CN CN201910248385.6A patent/CN111752091B/zh active Active
-
2020
- 2020-03-26 KR KR1020217035062A patent/KR102648080B1/ko active IP Right Grant
- 2020-03-26 JP JP2021557999A patent/JP7223456B2/ja active Active
- 2020-03-26 WO PCT/CN2020/081292 patent/WO2020200019A1/zh active Application Filing
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101135852A (zh) * | 2006-08-31 | 2008-03-05 | 富士胶片株式会社 | 图案形成材料及图案形成方法 |
CN101418051A (zh) * | 2008-12-01 | 2009-04-29 | 常州强力电子新材料有限公司 | 一种含有不对称性六芳基双咪唑光引发剂及其制备方法 |
CN102385246A (zh) * | 2010-09-01 | 2012-03-21 | 富士胶片株式会社 | 着色感光性组合物、滤色器的制造方法、滤色器及液晶显示装置 |
CN102888180A (zh) * | 2012-10-09 | 2013-01-23 | 深圳市深赛尔股份有限公司 | 抗菌紫外光固化涂料及其制备方法 |
JP2015038607A (ja) * | 2013-07-16 | 2015-02-26 | 三菱化学株式会社 | 感光性組成物、硬化物、スペーサー及び画像表示装置 |
CN108121159A (zh) * | 2016-11-29 | 2018-06-05 | 常州强力电子新材料股份有限公司 | 一种感光性树脂组合物及其应用 |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN114349886A (zh) * | 2022-01-13 | 2022-04-15 | 苏州大学 | 一种基于分子开关的光控自由基聚合方法 |
CN114349886B (zh) * | 2022-01-13 | 2022-11-08 | 苏州大学 | 一种基于分子开关的光控自由基聚合方法 |
CN114751861A (zh) * | 2022-04-07 | 2022-07-15 | 浙江扬帆新材料股份有限公司 | 一种含有吡唑啉和n,n-二烷基苯甲酸酯的分子内敏化大分子光引发剂及其制备方法和用途 |
CN114751861B (zh) * | 2022-04-07 | 2023-10-20 | 浙江扬帆新材料股份有限公司 | 一种含有吡唑啉和n,n-二烷基苯甲酸酯的分子内敏化大分子光引发剂及制备方法和用途 |
Also Published As
Publication number | Publication date |
---|---|
JP7223456B2 (ja) | 2023-02-16 |
KR102648080B1 (ko) | 2024-03-18 |
JP2022528234A (ja) | 2022-06-09 |
CN111752091A (zh) | 2020-10-09 |
CN111752091B (zh) | 2022-09-06 |
KR20210142189A (ko) | 2021-11-24 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
WO2020200019A1 (zh) | Habi类混合光引发剂在uvled光固化中的应用 | |
CN102010475B (zh) | 光聚合引发剂及感光性组合物 | |
JP7264535B2 (ja) | ヘキサアリールビスイミダゾール類混合光開始剤及び使用 | |
KR102542061B1 (ko) | 헥사아릴비스이미다졸 혼합 광개시제 | |
WO2020200020A1 (zh) | 一种六芳基双咪唑类光引发剂及其应用 | |
JP7311920B2 (ja) | システム安定性を向上できるhabi類光開始剤及びその応用 | |
TWI766645B (zh) | 乙氧基/丙氧基改性的吡唑啉有機物、其應用、光固化組合物及光刻膠 | |
EP4067998A1 (en) | Eo/po-modified 9-phenylacridine photosensitizer and application thereof | |
WO2022199625A1 (zh) | 一种具有提升的体系色相稳定性的感光性树脂组合物 | |
TWI838715B (zh) | 具有提升的體系色相穩定性的感光性樹脂組合物、包含其的感光性樹脂層疊體及其用途 | |
WO2022012317A1 (zh) | 一种吡唑啉类化合物、感光性树脂组合物及图形化方法 | |
CN116410135A (zh) | 萘乙烯基吡啶类化合物、感光性树脂组合物、其应用及图形化方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 20785062 Country of ref document: EP Kind code of ref document: A1 |
|
ENP | Entry into the national phase |
Ref document number: 2021557999 Country of ref document: JP Kind code of ref document: A |
|
NENP | Non-entry into the national phase |
Ref country code: DE |
|
ENP | Entry into the national phase |
Ref document number: 20217035062 Country of ref document: KR Kind code of ref document: A |
|
122 | Ep: pct application non-entry in european phase |
Ref document number: 20785062 Country of ref document: EP Kind code of ref document: A1 |