WO2020143261A1 - 化学机械抛光设备支撑结构及化学机械抛光设备 - Google Patents

化学机械抛光设备支撑结构及化学机械抛光设备 Download PDF

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Publication number
WO2020143261A1
WO2020143261A1 PCT/CN2019/111088 CN2019111088W WO2020143261A1 WO 2020143261 A1 WO2020143261 A1 WO 2020143261A1 CN 2019111088 W CN2019111088 W CN 2019111088W WO 2020143261 A1 WO2020143261 A1 WO 2020143261A1
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WO
WIPO (PCT)
Prior art keywords
polishing head
frame body
chemical mechanical
polishing
head frame
Prior art date
Application number
PCT/CN2019/111088
Other languages
English (en)
French (fr)
Inventor
尹影
李婷
刘福强
贾若雨
张为强
Original Assignee
北京半导体专用设备研究所（中国电子科技集团公司第四十五研究所）
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 北京半导体专用设备研究所（中国电子科技集团公司第四十五研究所） filed Critical 北京半导体专用设备研究所（中国电子科技集团公司第四十五研究所）
Publication of WO2020143261A1 publication Critical patent/WO2020143261A1/zh

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/27—Work carriers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/34—Accessories
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B41/00—Component parts such as frames, beds, carriages, headstocks
    • B24B41/02—Frames; Beds; Carriages

Definitions

  • the present disclosure relates to the technical field of polishing equipment, and in particular, to a support structure of chemical mechanical polishing equipment and chemical mechanical polishing equipment.
  • CMP chemical mechanical polishing
  • the structure is complex and the cost is high; the polishing quality is poor and the polishing efficiency is low.
  • the purpose of the present disclosure is, for example, to provide a support structure for chemical mechanical polishing equipment, which is simple in structure, disperses the load bearing of the central pillar, the polishing head frame body is relatively fixed to the working platform, does not change in displacement, and extends the service life.
  • Another object of the present disclosure is, for example, to provide a chemical mechanical polishing device.
  • An embodiment of the present disclosure provides a support structure for a chemical mechanical polishing device, including a polishing head frame body and a central column configured to support the polishing head frame body, the polishing head frame body includes a junction with the polishing head frame body A plurality of brackets in the center, the central column is located at the center of the polishing head frame body and is connected to the polishing head frame body, an end of the central column away from the polishing head frame body is configured to be mounted on a working platform, An edge support is connected to an end of each of the brackets away from the center of the polishing head frame body, the edge support is configured to cooperate with the center post to support the polishing head frame body, the edge support A working area configured to place a polishing table is formed between the central column and each of the brackets is provided with a moving rail extending toward the center of the polishing head frame body, the moving rail is configured as a polishing head moving mold The group is slidably connected to the bracket, and along the extending direction of the moving rail, there is a gap
  • the polishing head frame body and the working platform are relatively fixed, and no displacement change occurs, which improves the problem of reduced service life caused by the rotation of the existing polishing head frame body;
  • the column is placed on the working platform to support the polishing head frame body. Combined with the setting of the edge support, the force of the central column is shared, so that the polishing head frame body is placed smoothly;
  • each bracket is provided with a moving track, so that the polishing head movement module can
  • the polishing head module is driven to move relative to the bracket, and a polishing head module replacement area is reserved between the polishing table and the center column, so that the polishing head module can be loaded and unloaded in the polishing head module replacement area.
  • the polishing head frame body is detachably connected to the central column.
  • the polishing head frame body is provided with a groove matched with the central column, the central column is inserted into the groove and the end surface of the central column is in contact with the groove of the groove Bottom wall.
  • the center column is inserted into the groove, which is convenient for positioning the center column; the detachable connection of the center column and the polishing head frame body is convenient for assembling and disassembling the center column and the polishing head frame body, and the working efficiency is improved.
  • the groove bottom wall of the groove is provided with a connecting hole
  • the end surface of the central post abutting the groove bottom wall is provided with a threaded hole
  • the connecting hole and the threaded hole cooperate to be screwed Bolts configured to fix the polishing head frame body and the central post.
  • the central post is screwed to the groove.
  • the edge support is detachably connected to the bracket.
  • the assembly and replacement of the edge support member is facilitated, and the maintenance efficiency is improved.
  • the edge support and the center post are located on the same side of the polishing head frame body.
  • the edge support is located at the bottom of the polishing head frame body, and one end of the edge support supports the polishing head frame body, which increases the connection area between the edge support and the polishing head frame body, so as to better support the polishing head frame body.
  • the edge support is a plate-shaped structure, and the edge support includes a support surface configured to support the bracket, and the support surface is provided with a connection portion configured to be connected to the bracket.
  • the bracket is provided with a positioning hole configured to cooperate with the connecting portion, and the connecting portion is inserted into the positioning hole.
  • the edge support supports the support through the support surface to ensure that the edge support and the support have a certain contact area, which improves the support effect of the edge support; the edge support and the support realize the positioning connection through the cooperation of the positioning portion and the positioning hole, which improves the accuracy of the connection It is convenient for quick assembly.
  • connection part and the bracket are connected by a threaded locking member.
  • threaded locking parts facilitates the assembly and disassembly of the connecting part and the bracket, and improves the maintenance efficiency.
  • the positioning hole includes a connected first hole segment and a second hole segment, an end of the first hole segment extending away from the second hole segment extends to the bottom surface of the bracket, and the second hole segment An end remote from the first hole segment extends to the top surface of the bracket, a limit surface is formed at the connection position of the first hole segment and the second hole segment, and the threaded locking member is screwed to the The connecting portion is against the limiting surface.
  • the bracket is provided with an opening slot configured to pass through the polishing head module, and the opening slot extends from the end of the bracket toward the center of the polishing head frame body.
  • the arrangement of the opening groove enables the polishing head module to slide in the opening groove, which facilitates the assembly of the bracket and the polishing head module and the movement of the polishing head module.
  • each of the brackets is provided with two moving rails, and the two moving rails are located on the same side of the bracket and on opposite sides of the opening slot; the polishing head moving module It is configured to simultaneously slide-fit with the two moving rails located on the same bracket.
  • the two moving tracks on the same bracket are parallel.
  • the plurality of brackets are rotationally symmetrically distributed along the center of the polishing head frame body.
  • the bracket is rotationally symmetrical along the center of the polishing head frame body, so that the center column is balanced in force, which is convenient for maintaining the stability of the polishing head frame body.
  • the plurality of brackets are evenly arranged around the central axis of the polishing head frame body.
  • the number of brackets is four, and the four brackets form a cross structure.
  • the setting of four brackets makes reasonable use of the installation space.
  • An embodiment of the present disclosure also provides a chemical mechanical polishing device, including the above chemical mechanical polishing device support structure.
  • the chemical mechanical polishing equipment further includes a plurality of polishing movement modules and a plurality of polishing head modules.
  • the plurality of polishing movement modules are correspondingly arranged on the bracket and slidingly cooperate with the movement track,
  • Each polishing head moving module is connected to one polishing head module, and is configured to drive the polishing head module to reciprocate linearly along the extending direction of the moving track.
  • the polishing head moving module includes a first driving member, a slider, and a second driving member, the first driving member is connected to the slider, and the driving end of the first driving member is The polishing head module is connected and configured to drive the polishing head module to rotate; the slider is in sliding cooperation with the moving track, and the second driving member is disposed on the bracket and connected with the slider to configure To drive the slider to reciprocate linearly.
  • the present disclosure also provides a chemical mechanical polishing device, including a polishing head moving module, a polishing head module, and a chemical mechanical polishing device support structure according to an embodiment of the first aspect of the present disclosure.
  • the movable rail is slidably connected, and the polishing head module is detachably connected to the polishing head mobile module.
  • the polishing head moving module can drive the polishing head module to move along the moving rail.
  • the structure is simple and the operation is convenient, the service life of the polishing head frame body is improved, and the wafer replacement of the polishing head module is facilitated.
  • FIG. 1 is a schematic view from a first perspective of a supporting structure of a chemical mechanical polishing device according to the present disclosure
  • FIG. 2 is a schematic view from a second perspective of a supporting structure of a chemical mechanical polishing device according to the present disclosure
  • FIG. 3 is a schematic diagram of the connection between the center column of FIG. 1 and the polishing head frame body;
  • FIG. 4 is a schematic diagram of the connection between the edge support of FIG. 1 and the bracket;
  • FIG. 6 is a schematic view from a third perspective of a supporting structure of a chemical mechanical polishing device according to the present disclosure
  • FIG. 7 is a schematic structural view of a chemical mechanical polishing apparatus according to the present disclosure.
  • Icon 100-Chemical Mechanical Polishing Equipment Support Structure; 200-Chemical Mechanical Polishing Equipment; 1-Polishing Head Frame Body; 11-Bracket; 111-Positioning Hole; 1110-First Hole Segment; 1111-Second Hole Segment; 1112 Limiting surface; 112-opening groove; 113-bottom surface; 114-top surface; 12-moving rail; 13-groove; 131-connecting hole; 2-center column; 21-thread hole; 3-edge support; 31 -Support surface; 32-connecting part; 41-bolt; 42-thread locking member; 5-polishing head module replacement area; 6-polishing head moving module; 60-first driving part; 61-slider; 62 -Second drive part; 7- Polishing head module; 8- Work area.
  • the terms “inner”, “outer”, etc. indicate the orientation or positional relationship is based on the orientation or positional relationship shown in the drawings, or is usually placed when the product of the invention is used
  • the orientation or positional relationship is only for the convenience of describing the present disclosure and simplifying the description, and does not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and thus cannot be construed as a limitation to the present disclosure.
  • the terms “first”, “second”, etc. are only used to distinguish descriptions, and cannot be understood as indicating or implying relative importance.
  • connection should be understood in a broad sense, for example, it may be a fixed connection or a detachable connection, or Integrally connected; it can be a mechanical connection or an electrical connection; it can be directly connected, or it can be indirectly connected through an intermediate medium, or it can be the communication between two components.
  • setup and “connection” should be understood in a broad sense, for example, it may be a fixed connection or a detachable connection, or Integrally connected; it can be a mechanical connection or an electrical connection; it can be directly connected, or it can be indirectly connected through an intermediate medium, or it can be the communication between two components.
  • the chemical mechanical polishing device support structure 100 includes a polishing head frame body 1 and a central column 2.
  • the polishing head frame body 1 includes a plurality of brackets 11 converging at the center of the polishing head frame body 1, and each end of the bracket 11 away from the center of the polishing head frame body 1 is connected to an edge
  • the support 3 each bracket 11 is provided with a moving rail 12 extending toward the center of the polishing head frame body 1, the moving rail 12 is configured to realize a slidable connection of the polishing head moving module 6 and the bracket 11, in other words, polishing
  • the head moving module 6 is configured to slidingly cooperate with the moving rail 12 along the extending direction of the moving rail 12 to realize a sliding connection between the polishing head moving module 6 and the bracket 11.
  • the center column 2 is located at the center of the polishing head frame body 1 and is connected to the polishing head frame body 1.
  • the end of the center column 2 away from the polishing head frame body 1 is configured to be mounted on a working platform to position the polishing head frame body 1.
  • a plurality of edge supports 3 are arranged around the center column 2, and each edge support 3 and the center column 2 form a work area 8 configured to place a polishing work table.
  • each work area 8 is provided with a polishing work
  • the polishing table can be a polishing disc.
  • the polishing table in each working area 8 is located below the corresponding bracket 11 to facilitate cooperation with the polishing head moving module 6 connected to the bracket 11.
  • a polishing head module replacement area 5 is formed between the extension surfaces.
  • the polishing head module replacement area 5 is located below the bracket 11. Obviously, there is a polishing head module replacement area 5 below each bracket 11.
  • the polishing head frame body 1 and the central column 2 are relatively fixed, saving installation space, the moving rail 12 on the bracket 11 can be set for a longer stroke, and at the same time, there is a larger space between the polishing table and the central column 2, so The polishing head module replacement area 5 is formed.
  • the central column 2 is connected to the polishing head frame body 1 and is installed on a working platform, the polishing head frame body 1 is fixed relative to the working platform; the edge support 3 is connected to the polishing head frame body
  • the bracket 11 of 1 is connected to and located at the end of the bracket 11 away from the central column 2 and cooperates with the central column 2 to jointly support the polishing head frame body 1, thereby improving the stability of the polishing head frame body 1.
  • the bracket 11 is provided with a moving track 12 to facilitate the movement of the polishing head moving module 6 relative to the bracket 11, which increases the moving stroke of the polishing head moving module 6 and improves the stability of the polishing head moving module 6.
  • a gap is formed between the end of the moving rail 12 and the center column 2 to form a polishing head module replacement area 5, when the polishing head moving module 6 moves to the end of the moving rail 12 near the center column 2, and
  • the polishing head module 7 connected to the polishing head moving module 6 is located in the polishing head module replacement area 5, which is convenient for replacing the wafer on the polishing head module 7.
  • the center post 2 is detachably connected with the polishing head frame body 1.
  • the center of the polishing head frame body 1 is provided with a groove 13 matching with the center column 2, one end of the center column 2 is inserted into the groove 13, and the end surface of the center column 2 abuts the groove 13 Bottom wall of the trough.
  • the groove 13 is provided to facilitate the positioning of the center column 2; the connection mode of the center column 2 and the polishing head frame body 1 facilitates the assembly and disassembly of the center column 2 and the polishing head frame body 1 and improves the work efficiency.
  • the shape of the groove 13 and the shape of the center post 2 are set as required, and the shape and size of the two can be matched.
  • the groove 13 is a cylindrical groove
  • the center post 12 is a cylindrical rod.
  • the outer diameter of the center post 12 is equal to or slightly smaller than the inner diameter of the groove 13, so that the center post 12 is inserted into the groove 13.
  • the groove bottom wall of the groove 13 is provided with a plurality of connection holes 131, the connection holes 131 penetrate the polishing head frame body 1 in a direction perpendicular to the thickness of the polishing head frame body 1, in other words, the axis of the connection hole 131 is along
  • the groove 13 extends in the depth direction of the groove, and the end face of the center post 2 and the groove bottom wall of the groove 13 is provided with a plurality of threaded holes 21 corresponding to the connection holes 131, and the center post 2 and the polishing head frame 1 are passed through The bolts 41 in the connecting holes 131 and the corresponding screw holes 21 are locked.
  • connection way between the center column 2 and the polishing head frame body 1 can also be in other forms, for example, the outer periphery of the center column 2 is provided with external threads, the groove peripheral wall of the groove 13 is provided with internal threads, and the center column 2 and the polishing head frame body 1 Threaded fit; or, the center post 2 and the polishing head frame body 1 are interference fit; furthermore, the center post 2 and the polishing head frame body 1 are snapped or snapped on.
  • the edge support 3 is detachably connected to the bracket 11.
  • a detachable connection is adopted, which improves the assembly efficiency and facilitates the replacement of the edge support 3.
  • the edge support 3 and the center post 2 are located on the same side of the polishing head frame body 1, in other words, the edge support 3 is located on the side where the notch of the groove 13 is located.
  • the edge support 3 and the center post 2 are both located at the bottom of the polishing head frame body 1, and one end of the edge support 3 supports the polishing head frame body 1, adding the edge support 3 and the polishing head frame
  • the connection area of the body 1, the assembly of the edge support 3 and the polishing head frame body 1 are firmer, and it is convenient for supporting the polishing head frame body 1 better.
  • the edge support 3 may also be located at the end of the bracket 11, and a side of the edge support 3 near the central post 2 is connected to the end of the bracket 11.
  • the edge support 3 is a plate-shaped structure.
  • the edge support 3 includes a support surface 31 configured to support the bracket 11.
  • the bottom surface 113 of the bracket 11 overlaps the support surface 31.
  • the support surface 31 carries the support 11.
  • the weight enhances the support effect.
  • the support surface 31 is provided with a connection portion 32 configured to be connected with the bracket 11.
  • the bracket 11 is provided with a positioning hole 111 configured to be mated with the connection portion 32. The connection portion 32 is inserted into the positioning hole 111.
  • the edge support 3 supports the support 11 through the support surface 31 to ensure that the edge support 3 and the support 11 have a certain contact area, which improves the support firmness of the edge support 3; the edge support 3 and the support 11 are positioned and positioned through the connection portion 32
  • the holes 111 cooperate to realize the positioning connection, which has the function of restricting the degrees of freedom of the bracket 11 and the connecting portion 32 in the radial direction of the positioning hole 111, improving the connection accuracy and facilitating quick assembly.
  • the edge support 3 may also be arranged in a columnar structure to increase the area of the support surface 31 of the edge support 3 to facilitate stable support of the bracket 11. At the same time, the structural strength of the edge support 3 is greater, it is not easily damaged, and the service life is extended.
  • connection portion 32 and the bracket 11 are connected by a screw lock 42.
  • the positioning hole 111 includes a first hole segment 1110 and a second hole segment 1111 connected to each other. An end of the first hole segment 1110 away from the second hole segment 1111 is located on the bottom surface 113 of the bracket 11, and the second hole segment 1111 is away from the first hole segment 1110. One end is located on the top surface 114 of the bracket 11, the inner diameter of the first hole section 1110 is smaller than the inner diameter of the second hole section 1111, in other words, the first hole section 1110 and the second hole section 1111 constitute a stepped hole, the first hole section 1110 and A limiting surface 1112 is formed at the connection position of the second hole segment 1111.
  • the thread locking member 42 may be a nut, and the outer peripheral surface of the connecting portion 32 is provided with threads.
  • the connecting portion 32 is inserted from the first hole segment 1110 and extends into the second hole segment 1111.
  • the thread locking member 42 is screwed on the connecting portion 32 It is located in the second hole section 1111, and one end surface of the screw locking member 42 abuts the limiting surface 1112, thereby restricting the two degrees of freedom of the edge support 3 in the vertical direction, and the edge support 13 will not be positioned from The hole 111 falls off.
  • the connection portion 32 and the bracket 11 are locked by nuts, which facilitates the assembly and disassembly of the connection portion 32 and the bracket 11.
  • the thread locking member 42 may also be a bolt or a screw, etc.
  • the connecting portion 32 is provided with a threaded hole
  • the thread locking member 42 locks the connecting portion 32 and the bracket 11, and the thread locking member 42 abuts the limit surface
  • the user can use different thread locking members 42 according to different usage requirements, which is flexible and easy to assemble.
  • the bracket 11 is provided with an opening groove 112 configured to penetrate the polishing head module 7, and the opening groove 112 extends from the end of the bracket 11 away from the central column 2 toward the center of the polishing head frame body 1.
  • the opening groove 112 is provided along the extending direction of the moving rail 12, in other words, the opening groove 112 extends along the length direction of the bracket 11, so that the polishing head module can slide in the opening groove 112 to facilitate the bracket 11 and
  • the assembly of the polishing head module and the movement of the polishing head module are flexible.
  • the notch of the opening groove 112 is located on the end surface of the bracket 11 away from the central column 2, the groove depth of the opening groove 112 extends along the length direction of the bracket 11, and the opening groove 112 is on both sides of the groove 13 in the groove depth direction
  • the two sides of the bracket 11 respectively extend to the opposite sides of the bracket 11, that is, the two sides of the opening groove 112 in the groove depth direction of the groove 13 extend to the top surface 114 and the bottom surface 113 of the bracket 11, respectively.
  • the polishing head moving module 6 can be inserted into or removed from the slot 112 from the end of the slot 112 located on the bracket 11 away from the central column 2 to facilitate installation and replacement.
  • each bracket 11 is provided with two parallel moving guide rails 12.
  • the two parallel moving guide rails 12 are located on the same side of the bracket 11 and on opposite sides of the opening slot 112.
  • the polishing head moving module 6 simultaneously slidingly cooperates with two parallel moving guide rails 12 to improve the stability of the polishing head moving module 6.
  • the plurality of brackets 11 are rotationally symmetrically distributed along the center of the polishing head frame body 1, in other words, the plurality of brackets 11 are evenly spaced around the center axis of the polishing head frame body 1, and the arrangement of the plurality of brackets 11 is reasonable
  • the center column 2 is balanced in force and makes the polishing head frame body 1 more stable, and at the same time, it is convenient for the processing and manufacturing of the polishing head frame body 1.
  • the number of brackets 11 is four, and the four brackets 11 form a cross structure.
  • the angle between the two adjacent brackets 11 is 90°, the installation space is reasonably utilized, and at the same time, there is sufficient operating space between the two adjacent polishing tables to facilitate Operate on the corresponding polishing table.
  • the number of the brackets 11 may not be limited to four. Based on the weight of the polishing head module 7, it is convenient for the central column 2 to stably support the polishing head frame body 1.
  • the polishing head moving module 6 includes a first driving member 60, a slider 61, and a second driving member 62.
  • the first driving member 60 is connected to the slider 61, and the driving end of the first driving member 60 passes through the opening slot After 112, it is connected to the polishing head module 7 and is configured to drive the polishing head module 7 to rotate.
  • the slider 61 slidingly cooperates with the moving rail 12, the second driving member 62 is connected to the bracket 11, the driving end of the second driving member 62 is connected to the slider 61, and is configured to drive the slider 61 to slide relative to the moving rail 12, thereby driving the first A driving member 60 and the polishing head module 7 slide back and forth relative to the support 11 along the extending direction of the moving rail 12.
  • the first driving member 60 may be configured as a motor.
  • the second driving member 62 may be provided in a linear telescopic structure.
  • the second driving member 62 includes an air cylinder, a hydraulic cylinder, or a screw transmission mechanism mainly composed of a motor and a screw.
  • one end of the center column 2 is inserted into the groove 13 of the polishing head frame body 1, and the center column 2 and the polishing head frame body 1 are locked by bolts 41, and the edge support 3 is placed on The bottom of the polishing head frame body 1 is assembled and fixed with the corresponding bracket 11 to complete the installation of the support structure 100 of the chemical mechanical polishing device.
  • the polishing head frame body 1 is relatively fixed to the working platform without displacement, which improves the problem of shortening the service life caused by the rotation of the existing polishing head frame body 1; 2 Placed on the working platform to achieve the support positioning of the polishing head frame body 1, and combined with the setting of the edge support 3, it can share the force of the center column 2, so that the polishing head frame body 1 is placed smoothly; each bracket 11 is provided with Move the track 12 so that the polishing head moving module 6 can drive the polishing head module 7 to move smoothly relative to the bracket 11, and leave a gap between the polishing table and the center column 2 to form a polishing head module replacement area 5, which is convenient
  • the polishing head module 7 performs loading and unloading in the polishing head module replacement area 5, in other words, the design of the polishing head module replacement area 5 facilitates the replacement of the wafer on the polishing head module 7.
  • the chemical mechanical polishing device 200 provided by the present disclosure includes a polishing head moving module 6, a polishing head module 7, and the chemical mechanical polishing device support structure 100 provided by the present disclosure described above.
  • the polishing head moving module 6 is slidably connected to the moving rail 12 on the corresponding bracket 11, the polishing head module 7 is detachably connected to the polishing head moving module 6, the polishing head moving module 6 can drive the polishing head module 7 Relative to the support 11 along the moving rail 12.
  • the polishing head module 7 moves to the end of the moving rail 12 near the center of the polishing head frame body 1, the polishing head module 7 is located in the polishing head module replacement area 5 and can be completed in the polishing head module replacement area 5 Replacement of wafers on the polishing head module 7.
  • the chemical mechanical polishing device 200 provided by the present disclosure has a simple structure and convenient operation, extends the service life of the polishing head frame body 1, facilitates the replacement of the wafer on the polishing head module 7, and improves the polishing efficiency and quality.
  • the present disclosure provides a support structure of chemical mechanical polishing equipment and chemical mechanical polishing equipment, which has a long service life, high polishing efficiency, and high polishing quality.

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)

Abstract

一种化学机械抛光设备支撑结构及化学机械抛光设备，包括抛光头架体(1)，其中抛光头架体(1)包括交汇于抛光头架体(1)中心的多个支架(11)，中心柱(2)位于抛光头架体(1)的中心并与抛光头架体(1)连接，每个支架(11)的远离抛光头架体(1)的中心的一端连接有边缘支撑件(3)，边缘支撑件(3)配置成与中心柱(2)配合以支撑抛光头架体(1)，边缘支撑件(3)与中心柱(2)之间形成配置成放置抛光工作台的工作区(8)，每个支架(11)上设置有朝向抛光头架体(1)的中心延伸的移动轨道(12)，沿移动轨道(12)的延伸方向，移动轨道(12)的靠近中心柱(2)的一端的端部与中心柱(2)之间具有间隙以形成抛光头模组更换区(5)；该化学机械抛光设备支撑结构及化学机械抛光设备结构简单，能分散中心柱的承重，延长了抛光头架体的使用寿命。

Description

化学机械抛光设备支撑结构及化学机械抛光设备
相关申请的交叉引用
本公开要求于2019年01月11日提交中国专利局的申请号为201910027866.4、名称为“化学机械抛光设备支撑结构及化学机械抛光设备”的中国专利申请的优先权。
技术领域
本公开涉及抛光设备技术领域，具体而言，涉及一种化学机械抛光设备支撑结构及化学机械抛光设备。
背景技术
大规模集成电路生产过程中，对晶片上的沉积物进行平坦化是一道必需且频繁的工序。目前，完成这一道工序主要采用化学机械抛光(CMP)工艺。化学机械抛光机是完成这道工序的主要设备。
现有的化学机械抛光机存在以下缺点：
结构复杂，成本高；抛光质量差且抛光效率低。
发明内容
本公开的目的在于，例如，提供一种化学机械抛光设备支撑结构，结构简单，分散中心支柱的承重，抛光头架体与工作平台相对固定，不发生位移变化，使用寿命延长。
本公开的另一个目的在于，例如，提供一种化学机械抛光设备。
本公开的实施例是这样实现的：
本公开的实施例提供了一种化学机械抛光设备支撑结构，包括抛光头架体及配置成支撑所述抛光头架体的中心柱，所述抛光头架体包括交汇于所述抛光头架体中心的多个支架，所述中心柱位于所述抛光头架体的中心并与所述抛光头架体连接，所述中心柱的远离所述抛光头架体的一端配置成安装于工作平台，每个所述支架的远离所述抛光头架体的中心的一端连接有边缘支撑件，所述边缘支撑件配置成与所述中心柱配合以支撑所述抛光头架体，所述边缘支撑件与所述中心柱之间形成配置成放置抛光工作台的工作区，每个所述支架上设 置有朝向所述抛光头架体的中心延伸的移动轨道，所述移动轨道配置成抛光头移动模组与所述支架可滑动的连接，沿所述移动轨道的延伸方向，所述移动轨道的靠近所述中心柱的一端的端部与所述中心柱之间具有间隙以形成抛光头模组更换区，当所述抛光头移动模组移动至所述移动轨道的靠近所述中心柱的一端的端部时，与所述抛光头移动模组连接的抛光头模组位于所述抛光头模组更换区内。
根据本公开实施例提供的化学机械抛光设备支撑结构，抛光头架体与工作平台相对固定，不发生位移变化，改善了现有的抛光头架体转动带来的使用寿命降低的问题；通过中心柱放置于工作平台来支撑抛光头架体，结合边缘支撑件的设置，分担中心柱的受力，使得抛光头架体放置平稳；每个支架上设置有移动轨道，使得抛光头移动模组能够带动抛光头模组相对于支架移动，在抛光工作台与中心柱之间预留抛光头模组更换区，便于抛光头模组在抛光头模组更换区内进行上下片。
可选的，所述抛光头架体与所述中心柱可拆卸地连接。
可选的，所述抛光头架体开设有与所述中心柱配合的凹槽，所述中心柱插设于所述凹槽内且所述中心柱的端面抵接于所述凹槽的槽底壁。中心柱插设于凹槽内，便于实现中心柱的定位；中心柱与抛光头架体可拆卸的连接，便于装配和拆卸中心柱与抛光头架体，提高了工作效率。
可选的，所述凹槽的槽底壁设置有连接孔，所述中心柱与所述槽底壁抵接的端面上设置有螺纹孔，所述连接孔与所述螺纹孔配合以螺接配置成固定所述抛光头架体与所述中心柱的螺栓。
可选的，所述中心柱与所述凹槽螺接。
可选的本公开，所述边缘支撑件与所述支架可拆卸地连接。通过便于支撑件与支架的可拆卸连接，便于实现边缘支撑件的装配以及更换，提高了维修效率。
根据本公开的一些实施例，所述边缘支撑件与所述中心柱位于所述抛光头架体的同一侧。边缘支撑件位于抛光头架体的底部，边缘支撑件的一端支撑抛光头架体，增加了边缘支撑件与抛光头架体的连接面积，便于更好地支撑抛光头架体。
可选的，所述边缘支撑件为板状结构，所述边缘支撑件包括配置成支撑所述支架的支撑面，所述支撑面上设置有配置成与所述支架连接的连接部，所述支架开设有配置成与所述连接部配合的定位孔，所述连接部插设于所述定位孔 内。边缘支撑件通过支撑面支撑支架，保证边缘支撑件与支架具有一定的接触面积，提高了边缘支撑件的支撑效果；边缘支撑件与支架通过连接部与定位孔配合实现定位连接，提高了连接准确性，便于快速装配。
可选的，所述连接部与所述支架通过螺纹锁紧件连接。采用螺纹锁紧件，便于实现连接部与支架的装配与拆卸，提高了维修效率。
可选的，所述定位孔包括相连的第一孔段和第二孔段，所述第一孔段远离所述第二孔段的一端延伸至所述支架的底面，所述第二孔段远离所述第一孔段的一端延伸至所述支架的顶面，所述第一孔段与所述第二孔段的连接位置处形成限位面，所述螺纹锁紧件螺接于所述连接部上且与所述限位面抵持。
可选的，所述支架开设有配置成所述抛光头模组穿设的开口槽，所述开口槽由所述支架的端部朝向所述抛光头架体的中心延伸。开口槽的设置，使得抛光头模组能够在开口槽内滑动，便于支架与抛光头模组的装配以及便于抛光头模组的移动。
可选的，每个所述支架上设置有两根所述移动轨道，两根所述移动轨道位于所述支架的同一侧且位于所述开口槽相对的两侧；所述抛光头移动模组配置成同时与位于同一所述支架上的两根所述移动轨道滑动配合。
可选的，位于同一所述支架上的两根所述移动轨道平行。
可选的，所述多个支架沿所述抛光头架体的中心旋转对称分布。支架沿抛光头架体的中心旋转对称，使得中心柱受力均衡，便于保持抛光头架体的稳定性。
可选的，所述多个支架围绕所述抛光头架体的中轴线均匀间隔排布。
可选的，支架的数量为四个，四个支架形成十字交叉结构。四个支架的设置，合理利用安装空间，同时，相邻的两个抛光工作台之间具有充足的操作空间，便于在相应的抛光工作台操作。
本公开实施例还提供了一种化学机械抛光设备，包括上述的化学机械抛光设备支撑结构。
可选的，化学机械抛光设备还包括多个抛光移动模组以及多个抛光头模组，多个所述抛光移动模组一一对应设置于所述支架上且与所述移动轨道滑动配合，每个所述抛光头移动模组与一个所述抛光头模组连接，配置成驱动所述抛光头模组沿所述移动轨道的延伸方向往复直线运动。
可选的，所述抛光头移动模组包括第一驱动件、滑块以及第二驱动件，所述第一驱动件与所述滑块连接，且所述第一驱动件的驱动端与所述抛光头模组连接，配置成驱动所述抛光头模组转动；所述滑块与所述移动轨道滑动配合，所述第二驱动件设置于所述支架且与所述滑块连接，配置成驱动所述滑块往复直线运动。
本公开还提供了一种化学机械抛光设备，包括抛光头移动模组、抛光头模组及根据本公开第一方面实施例的化学机械抛光设备支撑结构，所述抛光头移动模组与所述移动轨道可滑动的连接，所述抛光头模组与所述抛光头移动模组可拆卸的连接，所述抛光头移动模组工作能够驱动所述抛光头模组沿所述移动轨道移动。
根据本公开实施例的化学机械抛光设备，结构简单、操作方便，提高了抛光头架体的使用寿命，便于实现抛光头模组的更换晶片。
本公开的附加方面和优点将在下面的描述中部分给出，部分将从下面的描述中变得明显，或通过本公开的实践了解到。
附图说明
为了更清楚地说明本公开实施例的技术方案，下面将对实施例中所需要使用的附图作简单地介绍，应当理解，以下附图仅示出了本公开的某些实施例，因此不应被看作是对范围的限定，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他相关的附图。
图1为根据本公开的化学机械抛光设备支撑结构的第一视角的示意图；
图2为根据本公开的化学机械抛光设备支撑结构的第二视角的示意图；
图3为图1的中心柱与抛光头架体的连接示意图；
图4为图1的边缘支撑件与支架的连接示意图；
图5为部分支架的剖视结构示意图；
图6为根据本公开的化学机械抛光设备支撑结构的第三视角的示意图；
图7为根据本公开的化学机械抛光设备的结构示意图。
图标：100-化学机械抛光设备支撑结构；200-化学机械抛光设备；1-抛光头架体；11-支架；111-定位孔；1110-第一孔段；1111-第二孔段；1112-限位 面；112-开口槽；113-底面；114-顶面；12-移动轨道；13-凹槽；131-连接孔；2-中心柱；21-螺纹孔；3-边缘支撑件；31-支撑面；32-连接部；41-螺栓；42-螺纹锁紧件；5-抛光头模组更换区；6-抛光头移动模组；60-第一驱动件；61-滑块；62-第二驱动件；7-抛光头模组；8-工作区。
具体实施方式
为使本公开实施例的目的、技术方案和优点更加清楚，下面将结合本公开实施例中的附图，对本公开实施例中的技术方案进行清楚、完整地描述，显然，所描述的实施例是本公开一部分实施例，而不是全部的实施例。通常在此处附图中描述和示出的本公开实施例的组件可以以各种不同的配置来布置和设计。
因此，以下对在附图中提供的本公开的实施例的详细描述并非旨在限制要求保护的本公开的范围，而是仅仅表示本公开的选定实施例。基于本公开中的实施例，本领域普通技术人员在没有作出创造性劳动前提下所获得的所有其他实施例，都属于本公开保护的范围。
应注意到：相似的标号和字母在下面的附图中表示类似项，因此，一旦某一项在一个附图中被定义，则在随后的附图中不需要对其进行进一步定义和解释。
在本公开的描述中，需要说明的是，术语“内”、“外”等指示的方位或位置关系为基于附图所示的方位或位置关系，或者是该发明产品使用时惯常摆放的方位或位置关系，仅是为了便于描述本公开和简化描述，而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作，因此不能理解为对本公开的限制。此外，术语“第一”、“第二”等仅用于区分描述，而不能理解为指示或暗示相对重要性。
在本公开的描述中，还需要说明的是，除非另有明确的规定和限定，术语“设置”、“连接”应做广义理解，例如，可以是固定连接，也可以是可拆卸连接，或一体地连接；可以是机械连接，也可以是电连接；可以是直接相连，也可以通过中间媒介间接相连，可以是两个元件内部的连通。对于本领域的普通技术人员而言，可以具体情况理解上述术语在本公开中的具体含义。下面参考附图描述本公开的化学机械抛光设备支撑结构100。
如图1-图5所示，本公开提供的化学机械抛光设备支撑结构100包括抛光头架体1及中心柱2。
具体而言，如图1和图2所示，抛光头架体1包括交汇于抛光头架体1中心的多个支架11，每个支架11远离抛光头架体1的中心的一端连接有边缘 支撑件3，每个支架11上设置有朝向抛光头架体1的中心延伸的移动轨道12，移动轨道12配置成实现抛光头移动模组6与支架11可滑动的连接，换句话说，抛光头移动模组6配置成与移动轨道12沿移动轨道12的延伸方向滑动配合，以实现抛光头移动模组6与支架11滑动连接。中心柱2位于抛光头架体1的中心并与抛光头架体1连接，中心柱2远离抛光头架体1的一端配置成安装于工作平台上，以定位抛光头架体1。多个边缘支撑件3围绕中心柱2排布，每个边缘支撑件3与中心柱2之间形成配置成放置抛光工作台的工作区8，工作时，每个工作区8内放置有抛光工作台，抛光工作台可以是抛光盘。每个工作区8内的抛光工作台位于对应支架11的下方，便于与支架11连接的抛光头移动模组6配合。沿移动轨道12的延伸方向，移动轨道12靠近中心柱2的端部与中心柱2之间具有间隙，以使中心柱2的外表面与移动轨道12靠近中心柱2的端部在竖向上的延伸面之间形成抛光头模组更换区5，抛光头模组更换区5位于支架11的下方，显然，每个支架11的下方对应有一个抛光头模组更换区5。
由于抛光头架体1与中心柱2相对固定，节约了安装空间，支架11上的移动轨道12可以设置较长的行程，同时，抛光工作台与中心柱2之间具有较大的空间，故而形成抛光头模组更换区5。
根据本公开提供的化学机械抛光设备支撑结构100，中心柱2与抛光头架体1连接，并安装于工作平台上，抛光头架体1相对工作平台固定；边缘支撑件3与抛光头架体1的支架11连接且位于支架11远离中心柱2的端部，与中心柱2配合共同支撑抛光头架体1，提高了抛光头架体1的稳定性。支架11上设置有移动轨道12，便于抛光头移动模组6相对于支架11移动，增大了抛光头移动模组6的移动行程以及提升了抛光头移动模组6的稳定性。同时，在移动轨道12的端部和中心柱2之间预留间隙而形成抛光头模组更换区5，当抛光头移动模组6移动至移动轨道12靠近中心柱2的端部时，与抛光头移动模组6连接的抛光头模组7位于抛光头模组更换区5内，便于更换抛光头模组7上的晶片。
本公开中，中心柱2与抛光头架体1可拆卸地连接。如图3所示，抛光头架体1的中心开设有与中心柱2配合的凹槽13，中心柱2的一端插设于凹槽13内，并且中心柱2的端面抵接于凹槽13的槽底壁。通过设置凹槽13，便于中心柱2的定位；中心柱2与抛光头架体1的连接方式，便于实现中心柱2与抛光头架体1的装配与拆卸，提高了工作效率。
需要说明的是，凹槽13的形状以及中心柱2的形状按需设置，二者的形状以及大小相匹配即可。本公开中，凹槽13为圆柱形槽，中心柱12为圆柱形杆。中心柱12的外径等于或者略小于凹槽13的内径，以便于中心柱12插入凹槽13中。
可选地，凹槽13的槽底壁开设有多个连接孔131，连接孔131沿垂直于抛光头架体1的厚度方向贯穿抛光头架体1，换句话说，连接孔131的轴线沿凹槽13的槽深方向延伸，中心柱2与凹槽13的槽底壁配合的端面上开设有与连接孔131对应的多个螺纹孔21，中心柱2与抛光头架体1通过穿设于连接孔131和对应的螺纹孔21内的螺栓41锁紧。本公开
显然，中心柱2与抛光头架体1的连接方式还可以为其他形式，例如中心柱2的外周面设置外螺纹，凹槽13的槽周壁设置内螺纹，中心柱2与抛光头架体1螺纹配合；或者，中心柱2与抛光头架体1过盈配合；再者，中心柱2与抛光头架体1卡接或者扣接等。
本公开中，边缘支撑件3与支架11可拆卸的连接。为了方便边缘支撑件3与支架11的配合，采用可拆卸的连接方式，提高了装配效率，便于更换边缘支撑件3。
可选的，边缘支撑件3与中心柱2位于抛光头架体1的同一侧，换句话说，边缘支撑件3位于凹槽13的槽口所在一侧。如图3和图4所示，边缘支撑件3和中心柱2均位于抛光头架体1的底部，边缘支撑件3的一端支撑抛光头架体1，增加了边缘支撑件3与抛光头架体1的连接面积，边缘支撑件3和抛光头架体1装配更加牢固，便于更好地支撑抛光头架体1。可选的，边缘支撑件3还可以位于支架11的端部，边缘支撑件3靠近中心柱2的一侧面与支架11的端面连接。
可选的，边缘支撑件3为板状结构，边缘支撑件3包括配置成支撑支架11的支撑面31，支架11的底面113搭接于支撑面31上，通过支撑面31来承载支架11的重量，增强了支撑效果。支撑面31上设置有配置成与支架11连接的连接部32，支架11开设有配置成与连接部32插接配合的定位孔111，连接部32插设于定位孔111内。边缘支撑件3通过支撑面31支撑支架11，保证边缘支撑件3与支架11具有一定的接触面积，提高了边缘支撑件3的支撑牢固性；边缘支撑件3与支架11通过连接部32与定位孔111配合实现定位连接，具有限制支架11与连接部32在定位孔111的径向上的自由度的作用，提高了连接准确性，便于快速装配。本公开
可选的，边缘支撑件3还可以设置为柱状结构，增加边缘支撑件3的支撑面31的面积，便于对支架11的稳定支撑。同时，边缘支撑件3的结构强度更大，不易损坏，延长使用寿命。
可选地，连接部32与支架11通过螺纹锁紧件42连接。定位孔111包括连通的第一孔段1110和第二孔段1111，第一孔段1110远离第二孔段1111的一端位于支架11的底面113，第二孔段1111远离第一孔段1110的一端位于 支架11的顶面114，第一孔段1110的内径小于第二孔段1111的内径，换句话说，第一孔段1110好第二孔段1111构成阶梯孔，第一孔段1110与第二孔段1111的连接位置处形成限位面1112。螺纹锁紧件42可以为螺母，连接部32的外周面设置螺纹，连接部32从第一孔段1110插入并伸入第二孔段1111中，螺纹锁紧件42螺接在连接部32上并位于第二孔段1111中，且螺纹锁紧件42的一端面与限位面1112抵持，从而限制了边缘支撑件3在竖向上的两个自由度，边缘支撑件13不会从定位孔111中脱落。通过螺母将连接部32和支架11锁紧，便于实现连接部32与支架11的装配与拆卸。可选的，螺纹锁紧件42还可以为螺栓或者螺钉等，连接部32开设螺纹孔，螺纹锁紧件42将连接部32与支架11锁紧，且螺纹锁紧件42与限位面抵持，使用者可以根据不同的使用需求，采用不同的螺纹锁紧件42，选择灵活，便于装配。
本公开中，支架11开设有配置成穿设抛光头模组7的开口槽112，开口槽112由支架11远离中心柱2的端部朝向抛光头架体1的中心延伸。如图1所示，开口槽112沿移动轨道12的延伸方向设置，换句话说，开口槽112沿支架11的长度方向延伸，使得抛光头模组能够在开口槽112内滑动，便于支架11与抛光头模组的装配以及抛光头模组移动灵活。可选的，开口槽112的槽口位于支架11远离中心柱2的端面上，开口槽112的槽深沿支架11的长度方向延伸，开口槽112在凹槽13的槽深方向上的两侧分别延伸至支架11相对的两侧面上，也即开口槽112在凹槽13的槽深方向上的两侧分别延伸至支架11的顶面114和底面113上。抛光头移动模组6能够从开口槽112位于支架11远离中心柱2的一端插入开槽口112或者脱离开口槽112，便于安装和更换。
可选的，每个支架11上设置有两根平行的移动导轨12，两根平行的移动导轨12位于支架11的同一侧且位于开口槽112相对的两侧。抛光头移动模组6同时与两根平行的移动导轨12滑动配合，提高抛光头移动模组6的稳定性。
本公开中，多个支架11沿抛光头架体1的中心旋转对称分布，换句话说，多个支架11围绕抛光头架体1的中心轴线均匀间隔排布，多个支架11的排布合理，中心柱2受力均衡且使抛光头架体1更加稳定，同时，便于抛光头架体1的加工制造。
可选的，如图5所示，支架11的数量为四个，四个支架11形成十字交叉结构。在抛光头架体1的周向上，相邻的两个支架11之间的夹角为90°，合理利用安装空间，同时，相邻的两个抛光工作台之间具有充足的操作空间，便于在相应的抛光工作台操作。本公开显然，支架11的数量可以不限于设置为四个，，基于抛光头模组7的重量考虑，便于实现中心柱2对于抛光头架体1的稳定支撑即可。
可选的，抛光头移动模组6包括第一驱动件60、滑块61以及第二驱动件 62，第一驱动件60与滑块61连接，第一驱动件60的驱动端穿过开口槽112后与抛光头模组7连接，配置成驱动抛光头模组7转动。滑块61与移动轨道12滑动配合，第二驱动件62与支架11连接，第二驱动件62的驱动端与滑块61连接，配置成驱动滑块61相对于移动轨道12滑动，从而带动第一驱动件60和抛光头模组7一起相对于支架11沿移动轨道12的延伸方向往复滑动。
可选的，第一驱动件60可以设置为电机。第二驱动件62可以设置为直线伸缩结构，例如，第二驱动件62包括气缸、液压缸或者主要由电机和丝杠构成的丝杠传动机构。
下面参考附图描述本公开提供的化学机械抛光设备支撑结构100的工作原理：
如图1所示，将中心柱2的一端插接在抛光头架体1的凹槽13内，并通过螺栓41将中心柱2与抛光头架体1锁紧，将边缘支撑件3放置于抛光头架体1的底部，并与对应的支架11装配固定，完成化学机械抛光设备支撑结构100的安装。
本公开提供的化学机械抛光设备支撑结构100，抛光头架体1与工作平台相对固定，不发生位移，改善了现有的抛光头架体1转动带来的使用寿命缩短的问题；将中心柱2放置于工作平台以实现抛光头架体1的支撑定位，同时结合边缘支撑件3的设置，能够分担中心柱2的受力，使得抛光头架体1放置平稳；每个支架11上设置有移动轨道12，使得抛光头移动模组6能够带动抛光头模组7相对于支架11平稳地移动，在抛光工作台与中心柱2之间预留间隙以形成抛光头模组更换区5，便于抛光头模组7在抛光头模组更换区5内进行上下片，换句话说，通过抛光头模组更换区5的设计，便于更换抛光头模组7上的晶片。
下面参考附图描述本公开提供的化学机械抛光设备200。
如图6所示，本公开提供的化学机械抛光设备200包括抛光头移动模组6、抛光头模组7及本公开上述提供的化学机械抛光设备支撑结构100。
抛光头移动模组6与对应支架11上的移动轨道12可滑动的连接，抛光头模组7与抛光头移动模组6可拆卸的连接，抛光头移动模组6能够驱动抛光头模组7沿移动轨道12相对于支架11移动。当抛光头模组7移动至移动轨道12靠近抛光头架体1的中心的端部时，抛光头模组7位于抛光头模组更换区5内，能够在抛光头模组更换区5内完成抛光头模组7上的晶片的更换。
本公开提供的化学机械抛光设备200，结构简单，操作方便，延长了抛光 头架体1的使用寿命，便于更换抛光头模组7上的晶片，提高了抛光效率及质量。
需要说明的是，在不冲突的情况下，本公开中的实施例中的特征可以相互结合。
以上所述仅为本公开的优选实施例而已，并不配置成限制本公开，对于本领域的技术人员来说，本公开可以有各种更改和变化。凡在本公开的精神和原则之内，所作的任何修改、等同替换、改进等，均应包含在本公开的保护范围之内。
工业实用性：
综上所述，本公开提供了一种化学机械抛光设备支撑结构及化学机械抛光设备，使用寿命长，抛光效率高，抛光质量高。

Claims (20)

  1. 一种化学机械抛光设备支撑结构，其特征在于，包括抛光头架体及配置成支撑所述抛光头架体的中心柱，所述抛光头架体包括交汇于所述抛光头架体中心的多个支架，所述中心柱位于所述抛光头架体的中心并与所述抛光头架体连接，所述中心柱的远离所述抛光头架体的一端配置成安装于工作平台，每个所述支架的远离所述抛光头架体的中心的一端连接有边缘支撑件，所述边缘支撑件配置成与所述中心柱配合以支撑所述抛光头架体，所述边缘支撑件与所述中心柱之间形成配置成放置抛光工作台的工作区，每个所述支架上设置有朝向所述抛光头架体的中心延伸的移动轨道，所述移动轨道配置成抛光头移动模组与所述支架可滑动的连接，沿所述移动轨道的延伸方向，所述移动轨道的靠近所述中心柱的一端的端部与所述中心柱之间具有间隙以形成抛光头模组更换区，当所述抛光头移动模组移动至所述移动轨道的靠近所述中心柱的一端的端部时，与所述抛光头移动模组连接的抛光头模组位于所述抛光头模组更换区内。
  2. 根据权利要求1所述的化学机械抛光设备支撑结构，其特征在于，所述抛光头架体与所述中心柱可拆卸地连接。
  3. 根据权利要求1或者2所述的化学机械抛光设备支撑结构，其特征在于，所述抛光头架体开设有与所述中心柱配合的凹槽，所述中心柱插设于所述凹槽内且所述中心柱的端面抵接于所述凹槽的槽底壁。
  4. 根据权利要求3所述的化学机械抛光设备支撑结构，其特征在于，所述凹槽的槽底壁设置有连接孔，所述中心柱与所述槽底壁抵接的端面上设置有螺纹孔，所述连接孔与所述螺纹孔配合以螺接配置成固定所述抛光头架体与所述中心柱的螺栓。
  5. 根据权利要求3所述的化学机械抛光设备支撑结构，其特征在于，所述中心柱与所述凹槽螺接。
  6. 根据权利要求1-5中任一项所述的化学机械抛光设备支撑结构，其特征在于，所述边缘支撑件与所述支架可拆卸地连接。
  7. 根据权利要求1-6中任一项所述的化学机械抛光设备支撑结构，其特征在于，所述边缘支撑件与所述中心柱位于所述抛光头架体的同一侧。
  8. 根据权利要求1-7中任一项所述的化学机械抛光设备支撑结构，其特征在于，所述边缘支撑件为板状结构，所述边缘支撑件包括配置成支撑所述支架的支撑面，所述支撑面上设置有配置成与所述支架连接的连接部，所述支架 开设有配置成与所述连接部配合的定位孔，所述连接部插设于所述定位孔内。
  9. 根据权利要求8所述的化学机械抛光设备支撑结构，其特征在于，所述连接部与所述支架通过螺纹锁紧件连接。
  10. 根据权利要求9所述的化学机械抛光设备支撑结构，其特征在于，所述定位孔包括相连的第一孔段和第二孔段，所述第一孔段远离所述第二孔段的一端延伸至所述支架的底面，所述第二孔段远离所述第一孔段的一端延伸至所述支架的顶面，所述第一孔段与所述第二孔段的连接位置处形成限位面，所述螺纹锁紧件螺接于所述连接部上且与所述限位面抵持。
  11. 根据权利要求1-10中任一项所述的化学机械抛光设备支撑结构，其特征在于，所述支架开设有配置成穿设所述抛光头模组的开口槽，所述开口槽由所述支架的端部朝向所述抛光头架体的中心延伸。
  12. 根据权利要求11所述的化学机械抛光设备支撑结构，其特征在于，每个所述支架上设置有两根所述移动轨道，两根所述移动轨道位于所述支架的同一侧且位于所述开口槽相对的两侧；所述抛光头移动模组配置成同时与位于同一所述支架上的两根所述移动轨道滑动配合。
  13. 根据权利要求12所述的化学机械抛光设备支撑结构，其特征在于，位于同一所述支架上的两根所述移动轨道平行。
  14. 根据权利要求1-13中任一项所述的化学机械抛光设备支撑结构，其特征在于，所述多个支架沿所述抛光头架体的中心旋转对称分布。
  15. 根据权利要求1-13中任一项所述的化学机械抛光设备支撑结构，其特征在于，所述多个支架围绕所述抛光头架体的中轴线均匀间隔排布。
  16. 根据权利要求15所述的化学机械抛光设备支撑结构，其特征在于，所述支架的数量为四个，四个所述支架形成十字交叉结构。
  17. 一种化学机械抛光设备，其特征在于，包括权利要求1-16中任一项所述的化学机械抛光设备支撑结构。
  18. 根据权利要求17所述的化学机械抛光设备，其特征在于，还包括多个抛光移动模组以及多个抛光头模组，多个所述抛光移动模组一一对应设置于所述支架上且与所述移动轨道滑动配合，每个所述抛光头移动模组与一个所述抛光头模组连接，配置成驱动所述抛光头模组沿所述移动轨道的延伸方向往复直线运动。
  19. 根据权利要求18所述的化学机械抛光设备，其特征在于，所述抛光头移动模组包括第一驱动件、滑块以及第二驱动件，所述第一驱动件与所述滑块连接，且所述第一驱动件的驱动端与所述抛光头模组连接，配置成驱动所述抛光头模组转动；所述滑块与所述移动轨道滑动配合，所述第二驱动件设置于所述支架且与所述滑块连接，配置成驱动所述滑块往复直线运动。
  20. 一种化学机械抛光设备，其特征在于，包括抛光头移动模组、抛光头模组及权利要求1-16中任意一项所述的化学机械抛光设备支撑结构，所述抛光头移动模组与所述移动轨道可滑动的连接，所述抛光头模组与所述抛光头移动模组可拆卸的连接，所述抛光头移动模组工作能够驱动所述抛光头模组沿所述移动轨道移动。
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CN106737055A (zh) * 2016-12-01 2017-05-31 天津华海清科机电科技有限公司 化学机械抛光机及用于其的抛光组件
CN109590896A (zh) * 2019-01-11 2019-04-09 北京半导体专用设备研究所（中国电子科技集团公司第四十五研究所） 化学机械抛光设备支撑结构及化学机械抛光设备

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