WO2020113680A1 - 过滤装置和光阻涂布系统 - Google Patents

过滤装置和光阻涂布系统 Download PDF

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Publication number
WO2020113680A1
WO2020113680A1 PCT/CN2018/121893 CN2018121893W WO2020113680A1 WO 2020113680 A1 WO2020113680 A1 WO 2020113680A1 CN 2018121893 W CN2018121893 W CN 2018121893W WO 2020113680 A1 WO2020113680 A1 WO 2020113680A1
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WIPO (PCT)
Prior art keywords
pipeline
filter element
photoresist
barrel
stirring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/CN2018/121893
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English (en)
French (fr)
Inventor
何怀亮
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
HKC Co Ltd
Original Assignee
HKC Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by HKC Co Ltd filed Critical HKC Co Ltd
Priority to US17/043,634 priority Critical patent/US11609500B2/en
Publication of WO2020113680A1 publication Critical patent/WO2020113680A1/zh
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D36/00—Filter circuits or combinations of filters with other separating devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/40—Mixing liquids with liquids; Emulsifying
    • B01F23/43—Mixing liquids with liquids; Emulsifying using driven stirrers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F27/00—Mixers with rotary stirring devices in fixed receptacles; Kneaders
    • B01F27/05—Stirrers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/181—Preventing generation of dust or dirt; Sieves; Filters
    • B01F35/187—Preventing generation of dust or dirt; Sieves; Filters using filters in mixers, e.g. during venting
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material

Definitions

  • This application relates to the technical field of semiconductor processing equipment, in particular to a filtering device and a photoresist coating system.
  • Photoresist also known as photoresist
  • Photoresist can be set in many industrial processes. Generally, the photoresist usually undergoes transportation and storage from production to final use. When used in the production line, the photoresist is easy to generate particles, which are directly coated on the product substrate, which is easy to cause product defects and lead to a decrease in product yield.
  • the statements here only provide background information related to the present application and do not necessarily constitute prior art.
  • the main purpose of this application is to provide a filtering device, which aims to provide a filtering device with good filtering performance and good dispersibility.
  • the filtering device proposed in this application should be set as a photoresist coating system.
  • the filtering device includes:
  • the liquid storage barrel is set to hold the photoresist to be filtered
  • a mixing structure including a mixing tank, and a mixing component at least partially accommodating the mixing tank;
  • a first pipeline one end of the first pipeline communicates with the liquid storage barrel, and the other end of the first pipeline communicates with the mixing barrel;
  • a first filter assembly is provided in the first pipeline and is located between the liquid storage barrel and the stirring barrel;
  • a first pressure detection component provided in the first pipeline, configured to detect the pressure of the photoresist in the first pipeline
  • one end of the second pipeline communicates with the stirring barrel, and the other end of the second pipeline is connected to the coating device.
  • the liquid storage barrel includes a barrel body and a first adapter, the barrel body has a containing cavity containing photoresist, and the barrel body is provided with a first communicating with the containing cavity An opening, the first adapter is installed at the first opening, and one end of the first pipeline passes through the first adapter and is accommodated in the accommodating cavity;
  • the filtering device further includes a vent tube, one end of the vent tube is received in the accommodating cavity through the first adapter, and an air pump is connected to the other end of the vent tube.
  • the first adapter is provided with a first adjustment hole communicating with the accommodating cavity, and one end of the first pipeline extends through the first adjustment hole into the accommodating cavity , And the length of the first pipeline extending into the accommodating cavity through the first adjustment hole can be adjusted;
  • the first adaptor is provided with a second adjustment hole communicating with the accommodating cavity, and one end of the vent tube extends through the second adjustment hole into the accommodating cavity, and the The vent tube can adjust the length extending into the accommodating cavity through the second adjustment hole;
  • the length of the first pipeline extending into the accommodating cavity is greater than the length of the vent tube extending into the accommodating cavity;
  • the liquid storage barrel further includes a seal ring provided at the first opening, the seal ring is interposed between the first adapter and the inner wall of the first opening, and is provided as a seal The first adapter and the first opening of the barrel.
  • the first filter assembly includes a first filter element and a second filter element arranged in series on the first pipeline, the first filter element is close to the liquid storage barrel, and the second filter element is close to the In the stirring barrel, the pore size of the first filter element is greater than or equal to the pore size of the second filter element;
  • the first pressure detection assembly includes a first pressure detector and a second pressure detector; the first pressure detector is located between the liquid storage barrel and the first filter element, and is configured to detect the first tube The pressure before filtering the photoresist in the road; a second pressure detector is located between the second filter element and the stirring barrel, and is configured to detect the pressure after filtering the photoresist in the first pipeline.
  • the mixing tank is provided with a second opening and a second adapter that covers the second opening, and one end of the first pipeline and the second pipeline pass through the second adapter The joint extends into the mixing barrel;
  • the stirring assembly includes a stirring rod rotatably disposed on the second adapter, a stirring head, and a driving member.
  • the stirring head is connected to an end of the stirring rod extending into the stirring barrel.
  • the driving member is disposed at an end of the stirring rod away from the stirring head, and the driving member drives the stirring rod to drive the stirring head to rotate to stir the photoresist in the stirring bucket.
  • the filtering device further includes:
  • the second filter assembly includes a third filter element and a fourth filter element arranged in series in the second pipeline.
  • the third filter element and the fourth filter element are located between the stirring tank and the coating device.
  • Three filter elements are close to the stirring barrel, the fourth filter element is close to the coating device, and the pore size of the third filter element is greater than or equal to the pore size of the fourth filter element;
  • a second pressure detection assembly is provided in the second pipeline.
  • the second pressure detection assembly includes a third pressure detector and a fourth pressure detector.
  • the third pressure detector is located in the mixing tank and the Between the third filter element, it is arranged to detect the pressure before the photoresist in the second pipeline is filtered; the fourth pressure detector is located between the fourth filter element and the coating device, and is arranged to detect the The pressure after filtering the photoresist in the second pipeline.
  • the filtering device further includes a sampling detection component disposed between the fourth pressure detector and the coating device, the sampling detection component includes a sampling connected to the second pipeline A tube and a sampling valve connected to the sampling tube.
  • the filtering device further includes a first shut-off valve provided in the second pipeline, the first shut-off valve is located between the sampling tube and the coating device;
  • the filtering device further includes a third pipeline and a second stop valve provided in the third pipeline, one end of the third pipeline communicates with the sampling pipe, and the other of the third pipeline One end communicates with the stirring barrel.
  • This application also proposes a filtering device, which is set as a photoresist coating system, and the filtering device includes:
  • the liquid storage barrel is set to hold the photoresist to be filtered
  • a mixing structure including a mixing tank, and a mixing component at least partially accommodating the mixing tank;
  • a first pipeline one end of the first pipeline communicates with the liquid storage barrel, and the other end of the first pipeline communicates with the mixing barrel;
  • the first filter assembly includes a first filter element and a second filter element arranged in series on the first pipeline, the first filter element and the second filter element are located between the liquid storage barrel and the stirring barrel;
  • a first pressure detection component which is provided in the first pipeline and is configured to detect the pressure of the photoresist in the first pipeline
  • a second pipe one end of the second pipe communicates with the stirring barrel, and the other end of the second pipe is connected to the coating device;
  • a second filter assembly including a third filter element and a fourth filter element arranged in series in the second pipeline, the third filter element and the fourth filter element being located between the stirring tank and the coating device;
  • the pore diameters of the third filter element and the fourth filter element are different from those of the first filter element and the second filter element.
  • This application also proposes a photoresist coating system, including:
  • a coating device that communicates with the stirring structure through the second pipeline.
  • the present application also proposes a display device including the above-mentioned display panel
  • a first filter component and a first pressure detection component are provided on the first pipeline connecting the storage tank and the stirring tank, and the first filter component is used to filter the photoresist entering the stirring tank, and Use the first pressure detection component to detect the pressure of the photoresist in the first pipeline to determine whether the photoresist in the first pipeline still contains particles and other substances, thereby improving the filtration performance of the filtering device; further, through the stirring component
  • the photoresist in the mixing tank is dispersed, so that the dispersed photoresist is directly connected to the coating device through the second pipeline and coated on the product substrate, which can greatly reduce the defect rate of the product and effectively improve the product quality.
  • FIG. 1 is a schematic structural diagram of an embodiment of a filtering device of the present application
  • FIG. 2 is a schematic structural diagram of another embodiment of a filtering device of the present application.
  • FIG. 3 is a schematic structural diagram of an embodiment of a filter element of the present application.
  • fixed may be a fixed connection, a detachable connection, or integrated; It is a mechanical connection or an electrical connection; it can be directly connected or indirectly connected through an intermediary. It can be the connection between two elements or the interaction between two elements, unless otherwise clearly defined.
  • This application proposes a filtering device 100, which is configured as a photoresist coating system. It is understandable that the filtering device 100 is used to filter and disperse the photoresist before coating with the photoresist, which can effectively improve the quality of the product.
  • the filtering device 100 includes:
  • the liquid storage barrel 10 is set to hold the photoresist to be filtered
  • the stirring structure 20 includes a stirring barrel 21 and a stirring assembly 22 at least partially containing the stirring barrel 21;
  • the first pipeline 31 one end of the first pipeline 31 communicates with the liquid storage barrel 10, and the other end of the first pipeline 31 communicates with the stirring barrel 21;
  • the first filter assembly 40 is provided in the first pipeline 31 and is located between the liquid storage tank 10 and the stirring tank 21;
  • the first pressure detection component 50 is provided in the first pipeline 31 and is configured to detect the pressure of the photoresist in the first pipeline 31;
  • the second pipe 32 has one end connected to the stirring barrel 21 and the other end connected to the coating device 300.
  • the liquid storage barrel 10 of the filtering device 100 is configured to store and contain photoresist
  • the first pipeline 31 communicates the liquid storage barrel 10 and the mixing barrel 21 of the mixing structure 20, and the first filter assembly 40 is provided on the first
  • the pipeline 31 is also located between the liquid storage tank 10 and the stirring tank 21, so that when the photoresist in the liquid storage tank 10 passes through the first filter assembly 40 on the first pipeline 31, the first filter assembly 40 performs filtering treatment. So as to effectively filter out the particles and other substances in the photoresist.
  • the first pressure detection component 50 is provided in the first pipeline 31, and the first pressure detection component 50 can detect the pressure of the photoresist in the first pipeline 31, so as to determine whether the photoresist still exists in the first pipeline 31 Particles and other substances, thereby improving the filtering effect of the filtering device 100.
  • the stirring structure 20 further includes a stirring component 22.
  • the stirring component 22 can be used to stir and disperse the photoresist in the stirring tank 21.
  • the photoresist after the dispersion treatment is connected to the coating device 300 through the second pipe 32, and the coating device 300 is used to apply the photoresist to the product, thereby improving the quality of the product , Effectively reduce product defects.
  • the first filter assembly 40 and the first pressure detection assembly 50 are provided on the first pipeline 31 connecting the liquid storage tank 10 and the stirring tank 21, and the first filter assembly 40 is used to enter the mixing tank 21.
  • the photoresist is filtered, and the pressure of the photoresist in the first pipeline 31 is detected by the first pressure detection component 50 to determine whether the photoresist in the first pipeline 31 still contains particles and other substances, thereby improving the filtering device 100
  • the filtering performance of the filter further, through the stirring assembly 22 to disperse the photoresist in the mixing tank 21, so that the dispersed photoresist is directly connected to the coating device 300 through the second pipeline 32, and coated on the product On the substrate, this can greatly reduce the defect rate of the product and effectively improve the product quality.
  • a liquid outlet may be provided at the bottom of the liquid storage tank 10, the first tube The path 31 communicates with the liquid storage tank 10 through the liquid outlet.
  • an on-off valve may also be provided at the liquid discharge port, so as to effectively control the liquid discharge volume of the first pipeline 31.
  • one end of the first pipeline 31 may also extend into the liquid storage barrel 10 through the upper end of the liquid storage barrel 10, and at this time, the portion of the first pipeline 31 that extends into the liquid storage barrel 10 needs to be located in the liquid storage barrel
  • the liquid level of the photoresist in 10 is lower, so that the photoresist in the storage tank 10 can be pressed into the first pipeline 31 by air pressure or other methods.
  • the first filter assembly 40 may be a filter barrel or a filter.
  • the first filter assembly 40 may also be another structure with a filtering function, which is not limited herein.
  • the first pressure detection component 50 may be a pressure sensor, a liquid pressure valve, etc.
  • the first pressure detection component 50 may also be other structures capable of detecting the liquid pressure in the first pipeline 31, which is not limited herein.
  • the liquid storage barrel 10 includes a barrel body 11 and a first adapter 12, the barrel body 11 has a containing cavity 11a for containing a photoresist, and the barrel body 11 is provided with Connected to the first opening 11b of the accommodating cavity 11a, the first adapter 12 is installed at the first opening 11b, and one end of the first pipeline 31 passes through the first adapter 12 and is accommodated in the accommodating cavity 11a;
  • the filtering device 100 further includes a vent tube 33.
  • One end of the vent tube 33 is received in the accommodating cavity 11 a through the first adapter 12, and the other end of the vent tube 33 is connected to the air pump 200.
  • the barrel 11 has an accommodating cavity 11a, and is provided with a first opening 11b communicating with the accommodating cavity 11a.
  • the photoresist to be filtered can be loaded into the containing cavity 11a of the barrel body 11 through the first opening 11b of the barrel body 11, and of course, an inlet liquid communicating with the containing cavity 11a can also be provided on the upper end of the barrel body 11
  • the photoresist to be filtered can also be inserted into the accommodating cavity 11a of the barrel 11 through the liquid inlet, which is not limited herein.
  • the first opening 11b of the barrel 11 serves as an inlet for loading the photoresist to be filtered, and also serves as an outlet for connecting the first pipeline 31.
  • a first adapter 12 is provided at the first opening 11 b, and one end of the first pipeline 31 passes through the first
  • the adapter 12 is accommodated in the accommodating cavity 11a and extends below the liquid level of the photoresist in the accommodating cavity 11a, so that the photoresist can easily flow into the first pipe 31. Understandable, The
  • the liquid storage barrel 10 further includes a sealing ring 13 provided at the first opening 11b.
  • the sealing ring 13 is interposed between the first adapter 12 and the inner wall of the first opening 11b.
  • the sealing ring 13 may be a gasket, a sealing ring, or other structure capable of performing a sealing function, which is not limited herein.
  • the filter device 100 is further provided with a vent pipe 33, and one end of the vent pipe 33 passes through the first adapter 12 and is accommodated in the accommodating chamber Cavity 11a.
  • the air pump 200 By connecting an air pump 200 to one end of the vent tube 33, the air pump 200 is used to inflate the sealed barrel body 11 accommodating cavity 11a through the vent tube 33, so that the pressure in the barrel body 11 can be increased, thereby pressing the photoresist into the first In the pipeline 31.
  • the portion of the vent tube 33 that extends into the accommodating cavity 11a is located above the liquid level of the photoresist. In this way, the photoresist can be pressed into the first pipeline 31 without affecting the barrel 11 The photoresist in the accommodating cavity 11a is affected.
  • the air pump 200 may be filled with compressed nitrogen gas or compressed dry air through the vent tube 33. Of course, any gas that does not react with the photoresist may be used, which is not limited herein.
  • the first adapter 12 is provided with a first adjustment hole 121 communicating with the accommodating cavity 11 a, and one end of the first pipeline 31 extends through the first adjustment hole 121
  • the accommodating cavity 11a, and the first pipeline 31 can adjust the length extending into the accommodating cavity 11a through the first adjusting hole 121.
  • the first adjustment hole 121 can adjust the extension of the first pipeline 31 according to the size and type of the barrel 11 and the amount of photoresist in the barrel 11 The length into the accommodating cavity 11a to improve the convenience and versatility of the filter device 100.
  • the first adjustment hole 121 may be a screw hole or a sliding hole.
  • the first adjustment hole 121 may also be other structures capable of adjusting the length of the first pipeline 31 extending into the accommodating cavity 11a. This is not limited.
  • a sealing structure may also be provided at the first adjustment hole 121, so as to ensure the tightness between the first pipe 31 and the first adjustment hole 121 when adjusting the first pipe 31 .
  • the first adapter 12 is provided with a second adjustment hole 122 communicating with the accommodating cavity 11 a, and one end of the vent tube 33 extends through the second adjustment hole 122 into the accommodation The cavity 11a, and the ventilation tube 33 can adjust the length extending into the accommodating cavity 11a through the second adjusting hole 122.
  • the second adjustment hole 122 can adjust the extension of the vent tube 33 into the volume according to the size and type of the barrel 11 and the amount of photoresist in the barrel 11
  • the length in the cavity 11a is increased to improve the convenience and versatility of the filter device 100.
  • the first adjustment hole 121 and the second adjustment hole 122 are arranged on the first adapter 12 at intervals.
  • the second adjustment hole 122 may be a threaded hole or a sliding hole.
  • the second adjustment hole 122 may also be other structures capable of adjusting the length of the vent tube 33 extending into the accommodating cavity 11a. Be limited.
  • a sealing structure may also be provided at the second adjustment hole 122, so as to ensure the sealing performance between the ventilation tube 33 and the second adjustment hole 122 when adjusting the ventilation tube 33.
  • the length of the first pipeline 31 extending into the accommodating cavity 11 a is greater than the length of the vent tube 33 extending into the accommodating cavity 11 a. In this way, it can be ensured that when the air pump 200 is filled with gas through the vent pipe 33, the photoresist in the barrel 11 can be smoothly pressed into the first pipeline 31.
  • the first filter assembly 40 includes a first filter element 41 and a second filter element 42 that are serially disposed in the first pipeline 31, the first filter element 41 is close to the liquid storage tank 10, The second filter element 42 is close to the stirring barrel 21, and the pore size of the first filter element 41 is greater than or equal to the pore size of the second filter element 42.
  • the first filter element 41 and the second filter element 42 generally include PP cotton, granular activated carbon, RO reverse osmosis membrane, and post-activated carbon, etc., which are arranged to adsorb solid particles in the photoresist.
  • the pore size of the first filter element 41 is greater than or equal to the pore size of the second filter element 42.
  • the photoresist in the first pipeline 31 is firstly adsorbed and filtered through the first filter element 41, and then is secondarily adsorbed and filtered through the second filter element 42 to improve the filtering effect of the filter device 100 to filter the photoresist. Since the pore size of the second filter element 42 is less than or equal to the pore size of the first filter element 41, after filtering through the second filter element 42, the solid particles in the photoresist can be further adsorbed and filtered.
  • the first pressure detection assembly 50 includes a first pressure detector 51 and a second pressure detector 52; the first pressure detector 51 is located in the storage tank 10 and the first Between the filter elements 41, it is arranged to detect the pressure before the photoresist in the first pipeline 31 is filtered; the second pressure detector 52 is located between the second filter element 42 and the stirring barrel 21, and is arranged to detect the light in the first pipeline 31 The pressure after the filter is filtered.
  • first pressure detector 51 and the second pressure detector 52 are respectively disposed on both sides of the first filter assembly 40, so that the pressure values detected by the first pressure detector 51 and the second pressure detector 52 can be determined It is determined whether the first filter assembly 40 is clogged to determine whether particles such as particles still exist in the photoresist passing through the first filter assembly 40, thereby improving the filtering performance of the filtering device 100.
  • the mixing tank 21 is provided with a second opening 21b and a second adapter 211 covering the second opening 21b, a first pipe 31 and a second pipe 32 The end of the extends through the second adapter 211 into the mixing tank 21;
  • the stirring assembly 22 includes a stirring rod 221 rotatably disposed on the second adapter 211, a stirring head 222, and a driving member 223.
  • the stirring head 222 is connected to the end of the stirring rod 221 that extends into the stirring barrel 21, and the driving member 223 is provided At the end of the stirring rod 221 away from the stirring head 222, the driving member 223 drives the stirring rod 221 to rotate the stirring head 222 to stir the photoresist in the stirring barrel 21.
  • the stirring tank 21 has a stirring chamber 21a, and the photoresist passes through the first filter assembly 40 and the first pressure detection assembly 50 through the first pipeline 31 and enters into the stirring chamber 21a of the stirring bucket 21 in sequence.
  • the second adapter 211 can be used to install and fix the first pipeline 31 and the second pipeline 32, so that the first pipeline 31 and the second pipeline One end of 32 extends into the mixing tank 21 through the second adapter 211.
  • the end of the stirring rod 221 connected to the stirring head 222 extends into the stirring chamber 21a through the second adapter 211, and the stirring rod 221 is driven by the driving member 223 to drive the stirring head 222 to rotate to stir the stirring chamber 21a photoresist, thereby improving the dispersion performance of the photoresist.
  • the stirring rod 221 and the second adapter 211 are rotatably connected through a structure such as a bearing, and the driving member 223 may also be fixed on the second adapter 211, which is not limited herein.
  • the driving member 223 may be a motor, a driving motor, etc., as long as it is a structure capable of driving the stirring rod 221 to rotate, which is not limited herein.
  • the filtering device 100 further includes a second filter assembly 60.
  • the second filter assembly 60 includes a third filter element 61 and a fourth filter element 62 that are serially disposed in the second pipeline 32.
  • the third filter element 61 and the fourth filter element 62 are located between the stirring drum 21 and the coating device 300, the third filter element 61 is close to the stirring drum 21, the fourth filter element 62 is close to the coating device 300, and the pore diameter of the third filter element 61 is greater than or equal to The pore size of the fourth filter element 62.
  • a third filter element 61 and a fourth filter element 62 are provided on the second pipeline 32, so that the dispersed photoresist is filtered again, and the filtered photoresist is filtered by the second
  • the pipeline 32 is connected to the coating device 300 to coat the product, thereby improving the quality of the product and reducing the defect rate of the product.
  • the third filter element 61 and the fourth filter element 62 are arranged in series to ensure the filtering effect of the photoresist through the second filter assembly 60.
  • the third filter element 61 and the fourth filter element 62 generally include: PP cotton, granular activated carbon, RO reverse osmosis membrane, and post-activated carbon, etc., which are arranged to adsorb solid particles in the photoresist.
  • the pore size of the third filter element 61 is greater than or equal to the pore size of the fourth filter element 62.
  • the photoresist in the second pipeline 32 is firstly adsorbed and filtered through the third filter element 61, and then is secondarily adsorbed and filtered through the fourth filter element 62, so as to improve the filtering effect of the filter device 100 to filter the photoresist. Since the pore size of the fourth filter element 62 is less than or equal to the pore size of the third filter element 61, after filtering through the fourth filter element 62, the solid particles in the photoresist can be further adsorbed and filtered clean, thus ensuring the coating device 300 to coat After the product quality.
  • the filtering device 100 further includes a second pressure detection assembly 70 disposed on the second pipeline 32.
  • the second pressure detection assembly 70 includes a third pressure detector 71 and a third Four pressure detectors 72, a third pressure detector 71 is located between the stirring tank 21 and the third filter element 61, and is arranged to detect the pressure in the second pipeline 32 before the photoresist is filtered; the fourth pressure detector 72 is located in the fourth Between the filter element 62 and the coating device 300, it is arranged to detect the pressure after the photoresist in the second pipeline 32 is filtered.
  • the third pressure detector 71 and the fourth pressure detector 72 are respectively disposed on both sides of the second filter assembly 60, so that the pressure values detected by the third pressure detector 71 and the fourth pressure detector 72 can be determined It is determined whether the second filter assembly 60 is clogged to determine whether particles such as particles still exist in the photoresist passing through the second filter assembly 60, thereby improving the filtering performance of the filtering device 100.
  • a detection port may also be provided on the mixing drum 21, and the filtering effect and dispersion effect of the photoresist in the mixing drum 21 are detected through the detection port. If the filtering effect and dispersion of the photoresist in the mixing drum 21 are detected If the effect is better, the mixing tank 21 and the coating device 300 can be directly connected through the second pipeline 32. At this time, the photoresist in the mixing tank 21 may not be filtered by the second filter assembly 60 and the second pressure detection assembly 70. If it is detected that the filtering and dispersing effects of the photoresist in the mixing tank 21 are not good, at this time, the photoresist in the second pipeline 32 needs to be filtered again through the second filter assembly 60 and the second pressure detection assembly 70. In order to ensure the quality of the product coated by the coating device 300.
  • the filtering device 100 further includes a sampling detection component 80 disposed between the fourth pressure detector 72 and the coating device 300.
  • the sampling detection component 80 includes a connection to the second The sampling tube 81 of the pipeline 32 and the sampling valve 82 connected to the sampling tube 81.
  • a sampling detection assembly 80 is provided between the fourth pressure detector 72 and the coating device 300, and the filtering effect of the photoresist after the second filter assembly 60 and the second pressure detection assembly 70 is detected by the sampling valve 82 And the dispersion effect to ensure the quality of the product coated by the coating device 300.
  • the filtering device 100 further includes a first shut-off valve 91 disposed in the second pipeline 32, and the first shut-off valve 91 is located between the sampling tube 81 and the coating device 300 . It can be understood that the setting of the first cut-off valve 91 is beneficial for controlling whether the photoresist after passing through the filtering device 100 continues to enter the coating device 300 for coating.
  • the filtering device 100 further includes a third pipeline 34 and a second shut-off valve 92 provided in the third pipeline 34.
  • One end of the third pipeline 34 communicates with the sampling tube 81.
  • the other end of the third pipe 34 communicates with the stirring drum 21.
  • the arrangement of the third pipeline 34 can realize circulating filtration and dispersion. That is, the filtering effect and dispersion effect of the photoresist after the second filter assembly 60 and the second pressure detection assembly 70 are detected by the sampling valve 82. If the filtering effect and dispersion effect of the photoresist are better, the third The second shut-off valve 92 on the pipeline 34 opens the second shut-off valve 92 so that the photoresist after passing through the second filter assembly 60 and the second pressure detection assembly 70 directly enters the coating device 300 for coating; if the photoresist The filtering effect and dispersion effect of the agent are not good.
  • the second shut-off valve 92 on the third line 34 is opened, and the second shut-off valve 92 is closed, so that the second filtering component 60 and the second pressure detecting component 70
  • the photoresist passes through the third pipeline 34, enters the stirring tank 21 again for dispersion, and is filtered by the second filter assembly 60 and the second pressure detection assembly 70.
  • the first pipeline 31 extends into the inner end of the mixing tank 21 through the second adapter 211 and remains at The upper end of the liquid level of the photoresist in the mixing tank 21.
  • the second pipeline 32 extends through the second adapter 211 into the inner end of the mixing tank 21 and continues to be at the lower end of the liquid level of the photoresist in the mixing tank 21.
  • the liquid inlet of the mixing drum 21 may be provided at the upper end of the mixing drum 21, and the liquid outlet of the mixing drum 21 may be provided at the bottom end of the mixing drum 21.
  • the fluidity of the agent achieves automatic flow, which is not limited here.
  • the liquid inlet and the liquid outlet can also be provided at the second opening 21b of the mixing tank 21, as shown in FIGS. 1 and 2, the liquid inlet of the first pipe 31 is realized simultaneously through the second adapter 211 And the second line 32 of the liquid.
  • the agitating chamber of the agitating barrel 21 is in a sealed state, and the photoresist in the agitating barrel 21 can be pressed into the second pipeline 32 by passing gas, so that the photoresist smoothly passes through the second pipeline 32 through the second The filter assembly 60 and the second pressure detection assembly 70 enter the coating device 300.
  • the filtering device 100 includes:
  • the liquid storage barrel 10 is set to hold the photoresist to be filtered
  • the stirring structure 20 includes a stirring barrel 21 and a stirring assembly 22 at least partially containing the stirring barrel 21;
  • the first pipeline 31 one end of the first pipeline 31 communicates with the liquid storage barrel 10, and the other end of the first pipeline 31 communicates with the stirring barrel 21;
  • the first filter assembly 40 includes a first filter element 41 and a second filter element 42 arranged in series on the first pipeline 31, and the first filter element 41 and the second filter element 42 are located between the liquid storage tank 10 and the stirring tank 21;
  • the first pressure detection component 50 is provided in the first pipeline 31 and is configured to detect the pressure of the photoresist in the first pipeline 31;
  • the second pipe 32 one end of the second pipe 32 communicates with the stirring barrel 21, and the other end of the second pipe 32 is connected to the coating device 300;
  • the second filter assembly 60 includes a third filter element 61 and a fourth filter element 62 arranged in series in the second pipeline 32, and the third filter element 61 and the fourth filter element 62 are located between the stirring tank 21 and the coating device 300;
  • the pore diameters of the third filter element 61 and the fourth filter element 62 are different from those of the first filter element 41 and the second filter element 42.
  • the present application also proposes a photoresist coating system including a coating device 300 and a filtering device 100.
  • a photoresist coating system including a coating device 300 and a filtering device 100.
  • the photoresist coating system adopts all the technical solutions of all the foregoing embodiments, it has at least all the effects brought by the technical solutions of the foregoing embodiments, which will not be repeated here.
  • the coating device 300 communicates with the stirring structure 20 through the second pipeline 32.

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Abstract

一种过滤装置和光阻涂布系统，该过滤装置包括：储液桶（10），设置为盛放待过滤光阻剂；搅拌结构（20），包括搅拌桶（21）、及至少部分容纳搅拌桶内的搅拌组件（22）；第一管路（31），第一管路（31）的一端连通储液桶（10），第一管路（31）的另一端连通搅拌桶（21）；第一过滤组件（40），设于第一管路（31），并位于储液桶（10）和搅拌桶（21）之间；第一压力检测组件（50），设于第一管路（31），设置为检测第一管路（31）内光阻剂的压力；及第二管路（32），第二管路（32）的一端连通搅拌桶（21），第二管路（32）的另一端连接于涂布装置（300）。

Description

过滤装置和光阻涂布系统
相关申请
本申请要求2018年12月4日申请的，申请号201811478710.X，名称为“过滤装置和光阻涂布系统”的中国专利申请的优先权，在此将其全文引入作为参考。
技术领域
本申请涉及半导体处理设备技术领域，特别涉及一种过滤装置和光阻涂布系统。
背景技术
在半导体加工处理过程中，往往需要采用诸如光阻的光敏材料。光阻，亦称光阻剂，可以应设置为很多工业制程中。一般地，光阻从生产到最后使用通常要经历运输及存放等，在产线使用时，光阻容易产生颗粒，直接涂布在产品基板上，容易造成产品瑕疵，导致产品的良率下降。这里的陈述仅提供与本申请有关的背景信息，而不必然地构成现有技术。
申请内容
本申请的主要目的是提供一种过滤装置，旨在提供一种过滤性能佳、分散性好的过滤装置。
为实现上述目的，本申请提出的过滤装置，应设置为光阻涂布系统，该过滤装置包括：
储液桶，设置为盛放待过滤光阻剂；
搅拌结构，包括搅拌桶、及至少部分容纳所述搅拌桶内的搅拌组件；
第一管路，所述第一管路的一端连通所述储液桶，所述第一管路的另一端连通所述搅拌桶；
第一过滤组件，设于所述第一管路，并位于所述储液桶和所述搅拌桶之间；
第一压力检测组件，设于所述第一管路，设置为检测所述第一管路内光阻剂的压力；及
第二管路，所述第二管路的一端连通所述搅拌桶，所述第二管路的另一端连接于涂布装置。
在一实施例中，所述储液桶包括桶体和第一转接头，所述桶体具有盛放光阻剂的容置腔，所述桶体设有连通所述容置腔的第一开口，所述第一转接头安装于所述第一开口处，所述第一管路的一端穿过所述第一转接头容纳于所述容置腔内；
所述过滤装置还包括通气管，所述通气管的一端穿过所述第一转接头容纳于所述容置腔内，所述通气管的另一端连接有气泵。
在一实施例中，所述第一转接头开设有连通所述容置腔的第一调节孔，所述第一管路的一端穿过所述第一调节孔伸入所述容置腔内，且所述第一管路通过所述第一调节孔可调节伸入所述容置腔内的长度；
且/或，所述第一转接头开设有连通所述容置腔的第二调节孔，所述通气管的一端穿过所述第二调节孔伸入所述容置腔内，且所述通气管通过所述第二调节孔可调节伸入所述容置腔内的长度；
且/或，所述第一管路伸入所述容置腔内的长度大于所述通气管伸入所述容置腔内的长度；
且/或，所述储液桶还包括设于所述第一开口处的密封圈，所述密封圈夹设于所述第一转接头和所述第一开口的内壁之间，设置为密封所述第一转接头和所述桶体的第一开口。
在一实施例中，所述第一过滤组件包括串联设置于所述第一管路的第一滤芯和第二滤芯，所述第一滤芯靠近所述储液桶，所述第二滤芯靠近所述搅拌桶，所述第一滤芯的孔径大于或等于所述第二滤芯的孔径；
所述第一压力检测组件包括第一压力检测器和第二压力检测器；所述第一压力检测器位于所述储液桶和所述第一滤芯之间，设置为检测所述第一管路内光阻剂过滤前的压力；第二压力检测器位于所述第二滤芯和所述搅拌桶之间，设置为检测所述第一管路内光阻剂过滤后的压力。
在一实施例中，所述搅拌桶设有第二开口和盖合于所述第二开口的第二转接头，所述第一管路和第二管路的一端穿过所述第二转接头伸入所述搅拌桶内；
所述搅拌组件包括可转动地穿设于所述第二转接头的搅拌杆、搅拌头及驱动件，所述搅拌头连接于所述搅拌杆伸入所述搅拌桶内的端部，所述驱动件设于所述搅拌杆远离所述搅拌头的一端，所述驱动件驱动所述搅拌杆带动所述搅拌头转动，以搅拌所述搅拌桶内的光阻剂。
在一实施例中，所述过滤装置还包括：
第二过滤组件，包括串联设置于所述第二管路的第三滤芯和第四滤芯，所述第三滤芯和第四滤芯位于所述搅拌桶和所述涂布装置之间，所述第三滤芯靠近所述搅拌桶，所述第四滤芯靠近所述涂布装置，所述第三滤芯的孔径大于或等于所述第四滤芯的孔径；
第二压力检测组件，设于所述第二管路，所述第二压力检测组件包括第三压力检测器和第四压力检测器，所述第三压力检测器位于所述搅拌桶和所述第三滤芯之间，设置为检测所述第二管路内光阻剂过滤前的压力；所述第四压力检测器位于所述第四滤芯和所述涂布装置之间，设置为检测所述第二管路内光阻剂过滤后的压力。
在一实施例中，所述过滤装置还包括设于所述第四压力检测器和所述涂布装置之间的取样检测组件，所述取样检测组件包括连接于所述第二管路的取样管、和连接于所述取样管的取样阀。
在一实施例中，所述过滤装置还包括设于所述第二管路的第一截止阀，所述第一截止阀位于所述取样管和所述涂布装置之间；
且/或，所述过滤装置还包括第三管路和设于第三管路的第二截止阀，所述第三管路的一端与所述取样管连通，所述第三管路的另一端与所述搅拌桶连通。
本申请还提出一种过滤装置，设置为光阻涂布系统，该过滤装置包括：
储液桶，设置为盛放待过滤光阻剂；
搅拌结构，包括搅拌桶、及至少部分容纳所述搅拌桶内的搅拌组件；
第一管路，所述第一管路的一端连通所述储液桶，所述第一管路的另一端连通所述搅拌桶；
第一过滤组件，包括串联设置于所述第一管路的第一滤芯和第二滤芯，所述第一滤芯和第二滤芯位于所述储液桶和所述搅拌桶之间；
第一压力检测组件，设于所述第一管路，设置为检测所述第一管路内光阻剂的压力；
第二管路，所述第二管路的一端连通所述搅拌桶，所述第二管路的另一端连接于涂布装置；及
第二过滤组件，包括串联设置于所述第二管路的第三滤芯和第四滤芯，所述第三滤芯和第四滤芯位于所述搅拌桶和所述涂布装置之间；
其中，所述第三滤芯和第四滤芯的孔径与所述第一滤芯和第二滤芯的孔径不同。
本申请还提出一种光阻涂布系统，包括：
上述所述的过滤装置；和
涂布装置，所述涂布装置通过所述第二管路与所述搅拌结构连通。
本申请还提出一种显示装置，包括上述所述的显示面板
本申请技术方案的过滤装置通过在连通储液桶和搅拌桶的第一管路上设置第一过滤组件和第一压力检测组件，利用第一过滤组件对进入搅拌桶的光阻剂进行过滤，并利用第一压力检测组件检测第一管路内光阻剂的压力，以判断第一管路内光阻剂是否还存在颗粒等物质，从而提高过滤装置的过滤性能；进一步地，通过搅拌组件对搅拌桶内的光阻剂进行分散处理，使分散后的光阻剂通过第二管路直接连接于涂布装置，并涂布在产品基板上，如此可大大降低产品的瑕疵率，有效提升产品品质。
附图说明
为了更清楚地说明本申请实施例或示例性技术中的技术方案，下面将对实施例或示例性技术描述中所需要使用的附图作简单地介绍，显而易见地，下面描述中的附图仅仅是本申请的一些实施例，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图示出的结构获得其他的附图。
图1为本申请过滤装置一实施例的结构示意图；
图2为本申请过滤装置另一实施例的结构示意图；
图3为本申请滤芯一实施例的结构示意图。
本申请目的的实现、功能特点及优点将结合实施例，参照附图做进一步说明。
具体实施方式
下面将结合本申请实施例中的附图，对本申请实施例中的技术方案进行清楚、完整地描述，显然，所描述的实施例仅仅是本申请的一部分实施例，而不是全部的实施例。基于本申请中的实施例，本领域普通技术人员在没有作出创造性劳动前提下所获得的所有其他实施例，都属于本申请保护的范围。
需要说明，本申请实施例中所有方向性指示仅设置为解释在某一特定姿态下各部件之间的相对位置关系、运动情况等，如果该特定姿态发生改变时，则该方向性指示也相应地随之改变。
在本申请中，除非另有明确的规定和限定，术语“连接”、“固定”等应做广义理解，例如，“固定”可以是固定连接，也可以是可拆卸连接，或成一体；可以是机械连接，也可以是电连接；可以是直接相连，也可以通过中间媒介间接相连，可以是两个元件内部的连通或两个元件的相互作用关系，除非另有明确的限定。对于本领域的普通技术人员而言，可以根据具体情况理解上述术语在本申请中的具体含义。
另外，在本申请中如涉及“第一”、“第二”等的描述仅设置为描述目的，而不能理解为指示或暗示其相对重要性或者隐含指明所指示的技术特征的数量。由此，限定有“第一”、“第二”的特征可以明示或者隐含地包括至少一个该特征。另外，各个实施例之间的技术方案可以相互结合，但是必须是以本领域普通技术人员能够实现为基础，当技术方案的结合出现相互矛盾或无法实现时应当认为这种技术方案的结合不存在，也不在本申请要求的保护范围之内。
本申请提出一种过滤装置100，设置为光阻涂布系统。可以理解的，用光阻剂进行涂布前先利用过滤装置100对光阻剂进行过滤和分散处理，可有效提高产品的品质。
请结合参照图1至图3，在本申请实施例中，该过滤装置100包括：
储液桶10，设置为盛放待过滤光阻剂；
搅拌结构20，包括搅拌桶21、及至少部分容纳搅拌桶21内的搅拌组件22；
第一管路31，第一管路31的一端连通储液桶10，第一管路31的另一端连通搅拌桶21；
第一过滤组件40，设于第一管路31，并位于储液桶10和搅拌桶21之间；
第一压力检测组件50，设于第一管路31，设置为检测第一管路31内光阻剂的压力；及
第二管路32，第二管路32的一端连通搅拌桶21，第二管路32的另一端连接于涂布装置300。
具体地，过滤装置100的储液桶10设置为储存和盛放光阻剂，第一管路31将储液桶10和搅拌结构20的搅拌桶21连通，第一过滤组件40设于第一管路31并位于储液桶10和搅拌桶21之间，使得储液桶10内光阻剂经过第一管路31上的第一过滤组件40时，被第一过滤组件40进行过滤处理，从而有效将光阻剂中的颗粒等物质过滤掉。第一压力检测组件50设于第一管路31，第一压力检测组件50可对第一管路31内光阻剂的压力进行检测，从而判断第一管路31内光阻剂是否还存在颗粒等物质，从而提高过滤装置100的过滤效果。
可以理解的，搅拌结构20还包括搅拌组件22，当经过第一过滤组件40的光阻剂进入搅拌桶21内时，可通过搅拌组件22对搅拌桶21内的光阻剂进行搅拌和分散处理，从而提高光阻剂的分散性能，经过分散处理后的光阻剂，通过第二管路32连接于涂布装置300，利用涂布装置300对产品进行光阻涂布，从而提高产品的品质，有效降低产品瑕疵。
本申请的过滤装置100通过在连通储液桶10和搅拌桶21的第一管路31上设置第一过滤组件40和第一压力检测组件50，利用第一过滤组件40对进入搅拌桶21的光阻剂进行过滤，并利用第一压力检测组件50检测第一管路31内光阻剂的压力，以判断第一管路31内光阻剂是否还存在颗粒等物质，从而提高过滤装置100的过滤性能；进一步地，通过搅拌组件22对搅拌桶21内的光阻剂进行分散处理，使分散后的光阻剂通过第二管路32直接连接于涂布装置300，并涂布在产品基板上，如此可大大降低产品的瑕疵率，有效提升产品品质。
在一实施例中，为了方便储液桶10内的光阻剂通过第一管路31流入第一过滤组件40和搅拌桶21，可在储液桶10的底部设置出液口，第一管路31通过出液口与储液桶10连通。当然，为了更好地控制第一管路31的出液量，也可在出液口处设置开关阀，以便有效控制第一管路31的出液量。
可选地，第一管路31的一端也可通过储液桶10的上端伸入储液桶10内，此时，第一管路31伸入储液桶10内的部分需位于储液桶10内光阻剂的液面一下，如此可通过气压或其他方式将储液桶10内光阻剂压入第一管路31内。
在本实施例中，第一过滤组件40可以是过滤桶或过滤器，当然，第一过滤组件40也可以是其他具有过滤功能的结构，在此不做限定。第一压力检测组件50可以是压力传感器或液体压力阀等，当然，第一压力检测组件50也可以是其他能够检测第一管路31内液体压力的结构，在此不做限定。
在一实施例中，如图1和图2所示，储液桶10包括桶体11和第一转接头12，桶体11具有盛放光阻剂的容置腔11a，桶体11设有连通容置腔11a的第一开口11b，第一转接头12安装于第一开口11b处，第一管路31的一端穿过第一转接头12容纳于容置腔11a内；
过滤装置100还包括通气管33，通气管33的一端穿过第一转接头12容纳于容置腔11a内，通气管33的另一端连接有气泵200。
具体地，桶体11具有容置腔11a，并设有连通容置腔11a的第一开口11b。可以理解的，待过滤的光阻剂可通过桶体11的第一开口11b装入桶体11的容置腔11a内，当然，还可在桶体11上端设置连通容置腔11a的入液口，待过滤的光阻剂也可通过入液口装入桶体11的容置腔11a内，在此不做限定。作为本实施例的可选方案，桶体11的第一开口11b即作为装入待过滤的光阻剂的入口，也作为连接第一管路31的出口。
如图1和图2所述，在本实施例中，为了封闭桶体11的第一开口11b，在第一开口11b处设置第一转接头12，第一管路31的一端穿过第一转接头12容纳于容置腔11a内，并伸入容置腔11a内光阻剂的液面以下，如此可方便光阻剂流入第一管路31。可以理解的，
为了进一步保证桶体11的密封性，储液桶10还包括设于第一开口11b处的密封圈13，密封圈13夹设于第一转接头12和第一开口11b的内壁之间，设置为密封第一转接头12和桶体11的第一开口11b。可以理解的，密封圈13可以是密封垫、密封圈或其他能够起到密封作用的结构，在此不做限定。
为了方便将桶体11容置腔11a内的光阻剂压入第一管路31内，过滤装置100还设置有通气管33，通气管33的一端穿过第一转接头12容纳于容置腔11a内。通过在通气管33的一端连接气泵200，利用气泵200通过通气管33往密封的桶体11容置腔11a内充气，可使得桶体11内的压强增加，从而将光阻剂压入第一管路31内。
可以理解的，通气管33伸入容置腔11a内的部分位于光阻剂的液面以上，如此设置，即可实现将光阻剂压入第一管路31内，也不会对桶体11容置腔11a内的光阻剂造成影响。在本实施例中，气泵200可通过通气管33充入压缩的氮气或压缩的干燥空气，当然，只要是不与光阻剂发生反应的其他气体均可，在此不做限定。
在一实施例中，如图1和图2所示，第一转接头12开设有连通容置腔11a的第一调节孔121，第一管路31的一端穿过第一调节孔121伸入容置腔11a内，且第一管路31通过第一调节孔121可调节伸入容置腔11a内的长度。
可以理解的，通过在第一转接头12设置第一调节孔121，利用第一调节孔121可根据桶体11的大小型号以及桶体11内光阻剂的量，调节第一管路31伸入容置腔11a内的长度，以提高过滤装置100的使用便利性和通用性。
在本实施例中，第一调节孔121可以是螺纹孔或滑孔，当然，第一调节孔121还可以是其他能够实现调节第一管路31伸入容置腔11a内的长度的结构在此不做限定。为了提高桶体11的密封性，还可以在第一调节孔121处设置密封结构，如此可保证在调节第一管路31时，第一管路31与第一调节孔121之间的密封性。
在一实施例中，如图1和图2所示，第一转接头12开设有连通容置腔11a的第二调节孔122，通气管33的一端穿过第二调节孔122伸入容置腔11a内，且通气管33通过第二调节孔122可调节伸入容置腔11a内的长度。
可以理解的，通过在第一转接头12设置第二调节孔122，利用第二调节孔122可根据桶体11的大小型号以及桶体11内光阻剂的量，调节通气管33伸入容置腔11a内的长度，以提高过滤装置100的使用便利性和通用性。可选地，第一调节孔121和第二调节孔122间隔设置于第一转接头12上。
在本实施例中，第二调节孔122可以是螺纹孔或滑孔，当然，第二调节孔122还可以是其他能够实现调节通气管33伸入容置腔11a内的长度的结构在此不做限定。为了提高桶体11的密封性，还可以在第二调节孔122处设置密封结构，如此可保证在调节通气管33时，通气管33与第二调节孔122之间的密封性。
如图1和图2所述，作为本实施例的可选方案，第一管路31伸入容置腔11a内的长度大于通气管33伸入容置腔11a内的长度。如此设置，可保证气泵200通过通气管33充入气体时，可顺利将桶体11内的光阻剂压入第一管路31内。
在一实施例中，如图1和图2所示，第一过滤组件40包括串联设置于第一管路31的第一滤芯41和第二滤芯42，第一滤芯41靠近储液桶10，第二滤芯42靠近搅拌桶21，第一滤芯41的孔径大于或等于第二滤芯42的孔径。
可以理解的，通过串联设置两个滤芯，以保证光阻剂通过第一过滤组件40的过滤效果。在本实施例中，第一滤芯41和第二滤芯42一般包括有：PP棉、颗粒活性炭、RO反渗透膜以及后置活性炭等，设置为吸附光阻剂中的固体颗粒等。在本实施例中，为了达到更好的过滤效果，第一滤芯41的孔径大于或等于第二滤芯42的孔径。也即第一管路31内的光阻剂先通过第一滤芯41进行首次吸附过滤，之后在经过第二滤芯42进行二次吸附过滤，以提高过滤装置100过滤光阻剂的过滤效果。由于第二滤芯42的孔径小于或等于第一滤芯41的孔径，在经过第二滤芯42过滤后，光阻剂内的固体颗粒可进一步被吸附和过滤干净。
在一实施例中，如图1和图2所示，第一压力检测组件50包括第一压力检测器51和第二压力检测器52；第一压力检测器51位于储液桶10和第一滤芯41之间，设置为检测第一管路31内光阻剂过滤前的压力；第二压力检测器52位于第二滤芯42和搅拌桶21之间，设置为检测第一管路31内光阻剂过滤后的压力。
可以理解的，第一压力检测器51和第二压力检测器52分别设于第一过滤组件40的两侧，如此可根据第一压力检测器51和第二压力检测器52检测到的压力值判断，第一过滤组件40是否被堵塞，以判断经过第一过滤组件40的光阻剂是否还存在颗粒等物质，从而提高过滤装置100的过滤性能。
在一实施例中，如图1和图2所述，搅拌桶21设有第二开口21b和盖合于第二开口21b的第二转接头211，第一管路31和第二管路32的一端穿过第二转接头211伸入搅拌桶21内；
搅拌组件22包括可转动地穿设于第二转接头211的搅拌杆221、搅拌头222及驱动件223，搅拌头222连接于搅拌杆221伸入搅拌桶21内的端部，驱动件223设于搅拌杆221远离搅拌头222的一端，驱动件223驱动搅拌杆221带动搅拌头222转动，以搅拌搅拌桶21内的光阻剂。
具体地，搅拌桶21具有搅拌腔21a，光阻剂通过第一管路31依次经过第一过滤组件40和第一压力检测组件50后进入搅拌桶21的搅拌腔21a内。通过在搅拌桶21的第二开口21b处设置第二转接头211，可利用第二转接头211安装固定第一管路31和第二管路32，使得第一管路31和第二管路32的一端穿过第二转接头211伸入搅拌桶21内。
为了提高光阻剂的分散性能，搅拌杆221连接有搅拌头222的一端通过第二转接头211伸入搅拌腔21a内，利用驱动件223驱动搅拌杆221带动搅拌头222转动，以搅拌搅拌腔21a内的光阻剂，从而提高光阻剂的分散性能。可以理解的，搅拌杆221与第二转接头211通过轴承等结构实现转动连接，驱动件223也可固定于第二转接头211上，在此不做限定。驱动件223可以是电机、驱动马达等，只要是能够驱动搅拌杆221转动的结构均可，在此不做限定。
在一实施例中，如图1和图2所述，过滤装置100还包括第二过滤组件60，第二过滤组件60包括串联设置于第二管路32的第三滤芯61和第四滤芯62，第三滤芯61和第四滤芯62位于搅拌桶21和涂布装置300之间，第三滤芯61靠近搅拌桶21，第四滤芯62靠近涂布装置300，第三滤芯61的孔径大于或等于第四滤芯62的孔径。
为了进一步提高过滤装置100的过滤性能，在第二管路32上设置第三滤芯61和第四滤芯62，使得经过分散后的光阻剂再次进行过滤，再次过滤后的光阻剂由第二管路32连接到涂布装置300进行产品涂布，从而提高产品的品质，降低产品的不良率。
可以理解的，通过串联设置第三滤芯61和第四滤芯62，以保证光阻剂通过第二过滤组件60的过滤效果。在本实施例中，第三滤芯61和第四滤芯62一般包括有：PP棉、颗粒活性炭、RO反渗透膜以及后置活性炭等，设置为吸附光阻剂中的固体颗粒等。在本实施例中，为了达到更好的过滤效果，第三滤芯61的孔径大于或等于第四滤芯62的孔径。也即第二管路32内的光阻剂先通过第三滤芯61进行首次吸附过滤，之后在经过第四滤芯62进行二次吸附过滤，以提高过滤装置100过滤光阻剂的过滤效果。由于第四滤芯62的孔径小于或等于第三滤芯61的孔径，在经过第四滤芯62过滤后，光阻剂内的固体颗粒可进一步被吸附和过滤干净，如此可保证涂布装置300涂布后产品的品质。
在一实施例中，如图1和图2所述，过滤装置100还包括设于第二管路32的第二压力检测组件70，第二压力检测组件70包括第三压力检测器71和第四压力检测器72，第三压力检测器71位于搅拌桶21和第三滤芯61之间，设置为检测第二管路32内光阻剂过滤前的压力；第四压力检测器72位于第四滤芯62和涂布装置300之间，设置为检测第二管路32内光阻剂过滤后的压力。
可以理解的，第三压力检测器71和第四压力检测器72分别设于第二过滤组件60的两侧，如此可根据第三压力检测器71和第四压力检测器72检测到的压力值判断，第二过滤组件60是否被堵塞，以判断经过第二过滤组件60的光阻剂是否还存在颗粒等物质，从而提高过滤装置100的过滤性能。
在一实施例中，还可在搅拌桶21上设置检测口，通过检测口检测搅拌桶21内光阻剂的过滤效果和分散效果，若检测到搅拌桶21内光阻剂的过滤效果和分散效果较佳，则可直接通过第二管路32将搅拌桶21和涂布装置300连接，此时搅拌桶21内的光阻剂可不经过第二过滤组件60和第二压力检测组件70过滤。若检测到搅拌桶21内光阻剂的过滤效果和分散效果不佳，此时，第二管路32内的光阻剂则需经过第二过滤组件60和第二压力检测组件70再次过滤，以保证涂布装置300涂布产品的品质。
在一实施例中，如图1和图2所示，过滤装置100还包括设于第四压力检测器72和涂布装置300之间的取样检测组件80，取样检测组件80包括连接于第二管路32的取样管81、和连接于取样管81的取样阀82。
可以理解地，在第四压力检测器72和涂布装置300之间设置取样检测组件80，通过取样阀82检测经过第二过滤组件60和第二压力检测组件70后的光阻剂的过滤效果和分散效果，以保证涂布装置300涂布产品的品质。
在一实施例中，如图1和图2所示，过滤装置100还包括设于第二管路32的第一截止阀91，第一截止阀91位于取样管81和涂布装置300之间。可以理解的，第一截止阀91的设置，有利于控制经过过滤装置100后的光阻剂是否继续进入涂布装置300进行涂布。
在一实施例中，如图2所示，过滤装置100还包括第三管路34和设于第三管路34的第二截止阀92，第三管路34的一端与取样管81连通，第三管路34的另一端与搅拌桶21连通。
可以理解的，第三管路34的设置，可实现循环过滤和分散。也即通过取样阀82检测经过第二过滤组件60和第二压力检测组件70后的光阻剂的过滤效果和分散效果，若光阻剂的过滤效果和分散效果较佳，此时关闭第三管路34上的第二截止阀92，打开第二截止阀92，使得经过第二过滤组件60和第二压力检测组件70后的光阻剂直接进入涂布装置300进行涂布；若光阻剂的过滤效果和分散效果不佳，此时，打开第三管路34上的第二截止阀92，关闭第二截止阀92，使得经过第二过滤组件60和第二压力检测组件70后的光阻剂通过第三管路34，再次进入搅拌桶21进行分散，并通过第二过滤组件60和第二压力检测组件70进行过滤。
可以理解的，为了保证由第一管路31进入搅拌桶21的光阻剂不倒流至第一管路31，第一管路31通过第二转接头211伸入搅拌桶21内端部持续处于搅拌桶21内光阻剂的液面上端。为了保证搅拌桶21内的光阻剂顺利进入 第二管路32，第二管路32通过第二转接头211伸入搅拌桶21内端部持续处于搅拌桶21内光阻剂的液面下端。
在本实施例中，也可将搅拌桶21的入液口设于搅拌桶21的上端，将搅拌桶21的出液口设于搅拌桶21的底端，如此可通过搅拌桶21内光阻剂的流动性实现自动流动，在此不做限定。当然，也可将入液口和出液口同时设于搅拌桶21的第二开口21b处，如图1和图2所示，通过第二转接头211同时实现第一管路31的入液和第二管路32的出液。此时，搅拌桶21的搅拌腔呈密封状态，还可通过通入气体将搅拌桶21内的光阻剂压入第二管路32，使得光阻剂顺利通过第二管路32经过第二过滤组件60和第二压力检测组件70后进入涂布装置300。
在一实施例中，如图1和图2所示，该过滤装置100包括：
储液桶10，设置为盛放待过滤光阻剂；
搅拌结构20，包括搅拌桶21、及至少部分容纳搅拌桶21内的搅拌组件22；
第一管路31，第一管路31的一端连通储液桶10，第一管路31的另一端连通搅拌桶21；
第一过滤组件40，包括串联设置于第一管路31的第一滤芯41和第二滤芯42，第一滤芯41和第二滤芯42位于储液桶10和搅拌桶21之间；
第一压力检测组件50，设于第一管路31，设置为检测第一管路31内光阻剂的压力；
第二管路32，第二管路32的一端连通搅拌桶21，第二管路32的另一端连接于涂布装置300；
第二过滤组件60，包括串联设置于第二管路32的第三滤芯61和第四滤芯62，第三滤芯61和第四滤芯62位于搅拌桶21和涂布装置300之间；
其中，第三滤芯61和第四滤芯62的孔径与第一滤芯41和第二滤芯42的孔径不同。
本申请还提出一种光阻涂布系统包括涂布装置300和过滤装置100，该过滤装置100的具体结构参照前述实施例。由于本光阻涂布系统采用了前述所有实施例的全部技术方案，因此至少具有前述实施例的技术方案所带来的所有的效果，在此不再一一赘述。其中，涂布装置300通过第二管路32与搅拌结构20连通。
以上所述仅为本申请的可选实施例，并非因此限制本申请的专利范围，凡是在本申请的申请构思下，利用本申请说明书及附图内容所作的等效结构变换，或直接/间接运用在其他相关的技术领域均包括在本申请的专利保护范围内。

Claims (20)

  1. 一种过滤装置，设置为光阻涂布系统，其中，该过滤装置包括：
    储液桶，设置为盛放待过滤光阻剂；
    搅拌结构，包括搅拌桶、及至少部分容纳所述搅拌桶内的搅拌组件；
    第一管路，所述第一管路的一端连通所述储液桶，所述第一管路的另一端连通所述搅拌桶；
    第一过滤组件，设于所述第一管路，并位于所述储液桶和所述搅拌桶之间；
    第一压力检测组件，设于所述第一管路，设置为检测所述第一管路内光阻剂的压力；及
    第二管路，所述第二管路的一端连通所述搅拌桶，所述第二管路的另一端连接于涂布装置。
  2. 如权利要求1所述的过滤装置，其中，所述储液桶包括桶体和第一转接头，所述桶体具有盛放光阻剂的容置腔，所述桶体设有连通所述容置腔的第一开口，所述第一转接头安装于所述第一开口处，所述第一管路的一端穿过所述第一转接头容纳于所述容置腔内；
    所述过滤装置还包括通气管，所述通气管的一端穿过所述第一转接头容纳于所述容置腔内，所述通气管的另一端连接有气泵。
  3. 如权利要求2所述的过滤装置，其中，所述第一转接头开设有连通所述容置腔的第一调节孔，所述第一管路的一端穿过所述第一调节孔伸入所述容置腔内，且所述第一管路通过所述第一调节孔可调节伸入所述容置腔内的长度。
  4. 如权利要求3所述的过滤装置，其中，所述第一转接头开设有连通所述容置腔的第二调节孔，所述通气管的一端穿过所述第二调节孔伸入所述容置腔内，且所述通气管通过所述第二调节孔可调节伸入所述容置腔内的长度。
  5. 如权利要求4所述的过滤装置，其中，所述第一管路伸入所述容置腔内的长度大于所述通气管伸入所述容置腔内的长度。
  6. 如权利要求4所述的过滤装置，其中，所述第一管路伸入所述容置腔内，并位于所述容置腔内待过滤光阻剂的液面以下，所述通气管伸入所述容置腔内，并位于所述容置腔内待过滤光阻剂的液面上方。
  7. 如权利要求2所述的过滤装置，其中，所述储液桶还包括设于所述第一开口处的密封圈，所述密封圈夹设于所述第一转接头和所述第一开口的内壁之间，设置为密封所述第一转接头和所述桶体的第一开口。
  8. 如权利要求1所述的过滤装置，其中，所述第一过滤组件包括串联设置于所述第一管路的第一滤芯和第二滤芯，所述第一滤芯靠近所述储液桶，所述第二滤芯靠近所述搅拌桶，所述第一滤芯的孔径大于或等于所述第二滤芯的孔径；
    所述第一压力检测组件包括第一压力检测器和第二压力检测器；所述第一压力检测器位于所述储液桶和所述第一滤芯之间，设置为检测所述第一管路内光阻剂过滤前的压力；第二压力检测器位于所述第二滤芯和所述搅拌桶之间，设置为检测所述第一管路内光阻剂过滤后的压力。
  9. 如权利要求1所述的过滤装置，其中，所述搅拌桶设有第二开口和盖合于所述第二开口的第二转接头，所述第一管路和第二管路的一端穿过所述第二转接头伸入所述搅拌桶内；
    所述搅拌组件包括可转动地穿设于所述第二转接头的搅拌杆、搅拌头及驱动件，所述搅拌头连接于所述搅拌杆伸入所述搅拌桶内的端部，所述驱动件设于所述搅拌杆远离所述搅拌头的一端，所述驱动件驱动所述搅拌杆带动所述搅拌头转动，以搅拌所述搅拌桶内的光阻剂。
  10. 如权利要求1所述的过滤装置，其中，所述过滤装置还包括：
    第二过滤组件，包括串联设置于所述第二管路的第三滤芯和第四滤芯，所述第三滤芯和第四滤芯位于所述搅拌桶和所述涂布装置之间，所述第三滤芯靠近所述搅拌桶，所述第四滤芯靠近所述涂布装置，所述第三滤芯的孔径大于或等于所述第四滤芯的孔径；和
    第二压力检测组件，设于所述第二管路，所述第二压力检测组件包括第三压力检测器和第四压力检测器，所述第三压力检测器位于所述搅拌桶和所述第三滤芯之间，设置为检测所述第二管路内光阻剂过滤前的压力；所述第四压力检测器位于所述第四滤芯和所述涂布装置之间，设置为检测所述第二管路内光阻剂过滤后的压力。
  11. 如权利要求10所述的过滤装置，其中，所述过滤装置还包括设于所述第四压力检测器和所述涂布装置之间的取样检测组件，所述取样检测组件包括连接于所述第二管路的取样管、和连接于所述取样管的取样阀。
  12. 如权利要求11所述的过滤装置，其中，所述过滤装置还包括设于所述第二管路的第一截止阀，所述第一截止阀位于所述取样管和所述涂布装置之间。
  13. 如权利要求11所述的过滤装置，其中，所述过滤装置还包括第三管路和设于第三管路的第二截止阀，所述第三管路的一端与所述取样管连通，所述第三管路的另一端与所述搅拌桶连通。
  14. 一种过滤装置，应设置为光阻涂布系统，其中，该过滤装置包括：
    储液桶，设置为盛放待过滤光阻剂；
    搅拌结构，包括搅拌桶、及至少部分容纳所述搅拌桶内的搅拌组件；
    第一管路，所述第一管路的一端连通所述储液桶，所述第一管路的另一端连通所述搅拌桶；
    第一过滤组件，包括串联设置于所述第一管路的第一滤芯和第二滤芯，所述第一滤芯和第二滤芯位于所述储液桶和所述搅拌桶之间；
    第一压力检测组件，设于所述第一管路，设置为检测所述第一管路内光阻剂的压力；
    第二管路，所述第二管路的一端连通所述搅拌桶，所述第二管路的另一端连接于涂布装置；及
    第二过滤组件，包括串联设置于所述第二管路的第三滤芯和第四滤芯，所述第三滤芯和第四滤芯位于所述搅拌桶和所述涂布装置之间；
    其中，所述第三滤芯和第四滤芯的孔径与所述第一滤芯和第二滤芯的孔径不同。
  15. 一种光阻涂布系统，其中，包括：
    过滤装置，包括：
    储液桶，设置为盛放待过滤光阻剂；
    搅拌结构，包括搅拌桶、及至少部分容纳所述搅拌桶内的搅拌组件；
    第一管路，所述第一管路的一端连通所述储液桶，所述第一管路的另一端连通所述搅拌桶；
    第一过滤组件，设于所述第一管路，并位于所述储液桶和所述搅拌桶之间；
    第一压力检测组件，设于所述第一管路，设置为检测所述第一管路内光阻剂的压力；及
    第二管路，所述第二管路的一端连通所述搅拌桶，所述第二管路的另一端连接于涂布装置；和
    涂布装置，所述涂布装置通过所述第二管路与所述搅拌结构连通。
  16. 如权利要求15所述的光阻涂布系统，其中，所述储液桶包括桶体和第一转接头，所述桶体具有盛放光阻剂的容置腔，所述桶体设有连通所述容置腔的第一开口，所述第一转接头安装于所述第一开口处，所述第一管路的一端穿过所述第一转接头容纳于所述容置腔内；
    所述过滤装置还包括通气管，所述通气管的一端穿过所述第一转接头容纳于所述容置腔内，所述通气管的另一端连接有气泵。
  17. 如权利要求16所述的光阻涂布系统，其中，所述第一转接头开设有连通所述容置腔的第一调节孔，所述第一管路的一端穿过所述第一调节孔伸入所述容置腔内，且所述第一管路通过所述第一调节孔可调节伸入所述容置腔内的长度；
    且/或，所述第一转接头开设有连通所述容置腔的第二调节孔，所述通气管的一端穿过所述第二调节孔伸入所述容置腔内，且所述通气管通过所述第二调节孔可调节伸入所述容置腔内的长度；
    且/或，所述第一管路伸入所述容置腔内的长度大于所述通气管伸入所述容置腔内的长度；
    且/或，所述储液桶还包括设于所述第一开口处的密封圈，所述密封圈夹设于所述第一转接头和所述第一开口的内壁之间，设置为密封所述第一转接头和所述桶体的第一开口。
  18. 如权利要求17所述的光阻涂布系统，其中，所述第一过滤组件包括串联设置于所述第一管路的第一滤芯和第二滤芯，所述第一滤芯靠近所述储液桶，所述第二滤芯靠近所述搅拌桶，所述第一滤芯的孔径大于或等于所述第二滤芯的孔径；
    所述第一压力检测组件包括第一压力检测器和第二压力检测器；所述第一压力检测器位于所述储液桶和所述第一滤芯之间，设置为检测所述第一管路内光阻剂过滤前的压力；第二压力检测器位于所述第二滤芯和所述搅拌桶之间，设置为检测所述第一管路内光阻剂过滤后的压力。
  19. 如权利要求18所述的光阻涂布系统，其中，所述过滤装置还包括：
    第二过滤组件，包括串联设置于所述第二管路的第三滤芯和第四滤芯，所述第三滤芯和第四滤芯位于所述搅拌桶和所述涂布装置之间，所述第三滤芯靠近所述搅拌桶，所述第四滤芯靠近所述涂布装置，所述第三滤芯的孔径大于或等于所述第四滤芯的孔径；和
    第二压力检测组件，设于所述第二管路，所述第二压力检测组件包括第三压力检测器和第四压力检测器，所述第三压力检测器位于所述搅拌桶和所述第三滤芯之间，设置为检测所述第二管路内光阻剂过滤前的压力；所述第四压力检测器位于所述第四滤芯和所述涂布装置之间，设置为检测所述第二管路内光阻剂过滤后的压力。
  20. 如权利要求19所述的光阻涂布系统，其中，所述过滤装置还包括设于所述第四压力检测器和所述涂布装置之间的取样检测组件，所述取样检测组件包括连接于所述第二管路的取样管、和连接于所述取样管的取样阀；
    所述过滤装置还包括设于所述第二管路的第一截止阀，所述第一截止阀位于所述取样管和所述涂布装置之间；
    所述过滤装置还包括第三管路和设于第三管路的第二截止阀，所述第三管路的一端与所述取样管连通，所述第三管路的另一端与所述搅拌桶连通。
PCT/CN2018/121893 2018-12-04 2018-12-19 过滤装置和光阻涂布系统 Ceased WO2020113680A1 (zh)

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Publication number Priority date Publication date Assignee Title
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Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1240932A2 (en) * 2001-03-15 2002-09-18 Koganei Corporation Filter unit, chemical liquid supply system, and chemical liquid supply method
CN1766734A (zh) * 2004-10-13 2006-05-03 三星电子株式会社 用于在制造半导体器件等中分配光刻胶的方法和设备
CN1928720A (zh) * 2005-09-06 2007-03-14 东京应化工业株式会社 光刻胶液供给装置及用于得到它的改造套件
CN106391358A (zh) * 2015-07-28 2017-02-15 株式会社思可林集团 涂布装置及涂布方法
CN106463357A (zh) * 2014-05-15 2017-02-22 东京毅力科创株式会社 增加光致抗蚀剂分配系统中再循环和过滤的方法和设备
CN208098509U (zh) * 2018-03-06 2018-11-16 东旭（昆山）显示材料有限公司 光阻容器及涂布机光阻供应系统

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI362059B (en) * 2004-11-25 2012-04-11 Az Electronic Mat Ip Japan Kk Photoresist coating solution supply system and method for supplying photoresist coating solution using thereof, and photoresist coating system using thereof
JP4679990B2 (ja) * 2005-07-22 2011-05-11 東京応化工業株式会社 ポジ型レジスト組成物の製造方法、ポジ型レジスト組成物およびレジストパターン形成方法
JP5439579B2 (ja) * 2012-02-27 2014-03-12 東京エレクトロン株式会社 液処理装置及び液処理方法
US9446331B2 (en) * 2013-03-15 2016-09-20 Taiwan Semiconductor Manufacturing Co., Ltd. System and method for dispensing photoresist
JP6020416B2 (ja) * 2013-11-01 2016-11-02 東京エレクトロン株式会社 処理液供給装置及び処理液供給方法
CN104932203A (zh) * 2015-07-10 2015-09-23 深圳市华星光电技术有限公司 一种光阻汲取装置
CN205903683U (zh) * 2016-04-27 2017-01-25 安徽方兴实业股份有限公司 一种高效过滤器
CN107754381A (zh) * 2017-11-07 2018-03-06 武汉华星光电半导体显示技术有限公司 溶液气泡去除装置及涂布机
CN207502908U (zh) * 2017-11-22 2018-06-15 武汉新芯集成电路制造有限公司 一种光阻供应系统

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1240932A2 (en) * 2001-03-15 2002-09-18 Koganei Corporation Filter unit, chemical liquid supply system, and chemical liquid supply method
CN1766734A (zh) * 2004-10-13 2006-05-03 三星电子株式会社 用于在制造半导体器件等中分配光刻胶的方法和设备
CN1928720A (zh) * 2005-09-06 2007-03-14 东京应化工业株式会社 光刻胶液供给装置及用于得到它的改造套件
CN106463357A (zh) * 2014-05-15 2017-02-22 东京毅力科创株式会社 增加光致抗蚀剂分配系统中再循环和过滤的方法和设备
CN106391358A (zh) * 2015-07-28 2017-02-15 株式会社思可林集团 涂布装置及涂布方法
CN208098509U (zh) * 2018-03-06 2018-11-16 东旭（昆山）显示材料有限公司 光阻容器及涂布机光阻供应系统

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