WO2020037947A1 - 清洗光罩的装置及方法 - Google Patents
清洗光罩的装置及方法 Download PDFInfo
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- WO2020037947A1 WO2020037947A1 PCT/CN2019/072251 CN2019072251W WO2020037947A1 WO 2020037947 A1 WO2020037947 A1 WO 2020037947A1 CN 2019072251 W CN2019072251 W CN 2019072251W WO 2020037947 A1 WO2020037947 A1 WO 2020037947A1
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- WIPO (PCT)
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- photomask
- cleaning
- heater
- cleaner
- dryer
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
Definitions
- the present application relates to the field of display, and in particular to a device and method for cleaning a photomask.
- liquid crystal displays Liquid Crystal Display, LCD
- organic light emitting diode displays Organic Light Emitting Diode, OLED
- cathode RayTube, CRT cathode ray tube
- Glass photomask also called photomask, photomask, MASK, optical glass.
- Common glass photomasks include chrome plate, dry plate, etc., which refers to the use of high-quality quartz glass or soda glass as the substrate and plating on it.
- a layer of metal chromium and photoresist becomes a photosensitive material.
- the designed circuit pattern is precisely positioned and exposed on the photoresist by laser equipment. The exposed area will be developed. After etching and stripping, it will be exposed to metal chromium. Products that form circuit patterns.
- a patterning process is used multiple times. Specifically, a mask is placed on the photoresist-coated substrate, and then the substrate is exposed by an exposure machine. Specifically, the exposure machine emits ultraviolet (UV) light by turning on an ultra-high pressure mercury lamp, and the The image information is transferred to the surface of the photoresist-coated substrate. Based on the pattern of the photomask, the photoresist may have exposed portions and unexposed portions. Then, the developing solution is used to develop the photoresist, so that the exposed portion of the photoresist can be removed, the unexposed portion of the photoresist (positive photoresist) can be retained, or the unexposed portion of the photoresist can be removed. The exposed portion of the photoresist (negative photoresist) is retained so that the photoresist forms the desired pattern.
- UV ultraviolet
- the initiator on the substrate will be broken to form small molecules.
- the small molecules have good compatibility with the solvent, and will dissolve in the solvent and evaporate with the solvent Into the air, and then adhere to the mask, causing the mask to fog.
- the photomask is atomized, the pattern on the photomask will be deformed, and finally the product formed by the photomask will be deformed, affecting the product quality.
- environmental problems in the machine will also cause particles to form on the photomask, which will also affect product quality.
- the photomask After the photomask is dirty, the photomask needs to be cleaned.
- the commonly used cleaning method is to remove the photomask from the exposure machine, then carry it to the photomask cleaning machine for cleaning, and then install it on the exposure machine after washing.
- the current cleaning method is mainly composed of a fluid-like cleaning solution and a driven photomask rotation. It uses the traction force of the fluid during the cleaning process to cause the particles to rotate, which is the main physical mechanism for the particles to be removed.
- KOH potassium hydroxide
- tank heater Tank Heater
- the double heater (Heater) line is a series circuit (as shown in Figure 2): first, if there is an abnormality such as a short circuit, the two heaters will not work and the heating will stop; second, a single heater (Heater) is damaged, the circuit will be disconnected, the entire heater (Heater) is not working, heating is stopped, affecting the efficiency of auxiliary equipment, and the double heater (Heater) connection line has no anti-corrosive device, potassium hydroxide (KOH)
- KOH potassium hydroxide
- the main purpose of this application is to provide a device and method for cleaning a photomask, so as to optimize the problems mentioned above.
- Another object of the present application is a device for cleaning a photomask, including: a body; a conveying device including a carrier capable of carrying the photomask, the photomask can be moved into the body; a cleaner, provided In the fixed frame of the body, the washer includes a cleaning head that can be extended or retracted corresponding to the photomask; and a heater provided at the bottom of the body to heat the cleaning liquid to an appropriate temperature.
- the heater further includes a first heater and a second heater; the first heater and the second heater are connected in a parallel circuit manner; and the cleaner further corresponds to the light of the cleaning head.
- a remover is provided on the feeding side of the mask, which can remove particles on the mask before wiping the mask.
- Another object of the present application is a method for cleaning a photomask, including: providing a body; providing a conveying device having a carrier capable of carrying the photomask to move the photomask into the body; and providing a cleaner,
- the cleaning device is provided in a fixed frame of the body, the cleaning device has a cleaning head which can be extended or retracted corresponding to the photomask; and a heater is provided at the bottom of the body to heat the cleaning liquid to an appropriate level. temperature.
- the heater further includes a first heater and a second heater, respectively, for heating the cleaning liquid.
- the first heater and the second heater are connected in a parallel circuit manner.
- the cleaner is further provided with a dryer on the cleaning head corresponding to the discharge side of the photomask, which can be used for drying and cleaning immediately after the photomask is wiped with compressed dry air or nitrogen. Rear photomask.
- the dryer has a heating component so that it can provide hot compressed dry air or hot nitrogen to further improve its drying effect.
- the cleaner is further provided with a remover on the cleaning head corresponding to the feeding side of the photomask, which can remove particles on the photomask before cleaning the photomask.
- the heater in the method for cleaning a photomask, further includes a first heater and a second heater, respectively, for heating the cleaning liquid.
- the first heater and the second heater are connected in a parallel circuit manner.
- the washer in the method for cleaning a photomask, is further provided with a dryer on a side of the cleaning head corresponding to the discharge of the photomask, which is used to compress the photomask after it is wiped. Dry the air or nitrogen to immediately dry the cleaned photomask.
- the dryer in the method for cleaning a photomask, has a heating component so that it can provide hot compressed dry air or hot nitrogen to further improve the drying effect.
- the cleaner in the method for cleaning a photomask, is further provided with a remover on the cleaning head corresponding to the feeding side of the photomask, and the particles on the photomask can be removed before cleaning the photomask .
- the application can prevent the short circuit of the liquid leakage corrosion circuit and increase the safety of the machine; prevent the failure of one heater from being broken, resulting in the failure of the other heater, and increase the stability of the cleaning mask during the machine work; and the parallel circuit can Control multiple components to work independently, each component will not affect each other after damage.
- FIG. 1 is a schematic diagram of an exemplary chemical solution leaking to a heater connecting line.
- FIG. 2 is a series circuit diagram of an exemplary dual heater circuit.
- FIG. 3a is a parallel circuit circuit diagram of a dual heater circuit according to an embodiment of the present application.
- FIG. 3b is a schematic diagram of a dual heater according to an embodiment of the present application.
- FIG. 4a is a schematic diagram of an apparatus for cleaning a photomask according to an embodiment of the present application.
- FIG. 4b is a schematic diagram of an apparatus for cleaning a photomask according to another embodiment of the present application.
- FIG. 4c is a schematic diagram of a heater in a device for cleaning a photomask according to an embodiment of the present application.
- FIG. 5 is a flowchart of a method for cleaning a photomask according to an embodiment of the present application.
- FIG. 3 a is a parallel circuit circuit diagram of a dual heater circuit according to an embodiment of the present application
- FIG. 3 b is a schematic diagram of the dual heater circuit according to an embodiment of the present application.
- a parallel circuit circuit 10 for a dual heater circuit includes a power switch 130, a first heater 110, and a second heater 120; The first heater 110 and the second heater 120 are connected in a parallel circuit manner.
- FIG. 4a is a schematic diagram of a device for cleaning a photomask according to an embodiment of the application
- FIG. 4b is a schematic diagram of a device for cleaning a photomask according to another embodiment of the application
- FIG. 4c is a heating device in the device for cleaning a photomask according to an embodiment of the application ⁇ Schematic.
- a photomask cleaning device 20 includes: a body 200; and a conveying device 230 including a carrier 232 capable of carrying the photomask, and the photomask can be moved into the body 200 Inside; a washer (not shown) is disposed in the fixed frame of the body 200, the washer includes a cleaning head which can be extended or retracted corresponding to the photomask; and a heater 240 is provided in the The bottom of the body 200 is used to heat the cleaning liquid to a proper temperature.
- the heater 240 further includes a first heater 110 and a second heater 120 for heating the cleaning solution, respectively.
- the first heater 110 and the second heater 120 are connected in a parallel circuit manner.
- the cleaner is further provided with a dryer on the cleaning head corresponding to the discharge side of the photomask, which can be used for drying and cleaning immediately after the photomask is wiped with compressed dry air or nitrogen. Rear photomask.
- the dryer has a heating component so that it can provide hot compressed dry air or hot nitrogen to further improve its drying effect.
- a photomask cleaning device 20 includes: a body 200; and a conveying device 230 including a carrier capable of carrying the photomask. 232.
- the photomask can be moved into the body 200.
- a washer (not shown) is provided in the fixed frame of the body 200. The washer includes a cleaning device that can be extended or retracted corresponding to the photomask.
- the cleaner is further provided with a dryer on the cleaning head corresponding to the discharge side of the photomask, which can be used for drying and cleaning immediately after the photomask is wiped with compressed dry air or nitrogen. Rear photomask.
- the dryer has a heating component so that it can provide hot compressed dry air or hot nitrogen to further improve its drying effect.
- FIG. 5 is a flowchart of a method for cleaning a photomask according to an embodiment of the present application.
- a method for cleaning a photomask includes: providing a body 200; and providing a conveying device 230 having a light-carrying capacity.
- the carrier 230 of the mask can move the photomask into the body 200; a cleaner (not shown) is provided and is arranged in the fixed frame of the body.
- the cleaner has a A cleaning head; and a heater 240 provided at the bottom of the body 200 to heat the cleaning liquid to an appropriate temperature.
- the heater 240 in the method for cleaning a photomask, the heater 240 further includes a first heater 110 and a second heater 120, respectively. Used to heat the cleaning solution.
- the first heater 110 and the second heater 120 are connected in a parallel circuit manner.
- the cleaner in the method for cleaning a photomask, is further provided with a cleaning head corresponding to the discharge side of the photomask.
- a dryer (not shown) is used to dry the cleaned photomask immediately after the photomask is wiped with compressed dry air or nitrogen.
- the photomask cleaning machine 20 is stopped first, and the potassium hydroxide mixed liquid is discharged and cleaned; After the power to the heater circuit is cut off, the multimeter confirms that there is no current in the heater circuit; replace the old heater with a screwdriver, replace the two new first heaters 110 and the second heater 120, and then connect the first heater 110 and the The second heater 120 is connected in parallel circuit; and the multimeter confirms that there is no abnormality in the circuit. After the power is turned on to test whether the two heaters (the first heater 110 and the second heater 120) are individually powered off, the other one works normally.
- step S511 a body is provided.
- a conveying device which has a carrier capable of carrying a photomask, and the photomask can be moved into the body.
- a cleaner is provided, and the cleaner is provided in the fixed frame of the body.
- the cleaner has a cleaning head that can be extended or retracted corresponding to the photomask.
- a heater is provided and disposed at the bottom of the body to heat the cleaning liquid to a proper temperature.
- the application can prevent the short circuit of the liquid leakage corrosion circuit and increase the safety of the machine; prevent the failure of one heater from being broken, resulting in the failure of the other heater, and increase the stability of the cleaning mask during the machine work; and the parallel circuit can Control multiple components to work independently, each component will not affect each other after damage, so it has industrial applicability.
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- General Physics & Mathematics (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Cleaning In General (AREA)
Abstract
一种清洗光罩的装置(20)及方法,清洗光罩的装置(20)包括:一机体(200);一输送装置(230),其包括一可承载光罩的承载器(232),可将光罩移入机体(200)内;一清洗器,设置于机体(200)的固定框架中,清洗器包括一可对应光罩伸出或缩回的清洗头;以及一加热器(240),设置于机体(200)的底部,用以将清洗液加热至适当温度。
Description
本申请涉及显示领域,特别是涉及一种清洗光罩的装置及方法。
在显示技术领域,液晶显示器(Liquid Crystal Display,LCD)与有机发光二极管显示器(Organic Light Emitting Diode,OLED)等平板显示器己经逐步取代阴极射线管(Cathode Ray Tube,CRT)显示器,广泛的应用于液晶电视、手机、个人数字助理、数字相机、计算机屏幕或笔记本电脑屏幕等。
玻璃光罩,也称光罩、光掩模版、MASK、光学玻璃,常见的玻璃光罩有铬版、干版等,是指用高品质石英玻璃或苏打玻璃作为衬底,在其上面镀上一层金属铬和感光胶,成为一种感光材料,把已设计好的电路图形通过激光设备精密定位曝光在感光胶上,被曝光的区域会被显影出来,经过蚀刻、脱膜后在金属铬上形成电路图形的产品。
而在平板显示器的制造过程中,会多次利用构图工艺。具体为,在涂有光刻胶的基板上方放置光罩(Mask),然后利用曝光机对基板进行曝光,具体的,曝光机通过开启超高压水银灯发出紫外线(Ultraviolet,UV)光,将光罩上的图像信息转移到涂有光刻胶的基板表面上,基于光罩的图案,光刻胶会有被曝光的部分和未被曝光的部分。再利用显影液对光刻胶进行显影,即可去除光刻胶被曝光的部分,保留光刻胶未被曝光的部分(正性光刻胶),或者去除光刻胶未被曝光的部分,保留光刻胶被曝光的部分(负性光刻胶),从而使光刻胶形成所需的图形。
在构图工艺的制作过程中,当UV光照射到基板上时,会造成基板上的起始剂断键形成小分子,小分子与溶剂相溶性较好,会溶解在溶剂中,并随溶剂挥发到空气中,进而附着在光罩上,造成光罩雾化。光罩雾化后,光罩上图案(Pattern)会产生变形,最终通过光罩形成的产品变形,影响产品品质。另外机台内环境问题也会导致光罩上形成有杂质(particle),同样会影响产品品质。
光罩脏污后就需要对光罩进行清洗,目前通常采用的清洗方法为:将光罩从曝光机上拆下,再搬运到光罩清洗机上进行清洗,洗完之后再安装到曝光机上。
关于光罩的清洗,近年来更发展出一种利用气体或流体所产生的震波来将粒子从光罩表面去除,这种清洗技术的设备成本极高,同时因其是令微粒受震波作用而扬起,但其真空设备不见得能有效的将微粒吸走,而造成微粒进一步污染其他设备与材料。
而目前的清洗方法主要是以流体状的清洗液配合驱动光罩旋转而成,其是利用清洗过程中流体的牵引力造成微粒旋转,是微粒被移除的主要物理机制,且当氢氧化钾(KOH)混液在坦克加热器(Tank Heater)若遇到漏液,药液渗漏到加热器连接线引起线路短路(如图1所示),烧坏加热器导致两支加热器无法加热,导致光罩在清洗过程,清洁能力下降。
双加热器(Heater)线路为一个串联回路(如图2所示):第一,如遇线路短路等异常,两个加热器(Heater)将无法工作,加热停止;第二,单一个加热器(Heater)损坏,线路将断路,整组加热器(Heater)不工作,加热停止,影响附属设备工作效率,且双加热器(Heater)连接线无防腐蚀性的装置,氢氧化钾(KOH)混液具有腐蚀性,线路容易被混液腐蚀后漏电、断路。
因此,本申请的主要目的在于提供一种清洗光罩的装置及方法,以更优化上述所提的问题。
发明内容
为了解决上述技术问题,本申请的目的在于,提供一种清洗光罩的装置,包括:一机体;一输送装置,其包括一可承载光罩的承载器,可将光罩移入所述机体内;一清洗器,设置于所述机体的固定框架中,所述清洗器包括一可对应光罩伸出或缩回的清洗头;以及一加热器,设置于所述机体的底部,用以将清洗液加热至适当温度。
本申请的目的及解决其技术问题还可以采用以下技术方案来实现的。
本申请的另一目的为一种清洗光罩的装置,包括:一机体;一输送装置,其包括一可承载光罩的承载器,可将光罩移入所述机体内;一清洗器,设置于所述机体的固定框架中,所述清洗器包括一可对应光罩伸出或缩回的清洗头;以及一加热器,设置于所述机体的底部,用以将清洗液加热至适当温度;其中,所述加热器更包括一第一加热器以及一第二加热器;所述第一加热器及所述第二加热器以并联电路方式连接;所述清洗器进一步于清洗头对应光罩进料一侧设有一去除器,可于擦拭光罩前预先去除光罩上的微粒。
本申请的又一目的为一种清洗光罩的方法,包括:提供一机体;提供一输送装置,其具有一可承载光罩的承载器,可将光罩移入机体内;提供一清洗器,设置于所述机体的固定框架中,所述清洗器具有一可对应光罩伸出或缩回的清洗头;以及提供一加热器,设置于所述机体的底部,用以将清洗液加热至适当温度。
在本申请的一实施例中,所述加热器更包括一第一加热器以及一第二加热器,分别用以加热清洗液。
在本申请的一实施例中,所述第一加热器及所述第二加热器以并联电路方式连接。
在本申请的一实施例中,所述清洗器进一步于清洗头对应光罩出料一侧设有一烘干器,用于当光罩经擦拭后,可利用压缩干燥空气或氮气立即烘干清洗后的光罩。
在本申请的一实施例中,所述烘干器具有一加热组件,使其可提供热压缩干燥空气或热氮气,进一步增进其烘干效果。
在本申请的一实施例中,所述清洗器进一步于清洗头对应光罩进料一侧设有一去除器,可于擦拭光罩前预先去除光罩上的微粒。
在本申请的一实施例中,所述清洗光罩的方法,所述加热器更包括一第一加热器以及一第二加热器,分别用以加热清洗液。
在本申请的一实施例中,所述清洗光罩的方法,所述第一加热器及所述第二加热器以并联电路方式连接。
在本申请的一实施例中,所述清洗光罩的方法,所述清洗器进一步于清洗头对应光罩出料一侧设有一烘干器,用于当光罩经擦拭后,可利用压缩干燥空气或氮气立即烘干清洗后的光罩。
在本申请的一实施例中,所述清洗光罩的方法,所述烘干器具有一加热组件,使其可提供热压缩干燥空气或热氮气,进一步增进其烘干效果。
在本申请的一实施例中,所述清洗光罩的方法,所述清洗器进一步于清洗头对应光罩进料一侧设有一去除器,可于擦拭光罩前预先去除光罩上的微粒。
本申请可防止漏液腐蚀线路出现短路,增加机台安全性;防止一支加热器故障出现断路,导致另一支加热器不能工作,增加机台工作中清洗光罩稳定性;且并联电路能控制多个元器件独立工作,各个元器件损坏后互不影响。
图1为范例式的药液渗漏到加热器连接线示意图。
图2为范例式的双加热器线路的串联回路电路图。
图3a为本申请一实施例的双加热器线路的并联回路电路图。
图3b为本申请一实施例的双加热器示意图。
图4a为本申请一实施例的清洗光罩的装置示意图。
图4b为本申请另一实施例的清洗光罩的装置示意图。
图4c为本申请一实施例的清洗光罩的装置中的加热器示意图。
图5为本申请一实施例的清洗光罩的方法流程图。
以下各实施例的说明是参考附加的图式,用以例示本申请可用以实施的特定实施例。本申请所提到的方向用语,例如「上」、「下」、「前」、「后」、「左」、「右」、「内」、「外」、「侧面」等,仅是参考附加图式的方向。因此,使用的方向用语是用以说明及理解本申请,而非用以 限制本申请。
附图和说明被认为在本质上是示出性的,而不是限制性的。在图中,结构相似的器是以相同标号表示。另外,为了理解和便于描述,附图中示出的每个组件的尺寸和厚度是任意示出的,但是本申请不限于此。
在附图中,为了清晰起见,夸大了层、膜、面板、区域等的厚度。在附图中,为了理解和便于描述,夸大了一些层和区域的厚度。将理解的是,当例如层、膜、区域或基底的组件被称作“在”另一组件“上”时,所述组件可以直接在所述另一组件上,或者也可以存在中间组件。
另外,在说明书中,除非明确地描述为相反的,否则词语“包括”将被理解为意指包括所述组件,但是不排除任何其它组件。此外,在说明书中,“在......上”意指位于目标组件上方或者下方,而不意指必须位于基于重力方向的顶部上。
为更进一步阐述本申请为达成预定发明目的所采取的技术手段及功效,以下结合附图及具体的实施例,对依据本申请提出的一种清洗光罩的装置及方法,其具体实施方式、结构、特征及其功效,详细说明如后。
图3a为本申请一实施例的双加热器线路的并联回路电路图及图3b为本申请一实施例的双加热器示意图。请参考图3a及图3b,在本申请的一实施例中,一种双加热器线路的并联回路电路10,包括:一电源开关130、一第一加热器110及一第二加热器120;所述第一加热器110及所述第二加热器120以并联电路方式连接。
图4a为本申请一实施例的清洗光罩的装置示意图、图4b为本申请另一实施例的清洗光罩的装置示意图及图4c为本申请一实施例的清洗光罩的装置中的加热器示意图。在本申请的一实施例中,一种清洗光罩的装置20,包括:一机体200;一输送装置230,其包括一可承载光罩的承载器232,可将光罩移入所述机体200内;一清洗器(图未示),设置于所述机体200的固定框架中,所述清洗器包括一可对应光罩伸出或缩回的清洗头;以及一加热器240,设置于所述机体200的底部,用以将清洗液加热至适当温度。
在本申请的一实施例中,所述加热器240更包括一第一加热器110以及一第二加热器120,分别用以加热清洗液。
在本申请的一实施例中,所述第一加热器110及所述第二加热器120以并联电路方式连接。
在本申请的一实施例中,所述清洗器进一步于清洗头对应光罩出料一侧设有一烘干器,用于当光罩经擦拭后,可利用压缩干燥空气或氮气立即烘干清洗后的光罩。
在本申请的一实施例中,所述烘干器具有一加热组件,使其可提供热压缩干燥空气或热 氮气,进一步增进其烘干效果。
请参考图4a、图4b及图4c,在本申请的一实施例中,一种清洗光罩的装置20,包括:一机体200;一输送装置230,其包括一可承载光罩的承载器232,可将光罩移入所述机体200内;一清洗器(图未示),设置于所述机体200的固定框架中,所述清洗器包括一可对应光罩伸出或缩回的清洗头;以及一加热器240,设置于所述机体200的底部,用以将清洗液加热至适当温度;其中,所述加热器240更包括一第一加热器110以及一第二加热器120;所述第一加热器110及所述第二加热器120以并联电路方式连接;所述清洗器(图未示)进一步于清洗头对应光罩进料一侧设有一去除器(图未示),可于擦拭光罩前预先去除光罩上的微粒。
在本申请的一实施例中,所述清洗器进一步于清洗头对应光罩出料一侧设有一烘干器,用于当光罩经擦拭后,可利用压缩干燥空气或氮气立即烘干清洗后的光罩。
在本申请的一实施例中,所述烘干器具有一加热组件,使其可提供热压缩干燥空气或热氮气,进一步增进其烘干效果。
图5为本申请一实施例的清洗光罩的方法流程图。在本申请的一实施例中,请参考图4a、图4b、图4c及图5,一种清洗光罩的方法,包括:提供一机体200;提供一输送装置230,其具有一可承载光罩的承载器230,可将光罩移入机体200内;提供一清洗器(图未示),设置于所述机体的固定框架中,所述清洗器具有一可对应光罩伸出或缩回的清洗头;以及提供一加热器240,设置于所述机体200的底部,用以将清洗液加热至适当温度。
请参考图4b、图4c及图5,在本申请的一实施例中,所述清洗光罩的方法,所述加热器240更包括一第一加热器110以及一第二加热器120,分别用以加热清洗液。
请参考图4b、图4c及图5,在本申请的一实施例中,所述清洗光罩的方法,所述第一加热器110及所述第二加热器120以并联电路方式连接。
请参考图4b、图4c及图5,在本申请的一实施例中,所述清洗光罩的方法,所述清洗器(图未示)进一步于清洗头对应光罩出料一侧设有一烘干器(图未示),用于当光罩经擦拭后,可利用压缩干燥空气或氮气立即烘干清洗后的光罩。
请参考图3a、图3b及图4a,在本申请的一实施例中,所述清洗光罩的方法,首先将光罩清洗机20停机,氢氧化钾混液药液排放完后清洁干净;加热器线路断电,万用表确认加热器线路无电流后;用螺丝刀更换下旧加热器,更换上两支新第一加热器110及第二加热器120,再将所述第一加热器110及所述第二加热器120以并联电路方式连接;以及万用表确认电路无异常,通电测试双加热器(第一加热器110、第二加热器120)单独断电后,另一支是否正常工作。
请参考图5,在流程S511中,提供一机体。
请参照图5,在流程S512中,提供一输送装置,其具有一可承载光罩的承载器,可将光罩移入机体内。
请参照图5,在流程S513中,提供一清洗器,设置于所述机体的固定框架中,所述清洗器具有一可对应光罩伸出或缩回的清洗头。
请参照图5,在流程S514中,提供一加热器,设置于所述机体的底部,用以将清洗液加热至适当温度。
本申请可防止漏液腐蚀线路出现短路,增加机台安全性;防止一支加热器故障出现断路,导致另一支加热器不能工作,增加机台工作中清洗光罩稳定性;且并联电路能控制多个元器件独立工作,各个元器件损坏后互不影响,因此,具有工业实用性。
“在一些实施例中”及“在各种实施例中”等用语被重复地使用。所述用语通常不是指相同的实施例;但它也可以是指相同的实施例。“包含”、“具有”及“包括”等用词是同义词,除非其前后文意显示出其它意思。
以上所述,仅是本申请的实施例,并非对本申请作任何形式上的限制,虽然本申请已以具体的实施例揭露如上,然而并非用以限定本申请,任何熟悉本专业的技术人员,在不脱离本申请技术方案范围内,当可利用上述揭示的技术内容作出些许更动或修饰为等同变化的等效实施例,但凡是未脱离本申请技术方案的内容,依据本申请的技术实质对以上实施例所作的任何简单修改、等同变化与修饰,均仍属于本申请技术方案的范围内。
Claims (15)
- 一种清洗光罩的装置,其中,包括:一机体;一输送装置,其包括一可承载光罩的承载器,可将光罩移入所述机体内;一清洗器,设置于所述机体的固定框架中,所述清洗器包括一可对应光罩伸出或缩回的清洗头;以及一加热器,设置于所述机体的底部,用以将清洗液加热至适当温度。
- 如权利要求1所述的清洗光罩的装置,其中,所述加热器更包括一第一加热器以及一第二加热器,分别用以加热清洗液。
- 如权利要求2所述的清洗光罩的装置,其中,所述第一加热器及所述第二加热器以并联电路方式连接。
- 如权利要求1所述的清洗光罩的装置,其中,所述清洗器进一步于清洗头对应光罩出料一侧设有一烘干器,用于当光罩经擦拭后,可利用压缩干燥空气或氮气立即烘干清洗后的光罩。
- 如权利要求4所述的清洗光罩的装置,其中,所述烘干器具有一加热组件,使其可提供热压缩干燥空气或热氮气,进一步增进其烘干效果。
- 如权利要求1所述的清洗光罩的装置,其中,所述清洗器进一步于清洗头对应光罩进料一侧设有一去除器,可于擦拭光罩前预先去除光罩上的微粒。
- 一种清洗光罩的装置,其中,包括:一机体;一输送装置,其包括一可承载光罩的承载器,可将光罩移入所述机体内;一清洗器,设置于所述机体的固定框架中,所述清洗器包括一可对应光罩伸出或缩回的清洗头;以及一加热器,设置于所述机体的底部,用以将清洗液加热至适当温度;其中,所述加热器更包括一第一加热器以及一第二加热器;所述第一加热器及所述第二加热器以并联电路方式连接;所述清洗器进一步于清洗头对应光罩进料一侧设有一去除器,可于擦拭光罩前预先去除光罩上的微粒。
- 如权利要求7所述的清洗光罩的装置,其中,所述清洗器进一步于清洗头对应光罩出料一侧设有一烘干器,用于当光罩经擦拭后,可利用压缩干燥空气或氮气立即烘干清洗后的光罩。
- 如权利要求8所述的清洗光罩的装置,其中,所述烘干器具有一加热组件,使其可提供 热压缩干燥空气或热氮气,进一步增进其烘干效果。
- 一种清洗光罩的方法,其中,包括:提供一机体;提供一输送装置,其具有一可承载光罩的承载器,可将光罩移入机体内;提供一清洗器,设置于所述机体的固定框架中,所述清洗器具有一可对应光罩伸出或缩回的清洗头;以及提供一加热器,设置于所述机体的底部,用以将清洗液加热至适当温度。
- 如权利要求10所述的清洗光罩的方法,其中,所述加热器更包括一第一加热器以及一第二加热器,分别用以加热清洗液。
- 如权利要求11所述的清洗光罩的方法,其中,所述第一加热器及所述第二加热器以并联电路方式连接。
- 如权利要求10所述的清洗光罩的方法,其中,所述清洗器进一步于清洗头对应光罩出料一侧设有一烘干器,用于当光罩经擦拭后,可利用压缩干燥空气或氮气立即烘干清洗后的光罩。
- 如权利要求13所述的清洗光罩的方法,其中,所述烘干器具有一加热组件,使其可提供热压缩干燥空气或热氮气,进一步增进其烘干效果。
- 如权利要求10所述的清洗光罩的方法,其中,所述清洗器进一步于清洗头对应光罩进料一侧设有一去除器,可于擦拭光罩前预先去除光罩上的微粒。
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