WO2020015219A1 - 清洗设备 - Google Patents

清洗设备 Download PDF

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Publication number
WO2020015219A1
WO2020015219A1 PCT/CN2018/111507 CN2018111507W WO2020015219A1 WO 2020015219 A1 WO2020015219 A1 WO 2020015219A1 CN 2018111507 W CN2018111507 W CN 2018111507W WO 2020015219 A1 WO2020015219 A1 WO 2020015219A1
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WO
WIPO (PCT)
Prior art keywords
cleaning
unit
washing
film
film washing
Prior art date
Application number
PCT/CN2018/111507
Other languages
English (en)
French (fr)
Inventor
高军召
魏垚
林健
Original Assignee
北京铂阳顶荣光伏科技有限公司
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Publication of WO2020015219A1 publication Critical patent/WO2020015219A1/zh

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B11/00Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto
    • B08B11/04Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto specially adapted for plate glass, e.g. prior to manufacture of windshields
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02Cleaning by the force of jets or sprays
    • B08B3/022Cleaning travelling work
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04Cleaning involving contact with liquid
    • B08B3/041Cleaning travelling work
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04Cleaning involving contact with liquid
    • B08B3/048Overflow-type cleaning, e.g. tanks in which the liquid flows over the tank in which the articles are placed
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04Cleaning involving contact with liquid
    • B08B3/08Cleaning involving contact with liquid the liquid having chemical or dissolving effect
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26DRYING
    • F26BDRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B21/00Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects

Definitions

  • the present application relates to, but is not limited to, a cleaning device, and particularly to a cleaning device for cleaning photovoltaic glass chips.
  • the existing cleaning method is manual cleaning, that is, the surface of photovoltaic glass is cleaned by alcohol and rags.
  • the cleaning labor intensity is high, the work efficiency is low, and Manual cleaning does not guarantee cleaning quality.
  • the technical problem to be solved by this application is to provide a cleaning device that meets the requirements for the cleaning process of photovoltaic glass chips, while greatly reducing the cleaning labor and guaranteeing the cleaning quality, and solving the manual labor of cleaning photovoltaic glass chips with high labor intensity, low work efficiency, and inability to Problems in ensuring cleaning quality.
  • the technical solution adopted by this application to solve its technical problems is to provide a cleaning device for cleaning photovoltaic glass chips, wherein the cleaning device includes: a rack; a transfer device, the transfer device is arranged on the rack, and the photovoltaic glass chip is placed On the conveying device, the conveying device conveys the photovoltaic glass chip and moves on the rack; the feeding device, the feeding device is arranged along the conveying direction of the conveying device, and the feeding device is used to receive the photovoltaic glass chip; the pre-cleaning device, the pre-cleaning device It is set along the conveying direction of the conveying device, and the pre-cleaning device is connected with the feeding device.
  • the pre-cleaning device is used to clean the impurities on the surface of the photovoltaic glass chip;
  • the film washing device the film washing device is set along the conveying direction of the conveying device, and the film is washed
  • the device is connected to a pre-cleaning device, and the film washing device cleans the protective ink on the surface of the photovoltaic glass chip through a film washing liquid;
  • the sewage washing device the sewage washing device is arranged along the conveying direction of the conveying device, and the sewage washing device is connected to the film washing device, sewage
  • the washing device is used to clean the film washing chemical solution remaining on the surface of the photovoltaic glass chip;
  • Spraying device spraying device is arranged along the conveying direction of the conveying device, and the spraying device is connected with the sewage flushing device, the spraying device is used to clean the surface of the photovoltaic glass chip;
  • air knife device the air knife device is along the conveying direction of the conveying device And the air knife device is connected with the
  • the present application replaces the traditional manual cleaning method with automatic equipment, and performs automatic cleaning throughout the process, and can clean multiple photovoltaic glass chips at one time, greatly reducing the cleaning labor and cleaning quality, and can ensure the cleaning quality.
  • FIG. 1 is a schematic front view of a cleaning device according to an embodiment of the present application.
  • FIG. 2 is a schematic side view of a cleaning device according to an embodiment of the present application.
  • FIG. 3 is a schematic diagram of a cleaning process of a cleaning device according to an embodiment of the present application.
  • FIG. 4 is a schematic front view of a film washing unit according to an embodiment of the present application.
  • FIG. 5 is a schematic side view of a film washing unit according to an embodiment of the present application.
  • FIG. 6 is a schematic top view of a film washing unit according to an embodiment of the present application.
  • Loading device 1 first pre-cleaning unit 2, second pre-cleaning unit 3, first isolation zone 4, first film washing unit 5, second film washing unit 6, third film washing unit 7, second isolation zone 8. Sewage washing device 9, first spray unit 10, second spray unit 11, third spray unit 12, fourth spray unit 13, fifth spray unit 14, air knife device 15, unloading device 16.
  • this application discloses a cleaning device 18 for cleaning photovoltaic glass chips 26 according to an embodiment.
  • the cleaning device 18 includes:
  • the frame 19 is formed by splicing a plurality of rectangular frames 27, or may be a whole rectangular frame structure, which mainly plays a supporting role, and is not limited to the frame structure disclosed in this embodiment.
  • the transfer device 20 is disposed on the rack 19, and the photovoltaic glass chip 26 is placed on the transfer device 20.
  • the transfer device 20 transports the photovoltaic glass chip 26 and moves on the rack 19.
  • the transfer device 20 is composed of a plurality of transfer mechanisms. Each conveying mechanism is correspondingly arranged in the feeding device 1, the pre-cleaning device 21, the film washing device 22, the sewage washing device 9, the spraying device 23, the air knife device 15, and the discharging device 16. Among them, the conveying mechanism corresponding to the conveying device 20 provided in the film washing device 22 is referred to as a film washing conveying mechanism 49.
  • the feeding device 1 is arranged along the conveying direction of the conveying device 20.
  • the feeding device 1 is used to receive the photovoltaic glass chip 26.
  • the feeding device 1 includes a feeding robot arm and a suction cup provided on the feeding robot arm.
  • the feeding robot arm sucks the photovoltaic glass chip 26 through the suction cup to realize automatic feeding of the photovoltaic glass chip 26.
  • the personnel may also choose other feeding device structures to automatically receive the photovoltaic glass chip 26, which is not limited to the structure of the feeding device disclosed in this embodiment, and the width and length of the feeding device 1 are greater than the length and width of the photovoltaic glass chip 26 It is used to ensure that after loading, the photovoltaic glass chips 26 are all in the loading device 1.
  • the pre-cleaning device 21 is arranged along the conveying direction of the conveying device 20, and the pre-cleaning device 21 is connected to the feeding device 1.
  • the pre-cleaning device 21 is used to clean the impurities on the surface of the photovoltaic glass chip 26.
  • the pre-cleaning device 21 Including a plurality of pre-cleaning units, and the plurality of pre-cleaning units are sequentially arranged along the conveying direction of the conveying device 20, and are used for multi-stage cleaning of the photovoltaic glass chip 26 to ensure that impurities on the surface of the photovoltaic glass chip 26 are cleaned, as described herein
  • the impurities may be sand particles or dust remaining on the surface of the photovoltaic glass chip 26 after the sand blasting treatment.
  • This application uses two pre-cleaning units as an example for illustration, but is not limited thereto.
  • the film washing device 22 is arranged along the conveying direction of the conveying device 20, and the film washing device 22 is connected to the pre-cleaning device 21, and the film washing device 22 cleans the protective ink on the surface of the photovoltaic glass chip 26 through the film washing liquid,
  • a first isolation zone 4 is provided between the film washing device 22 and the pre-cleaning device 21, and the first isolation zone 4 forms a space between the film washing device 22 and the pre-cleaning device 21, so that the film washing solution
  • the membrane washing device 22 overflows, it enters the interval space (that is, the first isolation zone 4), so that the barrier film washing liquid enters the pre-cleaning device 21; and when the water in the pre-washing device 21 overflows, it enters the interval.
  • the film washing device 22 may be provided with multiple film washing units, and the multiple film washing units are sequentially arranged along the conveying direction of the conveying device, and are used to perform multi-stage film washing on the photovoltaic glass chip 26 to improve the film washing cycle and ensure film washing.
  • the protective ink on the surface of the clean photovoltaic glass chip 26 is exemplified by setting three film washing units as an example, but it is not limited thereto.
  • the cleaning device 18 is also provided with a sensor 24.
  • the sensor 24 is used to detect whether there is a photovoltaic glass chip 26 in the cleaning device 18, and transmits the sensed signal to the control end through a wireless signal or data line to realize automatic control of the film washing device. 22 Whether to perform film washing, as to how the control terminal controls the circuit setting of the film washing device is not the scope of protection of this application, so the circuit settings of the control terminal controlling the film washing device are not described in detail here.
  • the sensor 24 is mainly used to detect whether there is a photovoltaic glass chip 26 in the cleaning device 18.
  • the sensor 24 is located in the cleaning device 18 and how many sensors are provided, it is not the protection of this application, as long as it can detect cleaning It is sufficient if there is a photovoltaic glass chip 26 in the device 18, please refer to FIG. 2.
  • the sensor 24 is set in the film washing device 22, but it is not limited thereto.
  • the sensor 24 may be a light sensor or an infrared sensor. The sensor 24 mainly detects whether there is a photovoltaic glass chip 26 in the film washing device 22, and is not limited to the light sensor or the infrared sensor disclosed in this embodiment.
  • Sewage washing device 9 sewage washing device 9 is arranged along the conveying direction of conveying device 20, and sewage washing device 9 is connected to film washing device 22, sewage washing device 9 is used to clean the residual film washing liquid on the surface of photovoltaic glass chip 26, sewage A second isolation zone 8 is also provided between the washing device 9 and the membrane washing device 22, and the second isolation zone 8 forms a space between the sewage washing device 9 and the membrane washing device 22, so that the membrane washing solution is washed from the membrane.
  • the device 22 When the device 22 overflows, it enters the interval space (ie, the second isolation zone 8), so that the barrier film washing liquid enters the sewage flushing device 9; and when the water in the sewage flushing device 9 overflows, it enters the interval space ( That is, in the second isolation zone 8), the water in the sewage washing device 9 is blocked from entering the membrane washing device 22.
  • the interval space ie, the second isolation zone 8
  • the spraying device 23 is arranged along the conveying direction of the conveying device 20, and the spraying device 23 is connected to the sewage flushing device 9.
  • the spraying device 23 is used to clean the surface of the photovoltaic glass chip 26.
  • the spraying device 23 can A plurality of spraying units are provided, and the plurality of spraying units are sequentially arranged along the conveying direction of the conveying device, and are used to perform multi-stage spraying on the photovoltaic glass chip 26 to ensure that the surface of the photovoltaic glass chip 26 is cleaned.
  • Each spraying unit is taken as an example for illustration, but it is not limited thereto.
  • the air knife device 15 and the air knife device 15 are arranged along the conveying direction of the conveying device 20, and the air knife device 15 is connected to the spray device 23.
  • the air knife device 15 is used to dry the moisture on the surface of the photovoltaic glass chip 26.
  • the manufacturing material of the air knife may be aluminum alloy or stainless steel, but it is not limited thereto.
  • Unloading device 16 the unloading device 16 is arranged along the conveying direction of the conveying device 20, and the unloading device 16 is connected to the wind knife device 15, and the unloading device 16 realizes automatic transfer of the photovoltaic glass chip 26 that has been cleaned, specifically, the unloading
  • the device 16 includes a feeding robot arm and a suction cup provided on the feeding robot arm. The feeding robot arm sucks the photovoltaic glass chip 26 through the suction cup to realize automatic transfer of the cleaned photovoltaic glass chip 26.
  • the personnel of this technology can also choose other The unloading device realizes the automatic transfer and cleaning of the photovoltaic glass chip 26, which is not limited to the unloading device structure disclosed in this embodiment.
  • the lower part of the cavity of the pre-cleaning device 21, the membrane washing device 22, the sewage washing device 9, the spraying device 23, the first isolation area 4 and the second isolation area 8 are all inclined structures. Please refer to FIG. The direction is toward the water outlet for easy drainage of sewage.
  • the pre-cleaning device 21 of the present application includes a first pre-cleaning unit 2 and a second pre-cleaning unit 3, the first pre-cleaning unit 2 is connected to the feeding device 1, and the second pre-cleaning unit 3 is connected to the first pre-cleaning unit 2.
  • the film washing device 22 further includes a first air cutting device 17, which is disposed between the first pre-cleaning unit 2 and the second pre-cleaning unit 3.
  • the first air cutting device 17 includes a first upper and lower air cutting tube and a first high pressure fan. The first high pressure fan supplies a high pressure air source for the first upper and lower air cutting tube.
  • High-pressure airflow blocks the water in the first pre-cleaning unit 2 from entering the second pre-cleaning unit 3; the first pre-cleaning unit 2 and the second pre-cleaning unit 3 can use the same water tank or different water tanks to supply water.
  • the water outlet of the second pre-cleaning unit 3 is connected to the water inlet of the water tank corresponding to the first pre-cleaning unit 2 to clean the second pre-cleaning unit 3
  • the water is discharged into a water tank corresponding to the first pre-cleaning unit 2 for cleaning by the first pre-cleaning unit 2, which can save water.
  • the film washing device 22 of the present application includes a first film washing unit 5, a second film washing unit 6, and a third film washing unit 7.
  • the first film washing unit 5 is connected to the pre-washing device 21, and the second film washing unit 6 is connected to the first film.
  • the washing unit 5 and the third membrane washing unit 7 are connected to the second membrane washing unit 6.
  • the film washing device 22 further includes a second wind cutting device 25.
  • the second wind cutting device 25 includes a front second wind cutting device 251 and a rear second wind cutting device 252.
  • the front second wind cutting device 251 is provided in the first film washing unit.
  • the front second air cutting device 251 includes a second upper and lower air cutting pipe and a second high pressure fan.
  • the second high pressure fan supplies a high pressure air source for the second upper and lower air cutting pipe.
  • the two-wind cutting device 251 blocks the film washing solution of the first film washing unit 5 from entering the second film washing unit 6 by the high-pressure air flow blown from the second upper and lower air cutting pipes.
  • the second wind cutting device 25 further includes a rear second wind cutting device 252. The rear second wind cutting device 252 is disposed between the second film washing unit 6 and the third film washing unit 7.
  • the rear second wind cutting device 252 includes a first Two upper and lower air cutting tubes and a second high-pressure fan, the second high-pressure fan supplies high-pressure air source for the second upper and lower air cutting tube, and the second air-cutting device 252 blocks the second membrane washing through the high-pressure airflow blown by the second upper and lower air cutting tube.
  • the film washing solution of the unit 6 enters the third film washing unit 7.
  • the material of the cavity of the film washing device 22 of the present application can be stainless steel, polyvinyl chloride or polypropylene.
  • the stainless steel model is SUS316, because molybdenum (Mo) is added to the stainless steel of the model SUS316. Therefore, its corrosion resistance, atmospheric corrosion resistance and high temperature strength are particularly good, and it can be used under harsh conditions.
  • Mo molybdenum
  • each film washing unit provided by an embodiment of the present application includes a spray washing treatment tank 37 and a lifting mechanism 51.
  • the spray cleaning processing tank 37 is used for cleaning the photovoltaic glass chip 26.
  • the lifting mechanism 51 includes a first lifting unit 38, and the first lifting unit 38 is disposed in the spray cleaning processing tank 37.
  • the film washing conveying mechanism 49 is disposed in the spray washing processing tank 37. One end of the film washing conveying mechanism 49 is movably connected to the spray washing processing tank 37, and the other end is movably connected to the first lifting unit 38.
  • the film washing conveying mechanism 49 is used to transfer the photovoltaic glass chip 26, and the first lifting unit 38 is used to drive the film washing conveying mechanism 49 relative to the spray washing processing tank 37.
  • the protective film on the chip 26 is separated from the photovoltaic glass chip 26. Therefore, the cleaning effect is better and the cleaning efficiency is higher.
  • the protective film is a protective coating disposed on the photovoltaic glass chip 26. As in an embodiment, the protective film is an ink layer coated on the photovoltaic glass chip 26.
  • the structure of the first lifting unit 38 may be various. It can be understood that the first lifting unit 38 may be an air cylinder, a hydraulic cylinder, or an electric telescopic rod, etc., as long as the mechanical structure capable of achieving the lifting movement is acceptable.
  • the number of the first lifting units 38 may be one, two or even more.
  • the movable connection mode of the first lifting unit 38 and the film washing and conveying mechanism 49 may be in various ways, as long as the connection mode capable of achieving the relative movement of the two can be referred to as a movable connection. It can be understood that the first lifting unit 38 and the film washing and conveying mechanism 49 can be rotationally connected through components such as a rotating shaft. The first lifting unit 38 and the film washing and conveying mechanism 49 can also be movably connected by a soft object.
  • the movable connection mode of the film washing conveying mechanism 49 and the spray washing treatment tank 37 may be various ways, and as long as it is a connection mode capable of achieving relative movement between the two, it may be referred to as an active connection.
  • the film washing conveying mechanism 49 and the spray washing processing tank 37 can be rotationally connected by a shaft or the like.
  • the film washing conveying mechanism 49 and the spray washing treatment tank 37 can also be movably connected by a soft object.
  • one end of the film washing conveying mechanism 49 is movably connected to the spray washing processing tank 37 through the first lifting unit 38, and the other end of the film washing conveying mechanism 49 is also movably connected to the spray washing processing tank 37.
  • the first lifting unit 38 is used to drive the film washing conveying mechanism 49 relative to the spray washing processing tank 37.
  • one end of the film washing conveying mechanism 49 is rotatably connected to the spray washing treatment tank 37, and the other end is rotatably connected to the first lifting unit 38.
  • the first lifting unit 38 is used for lifting and lowering the film washing and conveying mechanism 49 so that the film washing and conveying mechanism 49 is in an inclined state or a horizontal state.
  • the film washing conveying mechanism 49 is placed in a horizontal state by the first lifting unit 38, and the film washing conveying mechanism 49 transmits the photovoltaic glass chip 26 into the spray washing processing tank 37.
  • the first washing unit 38 can be used to adjust the film washing conveying mechanism 49 to an inclined state.
  • the protective film on the photovoltaic glass chip 26 is easily peeled off from the photovoltaic glass chip 26 during the cleaning process.
  • the film washing conveying mechanism 49 may be adjusted to be inclined by 3 ° -7 ° with respect to a horizontal plane. In this way, the photovoltaic glass chip 26 located on the film washing and conveying mechanism 49 can be inclined at an appropriate angle, which is more conducive to the protection film on the photovoltaic glass chip 26 falling off.
  • the lifting mechanism 51 may further include a second lifting unit 50.
  • the end of the film washing conveying mechanism 49 which is far away from the first lifting unit 38 is movably connected to the second lifting unit 50, and the end of the film washing conveying mechanism 49 is movably connected to the spray washing treatment tank 37 through the second lifting unit 50, and the second lifting unit 50 It is used to drive the film washing conveying mechanism 49 to move relative to the spray washing treatment tank 37.
  • the second lifting unit 50 not only the tilting movement of the film washing conveying mechanism 49 relative to the spray processing tank 37 can be realized, but also the film washing conveying mechanism 49 can be shaken relative to the spray cleaning processing tank 37, which is further beneficial to the photovoltaic glass chip.
  • the protective film on 26 comes off.
  • the second lifting unit 50 may have various structures. It can be understood that the second lifting unit 50 may be an air cylinder, a hydraulic cylinder or an electric telescopic rod, etc., as long as the lifting function can be realized.
  • the film washing conveying mechanism 49 and the second elevating unit 50 can be connected in various ways.
  • the film washing conveying mechanism 49 and the second elevating unit 50 may be relatively rotatably connected.
  • the film washing conveying mechanism 49 and the second elevating unit 50 can be movably connected by using a soft object.
  • the first lifting unit 38 and the second lifting unit 50 are both rotatably connected to the film washing conveying mechanism 49 through a universal joint.
  • a universal joint between the first lifting unit 38 and the film washing conveying mechanism 49 and a universal joint between the second lifting unit 50 and the film washing conveying mechanism 49 both ends of the film washing conveying mechanism 49 can be realized Different degrees of lifting and turning in different directions. Therefore, the photovoltaic glass chip 26 can be driven by the film washing and conveying mechanism 49 to achieve different degrees of tilt and non-directional shaking. Furthermore, the protection film on the photovoltaic glass chip 26 is easier to fall off, and the cleaning effect and the cleaning efficiency of the photovoltaic glass chip 26 are improved.
  • the number of the first elevating unit 38 and the second elevating unit 50 is not limited, as long as the relative movement of the film washing conveying mechanism 49 relative to the spray washing processing tank 37 can be achieved. In one embodiment, there are two first lifting units 38, one or two second lifting units 50, and the first lifting units 38 and the second lifting units 50 are distributed in a triangle or a quadrangle.
  • first lifting units 38 and the second lifting units 50 there may be two second lifting units 50, one or two first lifting units 38, and the first lifting unit 38 and the second lifting units 50 may be distributed in a triangle or a quadrangle.
  • the driving power of the first lifting unit 38 and the second lifting unit 50 to the film washing conveying mechanism 49 can be more balanced and easy to control, thereby making the film washing
  • the tilting and / or rocking motion of the transport mechanism 49 is more stable.
  • the film washing unit may not include a lifting mechanism.
  • the film washing unit further includes a shower 39 disposed above the spray processing tank 37, and the shower 39 is configured to spray the photovoltaic glass chip 26.
  • the shower 39 includes a first shower 40 and a second shower 41.
  • the first shower 40 and the second shower 41 are located on the upper and lower sides of the transport plane of the film washing conveying mechanism 49, respectively.
  • the shower 39 is used to spray the photovoltaic glass chip 26 on the film washing and conveying mechanism 49, which is more conducive to the removal of the protective film on the photovoltaic glass chip 26.
  • the membrane washing unit further includes a solution tank 42, a first pipe 43, and a second pipe 45.
  • One end of the first pipe 43 is in communication with the shower 39, and the other end of the first pipe 43 is in communication with the solution tank 42.
  • the first pipe 43 is further provided with a first valve 44 for cutting off or communicating with the first pipe. 43.
  • One end of the second pipe 45 is in communication with the spray washing treatment tank 37, and the other end of the second pipe 45 is in communication with the solution tank 42.
  • the second pipe 45 is provided with a second valve 46, and the second valve 46 is used to cut off or communicate with the second pipe. 45.
  • the solution tank 42 is used to provide a cleaning liquid for cleaning the photovoltaic glass chip 26. Depending on the composition of the protective film on the photovoltaic glass chip 26, different types of cleaning solutions can be selected.
  • the first valve 44 and the second valve 46 may be a solenoid valve, a pneumatic valve, a manual valve, a mechanical valve, or the like.
  • the solution tank 42 may be provided with a liquid pump for pumping liquid to facilitate pumping the liquid in the solution tank 42 into the spray-washing treatment tank 37.
  • the first valve 44 is opened and the second valve 46 is closed, the liquid in the solution tank 42 is sprayed to the photovoltaic glass chip 26 through the first pipe 43 to realize the spraying function of the photovoltaic glass chip 26.
  • the first valve 44 is closed and the second valve 46 is opened, the liquid in the solution tank 42 will enter the spray processing tank 37 through the second pipe 45, and the photovoltaic glass chip 26 may be immersed at this time.
  • the spray-washing treatment tank 37 can simultaneously soak and spray the photovoltaic glass chip 26, so that the volume of the film-washing unit can be reduced. And because the immersion and spraying are in the same operating space, this makes the first lifting unit 38, the second lifting unit 50 and the film washing conveying mechanism 49 cooperate without having to consider the impact on the transportation of the photovoltaic glass chip 26, and the overall operation process It is also smoother.
  • the film washing unit further includes an overflow port 47, which is disposed on a side wall of the spray processing tank 37, and the overflow port 47 is located above the transport plane of the film washing conveying mechanism 49.
  • the overflow port 47 is used to discharge excess liquid to avoid damage to the photovoltaic glass chip 26 due to excessive pressure.
  • the film washing unit further includes a liquid discharge port 48, and the liquid discharge port 48 is disposed at the bottom of the spray-washing treatment tank 37.
  • the liquid discharge port 48 By providing the liquid discharge port 48, the liquid in the spray washing treatment tank 37 can be discharged by using the liquid discharge port 48 after each process of the membrane washing unit is completed.
  • the film washing conveying mechanism 49 can use the existing roller-type transmission mechanism or the slide-rail type transmission mechanism, as long as it can realize the transmission of the photovoltaic glass chip 26 and can communicate with the first lifting unit 38 and the second lifting unit. 50 matches.
  • the film washing unit may further include a controller, and the first lifting unit 38, the second lifting unit 50, the film washing conveying mechanism 49, the shower 39, the first valve 44 and the second valve 46 may be electrically connected to the controller.
  • the use of a controller to control the operation of each of the above components can improve the automatic operation and efficiency of the membrane washing unit.
  • the spraying device 23 of the present application includes a first spraying unit 10, a second spraying unit 11, a third spraying unit 12, a fourth spraying unit 13, and a fifth spraying unit 14, and the first spraying unit 10 is connected to sewage
  • the washing device 9 the second spray unit 11 is connected to the first spray unit 10
  • the third spray unit 12 is connected to the second spray unit 11
  • the fourth spray unit 13 is connected to the third spray unit 12, and the fifth spray
  • the unit 14 is connected to the fourth spray unit 13, and the water in the fifth spray unit 14 is sequentially circulated for use by the fourth spray unit 13, the third spray unit 12, the second spray unit 11, and the first spray unit 10.
  • the water spraying in the fifth spraying unit 14 After the water spraying in the fifth spraying unit 14 is completed, it enters the fourth spraying unit 13 and after the water spraying in the fourth spraying unit 13 is completed, it enters the third spraying unit 12 and the third spraying unit 12 After the water spraying is completed, it enters the second spraying unit 11 and after the water spraying is completed, it enters the first spraying unit 10 for use, and the water of the first spraying unit 10 enters the sewage flushing device 9 so that Can save water.
  • the circulating water supply method of an embodiment disclosed in the present application is that the water outlet of the fifth spraying unit 14 and the fourth spraying unit 13, the third spraying unit 12, the second spraying unit 11 and the first spraying unit are respectively The water inlet of 10 is connected, or the water outlet of the fifth spraying unit 14 is connected to the water inlet of the fourth spraying unit 13, and the water outlet of the fourth spraying unit 13 is connected to the water inlet of the third spraying unit 12.
  • the water outlet of the three spraying unit 12 is connected to the water inlet of the second spraying unit 11, and the water outlet of the second spraying unit 11 is connected to the water inlet of the first spraying unit 10.
  • the personnel of this technology can also choose Other connection methods realize circulating water supply, which is not limited to the circulating water supply disclosed in this embodiment.
  • the cleaning process for cleaning the photovoltaic glass chip 26 is as follows:
  • Step S1 loading.
  • the feeding device 1 receives the photovoltaic glass chip 26, and the conveying device 20 conveys the photovoltaic glass chip 26 to move on the rack 19.
  • the photovoltaic glass chip 26 moves in the conveying direction of the conveying device 20, and sequentially passes through the following steps of the cleaning process:
  • Step S2 Pre-cleaning.
  • the first pre-cleaning unit 2 and the second pre-cleaning unit 3 in the pre-cleaning device 21 pre-clean the photovoltaic glass chip 26 to clean impurities on the surface of the photovoltaic glass chip 26.
  • Step S3 film washing.
  • the first film washing unit 5, the second film washing unit 6, and the third film washing unit 7 in the film washing device 22 sequentially perform the film washing on the pre-cleaned photovoltaic glass chip 26 through the film washing liquid to ensure that the film is cleaned.
  • Step S4 Sewage washing.
  • the sewage washing device 9 cleans the film washing solution remaining on the surface of the photovoltaic glass chip 26 after the film washing.
  • Step S5 Spray.
  • the first spraying unit 10, the second spraying unit 11, the third spraying unit 12, the fourth spraying unit 13, and the fifth spraying unit 14 in the spraying device 23 sequentially wash the photovoltaic glass chip after the sewage is washed 26 is sprayed to ensure that the surface of the photovoltaic glass chip 26 is cleaned.
  • Step S6 Air drying.
  • the air knife device 15 blows off the moisture on the surface of the photovoltaic glass chip 26 after spraying.
  • Step S7 Feeding.
  • the unloading device 16 transports the photovoltaic glass chip 26 after the cleaning is completed through a unloading robot arm and a suction cup.
  • the cleaning device of the present application replaces the traditional manual cleaning method with automatic equipment, and performs automatic cleaning throughout the process, and multiple photovoltaic glass chips can be cleaned at one time, greatly reducing the cleaning labor and ensuring the cleaning quality.

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Photovoltaic Devices (AREA)

Abstract

一种清洗设备(18),用于光伏玻璃芯片(26)的清洗,其中清洗设备(18)包括:机架(19);传送装置(20),传送装置(20)设置在机架(19)上,光伏玻璃芯片(26)放置在传送装置(20)上;上料装置(1),上料装置(1)沿着传送装置(20)的传送方向设置;预清洗装置(21),预清洗装置(21)沿着传送装置(20)的传送方向设置,并且预清洗装置(21)衔接上料装置(1);膜洗装置(22),膜洗装置(22)沿着传送装置(20)的传送方向设置,并且膜洗装置(22)衔接预清洗装置(21);污水冲洗装置(9),污水冲洗装置(9)沿着传送装置(20)的传送方向设置,并且污水冲洗装置(9)衔接膜洗装置(22);喷淋装置(23),喷淋装置(23)沿着传送装置(20)的传送方向设置,并且喷淋装置(23)衔接污水冲洗装置(9)。该设备通过自动化设备代替传统的手工清洗方式,大幅降低清洗劳动人力,并且可以保证清洗质量。

Description

清洗设备 技术领域
本申请涉及但不限于一种清洗设备,特别是涉及一种用于清洗光伏玻璃芯片的清洗设备。
背景技术
能源短缺已经成为阻碍当今世界经济发展的重大问题,开发新能源已经成为广泛的共识。太阳能作为一种无污染、可再生能源,它的利用受到越来越多的重视。太阳能光伏玻璃的透光率在太阳能利用方面起着重要的作用。
在太阳能光伏玻璃生产工艺流程中,光伏玻璃的清洗是一道重要工艺步骤,现有的清洗方法为手动清洗,即通过酒精和抹布对光伏玻璃表面进行清洁,清洗劳动强度大,工作效率低,且人工清洗也无法保证清洗质量。
因此,是否有一种光伏玻璃的自动化清洗设备,能够大幅降低清洗劳动人力和保证清洗质量,无疑是相关业界努力的目标。
发明内容
本申请所要解决的技术问题是提供一种清洗设备,满足光伏玻璃芯片的清洗工艺要求,同时大幅降低清洗劳动人力及保证清洗质量,解决手动清洗光伏玻璃芯片劳动强度大,工作效率低,且无法保证清洗质量的问题。
本申请解决其技术问题所采用的技术方案是:提供一种清洗设备,用于光伏玻璃芯片的清洗,其中清洗设备包括:机架;传送装置,传送装置设置在机架上,光伏玻璃芯片放置在传送装置上,传送装置运送光伏玻璃芯片在机架上移动;上料装置,上料装置沿着传送装置的传送方向设置,上料装置用于接收光伏玻璃芯片;预清洗装置,预清洗装置沿着传送装置的传送方向设置,并且预清装置衔接上料装置,预清洗装置用于清洗光伏玻璃芯片表面的杂质;膜洗 装置,膜洗装置沿着传送装置的传送方向设置,并且膜洗装置衔接预清洗装置,膜洗装置通过膜洗药液清洗光伏玻璃芯片表面上的保护油墨;污水冲洗装置,污水冲洗装置沿着传送装置的传送方向设置,并且污水冲洗装置衔接膜洗装置,污水冲洗装置用于清洗光伏玻璃芯片表面残留的膜洗药液;喷淋装置,喷淋装置沿着传送装置的传送方向设置,并且喷淋装置衔接污水冲洗装置,喷淋装置用于清洗光伏玻璃芯片的表面;风刀装置,风刀装置沿着传送装置的传送方向设置,并且风刀装置衔接喷淋装置,风刀装置用于吹干光伏玻璃芯片表面的水分;以及下料装置,下料装置沿着传送装置的传送方向设置,并且下料装置衔接风刀装置,下料装置用于传送清洗完成的光伏玻璃芯片。
本申请与现有技术相比具有的优点有:
本申请通过自动化设备代替传统的手工清洗方式,全程自动化清洗,且一次可清洗多个光伏玻璃芯片,大幅降低清洗劳动人力,并且可以保证清洗质量。
附图说明
利用附图对本申请作进一步说明,但附图中的内容不构成对本申请的任何限制。
图1是本申请一实施例的清洗设备的主视图示意图。
图2是本申请一实施例的清洗设备的侧视图示意图。
图3是本申请一实施例的清洗设备的清洗流程示意图。
图4是本申请一实施例的膜洗单元的主视示意图。
图5是本申请一实施例的膜洗单元的侧视示意图。
图6是本申请一实施例的膜洗单元的俯视示意图。
主要组件符号说明:
上料装置1,第一预清洗单元2,第二预清洗单元3,第一隔离区4,第一膜洗单元5,第二膜洗单元6,第三膜洗单元7,第二隔离区8,污水冲洗装置9,第一喷淋单元10,第二喷淋单元11,第三喷淋单元12,第四喷淋单元13, 第五喷淋单元14,风刀装置15,下料装置16,第一风切装置17,清洗设备18,机架19,传送装置20,预清洗装置21,膜洗装置22,喷淋装置23,传感器24,第二风切装置25,前第二风切装置251,后第二风切装置252,光伏玻璃芯片26,长方形框架27,喷洗处理槽37,第一升降单元38,喷淋器39,第一喷淋器40,第二喷淋器41,溶液箱42,第一管道43,第一阀门44,第二管道45,第二阀门46,溢流口47,排液口48,膜洗传送机构49,第二升降单元50,升降机构51,步骤S1:上料,步骤S2:预清洗,步骤S3:膜洗,步骤S4:污水冲洗,步骤S5:喷淋,步骤S6:风干,步骤S7:下料。
具体实施方式
实施例1
如图1所示,本申请揭露一实施例的一种清洗设备18,用于光伏玻璃芯片26的清洗,其中清洗设备18包括:
机架19,机架19为由若干长方形框架27拼接组成,或也可为一个整体的长方形框架结构,主要起支撑作用,并不以本实施例公开的机架结构为限。
传送装置20,传送装置20设置在机架19上,光伏玻璃芯片26放置在传送装置20上,传送装置20运送光伏玻璃芯片26在机架19上移动,传送装置20由多个传送机构组成,每个传送机构对应设置在上料装置1、预清洗装置21、膜洗装置22、污水冲洗装置9、喷淋装置23、风刀装置15和下料装置16内。其中,传送装置20对应设置在膜洗装置22内的传送机构称为膜洗传送机构49。
上料装置1,上料装置1沿着传送装置20的传送方向设置,上料装置1用于接收光伏玻璃芯片26。具体的,上料装置1包括上料机械手臂及设置在上料机械手臂上的吸盘,上料机械手臂通过吸盘吸住光伏玻璃芯片26,实现光伏玻璃芯片26的自动上料,此项技术的人员也可以选择其他上料装置结构实现自动接收光伏玻璃芯片26,并不以本实施例揭露的上料装置构造为限,且上料装置1的宽度和长度均大于光伏玻璃芯片26长度和宽度,用于确保上料后, 光伏玻璃芯片26全部在上料装置1内。
预清洗装置21,预清洗装置21沿着传送装置20的传送方向设置,并且预清装置21衔接上料装置1,预清洗装置21用于清洗光伏玻璃芯片26表面的杂质,其中预清洗装置21包括多个预清洗单元,且多个预清洗单元沿着传送装置20的传送方向依次设置,用于对光伏玻璃芯片26进行多段清洗,确保清洗干净光伏玻璃芯片26表面的杂质,在此所述的杂质可能是光伏玻璃芯片26在经过喷砂处理后表面残留的砂粒或者灰尘等,本申请以设置两个预清洗单元为例进行举例说明,但并不以此为限。
膜洗装置22,膜洗装置22沿着传送装置20的传送方向设置,并且膜洗装置22衔接预清洗装置21,膜洗装置22通过膜洗药液清洗光伏玻璃芯片26表面上的保护油墨,并且膜洗装置22与预清洗装置21之间还设有第一隔离区4,该第一隔离区4使膜洗装置22与预清洗装置21之间形成一段间隔空间,使膜洗药液从膜洗装置22溢出时进入该段间隔空间(即第一隔离区4)内,进而实现阻隔膜洗药液进入预清洗装置21内;以及,预清洗装置21中的水溢出时进入该段间隔空间(即第一隔离区4)内,进而实现阻隔预清洗装置21中的水进入膜洗装置22内。其中,膜洗装置22可以设置多个膜洗单元,且多个膜洗单元沿着传送装置的传送方向依次设置,用于对光伏玻璃芯片26进行多段膜洗,提高膜洗节拍,确保膜洗干净光伏玻璃芯片26表面的保护油墨,本申请以设置三个膜洗单元为例进行举例说明,但并不以此为限。
清洗设备18内还设有传感器24,传感器24用于感测清洗设备18内是否有光伏玻璃芯片26,并将感测的信号通过无线信号或者数据线传输到控制端,实现自动控制膜洗装置22是否进行膜洗,至于控制端如何控制膜洗装置的电路设置并不是本申请的保护范围,因此不在此进行赘述控制端控制膜洗装置的电路设置。另外,传感器24主要是用于感测清洗设备18内是否有光伏玻璃芯片26,至于传感器24设置在清洗设备18哪个位置,设置多少个传感器,并不是本申请的保护重点,只要能感测清洗设备18内是否有光伏玻璃芯片26即可, 请参考图2,本申请是将传感器24设置在膜洗装置22内,但并不以此为限。另外,传感器24可以为光传感器或红外线传感器,传感器24主要起感测膜洗装置22内是否有光伏玻璃芯片26,并不以本实施例公开的光传感器或红外线传感器为限。
污水冲洗装置9,污水冲洗装置9沿着传送装置20的传送方向设置,并且污水冲洗装置9衔接膜洗装置22,污水冲洗装置9用于清洗光伏玻璃芯片26表面残留的膜洗药液,污水冲洗装置9与膜洗装置22之间还设有第二隔离区8,该第二隔离区8使污水冲洗装置9与膜洗装置22之间形成一段间隔空间,使膜洗药液从膜洗装置22溢出时进入该段间隔空间(即第二隔离区8)内,进而实现阻隔膜洗药液进入污水冲洗装置9内;以及,污水冲洗装置9中的水溢出时进入该段间隔空间(即第二隔离区8)内,进而实现阻隔污水冲洗装置9中的水进入膜洗装置22内。
喷淋装置23,喷淋装置23沿着传送装置20的传送方向设置,并且喷淋装置23衔接污水冲洗装置9,喷淋装置23用于清洗光伏玻璃芯片26的表面,其中喷淋装置23可以设置多个喷淋单元,且多个喷淋单元沿着传送装置的传送方向依次设置,用于对光伏玻璃芯片26进行多段喷淋,确保清洗干净光伏玻璃芯片26的表面,本申请以设置五个喷淋单元为例进行举例说明,但并不以此为限。
风刀装置15,风刀装置15沿着传送装置20的传送方向设置,并且风刀装置15衔接喷淋装置23,风刀装置15用于吹干光伏玻璃芯片26表面的水分,风刀装置15包括风刀和用于驱动风刀的涡流风机或高压离心风机,风刀的制造材质可以是铝合金或不锈钢,但并不以此为限。
下料装置16,下料装置16沿着传送装置20的传送方向设置,并且下料装置16衔接风刀装置15,下料装置16实现自动传送清洗完成的光伏玻璃芯片26,具体的,下料装置16包括下料机械手臂及设置在下料机械手臂上的吸盘,下料机械手臂通过吸盘吸住光伏玻璃芯片26,实现自动传送清洗完成的光伏玻 璃芯片26,此项技术的人员也可以选择其他下料装置实现自动传送清洗完成的光伏玻璃芯片26,并不以本实施例揭露的下料装置构造为限。
其中,上述预清洗装置21、膜洗装置22、污水冲洗装置9、喷淋装置23、第一隔离区4和第二隔离区8的腔体下部均为倾斜结构,请参考图2,且倾斜方向朝向出水口,用于使污水容易排出。
具体的,本申请预清洗装置21包括第一预清洗单元2和第二预清洗单元3,第一预清洗单元2衔接上料装置1,第二预清洗单元3衔接第一预清洗单元2。膜洗装置22还包括第一风切装置17,第一风切装置17设置于第一预清洗单元2与第二预清洗单元3之间。第一风切装置17包括第一上下风切管和第一高压风机,第一高压风机为第一上下风切管供给高压气源,第一风切装置17通过第一上下风切管吹出的高压气流阻隔第一预清洗单元2中的水进入第二预清洗单元3;第一预清洗单元2与第二预清洗单元3可以采用相同的水箱或不同的水箱进行供水,当第一预清洗单元2与第二预清洗单元3采用不同的水箱供水时,第二预清洗单元3的出水口与第一预清洗单元2对应的水箱的入水口连接,将第二预清洗单元3清洗过后的水排入到与第一预清洗单元2对应的水箱中,供第一预清洗单元2进行清洗,可以节省用水。
本申请膜洗装置22包括第一膜洗单元5、第二膜洗单元6和第三膜洗单元7,第一膜洗单元5衔接预清洗装置21,第二膜洗单元6衔接第一膜洗单元5,第三膜洗单元7衔接第二膜洗单元6。膜洗装置22还包括第二风切装置25,第二风切装置25包括前第二风切装置251和后第二风切装置252,前第二风切装置251设置于第一膜洗单元5与第二膜洗单元6之间,前第二风切装置251内包括第二上下风切管和第二高压风机,第二高压风机为第二上下风切管供给高压气源,前第二风切装置251通过第二上下风切管吹出的高压气流阻隔第一膜洗单元5的膜洗药液进入第二膜洗单元6。第二风切装置25还包括后第二风切装置252,后第二风切装置252设置于第二膜洗单元6与第三膜洗单元7之间,后第二风切装置252包括第二上下风切管和第二高压风机,第二高压风机 为第二上下风切管供给高压气源,后第二风切装置252通过第二上下风切管吹出的高压气流阻隔第二膜洗单元6的膜洗药液进入第三膜洗单元7。
本申请膜洗装置22的腔体材质可以选用不锈钢、聚氯乙烯或聚丙烯,当膜洗装置22的腔体材质为不锈钢时,不锈钢型号为SUS316,因为型号SUS316的不锈钢内添加钼(Mo),故其耐蚀性、耐大气腐蚀性和高温强度特别好,可在苛酷的条件下使用,然熟悉此项技术的人员也可以选择其他合适的材质,并不以本实施例揭露的材质或不锈钢型号为限。
请参见图4至图6所示,本申请一实施例提供的每个膜洗单元包括喷洗处理槽37和升降机构51。喷洗处理槽37用于清洗光伏玻璃芯片26,升降机构51包括第一升降单元38,第一升降单元38设置在喷洗处理槽37内。膜洗传送机构49设置于喷洗处理槽37内,膜洗传送机构49的一端与喷洗处理槽37活动连接,另一端与第一升降单元38活动连接。膜洗传送机构49用于传输光伏玻璃芯片26,第一升降单元38用于带动膜洗传送机构49相对于喷洗处理槽37运动。由于膜洗传送机构49能够在喷洗处理槽37内运动,光伏玻璃芯片26随着膜洗传送机构49在喷洗处理槽37内运动,因此在清洗光伏玻璃芯片26时,更加易于使光伏玻璃芯片26上的保护膜脱离光伏玻璃芯片26。从而清洗的效果更好,清洗的效率也更高。其中,保护膜为设置在光伏玻璃芯片26上的保护涂层,如在一实施例中,保护膜为涂布在光伏玻璃芯片26上的油墨层。
第一升降单元38的结构形式可以为多种。可以理解,第一升降单元38可以为气缸、液压缸或者电动伸缩杆等等,只要能够实现升降运动的机械结构均可以。而第一升降单元38的数量,可以为一个、两个甚至更多个。
第一升降单元38与膜洗传送机构49的活动连接方式可以为多种方式,只要是能够实现两者的相对运动的连接方式均可以称之为活动连接。可以理解,第一升降单元38与膜洗传送机构49可以通过转轴等部件实现转动连接。第一升降单元38与膜洗传送机构49也可以通过软性物体实现活动连接。
膜洗传送机构49与喷洗处理槽37的活动连接方式可以为多种方式,只要是能够实现两者的相对运动的连接方式均可以称之为活动连接。膜洗传送机构49与喷洗处理槽37可以通过转轴等部件实现转动连接。膜洗传送机构49与喷洗处理槽37也可以通过软性物体实现活动连接。
对于每一膜洗单元,膜洗传送机构49的一端通过第一升降单元38与喷洗处理槽37活动连接,膜洗传送机构49的另一端也与喷洗处理槽37活动连接。利用第一升降单元38来带动膜洗传送机构49相对于喷洗处理槽37运动。膜洗单元在清洗光伏玻璃芯片26时,光伏玻璃芯片26在膜洗传送机构49的带动下会在喷洗处理槽37内运动,从而使光伏玻璃芯片26上的保护膜易于自光伏玻璃芯片26上脱落下来。膜洗单元更加的有利于光伏玻璃芯片26上的保护膜脱落,进而节约了资源,缩短了脱膜的时间,降低了生产成本。
作为一种可实施的方式,膜洗传送机构49的一端与喷洗处理槽37转动连接,另一端与第一升降单元38转动连接。第一升降单元38用于升降膜洗传送机构49,以使所膜洗传送机构49处于倾斜状态或者处于水平状态。在膜洗单元工作之前,通过第一升降单元38使膜洗传送机构49处于水平状态,膜洗传送机构49将光伏玻璃芯片26传输至喷洗处理槽37内。当膜洗单元开始对光伏玻璃芯片26进行处理时,可以利用第一升降单元38将膜洗传送机构49调至倾斜状态。由此光伏玻璃芯片26上的保护膜易于在清洗过程中自光伏玻璃芯片26上脱落。
在一个实施中,可将膜洗传送机构49调节至相对于水平面倾斜3°-7°。这样,可以使位于膜洗传送机构49上的光伏玻璃芯片26倾斜适当角度,从而更加有利于光伏玻璃芯片26上的保护膜脱落。
参见图4至图6,作为另一种可实施的方式,升降机构51还可以包括第二升降单元50。膜洗传送机构49远离第一升降单元38的一端与第二升降单元50活动连接,膜洗传送机构49的该端通过第二升降单元50与喷洗处理槽37活动连接,第二升降单元50用于带动膜洗传送机构49相对于喷洗处理槽37 运动。通过设置第二升降单元50,不仅可实现膜洗传送机构49相对于喷洗处理槽37的倾斜运动,还可使膜洗传送机构49能够相对于喷洗处理槽37晃动,进一步利于光伏玻璃芯片26上的保护膜脱落。
第二升降单元50的结构可以为多种。可以理解,第二升降单元50可以为气缸、液压缸或者电动伸缩杆等等,只要能够实现升降功能即可。
膜洗传送机构49和第二升降单元50的活动连接方式可以为多种方式。膜洗传送机构49和第二升降单元50可以是相对转动地连接。或者膜洗传送机构49和第二升降单元50利用软性物体实现活动连接。
在一些实施例中,第一升降单元38和第二升降单元50均通过万向节与膜洗传送机构49转动连接。通过在第一升降单元38与膜洗传送机构49之间设置万向节,以及在第二升降单元50与膜洗传送机构49之间设置万向节,可以实现膜洗传送机构49的两端不同程度的升降和沿不同方向的转动。从而通过膜洗传送机构49可带动光伏玻璃芯片26实现不同程度的倾斜和不定向的摇动。进而更加易于光伏玻璃芯片26上的保护膜的脱落,提高了对光伏玻璃芯片26的清洗效果和清洗效率。
第一升降单元38和第二升降单元50的数量不限,只要是能够实现膜洗传送机构49相对于喷洗处理槽37相对运动即可。在一个实施例中,第一升降单元38为两个,第二升降单元50为一个或两个,第一升降单元38和第二升降单元50呈三角形或者四边形分布。
当然,在其他实施例中,也可以是第二升降单元50为两个,第一升降单元38为一个或两个,第一升降单元38和第二升降单元50呈三角形或者四边形分布。通过将第一升降单元38和第二升降单元50呈三角形或者四边形分布,可使得第一升降单元38和第二升降单元50对膜洗传送机构49的驱动动力更加均衡易于控制,从而使得膜洗传送机构49的倾斜和/或摇摆运动更加稳定。
当然,在其他实施例中,膜洗单元还可以不包括升降机构。
参见图4,作为一种可实施的方式,膜洗单元还包括设置于喷洗处理槽37 的上方的喷淋器39,喷淋器39用于对光伏玻璃芯片26进行喷淋。在一个实施例中,喷淋器39包括第一喷淋器40和第二喷淋器41。第一喷淋器40和第二喷淋器41分别位于膜洗传送机构49的传输平面的上下两侧。通过设置喷淋器39对膜洗传送机构49上的光伏玻璃芯片26进行喷淋,更加利于光伏玻璃芯片26上的保护膜的脱落。
参见图4至图6,作为一种可实施的方式,膜洗单元还包括:溶液箱42、第一管道43和第二管道45。第一管道43的一端与喷淋器39连通,第一管道43的另一端与溶液箱42连通,第一管道43还设置有第一阀门44,第一阀门44用于切断或连通第一管道43。第二管道45的一端与喷洗处理槽37连通,第二管道45的另一端与溶液箱42连通,第二管道45设置有第二阀门46,第二阀门46用于切断或连通第二管道45。可以理解,溶液箱42用于提供清洗光伏玻璃芯片26的清洗液。根据光伏玻璃芯片26上的保护膜的成分不同,可选择不同种类的清洗液。
第一阀门44和第二阀门46可以是电磁阀、气动阀、手动阀或者机械阀等等。溶液箱42上可设置有用于抽液的液泵,以便于将溶液箱42内的液体泵入至喷洗处理槽37内。当第一阀门44开启、第二阀门46关闭时,溶液箱42中的液体会通过第一管道43喷射到光伏玻璃芯片26,实现对光伏玻璃芯片26的喷淋功能。当第一阀门44关闭、第二阀门46开启时,溶液箱42中的液体会通过第二管道45进入喷洗处理槽37,此时可对光伏玻璃芯片26进行浸泡。
喷洗处理槽37能够同时实现光伏玻璃芯片26的浸泡和喷淋,从而使得膜洗单元的体积能够缩小。并且由于浸泡和喷淋在同一操作空间内,这使得第一升降单元38、第二升降单元50与膜洗传送机构49在配合上无需考虑对光伏玻璃芯片26运输的影响,在整体的操作流程上也更加的顺畅。
在一个实施例中,膜洗单元还包括溢流口47,溢流口47设置于喷洗处理槽37的侧壁,且溢流口47位于膜洗传送机构49的传输平面的上方。利用溢流口47排放出去多余的液体,避免压力过大对光伏玻璃芯片26造成损害。
在一个实施例中,膜洗单元还包括排液口48,排液口48设置于喷洗处理槽37的槽底。通过设置排液口48,在膜洗单元的每个流程结束后可以利用排液口48将喷洗处理槽37内的液体排出。
膜洗传送机构49可以采用现有的滚轴式的传输机构,也可以采用滑轨式的传输机构,只要能够实现对光伏玻璃芯片26的传输并能够与第一升降单元38和第二升降单元50配合即可。
膜洗单元还可包括控制器,第一升降单元38、第二升降单元50、膜洗传送机构49、喷淋器39和第一阀门44、第二阀门46等均可与控制器电连接。利用控制器控制上述各个部件进行运作,从而可提高膜洗单元的自动化运作,提高效率。
本申请喷淋装置23包括第一喷淋单元10、第二喷淋单元11、第三喷淋单元12、第四喷淋单元13和第五喷淋单元14,第一喷淋单元10衔接污水冲洗装置9,第二喷淋单元11衔接第一喷淋单元10,第三喷淋单元12衔接第二喷淋单元11,第四喷淋单元13衔接第三喷淋单元12,第五喷淋单元14衔接第四喷淋单元13,第五喷淋单元14中的水依次循环供第四喷淋单元13、第三喷淋单元12、第二喷淋单元11和第一喷淋单元10使用,即第五喷淋单元14中的水喷淋完成后进入第四喷淋单元13使用、第四喷淋单元13的水喷淋完成后进入第三喷淋单元12、第三喷淋单元12的水喷淋完成后进入第二喷淋单元11、第二喷淋单元11的水喷淋完成后进入第一喷淋单元10使用,第一喷淋单元10的水进入污水冲洗装置9,从而可以节省用水。本申请公开的一实施例的循环供水方式为,第五喷淋单元14的出水口分别与第四喷淋单元13、第三喷淋单元12、第二喷淋单元11和第一喷淋单元10的入水口连接,或第五喷淋单元14的出水口与第四喷淋单元13的入水口连接,第四喷淋单元13的出水口与第三喷淋单元12的入水口连接,第三喷淋单元12的出水口与第二喷淋单元11的入水口连接,第二喷淋单元11的出水口与第一喷淋单元10的入水口连接,然此项技术的人员也可以选择其他连接方式实现循环供水,并不以本实施例揭 露的循环供水为限。
在本申请揭露的实施方式中,请同时参考图3及图1、2,清洗光伏玻璃芯片26的清洗流程为:
步骤S1:上料。上料装置1接收光伏玻璃芯片26,传送装置20运送光伏玻璃芯片26在机架19上移动,光伏玻璃芯片26沿着传送装置20的传送方向运动,依次经过下述步骤的清洗流程:
步骤S2:预清洗。预清洗装置21中的第一预清洗单元2和第二预清洗单元3对光伏玻璃芯片26进行预清洗,清洗光伏玻璃芯片26表面的杂质。
步骤S3:膜洗。膜洗装置22中的第一膜洗单元5、第二膜洗单元6和第三膜洗单元7通过膜洗药液依次对预清洗完成的光伏玻璃芯片26进行膜洗,确保膜洗干净光伏玻璃芯片26表面的保护油墨。
步骤S4:污水冲洗。污水冲洗装置9将膜洗完成的光伏玻璃芯片26表面残留的膜洗药液冲洗干净。
步骤S5:喷淋。喷淋装置23中的第一喷淋单元10、第二喷淋单元11、第三喷淋单元12、第四喷淋单元13和第五喷淋单元14依次对污水冲洗完成后的光伏玻璃芯片26进行喷淋,确保清洗干净光伏玻璃芯片26的表面。
步骤S6:风干。风刀装置15将喷淋后的光伏玻璃芯片26表面的水分吹干。
步骤S7:下料。下料装置16将清洗完成后的光伏玻璃芯片26通过下料机械手臂及吸盘运走。
上述说明示出并描述了本申请的若干优选实施方式,但如前所述,应当理解本申请并非局限于本文所披露的形式,不应看作是对其他实施方式的排除,而可用于各种其他组合、修改和环境,并能够在本文所述发明构想范围内,通过上述教导或相关领域的技术或知识进行改动。而本领域人员所进行的改动和变化不脱离本申请的精神和范围,则都应在本申请所附权利要求的保护范围内。
工业实用性
本申请的清洗装置通过自动化设备代替传统的手工清洗方式,全程自动化清洗,且一次可清洗多个光伏玻璃芯片,大幅降低清洗劳动人力,并且可以保证清洗质量。

Claims (20)

  1. 一种清洗设备,用于光伏玻璃芯片的清洗,其中所述清洗设备包括:
    机架、设置于所述机架上且用于传送所述光伏玻璃芯片的传送装置、以及沿所述传送装置的传送方向依次设置的上料装置、预清洗装置、膜洗装置、污水冲洗装置、喷淋装置、风刀装置以及下料装置;
    所述上料装置,用于接收所述光伏玻璃芯片;
    所述预清洗装置,用于清洗所述光伏玻璃芯片表面的杂质;
    所述膜洗装置,用于通过膜洗药液清洗所述光伏玻璃芯片表面上的保护油墨;
    所述污水冲洗装置,用于清洗所述光伏玻璃芯片表面残留的所述膜洗药液;
    所述喷淋装置,用于清洗所述光伏玻璃芯片的表面;
    所述风刀装置,用于吹干所述光伏玻璃芯片表面的水分;以及
    所述下料装置,用于传送清洗完成的所述光伏玻璃芯片。
  2. 根据权利要求1所述的清洗设备,其中所述预清洗装置、所述膜洗装置、所述污水冲洗装置和所述喷淋装置的腔体下部均为倾斜结构,所述倾斜结构的倾斜方向朝向出水口。
  3. 根据权利要求1所述的清洗设备,其中所述预清洗装置包括多个预清洗单元,且多个所述预清洗单元沿着所述传送装置的传送方向依次设置,用于对所述光伏玻璃芯片进行多段清洗。
  4. 根据权利要求3所述的清洗设备,其中所述预清洗装置包括沿着所述传送装置的传送方向依次设置的第一预清洗单元和第二预清洗单元,所述第一预清洗单元衔接所述上料装置,用于对所述光伏玻璃芯片进行初步清洗,所述第二预清洗单元衔接所述第一预清洗单元,用于对所述光伏玻璃芯片进行进一步清洗。
  5. 根据权利要求4所述的清洗设备,其中所述膜洗装置还包括第一风切装 置,所述第一风切装置设置于所述第一预清洗单元与所述第二预清洗单元之间,所述第一风切装置阻隔所述第一预清洗单元中的水进入所述第二预清洗单元。
  6. 根据权利要求4所述的清洗设备,其中所述第一预清洗单元与所述第二预清洗单元采用不同的水箱进行供水,其中所述第二预清洗单元的出水口与所述第一预清洗单元对应的水箱的入水口连接。
  7. 根据权利要求1所述的清洗设备,其中所述预清洗装置与所述膜洗装置之间还设有第一隔离区,所述第一隔离区阻隔所述膜洗药液进入所述预清洗装置内,以及阻隔所述预清洗装置中的水进入所述膜洗装置内;和/或所述膜洗装置与所述污水冲洗装置之间还设有第二隔离区,所述第二隔离区阻隔所述膜洗药液进入所述污水冲洗装置内,以及阻隔所述污水冲洗装置中的水进入所述膜洗装置内。
  8. 根据权利要求7所述的清洗设备,其中所述第一隔离区和所述第二隔离区的腔体下部均为倾斜结构。
  9. 根据权利要求1所述的清洗设备,其中所述膜洗装置包括多个膜洗单元,且多个所述膜洗单元沿着所述传送装置的传送方向依次设置,用于对所述光伏玻璃芯片进行多段膜洗。
  10. 根据权利要求9所述的清洗设备,其中所述膜洗装置包括沿着所述传送装置的传送方向依次设置的第一膜洗单元、第二膜洗单元和第三膜洗单元,所述膜洗装置还包括第二风切装置,所述第二风切装置包括前第二风切装置和后第二风切装置,所述前第二风切装置设置于所述第一膜洗单元与所述第二膜洗单元之间,用于阻隔所述第一膜洗单元的所述膜洗药液进入所述第二膜洗单元,所述后第二风切装置设置于所述第二膜洗单元与所述第三膜洗单元之间,用于阻隔所述第二膜洗单元的所述膜洗药液进入所述第三膜洗单元。
  11. 根据权利要求1所述的清洗设备,其中所述清洗设备内还设有传感器,所述传感器用于感测所述清洗设备内是否有所述光伏玻璃芯片。
  12. 根据权利要求1所述的清洗设备,其中所述膜洗装置的腔体材质为不锈钢、聚氯乙烯或聚丙烯。
  13. 根据权利要求1所述的清洗设备,其中所述喷淋装置包括多个喷淋单元,且多个所述喷淋单元沿着所述传送装置的传送方向依次设置,用于对所述光伏玻璃芯片进行多段喷淋。
  14. 根据权利要求13所述的清洗设备,其中所述喷淋装置包括沿着所述传送装置的传送方向依次设置的第一喷淋单元、第二喷淋单元、第三喷淋单元、第四喷淋单元和第五喷淋单元,所述第五喷淋单元中的水依次循环供所述第四喷淋单元、所述第三喷淋单元、所述第二喷淋单元和所述第一喷淋单元使用。
  15. 根据权利要求9所述的清洗设备,其中每一所述膜洗单元包括:
    喷洗处理槽,所述喷洗处理槽设置于所述机架上,所述传送装置包括膜洗传送机构,所述膜洗传送机构设置于所述喷洗处理槽内。
  16. 根据权利要求15所述的清洗设备,其中每一所述膜洗单元还包括设置于所述喷洗处理槽内的升降机构,所述升降机构用于带动所述膜洗传送机构升降。
  17. 根据权利要求16所述的清洗设备,其中所述膜洗传送机构的一端与所述喷洗处理槽转动连接,另一端与所述升降机构转动连接,以使所述膜洗传送机构处于倾斜状态或者处于水平状态。
  18. 根据权利要求16所述的清洗设备,其中每一所述膜洗单元还包括一喷淋器,所述喷淋器包括第一喷淋器和第二喷淋器,所述第一喷淋器和所述第二喷淋器分别位于所述传送装置的传输平面的上下两侧。
  19. 根据权利要求18所述的清洗设备,其中每一所述膜洗单元还包括:
    溶液箱;
    第一管道,所述第一管道的一端与所述喷淋器连通,所述第一管道的另一端与所述溶液箱连通,所述第一管道还设置有第一阀门,所述第一阀门用于切断或连通所述第一管道;以及
    第二管道,所述第二管道的一端与所述喷洗处理槽连通,所述第二管道的另一端与所述溶液箱连通,所述第二管道设置有第二阀门,所述第二阀门用于切断或连通所述第二管道。
  20. 根据权利要求16所述的清洗设备,其中每一所述膜洗单元还包括:
    溢流口,设置于所述喷洗处理槽的侧壁,且所述溢流口位于所述传送装置的传输平面的上方;以及
    排液口,设置于所述喷洗处理槽的槽底。
PCT/CN2018/111507 2018-07-18 2018-10-23 清洗设备 WO2020015219A1 (zh)

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