WO2019201104A1 - 像素单元、显示面板、显示设备及制造像素单元的方法 - Google Patents
像素单元、显示面板、显示设备及制造像素单元的方法 Download PDFInfo
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- WO2019201104A1 WO2019201104A1 PCT/CN2019/081660 CN2019081660W WO2019201104A1 WO 2019201104 A1 WO2019201104 A1 WO 2019201104A1 CN 2019081660 W CN2019081660 W CN 2019081660W WO 2019201104 A1 WO2019201104 A1 WO 2019201104A1
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/121—Active-matrix OLED [AMOLED] displays characterised by the geometry or disposition of pixel elements
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/30—Devices specially adapted for multicolour light emission
- H10K59/35—Devices specially adapted for multicolour light emission comprising red-green-blue [RGB] subpixels
- H10K59/353—Devices specially adapted for multicolour light emission comprising red-green-blue [RGB] subpixels characterised by the geometrical arrangement of the RGB subpixels
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/04—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a quantum effect structure or superlattice, e.g. tunnel junction
- H01L33/06—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a quantum effect structure or superlattice, e.g. tunnel junction within the light emitting region, e.g. quantum confinement structure or tunnel barrier
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/20—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular shape, e.g. curved or truncated substrate
- H01L33/24—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular shape, e.g. curved or truncated substrate of the light emitting region, e.g. non-planar junction
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/30—Devices specially adapted for multicolour light emission
- H10K59/35—Devices specially adapted for multicolour light emission comprising red-green-blue [RGB] subpixels
- H10K59/352—Devices specially adapted for multicolour light emission comprising red-green-blue [RGB] subpixels the areas of the RGB subpixels being different
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/80—Constructional details
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- H10K59/80515—Anodes characterised by their shape
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- H—ELECTRICITY
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- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
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Definitions
- the present disclosure relates to the field of display, and in particular, to a pixel unit, a display panel, a display device, and a method of manufacturing the pixel unit.
- An Organic Light-Emitting Diode (OLED) display panel includes a plurality of pixel units arranged in an array. Each pixel unit includes sub-pixel units of different colors. The luminescent layer of the sub-pixel unit may have a problem of different fading speeds, which may result in aging color shift of the pixel unit.
- a pixel unit includes a first sub-pixel unit and a second sub-pixel unit each including a first electrode, a light emitting layer, and a second electrode stacked on the substrate in a direction away from the substrate.
- the illuminating lifetime of the illuminating layer of the first sub-pixel unit is smaller than the illuminating lifetime of the illuminating layer of the second sub-pixel unit, and the area of the illuminating layer of the first sub-pixel unit on the substrate is equal to An area of an orthographic projection of the luminescent layer of the second sub-pixel unit on the substrate, and an area of the first projection of the first sub-pixel unit on the substrate is larger than the second sub-pixel unit The area of the orthographic projection of the first electrode on the substrate.
- the pixel unit further includes a third sub-pixel unit including a first electrode, a light emitting layer, and a second electrode stacked on the substrate in a direction away from the substrate.
- An illuminating lifetime of the illuminating layer of the third sub-pixel unit is greater than an illuminating lifetime of the illuminating layer of the second sub-pixel unit, and an area of the illuminating layer of the third sub-pixel unit on the substrate is equal to the An area of the orthographic projection of the light-emitting layer of the second sub-pixel unit on the substrate, and an area of the orthographic projection of the first electrode of the third sub-pixel unit on the substrate is smaller than the first of the second sub-pixel unit The area of the orthographic projection of the electrode on the substrate.
- an insulating portion is connected between the light emitting layer of the second sub-pixel unit and the substrate.
- an insulating portion is connected between the light emitting layer of at least one of the second sub-pixel unit and the third sub-pixel unit and the substrate.
- an orthographic projection of the insulating portion on the substrate does not overlap with an orthographic projection of the first electrode on the substrate, and The sum of the area of the orthographic projection of the insulating portion on the substrate and the area of the orthographic projection of the first electrode on the substrate is equal to the area of the orthographic projection of the luminescent layer on the substrate.
- the thickness of the insulating portion is the same as the thickness of the first electrode in a direction perpendicular to the substrate.
- an orthographic projection of the insulating portion on the substrate includes a ring shape, and an orthographic projection of the first electrode on the substrate is described The inner edge of the ring is surrounded.
- an orthographic projection of the insulating portion on the substrate follows a direction from the first sub-pixel unit to the second sub-pixel unit Arranging on opposite sides of the orthographic projection of the first electrode on the substrate.
- an orthographic projection of a geometric center of the first electrode on the substrate coincides with an orthographic projection of a geometric center of the luminescent layer on the substrate.
- a display panel including a pixel unit according to any of the embodiments of the present disclosure.
- a display device including the display panel of any of the embodiments of the present disclosure is provided.
- a method of fabricating a pixel unit comprising the steps of:
- a light-emitting layer on the first electrode of the first sub-pixel unit and the second sub-pixel unit Forming a light-emitting layer on the first electrode of the first sub-pixel unit and the second sub-pixel unit, wherein a light-emitting lifetime of the light-emitting layer of the first sub-pixel unit is smaller than a light emission of the second sub-pixel unit
- the luminescence lifetime of the layer, and the area of the orthographic projection of the luminescent layer of the first sub-pixel unit on the substrate is equal to the area of the orthographic projection of the luminescent layer of the second sub-pixel unit on the substrate.
- the method further includes:
- the step of forming a light-emitting layer on the first electrodes of the first sub-pixel unit and the second sub-pixel unit comprises:
- each of the light-emitting layers is on the substrate
- the area of the orthographic projection is equal to the sum of the area of the orthographic projection of the insulating portion of the second sub-pixel unit on the substrate and the area of the orthographic projection of the first electrode of the second sub-pixel unit on the substrate.
- the step of forming the first sub-pixel unit and the first electrode of the second sub-pixel unit on the substrate comprises:
- step of forming a light-emitting layer on the first electrodes of the first sub-pixel unit and the second sub-pixel unit comprises:
- a light-emitting layer on the first electrode of the first sub-pixel unit, the second sub-pixel unit, and the third sub-pixel unit wherein a light-emitting lifetime of the light-emitting layer of the third sub-pixel unit is greater than the first An illuminating lifetime of the luminescent layer of the two sub-pixel unit, and an orthographic projection area of the luminescent layer of the third sub-pixel unit on the substrate is equal to an orthographic projection of the luminescent layer of the second sub-pixel unit on the substrate Area.
- the method further includes:
- the step of forming a light-emitting layer on the first electrodes of the first sub-pixel unit, the second sub-pixel unit, and the third sub-pixel unit includes:
- FIG. 1 schematically illustrates a structure of a pixel unit according to an embodiment of the present disclosure
- FIG. 2 schematically illustrates the structure of another pixel unit in accordance with an embodiment of the present disclosure
- FIG. 3 schematically illustrates an arrangement of an insulating layer and a first electrode in a pixel unit according to an embodiment of the present disclosure
- FIG. 4 schematically illustrates an arrangement of an insulating layer and a first electrode in another pixel unit according to an embodiment of the present disclosure
- 5A-5D schematically illustrate a flow chart of a method of fabricating a pixel cell in accordance with an embodiment of the present disclosure
- FIG. 6-8 schematically illustrate the structure of pixel cells in various stages of a method of fabricating a pixel cell in accordance with an embodiment of the present disclosure.
- An OLED display panel typically includes a plurality of pixel units arranged in an array.
- Each pixel unit includes at least two sub-pixel units of different colors.
- each of the pixel units may include a red (R) sub-pixel unit, a green (G) sub-pixel unit, and a blue (B) sub-pixel unit, and the like.
- Each sub-pixel unit includes an anode, a cathode, a light-emitting layer interposed between the anode and the cathode, and the like.
- the light emitting layer may include a plurality of stacked film layers.
- the film layer of the light-emitting layer may include a hole injection layer, a hole transport layer, a light-emitting material layer, an electron transport layer, an electron injection layer, and the like, and the light-emitting layer may include one or more of these layers and other layer structures .
- the material properties of the luminescent materials of the respective colors determine their luminescent lifetime (i.e., the rate of decay), which may result in an aging color shift of the display panel.
- one method is to set the areas of the light-emitting layers of the sub-pixel units of different colors close to the substrate side to be different. Specifically, for each sub-pixel unit of different colors, the area of the more aging-inhibited luminescent layer is set to be smaller than the area of the aging layer that is more aging.
- the applied current is constant, the current density of the light-emitting layer which is less likely to deteriorate is increased, and the difference in the actual attenuation rate of the light-emitting layers of different colors is minimized.
- the methods for producing the film layer in the light-emitting layer in the organic electroluminescent device are mainly vacuum evaporation and solution processes.
- Vacuum evaporation is suitable for film formation of organic small molecular materials, and has the advantages of good film formation uniformity and relatively mature technology.
- the film forming apparatus for vacuum evaporation has high cost, low material utilization rate, and low alignment accuracy for use in large-sized products.
- Solution processes include spin coating, ink jet printing, and nozzle coating. It is suitable for film formation of polymeric materials and soluble small molecules. The process of the solution process is low in cost and has outstanding advantages in large-scale and large-scale production.
- the drying condition of the solution varies depending on the area of the light-emitting layer near the substrate side.
- the same film layer in the light-emitting layer in which different sub-pixel units are manufactured requires different drying conditions. Therefore, it is necessary to separately manufacture the same film layer in different sub-pixel units, which results in longer panel manufacturing time and lower production efficiency.
- FIG. 1 schematically illustrates the structure of a pixel unit in accordance with an embodiment of the present disclosure.
- the pixel unit may include a first sub-pixel unit and a second sub-pixel unit.
- the first sub-pixel unit and the second sub-pixel unit each include a first electrode 002, a light emitting layer 003, and a second electrode 004 stacked on the substrate 001 in a direction away from the substrate 001.
- the first electrode 002 can be an anode and the second electrode 004 can be a common cathode.
- the display panel may further include a pixel defining layer 005.
- the pixel defining layer 005 is configured to define a plurality of pixel cells and a plurality of sub-pixel cells in each of the pixel cells on the substrate.
- the luminescent lifetime of the luminescent layer of the first sub-pixel unit is less than the luminescent lifetime of the luminescent layer of the second sub-pixel unit.
- the term "luminous lifetime" refers to a life expectancy over which the luminescent layer can operate within a certain degree of attenuation as desired by the designer.
- the area of the orthographic projection of the light-emitting layer 003 of the first sub-pixel unit on the substrate 001 is equal to the area of the orthographic projection of the light-emitting layer 003 of the second sub-pixel unit on the substrate 001.
- the light-emitting layer 003 in each sub-pixel unit has the same area on the side close to the substrate 001, so that the drying condition substrate required for the light-emitting layer in the sub-pixel units of different colors is the same. Therefore, the light-emitting layers in the sub-pixel units of different colors can be simultaneously produced in the same step. Moreover, the area of the orthographic projection of the first electrode 002 of the first sub-pixel unit on the substrate 001 is larger than the area of the orthographic projection of the first electrode 002 of the second sub-pixel unit on the substrate 001.
- the area of the contact surface of the first electrode 002 and the light-emitting layer 003 of the different sub-pixel units is different, and in the sub-pixel unit in which the light-emitting layer having a small light-emitting lifetime is located, the area of the contact surface of the light-emitting layer and the first electrode Bigger.
- the portion of the light-emitting layer 003 that is in contact with the first electrode 002 emits light, and the portion of the light-emitting layer 003 that is not in contact with the first electrode 002 does not emit light. Therefore, although the areas of the light-emitting layers in the respective sub-pixel units are the same, the actual light-emitting areas of the light-emitting layers 003 of different colors are different.
- the current (i.e., current density) per unit area of the light-emitting layer 003 of different colors is different in the case where the applied voltage/current is constant.
- the current density of the light-emitting layer 003 having a larger actual light-emitting area is smaller, so The difference between the luminescence lifetime of the luminescent layer 003 having a larger actual illuminating area and the illuminating lifetime of the luminescent layer 003 having a smaller actual illuminating area is reduced.
- the drying conditions of the light-emitting layers in the sub-pixel units of different colors of the display panel of the embodiment of the present disclosure are substantially the same, so that the light-emitting layers in the sub-pixel units of different colors can be simultaneously manufactured, thus shortening the display panel. Manufacturing time increases productivity. Moreover, the luminescence lifetime of the luminescent layer of different sub-pixel units is adjusted, and the problem of aging color shift is improved.
- the width of the film structure is generally significantly greater than its height. Therefore, for the sake of simplicity of the language, the present application is described in terms of the same width of the upper and lower surfaces of the film layer. However, the substantial scope of this description can be modified accordingly with reference to the manner in which the widths of the upper and lower surfaces differ.
- the orthographic projection of the first electrode on the substrate is understood to be an orthographic projection of the surface of the first electrode away from the substrate on the substrate
- the orthographic projection of the insulating portion on the substrate is understood to be the distance from the substrate of the insulating portion.
- the orthographic projection of the surface on the substrate The term orthographic projection of the luminescent layer on the substrate should be interpreted in terms of context.
- the term when the term relates to the comparison with the area of the first electrode (and the insulating portion), it can be interpreted as an orthographic projection of the surface of the luminescent layer close to the substrate on the substrate.
- the term when the term relates to the drying conditions of the luminescent layer, it may refer to either an orthographic projection of the surface away from the substrate or an orthographic projection of the surface adjacent to the substrate, depending on the drying technique employed.
- the light emitting layer 003 may include a layer of a light emitting material.
- the luminescence lifetime of the luminescent layer 003 depends on the luminescence lifetime of the luminescent material. Therefore, in the sub-pixel units of different colors, the area of the contact surface of the first electrode 002 and the light-emitting layer 003 is negatively correlated with the light-emitting lifetime of the light-emitting material of the corresponding color.
- FIG. 2 schematically illustrates the structure of another pixel unit in accordance with an embodiment of the present disclosure.
- the pixel unit may also include a third sub-pixel unit.
- the luminescence lifetime of the luminescence layer of the third sub-pixel unit is greater than the luminescence lifetime of the luminescence layer of the second sub-pixel unit. That is, the luminescence lifetime of the luminescent material of the first sub-pixel unit, the luminescence lifetime of the luminescent material of the second sub-pixel unit, and the luminescence lifetime of the luminescent material of the third sub-pixel unit are incremental.
- the area of the orthographic projection of the first electrode of the third sub-pixel unit on the substrate is smaller than the area of the orthographic projection of the first electrode of the second sub-pixel unit on the substrate.
- the area of the first electrode of the first sub-pixel unit, the area of the first electrode of the second sub-pixel unit, and the area of the first electrode of the third sub-pixel unit are decremented, that is, in the first sub-pixel unit In the second sub-pixel unit and the third sub-pixel unit, the area of the contact surface of the first electrode 002 and the light-emitting layer 003 is increased.
- the first color can be red
- the second color can be green
- the third color can be blue.
- a portion of the sub-pixel units in the pixel unit may include an insulating portion 006 connected between the light emitting layer 003 and the substrate 001. Both the insulating portion 006 and the first electrode 002 are in contact with the light-emitting layer 003.
- an insulating portion 006 is connected between the light emitting layer of the second sub-pixel unit and the substrate.
- at least one sub-pixel unit may include an insulating portion 006 connected between the light emitting layer 003 and the substrate 001.
- an insulating portion is connected between the light emitting layer of at least one of the second sub-pixel unit and the third sub-pixel unit and the substrate.
- an insulating portion is connected between the light-emitting layer and the substrate in the second sub-pixel unit and the third sub-pixel unit.
- the material of the first electrode 002 and the material of the insulating portion 006 may be electrically different but Other features (eg, surface hydrophilic and hydrophobic features of the layer structure, etc.) are the same material.
- the material of the first electrode 002 may be Indium tin oxide (ITO)
- the material of the insulating portion 006 may be silicon nitride (SiN x ), silicon oxynitride (SiO x N y ) or silicon. Oxide (SiO x ).
- FIG. 3 schematically shows the arrangement of the insulating portion 006 and the first electrode 002.
- the cross section of the insulating portion 006 parallel to the substrate 001 is annular, that is, the projection of the insulating portion 006 on the plane of the substrate 001 is a ring shape.
- the ring shape may include a rectangular ring shape, a circular ring shape, or the like. In Fig. 3, the ring shape is specifically a rectangular ring shape.
- the contact surface of the insulating portion 006 and the light-emitting layer 003 is also annular.
- the orthographic projection of the insulating portion 006 on the substrate 001 does not overlap with the orthographic projection of the 002 first electrode 002 on the substrate 001. That is, the insulating portion 006 exists only on the side of the first electrode 002, and does not exist on the surface of the first electrode 002 facing the substrate 001 or the surface facing the light-emitting layer 003.
- the sum of the area of the orthographic projection of the insulating portion on the substrate and the area of the orthographic projection of the first electrode on the substrate is equal to the area of the orthographic projection of the luminescent layer on the substrate.
- the thickness of the insulating portion is the same as the thickness of the first electrode in a direction perpendicular to the substrate 001.
- the first electrode 002 is located within the inner ring of the ring.
- FIG. 4 schematically shows another arrangement of the insulating portion 006 and the first electrode 002.
- an orthographic projection of the insulating portion on the substrate is arranged in a direction from the first sub-pixel unit to the second sub-pixel unit.
- the opposite sides of the orthographic projection of the first electrode on the substrate that is, in the angle of view of FIG. 4, the two portions of the insulating portion 006 are respectively disposed on both sides of the first electrode 002.
- the projection of the contact surface of the first electrode 002 and the light-emitting layer 003 is rectangular, and the projection of the contact surface of the insulating portion 006 and the light-emitting layer 003 (ie, the two portions of the insulating portion) is distributed in a rectangular projection. On both sides.
- the geometric center of the first electrode 002 coincides with the geometric center of the luminescent layer 003.
- the orthographic projection of the insulating portion 006 on the substrate 001 does not overlap with the orthographic projection of the first electrode 002 on the substrate 001, and the insulating portion 006
- the sum of the area of the orthographic projection of the surface away from the substrate on the substrate 001 and the area of the orthographic projection of the surface of the first electrode 002 away from the substrate on the substrate 001 is equal to the surface of the corresponding sub-pixel unit adjacent to the substrate.
- the area of the orthographic projection on 001 is equal to the surface of the corresponding sub-pixel unit adjacent to the substrate.
- the first electrode 002 and the insulating portion 006 are disposed in the same layer, and the entirety of the first electrode 002 and the insulating portion 006 completely covers the surface of the light-emitting layer near the substrate 001 side.
- the thickness of the insulating portion 006 may be the same as the thickness of the first electrode 002 such that a film layer (eg, the light-emitting layer 003) disposed on both the first electrode 002 and the insulating portion 006 is at different positions.
- the thickness is the same. In this way, the film layers at different positions are subjected to the same electric field force, which can improve the uniformity of display of the display panel, and can improve the stability of the display panel.
- the drying conditions required for the light-emitting layer in the sub-pixel units of different colors are as similar as possible. It is therefore possible to simultaneously fabricate light-emitting layers in sub-pixel units of different colors.
- the actual light-emitting areas of the different light-emitting layers are adapted such that the current density of the light-emitting materials having a small light-emitting lifetime is also small, so that the difference in the light-emitting lifetime of the different light-emitting materials is reduced. Therefore, on the basis of ensuring the display life of the display panel, the manufacturing time of the display panel is shortened, and the production efficiency is improved.
- a display panel including a pixel unit according to an embodiment of the present disclosure is provided.
- a display device including a display panel according to an embodiment of the present disclosure.
- FIG. 5A schematically illustrates a flow chart of a method in accordance with an embodiment of the present disclosure.
- the method can include the following steps:
- step S502 Forming a first sub-pixel unit and a first electrode of the second sub-pixel unit on the substrate (step S502), wherein an area of the orthographic projection of the first electrode of the first sub-pixel unit on the substrate is greater than An area of the orthographic projection of the first electrode of the second sub-pixel unit on the substrate;
- step S503 Forming a light-emitting layer on the first electrode of the first sub-pixel unit and the second sub-pixel unit (step S503), wherein a light-emitting lifetime of the light-emitting layer of the first sub-pixel unit is smaller than the second sub- The luminescence lifetime of the luminescent layer of the pixel unit, and the projected area of the luminescent layer of the first sub-pixel unit on the substrate is equal to the projected area of the luminescent layer of the second sub-pixel unit on the substrate.
- a transparent conductive material having a certain thickness may be deposited on the substrate by magnetron sputtering or thermal evaporation to obtain a first conductive film layer.
- the first conductive film layer is then processed by a patterning process to obtain a first electrode.
- the area of the orthographic projection of the first electrode in the different sub-pixel units on the substrate is different.
- the specific area of the first electrode depends on the luminescence lifetime of the luminescent layer to be formed thereon. If the luminescence lifetime is long, the area of the electrode is small.
- the patterning process may include: photoresist coating, exposure, development, etching, and photoresist stripping.
- the transparent conductive material may be ITO, and the thickness of the first electrode may be set according to actual needs.
- the first electrode may have a thickness of 50 nm to 150 nm.
- the substrate may be a transparent substrate, and may be a substrate made of a light guide material having a certain hardness such as glass, quartz, or a transparent resin and made of a non-metal material.
- FIG. 6 exemplarily shows the structure of the substrate after the end of step S502.
- a first electrode 002 is formed on the substrate 001.
- the projected area of the first electrode 002 of the different sub-pixel units on the substrate 001 is different.
- the dotted line in Fig. 6 schematically shows the width of the light-emitting layer to be formed.
- the substrate and the underside thereof may further include a Thin Film Transistor (TFT) array for driving the sub-pixel unit to emit light.
- TFT Thin Film Transistor
- the substrate 001 may be a flat layer or the like.
- a pixel defining layer may be formed on the substrate on which the first electrode is formed.
- the pixel defining layer defines a plurality of arrayed pixel regions on the substrate. Each pixel region includes at least two sub-pixel units. The area of each sub-pixel unit near the side of the substrate is the same.
- the height of the pixel defining layer can be adjusted according to actual needs.
- the height of the pixel defining layer can be approximately 1 micron.
- the width of the pixel defining layer is adjusted with reference to the width of the light emitting layer such that when the light emitting layer is formed, its projected area on the substrate satisfies the correspondence with the first electrode.
- FIG. 7 schematically shows a substrate structure after the pixel defining layer 005 is formed on the substrate 001 on which the first electrode 002 is formed. As can be seen from Fig. 7, the area of each sub-pixel unit near the side of the substrate is the same.
- a light emitting layer may be formed on the first electrode (step S503).
- An illuminating lifetime of the illuminating layer of the first sub-pixel unit is smaller than an illuminating lifetime of the illuminating layer of the second sub-pixel unit, and an area of an orthographic projection of the illuminating layer of the first sub-pixel unit on the substrate is equal to The area of the orthographic projection of the luminescent layer of the second sub-pixel unit on the substrate.
- the organic light-emitting layer may include at least a hole injection layer, a hole transport layer, a light-emitting material layer, an electron transport layer, an electron injection layer, and the like, and the thickness of each film layer may be set according to actual needs.
- the electron transport layer, the electron injection layer, and the like can be formed by a method such as thermal evaporation.
- the hole injection layer, the hole transport layer, and the luminescent material layers of different colors may be formed in different sub-pixel units by a solution process (for example, inkjet printing, coating, spin coating, screen printing, etc.).
- Each of the pixel units includes at least two sub-pixel units of different colors, and the areas of the first electrodes of the sub-pixel units of different colors and the contact surface of the light-emitting layer are different.
- the area of the contact surface of the first electrode and the light-emitting layer may be inversely related to the light-emitting lifetime of the light-emitting layer.
- the pixel unit includes the first sub-pixel unit, the second sub-pixel unit, and the third sub-pixel unit
- the luminescence lifetime of the luminescent material of the first sub-pixel unit, the luminescence lifetime of the luminescent material of the second sub-pixel unit, and The illuminating lifetime of the illuminating material of the third sub-pixel unit is sequentially increased, and correspondingly, the areas of the contact surfaces of the first electrode and the illuminating layer in the first sub-pixel unit, the second sub-pixel unit, and the third sub-pixel unit are sequentially decreased.
- FIG. 8 schematically shows a schematic structural view after the light-emitting layer 003 is formed on the substrate 001 having the first electrode 002 and the pixel defining layer 005. As can be seen from FIG. 8, the area of the contact surface of the first electrode 002 and the light-emitting layer 003 of each sub-pixel unit is different.
- the second electrode 004 is intentionally formed on the substrate on which the light-emitting layer is formed.
- the method of forming the second electrode reference may be made to related art, and details are not described herein again.
- the pixel unit manufactured by the above method includes a first sub-pixel unit and a second sub-pixel unit each including a first electrode, a light emitting layer, and a second electrode stacked on the substrate in a direction away from the substrate.
- the illuminating lifetime of the illuminating layer of the first sub-pixel unit is smaller than the illuminating lifetime of the illuminating layer of the second sub-pixel unit, and the area of the illuminating layer of the first sub-pixel unit on the substrate is equal to The area of the orthographic projection of the light-emitting layer of the second sub-pixel unit on the substrate, the area of the orthographic projection of the first electrode of the first sub-pixel unit on the substrate is greater than the area of the second sub-pixel unit The area of the orthographic projection of the first electrode on the substrate.
- the contact area of the light-emitting layer with a large luminescence lifetime and the first electrode is small, the attenuation speed of each luminescent layer is adjusted, and the aging color shift of the pixel is alleviated.
- the area of each sub-pixel unit close to the substrate side is the same, the area of the light-emitting layer in each sub-pixel unit close to the substrate side is the same. Therefore, the drying conditions required for the light-emitting layers of the sub-pixel units of different colors are the same, so that the light-emitting layers in the sub-pixel units of different colors can be simultaneously manufactured.
- the manufacturing time of the display panel is shortened, and the production efficiency is improved.
- FIG. 5B schematically illustrates a flow chart of another method in accordance with an embodiment of the present disclosure.
- an insulating portion may also be formed on the substrate on which the first electrode is formed.
- the method includes: an area of the orthographic projection of the first electrode of the first sub-pixel unit on the substrate is larger than an area of the orthographic projection of the first electrode of the second sub-pixel unit on the substrate In the case of the insulating portion of the second sub-pixel unit formed on the substrate (step S504).
- the insulating portion is in the same layer as the first electrode and is in contact with the luminescent layer. In different sub-pixel units, the area of the contact surface of the first electrode and the light-emitting layer is different.
- step S503 includes forming a light-emitting layer on the first electrode of the first sub-pixel unit and the first electrode of the second sub-pixel unit and the insulating portion (step S5031), wherein the second sub- The area of the orthographic projection of the luminescent layer of the pixel unit on the substrate is equal to the area of the orthographic projection of the insulating portion of the second sub-pixel unit and the first electrode on the substrate.
- the light emitting layer of the first pixel unit has the same area as the light emitting layer of the second pixel unit, and the sum of the areas of the first electrode and the insulating portion of the second sub-pixel unit is equal to the area of the light emitting layer.
- An insulating material having a certain thickness may be formed by magnetron sputtering, thermal evaporation or plasma enhanced chemical vapor deposition (PECVD) to obtain an insulating film layer.
- the insulating film layer is then processed by a patterning process to obtain an insulating portion.
- the projection of the contact surface of the insulating portion with the light-emitting layer on the substrate 001 is annular, and the projection of the contact surface of the first electrode and the light-emitting layer on the substrate is located inside the ring.
- the projection of the contact surface of the first electrode and the light-emitting layer on the substrate 001 is rectangular, and in the direction from the first sub-pixel unit to the second sub-pixel unit, the insulating portion is disposed on the first electrode.
- the two sides of the projection of the contact surface of the insulating portion and the luminescent layer are distributed on opposite sides of the rectangular projection of the first electrode.
- the orthographic projection of the insulating portion on the substrate does not overlap with the orthographic projection of the first electrode on the substrate, and the area of the orthographic projection of the insulating portion on the substrate and the The sum of the areas of the orthographic projections of an electrode on the substrate is equal to the area of the orthographic projection of the corresponding sub-pixel unit on the substrate.
- the thickness of the insulating portion may be the same as the thickness of the first electrode.
- step S502 may include forming first electrodes of the first sub-pixel unit, the second sub-pixel unit, and the third sub-pixel unit on the substrate (step S5021), wherein the third sub-pixel unit The area of the orthographic projection of an electrode on the substrate is smaller than the area of the orthographic projection of the first electrode of the second sub-pixel unit on the substrate.
- step S503 may include forming a light-emitting layer on the first electrodes of the first sub-pixel unit, the second sub-pixel unit, and the third sub-pixel unit (step S5032), wherein the The luminescence lifetime of the luminescence layer of the three sub-pixel unit is greater than the luminescence lifetime of the luminescence layer of the second sub-pixel unit, and the projected area of the first luminescence layer of the third sub-pixel unit on the substrate is equal to the second The projected area of the luminescent layer of the sub-pixel unit on the substrate.
- FIG. 5D schematically illustrates a flow chart of still another method in accordance with an embodiment of the present disclosure.
- step S504 may include forming at least one of an insulating portion of the second sub-pixel unit and an insulating portion of the third sub-pixel unit on the substrate (step S5041).
- step S5032 may include forming a light-emitting layer on the formed insulating portion (step S5033), wherein an area of the orthographic projection of the formed light-emitting layer on the substrate is equal to that formed by the An area of the orthographic projection of the insulating portion covered by the light-emitting layer and the first electrode on the substrate.
- the present disclosure provides a pixel unit, a display panel, a display device, and a method of fabricating a pixel unit.
- the pixel unit includes at least two sub-pixel units of different colors.
- Each of the sub-pixel units includes a first electrode, a light emitting layer, and a second electrode stacked on the substrate in a direction away from the substrate.
- the illuminating lifetime of the illuminating layer of the first sub-pixel unit is smaller than the illuminating lifetime of the illuminating layer of the second sub-pixel unit, and the area of the illuminating layer of the first sub-pixel unit on the substrate is equal to An area of an orthographic projection of the luminescent layer of the second sub-pixel unit on the substrate, and an area of the first projection of the first sub-pixel unit on the substrate is larger than the second sub-pixel unit The area of the orthographic projection of the first electrode on the substrate.
- the attenuation speed of each of the light-emitting layers is adjusted, and the aging color shift of the pixel unit is weakened.
- the areas of the light-emitting layers on the side closer to the substrate in the respective sub-pixel units are the same, the drying conditions required for the light-emitting layers in the different sub-pixel units are substantially the same, so that the light-emitting layers in the respective sub-pixel units can be simultaneously fabricated. Therefore, on the basis of ensuring the display effect and the life of the display panel, the manufacturing time of the display panel is shortened, and the production efficiency is improved.
- a display device provided by an embodiment of the present disclosure may include a display panel according to an embodiment of the present disclosure.
- the display device can be any component having a display function such as a liquid crystal panel, an electronic paper, a mobile phone, a tablet computer, a television, a display, a notebook computer, a digital photo frame, a navigator, and the like.
- the display panel may be an OLED display panel or a Quantum Dot Light Emitting Diodes (QLED) display panel.
- QLED Quantum Dot Light Emitting Diodes
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Abstract
Description
Claims (15)
- 一种像素单元,包括第一亚像素单元和第二亚像素单元,其各自包括沿背离基板的方向在所述基板上堆叠的第一电极、发光层和第二电极,其中,所述第一亚像素单元的发光层的发光寿命小于所述第二亚像素单元的发光层的发光寿命,所述第一亚像素单元的发光层在所述基板上的正投影的面积等于所述第二亚像素单元的发光层在所述基板上的正投影的面积,并且所述第一亚像素单元的第一电极在所述基板上的正投影的面积大于所述第二亚像素单元的第一电极在所述基板上的正投影的面积。
- 根据权利要求1所述的像素单元,还包括第三亚像素单元,其包括沿背离所述基板的方向在所述基板上堆叠的第一电极、发光层和第二电极,其中所述第三亚像素单元的发光层的发光寿命大于所述第二亚像素单元的发光层的发光寿命,所述第三亚像素单元的发光层在所述基板上的正投影的面积等于所述第二亚像素单元的发光层在所述基板上的正投影的面积,并且所述第三亚像素单元的第一电极在所述基板上的正投影的面积小于所述第二亚像素单元的第一电极在所述基板上的正投影的面积。
- 根据权利要求1所述的像素单元,其中所述第二亚像素单元的发光层和所述基板之间连接有绝缘部。
- 根据权利要求2所述的像素单元,其中所述第二亚像素单元和所述第三亚像素单元中的至少一个的发光层和所述基板之间连接有绝缘部。
- 根据权利要求3或4所述的像素单元,其中在所述绝缘部所在的亚像素单元中,所述绝缘部在所述基板上的正投影与所述第一电极在所述基板上的正投影不重叠,且所述绝缘部在所述基板上的正投影的面积与所述第一电极在所述基板上的正投影的面积之和等于所述发光层在所述基板上的正投影的面积。
- 根据权利要求5所述的像素单元,其中在所述绝缘部所在的亚像素单元中,在垂直于所述基板的方向上,所述绝缘部的厚度与所述第一电极的厚度相同。
- 根据权利要求5所述的像素单元,其中在所述绝缘部所在的亚像素单元中,所述绝缘部在所述基板上的正投影包括环形,且所述第一电极在所述基板上的正投影被所述环形的内边缘包围。
- 根据权利要求5所述的像素单元,其中在所述绝缘部所在的亚像素单元中,所述绝缘部在所述基板上的正投影沿着从所述第一亚像素单元到所述第二亚像素单元的方向布置在所述第一电极在所述基板上的正投影的相对两侧。
- 根据权利要求1所述的像素单元,其中在任一个所述亚像素单元中,所述第一电极的几何中心在所述基板上的正投影与所述发光层的几何中心在所述基板上的正投影重合。
- 一种显示面板,包括如权利要求1-9中任一项所述的像素单元。
- 一种显示设备,包括如权利要求10所述的显示面板。
- 一种制造像素单元的方法,包括下述步骤:-提供基板;-在所述基板上形成第一亚像素单元和第二亚像素单元的第一电极,其中所述第一亚像素单元的第一电极在所述基板上的正投影的面积大于所述第二亚像素单元的第一电极在所述基板上的正投影的面积;以及-在所述第一亚像素单元和所述第二亚像素单元的第一电极上形成发光层,其中所述第一亚像素单元的发光层的发光寿命小于所述第二亚像素单元的发光层的发光寿命,并且所述第一亚像素单元的发光层在所述基板上的正投影的面积等于所述第二亚像素单元的发光层在所述基板上的正投影的面积。
- 根据权利要求12所述的方法,还包括:-在所述基板上形成第一亚像素单元和第二亚像素单元的第一电极的步骤之后,在所述基板上形成所述第二亚像素单元的绝缘部,并且,在所述第一亚像素单元和所述第二亚像素单元的第一电极上形成发光层的步骤包括:-在所述第一亚像素单元的第一电极和所述第二亚像素单元的第一电极及绝缘部上形成发光层,其中所述发光层中的每一个发光层在所述基板上的正投影的面积等于所述第二亚像素单元的绝缘部在所述基板上的正投影的面积与所述第二亚像素单元的第一电极在所述基板 上的正投影的面积之和。
- 根据权利要求12所述的方法,其中在所述基板上形成第一亚像素单元和第二亚像素单元的第一电极的步骤包括:-在所述基板上形成第一亚像素单元、第二亚像素单元和第三亚像素单元的第一电极,其中所述第三亚像素单元的第一电极在所述基板上的正投影的面积小于所述第二亚像素单元的第一电极在所述基板上的正投影的面积,并且在所述第一亚像素单元和所述第二亚像素单元的第一电极上形成发光层的步骤包括:-在所述第一亚像素单元、所述第二亚像素单元和所述第三亚像素单元的第一电极上形成发光层,其中所述第三亚像素单元的发光层的发光寿命大于所述第二亚像素单元的发光层的发光寿命,并且所述第三亚像素单元的发光层在所述基板上的正投影的面积等于所述第二亚像素单元的发光层在所述基板上的正投影的面积。
- 根据权利要求14所述的方法,还包括:-在所述基板上形成第一亚像素单元、第二亚像素单元和第三亚像素单元的第一电极的步骤之后,在所述基板上形成所述第二亚像素单元的绝缘部和所述第三亚像素单元的绝缘部中的至少一个,并且,在所述第一亚像素单元、所述第二亚像素单元和所述第三亚像素单元的第一电极上形成发光层的步骤包括:-在所形成的绝缘部上形成发光层,其中所形成的发光层在所述基板上的正投影的面积等于被所形成的发光层覆盖的绝缘部和第一电极在所述基板上的正投影的面积。
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CN111710698B (zh) * | 2020-06-05 | 2022-12-06 | 深圳市华星光电半导体显示技术有限公司 | Oled显示面板及其制作方法 |
CN114255704B (zh) * | 2020-09-21 | 2023-09-05 | 京东方科技集团股份有限公司 | 显示基板及显示装置 |
CN112635529A (zh) * | 2020-12-18 | 2021-04-09 | 北京维信诺科技有限公司 | 显示面板及其制备方法、显示装置 |
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