WO2019185787A1 - Fotoempfindliches halbleiterbauelement, verfahren zum bilden eines fotoempfindlichen halbleiterbauelements - Google Patents
Fotoempfindliches halbleiterbauelement, verfahren zum bilden eines fotoempfindlichen halbleiterbauelements Download PDFInfo
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 85
- 238000000034 method Methods 0.000 title claims description 28
- 239000000758 substrate Substances 0.000 claims abstract description 78
- 230000007704 transition Effects 0.000 claims description 22
- 239000002019 doping agent Substances 0.000 claims description 12
- 238000005530 etching Methods 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 description 14
- 239000000463 material Substances 0.000 description 7
- 238000001514 detection method Methods 0.000 description 6
- 238000000407 epitaxy Methods 0.000 description 6
- 230000006978 adaptation Effects 0.000 description 5
- 230000035945 sensitivity Effects 0.000 description 5
- 239000004020 conductor Substances 0.000 description 4
- 238000000151 deposition Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 230000006870 function Effects 0.000 description 4
- 238000010276 construction Methods 0.000 description 3
- 238000009792 diffusion process Methods 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 230000005855 radiation Effects 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- 230000003595 spectral effect Effects 0.000 description 3
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 239000011574 phosphorus Substances 0.000 description 2
- 238000005215 recombination Methods 0.000 description 2
- 230000006798 recombination Effects 0.000 description 2
- 230000001629 suppression Effects 0.000 description 2
- 230000008719 thickening Effects 0.000 description 2
- 206010020751 Hypersensitivity Diseases 0.000 description 1
- 208000026935 allergic disease Diseases 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000009610 hypersensitivity Effects 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 230000008447 perception Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/08—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
- H01L31/10—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by potential barriers, e.g. phototransistors
- H01L31/101—Devices sensitive to infrared, visible or ultraviolet radiation
- H01L31/11—Devices sensitive to infrared, visible or ultraviolet radiation characterised by two potential barriers, e.g. bipolar phototransistors
- H01L31/1105—Devices sensitive to infrared, visible or ultraviolet radiation characterised by two potential barriers, e.g. bipolar phototransistors the device being a bipolar phototransistor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
Definitions
- Photosensitive Semiconductor Device A method of forming a photosensitive semiconductor device
- the invention relates to a photosensitive semiconductor component and a method for forming a photosensitive semiconductor component.
- the invention relates to phototransistors adapted to ambient light detection.
- Such components are used, for example, to adapt the luminosity of active optical displays to the ambient light situation, that is, for example, to control the luminosity of backlights of displays in vehicles or mobile digital devices depending on the ambient light.
- ambient light transistors In order for such ambient light transistors to provide a customized output, they must have a spectral response that mimics the effective effects of the perception of displays, that is, the spectral distribution of ambient lighting on the one hand and the human vision over the wavelength on the other hand.
- the human eye is generally sensitive to wavelengths in the range between about 400 nm and 800 nm. Wavelengths shorter than 400 nm are UV light, wavelengths longer than 800 nm infrared light (IR). UV and IR radiation are no longer perceived by the eye. Regularly optical sensors are insufficiently adapted to the needs of ambient light detection.
- the semiconductor device 90 may be considered as a combination of a photodiode 98 with a amplifying transistor 99. It is built up on a substrate 91 with n + doping. Above this is a weaker doped layer 92 with n-doping. In the upper region of this layer 92, the p-doped layer 93 is diffused, which acts as an anode for the diode 98. For the adjacent transistor 99, it is the base layer directly connected thereto. In the base layer 93, an n + - doped emitter layer 94 is diffused.
- the adaptation of the detection characteristic takes place in that the thickness d1 of the layer 92 is set to a comparatively low value of, for example, about 2.5 ⁇ m to 3 ⁇ m, compared with conventional photosensitive components. In contrast, normal values are layer thicknesses of 10 pm to 30 pm.
- the thickness d1 By setting the thickness d1 to comparatively low values, one makes use of the wavelength-dependent absorption behavior of radiation in semiconductor material in conjunction with the different degrees of doping (n + in 91, n in 92). Short wavelengths penetrate comparatively small in the semiconductor and are absorbed substantially in said 3 pm of the layer 92.
- the thickness d1 of the lightly doped layer 92 the thickness d2 of the anode / base layer 93 also has to be set relatively thin to approximately 1 .mu.m.
- the emitter layer 94 is accordingly even thinner. Therefore, the total thickness of the vertical transistor 99 in the vertical direction of the drawing plane becomes very small. This leads to massive difficulties in terms of obtaining components with only slightly scattering properties. In the case of very flat structures as indicated in FIG. 9, characteristic values of the transistor can deviate by a factor of 5, so that the value of such components is limited.
- the object of the invention is therefore to provide a flat-conductor component and a production method therefor, which permit the production of semiconductor components which are well adapted to ambient light detection and with reduced scattering of the characteristic values thereof.
- a layered structure of a heavily doped substrate as a collector, above a qualitatively equal, but weakly doped semiconductor layer, in or above an oppositely doped base layer and again in or above it in some areas of a doped as the substrate emitter ter Mrs specified In this case, the lightly doped layer and / or the base layer have in the vertical (perpendicular to the substrate surface) cross section Attempts laterally adjacent areas of different thickness, wherein the transistor part of the semiconductor device in the thicker region of the weaker doped layer and / or the base layer is formed and the diode part in the thinner region.
- the weakly doped layer is thinner (ie thicker in the transistor region) in the diode region, this results in an improvement in the adaptation of the characteristic over the mechanism described above in the diode part by reducing the red sensitivity.
- the transistor in the vertical direction of the drawing plane can be made thicker by also making the base layer and the emitter layer thicker in the thick region of the less doped layer, so that it is easier to reduce variations in the transistor properties ,
- the base layer (in the transistor part) has a thicker and (in the diode part) thinner region, this causes the unfavorable reaction of the base doping on the photocurrent generation to be reduced by short-wave light in the underlying, less heavily doped layer, so that the relative Sensitivity of the diode part to short wavelengths (blue) is increased.
- the thickness of the less doped layer may then be selected to be approximately constant higher than optimal for red suppression, up to conventional values. Even then, the transistor part can be made thicker and therefore more reproducible.
- the embodiments are preferably combined, that is to say both the weaker doped layer and the base layer in the diode part are formed with thinner regions in order to combine the effects of red reduction and blue enhancement.
- a method of forming a photosensitive semiconductor device comprising the steps of providing a semiconductor substrate of the first Conductive type as a collector layer over which forming a lower doped layer of the first conductivity type, therein or thereabove forming a semiconductor base layer of the second conductivity type, therein or above forming an emitter layer of the first conductivity type so that a part of the base layer area is not separated from the emitter layer is covered, wherein the lower doped layer and / or the semiconductor base layer are formed with areas of different thickness and the emitter layer is formed in the region of the largest thickness of the lower doped layer and / or the semiconductor base layer.
- a method of forming a photosensitive semiconductor device comprising the steps of a) providing a semiconductor substrate of the first conductivity type as a collector layer, b.) Forming a lower doped layer of the first conductivity type, on or in a first In the region of the substrate surface, a first region of the lower doped layer of a first thickness is formed which is less than a first threshold value, or on a second region of the substrate surface, a second region of the lower doped layer of a second thickness is formed which is higher as a second threshold, which is higher than the first threshold, wherein on or in the substrate surface the first region and the second region adjoin one another or have a transition region between them on or in the substrate surface, on or in which a transition region is smaller doped C.) Forming on or in the lower doped layer of a semiconductor base layer of the second conductivity type having a first base layer region over at least a portion of the first A portion of the lower doped layer, a second base layer region over at least a portion of the
- the first region and the second region of the lower doped semiconductor layer may be formed by a. First epitaxially depositing on the semiconductor substrate a first semiconductive layer having the lower doping level, b.) Then the first semiconducting layer over the first region of the substrate surface is further alsdotiert, preferably up to the doping degree of the substrate or higher or lower, and c.) Then on the first semiconductive layer, a second semiconducting layer with the lower doping degree is preferably epitaxially applied.
- the first region and the second region of the less-doped semiconductor layer can also be produced by epitaxially depositing first a first semiconducting layer with the lower degree of doping first on the semiconductor substrate, and then b) on the first semiconductive layer a second semiconducting layer is applied to the second region of the substrate surface and not over the first region of the substrate surface.
- the first region and the second region of the less-doped semiconductor layer can also be produced by a. First epitaxially depositing on the semiconductor substrate a semiconducting layer with the lower doping level of the thickness of the second region of the less-doped semiconductor layer, and b. ), then the semiconductive layer over the first region of the substrate surface is removed, preferably by etching, until the thickness of the first region of the less doped semiconductor layer is reached.
- the first conductivity type is an n-type doping and the second conductivity type is a p-type doping. But it can also be the other way around.
- a photosensitive semiconductor device has a.) A semiconductor substrate of the first conductivity type as a collector layer, b.) A lower doped layer of the first conductivity type with regions of different thicknesses, c.) A semiconductor base layer of the second conductivity type in or over at least D) an emitter layer of the first conductivity type over at least portions of the base layer but not over at least a portion of the overlying portion of the base layer overlying the thinner portion of the lower doped layer.
- a further photosensitive semiconductor component has a.) A semiconductor substrate of the first conductivity type as a collector layer, b.) A less doped layer of the first conductivity type, c.) Over at least a portion of the less doped layer a semiconductor base layer of the second Conductivity type with regions of different thicknesses, d.) An emitter layer of the first conductivity type over at least a portion of the thicker region of the base layer but not over at least a portion of the thinner region of the base layer.
- FIG. 1
- 1 shows an embodiment of the semiconductor device according to the invention
- 2 shows schematically a first production method
- Fig. 8 is a plan view of a wafer
- Fig. 9 shows an embodiment of the prior art.
- FIG. 1 shows schematically the cross section through a single semiconductor component 1.
- the cross section along the dashed line marked with the arrows A - A can lie perpendicular to the plane of the drawing.
- the light incident surface is the surface of the semiconductor component exposed at the top in the figure.
- the semiconductor component is constructed on a substrate 10 whose thickness t9 can be several hundred, for example greater than 200 pm or greater than 300 pm and less than 1 mm or less than 700 pm.
- the substrate 10 shown in FIG. 1 is heavily n-doped (n + ). Above this there is a layer 11 which is weaker n-doped (h) than the substrate. 12 denotes a p-doped base layer and 13 denotes an n + -doped emitter layer. 1 shows in combination a thickening of the lightly doped layer 11 and a thickening of the base layer 12 in the right part of the figure, which corresponds to the transistor region. In this case, the thickness of the lightly doped layer (as well as that of other layers) is to be understood as measured starting from the free surface 2 of the planar conductor component and therefore includes the thicknesses of the overlying layers.
- t1 denote the thickness of the less-doped layer 11 in its thinner region
- t2 the thickness of the less-doped layer 11 in its thicker region
- t3 the thickness of the base layer in its thinner region
- t4 the thickness of the base layer 12 in their thicker area.
- the drawing of Fig. 1 shows that there (right part of the figure, transistor part of Flalbleiterbauelements), where the weaker doped layer 1 1 is configured thick, and the base layer 12 is made thick, and vice versa (in the diode part of the Flalbleiterbauelements in the left part the Figure).
- the different configuration of the thickness of the less heavily doped layer 1 1 is brought about by further dotting a (lower lying) region of the less heavily doped layer, as described below.
- This region is the region designated 10a in FIG. 1, which in terms of its doping intensity can correspond to that (n + ) of the substrate 10.
- the thick and thin regions of the less heavily doped layer 11 and of the base layer 12 lie next to one another in a top view and also in the section of FIG. 1 in the left-right direction and at best have a transition region between them.
- 10-1 symbolizes a region of the substrate over which a first region 1 1 -1 of lesser thickness of the less heavily doped layer 11 and a first region 12-1 of lesser thickness of the base layer 12 lie.
- 10-2 symbolizes a region of the substrate over which a second region 1 1 -2 of the less heavily doped layer 1 1 of greater thickness can lie and / or over which a second region 12-2 of the base layer Layer 12 may be greater thickness. It corresponds approximately to the transistor region of the semiconductor component. Between the regions 10-1 and 10-2 on the substrate, there may be a transition region 10-3 of a certain width w, within which the said dimensions / thicknesses merge into one another. Over the transition region 10-3 of the substrate lies a transition region 11 -3 of the less heavily doped layer 11 and a transition region 12-3 of the base layer.
- Fig. 1 The operation of the structure of Fig. 1 is as follows: In the range 10-1, 11-1 and 12-1, which substantially corresponds to a photodiode, the ratios for a suitably sized red suppression are set.
- the thickness t1 of the less heavily doped layer 11 is comparatively small, so that a significant proportion of the long wavelengths are absorbed in the underlying doped region 10a, which is higher at, for example, 10 nm.
- B. n + is doped, so that the red absorption takes place in areas of high recombination, so that the contribution of the long wavelengths to the signal is lower.
- the ratios are set to improve the reproducibility of transistor characteristics.
- the thickness t2 of the less heavily doped layer 11 and also the thickness t4 of the base layer 12 (measured from the substrate surface 2) are comparatively high, so that the difficulties in obtaining reproducible characteristics of the transistors resulting from the known flat design of the transistors, is retrieved.
- the thicknesses t1 and t2 of the regions of the more heavily doped layer 11 are determined starting from the substrate surface 2 and to this extent include the thicknesses of the respective overlying regions of the base layer 12.
- the thickness t4 of the thicker part 12-2 of the base layer 12 in turn, includes the thickness t5 of the emitter layer 13.
- the transitional area 10-3, 11 -3, 12-3 does not have its own technical function. However, it is in fact present as the area within which the different dimensions of the layers of the two adjacent areas merge into each other. Its width w is also determined by the necessities and constraints that exist to this extent and can be very small.
- FIGS. 2a to 2f a method of fabricating a semiconductor device having different thick regions of the less heavily doped layer 11 will be described.
- the method is suitable for producing the embodiment of FIG. 1.
- FIG. 8 shows, by way of example, the arrangement of many semiconductor devices 1 to be manufactured in a rectangular / square grid, which is imaged on a larger wafer 70 by the manufacturing process.
- the adjacent semiconductor devices 1 are simultaneously processed in the same way by the respectively suitable process steps and are separated at the end by being cut along the free spaces between them.
- FIG. 2 shows processes and processes to a single semiconductor component 1 as if it were manufactured alone. In fact, however, in many cases the production takes place in parallel with other semiconductor components 1 as indicated in FIG. 8.
- Fig. 2a shows the provision of a wafer 10 of semiconductor material.
- the semiconductor material is n-doped, in particular to an n + doping concentration.
- a first semiconductive layer 11a with the lower doping level n is applied to the substrate 10, preferably over the entire area.
- a part of the layer 11a is then further n-doped, so that it reaches an increased n-doping concentration, but which may still be below the n + concentration of the substrate 10 or may be the same or even higher can be.
- this part of the once lower doped layer 11 a becomes a part of the higher doped substrate 10, which is indicated by reference numeral 10 a.
- a second semiconducting layer 11b with the lower doping level n is then applied to the first layer 11a.
- a weaker doped layer 11 which on the left has a thinner area of thickness t1 and on the right a thicker area of thickness t2.
- the layers 11 a and 11 b can be applied by epitaxy.
- the n-doping of these layers 11 a and 11 b already takes place together with the epitaxial deposition of the layers.
- a base layer 12 is then formed. It is p-doped and can be made thicker in the thicker part of the weaker doped layer 11 than in the thinner part of the weaker doped layer 11. It obtains in this way the different thicknesses t3 and t4 as shown in Fig. 2e.
- the thicker region 12-2 can be manufactured first, followed by the thinner region 12-1 thereafter. It is important that in each case under the areas of the base layer 12 still areas of the weaker doped layer 11 remain, which allow the formation of a significant space charge zone up to the more doped th layer of substrate 10 and further on doped region 10a.
- an emitter layer 13 having a thickness t5 is formed last in the thicker part of the base layer 12. It can be diffused by diffusing n-type dopants into the previously p-doped region of the base layer 12. be diert.
- the emitter layer 13 can function as an emitter, while the substrate layer 10 can function as a collector. Seen vertically, the emitter layer 13 can be part of the thicker part of the base layer 12, so that in this way a vertical transistor of n + 13, p12, h ⁇ 1 and n + 10 is formed.
- a photodiode has been formed, consisting of p12, h ⁇ 1 and n + 10a, 10.
- FIG. 3 shows a further possibility of forming a planar conductor component having regions of different thickness of the less heavily doped layer 11.
- the steps of FIGS. 3a and 3b correspond qualitatively to those of FIGS. 2a and 2b and will not be explained further.
- the thickness t1 of the first semiconducting layer 11a is equal to that which is desired for the thinner portion 11-1 of the less heavily doped layer 11 last.
- a second semiconductive n-layer 11d of the lesser degree of doping is applied over part of the first semiconducting layer 11a.
- the layers 11 c and 11 d can be applied again by epitaxy by, for example, suitable masking.
- the second semiconducting layer 11 d is produced such that the total thickness of the two layers 11 c and 11 d corresponds to the last desired thickness t 2 of the thicker region 11 -2 of the less heavily doped layer 11.
- the substrate surface 2 is then no longer flat, but stepped.
- a base layer 12 is then produced, for example by indiffusion of p material from above into the surface. This can be done so that the base layer 12 has a smaller thickness t3 in the thinner region 11 -1 of the less heavily doped layer 11 than in the thicker region 11 -2 of the lower doped layer 11, where the base layer 12 has a thickness t 4 greater than t3 is.
- the production can be carried out in such a way that on the left side of the surface approaching the surface 2 Rich area of the base layer 12 a portion of the lower doped layer 11 stops.
- the emitter layer 13 is again formed, which can be manufactured by implanting n-material from above to the desired thickness t5, which is smaller than t4.
- FIGS. 4a and 4b qualitatively correspond to those of FIG. 2 and will not be explained separately.
- the less heavily doped layer 11 e is produced equal to a thickness t 2, for example by means of epitaxy, which corresponds to the last desired thickness of the thicker region 11 - 2 of the less heavily doped layer 11. This results in the layered structure of the more heavily doped substrate 10 with n + concentration as the collector layer and the weaker doped layer 11 with n concentration above it.
- a base layer 12 is then produced, for example by diffusing p material into the less heavily doped layer 11 from above. This takes place until a layer thickness t4 which corresponds to the last desired layer thickness of the thicker region 12-2 of the base layer 12 is reached.
- FIG. 4d shows two further steps in combination that can be performed in each of the two possible sequences.
- part of the base layer 12 is removed, for example by etching, so that in this area the base layer 12 assumes a thickness t3 and subsequently the weaker doped layer 11, measured from the component surface 2, has a reduced thickness t1.
- the emitter ter Mrs 13 made up to a thickness t5, such as by diffusion of n-type material.
- Fig. 5 shows an embodiment in which the weaker (h) doped layer 11 has a substantially constant thickness t6, but the base layer has regions of different thicknesses as described qualitatively before. It has been shown that even the provision of a thin base region (thickness t3 in FIG. 5) in the region of the photodiode alone brings about an improvement in the adaptation of the component characteristic, thereby reducing the negative retroactive effect of the base doping on the processes in FIG Space charge zone can be reduced in the lightly doped layer 11 below. Therefore, the thickness t6 of the less heavily doped layer 11 can be selected to be higher than the value optimal for the red reduction, so that the transistor region can accordingly be made thicker and therefore more reproducible. It saves in this construction, the cost of producing different thickness areas 11 -1, 11 -2 of the weaker doped layer eleventh
- FIG. 6 shows a method of forming a constant-thickness waveguide device of the less-doped layer 11 as shown qualitatively in FIG. Referring again to FIG. 6a, as previously described, a substrate 10 having n + doping is provided first.
- a layer 11 with n concentration is formed, for example by means of epitaxy. It is manufactured with the last desired layer thickness t6.
- a base layer 12 having regions of different layer thickness is then formed, for instance by firstly providing, as in FIG. 6c, in a subregion of the semiconductor (transistor region) a uniformly deep layer of thickness 17 with p Doping is made until the desired thicker Layer thickness t7 is reached as the first end depth.
- a less deep layer 12-2 of the thickness t3 is then produced with p-type doping until the desired weaker layer thickness t3 is reached as the second final depth.
- an emitter layer 13 can then be diffused into the thicker region of the base layer 12, or, as shown in FIG. 6e, can again be deposited separately up to a thickness t8 on the thicker region of the base layer be applied. The latter can be done again by epitaxy. In this construction, the thickness of the emitter layer is not included in the thick areas of the base layer and the weaker doped layer.
- Fig. 7 shows the beginning of another manufacturing process.
- An n + -doped substrate 10 with differently doped regions is produced.
- a uniform n + base doping can be generated.
- more mobile dopants 72 for n-doping, for example, phosphorus
- more mobile dopants 71 for example n-doping, arsenic, antimony
- More mobile dopants, such as phosphorus for n-doping or aluminum for p-doping have a higher diffusion coefficient than other dopants, which, given otherwise identical conditions, reflects their greater tendency to diffuse compared to other dopants.
- the less doped layer 11 is then built up, for example by means of epitaxy.
- the mobile n-type dopants 72 simultaneously diffuse with the layer structure and / or in a step which is specifically induced thereafter in the above-mentioned a priori less doped layer 11, so that there vertically seen in the lower region 10a whose lower doping due to the diffusion from below to a higher value to about n + increases.
- the upwardly diffusing dopant atoms 72 cause a reduction in the thickness of the lower doped layer from t2 in the transistor region above the substrate region 10-2 to tl in the diode region above the substrate region 10-1.
- the individual regions may appear island-like, ie in such a way that the base regions 12 of the individual semiconductor components are separated from each other by weaker doped regions 11, along which the singulation takes place.
- the respective existing emitter layers 13 may be completely island-like within the respective base layer 12.
- the wafer 10 may have a thickness t9 higher than 100 miti or higher than 200 miti or higher than 300 miti or higher than 400 miti and smaller than 1 mm or smaller than 800 miti.
- the net layer thickness of the lightly doped layer 11 (taken between the lower limit of the base layer 12 and the upper limit of the heavily doped layer 10, 10a in the vertical direction in the drawing plane) may be at least 1 in its first region 11-1 and in its second region 11-2 miti or at least 2 miti and / or at most 5 miti or at most 4 miti or at most 3 miti.
- the thickness t1 of the thin region of the lightly doped layer 11 is smaller than a first threshold value th 1 and the thickness t2 of the thicker part 11 -2 of the weaker doped layer 11 is greater than a second threshold value th2.
- the first threshold th1 may be 7 miti or 5 miti or 4 miti or 3 miti or 2 miti.
- the second threshold, th2, may be 4 miti or 5 miti or, in general, may be k2 times the first threshold, where k2 is 1, 1 or 1, 2 or 1, 5 or 2.
- the minimum thickness t1 of the first region 11-1 of the lower-doped layer 11 may be greater than k1 times the first threshold value th1, where k1 is 0.1 or 0.2 or 0.3.
- the maximum thickness t2 of the second region 11 -2 of the less doped layer 11 may be smaller than k3 times the second threshold th2, where k3 is 5 or 3 or 2 or 1.5.
- the first base layer region 12-1 may have a thickness t3 that is less than a third threshold value th3 and greater than 0.1 times or 0.2 times the third threshold value th3, wherein the third threshold value 3 is miti or 2 miti or 0.2 times or 0.3 times or 0.4 times the first threshold th1.
- the second base layer region 12-2 may have a thickness t4 that is greater than a fourth threshold th4 and less than 3 times or 2 times or 1.5 times the fourth threshold value th4, where the fourth threshold value is 2 miti or 3 miti or 4 miti or 5 miti or it may be 1, 5 or 2 times or 3 times the third threshold th3.
- the width w of the transition region 10-3 may be smaller than k4 times the first threshold value th1 or k4 times the thickness t1 of the first region 11-1 of the lower-doped layer 11, where k4 is 3 or 2 or 1 or 0.5 or 0, 2 is.
- the first base layer region 12-1 may have a thickness t3 that is less than k5 times the thickness t4 of the second base layer region 12-2, where k5 may be 1 or 0.9 or 0.7 or 0.5 or 0.4.
- the thickness t3 of the first region 12-1 of the base layer 12 may be k6 times the thickness t1 of the first region 11-1 of the less heavily doped layer 11, where k6 is greater than 0.2 or greater than 0.3 and / or less is 0.5 or less than 0.3 or less than 0.1 or less than 0.05.
- the thickness t4 of the second region 12-2 of the base layer 12 may be k7 times the thickness t3 of the second region 11-2 of the less heavily doped layer 11, where k7 is greater than 0.1 or greater than 0.2 or greater is 0.5 or greater than 0.6 and / or less than 0.9 or less than 0.8 or less than 0.7.
- the thickness t5 of the emitter layer 13 may be k8 times the thickness t4 of the second region 12-2 of the base layer 12, k8 being greater than 0.2 or greater than 0.4 or greater than 0.6 and / or less than 0 , 99 or less than 0.9 or less than 0.8 or less than 0.7.
- the thickness t6 of the less heavily doped layer 11 in FIG. 5 may be thicker than a lower limit, which is 3 miti or 4 miti or 5 miti, and may be thinner than an upper limit of 15 miti or 10 miti or 8 miti or 6 miti is.
- the thickness t7 of the thick region of 12-2 of the base layer may be dimensioned as t4 of FIG.
- the Thresholds th3 and th4 for forming the different thickness regions 12-1 and 12-2 of the base layer 12 may be as described with reference to FIG. 1, or may be reduced by 20% or 30% or 40%.
- the thickness t5 of the emitter layer 13 as shown in Fig. 5 may be as described with reference to Fig.
- the thickness t8 of the emitter layer 13 as shown in Fig. 6 may be thicker than a lower limit which is 1 with i or 2 with i and may be thinner than an upper limit which is 6 with i or 5 with i or 4 with i or 3 with i.
- a semiconductor device may have a dimension of a * b, where a is between 0.3 mm and 1 mm, preferably about 0.7 mm, and b between 0.3 mm and 1 mm , preferably 0.7 mm.
- the transistor portion may occupy 5% -35%, preferably 17% -22% of the area, the diode portion occupy 65% -95%, preferably 78% -83% of the area.
- the following doping levels may be present:
- Substrate 10 h +, 10 17 - 3 * 10 19
- Lower doped layer 11 n, 5 * 10 12 - 10 16
- Base layer 12 p, 10 15 - 10 18
- Emitter layer 13 n +, 5 * 10 18 - 10 2 °
- a thickness is assigned a parameter such as t1
- this in itself does not mean that the thickness must necessarily have constant value.
- the center values of the transition region can be taken as layer boundary.
- thicknesses with a tolerance of ⁇ 10% or ⁇ 5% or ⁇ 2% of the nominal value shall be understood.
- the base layer it will not have the function of a transistor base over its entire extent. In regions, it acts as part of the diode, in particular its anode.
- npn transistors are shown in the drawings. As such, they or the individual layers are also partially addressed in the description. However, this should not exclude the possibility that inverse structures (pnp transistors) can also be used with the invention.
- the conductivity as the first conductivity type and the second conductivity type are addressed in the usual way.
- the first conductivity type is an n-type doping and the second conductivity type is a p-type doping.
- the drawings and description exclusively describe this assignment, this should not rule out that the assignment can also be the other way around, ie the first conductivity type is p-doping and the second conductivity type is n-doping.
- first region 10-1 of the substrate serves primarily to describe the spatial arrangement of the overlying regions of individual layers. On the substrate itself, these areas are indistinguishable in many embodiments.
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Bipolar Transistors (AREA)
- Light Receiving Elements (AREA)
- Bipolar Integrated Circuits (AREA)
Abstract
Description
Claims
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
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EP19716324.9A EP3762975A1 (de) | 2018-03-29 | 2019-03-28 | Fotoempfindliches halbleiterbauelement, verfahren zum bilden eines fotoempfindlichen halbleiterbauelements |
US17/042,686 US11876144B2 (en) | 2018-03-29 | 2019-03-28 | Photosensitive semiconductor component, method for forming a photosensitive semiconductor component |
CN201980021856.8A CN111902950A (zh) | 2018-03-29 | 2019-03-28 | 光敏半导体组件及形成光敏半导体组件的方法 |
MX2020010027A MX2020010027A (es) | 2018-03-29 | 2019-03-28 | Componente semiconductor fotosensible, metodo de formacion de un componente semiconductor fotosensible. |
KR1020207031368A KR20200134316A (ko) | 2018-03-29 | 2019-03-28 | 감광성 반도체 부품, 감광성 반도체 부품의 형성 방법 |
JP2020552224A JP7458130B2 (ja) | 2018-03-29 | 2019-03-28 | 感光性半導体部品、および感光性半導体部品の形成方法 |
IL277631A IL277631A (en) | 2018-03-29 | 2020-09-29 | Light-sensitive semiconductor component, method for producing a light-sensitive semiconductor component |
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DE102018107611.8 | 2018-03-29 | ||
DE102018107611.8A DE102018107611A1 (de) | 2018-03-29 | 2018-03-29 | Fotoempfindliches Halbleiterbauelement, Verfahren zum Bilden eines fotoempfindlichen Halbleiterbauelements |
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WO2019185787A1 true WO2019185787A1 (de) | 2019-10-03 |
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PCT/EP2019/057847 WO2019185787A1 (de) | 2018-03-29 | 2019-03-28 | Fotoempfindliches halbleiterbauelement, verfahren zum bilden eines fotoempfindlichen halbleiterbauelements |
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US (1) | US11876144B2 (de) |
EP (1) | EP3762975A1 (de) |
JP (1) | JP7458130B2 (de) |
KR (1) | KR20200134316A (de) |
CN (1) | CN111902950A (de) |
DE (1) | DE102018107611A1 (de) |
IL (1) | IL277631A (de) |
MX (1) | MX2020010027A (de) |
TW (1) | TW201943094A (de) |
WO (1) | WO2019185787A1 (de) |
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US3601668A (en) * | 1969-11-07 | 1971-08-24 | Fairchild Camera Instr Co | Surface depletion layer photodevice |
JPS5211887A (en) | 1975-07-18 | 1977-01-29 | Toshiba Corp | Semiconductor photoelectric device and its manufacturing method |
EP0105386B1 (de) * | 1982-04-17 | 1986-10-08 | Sony Corporation | Halbleiterbildaufzeichnungselement |
JPS62143483A (ja) * | 1985-12-18 | 1987-06-26 | Matsushita Electric Ind Co Ltd | 受光素子 |
GB2201543A (en) | 1987-02-25 | 1988-09-01 | Philips Electronic Associated | A photosensitive device |
JPH01147876A (ja) | 1987-12-04 | 1989-06-09 | Canon Inc | 光電変換装置 |
JPH01214174A (ja) | 1988-02-23 | 1989-08-28 | Victor Co Of Japan Ltd | 高分解能赤外線センサー |
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JP2009260160A (ja) * | 2008-04-21 | 2009-11-05 | Panasonic Corp | 光半導体装置 |
US9666702B2 (en) | 2013-03-15 | 2017-05-30 | Matthew H. Kim | Advanced heterojunction devices and methods of manufacturing advanced heterojunction devices |
US10636933B2 (en) | 2015-12-22 | 2020-04-28 | Texas Instruments Incorporated | Tilted photodetector cell |
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2018
- 2018-03-29 DE DE102018107611.8A patent/DE102018107611A1/de active Pending
-
2019
- 2019-03-25 TW TW108110302A patent/TW201943094A/zh unknown
- 2019-03-28 JP JP2020552224A patent/JP7458130B2/ja active Active
- 2019-03-28 KR KR1020207031368A patent/KR20200134316A/ko active IP Right Grant
- 2019-03-28 CN CN201980021856.8A patent/CN111902950A/zh active Pending
- 2019-03-28 EP EP19716324.9A patent/EP3762975A1/de active Pending
- 2019-03-28 WO PCT/EP2019/057847 patent/WO2019185787A1/de unknown
- 2019-03-28 MX MX2020010027A patent/MX2020010027A/es unknown
- 2019-03-28 US US17/042,686 patent/US11876144B2/en active Active
-
2020
- 2020-09-29 IL IL277631A patent/IL277631A/en unknown
Patent Citations (6)
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JPS5681982A (en) * | 1979-12-08 | 1981-07-04 | Toshiba Corp | Power phototransistor |
US4649409A (en) * | 1982-11-12 | 1987-03-10 | Tokyo Shibaura Denki Kabushiki Kaisha | Photoelectric transducer element |
US5223919A (en) * | 1987-02-25 | 1993-06-29 | U. S. Philips Corp. | Photosensitive device suitable for high voltage operation |
US5598023A (en) * | 1987-09-11 | 1997-01-28 | Canon Kabushiki Kaisha | Photoelectric converting apparatus |
US5245204A (en) * | 1989-03-29 | 1993-09-14 | Canon Kabushiki Kaisha | Semiconductor device for use in an improved image pickup apparatus |
US7145121B1 (en) * | 2000-08-11 | 2006-12-05 | Cook Jr Koy B | Monolithic silicon integrated circuit for detecting azimuth and elevation of incident radiation and method for using same |
Also Published As
Publication number | Publication date |
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JP7458130B2 (ja) | 2024-03-29 |
EP3762975A1 (de) | 2021-01-13 |
TW201943094A (zh) | 2019-11-01 |
IL277631A (en) | 2020-11-30 |
US11876144B2 (en) | 2024-01-16 |
JP2021519519A (ja) | 2021-08-10 |
MX2020010027A (es) | 2020-10-14 |
CN111902950A (zh) | 2020-11-06 |
KR20200134316A (ko) | 2020-12-01 |
DE102018107611A1 (de) | 2019-10-02 |
US20210126150A1 (en) | 2021-04-29 |
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