WO2019181421A1 - Substrat de verre à films stratifiés et verre à vitre - Google Patents

Substrat de verre à films stratifiés et verre à vitre Download PDF

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Publication number
WO2019181421A1
WO2019181421A1 PCT/JP2019/007935 JP2019007935W WO2019181421A1 WO 2019181421 A1 WO2019181421 A1 WO 2019181421A1 JP 2019007935 W JP2019007935 W JP 2019007935W WO 2019181421 A1 WO2019181421 A1 WO 2019181421A1
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Prior art keywords
glass substrate
layer
laminated film
thickness
dielectric layer
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PCT/JP2019/007935
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English (en)
Japanese (ja)
Inventor
章代 松本
一色　眞誠
正文 秋田
Original Assignee
Ａｇｃ株式会社
エージーシー グラス ユーロップ
エージーシー フラット グラス ノース アメリカ， インコーポレイテッド
エージーシー ヴィドロ ド ブラジル リミターダ
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Application filed by Ａｇｃ株式会社, エージーシー グラス ユーロップ, エージーシー フラット グラス ノース アメリカ， インコーポレイテッド, エージーシー ヴィドロ ド ブラジル リミターダ filed Critical Ａｇｃ株式会社
Priority to JP2020507480A priority Critical patent/JPWO2019181421A1/ja
Publication of WO2019181421A1 publication Critical patent/WO2019181421A1/fr

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B17/00—Layered products essentially comprising sheet glass, or glass, slag, or like fibres
    • B32B17/06—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B9/00—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B9/00—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
    • B32B9/04—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00 comprising such particular substance as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions

Definitions

  • the present invention relates to a glass substrate with laminated film and a window glass.
  • High heat shielding performance is required for building glass panes in hot regions, for example, low-latitude to mid-latitude regions such as Southeast Asia.
  • the window glass In order to have high heat shielding performance, it is necessary for the window glass to have a low thermal emissivity.
  • a window glass having a low thermal emissivity a film laminate having a glass substrate and a laminated film including a first dielectric layer, a crystallinity improving region, a zirconium nitride layer, and a second dielectric layer is proposed. (Patent Document 1).
  • the inventors of the present invention have described that the cause of the peeling of the laminated film at the interface between the glass substrate and the laminated film in the glass substrate with the laminated film is that the compressive stress of the zirconium nitride layer in the laminated film is high and the adhesion of the first dielectric layer
  • the present invention was completed by finding out that it is based on low nature. That is, it discovered that the said subject could be solved by the glass substrate with a laminated film which has the following aspects.
  • the laminated film has a configuration including a first dielectric layer, a crystallinity improving layer, a functional layer, and a second dielectric layer in this order from the glass substrate side,
  • the first dielectric layer and the second dielectric layer comprise silicon nitride;
  • the functional layer includes zirconium nitride having an extinction coefficient of greater than 6.0 at a wavelength of 1500 nm,
  • the crystallinity improving layer includes zirconium nitride having an extinction coefficient of less than 2.0 at a wavelength of 1500 nm,
  • the laminated film has a stress index defined by the following formula (1) of 70 or more,
  • the adhesion layer includes silicon oxide and has a thickness of 3 to 20 nm;
  • a glass substrate with a laminated film is provided in which a value obtained by dividing the thickness of the adhesion layer
  • the glass substrate with a laminated film which is excellent in heat-shielding property and adhesiveness can be provided.
  • the “boundary between the crystallinity improving layer and the functional layer” is defined as follows.
  • a functional layer is formed on the surface of the crystallinity-improving layer, the atoms constituting the crystallinity-improving layer and the atoms constituting the functional layer are mixed, so the boundary between the crystallinity-improving layer and the functional layer is in the thickness direction. It exists with a certain width. Therefore, by alternately repeating etching by ion sputtering and X-ray photoelectron spectroscopy (XPS) measurement, the atomic concentration is analyzed in the thickness direction from the surface of the laminated film to the interface between the laminated film and the glass substrate.
  • XPS X-ray photoelectron spectroscopy
  • Sputter time range in which the metal atoms contained in the crystallinity-improving layer and the metal atoms contained in the functional layer are detected in the graph of sputtering time and atomic concentration (however, one or both metal atoms were detected as noise) Is the boundary between the crystallinity improving layer and the functional layer.
  • Oxygen atom concentration at the boundary between the crystallinity-enhancing layer and the functional layer refers to sputtering in which atoms contained in the crystallinity-improving layer and atoms contained in the functional layer are detected in the above-described graph of sputtering time and atomic concentration. It is the maximum value of oxygen atom concentration in the time range.
  • the “thickness of each layer constituting the laminated film” is calculated from “the boundary between the target layer and the upper layer” to “the boundary between the target layer and the lower layer” in the above-described graph of the sputtering time and the atomic concentration.
  • the sputtering time was a value converted from the sputtering rate of the standard sample to the thickness.
  • “Boundary between the target layer and the layer immediately above” and “Boundary between the target layer and the layer immediately below” are respectively “the median values of the sputtering times during which atoms included in the target layer and atoms included in the layer directly above are detected. And “the median value of the sputtering time during which atoms contained in the target layer and atoms contained in the immediate lower layer are detected”.
  • “Thickness of adhesion layer” is calculated by converting the sputtering time from “boundary between glass substrate and adhesion layer” to “boundary between adhesion layer and first dielectric layer” from the sputtering rate of the standard sample. Value.
  • the “boundary between the glass substrate and the adhesion layer” is the median value of the sputtering time during which atoms contained in the glass substrate and atoms contained in the adhesion layer are detected in the above-described graph of sputtering time and atomic concentration.
  • the “boundary between the adhesion layer and the first dielectric layer” is the median value of the sputtering time during which both atoms contained in the adhesion layer and atoms contained in the first dielectric layer are detected.
  • the value of “pressure” indicates “absolute pressure” unless otherwise specified.
  • the thickness of the glass substrate is a geometric thickness. “ ⁇ ” indicating a numerical range means that numerical values described before and after that are included as a lower limit value and an upper limit value. 1 and 2 are both schematic drawings, and the dimensional ratios thereof are different from actual ones for convenience of explanation.
  • the present invention will be described in detail. The description of the constituent elements described below is made based on typical embodiments of the present invention, but the present invention is not limited to such embodiments.
  • FIG. 1 is a cross-sectional view showing an example of a glass substrate with a laminated film of the present invention.
  • the glass substrate with a laminated film 10 includes a glass substrate 21, an adhesion layer 61 provided on one surface of the glass substrate 21, a first laminated film 22, and a second laminated film 23.
  • the 1st laminated film 22 has the structure which has the 1st dielectric material layer 31, the 1st crystallinity improvement layer 41, the 1st functional layer 51, and the 2nd dielectric material layer 32 in order from the glass substrate 21 side. Consists of.
  • the second laminated film 23 includes, from the glass substrate 21 side, a third dielectric layer 33 that also serves as the second dielectric layer 32 of the first laminated film 22, a second crystallinity improving layer 42, 2 functional layers 52 and a fourth dielectric layer 34 in this order.
  • FIG. 2 is a cross-sectional view showing another example of the glass substrate with a laminated film of the present invention.
  • the glass substrate 11 with a laminated film includes a glass substrate 21, an adhesion layer 61 provided on one surface of the glass substrate 21, a first laminated film 22, a second laminated film 23, and a third laminated film 24.
  • the third laminated film 24 includes a fifth dielectric layer 35 that also serves as the fourth dielectric layer 34 of the second laminated film 23, a third crystallinity improving layer 43, a third functional layer 53, and a third functional layer 53. 6 dielectric layers 36 in order.
  • the laminated film 22 may have a sacrificial layer between the first dielectric layer 31 and the first crystallinity improving layer 41, and the first functional layer 51, the second dielectric layer 32, and the like. A sacrificial layer may be provided between them.
  • the laminated films 23 and 24 may have a sacrificial layer.
  • the sacrificial layer is for suppressing diffusion of nitrogen from the first dielectric layer to the crystallinity improving layer and diffusion of nitrogen from the second dielectric layer to the functional layer during the heat treatment. It is preferably a metal layer made of any one of aluminum, titanium, chromium, niobium, molybdenum, hafnium, zirconium, or a combination thereof.
  • the laminated film 23 may have a top layer on the surface of the fourth dielectric layer 34 farthest from the glass substrate 21.
  • the laminated film 24 may have a top layer on the surface of the sixth dielectric layer 36.
  • the laminated films 22 to 24 are provided on at least one surface of the glass substrate 21.
  • the laminated films 22 to 24 may be provided on both surfaces of the glass substrate 21.
  • the glass substrate 21 examples include soda lime glass, aluminosilicate glass, non-alkali glass, and borosilicate glass, and soda lime glass is preferable.
  • the thickness of the glass substrate 21 is appropriately set according to the use of the laminated film-attached glass substrate. When a glass substrate with a laminated film is used as a window glass, the thickness of the glass substrate 21 is preferably 0.5 to 12 mm.
  • the adhesion layer 61 contains silicon oxide and has a thickness of 3 to 20 nm.
  • the silicon oxide is preferably doped with boron, aluminum, titanium, nickel, zinc, molybdenum, tin, tungsten, zirconium or niobium, and more preferably with aluminum or zirconium.
  • silicon oxide doped with aluminum is expressed as Si 1- ⁇ O z ⁇ Al ⁇ , where ⁇ is 0.03 to 0.50 and z is 1.0 to 2.0.
  • Zirconium-doped silicon oxide is expressed as Si 1- ⁇ O z ⁇ Zr ⁇ , where ⁇ is 0.03 to 0.50 and z is 1.0 to 2.0.
  • the thickness of the adhesion layer 61 is 3 nm or more, the glass substrate with a laminated film 10 has excellent adhesion.
  • the thickness is 20 nm or less, the laminated film-attached glass substrate 10 can realize an appearance with few defects.
  • the thickness of the adhesion layer 61 is preferably 5 to 15 nm, and more preferably 7 to 15 nm.
  • the first dielectric layer 31 and the second dielectric layer 32 include silicon nitride.
  • the silicon nitride is preferably doped with boron, aluminum, titanium, nickel, zinc, molybdenum, tin, tungsten, zirconium or niobium, and more preferably with aluminum or zirconium.
  • Silicon nitride doped with aluminum is expressed as Si 1- ⁇ N y ⁇ Al ⁇ , where ⁇ is 0.03 to 0.50 and y is 1.0 to 2.0.
  • Zirconium-doped silicon nitride is expressed as Si 1- ⁇ N y ⁇ Zr ⁇ , where ⁇ is 0.03 to 0.50 and y is 1.0 to 2.0.
  • the first dielectric layer 31 and the second dielectric layer 32 may contain impurities (carbon atoms, oxygen atoms, etc.) that are inevitably introduced during film formation.
  • the first dielectric layer 31 and the second dielectric layer 32 may be a single layer or a combination of two or more different types of layers.
  • the thickness of the first dielectric layer 31 and the second dielectric layer 32 is preferably 1.5 to 200 nm. If this thickness is 1.5 nm or more, the first functional layer 51 is protected from deterioration due to oxygen and moisture, and thus the laminated film-attached glass substrate 10 has excellent durability. If this thickness is 200 nm or less, the glass substrate 10 with a laminated film can obtain good productivity.
  • the first crystallinity improving layer 41 improves the crystallinity of zirconium nitride contained in the first functional layer 51 formed immediately above.
  • the first crystallinity improving layer 41 includes zirconium nitride having an extinction coefficient of less than 2.0 at a wavelength of 1500 nm.
  • Zirconium nitride is preferably present in the first crystallinity-improving layer 41 at a portion in contact with the first functional layer 51.
  • the thickness of the first crystallinity improving layer 41 is preferably 3 to 30 nm, more preferably 4.5 to 20 nm.
  • the glass substrate with film 10 has excellent heat shielding properties.
  • the first functional layer 51 includes zirconium nitride having an extinction coefficient of more than 6.0 at a wavelength of 1500 nm.
  • the first functional layer 51 may contain impurities (carbon atoms, oxygen atoms, other metal atoms, etc.) that are inevitably introduced during film formation.
  • the first functional layer 51 is formed in contact with the first crystallinity improving layer 41 and immediately above it.
  • the thickness of the first functional layer 51 is preferably 3 to 60 nm, and more preferably 10 to 40 nm. If this thickness is 3 nm or more, the heat-shielding property of the glass substrate 10 with a laminated film is further increased. If this thickness is 60 nm or less, the glass substrate 10 with a laminated film can have moderately visible light transmittance.
  • the materials and thicknesses of the third to sixth dielectric layers 33 to 36 are the same as those of the first dielectric layer 31 and the second dielectric layer 32, and the preferred embodiments are also the same.
  • the third to sixth dielectric layers 33 to 36 may contain impurities (carbon atoms, oxygen atoms, etc.) inevitably introduced at the time of film formation.
  • the materials and thicknesses of the second crystallinity enhancement layer 42 and the third crystallinity enhancement layer 43 are the same as those of the first crystallinity enhancement layer 41, and the preferred forms are also the same.
  • the second and third crystallinity improving layers 42 and 43 may contain impurities (carbon atoms, oxygen atoms, etc.) inevitably introduced during film formation.
  • the materials and thicknesses of the second functional layer 52 and the third functional layer 53 are the same as those of the first functional layer 51, and the preferred forms are also the same.
  • the second and third functional layers 52 and 53 may contain impurities (carbon atoms, oxygen atoms, etc.) that are inevitably introduced during film formation.
  • the glass substrate with a laminated film of the present invention is preferably such that the laminated film does not peel after 4 cycles of the salt spray test specified in JIS C60068-2-52. More preferably, the laminated film does not peel off after 5 cycles of the salt spray test.
  • the glass substrate with a laminated film of the present invention when the total thickness of all functional layers is 30 nm or more, the adhesion in the salt spray test is greatly improved.
  • the glass substrate with a laminated film of the present invention preferably has a solar heat acquisition rate specified in ISO 9050: 2003 of 0.36 or less, more preferably 0.30 or less.
  • the laminated film of the present invention has a stress index defined by the following formula (1) of 70 or more.
  • Stress index total thickness of functional layer (nm) + 0.2 ⁇ total thickness of dielectric layer (nm) + 0.4 ⁇ total thickness of crystallinity improving layer (nm) (1)
  • the present inventors have found that when a laminated film is provided directly on a glass substrate, if the laminated film has a stress index of 70 or more, it is easy to peel in a salt spray test.
  • the laminated film has a configuration in which a first dielectric layer containing silicon nitride, a crystallinity improving layer containing zirconium nitride, a functional layer containing zirconium nitride, and a second dielectric layer containing silicon nitride are sequentially formed, each layer Therefore, the stress of the laminated film tends to be as high as 5000 to 30000 MPa. Furthermore, a laminated film having a stress index of 70 or more calculated in consideration of the thickness of each layer has a stress of 8000 to 35000 MPa, and thus easily peels off in a salt spray test.
  • the stress index of the laminated film is preferably 70 to 230, more preferably 70 to 150, and particularly preferably 70 to 100.
  • the glass substrate with the laminated film has excellent heat shielding properties.
  • the stress index of the laminated film is 230 or less, the glass substrate with the laminated film becomes difficult to peel off in the salt spray test when an adhesion layer is provided.
  • the visible light absorptance of the functional layer can be reduced to a certain value or less, the glass substrate with a laminated film can have a visible light transmittance of 3% or more measured in accordance with ISO 9050: 2003.
  • the present inventors have introduced an adhesion layer 61 containing silicon oxide and having a thickness of 3 to 20 nm between the glass substrate and the laminated film, and the thickness of the adhesion layer 61 is set to the laminated film. It was found that when the value divided by the stress index of 0.04 to 0.29 is within the range, the glass substrate with a laminated film has excellent heat shielding properties and adhesion. The reason is not necessarily clear, but by selecting the thickness of the adhesion layer 61 and the laminated films 22 to 24 in which this value is in the range of 0.04 to 0.29, the laminated films 22 to 24 including the zirconium nitride layer are selected. We believe that we were able to achieve adhesion that can withstand the stress of. This value is preferably in the range of 0.09 to 0.25, and more preferably in the range of 0.09 to 0.20.
  • the ratio of the thickness of the adhesion layer 61 to the total thickness of the laminated film is preferably in the range of 0.009 to 0.102.
  • this ratio is 0.009 or more, the glass substrate with a laminated film can have excellent adhesion in a salt spray test.
  • this ratio is 0.102 or less, the laminated film-attached glass substrate can realize an appearance with few defects.
  • the ratio of the thickness of the second functional layer 52 to the thickness of the first functional layer 51 is preferably in the range of 1.05 to 2.60.
  • This ratio is more preferably in the range of 1.10 to 2.50, and still more preferably in the range of 1.20 to 2.40.
  • the oxygen atom concentration at the boundary between the first crystallinity improving layer 41 and the first functional layer 51 is preferably 20 atomic% or less, more preferably 15 atomic% or less, and 10 atomic% or less. More preferably it is.
  • the oxygen atom concentration is 20 atomic% or less, the crystallinity of zirconium nitride contained in the first functional layer 51 is improved, and the glass substrate with a laminated film can have excellent heat shielding properties.
  • the lower limit is 0 atomic%.
  • the oxygen atom concentration at the boundary between the second and third crystallinity enhancement layers 42 and 43 and the second and third functional layers 52 and 53 is the same as the first crystallinity enhancement layer 41 and the first functional layer 51. It is preferable to be in the same numerical range as the oxygen atom concentration at the boundary.
  • the glass substrate 10 with a laminated film of the present invention has an adhesion layer 61, a first dielectric layer 31, a first crystallinity improving layer 41, a first functional layer 51, a second dielectric on the surface of the glass substrate 21.
  • the body layer 32, the second crystallinity improving layer 42, the second functional layer 52, and the fourth dielectric layer 34 can be manufactured in sequence.
  • the third crystallinity improving layer 43, the third functional layer, and the sixth dielectric layer 36 are sequentially formed on the surface of the fourth dielectric layer 34. Can be manufactured.
  • the film forming method examples include a vacuum deposition method, an ion plating method, a sputtering method, a CVD method, and the like, and the sputtering method is preferable from the viewpoint of excellent thickness uniformity and productivity.
  • the glass substrate 11 with a laminated film of the present invention can be used as a window glass having a single glass substrate.
  • a window glass having a single glass substrate is lightweight and has excellent productivity.
  • the laminated glass is provided in the indoor side in the window glass which has one glass substrate. By providing the laminated film on the indoor side, the heat insulating property of the window glass is improved.
  • Examples 1 to 7 are examples, examples 11, 13, 14, and 15 are comparative examples, and example 12 is a reference example.
  • the thickness of each layer in the laminated film is measured with a spectroscopic ellipsometer (measured at 50 °, 60 °, and 70 ° incident angles using M-2000 manufactured by JA Woollam), and transmission spectrum (manufactured by Hitachi, Ltd.).
  • U-4100 measured in the wavelength range of 250 to 2500 nm
  • film surface reflection spectrum measured in the wavelength range of 250 to 2500 nm at an incident angle of 5 ° using U-4100 manufactured by Hitachi, Ltd.
  • the thickness of the adhesion layer was measured by a method of alternately repeating etching by ion sputtering and X-ray photoelectron spectroscopy (XPS) measurement.
  • XPS X-ray photoelectron spectroscopy
  • the extinction coefficient at a wavelength of 1500 nm of the crystallinity improving layer and the functional layer was determined as follows. With respect to the glass substrate with the laminated film, a spectral spectrum was measured using a spectrophotometer (U-4100, manufactured by Hitachi, Ltd.). In addition, polarization information was measured using a spectroscopic ellipsometer (manufactured by JA Woollam Co., Ltd., M-2000). Using the obtained spectral transmission spectrum, spectral reflection spectrum (film surface and glass surface) and polarization information, the optical model was fitted to determine the extinction coefficient.
  • Example 1 As the glass substrate 21, a soda-lime glass plate having a size of 100 mm in length, 100 mm in width, and 3 mm in thickness was prepared. As shown in Table 1 and Table 2, the adhesion layer 61 and the laminated films 22 and 23 were formed on one surface of the glass substrate 21 to obtain the laminated film-attached glass substrate 10. The adhesion layer 61 and the laminated films 22 and 23 were formed by a sputtering method.
  • the adhesion layer 61 Si 1- ⁇ O z ⁇ Al ⁇
  • the pressure during film formation was 0.5 Pa.
  • the first dielectric layer 31 and the second dielectric layer 32 (Si 1- ⁇ N y ⁇ Al ⁇ ) were formed by using a Si (90 mass%)-Al (10 mass%) target and discharging.
  • the pressure during film formation was 0.4 Pa.
  • the first crystallinity improving layer 41 (ZrN x )
  • nitrogen gas was used as a discharge gas.
  • the pressure during film formation was 0.4 Pa.
  • the pressure during film formation was 0.3 Pa.
  • the thicknesses of the second crystallinity improving layer 42, the second functional layer 52, and the fourth dielectric layer 34 were adjusted to the thicknesses shown in Tables 1 and 2 by changing the substrate transport speed.
  • Examples 2-7, Examples 11-15 By carrying out in the same manner as in Example 1 except that each element of the glass substrate, the adhesion layer, and the laminated film in the glass substrate with the laminated film is configured as shown in Table 1 and Table 2, the glass substrate with laminated film 10 or 11 was obtained.
  • the glass substrate with a laminated film of the present invention is useful for architectural window glass, vehicle window glass, and the like as heat shielding glass. It should be noted that the entire content of the specification, claims, drawings, and abstract of Japanese Patent Application No. 2018-053485 filed on March 20, 2018 is cited here as disclosure of the specification of the present invention. Incorporate.

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Abstract

L'invention concerne un substrat de verre avec des films stratifiés qui a d'excellentes propriétés de protection contre la chaleur et une excellente adhésivité. Le substrat de verre avec des films stratifié comprend un substrat de verre, une couche adhésive disposée sur au moins une surface du substrat de verre, et au moins deux films stratifiés ; les films stratifiés comprennent, dans l'ordre depuis le côté substrat de verre, une première couche diélectrique, une couche améliorant la cristallinité, une couche fonctionnelle et une seconde couche diélectrique ; la première couche diélectrique et la seconde couche diélectrique comprennent du nitrure de silicium ; la couche fonctionnelle comprend du nitrure de zirconium ayant un coefficient d'extinction supérieur à 6,0 à une longueur d'onde de 1500 nm ; les films stratifiés ont un indice de contrainte, défini par la formule (1), d'au moins 70 ; la couche adhésive comprend de l'oxyde de silicium et a une épaisseur de 3 à 20 nm ; et la valeur trouvée en divisant l'épaisseur de la couche adhésive par l'indice de contrainte est de 0,04 à 0,29.
PCT/JP2019/007935 2018-03-20 2019-02-28 Substrat de verre à films stratifiés et verre à vitre WO2019181421A1 (fr)

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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016513057A (ja) * 2013-02-20 2016-05-12 サン−ゴバン グラス フランス 熱放射反射コーティングを有する板ガラス
JP2016515950A (ja) * 2013-02-27 2016-06-02 サン−ゴバン グラス フランス 低放射率の多層で被覆された基材
WO2016199676A1 (fr) * 2015-06-11 2016-12-15 旭硝子株式会社 Empilement de films et verre feuilleté
JP2017529305A (ja) * 2014-09-12 2017-10-05 ショット アクチエンゲゼルシャフトＳｃｈｏｔｔ ＡＧ コーティングされた化学強化された薄型フレキシブルガラス

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016513057A (ja) * 2013-02-20 2016-05-12 サン−ゴバン グラス フランス 熱放射反射コーティングを有する板ガラス
JP2016515950A (ja) * 2013-02-27 2016-06-02 サン−ゴバン グラス フランス 低放射率の多層で被覆された基材
JP2017529305A (ja) * 2014-09-12 2017-10-05 ショット アクチエンゲゼルシャフトＳｃｈｏｔｔ ＡＧ コーティングされた化学強化された薄型フレキシブルガラス
WO2016199676A1 (fr) * 2015-06-11 2016-12-15 旭硝子株式会社 Empilement de films et verre feuilleté

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Title
MENG, JIAN-PING: "Influence of ion-atom arrival ratio on structure and optical properties of ZrNx films", MATERIALS LETTERS, vol. 164, February 2016 (2016-02-01), pages 291 - 293, XP055640764 *

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