WO2019119804A1 - Substrate frame return device, substrate frame return method and fully automatic coating machine - Google Patents

Abstract

A substrate frame return device and a substrate frame return method, as well as a fully automatic coating machine using the substrate frame return device. The substrate frame return device comprises a substrate frame conveying device (1) and substrate frame lifting and returning devices (2), wherein the substrate frame conveying device (1) is disposed at the bottom of coating devices (3), two ends of the substrate frame conveying device are respectively provided with one substrate frame lifting and returning device (2), and the substrate frame conveying device (1) is connected to a conveyor belt (4) on the coating devices when the substrate frame lifting and returning devices (2) are lifted. The substrate frame return method comprises four steps of substrate frame lifting, substrate frame conveying, substrate frame lowering and substrate frame returning. The substrate frame return device may implement the return function of the substrate frame, implement automatic coating, and may effectively use existing space, thereby solving the problem of modifying coating devices that are already in production.

Description

Substrate frame return device and substrate frame return method, automatic coating machine

This application is required to be submitted to the China Patent Office on December 21, 2017, the application number is 201711397058.4, the application name is “substrate rack return device and substrate frame return method”, the application number is 201711394591.5, and the application name is “automatic coating machine”. The priority of the Chinese Patent Application, the entire contents of which is incorporated herein by reference.

Technical field

The present disclosure relates to the field of coating, and in particular to a substrate carrier returning device, a substrate carrier returning method, and a fully automatic coating machine.

Background technique

The production type magnetron sputtering deposition equipment used in the photovoltaic industry is mainly divided into two types: a horizontal magnetron sputtering coating machine and a vertical magnetron sputtering coating machine. Among them, the main one is horizontal, and its main advantage is that the overall film uniformity is good.

During the sputtering coating process, the target slag phenomenon is inevitable, and the edge of the glass film layer is prone to sparking, which seriously affects the film formation quality. In order to avoid the occurrence of sparking, an additional substrate holder is required to shield the edge of the glass. When the substrate holder is added, a backhaul system needs to be added to realize automatic control. However, due to limited space in the factory, the substrate backplane system cannot be externally mounted. In addition, the ability to achieve automation has become a problem.

Summary of the invention

The present disclosure provides a substrate back transfer device and a substrate back transfer method, and a fully automatic coating machine, which can realize the back transfer function of the substrate holder, realize automatic production, and can effectively utilize the bottom space of the existing coating machine to reduce the land occupation. The area is effective to solve the transformation problem of the coating equipment that has been put into production.

Some embodiments of the present disclosure provide a substrate holder returning device including a substrate holder conveying device and a substrate holder lifting and returning device; wherein the substrate holder conveying device is disposed at a bottom of the coating device, and the coating device The inlet end and the outlet end of the coating device are respectively provided with one of the substrate rack lifting and returning devices.

A substrate holder lifting and returning device at the inlet end of the coating apparatus is configured to receive the substrate holder transported back by the substrate holder transport device and configured to transport the substrate holder to a conveyor belt in the coating apparatus.

A substrate holder lifting and returning device at the exit end of the coating apparatus is configured to receive the substrate holder conveyed by the conveyor belt and configured to convey the substrate holder to the substrate holder conveying device.

In some embodiments, the substrate holder transport device is a belt conveyor or a conveyor belt.

In some embodiments, the substrate holder transport device includes a first return body and a support leg, the support legs being fixedly disposed at a bottom of the first return body. The first return body is configured to drive the substrate carrier transported by the conveyor belt to move toward the inlet end of the conveyor belt.

The substrate rack lifting and returning device comprises a second returning body and a lifting device; the lifting device is arranged at the bottom of the second returning body. a second returning body in the substrate rack lifting and returning device at the outlet end of the coating device, configured to drive the substrate rack conveyed by the conveyor belt to move to the inlet end of the substrate rack conveying device; and the substrate rack lifting and returning device at the inlet end of the coating device The second return body is configured to drive the substrate holder transported back by the substrate holder transport device to move to the inlet end of the conveyor belt.

In some embodiments, the first return body is identical in structure to the second return body, and each includes a frame, a plurality of transfer wheels for transporting the substrate holder, a plurality of rotating shafts, and a drive motor. A mounting groove is respectively disposed on two sides of the frame body, and the transfer wheel is disposed in each of the two mounting slots. The transfer wheel in one of the mounting slots is coupled to the transfer wheel in the other of the mounting slots by the rotating shaft; any two adjacent rotating shafts are coupled by a belt and a pulley. The drive motor is fixedly mounted on the frame, and an output shaft of the drive electrode is coupled to one of the rotating shafts.

In some embodiments, the transfer wheel is a sheave. The substrate holder returning device further comprises a substrate holder; the bottom of the substrate holder is provided with two flat-shaped guiding rods, and the two guiding rods respectively cooperate with the groove wheels in the two mounting grooves.

In some embodiments, the lifting device is one of a hydraulic cylinder, a cylinder, and an electric push-pull rod.

Some embodiments of the present disclosure provide a substrate rack returning method applied to the substrate rack returning device, comprising: a substrate rack lifting and returning device at an inlet end of the coating device lifting the substrate rack and transmitting the substrate to the conveyor belt The conveyor belt transports the substrate holder from the inlet end of the coating device to the outlet end of the coating device, and transfers the substrate holder to the substrate holder lifting and returning device at the outlet end of the coating device and in an ascending state. The substrate rack lifting and returning device at the outlet end of the coating device is lowered with the substrate holder, and the substrate holder is transferred to the substrate holder conveying device. The substrate rack transfer device returns the substrate rack from the bottom of the coating device to the substrate rack lifting and returning device at the inlet end of the coating device and is in a descending state, and completes a return process of the loop back substrate carrier.

In some embodiments, during the transfer of the substrate holder by the conveyor belt, the substrate holder lifting and returning device at the inlet end of the coating device is lowered to a third preset position; and the third predetermined position is a substrate carrier The position is flush.

In some embodiments, the substrate holder lifting and returning device at the outlet end of the coating device rises to a fourth preset position during the substrate carrier returning; the fourth predetermined position is flush with the conveyor belt. s position.

Some embodiments of the present disclosure provide a fully automatic coating machine including a top sheeting device, a returning device, and a lower sheeting device. The coating apparatus comprises a plurality of conveyor belts arranged in parallel, and a first gap is formed between two adjacent conveyor belts, each of which runs through the coating apparatus, and both ends of each conveyor belt extend into the upper and lower apparatus, respectively.

The back-transmission device is disposed under the coating device, and the back-transmission device is the substrate carrier return device described above. The two ends of the backhaul device are respectively located in the upper device and the lower device.

The upper sheet device is connected to the inlet end of the coating device, configured to transfer and place the glass substrate on the substrate holder at the inlet end of the conveyor belt; the lower sheet device is connected to the outlet end of the coating device, and is configured to be a glass on the substrate holder at the outlet end of the conveyor belt The substrate is transferred and sent to the next station.

In some embodiments the wafer loading apparatus includes a first substrate transfer belt, a first substrate lift mechanism, a first substrate transfer mechanism, a first substrate lift mechanism, and a first travel track.

The first substrate conveyor is configured to feed the glass substrate into the wafer apparatus.

The first substrate transfer mechanism is slidably disposed on the first traveling track. The first substrate transfer mechanism has a first preset position and a second preset position on the first traveling track, the first preset position is directly above the first substrate conveyor, and the second preset position is first The substrate lifting mechanism is opposite.

The first substrate lift mechanism moves up and down relative to the substrate transfer belt in a direction perpendicular to the first substrate transfer belt. The first substrate lifting mechanism is configured to lift the glass substrate on the first substrate transfer belt when jacking, to drop the glass substrate during landing, and to place the first substrate transfer mechanism that slides to the first predetermined position on.

The first substrate transfer mechanism is configured to elongate movement upon sliding to the second predetermined position to transfer the glass substrate directly above the conveyor belt.

The first substrate lifting mechanism is disposed below the inlet end of the conveyor belt. The first substrate lift mechanism is configured to jack up the glass substrate on the first substrate transfer mechanism when it is raised, to drop the glass substrate upon landing and to place it on the substrate holder on the conveyor.

In some embodiments, the lower sheet apparatus includes a second substrate transfer belt, a second substrate lift mechanism, a second substrate transfer mechanism, a second substrate lift mechanism, and a second travel track.

The second substrate transfer mechanism is slidably disposed on the second traveling track. The second substrate transfer mechanism has a fifth preset position and a sixth preset position on the second traveling track, the fifth preset position is directly above the second substrate conveyor, the sixth preset The position is opposite to the second substrate jacking mechanism.

The second substrate transfer mechanism is configured to elongate movement upon sliding to the sixth predetermined position.

The second substrate lifting mechanism is disposed below the outlet end of the conveyor. The second substrate lifting mechanism is configured to lift the glass substrate on the substrate holder on the conveyor belt when jacking up, to drop the glass substrate when landing, and to place the second elongated when sliding to the sixth predetermined position The substrate transfer mechanism.

The second substrate lift mechanism moves up and down relative to the second substrate transfer belt in a direction perpendicular to the second substrate transfer belt. The second substrate lifting mechanism is configured to lift the glass substrate on the second substrate transfer mechanism that slides to the fifth predetermined position when jacking, to drop the glass substrate during landing and to place on the second substrate conveyor on.

The second substrate transfer belt is configured to feed the glass substrate out of the lower sheet device and feed it to the next station.

In some embodiments, the first substrate lift mechanism and the second substrate lift mechanism each include a first lift fork and a lift cylinder. The first lift fork includes a plurality of first plungers, a first plunger connecting rod, and a lift cylinder connecting rod. The plurality of first plungers are fixed in parallel to the first plunger connecting rod, and the first plunger connecting rod is fixedly connected to the telescopic end of the lifting cylinder through the lifting cylinder connecting rod . The first substrate conveyor belt is plural and arranged at equal intervals in parallel with each other, and the first plunger of the first substrate lifting mechanism is configured to pass through the second between the adjacent two first substrate conveyor belts during lifting. Gap. The second substrate conveyor belt is plural and arranged at equal intervals in parallel with each other, and the first plunger of the second substrate lifting mechanism is configured to pass the second between the adjacent two second substrate conveyor belts during lifting Gap.

In some embodiments, the first substrate transfer mechanism and the second substrate transfer mechanism each include a second lift fork, a telescopic cylinder, a slider, and a carriage. The slider of the first substrate transfer mechanism is slidably disposed on the first traveling rail. The carriage of the second substrate transfer mechanism is slidably disposed on the second traveling rail. The slider is slidably disposed on the slider. The telescopic cylinder is fixed to the slider. The second lifting fork includes a plurality of second plungers and a second plunger connecting rod; the plurality of second plungers are equally spaced on the second plunger connecting rod; the second plunger connecting rod is fixed to the telescopic cylinder The telescopic end.

In some embodiments, the first travel track and the second travel track each include an upper rail, a middle rail, and a lower rail. The slide of the first substrate transfer mechanism is slidably coupled to the upper rail, the middle rail and the lower rail of the first traveling rail. The carriage of the second substrate transfer mechanism is slidably coupled to the upper rail, the middle rail and the lower rail of the second traveling rail.

In some embodiments, the first substrate transfer mechanism and the second substrate transfer mechanism each further include a first servo motor and a first rack. The first rack is fixedly mounted on the middle rail; the first servo motor is fixed on the slider, and the first servo motor is connected to the first gear that meshes with the first rack.

In some embodiments, one side of the carriage has two second rails arranged in parallel in a vertical direction; the slider is slidably mounted on the carriage by a second rail.

In some embodiments, the first substrate transfer mechanism and the second substrate transfer mechanism each further include a second servo motor and a second rack. The second rack is disposed on the carriage and disposed in parallel with the second rail. The second servo motor is fixed to the slider, and the second servo motor is coupled to the second gear that meshes with the second rack.

In some embodiments, the first substrate jacking mechanism and the second substrate jacking mechanism each include a base and a plurality of liftable lifting jacks, the jacking cylinder being secured to the base. Each jacking cylinder is configured to pass a first gap between two adjacent conveyor belts when telescopic and through a gap between two adjacent second poles.

In a substrate carrier back-transfer device provided by some embodiments of the present disclosure, automatic return of the substrate holder during the sputter coating process is achieved. Since the space for installing the bottom of the coating device is fully utilized, the substrate carrier conveying device with a large footprint is disposed under the coating device, thereby solving the problem that the coating device that has been put into production cannot add the substrate carrier returning system in a limited plant space. The problem. The utility model has the advantages of simple structure and small occupied area, and the substrate holder can be reused, and one set is used, one set is used, and the other set is spared, and the substrate frame buffer room is not required to be disposed at the inlet and the back end of the coating device, thereby greatly reducing The cost.

In a fully automatic coating machine provided by some embodiments of the present disclosure, the automatic loading, the automatic lowering, and the automatic backing of the substrate holder can be realized by the cooperation of the substrate backing device and the upper device and the lower device. The function enables the coating equipment to achieve a high degree of automation control, eliminating the need for manual operation throughout the entire process, greatly improving production efficiency. Moreover, since the returning device is disposed at the bottom of the coating device, the existing space can be effectively utilized, and the floor space is saved, which is not only suitable for the arrangement of the new device, but also suitable for the transformation of the old device.

DRAWINGS

1 is a perspective view of an overall structure of a substrate carrier returning device according to some embodiments of the present disclosure;

2 is a perspective view of a substrate rack transport device according to some embodiments of the present disclosure;

3 is a perspective view of a first returning body provided by some embodiments of the present disclosure;

4 is a perspective view of a substrate rack lifting and returning device according to some embodiments of the present disclosure;

FIG. 5 is a perspective view of a second returning body provided by some embodiments of the present disclosure; FIG.

6 is a perspective view of a substrate holder according to some embodiments of the present disclosure;

7 is a schematic flow chart of a method for returning a substrate rack according to some embodiments of the present disclosure;

8 is a perspective view of an overall structure of a fully automatic coating machine according to some embodiments of the present disclosure;

9 is a structural isometric view of a top sheet device according to some embodiments of the present disclosure;

FIG. 10 is a structural isometric view of a lower sheet device according to some embodiments of the present disclosure; FIG.

11 is a perspective view of a first substrate lifting mechanism and a second substrate lifting mechanism according to some embodiments of the present disclosure;

12 is a perspective view of a first substrate transfer mechanism and a second substrate transfer mechanism according to some embodiments of the present disclosure;

13 is a structural isometric view of a first gear and a first rack engaged by some embodiments of the present disclosure;

14 is a structural isometric view of a second gear and a second rack engaged by some embodiments of the present disclosure;

15 is a perspective view of a first substrate jacking mechanism and a second substrate jacking mechanism provided by some embodiments of the present disclosure.

Detailed ways

The embodiments of the present disclosure are described in detail below, and the examples of the embodiments are illustrated in the accompanying drawings, in which the same reference numerals refer to the same elements or elements having the same function. The embodiments described below with reference to the accompanying drawings are intended to be illustrative only, and are not to be construed as limiting.

In the related art, a substrate holder is added by providing a buffer chamber at the inlet end and the outlet end of the horizontal magnetron sputtering coater and a returning system disposed on the side of the horizontal magnetron sputtering coater. However, due to the large footprint of this design, it is necessary to reserve space in advance, which is impossible for the equipment that has been put into production.

Embodiments of the present disclosure provide a substrate holder returning device, as shown in FIG. 1, including a substrate holder transfer device 1 and a substrate holder lifting and returning device 2. The substrate rack transfer device 1 is disposed at the bottom of the coating device 3, and a substrate holder lifting and returning device 2 is disposed at each end of the coating device 3. A substrate rack lifting and lowering device 2 is disposed at the inlet end X1 of the coating device (the corresponding substrate rack lifting and lowering device 2 is also located at the outlet end X4 of the substrate holder conveying device 1), and another substrate holder lifting and returning device 2 is disposed at The outlet end X2 of the coating device 3 (the corresponding substrate holder lifting and returning device 2 is also located at the inlet end X3 of the substrate holder conveying device 1).

The substrate holder lifting and returning device 2 at the inlet end X1 of the coating apparatus is configured to receive the substrate holder 15 transported back by the substrate holder conveying device 1, and is configured to convey the substrate holder 15 to the conveyor belt 4 in the coating apparatus 3. The substrate rack lifting and lowering device 2 at the exit end X2 of the coating device is configured to receive the substrate holder 15 conveyed by the conveyor belt 4, and is configured to convey the substrate holder 15 to the substrate holder conveying device 1.

It will be appreciated that some embodiments of the present disclosure provide a substrate carrier back-transfer device for transporting the substrate holder 15 as a carrier for the glass substrate for coating.

In some embodiments of the present disclosure, the substrate carrier returning device operates in such a manner that the substrate holder lifting and returning device 2 at the inlet end X1 of the coating device rises with the substrate holder 15. When the substrate rack lifting and lowering device 2 is raised to be in contact with the conveyor belt 4 of the coating device 3 (in some embodiments, the substrate rack lifting and lowering device 2 is raised to be flush with the conveyor belt 4 of the coating device 3), the substrate is stopped, and the substrate is stopped. The rack lifting and lowering device 2 starts to transport the substrate holder 15 and transports the substrate holder 15 to the conveyor belt 4 of the coating device 3. Then, the glass substrate is placed on the substrate holder 15, and the substrate holder 15 is guided by the conveyor belt 4 into the coating device 3 to coat the glass substrate. Wherein, during the transfer of the substrate holder 15 by the conveyor belt 4, the substrate holder lifting and returning device 2 at the inlet end X1 of the coating device is lowered and connected to the substrate holder conveying device 1 (in some embodiments, the substrate holder is moved back and forth) The device 2 is lowered to be flush with the substrate holder transfer device 1). After the coating is completed, the substrate holder 15 carries the glass substrate from the exit end X2 of the coating device, and is transferred to the substrate holder lifting and returning device 2 at the outlet end X2 of the coating device (at this time, the outlet end of the coating device X2) The substrate rack lifting and lowering device 2 is in a rising state, flush with the conveyor belt 4). After the coated glass substrate is removed by manual or mechanical means, the substrate holder lifting and returning device 2 at the exit end X2 of the coating device is lowered with the substrate holder 15. When the substrate rack elevating and returning device 2 at the exit end X2 of the coating device is lowered to be in contact with the substrate rack transporting device 1, the substrate rack 15 is transferred to the substrate rack transporting device 1. The substrate holder conveying device 1 transports the substrate holder 15 to the substrate holder lifting and returning device 2 at the inlet end X1 of the coating device (at this time, the substrate holder lifting and returning device 2 at the inlet end X1 of the coating device is in a descending state, and the substrate holder The conveyor 1 is flush) to complete a duty cycle. Here, during the transfer of the substrate holder 15 by the substrate holder transfer device 1, the substrate holder lifting/returning device 2 at the exit end X2 of the coating device rises, waiting for the substrate holder 15 for the next working cycle to be picked up.

Embodiments of the present disclosure provide a substrate holder returning device that realizes automatic return of the substrate holder 15 during sputter coating. Since the embodiment of the present disclosure makes full use of the space for installing the bottom of the coating device 3, the substrate carrier conveying device 1 having a large footprint is disposed under the coating device 3, thereby solving the problem that the coating device that has been put into production cannot be in a limited plant space. The problem of adding the substrate rack return transmission system has the advantages of simple structure and small footprint, and the substrate holder 15 can be reused, one for use, one set for use, and the other for standby, without the need for the coating device 3 The inlet and outlet ends are provided with a substrate holder 15 buffer chamber, thereby greatly reducing the cost.

It should be noted that the substrate rack transfer device 1 has various structures. In some embodiments, the substrate carrier transfer device 1 employs a belt conveyor. In other embodiments, the substrate carrier transfer device 1 employs a conveyor belt. In other embodiments, the substrate carrier transfer device 1 employs a device having a transfer function.

In some embodiments, as shown in FIG. 2, the substrate carrier transfer device 1 includes a first return body 100 and a support leg 6 that is fixedly disposed at the bottom of the first return body 100.

In some embodiments, the support legs 6 are foldable support legs. When the substrate holder conveying device 1 is not used, the support legs 6 can be folded, the occupied space of the substrate holder conveying device 1 can be reduced, and the transportation can be facilitated; when the substrate holder conveying device 1 needs to be repaired during production and use, The support legs 6 can be folded to reduce the occupied space of the substrate rack transporting device 1 and facilitate the maintenance of the staff.

In some embodiments, the first returning body 100 is configured to drive the substrate holder 15 transported by the conveyor belt 4 to move toward the inlet end 401 of the conveyor belt to effect the return of the substrate holder 15 from the coating device outlet end X2 to the coating device inlet. End X1. It can be understood that the inlet end 401 of the conveyor belt, that is, the inlet end X1 of the coating device.

In some embodiments, as shown in FIG. 3, the first return body 100 includes a frame body 9, a plurality of transfer wheels 10, a plurality of rotating shafts 11, and a drive motor 12. A mounting groove 13 is respectively disposed on two sides of the frame body 9, and a transfer wheel 10 is disposed in each of the two mounting slots 13. Each of the transfer wheels 10 in one of the mounting slots 13 is connected to a transfer wheel 10 in the other mounting groove 13 via a rotating shaft 11 (in some embodiments, the rotating shaft 11 is arranged along the width direction W of the frame 9) The two adjacent rotating shafts 11 are interlocked by the belt 14 and the pulley 300. The drive motor 12 is fixedly mounted on the frame body 9, and the output shaft of the drive electrode 12 is coupled to one of the rotary shafts 11.

In some embodiments, any two adjacent rotating shafts 11 are interlocked by the belt 14 and the pulley 300, and are realized in the following manner: except for one end of each of the rotating shafts 11 of the two sides of the rotating shaft 11 Each of the remaining shafts 11 is provided with two pulleys 300 at one end thereof, and any two adjacent pulleys 300 are connected by a belt 14. In other embodiments, a tensioning pulley 5 is disposed between the two rotating shafts 11, and the position of the tensioning pulley 5 is adjustable to adjust the tightness of the belt 14, and the belt 14 connecting the adjacent two rotating shafts 11 can be prevented. Slip.

In some embodiments, as shown in FIG. 4, the substrate rack lifting and lowering device 2 includes a second returning body 200 and a lifting device 8; the lifting device 8 is disposed at the bottom of the second returning body 200. The second return main body 200 of the substrate rack lifting and lowering device 2 located at the exit end X2 of the coating device is configured to move the substrate holder 15 transported by the conveyor 4 to the inlet end X3 of the substrate rack transfer device 1. The second return body 200 in the substrate rack lifting and lowering device 2 at the inlet end X1 of the coating device is configured to drive the substrate holder 15 transported back by the substrate carrier transfer device 1 to move to the inlet end 401 of the conveyor.

In some embodiments, the lifting device 8 employs a hydraulic cylinder. In other embodiments, the lifting device 8 employs a cylinder. In still other embodiments, the lifting device 8 employs an electric push-pull rod. Of course, the specific structure of the lifting device 8 is not limited to the illustrated structure.

In some embodiments, the second backhaul body 200 is identical in structure to the first backhaul body 100. As shown in FIG. 5, the second return main body 200 also includes a frame body 9, a plurality of transfer wheels 10, a plurality of rotating shafts 11, and a drive motor 12. A mounting groove 13 is respectively disposed on two sides of the frame body 9, and a transfer wheel 10 is disposed in each of the two mounting slots 13. Each of the transfer wheels 10 in one of the mounting slots 13 is connected to a transfer wheel 10 in the other mounting slot 13 via a rotating shaft 11, and any two adjacent rotating shafts 11 are coupled by a belt 14 and a pulley 300. The drive motor 12 is fixedly mounted on the frame body 9, and the output shaft of the drive motor 12 is coupled to one of the rotating shafts 11.

In some embodiments, except for one end of each of the rotating shafts 11 on the most two sides of the rotating shaft 11, one pulley 300 is provided, and one end of each of the rotating shafts 11 is provided with two pulleys 300, any two adjacent to each other. The pulleys 300 are each connected by a belt 14. In other embodiments, a tensioning pulley 5 is disposed between the two rotating shafts 11, and the position of the tensioning pulley 5 is adjustable to adjust the tightness of the belt 14, and the belt 14 connecting the adjacent two rotating shafts 11 can be prevented. Slip.

It should be noted that the driving motor 12 drives one of the rotating shafts 11 to rotate. Since any two adjacent rotating shafts 11 are connected by the belt 14, all the rotating shafts 11 rotate in the same direction, and at the same time, the conveying wheel 10 thereon is rotated, so that the conveying wheel 10 moves with the substrate holder 15 to realize The transfer of the substrate holder 15.

In order to ensure that the substrate holder 15 can move according to a prescribed route, it is prevented from running off. In some embodiments, as shown in Figure 4, the transfer wheel 10 employs a sheave. Based on this, as shown in FIG. 6, since the substrate holder returning device is used to transport the substrate holder 15, in some embodiments, the substrate holder returning device further includes a substrate holder 15, the bottom of the substrate holder 15. There are two guide rods 16 arranged in a flat shape. Referring to FIG. 4, the two guide rods 16 are respectively engaged with the sheaves in the two mounting slots 13, that is, the two guide rods 16 are placed in the slots of the sheaves in the two mounting slots 13, so that the substrate holder During the transfer process, the guide rod 16 at the bottom of the substrate holder 15 moves along the groove on the transfer wheel 10, effectively preventing the deviation, and the contact area between the two is increased, the friction is increased, and the friction can be prevented. The role of slipping.

Some embodiments of the present disclosure provide a substrate carrier return method applied to the substrate carrier return device, as shown in FIG. 7 , including:

S1, the substrate holder lifting and returning device 2 at the inlet end X1 of the coating device lifts the substrate holder 15 and transports it to the conveyor belt 4, and the conveyor belt 4 transports the substrate holder 15 from the inlet end X1 of the coating device 3 to the outlet end X2 of the coating device. And transporting the substrate holder 15 to the substrate holder lifting and returning device 2 at the outlet end X2 of the coating apparatus and in an ascending state.

S2, the substrate rack lifting and lowering device 2 at the exit end X2 of the coating device is lowered with the substrate holder 15, and the substrate holder 15 is transferred to the substrate holder conveying device 1.

S3, the substrate holder conveying device 1 returns the substrate holder 15 from the bottom of the coating device 3 to the substrate holder lifting and returning device 2 at the inlet end X1 of the coating device and in a descending state, and completes a loopback of the substrate holder 15 Pass the process.

In some embodiments, a substrate carrier return method applied to the substrate carrier return device includes:

S10. The substrate rack lifting and lowering device 2 at the inlet end X1 of the coating device lifts the substrate holder 15 and transports it to the conveyor belt 4. The conveyor belt 4 transports the substrate holder 15 from the coating device inlet end X1 to the coating device outlet end X2. And transporting the substrate holder 15 to the substrate rack lifting and lowering device 2 at the outlet end X2 of the coating device and rising to the fourth preset position; in the process of conveying the substrate holder 15 by the conveyor belt 4, at the inlet end X1 of the coating device The substrate holder lifting and returning device 2 is lowered to a third preset position.

In step S10, the substrate holder 15 is lifted by the substrate holder lifting/returning device 2 at the inlet end X2 of the coating device, that is, the process in which the substrate holder 15 is raised. The conveyor belt 4 transports the substrate holder 15 from the coating device inlet end X1 to the coating device outlet end X2, and transfers the substrate holder 15 to the substrate holder lifting and returning device 2 at the outlet end X2 of the coating device and is in a rising state, that is, It is a process in which the substrate holder 15 is transported.

In some embodiments, the third predetermined position refers to a position that is flush with the substrate holder transport device 1. In some embodiments, the fourth predetermined position refers to a position that is flush with the conveyor belt 4.

S20, the substrate rack lifting and lowering device 2 at the exit end X2 of the coating device is lowered with the substrate holder 15, and the substrate holder 15 is transferred to the substrate holder conveying device 1.

S30, the substrate holder conveying device 1 returns the substrate holder 15 from the bottom of the coating device 3 to the substrate holder lifting and returning device 2 at the inlet end X1 of the coating device and at a third preset position, to complete a working cycle; During the process of returning the frame 15, the substrate holder lifting and returning device 2 at the outlet end X2 of the coating device rises to a fourth predetermined position.

It should be noted that “third” and “fourth” in the third preset position and the fourth preset position only distinguish the two preset positions.

Some embodiments of the present disclosure provide a fully automatic coater, as shown in FIG. 8, including a coating apparatus 3, a sheeting apparatus 7, a returning device 17, and a lowering apparatus 18. The coating device 3 comprises a plurality of conveyor belts 4 arranged in parallel at equal intervals and extending through the entire coating device 3, a first slit 400 is formed between two adjacent belts 4 (as shown in Figures 9 and 10), and each conveyor belt 4 Both ends extend into the upper sheet device 7 and the lower sheet device 18, respectively. The return device 17 is disposed below the coating device 3, and the return device 17 is the substrate carrier return device described above, and both ends of the return device 17 are located in the upper device 7 and the lower device 18, respectively.

In some embodiments, the two ends of the backhaul device 17 are respectively located in the upper device 7 and the lower device 18, that is, the substrate rack lifting and transmitting device 2 on both sides of the return device 17 are respectively located in the upper device 7 and the lower device. Within device 18.

The top sheet device 7 is coupled to the coating device inlet end X1 and is configured to transfer and place the glass substrate 500 on the substrate holder 15 at the inlet end of the conveyor belt 4.

The lower sheet device 18 is coupled to the coating device outlet end X1 and configured to transfer the glass substrate 500 on the substrate holder 15 at the outlet end of the conveyor belt 4 and feed it to the next station.

In some embodiments, the top sheet device 7 and the lower sheet device 18 are further provided with a spare substrate holder storage area configured to store the spare substrate holder 15. That is to use a set of substrate holders 15 to prevent accidents and ensure the normal operation of the equipment at all times.

In some embodiments, as shown in FIG. 8, the top sheet device 7 is identical in structure to the lower sheet device 18 and symmetrically disposed relative to the coating device 3, thereby saving floor space.

In some embodiments, as shown in FIG. 9, the wafer loading apparatus 7 includes a first substrate transfer belt I-19, a first substrate lifting mechanism I-20, a first substrate transfer mechanism I-21, and a first base. The sheet lifting mechanism 22 is provided.

The first substrate transfer belt I-19 is perpendicular to the returning device 17, i.e., the length direction (or conveying direction) of the first substrate conveying belt I-19 is perpendicular to the returning device 17, and the first substrate conveying belt I-19 is close to The substrate holder lifting and returning device 2 is disposed. The first substrate transfer belt I-19 is configured to feed the glass substrate into the top sheet device 7.

The fully automatic coater further includes a first travel track I-23 disposed in parallel with the return device 17, and the first substrate transfer mechanism I-21 is slidably mounted on the first travel track I-23. The first substrate transfer mechanism I-21 has a first preset position Y1 and a second preset position Y2 on the first traveling track I-23, and the first preset position Y1 is located on the first substrate transfer belt I-19. Above, the second preset position Y2 is opposite to the first substrate jacking mechanism I-22. The first substrate transfer mechanism I-21 is configured to elongate while sliding to the second preset position Y2 to transfer the glass substrate directly above the conveyor belt 4.

The first substrate lifting mechanism I-20 is disposed between the first substrate transfer belt I-19 and the substrate holder lifting and returning device 2. The first substrate lifting mechanism I-20 moves up and down in a direction perpendicular to the first substrate conveying belt I-19 with respect to the first substrate conveying belt I-19. The first substrate lift mechanism I-20 is configured to lift the glass substrate 500 on the first substrate transfer belt I-19 when jacked up, drop the glass substrate 500 when landing, and place it on the first preset The first substrate transfer mechanism I-21 at the Y1 position.

The first substrate jacking mechanism I-22 is disposed below the inlet end of the conveyor belt 4 of the coating device 3 (ie, the first substrate jacking mechanism I-22 is disposed at the inlet end of the conveyor belt 4 below the substrate rack lifting and returning device 2) ). The first substrate jacking mechanism I-22 is configured to jack up the glass substrate 500 on the first substrate transfer mechanism I-21 when jacking up, drop the glass substrate 500 at the time of landing, and place it on the conveyor belt 4. On the substrate holder 15.

In some embodiments, the first substrate transfer belt I-19 in the top sheet device 7 feeds the glass substrate 500 into the top sheet device 7, and the first substrate lift mechanism I-20 first performs a lifting motion to the glass. The substrate 500 is lifted off from the first substrate transfer belt I-19, and then subjected to a falling motion to place the glass substrate 500 on the first substrate transfer mechanism I-21 at the first preset position Y1. The first substrate transfer mechanism I-21 slides to the second preset position Y2, and transfers the glass substrate 500 directly above the conveyor belt 4. The first substrate lifting mechanism I-22 first performs the jacking motion. The glass substrate 500 on a substrate transfer mechanism I-21 is then subjected to a falling motion to place the glass substrate 500 on the substrate holder 15 on the conveyor belt 4.

In some embodiments, as shown in FIG. 10, the lower sheet device 18 includes a second substrate transfer belt II-19, a second substrate lift mechanism II-20, a second substrate transfer mechanism II-21, and a second base. The top lift mechanism II-22 and the second travel track II-23.

The second substrate transfer mechanism II-21 is slidably disposed on the second traveling track II-23; the second substrate transfer mechanism II-21 has a fifth preset position Y5 and the second on the second traveling track II-23 Six preset positions Y6, the fifth preset position Y5 is located directly above the second substrate conveyor belt II-19, and the sixth preset position Y6 is opposite to the second substrate jacking mechanism II-22.

The second substrate transfer mechanism II-21 is configured to elongate motion when sliding to the sixth preset position Y6.

The second substrate lifting mechanism II-22 is disposed below the outlet end of the conveyor belt 4. The second substrate jacking mechanism II-22 is configured to lift the glass substrate 500 on the substrate holder 15 on the conveyor belt 4 when jacking up, to drop the glass substrate 500 during landing and to slide it to the sixth preset At the position Y6, the second substrate transfer mechanism II-21 is elongated.

The second substrate lifting mechanism II-20 moves in a direction perpendicular to the second substrate conveying belt II-19 with respect to the second substrate conveying belt II-19; the second substrate lifting mechanism II-20 is configured to be lifted at the time of jacking The glass substrate 500 on the second substrate transfer mechanism II-21 slid to the fifth preset position Y5 is dropped onto the glass substrate 500 and placed on the second substrate transfer belt II-19.

The second substrate transfer belt II-19 is configured to feed the glass substrate 500 out of the lower sheet device 18 and to the next station.

The second substrate jacking mechanism II-22 in the lower sheet device 18 performs the jacking motion to lift the glass substrate on the substrate holder 15, and the second substrate transfer mechanism II-21 located at the sixth preset position Y6 catches The glass substrate 500 directly above the conveyor belt 4 is slid to the fifth predetermined position Y5 to transport the glass substrate 500 directly above the second substrate conveyor belt II-19. The second substrate lifting mechanism II-20 first performs the jacking motion lifting to pick up the glass substrate 500 directly above the second substrate conveyor belt II-19, and then performs a falling motion to place it on the second substrate conveyor belt II- At 19, the second substrate transfer belt II-19 feeds the glass substrate 500 out of the lower sheet device 18 and feeds it to the next station.

Based on this, the fully automatic coating machine can automatically complete the upper, lower and coating work of the glass substrate, realize full automatic control, and the whole process does not require manual operation.

In some embodiments, as shown in FIG. 11, the first substrate lifting mechanism I-20 and the second substrate lifting mechanism II-20 each include a first lifting fork 50 and a lifting cylinder 40, the first The lift fork 50 includes a plurality of first plungers 25, a first plunger connecting rod 26, and a lift cylinder connecting rod 27. The plurality of first plungers 25 are fixed in parallel at equal intervals to the first plunger connecting rod 26, and the first plunger connecting rod 26 is fixedly coupled to the telescopic end 41 of the lift cylinder 40 via the lift cylinder connecting rod 27.

As shown in FIG. 11, the first substrate transfer belts I-19 are plural, and are arranged in parallel with each other at equal intervals (that is, a second slit 191 is formed between any adjacent two first substrate transfer belts I-19, first The first plunger 25 of the substrate lifting mechanism I-20 is disposed opposite to the second slit 191 between the first substrate conveying belts I-19, so that the first plunger 25 can be lifted and lowered through the adjacent first substrate. The second slit 191 between the conveyor belts I-19, that is, the width of the first plunger 25 is smaller than the second slit 191 between the first substrate conveyors I-19. As shown in Fig. 11, the second substrate conveyor belt II -19 are plural and arranged in parallel with each other at equal intervals (ie, a second slit 191 is formed between any two adjacent second substrate conveyor belts II-19), and the first of the second substrate lifting mechanism II-20 The second slit 191 between the plunger 25 and the second substrate transfer belt II-19 is disposed opposite to each other, and the first plunger 25 can be lifted and lowered through the second gap between the adjacent second substrate conveyors II-19. 191, that is, the width of the first plunger 25 is smaller than the second slit 191 between the second substrate conveyors II-19.

Thus, for the wafer apparatus 7, the first substrate lifting mechanism I-20 realizes that the glass substrate 500 is removed from the first substrate transfer belt I-19 and placed on the first substrate transfer mechanism I- 21 on. For the lower sheet device 18, the second substrate lifting mechanism II-20 realizes that the glass substrate 500 is removed from the second substrate transfer mechanism II-2 and placed on the second substrate transfer belt II-19. .

In some embodiments, as shown in FIG. 12, the first substrate transfer mechanism I-21 and the second substrate transfer mechanism II-21 each include a second lift fork 60, a telescopic cylinder 28, a slider 29, and a carriage. 30.

The carriage 30 of the first substrate transfer mechanism I-21 is slidably disposed on the first traveling rail I-23; the carriage 30 of the second substrate transfer mechanism II-21 is slidably disposed on the second traveling rail II -23.

The slider 29 is slidably disposed on the carriage 30.

The telescopic cylinder 28 is fixed to the slider 29.

The second lift fork 60 includes a plurality of second plungers 36 and a second plunger connecting rod 37; the plurality of second plungers 36 are equally spaced on the second plunger connecting rod 37; the second plunger connecting rods 37 It is fixed to the telescopic end 281 of the telescopic cylinder 28. The second lift fork 60 is fixed to the slider 29 by a telescopic cylinder 28. The second lift fork 60 is telescopically moved by the telescopic cylinder 28.

Thus, for the top sheet device 7, the first substrate transfer mechanism I-21 realizes sliding on the first traveling rail I-23, and when sliding to the second preset position Y2, the glass is extended by the stretching motion. The substrate 500 is transferred directly above the conveyor belt 4. For the lower sheet device 18, the second substrate transfer mechanism II-21 realizes an elongation movement when sliding to the sixth preset position Y6, thereby picking up the glass substrate 500 directly above the conveyor belt 4 and sliding it to the fifth pre- With the position Y5, the glass substrate 500 is transported directly above the second substrate transfer belt II-19.

In some embodiments, as shown in FIG. 12, the first travel track I-23 and the second travel track II-23 each include an upper rail 231, a middle rail 232, and a lower rail 233 that are disposed in parallel. The carriage 30 of the first substrate transfer mechanism I-21 is slidably coupled to the upper rail 231, the middle rail 232, and the lower rail 233 of the first traveling rail I-23. The carriage 30 of the second substrate transfer mechanism II-21 is slidably coupled to the upper rail 231, the middle rail 232, and the lower rail 233 of the second traveling rail II-23.

Based on this, whether it is the first traveling track I-23 or the second traveling track II-23, by setting it to include the upper rail 231, the middle rail 232, and the lower rail 233, and the carriage 30 and the upper rail 231, The middle rail 232 and the lower rail 233 are slidably connected to ensure smooth sliding of the slider 30.

In some embodiments, as shown in FIG. 12, the first substrate transfer mechanism I-21 and the second substrate transfer mechanism II-21 each further include a first servo motor 31 and a first rack 33. The first rack 33 is fixedly mounted on the middle rail 232. The first servo motor 31 is fixed to the slider 29, and the first servo motor 31 is connected with a first gear 71 (shown in Fig. 13) that meshes with the first rack 33.

By fixing the first rack 33 to the middle rail 232 and connecting the first servo motor 31 with the first gear 71 meshing with the first rack 33, the first servo motor 31 can follow the slider 29 The middle rail 232 slides in the extending direction, but does not exert a large force on the slider 29 to avoid deforming the slider 29.

In some embodiments, as shown in FIG. 12, one side of the carriage 30 has two second slide rails 34 arranged in parallel in the vertical direction, and the slider 29 is slidably mounted on the carriage by the second slide rail 34. 30 on. Based on this, when the slider 29 slides on the carriage 30 along the second slide rail 34, the second lift fork 60 can be moved up and down.

In some embodiments, as shown in FIG. 12, the first substrate transfer mechanism I-21 and the second substrate transfer mechanism II-21 each further include a second servo motor 32 and a second rack 35. The second rack 35 is disposed on the carriage 30 and disposed in parallel with the second rail 34; the second servo motor 32 is fixed on the slider 29, and the second servo motor 32 is coupled to the second rack 35. The second gear 72 (shown in Figure 14). Based on this, the second servo motor 32 can be slid in the vertical direction following the slider 29, but does not exert a large force on the slider 29 to avoid deformation of the slider 29.

In some embodiments, as shown in FIG. 15, the first substrate jacking mechanism I-22 and the second substrate jacking mechanism II-22 each include a base 38 and a plurality of telescopically movable jacks 39. The jacking cylinders 39 are fixed to the base 38, and each jacking cylinder 39 is configured to pass through the first gap 400 between the adjacent two conveyor belts 4 when telescopic, and between the adjacent two second plungers 36 gap.

Among them, the number of jacking cylinders 39 is at least three.

In some embodiments, the jacking cylinder 39 extends through the gap between the first slot 400 and the second plunger 36 between the conveyor belts 4 to effect the width of the telescoping end of the jacking glass substrate, i.e., the jacking cylinder 39. It is smaller than the first slit 400 between the adjacent two conveyor belts 4 and smaller than the gap between the adjacent two second plungers 36. Thus, for the wafer apparatus 7, the first substrate lifting mechanism I-22 removes the glass substrate 500 from the second lifting fork 60 on the first substrate transfer mechanism I-21, and places it. On the substrate holder 15 on the conveyor belt 4. For the lower sheet device 18, the second substrate lift mechanism II-22 implements a second lift fork that removes the glass substrate 500 from the substrate holder 15 and places it on the second substrate transfer mechanism II-21. 60 on.

The working principle of the automatic coating machine will be described below based on a fully automatic coating machine including the upper sheet device 7, the returning device 17, and the lower sheet device 18.

The upper sheet process is: the substrate holder 15 is transferred to the substrate holder lifting and returning device 2 at the inlet end X1 of the coating device through the substrate holder conveying device 1, and the lifting device 8 of the substrate holder lifting and returning device 2 is extended and the second time is The main body 200 is raised. When the second return main body 200 is flush with the conveyor belt 4 of the coating apparatus 3, the lifting device 8 stops elongating. At the same time, the drive motor 12 on the second return main body 200 starts to operate, and the transfer wheel 10 drives the substrate holder 15 to move, and the substrate holder 15 is sent to the conveyor belt 4. When the substrate holder 15 is moved on the conveyor belt 4 to a position directly above the first substrate lifting mechanism I-22, the conveyor belt 4 is stopped, waiting for the glass substrate 500 to be placed. After the substrate holder 15 is fed onto the conveyor belt 4, the lifting device 8 is contracted and lowered with the second return main body 200 to be in contact with the substrate holder conveying device 1.

During the transfer of the substrate holder 15, the glass substrate 500 is carried into the upper sheet device 7 through the first substrate transfer belt I-19, and reaches the first of the first substrate lifting mechanism I-20 at the glass substrate 500. The first substrate transfer belt I-19 is stopped after the lift fork 50 is positioned directly above. The lift cylinder 40 of the first substrate lifting mechanism I-20 is elongated, and the glass substrate 500 is lifted up during the rise of the first lift fork 50 under the first substrate transfer belt I-19, and rises above The position of the height of the second lift fork 60 of the first substrate transfer mechanism I-21 stops rising. The first substrate transfer mechanism I-21 moves along the first traveling track I-23 to the first preset position Y1 under the driving action of the first servo motor 31, and at this time, the first substrate transfer mechanism I-21 The two lift forks 60 are located just below the glass substrate 500. The glass substrate 500 is placed on the second lift fork 60 by contraction of the lift cylinder 40 of the first substrate lifting mechanism I-20. Then, the first lift fork 50 is driven by the contraction of the lift cylinder 40 until it is under the first substrate transfer belt I-19 to wait for the next glass substrate 500. The first substrate transfer mechanism I-21 is moved to the second preset position Y2 (position opposite to the substrate holder 15) by the driving of the first servo motor 31, and then the telescopic cylinder 28 is elongated to send the glass substrate 500. Up to the top of the substrate holder 15. The jacking cylinder 39 of the first substrate jacking mechanism I-22 located below the conveyor belt 4 extends through the substrate holder 15 and lifts up the glass substrate 500 to separate the glass substrate 500 from the second lift 60 fork. Thereafter, the telescopic cylinder 28 is contracted and returned to the initial position, the jacking cylinder 39 is contracted and lowered with the glass substrate 500, and the glass substrate 500 is dropped on the substrate holder 15. The conveyor belt 4 carries the substrate holder 15 and the glass substrate 500 together into the coating apparatus 3 to perform a coating process. After the coating process is completed, it enters the lower sheet device 18.

The unloading process is: when the substrate holder 15 moves together with the film-coated glass substrate 500 to the outlet end of the conveyor belt 4, the conveyor belt 4 stops running, and the top substrate of the second substrate lifting mechanism II-22 in the lower sheet device 18 39 elongates and lifts the film-coated glass substrate 500. The second lift fork 60 of the second substrate transfer mechanism II-21 moves under the elongation of the telescopic cylinder 28 directly below the film-coated glass substrate 500, and the lift cylinder 39 contracts to coat the filmed glass. The substrate 500 is placed on the second lift fork 60. The telescopic cylinder 28 of the second substrate transfer mechanism II-21 is contracted to return the second lift fork 60 to the original position, and the glass-coated glass substrate 500 is driven to the second by the driving of the first servo motor 31. Immediately above the substrate transfer belt II-19 (i.e., the fifth preset position Y5). The first lift fork 50 on the second substrate lift mechanism II-20 rises and picks up the film-coated glass substrate 500. Then, the second substrate transfer mechanism II-21 is operated to a position opposite to the empty substrate holder 15 (ie, the sixth preset position Y6), waiting for the next piece of the film-coated glass substrate 500, the first lifting fork The 50 drops and the film-coated glass substrate 500 is placed on the second substrate transfer belt II-19. The second substrate transfer belt II-19 feeds the film-coated glass substrate to the next station.

The conveyor belt 4 feeds the empty substrate holder 15 to the substrate holder lifting and returning device 2 at the exit end X2 of the coating apparatus in the returning device 17. The lifting device 8 of the substrate rack lifting and lowering device 2 is contracted, and the substrate rack lifting and lowering device 2 is lowered to be in contact with the substrate holder conveying device 1, and the empty substrate holder 15 is transferred to the substrate holder conveying device 1 after docking. At this point, complete a complete workflow.

The above description is only some embodiments of the present disclosure, but the present disclosure is not limited thereto. All changes which are made in accordance with the teachings of the present disclosure, or equivalents to equivalent variations, are intended to be within the scope of the present disclosure.

Claims (19)

1. A substrate rack returning device, comprising: a substrate rack conveying device (1) and a substrate rack lifting and returning device (2); wherein

   The substrate rack conveying device (1) is disposed at the bottom of the coating device (3), and the coating device inlet end (X1) and the coating device outlet end (X2) are respectively provided with one of the substrate rack lifting and returning devices (2) ;

   a substrate rack lifting and returning device (2) located at an inlet end (X1) of the coating device, configured to receive a substrate holder (15) conveyed back by the substrate holder conveying device (1), and configured to mount the substrate holder ( 15) being transferred to the conveyor belt (4) in the coating device (3);

   a substrate holder lifting and returning device (2) located at an outlet end (X2) of the coating device, configured to receive a substrate holder (15) conveyed by the conveyor belt (4), and configured to mount the substrate holder (15) Transfer to the substrate holder transport device (1).
2. The substrate holder returning device according to claim 1, wherein said substrate holder conveying device (1) comprises a first returning body (100) and a supporting leg (6); said supporting leg (6) is fixed Provided at the bottom of the first returning body (100); the first returning body (100) is configured to drive the substrate holder (15) conveyed by the conveyor belt (4) to the inlet end of the conveyor belt (401) )mobile.
3. The substrate holder returning device according to claim 2, wherein said substrate holder lifting and returning device (2) comprises a second returning body (200) and a lifting device (8); said lifting device (8) Provided at the bottom of the second return body (200);

   The second return body (200) located in the substrate rack lifting and lowering device (2) of the coating device outlet end (X2) is configured to drive the substrate holder (15) conveyed by the conveyor belt (4) Moving to the inlet end (X3) of the substrate holder transport device;

   The second return body (200) located in the substrate rack lifting and returning device (2) at the inlet end (X1) of the coating device is configured to drive the substrate transported back by the substrate carrier transfer device (1) The frame (15) is moved to the inlet end (401) of the conveyor.
4. The substrate carrier returning device according to claim 3, wherein the first returning body (100) and the second returning body (200) have the same structure, each comprising a frame body (9), a plurality of transfer wheels (10) for conveying the substrate holder (15), a plurality of rotating shafts (11) and a driving motor (12);

   A mounting groove (13) is respectively disposed on two sides of the frame body (9), and the transfer wheel (10) is disposed in each of the two mounting grooves (13), and one of the mounting slots (13) The transfer wheel (10) in the middle is connected to the transfer wheel (10) in the other of the mounting grooves (13) through the rotating shaft (11); any two adjacent rotating shafts (11) pass The belt (14) and the pulley (300) are linked;

   The drive motor (12) is fixedly mounted on the frame body (9), and an output shaft of the drive motor (12) is connected to one of the rotating shafts (11).
5. The substrate carrier returning device according to claim 4, wherein the transfer wheel (10) is a sheave;

   The substrate holder returning device further comprises a substrate holder (15); the bottom of the substrate holder (15) is provided with two flat-shaped guiding rods (16), and the two guiding rods (16) are respectively and two The sheaves in the mounting slots (13) are mated.
6. The substrate holder returning device according to claim 3, wherein said lifting device (8) is one of a hydraulic cylinder, a cylinder, and an electric push-pull rod.
7. A substrate carrier back-transfer method applied to the substrate carrier back-transfer device of claim 1 is characterized in that it comprises:

   The substrate holder lifting and returning device (2) at the inlet end (X1) of the coating device lifts the substrate holder (15) and conveys it to the conveyor belt (4). The conveyor belt (4) imports the substrate holder (15) from the coating device. The end (X1) is transferred to the outlet end (X2) of the coating device, and the substrate holder (15) is transferred to the substrate holder lifting and returning device (2) at the outlet end (X2) of the coating device and in an ascending state;

   a substrate holder lifting and returning device (2) located at the outlet end (X2) of the coating device is lowered with the substrate holder (15), and the substrate holder (15) is transferred to the substrate holder conveying device (1);

   The substrate holder conveying device (1) returns the substrate holder (15) from the bottom of the coating device (3) to the substrate holder lifting and returning device (2) at the inlet end (X1) of the coating device and is in a descending state, and completes the cycle. A return process of the substrate holder (15) is returned.
8. The substrate carrier returning method according to claim 7, wherein said said substrate holder (15) is located at said inlet end (X1) of said coating apparatus during transfer of said substrate holder (15) by said conveyor belt (4) The substrate rack lifting and returning device (2) is lowered to a third preset position;

   The third preset position is a position flush with the substrate holder transport device (1).
9. The substrate carrier returning method according to claim 7, wherein in the process of returning the substrate holder (15), the substrate holder lifting and returning device at the outlet end (X2) of the coating device (2) rising to the fourth preset position;

   The fourth preset position is a position flush with the conveyor belt (4).
10. A fully automatic coating machine, comprising a coating device (3), characterized by: further comprising a top device (7), a return device (17) and a lower device (18);

    The coating device (3) comprises a plurality of conveyor belts (4) arranged in parallel, a first gap (400) is formed between two adjacent conveyor belts (4), and each of the conveyor belts (4) runs through the same a coating device (3), and two ends of each of the conveyor belts (4) respectively protrude into the top sheet device (7) and the lower sheet device (18);

    The returning device (17) is disposed under the coating device (3), and the back transmitting device (17) is the substrate carrier returning device of claim 1; the returning device (17) The two ends are respectively located in the upper piece device (7) and the lower piece device (18);

    The top sheet device (7) is connected to the inlet end (X1) of the coating device, configured to transfer the glass substrate (500) and placed on the substrate holder (15) at the inlet end of the conveyor belt (4);

    The lower sheet device (18) is connected to the outlet end (X2) of the coating device, and is configured to transfer the glass substrate (500) on the substrate holder (15) at the outlet end of the conveyor belt (4) and feed it into the lower portion. A station.
11. The automatic coating machine according to claim 10, characterized in that said top sheet device (7) comprises a first substrate transfer belt (I-19), a first substrate lifting mechanism (I-20), a substrate transfer mechanism (I-21), a first substrate lifting mechanism (I-22) and a first traveling track (I-23);

    The first substrate transfer belt (I-19) is configured to feed the glass substrate (500) into the top sheet device (7);

    The first substrate transfer mechanism (I-21) is slidably disposed on the first traveling track (I-23); the first substrate transfer mechanism (I-21) is in the first walking The track (I-23) has a first preset position (Y1) and a second preset position (Y2), the first preset position (Y1) being located on the first substrate conveyor belt (I-19) Directly above, the second preset position (Y2) is opposite to the first substrate jacking mechanism (I-22);

    The first substrate lifting mechanism (I-20) moves up and down relative to the first substrate conveyor (I-19) in a direction perpendicular to the first substrate conveyor (I-19);

    The first substrate transfer mechanism (I-21) is configured to elongate movement when sliding to a second preset position (Y2) to transfer the glass substrate (500) directly above the conveyor belt (4);

    The first substrate lifting mechanism (I-22) is disposed below the inlet end of the conveyor belt (4).
12. A fully automatic coater according to claim 11, wherein said lower sheet device (18) comprises a second substrate transfer belt (II-19), a second substrate lifting mechanism (II-20), a two-substrate transfer mechanism (II-21), a second substrate lift mechanism (II-22), and a second travel track (II-23);

    The second substrate transfer mechanism (II-21) is slidably disposed on the second traveling track (II-23); the second substrate transfer mechanism (II-21) is in the second walking The track (II-23) has a fifth preset position (Y5) and a sixth preset position (Y6), and the fifth preset position (Y5) is located on the second substrate conveyor belt (II-19) Directly above, the sixth preset position (Y6) is opposite to the second substrate jacking mechanism (II-22);

    The second substrate transfer mechanism (II-21) is configured to elongate when sliding to the sixth preset (Y6) position;

    The second substrate lifting mechanism (II-22) is disposed below the outlet end of the conveyor belt (4);

    The second substrate lifting mechanism (II-20) is moved up and down in a direction perpendicular to the second substrate conveying belt (II-19) with respect to the second substrate conveying belt (II-19);

    The second substrate transfer belt (II-19) is configured to feed the glass substrate (500) out of the lower sheet device (18) and to the next station.
13. The fully automatic coating machine according to claim 12, wherein said first substrate lifting mechanism (I-20) and said second substrate lifting mechanism (II-20) each comprise a first lifting Lift fork (50) and lift cylinder (40);

    The first lift fork (50) includes a plurality of first plungers (25), a first plunger connecting rod (26), and a lift cylinder connecting rod (27); the plurality of first plungers (25) Equally spaced parallel to the first plunger connecting rod (26), the first plunger connecting rod (26) passing through the lift cylinder connecting rod (27) and the lifting cylinder (40) The telescopic end (41) is fixedly connected;

    The first substrate transfer belt (I-19) is plural and arranged in parallel with each other at equal intervals, and the first plunger (25) of the first substrate lifting mechanism (I-20) is configured to be raised and lowered Passing a second gap (191) between two adjacent first substrate transfer belts (I-19);

    The second substrate transfer belt (II-20) is plural and arranged in parallel with each other at equal intervals, and the first plunger (25) of the second substrate lifting mechanism (II-20) is configured to be raised and lowered A second slit (191) between the two adjacent second substrate transfer belts (II-19) is passed.
14. A fully automatic coater according to claim 12, wherein said first substrate transfer mechanism (I-21) and said second substrate transfer mechanism (II-21) each comprise a second lift fork (60), a telescopic cylinder (28), a slider (29) and a carriage (30);

    a carriage (30) of the first substrate transfer mechanism (I-21) slidably disposed on the first traveling rail (I-23); the second substrate transfer mechanism (II-21) a sliding seat (30) slidably disposed on the second traveling rail (II-23);

    The slider (29) is slidably disposed on the slider (30);

    The telescopic cylinder (28) is fixed on the slider (29);

    The second lift fork (60) includes a plurality of second plungers (36) and a second plunger connecting rod (37); the plurality of second plungers (36) are equally spaced at the second a plunger connecting rod (37); the second plunger connecting rod (37) is fixed to the telescopic end (281) of the telescopic cylinder (28).
15. A fully automatic coating machine according to claim 14, wherein said first traveling rail (I-23) and said second traveling rail (II-23) each comprise an upper rail (231) and a middle rail ( 232) and lower rail (233);

    The sliding seat (30) of the first substrate transfer mechanism (I-21) slides with the upper rail (231), the middle rail (232) and the lower rail (233) of the first traveling rail (I-23) connection;

    The sliding seat (30) of the second substrate transfer mechanism (II-21) slides with the upper rail (231), the middle rail (232) and the lower rail (233) of the second traveling rail (II-23) connection.
16. A fully automatic coating machine according to claim 15, wherein said first substrate transfer mechanism (I-21) and said second substrate transfer mechanism (II-21) each further comprise a first servo motor (31) and a first rack (33);

    The first rack (33) is fixedly mounted on the middle rail (232);

    The first servo motor (31) is fixed on the slider (29), and the first servo motor (31) is connected with a first gear (71) that meshes with the first rack (33). .
17. The automatic coating machine according to claim 16, wherein one side of the sliding seat (30) has two second sliding rails (34) arranged in parallel in the vertical direction;

    The slider (29) is slidably mounted on the carriage (30) by the second slide rail (34).
18. A fully automatic coater according to claim 17, wherein said first substrate transfer mechanism (I-21) and said second substrate transfer mechanism (II-21) each further comprise a second servo motor (32) and a second rack (35);

    The second rack (35) is disposed on the slider (30) and arranged in parallel with the second rail (34);

    The second servo motor (32) is fixed to the slider (29), and the second servo motor (32) is connected with a second gear (72) that meshes with the second rack (35). .
19. The fully automatic coater according to claim 14, wherein said first substrate lifting mechanism (I-22) and said second substrate lifting mechanism (II-22) each comprise a base (38). And a plurality of telescopically movable jacking cylinders (39) fixed to the base (38); each of the jacking cylinders (39) configured to pass through the phase during telescoping Adjacent to the first gap (400) between the two conveyor belts (4), and passing through a gap between two adjacent second rods (36).

Images