WO2019100557A1 - Part switching device and evaporation system - Google Patents

Part switching device and evaporation system Download PDF

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Publication number
WO2019100557A1
WO2019100557A1 PCT/CN2018/072067 CN2018072067W WO2019100557A1 WO 2019100557 A1 WO2019100557 A1 WO 2019100557A1 CN 2018072067 W CN2018072067 W CN 2018072067W WO 2019100557 A1 WO2019100557 A1 WO 2019100557A1
Authority
WO
WIPO (PCT)
Prior art keywords
rotating shaft
base
type
bottom plate
switching device
Prior art date
Application number
PCT/CN2018/072067
Other languages
French (fr)
Chinese (zh)
Inventor
刘扬
吴聪原
Original Assignee
深圳市华星光电半导体显示技术有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 深圳市华星光电半导体显示技术有限公司 filed Critical 深圳市华星光电半导体显示技术有限公司
Publication of WO2019100557A1 publication Critical patent/WO2019100557A1/en

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Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50Substrate holders
    • C23C14/505Substrate holders for rotation of the substrates
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation

Definitions

  • the present application relates to the field of machining technology, and in particular to a part switching device and an evaporation system.
  • the technical problem mainly solved by the present application is to provide a part switching device and an evaporation system, which can effectively increase the number of parts that can be accommodated in the part switching device, improve the use efficiency of the corresponding equipment, and thereby improve the efficiency of industrial production.
  • a technical solution adopted by the present application is to provide an evaporation system, which includes at least a coating cavity, an evaporation source, a substrate, a film thickness monitor, and the vapor deposition system further includes a part switching device.
  • the part switching device includes a base device and a base sleeve surrounding the base device;
  • the base device includes a base, a first type of rotating shaft, and a controller,
  • the base includes a bottom plate and a side wall perpendicular to the edge of the bottom plate, and the side wall is disposed
  • the first type of rotating shaft is vertically fixed to the bottom plate for driving the base to rotate when rotating;
  • the controller is connected to the first type of rotating shaft for controlling the first type of rotating shaft to rotate in a preset manner; wherein the base sleeve is set a window is provided for enabling the plurality of accommodating grooves to be sequentially aligned with the window when the first type of rotating shaft drives
  • a technical solution adopted by the present application is to provide a part switching device including a base device and a base cover surrounding the base device; wherein the base device includes a base and a rotating shaft
  • the base includes a bottom plate and a side wall perpendicular to the edge of the bottom plate.
  • the side wall is provided with a plurality of receiving grooves for accommodating the components.
  • the opening direction of the receiving groove is perpendicular to the side wall and away from the bottom plate, and the rotating shaft is vertically fixed to the bottom plate.
  • the base sleeve is provided with a window for sequentially aligning the plurality of receiving slots with the window when the rotating shaft drives the base to rotate, so as to facilitate the receiving of the slot Parts are exposed for processing or other operations.
  • a part switching device including a plurality of base devices and a base cover surrounding the plurality of base devices; wherein each base
  • the seat device comprises: a base, comprising a bottom plate and a side wall perpendicular to the edge of the bottom plate; the side wall is provided with a plurality of receiving grooves for accommodating the components, the opening direction of the receiving groove is perpendicular to the side wall and away from the bottom plate;
  • a type of rotating shaft is vertically fixed to the bottom plate for driving the base to rotate when rotating;
  • the first type of rotating shaft of each base device is vertically fixed on a second type of rotating shaft to drive when the second type of rotating shaft rotates
  • the plurality of bases rotate around the second type of rotating shaft; wherein the base sleeve is provided with a window for sequentially aligning the plurality of receiving slots when the first type of rotating shaft and the second type of rotating shaft drive the base to rotate It is convenient for the parts in the receiving groove to be exposed for processing or other
  • the beneficial effects of the present application are: different from the prior art, the present application discloses a part switching device and an evaporation system.
  • the part switching device comprises a base device and a base sleeve surrounding the base device; wherein the base device comprises a base and a rotating shaft, the base comprises a bottom plate and a side wall perpendicular to the edge of the bottom plate, and the side wall is provided with a plurality of In the accommodating groove of the accommodating part, the opening direction of the accommodating groove is perpendicular to the side wall and away from the bottom plate, and the rotating shaft is vertically fixed to the bottom plate for rotating the pedestal when rotating; wherein the pedestal sleeve is provided with a window for When the rotating shaft drives the base to rotate, the plurality of receiving grooves can be sequentially aligned with the window, so that the parts in the receiving groove are exposed for processing or other operations.
  • the accommodating groove on the side wall of the pedestal in the case of the same size of the bottom surface of the pedestal, more accommodating grooves can be provided, and the multiple pedestal devices can be multiplied by multiple times.
  • the number of parts that can be accommodated by the part switching device is increased, the frequency of replacement of parts is effectively reduced, the use efficiency of the corresponding equipment is improved, and the efficiency of industrial production is improved.
  • Figure 1 is a front elevational view of a conventional part switching device
  • FIG. 2 is a schematic plan view of a conventional part switching device
  • FIG. 3 is a side view showing an embodiment of a part switching device provided by the present application.
  • FIG. 4 is a front elevational view showing an embodiment of a part switching device provided by the present application.
  • Figure 5 is a front elevational view showing another embodiment of the part switching device provided by the present application.
  • FIG. 6 is a top plan view of another embodiment of the part switching device provided by the present application.
  • FIG. 7 is a top plan view of still another embodiment of the part switching device provided by the present application.
  • FIG. 8 is a schematic diagram of an embodiment of a coating system provided by the present application.
  • first”, “second”, and “third” in the embodiments of the present invention are used for descriptive purposes only, and are not to be construed as indicating or implying a relative importance or implicitly indicating the number of technical features indicated.
  • features defining “first”, “second”, and “third” may include at least one of the features, either explicitly or implicitly.
  • the meaning of “a plurality” is at least two, such as two, three, etc., unless specifically defined otherwise.
  • the terms “comprises” and “comprising” and “comprising” are intended to cover a non-exclusive inclusion. For example, a process, method, system, product, or device that comprises a series of steps or units is not limited to the listed steps or units, but optionally also includes steps or units not listed, or alternatively Other steps or units inherent to these processes, methods, products or equipment.
  • references to "an embodiment” herein mean that a particular feature, structure, or characteristic described in connection with the embodiments can be included in at least one embodiment of the invention.
  • the appearances of the phrases in various places in the specification are not necessarily referring to the same embodiments, and are not exclusive or alternative embodiments that are mutually exclusive. Those skilled in the art will understand and implicitly understand that the embodiments described herein can be combined with other embodiments.
  • FIG. 1 and FIG. 2 Please also refer to FIG. 1 and FIG. 2 for a schematic diagram of a conventional part switching device.
  • the mechanical device 10 is composed of a disk-shaped base 11, a rotating shaft 12, and a base cover 13.
  • a plurality of accommodating grooves 111 are provided at equidistant and evenly distributed positions from the center of the susceptor 11 for placing quartz crystal oscillator pieces.
  • the bottom of the pedestal sleeve 13 has an opening 131 which can be concentric with any accommodating groove 111 in use.
  • the quartz crystal oscillator piece is switched by the rotating shaft 12 to face the opening 131, and only one crystal piece is at the position of the opening 131 at the same time.
  • quartz crystal plate base has 12 crystal oscillators. After 12 crystal oscillators are used, it is necessary to stop the use of the device and replace the crystal oscillator. Quartz crystal oscillators are usually used in high vacuum environments. The frequency of replacing quartz crystal oscillators will affect the efficiency of the equipment and affect the efficiency of industrial production.
  • FIG. 3 and FIG. 4 are schematic diagrams showing a left side view and a front view of an embodiment of the part switching device provided by the present application.
  • the part switching device 20 includes a base device 21 and a base cover 22 that surrounds the base device 21.
  • the base device 21 includes a base 211 and a rotating shaft 212.
  • the base 211 includes a bottom plate 211a and a side wall 211b perpendicular to the edge of the bottom plate 211a.
  • the side wall 211b is provided with a plurality of receiving grooves 211c for accommodating the components, and the opening direction of the receiving groove 211c is perpendicular to the side wall 211b. And away from the bottom plate 211a.
  • the bottom plate 211a may be configured as a circular bottom plate, a regular polygonal bottom plate, or a bottom plate of other shapes.
  • the side wall 211b is perpendicular to the edge of the bottom plate 211a. It can be understood that the edge of the side wall 211b is perpendicular to the edge of the bottom plate 211a or the middle portion of the side wall 211b is perpendicular to the edge of the bottom plate 211a, and the middle portion of the side wall 211b is perpendicularly connected to the edge of the bottom plate 211a.
  • the wall 211b extends toward both sides of the bottom plate 211a so that the side view assumes a "T" shape.
  • the combination of the side wall 211b and the bottom plate 211a is various and is not limited herein.
  • the base 211 has a "dish dish” shape in which the circular bottom plate 211a is added with the vertical side wall 211b, that is, the side wall 211b is vertically disposed along the circumferential edge of the bottom plate 211a and extends toward one side surface of the bottom plate 211a.
  • the circular bottom plate 211a of the base 211 is a solid planar circular bottom plate. In other embodiments, it may also be arranged in a grid-like circular bottom plate, that is, the inner side of the bottom plate 211a (facing the side wall 211b side).
  • the circular flat plate has a grid-like support structure on the outer side of the bottom plate 211a. This is applicable to the large-diameter base. Under the premise of ensuring the rigidity of the large-diameter base, the thickness of the circular bottom plate 211a and the material cost can be reduced. .
  • the accommodating groove 211c is formed on the side wall 211b.
  • the accommodating groove 211c does not penetrate the side wall 211b, and then a small through hole is inserted into the accommodating groove 211c to penetrate the side wall 211b.
  • the groove 211c is concentric, and the convex portion formed by the through hole and the receiving groove 211c is just enough to block the part from slipping out of the base 211.
  • the depth of the accommodating groove 211c can accommodate the parts or accommodate most of the parts to meet the work requirements.
  • the thickness of the side wall 211b needs to satisfy the rigidity requirement under the above conditions, or increase the thickness as needed, or provide reinforcing ribs on the side wall 211b.
  • the number of the accommodating grooves 211c is appropriately set, and the plurality of accommodating grooves 211c are uniformly distributed on the side wall 211b, so as to be integrated. Maximize benefits.
  • the rotating shaft 212 is fixed to the center of the bottom plate 211a. If the bottom plate has a circular shape in other embodiments, the rotating shaft 212 is fixed at the center of the bottom plate 211a.
  • the connection mode of the rotating shaft 212 and the base 211 can be detachable or non-detachable. In this embodiment it is a detachable connection, such as a threaded connection, and in other embodiments a non-detachable connection, such as welding, may be used.
  • the detachable connection facilitates the replacement of the base 211 and the components.
  • the center of the circular bottom plate 211a is provided with a threaded hole, and one end of the rotating shaft 212 connected to the base 211 is provided with a thread matched with the threaded hole. After they are connected, tighten them with nuts to prevent loosening.
  • the rotating shaft 212 is disposed inside the bottom plate 211a, that is, the rotating shaft 212 and the side wall 211b are located on the same side of the bottom plate 211a.
  • the rotating shaft 212 may be disposed on the outer side of the bottom plate 211a, and the parts can be easily replaced without removing the base 211.
  • the rotating shaft 212 can be set as a solid shaft or a hollow shaft according to the weight of the base 211, the length of the rotating shaft 212, and the diameter of the base 211.
  • the rotating shaft 212 is a solid shaft.
  • the base cover 22 encloses at least the base 211, and has a size and shape suitable for the size and shape of the base 211, and a window 221 is disposed on a side of the base cover 22 opposite to the side wall 211b.
  • a plurality of windows 221 may also be provided to increase the processing efficiency of the part.
  • the shape, the size and the position of the window 221 correspond to the accommodating groove 211c, that is, when the rotating shaft 212 rotates the base 211, the plurality of accommodating grooves 211c can be sequentially aligned with the window 221 to facilitate the accommodating groove 211c.
  • the parts are exposed for processing or other operations. It should be emphasized that only one part is in the window 221 at the same time in this embodiment.
  • the base sleeve 22 is of a detachable structure and is fixed to the part switching device 20, that is, the spatial position of the window 221 is fixed.
  • the pedestal sleeve 22 is detachable from the outer side of the circular bottom plate 211a, and is screwed to another portion of the pedestal sleeve 22.
  • the part switching device 20 further includes a controller (not shown).
  • the controller is coupled to the rotating shaft 212 for controlling the rotating shaft 212 to rotate in a preset manner.
  • the rotating shaft 212 is driven by a servo motor.
  • the controller controls the servo motor by a program to cause the base 211 to rotate the switching part to the window 221 as needed. Specifically, after detecting that the part is processed, the controller controls the rotating shaft 212 to rotate by a certain angle, so that the part at the window 221 on the base 211 is staggered from the window 221 to prevent the processed part from being over-processed, or in detecting the window 221 There is no part to be processed, the control shaft 212 is rotated by a certain angle, and the part to be processed is rotated to the window 221 for processing.
  • the vapor deposition apparatus simultaneously coats the substrate and the quartz crystal oscillator, and the evaporation material is deposited on the substrate and also deposited on the crystal oscillator. Therefore, the substrate can be monitored by the thickness/rate of the deposited film on the quartz crystal oscillator. The thickness/rate of the deposited film on the material. The monitor collects the film thickness information through the quartz crystal oscillator. This is because the change of the film thickness of the material deposited on the quartz crystal oscillator is proportional to the change value of the vibration frequency of the quartz crystal oscillator.
  • the thickness/rate of the deposited film on the quartz crystal plate is obtained, thereby monitoring the thickness/rate of the deposited film on the substrate, and the quartz crystal plate is placed in the part switching device 20.
  • the quartz crystal oscillator has two faces, a working surface and an electrode contact surface, and the quartz crystal oscillator is placed in the accommodating groove 211c, and the working surface faces the direction in which the coating material adheres (ie, the side facing the susceptor sleeve 22).
  • the electrode surface is electrically connected to the monitor, so that the quartz crystal oscillator piece is fixed and fixed in the base 211, and then the base 211 is packaged by the base sleeve 22 to prevent the quartz crystal oscillator piece in the non-working position from being coated.
  • the controller controls the servo motor to rotate the rotating shaft 212 to make a quartz crystal oscillator plate at the window 221, and the coating device starts to simultaneously coat the substrate and the quartz crystal oscillator plate; if the window is detected; At 221, there is a quartz crystal oscillator, and the coating equipment starts to coat the substrate and the quartz crystal oscillator simultaneously.
  • the monitor monitors the change value of the vibration frequency of the quartz crystal oscillator. When the variation value of the vibration frequency of the quartz crystal oscillator reaches the first threshold value, it indicates that the film thickness of the substrate reaches the requirement, the coating is stopped, and the next substrate to be coated is replaced.
  • the quartz crystal oscillator is indicated.
  • the blade reaches the end of its life, and the controller controls the rotation of the shaft 212 to rotate another unused quartz crystal piece to the window 221 on the base cover 22. In this way, after all the quartz crystal oscillators have reached the service life, the quartz crystal oscillator pieces are replaced.
  • the beneficial effects of the present application are: Different from the prior art, the present application discloses a part switching device.
  • the part switching device comprises a base device and a base sleeve surrounding the base device; wherein the base device comprises a base and a rotating shaft, the base comprises a bottom plate and a side wall perpendicular to the edge of the bottom plate, and the side wall is provided with a plurality of In the accommodating groove of the accommodating part, the window direction of the accommodating groove is perpendicular to the side wall and away from the bottom plate, and the rotating shaft is vertically fixed to the bottom plate for rotating the pedestal when rotating; wherein the pedestal sleeve is provided with a window for When the rotating shaft drives the base to rotate, the plurality of receiving grooves can be sequentially aligned with the window, so that the parts in the receiving groove are exposed for processing or other operations.
  • the accommodating groove is disposed on the side wall of the base, and in the case of the same size of the bottom surface of the base, more accommodating grooves can be provided, which increases the number of parts that the component switching device can accommodate, and effectively reduces the number of parts.
  • the frequency of replacement of parts increases the efficiency of use of the corresponding equipment, thereby increasing the efficiency of industrial production.
  • FIG. 5 and FIG. 6 simultaneously, a front view and a top view of another embodiment of the part switching device provided by the present application.
  • the part switching device 30 includes three base units (32, 33, 34) and a base sleeve 35 surrounding the three base units (32, 33, 34).
  • Each of the base units (32/33/34) includes a base (321/331/341), a first type of shaft (322/332/342), and each base unit (32/33)
  • the first type of shafts (322/332/342) of /34) are vertically fixed to a second type of rotating shaft 31 to drive a plurality of bases (32, 33, 34) around when the second type of rotating shaft 31 rotates.
  • the second type of shaft 31 rotates.
  • the base sleeve 35 has a window 351 thereon.
  • a plurality of windows 351 may be disposed on the base sleeve 35 to increase the processing efficiency of the parts.
  • the base unit (32, 33, 34) is a base unit as described in the above embodiment.
  • the rotating shaft and the base sleeve described in the previous embodiment are applicable to the first type of rotating shafts (322, 332, 342) and the base sleeve 35 of the present embodiment, and are not described herein.
  • a plurality of base devices means that the number of base devices is greater than one.
  • the number of pedestals is three. In other embodiments, the number of pedestals may be two, four, five, etc., which is not limited in this application.
  • the plurality of pedestals are equidistant from the second type of rotating shaft and are evenly distributed in the same spatial range around the second type of rotating shaft, that is, the plurality of first type of rotating shafts (322, 332, 342) surround the second type of rotating shaft 31 in this embodiment. Evenly distributed.
  • the first type of rotating shafts (322, 332, 342) are inner jacket layers.
  • the outer layer is connected to the second type of rotating shaft 31, and the inner layer is rotatable by a motor.
  • the outer layer of the first type of rotating shafts (322, 332, 342) is fixed relative to the second type of rotating shaft 31, so that the second type of rotating shaft 31 can rotate and switch the respective bases (321, 331, 341) to the window 351.
  • the inner shaft of the first type of rotating shafts (322, 332, 342) is rotated relative to the window 351 according to the rotation of the accommodating grooves (321a, 331a, 341a).
  • the outer layer of the first type of rotating shafts (322, 332, 342) is detachably connected to the second type of rotating shaft 31, and is fixed to the second type of rotating shaft 31 by a connecting member, and the first type of rotating shafts (322, 332, 342)
  • the inner jacket layer is relatively rotatable and axially non-displaceable.
  • the second type of rotating shaft 31 is perpendicular to the plane formed by the rotating shafts (33, 35, 37), and the switching base (32, 34, 36) is driven at the window 351 by the servo motor.
  • the part switching device 30 further includes a controller (not shown).
  • the controller connects a plurality of first type of rotating shafts (322, 332, 342) and a second type of rotating shaft 31 for controlling the first type of rotating shafts (322, 332, 342) and the second type of rotating shafts 31 to rotate in a preset manner.
  • the second type of rotating shaft 31 and the first type of rotating shafts (322, 332, 342) are each provided with an independent servo motor and electrically connected to the controller.
  • the controller controls each servo motor through the program, so that the base (321, 331, 341) rotates the parts to the window 351 as needed.
  • the controller controls the first type of rotating shafts (322, 332, 342) to rotate by a certain angle, so that the parts at the window 351 on the base (321, 331, 341) are staggered from the window 351.
  • the first type of rotating shafts (322, 332, 342) to rotate by a certain angle, and rotate the parts to be processed to the window 351 for processing.
  • the second type of rotating shaft 31 is controlled to rotate at an angle to rotate the other base (331 or 341 or 321) to the window 351.
  • the coating thickness control in the field of the film industry is still taken as an example.
  • the controller detects whether there is a pedestal (321, 331, 341) at the window 351. If there is no pedestal (321, 331, 341), the controller controls the servo motor to drive the second type of rotating shaft 31 to rotate, so that a pedestal (321 or 331 or 341) is located at the position of the window 351, and the controller re-detects whether there is a quartz crystal oscillator plate at the window 351. If so, the coating device starts coating the substrate and the quartz crystal oscillator simultaneously.
  • the controller controls the first type of rotating shaft ( Rotating 322 or 332 or 342) so that a quartz crystal oscillator is at the window 351, and the coating device starts to simultaneously coat the substrate with the quartz crystal oscillator; if the base 321 (321 or 331 or 341) is detected at the window 351, the same After processing, a quartz crystal oscillator is placed at the window 351, and the coating device starts coating the substrate and the quartz crystal oscillator simultaneously.
  • the monitor monitors the change value of the vibration frequency of the quartz crystal oscillator. When the variation value of the vibration frequency of the quartz crystal oscillator reaches the first threshold value, it indicates that the film thickness of the substrate reaches the requirement, the coating is stopped, and the next substrate to be coated is replaced.
  • the quartz crystal oscillator is indicated.
  • the controller controls the rotation of the first type of shaft (322 or 332 or 342) to rotate another quartz crystal oscillator to be processed to the window 351 on the base sleeve 35.
  • the controller controls the second type of rotating shaft 31 to rotate, and rotates the other base (321 or 331 or 341) to the window 351. In this way, all the quartz crystal oscillator pieces on the part switching device 30 reach the service life, and the quartz crystal oscillator piece is replaced.
  • a plurality of part switching devices 30 can be circumferentially mounted on a turntable device 37.
  • the controller is also used to control the turntable device 37 to rotate a certain angle to place the other part switching device 30 at the working position after the parts in the part switching device 30 have been processed.
  • the beneficial effects of the present application are: Different from the prior art, the present application discloses a part switching device.
  • the part switching device comprises a plurality of base devices and a base sleeve surrounding the plurality of base devices; wherein each base device comprises: a base comprising a bottom plate and side walls perpendicular to the edge of the bottom plate, the side walls are arranged There are a plurality of accommodating grooves for accommodating the parts, and the window direction of the accommodating groove is perpendicular to the side wall and away from the bottom plate; the first type of rotating shaft is vertically fixed to the bottom plate for driving the base to rotate when rotating; each base The first type of rotating shaft of the seat device is vertically fixed on a second type of rotating shaft to drive the plurality of bases to rotate around the second type of rotating shaft when the second type of rotating shaft rotates; wherein the base sleeve is provided with a window for When the first type of rotating shaft and the second type of rotating shaft drive the base to rotate, the plurality of receiving grooves can be sequentially align
  • the accommodating groove on the side wall of the pedestal in the case of the same size of the bottom surface of the pedestal, more accommodating grooves can be provided, and the multiple pedestal devices can be multiplied by multiple times.
  • the number of parts that can be accommodated by the part switching device is increased, the frequency of replacement of parts is effectively reduced, the use efficiency of the corresponding equipment is improved, and the efficiency of industrial production is improved.
  • FIG. 8 a schematic diagram of an embodiment of an evaporation system provided by the present application.
  • the vapor deposition system includes at least a vapor deposition chamber 41, an evaporation source 42, a substrate 43, a crystal plate base device 44, and a film thickness monitor 45 connected thereto.
  • the crystal plate base device 44 of the present embodiment adopts the component switching device described in the foregoing embodiment, and the corresponding component is a crystal oscillator piece, and the crystal oscillator base device is different from the prior art crystal plate base device. 44 is used to switch the crystal oscillator when needed.
  • the evaporation material is evaporated from the evaporation source 42, deposited on the substrate 43 (target deposition substrate) and the crystal oscillator to form a desired film, and the film thickness on the substrate 43 has a certain relationship with the film thickness on the crystal plate.
  • the film thickness monitor 45 monitors the film thickness on the substrate 43 by the film thickness on the crystal plate. When the film thickness on the crystal oscillator sheet accumulates to a certain extent, the crystal oscillator piece can no longer be used, that is, the life of the crystal oscillator plate is reached, and at this time, the crystal oscillator piece base device 44 can be switched to the next crystal oscillator piece, and all the crystal oscillator pieces in the pedestal are reached.
  • the vapor deposition chamber 41 is opened to replace all the crystal oscillator pieces. Since the crystal plate base device 44 in the form of the above-described part switching device is used in the present embodiment, the number of crystal oscillator pieces is multiplied as compared with the prior art, and the frequency of opening the cavity replacement crystal piece is doubled, thereby improving production efficiency.

Abstract

Disclosed is a part switching device (20) and an evaporation system. The part switching device (20) includes a base device (21) and a base sleeve (22) surrounding the base device (21), in which the base device (21) comprises a base (211) and a rotating shaft (212). A plurality of receiving grooves (211c) for accommodating parts is disposed on a base sidewall (211b). The rotating shaft (212) is vertically fixed to the base plate (211a) and is for rotating the base (211) when rotating. The base sleeve (22) is provided with a window (221). Each receiving groove (211c) is sequentially aligned with the window (221) when the base (211) is rotated along with the rotating shaft (212), such that the parts in the receiving grooves (211c) are exposed for processing or other operations. The method can effectively increase the number of parts that can be accommodated in the part switching device (20) and the use efficiency of the corresponding equipment, thereby increasing the efficiency of industrial production.

Description

零件切换装置以及蒸镀系统 Part switching device and evaporation system
【技术领域】[Technical Field]
本申请涉及机械加工技术领域,特别是涉及零件切换装置以及蒸镀系统。The present application relates to the field of machining technology, and in particular to a part switching device and an evaporation system.
【背景技术】 【Background technique】
随着工业技术以及机械技术的发展,工业生产或零件加工大多都是机械化的流水线操作。在流水线的操作过程中,加工的机械装置一般是不动的,而是采用一种零件传送装置来传输待加工的零件,使每个零件一个一个的传送到机械装置以进行加工。With the development of industrial technology and mechanical technology, industrial production or part processing are mostly mechanized pipeline operations. During the operation of the pipeline, the machined machinery is generally stationary, but a part transfer device is used to transport the parts to be machined, and each part is transferred one by one to the machine for processing.
【发明内容】 [Summary of the Invention]
本申请主要解决的技术问题是提供零件切换装置及一种蒸镀系统,能够有效增加零件切换装置中可容置零件的数量,提高相应设备的使用效率,进而提高工业生产的效率。The technical problem mainly solved by the present application is to provide a part switching device and an evaporation system, which can effectively increase the number of parts that can be accommodated in the part switching device, improve the use efficiency of the corresponding equipment, and thereby improve the efficiency of industrial production.
为解决上述技术问题,本申请采用的一个技术方案是:提供一种蒸镀系统,该蒸镀系统至少包括镀膜腔体、蒸发源、基板、膜厚监控仪,蒸镀系统还包括零件切换装置,零件切换装置包括基座装置以及包围基座装置的基座套;基座装置包括基座、第一类转轴、控制器,基座包括底板以及垂直于底板边缘的侧壁,侧壁上设置有多个用于容置零件的容置槽,容置槽的开口方向垂直于侧壁且远离底板;其中,底板为圆形,侧壁沿底板的圆周边缘垂直设置,并朝底板的一侧面延伸;第一类转轴垂直固定于底板,用于在转动时带动基座转动;控制器连接第一类转轴,用于控制第一类转轴以预设方式进行转动;其中,基座套上设置有一窗口,用于在第一类转轴带动基座转动时,使多个容置槽能依次对准窗口,便于容置槽中的零件露出以进行加工或其他操作;零件切换装置中容置的零件为晶振片,零件切换装置用于在需要时进行晶振片的切换。In order to solve the above technical problem, a technical solution adopted by the present application is to provide an evaporation system, which includes at least a coating cavity, an evaporation source, a substrate, a film thickness monitor, and the vapor deposition system further includes a part switching device. The part switching device includes a base device and a base sleeve surrounding the base device; the base device includes a base, a first type of rotating shaft, and a controller, the base includes a bottom plate and a side wall perpendicular to the edge of the bottom plate, and the side wall is disposed There are a plurality of accommodating grooves for accommodating the parts, and the opening direction of the accommodating grooves is perpendicular to the side walls and away from the bottom plate; wherein the bottom plate is circular, the side walls are vertically disposed along the circumferential edge of the bottom plate, and face one side of the bottom plate The first type of rotating shaft is vertically fixed to the bottom plate for driving the base to rotate when rotating; the controller is connected to the first type of rotating shaft for controlling the first type of rotating shaft to rotate in a preset manner; wherein the base sleeve is set a window is provided for enabling the plurality of accommodating grooves to be sequentially aligned with the window when the first type of rotating shaft drives the base to rotate, so that the parts in the receiving groove are exposed for processing or other operations; Part switching device is housed crystal film, switching means for switching components crystal film when required.
为解决上述技术问题,本申请采用的一个技术方案是:提供一种零件切换装置,该零件切换装置包括基座装置以及包围基座装置的基座套;其中,基座装置包括基座及转轴,基座包括底板以及垂直于底板边缘的侧壁,侧壁上设置有多个用于容置零件的容置槽,容置槽的开口方向垂直于侧壁且远离底板,转轴垂直固定于底板,用于在转动时带动基座转动;其中,基座套上设置有一窗口,用于在转轴带动基座转动时,使多个容置槽能依次对准该窗口,便于容置槽中的零件露出以进行加工或其他操作。In order to solve the above technical problem, a technical solution adopted by the present application is to provide a part switching device including a base device and a base cover surrounding the base device; wherein the base device includes a base and a rotating shaft The base includes a bottom plate and a side wall perpendicular to the edge of the bottom plate. The side wall is provided with a plurality of receiving grooves for accommodating the components. The opening direction of the receiving groove is perpendicular to the side wall and away from the bottom plate, and the rotating shaft is vertically fixed to the bottom plate. For rotating the base during rotation; wherein the base sleeve is provided with a window for sequentially aligning the plurality of receiving slots with the window when the rotating shaft drives the base to rotate, so as to facilitate the receiving of the slot Parts are exposed for processing or other operations.
为解决上述技术问题,本申请采用的另一个技术方案是:提供一种零件切换装置,该零件切换装置包括多个基座装置以及包围多个基座装置的基座套;其中,每个基座装置包括:基座,包括底板以及垂直于底板边缘的侧壁,侧壁上设置有多个用于容置零件的容置槽,容置槽的开口方向垂直于侧壁且远离底板;第一类转轴,垂直固定于底板,用于在转动时带动基座转动;每个基座装置的第一类转轴垂直固定在一第二类转轴上,以在第二类类转轴转动时,带动多个基座绕第二类转轴转动;其中,基座套上设置有一窗口,用于在第一类转轴及第二类转轴带动基座转动时,使多个容置槽能依次对准窗口,便于容置槽中的零件露出以进行加工或其他操作。In order to solve the above technical problem, another technical solution adopted by the present application is to provide a part switching device including a plurality of base devices and a base cover surrounding the plurality of base devices; wherein each base The seat device comprises: a base, comprising a bottom plate and a side wall perpendicular to the edge of the bottom plate; the side wall is provided with a plurality of receiving grooves for accommodating the components, the opening direction of the receiving groove is perpendicular to the side wall and away from the bottom plate; A type of rotating shaft is vertically fixed to the bottom plate for driving the base to rotate when rotating; the first type of rotating shaft of each base device is vertically fixed on a second type of rotating shaft to drive when the second type of rotating shaft rotates The plurality of bases rotate around the second type of rotating shaft; wherein the base sleeve is provided with a window for sequentially aligning the plurality of receiving slots when the first type of rotating shaft and the second type of rotating shaft drive the base to rotate It is convenient for the parts in the receiving groove to be exposed for processing or other operations.
本申请的有益效果是:区别于现有技术的情况,本申请公开了零件切换装置以及蒸镀系统。该零件切换装置包括基座装置以及包围基座装置的基座套;其中,基座装置包括基座及转轴,基座包括底板以及垂直于底板边缘的侧壁,侧壁上设置有多个用于容置零件的容置槽,容置槽的开口方向垂直于侧壁且远离底板,转轴垂直固定于底板,用于在转动时带动基座转动;其中,基座套上设置有一窗口,用于在转轴带动基座转动时,使多个容置槽能依次对准该窗口,便于容置槽中的零件露出以进行加工或其他操作。本申请通过将容置槽设置在基座的侧壁上,在基座底面同等大小的情况下,可设置更多的容置槽数量,以及通过将多个基座装置组合起来,成倍地增加了零件切换装置可容置零件的数目,有效降低零件的更换频率,提高了相应设备的使用效率,进而提高了工业生产的效率。The beneficial effects of the present application are: different from the prior art, the present application discloses a part switching device and an evaporation system. The part switching device comprises a base device and a base sleeve surrounding the base device; wherein the base device comprises a base and a rotating shaft, the base comprises a bottom plate and a side wall perpendicular to the edge of the bottom plate, and the side wall is provided with a plurality of In the accommodating groove of the accommodating part, the opening direction of the accommodating groove is perpendicular to the side wall and away from the bottom plate, and the rotating shaft is vertically fixed to the bottom plate for rotating the pedestal when rotating; wherein the pedestal sleeve is provided with a window for When the rotating shaft drives the base to rotate, the plurality of receiving grooves can be sequentially aligned with the window, so that the parts in the receiving groove are exposed for processing or other operations. In the present application, by arranging the accommodating groove on the side wall of the pedestal, in the case of the same size of the bottom surface of the pedestal, more accommodating grooves can be provided, and the multiple pedestal devices can be multiplied by multiple times. The number of parts that can be accommodated by the part switching device is increased, the frequency of replacement of parts is effectively reduced, the use efficiency of the corresponding equipment is improved, and the efficiency of industrial production is improved.
【附图说明】 [Description of the Drawings]
为了更清楚地说明本发明实施例或现有技术中的技术方案,下面将对实施例或现有技术描述中所需要使用的附图作简单地介绍,显而易见地,下面描述中的附图仅仅是本发明的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其他的附图。In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the embodiments or the description of the prior art will be briefly described below. Obviously, the drawings in the following description are only It is a certain embodiment of the present invention, and other drawings can be obtained from those skilled in the art without any creative work.
图1是现有的零件切换装置的主视示意图;Figure 1 is a front elevational view of a conventional part switching device;
图2是现有的零件切换装置的俯视示意图;2 is a schematic plan view of a conventional part switching device;
图3是本申请提供的零件切换装置一实施例的侧视示意图;3 is a side view showing an embodiment of a part switching device provided by the present application;
图4是本申请提供的零件切换装置一实施例的主视示意图;4 is a front elevational view showing an embodiment of a part switching device provided by the present application;
图5是本申请提供的零件切换装置另一实施例的主视示意图;Figure 5 is a front elevational view showing another embodiment of the part switching device provided by the present application;
图6是本申请提供的零件切换装置另一实施例的俯视示意图;6 is a top plan view of another embodiment of the part switching device provided by the present application;
图7是本申请提供的零件切换装置又一实施例的俯视示意图;7 is a top plan view of still another embodiment of the part switching device provided by the present application;
图8是本申请提供的镀膜系统一实施例的示意图。FIG. 8 is a schematic diagram of an embodiment of a coating system provided by the present application.
【具体实施方式】【Detailed ways】
下面将结合本发明实施例中的附图,对本发明实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例仅是本发明的一部分实施例,而不是全部的实施例。基于本发明中的实施例,本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例,都属于本发明保护的范围。The technical solutions in the embodiments of the present invention are clearly and completely described in the following with reference to the accompanying drawings in the embodiments of the present invention. It is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments obtained by those skilled in the art based on the embodiments of the present invention without creative efforts are within the scope of the present invention.
本发明实施例中的术语“第一”、“第二”、“第三”仅用于描述目的,而不能理解为指示或暗示相对重要性或者隐含指明所指示的技术特征的数量。由此,限定有“第一”、“第二”、“第三”的特征可以明示或者隐含地包括至少一个该特征。本发明的描述中,“多个”的含义是至少两个,例如两个,三个等,除非另有明确具体的限定。此外,术语“包括”和“具有”以及它们任何变形,意图在于覆盖不排他的包含。例如包含了一系列步骤或单元的过程、方法、系统、产品或设备没有限定于已列出的步骤或单元,而是可选地还包括没有列出的步骤或单元,或可选地还包括对于这些过程、方法、产品或设备固有的其它步骤或单元。The terms "first", "second", and "third" in the embodiments of the present invention are used for descriptive purposes only, and are not to be construed as indicating or implying a relative importance or implicitly indicating the number of technical features indicated. Thus, features defining "first", "second", and "third" may include at least one of the features, either explicitly or implicitly. In the description of the present invention, the meaning of "a plurality" is at least two, such as two, three, etc., unless specifically defined otherwise. Furthermore, the terms "comprises" and "comprising" and "comprising" are intended to cover a non-exclusive inclusion. For example, a process, method, system, product, or device that comprises a series of steps or units is not limited to the listed steps or units, but optionally also includes steps or units not listed, or alternatively Other steps or units inherent to these processes, methods, products or equipment.
在本文中提及“实施例”意味着,结合实施例描述的特定特征、结构或特性可以包含在本发明的至少一个实施例中。在说明书中的各个位置出现该短语并不一定均是指相同的实施例,也不是与其它实施例互斥的独立的或备选的实施例。本领域技术人员显式地和隐式地理解的是,本文所描述的实施例可以与其它实施例相结合。References to "an embodiment" herein mean that a particular feature, structure, or characteristic described in connection with the embodiments can be included in at least one embodiment of the invention. The appearances of the phrases in various places in the specification are not necessarily referring to the same embodiments, and are not exclusive or alternative embodiments that are mutually exclusive. Those skilled in the art will understand and implicitly understand that the embodiments described herein can be combined with other embodiments.
请同时参阅图1、图2,现有的零件切换装置的示意图。Please also refer to FIG. 1 and FIG. 2 for a schematic diagram of a conventional part switching device.
图1、图2为一常见的可放置多个石英晶振片的机械装置的主视图与俯视图,该机械装置10由圆盘状基座11、转轴12、基座套13构成。1 and 2 are a front view and a plan view of a conventional mechanical device in which a plurality of quartz crystal oscillation plates are placed. The mechanical device 10 is composed of a disk-shaped base 11, a rotating shaft 12, and a base cover 13.
在基座11的圆盘状平面上,距圆心等距离且均匀分布的位置处有多个容置槽111,用来放置石英晶振片。基座套13的底部有一开口131,使用中可与任一容置槽111同轴心。通过转轴12可切换石英晶振片与该开口131相对,且同一时间仅有一个晶振片处于该开口131位置。On the disc-shaped plane of the susceptor 11, a plurality of accommodating grooves 111 are provided at equidistant and evenly distributed positions from the center of the susceptor 11 for placing quartz crystal oscillator pieces. The bottom of the pedestal sleeve 13 has an opening 131 which can be concentric with any accommodating groove 111 in use. The quartz crystal oscillator piece is switched by the rotating shaft 12 to face the opening 131, and only one crystal piece is at the position of the opening 131 at the same time.
现有市售最大的石英晶振片基座规格为12颗晶振片,即用完12颗晶振片后就需要停止设备的使用并进行更换晶振片的操作。而石英晶振片通常都是在高真空的环境下使用的,则更换石英晶振片的频率就会影响到设备的使用效率,进而影响工业生产的效率。The largest commercially available quartz crystal plate base has 12 crystal oscillators. After 12 crystal oscillators are used, it is necessary to stop the use of the device and replace the crystal oscillator. Quartz crystal oscillators are usually used in high vacuum environments. The frequency of replacing quartz crystal oscillators will affect the efficiency of the equipment and affect the efficiency of industrial production.
请同时参阅图3和图4,本申请提供的零件切换装置一实施例的左视示意图与主视示意图。Please refer to FIG. 3 and FIG. 4 simultaneously. FIG. 3 and FIG. 4 are schematic diagrams showing a left side view and a front view of an embodiment of the part switching device provided by the present application.
零件切换装置20包括基座装置21以及包围基座装置21的基座套22。其中,基座装置21包括基座211、转轴212。The part switching device 20 includes a base device 21 and a base cover 22 that surrounds the base device 21. The base device 21 includes a base 211 and a rotating shaft 212.
基座211包括底板211a以及垂直于底板211a边缘的侧壁211b,其侧壁211b上设置有多个用于容置零件的容置槽211c,且容置槽211c的开口方向垂直于侧壁211b并远离底板211a。The base 211 includes a bottom plate 211a and a side wall 211b perpendicular to the edge of the bottom plate 211a. The side wall 211b is provided with a plurality of receiving grooves 211c for accommodating the components, and the opening direction of the receiving groove 211c is perpendicular to the side wall 211b. And away from the bottom plate 211a.
可选的,底板211a可以设为圆形底板、正多边形底板或其他形状的底板。侧壁211b与底板211a边缘垂直,可理解为,侧壁211b边缘与底板211a边缘垂直或侧壁211b的中间部分与底板211a边缘垂直,侧壁211b的中间部分与底板211a边缘垂直连接时,侧壁211b朝向底板211a两侧面延伸,以使侧视图呈现出“T”字型。侧壁211b与底板211a的搭配形式多样,在此不作限制。Alternatively, the bottom plate 211a may be configured as a circular bottom plate, a regular polygonal bottom plate, or a bottom plate of other shapes. The side wall 211b is perpendicular to the edge of the bottom plate 211a. It can be understood that the edge of the side wall 211b is perpendicular to the edge of the bottom plate 211a or the middle portion of the side wall 211b is perpendicular to the edge of the bottom plate 211a, and the middle portion of the side wall 211b is perpendicularly connected to the edge of the bottom plate 211a. The wall 211b extends toward both sides of the bottom plate 211a so that the side view assumes a "T" shape. The combination of the side wall 211b and the bottom plate 211a is various and is not limited herein.
具体而言,本实施例中基座211为圆形底板211a加垂直侧壁211b的“培养皿”状,即侧壁211b沿底板211a的圆周边缘垂直设置,并朝底板211a的一侧面延伸。在本实施例中基座211的圆形底板211a为一实心平面状圆形底板,在其他实施例中其还可以设置成网格状圆形底板,即底板211a内侧(面向侧壁211b一侧)为圆形平面薄板,底板211a外侧为网格状支撑结构,此举适用于大直径基座,在保证大直径基座的刚度的前提下,可以减少圆形底板211a的厚度及材料的耗费。Specifically, in the present embodiment, the base 211 has a "dish dish" shape in which the circular bottom plate 211a is added with the vertical side wall 211b, that is, the side wall 211b is vertically disposed along the circumferential edge of the bottom plate 211a and extends toward one side surface of the bottom plate 211a. In this embodiment, the circular bottom plate 211a of the base 211 is a solid planar circular bottom plate. In other embodiments, it may also be arranged in a grid-like circular bottom plate, that is, the inner side of the bottom plate 211a (facing the side wall 211b side). The circular flat plate has a grid-like support structure on the outer side of the bottom plate 211a. This is applicable to the large-diameter base. Under the premise of ensuring the rigidity of the large-diameter base, the thickness of the circular bottom plate 211a and the material cost can be reduced. .
在侧壁211b上,从内向外开设容置槽211c,容置槽211c未贯穿侧壁211b,然后在容置槽211c内开一稍小的通孔贯穿侧壁211b,该通孔与容置槽211c同轴心,且通孔与容置槽211c形成的凸起部位刚好能够阻挡零件向基座211外部滑出。容置槽211c深度能够将零件容置在内,或将零件的大部分容置在内,满足工作需求即可。侧壁211b的厚度在满足上述条件下,还需满足刚度需求,或按需增加厚度,或在侧壁211b上设置加强肋。此外,还需根据圆形底板211a的直径、侧壁211b的刚度及综合成本,合理设置容置槽211c的数量,并且设置的多个容置槽211c在侧壁211b上均匀分布,以使综合效益最大化。The accommodating groove 211c is formed on the side wall 211b. The accommodating groove 211c does not penetrate the side wall 211b, and then a small through hole is inserted into the accommodating groove 211c to penetrate the side wall 211b. The groove 211c is concentric, and the convex portion formed by the through hole and the receiving groove 211c is just enough to block the part from slipping out of the base 211. The depth of the accommodating groove 211c can accommodate the parts or accommodate most of the parts to meet the work requirements. The thickness of the side wall 211b needs to satisfy the rigidity requirement under the above conditions, or increase the thickness as needed, or provide reinforcing ribs on the side wall 211b. In addition, according to the diameter of the circular bottom plate 211a, the rigidity of the side wall 211b, and the overall cost, the number of the accommodating grooves 211c is appropriately set, and the plurality of accommodating grooves 211c are uniformly distributed on the side wall 211b, so as to be integrated. Maximize benefits.
本实施例中,转轴212固定于底板211a的圆心上,若其他实施例中底板为异于圆形的形状,则转轴212固定于底板211a的中心位置处。转轴212与基座211的连接方式,可选为可拆卸式连接或不可拆卸式连接。本实施例中其为可拆卸式连接,如螺纹连接,在其他实施例中可选用不可拆卸连接,如焊接。可拆卸连接方便基座211及零件的更换,在本实施例中,圆形底板211a的圆心上设有一螺纹孔,转轴212与基座211连接的一端设有与该螺纹孔相配合的螺纹,待它们连接后用螺母紧固防松。在本实施例中,转轴212设置在底板211a内侧,即转轴212与侧壁211b位于底板211a的同一侧面。在其他实施例中为方便零件的更换,还可将转轴212设置在底板211a的外侧,在无需取下基座211的情况下,便可方便的更换零件。转轴212可根据基座211的重量、转轴212的长度、基座211的直径大小设置为实心轴或空心轴,本实施例中转轴212为实心轴。In this embodiment, the rotating shaft 212 is fixed to the center of the bottom plate 211a. If the bottom plate has a circular shape in other embodiments, the rotating shaft 212 is fixed at the center of the bottom plate 211a. The connection mode of the rotating shaft 212 and the base 211 can be detachable or non-detachable. In this embodiment it is a detachable connection, such as a threaded connection, and in other embodiments a non-detachable connection, such as welding, may be used. The detachable connection facilitates the replacement of the base 211 and the components. In the embodiment, the center of the circular bottom plate 211a is provided with a threaded hole, and one end of the rotating shaft 212 connected to the base 211 is provided with a thread matched with the threaded hole. After they are connected, tighten them with nuts to prevent loosening. In the present embodiment, the rotating shaft 212 is disposed inside the bottom plate 211a, that is, the rotating shaft 212 and the side wall 211b are located on the same side of the bottom plate 211a. In other embodiments, in order to facilitate the replacement of the parts, the rotating shaft 212 may be disposed on the outer side of the bottom plate 211a, and the parts can be easily replaced without removing the base 211. The rotating shaft 212 can be set as a solid shaft or a hollow shaft according to the weight of the base 211, the length of the rotating shaft 212, and the diameter of the base 211. In this embodiment, the rotating shaft 212 is a solid shaft.
基座套22至少将基座211包围在内,其尺寸形状与基座211的尺寸形状相适宜,且基座套22上与侧壁211b相对的一面设置有一个窗口221。在其他实施例中,还可以设置多个窗口221,以增加零件的加工效率。该窗口221的形状、尺寸及位置与容置槽211c相对应,即在转轴212带动基座211转动时,使多个容置槽211c能依次对准该窗口221,便于一个容置槽211c中的零件露出以进行加工或其他操作。需要强调的是,本实施例中同一时间仅有一个零件处于该窗口221。基座套22为可拆卸式结构,且固定在零件切换装置20上,即窗口221的空间位置是固定不变的。本实施例中,基座套22相对圆形底板211a外侧的一面可拆卸,其螺接于基座套22的另一部分上。The base cover 22 encloses at least the base 211, and has a size and shape suitable for the size and shape of the base 211, and a window 221 is disposed on a side of the base cover 22 opposite to the side wall 211b. In other embodiments, a plurality of windows 221 may also be provided to increase the processing efficiency of the part. The shape, the size and the position of the window 221 correspond to the accommodating groove 211c, that is, when the rotating shaft 212 rotates the base 211, the plurality of accommodating grooves 211c can be sequentially aligned with the window 221 to facilitate the accommodating groove 211c. The parts are exposed for processing or other operations. It should be emphasized that only one part is in the window 221 at the same time in this embodiment. The base sleeve 22 is of a detachable structure and is fixed to the part switching device 20, that is, the spatial position of the window 221 is fixed. In this embodiment, the pedestal sleeve 22 is detachable from the outer side of the circular bottom plate 211a, and is screwed to another portion of the pedestal sleeve 22.
零件切换装置20进一步地包括控制器(未图示)。控制器连接转轴212,用于控制转轴212以预设方式进行转动。The part switching device 20 further includes a controller (not shown). The controller is coupled to the rotating shaft 212 for controlling the rotating shaft 212 to rotate in a preset manner.
在本实施例中,转轴212由伺服电机驱动。控制器通过程序控制伺服电机,使基座211按需转动切换零件至窗口221处。具体的,控制器在检测到零件被处理完成后,控制转轴212转动一定角度,使基座211上处于窗口221处的零件错开窗口221,防止处理后的零件过处理,或在检测到窗口221处无待处理的零件,控制转轴212转动一定角度,将待处理的零件旋转至窗口221处进行处理。In the present embodiment, the rotating shaft 212 is driven by a servo motor. The controller controls the servo motor by a program to cause the base 211 to rotate the switching part to the window 221 as needed. Specifically, after detecting that the part is processed, the controller controls the rotating shaft 212 to rotate by a certain angle, so that the part at the window 221 on the base 211 is staggered from the window 221 to prevent the processed part from being over-processed, or in detecting the window 221 There is no part to be processed, the control shaft 212 is rotated by a certain angle, and the part to be processed is rotated to the window 221 for processing.
如在薄膜工业领域,需对薄膜材料的蒸镀速率和膜厚进行精确的控制。如对基板进行镀膜加工时,蒸镀设备同时对基板与石英晶振片镀膜,蒸发材料沉积到基板上,同时也沉积到晶振片上,因此可以通过材料在石英晶振片上沉积膜的厚度/速率监测基板上材料沉积膜的厚度/速率。监控仪通过石英晶振片采集膜厚信息,这是因为沉积到石英晶振片上的材料膜厚的变化值与石英晶振片振动频率的变化值成正比例关系,通过检测石英晶振片振动频率的变化,可得到石英晶振片上沉积膜的厚度/速率,进而监控基板上沉积膜的厚度/速率,而石英晶振片放置在零件切换装置20内。For example, in the field of the film industry, precise control of the evaporation rate and film thickness of the film material is required. For example, when the substrate is coated, the vapor deposition apparatus simultaneously coats the substrate and the quartz crystal oscillator, and the evaporation material is deposited on the substrate and also deposited on the crystal oscillator. Therefore, the substrate can be monitored by the thickness/rate of the deposited film on the quartz crystal oscillator. The thickness/rate of the deposited film on the material. The monitor collects the film thickness information through the quartz crystal oscillator. This is because the change of the film thickness of the material deposited on the quartz crystal oscillator is proportional to the change value of the vibration frequency of the quartz crystal oscillator. By detecting the change of the vibration frequency of the quartz crystal oscillator, The thickness/rate of the deposited film on the quartz crystal plate is obtained, thereby monitoring the thickness/rate of the deposited film on the substrate, and the quartz crystal plate is placed in the part switching device 20.
具体而言,石英晶振片有两个面,工作面和电极接触面,将石英晶振片置于容置槽211c内,工作面朝向镀膜物质附着的方向(即朝向基座套22的一侧),电极面与监控仪电连接,使石英晶振片在基座211内安装固定妥当,再用基座套22将基座211封装好,防止非工作位置的石英晶振片被镀膜。之后,若检测到窗口221处无石英晶振片,则控制器控制伺服电机带动转轴212转动,使一石英晶振片处于窗口221处,镀膜设备开始对基板与石英晶振片同时镀膜;若检测到窗口221处有石英晶振片,则镀膜设备开始对基板与石英晶振片同时镀膜。同时,监控仪监测石英晶振片振动频率的变化值。待石英晶振片振动频率的变化值达到第一阈值,表明基板膜厚达到要求,停止镀膜,更换下一块待镀膜的基板,若石英晶振片振动频率的总变化值达到第二阈值,表明石英晶振片到达使用寿命,控制器控制转轴212转动,将另一未使用的石英晶振片旋转至基座套22上的窗口221处。如此循环往复,待所有石英晶振片使用寿命均到达后,更换石英晶振片。Specifically, the quartz crystal oscillator has two faces, a working surface and an electrode contact surface, and the quartz crystal oscillator is placed in the accommodating groove 211c, and the working surface faces the direction in which the coating material adheres (ie, the side facing the susceptor sleeve 22). The electrode surface is electrically connected to the monitor, so that the quartz crystal oscillator piece is fixed and fixed in the base 211, and then the base 211 is packaged by the base sleeve 22 to prevent the quartz crystal oscillator piece in the non-working position from being coated. Thereafter, if it is detected that there is no quartz crystal oscillator plate at the window 221, the controller controls the servo motor to rotate the rotating shaft 212 to make a quartz crystal oscillator plate at the window 221, and the coating device starts to simultaneously coat the substrate and the quartz crystal oscillator plate; if the window is detected; At 221, there is a quartz crystal oscillator, and the coating equipment starts to coat the substrate and the quartz crystal oscillator simultaneously. At the same time, the monitor monitors the change value of the vibration frequency of the quartz crystal oscillator. When the variation value of the vibration frequency of the quartz crystal oscillator reaches the first threshold value, it indicates that the film thickness of the substrate reaches the requirement, the coating is stopped, and the next substrate to be coated is replaced. If the total variation value of the vibration frequency of the quartz crystal oscillator reaches the second threshold value, the quartz crystal oscillator is indicated. The blade reaches the end of its life, and the controller controls the rotation of the shaft 212 to rotate another unused quartz crystal piece to the window 221 on the base cover 22. In this way, after all the quartz crystal oscillators have reached the service life, the quartz crystal oscillator pieces are replaced.
本申请的有益效果是:区别于现有技术的情况,本申请公开了一种零件切换装置。该零件切换装置包括基座装置以及包围基座装置的基座套;其中,基座装置包括基座及转轴,基座包括底板以及垂直于底板边缘的侧壁,侧壁上设置有多个用于容置零件的容置槽,容置槽的窗口方向垂直于侧壁且远离底板,转轴垂直固定于底板,用于在转动时带动基座转动;其中,基座套上设置有一窗口,用于在转轴带动基座转动时,使多个容置槽能依次对准该窗口,便于容置槽中的零件露出以进行加工或其他操作。本申请通过将容置槽设置在基座的侧壁上,在基座底面同等大小的情况下,可设置更多的容置槽数量,增加了零件切换装置可容置零件的数目,有效降低零件的更换频率,提高了相应设备的使用效率,进而提高了工业生产的效率。The beneficial effects of the present application are: Different from the prior art, the present application discloses a part switching device. The part switching device comprises a base device and a base sleeve surrounding the base device; wherein the base device comprises a base and a rotating shaft, the base comprises a bottom plate and a side wall perpendicular to the edge of the bottom plate, and the side wall is provided with a plurality of In the accommodating groove of the accommodating part, the window direction of the accommodating groove is perpendicular to the side wall and away from the bottom plate, and the rotating shaft is vertically fixed to the bottom plate for rotating the pedestal when rotating; wherein the pedestal sleeve is provided with a window for When the rotating shaft drives the base to rotate, the plurality of receiving grooves can be sequentially aligned with the window, so that the parts in the receiving groove are exposed for processing or other operations. In the present application, the accommodating groove is disposed on the side wall of the base, and in the case of the same size of the bottom surface of the base, more accommodating grooves can be provided, which increases the number of parts that the component switching device can accommodate, and effectively reduces the number of parts. The frequency of replacement of parts increases the efficiency of use of the corresponding equipment, thereby increasing the efficiency of industrial production.
请同时参阅图5和图6,本申请提供的零件切换装置另一实施例的主视图与俯视图。Please refer to FIG. 5 and FIG. 6 simultaneously, a front view and a top view of another embodiment of the part switching device provided by the present application.
该零件切换装置30包括三个基座装置(32、33、34)以及包围三个基座装置(32、33、34)的基座套35。The part switching device 30 includes three base units (32, 33, 34) and a base sleeve 35 surrounding the three base units (32, 33, 34).
其中,每一个基座装置(32/33/34)均包括一基座(321/331/341)、一第一类转轴(322/332/342),且每个基座装置(32/33/34)的第一类转轴(322/332/342)均垂直固定在一第二类转轴31上,以在第二类转轴31转动时,带动多个基座(32、33、34)绕第二类转轴31转动。Each of the base units (32/33/34) includes a base (321/331/341), a first type of shaft (322/332/342), and each base unit (32/33) The first type of shafts (322/332/342) of /34) are vertically fixed to a second type of rotating shaft 31 to drive a plurality of bases (32, 33, 34) around when the second type of rotating shaft 31 rotates. The second type of shaft 31 rotates.
在此实施例中,基座套35上有一窗口351。在其他实施例中,基座套35上可设置多个窗口351,以增加零件的加工效率。In this embodiment, the base sleeve 35 has a window 351 thereon. In other embodiments, a plurality of windows 351 may be disposed on the base sleeve 35 to increase the processing efficiency of the parts.
基座装置(32、33、34)是如上一实施例描述的基座装置。在上一实施例描述过的转轴及基座套,均适用于本实施列的第一类转轴(322、332、342)及基座套35,在此不作赘述。The base unit (32, 33, 34) is a base unit as described in the above embodiment. The rotating shaft and the base sleeve described in the previous embodiment are applicable to the first type of rotating shafts (322, 332, 342) and the base sleeve 35 of the present embodiment, and are not described herein.
可选的,多个基座装置,意味着基座装置的数量大于一个。在本实施例中,基座的数量为三个。在其他实施例中,基座的数量可选为二、四、五等数目,本申请对此不作限制。多个基座距第二类转轴距离相等,且绕第二类转轴在同一空间范围内均匀分布,即本实施例中多个第一类转轴(322、332、342)围绕第二类转轴31均匀分布。Alternatively, a plurality of base devices means that the number of base devices is greater than one. In this embodiment, the number of pedestals is three. In other embodiments, the number of pedestals may be two, four, five, etc., which is not limited in this application. The plurality of pedestals are equidistant from the second type of rotating shaft and are evenly distributed in the same spatial range around the second type of rotating shaft, that is, the plurality of first type of rotating shafts (322, 332, 342) surround the second type of rotating shaft 31 in this embodiment. Evenly distributed.
在本实施例中,第一类转轴(322、332、342)为内外套层结构。其外层与第二类转轴31连接,内层可由电机驱动转动。具体而言,第一类转轴(322、332、342)外层相对第二类转轴31固定不动,使第二类转轴31可以转动切换各基座(321、331、341)至窗口351处,第一类转轴(322、332、342)内层根据工作需要转动切换容置槽(321a、331a、341a)与窗口351相对。In the present embodiment, the first type of rotating shafts (322, 332, 342) are inner jacket layers. The outer layer is connected to the second type of rotating shaft 31, and the inner layer is rotatable by a motor. Specifically, the outer layer of the first type of rotating shafts (322, 332, 342) is fixed relative to the second type of rotating shaft 31, so that the second type of rotating shaft 31 can rotate and switch the respective bases (321, 331, 341) to the window 351. The inner shaft of the first type of rotating shafts (322, 332, 342) is rotated relative to the window 351 according to the rotation of the accommodating grooves (321a, 331a, 341a).
其中,第一类转轴(322、332、342)外层与第二类转轴31为可拆式连接,如通过连接件固定于第二类转轴31上,第一类转轴(322、332、342)的内外套层可相对转动且轴向无位移。The outer layer of the first type of rotating shafts (322, 332, 342) is detachably connected to the second type of rotating shaft 31, and is fixed to the second type of rotating shaft 31 by a connecting member, and the first type of rotating shafts (322, 332, 342) The inner jacket layer is relatively rotatable and axially non-displaceable.
第二类转轴31垂直于转轴(33、35、37)组成的平面,在伺服电机的驱动下切换基座(32、34、36)处于窗口351处。The second type of rotating shaft 31 is perpendicular to the plane formed by the rotating shafts (33, 35, 37), and the switching base (32, 34, 36) is driven at the window 351 by the servo motor.
零件切换装置30进一步地包括控制器(未图示)。控制器连接多个第一类转轴(322、332、342)以及第二类转轴31,用于控制第一类转轴(322、332、342)以及第二类转轴31以预设方式进行转动。The part switching device 30 further includes a controller (not shown). The controller connects a plurality of first type of rotating shafts (322, 332, 342) and a second type of rotating shaft 31 for controlling the first type of rotating shafts (322, 332, 342) and the second type of rotating shafts 31 to rotate in a preset manner.
具体而言,第二类转轴31和第一类转轴(322、332、342)均配有独立的伺服电机,且与控制器电性连接。控制器通过程序控制各伺服电机,使基座(321、331、341)按需转动切换零件至窗口351处。具体的,控制器在检测到零件被处理完成后,控制第一类转轴(322、332、342)转动一定角度,使基座(321、331、341)上处于窗口351处的零件错开窗口351,防止处理后的零件过处理,或在检测到窗口351处无待处理的零件,控制第一类转轴(322、332、342)转动一定角度,将待处理的零件旋转至窗口351处进行处理,或在检测到基座(321或331或341)上的零件均被处理完后,控制第二类转轴31转动一定角度将另一基座(331或341或321)旋转至窗口351处。Specifically, the second type of rotating shaft 31 and the first type of rotating shafts (322, 332, 342) are each provided with an independent servo motor and electrically connected to the controller. The controller controls each servo motor through the program, so that the base (321, 331, 341) rotates the parts to the window 351 as needed. Specifically, after detecting that the part is processed, the controller controls the first type of rotating shafts (322, 332, 342) to rotate by a certain angle, so that the parts at the window 351 on the base (321, 331, 341) are staggered from the window 351. To prevent the processed parts from being over-processed, or to detect the parts that are not to be processed at the window 351, control the first type of rotating shafts (322, 332, 342) to rotate by a certain angle, and rotate the parts to be processed to the window 351 for processing. Or, after detecting that the parts on the base (321 or 331 or 341) have been processed, the second type of rotating shaft 31 is controlled to rotate at an angle to rotate the other base (331 or 341 or 321) to the window 351.
仍以薄膜工业领域中的镀膜厚度控制为例。控制器检测窗口351处有无基座(321、331、341),若无基座(321、331、341),控制器控制伺服电机驱动第二类转轴31转动,使一基座(321或331或341)处于窗口351位置处,控制器再检测窗口351处有无石英晶振片,若有,镀膜设备开始对基板与石英晶振片同时镀膜,若无,则控制器控制第一类转轴(322或332或342)转动,使一石英晶振片处于窗口351处,镀膜设备开始对基板与石英晶振片同时镀膜;若检测到窗口351处有基座(321或331或341),同样经上述处理,使一石英晶振片处于窗口351处,镀膜设备开始对基板与石英晶振片同时镀膜。同时,监控仪监测石英晶振片振动频率的变化值。待石英晶振片振动频率的变化值达到第一阈值,表明基板膜厚达到要求,停止镀膜,更换下一块待镀膜的基板,若石英晶振片振动频率的总变化值达到第二阈值,表明石英晶振片到达使用寿命,控制器控制第一类转轴(322或332或342)转动,将另一待处理的石英晶振片旋转至基座套35上的窗口351处。当该基座(321或331或341)上的石英晶振片均到达使用寿命,控制器控制第二类转轴31转动,将另一基座(321或331或341)旋转至窗口351处。如此循环往复,待零件切换装置30上所有的石英晶振片都到达使用寿命,更换石英晶振片。The coating thickness control in the field of the film industry is still taken as an example. The controller detects whether there is a pedestal (321, 331, 341) at the window 351. If there is no pedestal (321, 331, 341), the controller controls the servo motor to drive the second type of rotating shaft 31 to rotate, so that a pedestal (321 or 331 or 341) is located at the position of the window 351, and the controller re-detects whether there is a quartz crystal oscillator plate at the window 351. If so, the coating device starts coating the substrate and the quartz crystal oscillator simultaneously. If not, the controller controls the first type of rotating shaft ( Rotating 322 or 332 or 342) so that a quartz crystal oscillator is at the window 351, and the coating device starts to simultaneously coat the substrate with the quartz crystal oscillator; if the base 321 (321 or 331 or 341) is detected at the window 351, the same After processing, a quartz crystal oscillator is placed at the window 351, and the coating device starts coating the substrate and the quartz crystal oscillator simultaneously. At the same time, the monitor monitors the change value of the vibration frequency of the quartz crystal oscillator. When the variation value of the vibration frequency of the quartz crystal oscillator reaches the first threshold value, it indicates that the film thickness of the substrate reaches the requirement, the coating is stopped, and the next substrate to be coated is replaced. If the total variation value of the vibration frequency of the quartz crystal oscillator reaches the second threshold value, the quartz crystal oscillator is indicated. When the sheet reaches the service life, the controller controls the rotation of the first type of shaft (322 or 332 or 342) to rotate another quartz crystal oscillator to be processed to the window 351 on the base sleeve 35. When the quartz crystal oscillator pieces on the base (321 or 331 or 341) reach the service life, the controller controls the second type of rotating shaft 31 to rotate, and rotates the other base (321 or 331 or 341) to the window 351. In this way, all the quartz crystal oscillator pieces on the part switching device 30 reach the service life, and the quartz crystal oscillator piece is replaced.
更进一步地,参阅图7,可将多个零件切换装置30沿圆周安装在一转盘装置37上。同时,控制器还用于在零件切换装置30内的零件均被处理完后,控制转盘装置37转动一定角度将另一零件切换装置30置于工作位置处。Still further, referring to Fig. 7, a plurality of part switching devices 30 can be circumferentially mounted on a turntable device 37. At the same time, the controller is also used to control the turntable device 37 to rotate a certain angle to place the other part switching device 30 at the working position after the parts in the part switching device 30 have been processed.
本申请的有益效果是:区别于现有技术的情况,本申请公开了一种零件切换装置。该零件切换装置包括多个基座装置以及包围多个基座装置的基座套;其中,每个基座装置均包括:基座,包括底板以及垂直于底板边缘的侧壁,侧壁上设置有多个用于容置零件的容置槽,容置槽的窗口方向垂直于侧壁且远离底板;第一类转轴,垂直固定于底板,用于在转动时带动基座转动;每个基座装置的第一类转轴垂直固定在一第二类转轴上,以在第二类类转轴转动时,带动多个基座绕第二类转轴转动;其中,基座套上设置有一窗口,用于在第一类转轴及第二类转轴带动基座转动时,使多个容置槽能依次对准窗口,便于容置槽中的零件露出以进行加工或其他操作。本申请通过将容置槽设置在基座的侧壁上,在基座底面同等大小的情况下,可设置更多的容置槽数量,以及通过将多个基座装置组合起来,成倍地增加了零件切换装置可容置零件的数目,有效降低零件的更换频率,提高了相应设备的使用效率,进而提高了工业生产的效率。The beneficial effects of the present application are: Different from the prior art, the present application discloses a part switching device. The part switching device comprises a plurality of base devices and a base sleeve surrounding the plurality of base devices; wherein each base device comprises: a base comprising a bottom plate and side walls perpendicular to the edge of the bottom plate, the side walls are arranged There are a plurality of accommodating grooves for accommodating the parts, and the window direction of the accommodating groove is perpendicular to the side wall and away from the bottom plate; the first type of rotating shaft is vertically fixed to the bottom plate for driving the base to rotate when rotating; each base The first type of rotating shaft of the seat device is vertically fixed on a second type of rotating shaft to drive the plurality of bases to rotate around the second type of rotating shaft when the second type of rotating shaft rotates; wherein the base sleeve is provided with a window for When the first type of rotating shaft and the second type of rotating shaft drive the base to rotate, the plurality of receiving grooves can be sequentially aligned with the window, so that the parts in the receiving groove are exposed for processing or other operations. In the present application, by arranging the accommodating groove on the side wall of the pedestal, in the case of the same size of the bottom surface of the pedestal, more accommodating grooves can be provided, and the multiple pedestal devices can be multiplied by multiple times. The number of parts that can be accommodated by the part switching device is increased, the frequency of replacement of parts is effectively reduced, the use efficiency of the corresponding equipment is improved, and the efficiency of industrial production is improved.
参阅图8,本申请提供的蒸镀系统一实施例的示意图。Referring to Figure 8, a schematic diagram of an embodiment of an evaporation system provided by the present application.
蒸镀系统至少包含蒸镀腔体41、蒸发源42、基板43、晶振片基座装置44和与其连接的膜厚监控仪45。其中,不同于现有技术中的晶振片基座装置,本实施例中的晶振片基座装置44采用前述实施例中所述的零件切换装置,其对应零件为晶振片,晶振片基座装置44用于在需要时进行晶振片的切换。The vapor deposition system includes at least a vapor deposition chamber 41, an evaporation source 42, a substrate 43, a crystal plate base device 44, and a film thickness monitor 45 connected thereto. The crystal plate base device 44 of the present embodiment adopts the component switching device described in the foregoing embodiment, and the corresponding component is a crystal oscillator piece, and the crystal oscillator base device is different from the prior art crystal plate base device. 44 is used to switch the crystal oscillator when needed.
蒸发材料从蒸发源42中蒸发出来,沉积到基板43(目标沉积基底)和晶振片上,形成所需薄膜,基板43上膜厚与晶振片上膜厚成一定关系。膜厚监控仪45通过晶振片上膜厚的情况监控基板43上膜厚的情况。当晶振片上的膜厚累积到一定程度时,晶振片不能再使用,即达到晶振片寿命,此时可通过晶振片基座装置44切换到下一个晶振片,当基座中所有晶振片都达到使用寿命后,打开蒸镀腔体41更换全部晶振片。因本实施例使用前述零件切换装置形式的晶振片基座装置44,与现有技术相比,晶振片数量成倍增加,开腔更换晶振片的频率成倍减少,提高了生产效率。The evaporation material is evaporated from the evaporation source 42, deposited on the substrate 43 (target deposition substrate) and the crystal oscillator to form a desired film, and the film thickness on the substrate 43 has a certain relationship with the film thickness on the crystal plate. The film thickness monitor 45 monitors the film thickness on the substrate 43 by the film thickness on the crystal plate. When the film thickness on the crystal oscillator sheet accumulates to a certain extent, the crystal oscillator piece can no longer be used, that is, the life of the crystal oscillator plate is reached, and at this time, the crystal oscillator piece base device 44 can be switched to the next crystal oscillator piece, and all the crystal oscillator pieces in the pedestal are reached. After the service life, the vapor deposition chamber 41 is opened to replace all the crystal oscillator pieces. Since the crystal plate base device 44 in the form of the above-described part switching device is used in the present embodiment, the number of crystal oscillator pieces is multiplied as compared with the prior art, and the frequency of opening the cavity replacement crystal piece is doubled, thereby improving production efficiency.
在前两个实施例中,均有详述晶振片切换过程,不再赘述。In the first two embodiments, the switching process of the crystal oscillator is described in detail, and will not be described again.
以上所述仅为本申请的实施例,并非因此限制本申请的专利范围,凡是利用本申请说明书及附图内容所作的等效结构或等效流程变换,或直接或间接运用在其他相关的技术领域,均同理包括在本申请的专利保护范围内。The above description is only the embodiment of the present application, and thus does not limit the scope of the patent application, and the equivalent structure or equivalent process transformation made by using the specification and the drawings of the present application, or directly or indirectly applied to other related technologies. The fields are all included in the scope of patent protection of this application.

Claims (18)

  1. 一种蒸镀系统,至少包括镀膜腔体、蒸发源、基板、膜厚监控仪,其中,所述蒸镀系统还包括零件切换装置,所述零件切换装置包括基座装置以及包围所述基座装置的基座套;An evaporation system comprising at least a coating chamber, an evaporation source, a substrate, a film thickness monitor, wherein the evaporation system further comprises a part switching device, the part switching device comprising a base device and surrounding the base a base sleeve of the device;
    其中,所述基座装置包括:Wherein the base device comprises:
    基座,包括底板以及垂直于所述底板边缘的侧壁,所述侧壁上设置有多个用于容置零件的容置槽,所述容置槽的开口方向垂直于所述侧壁且远离所述底板;a pedestal comprising a bottom plate and a side wall perpendicular to an edge of the bottom plate, wherein the side wall is provided with a plurality of accommodating grooves for accommodating the components, and the opening direction of the accommodating groove is perpendicular to the side wall Far from the bottom plate;
    其中,所述底板为圆形,所述侧壁沿所述底板的圆周边缘垂直设置,并朝所述底板的一侧面延伸;Wherein the bottom plate is circular, the side walls are vertically disposed along a circumferential edge of the bottom plate, and extend toward a side of the bottom plate;
    第一类转轴,垂直固定于所述底板,用于在转动时带动所述基座转动;a first type of rotating shaft is vertically fixed to the bottom plate for driving the base to rotate when rotating;
    控制器,连接所述第一类转轴,用于控制所述第一类转轴以预设方式进行转动;a controller, connected to the first type of rotating shaft, configured to control the first type of rotating shaft to rotate in a preset manner;
    其中,所述基座套上设置有一窗口,用于在所述第一类转轴带动所述基座转动时,使多个所述容置槽能依次对准所述窗口,便于所述容置槽中的零件露出以进行加工或其他操作;The pedestal sleeve is provided with a window for sequentially aligning the plurality of accommodating slots with the window when the first type of rotating shaft drives the susceptor to rotate, so as to facilitate the accommodating The parts in the slot are exposed for processing or other operations;
    所述零件切换装置中容置的零件为晶振片,所述零件切换装置用于在需要时进行晶振片的切换。The component housed in the component switching device is a crystal oscillator piece, and the component switching device is used to switch the crystal oscillator plate when needed.
  2. 根据权利要求1所述的蒸镀系统,其中,The vapor deposition system according to claim 1, wherein
    所述第一类转轴固定于所述底板的圆心上,所述第一类转轴与所述侧壁位于所述底板的同一侧面。The first type of rotating shaft is fixed on a center of the bottom plate, and the first type of rotating shaft and the side wall are located on the same side of the bottom plate.
  3. 根据权利要求1所述的蒸镀系统,其中,The vapor deposition system according to claim 1, wherein
    多个所述容置槽均匀分布设置在所述侧壁上。A plurality of the accommodating grooves are evenly distributed on the side wall.
  4. 根据权利要求1所述的蒸镀系统,其中,The vapor deposition system according to claim 1, wherein
    所述零件切换装置还可包括多个所述基座装置,且多个所述基座装置设置于所述基座套内。The part switching device may further include a plurality of the base devices, and a plurality of the base devices are disposed in the base sleeve.
  5. 根据权利要求4所述的蒸镀系统,其中,The vapor deposition system according to claim 4, wherein
    所述基座装置还包括第二类转轴,每个所述基座装置的第一类转轴垂直固定在一第二类转轴上,以在所述第二类转轴转动时,带动多个所述基座绕所述第二类转轴转动。The base device further includes a second type of rotating shaft, and the first type of rotating shaft of each of the base units is vertically fixed to a second type of rotating shaft to drive the plurality of the rotating shafts when the second type of rotating shaft rotates The base rotates about the second type of rotating shaft.
  6. 根据权利要求5所述的蒸镀系统,其中,The vapor deposition system according to claim 5, wherein
    多个所述第一类转轴围绕所述第二类转轴均匀分布。A plurality of said first type of rotating shafts are evenly distributed around said second type of rotating shaft.
  7. 根据权利要求4所述的蒸镀系统,其中,The vapor deposition system according to claim 4, wherein
    所述控制器还连接所述第二类转轴,控制所述第二类转轴以预设方式进行转动。The controller is further connected to the second type of rotating shaft, and controls the second type of rotating shaft to rotate in a preset manner.
  8. 一种零件切换装置,其中,包括基座装置以及包围所述基座装置的基座套;A part switching device, comprising: a base device and a base sleeve surrounding the base device;
    其中,所述基座装置包括:Wherein the base device comprises:
    基座,包括底板以及垂直于所述底板边缘的侧壁,所述侧壁上设置有多个用于容置零件的容置槽,所述容置槽的开口方向垂直于所述侧壁且远离所述底板;a pedestal comprising a bottom plate and a side wall perpendicular to an edge of the bottom plate, wherein the side wall is provided with a plurality of accommodating grooves for accommodating the components, and the opening direction of the accommodating groove is perpendicular to the side wall Far from the bottom plate;
    转轴,垂直固定于所述底板,用于在转动时带动所述基座转动;a rotating shaft fixed vertically to the bottom plate for driving the base to rotate when rotating;
    其中,所述基座套上设置有一窗口,用于在所述转轴带动所述基座转动时,使多个所述容置槽能依次对准所述窗口,便于所述容置槽中的零件露出以进行加工或其他操作。The pedestal sleeve is provided with a window for sequentially aligning the plurality of accommodating grooves with the window when the rotating shaft drives the susceptor to rotate, so as to facilitate the accommodating groove. Parts are exposed for processing or other operations.
  9. 根据权利要求8所述的零件切换装置,其中,The part switching device according to claim 8, wherein
    所述底板为圆形,所述侧壁沿所述底板的圆周边缘垂直设置,并朝所述底板的一侧面延伸。The bottom plate is circular, and the side walls are vertically disposed along a circumferential edge of the bottom plate and extend toward a side of the bottom plate.
  10. 根据权利要求9所述的零件切换装置,其中,The part switching device according to claim 9, wherein
    所述转轴固定于所述底板的圆心上,所述转轴与所述侧壁位于所述底板的同一侧面。The rotating shaft is fixed on a center of the bottom plate, and the rotating shaft and the side wall are located on the same side of the bottom plate.
  11. 根据权利要求9所述的零件切换装置,其中,The part switching device according to claim 9, wherein
    多个所述容置槽均匀分布设置在所述侧壁上。A plurality of the accommodating grooves are evenly distributed on the side wall.
  12. 根据权利要求8所述的零件切换装置,其中,The part switching device according to claim 8, wherein
    所述零件切换装置还包括控制器;The part switching device further includes a controller;
    所述控制器连接所述转轴,用于控制所述转轴以预设方式进行转动。The controller is coupled to the rotating shaft for controlling the rotating shaft to rotate in a preset manner.
  13. 一种零件切换装置,其中,包括多个基座装置以及包围所述多个基座装置的基座套;A part switching device, comprising: a plurality of base devices and a base sleeve surrounding the plurality of base devices;
    其中,每个所述基座装置包括:Wherein each of the base devices comprises:
    基座,包括底板以及垂直于所述底板边缘的侧壁,所述侧壁上设置有多个用于容置零件的容置槽,所述容置槽的开口方向垂直于所述侧壁且远离所述底板;a pedestal comprising a bottom plate and a side wall perpendicular to an edge of the bottom plate, wherein the side wall is provided with a plurality of accommodating grooves for accommodating the components, and the opening direction of the accommodating groove is perpendicular to the side wall Far from the bottom plate;
    第一类转轴,垂直固定于所述底板,用于在转动时带动所述基座转动;a first type of rotating shaft is vertically fixed to the bottom plate for driving the base to rotate when rotating;
    每个所述基座装置的第一类转轴垂直固定在一第二类转轴上,以在所述第二类转轴转动时,带动多个所述基座绕所述第二类转轴转动;a first type of rotating shaft of each of the base devices is vertically fixed on a second type of rotating shaft to drive a plurality of the bases to rotate about the second type of rotating shaft when the second type of rotating shaft rotates;
    其中,所述基座套上设置有一窗口,用于在所述第一类转轴及所述第二类转轴带动所述基座转动时,使多个所述容置槽能依次对准所述窗口,便于所述容置槽中的零件露出以进行加工或其他操作。Wherein the pedestal sleeve is provided with a window for sequentially aligning the plurality of accommodating grooves when the first type of rotating shaft and the second type of rotating shaft drive the susceptor to rotate A window that facilitates exposing parts in the receiving slot for processing or other operations.
  14. 根据权利要求13所述的零件切换装置,其中,The parts switching device according to claim 13, wherein
    所述底板为圆形,所述侧壁沿所述底板的圆周边缘垂直设置,并朝所述底板的一侧面延伸。The bottom plate is circular, and the side walls are vertically disposed along a circumferential edge of the bottom plate and extend toward a side of the bottom plate.
  15. 根据权利要求14所述的零件切换装置,其中,The parts switching device according to claim 14, wherein
    所述第一类转轴固定于所述底板的圆心上,所述第一类转轴与所述侧壁位于所述底板的同一侧面。The first type of rotating shaft is fixed on a center of the bottom plate, and the first type of rotating shaft and the side wall are located on the same side of the bottom plate.
  16. 根据权利要求14所述的零件切换装置,其中,The parts switching device according to claim 14, wherein
    多个所述容置槽均匀分布设置在所述侧壁上。A plurality of the accommodating grooves are evenly distributed on the side wall.
  17. 根据权利要求13所述的零件切换装置,其中,The parts switching device according to claim 13, wherein
    多个所述第一类转轴围绕所述第二类转轴均匀分布。A plurality of said first type of rotating shafts are evenly distributed around said second type of rotating shaft.
  18. 根据权利要求13所述的零件切换装置,其中,The parts switching device according to claim 13, wherein
    所述零件切换装置还包括控制器;The part switching device further includes a controller;
    所述控制器连接所述第一类转轴以及所述第二类转轴,用于控制所述第一类转轴以及所述第二类转轴以预设方式进行转动。The controller is connected to the first type of rotating shaft and the second type of rotating shaft for controlling the first type of rotating shaft and the second type of rotating shaft to rotate in a preset manner.
PCT/CN2018/072067 2017-11-27 2018-01-10 Part switching device and evaporation system WO2019100557A1 (en)

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