CN102268652A - Film-plating umbrella stand - Google Patents
Film-plating umbrella stand Download PDFInfo
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- CN102268652A CN102268652A CN2010101922376A CN201010192237A CN102268652A CN 102268652 A CN102268652 A CN 102268652A CN 2010101922376 A CN2010101922376 A CN 2010101922376A CN 201010192237 A CN201010192237 A CN 201010192237A CN 102268652 A CN102268652 A CN 102268652A
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Abstract
The invention relates to a film-plating umbrella stand. The film-plating umbrella stand comprises a center support rod; a center load disk arranged on the center support rod; a plurality of peripheral support rods, wherein the peripheral support rods are around the center support rod and are fixed on the center support rod; and a plurality of peripheral load disks, wherein the peripheral load disks are respectively arranged on the peripheral support rods. The center support rod can rotate around the central axis of the length direction of the enter support rod. Both the center load disk and the peripheral load disk comprise at least a first load disk and a second load disk. The first load disk and the second load disk of the center load disk or the peripheral load disk are connected respectively through connection shafts, and can rotate around the connection shafts and relative to the center support rod or the peripheral support rods to respectively realize side turning over. Through grooves penetrating the lateral surfaces of the peripheral support rods are arranged on the peripheral support rods along the length directions of the peripheral support rods. Peripheral connection shafts are positioned in the corresponding through grooves, and the first load disks and the second load disks of the corresponding peripheral load disks are respectively positioned on both sides of the through grooves. The peripheral connection shafts can slide along the through grooves, such that the peripheral load disks can lift or lower along the corresponding peripheral support rods.
Description
Technical field
The present invention relates to a kind of film-plating umbrella stand, relate in particular to a kind of film-plating umbrella stand of the may command plated film element film thickness that constitutes by the plane load plate.
Background technology
Optical thin film generally adopt vapour deposition method (Evaporation Deposition), ion help the plating method (Ion Assisteddeposition, IAD) or the ion beam sputtering deposition method (Ion Beam Sputtering Deposition IBSD) is coated with.Be coated with in the process at rete, usually use film-plating umbrella stand to carry the plated film element, the plated film element is positioned on the film-plating umbrella stand, surface to be plated is towards the target that is arranged at the film-plating umbrella stand below, by modes such as evaporation or ion bombardments target material is dashed to film-plating umbrella stand, and be attached to surface formation plated film rete to be plated.
See also Fig. 7, be the synoptic diagram of traditional film-plating umbrella stand 10, traditional film-plating umbrella stand 10 is a globoidal structure, offers a plurality of bearing holes 12 on it, and traditional film-plating umbrella stand 10 can be around its center rotation.During plated film, plated film element (figure does not show) is placed in bearing holes 12, and surface to be plated is towards the target that is arranged at the film-plating umbrella stand below (figure does not show).But general volume of this traditional film-plating umbrella stand and weight are all bigger, need occupy bigger space in the use, are not easy to folding and unfolding and preserve.And the radian that traditional film-plating umbrella stand has makes that again the width between centers target of film-plating umbrella stand is far away, easily causes the plated film element plated film thicknesses of layers that is positioned over the film-plating umbrella stand central position not enough, influences the homogeneity of same batch of plated film element plated film rete; Moreover the distance of the plated film element distances target that carries on traditional film-plating umbrella stand generally all is a fixed comparatively, the thickness of wayward plated film element plated film rete.In addition,, thus, the plated film element is polluted, influence the yield of plated film goods for adopting traditional film-plating umbrella stand to need artificial upset plated film element usually at the plated film element of different surfaces plated film.
Summary of the invention
In view of this, be necessary to provide a kind of be easy to realize, film-plating umbrella stand that can effectively solve problems of the prior art.
A kind of film-plating umbrella stand comprises a centre post, and one is arranged at the center load plate on the centre post, and several center on and be fixed in the peripheral support bar of described centre post, and several are arranged at the peripheral load plate on described several peripheral support bars respectively.Described centre post can be around the central shaft rotation of its length direction.Described center load plate and described several peripheral load plates all are made up of one first load plate and one second load plate at least, first load plate of described center load plate is connected by a center coupling shaft with second load plate, and first load plate of described center load plate and second load plate can be realized turn-over respectively with respect to described centre post rotation around described center coupling shaft.First load plate of described several peripheral load plates is connected by a peripheral coupling shaft with second load plate, and first load plate of described peripheral load plate can be realized turn-over respectively with respect to corresponding peripheral support bar rotation around described peripheral coupling shaft with second load plate.Described peripheral support bar further offers a through slot that runs through described peripheral support bar outer side along its length direction, described peripheral coupling shaft is positioned at the described through slot corresponding with it, first load plate of corresponding described peripheral load plate and the both sides that second load plate lays respectively at described through slot, described peripheral coupling shaft can slide along described through slot, makes described peripheral load plate rise or descend along the peripheral support bar corresponding with it.
With respect to prior art, film-plating umbrella stand provided by the invention has following advantage: one, and film-plating umbrella stand is a unitized construction, is different from non-traditional umbrella-shaped structure, is convenient to folding and unfolding and preserves, the space that occupies is less, can save placement space.Its two, the load plate in the film-plating umbrella stand of the present invention can also rotation transformation plated film angle except can whole rotation, can improve homogeneity, compactness and the stress distribution of plated film rete effectively.Its three, liftable peripheral load plate in the film-plating umbrella stand, the plated film element that make to be provided with thereon adds man-hour at plated film, can regulate the distance with target, thereby can control the thickness of plated film element plated film rete.Its four, film-plating umbrella stand one-piece construction of the present invention is simple, is convenient to installation and removal, need not to design to have the complex-curved of radian, helps reducing design cost.Its five, for adopting film-plating umbrella stand of the present invention to be convenient to realize the plated film element that overturns automatically, can avoid the plated film element to be polluted at the plated film element of different surfaces plated film, improve the yield of plated film goods.
Description of drawings
Fig. 1 is the synoptic diagram of the film-plating umbrella stand that provides of one embodiment of the invention, and described film-plating umbrella stand comprises center load plate, peripheral load plate and lifting device.
Fig. 2 is the local enlarged diagram of film-plating umbrella stand shown in Figure 1.
Fig. 3 is the lifting device shown in Figure 1 and the synoptic diagram of peripheral load plate.
Fig. 4 is the view of the peripheral load plate in the film-plating umbrella stand shown in Figure 1 when being adjusted to a certain angle and a certain height.
Fig. 5 is the view of the peripheral load plate in the film-plating umbrella stand shown in Figure 1 when being adjusted to another angle and another height.
Fig. 6 is center load plate in the film-plating umbrella stand shown in Figure 1 and the synoptic diagram behind the peripheral load plate turn-over.
Fig. 7 is the synoptic diagram of traditional film-plating umbrella stand.
The main element nomenclature
Tradition film-plating umbrella stand 10
Bearing holes 12,53
Bracing frame 30
Cross bar 34
Gap 54
Contiguous block 55
Monitor 65
Hawser 67
Film-plating umbrella stand 100
First end 311
Second end 312
Installation end 322
Through slot 324
Drive shaft 361
Monitoring holes 651
Embodiment
Below in conjunction with drawings and Examples the technical program is described in further detail.
See also Fig. 1, one embodiment of the invention provides a kind of film-plating umbrella stand 100, and it comprises 40, four peripheral load plates 50 of 30, one center load plates of a bracing frame, and four lifting devices 60.
Support frame as described above 30 has the centre post 31 of a strip and the peripheral support bar 32 of four strips.Described centre post 31 is positioned at the central position of support frame as described above 30.Described four peripheral support bars 32 serve as the setting that spool is centrosymmetric around described centre post 31 and with described centre post 31.Described centre post 31 has the first relative end 311 and second end 312.Described peripheral support bar 32 has relative coupling end 321 and installation end 322.In the same way four coupling ends 321 are connected with first end 311 of described centre post 31 by a cross bar 34 respectively in described four peripheral support bars 32, thus, described centre post 31 constitutes an integral body with described four peripheral support bars 32 and four cross bars 34, and promptly support frame as described above 30.
In the present embodiment, described four cross bars 34 are in same plane, and the geomery of each described cross bar 34 is all identical, and described four cross bars 34 intersect at first end 311 of described centre post 31.Each described peripheral support bar 32 all is parallel to described centre post 31, and the length dimension of each the described peripheral support bar 32 all length dimension with described centre post 31 is identical.Certainly, the relation between described peripheral support bar 32 and the described centre post 31 is not limited to present embodiment, as, between each described peripheral support bar 32 and the described centre post 31 angle of inclination can be set.
Further, first end 311 of described centre post 31 is connected with the drive shaft 361 of a driving mechanism 36, and to drive support frames as described above 30 be turning axle with the central shaft of described centre post 31 length directions to described driving mechanism 36 and be rotated around it by described drive shaft 361.
In the present embodiment, described center load plate 40 is all identical with shape, structure and the size of described peripheral load plate 50, below, present embodiment is that example describes its structure with peripheral load plate 50.
See also Fig. 2, described peripheral load plate 50 is dull and stereotyped disk, and it is made up of one first load plate 51 and one second load plate 52.Described first load plate 51 and described second load plate 52 all offer the bearing holes 53 of a plurality of carrying plated film elements.Each described bearing holes 53 is all accommodated a plated film element (figure does not show), and the concrete shape and structure of described bearing holes 53 can design according to the concrete shape and structure of the plated film element that is carried, as rectangle, circle.In the present embodiment, described first load plate 51 is semi-circular structure with described second load plate 52, lays respectively at described peripheral support bar 32 both sides, and described first load plate 51 and described second load plate 52 places are in one plane and with respect to described peripheral support bar 32 symmetries.
Have a gap 54 between described first load plate 51 and described second load plate 52, described gap 54 can be passed through described gap 54 more than or equal to the width of described peripheral support bar 32 to guarantee described peripheral support bar 32.The semicircle home position of the semicircle home position of described first load plate 51 and described second load plate 52 is respectively arranged with a contiguous block 55.The installation end 322 of described peripheral support bar 32 is between described two contiguous blocks 55, and described installation end 322 couples together by a coupling shaft 57 with described two contiguous blocks 55, and described coupling shaft 57 is vertical or be basically perpendicular to described peripheral support bar 32.Thus, described first load plate 51 can rotate with respect to described peripheral support bar 32 around described coupling shaft 57 simultaneously with described second load plate 52, described peripheral load plate 50 opposite first 58 can be overturn with second surface 59, that is turn-over, as Fig. 1 and shown in Figure 2.
Be understandable that, described first load plate 51 also can be rotated towards different directions respectively around described coupling shaft 57 with described second load plate 52, thus, can control the plated film processing of the plated film element that described first load plate 51 and described second load plate 52 carried separately respectively.
Be understandable that the installation end 322 of described peripheral support bar 32 can directly be connected between first load plate 51 and second load plate 52 by coupling shaft 57, and does not need contiguous block 55.
Preferably, the sectional dimension of described cross bar 34 is less than or equal to the sectional dimension of described peripheral support bar 32, thus, when the radius of described peripheral load plate 50 greater than described coupling shaft 57 and described cross bar 34 apart from the time, can guarantee that described cross bar 34 can pass through described gap 54.
For need be at the plated film element of different surfaces plated film, when it is carried on the bearing holes 53 of described peripheral load plate 50, driving described first load plate 51 rotates with respect to described peripheral support bar 32 around described coupling shaft 57 with described second load plate 52, can change the plated film element towards the target angle of (figure does not show), thus, can regulate the thickness of plated film element plated film rete; And, rotate with respect to described peripheral support bar 32 around described coupling shaft 57 with described second load plate 52 by driving described first load plate 51, also can make plated film element facing surfaces accept plated film, realize the plated film processing of plated film element different surfaces.
Be understandable that, described coupling shaft 57 can be connected with driving mechanism (figure does not show), thus, and by the control driving mechanism, can realize driving automatically described first load plate 51 and rotate with respect to described peripheral support bar 32 around described coupling shaft 57, can realize automatic turn-over with described second load plate 52.
In the present embodiment, described peripheral load plate 50 is made up of first load plate 51 of a semi-circular structure and second load plate 52 of a semi-circular structure.Certainly, described peripheral load plate 50 also can be made up of the load plate of four quadrntnt structures, and thus, described peripheral load plate 50 can be realized the automatic turn-over of different directions in two orthogonal directions with respect to described peripheral support bar 32 rotations.
See also Fig. 1 and Fig. 2, the center load plate 40 that shape, structure and size are all identical with described peripheral load plate 50, be connected in second end 312 of centre post 31, the syndeton of described center load plate 40 and centre post 31 all is same as the syndeton of described peripheral load plate 50 and described peripheral support bar 32, promptly, center load plate 40 also couples together by two contiguous blocks 55 and a coupling shaft 57 with second end 312 of centre post 31, thus, upset can be realized in two relative surfaces in the load plate 40 of described center.
See also Fig. 3, described lifting device 60 comprises a main part 61, cylinder 63, monitor 65, and hawser 67.Described cylinder 63 is contained in the receiving space of described main part 61, and described cylinder 63 can be around its rotating shaft (figure does not show) with respect to described main part 61 rotations.Described monitor 65 has a monitoring holes 651, and in the present embodiment, the central shaft of described monitoring holes 651 is towards described cylinder 63 and perpendicular to the rotating shaft of described cylinder 63.Described hawser 67 passes described monitoring holes 651 and walks around described cylinder 63.Correspondingly, for realizing being connected of described lifting device 60 and described peripheral support bar 32, described peripheral support bar 32 offers a through slot 324 and a guide hole 325 that communicates with described through slot 324 along its length direction.Described through slot 324 runs through described peripheral support bar 32 outer sides, described coupling shaft 57 is positioned at described through slot 324 and passes described peripheral support bar 32 via described through slot 324, simultaneously, described coupling shaft 57 can slide along described through slot 324, thus, first load plate 51 of described peripheral load plate 50 and second load plate 52 can rise or descend along the peripheral support bar 32 of described through slot 324 with respect to correspondence with described coupling shaft 57.Described hawser 67 passes described monitoring holes 651 and walks around described cylinder 63, and passes to described through slot 324 from described guide hole 325 and to be connected with the coupling shaft 57 of corresponding described peripheral load plate 50.By the described hawser 67 of described lifting device 60 folding and unfoldings, can make described peripheral load plate 50 rise or descend along the peripheral support bar corresponding 32 with it.
Be understandable that, described main part 61 inside can be provided with another cylinder 63 (figure does not show) and be used to twine described hawser 67, thus, described hawser 67 can be walked around the cylinder 63 of main part 61 inside and pass described monitoring holes 651 successively and described guide hole 325 is connected with the coupling shaft 57 of corresponding described peripheral load plate 50.
In the present embodiment, described through slot 324 is perpendicular to the length direction of described peripheral support bar 32.Described guide hole 325 is located at the coupling end 321 of described peripheral support bar 32, and the length direction of described guide hole 325 from the end face of described coupling end 321 along described peripheral support bar 32 passes to described through slot 324.
In the present embodiment, described lifting device 60 is arranged at the coupling end 321 of described peripheral support bar 32, promptly away from an end of described peripheral load plate 50.
Preferably, described lifting device 60 is driven by a motor (figure does not show) and realizes the described hawser 67 of folding and unfolding, drives described peripheral load plate 50 by described hawser 67 and rises or descend along the peripheral support bar corresponding with it 32.Thus, can realize of the up-and-down movement of described peripheral load plate 50 with respect to support frame as described above 30.
Described monitor 65 is used to monitor and measure the distance that the hawser 67 that passes described monitoring holes 651 is moved, that is, described monitor 65 can be measured the distance that described peripheral load plate 50 moves along the peripheral support bar 32 corresponding with it indirectly.
Be understandable that the implementation of measuring the miles of relative movement of described hawser 67 is not limited to the described monitor 65 in the present embodiment.
Be understandable that described peripheral support bar 32 can be provided with the scale of the distance of corresponding described peripheral load plate 50 risings or decline along its length direction.Thus, by the scale on the described peripheral support bar 32, can obtain the information of described peripheral load plate 50 move distances intuitively.Certainly, described peripheral load plate 50 also can directly be shown by the display screen that links to each other with described monitor 65 along the distance that the peripheral support bar corresponding with it 32 rises or descend.
When being arranged at described film-plating umbrella stand 100 in the plated film chamber, rising or descend along the peripheral support bar corresponding 32, can regulate the distance of described peripheral load plate 50 and target with it by the described peripheral load plate 50 of described lifting device 60 controls.Further, the position relation of the plated film element of carrying and target on the fixing described center load plate 40, angle, distance as plated film element and target, and be reference value with the coating film thickness of plated film element of carrying on the described center load plate 40, by controlling the position relation of described peripheral load plate 50 and target, promptly can regulate the coating film thickness of the plated film element of carrying on the described peripheral load plate 50.
Be understandable that, for realizing the coating film thickness and the homogeneity of the plated film element of carrying on the peripheral load plate 50 of monitoring, also can be on described center load plate 40 proportioning controller of installation and measuring thicknesses of layers, the passing ratio controller detects the coating film thickness signal of the plated film element that center load plate 40 carried, and feed back to control center, according to corresponding information, control peripheral load plate 50 liftings or rotation by control center, can regulate the coating film thickness of the plated film element of carrying on the peripheral load plate 50.
See also Fig. 4 and Fig. 5, the view when rotating to different angles and being adjusted to different heights for four in the described film-plating umbrella stand 100 peripheral load plates 50.As can be known, by controlling the angle of rotation of described peripheral load plate 50 with respect to each self-corresponding described peripheral support bar 32, can make described peripheral load plate 50 with different angles towards target, thus, the plated film angle of the plated film element of carrying on the described peripheral load plate 50 of may command, simultaneously, by described lifting device 60, can regulate the distance of described peripheral load plate 50 again with respect to target.Thus, the coating film thickness of the plated film element of carrying on the described peripheral load plate 50 of may command.
See also Fig. 6, be the synoptic diagram behind center load plate 40 in the described film-plating umbrella stand 100 and peripheral load plate 50 turn-overs, wherein, center load plate 40 has turn to relative orientation with peripheral load plate 50 two opposite first 58 separately with second surface 59, that is, center load plate 40 and the second surface 59 of peripheral load plate 50 towards target have turn to and have deviated from target among Fig. 1, and center load plate 40 and peripheral load plate 50 deviate from the first surface 58 of target among Fig. 1, turn to towards target.Thus, the plated film element of carrying can carry out the plated film processing of different surfaces on described center load plate 40 and the described peripheral load plate 50.
Be understandable that, the concrete shape and structure of described film-plating umbrella stand 100 is not limited to present embodiment, according to the plated film processing of reality, centre post 31 and peripheral support bar 32, center load plate 40 and peripheral load plate 50 all can be designed as different sizes and shape.As, the length of peripheral support bar 32 can be greater than or less than the length of centre post 31, the size of peripheral load plate 50 can be greater than or less than the size of center load plate 40, and center load plate 40 can be designed as square oval or asymmetric shape with peripheral load plate 50.As long as the center load plate 40 in the described film-plating umbrella stand 100 can be realized upset with peripheral load plate 50, peripheral load plate 50 of while can rise or descend and get final product along the peripheral support bar 32 of its correspondence.
Be understandable that, the described peripheral load plate 50 of other quantity also can be set in the described film-plating umbrella stand 100, as as described in center load plate 40 around design two, three, five or six as described in peripheral load plate 50, specifically can be provided with according to actual needs.
Be understandable that, described film-plating umbrella stand 100 carrying plated film elements carry out plated film and add man-hour, on the one hand, described center load plate 40 can be with support frame as described above 30 around described centre post 31 rotations, so that the plated film element is accepted the plated film of target material at different directions with described peripheral load plate 50.On the other hand, described center load plate 40 and described peripheral load plate 50 also can each inherent regulation plated film angle or turn-overs.Simultaneously, described peripheral load plate 50 can rise or descend at the peripheral support bar 32 of the control lower edge of described lifting device 60 correspondence, thereby changes the distance of peripheral load plate 50 and target.Thus, both can regulate the plated film rete that is carried on the plated film element on the different peripheral load plates 50, can regulate the plated film element that is carried on same peripheral load plate 50 or the center load plate 40 again, can also make same plated film element facing surfaces accept plated film processing.
Be understandable that, the implementation that peripheral load plate 50 rises or descends along the peripheral support bar corresponding with it 32 is not limited to the lifting device 60 in the present embodiment, also can utilize the peripheral load plate 50 of other structure controls to move along the peripheral support bar 32 corresponding with it, as, peripheral support bar 32 is designed to expansion link mechanism, described peripheral support bar 32 can be stretched along its length direction, perhaps utilize screw mandrel to connect described coupling shaft 57, by rotatablely moving of screw mandrel being converted to the translational motion of coupling shaft 57 along the peripheral support bar 32 corresponding with it, can realize controlling the peripheral load plate 50 edges peripheral support bar 32 corresponding equally and rise or descend, thereby realize regulating the distance of peripheral load plate 50 and target with it.
With respect to prior art, film-plating umbrella stand provided by the invention has following advantage: one, and film-plating umbrella stand is a unitized construction, is different from non-traditional umbrella-shaped structure, is convenient to folding and unfolding and preserves, the space that occupies is less, can save placement space.Its two, the load plate in the film-plating umbrella stand of the present invention can also rotation transformation plated film angle except can whole rotation, can improve homogeneity, compactness and the stress distribution of plated film rete effectively.Its three, liftable peripheral load plate in the film-plating umbrella stand, the plated film element that make to be provided with thereon adds man-hour at plated film, can regulate the distance with target, thereby can control the thickness of plated film element plated film rete.Its four, film-plating umbrella stand one-piece construction of the present invention is simple, is convenient to installation and removal, need not to design to have the complex-curved of radian, helps reducing design cost.Its five, for adopting film-plating umbrella stand of the present invention to be convenient to realize the plated film element that overturns automatically, can avoid the plated film element to be polluted at the plated film element of different surfaces plated film, improve the yield of plated film goods.
In addition, those skilled in the art can also do other variation in spirit of the present invention, and certainly, the variation that these are done according to spirit of the present invention all should be included within the present invention's scope required for protection.
Claims (10)
1. film-plating umbrella stand, it comprises:
A centre post, described centre post can be around the central shaft rotation of its length direction;
A center load plate, described center load plate is arranged on the described centre post;
Several peripheral support bars, described several peripheral support bars center on and are fixed in described centre post; And several peripheral load plates, described several peripheral load plates are arranged at respectively on described several peripheral support bars;
It is characterized in that:
Described center load plate and described several peripheral load plates all are made up of one first load plate and one second load plate at least, first load plate of described center load plate is connected by a center coupling shaft with second load plate, and first load plate of described center load plate and second load plate can be realized turn-over respectively with respect to described centre post rotation around described center coupling shaft; First load plate of described several peripheral load plates is connected by a peripheral coupling shaft with second load plate, and first load plate of described peripheral load plate can be realized turn-over respectively with respect to corresponding peripheral support bar rotation around described peripheral coupling shaft with second load plate; Described peripheral support bar further offers a through slot that runs through described peripheral support bar outer side along its length direction, described peripheral coupling shaft is positioned at the described through slot corresponding with it, first load plate of corresponding described peripheral load plate and the both sides that second load plate lays respectively at described through slot, described peripheral coupling shaft can slide along described through slot, makes described peripheral load plate rise or descend along the peripheral support bar corresponding with it.
2. film-plating umbrella stand as claimed in claim 1, it is characterized in that, described film-plating umbrella stand further comprises at least one lifting device, described at least one lifting device is connected with the peripheral coupling shaft of at least one described peripheral load plate, and described lifting device is used to drive corresponding described peripheral load plate and rises or descend along the peripheral support bar corresponding with it.
3. film-plating umbrella stand as claimed in claim 2 is characterized in that, described lifting device comprises that a cylinder, one have the monitor of monitoring holes, and hawser; Described peripheral support bar further offers a guide hole that communicates with described through slot from the end along its length direction; Described hawser is walked around described cylinder and is passed described monitoring holes successively and described guide hole is connected with the peripheral coupling shaft of corresponding described peripheral load plate; The described hawser of described lifting device folding and unfolding makes described peripheral load plate rise or descend along the peripheral support bar of described through slot with respect to correspondence with described peripheral coupling shaft; The folding and unfolding length of the described hawser of described monitor monitors.
4. film-plating umbrella stand as claimed in claim 3, it is characterized in that, described lifting device is arranged in the described peripheral support bar end away from described peripheral load plate, described lifting device is driven by a motor and realizes the described hawser of folding and unfolding, makes described peripheral load plate rise or descend along the peripheral support bar corresponding with it.
5. film-plating umbrella stand as claimed in claim 1, it is characterized in that, described film-plating umbrella stand further comprises several cross bars, described several peripheral support bars are symmetrical arranged with respect to described centre post, described peripheral support bar is parallel to described centre post, and is connected by described cross bar between described centre post and the described peripheral support bar.
6. film-plating umbrella stand as claimed in claim 1 is characterized in that, described center coupling shaft is perpendicular to described centre post, and described peripheral coupling shaft is perpendicular to the described peripheral support bar of correspondence.
7. film-plating umbrella stand as claimed in claim 1, it is characterized in that, first load plate of described center load plate and second load plate be with respect to described centre post symmetry, and first load plate of described several peripheral load plates and second load plate are with respect to the described peripheral support bar symmetry corresponding with it.
8. as each described film-plating umbrella stand in the claim 1 to 7, it is characterized in that, described center load plate and described peripheral load plate are dull and stereotyped disk, and described centre post is connected with described center load plate or described peripheral load plate with the central position of described peripheral load plate at described center load plate respectively with described peripheral support bar.
9. as each described film-plating umbrella stand in the claim 1 to 7, it is characterized in that, first load plate and second load plate of described center load plate or described peripheral load plate are semi-circular structure, and are symmetricly set in the both sides of described centre post or described peripheral support bar respectively.
10. film-plating umbrella stand as claimed in claim 9, it is characterized in that, the semicircle home position of first load plate of described center load plate or described peripheral load plate and the semicircle home position of second load plate are respectively arranged with a contiguous block, and described contiguous block couples together by described center coupling shaft or described peripheral coupling shaft and described centre post or described peripheral support bar.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201010192237.6A CN102268652B (en) | 2010-06-04 | 2010-06-04 | Film-plating umbrella stand |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201010192237.6A CN102268652B (en) | 2010-06-04 | 2010-06-04 | Film-plating umbrella stand |
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| CN102268652A true CN102268652A (en) | 2011-12-07 |
| CN102268652B CN102268652B (en) | 2014-04-30 |
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| CN201010192237.6A Expired - Fee Related CN102268652B (en) | 2010-06-04 | 2010-06-04 | Film-plating umbrella stand |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN104109841A (en) * | 2014-07-23 | 2014-10-22 | 中国科学院上海光学精密机械研究所 | Magnetron sputtering coating equipment employing glancing angle deposition |
| CN107916409A (en) * | 2017-11-27 | 2018-04-17 | 深圳市华星光电半导体显示技术有限公司 | A kind of part switching device and deposition system |
| TWI754564B (en) * | 2020-03-18 | 2022-02-01 | 陸昇科技有限公司 | Vapor deposition apparatus |
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|---|---|---|---|---|
| CN104109841A (en) * | 2014-07-23 | 2014-10-22 | 中国科学院上海光学精密机械研究所 | Magnetron sputtering coating equipment employing glancing angle deposition |
| CN107916409A (en) * | 2017-11-27 | 2018-04-17 | 深圳市华星光电半导体显示技术有限公司 | A kind of part switching device and deposition system |
| WO2019100557A1 (en) * | 2017-11-27 | 2019-05-31 | 深圳市华星光电半导体显示技术有限公司 | Part switching device and evaporation system |
| CN107916409B (en) * | 2017-11-27 | 2019-11-26 | 深圳市华星光电半导体显示技术有限公司 | A kind of part switching device and deposition system |
| TWI754564B (en) * | 2020-03-18 | 2022-02-01 | 陸昇科技有限公司 | Vapor deposition apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| CN102268652B (en) | 2014-04-30 |
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