JPS616273A - Upsetting device for work - Google Patents
Upsetting device for workInfo
- Publication number
- JPS616273A JPS616273A JP12632884A JP12632884A JPS616273A JP S616273 A JPS616273 A JP S616273A JP 12632884 A JP12632884 A JP 12632884A JP 12632884 A JP12632884 A JP 12632884A JP S616273 A JPS616273 A JP S616273A
- Authority
- JP
- Japan
- Prior art keywords
- works
- vacuum
- machine frame
- attached
- workpiece
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
- C23C14/505—Substrate holders for rotation of the substrates
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
【発明の詳細な説明】
本発明は主として真空蒸着その他の真空処理装置に適用
されるワークの反転装置に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a workpiece reversing device mainly applied to vacuum evaporation and other vacuum processing apparatuses.
従来この種処理装置として、例えば真空処理室内の上方
にモータ等により回転される機枠を設け、これに半導体
基板その他のワークを複数枚取付けて各ワークに下方の
蒸発源からの蒸発物質を薄膜状に形成する処理を施づよ
うにしたものが知られているが、該ワークは蒸発源に対
向する面のみが処理されるのでワークの表裏両面の処理
が要求される場合ワークを反転する必要がある。この反
転は処理室内の真空を相持したまま行なえることが処理
時間の短縮のために好ましく、またその反転の手段は真
空室内の清浄さの維持のために簡単な構成であることが
望まれる。Conventionally, this type of processing equipment has a machine frame rotated by a motor or the like above the vacuum processing chamber, a plurality of semiconductor substrates and other workpieces attached to this frame, and a thin film of evaporated material from an evaporation source below is applied to each workpiece. There is a known method that processes the workpiece to form a shape, but since only the surface facing the evaporation source is processed, the workpiece must be reversed if both the front and back sides of the workpiece are required to be processed. There is. It is preferable that this reversal can be carried out while maintaining the vacuum in the processing chamber in order to shorten the processing time, and it is desirable that the means for reversing the apparatus be of a simple construction in order to maintain the cleanliness within the vacuum chamber.
本発明はワークの５１′ｌ即時聞を短縮すると共に構成
の簡単な反転装−を提供することをその目的とするもの
で、真空処ｌ！Ｉｌ室内に回転自在の機枠を設け、これ
にワークを取付けて該ワークに真空蒸着その他の処理を
施す式のものに於て、該機枠に、支軸により支承され目
つばねにより一方向への旋回力が付与されたワークホル
ダを設けると共に、該ワークホルダをその旋回力を保持
して停止させるス１〜ツバを設け、該真空処理室に該機
枠の一方への回転時に該スＩ・ツバに解除作動を与える
ブラケットを設けたことを特徴とする。The object of the present invention is to provide a reversing device which shortens the time required for a workpiece to be subjected to vacuum processing and which has a simple structure. In a type of machine in which a rotatable machine frame is provided in the room, a workpiece is attached to the machine frame, and vacuum deposition or other processing is performed on the workpiece, the machine frame is supported by a spindle and is fixed in one direction by an eye spring. A work holder to which a turning force is applied is provided, and a collar for holding the turning force and stopping the work holder is provided in the vacuum processing chamber. It is characterized in that a bracket is provided on the I-flange to provide a release action.
本発明の実施例を図面につき説明するに、第１図に於て
符号（１）は真空排気される真空処理室、（２）は該真
空処理室（１）の下方の回転軸（３）と一体のジ」イン
ｌ−（４）に取付けられた正逆回転自在の機枠、（５）
は該処理室（１）の下方に設けた蒸発源を示し、該機枠
（２）と蒸発源（５）の中間に介在させたシャッタ（０
）が側方に退去すると該蒸発源（５）からの蒸発物質が
該機枠（２）に取付けた板状のワーク（１）の蒸発源（
５）に向いた而（７ａ）に付着して薄膜形成処理が施さ
れる。An embodiment of the present invention will be described with reference to the drawings. In FIG. 1, reference numeral (1) indicates a vacuum processing chamber to be evacuated, and (2) indicates a rotating shaft (3) below the vacuum processing chamber (1). Machine frame (5) that can be rotated in forward and reverse directions, attached to the engine l-in (4), which is integrated with the
indicates an evaporation source provided below the processing chamber (1), and a shutter (0) interposed between the machine frame (2) and the evaporation source (5).
) retreats to the side, the evaporated substances from the evaporation source (5) reach the evaporation source (of the plate-shaped workpiece (1) attached to the machine frame (2))
It adheres to the area (7a) facing 5) and undergoes a thin film forming process.
該機枠（２）は例えば第２図及び第３図に明示Ｊるよう
にフレーム（ロ）で形成された６ＷＡの台形枠から成る
概略傘形の枠で構成し、台枠の一辺にこれど相似形のワ
ーク（７）を保持するワークホルダ（９）を取付けした
。該ワークホルダ（９）はワーク（７）の両面を挟んで
保持部る保持部（９ａ）とフレーム（０）に軸着される
軸部（９ｂ）を備え、一端をフレーム（ロ）に固定した
コイルばね（ト）を巻き上げてその他端をワーク（７）
の面に係合さＵることににり該ワークホルダ（９）に一
方向即ちばね（社））の戻り右向の旋回力が与えられる
にうにした。（１１）は該機枠（２）のフレーム（８）
に軸１２１）で軸着した一方向に回転可能なストッパを
示し、該ストッパａＯの先端部（ｌｌａ）をワーク（７
）の端部に係合させるとばね＠）により与えられた旋回
力を保有した状態でワークホルダ（９）の旋回を停止さ
けることが出来る。The machine frame (2) is constituted by a generally umbrella-shaped frame made of a 6WA trapezoidal frame formed by a frame (B), as clearly shown in FIGS. 2 and 3, and one side of the frame has this. A work holder (9) was attached to hold a work (7) of similar shape. The work holder (9) includes a holding part (9a) that holds both sides of the work (7) and a shaft part (9b) that is pivoted to the frame (0), and one end is fixed to the frame (B). Wind up the coil spring (G) and attach the other end to the workpiece (7)
By engaging with the surface of the work holder (9), a turning force is applied to the work holder (9) in one direction, that is, in the right direction. (11) is the frame (8) of the machine frame (2)
A stopper rotatable in one direction is shown attached to the shaft 121), and the tip (lla) of the stopper aO is connected to the workpiece (7).
) can prevent the work holder (9) from stopping while retaining the turning force applied by the spring ().
該ストッパＣ０の後端部（１１ｂ）は機枠（２）が回転
した時真空処理室（１）に段重」たブラケットＯ■と衝
突し得るように延長される。６３）は該ス１〜ツバ００
と一体の当り片（１１ｃ）と当接して回転をＩｔ、Ｉｔ
限するビンである。ブラケット（＋２１の詳細は第４図
乃至第６図の如くであり台座−）にＲ部ａωを有Ｊ゛る
傾動杆（＋６）を軸着し、これに必要に応じて傾動杆６
６）の起立用のばね０７）を付設して構成され、ストッ
パＯＯの後端部（１１ｂ）が矢印方向に当ると傾動打Ｑ
６）が倒れてストッパ６０に解除作動は与えず、その逆
方向から当ると傾動扛６のは倒れずストッパＯ０が倒れ
てワーク（７）及びワークホルダ（０）の旋回を許容す
る解除作動を行なう。６Ｂ）は回転軸（３）を正逆に回
転させるモータ、Ｑ９）はフレーム（８）に設置プたワ
ーク（７）の旋回防止片である。The rear end (11b) of the stopper C0 is extended so that when the machine frame (2) rotates, it can collide with the bracket O2 placed in the vacuum processing chamber (1). 63) is the s1 to brim 00
It contacts with the contact piece (11c) integrated with and rotates It, It
It is a limited bottle. A tilting rod (+6) having an R portion aω is pivotally attached to the bracket (the details of +21 are as shown in FIGS. 4 to 6, and the pedestal is -), and the tilting rod 6 is attached to this as necessary.
6) is provided with a spring 07) for standing up, and when the rear end (11b) of the stopper OO hits in the direction of the arrow, the tilting stroke Q
6) falls down and does not release the stopper 60, and when it is hit from the opposite direction, the tilting arm 6 does not fall and the stopper O0 falls, causing a release action that allows the workpiece (7) and work holder (0) to rotate. Let's do it. 6B) is a motor that rotates the rotary shaft (3) in forward and reverse directions, and Q9) is a rotation prevention piece for the workpiece (7) installed on the frame (8).
尚、図示の例では機枠（２）のワークホルダ（９）と対
向する位置にもフリー回転のホルダ■を設け、両ホルダ
（９）（イ）の共同で安定にワーク（７）を支承出来る
ようにした。In the illustrated example, a freely rotating holder ■ is also provided on the machine frame (2) at a position facing the work holder (9), and both holders (9) and (a) jointly support the work (7) stably. I made it possible.
その作動を説明するに、機枠（２）の各ワークホルダ（
０）にワーク（７）を保持させ、これらを１８０″′旋
回させるとばね（ト）が巻かれてワークホルダ（９）に
は旋回力が付与される。次でストッパ００で第３図示の
ようにワーク（７）の側部を係止するとワークホルダ（
９）はばね（ト）の旋回力を保持して停止状態となる。To explain its operation, each work holder (
When the workpiece (7) is held by the stopper 00 and rotated by 180'', the spring (g) is wound and a turning force is applied to the workpiece holder (9). When the side of the workpiece (7) is locked as shown, the workpiece holder (
9) maintains the turning force of the spring (g) and comes to a halt.
こうして機枠（２）にワーク（７）のセットが終ると真
空処理室（１）内に持込まれ回転軸（３）に取付けられ
る。該処理室（１）内を真空化し機枠（２）を回転させ
乍ら蒸発１ （５）を作動するとワーク（７）の下面（
７ａ）に蒸発物質が付＠するが、この場合の機枠（２）
は第２図の矢印方向に回転されるもので、ブラケット０
２は各ストッパ０１）になぎ倒され、ストッパ０９はワ
ークホルダ（０）の旋回力を解除することがない。該下
面（７ａ）の処理が終るとワーク（７）を反転し、その
背面の処理を行なうが、その場合機枠（２）を前記と逆
回転すると各ス］・ツバＯＯはブラケットＱ２の逆側か
ら当り、ブラケット０２が倒れず各ストッパ６０が順次
側れる。各ワーク（７）の端部からストッパ６０が離れ
るとワークホルダ（９）はばね（ト）の旋回力で１８０
°旋回し、ワーク（７）の他端部が旋回防止片００に当
って止るとその反転が終り、ワーク（７）の新たな面が
蒸発源（５）に面する。そのまま機枠（２）の回転を続
ければ新たな面を処理することが出来、その際ストッパ
ＯＯはブラケット０２１により倒され続けるが、ワーク
ホルダ（９）の旋回力は既に解放済みであるのでワーク
（７）は反転しない。After the workpiece (7) has been set in the machine frame (2) in this manner, it is brought into the vacuum processing chamber (1) and attached to the rotating shaft (3). When the inside of the processing chamber (1) is evacuated and the machine frame (2) is rotated while evaporation 1 (5) is activated, the lower surface (
7a) has an evaporated substance @, but in this case, the machine frame (2)
is rotated in the direction of the arrow in Figure 2, and the bracket 0
2 is swept down by each stopper 01), and the stopper 09 does not release the turning force of the work holder (0). When the lower surface (7a) has been processed, the workpiece (7) is reversed and the back surface is processed.In this case, when the machine frame (2) is rotated in the opposite direction to the above, the collar OO will be placed in the opposite direction of the bracket Q2. Since the bracket 02 is hit from the side, each stopper 60 is sequentially moved to the side without falling down. When the stopper 60 separates from the end of each workpiece (7), the workpiece holder (9) is rotated 180 degrees by the turning force of the spring (g).
When the other end of the workpiece (7) hits the rotation prevention piece 00 and stops, the reversal ends and the new surface of the workpiece (7) faces the evaporation source (5). If the machine frame (2) continues to rotate, a new surface can be processed, and in this case, the stopper OO will continue to be pushed down by the bracket 021, but since the turning force of the work holder (9) has already been released, the work (7) is not reversed.
このように本発明によるときは回転自在の機枠に旋回力
を保有したワークホルダとその旋回力を保有させてワー
クホルダを停止させるストッパを設け、該機枠一方への
回転時にブラケットがストッパを作動させてワークホル
ダの旋回を許容りるようにしたので機枠の同転方向を変
えるだけでワークホルダに取付けたワークの反転を行な
え、その反転作動は機枠の１回転で終了さｔ！得るので
反転時間が短く、負空処理室内に大気を導入することな
く真空としたまま反転を行なうのでワークの処理時間を
短縮出来、ワークホルダはばねにより自転するので特別
の動力源が不要で構成が簡単になる等の効果がある。In this way, according to the present invention, a rotatable machine frame is provided with a work holder having a turning force and a stopper that stops the work holder by holding the turning force, and when the machine frame rotates in one direction, the bracket engages the stopper. Since it is activated to allow the work holder to rotate, the work mounted on the work holder can be reversed simply by changing the direction of rotation of the machine frame, and the reversal operation is completed with one rotation of the machine frame! The workpiece processing time can be shortened because the workpiece is turned over while the vacuum is maintained without introducing atmospheric air into the negative air processing chamber, and the workpiece holder rotates on its own axis with a spring, so no special power source is required. This has the effect of making things easier.
第１図は本発明の実施例の截断側面図、第２図は第１図
のＩ−ＩＩ線部分の平面図、第３図は第１図のｍ−■線
部分の拡大図、第４図は第１図のＴＶ −ＩＶ線部分の
拡大図、第５図はその平面図、第６図は傾倒杆の側面図
である。
（１）・・・真空処理室、 （２）・・・機枠、（７）
・・・ワーク、（０）・・・ワークホルダ、（至）・・
・ばね、００・・・ストッパ、 ０２１・・・ブラケ
ット特開口ａＧ１−６２７３（４）1 is a cutaway side view of an embodiment of the present invention, FIG. 2 is a plan view of the section taken along line I-II in FIG. 1, FIG. 3 is an enlarged view of the section taken along line m-■ in FIG. 1, and FIG. The figure is an enlarged view of the TV-IV line portion of FIG. 1, FIG. 5 is a plan view thereof, and FIG. 6 is a side view of the tilting rod. (1)...Vacuum processing chamber, (2)...Machine frame, (7)
...Work, (0)...Work holder, (to)...
・Spring, 00... Stopper, 021... Bracket special opening aG1-6273 (4)
Claims (1)
取付けて該ワークに真空蒸着その他の処理を施す式のも
のに於て、該機枠に、支軸により支承され且つばねによ
り一方向への旋回力が付与されたワークホルダを設ける
と共に該ワークホルダをその旋回力を保持して停止させ
るストッパを設け、該真空処理室に該機枠の一方への回
転時に該ストッパに解除作動を与えるブラケットを設け
たことを特徴とするワークの反転装置。In a type of machine in which a rotatable machine frame is provided in a vacuum processing chamber, a workpiece is attached to the machine frame, and vacuum deposition or other processing is performed on the workpiece, the machine frame is supported by a spindle and rotated in one direction by a spring. A work holder to which a turning force is applied is provided, and a stopper for stopping the work holder while holding the turning force is provided in the vacuum processing chamber, and the stopper is actuated to release when the machine frame rotates in one direction. A workpiece reversing device characterized by being provided with a bracket.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12632884A JPS616273A (en) | 1984-06-21 | 1984-06-21 | Upsetting device for work |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12632884A JPS616273A (en) | 1984-06-21 | 1984-06-21 | Upsetting device for work |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS616273A true JPS616273A (en) | 1986-01-11 |
Family
ID=14932463
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12632884A Pending JPS616273A (en) | 1984-06-21 | 1984-06-21 | Upsetting device for work |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS616273A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2602244A1 (en) * | 1986-07-31 | 1988-02-05 | Satis Vacuum Ag | INSTALLATION FOR THE VACUUM APPLICATION OF OPTICAL COATINGS |
| JP2000303167A (en) * | 1999-04-19 | 2000-10-31 | Hoya Corp | Vapor deposition device for lens |
| EP1050597A2 (en) * | 1999-05-04 | 2000-11-08 | Satis Vacuum Industries Vertriebs - AG | Vacuum coating apparatus |
| CN102268652A (en) * | 2010-06-04 | 2011-12-07 | 鸿富锦精密工业（深圳）有限公司 | Film-plating umbrella stand |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58128724A (en) * | 1982-01-27 | 1983-08-01 | Hitachi Ltd | Wafer inverting apparatus |
-
1984
- 1984-06-21 JP JP12632884A patent/JPS616273A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58128724A (en) * | 1982-01-27 | 1983-08-01 | Hitachi Ltd | Wafer inverting apparatus |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2602244A1 (en) * | 1986-07-31 | 1988-02-05 | Satis Vacuum Ag | INSTALLATION FOR THE VACUUM APPLICATION OF OPTICAL COATINGS |
| JP2000303167A (en) * | 1999-04-19 | 2000-10-31 | Hoya Corp | Vapor deposition device for lens |
| EP1050597A2 (en) * | 1999-05-04 | 2000-11-08 | Satis Vacuum Industries Vertriebs - AG | Vacuum coating apparatus |
| EP1050597A3 (en) * | 1999-05-04 | 2004-01-21 | Satis Vacuum Industries Vertriebs - AG | Vacuum coating apparatus |
| CN102268652A (en) * | 2010-06-04 | 2011-12-07 | 鸿富锦精密工业（深圳）有限公司 | Film-plating umbrella stand |
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