CN105861992A - Evaporation device - Google Patents
Evaporation device Download PDFInfo
- Publication number
- CN105861992A CN105861992A CN201610251510.5A CN201610251510A CN105861992A CN 105861992 A CN105861992 A CN 105861992A CN 201610251510 A CN201610251510 A CN 201610251510A CN 105861992 A CN105861992 A CN 105861992A
- Authority
- CN
- China
- Prior art keywords
- crucible
- load plate
- evaporation
- evaporation source
- switching device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Electroluminescent Light Sources (AREA)
Abstract
The invention provides an evaporation device. The evaporation device comprises a vacuum cavity (11), evaporation sources (12) arranged in the vacuum cavity (11), and crucible switchover devices (13) arranged above the evaporation sources (12), wherein each crucible switchover device (13) comprises a crucible carrying disc (10), a plurality of crucibles (30) arranged on the crucible carrying disc (10), and a moving shaft (20) arranged at the bottom of the crucible carrying disc (10) and vertically connected with the crucible carrying disc (10); the moving shafts are controlled to drive the crucible carrying discs to rotate and carry out lifting movement, so as to realize crucible switchover on the evaporation sources under a vacuum environment, and realize correspondence between one evaporation source and the plurality of crucibles; and therefore, the loading number of the crucibles is increased, the number of the evaporation sources is reduced, the period of cavity-opening charge is prolonged, the production efficiency is increased, and the equipment cost is reduced.
Description
Technical field
The present invention relates to OLED and show manufacturing technology field, particularly relate to a kind of evaporation coating device.
Background technology
In recent years, liquid crystal display (Liquid Crystal Display, LCD) device and Organic Light Emitting Diode
The flat-panel monitors such as (Organic Light Emitting Diode, OLED) display the most progressively replace
CRT monitor, becomes the main product in monitor market.Wherein, OLED display has spontaneous
Light, driving voltage are low, luminous efficiency is high, the response time is short, definition is high, nearly 180 ° with contrast
Visual angle, use temperature range width, can realize the plurality of advantages such as Flexible Displays and large area total colouring, quilt
Industry is known as the display being there is most development potentiality.
OLED display device is generally by anode, negative electrode and folder Organic Electricity between the anode and cathode
Electroluminescent material layer constitute, electroluminescent organic material layer include again hole injection layer, hole transmission layer,
Luminescent layer, electron transfer layer and electron injecting layer.The luminescence mechanism of OLED display device is from yin, yang
The two poles of the earth are injected separately into electronics and hole, and the electronics and the hole that are injected into are combined in luminescent layer through transmission, from
And excite luminescent layer molecule produce singlet exciton, singlet exciton attenuation and luminous.
At present, preparation OLED display device main way is heating in vacuum plated film, i.e. in vacuum cavity
Use crucible heating OLED material so that it is distilling at a certain temperature or melting is vaporized into steam, thoroughly
The perforate crossed on metal mask plate is deposited on substrate.
Refer to the structural representation that Fig. 1, Fig. 1 are existing a kind of OLED evaporation coating device, should
OLED evaporation coating device is the OLED evaporated device of point source, including: vacuum cavity 1, be located at described very
Multiple vapor deposition source 2 in cavity body 1 and with the described the most multiple crucible of vapor deposition source 2 (not
Diagram), it is limited to the size of vacuum cavity 1, the evaporation can arranged in this OLED evaporation coating device
The quantity in source 2 is limited (being usually no more than 10), namely the quantity being every time loaded into crucible also has
Limit, after the material in crucible is evaporated, it is impossible to realize in the environment of vacuum the loading of new crucible with
Replace, be only switched into next evaporation source and use or again begin to speak to feed.As an example it is assumed that should
OLED evaporation coating device comprises 10 vapor deposition source and 10 crucibles, and each crucible can fill 100 grams have
Machine material, is deposited with according to normal plating rate, consumes 3 grams of organic materials per hour and calculates, in 10 crucibles
All organic materials all make the time being finished be about 333 hours, are roughly equal to 14 days, i.e. at most every two weeks just
Must begin to speak to feed, if plating rate improves again, this cycle also will become shorter, and charging of beginning to speak is made
Industry is switched on vacuum cavity, carries out interpolation or the replacement of material, the most again extract under atmospheric condition
Vacuum just can work on, strong influence production efficiency and the continuity of volume production.This OLED steams simultaneously
Plating appts often increases a crucible be accomplished by increasing an evaporation source, cause its equipment cost to be in not
Under.
Summary of the invention
It is an object of the invention to provide a kind of evaporation coating device, by increasing capacitance it is possible to increase the quantity that crucible is loaded into, reduce
The quantity of vapor deposition source, extends the cycle of charging of beginning to speak, improves production efficiency, reduce equipment cost.
For achieving the above object, the present invention provides a kind of evaporation coating device, including: vacuum chamber, be located at described
Evaporation source in vacuum chamber and be located at the crucible switching device above described evaporation source；
Described crucible switching device includes: crucible load plate, the multiple crucibles being located on described crucible load plate,
And it is located at the kinematic axis being vertically connected bottom described crucible load plate with described crucible load plate；
Described crucible load plate is provided with multiple through hole, and in each through hole, correspondence is placed with a crucible；
Described kinematic axis drives described crucible load plate to rotate around the axis of described kinematic axis so that crucible load plate
On crucible and evaporation source contraposition, described kinematic axis drives axial along described kinematic axis of described crucible load plate
Rise or fall so that crucible separates with evaporation source or crucible is put into evaporation source.
Described crucible load plate generally circular in shape, the plurality of through hole is uniformly distributed in crucible load plate described in
Concentrically ringed circumference on, described kinematic axis is located at the central point of the bottom of described crucible load plate.
The top diameter of described crucible is more than institute more than the base diameter of described crucible, the diameter of described through hole
State the base diameter top diameter less than described crucible of crucible.
The quantity of described evaporation source is 2 to 10, and the quantity of described crucible switching device is less than or equal to institute
Stating the quantity of evaporation source, the quantity of the crucible on the crucible load plate of each crucible switching device is 2 to 10
Individual.
Described evaporation source is uniformly distributed on the circumference of a circle.
The quantity of described crucible switching device is less than the quantity of described evaporation source, each crucible switching device pair
Should multiple evaporation sources.
The quantity of described crucible switching device is equal to the quantity of described evaporation source, each crucible switching device pair
Answer an evaporation source.
The quantity of described evaporation source and crucible switching device is 3.
The quantity of the crucible on the crucible load plate of each crucible switching device is 10.
Beneficial effects of the present invention: the evaporation coating device that the present invention provides, including: vacuum chamber, be located at described
Evaporation source in vacuum chamber and be located at the crucible switching device above described evaporation source, wherein, described
Crucible switching device includes: crucible load plate, the multiple crucibles being located on described crucible load plate and be located at
The kinematic axis being vertically connected with described crucible load plate bottom described crucible load plate, by controlling described kinematic axis
The crucible that described crucible load plate rotates and elevating movement realizes completing under vacuum conditions in vapor deposition source is driven to cut
Change, it is achieved the corresponding multiple crucibles of vapor deposition source, thus increase the quantity that crucible is loaded into, reduce vapor deposition source
Quantity, extend begin to speak charging cycle, improve production efficiency, reduce equipment cost.
Accompanying drawing explanation
In order to be able to be further understood that inventive feature and technology contents, refer to below in connection with this
Bright detailed description and accompanying drawing, but accompanying drawing only provides reference and explanation use, is not used for adding the present invention
To limit.
In accompanying drawing,
Fig. 1 is the structural representation of existing evaporation coating device；
Fig. 2 is the structural representation of the evaporation coating device of the present invention；
Fig. 3 be the present invention evaporation coating device in the three-dimensional structure diagram of crucible switching device and evaporation source；
Fig. 4 be the present invention evaporation coating device in the structural representation of crucible.
Detailed description of the invention
By further illustrating the technological means and effect thereof that the present invention taked, below in conjunction with the present invention's
Preferred embodiment and accompanying drawing thereof are described in detail.
Referring to Fig. 2, the present invention provides a kind of evaporation coating device, including: vacuum chamber 11, be located at described very
Evaporation source 12 in cavity 11 and be located at the crucible switching device 13 above described evaporation source 12.
Specifically, referring to Fig. 3, described crucible switching device 13 includes: crucible load plate 10, be located at institute
State the multiple crucibles 30 on crucible load plate 10 and be located at bottom described crucible load plate 10 with described crucible
The kinematic axis 20 that load plate 20 is vertically connected.
Further, described crucible load plate 10 is provided with multiple through hole 50, corresponding in each through hole 50
It is placed with a crucible 30, in conjunction with Fig. 4, the top diameter D of described crucible 30 more than described crucible 30
Base diameter d, the diameter of described through hole 50 more than the base diameter d of described crucible 30 less than described
The top diameter D of crucible 30, so that crucible 30 is steadily positioned on through hole 50, and will not fall
Fall, and can contact with evaporation source 12 when declining.
Specifically, the crucible handoff procedure of described evaporation coating device is: first, and described kinematic axis 20 drives institute
Stating crucible load plate 10 rising makes the crucible 30 being evaporated separate with described vapor deposition source 12, then,
Described kinematic axis 20 drives described crucible load plate 10 to rotate around the axis of described kinematic axis 20 so that crucible
Another crucible 30 on load plate 10 and evaporation source 12 contraposition, described kinematic axis 20 drives described crucible
Another crucible 30, along the axial decline of described kinematic axis 20, is put in evaporation source 12 by load plate 10,
Complete the switching of crucible.Whole handoff procedure need not open vacuum chamber 11, under vacuum conditions can be complete
Become, simple and fast.
Further, described kinematic axis 20 includes: rotary shaft 21 and be sheathed on described rotary shaft 21
Interior lifting shaft 22, described lifting shaft 22 is connected with described crucible load plate 10, drives described crucible load plate
10 oscilaltions, described rotary shaft 21 drives described lifting shaft 22 and crucible load plate 10 to rotate.
Specifically, described crucible load plate 10 generally circular in shape, the plurality of through hole 50 is uniformly distributed in
On the concentrically ringed circumference of crucible load plate 10 described in, described kinematic axis 20 is located at described crucible load plate 10
The central point of bottom.
Specifically, the quantity of described evaporation source 12 selects, extremely according to the size of described vacuum chamber 11
It is 2 less, the most not can exceed that the upper limit (such as 10) that described vacuum chamber 11 can accommodate, and described
The quantity of crucible switching device 13 is less than or equal to the quantity of described evaporation source 12.Wherein, when described earthenware
When the quantity of crucible switching device 13 is less than the quantity of described evaporation source 12, each crucible switching device 13 is right
Answer multiple evaporation sources 12, when the quantity of described crucible switching device 13 is equal to the quantity of described evaporation source 12
Time, the corresponding evaporation source 12 of each crucible switching device 13.
Preferably, the quantity of the crucible 30 on the crucible load plate 10 of each crucible switching device 13 is 2 to arrive
10, described evaporation source 12 is uniformly distributed on the circumference of a circle.
If it should be noted that the quantity of described evaporation source 12 and crucible switching device 13 is 3,
The quantity of the crucible 30 on the crucible load plate 10 of each crucible switching device 13 is 10, then one true
Cavity 11 can be loaded into 30 crucibles 30, is 3 times of prior art, significantly increases crucible 30
Loading, and 30 crucibles 30 have only to 3 evaporation sources 2, evaporation source 2 quantity is prior art
1/10, these 30 crucibles can complete switching under vacuum conditions by crucible switching device, say, that one
Secondary charging operation of beginning to speak can fill the material of 30 crucibles, in the case of plating rate is identical, is greatly prolonged
Begin to speak cycle of charging, thus improve production efficiency, reduce equipment cost.
In sum, the evaporation coating device of the present invention, including: vacuum chamber, the steaming being located in described vacuum chamber
Rise and be located at the crucible switching device above described evaporation source, wherein, described crucible switching device
Including: crucible load plate, the multiple crucibles being located on described crucible load plate and be located at described crucible load plate
The kinematic axis that bottom is vertically connected with described crucible load plate, drives described crucible by controlling described kinematic axis
The crucible that load plate rotates and elevating movement realizes completing in vapor deposition source under vacuum conditions switches, it is achieved one
The corresponding multiple crucibles of vapor deposition source, thus increase the quantity that crucible is loaded into, reduce the quantity of vapor deposition source, extend
Begin to speak the cycle fed, improve production efficiency, reduce equipment cost.
The above, for the person of ordinary skill of the art, can be according to the technical side of the present invention
Other various corresponding changes and deformation are made in case and technology design, and all these change and deformation are all answered
Belong to the protection domain of appended claims of the present invention.
Claims (9)
1. an evaporation coating device, it is characterised in that including: vacuum chamber (11), be located at described vacuum chamber
(11) evaporation source (12) in and be located at the crucible switching device of described evaporation source (12) top
(13)；
Described crucible switching device (13) including: crucible load plate (10), is located at described crucible load plate
(10) multiple crucibles (30) on and be located at described crucible load plate (10) bottom and carry with described crucible
The kinematic axis (20) that dish (20) is vertically connected；
Described crucible load plate (10) is provided with multiple through hole (50), and each through hole (50) interior correspondence is put
It is equipped with a crucible (30)；
Described kinematic axis (20) drives the described crucible load plate (10) axis around described kinematic axis (20)
Rotate so that the crucible (30) on crucible load plate (10) and evaporation source (12) contraposition, described motion
Axle (20) drive described crucible load plate (10) along described kinematic axis (20) axially carry out rise or under
Fall so that crucible (30) separates with evaporation source (12) or crucible (30) is put into evaporation source (12)
In.
2. evaporation coating device as claimed in claim 1, it is characterised in that described crucible load plate (10)
Generally circular in shape, the plurality of through hole (50) is uniformly distributed in the concentric of crucible load plate (10) described in
On the circumference of circle, described kinematic axis (20) is located at the central point of the bottom of described crucible load plate (10).
3. evaporation coating device as claimed in claim 1, it is characterised in that the top of described crucible (30)
Diameter is more than described crucible more than the base diameter of described crucible (30), the diameter of described through hole (50)
(30) base diameter and the top diameter less than described crucible (30).
4. evaporation coating device as claimed in claim 1, it is characterised in that the number of described evaporation source (12)
Amount is 2 to 10, and the quantity of described crucible switching device (13) is less than or equal to described evaporation source
(12) quantity, the crucible (30) on the crucible load plate (10) of each crucible switching device (13)
Quantity is 2 to 10.
5. evaporation coating device as claimed in claim 4, it is characterised in that described evaporation source (12) is uniform
It is distributed on the circumference of a circle.
6. evaporation coating device as claimed in claim 4, it is characterised in that described crucible switching device
(13) quantity is less than the quantity of described evaporation source (12), and each crucible switching device (13) correspondence is many
Individual evaporation source (12).
7. evaporation coating device as claimed in claim 4, it is characterised in that described crucible switching device
(13) quantity is equal to the quantity of described evaporation source (12), each crucible switching device (13) corresponding
Individual evaporation source (12).
8. evaporation coating device as claimed in claim 7, it is characterised in that described evaporation source (12) and earthenware
The quantity of crucible switching device (13) is 3.
9. evaporation coating device as claimed in claim 8, it is characterised in that each crucible switching device
(13) quantity of the crucible (30) on crucible load plate (10) is 10.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610251510.5A CN105861992B (en) | 2016-04-20 | 2016-04-20 | Evaporation coating device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610251510.5A CN105861992B (en) | 2016-04-20 | 2016-04-20 | Evaporation coating device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN105861992A true CN105861992A (en) | 2016-08-17 |
| CN105861992B CN105861992B (en) | 2019-04-30 |
Family
ID=56632708
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610251510.5A Active CN105861992B (en) | 2016-04-20 | 2016-04-20 | Evaporation coating device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN105861992B (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107267923A (en) * | 2017-08-15 | 2017-10-20 | 佛山市南海区晶鼎泰机械设备有限公司 | A kind of primary and secondary crucible device that composition metal film layer is deposited |
| WO2019100557A1 (en) * | 2017-11-27 | 2019-05-31 | 深圳市华星光电半导体显示技术有限公司 | Part switching device and evaporation system |
| CN112538605A (en) * | 2020-12-03 | 2021-03-23 | 福建华佳彩有限公司 | Evaporation plating equipment |
| CN114277354A (en) * | 2021-12-28 | 2022-04-05 | 深圳奥卓真空设备技术有限公司 | AF continuous vacuum coating equipment and uniformity control method thereof |
| WO2022206385A1 (en) * | 2021-04-01 | 2022-10-06 | 宁波星河材料科技有限公司 | High-flux film preparation device in which crucible replacement is convenient, and use thereof |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006104513A (en) * | 2004-10-04 | 2006-04-20 | Toyota Industries Corp | Crucible cooling method in evaporation source, and evaporation source |
| KR100579866B1 (en) * | 2004-12-02 | 2006-05-15 | 두산디앤디 주식회사 | Substrate deposition device |
-
2016
- 2016-04-20 CN CN201610251510.5A patent/CN105861992B/en active Active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006104513A (en) * | 2004-10-04 | 2006-04-20 | Toyota Industries Corp | Crucible cooling method in evaporation source, and evaporation source |
| KR100579866B1 (en) * | 2004-12-02 | 2006-05-15 | 두산디앤디 주식회사 | Substrate deposition device |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107267923A (en) * | 2017-08-15 | 2017-10-20 | 佛山市南海区晶鼎泰机械设备有限公司 | A kind of primary and secondary crucible device that composition metal film layer is deposited |
| CN107267923B (en) * | 2017-08-15 | 2019-05-17 | 佛山市南海区晶鼎泰智能科技有限公司 | A kind of primary and secondary crucible device that composition metal film layer is deposited |
| WO2019100557A1 (en) * | 2017-11-27 | 2019-05-31 | 深圳市华星光电半导体显示技术有限公司 | Part switching device and evaporation system |
| CN112538605A (en) * | 2020-12-03 | 2021-03-23 | 福建华佳彩有限公司 | Evaporation plating equipment |
| CN112538605B (en) * | 2020-12-03 | 2024-05-14 | 福建华佳彩有限公司 | Evaporation equipment |
| WO2022206385A1 (en) * | 2021-04-01 | 2022-10-06 | 宁波星河材料科技有限公司 | High-flux film preparation device in which crucible replacement is convenient, and use thereof |
| CN114277354A (en) * | 2021-12-28 | 2022-04-05 | 深圳奥卓真空设备技术有限公司 | AF continuous vacuum coating equipment and uniformity control method thereof |
| CN114277354B (en) * | 2021-12-28 | 2023-09-19 | 深圳奥卓真空设备技术有限公司 | AF continuous vacuum coating equipment and uniformity control method thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| CN105861992B (en) | 2019-04-30 |
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