WO2022206385A1

WO2022206385A1 - High-flux film preparation device in which crucible replacement is convenient, and use thereof

Info

Publication number: WO2022206385A1
Application number: PCT/CN2022/081093
Authority: WO
Inventors: 郭鸿杰; 杨露明; 冯秋洁
Original assignee: 宁波星河材料科技有限公司
Priority date: 2021-04-01
Filing date: 2022-03-16
Publication date: 2022-10-06
Also published as: CN112877649A

Abstract

Disclosed in the present disclosure are a high-flux film preparation device in which crucible replacement is convenient, and the use thereof. The device comprises an evaporation cavity and a storage cavity, wherein the evaporation cavity is in communication with the storage cavity by means of a flexible connecting pipeline; the pipeline, which communicates the evaporation cavity with the storage cavity, is provided with a stop member; the evaporation cavity is internally provided with an evaporation source, and a recess in which a crucible is placed; a crucible storage rack and a manipulator are arranged in the storage cavity; the manipulator is used for transporting the crucible between the recess and the crucible storage rack; and the crucible is a truncated cone-shaped crucible. According to the present application, by means of the arrangement of the storage cavity, the crucible can be replaced in a vacuum environment, such that the alternating coating of various materials is realized, thereby facilitating the vacuum coating of the same substrate by using various materials, and the problem of the cross contamination of materials can be completely prevented.

Description

A high-throughput thin film preparation device that is easy to replace the crucible and its application

technical field

The embodiments of the present application belong to the technical field of film coating, and relate to a film coating device, and in particular, to a high-flux thin film preparation device that facilitates replacement of crucibles and applications thereof.

Background technique

In traditional material research, one sample is prepared for each experiment, so the material development cycle is long. High-throughput material chip technology draws on the mask technology for manufacturing integrated circuit chips. Thousands of materials with different components can be prepared in one experiment on a substrate, and the composition, structure, and phase can be quickly characterized, which can greatly shorten the time. The development cycle of new materials. High-throughput material chip technology has become one of the most important methods for material research and development.

High-throughput material chip technology often requires alternate coating of multiple materials. At present, the evaporation source used in electron beam evaporation can store multiple materials at the same time. The evaporation source has a baffle with a gap. When a certain material needs to be evaporated, the electron beam evaporation source rotates the material to be evaporated under the baffle gap by rotating. , the electron beam heats the material under the baffle notch, thereby evaporating the coating. Other materials are shielded by baffles to avoid cross-contamination between materials due to evaporation.

Although the electron beam evaporation source can store multiple materials at the same time, it is still limited. If it is necessary to change or add materials, it is necessary to break the vacuum and open the cavity. And during the coating process, the evaporated material will be deposited on the edge of the baffle gap; if the vacuum chamber is not opened in time to clean up the material deposited on the edge of the baffle gap, the material deposited on the edge of the gap will fall off and fall into the material under the baffle gap. This e-beam evaporation source also causes cross-contamination of materials.

CN 101985736A discloses a multi-station graded film plating equipment, comprising a drive module, a substrate, a workpiece disk, a mask mechanism and a uniform mechanism, the workpiece disk is located on the substrate, and the workpiece disk can rotate around its axis , which has a constant distance from the substrate. A coating station is fixed on the workpiece plate; a coating hole is arranged on the substrate corresponding to the coating station; a mask mechanism is fixed between the coating station and the coating hole; The lower part of the coating hole is fixedly provided with a uniform mechanism on the base plate; the working section of the driving module is fixedly connected with the workpiece disc. However, the equipment has a set of substrate transposition mechanism, the substrate to be plated can be automatically replaced in the vacuum chamber, and the non-uniform film plating can be realized through a specific mask mechanism. However, one set of mask mechanism in this equipment can only coat one type of coating sheet, and different types of coating sheets need to be replaced with different mask mechanisms, and the operation is complicated.

CN 105887020A discloses a multi-evaporation source coating device and a coating method thereof. A plurality of film thickness controllers are arranged in the vacuum coating chamber, and one of the film thickness controllers is arranged at the center of the workpiece umbrella frame for monitoring all the films. The coating rate on the coating substrate, the rest of the film thickness controller and the evaporation source are in one-to-one correspondence to monitor and adjust the evaporation rate of each evaporation source respectively. However, in this method, multiple evaporation sources are placed in the same chamber, and the number of evaporation sources is limited by the vacuum chamber. Based on the consideration of coating uniformity, it is difficult to install too many evaporation sources.

CN 1814855A discloses a multi-evaporation source system for preparing multi-component thin films, which includes a vacuum chamber. The vacuum chamber is equipped with a plurality of electron guns to heat the evaporation sources. Each electron gun evaporation source includes an electron gun, a sensor and a crucible. Electromagnetic shielding devices are arranged between the two evaporation sources. In this application, by setting up an electromagnetic shielding device, a plurality of electron guns will not interfere with each other, so that a multi-component thin film can be prepared by using the electron gun. However, this equipment needs to set up multiple electron guns and multiple evaporation sources in the vacuum chamber, which is easy to cause direct cross-contamination of materials.

In this regard, to provide a high-throughput thin film preparation device that can easily replace the crucible without destroying the vacuum state in the cavity, which is convenient for the replacement of the crucible, which is conducive to realizing the vacuum coating of multiple materials on the same substrate, and can completely avoid the material cross-contamination problem.

SUMMARY OF THE INVENTION

The following is an overview of the topics detailed in this article. This summary is not intended to limit the scope of protection of the claims.

The embodiments of the present application provide a high-flux thin-film preparation device that facilitates replacement of crucibles and applications thereof. The high-flux thin-film preparation device for easy replacement of crucibles can facilitate the replacement of crucibles without destroying the vacuum state in the cavity. The high-throughput thin film preparation device is beneficial to realize the vacuum coating of multiple materials on the same substrate, and can completely avoid the problem of cross-contamination of materials.

In a first aspect, an embodiment of the present application provides a high-flux thin-film preparation device that facilitates crucible replacement, and the high-flux thin-film preparation device that facilitates crucible replacement includes an evaporation chamber and a storage chamber.

The evaporation chamber is communicated with the storage chamber through a soft connection pipeline; a cutoff piece is provided in the communication pipeline between the evaporation chamber and the storage chamber.

The evaporation chamber is provided with an evaporation source and a groove for placing the crucible.

The storage cavity is provided with a crucible storage rack and a manipulator; the manipulator is used for the transportation of the crucible between the groove and the crucible storage rack;

The crucible is a circular truncated crucible.

The high-throughput thin film preparation device for easy replacement of crucibles provided by the present application can realize the replacement of crucibles without breaking the vacuum through the arrangement of the evaporation chamber and the storage chamber, so as to realize the alternate coating of various materials under vacuum conditions. The evaporation chamber is provided with an evaporation source and a groove for placing the crucible, and the crucible placed in the groove is a truncated crucible.

The evaporation source in the evaporation chamber described in this application includes an electron beam evaporation source and/or a laser evaporation source, and the evaporation source is used to heat the material in the crucible. This application does not specifically limit the position of the evaporation source, as long as the crucible can be The heating of the inner material can be done.

When the truncated crucible is placed in the groove, the small diameter end of the truncated crucible is the bottom, and the side wall of the truncated crucible is in contact with the inside of the groove.

The use of the flexible connecting pipeline in the present application facilitates the leveling of the connecting pipeline between the evaporation chamber and the storage chamber, thereby facilitating the transport of the crucible by the manipulator between the evaporation source and the crucible storage rack.

As a preferred technical solution, the flexible connecting pipeline includes but is not limited to a corrugated pipe.

The cut-off piece described in this application is used to control the communication between the evaporation chamber and the storage cavity. When vacuum coating is performed in the evaporation cavity, the cut-off piece is controlled to make the connection between the evaporation cavity and the storage cavity disconnected; when the crucible needs to be replaced, Then, the cut-off piece is controlled to communicate between the evaporation chamber and the storage chamber.

As a preferred technical solution, the shut-off member includes but is not limited to a shut-off valve.

The use of the manipulator for transporting the crucible between the evaporation source and the crucible storage rack in this application means that the manipulator can not only transport the crucible of the crucible storage rack of the storage cavity to the groove of the evaporation source, but also can transport the crucible in the groove of the evaporation source. The crucibles are transported to the crucible storage rack of the storage chamber.

Preferably, the crucible storage rack includes a support plate, a crucible holder disposed on the support plate, and a support shaft disposed at the bottom of the support plate; the support shaft passes through the storage cavity.

The support shaft is used for axial displacement of the crucible holder along the support shaft and/or rotation of the crucible holder along the axial direction of the support shaft.

When the support shaft is used for the axial displacement of the crucible support along the support shaft, the crucible storage rack moves up and down along the axial direction of the support shaft, and cooperates with the axial displacement and axial rotation of the manipulator to realize the picking and placing of the crucible on the crucible support; When the support shaft is used for the crucible support to rotate along the axial direction of the support shaft, the crucible support cooperates with the axial displacement and/or axial rotation of the manipulator to realize the pick and place of the crucible on the crucible support.

As a further preferred technical solution, the support shaft is used for the axial displacement of the crucible support along the support shaft and the axial rotation of the crucible support along the support shaft, so that the crucible support and the manipulator can be matched more flexibly, and it is convenient for the manipulator to adjust the crucible support. The picking and placing of crucibles at different positions improves the space utilization in the storage cavity.

Preferably, the crucible support includes at least one layer of crucible storage platforms; the crucible storage platforms are used for placing truncated crucibles; the crucible storage platforms are supported by support columns.

The present application does not specifically limit the distances between two adjacent layers of crucible storage platforms and the crucible storage platforms at the bottommost layer and the support plate. Those skilled in the art can reasonably select the distance between the crucible storage table of two adjacent layers and the crucible storage table of the bottom layer and the support plate according to the height of the crucible and in order to facilitate the pick and place of the manipulator.

The crucible holder described in this application includes at least one layer of crucible storage table, for example, it can be one layer, two layers, three layers, four layers, five layers or ten layers, but not limited to the listed values, and other non-enumerated values within the value range The same applies to numerical values. Those skilled in the art can make reasonable settings according to the size of the storage cavity and the number of crucibles.

Preferably, the crucible storage table is provided with at least 2 through holes for placing the truncated crucible; for example, there may be 2, 3, 4, 5, 6, 7, 8, 9 or 10 through holes but not limited to the recited values, and other non-recited values within the range of values are equally applicable.

Those skilled in the art can reasonably set the number and size of the through holes according to the size of the truncated crucible.

Preferably, the manipulator includes a first displacement member and a second displacement member.

The first displacement member is penetrated through the storage cavity, the axial direction of the first displacement member is parallel to the axial direction of the support shaft, and the axial direction of the first displacement member is perpendicular to the axial direction of the second displacement member;

The first displacement member drives the second displacement member to displace along the axial direction of the first displacement member and/or drives the second displacement member to rotate along the axial direction of the first displacement member; the second displacement member is used for the crucible to be placed in the groove. and transport between crucible storage racks.

The arrangement of the first displacement piece in the present application can not only cooperate with the support shaft to realize the quick pick and place of the truncated crucible, but also realize the pick and place of the truncated crucible placed in the groove; The arrangement can realize the movement of the truncated crucible between the evaporation chamber and the storage chamber.

In the present application, through the arrangement of the first displacement member, the second displacement member can be displaced along the axial direction of the first displacement member, and the second displacement member can be rotated along the axial direction of the first displacement member, so that the second displacement member has different effects on the crucible support. Location of the truncated crucible.

When the first displacement member drives the second displacement member to displace along the axial direction of the first displacement member, the manipulator cooperates with the axial rotation through the axial displacement of the support shaft, so that the second displacement member can pick and place the circular platform near the flexible connection pipeline. When the first displacement member drives the second displacement member to rotate along the axial direction of the first displacement member, the manipulator cooperates with the axial rotation through the axial displacement of the support shaft to realize the picking and placing of the truncated crucible at different positions of the crucible support. .

Preferably, the second displacement member is provided with a notch matched with the truncated crucible.

As one of the preferred technical solutions of the high-throughput thin film preparation device for easy replacement of crucibles described in this application, the frustum-shaped crucible is a single-layer crucible; when the frustum-shaped crucible is placed in the groove, the frustum-shaped crucible is higher than the groove .

In the present application, by making the truncated crucible higher than the groove, it is convenient for the manipulator to pick and place the truncated crucible.

As the second preferred technical solution of the high-throughput thin film preparation device that is easy to replace the crucible described in this application, the circular frustum-shaped crucible is a single-layer crucible;

When the circular truncated crucible is placed in the groove, the circular truncated crucible is not higher than the groove;

The bottom of the groove is provided with at least three through holes for passing through the thimbles; the thimbles are used to push up the truncated crucible through the through holes.

The bottom of the groove is provided with at least three through holes for passing through the thimble, so as to ensure the stability of the crucible when the thimble pushes up the crucible.

When the truncated crucible is not higher than the groove, the thimble can be inserted through the through hole at the bottom of the groove, and the thimble can be used to lift the truncated crucible when the manipulator transfers the truncated crucible, so as to facilitate the second displacement member to the truncated crucible. crawl.

The number of through holes for passing the thimble provided at the bottom of the groove is at least 3, for example, it can be 3, 4, 5, 6, 8 or 10, but is not limited to the listed values , other non-recited values within the numerical range also apply.

Preferably, the at least three through holes for passing through the thimble are axially symmetrically distributed along the central axis of the groove.

As the third preferred technical solution of the high-throughput thin film preparation device for easy replacement of crucibles described in this application, the circular frustum-shaped crucible includes an inner layer and a protective layer disposed outside the inner layer;

When the circular truncated crucible is placed in the groove, the inner layer is not higher than the groove, and the protective layer is higher than the groove.

In order to facilitate the taking and placing of the truncated crucible in the groove, the upper end of the truncated crucible needs to be higher than the top surface of the groove. At this time, due to uneven heating, it is easy to cause damage to the truncated crucible, thereby affecting the coating effect. In the present application, the circular truncated crucible includes an inner layer and a protective layer, the inner layer is not higher than the groove, and the protective layer is higher than the groove, which can not only ensure the uniform heating of the inner layer, but also facilitate the truncated crucible to be placed in the groove. pick and place.

As the fourth preferred technical solution of the high-flux thin-film preparation device for easy replacement of crucibles described in this application, the circular frustum-shaped crucible includes an inner layer and a protective layer disposed outside the inner layer;

When the circular truncated crucible is placed in the groove, the inner layer does not rise above the groove, and the protective layer does not rise above the groove.

When the inner layer and the protective layer of the truncated crucible are not higher than the groove, the thimble can be inserted through the through hole at the bottom of the groove, and the thimble can be used to lift the truncated crucible when the manipulator transfers the truncated crucible, so as to facilitate the first step. Grab the truncated crucible by two displacement pieces.

The material of the inner layer described in this application is a conventional crucible material, and the material of the protective layer is a thermally conductive material.

Preferably, the material used for the inner layer includes Al ₂ O ₃ or graphite.

Preferably, the material used for the protective layer includes any one of molybdenum, tungsten or copper.

In a second aspect, an embodiment of the present application provides an application of using the high-throughput thin film preparation device for easy replacement of crucibles described in the first aspect for coating, and the application includes the following steps:

(1) under vacuum conditions, the evaporation chamber is communicated with the storage chamber, and the crucible placed in the crucible storage rack is transferred to the groove through the cooperation of the crucible storage rack and the manipulator, so as to realize the placement of the crucible in the evaporation chamber;

(2) under vacuum conditions, the evaporation chamber is communicated with the storage chamber, and the crucible placed in the groove is transferred to the crucible storage rack through the cooperation of the crucible storage rack and the manipulator, so as to realize the taking out of the crucible in the evaporation chamber;

Step (1) and step (2) are in no particular order.

In the application described in the second aspect of the present application, after placing the crucible in the evaporation chamber or taking out the crucible in the evaporation chamber, the non-communication between the evaporation chamber and the storage chamber is selectively controlled according to subsequent process requirements; The communication or non-communication between the storage chambers is controlled by the shut-off.

Preferably, in the application described in the second aspect of the present application, when the crucible is placed in the groove, the crucible is higher than the groove. That is, when the circular truncated crucible is a single-layer crucible, when the circular truncated crucible is placed in the groove, the circular truncated crucible is higher than the groove; when the circular truncated crucible includes an inner layer and a protective layer, when the circular truncated crucible is placed in the groove, the inner The layer does not rise above the groove, and the protective layer rises above the groove.

In a third aspect, the embodiments of the present application provide an application of using the high-throughput thin film preparation device for easy replacement of crucibles described in the second aspect to perform evaporation coating, and the application includes the following steps:

(2) Under vacuum conditions, connect the evaporation chamber with the storage chamber, use the thimble to push the crucible out of the groove, and then transfer the crucible placed in the groove to the crucible storage rack through the cooperation of the crucible storage rack and the manipulator to realize the evaporation chamber Take out the inner crucible;

Step (1) and step (2) are in no particular order.

In the application described in the third aspect of the present application, after placing the crucible in the evaporation chamber or taking out the crucible in the evaporation chamber, the non-communication between the evaporation chamber and the storage chamber is selectively controlled according to the needs of the subsequent process; The communication or non-communication between the storage chambers is controlled by the shut-off.

Preferably, in the application described in the third aspect of the present application, when the crucible is placed in the groove, the crucible does not rise above the groove, and at this time, the bottom of the groove is provided with at least three through holes for passing through the thimble, and the thimble The crucible is pushed out of the groove, which is convenient for the manipulator to pick and place the crucible in the groove. When the truncated crucible is a single-layer crucible, when the truncated crucible is placed in the groove, the truncated crucible does not rise above the groove; when the truncated crucible includes an inner layer and a protective layer, when the truncated crucible is placed in the groove, the inner The layer does not rise above the groove, and the protective layer does not rise above the groove.

Compared with the related art, the present application has the following beneficial effects:

(1) The high-flux thin film preparation device that is easy to replace the crucible provided by the embodiment of the application can realize the replacement of the circular frustum crucible under the vacuum environment through the setting of the storage cavity and the evaporation cavity, thereby realizing the alternate coating of various materials;

(2) In the embodiment of the present application, the crucible support is displaced along the axial direction of the support shaft through the support shaft, and the crucible support can be rotated along the axial direction of the support shaft, which is convenient for the robot to pick and place the truncated crucible at different positions of the crucible support, and improves the performance of the crucible support. Space utilization in the storage cavity;

(3) In the embodiment of the present application, through the arrangement of the first displacement member, the second displacement member can be displaced along the axial direction of the first displacement member, and the second displacement member can be rotated along the axial direction of the first displacement member, so as to facilitate the second displacement Pick and place the truncated crucible at different positions of the crucible support frame;

(4) In the embodiment of the present application, the frustum-shaped crucible includes an inner layer and a protective layer arranged outside the inner layer, and when the frustum-shaped crucible is placed in the groove, the inner layer is not higher than the groove, and the protective layer is high The groove can not only ensure the uniform heating of the inner layer, but also facilitate the taking and placing of the truncated crucible in the groove.

Other aspects will become apparent upon reading and understanding of the drawings and detailed description.

Description of drawings

The accompanying drawings are used to provide a further understanding of the technical solutions herein, and constitute a part of the specification, and together with the embodiments of the present application, they are used to explain the technical solutions herein, and do not constitute a limitation on the technical solutions herein.

1 is a schematic structural diagram of a high-throughput thin film preparation device that is convenient for crucible replacement provided by an embodiment of the present application;

2 is a schematic structural diagram of a crucible storage rack provided in an embodiment of the present application;

3 is a schematic structural diagram of a manipulator provided in an embodiment of the present application;

Fig. 4 is the schematic diagram of thimble action in application example 5;

Fig. 5 is the schematic diagram when the truncated truncated crucible provided by embodiment 5-6 is placed in the groove;

Fig. 6 is the structural representation of the circular frustum crucible provided by embodiment 5-6;

FIG. 7 is a schematic structural diagram of the truncated crucible provided in Example 7. FIG.

Among them: 1, evaporation chamber; 1-2, thimble; 1-1, evaporation source; 2, storage chamber; 2-1, frustum crucible; 2-1-1, inner layer; 2-1-2, protective layer ; 2-2, crucible storage rack; 2-3, manipulator; 2-4, crucible storage table; 2-5, support shaft; 2-6, first displacement piece; 2-7, second displacement piece; 2- 8, support column; 3, cut-off piece; 4, flexible connection pipeline.

Detailed ways

The technical solutions of the present application are further described below through specific embodiments. It should be understood by those skilled in the art that the embodiments are only for helping the understanding of the present application, and should not be regarded as a specific limitation of the present application.

Example 1

This embodiment provides a high-flux thin-film preparation device that facilitates crucible replacement. The schematic structural diagram of the high-flux thin-film preparation device that facilitates crucible replacement is shown in FIG. 1 , including an evaporation chamber 1 and a storage chamber 2 .

The evaporation chamber 1 is communicated with the storage chamber 2 through a soft connection pipeline 4;

The evaporation chamber 1 is provided with an electron beam evaporation source and a groove for placing the truncated crucible 2-1.

The storage cavity 2 is provided with a crucible storage rack 2-2 and a manipulator 2-3; the manipulator 2-3 is used for transporting the frustum-shaped crucible 2-1 between the groove and the crucible storage rack 2-2.

The schematic structural diagram of the crucible storage rack 2-2 is shown in FIG. 2, which includes a support plate, a crucible support arranged on the support plate, and a support shaft 2-5 arranged at the bottom of the support plate; the support shaft 2-5 passes through the support plate. It is arranged in the storage cavity 2 for the axial displacement of the crucible support along the support shaft 2-5.

The crucible support includes two layers of crucible storage tables 2-4; the crucible storage table 2-4 is provided with a through hole for placing the truncated crucible 2-1; the crucible storage table 2-4 passes through the support column 2-8 support.

The schematic structural diagram of the manipulator 2-3 is shown in FIG. 3, including a first displacement member 2-6 and a second displacement member 2-7.

The first displacement member 2-6 passes through the storage cavity 2, the axial direction of the first displacement member 2-6 is parallel to the axial direction of the support shaft 2-5, and the axial direction of the first displacement member 2-6 is parallel to the axial direction of the support shaft 2-5. The axial direction of the second displacement member 2-7 is vertical. The first displacement member 2-6 drives the second displacement member 2-7 to move along the axial direction of the first displacement member 2-6, and the first displacement member 2-6 can also drive the second displacement member 2-7 along the axial direction of the first displacement member 2-6. The axial rotation of the first displacement member 2-6; the second displacement member 2-7 is used for the transportation of the frustum-shaped crucible 2-1 between the groove and the crucible storage rack 2-2.

The circular truncated crucible 2-1 used in this embodiment is a single-layer crucible with a truncated shape. When the circular truncated crucible 2-1 is placed in the groove, the circular truncated crucible 2-1 is higher than the groove.

Application example 1

When this application example applies the high-throughput thin film preparation device provided in Example 1 for easy replacement of crucibles, firstly, the connection pipeline between the evaporation chamber 1 and the storage chamber 2 is leveled through the flexible connection pipeline 4; then the second displacement member 2-7 Under the action of the first displacement member 2-6, it rotates along the axial direction of the first displacement member 2-6, so that the second displacement member 2-6 rotates to the position of the frustum-shaped crucible 2-1 to be taken, and passes through the second displacement member 2-6. -7 The coordination along its own axial displacement and the axial displacement along the first displacement member 2-6, take out and replace the frustum-shaped crucible 2-1; open the cut-off member 3 to communicate between the evaporation chamber 1 and the storage chamber 2, and then The second displacement member 2-7 rotates to the communication direction along the axial direction of the first displacement member 2-6 under the action of the first displacement member 2-6. The axial displacement of the first displacement member 2-6 is coordinated, and the truncated crucible 2-1 is placed in the groove; finally, the second displacement member 2-7 is displaced along its own axis and along the axis of the first displacement member 2-6. The fit to the displacement returns to the storage chamber 2 , and then the shut-off member 3 is closed so that there is no communication between the evaporation chamber 1 and the storage chamber 2 .

When the truncated crucible 2-1 in the evaporation chamber 1 needs to be replaced, the cut-off member 3 is first opened to communicate between the evaporation chamber 1 and the storage chamber 2; The axial displacement of the displacement member 2-6 is coordinated to move to the evaporation chamber 1, and under the action of the axial displacement of the first displacement member 2-6, the second displacement member 2-7 moves the frustum-shaped crucible 2-1 out of the groove, Then, the truncated crucible 2-1 is transported to the storage chamber 2 through the second displacement member along its own axial displacement; In coordination with the axial displacement, place the truncated crucible 2-1 on the crucible storage rack 2-2; repeat the steps of taking out the truncated crucible 2-1 to replace the truncated crucible 2-1 in the evaporation chamber 1.

Application example 2

This application example applies the high-throughput thin film preparation device provided in Example 1 that facilitates the replacement of crucibles. The difference from Application Example 1 is that in this application example, when the truncated crucible 2-1 is taken and placed, the crucible storage rack 2-2 is supported by The shaft 2-5 is displaced along the axial direction of the support shaft 2-5, so as to cooperate with the axial movement of the manipulator 2-3 along the first displacement member 2-6, which facilitates the taking and placing of the truncated crucible 2-1.

Example 2

The evaporation chamber 1 is provided with a laser evaporation source and a groove for placing the truncated crucible 2-1.

The schematic structural diagram of the crucible storage rack 2-2 is shown in FIG. 2, which includes a support plate, a crucible support arranged on the support plate, and a support shaft 2-5 arranged at the bottom of the support plate; the support shaft 2-5 passes through the support plate. It is arranged in the storage chamber 2 for the crucible holder to rotate along the axial direction of the support shaft 2-5.

Application example 3

When this application example applies the high-throughput thin film preparation device provided in Example 2 to facilitate the replacement of crucibles, firstly, the connection pipeline between the evaporation chamber 1 and the storage chamber 2 is leveled through the flexible connection pipeline 4; then the second displacement member 2-7 Under the action of the first displacement member 2-6, it rotates along the axial direction of the first displacement member 2-6, so that the second displacement member 2-6 rotates to the position of the frustum-shaped crucible 2-1 to be taken, and passes through the second displacement member 2-6. -7 The axial displacement along its own axis and the axial displacement along the first displacement member 2-6 are matched, and the truncated crucible 2-1 is taken out and replaced; The second displacement member 2-7 rotates to the communication direction along the axial direction of the first displacement member 2-6 under the action of the first displacement member 2-6. The coordination of the axial displacement of the first displacement member 2-6 is to place the frustum-shaped crucible 2-1 in the groove; finally, the second displacement member 2-7 is displaced along its own axis and along the axis of the first displacement member 2-6. The fit to the displacement returns to the storage chamber 2 , and then the shut-off member 3 is closed so that there is no communication between the evaporation chamber 1 and the storage chamber 2 .

When the truncated crucible 2-1 in the evaporation chamber 1 needs to be replaced, the cut-off member 3 is first opened to communicate between the evaporation chamber 1 and the storage chamber 2; the second displacement member 2-7 is displaced along its own axial direction and along the first The axial displacement of the displacement member 2-6 is coordinated to move to the evaporation chamber 1, and under the action of the axial displacement of the first displacement member 2-6, the second displacement member 2-7 moves the frustum-shaped crucible 2-1 out of the groove, Then, the truncated crucible 2-1 is transported to the storage chamber 2 through the second displacement member along its own axial displacement; In coordination with the axial displacement, place the truncated crucible 2-1 on the crucible storage rack 2-2; repeat the steps of taking out the truncated crucible 2-1 to replace the truncated crucible 2-1 in the evaporation chamber 1.

Application example 4

This application example applies the high-throughput thin film preparation device provided in example 2 that is convenient for crucible replacement. The difference from application example 3 is that when the truncated crucible 2-1 is taken and placed in this application example, the crucible storage rack 2-2 is supported by The shaft 2-5 rotates along the axial direction of the support shaft 2-5, so as to cooperate with the manipulator 2-3 to rotate and axially displace along the first displacement member 2-6, which is convenient for picking and placing the truncated crucible 2-1.

Example 3

This embodiment provides a high-throughput thin film preparation device that is convenient for crucible replacement. The difference from Embodiment 1 is that the truncated truncated crucible 2-1 used in this embodiment is a single-layer crucible with a truncated truncated shape, and the truncated truncated crucible When 2-1 is placed in the groove, the truncated crucible 2-1 is not higher than the groove. In order to facilitate the taking out of the truncated crucible 2-1, the bottom of the groove is provided with three through holes for passing through the thimble 1-2, and the three through holes for passing through the thimble are along the groove The central axis of the axisymmetric distribution.

Application example 5

When this application example applies the high-throughput thin film preparation device provided in Example 3 for easy replacement of crucibles, firstly, the connection pipeline between the evaporation chamber 1 and the storage chamber 2 is leveled through the flexible connection pipeline 4; then the second displacement member 2-7 Under the action of the first displacement member 2-6, it rotates along the axial direction of the first displacement member 2-6, so that the second displacement member 2-6 rotates to the position of the frustum-shaped crucible 2-1 to be taken, and passes through the second displacement member 2-6. -7 The axial displacement along its own axis and the axial displacement along the first displacement member 2-6 are matched, and the truncated crucible 2-1 is taken out and replaced; The second displacement member 2-7 rotates to the communication direction along the axial direction of the first displacement member 2-6 under the action of the first displacement member 2-6. The coordination of the axial displacement of the first displacement member 2-6 is to place the frustum-shaped crucible 2-1 in the groove; finally, the second displacement member 2-7 is displaced along its own axis and along the axis of the first displacement member 2-6. The fit to the displacement returns to the storage chamber 2 , and then the shut-off member 3 is closed so that there is no communication between the evaporation chamber 1 and the storage chamber 2 .

When it is necessary to replace the truncated crucible 2-1 in the evaporation chamber 1, first open the cut-off member 3 to connect the evaporation chamber 1 and the storage chamber 2, and the ejector pin 1-2 pushes the truncated crucible 2-1 out of the groove (such as 4); the second displacement member 2-7 moves to the evaporation chamber 1 along the axial displacement of the second displacement member 2-7 along with the axial displacement of the first displacement member 2-6, and moves to the evaporation chamber 1 in the axial direction of the first displacement member 2-6. Under the action of displacement, the second displacement member 2-7 moves the frustum-shaped crucible 2-1 out of the groove, and then the frustum-shaped crucible 2-1 is transported to the storage chamber 2 by the second displacement member along its own axial displacement; then Through the cooperation between the axial displacement of the second displacement member 2-7 and the axial displacement of the first displacement member 2-6, the frustum-shaped crucible 2-1 is placed on the crucible storage rack 2-2; the frustum-shaped crucible is repeatedly taken out In step 2-1, the frustum-shaped crucible 2-1 in the evaporation chamber 1 is replaced.

Example 4

The schematic structural diagram of the crucible storage rack 2-2 is shown in FIG. 2, which includes a support plate, a crucible support arranged on the support plate, and a support shaft 2-5 arranged at the bottom of the support plate; the support shaft 2-5 passes through the support plate. It is arranged in the storage chamber 2 for the crucible support to rotate along the axial direction of the support shaft 2-5 and to displace along the axial direction of the support shaft 2-5.

The circular truncated crucible 2-1 used in this embodiment is a single-layer crucible with a truncated shape, and when the circular truncated crucible 2-1 is placed in the groove, the circular truncated crucible 2-1 is higher than the groove.

Application example 6

This application example applies the high-flux thin-film preparation device for easy replacement of crucibles provided in Example 4. The difference between Example 4 and the high-flux thin-film preparation device for easy replacement of crucibles provided in Example 4 is that the crucible support provided in Example 4 It can displace along the axial direction of the support shaft 2-5, and can also rotate along the axial direction of the support shaft 2-5.

Therefore, when applying the high-throughput thin film preparation device for easy replacement of crucibles provided in Example 4, the crucible support can be selectively displaced and/or rotated in the axial direction of the support shaft 2-5, so as to cooperate with the manipulator 2-3 The truncated crucible 2-1 on the crucible storage rack 2-2 can be picked and placed.

When the crucible support is fixed, refer to Application Example 1 and Application Example 3 for the method of taking and placing the truncated crucible 2-1 on the crucible storage rack 2-2 by using the manipulator 2-3.

When the crucible support is displaced along the axial direction of the support shaft 2-5, the method of using the manipulator 2-3 to realize the picking and placing of the truncated crucible 2-1 on the crucible storage rack 2-2 refers to Application Example 2.

When the crucible holder rotates along the axial direction of the support shaft 2-5, refer to Application Example 4 for the method of using the manipulator 2-3 to realize the picking and placing of the truncated crucible 2-1 on the crucible storage rack 2-2.

Example 5

This embodiment provides a high-throughput thin film preparation device that facilitates crucible replacement. The difference from Embodiment 1 is that the structure diagram of the truncated frustum crucible 2-1 provided in this embodiment is shown in FIG. 6 . The crucible 2-1 includes an inner layer 2-1-1 and a protective layer 2-1-2 disposed outside the inner layer 2-1-1.

Figure 5 shows a schematic diagram of the circular truncated crucible 2-1 in this embodiment after being placed in the groove.

The material used for the inner layer 2-1-3 is Al ₂ O ₃ , and the material used for the protective layer 2-1-4 is tungsten.

In this embodiment, the frustum-shaped crucible 2-1 includes an inner layer 2-1-1 and a protective layer 2-1-2 disposed outside the inner layer 2-1-1. When the frustum-shaped crucible 2-1 is placed in the groove , the inner layer 2-1-1 is not higher than the groove, and the protective layer 2-1-2 is higher than the groove, which can not only ensure the uniform heating of the inner layer 2-1-1, but also facilitate the truncated crucible 2-1 in the Pick and place of grooves.

Example 6

The material used for the inner layer 2-1-3 is graphite, and the material used for the protective layer 2-1-4 is molybdenum.

Example 7

This embodiment provides a high-throughput thin film preparation device that facilitates crucible replacement. The difference from Embodiment 3 is that the structure diagram of the circular frustum crucible 2-1 used in this embodiment is shown in FIG. 7 . 2-1 includes an inner layer 2-1-1 and a protective layer 2-1-2 disposed on the outside of the inner layer 2-1-1, and when the circular frustum crucible 2-1 is placed in the 1 is not higher than the groove, and the protective layer 2-1-2 is not higher than the groove.

In order to facilitate the taking out of the truncated crucible 2-1, the bottom of the groove is provided with three through holes for passing through the thimble 1-2, and the three through holes for passing through the thimble are along the groove The central axis of the axisymmetric distribution.

In this embodiment, the frustum-shaped crucible 2-1 includes an inner layer 2-1-1 and a protective layer 2-1-2 disposed outside the inner layer 2-1-1, so that the inner layer 2-1-1 is heated evenly; The arrangement of the three through holes for passing the thimble can facilitate the taking and placing of the truncated crucible 2-1.

In summary, the high-throughput thin film preparation device provided by the present application, which is easy to replace the crucible, can realize the replacement of the truncated crucible in a vacuum environment through the arrangement of the storage chamber and the evaporation chamber, thereby realizing the alternate coating of various materials; In the present application, the crucible support is displaced along the axial direction of the support shaft through the support shaft, and the crucible support can be rotated along the axial direction of the support shaft, which is convenient for the manipulator to pick and place the truncated crucible in different positions of the crucible support, and improves the space in the storage cavity Utilization rate; in the present application, the second displacement member can be displaced along the axial direction of the first displacement member through the arrangement of the first displacement member, and the second displacement member can be rotated along the axial direction of the first displacement member, which is convenient for the second displacement member to Picking and placing of truncated truncated crucibles at different positions of the crucible support frame; in the present application, the truncated truncated crucible is made to include an inner layer and a protective layer arranged on the outside of the inner layer, and when the truncated crucible is placed in the groove, the inner layer is not high Out of the groove, the protective layer is higher than the groove, which can not only ensure the uniform heating of the inner layer, but also facilitate the taking and placing of the truncated crucible in the groove.

The applicant declares that the above are only specific embodiments of the present application, but the protection scope of the present application is not limited to this. Those skilled in the art should Changes or substitutions that can be easily conceived within the technical scope all fall within the protection scope and disclosure scope of the present application.

Claims

A high-flux thin-film preparation device for easy replacement of crucibles, wherein the high-throughput thin-film preparation device for easy replacement of crucibles includes an evaporation chamber and a storage chamber;

The evaporation chamber is communicated with the storage chamber through a soft connection pipeline; the communication pipeline between the evaporation chamber and the storage chamber is provided with a cut-off piece;

The evaporation chamber is provided with an evaporation source and a groove for placing the crucible;

The storage cavity is provided with a crucible storage rack and a manipulator; the manipulator is used for the transportation of the crucible between the groove and the crucible storage rack;

The crucible is a circular truncated crucible.
The high-throughput thin film preparation device for easy replacement of crucibles according to claim 1, wherein the crucible storage rack comprises a support plate, a crucible support arranged on the support plate, and a support shaft arranged at the bottom of the support plate; the support plate The shaft passes through the storage cavity; the support shaft is used for the axial displacement of the crucible support along the support shaft and/or the axial rotation of the crucible support along the support shaft.
The high-throughput thin film preparation device for easy replacement of crucibles according to claim 2, wherein the crucible support comprises at least one layer of crucible storage platforms; the crucible storage platforms are used for placing truncated crucibles; the crucible storage platforms pass through Support column support.
The device for preparing high-throughput thin films for easy replacement of crucibles according to claim 3, wherein the crucible storage table is provided with at least two through holes for placing the truncated crucibles.
The high-throughput thin film preparation device for easy replacement of crucibles according to any one of claims 1-4, wherein the manipulator comprises a first displacement part and a second displacement part;

The first displacement member is penetrated through the storage cavity, the axial direction of the first displacement member is parallel to the axial direction of the support shaft, and the axial direction of the first displacement member is perpendicular to the axial direction of the second displacement member;

The first displacement member drives the second displacement member to displace along the axial direction of the first displacement member and/or drives the second displacement member to rotate along the axial direction of the first displacement member; the second displacement member is used for the crucible to be placed in the groove. and transport between crucible storage racks.
The device for preparing high-throughput thin films that is convenient for crucible replacement according to any one of claims 1-5, wherein the frustum-shaped crucible is a single-layer crucible;

When the circular truncated crucible is placed in the groove, the circular truncated crucible is higher than the groove.
The device for preparing high-throughput thin films that is convenient for crucible replacement according to any one of claims 1-5, wherein the frustum-shaped crucible is a single-layer crucible;

When the circular truncated crucible is placed in the groove, the circular truncated crucible is not higher than the groove;

The bottom of the groove is provided with at least three through holes for passing through the thimbles; the thimbles are used to push up the truncated crucible through the through holes.
The high-flux thin-film preparation device for easy crucible replacement according to any one of claims 1-5, wherein the frustum-shaped crucible comprises an inner layer and a protective layer disposed outside the inner layer;

When the circular truncated crucible is placed in the groove, the inner layer is not higher than the groove, and the protective layer is higher than the groove.
The high-flux thin-film preparation device for easy crucible replacement according to any one of claims 1-5, wherein the frustum-shaped crucible comprises an inner layer and a protective layer disposed outside the inner layer;

When the circular truncated crucible is placed in the groove, the inner layer is not higher than the groove, and the protective layer is not higher than the groove;

The bottom of the groove is provided with at least three through holes for passing through the thimbles; the thimbles are used to push up the truncated crucible through the through holes.
The high-flux thin-film preparation device for easy crucible replacement according to claim 8 or 9, wherein the material used for the inner layer comprises Al 2 O 3 or graphite.
The high-throughput thin film preparation device for easy replacement of crucibles according to claim 8 or 9, wherein the material used for the protective layer comprises any one of molybdenum, tungsten or copper.
A kind of application that utilizes the high-flux thin film preparation device that is convenient to replace the crucible according to any one of claims 1-11 to carry out the application of evaporation coating, and it comprises the steps:

(1) under vacuum conditions, the evaporation chamber is communicated with the storage chamber, and the crucible placed in the crucible storage rack is transferred to the groove through the cooperation of the crucible storage rack and the manipulator, so as to realize the placement of the crucible in the evaporation chamber;

(2) under vacuum conditions, the evaporation chamber is communicated with the storage chamber, and the crucible placed in the groove is transferred to the crucible storage rack through the cooperation of the crucible storage rack and the manipulator, so as to realize the taking out of the crucible in the evaporation chamber;

Step (1) and step (2) are in no particular order.
A kind of application that utilizes the high-flux thin film preparation device that is convenient to replace the crucible according to any one of claims 1-11 to carry out the application of evaporation coating, and it comprises the steps:

(1) under vacuum conditions, the evaporation chamber is communicated with the storage chamber, and the crucible placed in the crucible storage rack is transferred to the groove through the cooperation of the crucible storage rack and the manipulator, so as to realize the placement of the crucible in the evaporation chamber;

(2) Under vacuum conditions, connect the evaporation chamber with the storage chamber, use the thimble to push the crucible out of the groove, and then transfer the crucible placed in the groove to the crucible storage rack through the cooperation of the crucible storage rack and the manipulator to realize the evaporation chamber Take out the inner crucible;

Step (1) and step (2) are in no particular order.