CN105861992B - Evaporation coating device - Google Patents
Evaporation coating device Download PDFInfo
- Publication number
- CN105861992B CN105861992B CN201610251510.5A CN201610251510A CN105861992B CN 105861992 B CN105861992 B CN 105861992B CN 201610251510 A CN201610251510 A CN 201610251510A CN 105861992 B CN105861992 B CN 105861992B
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- China
- Prior art keywords
- crucible
- load plate
- evaporation source
- switching device
- evaporation
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Electroluminescent Light Sources (AREA)
Abstract
The present invention provides a kind of evaporation coating device, it include: vacuum chamber (11), evaporation source (12) in the vacuum chamber (11), and it is set to the crucible switching device (13) above the evaporation source (12), wherein, the crucible switching device (13) includes: crucible load plate (10), multiple crucibles (30) on the crucible load plate (10), and it is set to the kinematic axis (20) that crucible load plate (10) bottom is vertically connected with the crucible load plate (10), the crucible load plate rotation and elevating movement is driven to realize the crucible switching completed in evaporation source under vacuum conditions by controlling the kinematic axis, realize that an evaporation source corresponds to multiple crucibles, to increase the quantity of crucible loading, reduce the quantity of evaporation source, extend the period for charging of beginning to speak, improve production efficiency , reduce equipment cost.
Description
Technical field
The present invention relates to OLED to show manufacturing technology field more particularly to a kind of evaporation coating device.
Background technique
In recent years, liquid crystal display (Liquid Crystal Display, LCD) device and Organic Light Emitting Diode (Organic
Light Emitting Diode, OLED) flat-panel monitors such as display gradually replace CRT monitor, become display
Main product in market.Wherein, OLED display have self-luminous, driving voltage is low, luminous efficiency is high, the response time is short,
Clarity and contrast be high, nearly 180 ° of visual angles, use temperature range is wide, it can be achieved that Flexible Displays and large area total colouring etc. are all
More advantages are known as being the display for most having development potentiality by industry.
OLED display device is usually by anode, the electroluminescent organic material of cathode and folder between the anode and cathode
Layer is constituted, and electroluminescent organic material layer includes hole injection layer, hole transmission layer, luminescent layer, electron transfer layer and electronics again
Implanted layer.The luminescence mechanism of OLED display device is to be injected separately into electrons and holes from yin, yang the two poles of the earth, by injected electrons and sky
Cave transmitted it is compound in luminescent layer, thus excite luminescent layer molecule generate singlet exciton, singlet exciton attenuation and shine.
Currently, preparation OLED display device main way is heating in vacuum plated film, i.e., added in vacuum cavity using crucible
Hot OLED material makes it distil or melt at a certain temperature and is vaporized into steam, deposits through the aperture on metal mask plate
On substrate.
Referring to Fig. 1, Fig. 1 is a kind of existing structural schematic diagram of OLED evaporation coating device, which is point
The OLED evaporated device in source, comprising: vacuum cavity 1, multiple evaporation sources 2 in the vacuum cavity 1 and with the steaming
The one-to-one multiple crucibles (not shown) in plating source 2, are limited to the size of vacuum cavity 1, can in the OLED evaporation coating device
The quantity of the evaporation source 2 of arrangement is limited and (is usually no more than 10), namely the quantity of loading crucible is also limited every time,
After the material in crucible is evaporated, the loading and replacement of new crucible can not be realized in the environment of vacuum, is only switched into down
One evaporation source uses or begins to speak to feed again.As an example it is assumed that the OLED evaporation coating device includes 10 evaporation sources and 10
A crucible, fillable 100 grams of the organic material of each crucible, is deposited according to normal plating rate, consumes 3 grams of organic materials per hour
It calculates, the time that whole organic materials in 10 crucibles have all used is about 333 hours, is roughly equal to 14 days, i.e., at most every two weeks
It must just begin to speak to feed, if plating rate improves again, this period will also be become shorter, and operation of beginning to speak to feed is switched on very
Cavity body carries out the addition or replacement of material under atmospheric condition, and then extracting vacuum again can just work on, great shadow
Ring the continuity of production efficiency and volume production.One crucible of every increase just needs to increase an evaporation in the OLED evaporation coating device simultaneously
Source causes its equipment cost to remain high.
Summary of the invention
The purpose of the present invention is to provide a kind of evaporation coating devices, can increase the quantity of crucible loading, reduce evaporation source
Quantity extends the period for charging of beginning to speak, improves production efficiency, reduces equipment cost.
To achieve the above object, the present invention provides a kind of evaporation coating device, comprising: vacuum chamber, in the vacuum chamber
Evaporation source and the crucible switching device above the evaporation source；
The crucible switching device include: crucible load plate, multiple crucibles on the crucible load plate and be set to institute
State the kinematic axis that crucible load plate bottom is vertically connected with the crucible load plate；
The crucible load plate is equipped with multiple through-holes, and correspondence is placed with a crucible in each through-hole；
The kinematic axis drives the crucible load plate to rotate around the axis of the kinematic axis, so that the crucible on crucible load plate
It being aligned with evaporation source, the kinematic axis drives the crucible load plate to be risen or fallen along the axial direction of the kinematic axis, so that
Crucible separates with evaporation source or crucible is put into evaporation source.
The shape of the crucible load plate is circle, and the multiple through-hole is uniformly distributed in the concentric circles of a crucible load plate
Circumference on, the kinematic axis be set to the crucible load plate bottom central point.
The top diameter of the crucible is greater than the base diameter of the crucible, and the diameter of the through-hole is greater than the crucible
Base diameter is less than the top diameter of the crucible.
The quantity of the evaporation source is 2 to 10, and the quantity of the crucible switching device is less than or equal to the evaporation source
Quantity, the quantity of the crucible on the crucible load plate of each crucible switching device is 2 to 10.
The evaporation source is uniformly distributed on a round circumference.
The quantity of the crucible switching device is less than the quantity of the evaporation source, and each crucible switching device corresponds to multiple steamings
It rises.
The quantity of the crucible switching device is equal to the quantity of the evaporation source, the corresponding steaming of each crucible switching device
It rises.
The quantity of the evaporation source and crucible switching device is 3.
The quantity of crucible on the crucible load plate of each crucible switching device is 10.
Beneficial effects of the present invention: evaporation coating device provided by the invention, comprising: vacuum chamber, in the vacuum chamber
Evaporation source and the crucible switching device above the evaporation source, wherein the crucible switching device includes: that crucible carries
Disk, multiple crucibles on the crucible load plate and be set to crucible load plate bottom phase vertical with the crucible load plate
Kinematic axis even drives the crucible load plate rotation and elevating movement to realize complete under vacuum conditions by the control kinematic axis
It at the crucible switching in evaporation source, realizes that an evaporation source corresponds to multiple crucibles, to increase the quantity of crucible loading, reduces and steam
The quantity in plating source extends the period for charging of beginning to speak, improves production efficiency, reduces equipment cost.
Detailed description of the invention
For further understanding of the features and technical contents of the present invention, it please refers to below in connection with of the invention detailed
Illustrate and attached drawing, however, the drawings only provide reference and explanation, is not intended to limit the present invention.
In attached drawing,
Fig. 1 is the structural schematic diagram of existing evaporation coating device；
Fig. 2 is the structural schematic diagram of evaporation coating device of the invention；
Fig. 3 is the three-dimensional structure diagram of crucible switching device and evaporation source in evaporation coating device of the invention；
Fig. 4 is the structural schematic diagram of crucible in evaporation coating device of the invention.
Specific embodiment
Further to illustrate technological means and its effect adopted by the present invention, below in conjunction with preferred implementation of the invention
Example and its attached drawing are described in detail.
Referring to Fig. 2, the present invention provides a kind of evaporation coating device, comprising: vacuum chamber 11, the steaming in the vacuum chamber 11
Rise 12 and the crucible switching device 13 above the evaporation source 12.
Specifically, referring to Fig. 3, the crucible switching device 13 includes: crucible load plate 10, is set to the crucible load plate 10
On multiple crucibles 30 and the kinematic axis 20 that is vertically connected set on 10 bottom of crucible load plate and the crucible load plate 20.
Further, the crucible load plate 10 is equipped with multiple through-holes 50, and correspondence is placed with one in each through-hole 50
Crucible 30, in conjunction with Fig. 4, the top diameter D of the crucible 30 is greater than the base diameter d of the crucible 30, the through-hole 50 it is straight
The base diameter d that diameter is greater than the crucible 30 is less than the top diameter D of the crucible 30, so that crucible 30 is steadily placed in
It on through-hole 50, and does not fall out, and can be contacted with evaporation source 12 in decline.
Specifically, the crucible handoff procedure of the evaporation coating device are as follows: firstly, the kinematic axis 20 drives the crucible load plate
10 rise so that the crucible 30 being evaporated is separated with the evaporation source 12, and then, the kinematic axis 20 drives the crucible
Load plate 10 is rotated around the axis of the kinematic axis 20, so that another crucible 30 and evaporation source 12 on crucible load plate 10 align,
The kinematic axis 20 drives axial direction decline of the crucible load plate 10 along the kinematic axis 20, another crucible 30 is put into evaporation
In source 12, the switching of crucible is completed.Entire handoff procedure does not need to open vacuum chamber 11, can be completed under vacuum conditions, letter
It is single quick.
Further, the kinematic axis 20 includes: rotary shaft 21 and the lifting shaft that is sheathed in the rotary shaft 21
22, the lifting shaft 22 is connect with the crucible load plate 10, drives 10 oscilaltion of crucible load plate, 21 band of rotary shaft
It moves the lifting shaft 22 and crucible load plate 10 rotates.
Specifically, the shape of the crucible load plate 10 is circle, and the multiple through-hole 50 is uniformly distributed in a crucible
On the circumference of the concentric circles of load plate 10, the kinematic axis 20 is set to the central point of the bottom of the crucible load plate 10.
Specifically, the quantity of the evaporation source 12 is selected according to the size of the vacuum chamber 11, and at least 2, most
The upper limit (such as 10) that can mostly accommodate no more than the vacuum chamber 11, and the quantity of the crucible switching device 13 is less than or
Equal to the quantity of the evaporation source 12.Wherein, when the quantity of the crucible switching device 13 is less than the quantity of the evaporation source 12
When, the corresponding multiple evaporation sources 12 of each crucible switching device 13, when the quantity of the crucible switching device 13 is equal to the evaporation
When the quantity in source 12, the corresponding evaporation source 12 of each crucible switching device 13.
Preferably, the quantity of the crucible 30 on the crucible load plate 10 of each crucible switching device 13 is 2 to 10, the steaming
It rises and 12 is uniformly distributed on a round circumference.
It should be noted that if the quantity of the evaporation source 12 and crucible switching device 13 is 3, each crucible switching
The quantity of crucible 30 on the crucible load plate 10 of device 13 is 10, then a vacuum chamber 11 can be loaded into 30 crucibles 30, is existing
There are 3 times of technology, significantly increases the loading of crucible 30, and 30 30, crucible needs, 3 evaporation sources 2, evaporation source 2 count
Amount is the 1/10 of the prior art, which can complete to switch under vacuum conditions by crucible switching device, that is to say, that
The material that operation of once beginning to speak to feed can fill 30 crucibles substantially prolongs in the identical situation of plating rate and begins to speak to feed
Period reduce equipment cost to improve production efficiency.
In conclusion evaporation coating device of the invention, comprising: vacuum chamber, the evaporation source in the vacuum chamber, Yi Jishe
Crucible switching device above the evaporation source, wherein the crucible switching device includes: crucible load plate, is set to the earthenware
Multiple crucibles on crucible load plate and the kinematic axis being vertically connected set on crucible load plate bottom and the crucible load plate, lead to
It crosses to control the kinematic axis crucible load plate rotation and elevating movement is driven to realize under vacuum conditions and complete in evaporation source
Crucible switching, realizes that an evaporation source corresponds to multiple crucibles, to increase the quantity of crucible loading, reduces the quantity of evaporation source,
In the period for extending charging of beginning to speak, production efficiency is improved, reduces equipment cost.
The above for those of ordinary skill in the art can according to the technique and scheme of the present invention and technology
Other various corresponding changes and modifications are made in design, and all these change and modification all should belong to the appended right of the present invention
It is required that protection scope.
Claims (7)
1. a kind of evaporation coating device characterized by comprising vacuum chamber (11), the evaporation source being set in the vacuum chamber (11)
(12) and be set to the evaporation source (12) above crucible switching device (13)；
The crucible switching device (13) includes: crucible load plate (10), multiple crucibles on the crucible load plate (10)
(30) and set on crucible load plate (10) bottom and the crucible load plate (10) kinematic axis (20) being vertically connected；
The crucible load plate (10) is equipped with multiple through-holes (50), and correspondence is placed with a crucible in each through-hole (50)
(30)；
The kinematic axis (20) drives the crucible load plate (10) to rotate around the axis of the kinematic axis (20), so that crucible load plate
(10) crucible (30) and evaporation source (12) on align, and the kinematic axis (20) drives the crucible load plate (10) to move along described
The axial direction of axis (20) is risen or fallen, so that crucible (30) separates with evaporation source (12) or crucible (30) is put into evaporation source
(12) in；
The kinematic axis (20) includes: rotary shaft (21) and the lifting shaft (22) being sheathed in the rotary shaft (21)；
The top diameter of the crucible (30) is greater than the base diameter of the crucible (30), and the diameter of the through-hole (50) is greater than institute
It states the base diameter of crucible (30) and is less than the top diameter of the crucible (30)；
The shape of the crucible load plate (10) is circle, and the multiple through-hole (50) is uniformly distributed in a crucible load plate (10)
Concentric circles circumference on, the kinematic axis (20) be set to the crucible load plate (10) bottom central point.
2. evaporation coating device as described in claim 1, which is characterized in that the quantity of the evaporation source (12) is 2 to 10, described
The quantity of crucible switching device (13) is less than or equal to the quantity of the evaporation source (12), the earthenware of each crucible switching device (13)
The quantity of crucible (30) on crucible load plate (10) is 2 to 10.
3. evaporation coating device as claimed in claim 2, which is characterized in that the evaporation source (12) is uniformly distributed in a round circle
Zhou Shang.
4. evaporation coating device as claimed in claim 2, which is characterized in that the quantity of the crucible switching device (13) is less than described
The quantity of evaporation source (12), the corresponding multiple evaporation sources (12) of each crucible switching device (13).
5. evaporation coating device as claimed in claim 2, which is characterized in that the quantity of the crucible switching device (13) is equal to described
The quantity of evaporation source (12), the corresponding evaporation source (12) of each crucible switching device (13).
6. evaporation coating device as claimed in claim 5, which is characterized in that the evaporation source (12) and crucible switching device (13)
Quantity is 3.
7. evaporation coating device as claimed in claim 6, which is characterized in that the crucible load plate (10) of each crucible switching device (13)
On crucible (30) quantity be 10.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610251510.5A CN105861992B (en) | 2016-04-20 | 2016-04-20 | Evaporation coating device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610251510.5A CN105861992B (en) | 2016-04-20 | 2016-04-20 | Evaporation coating device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN105861992A CN105861992A (en) | 2016-08-17 |
| CN105861992B true CN105861992B (en) | 2019-04-30 |
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ID=56632708
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610251510.5A Active CN105861992B (en) | 2016-04-20 | 2016-04-20 | Evaporation coating device |
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| Country | Link |
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| CN (1) | CN105861992B (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107267923B (en) * | 2017-08-15 | 2019-05-17 | 佛山市南海区晶鼎泰智能科技有限公司 | A kind of primary and secondary crucible device that composition metal film layer is deposited |
| CN107916409B (en) * | 2017-11-27 | 2019-11-26 | 深圳市华星光电半导体显示技术有限公司 | A kind of part switching device and deposition system |
| CN112538605B (en) * | 2020-12-03 | 2024-05-14 | 福建华佳彩有限公司 | Evaporation equipment |
| CN112877649A (en) * | 2021-04-01 | 2021-06-01 | 宁波星河材料科技有限公司 | High-flux thin film preparation device convenient for crucible replacement and application thereof |
| CN114277354B (en) * | 2021-12-28 | 2023-09-19 | 深圳奥卓真空设备技术有限公司 | AF continuous vacuum coating equipment and uniformity control method thereof |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006104513A (en) * | 2004-10-04 | 2006-04-20 | Toyota Industries Corp | Crucible cooling method in evaporation source, and evaporation source |
| KR100579866B1 (en) * | 2004-12-02 | 2006-05-15 | 두산디앤디 주식회사 | Substrate deposition device |
-
2016
- 2016-04-20 CN CN201610251510.5A patent/CN105861992B/en active Active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006104513A (en) * | 2004-10-04 | 2006-04-20 | Toyota Industries Corp | Crucible cooling method in evaporation source, and evaporation source |
| KR100579866B1 (en) * | 2004-12-02 | 2006-05-15 | 두산디앤디 주식회사 | Substrate deposition device |
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| Publication number | Publication date |
|---|---|
| CN105861992A (en) | 2016-08-17 |
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