CN114277354B - AF continuous vacuum coating equipment and uniformity control method thereof - Google Patents
AF continuous vacuum coating equipment and uniformity control method thereof Download PDFInfo
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- CN114277354B CN114277354B CN202111628727.0A CN202111628727A CN114277354B CN 114277354 B CN114277354 B CN 114277354B CN 202111628727 A CN202111628727 A CN 202111628727A CN 114277354 B CN114277354 B CN 114277354B
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- 238000000034 method Methods 0.000 title claims abstract description 13
- 238000001771 vacuum deposition Methods 0.000 title claims abstract description 12
- 238000001704 evaporation Methods 0.000 claims abstract description 105
- 230000008020 evaporation Effects 0.000 claims abstract description 103
- 239000003814 drug Substances 0.000 claims abstract description 52
- 239000007788 liquid Substances 0.000 claims abstract description 52
- 239000000178 monomer Substances 0.000 claims abstract description 31
- 239000011248 coating agent Substances 0.000 claims abstract description 12
- 238000000576 coating method Methods 0.000 claims abstract description 12
- 238000007789 sealing Methods 0.000 claims abstract description 4
- 239000000758 substrate Substances 0.000 claims description 13
- 239000007888 film coating Substances 0.000 claims description 7
- 238000009501 film coating Methods 0.000 claims description 7
- 238000007747 plating Methods 0.000 claims description 5
- 238000005303 weighing Methods 0.000 claims description 5
- 238000009826 distribution Methods 0.000 claims description 3
- 238000004088 simulation Methods 0.000 claims description 3
- 238000004364 calculation method Methods 0.000 claims description 2
- 239000000463 material Substances 0.000 claims description 2
- 238000013178 mathematical model Methods 0.000 claims description 2
- 238000010438 heat treatment Methods 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 abstract description 11
- 238000005457 optimization Methods 0.000 abstract description 5
- 239000011159 matrix material Substances 0.000 abstract description 3
- 230000003287 optical effect Effects 0.000 abstract description 3
- 230000003666 anti-fingerprint Effects 0.000 abstract description 2
- 230000003373 anti-fouling effect Effects 0.000 abstract description 2
- 238000007738 vacuum evaporation Methods 0.000 abstract 1
- 238000010586 diagram Methods 0.000 description 4
- 229910008284 Si—F Inorganic materials 0.000 description 3
- 239000002699 waste material Substances 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 2
- 230000017525 heat dissipation Effects 0.000 description 2
- 238000010923 batch production Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 230000003028 elevating effect Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
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Abstract
The invention discloses AF continuous vacuum coating equipment and a uniformity control method thereof, belonging to the field of optical lens antifouling and anti-fingerprint. The vacuum evaporation source comprises evaporation source monomers arranged above equipment, wherein the evaporation source monomers comprise a liquid medicine interface, an evaporation source system and an evaporation source interface, the liquid medicine interface, the evaporation source system and the evaporation source interface are sequentially and fixedly connected in a sealing manner from top to bottom, and the vacuum cavity is arranged below the evaporation source monomers and is connected with the vacuum cavity. The invention adopts the evaporation source system with the rotating mechanism, and the multiple sets of evaporation source systems are replaced, so that the heater can be cooled for enough time and liquid medicine is added, the rapid AF (AS) continuous coating production with the beat of 3-5 minutes is realized, and the mass production becomes reality; the matrix type AF evaporation source lattice is adopted, and on the premise of ensuring uniformity and wear resistance, the economical optimization of the dosage of AF liquid medicine is realized.
Description
Technical Field
The invention belongs to the field of antifouling and anti-fingerprint of optical lenses, and particularly relates to AF continuous vacuum coating equipment and a uniformity control method thereof.
Background
Current AF (AS) coating techniques include two broad categories, AF (AS) atmospheric spray coating techniques, AF (AS) vacuum coating techniques, respectively. The former has poor bonding degree of Si-F bonds and limited wear resistance, and is not suitable for high-end products; the latter has good Si-F bond bonding degree, but has slower production beat, and has the problem of great waste of AF liquid medicine. Generally, the production takt of the existing AF coating film is 30 minutes or longer, the problem of AF liquid medicine waste is quite obvious, and the waste of the AF liquid medicine is 2-5 times of the use amount of the AF liquid medicine due to the requirements of uniformity and wear resistance.
Disclosure of Invention
The invention aims to provide AF continuous vacuum coating equipment and a uniformity control method thereof, which aim to solve the problems in the background technology. In order to achieve the purpose, the invention adopts the following technical scheme:
the utility model provides an AF continuous vacuum coating equipment and homogeneity control method thereof, includes the evaporation source monomer of installing in equipment top, evaporation source monomer includes liquid medicine interface, evaporation source system and evaporation source interface, liquid medicine interface, evaporation source system and evaporation source interface are sealed fixed connection from top to bottom in proper order, and the vacuum cavity is installed evaporation source monomer's below, evaporation source interface with the vacuum cavity is refuted.
Specifically, the number of the evaporation source monomers is not less than 2, 12 evaporation source monomers are designed in the embodiment, the number of the evaporation source monomers can also be 6, 8 and other combinations, and a plurality of evaporation source monomers form an evaporation source lattice; the liquid medicine interface specifically comprises a liquid medicine adding system, a vacuum valve system and a precise metering pump for weighing the liquid medicine, wherein the vacuum valve system is required to be opened in the liquid medicine adding process, so that air is prevented from entering the vacuum cavity, and the quality of a coated substrate is prevented from being influenced. After the liquid medicine is added, the vacuum valve and the vacuum pump system are started to vacuumize, so that the evaporation source monomer can be connected with the vacuum cavity in a vacuum way after entering a high-vacuum environment, and the evaporation source monomer preparation working stage is entered.
Specifically, the evaporation source system comprises a heater, a rotating mechanism, a lifting mechanism and a liquid medicine station, wherein the heater is arranged inside the evaporation source system and is close to the liquid medicine station, and the rotating mechanism is in a ring shape and is fixedly arranged on the outer side of the evaporation source system. The rotary mechanism is used for controlling the replacement of evaporation source system, evaporation source system quantity is not less than 2, and every evaporation source monomer is inside to be equipped with 8 evaporation source systems in this embodiment, sets up a plurality of evaporation source systems and can let the heater possess sufficient time heat dissipation and add the liquid medicine, improves production efficiency. The vacuum pump group is arranged in the vacuum cavity, the number of the vacuum pumps in the vacuum pump group is not less than 2, and the redundant design is adopted, so that the vacuum pump not only can rapidly vacuumize, but also can continuously work when a certain vacuum pump fails, and the production work is ensured not to be interrupted. The whole equipment also comprises a central control system and a feedback system, and the whole equipment is fully-automatic in operation, so that manpower is saved.
A uniformity control method of continuous vacuum coating equipment is applied to the continuous vacuum coating equipment, and comprises the following steps: (1) The coated substrate is placed in a vacuum bin body, and the vacuum bin body is pumped until the pressure reaches 10 < -4 > Pa to 10 < -3 > Pa; (2) The liquid medicine adding system of the liquid medicine interface is started, and the liquid medicine weighed by the precise metering pump is conveyed to the evaporation source system; (3) The evaporation source systems of the evaporation source lattice are started, the evaporation source systems filled with the liquid medicine reach a preset position through a rotating mechanism and a lifting mechanism, a heater is heated to a preset temperature, and when the liquid medicine is used up after the heater of one evaporation source system is overheated, the rotating mechanism rotates to replace the next evaporation source system;
(4) After the film coating of the film coating substrate is finished, the film coating substrate is replaced, and the rotating mechanism rotates to replace the next evaporation source system and lifts to a preset position;
(5) And the like, closing the whole electrical system until all coating materials are coated.
The invention has the beneficial effects that: the invention adopts a high vacuum continuous coating technology to ensure that the bonding degree of Si-F bonds is very sufficient, and the product performance is excellent; the invention adopts the evaporation source system with the rotating mechanism, and the multiple sets of evaporation source systems are replaced, so that the heater can be cooled for enough time and liquid medicine is added, the rapid AF (AS) continuous coating production with the beat of 3-5 minutes is realized, and the mass production becomes reality; the invention adopts a matrix type AF evaporation source lattice, and on the premise of ensuring uniformity and wear resistance, the economical optimization of the dosage of AF liquid medicine is realized; the invention establishes a mathematical model for the AF evaporation source lattice based on past experience and theory to carry out simulation calculation, ensures optimization of elements such as lattice distribution, cavity design and the like, and ensures that the optical controllability of the AF layer is more precise.
Drawings
FIG. 1 is a schematic diagram of an evaporation source monomer structure according to an embodiment of the present invention;
FIG. 2 is a schematic diagram of an overall structure according to an embodiment of the present invention;
FIG. 3 is a schematic top view of an embodiment of the present invention;
FIG. 4 is a schematic diagram of simulation results according to an embodiment of the present invention.
Wherein, each reference sign in the figure:
1. evaporating source lattice; 11. evaporating source monomer; 111. a liquid medicine interface; 1111. a liquid medicine adding system; 1112. a vacuum valve system; 1113. a precision metering pump; 112. an evaporation source system; 1121. a heater; 1122. a rotation mechanism; 1123. a lifting mechanism; 113. an evaporation source interface; 1131. a vacuum valve; 2. a vacuum chamber; 21. a vacuum pump unit; and 3, coating a film substrate.
Detailed Description
In order that the invention may be readily understood, a more complete description of the invention will be rendered by reference to the appended drawings. The drawings illustrate preferred embodiments of the invention. This invention may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete.
The technical scheme of the patent is further described in detail below with reference to the specific embodiments.
As shown in fig. 1 to 3, the evaporation source monomer 11 in fig. 1 is schematically shown in the structure, fig. 2 is a schematic diagram of the whole structure of the invention, fig. 3 is a top view of the invention, and as shown in the figure, the invention comprises the evaporation source monomer 11 arranged above equipment, the evaporation source monomer 11 is provided with a liquid medicine interface 111, an evaporation source system 112 and an evaporation source interface 113, the liquid medicine interface 111, the evaporation source system 112 and the evaporation source interface 113 are sequentially and fixedly connected in a sealing way from top to bottom, a vacuum cavity 2 is arranged below the evaporation source monomer 11, and the evaporation source interface 113 is connected with the vacuum cavity 2. The number of the evaporation source monomers 11 is not less than 2, 12 evaporation source monomers 11 are designed in the embodiment, the number of the evaporation source monomers 11 can also be 6, 8 and other combinations, and the evaporation source monomers 11 form the evaporation source lattice 1, so that the film plating of the film plating substrate 3 is more uniform; the liquid medicine interface 111 specifically includes a liquid medicine adding system 1111, a vacuum valve system 1112 and a precise metering pump 1113 for weighing the liquid medicine, and the vacuum valve system 1112 needs to be opened during the liquid medicine adding process to prevent air from entering the vacuum cavity 2 and affecting the quality of the coated substrate 3.
As shown in fig. 1, the evaporation source system 112 specifically includes a heater 1121, a rotating mechanism 1122, a lifting mechanism 1123 and a liquid medicine station, the heater 1121 is installed inside the evaporation source system 112 and is close to the liquid medicine station, and the rotating mechanism 1122 is in a ring shape and is fixedly installed outside the evaporation source system 112. The rotation mechanism 1122 is used for controlling the replacement of the evaporation source systems 112, the number of the evaporation source systems 112 is not less than 2, in this embodiment, 8 evaporation source systems 112 are arranged in each evaporation source monomer 11, and the plurality of evaporation source systems 112 are arranged, so that the heater 1121 can have enough time for heat dissipation and adding of liquid medicine, and the production efficiency is improved. The vacuum pump group 21 is arranged in the vacuum cavity 2, the number of the vacuum pumps in the vacuum pump group 21 is not less than 2, and the redundant design is adopted, so that the vacuum pump not only can rapidly vacuumize, but also can continuously work when a certain vacuum pump fails, and the production work is ensured not to be interrupted. The whole equipment also comprises a central control system and a feedback system, and the whole equipment is fully-automatic in operation, so that manpower is saved.
When the vacuum coating device is used, a central control system is started, electricity starts to run, a substrate needing coating is placed in the vacuum cavity 2, a sealing door is closed, a vacuum pump set 21 is started, a sensor detects the internal air pressure of the vacuum cavity 2 in real time and feeds back to a central processing unit, an evaporation source lattice 1 is started, liquid medicine interfaces 111, an evaporation source system 112 and an evaporation source interface 113 in a plurality of evaporation source monomers 11 are started, and when the air pressure in the vacuum cavity 2 reaches a preset air pressure, liquid medicine of the evaporation source interface 113 enters the vacuum cavity 2 to coat a coating substrate 3; if the temperature of the heater 1121 of the evaporation source system 112 is too high or the chemical solution is used up, the elevating mechanism 1123 and the rotating mechanism 1122 are activated to replace the evaporation source system 112 until the coating of the substrate is completed.
As shown in fig. 4, the AF evaporation source lattice 1 is modeled based on conventional experience and theory to ensure optimization of lattice distribution, cavity design, electrical control, and the like.
The evaporation source system 112 with the rotating mechanism 1122 is adopted, the multiple sets of evaporation source systems 112 are replaced, the heater 1121 can be cooled for enough time and liquid medicine is added, rapid AF (AS) continuous film coating production with a beat of 3-5 minutes is realized, and large-scale batch production is realized; the invention adopts the matrix AF evaporation source lattice 1, and the economical optimization of the dosage of AF liquid medicine is realized on the premise of ensuring the uniformity and the wear resistance.
It will be understood that when an element is referred to as being "fixed to" another element, it can be directly on the other element or intervening elements may also be present. When an element is referred to as being "connected" to another element, it can be directly connected to the other element or intervening elements may also be present. In contrast, when an element is referred to as being "directly on" another element, there are no intervening elements present. The terms "vertical," "horizontal," "left," "right," and the like are used herein for illustrative purposes only and are not meant to be the only embodiments, and the terms "upper," "lower," "left," "right," "front," "back," and the like are used herein with reference to the positional relationship of the drawings.
Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. The terminology used herein in the description of the invention is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. The term "and/or" as used herein includes any and all combinations of one or more of the associated listed items.
The above embodiments are only for illustrating the present invention, not for limiting the present invention, and various changes and modifications may be made by one of ordinary skill in the relevant art without departing from the spirit and scope of the present invention, and therefore, all equivalent technical solutions are also within the scope of the present invention, and the scope of the present invention is defined by the claims.
Claims (5)
1. An AF continuous vacuum coating device, which is characterized in that: the evaporation source monomer comprises a liquid medicine interface, an evaporation source system and an evaporation source interface, wherein the liquid medicine interface, the evaporation source system and the evaporation source interface are sequentially and fixedly connected in a sealing manner from top to bottom, a vacuum cavity is arranged below the evaporation source monomer, and the evaporation source interface is connected with the vacuum cavity; the evaporation source system comprises a heater, a rotating mechanism, a lifting mechanism and a liquid medicine station, wherein the heater is positioned inside the evaporation source system and is close to the liquid medicine station, the rotating mechanism is fixedly arranged outside the evaporation source system in a ring shape, the number of evaporation source monomers is not less than 2, the number of the evaporation source systems inside the evaporation source monomers is not less than 2, the evaporation source monomers form an evaporation source lattice, a mathematical model is built for the evaporation source lattice to carry out simulation calculation, and lattice distribution is ensured.
2. An AF continuous vacuum plating apparatus according to claim 1, wherein: the liquid medicine interface comprises a liquid medicine adding system, a vacuum valve system and a precise weighing pump for weighing the liquid medicine.
3. An AF continuous vacuum plating apparatus according to claim 1, wherein: the vacuum cavity comprises vacuum pump groups, and the number of the vacuum pump groups is not less than 2.
4. An AF continuous vacuum plating apparatus according to claim 1, wherein: also comprises a central control system, a feedback system and an electric system.
5. The uniformity control method of the AF continuous vacuum coating equipment is characterized by comprising the steps of placing a coating substrate in a vacuum bin body and exhausting air from the vacuum bin body until reaching 10 < -4 > Pa to 10 < -3 > Pa; the liquid medicine adding system of the liquid medicine interface is started, and the liquid medicine weighed by the precise weighing pump is conveyed to the evaporation source system; starting the evaporation source systems of a plurality of evaporation source monomers, enabling the evaporation source system filled with the liquid medicine to reach a preset position through a rotating mechanism and a lifting mechanism, heating the heater to a preset temperature, and rotating the rotating mechanism to replace the next evaporation source system after the liquid medicine is used up after the heater of one evaporation source system is overheated; after the film coating of the film coating substrate is finished, the film coating substrate is replaced, and the rotating mechanism rotates to replace the next evaporation source system and lifts to a preset position; and the like, closing the whole electrical system until all coating materials are coated.
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| Application Number | Priority Date | Filing Date | Title |
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| CN202111628727.0A CN114277354B (en) | 2021-12-28 | 2021-12-28 | AF continuous vacuum coating equipment and uniformity control method thereof |
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| CN202111628727.0A CN114277354B (en) | 2021-12-28 | 2021-12-28 | AF continuous vacuum coating equipment and uniformity control method thereof |
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| CN114277354B true CN114277354B (en) | 2023-09-19 |
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|---|---|---|---|---|
| JPH10168560A (en) * | 1996-12-06 | 1998-06-23 | Ulvac Japan Ltd | Evaporating source for organic material |
| JP2007332433A (en) * | 2006-06-16 | 2007-12-27 | Seiko Epson Corp | Vacuum vapor-deposition apparatus |
| CN101280418A (en) * | 2008-04-29 | 2008-10-08 | 南京邮电大学 | Multi-source vacuum evaporation device having multi-layer radial type evaporation source distribution structure |
| KR20160005876A (en) * | 2014-07-07 | 2016-01-18 | 주식회사 선익시스템 | Thin Film Deposition Apparatus with Multiple Evaporation Source |
| CN105861992A (en) * | 2016-04-20 | 2016-08-17 | 深圳市华星光电技术有限公司 | Evaporation device |
| CN207958483U (en) * | 2018-01-03 | 2018-10-12 | 爱发科豪威光电薄膜科技(深圳)有限公司 | Evaporation source and sputtering coating equipment |
| CN211199385U (en) * | 2019-11-28 | 2020-08-07 | 爱发科豪威光电薄膜科技(深圳)有限公司 | Evaporation source mechanism and sputter coating equipment |
| KR20200104743A (en) * | 2019-02-27 | 2020-09-04 | 캐논 톡키 가부시키가이샤 | Film forming apparatus, film forming method and manufacturing method of electronic device |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005082837A (en) * | 2003-09-05 | 2005-03-31 | Shin Meiwa Ind Co Ltd | Vacuum film deposition method and apparatus, and filter manufactured by using the same |
| KR20150065883A (en) * | 2012-11-14 | 2015-06-15 | 가부시키가이샤 고베 세이코쇼 | Film deposition device |
| CN103726020B (en) * | 2013-12-30 | 2016-09-14 | 深圳市华星光电技术有限公司 | Vacuum deposition apparatus and evaporation coating method |
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- 2021-12-28 CN CN202111628727.0A patent/CN114277354B/en active Active
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10168560A (en) * | 1996-12-06 | 1998-06-23 | Ulvac Japan Ltd | Evaporating source for organic material |
| JP2007332433A (en) * | 2006-06-16 | 2007-12-27 | Seiko Epson Corp | Vacuum vapor-deposition apparatus |
| CN101280418A (en) * | 2008-04-29 | 2008-10-08 | 南京邮电大学 | Multi-source vacuum evaporation device having multi-layer radial type evaporation source distribution structure |
| KR20160005876A (en) * | 2014-07-07 | 2016-01-18 | 주식회사 선익시스템 | Thin Film Deposition Apparatus with Multiple Evaporation Source |
| CN105861992A (en) * | 2016-04-20 | 2016-08-17 | 深圳市华星光电技术有限公司 | Evaporation device |
| CN207958483U (en) * | 2018-01-03 | 2018-10-12 | 爱发科豪威光电薄膜科技(深圳)有限公司 | Evaporation source and sputtering coating equipment |
| KR20200104743A (en) * | 2019-02-27 | 2020-09-04 | 캐논 톡키 가부시키가이샤 | Film forming apparatus, film forming method and manufacturing method of electronic device |
| CN211199385U (en) * | 2019-11-28 | 2020-08-07 | 爱发科豪威光电薄膜科技(深圳)有限公司 | Evaporation source mechanism and sputter coating equipment |
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Address after: No. 804, Building 1, 159 Tianxing 5th Road, Xiangzhou District, Zhuhai City, Guangdong Province 519000 Patentee after: Aozhuo Vacuum Equipment Technology (Zhuhai) Co.,Ltd. Country or region after: China Address before: 518000 6f-6b (06), Shenzhou computer building, Madame Curie Avenue, wankecheng community, Bantian street, Longgang District, Shenzhen, Guangdong Province Patentee before: Shenzhen aozhuo Vacuum Equipment Technology Co.,Ltd. Country or region before: China |
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