CN107267923A - A kind of primary and secondary crucible device that composition metal film layer is deposited - Google Patents
A kind of primary and secondary crucible device that composition metal film layer is deposited Download PDFInfo
- Publication number
- CN107267923A CN107267923A CN201710695440.7A CN201710695440A CN107267923A CN 107267923 A CN107267923 A CN 107267923A CN 201710695440 A CN201710695440 A CN 201710695440A CN 107267923 A CN107267923 A CN 107267923A
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- China
- Prior art keywords
- crucible
- sub
- female
- pedestal
- film layer
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The present invention develops a kind of primary and secondary crucible device that composition metal film layer is deposited, including pedestal, it is characterized in that：Provided with female crucible and some sub- crucible mold blocks on pedestal；Female crucible mounting groove is reserved with the pedestal, female crucible is arranged in female crucible mounting groove；Some described sub- crucible mold blocks are that the outline for surrounding female crucible is distributed on pedestal；Each described sub- crucible module includes sub- stool, sub- crucible, electron gun and driving cylinder；The sub- stool is hinged on the surface of the pedestal；The sub- crucible and electron gun are each attached to the sub- stool surface, and the push rod of the driving cylinder is connected to the bottom of the sub- crucible；The sub- crucible can opposite base overturn above the periphery of female crucible；It is equipped between each described sub- crucible and female crucible and favours the drainage trough that the surface of pedestal is set.The invention, which has, prepares efficient, even film layer and people's low cost and other advantages.
Description
Technical field
Metallic diaphragm device is prepared the present invention relates to a kind of evaporation, especially a kind of primary and secondary that composition metal film layer is deposited
Crucible device.
Background technology
Material surface handle application field, evaporation coating prepare metallic diaphragm be frequently with method, common evaporation
Plated film is that a kind of evaporation material is put in a crucible, is evaporated by an electron gun control, wants to obtain different metal+alloy material
The multi-layer composite coatings of+different metal etc. are, it is necessary to which multiple crucibles, more electron gun.Because each crucible has in the presence of certain
Effect evaporation scope, the evaporation scope of multiple crucibles is different, can cause the inhomogeneities of film layer.
For this reason, it may be necessary to develop the equipment that a kind of new crucible electron gun evaporation prepares metallic diaphragm.
The content of the invention
It is an object of the invention to provide it is a kind of prepare efficiently, even film layer and the low evaporation of people's cost prepare metallic diaphragm
Equipment.
To achieve these goals, the present invention is adopted the following technical scheme that：
A kind of primary and secondary crucible device that composition metal film layer is deposited, including pedestal, it is characterized in that：Provided with mother on pedestal
Crucible and some sub- crucible mold blocks；Female crucible mounting groove is reserved with the pedestal, female crucible is arranged on female earthenware
In crucible mounting groove；Some described sub- crucible mold blocks are that the outline for surrounding female crucible is distributed on pedestal；It is each described
Sub- crucible module include sub- stool, sub- crucible, electron gun and driving cylinder；The sub- stool is hinged on the pedestal
Surface；The sub- crucible and electron gun are each attached to the sub- stool surface, and the push rod of the driving cylinder is connected to institute
State the bottom of sub- crucible；The sub- crucible can opposite base overturn above the periphery of female crucible；Each described sub- crucible with
It is equipped between female crucible and favours the drainage trough that the surface of pedestal is set；One end of the drainage trough extends obliquely to female earthenware
Above crucible, the other end is towards sub- crucible；The sub- crucible can opposite base overturn to the top of drainage trough.
The operation principle of the present invention is as follows：
Required metal is positioned in sub- crucible, by controlling each electron gun to preheat and switching.Then by controlling to drive
Device, so as to control feeding, allows metal to be flowed out from sub- crucible, by drainage trough, flows to main crucible, so that the shape in main crucible
Into alloy solution.The different elemental metals of sub- crucible around by coordinating, can finally obtain multiple combinations, membrane uniformity
Variety classes Alloy Composite Coating.
In order to be accurately positioned when ensureing and installing equipment, it is preferred that the pedestal is additionally provided with the push rod for driving cylinder
The clearance position passed through.
In order to ensure the metal liquid energy in crucible smoothly imports drainage trough, it is preferred that the drainage trough and the pedestal
It is 10 °~25 ° to form gradient.
In order to ensure the security in the course of work, convenient transportation and with reaching design effect, it is preferred that the pedestal
Outline is sector；Crucible outline is discoid.
Brief description of the drawings
Fig. 1 is a kind of side structure schematic view for the primary and secondary crucible device that composition metal film layer is deposited in embodiment 1；
Fig. 2 is a kind of dimensional structure diagram for the primary and secondary crucible device that composition metal film layer is deposited in embodiment 1.
Description of reference numerals：1- pedestals；2- mother's crucibles；3- crucible modules；4- mother's crucible mounting grooves；5- crucibles bottom
Seat；6- crucibles；7- electron guns；8- drive cylinders；9- clearance positions；10- drainage troughs.
Embodiment
The present invention is further described with reference to the accompanying drawings and examples.
As shown in Figure 1-2, a kind of primary and secondary crucible device that composition metal film layer is deposited, including pedestal 1, it is characterized in that：
Provided with 1 female crucible 2 and 4 sub- crucible modules 3 on pedestal 1；Female crucible mounting groove 4 is reserved with pedestal 1, female crucible 2 is pacified
In female crucible mounting groove 4；4 sub- crucible modules 3 are that the outline for surrounding female crucible is distributed on pedestal.
Every sub- crucible mold block 3 includes sub- stool 5, sub- crucible 6, electron gun 7 and driving cylinder 8；Sub- stool 5 is cut with scissors
It is connected on the surface of pedestal 1；Sub- crucible 6 and electron gun 7 are each attached to the sub- susceptor surface of crucible 6, and the push rod of driving cylinder 8 is connected to son
The bottom of crucible 6；Sub- crucible 6 can opposite base 1 overturn above the periphery of female crucible 2；Every sub- crucible 6 and female crucible 2 it
Between be equipped with favour pedestal 1 surface set drainage trough 10；One end of drainage trough 10 is extended obliquely on female crucible 2
Side, the other end is towards sub- crucible 6；Sub- crucible 6 can opposite base 2 overturn to the top of drainage trough 10
As shown in Fig. 2 the outline of pedestal 1 is sector, female crucible 2 and sub- crucible 6 outline is discoid；Pedestal 1 is also
It is provided with the clearance position 9 passed through for the push rod of driving cylinder 8；Drainage trough 10 is 15 ° with the formation gradient of pedestal 1.
Required metal is positioned in each sub- crucible 6, by controlling each electron gun 7 to preheat and switch.Then control is passed through
Driving cylinder 8 processed, so as to control feeding, allows metal to be flowed out from sub- crucible 6, by drainage trough 7, the female crucible 2 of flow direction, so that in master
Alloy solution is formed in crucible 2.By coordinate around sub- crucible 6 different elemental metals, can finally obtain multiple combinations,
The variety classes Alloy Composite Coating of membrane uniformity.
Although the present invention is illustrated by specific embodiment, it will be appreciated by those skilled in the art that, do not departing from
In the case of the scope of the invention, various conversion and equivalent substitute can also be carried out to the present invention.In addition, for particular condition or answering
With various modifications can be made to the present invention, without departing from the scope of the present invention.Therefore, the present invention is not limited to disclosed tool
Body embodiment, and whole embodiments for falling within the scope of the appended claims should be included.
Claims (5)
1. a kind of primary and secondary crucible device that composition metal film layer is deposited, including pedestal, it is characterized in that：Provided with female earthenware on pedestal
Crucible and some sub- crucible mold blocks；Female crucible mounting groove is reserved with the pedestal, female crucible is arranged on female crucible
In mounting groove；Some described sub- crucible mold blocks are that the outline for surrounding female crucible is distributed on pedestal；Described in each
Sub- crucible module includes sub- stool, sub- crucible, electron gun and driving cylinder；The sub- stool is hinged on the pedestal
Surface；The sub- crucible and electron gun are each attached to the sub- stool surface, and the push rod of the driving cylinder is connected to described
The bottom of sub- crucible；The sub- crucible can opposite base overturn above the periphery of female crucible；Each described sub- crucible and mother
It is equipped between crucible and favours the drainage trough that the surface of pedestal is set；One end of the drainage trough extends obliquely to female crucible
Top, the other end is towards sub- crucible；The sub- crucible can opposite base overturn to the top of drainage trough.
2. a kind of primary and secondary crucible device that composition metal film layer is deposited according to claim 1, it is characterized in that, the base
Seat is additionally provided with the clearance position passed through for the push rod of driving cylinder.
3. a kind of primary and secondary crucible device of evaporation composition metal film layer according to claim 1 and 2, it is characterized in that, institute
It is 10 °~25 ° that drainage trough, which is stated, with pedestal formation gradient.
4. a kind of primary and secondary crucible device that composition metal film layer is deposited according to claim 1, it is characterized in that, the base
Seat outline is sector.
5. a kind of primary and secondary crucible device that composition metal film layer is deposited according to claim 1, it is characterized in that, the earthenware
Crucible outline is discoid.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710695440.7A CN107267923B (en) | 2017-08-15 | 2017-08-15 | A kind of primary and secondary crucible device that composition metal film layer is deposited |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710695440.7A CN107267923B (en) | 2017-08-15 | 2017-08-15 | A kind of primary and secondary crucible device that composition metal film layer is deposited |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN107267923A true CN107267923A (en) | 2017-10-20 |
| CN107267923B CN107267923B (en) | 2019-05-17 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201710695440.7A Active CN107267923B (en) | 2017-08-15 | 2017-08-15 | A kind of primary and secondary crucible device that composition metal film layer is deposited |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109881181A (en) * | 2019-01-31 | 2019-06-14 | 长江存储科技有限责任公司 | Semiconductor processing equipment |
| CN110220375A (en) * | 2019-03-21 | 2019-09-10 | 佛山市南海区辉泰科技机械有限公司 | A kind of primary and secondary smelting furnace |
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|---|---|---|---|---|
| JPS57161061A (en) * | 1981-03-30 | 1982-10-04 | Tdk Corp | Crucible for evaporation |
| JPS6137961A (en) * | 1984-07-28 | 1986-02-22 | Matsushita Electric Ind Co Ltd | Multiple-source vapor deposition device |
| JPH03294474A (en) * | 1990-04-11 | 1991-12-25 | Mitsubishi Electric Corp | Film formation apparatus |
| CN101096748A (en) * | 2006-06-28 | 2008-01-02 | 鸿富锦精密工业（深圳）有限公司 | Combined type copple |
| CN102337502A (en) * | 2010-07-19 | 2012-02-01 | 鸿富锦精密工业（深圳）有限公司 | Film material processing device and vapor deposition equipment with same |
| CN202688419U (en) * | 2012-06-08 | 2013-01-23 | 杭州大和热磁电子有限公司 | Multi-crucible electronic gun |
| TW201339340A (en) * | 2012-03-28 | 2013-10-01 | Advanced Wireless Semiconductor Company | Evaporation apparatus for evaporating thick Ag layer by using electron gun |
| CN105624611A (en) * | 2016-03-29 | 2016-06-01 | 苏州方昇光电装备技术有限公司 | Rotary organic material evaporating device |
| CN105861992A (en) * | 2016-04-20 | 2016-08-17 | 深圳市华星光电技术有限公司 | Evaporation device |
| CN205688001U (en) * | 2016-06-04 | 2016-11-16 | 浙江星星科技股份有限公司 | A kind of raw material evaporation mechanism of the coater for making colourless superhard AR+AF panel |
| CN106947945A (en) * | 2017-05-11 | 2017-07-14 | 成都西沃克真空科技有限公司 | One kind resistance steaming device steams platform with many steric hindrances of Shockproof type |
| CN206385252U (en) * | 2016-12-15 | 2017-08-08 | 浙江美迪凯现代光电有限公司 | A kind of quartz wedge of plated film |
-
2017
- 2017-08-15 CN CN201710695440.7A patent/CN107267923B/en active Active
Patent Citations (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57161061A (en) * | 1981-03-30 | 1982-10-04 | Tdk Corp | Crucible for evaporation |
| JPS6137961A (en) * | 1984-07-28 | 1986-02-22 | Matsushita Electric Ind Co Ltd | Multiple-source vapor deposition device |
| JPH03294474A (en) * | 1990-04-11 | 1991-12-25 | Mitsubishi Electric Corp | Film formation apparatus |
| CN101096748A (en) * | 2006-06-28 | 2008-01-02 | 鸿富锦精密工业（深圳）有限公司 | Combined type copple |
| CN102337502A (en) * | 2010-07-19 | 2012-02-01 | 鸿富锦精密工业（深圳）有限公司 | Film material processing device and vapor deposition equipment with same |
| TW201339340A (en) * | 2012-03-28 | 2013-10-01 | Advanced Wireless Semiconductor Company | Evaporation apparatus for evaporating thick Ag layer by using electron gun |
| CN202688419U (en) * | 2012-06-08 | 2013-01-23 | 杭州大和热磁电子有限公司 | Multi-crucible electronic gun |
| CN105624611A (en) * | 2016-03-29 | 2016-06-01 | 苏州方昇光电装备技术有限公司 | Rotary organic material evaporating device |
| CN105861992A (en) * | 2016-04-20 | 2016-08-17 | 深圳市华星光电技术有限公司 | Evaporation device |
| CN205688001U (en) * | 2016-06-04 | 2016-11-16 | 浙江星星科技股份有限公司 | A kind of raw material evaporation mechanism of the coater for making colourless superhard AR+AF panel |
| CN206385252U (en) * | 2016-12-15 | 2017-08-08 | 浙江美迪凯现代光电有限公司 | A kind of quartz wedge of plated film |
| CN106947945A (en) * | 2017-05-11 | 2017-07-14 | 成都西沃克真空科技有限公司 | One kind resistance steaming device steams platform with many steric hindrances of Shockproof type |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109881181A (en) * | 2019-01-31 | 2019-06-14 | 长江存储科技有限责任公司 | Semiconductor processing equipment |
| CN110220375A (en) * | 2019-03-21 | 2019-09-10 | 佛山市南海区辉泰科技机械有限公司 | A kind of primary and secondary smelting furnace |
Also Published As
| Publication number | Publication date |
|---|---|
| CN107267923B (en) | 2019-05-17 |
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Address after: 528200 Becky Science and Technology Industrial Park, Shishan Town, Nanhai District, Foshan City, Guangdong Province, No. 1 Applicant after: Foshan Nanhai Jingding Tai Intelligent Technology Co.,Ltd. Address before: 528200 Factory Building No. 1 of Liang Jinping, Shizhong Village West Industrial Zone, Shishan Town, Foshan City, Guangdong Province Applicant before: FOSHAN NANHAI JINGDINGTAI MACHINERY EQUIPMENT Co.,Ltd. |
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| GR01 | Patent grant | ||
| PE01 | Entry into force of the registration of the contract for pledge of patent right |
Denomination of invention: A Parent Crucible Device for Evaporating Composite Metal Film Effective date of registration: 20220926 Granted publication date: 20190517 Pledgee: Guangdong Nanhai rural commercial bank Limited by Share Ltd. Guicheng branch Pledgor: Foshan Nanhai Jingding Tai Intelligent Technology Co.,Ltd. Registration number: Y2022980016451 |
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