CN204803400U - Substrate carrier - Google Patents
Substrate carrier Download PDFInfo
- Publication number
- CN204803400U CN204803400U CN201520433153.5U CN201520433153U CN204803400U CN 204803400 U CN204803400 U CN 204803400U CN 201520433153 U CN201520433153 U CN 201520433153U CN 204803400 U CN204803400 U CN 204803400U
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- Prior art keywords
- support bar
- substrate
- substrate carrier
- supporting base
- annulus
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Abstract
The utility model relates to a substrate carrier for in the evaporation deposit system, load the substrate, substrate carrier includes gyro wheel, bracing piece and supporting pedestal, gyro wheel and supporting pedestal connect respectively the both ends of bracing piece, supporting pedestal is used for placing the substrate, the gyro wheel is used for rolling on the track. The utility model provides a substrate carrier, including gyro wheel, bracing piece and supporting pedestal, can conveniently load the substrate, can realize carrying out the deposit to the substrate of equidimension not, simultaneously the deposit angle of inclination of adjustable substrate still, and the substrate carrier in this application can conveniently place the substrate, it is fixed firm stable to the substrate, do benefit to very much and go on the sedimentary of substrate.
Description
Technical field
The utility model relates to a kind of substrate carrier, particularly relates to the substrate carrier applied in a kind of glancing angle deposition vapo(u)rization system.
Background technology
Glancing angle deposition technology a kind ofly traditional thin film vacuum deposition and controlled substrate is rotated the novelty combined, effective method for manufacturing thin film.In traditional film deposition techniques, particle beam incides (i.e. normal incidence deposition) on substrate surface along the normal direction of substrate.And glancing angle deposition technology substrate is tilted (or changing the incident direction of particle beam), make the normal of the incident direction of particle beam and substrate surface (i.e. deposition angles) at a certain angle, the film that the method grows has the columnar structure of inclination.The nano structure membrane of different shape can be prepared by the angle of inclination and speed of rotation changing substrate, as spirrillum, inclination column, in a zigzag, C shape and vertical columnar structure etc., the character that porosity is high because having for these films, specific surface area is large and anisotropy etc. is superior, makes it be used widely in graded index antireflective film, sensor, solar cell, photon crystal device, photochemical catalysis etc.
At present, the glancing angle deposition vapo(u)rization system of application needs employing two motors to control the revolution of substrate and rotation and angle of inclination, as shown in Figure 6, the vapo(u)rization system of this structure adopts two at the motor 002 of cavity 001 inside, 003, be respectively used to the angle of inclination and the speed of rotation that control substrate 004, substrate is positioned at directly over evaporation source 005, be subject to the restriction of three-dimensional motion, substrate must be fixed, and adopt motor can only place a substrate deposition to control angle of inclination, because a motor can only carry out the control of angle of inclination or rotation to a substrate, deposit as needed multi-disc simultaneously, the number increasing motor is then needed to be controlled substrate respectively, this adds increased cost and the maintenance thereof of evaporation equipment.In addition, existing substrate carrier is complicated to the fixed sturcture of substrate, exists and is inconvenient to load, fix illusive problem.
Utility model content
In view of this, the purpose of this utility model is to provide a kind of substrate carrier, and structure is simple, easy to operate, to substrate fixation.
The substrate carrier that the utility model provides, for in hydatogenesis system, substrate is loaded, it is characterized in that, described substrate carrier comprises roller, support bar and supporting base, described roller and supporting base are connected to the two ends of described support bar, and described supporting base is for placing substrate, and described roller is used for rolling in orbit.
Preferably, the substrate place plane orthogonal described support bar and described supporting base placed.
Preferably, described roller, be between supporting base and support bar and be fixedly connected with.
Preferably, described roller and/or described supporting base are arranged to comprise vary in size interchangeable a series of.
Preferably, the length of described support bar can regulate.
Preferably, described support bar comprises the first support bar and the second support bar, described first support bar is provided with outside screw or internal thread, described second support bar being provided with corresponding internal thread or outside screw, adjusting the length of described support bar by adjusting described internal thread and externally threaded cooperation.
Preferably, described support bar comprises the first support bar and the second support bar, one end of described first support bar is sleeved on one end of the second support bar, adjusts the length of described support bar by adjusting the described first support bar cover length installed in described second support bar.
Preferably, described supporting base comprises annulus and support, described support comprises multiple branch, one end of multiple branch is intersected, its intersection point is positioned on the longitudinal cenlerline of described annulus, and with the center of circle of described annulus in a distance, this end of intersecting is connected with the end of described support bar, and other one end of multiple branch is fixed on described annulus.
Preferably, multiple branches of described support in uneven distribution, are formed with larger opening between Liang Ge branch wherein in the circumference of annulus.
Preferably, described annulus is provided with substrate fixed part, this substrate fixed part extends radially inwardly formation in the inner edge of described annulus along described annulus.
The substrate carrier that the utility model provides, comprises roller, support bar and supporting base, can load substrate easily; In the application, roller, be fixedly connected with between support bar and supporting base, the rotation of roller can drive the rotation of supporting base, thus the convenient uniform deposition realized substrate; By replacing roller, the supporting seat of different size, can realize depositing the substrate of different size, going back the deposition pitch angle of adjustable substrate simultaneously; Further, the substrate carrier in the application can place substrate easily, stablizes substrate fixation, is beneficial to very much the carrying out of the deposition to substrate.
Accompanying drawing explanation
By referring to the description of accompanying drawing to the utility model embodiment, above-mentioned and other objects of the present utility model, feature and advantage will be more clear, in the accompanying drawings:
Fig. 1 is the utility model glancing angle deposition vapo(u)rization system one-piece construction schematic diagram (its housing and vacuum-evaporator not shown);
Fig. 2 is the utility model glancing angle deposition vapo(u)rization system sectional view;
Fig. 3 is the substrate carrier one-piece construction schematic diagram in the utility model glancing angle deposition vapo(u)rization system;
Fig. 4 is the A-A sectional view in Fig. 3;
Deposition angles schematic diagram when Fig. 5 is the utility model glancing angle deposition vapo(u)rization system inclination evaporation;
Fig. 6 is glancing angle deposition vapo(u)rization system structural representation of the prior art.
Embodiment
Hereinafter with reference to accompanying drawing, various embodiment of the present utility model is described in more detail.In various figures, identical element adopts same or similar Reference numeral to represent.For the sake of clarity, the various piece in accompanying drawing is not drawn in proportion.
As shown in Figure 1-2, the glancing angle deposition vapo(u)rization system in the application comprises shell 1, actuating unit 2, deposition evaporation transmission mechanism 3 and vacuum-evaporator 4.A part for described actuating unit 2 is positioned at the outside of described shell 1, described deposition evaporation transmission mechanism 3 and vacuum-evaporator 4 are positioned at the inside of described shell, described actuating unit 2 evaporates transmission mechanism 3 be connected with described deposition, evaporates transmission mechanism 3 rotate for driving described deposition.Described vacuum-evaporator 4 can be thermal evaporation or electron beam evaporation, is positioned at the below of described deposition evaporation transmission mechanism 3.
Described actuating unit 2 comprises motor 21 and driving section 22, and described motor 21 is positioned at the outside of described shell 1, and like this, the vaporization temperature in housing can not impact motor 21, is conducive to the smooth running of motor 21, also can increase the work-ing life of motor 21 simultaneously.Described deposition evaporation transmission mechanism 3 is connected with described motor 21 by described driving section 22.Described driving section 22 comprises multiple sets of teeth wheel set.In a preferred embodiment, described gear pair comprises drive bevel gear 221, driven wheel of differential 222; Driver pinion (not shown) and driven master wheel 223.Described drive bevel gear 221 is connected with the output shaft of motor 21, and described driven wheel of differential 222 and drive bevel gear 221 are meshed, and coaxially, described pinion(gear) can rotate under the drive of described driven wheel of differential 222 for described driven wheel of differential 222 and described pinion(gear); Described master wheel 223 engages with described pinion(gear), can rotate under the drive of described pinion(gear), thus drives described deposition evaporation transmission mechanism 3 to rotate.Described motor 21 can be arranged on the upper end of described shell 1 by this structure easily, the convenient installation to motor 21.
As shown in Figure 1-2, described deposition evaporation transmission mechanism 3 comprises swivel mount 31, substrate carrier 32 and track 33.One end of described swivel mount 31 is connected with described actuating unit 2, can rotate under the driving of described actuating unit 2 around the longitudinal axis of self.Described substrate carrier 32 is connected to other one end of described swivel mount 31.Described track 33 position is fixed, and preferably, can be fixed on the inwall of described shell 1.Described substrate carrier 32 can realize along the revolution of described track 33 and the rotation around own longitudinal axis with the rotation of described swivel mount 31.
As shown in Figure 1-2, described swivel mount 31 comprises power connection 311 and support arm 312.The upper end of described power connection 311 is connected with described actuating unit 2, and one end of described support arm 312 is connected on the radially outer edge of described power connection 311.Preferably, described power connection 311 comprises union lever 3111 and shack 3112, and described union lever 3111 is provided with multiple, is connected to equably between described actuating unit 2 and shack 3112.The internal diameter of described shack 3112 is greater than the external diameter of described actuating unit 2 lower end, and the external diameter of described shack 3112 is less than the internal diameter of described track 33.Such power connection structure can increase the driving arm of force of motor, can also reduce the total quality of swivel mount 31 simultaneously, makes the rotation of whole deposition evaporation transmission mechanism 3 more flexible, is conducive to the accurate control to velocity of rotation.In order to adjust the height of described power connection 311, described shack 3112 can be arranged multiple (having illustrated in Fig. 1-2 that shack 3112 is the situation of two), is connected between multiple described shack 3112 by pole 3113.
Described support arm 312 is provided with multiple, and for shaft-like, its one end is connected in the outer rim of described shack 3112, and one end is positioned at the position near described track 33 in addition.Preferably, multiple described support arm is arranged in the outer rim of described shack 3112 equably.At described support arm 312, one end of described track 33 is provided with substrate carrier installation portion 3121.Described substrate carrier installation portion 3121 is provided with through hole 3122, for installing described substrate carrier 32.
As shown in Figure 3, described substrate carrier 32 comprises roller 321, support bar 322 and supporting base 323.Described roller 321 and supporting base 323 are connected to the two ends of described support bar 322.Described supporting base 323 for placing substrate, the substrate place plane orthogonal that described support bar 323 and described supporting base 323 are placed.Preferably, substrate place plane is vertically placed.Described roller 321, be between supporting base 323 and support bar 322 and be fixedly connected with, when described roller 321 rolls on described track 33, also be axle center rotation with own longitudinal axis while described support bar 322 can be driven to revolve round the sun with described roller 321, thus also carry out with the longitudinal axis of described support bar as axle center rotation while driving described supporting base 323 to carry out revolving round the sun further, thus realizing revolution and the spinning motion of substrate when pitch angle is evaporated, the speed that substrate rotates can be controlled by described actuating unit.Meanwhile, described roller 321 and supporting base 323 can be arranged to comprise vary in size interchangeable a series of, by replacing the roller 321 varied in size, can be used for the spin velocity size adjusting described substrate; By replacing the supporting base 323 that varies in size, can conveniently to the substrate of different size, such as 4 cun, 6 cun of silicon chips etc. carry out hydatogenesis, simultaneously by arranging multiple supporting base 323, once can carry out hydatogenesis to multiple substrate simultaneously.。
Preferably, the two ends of described support bar 322 are provided with helicitic texture, described roller 321 and supporting base 323 are fixed on the two ends of described support bar 322 by helicitic texture.
Preferably, the length of described support bar 322 can regulate, in a preferred embodiment, described support bar 322 comprises the first support bar 3221 and the second support bar 3222, described first support bar is provided with outside screw or internal thread, described second support bar 3222 is provided with corresponding internal thread or outside screw, by the cooperation of described outside screw and internal thread, described first support bar 3221 and the second support bar 3222 are coupled together thus form described support bar 322, just can adjust the length of described support bar 322 easily by adjusting described internal thread and externally threaded cooperation simultaneously.The mode of described support bar 322 length adjustment can also adopt other mode, such as by the mode of inside and outside sleeve, described inside and outside sleeve arranges locating structure, when inside and outside sleeve is adjusted to correct position time, by described locating structure, described inside and outside sleeve is positioned, so also can adjust the length of described support bar 322 easily.By adjusting the length of described support bar 322, the deposition angles of any one substrate can be adjusted easily, in same evaporation deposition process, realize different glancing angle depositions.
Preferably, described support bar 322 is fixed on the through hole 3122 on described support arm 312 near the one end be connected with described roller 321, and described supporting base 323 is positioned at the radially inner side of described track 33.Each support arm 312 can install a substrate carrier 32.The support bar 322 of all substrate carrier 32 in same plane, the co-planar or parallel at this plane and described track 33 place.
As shown in Figure 3, in a preferred embodiment, described supporting base 323 comprises annulus 3231 and support 3232.Described support 3232 comprises multiple branch, one end of multiple branch is intersected, its intersection point is positioned on the longitudinal cenlerline of described annulus 3231, and with the center of circle of described annulus 3231 in a distance, this end of intersecting is connected with the end of described support bar 322, and other one end of multiple branch is fixed on described annulus 3231.Preferably, multiple branches of described support 3232 are in uneven distribution in the circumference of annulus 3231, and be formed with larger opening 3233 between Liang Ge branch wherein, this larger opening 3233 can conveniently to the placement of substrate.
As shown in Figure 3-4, described annulus 3231 is provided with fixed part 3234, this fixed part 3234 extends radially inwardly formation in the inner edge of described annulus 3231 along described annulus 3231, its Inner edge diameter is less than the inner edge diameter of described annulus 3231, like this, between described annulus 3231 and fixed part 3234, stage portion 3235 is formed.During mounted substrate, substrate is put into described substrate from described larger opening 3233, and the outer rim of substrate is resisted against described stage portion 3235 place, then by gripping unit, described substrate is fixed on described supporting base 323 by the (not shown)s such as such as clip.Such structure, while facilitating substrate to install, can make the substrate after installing keep formation state, and the fixed safety to substrate, be convenient to carry out depositing operation to substrate.
As shown in Figure 2, described vacuum-evaporator 4 is positioned at the below of described deposition evaporation transmission mechanism 3, the evaporation source of described vacuum-evaporator 4 is placed towards described deposition evaporation transmission mechanism 3, the longitudinal cenlerline of described evaporation source and described support bar 322 place plane orthogonal, in other words, the longitudinal cenlerline of the evaporation source of described vacuum-evaporator 4 is positioned at vertical position, and the longitudinal cenlerline of described evaporation source is through the center of circle of described track 33 place circle.When vacuum-evaporation, the incident direction of particle beam becomes certain inclined angle alpha with the normal direction of the substrate be placed on supporting base 323, the size of deposition angles during by regulating the length of support bar 322 and adjustable tilt evaporation (as shown in Figure 5, schematically showing two different deposition angles α 1 and α 2 in Fig. 5).
Swivel mount 31 in glancing angle deposition device in the utility model can connect multiple substrate carrier 32, can simultaneously to multiple substrate hydatogenesis in a vacuum, and each substrate can be adjusted to identical or different angle of inclination.Therefore, glancing angle deposition vapo(u)rization system in the utility model has multi-disc evaporation, substrate rotates and the advantage such as tilt adjustable of each substrate, this is not only conducive to groping of high temperature evaporation and Initial Experimental Stage processing condition, but also be conducive to the reduction of production capacity lifting and production cost, be more suitable for the batch production of pitch angle evaporation nano structure membrane.
Last it is noted that obviously, above-described embodiment is only for the utility model example is clearly described, and the restriction not to embodiment.For those of ordinary skill in the field, can also make other changes in different forms on the basis of the above description.Here exhaustive without the need to also giving all embodiments.And thus the apparent change of amplifying out or variation be still among protection domain of the present utility model.
Claims (10)
1. a substrate carrier, for in hydatogenesis system, substrate is loaded, it is characterized in that, described substrate carrier comprises roller, support bar and supporting base, described roller and supporting base are connected to the two ends of described support bar, and described supporting base is for placing substrate, and described roller is used for rolling in orbit.
2. substrate carrier according to claim 1, is characterized in that, the substrate place plane orthogonal that described support bar and described supporting base are placed.
3. substrate carrier according to claim 1 and 2, is characterized in that, described roller, is is fixedly connected with between supporting base and support bar.
4. substrate carrier according to claim 1, is characterized in that, described roller and/or described supporting base are arranged to comprise vary in size interchangeable a series of.
5. substrate carrier according to claim 1, is characterized in that, the length of described support bar can regulate.
6. substrate carrier according to claim 5, it is characterized in that, described support bar comprises the first support bar and the second support bar, described first support bar is provided with outside screw or internal thread, described second support bar being provided with corresponding internal thread or outside screw, adjusting the length of described support bar by adjusting described internal thread and externally threaded cooperation.
7. substrate carrier according to claim 5, it is characterized in that, described support bar comprises the first support bar and the second support bar, one end of described first support bar is sleeved on one end of the second support bar, adjusts the length of described support bar by adjusting the described first support bar cover length installed in described second support bar.
8. substrate carrier according to claim 1, it is characterized in that, described supporting base comprises annulus and support, described support comprises multiple branch, one end of multiple branch is intersected, and its intersection point is positioned on the longitudinal cenlerline of described annulus, and with the center of circle of described annulus in a distance, this end of intersecting is connected with the end of described support bar, and other one end of multiple branch is fixed on described annulus.
9. substrate carrier according to claim 8, is characterized in that, multiple branches of described support in uneven distribution, are formed with larger opening between Liang Ge branch wherein in the circumference of annulus.
10. substrate carrier according to claim 8, is characterized in that, described annulus is provided with substrate fixed part, and this substrate fixed part extends radially inwardly formation in the inner edge of described annulus along described annulus.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520433153.5U CN204803400U (en) | 2015-06-19 | 2015-06-19 | Substrate carrier |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520433153.5U CN204803400U (en) | 2015-06-19 | 2015-06-19 | Substrate carrier |
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| CN204803400U true CN204803400U (en) | 2015-11-25 |
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| CN201520433153.5U Expired - Fee Related CN204803400U (en) | 2015-06-19 | 2015-06-19 | Substrate carrier |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105951054A (en) * | 2016-04-21 | 2016-09-21 | 孙小燕 | Anti-aging treatment apparatus and anti-aging treatment method for metal surface |
| CN107916409A (en) * | 2017-11-27 | 2018-04-17 | 深圳市华星光电半导体显示技术有限公司 | A kind of part switching device and deposition system |
| WO2018214452A1 (en) * | 2017-05-21 | 2018-11-29 | 江苏菲沃泰纳米科技有限公司 | Substrate-moving type apparatus and method for preparing nano coating by means of plasma discharge |
| US11270871B2 (en) | 2017-05-21 | 2022-03-08 | Jiangsu Favored Nanotechnology Co., LTD | Multi-layer protective coating |
-
2015
- 2015-06-19 CN CN201520433153.5U patent/CN204803400U/en not_active Expired - Fee Related
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105951054A (en) * | 2016-04-21 | 2016-09-21 | 孙小燕 | Anti-aging treatment apparatus and anti-aging treatment method for metal surface |
| CN105951054B (en) * | 2016-04-21 | 2018-02-06 | 孙小燕 | A kind of anti-aging processing unit in metal surface and its anti-aging processing method |
| WO2018214452A1 (en) * | 2017-05-21 | 2018-11-29 | 江苏菲沃泰纳米科技有限公司 | Substrate-moving type apparatus and method for preparing nano coating by means of plasma discharge |
| US11270871B2 (en) | 2017-05-21 | 2022-03-08 | Jiangsu Favored Nanotechnology Co., LTD | Multi-layer protective coating |
| US11587772B2 (en) | 2017-05-21 | 2023-02-21 | Jiangsu Favored Nanotechnology Co., LTD | Multi-layer protective coating |
| US11742186B2 (en) | 2017-05-21 | 2023-08-29 | Jiangsu Favored Nanotechnology Co., LTD | Multi-functional protective coating |
| CN107916409A (en) * | 2017-11-27 | 2018-04-17 | 深圳市华星光电半导体显示技术有限公司 | A kind of part switching device and deposition system |
| CN107916409B (en) * | 2017-11-27 | 2019-11-26 | 深圳市华星光电半导体显示技术有限公司 | A kind of part switching device and deposition system |
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Legal Events
| Date | Code | Title | Description |
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| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20151125 Termination date: 20210619 |