WO2019080145A1 - 一种面板烘烤装置 - Google Patents

一种面板烘烤装置

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Publication number
WO2019080145A1
WO2019080145A1 PCT/CN2017/108465 CN2017108465W WO2019080145A1 WO 2019080145 A1 WO2019080145 A1 WO 2019080145A1 CN 2017108465 W CN2017108465 W CN 2017108465W WO 2019080145 A1 WO2019080145 A1 WO 2019080145A1
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WO
WIPO (PCT)
Prior art keywords
opening
panel
heating plate
baked
openings
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/CN2017/108465
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English (en)
French (fr)
Inventor
刘开欣
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Wuhan China Star Optoelectronics Technology Co Ltd
Original Assignee
Wuhan China Star Optoelectronics Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Wuhan China Star Optoelectronics Technology Co Ltd filed Critical Wuhan China Star Optoelectronics Technology Co Ltd
Priority to US15/735,743 priority Critical patent/US20200041826A1/en
Publication of WO2019080145A1 publication Critical patent/WO2019080145A1/zh
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1337Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/133711Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by organic films, e.g. polymeric films
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/02Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by baking
    • B05D3/0254After-treatment
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303Apparatus specially adapted to the manufacture of LCDs
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1337Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/13378Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00Ohmic-resistance heating
    • H05B3/20Heating elements having extended surface area substantially in a two-dimensional [2D] plane, e.g. plate-heater
    • H05B3/22Heating elements having extended surface area substantially in a two-dimensional [2D] plane, e.g. plate-heater non-flexible
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00Ohmic-resistance heating
    • H05B3/20Heating elements having extended surface area substantially in a two-dimensional [2D] plane, e.g. plate-heater
    • H05B3/22Heating elements having extended surface area substantially in a two-dimensional [2D] plane, e.g. plate-heater non-flexible
    • H05B3/26Heating elements having extended surface area substantially in a two-dimensional [2D] plane, e.g. plate-heater non-flexible heating conductor mounted on insulating base

Definitions

  • the present invention relates to the field of display panel manufacturing, and more particularly to a panel baking apparatus.
  • the alignment layer needs to be baked after being coated.
  • the support rod is designed to be used as a tool for receiving the panel.
  • the baking device is likely to be unevenly heated in the non-supporting rod region at the position of the support rod.
  • the technical problem to be solved by the present invention is to provide a panel baking device capable of solving the situation that the heating plate is heated differently in the region of the support rod and other regions, thereby avoiding uneven heating of the alignment layer during the baking process, and improving the product. Quality and yield.
  • an embodiment of the present invention provides a panel baking apparatus, comprising: a heating plate, the heating plate is provided with a plurality of openings capable of being controlled to open or close; and a plurality of layers disposed on one side of the heating plate a support rod for supporting the baking panel, the support rod is disposed at a position corresponding to the position of the opening and is movable along the axis direction of the opening, wherein: the opening is controlled to open, and the support rod is along the axis of the opening Moving up and passing through the opening to support the panel to be baked located on one side of the heating plate; the support rod moves along the axis of the opening and moves out of the opening, the opening is controlled to close, and the panel to be baked is carried in a flat Heat the plate.
  • the support rod vertically rises or falls vertically along the axis direction of the opening.
  • the number of the support rods is one-to-one corresponding to the number of the opening settings.
  • the openings on the heating plate are uniformly arranged.
  • the side of the heating plate for carrying the panel to be baked is provided with an X-ray emitting device for eliminating static electricity.
  • an embodiment of the present invention provides a panel baking apparatus, comprising: a heating plate, wherein the heating plate is provided with a plurality of openings capable of being controlled to open or close; a plurality of support bars on one side of the plate for supporting the baking panel, the support bar being disposed at a position corresponding to the position of the opening and movable along an axial direction of the opening, wherein: The opening is controlled to open, the support rod moves upward along the axial direction of the opening, and the panel to be baked located on one side of the heating plate is supported through the opening; the support rod is along the axis of the opening The direction moves downwardly and moves out of the opening, the opening is controlled to be closed, and the panel to be baked is carried on a flat heating plate; the heating plate is used to carry one side of the panel to be baked and is provided for eliminating static electricity.
  • the X-ray emitting device the support rod vertically rises or falls vertically in the axial direction of the opening.
  • the number of the support rods is set to correspond one-to-one with the number of the openings.
  • the plurality of support rods are evenly arranged equidistantly.
  • the openings and the like on the heating plate are uniformly arranged.
  • an embodiment of the present invention provides a panel baking apparatus, comprising: a heating plate, wherein the heating plate is provided with a plurality of openings capable of being controlled to open or close; a plurality of support bars on one side of the plate for supporting the baking panel, the support bar being disposed at a position corresponding to the position of the opening and movable along an axial direction of the opening, wherein: The opening is controlled to open, the support rod moves upward along the axial direction of the opening, and the panel to be baked located on one side of the heating plate is supported through the opening; the support rod is along the axis of the opening The direction moves downwardly and moves out of the opening, the opening is controlled to be closed, and the panel to be baked is carried on a flat heating plate; the number of the setting of the supporting rod is in one-to-one correspondence with the number of the opening.
  • the plurality of support rods are evenly arranged equidistantly.
  • the openings and the like on the heating plate are uniformly arranged.
  • the side of the heating plate for carrying the panel to be baked is provided with an X-ray emitting device for eliminating static electricity.
  • the opening is controlled to open, the support rod moves upward along the axis of the opening and supports the panel to be baked located on one side of the heating plate through the opening; the support rod moves along the axis of the opening and moves out Opening the hole, the panel to be baked is carried on the heating plate, and the opening is controlled to be closed, so that all the panels can directly contact the heating plate during the heating process, and the heating plate provides a uniform heating environment for the panel, and the heating plate is set in the heating plate.
  • the condition that the support rod area is different from other areas is heated to avoid uneven heating of the alignment layer during the baking process and improve product quality.
  • setting the X-ray emitting device can avoid electrostatic damage that may occur when the substrate is separated from the heating plate, thereby improving product yield.
  • the structure is streamlined for easy maintenance and maintenance.
  • FIG. 1 is a schematic view showing the structure of a panel baking apparatus according to an embodiment of the present invention.
  • FIG. 1 there is shown a first embodiment of the panel baking apparatus of the present invention.
  • the panel baking device in this embodiment comprises: a heating plate 1, and the heating plate 1 is provided with a plurality of openings 1a, 1b, 1c, 1d, 1e, 1f which can be controlled to open or close.
  • the heating plate 1 is a heating plate and is installed in an oven.
  • the openings 1a, 1b, 1c, 1d, 1e, 1f in this embodiment are through holes, and the openings 1a, 1b, 1c, 1d, 1e, 1f function to pass the support rod.
  • the openings 1a, 1b, 1c, 1d, 1e, 1f, etc. on the heating plate 1 are evenly arranged, so that the support rod passing therethrough can be kept uniform at the same time, and the panel to be baked can be uniformly provided. support.
  • the controlled opening and closing of the openings 1a, 1b, 1c, 1d, 1e, 1f is achieved by corresponding control means, while the bearing material and heating of the openings 1a, 1b, 1c, 1d, 1e, 1f in the closed state
  • the materials used in the panels are the same to ensure uniform heating of the overtime sheets during heating.
  • the openings 1a, 1b, 1c, 1d, 1e, 1f are synchronously turned on when the control is turned on, and are synchronously closed when the control is turned off, so that the probability of the control error can be reduced, and the work efficiency can be improved.
  • the number of the opening arrangements, the position of the setting, and the size of the setting are not limited to the above embodiments, and can be adjusted according to actual control conditions, without affecting the actual effect that can be achieved.
  • the support rod is disposed on one side of the heating plate 1, as shown in the bottom, the support rod is used to support the baking panel.
  • the support rod is set to 6 pieces, respectively 2a, 2b, 2c, 2d, 2e, 2f.
  • the number of the support rods is set to correspond one-to-one with the number of the opening holes, that is, the plurality of support rods 2a, 2b, 2c, 2d, 2e, 2f are equally arranged equidistantly.
  • the position where the support rod 2a is disposed corresponds to the position of the opening 1a
  • the position where the support rod 2b is disposed corresponds to the position of the opening 1b, and so on. This setting maximizes the support density of the support rods.
  • the support rods 2a, 2b, 2c, 2d, 2e, and 2f in this embodiment are round rods or square rods, and have the same structure.
  • the support rod 2a is taken as an example to describe the process of ascending or descending.
  • the support rod 2a is disposed at a position corresponding to the position of the opening 1a and is movable in the axial direction of the opening 1a. It can be understood that all the support rods are also in a synchronously rising or synchronously descending operation mode, thereby ensuring the supporting operation. Accuracy and synchronicity.
  • the movement of the support rod 2a in the axial direction of the opening 1a in this embodiment is a vertically rising movement and a vertically descending movement.
  • all the support rods 2a, 2b, 2c, 2d, 2e, 2f rise through the corresponding openings, and the heating plate 1 can be jacked up on the top side of the glass panel, thereby facilitating the robot in the oven. Work on the glass panel inside. When the panel needs to be baked, all the support rods 2a, 2b, 2c, 2d, 2e, 2f are lowered, the openings 1a, 1b, 1c, 1d, 1e, 1f are controlled to be closed, and the panel directly falls on the flat heating. On the board 1, the heating board 1 uniformly bakes the panel.
  • the openings 1a, 1b, 1c, 1d, 1e, 1f are controlled to be synchronously opened, and the support rods 2a, 2b, 2c, 2d, 2e, 2f are respectively opened along the corresponding holes.
  • the axis direction moves synchronously and rises through the opening, and the support rod passes through the opening and then is placed on the side of the heating plate 1
  • the baking panel is supported to lift up, thereby facilitating the robot to work on the glass panel in the oven.
  • the support rods 2a, 2b, 2c, 2d, 2e, 2f are synchronously moved down along the axis direction of the corresponding opening and moved out of the opening, and the opening is controlled to be closed, and the panel to be baked is directly It is carried by a flat heating plate.
  • the panel baking apparatus further includes an X-ray emitting device 3: the X-ray emitting device 3 is disposed on one side of the heating plate 1.
  • the function of the X-ray emitting device 3 is to eliminate static electricity, and it is possible to prevent electrostatic damage that may occur when the substrate is detached from the flat heating plate 1.
  • the opening is controlled to open, the support rod moves upward along the axis of the opening and supports the panel to be baked located on one side of the heating plate through the opening; the support rod moves along the axis of the opening and moves out Opening the hole, the panel to be baked is carried on the heating plate, and the opening is controlled to be closed, so that all the panels can directly contact the heating plate during the heating process, and the heating plate provides a uniform heating environment for the panel, and the heating plate is set in the heating plate.
  • the condition that the support rod area is different from other areas is heated to avoid uneven heating of the alignment layer during the baking process and improve product quality.
  • setting the X-ray emitting device can avoid electrostatic damage that may occur when the substrate is separated from the heating plate, thereby improving product yield.
  • the structure is streamlined for easy maintenance and maintenance.

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Mathematical Physics (AREA)
  • Furnace Charging Or Discharging (AREA)
  • Baking, Grill, Roasting (AREA)

Abstract

一种面板烘烤装置,包括:加热板(1),加热板(1)上设有多个能够受控开启或关闭的开孔(1a、1b、1c、1d、1e、1f);设置在加热板一侧的多根用以对待烘烤面板进行支撑的支撑杆(2a、2b、2c、2d、2e、2f),支撑杆设置的位置与开孔的位置相对应且能够沿开孔的轴线方向移动,其中:开孔受控开启,支撑杆沿开孔的轴线方向移动上升并穿过开孔对位于加热板一侧的待烘烤面板进行支撑;支撑杆沿开孔的轴线方向移动下降并移出开孔,开孔受控关闭,待烘烤面板承载在平整的加热板上。面板烘烤装置能够解决加热板在设置支撑杆区域与其它区域受热不同的状况,避免发生配向层在烘烤过程中的受热不均,提升产品品质和良率。

Description

一种面板烘烤装置
本申请要求于2017年10月25日提交中国专利局、申请号为201711008427.6、发明名称为“一种面板烘烤装置”的中国专利申请的优先权,上述专利的全部内容通过引用结合在本申请中。
技术领域
本发明涉及显示面板制造领域,尤其涉及一种面板烘烤装置。
背景技术
现有技术中,在LCD面板的生产过程中,配向层涂布后需经过烘烤成型,为保证烤箱内取放片的需求,烤箱炉内需设计支撑杆作为承接面板的工具。
现有的面板烘烤装置因结构设计不合理,存在如下技术问题:
1、烘烤装置在支撑杆的位置容易发生与非支撑杆区域受热不均的情况。
2、由于LTPS产品配向层在烘烤成型过程中的极端敏感性,受热不均的情况容易导致配向层不均,极易发展成为显示不良,影响产品的品质。
发明内容
本发明所要解决的技术问题在于,提供一种面板烘烤装置,能够解决加热板在设置支撑杆区域与其它区域受热不同的状况,避免发生配向层在烘烤过程中的受热不均,提升产品品质和良率。
为了解决上述技术问题,本发明实施例提供了一种面板烘烤装置,包括:加热板,加热板上设有多个能够受控开启或关闭的开孔;设置在加热板一侧的多根用以对待烘烤面板进行支撑的支撑杆,支撑杆设置的位置与开孔的位置相对应且能够沿开孔的轴线方向移动,其中:开孔受控开启,支撑杆沿开孔的轴线方向移动上升并穿过开孔对位于加热板一侧的待烘烤面板进行支撑;支撑杆沿开孔的轴线方向移动下降并移出开孔,开孔受控关闭,待烘烤面板承载在平整的加热板上。
其中,支撑杆沿开孔的轴线方向垂直上升或垂直下降。
其中,支撑杆设置的根数与开孔设置的数量一一对应。
其中,多根支撑杆等距均匀设置.
其中,在加热板上的开孔等均均匀设置。
其中,加热板用以承载待烘烤面板的一侧设有用以消除静电的X射线发射装置。
为了解决上述技术问题,本发明实施例提供了一种面板烘烤装置,其中,包括:加热板,所述加热板上设有多个能够受控开启或关闭的开孔;设置在所述加热板一侧的多根用以对待烘烤面板进行支撑的支撑杆,所述支撑杆设置的位置与所述开孔的位置相对应且能够沿所述开孔的轴线方向移动,其中:所述开孔受控开启,所述支撑杆沿开孔的轴线方向移动上升并穿过所述开孔对位于所述加热板一侧的待烘烤面板进行支撑;所述支撑杆沿开孔的轴线方向移动下降并移出所述开孔,所述开孔受控关闭,待烘烤面板承载在平整的加热板上;所述加热板用以承载待烘烤面板的一侧设有用以消除静电的X射线发射装置;所述支撑杆沿开孔的轴线方向垂直上升或垂直下降。
其中,所述支撑杆设置的根数与所述开孔设置的数量一一对应。
其中,所述多根支撑杆等距均匀设置.
其中,在加热板上的所述开孔等均均匀设置。
为了解决上述技术问题,本发明实施例提供了一种面板烘烤装置,其中,包括:加热板,所述加热板上设有多个能够受控开启或关闭的开孔;设置在所述加热板一侧的多根用以对待烘烤面板进行支撑的支撑杆,所述支撑杆设置的位置与所述开孔的位置相对应且能够沿所述开孔的轴线方向移动,其中:所述开孔受控开启,所述支撑杆沿开孔的轴线方向移动上升并穿过所述开孔对位于所述加热板一侧的待烘烤面板进行支撑;所述支撑杆沿开孔的轴线方向移动下降并移出所述开孔,所述开孔受控关闭,待烘烤面板承载在平整的加热板上;所述支撑杆设置的根数与所述开孔设置的数量一一对应。
其中,所述多根支撑杆等距均匀设置.
其中,在加热板上的所述开孔等均均匀设置。
其中,所述加热板用以承载待烘烤面板的一侧设有用以消除静电的X射线发射装置。
实施本发明所提供的面板烘烤装置,具有如下有益效果:
第一、开孔受控开启,支撑杆沿开孔的轴线方向移动上升并穿过开孔对位于加热板一侧的待烘烤面板进行支撑;支撑杆沿开孔的轴线方向移动下降并移出开孔,待烘烤面板承载在加热板上,开孔受控关闭,使在加热过程中,全部面板能够直接与加热板进行接触,加热板为面板提供均匀的加热环境,解决加热板在设置支撑杆区域与其它区域受热不同的状况,避免发生配向层在烘烤过程中受热不均,提升产品品质。
第二、设置X射线发射装置,能够避免基板脱离加热板时可能产生的静电击伤,提升产品良率。
第三、结构精简,便于维修和维护。
附图说明
为了更清楚地说明本发明实施例或现有技术中的技术方案,下面将对实施例或现有技术描述中所需要使用的附图作简单地介绍,显而易见地,下面描述中的附图仅仅是本发明的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其他的附图。
图1是本发明实施例面板烘烤装置的结构示意图。
具体实施方式
下面将结合本发明实施例中的附图,对本发明实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例仅仅是本发明一部分实施例,而不是全部的实施例。基于本发明中的实施例,本领域普通技术人员在没有作出创造性劳动前提下所获得的所有其他实施例,都属于本发明保护的范围。
参见图1-,为本发明面板烘烤装置的实施例一。
本实施例中的面板烘烤装置,包括:加热板1,加热板1上设有多个能够受控开启或关闭的开孔1a、1b、1c、1d、1e、1f。
加热板1为一具有加热功能的平板,安装在烤箱炉内。本实施例中的开孔1a、1b、1c、1d、1e、1f为贯通孔,开孔1a、1b、1c、1d、1e、1f的作用是供支撑杆穿过。
优选的,在加热板1上的开孔1a、1b、1c、1d、1e、1f等均均匀设置,如此,能够保证穿过其的支撑杆同时保持均匀,能够为待烘烤面板提供均匀 支撑。
开孔1a、1b、1c、1d、1e、1f的受控开启和关闭通过相应的控制装置实现,同时,开孔1a、1b、1c、1d、1e、1f在关闭状态下的承载材料与加热板所使用的材料相同,以此来保证加班板在加热时的加热均匀性。
优选的,开孔1a、1b、1c、1d、1e、1f在受控开启时为同步开启,受控关闭时为同步关闭,如此能够降低操控出错的概率,也能够提升作业效率。
可以理解的是开孔设置的数量、设置的位置以及设置的大小并不限定在上述实施方式中,其可以根据实际的操控状况进行调整,并不影响实际能够达到的效果。
进一步的,支撑杆设置在加热板1的一侧,如图所示的底部,支撑杆的作用是对待烘烤面板进行支撑,本实施例中支撑杆设为6根,分别为2a、2b、2c、2d、2e、2f。本实施例中支撑杆设置的根数与开孔设置的数量一一对应,也就是说,多根支撑杆2a、2b、2c、2d、2e、2f同样为等距均匀设置。例如:支撑杆2a设置的位置对应开孔1a的位置,支撑杆2b设置的位置对应开孔1b的位置,以此类推。如此设置能够最大限度的增加支撑杆的支撑密度。
本实施例中的支撑杆2a、2b、2c、2d、2e、2f为圆杆或方杆,结构相同,以下以支撑杆2a为例说明其上升或下降的过程。
支撑杆2a设置的位置与开孔1a的位置相对应且能够沿开孔1a的轴线方向移动,可以理解的是,全部的支撑杆也为同步上升或同步下降的作业模式,如此能够保证支撑作业的精准性和同步性。
本实施例中支撑杆2a沿开孔1a的轴线方向的移动为垂直上升的移动和垂直下降的移动。具体实施时,全部支撑杆2a、2b、2c、2d、2e、2f上升穿过相应的开孔,能够将加热板1如图所示的顶侧的玻璃面板顶起,进而便于机械手在烤箱炉内对玻璃面板进行作业。而当需要对面板进行烘烤时,全部支撑杆2a、2b、2c、2d、2e、2f下降,开孔1a、1b、1c、1d、1e、1f受控关闭,面板直接落在平整的加热板1上,加热板1对面板进行均匀烘烤。
本实施例中的面板烘烤装置在具体实施时,开孔1a、1b、1c、1d、1e、1f受控同步开启,支撑杆2a、2b、2c、2d、2e、2f分别沿对应开孔的轴线方向同步移动上升并穿过开孔,支撑杆穿过开孔后则对位于加热板1一侧的待 烘烤面板进行支撑顶起,进而便于机械手在烤箱炉内对玻璃面板进行作业。而当需要对面板进行烘烤时,支撑杆2a、2b、2c、2d、2e、2f分别沿对应开孔的轴线方向同步移动下降并移出开孔,开孔受控关闭,待烘烤面板直接由平整的加热板承载。
本发明面板烘烤装置的其它实施方式中,面板烘烤装置还包括X射线发射装置3:X射线发射装置3设置在加热板1的一侧.
X射线发射装置3的作用是用以消除静电,能够避免基板脱离平整的加热板1时可能产生的静电击伤。
实施本发明所提供的面板烘烤装置,具有如下有益效果:
第一、开孔受控开启,支撑杆沿开孔的轴线方向移动上升并穿过开孔对位于加热板一侧的待烘烤面板进行支撑;支撑杆沿开孔的轴线方向移动下降并移出开孔,待烘烤面板承载在加热板上,开孔受控关闭,使在加热过程中,全部面板能够直接与加热板进行接触,加热板为面板提供均匀的加热环境,解决加热板在设置支撑杆区域与其它区域受热不同的状况,避免发生配向层在烘烤过程中受热不均,提升产品品质。
第二、设置X射线发射装置,能够避免基板脱离加热板时可能产生的静电击伤,提升产品良率。
第三、结构精简,便于维修和维护。

Claims (14)

  1. 一种面板烘烤装置,其中,包括:
    加热板,所述加热板上设有多个能够受控开启或关闭的开孔;
    设置在所述加热板一侧的多根用以对待烘烤面板进行支撑的支撑杆,所述支撑杆设置的位置与所述开孔的位置相对应且能够沿所述开孔的轴线方向移动,其中:
    所述开孔受控开启,所述支撑杆沿开孔的轴线方向移动上升并穿过所述开孔对位于所述加热板一侧的待烘烤面板进行支撑;所述支撑杆沿开孔的轴线方向移动下降并移出所述开孔,所述开孔受控关闭,待烘烤面板承载在平整的加热板上。
  2. 如权利要求1所述的面板烘烤装置,其中,所述支撑杆沿开孔的轴线方向垂直上升或垂直下降。
  3. 如权利要求2所述的面板烘烤装置,其中,所述支撑杆设置的根数与所述开孔设置的数量一一对应。
  4. 如权利要求3所述的面板烘烤装置,其中,所述多根支撑杆等距均匀设置。
  5. 如权利要求3所述的面板烘烤装置,其中,在加热板上的所述开孔等均均匀设置。
  6. 如权利要求1所述的面板烘烤装置,其中,所述加热板用以承载待烘烤面板的一侧设有用以消除静电的X射线发射装置。
  7. 一种面板烘烤装置,其中,包括:
    加热板,所述加热板上设有多个能够受控开启或关闭的开孔;
    设置在所述加热板一侧的多根用以对待烘烤面板进行支撑的支撑杆,所述支撑杆设置的位置与所述开孔的位置相对应且能够沿所述开孔的轴线方向移动,其中:
    所述开孔受控开启,所述支撑杆沿开孔的轴线方向移动上升并穿过所述开孔对位于所述加热板一侧的待烘烤面板进行支撑;所述支撑杆沿开孔的轴线方向移动下降并移出所述开孔,所述开孔受控关闭,待烘烤面板承载在平 整的加热板上;
    所述加热板用以承载待烘烤面板的一侧设有用以消除静电的X射线发射装置;
    所述支撑杆沿开孔的轴线方向垂直上升或垂直下降。
  8. 如权利要求7所述的面板烘烤装置,其中,所述支撑杆设置的根数与所述开孔设置的数量一一对应。
  9. 如权利要求8所述的面板烘烤装置,其中,所述多根支撑杆等距均匀设置。
  10. 如权利要求8所述的面板烘烤装置,其中,在加热板上的所述开孔等均均匀设置。
  11. 一种面板烘烤装置,其中,包括:
    加热板,所述加热板上设有多个能够受控开启或关闭的开孔;
    设置在所述加热板一侧的多根用以对待烘烤面板进行支撑的支撑杆,所述支撑杆设置的位置与所述开孔的位置相对应且能够沿所述开孔的轴线方向移动,其中:
    所述开孔受控开启,所述支撑杆沿开孔的轴线方向移动上升并穿过所述开孔对位于所述加热板一侧的待烘烤面板进行支撑;所述支撑杆沿开孔的轴线方向移动下降并移出所述开孔,所述开孔受控关闭,待烘烤面板承载在平整的加热板上;
    所述支撑杆设置的根数与所述开孔设置的数量一一对应。
  12. 如权利要求11所述的面板烘烤装置,其中,所述多根支撑杆等距均匀设置。
  13. 如权利要求11所述的面板烘烤装置,其中,在加热板上的所述开孔等均均匀设置。
  14. 如权利要求11所述的面板烘烤装置,其中,所述加热板用以承载待烘烤面板的一侧设有用以消除静电的X射线发射装置。
PCT/CN2017/108465 2017-10-25 2017-10-31 一种面板烘烤装置 Ceased WO2019080145A1 (zh)

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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030096196A1 (en) * 2001-11-21 2003-05-22 Ushiodenki Kabushiki Kaisha Process for curing of a resist which has been applied to a large substrate, and device for carrying out of the process
US20050258165A1 (en) * 2004-05-24 2005-11-24 Tokyo Electron Limited Heat treating apparatus and heat treating method
CN202111064U (zh) * 2011-06-07 2012-01-11 京东方科技集团股份有限公司 一种热烘/冷却基板装置
CN105280518A (zh) * 2014-05-30 2016-01-27 盛美半导体设备(上海)有限公司 半导体基板的热处理装置
CN106207006A (zh) * 2014-12-17 2016-12-07 四川虹视显示技术有限公司 一种oled玻璃基板烘烤装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20010063357A (ko) * 1999-12-22 2001-07-09 윤종용 현상 후 베이킹 처리방법
KR100785620B1 (ko) * 2005-03-15 2007-12-12 오므론 가부시키가이샤 제전 방법, 제전 장치, 유리 기판의 대전 방지 방법 및유리 기판의 대전 방지 장치
KR100756229B1 (ko) * 2006-10-26 2007-09-07 주식회사 탑 엔지니어링 어레이 테스트 장비
CN101840109B (zh) * 2009-03-20 2012-05-30 北京京东方光电科技有限公司 贴布预摩擦设备
CN103094149A (zh) * 2011-10-27 2013-05-08 沈阳芯源微电子设备有限公司 一种防止晶片翘曲的烘烤装置及其烘烤方法
CN202823832U (zh) * 2012-10-24 2013-03-27 京东方科技集团股份有限公司 烘烤设备
CN104820302B (zh) * 2015-05-19 2018-05-18 合肥京东方光电科技有限公司 取向膜检测装置及方法
CN106054541B (zh) * 2016-08-12 2019-09-20 武汉华星光电技术有限公司 预烘烤设备

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030096196A1 (en) * 2001-11-21 2003-05-22 Ushiodenki Kabushiki Kaisha Process for curing of a resist which has been applied to a large substrate, and device for carrying out of the process
US20050258165A1 (en) * 2004-05-24 2005-11-24 Tokyo Electron Limited Heat treating apparatus and heat treating method
CN202111064U (zh) * 2011-06-07 2012-01-11 京东方科技集团股份有限公司 一种热烘/冷却基板装置
CN105280518A (zh) * 2014-05-30 2016-01-27 盛美半导体设备(上海)有限公司 半导体基板的热处理装置
CN106207006A (zh) * 2014-12-17 2016-12-07 四川虹视显示技术有限公司 一种oled玻璃基板烘烤装置

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