WO2018214206A1 - 柔性阵列基板的制作方法 - Google Patents

柔性阵列基板的制作方法 Download PDF

Info

Publication number
WO2018214206A1
WO2018214206A1 PCT/CN2017/089266 CN2017089266W WO2018214206A1 WO 2018214206 A1 WO2018214206 A1 WO 2018214206A1 CN 2017089266 W CN2017089266 W CN 2017089266W WO 2018214206 A1 WO2018214206 A1 WO 2018214206A1
Authority
WO
WIPO (PCT)
Prior art keywords
array substrate
flexible
driving circuit
flexible array
fabricating
Prior art date
Application number
PCT/CN2017/089266
Other languages
English (en)
French (fr)
Inventor
陈黎暄
李泳锐
Original Assignee
深圳市华星光电技术有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 深圳市华星光电技术有限公司 filed Critical 深圳市华星光电技术有限公司
Priority to KR1020197037978A priority Critical patent/KR20200010473A/ko
Priority to JP2019564992A priority patent/JP6845351B2/ja
Priority to EP17910757.8A priority patent/EP3640925B1/en
Priority to US15/548,103 priority patent/US10743424B2/en
Publication of WO2018214206A1 publication Critical patent/WO2018214206A1/zh

Links

Images

Classifications

    • G—PHYSICS
    • G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F9/00—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
    • G09F9/30—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
    • G09F9/301—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements flexible foldable or roll-able electronic displays, e.g. thin LCD, OLED
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1345—Conductors connecting electrodes to cell terminals
    • G02F1/13452—Conductors connecting driver circuitry and terminals of panels
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/46—Manufacturing multilayer circuits
    • H05K3/4688—Composite multilayer circuits, i.e. comprising insulating layers having different properties
    • H05K3/4691—Rigid-flexible multilayer circuits comprising rigid and flexible layers, e.g. having in the bending regions only flexible layers
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133305—Flexible substrates, e.g. plastics, organic film
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1345—Conductors connecting electrodes to cell terminals
    • G02F1/13454—Drivers integrated on the active matrix substrate
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/02—Details
    • H05K1/11—Printed elements for providing electric connections to or between printed circuits
    • H05K1/115—Via connections; Lands around holes or via connections
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/007—Manufacture or processing of a substrate for a printed circuit board supported by a temporary or sacrificial carrier
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/022—Processes for manufacturing precursors of printed circuits, i.e. copper-clad substrates
    • H05K3/025—Processes for manufacturing precursors of printed circuits, i.e. copper-clad substrates by transfer of thin metal foil formed on a temporary carrier, e.g. peel-apart copper
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/027—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed by irradiation, e.g. by photons, alpha or beta particles
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
    • H05K3/4038—Through-connections; Vertical interconnect access [VIA] connections
    • H05K3/4053—Through-connections; Vertical interconnect access [VIA] connections by thick-film techniques
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136286—Wiring, e.g. gate line, drain line
    • G02F1/13629—Multilayer wirings
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136286—Wiring, e.g. gate line, drain line
    • G02F1/136295—Materials; Compositions; Manufacture processes
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2201/00—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
    • G02F2201/42—Arrangements for providing conduction through an insulating substrate
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/10—Details of components or other objects attached to or integrated in a printed circuit board
    • H05K2201/10007—Types of components
    • H05K2201/10128—Display

Definitions

  • the present invention relates to the field of display technologies, and in particular, to a method for fabricating a flexible array substrate.
  • LCD liquid crystal display
  • OLED organic light emitting display
  • a conventional liquid crystal display generally includes a display panel 100 , a source driving chip 200 electrically connected to an upper side of the display panel 100 , and a gate electrically connected to the left and right sides of the display panel 100 .
  • the display area 101 is provided with a plurality of parallel horizontally arranged gate lines and a plurality of vertically spaced source lines arranged in parallel.
  • the non-display area 102 is provided with a plurality of fan-shaped array substrates.
  • Wire On Array (WOA) 500 connecting the plurality of gate lines to the gate driving chip 400 through the WOA trace 500, and connecting the plurality of source lines to the source driving chip 200.
  • the GOA circuit is directly fabricated on the display panel.
  • the area is directly connected to the gate line, but at this time, the WOA trace can not be omitted, and the drive circuit board and the GOA circuit need to be electrically connected by using the WOA trace, and the gate drive is omitted.
  • the GOA circuit also needs to occupy a certain width of the non-display area, especially when the resolution of the display panel rises from high definition to ultra high definition or higher, the number of stages of the GOA circuit to be set will be more, and the width of the display panel Is fixed, causing only the width of the non-display area to be extended.
  • the thin film transistor and circuit structure of more GOA circuits are placed, and the excessive wiring area occupied by the GOA circuit and the WOA trace is very disadvantageous for the implementation of the ultra-narrow bezel or the borderless display.
  • the prior art proposes a double-sided circuit structure, in particular, a circuit is fabricated on both sides of a flexible substrate, and the circuit of the front and back sides of the flexible substrate is connected by opening a hole in the flexible substrate.
  • the manufacturing method is as follows: firstly, a flexible substrate is fabricated on a rigid substrate, then a layer of circuit is formed on the flexible substrate, and then the flexible substrate is peeled off, re-attached and reattached to the rigid substrate to continue on the other side of the flexible substrate. Make the circuit. In the manufacturing process, the flexible substrate needs to be peeled off first and then pasted again.
  • An object of the present invention is to provide a method for fabricating a flexible array substrate, which is difficult to manufacture a flexible array substrate having a double-sided circuit structure, and improves the process yield of the flexible array substrate.
  • the present invention provides a method for fabricating a flexible array substrate, comprising the following steps:
  • Step S1 providing a rigid support plate, forming an adhesive layer on the rigid support plate, forming a passivation layer on the adhesive layer;
  • Step S2 forming a back surface driving circuit on the passivation layer, and covering the back surface driving circuit with a flat layer;
  • Step S3 forming a flexible substrate on the flat layer
  • Step S4 forming a via hole penetrating the flexible substrate and the flat layer on the flexible substrate;
  • Step S5 forming a front driving circuit and a display circuit electrically connected to the front driving circuit on the flexible substrate, wherein the front driving circuit is electrically connected to the back driving circuit through the via hole;
  • Step S6 peeling off the rigid support plate and the adhesive layer to obtain a flexible array substrate.
  • the material of the rigid support plate is glass.
  • the material of the flexible substrate is polyimide, polyethylene terephthalate, cyclic olefin copolymer, or polyether sulfone resin.
  • the flexible substrate has a thickness of 5 to 500 microns.
  • the via hole is formed in the step S4 by laser drilling or chemical etching.
  • the vias have a diameter of 5 to 100 microns.
  • the rigid support plate and the adhesive layer are peeled off by laser peeling in the step S6.
  • a flexible substrate is formed on the flat layer by coating or attaching.
  • the front drive circuit and the back drive circuit together form a WOA trace of the flexible array substrate.
  • the front drive circuit and the back drive circuit together form a WOA trace and GOA circuit of the flexible array substrate.
  • the invention also provides a method for manufacturing a flexible array substrate, comprising the following steps:
  • Step S1 providing a rigid support plate, forming an adhesive layer on the rigid support plate, forming a passivation layer on the adhesive layer;
  • Step S2 forming a back surface driving circuit on the passivation layer, and covering the back surface driving circuit with a flat layer;
  • Step S3 forming a flexible substrate on the flat layer
  • Step S4 forming a via hole penetrating the flexible substrate and the flat layer on the flexible substrate;
  • Step S5 forming a front driving circuit and a display circuit electrically connected to the front driving circuit on the flexible substrate, wherein the front driving circuit is electrically connected to the back driving circuit through the via hole;
  • Step S6 peeling off the rigid support plate and the adhesive layer to obtain a flexible array substrate
  • the material of the flexible substrate is polyimide, polyethylene terephthalate, cyclic olefin copolymer, or polyether sulfone resin;
  • the flexible substrate has a thickness of 5 to 500 microns.
  • the present invention provides a method of fabricating a flexible array substrate, which firstly forms a laminated adhesive layer, a passivation layer, a back surface driving circuit, a flat layer, a flexible substrate, and the like on a rigid support plate.
  • the front drive circuit and the display circuit are then stripped of the rigid support plate and the adhesive layer to obtain a flexible array substrate having a double-sided circuit structure, and the steps of peeling, reversing and re-adhesive of the flexible substrate are not required in the entire manufacturing process.
  • the problem that the flatness of the flexible substrate is poor and the yield is low after the partial offset can be avoided, the manufacturing difficulty of the flexible array substrate having the double-sided circuit structure is reduced, and the process yield of the flexible array substrate is improved.
  • FIG. 1 is a structural view of a conventional liquid crystal display
  • step S3 is a schematic diagram of step S3 of the method for fabricating a flexible array substrate of the present invention.
  • step S4 of the method for fabricating a flexible array substrate of the present invention
  • step S5 is a schematic diagram of step S5 of the method for fabricating a flexible array substrate of the present invention.
  • step S6 is a schematic diagram of step S6 of the method for fabricating a flexible array substrate of the present invention.
  • FIG. 8 is a flow chart of a method of fabricating a flexible array substrate of the present invention.
  • the present invention provides a method for fabricating a flexible array substrate, comprising the following steps:
  • Step S1 Referring to FIG. 2, a rigid support plate 1 is provided, an adhesive layer 2 is formed on the rigid support plate 1, and a passivation layer 3 is formed on the adhesive layer 2.
  • the material of the rigid support plate 1 is glass
  • the material of the adhesive layer 2 may be selected from a glue material such as a pressure sensitive adhesive or a temperature control adhesive
  • the material of the passivation layer 3 may be silicon oxide (SiOx).
  • Inorganic materials such as silicon nitride (SiNx) are produced by physical vapor deposition (PVD) or organic materials such as fusible polytetrafluoroethylene (PFA) by chemical vapor deposition (Chemical Vapor).
  • PVD physical vapor deposition
  • PFA fusible polytetrafluoroethylene
  • CVD chemical vapor deposition
  • Step S2 referring to FIG. 3, a back surface driving circuit 4 is formed on the passivation layer 3, and the flat layer 5 is covered on the back surface driving circuit 4.
  • Step S3 referring to FIG. 4, a flexible substrate 6 is formed on the flat layer 5.
  • the material of the flexible substrate 6 is polyimide (PI), polyethylene terephthalate (PET), cyclic olefin copolymer (COC), or polyether sulfone resin (PES), etc.
  • PI polyimide
  • PET polyethylene terephthalate
  • COC cyclic olefin copolymer
  • PES polyether sulfone resin
  • the flexible substrate 6 is fabricated by coating or attaching, in order to facilitate subsequent punching operations, the thickness of the flexible substrate 6 is not excessively thick, preferably, the flexible substrate 6 The thickness ranges from 5 to 500 microns.
  • Step S4 referring to FIG. 5, a via hole 7 penetrating the flexible substrate 6 and the flat layer 5 is formed on the flexible substrate 6.
  • the via hole 7 can be formed by laser drilling or chemical etching, and the diameter of the via hole 7 needs to match the diameter of the wire to be passed through the via hole 7, preferably
  • the via 7 has a diameter of 5 to 100 ⁇ m.
  • Step S5 referring to FIG. 6, a front driving circuit 8 and a display circuit 9 electrically connected to the front driving circuit 8 are formed on the flexible substrate 6, and the front driving circuit 8 passes through the via 7 and the The back drive circuit 4 is electrically connected.
  • the front driving circuit 8 is formed on a predetermined non-display area on the flexible substrate 6, and the display circuit 9 is formed on a predetermined display area on the flexible substrate 6, wherein The display area is located at the center of the flexible substrate 6, and the non-display area surrounds the display area.
  • the flexible array substrate adopts a structure of an external driving chip
  • the front driving circuit 8 and the back driving circuit 4 jointly form a WOA trace of the flexible array substrate
  • the display circuit 9 includes a plurality of data lines, And a plurality of scan lines, the plurality of data lines and the plurality of scan lines are vertically interleaved to form a plurality of pixel units, and each of the WOA traces is electrically connected to one data line or one scan line, and each WOA trace is externally The scan signal or the data signal is received and transmitted to the scan line or the data line accordingly, thereby realizing the screen display.
  • the flexible array substrate adopts a GOA structure
  • the front driving circuit 8 and the back driving circuit 4 jointly form a WOA trace and a GOA circuit of the flexible array substrate
  • the GOA circuit includes a corresponding scan line
  • each of the WOA traces is electrically connected to a data line or a GOA unit
  • the respective WOA traces are transmitted from the externally received signal to the GOA unit to generate a scan signal and then transmitted.
  • the scan line or the received data signal is transmitted to the data line to realize the screen display, and the GOA technology can eliminate the external gate drive chip, thereby further reducing the frame width of the display device.
  • Step S6 referring to FIG. 7, the rigid support plate 1 and the adhesive layer 2 are peeled off to obtain a flexible array substrate.
  • the rigid support plate 1 and the adhesive layer 2 are peeled off by laser peeling in the step S6.
  • the circuit structure of the non-display area (including the WOA circuit and the GOA circuit) is distributed to both sides of the flexible substrate by the above method, and the circuit structure of the non-display area is all distributed on the same side of the flexible substrate,
  • the wiring area occupied by the circuit structure of the non-display area is greatly reduced, thereby reducing the width of the non-display area, and achieving ultra-narrow border or borderless display.
  • the flexible substrate 6 is formed on the back surface driving circuit 4 by forming the back surface driving circuit 4, and finally the front surface driving circuit 8 and the display circuit 9 are formed on the flexible substrate 6.
  • the flexible array substrate having a double-sided circuit structure does not need to perform the steps of peeling, reversing, and re-adhesive of the flexible substrate 6, and can avoid the flexible substrate 6 after being biased.
  • the problem of poor flatness and low yield reduces the difficulty in fabricating a flexible array substrate having a double-sided circuit structure and improves the process yield of the flexible array substrate.
  • the present invention provides a method for fabricating a flexible array substrate, which firstly forms a laminated adhesive layer, a passivation layer, a back surface driving circuit, a flat layer, a flexible substrate, and a front surface on a rigid support plate.
  • Drive circuit and display circuit then peel off rigid support plate and glue Layer, a flexible array substrate having a double-sided circuit structure is obtained, and the steps of peeling, reversing, and re-adhesive of the flexible substrate are not required in the entire manufacturing process, and the problem of poor flatness and low yield of the flexible substrate after the offset is avoided
  • the manufacturing difficulty of the flexible array substrate having the double-sided circuit structure is reduced, and the process yield of the flexible array substrate is improved.

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Nonlinear Science (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Mathematical Physics (AREA)
  • Optics & Photonics (AREA)
  • Theoretical Computer Science (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Liquid Crystal (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)

Abstract

一种柔性阵列基板的制作方法，先在刚性支撑板（1）上连续形成层叠设置胶粘层（2）、钝化层（3）、背面驱动电路（4）、平坦层（5）、柔性衬底（6）、以及正面驱动电路（8）和显示电路（9），之后再剥离刚性支撑板（1）和胶粘层（2），得到一具有双面电路结构的柔性阵列基板，整个制作过程无需进行柔性衬底（6）的剥离、反转和再偏贴的步骤，能够避免再偏贴后柔性衬底（6）平整性差和良率低的问题，降低具有双面电路结构的柔性阵列基板的制作难度，提升柔性阵列基板的制程良率。

Description

柔性阵列基板的制作方法 技术领域
本发明涉及显示技术领域，尤其涉及一种柔性阵列基板的制作方法。
背景技术
随着显示技术的发展，液晶显示器(Liquid Crystal Display，LCD)与有机发光二极管显示装置(Organic Light Emitting Display，OLED)等平面显示装置因具有高画质、省电、机身薄及应用范围广等优点，而被广泛的应用于手机、电视、个人数字助理、数字相机、笔记本电脑、台式计算机等各种消费性电子产品，成为显示装置中的主流。
请参阅图1，现有的液晶显示器通常包括：显示面板100、电性连接于所述显示面板100上侧的源极驱动芯片200、电性连接于所述显示面板100左右两侧的栅极驱动芯片400、以及与所述源极驱动芯片200以及栅极驱动芯片400均电性连接的驱动电路板300，所述显示面板100包括显示区101、以及包围所述显示区101的非显示区102，所述显示区101内设有多条平行间隔排列的水平的栅极线和多条平行间隔排列的竖直的源极线，所述非显示区102设有多条扇形排列的阵列基板走线(Wire On Array，WOA)500，通过所述WOA走线500将所述多条栅极线连接至所述栅极驱动芯片400，将所述多条源极线连接至源极驱动芯片200。
随着显示器的发展，超窄边框或者无边框渐渐成为一种趋势，不论LCD还是OLED，窄边框或无边框显示都可以带来更好的外观体验，然而，由于显示面板的显示区外围存在无法省去的WOA走线，导致显示面板的显示区到边缘的距离增大，使得无边框或者超窄边框的实现变得困难。尤其，当显示面板的分辨率从高清上升到超高清或者更高时，需要更多的区域用来放置WOA走线，导致边框区域缩窄更加困难。此外，随着显示技术的发展，现有技术中，还可以采用阵列基板行驱动电路(Gate Driver on Array，GOA)来取代栅极驱动芯片，此时GOA电路被直接制作在显示面板的非显示区上并直接连接至栅极线，但此时WOA走线也不可省去，需要用WOA走线将所述驱动电路板与GOA电路电性连接到一起，此时虽然省去了栅极驱动芯片，但GOA电路也需要占用一定宽度的非显示区，尤其当显示面板的分辨率从高清上升到超高清或者更高时，需要设置的GOA电路的级数会更多，而显示面板的宽度是固定的，导致只能延伸非显示区的宽度从而放 置下更多的GOA电路的薄膜晶体管及电路结构，GOA电路以及WOA走线占用的布线面积过大对超窄边框或无边框显示的实现十分不利。
为了解决上述问题，现有技术提出了一种双面电路结构，具体为在柔性衬底的正反两面均制作电路，并通过在柔性衬底上开孔连接柔性衬底的正反两面的电路，其制作方法为：先在刚性基板上制作柔性衬底，随后在柔性衬底上制作一层电路，再剥离柔性衬底，反转后重新贴到刚性基板上继续在柔性衬底的另一面制作电路。在制作过程中，需要将柔性衬底先剥离然后再次偏贴，在目前的技术水平下，即便使用温控胶等非激光剥离的方式，也很容易出现偏贴的平整性不佳等问题，导致上述的双面电路结构制程难度大，良率低。
发明内容
本发明的目的在于提供一种柔性阵列基板的制作方法，降低具有双面电路结构的柔性阵列基板的制作难度，提升柔性阵列基板的制程良率。
为实现上述目的，本发明提供了一种柔性阵列基板的制作方法，包括如下步骤：
步骤S1、提供一刚性支撑板，在所述刚性支撑板上形成胶粘层，在所述胶粘层上形成钝化层；
步骤S2、在所述钝化层上制作背面驱动电路，并在所述背面驱动电路上覆盖平坦层；
步骤S3、在所述平坦层上制作柔性衬底；
步骤S4、在所述柔性衬底上形成贯穿所述柔性衬底和平坦层的过孔；
步骤S5、在所述柔性衬底上形成正面驱动电路以及与正面驱动电路电性连接的显示电路，所述正面驱动电路通过所述过孔与所述背面驱动电路电性连接；
步骤S6、剥离所述刚性支撑板和胶粘层，制得柔性阵列基板。
所述刚性支撑板的材料为玻璃。
所述柔性衬底的材料为聚酰亚胺、聚对苯二甲酸乙二醇酯、环烯烃共聚物、或者聚醚砜树脂。
所述柔性衬底的厚度为5至500微米。
所述步骤S4中通过激光打孔、或化学腐蚀的方法制作所述过孔。
所述过孔的直径为5至100微米。
所述步骤S6中通过激光剥离的方式剥离所述刚性支撑板和胶粘层。
所述步骤S3中通过涂布或贴附的方式在平坦层上制作柔性衬底。
所述正面驱动电路和背面驱动电路共同形成所述柔性阵列基板的WOA走线。
所述正面驱动电路和背面驱动电路共同形成所述柔性阵列基板的WOA走线和GOA电路。
本发明还提供一种柔性阵列基板的制作方法，包括如下步骤：
步骤S1、提供一刚性支撑板，在所述刚性支撑板上形成胶粘层，在所述胶粘层上形成钝化层；
步骤S2、在所述钝化层上制作背面驱动电路，并在所述背面驱动电路上覆盖平坦层；
步骤S3、在所述平坦层上制作柔性衬底；
步骤S4、在所述柔性衬底上形成贯穿所述柔性衬底和平坦层的过孔；
步骤S5、在所述柔性衬底上形成正面驱动电路以及与正面驱动电路电性连接的显示电路，所述正面驱动电路通过所述过孔与所述背面驱动电路电性连接；
步骤S6、剥离所述刚性支撑板和胶粘层，制得柔性阵列基板；
其中，所述柔性衬底的材料为聚酰亚胺、聚对苯二甲酸乙二醇酯、环烯烃共聚物、或者聚醚砜树脂；
其中，所述柔性衬底的厚度为5至500微米。
本发明的有益效果：本发明提供一种柔性阵列基板的制作方法，该方法先在刚性支撑板上连续形成层叠设置胶粘层、钝化层、背面驱动电路、平坦层、柔性衬底、以及正面驱动电路和显示电路，之后再剥离刚性支撑板和胶粘层，得到一具有双面电路结构的柔性阵列基板，整个制作过程无需进行柔性衬底的剥离、反转和再偏贴的步骤，能够避免再偏贴后柔性衬底平整性差和良率低的问题，降低具有双面电路结构的柔性阵列基板的制作难度，提升柔性阵列基板的制程良率。
附图说明
为了能更进一步了解本发明的特征以及技术内容，请参阅以下有关本发明的详细说明与附图，然而附图仅提供参考与说明用，并非用来对本发明加以限制。
附图中，
图1为现有的液晶显示器的结构图；
图2为本发明的柔性阵列基板的制作方法的步骤S1的示意图；
图3为本发明的柔性阵列基板的制作方法的步骤S2的示意图；
图4为本发明的柔性阵列基板的制作方法的步骤S3的示意图；
图5为本发明的柔性阵列基板的制作方法的步骤S4的示意图；
图6为本发明的柔性阵列基板的制作方法的步骤S5的示意图；
图7为本发明的柔性阵列基板的制作方法的步骤S6的示意图；
图8为本发明的柔性阵列基板的制作方法的流程图。
具体实施方式
为更进一步阐述本发明所采取的技术手段及其效果，以下结合本发明的优选实施例及其附图进行详细描述。
请参阅图8，本发明提供一种柔性阵列基板的制作方法，包括如下步骤：
步骤S1、请参阅图2，提供一刚性支撑板1，在所述刚性支撑板1上形成胶粘层2，在所述胶粘层2上形成钝化层3。
具体地，所述刚性支撑板1的材料为玻璃，所述胶粘层2的材料可选择压敏胶或温控胶等胶水材料，所述钝化层3的材料可以为氧化硅(SiOx)和氮化硅(SiNx)等无机材料，通过物理气相沉积(Physical Vapor Deposition，PVD)的方法制作，也可以为可熔性聚四氟乙烯(PFA)等有机材料，通过化学气相沉积(Chemical Vapor Deposition，CVD)的方法制作，所述钝化层3用于保护后续制作的背面驱动电路4。
步骤S2、请参阅图3，在所述钝化层3上制作背面驱动电路4，并在所述背面驱动电路4上覆盖平坦层5。
步骤S3、请参阅图4，在所述平坦层5上制作柔性衬底6。
具体地，所述柔性衬底6的材料为聚酰亚胺(PI)、聚对苯二甲酸乙二醇酯(PET)、环烯烃共聚物(COC)、或聚醚砜树脂(PES)等材料，所述柔性衬底6通过涂布或贴附的方式的制作，为便于于后续的打孔操作，所述柔性衬底6的厚度不宜过厚，优选地，所述柔性衬底6的厚度范围为5至500微米。
步骤S4、请参阅图5，在所述柔性衬底6上形成贯穿所述柔性衬底6和平坦层5的过孔7。
具体地，所述步骤S4中可以通过激光打孔、或化学腐蚀的方法制作所述过孔7，所述过孔7的直径需要与待穿越该过孔7的导线的直径相匹配，优选地，所述过孔7的直径为5至100微米。
步骤S5、请参阅图6，在所述柔性衬底6上形成正面驱动电路8以及与正面驱动电路8电性连接的显示电路9，所述正面驱动电路8通过所述过孔7与所述背面驱动电路4电性连接。
具体地，所述正面驱动电路8形成于所述柔性衬底6上预设的非显示区内，所述显示电路9形成于所述柔性衬底6上预设的显示区内，其中，所述显示区位于所述柔性衬底6的中央，所述非显示区域包围所述显示区域。
可选地，所述柔性阵列基板采用外接驱动芯片的结构，所述正面驱动电路8和背面驱动电路4共同形成所述柔性阵列基板的WOA走线，所述显示电路9包括多条数据线、以及多条扫描线，所述多条数据线与多条扫描线垂直交错形成多个像素单元，每一条WOA走线均对应电性连接一条数据线或一条扫描线，各条WOA走线从外部接收扫描信号或数据信号并相应传递给扫描线或数据线，从而实现画面显示。
可选地，所述柔性阵列基板采用GOA结构，所述正面驱动电路8和背面驱动电路4共同形成所述柔性阵列基板的WOA走线和GOA电路，所述GOA电路包括对应与所述扫描线一一对应的多个GOA单元，每一条WOA走线均对应电性连接一条数据线或一个GOA单元，所述各条WOA走线将从外部接收到的信号传递给GOA单元生成扫描信号再传递给扫描线或者接收数据信号传递给数据线，从而实现画面显示，采用GOA技术可以免去外接的栅极驱动芯片，从而进一步减少显示装置的边框宽度。
步骤S6、请参阅图7，剥离所述刚性支撑板1和胶粘层2，制得柔性阵列基板。
具体地，所述步骤S6中通过激光剥离的方式剥离所述刚性支撑板1和胶粘层2。
进一步地，通过上述方法将非显示区的电路结构(包括WOA电路及GOA电路)分布到柔性衬底的两面，相比于将非显示区的电路结构全部分布于柔性衬底的同一面，能够大幅度减少非显示区的电路结构占用的布线面积，进而减少非显示区的宽度，实现超窄边框或无边框显示。
重点的是，上述制作方法中，通过先形成背面驱动电路4，接着在背面驱动电路4上形成柔性衬底6，最后再在柔性衬底6上形成正面驱动电路8和显示电路9，制得具有双面电路结构的柔性阵列基板，相比于现有技术，整个制作过程中，无需进行柔性衬底6的剥离、反转和再偏贴的步骤，能够避免再偏贴后柔性衬底6平整性差和良率低的问题，降低具有双面电路结构的柔性阵列基板的制作难度，提升柔性阵列基板的制程良率。
综上所述，本发明提供一种柔性阵列基板的制作方法，该方法先在刚性支撑板上连续形成层叠设置胶粘层、钝化层、背面驱动电路、平坦层、柔性衬底、以及正面驱动电路和显示电路，之后再剥离刚性支撑板和胶粘 层，得到一具有双面电路结构的柔性阵列基板，整个制作过程无需进行柔性衬底的剥离、反转和再偏贴的步骤，能够避免再偏贴后柔性衬底平整性差和良率低的问题，降低具有双面电路结构的柔性阵列基板的制作难度，提升柔性阵列基板的制程良率。
以上所述，对于本领域的普通技术人员来说，可以根据本发明的技术方案和技术构思作出其他各种相应的改变和变形，而所有这些改变和变形都应属于本发明权利要求的保护范围。

Claims (18)

  1. 一种柔性阵列基板的制作方法，包括如下步骤：
    步骤S1、提供一刚性支撑板，在所述刚性支撑板上形成胶粘层，在所述胶粘层上形成钝化层；
    步骤S2、在所述钝化层上制作背面驱动电路，并在所述背面驱动电路上覆盖平坦层；
    步骤S3、在所述平坦层上制作柔性衬底；
    步骤S4、在所述柔性衬底上形成贯穿所述柔性衬底和平坦层的过孔；
    步骤S5、在所述柔性衬底上形成正面驱动电路以及与正面驱动电路电性连接的显示电路，所述正面驱动电路通过所述过孔与所述背面驱动电路电性连接；
    步骤S6、剥离所述刚性支撑板和胶粘层，制得柔性阵列基板。
  2. 如权利要求1所述的柔性阵列基板的制作方法，其中，所述刚性支撑板的材料为玻璃。
  3. 如权利要求1所述的柔性阵列基板的制作方法，其中，所述柔性衬底的材料为聚酰亚胺、聚对苯二甲酸乙二醇酯、环烯烃共聚物、或者聚醚砜树脂。
  4. 如权利要求1所述的柔性阵列基板的制作方法，其中，所述柔性衬底的厚度为5至500微米。
  5. 如权利要求1所述的柔性阵列基板的制作方法，其中，所述步骤S4中通过激光打孔、或化学腐蚀的方法制作所述过孔。
  6. 如权利要求1所述的柔性阵列基板的制作方法，其中，所述过孔的直径为5至100微米。
  7. 如权利要求1所述的柔性阵列基板的制作方法，其中，所述步骤S6中通过激光剥离的方式剥离所述刚性支撑板和胶粘层。
  8. 如权利要求1所述的柔性阵列基板的制作方法，其中，所述步骤S3中通过涂布或贴附的方式在平坦层上制作柔性衬底。
  9. 如权利要求1所述的柔性阵列基板的制作方法，其中，所述正面驱动电路和背面驱动电路共同形成所述柔性阵列基板的WOA走线。
  10. 如权利要求1所述的柔性阵列基板的制作方法，其中，所述正面驱动电路和背面驱动电路共同形成所述柔性阵列基板的WOA走线和GOA电路。
  11. 一种柔性阵列基板的制作方法，包括如下步骤：
    步骤S1、提供一刚性支撑板，在所述刚性支撑板上形成胶粘层，在所述胶粘层上形成钝化层；
    步骤S2、在所述钝化层上制作背面驱动电路，并在所述背面驱动电路上覆盖平坦层；
    步骤S3、在所述平坦层上制作柔性衬底；
    步骤S4、在所述柔性衬底上形成贯穿所述柔性衬底和平坦层的过孔；
    步骤S5、在所述柔性衬底上形成正面驱动电路以及与正面驱动电路电性连接的显示电路，所述正面驱动电路通过所述过孔与所述背面驱动电路电性连接；
    步骤S6、剥离所述刚性支撑板和胶粘层，制得柔性阵列基板；
    其中，所述柔性衬底的材料为聚酰亚胺、聚对苯二甲酸乙二醇酯、环烯烃共聚物、或者聚醚砜树脂；
    其中，所述柔性衬底的厚度为5至500微米。
  12. 如权利要求11所述的柔性阵列基板的制作方法，其中，所述刚性支撑板的材料为玻璃。
  13. 如权利要求11所述的柔性阵列基板的制作方法，其中，所述步骤S4中通过激光打孔、或化学腐蚀的方法制作所述过孔。
  14. 如权利要求11所述的柔性阵列基板的制作方法，其中，所述过孔的直径为5至100微米。
  15. 如权利要求11所述的柔性阵列基板的制作方法，其中，所述步骤S6中通过激光剥离的方式剥离所述刚性支撑板和胶粘层。
  16. 如权利要求11所述的柔性阵列基板的制作方法，其中，所述步骤S3中通过涂布或贴附的方式在平坦层上制作柔性衬底。
  17. 如权利要求11所述的柔性阵列基板的制作方法，其中，所述正面驱动电路和背面驱动电路共同形成所述柔性阵列基板的WOA走线。
  18. 如权利要求11所述的柔性阵列基板的制作方法，其中，所述正面驱动电路和背面驱动电路共同形成所述柔性阵列基板的WOA走线和GOA电路。
PCT/CN2017/089266 2017-05-23 2017-06-20 柔性阵列基板的制作方法 WO2018214206A1 (zh)

Priority Applications (4)

Application Number Priority Date Filing Date Title
KR1020197037978A KR20200010473A (ko) 2017-05-23 2017-06-20 플렉시블 어레이 기판의 제작 방법
JP2019564992A JP6845351B2 (ja) 2017-05-23 2017-06-20 フレキシブルアレイ基板の製造方法
EP17910757.8A EP3640925B1 (en) 2017-05-23 2017-06-20 Method for manufacturing flexible array substrate
US15/548,103 US10743424B2 (en) 2017-05-23 2017-06-20 Method for manufacturing flexible array substrate

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201710370204.8 2017-05-23
CN201710370204.8A CN106952583B (zh) 2017-05-23 2017-05-23 柔性阵列基板的制作方法

Publications (1)

Publication Number Publication Date
WO2018214206A1 true WO2018214206A1 (zh) 2018-11-29

Family

ID=59480062

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2017/089266 WO2018214206A1 (zh) 2017-05-23 2017-06-20 柔性阵列基板的制作方法

Country Status (6)

Country Link
US (1) US10743424B2 (zh)
EP (1) EP3640925B1 (zh)
JP (1) JP6845351B2 (zh)
KR (1) KR20200010473A (zh)
CN (1) CN106952583B (zh)
WO (1) WO2018214206A1 (zh)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107742628A (zh) * 2017-09-12 2018-02-27 奕瑞影像科技（太仓）有限公司 柔性闪烁屏、放射线图像传感器及其制备方法
CN109523914B (zh) * 2017-09-19 2021-10-15 深圳天珑无线科技有限公司 一种柔性屏的保护装置、显示面板及电子装置
US10209597B1 (en) * 2018-01-04 2019-02-19 Didrew Technology (Bvi) Limited System and method of manufacturing frameless LCD display
CN108122497B (zh) * 2018-02-02 2023-11-14 京东方科技集团股份有限公司 一种柔性阵列基板、柔性显示装置及组装方法
CN109148529B (zh) * 2018-08-20 2021-11-02 武汉华星光电半导体显示技术有限公司 基板及显示装置
CN109410852A (zh) * 2018-10-22 2019-03-01 惠科股份有限公司 一种显示装置及其检测方法
TWI707180B (zh) * 2019-11-08 2020-10-11 友達光電股份有限公司 對向基板
CN110890050B (zh) * 2019-11-21 2022-07-12 武汉华星光电半导体显示技术有限公司 阵列基板及其制作方法、显示装置
CN114203729B (zh) * 2021-12-02 2023-10-17 武汉华星光电半导体显示技术有限公司 半成品oled显示面板、oled显示面板制备方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013038229A (ja) * 2011-08-08 2013-02-21 Seiko Epson Corp 電気装置の製造方法、半導体基板の製造方法、電気装置用形成基板、及び電子機器
CN203012296U (zh) * 2012-12-13 2013-06-19 京东方科技集团股份有限公司 阵列基板和液晶显示装置
CN103217845A (zh) * 2013-04-22 2013-07-24 京东方科技集团股份有限公司 下基板及其制造方法、液晶显示面板和液晶显示器
CN105632347A (zh) * 2016-04-01 2016-06-01 京东方科技集团股份有限公司 一种柔性面板及其制作方法、显示装置
CN106063393A (zh) * 2015-02-16 2016-10-26 日本梅克特隆株式会社 柔性印刷布线板的制造方法
CN106530972A (zh) * 2016-12-20 2017-03-22 深圳市华星光电技术有限公司 柔性阵列基板的制作方法

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA2059020C (en) * 1991-01-09 1998-08-18 Kohji Kimbara Polyimide multilayer wiring board and method of producing same
US5231751A (en) * 1991-10-29 1993-08-03 International Business Machines Corporation Process for thin film interconnect
TW494447B (en) * 2000-02-01 2002-07-11 Semiconductor Energy Lab Semiconductor device and manufacturing method thereof
JP2002082627A (ja) * 2000-09-07 2002-03-22 Sony Corp 表示装置
JP2003109773A (ja) * 2001-07-27 2003-04-11 Semiconductor Energy Lab Co Ltd 発光装置、半導体装置およびそれらの作製方法
WO2005052892A1 (en) * 2003-11-28 2005-06-09 Semiconductor Energy Laboratory Co., Ltd. Method of manufacturing display device
US8173519B2 (en) * 2006-03-03 2012-05-08 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing semiconductor device
US20100289132A1 (en) * 2009-05-13 2010-11-18 Shih-Fu Huang Substrate having embedded single patterned metal layer, and package applied with the same, and methods of manufacturing of the substrate and package
US8367473B2 (en) * 2009-05-13 2013-02-05 Advanced Semiconductor Engineering, Inc. Substrate having single patterned metal layer exposing patterned dielectric layer, chip package structure including the substrate, and manufacturing methods thereof
US8786062B2 (en) * 2009-10-14 2014-07-22 Advanced Semiconductor Engineering, Inc. Semiconductor package and process for fabricating same
US8008121B2 (en) * 2009-11-04 2011-08-30 Stats Chippac, Ltd. Semiconductor package and method of mounting semiconductor die to opposite sides of TSV substrate
US9735113B2 (en) * 2010-05-24 2017-08-15 STATS ChipPAC Pte. Ltd. Semiconductor device and method of forming ultra thin multi-die face-to-face WLCSP
US8768062B2 (en) * 2010-11-09 2014-07-01 Tata Consulting Services Limited Online script independent recognition of handwritten sub-word units and words
JP5417383B2 (ja) * 2011-06-13 2014-02-12 株式会社ジャパンディスプレイ 液晶表示装置及びその製造方法
CN103337478B (zh) * 2013-06-26 2015-09-09 青岛海信电器股份有限公司 柔性有机发光二极管显示器的制作方法
US9232686B2 (en) * 2014-03-27 2016-01-05 Intel Corporation Thin film based electromagnetic interference shielding with BBUL/coreless packages
US9318475B2 (en) * 2014-05-15 2016-04-19 LuxVue Technology Corporation Flexible display and method of formation with sacrificial release layer
CN104167429B (zh) * 2014-08-01 2017-05-31 京东方科技集团股份有限公司 一种柔性显示面板及其制备方法、显示装置
CN204216046U (zh) * 2014-11-18 2015-03-18 昆山国显光电有限公司 走线结构、有机发光显示面板和有机发光显示器
CN104916252B (zh) * 2015-07-13 2017-08-25 京东方科技集团股份有限公司 圆形显示面板及其制作方法、显示装置

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013038229A (ja) * 2011-08-08 2013-02-21 Seiko Epson Corp 電気装置の製造方法、半導体基板の製造方法、電気装置用形成基板、及び電子機器
CN203012296U (zh) * 2012-12-13 2013-06-19 京东方科技集团股份有限公司 阵列基板和液晶显示装置
CN103217845A (zh) * 2013-04-22 2013-07-24 京东方科技集团股份有限公司 下基板及其制造方法、液晶显示面板和液晶显示器
CN106063393A (zh) * 2015-02-16 2016-10-26 日本梅克特隆株式会社 柔性印刷布线板的制造方法
CN105632347A (zh) * 2016-04-01 2016-06-01 京东方科技集团股份有限公司 一种柔性面板及其制作方法、显示装置
CN106530972A (zh) * 2016-12-20 2017-03-22 深圳市华星光电技术有限公司 柔性阵列基板的制作方法

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of EP3640925A4 *

Also Published As

Publication number Publication date
EP3640925A4 (en) 2020-12-09
JP2020521336A (ja) 2020-07-16
US20180343750A1 (en) 2018-11-29
EP3640925B1 (en) 2023-08-02
JP6845351B2 (ja) 2021-03-17
EP3640925A1 (en) 2020-04-22
CN106952583B (zh) 2019-04-30
US10743424B2 (en) 2020-08-11
CN106952583A (zh) 2017-07-14
KR20200010473A (ko) 2020-01-30

Similar Documents

Publication Publication Date Title
WO2018214206A1 (zh) 柔性阵列基板的制作方法
JP6742523B2 (ja) 可撓性アレイ基板の製造方法
WO2018112996A1 (zh) 显示装置
CN106684243B (zh) 一种柔性显示面板及显示装置
US11386837B2 (en) Display substrate and manufacturing method thereof, and display apparatus
US20220308376A1 (en) Array substrate, manufacturing method thereof, and display panel
US8027009B2 (en) Liquid crystal display device and method of manufacturing the same
US20110255034A1 (en) Display device
CN110308579B (zh) 一种刚性显示面板及其制作方法
WO2018112997A1 (zh) Goa电路结构
TW201300906A (zh) 影像顯示系統
US10002887B2 (en) Array substrate, method for producing the same, and display apparatus
WO2016086606A1 (zh) 阵列基板、修补片、显示面板和修复阵列基板的方法
US10674606B2 (en) Display panel and display device
WO2015184756A1 (zh) 柔性基板及其制造方法、柔性显示装置
US10871688B2 (en) Array substrate, manufacturing method thereof, and display device
US20130140572A1 (en) Array substrate and method for manufacturing the same
US20210242248A1 (en) Double-sided tft panel, method for manufacturing the same, and display device
WO2018045613A1 (zh) 薄膜晶体管阵列基板及其制造方法
US20240096900A1 (en) Display panel
KR20180024284A (ko) 베젤이 감소한 표시장치

Legal Events

Date Code Title Description
WWE Wipo information: entry into national phase

Ref document number: 15548103

Country of ref document: US

121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 17910757

Country of ref document: EP

Kind code of ref document: A1

ENP Entry into the national phase

Ref document number: 2019564992

Country of ref document: JP

Kind code of ref document: A

NENP Non-entry into the national phase

Ref country code: DE

ENP Entry into the national phase

Ref document number: 20197037978

Country of ref document: KR

Kind code of ref document: A

WWE Wipo information: entry into national phase

Ref document number: 2017910757

Country of ref document: EP

ENP Entry into the national phase

Ref document number: 2017910757

Country of ref document: EP

Effective date: 20200102