WO2018166375A1 - 基板及其制备方法、以及显示面板 - Google Patents

基板及其制备方法、以及显示面板 Download PDF

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Publication number
WO2018166375A1
WO2018166375A1 PCT/CN2018/078106 CN2018078106W WO2018166375A1 WO 2018166375 A1 WO2018166375 A1 WO 2018166375A1 CN 2018078106 W CN2018078106 W CN 2018078106W WO 2018166375 A1 WO2018166375 A1 WO 2018166375A1
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WO
WIPO (PCT)
Prior art keywords
substrate
protrusion
base substrate
spacer
mask
Prior art date
Application number
PCT/CN2018/078106
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English (en)
French (fr)
Inventor
薛婕
蒋迁
章旭
Original Assignee
京东方科技集团股份有限公司
北京京东方显示技术有限公司
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Application filed by 京东方科技集团股份有限公司, 北京京东方显示技术有限公司 filed Critical 京东方科技集团股份有限公司
Priority to US16/300,163 priority Critical patent/US10824026B2/en
Publication of WO2018166375A1 publication Critical patent/WO2018166375A1/zh

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/703—Gap setting, e.g. in proximity printer
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133351—Manufacturing of individual cells out of a plurality of cells, e.g. by dicing
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13396—Spacers having different sizes

Definitions

  • Embodiments of the present disclosure relate to a substrate, a method of fabricating the same, and a display panel.
  • Lithography is a common patterning process.
  • the photolithography process includes, for example, the steps of: forming a film on a substrate; coating a photoresist layer on the film; exposing and developing the photoresist layer using a mask to form a photoresist pattern; and using a photoresist pattern
  • the film is etched as a mask to give the film the desired pattern.
  • an exposure gap measurement window is designed on the mask for measuring the distance between the mask and the surface of the substrate during exposure.
  • a substrate including a substrate substrate includes a plurality of cells having a dicing region between at least two adjacent cells; the substrate further includes a first protrusion disposed on the substrate substrate and located in the dicing region; and the first The position of the protrusion corresponds to the position of the exposure gap control window provided on the mask used when the substrate is exposed.
  • each of the at least two adjacent cells includes a display area; the substrate further includes a spacer disposed on the base substrate and located in the display area; and the first protrusion is The spacers are disposed in the same layer and in the same material.
  • each of the at least two adjacent cells includes a sealing zone located outside the display zone and an intermediate zone between the display zone and the sealing zone; the substrate further comprising a second protrusion disposed at the The substrate is located on the substrate and located in the intermediate region; and the first protrusion and the spacer are disposed in the same layer and the same material as the second protrusion.
  • the substrate further includes a black matrix and a color film layer disposed on the base substrate, the black matrix including the first portion and the second portion. a first portion of the black matrix and the color film layer are located between the base substrate and the spacer; a second portion of the black matrix is located between the base substrate and the second protrusion between.
  • a distance of an end of the first protrusion away from the base substrate from the base substrate, and a distance of an end of the spacer away from the base substrate from the base substrate And the distances of the ends of the second protrusions away from the base substrate from the base substrate are different from each other.
  • a distance of an end of the first protrusion away from the base substrate from the base substrate, and a distance of an end of the spacer away from the base substrate from the base substrate And the distances of the ends of the second protrusions away from the base substrate from the base substrate are the same as each other.
  • the at least two adjacent cells are arranged in a row direction; and in the cutting region between the at least two adjacent cells, the first protrusions are plural, and a plurality of The first protrusions are arranged in the column direction.
  • the height of the first protrusion is 3.6 microns to 3.8 microns.
  • the first protrusion is transparent.
  • the material of the first protrusion is a photosensitive material.
  • a display panel comprising: the substrate as described above; an opposite substrate; and a sealant, disposed between the substrate and the opposite substrate, and the substrate and The opposite substrate is bonded.
  • each of the at least two adjacent units includes a display area and a sealing area outside the display area, the sealant is disposed in the sealing area;
  • the display panel further includes an auxiliary sealant, Located in the cutting zone, wherein the first protrusion is located between the sealant and the auxiliary sealant; the sealant and the auxiliary sealant are in the same layer and are provided in the same material.
  • a method of fabricating a substrate including a substrate.
  • the substrate includes a plurality of cells having a dicing zone between at least two adjacent cells; the method comprising: exposing the substrate to a mask using the mask A first protrusion is formed at a position corresponding to a position of the exposure gap control window provided on the board, and the first protrusion is located at the cutting area.
  • each of the at least two adjacent cells includes a display area; the mask includes a spacer window; the method includes: exposing the substrate to the liner using the mask A spacer and the first protrusion are simultaneously formed on the base substrate, and the position of the spacer corresponds to the position of the spacer window and is located in the display area.
  • each of the at least two adjacent cells includes a sealing zone located outside of the display zone and an intervening zone between the display zone and the sealing zone;
  • the mask includes a second protrusion window;
  • the method includes: exposing the substrate by using the mask to simultaneously form the spacer, the first protrusion and the second protrusion on the base substrate, and the position of the second protrusion Corresponding to the position of the second protrusion window and located in the intermediate area.
  • the method further includes forming a black matrix and a color film layer on the base substrate, the black matrix including a first portion and a second portion. a first portion of the black matrix and the color film layer are located between the base substrate and the spacer; a second portion of the black matrix is located between the base substrate and the second protrusion between.
  • the light transmittance of the exposure gap control window, the light transmittance of the spacer window, and the light transmittance of the second protrusion window are identical to each other.
  • the light transmittance of the exposure gap control window is greater than the light transmittance of the second protrusion window, and the light transmittance of the second protrusion window is greater than the light transmittance of the spacer window.
  • FIG. 1 is a schematic view of a position of a post-exposure substrate corresponding to an exposure gap control window provided on a mask according to a technique
  • FIG. 2 is a schematic diagram of an exposure gap control window of a mask according to one technique
  • FIG. 3 is a schematic structural view of a display panel when it is cut according to a technique
  • FIG. 4 is a schematic diagram showing the principle of measuring the distance between the mask and the substrate during exposure
  • 5(a) and 5(b) are schematic structural views of a substrate according to an embodiment of the present disclosure.
  • 6(a) and 6(b) are schematic views of a mask provided by an embodiment of the present disclosure.
  • FIG. 7 is a schematic structural diagram of a substrate according to an embodiment of the present disclosure.
  • FIG. 8 is a schematic diagram showing a distribution of a first protrusion included in a substrate according to an embodiment of the present disclosure
  • FIG. 9 is a schematic structural view of a display panel according to an embodiment of the present disclosure when cutting.
  • each film layer in the drawings do not reflect the actual size and shape, and the purpose is only to illustrate the contents of the embodiments of the present disclosure.
  • an unopened region 22 is designed in addition to the asymmetric two sets of exposure gap control windows 21 when designing the mask.
  • different regions of the substrate are exposed by using a mask.
  • the positions of the window 21 and the unopened region 22 on the right side of the mask are respectively different from those of the second exposure 12
  • the left unopened area 22 and the position of the window 21 coincide; at the first exposure 11, the corresponding position of the mask unopened area 22 has no pattern on the substrate; in the subsequent second exposure 12, This position performs a gap measurement for the second exposure.
  • such a design may cause the area corresponding to the eight areas of the edge of the substrate in FIG. 1 to be blocked due to exposure, and the area 01 to area 08 may be unpatterned when the display panel is cut.
  • the supporting force is insufficient, and the deformation of the substrate is formed to accumulate stress, resulting in a difference in the spacing of the stress boxes, resulting in poor peripheralness of the panel.
  • the display panel when the display panel is cut, the vicinity of the cutting position (the position indicated by the direction of the arrow in the figure) is insufficient due to the absence of the pattern, and the stress of the color filter substrate is accumulated, resulting in a difference in the spacing of the stress boxes.
  • the display panel includes an array substrate and a color filter substrate disposed opposite to each other, and a liquid crystal layer 33 and a spacer 34 between the array substrate and the color filter substrate, and a seal of the array substrate and the color filter substrate. Frame glue 35.
  • the array substrate in FIG. 3 only shows the metal layer 32 on the base substrate 31.
  • the color film substrate only shows the red (R) color film layer 36 and the green (G) color film layer on the base substrate 31. 37. Blue (B) color film layer 38 and black matrix 39.
  • FIG. 4 is a schematic diagram showing the principle of measuring the distance between the mask and the substrate during exposure.
  • the exposure machine is exemplified by the currently used proximity exposure machine.
  • the spacing between the mask 41 and the substrate 42 during exposure is a key parameter determining the size of the pattern formed after exposure.
  • the spacing between the mask 41 and the substrate 42 is measured by the interference principle of light, and the light reflected by the mask 41 is captured by, for example, a charge coupled device (CCD) and reaches through the exposure gap control window of the mask 41.
  • CCD charge coupled device
  • the light reflected by the substrate 42 and reflected by the substrate 42 is converted into a pitch between the mask 41 and the substrate 42 in accordance with the optical path difference between the two reflected rays.
  • the structural member 43 when the proximity exposure machine measures the spacing between the masking plate 41 and the substrate 42 is shown in FIG. 4, which includes a light source 431 such as an organic light emitting diode that emits white light, a negative pressure element 432, and, for example. Test component 433 of the CCD.
  • the negative pressure element 432 is, for example, a vacuuming element, and applies an upward force to the mask plate 41 to prevent the mask plate 41 from sagging downward due to gravity.
  • an embodiment of the present disclosure provides a substrate including a substrate substrate 50 .
  • the substrate includes a plurality of cells 80 having a dicing zone between at least two adjacent cells 80; the substrate further includes a first protrusion 51 disposed on the substrate substrate 50 and located in the cutting zone; and first The position of the protrusion 51 corresponds to the position of the exposure gap control window 611 provided on the mask 61 used when the substrate is exposed.
  • FIG. 6(a) and 6(b) are schematic views of a mask provided by an embodiment of the present disclosure, respectively.
  • the diagram (a) only the exposure gap control window 611 is shown for convenience of description.
  • FIG. 6(b) for the convenience of description, only the exposure gap control window 611, and the spacer window 613 and the second protrusion window 614 which will be described later are shown.
  • the mask 61 may have other patterns thereon.
  • the exposure gap control window 611 is symmetrical about the central symmetry axis 612 of the mask 61.
  • the substrate in the embodiment of the present disclosure is provided with a first protrusion 51 corresponding to the position of the at least one exposure gap control window 611 provided on the mask 61 used for exposing the substrate, thereby
  • the first protrusions 51 may be formed while patterning the film layer on the substrate by the mask 61, so that the first protrusions 51 are not formed by a separate process.
  • the first protrusion portion 51 can perform a certain supporting action, and further, the stress accumulation in the vicinity of the cutting position of the display panel can be reduced, and the occurrence of defects in the periphery of the display panel can be improved.
  • the substrate has a plurality of first protrusions 51.
  • the plurality of first protrusions 51 are symmetrically distributed with respect to the central symmetry axis 52 of the substrate in the first direction.
  • the plurality of first protrusions 51 are distributed on a central symmetry axis 52' of the substrate in the second direction, the first direction being perpendicular to the second direction.
  • the first protrusion 51 can better serve as a support.
  • the exposure process is as follows.
  • the gap between the mask 61 and the substrate is measured by the exposure gap control window 611, and then the first exposure 81 is performed and the first protrusion 51 is formed at a position of the substrate corresponding to the exposure gap control window 611; the mask is moved such that The position of the exposure gap control window 611 on the left side of the mask is the same as the position of the exposure gap control window 611 on the right side of the mask at the first exposure 81 (the first protrusion has been formed on the substrate at the position)
  • the coincidence the gap between the mask 61 and the substrate is measured again by the exposure gap control window 611; the exposure gap control window 611 on the left side of the mask is blocked and the second exposure 82 is performed.
  • the height of the first protrusions 51 is 3.6 m to 3.8 m.
  • the distance between the mask and the substrate surface is on the order of 100 micrometers, and the height of the first protrusion is 3.6 m to 3.8 m, so that the mask 61 is again measured by the exposure gap control window 611 as described above.
  • the first protrusion 51 existing at the corresponding position of the exposure gap control window 611 does not affect the accuracy of the pitch measurement. Therefore, the embodiment of the present disclosure can reduce stress accumulation near the cutting position of the display panel without affecting the measurement of the pitch, and improve the occurrence of defects around the display panel.
  • the first protrusion 51 is transparent. In this way, when the gap between the mask 61 and the substrate is measured by the exposure gap control window 611 again as described above, the first protrusion 51 existing at the corresponding position of the exposure gap control window 611 does not affect the pitch measurement. accuracy.
  • the material of the first protrusion 51 is a photosensitive material.
  • the material of the first protrusion 51 is a transparent photosensitive organic material such as a photoresist.
  • the first protrusions 51 can be formed only by exposure and development without etching, which simplifies the fabrication process.
  • the mask is moved such that the position of the exposure gap control window 611 on the left side of the mask when the second exposure 82 coincides with the position of the exposure gap control window 611 on the right side of the mask at the first exposure 81 Therefore, the distance between the unit 80 formed by the first exposure 81 and the unit formed by the second exposure 82 can be made as small as possible, facilitating the realization of a narrow bezel.
  • the substrate in the embodiment of the present disclosure further includes a black matrix 39, a color film layer (for example, a red color film layer 36, a green color film layer 37, and a blue color film layer) on the substrate substrate 50. 38) and the spacer 34, that is, the substrate in the embodiment of the present disclosure is a color filter substrate.
  • the substrate in the embodiment of the present disclosure may also be an array substrate, that is, the first protrusion portion 51 is disposed on the array substrate.
  • the circuit board is bound with various circuit boards, and the array substrate is farther away from the cutting position than the color film substrate. Therefore, in order to enable the first protrusion 51 to play a better supporting role during cutting, it is preferable to The protrusion 51 is provided on the color filter substrate.
  • the material of the first protrusion 51 is a transparent photosensitive organic material, and the material of the first protrusion 51 is the same as the material of the spacer 34.
  • the first protrusion 51 and the spacer 34 can be formed in the same patterning process, and the material selection cost of the first protrusion 51 can be reduced and the process can be simplified.
  • FIG. 8 is a schematic diagram of a distribution of a first protrusion included in a substrate according to an embodiment of the present disclosure. As shown in FIG. 8, for example, different regions of the substrate are exposed by the mask 61 shown in FIG. 6(a), and a total of four exposures are performed.
  • the unit 80 formed by the first exposure 81 and the unit 80 formed by the second exposure 82 are arranged in the row direction, and the first protrusions 51 are arranged in the column direction.
  • the embodiment of the present disclosure does not have a case where the pattern cannot be formed due to the occlusion of the exposure, and due to the arrangement of the first protrusions 51, the stress accumulation in the vicinity of the cutting position can be well reduced, and the occurrence of defects in the periphery of the display panel can be improved.
  • the first protrusions 51 are symmetrically arranged, and the symmetrical design can also achieve the purpose of saving the occupied area, and can improve the peripheral use of the substrate while improving the effective use of the substrate.
  • the at least two adjacent cells 80 are arranged in the row direction; and as an example, only one first protrusion 51 is provided in the cutting region between the at least two adjacent cells 80.
  • the first protrusions 51 are plural, and the plurality of first protrusions are arranged in the column direction 51. In this way, it is possible to further reduce the stress accumulation in the vicinity of the cutting position and improve the occurrence of defects in the periphery of the display panel.
  • the first protrusion 81 is formed at a position corresponding to the exposure gap control window 611 of the substrate at the time of the first exposure 81, and the exposure gap control window 611 of the left side of the mask is blocked at the second exposure 82 (which The position of the exposure gap control window 611 on the right side of the mask is coincident with the first exposure 81, and the first protrusion 51) has been formed on the substrate at the position.
  • the first protrusion portion 51 is not repeatedly formed at the position where the first protrusion portion 51 has been formed. Therefore, all of the first protrusions 51 are equal in height over the entire substrate. In this way, the height uniformity of the plurality of first protrusions 51 on the substrate can be maintained.
  • Fig. 7 is a cross-sectional view taken along line I-I of Fig. 8.
  • each of the at least two adjacent cells 80 includes a display area; a spacer 34 is located in the display area.
  • the first protrusion 51 is disposed in the same layer and the same material as the spacer 34 to simplify the manufacturing process.
  • “the first protrusion 51 is in the same layer and the same material as the spacer 34” means that the same film layer (for example, the same photoresist layer) is lithographically patterned by the same mask. The process is simultaneous with the first protrusion 51 and the spacer 34.
  • each of the at least two adjacent cells 80 includes a sealing zone located outside of the display zone and an intervening zone between the display zone and the sealing zone; the substrate further comprising Two protrusions 33 are provided on the base substrate 50 and located in the intermediate area.
  • the second protrusions 33 can also play a certain supporting role, thereby further reducing the accumulation of cutting stress on the display panel and improving the occurrence of defects in the periphery of the display panel.
  • the first protrusion 51 and the spacer 34 are disposed in the same layer and the same material as the second protrusion 33 to simplify the manufacturing process.
  • the first protrusion 51, the spacer 34 and the second protrusion 33 are disposed in the same layer and the same material" means that the same film layer (for example, the same photoresist layer) is formed by the same mask.
  • a photolithography process is performed to simultaneously cover the first protrusions 51, the spacers 34, and the second protrusions 33.
  • the black matrix 39 includes a first portion and a second portion; a first portion of the black matrix 39 and the color film layer are between the substrate substrate 50 and the spacers 34; and a second portion of the black matrix 39 Located between the base substrate 50 and the second protrusions 33. Having the second portion of the black matrix 39 disposed in the intervening region or both the intervening region and the sealing region prevents light leakage from the edge of the panel.
  • the mask for exposing the substrate is a one-tone mask such that the first protrusions 51, the spacers 34, and the second protrusions 33 have the same thickness in a direction perpendicular to the base substrate 50.
  • the distance of the end of the first protrusion 51 away from the base substrate 50 from the base substrate 50, and the distance of the spacer 34 from the base substrate 50 are different from each other.
  • the distance of the end of the first protrusion 51 away from the base substrate 50 from the base substrate 50 is smaller than the distance of the end of the second protrusion 33 away from the base substrate 50 from the base substrate 50
  • the second The distance of the end of the protrusion 33 away from the base substrate 50 from the base substrate 50 is smaller than the distance of the end of the spacer 34 away from the base substrate 50 from the base substrate 50.
  • the spacer 34, the first protrusion 55, and the second protrusion 33 can be formed in a simple process.
  • the mask for exposing the substrate is a multi-tone mask such that the first protrusions 51, the spacers 34, and the second protrusions 33 respectively have different thicknesses in a direction perpendicular to the base substrate 50.
  • the spacer 34 can be made.
  • the distance from the end of the base substrate 50 from the base substrate 50 and the distance from the end of the second protrusion 33 away from the base substrate 50 from the base substrate 50 are identical to each other. In this case, the uniformity of the supporting force can be further improved.
  • the embodiment of the present disclosure further provides a display panel, which includes the above substrate provided by an embodiment of the present disclosure.
  • the display panel in the embodiment of the present disclosure includes the substrate provided by the embodiment of the present disclosure, the opposite substrate 91 disposed opposite to the substrate, and the liquid crystal layer between the substrate and the opposite substrate 91 ( Not shown) and the spacer 34, and the sealant 351 sealing the opposite substrate 91 and the substrate.
  • the opposite substrate 91 is an array substrate.
  • the above substrate provided by the embodiment of the present disclosure includes a substrate substrate 50, a black matrix 39 on the substrate substrate 50, a spacer 34, and a first protrusion 51.
  • the direction of the arrow in Fig. 9 indicates the position at which the display panel is cut.
  • the above substrate provided by the embodiment of the present disclosure further includes a color film layer, see FIG. 7.
  • the first protrusion 51 can play a certain supporting role, thereby reducing the stress accumulation near the cutting position of the display panel and improving the occurrence of defects around the display panel. .
  • each of the at least two adjacent units 80 includes a display area and a sealing area located outside of the display area, the sealant 351 being disposed in the sealing area.
  • the display panel further includes an auxiliary sealant 352 located at the cutting area, and the first protrusion 51 is located between the sealant 351 and the auxiliary sealant 352. between.
  • the auxiliary sealant 352 can also be provided to provide a certain supporting force, which can reduce the stress accumulation near the cutting position of the display panel and improve the occurrence of defects around the display panel.
  • the sealant 351 and the auxiliary sealant 352 are disposed in the same layer and in the same material to simplify the process.
  • “the sealant 351 and the auxiliary sealant 352 are disposed in the same layer and the same material” means that they are simultaneously formed by the same coating process and the same curing process.
  • the display panel according to an embodiment of the present disclosure is a mother board, and after cutting, a plurality of sub-boards are obtained, one unit 80 corresponds to one sub-board, and one sub-board can serve as a single display screen.
  • the embodiment of the present disclosure further provides a display device, which includes the above display panel provided by the embodiment of the present disclosure.
  • the display device may be, for example, a mobile phone, a tablet computer, a liquid crystal television, an Organic Light Emitting Diode (OLED) television, a notebook computer, a digital photo frame, a navigator, or the like, or any display product or component.
  • OLED Organic Light Emitting Diode
  • Embodiments of the present disclosure also provide a method of fabricating a substrate.
  • the method is used to fabricate a substrate according to an embodiment of the present disclosure as described above.
  • the substrate includes a substrate substrate 50 that includes a plurality of cells 80 with a cutting zone between at least two adjacent cells 80.
  • the method includes: exposing the substrate with a mask 61 to form a first protrusion at a position of the base substrate 50 corresponding to a position of the exposure gap control window 611 provided on the mask 61 In the portion 51, the first protrusion 51 is located in the cutting area.
  • the exposure gap control window 21 is only used to measure the distance between the reticle and the substrate.
  • the exposure gap control window 611 is used to form the first protrusions 51 in addition to the distance between the mask and the substrate.
  • the first protrusion portion 51 can perform a certain supporting action, and further, the stress accumulation in the vicinity of the cutting position of the display panel can be reduced, and the occurrence of defects in the periphery of the display panel can be improved.
  • each of the at least two adjacent cells 80 includes a display area; the mask 61 includes a spacer window 613.
  • the method includes exposing the substrate with the mask 61 to simultaneously form a spacer 34 and the first protrusion 51 on the substrate substrate 50, the position of the spacer 34 Corresponding to the position of the spacer window 613 and located in the display area.
  • a layer of photoresist is coated on the base substrate 50, the layer of photoresist is exposed by the mask 61, and then developed to simultaneously form the spacers 34 and the first substrate 50 on the substrate substrate 50.
  • a protrusion 51 can be formed while forming the spacers 34 to simplify the manufacturing process.
  • each of the at least two adjacent cells 80 includes a sealing zone located outside of the display zone and an intervening zone between the display zone and the sealing zone;
  • the mask plate 61 includes a second protrusion window 614;
  • the method includes: exposing the substrate by using the mask 61 to simultaneously form the spacer 34 on the substrate substrate 50
  • the first protrusion 51 and the second protrusion 33 are located, and the position of the second protrusion 33 is located in the intermediate area corresponding to the position of the second protrusion window 614.
  • a photoresist is coated on the base substrate 50, the photoresist is exposed by the mask 61, and then developed to simultaneously form the spacer 34 on the substrate 50.
  • a protrusion 51 and a second protrusion 33 can be formed while forming the spacer 34 to simplify the manufacturing process.
  • the second protrusions 33 can also provide a certain supporting action, and can further reduce stress accumulation in the vicinity of the cutting position of the display panel, thereby improving the occurrence of defects in the periphery of the display panel.
  • the method further includes forming a black matrix 39 and a color film layer on the base substrate 50, the black matrix 39 including the first portion and the second portion;
  • the first portion and the color film layer are located between the base substrate 50 and the spacers 34;
  • the second portion of the black matrix 39 is located between the base substrate 50 and the second protrusions 33.
  • the mask for exposing the substrate is a one-tone mask such that the first protrusions 51, the spacers 34, and the second protrusions 33 have the same thickness in a direction perpendicular to the base substrate 50.
  • the distance of the end of the first protrusion 51 away from the base substrate 50 from the base substrate 50, and the distance of the spacer 34 from the base substrate 50 are different from each other.
  • the distance of the end of the first protrusion 51 away from the base substrate 50 from the base substrate 50 is smaller than the distance of the end of the second protrusion 33 away from the base substrate 50 from the base substrate 50
  • the second The distance of the end of the protrusion 33 away from the base substrate 50 from the base substrate 50 is smaller than the distance of the end of the spacer 34 away from the base substrate 50 from the base substrate 50.
  • the spacer 34, the first protrusion 55, and the second protrusion 33 can be formed in a simple process.
  • the mask for exposing the substrate is a one-tone mask
  • the light transmittance of the exposure gap control window 611, the light transmittance of the spacer window 613, and the light transmittance of the second protrusion window 614 are identical to each other, for example, The light transmittance is about 100%.
  • the mask for exposing the substrate is a multi-tone mask such that the first protrusions 51, the spacers 34, and the second protrusions 33 respectively have different thicknesses in a direction perpendicular to the base substrate 50.
  • the spacer 34 can be made.
  • the distance from the end of the base substrate 50 from the base substrate 50 and the distance from the end of the second protrusion 33 away from the base substrate 50 from the base substrate 50 are identical to each other. In this case, the uniformity of the supporting force can be further improved.
  • the light transmittance of the exposure gap control window 611 is greater than the light transmittance of the second protrusion window 614, and the light transmittance of the second protrusion window 614 is greater than the light transmittance of the spacer window 34.

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Abstract

一种基板及其制备方法、以及显示面板。基板包括衬底基板 (50)。基板包括多个单元 (80)，在至少两个相邻的单元 (80) 之间具有切割区；基板还包括第一突起部 (51)，设置在衬底基板 (50) 上并位于切割区；并且第一突起部 (51) 的位置与对基板曝光时使用的掩膜板 (61) 上设置的曝光间隙控制窗口 (611) 的位置对应。

Description

基板及其制备方法、以及显示面板
本申请要求于2017年3月14日递交的第201720244625.1号中国专利申请的优先权，在此全文引用上述中国专利申请公开的内容以作为本申请的一部分。
技术领域
本公开的实施例涉及一种基板及其制备方法、以及显示面板。
背景技术
光刻工艺是一种常见的构图工艺。光刻工艺例如包括如下步骤：在衬底基板上形成膜；在膜上涂覆光刻胶层；采用掩模板对光刻胶层进行曝光、显影以形成光刻胶图案；以光刻胶图案作为掩模对膜进行刻蚀以使膜具有所需的图案。为了保证所需的图案能被精确地形成，在上述光刻工艺中需要严格控制掩模板和衬底基板之间的距离。例如，掩膜板上设计有曝光间隙测量窗口，用于测量曝光时掩模板与衬底基板表面之间的距离。
发明内容
根据本公开的实施例，提供一种基板，包括衬底基板。所述基板包括多个单元，在至少两个相邻的单元之间具有切割区；所述基板还包括第一突起部，设置在衬底基板上并位于所述切割区；并且所述第一突起部的位置与对所述基板曝光时使用的掩膜板上设置的曝光间隙控制窗口的位置对应。
例如，所述至少两个相邻的单元的每个包括显示区；所述基板还包括隔垫物，设置在所述衬底基板上并位于所述显示区；并且所述第一突起部与所述隔垫物同层且同材料设置。
例如，所述至少两个相邻的单元的每个包括位于显示区之外的密封区以及位于显示区与密封区之间的居间区；所述基板还包括第二突起部，设置在所述衬底基板上并位于所述居间区；并且所述第一突起部、所述隔垫物与所述第二突起部同层且同材料设置。
例如，所述的基板还包括设置在衬底基板上的黑矩阵和彩膜层，所述黑矩阵包括第一部分和第二部分。所述黑矩阵的第一部分和所述彩膜层位于所述衬底基板和所述隔垫物之间；所述黑矩阵的第二部分位于所述衬底基板和所述第二突起部之间。
例如，所述第一突起部的远离所述衬底基板的端部距所述衬底基板的距离、所述隔垫物的远离所述衬底基板的端部距所述衬底基板的距离、以及所述第二突起部的远离所述衬底基板的端部距所述衬底基板的距离彼此不同。
例如，所述第一突起部的远离所述衬底基板的端部距所述衬底基板的距离、所述隔垫物的远离所述衬底基板的端部距所述衬底基板的距离、以及所述第二突起部的远离所述衬底基板的端部距所述衬底基板的距离彼此相同。
例如，所述至少两个相邻的单元沿行方向排列；并且在所述至少两个相邻的单元之间的所述切割区中，所述第一突起部为多个，且多个所述第一突起部沿列方向排列。
例如，所述第一突起部的高度为3.6微米到3.8微米。
例如，所述第一突起部是透明的。
例如，所述第一突起部的材料为感光材料。
根据本公开的实施例，还一种显示面板，包括：如上所述的基板；对向基板；以及封框胶，设置在所述基板和所述对向基板之间，并将所述基板与所述对向基板结合。
例如，所述至少两个相邻的单元的每个包括显示区和位于显示区之外的密封区，所述封框胶设置在所述密封区；所述显示面板还包括辅助封框胶，位于所述切割区，其中所述第一突起部位于所述封框胶和所述辅助封框胶之间；所述封框胶和所述辅助封框胶同层且同材料设置。
根据本公开的实施例，提供一种基板的制备方法，该基板包括衬底基板。所述基板包括多个单元，在至少两个相邻的单元之间具有切割区；所述方法包括：采用掩模板对所述基板进行曝光，以在所述衬底基板的与所述掩膜板上设置的曝光间隙控制窗口的位置相对应的位置处形成第一突起部，所述第一突起部位于所述切割区。
例如，所述至少两个相邻的单元的每个包括显示区；所述掩模板包括隔垫物窗口；所述方法包括：采用所述掩模板对所述基板进行曝光，以在所述 衬底基板上同时形成隔垫物和所述第一突起部，所述隔垫物的位置与所述隔垫物窗口的位置对应且位于所述显示区。
例如，所述至少两个相邻的单元的每个包括位于显示区之外的密封区以及位于显示区与密封区之间的居间区；所述掩模板包括第二突起部窗口；所述方法包括：采用所述掩模板对所述基板进行曝光，以在所述衬底基板上同时形成所述隔垫物、所述第一突起部和第二突起部，所述第二突起部的位置与所述第二突起部窗口的位置相对应且位于所述居间区。
例如，所述方法还包括在所述衬底基板上形成黑矩阵和彩膜层，所述黑矩阵包括第一部分和第二部分。所述黑矩阵的第一部分和所述彩膜层位于所述衬底基板和所述隔垫物之间；所述黑矩阵的第二部分位于所述衬底基板和所述第二突起部之间。
例如，所述曝光间隙控制窗口的透光率、所述隔垫物窗口的透光率、以及所述第二突起部窗口的透光率彼此相同。
例如，所述曝光间隙控制窗口的透光率大于所述第二突起部窗口的透光率，并且所述第二突起部窗口的透光率大于所述隔垫物窗口的透光率。
附图说明
为了更清楚地说明本公开实施例的技术方案，下面将对实施例的附图作简单地介绍，显而易见地，下面描述的附图仅仅涉及本公开的一些实施例，而非对本公开的限制。
图1为根据一种技术的曝光后基板的与掩膜板上设置的曝光间隙控制窗口对应的位置处的示意图；
图2为根据一种技术的掩膜板的曝光间隙控制窗口的示意图；
图3为根据一种技术的对显示面板切割时的结构示意图；
图4为曝光时测量掩膜板与基板之间距离的原理示意图；
图5(a)和图5(b)分别为本公开实施例提供的基板的结构示意图；
图6(a)和图6(b)分别为本公开实施例提供的掩膜板的示意图；
图7为本公开实施例提供的基板的更详细的结构示意图；
图8为本公开实施例提供的基板包括的第一突起部的分布示意图；
图9为对本公开实施例提供的显示面板切割时的结构示意图。
具体实施方式
为使本公开实施例的目的、技术方案和优点更加清楚，下面将结合附图，对本公开实施例的技术方案进行清楚、完整地描述。显然，所描述的实施例是本公开的一部分实施例，而不是全部的实施例。基于所描述的本公开的实施例，本领域普通技术人员在无需创造性劳动的前提下所获得的所有其他实施例，都属于本公开保护的范围。
除非另作定义，此处使用的技术术语或者科学术语应当为本公开所属领域内具有一般技能的人士所理解的通常意义。本公开专利申请说明书以及权利要求书中使用的“第一”、“第二”以及类似的词语并不表示任何顺序、数量或者重要性，而只是用来区分不同的组成部分。“包括”或者“包含”等类似的词语意指出现在“包括”或者“包含”前面的元件或者物件涵盖出现在“包括”或者“包含”后面列举的元件或者物件及其等同，并不排除其他元件或者物件。“上”、“下”、“左”、“右”等仅用于表示相对位置关系，当被描述对象的绝对位置改变后，则该相对位置关系也可能相应地改变。
附图中各膜层厚度和区域大小、形状不反应真实的大小、形状，目的只是示意说明本公开实施例的内容。
如图2所示，为了实现窄边框，在设计掩模板时除了设计非对称的两组曝光间隙控制窗口21外，还设计了未开口区域22。如图1和图2所示，采用掩模板对基板的不同区域进行曝光，第一次曝光11时掩模板右侧的窗口21和未开口区域22的位置分别与第二次曝光12时掩模板左侧的未开口区域22和窗口21的位置相重合；在第一次曝光11时，掩模板未开口区域22对应位置在基板上无图案；在随后的第二次曝光12时，还能在此位置进行第二次曝光的间隙测量。
但是，这样的设计会导致图1中基板边缘的区域01到区域08这八个区域对应位置处因曝光被遮挡而无法形成图案，后续在显示面板切割时，区域01到区域08会因无图案而导致支撑力不足，基板形变形成应力积累，造成应力性盒间距(gap)差异，导致面板周边不良的发生。
例如，如图3所示，在显示面板切割时，切割位置(图中箭头方向所示的位置)附近因为无图案而导致支撑力不足，彩膜基板形变形成应力积累，造成应力性盒间距差异。例如，在图3中，显示面板包括相对设置的阵列基 板和彩膜基板，以及位于阵列基板和彩膜基板之间的液晶层33和隔垫物34，以及密封阵列基板和彩膜基板的封框胶35。图3中阵列基板仅示出了位于衬底基板31上的金属层32，彩膜基板仅示出了位于衬底基板31上的红色(R)彩膜层36、绿色(G)彩膜层37、蓝色(B)彩膜层38和黑矩阵39。
图4为曝光时测量掩膜板与基板之间距离的原理示意图。如图4所示，曝光机以目前常用的接近式曝光机为例。曝光时掩膜板41与基板42之间的间距是决定曝光后形成的图案的尺寸的关键参数。掩膜板41与基板42之间的间距测量是利用光的干涉原理，通过例如电荷耦合元件(Charge Coupled Device，CCD)捕捉掩膜板41反射的光线和通过掩模板41的曝光间隙控制窗口到达基板42并被基板42反射的光线，根据两束反射光线的光程差换算得到掩膜板41与基板42之间的间距。图4中示出了接近式曝光机测量掩膜板41与基板42之间的间距时的结构件43，该结构件43包括例如发出白光的有机发光二极管的光源431、负压元件432和例如CCD的测试部件433。负压元件432例如为抽真空元件，向掩模板41施加向上的力以防止掩模板41由于重力作用而向下下垂。
参考图5(a)至图8所示，本公开实施例提供了一种基板，包括衬底基板50。该基板包括多个单元80，在至少两个相邻的单元80之间具有切割区；该基板还包括第一突起部51，设置在衬底基板50上并位于所述切割区；并且第一突起部51的位置与对基板曝光时使用的掩膜板61上设置的曝光间隙控制窗口611的位置对应。
图6(a)和图6(b)分别为本公开实施例提供的掩膜板的示意图。在图(a)中，为了描述方便，仅示出了曝光间隙控制窗口611。在图6(b)中，为了描述方便，仅示出了曝光间隙控制窗口611、以及后续将要描述的隔垫物窗口613和第二突起部窗口614。然而，需要说明的是，掩模板61上还可以具有其他图案。
如图6(a)和图6(b)所示，本公开实施例中，曝光间隙控制窗口611关于掩膜板61的中心对称轴612对称。
本公开实施例中的基板上设置有第一突起部51，第一突起部51的位置与对该基板曝光时使用的掩膜板61上设置的至少一曝光间隙控制窗口611的位置对应，从而可以在利用所述掩模板61对基板上的膜层进行图案化的同 时形成第一突起部51，从而不用采用单独的工艺来形成第一突起部51。另外，第一突起部51能够起到一定的支撑作用，进而能够降低显示面板切割位置附近的应力积累，改善显示面板周边不良的发生。
例如，如图5(a)和5(b)所示，基板具有多个第一突起部51。例如，该多个第一突起部51关于基板的沿第一方向的中心对称轴52对称分布设置。例如，该多个第一突起部51分布在基板的沿第二方向的中心对称轴52’上，第一方向垂直于第二方向。这样，第一突起部51能够更好的起到支撑作用。
例如，采用图6(a)所示的掩模板对基板的不同区域进行曝光，曝光的过程如下。利用曝光间隙控制窗口611测量掩模板61和基板之间的间隙，然后进行第一次曝光81并在基板的与曝光间隙控制窗口611对应的位置处形成第一突起部51；移动掩模板，使得掩模板的左侧的曝光间隙控制窗口611的位置与第一次曝光81时掩模板的右侧的曝光间隙控制窗口611的位置(在该位置处的基板上已经形成了第一突起部)相重合；再次利用曝光间隙控制窗口611测量掩模板61和基板之间的间隙；遮挡掩模板的左侧的曝光间隙控制窗口611并进行第二次曝光82。
例如，第一突起部51的高度为3.6m到3.8m。采用掩模板对基板曝光时，掩膜板与基板表面的间距在百微米数量级，而第一突起部的高度为3.6m到3.8m，因此如上所述再次利用曝光间隙控制窗口611测量掩模板61和基板之间的间隙时，曝光间隙控制窗口611对应位置处存在的第一突起部51不会影响间距测量的准确性。因此，本公开实施例能够在不影响间距测量的前提下，降低显示面板切割位置附近的应力积累，改善显示面板周边不良的发生。
例如，第一突起部51是透明的。这样一来，在如上所述再次利用曝光间隙控制窗口611测量掩模板61和基板之间的间隙时，曝光间隙控制窗口611对应位置处存在的第一突起部51就更加不会影响间距测量的准确性。
例如，第一突起部51的材料为感光材料。例如，第一突起部51的材料为透明感光有机材料，例如光刻胶。这样，可以仅通过曝光和显影即可形成第一突起部51而不用蚀刻，简化了制作工艺。
如上所述，移动掩模板，使得第二次曝光82时掩模板的左侧的曝光间隙控制窗口611的位置与第一次曝光81时掩模板的右侧的曝光间隙控制窗口 611的位置相重合，因此，可以使得通过第一次曝光81形成的单元80和通过第二次曝光82形成的单元之间的距离尽可能的小，有利于实现窄边框。
例如，如图7所示，本公开实施例中的基板还包括位于衬底基板50上的黑矩阵39、彩膜层(例如，红色彩膜层36、绿色彩膜层37和蓝色彩膜层38)和隔垫物34，即本公开实施例中的基板为彩膜基板。当然，实际生产过程中，本公开实施例中的基板还可以为阵列基板，即将第一突起部51设置在阵列基板上。阵列基板上绑定有各种电路板，并且阵列基板与彩膜基板相比距离切割位置更远，因此为了使得在切割时第一突起部51能够起到更好的支撑作用，优选将第一突起部51设置于彩膜基板上。
例如，第一突起部51的材料为透明感光有机材料，并且第一突起部51的材料与隔垫物34的材料相同。这样，能够将第一突起部51与隔垫物34在同一次构图工艺中制作形成，能够降低第一突起部51的材料选取成本并简化工艺。
图8为本公开实施例提供的基板包括的第一突起部的分布示意图。如图8所示，例如采用图6(a)所示的掩模板61对基板的不同区域进行曝光，共进行了四次曝光。第一次曝光81所形成的单元80与第二次曝光82所形成的单元80在行方向上排列，第一突起部51沿列方向排列。本公开实施例并不存在因曝光被遮挡而无法形成图案的情况，并且由于第一突起部51的设置，能够很好的降低切割位置附近的应力积累，改善显示面板周边不良的发生。
如图8所示，第一突起部51对称设置，这种对称设计同样可以达到节省占位面积的目的，在满足基板最大化有效利用的同时还可以改善显示面板周边不良的发生。
在图8中，所述至少两个相邻的单元80沿行方向排列；并且作为示例在所述至少两个相邻的单元80之间的切割区中仅设置了一个第一突起部51。然而，本公开实施例不局限于此。例如，在所述至少两个相邻的单元80之间的切割区中，第一突起部51为多个，且多个第一突起部沿列方向51排列。这样，能够进一步降低切割位置附近的应力积累，改善显示面板周边不良的发生。
如上所述，第一次曝光81时在基板的与曝光间隙控制窗口611对应的位置处形成第一突起部51，第二次曝光82时遮挡掩模板的左侧的曝光间隙控 制窗口611(其与第一次曝光81时掩模板的右侧的曝光间隙控制窗口611的位置相重合，且在该位置处的基板上已经形成了第一突起部51)。这样一来，在第二次曝光82时，就不会在已经形成有第一突起部51的位置处再重复形成第一突起部51。因此，在整个基板上，所有的第一突起部51都是等高的。这样，可以保持多个第一突起部51在基板上的高度均一性。
图7为沿图8的I-I线截取的截面图。例如，参见图7和图8，所述至少两个相邻的单元80的每个包括显示区；隔垫物34位于所述显示区。例如，所述第一突起部51与所述隔垫物34同层且同材料设置，以简化制作工艺。需要说明的是，“所述第一突起部51与所述隔垫物34同层且同材料设置”是指对同一膜层(例如，同一光刻胶层)采用同一掩模板进行一次光刻工艺以同时第一突起部51与所述隔垫物34。
例如，参见图7和图8，所述至少两个相邻的单元80的每个包括位于显示区之外的密封区以及位于显示区与密封区之间的居间区；所述基板还包括第二突起部33，设置在所述衬底基板50上并位于所述居间区。第二突起部33也能够起到一定的支撑作用，进而可以进一步降低显示面板的切割应力积累，改善显示面板周边不良的发生。例如，所述第一突起部51、所述隔垫物34与所述第二突起部33同层且同材料设置，以简化制作工艺。“所述第一突起部51、所述隔垫物34与所述第二突起部33同层且同材料设置”是指对同一膜层(例如，同一光刻胶层)采用同一掩模板进行一次光刻工艺以同时第一突起部51、隔垫物34、第二突起部33。
例如，参见图7和图8，黑矩阵39包括第一部分和第二部分；黑矩阵39的第一部分和彩膜层位于衬底基板50和隔垫物34之间；黑矩阵39的第二部分位于衬底基板50和第二突起部33之间。将黑矩阵39的第二部分设置在居间区中或者居间区和密封区二者中，可以防止面板边缘漏光。
例如，对基板进行曝光的掩模板为单色调掩模板，从而第一突起部51、隔垫物34、和第二突起部33在垂直于衬底基板50的方向上具有相同的厚度。在此情况下，由于如上所述的黑矩阵39和彩膜层，第一突起部51的远离衬底基板50的端部距衬底基板50的距离、隔垫物34的远离衬底基板50的端部距衬底基板50的距离、以及第二突起部33的远离衬底基板50的端部距衬底基板50的距离彼此不同。进一步地，第一突起部51的远离衬底基板50 的端部距衬底基板50的距离小于第二突起部33的远离衬底基板50的端部距衬底基板50的距离，而第二突起部33的远离衬底基板50的端部距衬底基板50的距离小于隔垫物34的远离衬底基板50的端部距衬底基板50的距离。在此情况下，可以以简单的工艺形成隔垫物34、第一突起部55和第二突起部33三者。
例如，对基板进行曝光的掩模板为多色调掩模板，以使得第一突起部51、隔垫物34、和第二突起部33在垂直于衬底基板50的方向上分别具有不同的厚度。在此情况下，即使设置了如上所述的黑矩阵39和彩膜层，也可以使得第一突起部51的远离衬底基板50的端部距衬底基板50的距离、隔垫物34的远离衬底基板50的端部距衬底基板50的距离、以及第二突起部33的远离衬底基板50的端部距衬底基板50的距离彼此相同。在此情况下，可以进一步提高支撑力的均匀性。
本公开实施例还提供了一种显示面板，该显示面板包括本公开实施例提供的上述基板。如图9所示，本公开实施例中的显示面板包括本公开实施例提供的上述基板，与该基板相对设置的对向基板91，以及位于该基板与对向基板91之间的液晶层(未示出)和隔垫物34，以及密封对向基板91和该基板的封框胶351。例如，对向基板91为阵列基板。例如，本公开实施例提供的上述基板包括衬底基板50、位于衬底基板50上的黑矩阵39、隔垫物34和第一突起部51。图9中箭头方向表示显示面板切割的位置。例如，本公开实施例提供的上述基板还包括彩膜层，参见图7。
本公开实施例中的显示面板在切割时，如图9所示，第一突起部51能够起到一定的支撑作用，进而能够降低显示面板切割位置附近处应力积累，改善显示面板周边不良的发生。
例如，参见图8和图9，所述至少两个相邻的单元80的每个包括显示区和位于显示区之外的密封区，所述封框胶351设置在所述密封区。例如，参见图8和图9，所述显示面板还包括辅助封框胶352，位于所述切割区，所述第一突起部51位于所述封框胶351和所述辅助封框胶352之间。设置辅助封框胶352，也可以提供一定的支撑力，够降低显示面板切割位置附近处应力积累，改善显示面板周边不良的发生。例如，所述封框胶351和所述辅助封框胶352同层且同材料设置，以简化工艺。例如，“所述封框胶351和所述 辅助封框胶352同层且同材料设置”是指通过同一涂覆工艺和同一固化工艺而同时形成。
例如，根据本公开实施例的显示面板为母板，经过切割之后得到多个子板，一个单元80对应于一个子板，一个子板可以作为一个单独的显示屏。
本公开实施例还提供了一种显示装置，该显示装置包括本公开实施例提供的上述显示面板。该显示装置例如可以为：手机、平板电脑、液晶电视、有机发光二极管(Organic Light Emitting Diode，OLED)电视、笔记本电脑、数码相框、导航仪等任何具有显示功能的产品或部件。
本公开实施例还提供了一种基板的制作方法。该方法用于制作如上所述的根据本公开实施例的基板。例如，该基板包括衬底基板50，该基板包括多个单元80，在至少两个相邻的单元80之间具有切割区。该方法包括：采用掩模板61对所述基板进行曝光，以在所述衬底基板50的与所述掩膜板61上设置的曝光间隙控制窗口611的位置相对应的位置处形成第一突起部51，所述第一突起部51位于所述切割区。在图1和图2所示的技术中，曝光间隙控制窗口21仅用于测量掩模板和基板之间的距离。然而，在根据本公开的实施例中，曝光间隙控制窗口611除了用于测量掩模板和基板之间的距离之外，还用于形成第一突起部51。第一突起部51能够起到一定的支撑作用，进而能够降低显示面板切割位置附近的应力积累，改善显示面板周边不良的发生。
例如，参见图6(b)、图7和图8，所述至少两个相邻的单元80的每个包括显示区；所述掩模板61包括隔垫物窗口613。所述方法包括：采用所述掩模板61对所述基板进行曝光，以在所述衬底基板50上同时形成隔垫物34和所述第一突起部51，所述隔垫物34的位置与所述隔垫物窗口613的位置对应且位于所述显示区。例如，在衬底基板50上涂覆一层光刻胶，采用所述掩模板61对该层光刻胶进行曝光，然后显影以在所述衬底基板50上同时形成隔垫物34和第一突起部51。这样，可以在形成隔垫物34的同时形成第一突起部51，以简化制作工艺。
例如，参见图6(b)、图7和图8，所述至少两个相邻的单元80的每个包括位于显示区之外的密封区以及位于显示区与密封区之间的居间区；所述掩模板61包括第二突起部窗口614；所述方法包括：采用所述掩模板61对所述基板进行曝光，以在所述衬底基板50上同时形成所述隔垫物34、所述 第一突起部51和第二突起部33，所述第二突起部33的位置与所述第二突起部窗口614的位置相对应其位于所述居间区。例如，在衬底基板50上涂覆一层光刻胶，采用所述掩模板61对该层光刻胶进行曝光，然后显影以在所述衬底基板50上同时形成隔垫物34、第一突起部51和第二突起部33。这样，可以在形成隔垫物34的同时形成第一突起部51和第二突起部33，以简化制作工艺。第二突起部33也能够起到一定的支撑作用，进而能够降低显示面板切割位置附近的应力积累，改善显示面板周边不良的发生。
例如，参见图6(b)、图7和图8，所述方法还包括在衬底基板50上形成黑矩阵39和彩膜层，黑矩阵39包括第一部分和第二部分；黑矩阵39的第一部分和彩膜层位于衬底基板50和隔垫物34之间；黑矩阵39的第二部分位于衬底基板50和第二突起部33之间。
例如，对基板进行曝光的掩模板为单色调掩模板，从而第一突起部51、隔垫物34、和第二突起部33在垂直于衬底基板50的方向上具有相同的厚度。在此情况下，由于如上所述的黑矩阵39和彩膜层，第一突起部51的远离衬底基板50的端部距衬底基板50的距离、隔垫物34的远离衬底基板50的端部距衬底基板50的距离、以及第二突起部33的远离衬底基板50的端部距衬底基板50的距离彼此不同。进一步地，第一突起部51的远离衬底基板50的端部距衬底基板50的距离小于第二突起部33的远离衬底基板50的端部距衬底基板50的距离，而第二突起部33的远离衬底基板50的端部距衬底基板50的距离小于隔垫物34的远离衬底基板50的端部距衬底基板50的距离。在此情况下，可以以简单的工艺形成隔垫物34、第一突起部55和第二突起部33三者。由于对基板进行曝光的掩模板为单色调掩模板，因此曝光间隙控制窗口611的透光率、隔垫物窗口613的透光率、以及第二突起部窗口614的透光率彼此相同，例如透光率均为约100％。
例如，对基板进行曝光的掩模板为多色调掩模板，以使得第一突起部51、隔垫物34、和第二突起部33在垂直于衬底基板50的方向上分别具有不同的厚度。在此情况下，即使设置了如上所述的黑矩阵39和彩膜层，也可以使得第一突起部51的远离衬底基板50的端部距衬底基板50的距离、隔垫物34的远离衬底基板50的端部距衬底基板50的距离、以及第二突起部33的远离衬底基板50的端部距衬底基板50的距离彼此相同。在此情况下，可以进一 步提高支撑力的均匀性。为了实现这样的结构，例如，曝光间隙控制窗口611的透光率大于第二突起部窗口614的透光率，并且第二突起部窗口614的透光率大于隔垫物窗口34的透光率。
以上所述仅是本公开的示范性实施方式，而非用于限制本公开的保护范围，本公开的保护范围由所附的权利要求确定。

Claims (18)

  1. 一种基板，包括衬底基板，其中，
    所述基板包括多个单元，在至少两个相邻的单元之间具有切割区；
    所述基板还包括第一突起部，设置在衬底基板上并位于所述切割区；并且
    所述第一突起部的位置与对所述基板曝光时使用的掩膜板上设置的曝光间隙控制窗口的位置对应。
  2. 根据权要求1所述的基板，其中，
    所述至少两个相邻的单元的每个包括显示区；
    所述基板还包括隔垫物，设置在所述衬底基板上并位于所述显示区；并且
    所述第一突起部与所述隔垫物同层且同材料设置。
  3. 根据权利要求2所述的基板，其中，
    所述至少两个相邻的单元的每个包括位于显示区之外的密封区以及位于显示区与密封区之间的居间区；
    所述基板还包括第二突起部，设置在所述衬底基板上并位于所述居间区；并且
    所述第一突起部、所述隔垫物与所述第二突起部同层且同材料设置。
  4. 根据权利要求3所述的基板，还包括设置在衬底基板上的黑矩阵和彩膜层，所述黑矩阵包括第一部分和第二部分，其中，
    所述黑矩阵的第一部分和所述彩膜层位于所述衬底基板和所述隔垫物之间；
    所述黑矩阵的第二部分位于所述衬底基板和所述第二突起部之间。
  5. 根据权利要求4所述的基板，其中，所述第一突起部的远离所述衬底基板的端部距所述衬底基板的距离、所述隔垫物的远离所述衬底基板的端部距所述衬底基板的距离、以及所述第二突起部的远离所述衬底基板的端部距所述衬底基板的距离彼此不同。
  6. 根据权利要求4所述的基板，其中，所述第一突起部的远离所述衬底基板的端部距所述衬底基板的距离、所述隔垫物的远离所述衬底基板的端部 距所述衬底基板的距离、以及所述第二突起部的远离所述衬底基板的端部距所述衬底基板的距离彼此相同。
  7. 根据权利要求1-6任一项所述的基板，其中，
    所述至少两个相邻的单元沿行方向排列；并且
    在所述至少两个相邻的单元之间的所述切割区中，所述第一突起部为多个，且多个所述第一突起部沿列方向排列。
  8. 根据权利要求1-6任一项所述的基板，其中，所述第一突起部的高度为3.6微米到3.8微米。
  9. 根据权利要求1-6任一项所述的基板，其中，所述第一突起部是透明的。
  10. 根据权利要求1-6任一项所述的基板，其中，所述第一突起部的材料为感光材料。
  11. 一种显示面板，包括：
    如权利要求1-10任一项所述的基板；
    对向基板；以及
    封框胶，设置在所述基板和所述对向基板之间，并将所述基板与所述对向基板结合。
  12. 根据权利要求11所述的显示面板，其中，
    所述至少两个相邻的单元的每个包括显示区和位于显示区之外的密封区，所述封框胶设置在所述密封区；
    所述显示面板还包括辅助封框胶，位于所述切割区，其中所述第一突起部位于所述封框胶和所述辅助封框胶之间；
    所述封框胶和所述辅助封框胶同层且同材料设置。
  13. 一种基板的制备方法，该基板包括衬底基板，其中，
    所述基板包括多个单元，在至少两个相邻的单元之间具有切割区；
    所述方法包括：采用掩模板对所述基板进行曝光，以在所述衬底基板的与所述掩膜板上设置的曝光间隙控制窗口的位置相对应的位置处形成第一突起部，所述第一突起部位于所述切割区。
  14. 根据权要求13所述的方法，其中，
    所述至少两个相邻的单元的每个包括显示区；
    所述掩模板包括隔垫物窗口；
    所述方法包括：采用所述掩模板对所述基板进行曝光，以在所述衬底基板上同时形成隔垫物和所述第一突起部，所述隔垫物的位置与所述隔垫物窗口的位置对应且位于所述显示区。
  15. 根据权利要求14所述的方法，其中，
    所述至少两个相邻的单元的每个包括位于显示区之外的密封区以及位于显示区与密封区之间的居间区；
    所述掩模板包括第二突起部窗口；
    所述方法包括：采用所述掩模板对所述基板进行曝光，以在所述衬底基板上同时形成所述隔垫物、所述第一突起部和第二突起部，所述第二突起部的位置与所述第二突起部窗口的位置相对应且位于所述居间区。
  16. 根据权利要求15所述的方法，还包括在所述衬底基板上形成黑矩阵和彩膜层，所述黑矩阵包括第一部分和第二部分，其中，
    所述黑矩阵的第一部分和所述彩膜层位于所述衬底基板和所述隔垫物之间；
    所述黑矩阵的第二部分位于所述衬底基板和所述第二突起部之间。
  17. 根据权利要求16所述的方法，其中，所述曝光间隙控制窗口的透光率、所述隔垫物窗口的透光率、以及所述第二突起部窗口的透光率彼此相同。
  18. 根据权利要求16所述的方法，其中，所述曝光间隙控制窗口的透光率大于所述第二突起部窗口的透光率，并且所述第二突起部窗口的透光率大于所述隔垫物窗口的透光率。
PCT/CN2018/078106 2017-03-14 2018-03-06 基板及其制备方法、以及显示面板 WO2018166375A1 (zh)

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