WO2018155592A1 - 中空構造体の製造方法、めっき複合体及び中空構造体 - Google Patents
中空構造体の製造方法、めっき複合体及び中空構造体 Download PDFInfo
- Publication number
- WO2018155592A1 WO2018155592A1 PCT/JP2018/006581 JP2018006581W WO2018155592A1 WO 2018155592 A1 WO2018155592 A1 WO 2018155592A1 JP 2018006581 W JP2018006581 W JP 2018006581W WO 2018155592 A1 WO2018155592 A1 WO 2018155592A1
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- WO
- WIPO (PCT)
- Prior art keywords
- core material
- hollow structure
- plating layer
- hollow
- plating
- Prior art date
Links
- 239000002131 composite material Substances 0.000 title claims abstract description 47
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 23
- 238000007747 plating Methods 0.000 claims abstract description 187
- 239000000463 material Substances 0.000 claims abstract description 25
- 239000011162 core material Substances 0.000 claims description 173
- 229910052751 metal Inorganic materials 0.000 claims description 47
- 239000002184 metal Substances 0.000 claims description 47
- 230000007797 corrosion Effects 0.000 claims description 28
- 238000005260 corrosion Methods 0.000 claims description 28
- 229920003002 synthetic resin Polymers 0.000 claims description 9
- 239000000057 synthetic resin Substances 0.000 claims description 9
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract description 73
- 229910052802 copper Inorganic materials 0.000 abstract description 73
- 239000010949 copper Substances 0.000 abstract description 73
- 229910052782 aluminium Inorganic materials 0.000 abstract description 14
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract description 14
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical group [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 abstract description 12
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 abstract description 4
- 229910052708 sodium Inorganic materials 0.000 abstract description 4
- 239000011734 sodium Substances 0.000 abstract description 4
- 239000013585 weight reducing agent Substances 0.000 abstract description 4
- 238000005520 cutting process Methods 0.000 abstract description 2
- 230000017525 heat dissipation Effects 0.000 abstract description 2
- 238000005549 size reduction Methods 0.000 abstract 1
- 239000000243 solution Substances 0.000 description 40
- 238000000034 method Methods 0.000 description 16
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 15
- 238000007654 immersion Methods 0.000 description 13
- 239000007864 aqueous solution Substances 0.000 description 12
- 239000011888 foil Substances 0.000 description 7
- 229920001721 polyimide Polymers 0.000 description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- 239000004642 Polyimide Substances 0.000 description 6
- 230000005540 biological transmission Effects 0.000 description 4
- 238000001816 cooling Methods 0.000 description 4
- 239000003507 refrigerant Substances 0.000 description 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 3
- 230000002378 acidificating effect Effects 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 229910052804 chromium Inorganic materials 0.000 description 3
- 239000011651 chromium Substances 0.000 description 3
- 238000004090 dissolution Methods 0.000 description 3
- 238000007689 inspection Methods 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 230000002093 peripheral effect Effects 0.000 description 3
- 238000003466 welding Methods 0.000 description 3
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- 239000012670 alkaline solution Substances 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- 238000009713 electroplating Methods 0.000 description 2
- 238000010828 elution Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 230000020169 heat generation Effects 0.000 description 2
- 230000001788 irregular Effects 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 239000000523 sample Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000005536 corrosion prevention Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- -1 for example Polymers 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000010365 information processing Effects 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000004080 punching Methods 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000005019 vapor deposition process Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1655—Process features
- C23C18/1657—Electroless forming, i.e. substrate removed or destroyed at the end of the process
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1635—Composition of the substrate
- C23C18/1637—Composition of the substrate metallic substrate
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1635—Composition of the substrate
- C23C18/1639—Substrates other than metallic, e.g. inorganic or organic or non-conductive
- C23C18/1641—Organic substrates, e.g. resin, plastic
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1646—Characteristics of the product obtained
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1689—After-treatment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/1803—Pretreatment of the material to be coated of metallic material surfaces or of a non-specific material surfaces
- C23C18/1824—Pretreatment of the material to be coated of metallic material surfaces or of a non-specific material surfaces by chemical pretreatment
- C23C18/1827—Pretreatment of the material to be coated of metallic material surfaces or of a non-specific material surfaces by chemical pretreatment only one step pretreatment
- C23C18/1834—Use of organic or inorganic compounds other than metals, e.g. activation, sensitisation with polymers
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/38—Coating with copper
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/02—Local etching
- C23F1/04—Chemical milling
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/32—Alkaline compositions
- C23F1/36—Alkaline compositions for etching aluminium or alloys thereof
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/44—Compositions for etching metallic material from a metallic material substrate of different composition
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D1/00—Electroforming
- C25D1/02—Tubes; Rings; Hollow bodies
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D1/00—Electroforming
- C25D1/08—Perforated or foraminous objects, e.g. sieves
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/38—Electroplating: Baths therefor from solutions of copper
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/34—Pretreatment of metallic surfaces to be electroplated
- C25D5/42—Pretreatment of metallic surfaces to be electroplated of light metals
- C25D5/44—Aluminium
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/48—After-treatment of electroplated surfaces
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
- H01L21/4814—Conductive parts
- H01L21/4871—Bases, plates or heatsinks
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
- H01L23/36—Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
- H01L23/367—Cooling facilitated by shape of device
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/54—Contact plating, i.e. electroless electrochemical plating
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B13/00—Apparatus or processes specially adapted for manufacturing conductors or cables
- H01B13/004—Apparatus or processes specially adapted for manufacturing conductors or cables for manufacturing rigid-tube cables
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
- H01L23/36—Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
- H01L23/373—Cooling facilitated by selection of materials for the device or materials for thermal expansion adaptation, e.g. carbon
- H01L23/3736—Metallic materials
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
- H01L23/42—Fillings or auxiliary members in containers or encapsulations selected or arranged to facilitate heating or cooling
- H01L23/427—Cooling by change of state, e.g. use of heat pipes
Definitions
- the present invention relates to a method for producing a hollow structure useful as a radiator (heat sink, heat pipe, vapor chamber) incorporated in various small, thin, and multifunctional semiconductor devices, a plating composite, and a hollow structure. More specifically, a hollow structure body developed by utilizing the difference between the metal used as a temporary plating core material and another metal on the metal and the solubility of the two metals in a specific solution.
- the present invention relates to a manufacturing method, a plating composite, and a hollow structure.
- a cooling fan is installed in the equipment and operated to dissipate the heat of various devices, or the heat generating part of the device that generates heat directly contacts a heat sink made of aluminum or copper with good heat conduction.
- the heat generation part is connected to a heat sink via a heat pump, and the heat generated by the device is absorbed by the heat sink to dissipate heat.
- components such as two heat conductive thin plates and vibration generating means must be manufactured and prepared as separate members, and they must be assembled into a liquid-tight structure to form an internal space between the thin plates. It must be done. For this reason, in the assembly process of the structure, after the constituent members are arranged in a predetermined positional relationship, a fine, careful and complicated process such as laser welding is performed on the peripheral edge of the structure in order to make the whole liquid-tight structure. It is necessary to do work.
- These problems become more complicated as the structure has a more complicated shape, and can be said to be problems to be solved considering the problem of mass production and industrialization.
- the present invention does not require a step of assembling each component as in the prior art described above, and utilizes a plating method in which a metal is plated on a certain core material, and a difference in melting ability between the core material and the plating with respect to a specific solution. Then, only the core material is dissolved and removed to form a hollow portion, and the body manufactures a hollow structure made of plated metal, in particular, a thin and thin hollow structure can be manufactured easily and inexpensively. The issue is to provide technology that is suitable for use.
- the present invention provides: A plating composite having a plating layer formed by plating the surface of the core material, wherein the plating composite in a form in which a part of the core material is exposed from the plating layer, Next, the core material is dissolved and removed by a solution that dissolves the core material but the plating layer does not dissolve, and the portion of the core material is converted into a hollow portion, A method for producing a hollow structure, comprising producing a hollow structure having the plating layer as a skeleton, is provided.
- the core material is preferably a metal or a synthetic resin.
- the core material preferably has a thickness of 0.001 to 1 mm, and the plating layer preferably has a thickness of 0.001 to 1 mm. It is preferable to use a material in which at least one through hole is formed in the thickness direction as the core material.
- As the core material it is preferable to use a material having an uneven portion formed on at least a part of the surface. It is preferable to use a structure in which a sheet-like member made of a material that is not dissolved by the solution is integrated as the core material, and the sheet-like member remains in the hollow portion.
- At least a part of the surface of the core material Prior to the plating treatment, at least a part of the surface of the core material is coated with a corrosion-resistant metal layer that has excellent corrosion resistance and does not dissolve in the solution, and at least a part of the inner surface of the skeleton portion made of the plating layer Is preferably covered with the corrosion-resistant metal layer.
- the present invention comprises a core material and a plating layer covering the surface of the core material,
- the core material is dissolved and removed by a solution in which the core material is dissolved but the plating layer is not dissolved to convert the core material into a hollow part, and the plating layer is used as a skeleton part of a hollow structure.
- a plating composite used for manufacturing the hollow structure in which a part of a core material is exposed from the plating layer.
- the thickness of the core material of the plating composite is 0.001 to 1 mm, and the thickness of the plating layer is 0.001 to 1 mm. It is preferable that an uneven portion is formed on at least a part of the surface of the core material of the plating composite. It is preferable that the core material of the plating composite is an integrated sheet-like member made of a material that remains in the hollow portion and is not dissolved by the solution. Between the core material and the plating layer of the plating composite, a corrosion-resistant metal layer that has excellent corrosion resistance and does not dissolve in the solution covers and covers at least a part of the surface of the core material. preferable.
- the present invention provides the core material, wherein the core material is dissolved and removed by a solution in which the core material is dissolved but the plating layer is not dissolved, in a plating complex in which the surface of the core material is covered with a plating layer except for a part thereof.
- a plating complex in which the surface of the core material is covered with a plating layer except for a part thereof.
- a heat medium is enclosed in the hollow portion of the hollow structure. It is preferable that the interval between the inner surfaces facing each other of the hollow portion corresponding to the thickness direction of the core of the hollow structure is 0.001 to 1 mm, and the thickness of the skeleton portion is 0.001 to 1 mm. It is preferable that at least a part of the inner surface of the hollow portion of the hollow structure has an uneven portion. It is preferable that a sheet-like member made of a material that is not dissolved by the solution is inserted and disposed in the hollow portion of the hollow structure.
- the hollow structure is preferably used as a radiator, cable or metal tube for electronic equipment.
- a hollow structure having a hollow portion inside can be manufactured without mechanically assembling a heat conductive thin plate or the like.
- the hollow structure having a complicated shape, the overall size is reduced, the thickness is reduced, and the diameter is reduced.
- a hollow structure can be manufactured.
- the thickness of the core material including the “thickness (diameter)” in the case of a rod-shaped or cylindrical material
- the shape of the core by appropriately selecting the thickness of the core material (including the “thickness (diameter)” in the case of a rod-shaped or cylindrical material) and the shape of the core, the cross-sectional area of the hollow portion to be formed The size and the space volume of the entire hollow portion can be arbitrarily set.
- the strength, heat capacity, and weight of the skeleton formed can be arbitrarily adjusted. Also, if a method of dissolving and removing the core material by heat is adopted, especially in the case of a structure where the space of the hollow portion is narrow and deep, the solution until the core material is dissolved is discharged to the outside. It may be cooled and solidified in the meantime, so that it cannot be discharged smoothly, and the amount remaining in the space may be relatively large. On the other hand, in the present invention, since the core material is dissolved by the solution, it is not solidified in the process of discharging the core material, and the core material solution can be discharged quickly without substantially remaining in the hollow portion.
- a cylindrical plating layer is also formed on the wall surface of the through hole, and the upper and lower ends thereof are the upper surface portion and the lower surface portion of the skeleton portion. Since the cylindrical plating layer is connected and integrated with the plating layer constituting the structure, the cylindrical plating layer is reinforced as a strut in the thickness direction to prevent sag between the plating layers of the upper surface portion and the lower surface portion of the obtained hollow structure. It is suitable because it also exhibits an action.
- the hollow structure of the present invention can be reduced in size, diameter, thickness, and weight as a heat sink such as a heat sink, heat pipe, or vapor chamber.
- a heat sink such as a heat sink, heat pipe, or vapor chamber.
- various electronic devices electrical control machinery / equipment, power distribution / control machinery / equipment, telecommunications machinery / equipment, portable information terminal, smartphone
- Computers, power modules, other electronic application machinery and the like is particularly suitable as a heatsink built in and incorporated therein.
- the present invention when the present invention is applied to a cable for transmitting power and information (particularly, a cable for high-speed transmission), a thin hollow structure can be obtained, so that the dielectric constant is stable over the entire length, and the large capacity Suitable for high-speed data transmission.
- FIG. 2 is a partially cutaway perspective view showing a plating composite according to an embodiment of the present invention in which a copper plating layer is formed on the entire surface of the core material of FIG. 1.
- FIG. 3 is a sectional view taken along line III-III in FIG. 2. It is a partially cutaway sectional view showing the section of the hollow structure concerning one embodiment of the present invention obtained after the immersion treatment in the solution.
- FIG. 5 (a) is a cross-sectional view showing a part of a plating composite provided with a corrosion-resistant metal layer, and FIG.
- FIG. 5 (b) shows a hollow structure in which a corrosion-resistant metal layer is formed on the inner surface of a copper plating layer.
- FIG. FIG. 6A is a perspective view showing a cross-section of a flat plate-like hollow structure in which a copper plating layer corresponding to a support is not formed
- FIG. 6B is a perspective view showing a cylindrical hollow structure.
- FIG. Fig.7 (a) is the figure which showed the hollow structure which concerns on other embodiment of this invention
- FIG.7 (b) is the figure which showed an example of the core material in which the uneven
- FIG. 8 (a) is a view showing a hollow structure according to still another embodiment of the present invention
- FIG. 8 (b) is a view showing a core material in which sheet-like members are integrated on one side
- FIG.8 (c) is the figure which showed the core material which sandwiched the sheet-like member.
- a core material described later is prepared.
- a plating complex is formed in which a plating layer covering the entire surface of the core material is formed, and further, a part of the plating layer is excised to expose the cut surface of the core material. .
- the plating composite from which a part of the core material is exposed is immersed in a solution described later to selectively dissolve and remove only the core material.
- the location of the core material of the plating composite is converted into a hollow portion, the plating layer remains as it is, and the upper surface plating layer, the lower surface plating layer, and A skeleton portion having an integral structure formed of a cylindrical plating layer (in the case of a core material having a through hole) connecting the two plating layers is formed.
- the core material a metal or a synthetic resin that is dissolved in a solution used during the immersion treatment is selected.
- a metal that does not dissolve in the solution used during the immersion treatment is selected. Therefore, a solution that dissolves the core material but does not dissolve the plating layer is selected as the solution used during the immersion treatment.
- the solution either an alkaline aqueous solution or an acidic aqueous solution can be used, and one of them is selected in accordance with the combination of the core material and the material forming the plating layer.
- an alkaline aqueous solution is selected as the solution used during the immersion treatment
- an amphoteric metal such as aluminum or zinc that dissolves in the core material
- copper, nickel, chromium, or the like that does not dissolve in the plating layer.
- an alkaline aqueous solution is selected as the solution used during the immersion treatment.
- examples of such an alkaline solution include an aqueous sodium hydroxide solution and an aqueous potassium hydroxide solution.
- the core material is not limited to a metal, and a synthetic resin can also be used.
- the synthetic resin for example, polyimide can be used as a material that dissolves in an alkaline solution.
- the obtained hollow structure is used as a radiator (heat sink, heat pipe, etc.)
- aluminum or polyimide is selected as the core material
- copper having excellent heat conductivity is selected as the material for forming the plating layer
- alkali It is preferable to select sodium hydroxide or a polyimide etching solution as the aqueous solution.
- the core material may be a flat plate or foil having an arbitrary thickness, but as shown in FIG. 1, one or more through-holes in the thickness direction from the upper surface portion 1a of the core material 1 toward the lower surface portion 1b. Those in which 2 is formed are preferred. The reason will be described later.
- the cross-sectional shape of these through-holes 2 is preferably circular as shown in FIG. 1, but the shape is not limited to this, for example, a triangular, quadrangular, elliptical, star-shaped or other irregular cross-section. Arbitrary shapes, such as a shape, may be sufficient.
- Such a through hole 2 can be formed by, for example, mechanical punching or drilling, or by applying photolithography and etching techniques.
- the entire surface of the core material 1, that is, the upper surface portion 1a, the lower surface portion 1b, the peripheral end surface portion 1c, and the wall surface portion 2a of the through hole 2 are covered with a copper plating layer 3 having a desired thickness, as shown in FIG.
- the core material-plating composite member 4 is manufactured. Compared with the core material 1 of FIG. 1, the core material-plating composite member 4 is thicker by the thickness of the formed copper plating layer 3 and has a longer width and length. The diameter is smaller than the diameter of the through hole 2.
- the copper plating layer 3 can be formed by applying an electrolytic plating method using a normal copper plating bath or an electroless plating method. In that case, since the surface of the aluminum core material 1 is covered with a passive film and the copper plating layer may not be electrodeposited evenly as it is, the copper plating layer 3 is evenly applied to the entire surface of the core material 1 as much as possible. Before the plating process, for example, zinc replacement or pretreatment using an acidic cleaner is preferably performed on the entire surface of the core material 1. In this embodiment, since the aluminum core material 1 is finally dissolved, the adhesion strength between the core material 1 and the copper plating layer 3 does not need to be strong. For this reason, it is sufficient to immerse in an acidic cleaner as a pretreatment, whereby the cost for the plating treatment can be considerably reduced.
- the thickness of the copper plating layer 3 to be formed can be adjusted to any thickness by selecting the copper concentration in the copper plating bath used during the plating treatment, the current density employed during the plating treatment, and the plating time. .
- the plating time can be lengthened to increase the thickness of the plating layer, and conversely, it can be shortened to decrease the thickness of the plating layer.
- the thickness of the copper plating layer 3 can be made different between the upper surface portion 1a and the lower surface portion 1b of the core material 1, or the thickness of the copper plating layer 3 can be partially changed.
- a part of the core material-plated composite member 4 manufactured in this way is cut out to obtain a plated composite body 4A of the present embodiment in which the cut surface of the aluminum core material 1 is exposed.
- the part to be excised is not limited to one place, and may be a plurality of appropriate parts.
- the cut surface of the plated composite 4A obtained after the cutting has a cross-sectional structure as shown in FIG. Yes. That is, the cut surface of the plating composite 4A is formed on the cut surface 1d of the core material 1 itself, the upper surface portion 1a and the lower surface portion 1b of the core material 1, and the wall surface portion 2a of the through hole 2 in FIG.
- the cut surfaces 3d of the copper plating layer 3 in which the copper plating layers 3 are connected to each other to form an integral structure are simultaneously exposed.
- the wall surface of the portion of the through-hole 2A that has not been removed remains covered with the copper plating layer 3.
- the plating composite 4A most of the core material 1 is covered in a bag shape with the copper plating layer 3, so that only the portion of the cut surface 1d is the aluminum constituting the core material 1. It has been put out.
- the plating composite 4A is subjected to an immersion treatment in a solution.
- An alkaline aqueous solution is used as the solution.
- an aqueous sodium hydroxide solution is preferred.
- the core material 1 exposed from the cut surface 1d from the position of the cut surface 3d of the copper plating layer 3 is made of aluminum which is an amphoteric metal. Dissolve in However, the copper of the copper plating layer 3 covering the core material 1 does not dissolve.
- the dissolution of only the aluminum plate 1 into the aqueous solution proceeds from the cut surface 1d where it is exposed toward the inside, and finally.
- the core material 1 is entirely dissolved from the plating composite 4A.
- the solution of the aluminum core material 1 is discharged to the outside from the portion surrounded by the cut surface 3d of the copper plating layer 3 (the portion where the cut surface 1d of the core material 1 is exposed). 1 is removed.
- the portion where the aluminum core material 1 was present was converted to the hollow portion 5A, and the skeleton portion was surrounded by the remaining copper plating layer 3 surrounding the hollow portion 5A.
- a plate-like hollow structure 5 converted to 5B is obtained.
- the opening of the hollow portion 5A is located on the cut surface 1d of the core 1 described above.
- the sodium concentration in the aqueous sodium solution is set to 5 to 30%, the liquid temperature is maintained at 30 to 80 ° C., the aqueous solution is stirred, and the aqueous solution is vibrated with an ultrasonic vibrator. If the dipping process is advanced, the melting of the aluminum core material 1 proceeds smoothly, which is preferable.
- an aluminum core material 1 having a thickness of 0.3 mm in which a plurality of circular through holes 2 having a diameter of 3 mm are punched is formed, and the entire surface thereof is covered and a copper plating layer having a thickness of 0.15 mm is formed by electrolytic plating. 2 is manufactured, and a core material-plating composite member 4 shown in FIG. 2 is manufactured. Then, a part of the core material-plating composite member 4 is cut and removed to a width of about 20 mm, and the cut surface 1d of the aluminum core material 1 and the copper plating layer 3 are formed.
- a plating composite 4A (FIG.
- a thin plate-like hollow structure 5 as shown in FIG. 4 can be manufactured by applying an ultrasonic vibration of 20 to 100 kHz and performing an immersion treatment for about 30 to 180 minutes.
- a hollow portion 5 ⁇ / b> A having the same shape as the aluminum core material 1 used is formed inside the skeleton portion 5 ⁇ / b> B having an integral structure of the copper plating layer 3 having a thickness of 0.15 mm.
- the opening of the hollow portion 5A (the height (the distance between the inner surfaces facing each other of the hollow portion 5A) is 0.3 mm) is located.
- the overall thickness is 0.6 mm (0.15 mm ⁇ 2 + 0.3 mm), and the overall thickness is reduced.
- the copper plating layer 3c which forms the wall surface of 2 A of through-holes stood in the state integrated with these copper plating layers 3a and 3b between the copper plating layer 3a of the upper surface, and the copper plating layer 3b of the lower surface Therefore, even when an excessive surface pressure is applied between the copper plating layers 3a and 3b, for example, in the vertical direction, the standing copper plating layer 3c is stretched between the copper plating layers 3a and 3b. Reinforcing action as a support to prevent
- the hollow structure 5 manufactured in this way can be used as it is as a radiator for an electronic device (such as a heat sink), but the hollow portion 5A is filled with a heat medium (for example, a cooling refrigerant (such as water)).
- a heat medium for example, a cooling refrigerant (such as water)
- the heating medium can be filled from the opening of the hollow portion 5A, and then the opening can be sealed using means such as caulking, pressing, welding, heat fusion, soldering, and the like.
- the hollow structure 5 of the present embodiment has the copper plating layers 3a, 3b, and 3c integrated with each other, and if only the opening is sealed sufficiently, a liquid-tight structure can be easily obtained.
- the obtained radiator is thin overall, so it can be placed in a narrow space. Further, since the overall planar shape is defined by the planar shape of the core material that is the starting member to be used, even a heat sink with a complicated shape can be easily accommodated. Moreover, the hollow structure can be easily manufactured by the plating technique and the immersion treatment in the solution as described above. In addition, when the heat medium (refrigerant) is sealed in the hollow part, when combined with each device of an electronic device, the heat medium functions better for each device that generates heat. Demonstrate the effect.
- the core material 1 when the distance between the inner surfaces facing each other of the hollow portion 5A is extremely narrow, such as 0.3 mm, the core material 1 is also very thin, such as 0.3 mm. If it is made of aluminum as in the present embodiment, it is dissolved in an alkaline aqueous solution, so that it becomes a solution with extremely low viscosity. Therefore, even in a narrow gap, the solution is converted into the hollow portion 5A.
- the copper plating layer 3 can be quickly discharged to the outside through the opening surrounded by the cut portion 3d.
- the aluminum solution is not dissolved. It flows out promptly without being blocked by them. Therefore, according to this embodiment, even if the space between the inner surfaces facing each other in the hollow portion is extremely narrow, or even if there is a pillar-shaped material that hinders elution inside, the dissolved core material 1 is hardly left.
- the heat medium even when filling the hollow medium with a small volume with the heat medium, it is possible to fill the heat medium in an amount corresponding to the volume, even if it is thin (in the above example, the overall thickness is 0.6 mm), High performance radiators (heat sinks and vapor chambers) can be provided. The same applies to a heat pipe having a hollow portion with a diameter of about 1 mm, for example.
- a metal such as aluminum
- a synthetic resin such as polyimide
- a skeleton is formed by plating on the metal.
- a core material having a thickness of 0.001 to 10 mm
- the distance between the upper and lower inner surfaces facing each other in the hollow portion corresponding to the thickness direction of the core material is 0.001 to 10 mm.
- the thickness of the core material 1 and the interval between the inner surfaces facing each other of the hollow portion corresponding to the thickness direction are 0.001 to 5 mm, 0.001 to 3 mm, 0.001 to 1 mm, and further 0.001. It is particularly suitable for the production of very thin radiators of ⁇ 0.5 mm. Therefore, the electronic device is suitable for being arranged in a very narrow space.
- an aluminum foil or polyimide film having a thickness of about 0.01 mm is used as the core material 1, and the thickness of the plating layer laminated on the front side and the back side is set to about 0.01 mm, so that the hollow portion is included.
- a very thin hollow metal foil having a total thickness of about 0.03 mm can be obtained.
- a film made of a synthetic resin such as polyimide is used as the core material 1, for example, a thinner radiator with a space between the upper and lower inner surfaces facing each other in the hollow portion of 0.001 to 0.01 mm is manufactured. Suitable for
- the present invention may be any form that is not covered with the copper plating layer 3 and is exposed at the stage of becoming the plating composite 4A so that the core material 1 can be dissolved. It is possible to prevent the copper plating layer 3 from being formed at the masked portion by masking a part of the core material 1 and then performing a plating treatment. Moreover, even if it does not mask, when it immerses in a plating bath, the site
- FIG. 5 a metal layer (corrosion-resistant metal layer) 10 having excellent corrosion resistance covering at least a part of the surface of the core material 1 may be interposed.
- the material of the corrosion-resistant metal layer 10 include materials that do not dissolve in the solution that dissolves the core material 1, such as gold and silver.
- the corrosion-resistant metal layer 10 is provided, for example, the surface of the core material 1 is previously coated with a plating process, a sputtering process, a vapor deposition process, etc., and then the surface of the corrosion-resistant metal layer 10 is coated with the copper plating layer 3.
- the plating composite 4A can also be obtained. In this case, it is the same as in the above embodiment that a part of the core material 1 is exposed not only by the copper plating layer 3 but also by the corrosion-resistant metal layer 10.
- the same means as various means for exposing from the copper plating layer 3 can be adopted.
- the plating layer is not limited to copper, and a metal such as nickel or chromium may be selected as in the above embodiment.
- the skeleton 5B of the hollow structure 5 As shown in FIG. 5B, the inner surface of the copper plating layer 3 is covered with the corrosion-resistant metal layer 10. Therefore, when using it for the use which fills a heat medium (refrigerant) inside like a heat radiator, it is preferable for corrosion prevention to coat
- the through-hole 2 is formed in the core material 1, and the copper plating layer 3c which functions as a support
- the copper plating layer 3c which functions as a support
- the copper plating layer 3c that performs the function of the support column.
- a flat plate in which a through hole is not formed as a core material As shown in FIG. 6 (a), it is of course possible to make the hollow structure 51 composed of a flat frame portion 51B (copper plating layer 3) having a hollow portion 51A without a support.
- a thin plate material, foil or film is used as the core material, so that it is mainly used as a base material for heat sinks incorporated in various electronic devices pursuing miniaturization, thickness reduction, weight reduction, and multifunctionality.
- the use of the hollow structure is not limited thereto, and a rod-like or needle-like material can be used as a core material to form a small-diameter heat pipe.
- an aluminum needle-like body is used as a core material, and after covering it to form a metal plating layer with high hardness and excellent corrosion resistance such as nickel and chromium, the needle-like body is dissolved and removed. If an ultrafine metal tube is used, it can be used as a base material for an inspection probe for semiconductor device inspection, for example.
- FIG. 6B shows an example of a hollow structure 52 manufactured using such a rod-like or needle-like core material and used as a heat pipe, an inspection probe, or the like, and a cylinder having a hollow portion 52A. It is comprised from the shape-like frame
- FIGS. 7A and 7B are views showing a hollow structure 53 according to another embodiment.
- the hollow structure 53 is used as a radiator (heat sink, heat pipe, vapor chamber, or the like), as described above, the hollow portion 53A is filled with a heat medium (refrigerant) such as water and sealed and used.
- a heat medium such as water and sealed and used.
- the formation range of the concavo-convex portion 53A1 is preferably as wide as possible, and as shown in FIG.
- the uneven portion 53A1 here includes various shapes such as dimple shape, groove shape, line shape, line shape, mesh shape, etc., and these include those that function as a wick that performs capillary action. .
- a concavo-convex portion 53A1 in the hollow portion 53A as shown in FIG. 7B, at least a part of the surface of the core material 1 has a dimple shape, a groove shape, a linear shape, a streak.
- the concavo-convex portion 1e made of a shape, mesh shape or the like may be formed.
- the uneven portion 1e of the core material 1 becomes a hollow portion 53A as shown in FIG. That is, the concave portion of the core material 1 becomes a convex portion on the inner surface of the hollow portion 53A, and the concave and convex portion 53A1 is formed in which the convex portion of the core material 1 becomes a concave portion on the inner surface of the hollow portion 53A.
- the formation range of the uneven portion 1e on the surface of the core material 1 is also increased. Further, by forming the uneven portions 1e on both surfaces of the core material 1, the uneven portions 53A1 can be formed on both inner surfaces of the hollow portion 53A facing each other.
- FIGS. 8A and 8B are views showing a hollow structure 54 according to still another embodiment.
- the hollow structure 54 has an uneven portion 541 such as a dimple shape, a groove shape, a line shape, a line shape, a mesh shape, etc. on the surface of the core material 1 as the core material 1 in advance.
- the sheet-like member 540 having the surface is joined and integrated by welding, adhesion, or the like, and then the core 1 and the plating composite in which the copper plating layer 3 is formed on the sheet-like member 540 are formed. , And further dissolved.
- the sheet-like member 540 may use a metal mesh or a porous material, and those meshes and holes penetrating in the thickness direction may constitute the uneven portion 541 described above.
- a sheet-like (including film-like, foil-like, etc.) member gold, silver, copper, etc.
- the sheet-like member 540 having the uneven portion 541 is fixed to the inner surface of the hollow portion 54 ⁇ / b> A formed by the copper plating layer 3.
- the uneven part 541 is formed in the integrated range.
- the sheet-like member 540 having the uneven portion 541 as described above is formed between two metal (aluminum, etc.) foils 100, 100 (or two synthetic resins). (Polyimide or the like) is sandwiched between films, and this is used as one core material 1, and the core material 1 is subjected to plating treatment, and then processed in the same manner as described above to produce the hollow structure 54. .
- the core material 1 metal foils 100, 100, etc.
- the sheet-like member 540 remains without being fixed in the hollow portion 54A.
- the sheet-like member 540 By disposing the sheet-like member 540 in the hollow portion 54A, a wick that performs capillary action can be formed, but the sheet-like member is inserted into a narrow space where the distance between the inner surfaces is 1 mm or less in a subsequent process. The work to do is difficult. However, as described above, by using the core material 1 in which the sheet-like member is sandwiched with a metal foil or a synthetic resin film, the same steps as those described above, such as plating and dissolution treatment of the core material 1, are performed thereafter. The sheet-like member 540 can be easily arranged in a narrow space.
- the sheet-like member 540 is preferably fixed on the inner surface of the hollow portion 54A as shown in FIGS. 8 (a) and 8 (b) in terms of function as a wick, but FIG. 8 (c). By adopting the method, it is possible to arrange without fixing.
- the present invention is suitable for manufacturing thin or thin hollow structures having a small thickness (thin diameter) as described above.
- a thick plate and a block having a large thickness are used as a core material
- the present invention can also be applied to manufacturing a larger-sized product such as a power module radiator incorporated in an automobile, a railway, a solar cell system, or the like.
- the melted core material can be thin or thick.
- the shape of the hollow part and the hollow structure (skeleton part) can also be various shapes, for example, the shape in the cross-sectional direction, such as a triangle, a quadrangle, an ellipse, a star, and other irregular cross-sectional shapes It is also possible to do.
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Abstract
Description
芯材の表面にめっき処理を施して形成しためっき層を有するめっき複合体であって、前記めっき層から前記芯材の一部が表出した形態の前記めっき複合体を製造し、
ついで前記芯材は溶解するが前記めっき層は溶解しない溶液によって前記芯材を溶解除去して前記芯材の箇所を中空部に転化し、
前記めっき層を骨格部とした中空構造体を製造することを特徴とする中空構造体の製造方法を提供する。
前記芯材の厚みが0.001~1mmであり、前記めっき層の厚みが0.001~1mmであることが好ましい。
前記芯材として、厚み方向に少なくとも1つの貫通孔が形成されているものを用いることが好ましい。
前記芯材として、表面の少なくとも一部に凹凸部が形成されたものを用いることが好ましい。
前記芯材として、前記溶液によって溶解しない材料からなるシート状部材が一体化されたものを用い、前記中空部内に前記シート状部材を残存させる構成とすることが好ましい。
前記めっき処理する前に、前記芯材の表面の少なくとも一部を、耐食性に優れると共に前記溶液に溶解しない耐食性金属層で被覆しておき、前記めっき層からなる前記骨格部の内面の少なくとも一部を、前記耐食性金属層により被覆された構造とすることが好ましい。
電子機器用の放熱器として用いるため、前記中空部に熱媒体を封入する工程をさらに有することが好ましい。
前記芯材は溶解するが前記めっき層は溶解しない溶液によって前記芯材を溶解除去して前記芯材の箇所を中空部に転化し、前記めっき層を中空構造体の骨格部とするべく、前記芯材の一部が前記めっき層から表出した形態となっている前記中空構造体の製造に用いられるめっき複合体を提供する。
前記めっき複合体の前記芯材の表面の少なくとも一部に凹凸部が形成されていることが好ましい。
前記めっき複合体の前記芯材は、前記中空部内に残存させる、前記溶液によって溶解しない材料からなるシート状部材が一体化されたものであることが好ましい。
前記めっき複合体の前記芯材と前記めっき層との間に、耐食性に優れると共に前記溶液に溶解しない耐食性金属層が、前記芯材の表面の少なくとも一部を被覆して介在されていることが好ましい。
前記中空構造体の前記芯材の厚み方向に相当する前記中空部の対向する内面間の間隔が0.001~1mmであり、前記骨格部の厚みが0.001~1mmであることが好ましい。
前記中空構造体の前記中空部の内面の少なくとも一部に、凹凸部を有することが好ましい。
前記中空構造体の前記中空部内に、前記溶液によって溶解しない材料からなるシート状部材が挿入配置されていることが好ましい。
前記中空構造体の前記めっき層からなる前記骨格部の内面の少なくとも一部が、耐食性に優れると共に前記溶液によって溶解しない耐食性金属層により被覆された構造であることが好ましい。
前記中空構造体は、電子機器用の放熱器、ケーブル又は金属チューブとして用いられることが好ましい。
特に厚み方向に貫通孔を形成した芯材を用いると、形成された骨格部では、貫通孔の壁面にも円筒状にめっき層が形成され、そしてその上下両端は骨格部の上面部と下面部を構成するめっき層と連結して一体化しているので、その円筒状のめっき層が、得られた中空構造体の上面部と下面部のめっき層間におけるへたりを防ぐ厚み方向の支柱としての補強作用も発揮するので好適である。
ついで、芯材の一部が表出しているめっき複合体を後述する溶液に浸漬して芯材だけを選択的に溶解除去する。この浸漬処理により、最終的に得られた中空構造体では、めっき複合体の芯材の箇所は中空部に転化し、めっき層はそのまま残って上面部のめっき層、下面部のめっき層、そして両めっき層を連結する円筒状のめっき層(貫通孔を形成した芯材の場合)から成る一体構造の骨格部が形成される。
芯材としては浸漬処理時に用いる溶液に溶解する金属又は合成樹脂が選定される。そしてめっき層を形成する材料としては浸漬処理時に用いる溶液に溶解しない金属が選定される。したがって浸漬処理時に用いる溶液としては、芯材は溶解するがめっき層は溶解しない溶液が選定される。
溶液としてはアルカリ水溶液と酸性水溶液のいずれも用いることはできるが、芯材の材料とめっき層を形成する材料との組み合わせに対応してそのいずれかが選定される。
芯材としては任意の厚みの平坦な板材や箔であってもよいが、図1で示したように、芯材1の上面部1aから下面部1bに向かう厚み方向に1つ以上の貫通孔2が形成されているものが好ましい。その理由は後述する。これら貫通孔2の断面形状は図1で示したような円形であることを好適とするが、その形状はこれに限定されるものではなく、例えば三角形、四角形、楕円、星形その他の異形断面形状など任意の形状であってもよい。このような貫通孔2は、例えば機械的な打ち抜き加工やドリル加工によって形成したり、またフォトリソグラフィーとエッチング技術を適用したりして形成することができる。
例えば水酸化ナトリウム水溶液にめっき複合体4Aを浸漬すると、銅めっき層3の切断面3dの位置から、切断面1dが表出している芯材1は、両性金属であるアルミニウムからなるため、当該水溶液に溶解する。しかし芯材1を被覆している銅めっき層3の銅は溶解しない。そしてその後も銅めっき層3の溶解は進行しない状態で、アルミニウム製の板材1だけの当該水溶液への溶解は、それが表出する切断面1dから内部に向かって進行していき、最終的には芯材1の全部がめっき複合体4Aから溶解される。アルミニウム製の芯材1の溶解液は、銅めっき層3の切断面3dによって取り囲まれた部位(芯材1の切断面1dが表出していた部位)から外部に排出され、これにより、芯材1は除去される。
1a 芯材1の上面部
1b 芯材1の下面部
1d 芯材1の切断面
10 耐食性金属層
2 貫通孔
2a 貫通孔2の壁面部
2A 貫通孔
3 銅めっき層(めっき層)
3a 銅めっき層3の上面
3b 銅めっき層3の下面
3c 貫通孔2Aの壁面(立設された銅めっき層)
3d 銅めっき層3の切断面
4 芯材-めっき複合部材
4A めっき複合体
5,51,52,53,54 中空構造体
5A,51A、52A,53A,54A 中空構造体の中空部
5B,51B,52B 中空構造体の骨格部
Claims (20)
- 芯材の表面にめっき処理を施して形成しためっき層を有するめっき複合体であって、前記めっき層から前記芯材の一部が表出した形態の前記めっき複合体を製造し、
ついで前記芯材は溶解するが前記めっき層は溶解しない溶液によって前記芯材を溶解除去して前記芯材の箇所を中空部に転化し、
前記めっき層を骨格部とした中空構造体を製造することを特徴とする中空構造体の製造方法。 - 前記芯材が、金属又は合成樹脂である請求項1記載の中空構造体の製造方法。
- 前記芯材の厚みが0.001~1mmであり、前記めっき層の厚みが0.001~1mmである請求項1又は2記載の中空構造体の製造方法。
- 前記芯材として、厚み方向に少なくとも1つの貫通孔が形成されているものを用いる請求項1~3のいずれかに記載の中空構造体の製造方法。
- 前記芯材として、表面の少なくとも一部に凹凸部が形成されたものを用いる請求項1~4のいずれか1に記載の中空構造体の製造方法。
- 前記芯材として、前記溶液によって溶解しない材料からなるシート状部材が一体化されたものを用い、前記中空部内に前記シート状部材を残存させる請求項1~5のいずれか1に記載の中空構造体の製造方法。
- 前記めっき処理する前に、前記芯材の表面の少なくとも一部を、耐食性に優れると共に前記溶液に溶解しない耐食性金属層で被覆しておき、前記めっき層からなる前記骨格部の内面の少なくとも一部を、前記耐食性金属層により被覆された構造とする請求項1~6のいずれか1に記載の中空構造体の製造方法。
- 電子機器用の放熱器として用いるため、前記中空部に熱媒体を封入する工程をさらに有する請求項1~7のいずれか1に記載の中空構造体の製造方法。
- 芯材と、前記芯材の表面を被覆するめっき層とを有して構成され、
前記芯材は溶解するが前記めっき層は溶解しない溶液によって前記芯材を溶解除去して前記芯材の箇所を中空部に転化し、前記めっき層を中空構造体の骨格部とするべく、前記芯材の一部が前記めっき層から表出した形態となっている前記中空構造体の製造に用いられるめっき複合体。 - 前記芯材の厚みが0.001~1mmであり、前記めっき層の厚みが0.001~1mmである請求項9記載のめっき複合体。
- 前記芯材の表面の少なくとも一部に凹凸部が形成されている請求項9又は10記載のめっき複合体。
- 前記芯材は、前記中空部内に残存させる、前記溶液によって溶解しない材料からなるシート状部材が一体化されたものである請求項9~11のいずれか1に記載のめっき複合体。
- 前記芯材と前記めっき層との間に、耐食性に優れると共に前記溶液に溶解しない耐食性金属層が、前記芯材の表面の少なくとも一部を被覆して介在されている請求項9~12のいずれか1に記載のめっき複合体。
- 芯材の表面がめっき層で一部を除いて被覆されためっき複合体のうち、前記芯材は溶解するが前記めっき層は溶解しない溶液によって溶解除去された前記芯材の箇所が中空部を構成し、前記めっき層が骨格部を構成している中空構造体。
- 前記中空部に熱媒体が封入されている請求項14記載の中空構造体。
- 前記芯材の厚み方向に相当する前記中空部の対向する内面間の間隔が0.001~1mmであり、前記骨格部の厚みが0.001~1mmである請求項14又は15記載の中空構造体。
- 前記中空部の内面の少なくとも一部に、凹凸部を有する請求項14~16のいずれか1に記載の中空構造体。
- 前記中空部内に、前記溶液によって溶解しない材料からなるシート状部材が挿入配置されている請求項14~17のいずれか1に記載の中空構造体。
- 前記めっき層からなる前記骨格部の内面の少なくとも一部が、耐食性に優れると共に前記溶液によって溶解しない耐食性金属層により被覆された構造である請求項14~18のいずれか1に記載の中空構造体。
- 電子機器用の放熱器、ケーブル又は金属チューブとして用いられる請求項14~19のいずれか1に記載の中空構造体。
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