WO2018153041A1 - 缓存装置和液晶屏生产线 - Google Patents

缓存装置和液晶屏生产线 Download PDF

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Publication number
WO2018153041A1
WO2018153041A1 PCT/CN2017/098817 CN2017098817W WO2018153041A1 WO 2018153041 A1 WO2018153041 A1 WO 2018153041A1 CN 2017098817 W CN2017098817 W CN 2017098817W WO 2018153041 A1 WO2018153041 A1 WO 2018153041A1
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WIPO (PCT)
Prior art keywords
air blowing
blowing device
side wall
air
cache
Prior art date
Application number
PCT/CN2017/098817
Other languages
English (en)
French (fr)
Inventor
刘超
任青双
沈二峰
尹泰赫
雷爱华
严晗
胡兴明
毕如宝
戴超谋
董胜旺
吴小富
周伟伟
张栋栋
李金明
Original Assignee
京东方科技集团股份有限公司
合肥鑫晟光电科技有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 京东方科技集团股份有限公司, 合肥鑫晟光电科技有限公司 filed Critical 京东方科技集团股份有限公司
Priority to EP17847783.2A priority Critical patent/EP3591459B1/en
Priority to US15/761,006 priority patent/US10625311B2/en
Publication of WO2018153041A1 publication Critical patent/WO2018153041A1/zh

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B5/00—Cleaning by methods involving the use of air flow or gas flow
    • B08B5/02—Cleaning by the force of jets, e.g. blowing-out cavities
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G1/00—Storing articles, individually or in orderly arrangement, in warehouses or magazines
    • B65G1/02—Storage devices
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1313—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells specially adapted for a particular application
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers
    • H01L21/67363—Closed carriers specially adapted for containing substrates other than wafers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers
    • H01L21/67389—Closed carriers characterised by atmosphere control
    • H01L21/67393—Closed carriers characterised by atmosphere control characterised by the presence of atmosphere modifying elements inside or attached to the closed carrierl
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B9/00—Cleaning hollow articles by methods or apparatus specially adapted thereto 
    • B08B9/08—Cleaning containers, e.g. tanks
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1316—Methods for cleaning the liquid crystal cells, or components thereof, during manufacture: Materials therefor

Definitions

  • the present disclosure relates to the field of cache devices, and more particularly to a cache device and a liquid crystal screen production line.
  • the buffer device is a widely used device in the production line of electronic glass deep processing (for example, liquid crystal display) for storing a glass substrate.
  • the typical structure of the current cache device basically comprises an outer frame, a support frame is arranged inside the outer frame, the support frame comprises a plurality of horizontal cross beams, and a plurality of vertical support pins are densely arranged on the horizontal cross beams of the layers, and the plurality of caches are arranged.
  • the glass substrate can be supported horizontally on the support pins.
  • the lower portion of the buffer device is also supported by the support so that the buffer device is at a height that allows the operator to access the glass substrate.
  • the outer frame of the related art buffer device is generally configured as a non-closed box-type structure, and only the front side (the side facing the operator) is provided with an opening for the glass substrate, and the rear wall of the outer frame (opposite the opening) Side wall), the left side wall (the side wall on the left side of the operator), the right side wall (the side wall on the right side of the operator), the top wall and the bottom wall are detachably mounted with a cover to enable the cache A relatively isolated space is formed inside the device to protect the glass substrate.
  • the product yield can be improved by improving the cleanliness of the product.
  • an EFU Equipment Fan-filter unit
  • a plurality of ventilation holes are arranged on the bottom wall of the outer frame, and the EFU is not loaded in the buffer device (internal not
  • the filtered clean air is blown from the top to the bottom inside the outer frame, and the formed airflow is discharged from the vent hole of the bottom wall to clean the inside of the buffer device.
  • the above cleaning method has a limited cleaning effect. On the one hand, it can only blow clean air at no load, and on the other hand, dust tends to gather at corners where some airflow cannot be blown to form a dead corner that is difficult to clean. Therefore, it is necessary to manually perform a deep cleaning of the cache device on a PM (preventive maintenance) day. Since the horizontal cross beam and the support nail are densely arranged inside the outer frame and the maintenance space is narrow, the person can not enter the outer frame for wiping during manual cleaning, and only the side wall can be removed, and then the cleaning tool is passed through the inside of the outer frame. The person performs "saw-on" cleaning on both sides of the cache device, which has the disadvantages of difficulty in cleaning, low efficiency, and poor cleaning effect.
  • the present disclosure is directed to providing a cache device to address at least one of the above-described technical problems existing in current cache devices.
  • the first side wall of the frame having an opening for accessing the cached item
  • a support frame located in an area surrounded by the frame for supporting a cached item
  • first air blowing device on a second side wall opposite to the first side wall of the frame; the first air blowing device being configured to blow air toward the opening;
  • An air exhausting device on a fourth side wall opposite the third side wall of the frame.
  • the buffer device further includes: a third air blowing device on the fifth side wall of the frame; and at least one ventilation hole disposed on the sixth side wall opposite to the fifth side wall.
  • the second air blowing device is configured to blow the airflow pressure not less than the airflow pressure blown by the first air blowing device
  • the third air blowing device is configured to blow out the airflow pressure Not less than the pressure of the airflow blown by the second air blowing device.
  • the fourth sidewall includes a deflector, and the deflector is provided with at least one flow guiding hole.
  • the first air blowing device includes a plurality of fan filters for equipment, and the plurality of device fan filters are arranged in a rectangular array; and/or the second air blowing device and the third air blowing device respectively comprise a plurality of nozzles in communication with a source of compressed dry air; and/or the extraction device is a vacuum extraction device.
  • the nozzle is a 360° rotating nozzle.
  • the cache device further includes a detecting device and a controller; the detecting device is configured to detect a storage state in the cache device; and when the cache device is in a normal working state, the first air blowing device remains in operation when the cache device is in a dead time When the set time is exceeded, the detecting device sends a start signal to the controller; the controller controls the second air blowing device and the air blowing device to start according to the start signal, and causes the second air blowing device and the air extracting device to operate for a predetermined period of time.
  • the detecting device sends a stop signal to the controller when detecting that the cached item is stored in the buffer device, and the controller controls the second air blowing device and the air blowing device according to the stop signal. shut down.
  • the buffering device further includes: an input unit connected to the controller signal; and the controller controlling the starting and closing of the third air blowing device according to the information input by the input unit.
  • Embodiments of the present invention also provide a liquid crystal panel production line configured with the above-described cache device.
  • the first air blowing device can generally blow air horizontally from the second side wall of the outer frame to the opening direction, and the air blowing direction of the first air blowing device is substantially parallel to the plane of the glass substrate. Even if the glass substrate is placed inside the buffer device, the first air blowing device can be not turned off, thereby achieving basic cleaning of the buffer device 24 hours a day, and the daily cleaning effect of the cache device is remarkably improved.
  • the direction of the airflow blown by the second air blowing device is not parallel to the direction of the airflow blown by the first air blowing device, the position where the first air blowing device cannot be blown can be additionally cleaned when the buffer device is idling, and the buffer device can be realized. The depth of cleaning can greatly reduce the frequency of manual cleaning, and the cleaning effect is good.
  • FIG. 1 is a front elevational view showing a cache device according to an embodiment of the present invention
  • FIG. 2 is a bottom view of a cache device provided by an embodiment of the present invention.
  • FIG. 3 is a perspective view of a cache device according to an embodiment of the present invention in a first direction
  • FIG. 4 is a perspective view of a cache device in a second direction provided by an embodiment of the present invention.
  • FIGS. 1 through 4 there is shown a structure of a cache device provided by an embodiment of the present invention, for example, for supporting a glass substrate. As shown, the cache is loaded
  • the arrangement includes an outer frame, and in combination with the related art, the structure of the outer frame is generally not a closed box structure.
  • An opening 10 for accommodating the cached article is provided on a first side wall of the outer frame, such as a front side wall, a second side wall opposite the first side wall, such as a rear wall 11, and a third side wall 12 opposite to the first side wall
  • the four side walls, such as the left side wall 12 and the right side wall 13, the opposite fifth side wall and the sixth side wall, such as the top wall 14 and the bottom wall 15, are preferably detachably mounted with a cover to form a interior of the buffer device.
  • the relatively isolated space serves to protect the glass substrate.
  • the inside of the outer frame is provided with a support frame for horizontally supporting a cached article such as a glass substrate.
  • the support frame comprises a plurality of horizontal cross beams 100, and a plurality of vertical support pins 101 are densely arranged on the horizontal cross beams of the respective layers, and the buffered glass substrate can be horizontally supported on the support nails.
  • Each of the horizontal cross beams and the support nails thereon may be made of aluminum, and the position of the support nails in contact with the glass substrate may also be sheathed by Peek (polyether ether ketone resin) to avoid the support nail scratching the glass.
  • Peek polyether ether ketone resin
  • the frame body and the side walls of the outer frame may be made of stainless steel.
  • the lower portion of the buffer device is also supported by a support (not shown) to position the cache device at a height that allows the operator to access the glass substrate.
  • the buffer device provided in this embodiment further includes a first air blowing device 2, a second air blowing device 3, and an exhaust duct 4.
  • the first air blowing device 2 is disposed on the rear wall 11 of the outer frame, and the first air blowing device 2 is configured to blow air in the direction of the opening 10, that is, the first air blowing device 2 is generally oriented from the rear wall 11 toward the opening 10. Air is supplied horizontally. It can be understood that the airflow blown by the first air blowing device 2 is the filtered clean airflow.
  • the first air blowing device 2 may be a plurality of equipment fan filters (hereinafter referred to as EFU) installed on the rear wall of the outer frame and arranged in a rectangular array, and the airflow blown by the EFU penetrates the outer frame substantially horizontally. The interior is discharged from the opening 10.
  • EFU equipment fan filters
  • the second air blowing device 3 is disposed on the left side wall 12 of the outer frame for blowing clean air to the inside of the outer frame. It can be understood that the airflow blown by the second air blowing device 3 should also be the filtered cleaning gas.
  • the exhaust duct 4 is disposed on the right side wall 13 of the outer frame and is adapted to communicate with the air extracting device for extracting the gas inside the outer frame, and is mainly used for pumping away the cleaning gas blown by the second air blowing device 3.
  • the air extraction device may be a vacuum air extraction device.
  • the second air blowing device 3 can also adopt an EFU for horizontally blowing air from left to right.
  • the second blower 3 comprises a plurality of nozzles adapted to communicate with a source of compressed dry air, the plurality of nozzles being arranged in a rectangular array on the left side wall.
  • the compressed dry air source preferably provides compressed dry air of from 0.5 MPa to 0.6 MPa such that the pressure of the gas stream blown by the second blower 3 is not less than the pressure of the gas stream blown by the first blower 2 to provide greater cleaning capability. .
  • the position that the first air blowing device 2 cannot blow can be additionally cleaned, and the buffer device can be realized. Deep cleaning.
  • the second air blowing device 3 blows air
  • the left side wind can be discharged by the air blowing device, instead of providing ventilation holes on the right side wall 13 to circulate the air, thereby avoiding opening a ventilation hole row connecting the outside wall on the right side wall.
  • the gas adversely affects the product on the production line on the right side of the buffer device.
  • the positions of the second air blowing device 3 and the exhaust duct 4 can be interchanged, that is, the second air blowing device 3 can be disposed on the right of the outer frame.
  • the exhaust duct 4 may be disposed on the left side wall of the outer frame.
  • each nozzle of the second air blowing device 3 may be a 360° rotating nozzle to provide more cleaning angles and a larger cleaning range, further reducing cleaning dead angles.
  • the second air blowing device 3 and the air blowing device can be in the normal working state of the buffer device in order to prevent the higher pressure cleaning airflow from hitting the buffered glass substrate when the airflow is blown obliquely or obliquely downward. Open during no load.
  • a deflector 16 may be disposed inside the right side wall 13 on which the exhaust duct 4 is mounted.
  • the deflector vertical plate 16 is disposed in parallel with the right side wall 13.
  • the flow guiding vertical plate 16 is provided with a plurality of flow guiding holes 160, so that the clean air blown by the second air blowing device 3 is uniformly introduced into the exhaust air pipe. After 4, it is pumped away by the air extracting device, which also facilitates the uniform flow of the clean airflow inside the buffer device.
  • the exhaust duct 4 is mounted to the left side wall 12, the inner side of the left side wall 12 of the deflector riser 4 is disposed in parallel with the left side wall 12.
  • the buffer device further includes a third air blowing device 5 disposed on the top wall 14 of the outer frame, and the third air blowing device 5 is for blowing the clean air to the inside of the outer frame.
  • the airflow blown by the third air blowing device 3 should also be filtered clean air.
  • a plurality of ventilation holes 150 are provided on the bottom wall 15 of the outer frame, and the ventilation holes 150 may have a larger aperture, and the cleaning air is vented from the ventilation holes 150 to the buffer. The lower part of the device is discharged, which does not affect the products on the production line on the left and right sides of the buffer device.
  • the third air blowing device 5 may also employ an EFU for blowing air from the top to the bottom.
  • the third blower 5 includes a plurality of nozzles adapted to communicate with a source of compressed dry air, and the plurality of nozzles may be arranged in a rectangular array on the top wall 14.
  • the third air blowing device 5 can share the compressed air with the second air blowing device 3 a dry air source; or the pressure of the airflow blown by the third air blowing device 5 is not less than the pressure of the airflow blown by the second air blowing device 3, for example, the pressure of the compressed dry air communicated by the third air blowing device 5 is 0.7 Mpa. ⁇ 0.8Mpa.
  • each nozzle of the third air blowing device 5 may also be a 360° rotating nozzle.
  • the third air blowing device 5 can be turned on only at the time of PM.
  • the cache device further includes a detection device and a controller.
  • the detecting means may, for example, comprise a proximity switch provided inside the buffer means for detecting a storage state within the buffer means. In the normal operating state of the buffer device, the first air blowing device 2 remains in operation, and when the dead time of the buffer device exceeds a set time period (for example, 30 minutes), the detecting device issues a start signal to the controller.
  • the controller controls the second air blowing device 3 and the air blowing device to be activated according to the activation signal, and the second air blowing device 3 and the air blowing device are turned off after being operated for a predetermined period of time (for example, 30 minutes), thereby realizing the automatic operation of the second air blowing device 3 and the air blowing device. Start and shut down.
  • the controller can use a PLC controller.
  • the detecting device sends a stop signal to the controller when detecting that the cached item is stored in the buffer device, and the controller controls the second air blowing device according to the stop signal. 3 and the air blowing device is closed to prevent the strong air current blown by the second air blowing device 3 from striking the glass substrate.
  • the buffering device further comprises an input unit, the input unit may also be connected to the controller signal, and the controller controls the starting and closing of the third air blowing device 5 according to the information input by the input unit.
  • the input unit can be a touch screen. If the PM day of the cache device is fixed, the automatic mode can be selected on the touch screen, and according to the data input in advance by the program, the third air blowing device 5 can be automatically started on the set PM date and After running for a certain period of time, it will automatically shut down. If the PM day is not fixed, you can select the manual mode, manually click the start/stop button on the touch screen to realize the one-button start/stop function of the third air supply device, or click the start button in the manual mode to make the third air supply. The device is automatically turned off after 4 hours of operation.
  • the buffer device provided in this embodiment can provide two cleaning modes: one is a normal cleaning mode, and is suitable for normal cleaning on a normal production day.
  • the first air blowing device 2 maintains continuous operation
  • the second The air blowing device 3 and the air blowing device operate according to the storage state of the buffer device; the other is the PM cleaning mode, which is suitable for thorough cleaning of the PM day.
  • the third air blowing device 5 is all activated for a predetermined period of time.
  • the proportion of dust particles removed is about 80% when the buffer device is normally used in the normal cleaning mode. When the PM is cleaned, the proportion of dust particles is about 100%.
  • the current cache device produces about 50% of the dust particles on the day of production, and the ratio of manual cleaning and dust removal on the PM day is about 70%. Therefore, the buffer device provided by the embodiment not only reduces the difficulty of cleaning the internal space, but also improves the cleaning efficiency and the cleaning effect.
  • the embodiment of the present invention further provides a liquid crystal panel production line, which is provided with the cache device provided by the embodiment of the present invention, and therefore should also have the above technical effects achieved by the cache device.

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Nonlinear Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Manufacture Of Electron Tubes, Discharge Lamp Vessels, Lead-In Wires, And The Like (AREA)
  • Cleaning In General (AREA)
  • Drying Of Solid Materials (AREA)

Abstract

一种缓存装置和液晶屏生产线，缓存装置包括外框架，外框架的前侧具有用于取放缓存物品的开口（10），外框架的内部配置有用于水平支撑缓存物品的支撑架；第一送风装置（2），配置于外框架的后壁（11）上；第一送风装置（2）用于向开口（10）的方向吹风；第二送风装置（3），配置于外框架的左侧壁（12）或者右侧壁（13）中的一者上；适于与抽风装置连通的排风管道（4），排风管道（4）配置于外框架的左侧壁（12）或者右侧壁（13）中的另一者上。缓存装置可以显著改善缓存装置的日常清洁效果，还可以自动进行深度清洁。

Description

缓存装置和液晶屏生产线
相关申请的交叉引用
本申请要求于2017年2月21日递交的中国专利申请第201710093304.0号的优先权，在此全文引用上述中国专利申请公开的内容以作为本申请的一部分。
技术领域
本公开涉及缓存设备领域，更具体地，涉及一种缓存装置和液晶屏生产线。
背景技术
缓存装置作为电子玻璃深加工(例如液晶显示屏)生产线中一种广泛使用的设备，用于存储玻璃基板。目前的缓存装置的典型结构基本包括外框架、外框架内部设置有支撑架，支撑架包括多层水平交叉横梁，在各层水平交叉横梁上密集布置有很多竖向的支撑钉，多个缓存的玻璃基板可以分层水平地支撑于支撑钉上。缓存装置的下方还会由支座支撑，以使缓存装置处于一个便于操作人员取放玻璃基板的高度。
相关技术的缓存装置的外框架通常配置为不封闭的箱型结构，只在前侧(面向操作人员的一侧)设置有供取放玻璃基板的开口，而外框架的后壁(与开口相对的侧壁)，左侧壁(位于操作人员左侧的侧壁)、右侧壁(位于操作人员右侧的侧壁)、顶壁和底壁都可拆卸地安装有盖板，以使缓存装置内部形成一个相对隔离的空间，起到保护玻璃基板的作用。
电子玻璃深加工生产线中，通过提高产品的洁净度，能够提升产品良率。为避免玻璃基板在缓存装置内中转时被灰尘等颗粒 污染，如何保证缓存装置内的环境洁净对于提升产品良率非常重要。目前在缓存装置的外框架的顶壁上安装有EFU(Equipment fan-filter unit，设备用风机过滤器)，外框架的底壁上设置有多个通风孔，EFU在缓存装置空载(内部未储存玻璃基板)时在外框架内部自上向下吹过滤后的清洁风，所形成的气流从底壁的通风孔排出，使缓存装置内部清洁。
然而，上述清洁方式的清洁效果有限，一方面仅能在空载时吹清洁风，另一方面灰尘容易聚集在一些气流吹不到的角落形成不易清洁的死角。因此还需在每隔一段时间的PM(预防保养，preventive maintenance)日由人工对缓存装置做一次深度清洁。由于水平交叉横梁和支撑钉在外框架内部密集布置、形成的维护空间狭小，人工清洁时人员不能进入外框架内部进行擦拭，只能将侧壁拆除，再将清洁用具从外框架内部穿过，由人员在缓存装置的两边进行“拉锯式”清洁，存在清洁难度大、效率低且清洁效果差的缺点。
发明内容
本公开旨在提供一种缓存装置，以解决当前的缓存装置存在的上述技术问题中的至少一个。
本发明的实施例提供的一种缓存装置，包括：
框架，所述框架的第一侧壁具有用于取放缓存物品的开口；
支撑架，所述支撑架位于所述框架围绕的区域内，用以支撑缓存物品；
第一送风装置，在与所述框架的第一侧壁相对的第二侧壁上；所述第一送风装置被配置为向所述开口的方向吹风；
第二送风装置，在所述框架的与所述第一侧壁相邻的第三侧壁上；以及
排风装置，所述排风装置在与所述框架的第三侧壁相对的第四侧壁上。
进一步地，该缓存装置还包括：第三送风装置，在所述框架的第五侧壁上；与所述第五侧壁相对的第六侧壁上设置至少一个通风孔。
。
进一步地，所述第二送风装置被配置为吹出的气流压力不小于由所述第一送风装置吹出的气流压力，并且/或者，所述第三送风装置被配置为吹出的气流压力不小于由所述第二送风装置吹出的气流压力。
进一步地，所述第四侧壁包括导流立板，所述导流立板上设置有至少一个导流孔。进一步地，第一送风装置包括多个设备用风机过滤器，多个设备用风机过滤器按照矩形阵列的形式布置；并且/或者，第二送风装置和第三送风装置分别包括适于和压缩干燥空气源连通的多个喷嘴；并且/或者，抽风装置为真空抽风装置。
进一步地，喷嘴为360°旋转喷嘴。
进一步地，该缓存装置还包括检测装置和控制器；检测装置用于检测缓存装置内的存储状态；在缓存装置处于正常工作状态时，第一送风装置保持运行，当缓存装置的空载时间超过设定时长时，检测装置向控制器发出启动信号；控制器根据启动信号控制第二送风装置和抽风装置启动，使第二送风装置和抽风装置运行预定时长。
进一步地，在第二送风装置和抽风装置运行期间，检测装置当检测到缓存装置内存储有缓存物品时，向控制器发出停止信号，控制器根据停止信号控制第二送风装置和抽风装置关闭。
进一步地，该缓存装置还包括：输入单元，与控制器信号连接；控制器根据输入单元输入的信息控制第三送风装置的启动和关闭。
本发明的实施例还提供了一种液晶屏生产线，配置有上述的缓存装置。
本发明的实施例提供的缓存装置，第一送风装置可以大体自外框架的第二侧壁向开口方向水平地送风，第一送风装置的送风方向与玻璃基板的放置平面基本平行，即使缓存装置内部放置有玻璃基板时，也可以不关闭第一送风装置，从而实现对缓存装置全天24小时的基本清洁，显著改善了缓存装置的日常清洁效果。通过使第二送风装置吹出的气流方向与第一送风装置吹出的气流方向不相平行，可以在缓存装置空载时对第一送风装置吹不到的位置进行补充清洁，实现缓存装置的深度清洁，由此可以大幅降低人工清洗的频率，而且清洁效果好。
附图说明
下文将参考附图进一步描述本发明的实施例，在附图中：
图1示出了本发明的实施例提供的缓存装置的主视图；
图2示出了本发明的实施例提供的缓存装置的仰视图；
图3示出了本发明的实施例提供的缓存装置沿第一方向的立体图，以及，
图4示出了本发明的实施例提供的缓存装置沿第二方向的立体图。
具体实施方式
参见图1至图4，示出了本发明的实施例提供的缓存装置的结构，该缓存装置例如用于支撑玻璃基板。如图所示，该缓存装 置包括外框架，结合相关技术可知，该外框架的结构大体为不封闭箱型结构。在外框架的第一侧壁例如前侧壁上具有用于取放缓存物品的开口10，外框架与第一侧壁相对的第二侧壁例如后壁11，相对的第三侧壁12与第四侧壁例如左侧壁12与右侧壁13、相对的第五侧壁和第六侧壁例如顶壁14和底壁15优选地可拆卸地安装有盖板，以使缓存装置内部形成一个相对隔离的空间，起到保护玻璃基板的作用。
外框架的内部配置有用于水平支撑缓存物品(例如玻璃基板)的支撑架。优选地，支撑架包括多层水平交叉横梁100(cross bar)，在各层水平交叉横梁上密集布置有很多竖向的支撑钉101，缓存的玻璃基板可以水平地支撑于支撑钉上。各水平交叉横梁及其上的支撑钉均可以为铝材质，支撑钉的与玻璃基板接触的位置还可以套设由Peek(聚醚醚酮树脂)制成的保护套，避免支撑钉划伤玻璃基板。外框架的框架主体和各侧壁可以选用不锈钢制成。缓存装置的下方还会由支座(图中未示出)支撑，以使缓存装置处于一个便于操作人员取放玻璃基板的高度。
本实施例提供的缓存装置还包括第一送风装置2、第二送风装置3和排风管道4。其中第一送风装置2配置于外框架的后壁11上，第一送风装置2用于向开口10的方向吹风，也即，第一送风装置2大体自后壁11向开口10方向水平地送风。可以理解，第一送风装置2吹出的气流是已过滤过的清洁气流。优选地，该第一送风装置2可以为多个安装在外框架的后壁上、并排列成矩形阵列的设备用风机过滤器(以下简称EFU)，EFU吹出的气流大体沿水平方向贯穿外框架内部后从开口10排出。相对于相关技术中将EFU安装在顶壁并向下吹风的清洁方式来说(该种清洁方式在缓存装置非空载时，由于清洁风流动方向与玻璃基板正交，携带的灰尘颗粒一旦落到玻璃基板上后不易被吹走，因此需 关掉EFU)，本实施例提供的缓存装置即使内部放置有玻璃基板时，因该第一送风装置2的送风方向与玻璃基板的放置平面基本平行，可以不用关闭第一送风装置，从而实现对缓存装置全天24小时的基本清洁，而不用局限于仅在缓存装置空载时才能清洁，可以改善日常清洁效果。此外，第一送风装置2因向开口10方向吹风，从开口排出的气流也不会对生产线位于缓存装置两侧的上下游其他产品产生不利影响。
第二送风装置3配置于外框架的左侧壁12上，用于向外框架的内部吹清洁风。可以理解，该第二送风装置3吹出的气流也应是已过滤过的清洁气体。排风管道4配置于外框架的右侧壁13上，适于与抽风装置连通，用于抽出外框架内部的气体，主要用于抽走由第二送风装置3吹出的清洁气体。优选地，抽风装置可以为真空抽风装置。
第二送风装置3也可以采用EFU，用于从左向右水平送风。或者在可替换的实施例中，第二送风装置3包括适于和压缩干燥空气源连通的多个喷嘴，多个喷嘴在左侧壁上以矩形阵列的方式排布。压缩干燥空气源优选地提供0.5Mpa～0.6Mpa的压缩干燥空气，使得由第二送风装置3吹出的气流压力不小于由第一送风装置2吹出的气流压力，以提供更强的清洁能力。这样，通过使第二送风装置3吹出的气流方向与第一送风装置2吹出的气流方向不相平行，可以对第一送风装置2吹不到的位置进行补充清洁，实现缓存装置的深度清洁。第二送风装置3吹风时，通过抽风装置可以将左侧向来风排出，而不用在右侧壁13上设置通风孔使空气流通，这样还可以避免在右侧壁开设连通外界的通风孔排气的话对生产线上位于缓存装置右侧的产品产生的不利影响。可以理解的是，在其他实施例中，第二送风装置3和排风管道4的位置可以互换，也即，第二送风装置3可以配置于外框架的右 侧壁上，排风管道4可以配置于外框架的左侧壁上。
优选地，第二送风装置3的各喷嘴可以为360°旋转喷嘴，以提供更多的清洁角度和更大的清洁范围，进一步减少清洁死角。当各喷嘴为360°旋转喷嘴时，为避免较高压清洁气流斜向上或者斜向下吹出时冲击到缓存的玻璃基板，第二送风装置3和抽风装置可以在缓存装置处于正常工作状态下的空载期间开启。
优选地，为使第二送风装置3吹出的清洁空气能够更好地被抽风装置抽走，还可以在安装有排风管道4的右侧壁13的内侧设置一导流立板16，该导流立板16与右侧壁13平行地设置，导流立板16上设置有多个导流孔160，这样有利于第二送风装置3吹出的清洁空气较均匀地导入到排风管道4后被抽风装置抽走，这样也有利于缓存装置内部清洁气流的均匀化流动。当然，在其他实施例中，如果排风管道4安装于左侧壁12，则导流立板4靠近左侧壁12的内侧与左侧壁12平行地设置。
为进一步增强清洁效果，该缓存装置还包括配置于外框架的顶壁14上的第三送风装置5，第三送风装置5用于向外框架的内部吹清洁风。可以理解，该第三送风装置3吹出的气流也应是已过滤过的清洁空气。为使第三送风装置5吹出的清洁空气能够顺利排出，在外框架的底壁15上设置有多个通风孔150，该通风孔150可以具有较大的孔径，清洁空气自通风孔150向缓存装置的下方排出，不会对生产线上位于缓存装置左右两侧的产品产生影响。
该第三送风装置5也可以采用EFU，用于从上向下送风。或者在可替换的实施例中，第三送风装置5包括适于和压缩干燥空气源连通的多个喷嘴，多个喷嘴可以在顶壁14上以矩形阵列的方式排布。第三送风装置5可以与第二送风装置3共享压缩干 燥空气源；或者可以使由第三送风装置5吹出的气流压力不小于由第二送风装置3吹出的气流压力，例如第三送风装置5连通的压缩干燥空气的压力范围为0.7Mpa～0.8Mpa。这样，通过使第三送风装置5吹出的气流方向与第一送风装置2、第二送风装置3吹出的气流方向均不相同，可以实现对缓存内部更加彻底的清洁。
优选地，第三送风装置5的各喷嘴也可以为360°旋转喷嘴。另外，为实现清洁效果与资源节约之间的平衡，可以仅在PM时开启该第三送风装置5。
为了实现缓存装置的清洁操作的自动化控制，优选地，该缓存装置还包括检测装置和控制器。检测装置例如可以包括在缓存装置内部设置的接近开关，用于检测缓存装置内的存储状态。在缓存装置的正常工作状态下，第一送风装置2保持运行，当缓存装置的空载时间超过设定时长(例如30分钟)时，检测装置向控制器发出启动信号。控制器根据启动信号控制第二送风装置3和抽风装置启动，使第二送风装置3和抽风装置运行预定时长(例如30分钟)后关闭，实现第二送风装置3和抽风装置的自动启动和关闭。优选地，控制器可以使用PLC控制器。
另外，在第二送风装置3和抽风装置处于运行过程中，检测装置当检测到缓存装置内存储有缓存物品时，则向控制器发出停止信号，控制器根据停止信号控制第二送风装置3和抽风装置关闭，避免第二送风装置3吹出的强劲气流冲击玻璃基板。
优选地，缓存装置还包括输入单元，该输入单元也可以与控制器信号连接，控制器根据输入单元输入的信息控制第三送风装置5的启动和关闭。该输入单元可以为触摸屏。如果缓存装置的PM日固定，可以在触摸屏上选择自动模式，根据程序预先输入的数据，第三送风装置5就可以在设定好的PM日期自动启动并 运行一定时长后，自动关闭。如果PM日不固定，可以选择手动模式，手动在触摸屏上点击启动/停止按钮，实现第三送风装置的一键启动/停止功能，或者在手动模式下点击启动按钮后，使第三送风装置运行例如4个小时后自动关闭。
综上所述，本实施例提供的缓存装置可以提供两种清洁模式：一种是普通清洁模式，适用于正常生产日的普通清洁，此时，第一送风装置2保持连续运行，第二送风装置3、抽风装置根据缓存装置的存储状态运行；一种是PM清洁模式，适用于PM日的彻底清洁，此时，第一送风装置2、第二送风装置3、抽风装置、第三送风装置5全部启动预定的时长。
根据实验证明，该缓存装置正常生产日使用普通清洁模式时，去除灰尘颗粒的比例大约达到80％；PM日清洁时，去除灰尘颗粒的比例大约接近100％。而当前的缓存装置生产日去除灰尘颗粒的比例大约50％，PM日人工清洁去除灰尘颗粒的比例大约70％。因此，本实施例提供的缓存装置不但降低了内部空间的清洁难度，还提高了清洁效率以及清洁效果。
本发明的实施例还提供了一种液晶屏生产线，其配置有本发明的实施例提供的缓存装置，因此也应具备该缓存装置所达到的上述技术效果。
可以理解的是，本公开的以上各实施例仅仅是为了说明本公开的原理而采用的示例性实施例，本公开并不局限于此。对于本领域内的普通技术人员而言，在不脱离本公开的精神和实质的情况下，可以做出各种变型和改进，这些变型和改进也视为处于本公开的保护范围之内。本公开的保护范围仅由所附权利要求书的语言表述的含义及其等同含义所限定。

Claims (10)

  1. 一种缓存装置，包括:
    框架，所述框架的第一侧壁具有用于取放缓存物品的开口；
    支撑架，所述支撑架位于所述框架围绕的区域内，用以支撑缓存物品；
    第一送风装置，在与所述框架的第一侧壁相对的第二侧壁上；所述第一送风装置被配置为向所述开口的方向吹风；
    第二送风装置，在所述框架的与所述第一侧壁相邻的第三侧壁上；以及
    排风装置，所述排风装置在与所述框架的第三侧壁相对的第四侧壁上。
  2. 根据权利要求1所述的缓存装置，其中，还包括：第三送风装置，在所述框架的第五侧壁上；与所述第五侧壁相对的第六侧壁上设置至少一个通风孔。
  3. 根据权利要求2所述的缓存装置，其中，所述第二送风装置被配置为吹出的气流压力不小于由所述第一送风装置吹出的气流压力，并且/或者，所述第三送风装置被配置为吹出的气流压力不小于由所述第二送风装置吹出的气流压力。
  4. 根据权利要求2所述的缓存装置，其中，所述第四侧壁包括导流立板，所述导流立板上设置有至少一个导流孔。
  5. 根据权利要求2所述的缓存装置，其中，
    所述第一送风装置包括多个设备用风机过滤器，所述多个设备用风机过滤器按照矩形阵列的形式布置；并且/或者，
    所述第二送风装置和第三送风装置分别包括适于和压缩干燥空气源连通的多个喷嘴；并且/或者，
    所述抽风装置为真空抽风装置。
  6. 根据权利要求5所述的缓存装置，其中，所述喷嘴为 360°旋转喷嘴。
  7. 根据权利要求2至6中任一项所述的缓存装置，其中，还包括检测装置和控制器；所述检测装置用于检测所述缓存装置内的存储状态；在所述缓存装置处于正常工作状态时，所述第一送风装置保持运行，当缓存装置的空载时间超过设定时长时，所述检测装置向所述控制器发出启动信号；所述控制器根据所述启动信号控制所述第二送风装置和所述抽风装置启动，使所述第二送风装置和所述抽风装置运行预定时长。
  8. 根据权利要求7所述的缓存装置，其中，在所述第二送风装置和所述抽风装置运行期间，所述检测装置当检测到所述缓存装置内存储有缓存物品时，向所述控制器发出停止信号，所述控制器根据所述停止信号控制所述第二送风装置和所述抽风装置关闭。
  9. 根据权利要求7所述的缓存装置，其中，还包括：输入单元，与所述控制器信号连接；所述控制器根据所述输入单元输入的信息控制所述第三送风装置的启动和关闭。
  10. 一种液晶屏生产线，其中，配置有权利要求1至9中任一项所述的缓存装置。
PCT/CN2017/098817 2017-02-21 2017-08-24 缓存装置和液晶屏生产线 WO2018153041A1 (zh)

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