WO2018146841A1 - めっき液、及び、めっき製品の製造方法 - Google Patents

めっき液、及び、めっき製品の製造方法 Download PDF

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Publication number
WO2018146841A1
WO2018146841A1 PCT/JP2017/030445 JP2017030445W WO2018146841A1 WO 2018146841 A1 WO2018146841 A1 WO 2018146841A1 JP 2017030445 W JP2017030445 W JP 2017030445W WO 2018146841 A1 WO2018146841 A1 WO 2018146841A1
Authority
WO
WIPO (PCT)
Prior art keywords
plating
mol
plating solution
chromium
concentration
Prior art date
Application number
PCT/JP2017/030445
Other languages
English (en)
French (fr)
Japanese (ja)
Inventor
縄舟 秀美
西脇 宏
敏一 村田
秀浩 吉岡
美幸 亀川
Original Assignee
テクノロール株式会社
フソー株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by テクノロール株式会社, フソー株式会社 filed Critical テクノロール株式会社
Priority to KR1020177033982A priority Critical patent/KR20190115481A/ko
Priority to EP17800356.2A priority patent/EP3388558A1/en
Priority to US15/576,892 priority patent/US20200040477A1/en
Publication of WO2018146841A1 publication Critical patent/WO2018146841A1/ja

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    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/04Electroplating: Baths therefor from solutions of chromium
    • C25D3/06Electroplating: Baths therefor from solutions of chromium from solutions of trivalent chromium
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/04Electroplating: Baths therefor from solutions of chromium
    • C25D3/10Electroplating: Baths therefor from solutions of chromium characterised by the organic bath constituents used

Definitions

  • a base plating step of applying a base plating to the preprocessed product between the pretreatment step and the plating step, or a preprocessed product (hereinafter, An intermediate plating step of further applying intermediate plating to the “underplating product” may be performed.
  • trivalent chromium plating is performed as finish plating for a product subjected to intermediate plating (hereinafter also referred to as “intermediate plating product”).
  • the current density is 2 A / dm 2 or more and 20 A / dm 2 or less.
  • the current density is more preferably 2A / dm 2 or more 15A / dm 2 or less, and particularly preferably 2A / dm 2 or more 13A / dm 2 or less.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electroplating Methods And Accessories (AREA)
PCT/JP2017/030445 2017-02-08 2017-08-25 めっき液、及び、めっき製品の製造方法 WO2018146841A1 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
KR1020177033982A KR20190115481A (ko) 2017-02-08 2017-08-25 도금액, 및 도금 제품의 제조 방법
EP17800356.2A EP3388558A1 (en) 2017-02-08 2017-08-25 Metal plating solution and method for producing metal plated product
US15/576,892 US20200040477A1 (en) 2017-02-08 2017-08-25 Plating solution and method for producing plated product

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2017-021006 2017-02-08
JP2017021006A JP6547232B2 (ja) 2017-02-08 2017-02-08 めっき液ならびにめっき製品の製造方法

Publications (1)

Publication Number Publication Date
WO2018146841A1 true WO2018146841A1 (ja) 2018-08-16

Family

ID=63107327

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2017/030445 WO2018146841A1 (ja) 2017-02-08 2017-08-25 めっき液、及び、めっき製品の製造方法

Country Status (6)

Country Link
US (1) US20200040477A1 (enrdf_load_stackoverflow)
EP (1) EP3388558A1 (enrdf_load_stackoverflow)
JP (1) JP6547232B2 (enrdf_load_stackoverflow)
KR (1) KR20190115481A (enrdf_load_stackoverflow)
TW (1) TW201835387A (enrdf_load_stackoverflow)
WO (1) WO2018146841A1 (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111699284B (zh) * 2018-02-09 2022-12-30 日本制铁株式会社 容器用钢板以及容器用钢板的制造方法
JP6624400B1 (ja) * 2018-07-04 2019-12-25 株式会社大都技研 遊技台
CN117488300B (zh) 2024-01-02 2024-03-29 仪征亚新科双环活塞环有限公司 一种具有硬质镀层的活塞环及其制备方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000249340A (ja) 1999-02-25 2000-09-12 Ngk Spark Plug Co Ltd グロープラグ及びその製造方法
JP2011099126A (ja) * 2008-01-24 2011-05-19 Okuno Chemical Industries Co Ltd 3価クロムめっき浴
JP2016113662A (ja) * 2014-12-15 2016-06-23 株式会社Jcu 3価クロムめっき液および3価クロムめっき方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000249340A (ja) 1999-02-25 2000-09-12 Ngk Spark Plug Co Ltd グロープラグ及びその製造方法
JP2011099126A (ja) * 2008-01-24 2011-05-19 Okuno Chemical Industries Co Ltd 3価クロムめっき浴
JP2016113662A (ja) * 2014-12-15 2016-06-23 株式会社Jcu 3価クロムめっき液および3価クロムめっき方法

Also Published As

Publication number Publication date
KR20190115481A (ko) 2019-10-14
TW201835387A (zh) 2018-10-01
JP2018127667A (ja) 2018-08-16
EP3388558A1 (en) 2018-10-17
JP6547232B2 (ja) 2019-07-24
US20200040477A1 (en) 2020-02-06

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