WO2018137676A1 - 快门装置及其控制方法、光刻机及其曝光剂量控制方法 - Google Patents

快门装置及其控制方法、光刻机及其曝光剂量控制方法 Download PDF

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Publication number
WO2018137676A1
WO2018137676A1 PCT/CN2018/074089 CN2018074089W WO2018137676A1 WO 2018137676 A1 WO2018137676 A1 WO 2018137676A1 CN 2018074089 W CN2018074089 W CN 2018074089W WO 2018137676 A1 WO2018137676 A1 WO 2018137676A1
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WIPO (PCT)
Prior art keywords
shutter
shutter device
coil structure
blade
shutter blade
Prior art date
Application number
PCT/CN2018/074089
Other languages
English (en)
French (fr)
Inventor
蒋志勇
章富平
王彦飞
Original Assignee
上海微电子装备（集团）股份有限公司
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Application filed by 上海微电子装备（集团）股份有限公司 filed Critical 上海微电子装备（集团）股份有限公司
Priority to SG11201906706UA priority Critical patent/SG11201906706UA/en
Priority to JP2019539864A priority patent/JP6909858B2/ja
Priority to KR1020197024058A priority patent/KR102259532B1/ko
Priority to EP18744361.9A priority patent/EP3575861B1/en
Priority to US16/480,639 priority patent/US10983415B2/en
Publication of WO2018137676A1 publication Critical patent/WO2018137676A1/zh

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/005—Diaphragms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B9/00—Exposure-making shutters; Diaphragms
    • G03B9/08—Shutters
    • G03B9/10—Blade or disc rotating or pivoting about axis normal to its plane
    • G03B9/18—More than two members
    • G03B9/22—More than two members each moving in one direction to open and then in opposite direction to close, e.g. iris type
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/02—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the intensity of light
    • G02B26/023—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the intensity of light comprising movable attenuating elements, e.g. neutral density filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B9/00—Exposure-making shutters; Diaphragms
    • G03B9/08—Shutters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B9/00—Exposure-making shutters; Diaphragms
    • G03B9/08—Shutters
    • G03B9/10—Blade or disc rotating or pivoting about axis normal to its plane
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B9/00—Exposure-making shutters; Diaphragms
    • G03B9/08—Shutters
    • G03B9/10—Blade or disc rotating or pivoting about axis normal to its plane
    • G03B9/14—Two separate members moving in opposite directions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B9/00—Exposure-making shutters; Diaphragms
    • G03B9/58—Means for varying duration of "open" period of shutter
    • G03B9/60—Means for varying duration of "open" period of shutter by varying speed of movement of obturating members
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B9/00—Exposure-making shutters; Diaphragms
    • G03B9/58—Means for varying duration of "open" period of shutter
    • G03B9/62—Means for varying duration of "open" period of shutter by varying interval of time between end of opening movement and beginning of closing movement
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70975—Assembly, maintenance, transport or storage of apparatus
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K33/00—Motors with reciprocating, oscillating or vibrating magnet, armature or coil system
    • H02K33/12—Motors with reciprocating, oscillating or vibrating magnet, armature or coil system with armatures moving in alternate directions by alternate energisation of two coil systems

Definitions

  • the present invention relates to the field of lithography machines, and in particular, to a shutter device and a control method thereof, a lithography machine, and an exposure dose control method thereof.
  • Photolithography is used to print patterned features on the surface of a substrate.
  • substrates include semiconductor wafers or glass substrates having a surface coated with a light sensitive medium.
  • the wafer is placed on a wafer stage and the pattern is projected onto the wafer surface by an exposure device located within the lithographic apparatus.
  • the exposure system of the existing low-end lithography machine uses a high-pressure mercury lamp as a light source, and the start and end of exposure are controlled by a mechanical shutter in the optical path, and the exposure dose size is determined by the exposure time.
  • the specific process is as follows: firstly, the output power of the high-pressure mercury lamp is stabilized by preheating and environmental control; then, the exposure time is calculated, the shutter is opened to start exposure, and the synchronous timing starts; finally, the time is up, the shutter is closed, and the exposure ends.
  • the shutter mechanical form applied to exposure is mainly classified into a rotary shutter and a linear shutter according to the form of shutter blade motion.
  • Shutter motion control methods mainly include open loop control and closed loop control.
  • a shutter with a two-blade rotary direct drive mode is disclosed.
  • the moving body is a permanent magnet, and the direction of the magnetic field is changed by changing the current direction of the coil group to absorb the linear motion of the permanent magnet, but the speed is not clearly reflected.
  • An electromagnetic linear motion driving structure is also disclosed in the prior art, but the application condition of the structure is in the field of cameras, the aperture diameter is less than 10 mm, and the light intensity of the camera working condition is low, which is not suitable for photolithography. machine.
  • the prior art also proposes a single-blade rotary shutter using a rotating electric machine as a driving, and adopts closed-loop control for exposure opening and closing position control, and the shutter minimum opening and closing time (the minimum time required from the start of the shutter to the complete closing)
  • the minimum exposure dose achievable with the rotary shutter is 300mj between 150ms and 170ms under the condition that the radiation intensity of the light source is 2000mW/cm 2 .
  • the main problems facing this shutter are as follows:
  • the invention provides a shutter device and a control method thereof, a lithography machine and an exposure dose control method thereof, so as to reduce shutter opening and closing time, improve low-dose exposure yield and improve light source utilization rate.
  • the present invention provides a shutter device including: a light blocking unit and a voice coil motor, wherein the voice coil motor includes a permanent magnet module, a driving rail module, and a coil structure, and the coil structure is disposed in the a drive rail module, the permanent magnet module generates a magnetic field inside the drive rail module, the light blocking unit includes two shutter blades, and the shutter blade is connected to the coil structure, and the coil structure is energized to generate The magnetic field of the driving rail module with the opposite direction or the same magnetic field causes the coil structure to move forward or backward along the driving rail module to drive the two shutter blades to open or close.
  • the voice coil motor includes a permanent magnet module, a driving rail module, and a coil structure, and the coil structure is disposed in the a drive rail module, the permanent magnet module generates a magnetic field inside the drive rail module, the light blocking unit includes two shutter blades, and the shutter blade is connected to the coil structure, and the coil structure is energized to generate The magnetic field of the driving rail module with the opposite direction or the
  • the permanent magnet module comprises two sets of permanent magnets arranged symmetrically, each set of permanent magnets comprises two permanent magnets, and the driving rail module is disposed between the two permanent magnets, the coil structure comprises Two coils, one coil connected to one shutter blade and corresponding to a set of permanent magnets.
  • the drive rail module uses a core.
  • the drive rail module is curved or semi-circular.
  • the two shutter blades are scissor-type hinged and there is overlap between the two shutter blades in the closed state.
  • the shutter blade is made of an aluminum blade.
  • the shutter blade surface is treated by a black anodizing process.
  • the shutter device further includes a cover that is disposed outside the voice coil motor and the light blocking unit, and the light shielding hole is opened at a position corresponding to the light blocking unit on the cover.
  • the casing is provided with a cooling air inlet for introducing compressed air to cool the voice coil motor and the light blocking unit.
  • the diameter of the shutter blade is larger than the diameter of the light-passing aperture.
  • a bearing shaft assembly is further disposed between the shutter blade and the coil structure.
  • the bearing shaft assembly includes: a bearing housing, a rotating shaft mounted on the bearing housing, a bearing disposed on the rotating shaft, and a sleeve engaged with the bearing, the shutter blade being sleeved on the The shaft is connected to the coil structure.
  • the bearing employs a double deep groove ball bearing.
  • the shutter device further includes a position detector mounted on the bearing housing, and a position detecting piece mounted on the sleeve and having a fixed position relative to the shutter blade position.
  • the center of gravity of the shutter blade is close to the center of the rotating shaft and is biased toward the arcuate edge side of the shutter blade.
  • the permanent magnet module and the drive rail module are mounted and fixed on the bearing housing.
  • the present invention also provides a control method of the shutter device as described above, comprising: determining an output force of the voice coil motor according to a required spot size; determining a current output by the control board to the coil structure according to an output force of the voice coil motor, wherein The control board outputs a positive direction current to the coil structure to control the shutter blade acceleration, and the control board outputs a reverse current to the coil structure to control the shutter blade to decelerate, by opening the acceleration, opening the deceleration, turning off the acceleration, and turning off the deceleration.
  • the rate control phase realizes opening and closing of the shutter blade while setting the energization time when the shutter blade is in the opening acceleration, the opening deceleration, the closing acceleration, and the deceleration state.
  • the method further comprises outputting, by said control board, to the coil structure a current that is substantially less than a forward current that controls acceleration of the shutter blade and a reverse current that controls deceleration of the shutter blade to bring the shutter blade to a standstill.
  • determining the output force of the voice coil motor according to the required spot size comprises: determining a rotation stroke of the single shutter blade according to the required spot size, and calculating a thrust required for the shutter blade during the opening and closing process according to the rotation stroke, thereby determining The output force of the voice coil motor.
  • the method further comprises: optimizing a current peak output by the control board to the coil structure, and performing an S-type speed curve control on the shutter blade.
  • the present invention also provides a lithography machine including the above shutter device.
  • the present invention also provides an exposure dose control method applied to the lithography machine, comprising: receiving an exposure dose command, determining an output force of the voice coil motor according to the exposure dose, according to an output of the voice coil motor The force determines a current and a power-on time that the control board outputs to the coil structure, wherein the control board outputs a forward current to the coil structure to cause the shutter device to perform an opening acceleration operation, and the control board is stuck to the coil structure after the acceleration is completed.
  • Outputting a reverse current causes the shutter device to perform an open deceleration operation; after the deceleration current ends, the coil structure controls the card output holding current to enter a waiting phase; and waits for the shutdown command to be issued according to the energy time integration determination condition, and after the shutdown command is issued
  • the control board outputs a forward current to the coil structure to cause the shutter device to perform a closing acceleration operation, and after the acceleration ends, the control board outputs a reverse current to the coil structure to cause the shutter device to perform a deceleration operation, thereby completing Single exposure dose control process.
  • the present invention Compared with the prior art, the present invention has the following advantages: the present invention can reduce the shutter blade travel by using two sets of shutter blades, and on the other hand, a voice coil motor capable of providing a large torque, which cooperates with the present invention.
  • the lithography machine exposure shutter device can achieve the following technical indicators: single blade opening and closing angle of 20°, light passing diameter of 40mm, minimum opening and closing time of 28.4ms, greatly improving the opening and closing time of the shutter blade, and a single shutter blade
  • the average driving power is 15.3W; the illumination condition is 2500mW/cm 2 , the minimum exposure dose when the optical power at the shutter blade is 170W is 80mj, and the low-dose exposure yield is increased by at least 3 times, without using the illumination attenuation mechanism, the unit is improved.
  • Light source utilization during the time is 15.3W; the illumination condition is 2500mW/cm 2 , the minimum exposure dose when the optical power at the shutter blade is 170W is 80mj, and the low
  • FIG. 1 is a schematic structural view of a shutter device according to Embodiment 1 of the present invention.
  • FIG. 2 is a schematic structural view of a voice coil motor according to Embodiment 1 of the present invention.
  • FIG. 3 is a schematic structural view of a bearing shaft assembly according to Embodiment 1 of the present invention.
  • FIG. 4 is a schematic view showing a position of a center of a shutter blade in Embodiment 1 of the present invention.
  • Figure 5 is a view showing a positional relationship between a shutter blade and a cover in Embodiment 1 of the present invention
  • FIG. 6 is a schematic diagram of shutter shutter rate control according to Embodiment 1 of the present invention.
  • FIG. 7 is a schematic diagram of an open loop current control principle of a shutter device according to Embodiment 1 of the present invention.
  • Embodiment 8 is a schematic diagram of energy detection of a photolithography machine during exposure process according to Embodiment 1 of the present invention.
  • FIG. 9 is a schematic diagram of optimized speed control of a shutter blade according to Embodiment 2 of the present invention.
  • 100-voice coil motor 110-permanent magnet module, 111-permanent magnet, 120-drive rail module, 130-coil, 200-shutter blade, 300-bearing shaft assembly, 310-bearing, 320- Shaft, 330-bearing, 340-sleeve, 400-position detector, 350-position detector, 500-shell, 510-through aperture.
  • the lithography apparatus of the present invention exposes a shutter device, comprising: a casing 500, a light blocking unit disposed in the casing 500, a bearing shaft assembly 300, a voice coil motor 100, and a position detecting module.
  • the overall dimensions of the casing 500, i.e., the lithographic exposure shutter device are, for example, 160 mm x 50 mm x 200 mm.
  • the light blocking unit includes two shutter blades 200, and the voice coil motor 100 controls the shutter blade 200 to move by the bearing shaft assembly 300 to rotate the shutter blade 200 around the rotating shaft 320.
  • the voice coil motor 100 includes: a permanent magnet module 110, a driving rail module 120, and a coil structure, wherein the permanent magnet module 110 includes two sets of permanent magnet groups 1101 and 1102 arranged symmetrically. Each group of permanent magnets includes two permanent magnets 111.
  • the driving rail module 120 adopts an iron core that penetrates two sets of permanent magnet groups 1101 and 1102 and is disposed between two permanent magnets 111.
  • the coil structure includes two coils 130, and the two coils 130 are disposed. On the core and connected to the corresponding shutter blade 200.
  • one set of permanent magnets corresponds to one coil 130
  • one coil 130 is connected to one shutter blade 200
  • two sets of permanent magnets 1101 and 1102 composed of four permanent magnets 111 generate a magnetic field in the direction of the iron core inside the iron core, and the coil After the energization of 130, the direction of the magnetic field of the coil 130 is opposite or the same as the direction of the magnetic field inside the core.
  • the coil 130 can be controlled to perform acceleration and deceleration on the core.
  • the voice coil motor 100 further includes a mounting seat 140 for fixing the permanent magnet groups 1101, 1102 and the drive rail module 120.
  • the driving rail module 120 is curved or semi-circular.
  • the mounting seat 140 and the permanent magnet module 110 are also correspondingly arranged in an arc shape or a semi-circular shape to facilitate driving the The two sets of shutter blades 200 operate. Therefore, FIG. 2 of the present embodiment is only used as an auxiliary explanation for the structure of the voice coil motor 100, and the specific shape of the voice coil motor 100 should not be constrained.
  • the bearing shaft assembly 300 includes a bearing housing 310, a rotating shaft 320 mounted on the bearing housing 310, a bearing 330 disposed on the rotating shaft 320, and a transition with the bearing 330.
  • the mating sleeve 340, the two shutter blades 200 are sleeved on the rotating shaft 320 and connected to the corresponding coils 130.
  • the shutter blades 200 sleeved on the rotating shaft 320 are sequentially mounted on the bearing housing 310 through the bearing 330 and the sleeve 340.
  • a transition fit between the shaft 320 and the bearing 330, between the bearing 330 and the sleeve 340, can greatly reduce the amount of axial swing of the shutter blade 200.
  • the permanent magnet module 110 and the drive rail module 120 are mounted and fixed on the bearing housing 310, as shown in FIG.
  • the bearing 330 adopts a double deep groove ball bearing, which can effectively reduce the sway during the high speed movement of the bearing housing 310 and the rotating shaft 320 compared with the single bearing structure.
  • a light-passing hole 510 is defined in the cover 500 at a position corresponding to the light-blocking unit, that is, the shutter blade 200, and the cover 500 is provided with a cooling gas inlet through which the cooling gas is passed.
  • the inlet is supplied with a small amount of compressed air to heat-dissipate the coil 130 and the shutter blade 200, thereby avoiding the risk of current instability inside the coil 130 due to thermal influence, and improving the long-term reliability of the shutter blade 200.
  • the present invention adopts an aluminum blade having a heat dissipation coefficient superior to that of the heat resistant stainless steel and having a smaller moment of inertia, and the aluminum blade is assisted with the above-described small flow compressed air to realize the shutter blade 200. Cooling heat.
  • the two shutter blades 200 of the present invention are connected by a scissor-type hinge, and further, in an unexposed state, in order to effectively reduce the scattered light caused by the gap between the two shutter blades 200 and The reflected light enters the illumination system and there is overlap between the two shutter blades 200.
  • the gap of the shutter blade 200 the distance in the direction perpendicular to the paper in FIG. 1 is 2 mm
  • the design overlap width is 8 mm, which increases stray light between the two shutter blades 200.
  • the shutter blade 200 needs to be processed by a hard black anodizing process, so that the surface reflectance of the shutter blade 200 is less than 6%, which can effectively absorb stray light; and simultaneously control the shutter blade 200 and the cover 500
  • the spacing between the ⁇ 2 mm is such that the diameter of the shutter blade 200 is ⁇ 4 mm larger than the aperture of the light-passing aperture 510, thereby reducing the effect of scattered light at the edge of the light-passing aperture 510 of the casing 500.
  • the radius of the light passing hole 510 is r
  • the radius after the overlapping of the two shutter blades is R, and R-r ⁇ 4 mm is required.
  • the center of gravity C of the shutter blade 200 is located below the rotating shaft 320 of the shutter blade 200, and is biased toward the arc side of the shutter blade 200 such that the gravity distance of the shutter blade 200 is greater than that of the bearing 330.
  • the frictional resistance distance allows the shutter blade 200 to be in a closed light blocking state in an abnormally powered off state, thereby preventing the ultraviolet light from affecting the workpiece table or the silicon wafer for a long time.
  • the position detecting module comprises a position detector 400 and a position detecting piece 350.
  • the position detecting device 400 has two positions respectively mounted on the bearing housing 310 on both sides of the rotating shaft 320, and two position detecting pieces 350 are arranged.
  • Each of the two shutter blades 200 is mounted on a sleeve 340 to which the shutter blades 200 are coupled.
  • the two position detecting sheets 350 are rotated in accordance with the rotation of the shutter blades 200, and the position detector 400 is in one-to-one correspondence with the position of the position detecting sheet 350. It is used to recognize the opening and closing of the shutter blade 200.
  • both position detecting pieces 350 are mounted on the sleeve 340 of the left shutter blade 200 shown in the figure, and when the two shutter blades 200 are in the closed state, the position detector on the right side 400 can detect the position of the position detecting piece 350 on the right side, and feedback the signal state '1' by the position detector 400 on the right side.
  • the position detector 400 on the left side cannot detect the position of the position detecting piece 350 on the left side, and thus the position on the left side.
  • the detector 400 feeds back the signal state '0', and the two position detectors 400 combine the feedback signal to '10', indicating that the two shutter blades 200 are in a closed state.
  • the left shutter blade 200 rotates clockwise
  • the right shutter blade 200 rotates counterclockwise
  • the two position detecting sheets 350 also rotate clockwise accordingly, so that the right position is detected.
  • the sheet 350 is separated from the position detector on the right such that the position detector 400 on the right side cannot detect the position detector 350 on the right side, the position detector 400 on the right side feeds back the signal state '0', and the position detector 400 on the left side can detect the left side.
  • the position detecting piece 350, the left position detector 400 feeds back the signal state '1', and the two position detectors 400 feedback signal is '01', indicating that the two shutter blades 200 are in an open state.
  • the state '0' may be used to indicate that the position detecting sheet 350 is detected, and the state '1' is used to indicate that the position detecting sheet 350 is not detected.
  • the present invention can be implemented by other position setting methods and opening and closing state detecting modes, and the shutter blade opening and closing state is reflected by the detecting state between the position detector 400 and the position detecting piece 350. The embodiments are all within the scope of protection of the present application.
  • the present embodiment can reduce the stroke of the shutter blade 200 by using two shutter blades 200; on the other hand, a voice coil motor 100 capable of providing a large torque, which cooperates with the lithography machine of the present invention
  • the exposure shutter device can realize the following technical indicators: the opening and closing angle of the single shutter blade 200 is up to 20°, the light passing diameter is 40 mm, and the minimum opening and closing time of the single shutter blade 200 is 15.4 W, and the minimum opening and closing time is 28.4 ms.
  • the stroke mode greatly reduces the opening and closing time; when the radiation intensity of the light source is 2500 mW/cm 2 , the minimum exposure dose at the shutter blade 200 at an optical power of 170 W is 80 mj, which is small compared with the prior art.
  • the dose exposure yield is increased by at least 3 times, eliminating the need for an illumination attenuation mechanism, which improves the utilization of the light source per unit time.
  • FIG. 6 it is a schematic diagram of the opening and closing movement of the shutter device of the lithography machine of the present invention, that is, a schematic diagram of the rate control of the shutter blade, and the motion forms mainly include opening the acceleration process, opening the deceleration process, turning off the acceleration process, and turning off the deceleration. process.
  • the present invention further provides a method for controlling an exposure shutter device of a lithography machine.
  • the present invention provides an open-loop current control of a shutter device, which specifically includes:
  • the rotation stroke of the single shutter blade 200 is determined according to the spot size required at the time of exposure, and the thrust required for the shutter blade 200 during the opening and closing process is calculated based on the rotation stroke, thereby determining the output force of the voice coil motor 100. Specifically implemented by the following formula:
  • L is the rotation stroke of the single shutter blade 200, and the minimum opening and closing required time t is 30 ms (ie, the minimum time t from the start of opening to the complete closing is not more than 30 ms), and the moment of inertia J of the single shutter blade 200 is 0.000042 Kg ⁇ m 2 ;
  • M is the magnitude of the rotational moment, ⁇ is the angular velocity of the shutter blade 200, and
  • l is the length of the arm of the coil 130.
  • the magnitude of the thrust F required for the single shutter blade 200 during the opening and closing of the shutter device, that is, the output force F of the voice coil motor 100 is calculated by the following formula:
  • the output force F of the voice coil motor 100 is determined to be 14N.
  • the direction and magnitude of the current required to be supplied in the coil 130 are determined according to the output force of the voice coil motor 100, and a corresponding current can be output to the coil 130 through a control board (not shown), wherein the shutter blade state is stationary, and the control is performed.
  • the shutter blade 200 When the card outputs the positive direction current I1, the shutter blade 200 is opened, and when the control card outputs the reverse current I2, the shutter blade 200 is closed; when the shutter blade 200 is turned on or off, the control card outputs the forward direction current I1, the shutter When the blade 200 is in an opening acceleration or a closing acceleration process, and the control board outputs a reverse current I2, the shutter blade 200 is in an open deceleration or a deceleration process, and the shutter blade 200 is set to open acceleration, open deceleration, close acceleration, and deceleration state.
  • the energization time of the time t1, t2, t3 and t4 controls the opening process and the closing process of the shutter device, of course, t1 + t2 + t3 + t4 ⁇ 30 ms, as shown in FIG.
  • the output current of the control board is much smaller than the positive and negative currents, so that the shutter blade 200 is at a standstill.
  • the electrical parameters of the shutter device obtained in the above manner mainly include: the resistance of the single coil 130 is ⁇ 6 ⁇ , the current in the coil 130 is ⁇ 5 A, and the power is ⁇ 22 W.
  • the shutter dose exposure control process includes: receiving an exposure dose command, and controlling the card to output positive and negative currents so that the shutter exposure shutter of the lithography machine sequentially turns on and accelerates, and the deceleration action is turned on; after the deceleration current ends, the control board outputs the holding current to wait.
  • the holding current refers to a current that is much smaller than the positive and negative currents, so that the shutter blade 200 is in a stationary state (shown as being kept in an open state); the waiting time is determined according to the energy time integration determination condition, and the closing command is issued.
  • the control board outputs positive and negative currents to cause the shutter blade 200 to perform acceleration and deceleration.
  • the opening and closing speed of the shutter blade 200 can be improved by optimizing the peak value of the output current of the control board, and the irradiation intensity of the light source is 3000 mW/cm 2 .
  • the minimum opening and closing time is up to 20ms. It can be found by comparing FIG. 9 and FIG. 6 that the difference between this embodiment and Embodiment 1 is that the present embodiment optimizes the control board on the basis of Embodiment 1, and the light blocking unit, that is, the shutter blade 200, The S-type speed curve control is performed, so that the vibration frequency and amplitude of the shutter blade 200 in the open position and the closed position can be reduced, thereby further ensuring the accuracy and repeatability of the exposure dose.

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Abstract

一种快门装置及其控制方法、光刻机及其曝光剂量控制方法。快门装置包括：挡光单元和音圈电机（100），其中，音圈电机（100）包括永磁模块（110）、驱动导轨模块（120）和线圈结构（130）。线圈结构（130）设置在驱动导轨模块（120）上，永磁模块（110）在驱动导轨模块（120）内部产生磁场。挡光单元包括两个快门叶片（200），快门叶片（200）与线圈结构（130）连接。线圈结构（130）通电后产生与驱动导轨模块（120）磁场方向相反或相同的磁场，使线圈结构（130）沿驱动导轨模块（120）正向或反向运动，带动两个快门叶片（200）打开或关闭。通过使音圈电机（100）的线圈结构（130）直接与挡光单元连接，大大减小了快门叶片（200）的开闭时间，进而提高了小剂量曝光产率，提高了单位时间内的光源利用率。

Description

快门装置及其控制方法、光刻机及其曝光剂量控制方法 技术领域
本发明涉及光刻机领域，特别涉及一种快门装置及其控制方法、光刻机及其曝光剂量控制方法。
背景技术
光刻技术是用于在衬底表面上印刷具有特征的构图。经常使用的衬底包括表面涂有光敏感介质的半导体晶片或玻璃基片。在光刻过程中，晶片放在晶片台上，通过处在光刻设备内的曝光装置，将特征构图投射到晶片表面。
光刻机的一个重要指标是曝光剂量，对于曝光剂量的精确控制直接影响着一台光刻机的刻蚀精度。
现有中低端光刻机的曝光系统采用高压汞灯作为光源，曝光开始、结束由光路中的机械快门控制，曝光剂量大小由曝光时间确定。具体过程如下：首先通过预热和环境控制使高压汞灯输出光功率达到稳定；接着，计算曝光时间，打开快门开始曝光，同步计时开始；最后，时间到，关闭快门，曝光结束。
应用于曝光的快门机械形式根据快门叶片运动形式主要分为旋转式快门及直线式快门。快门运动控制方式主要包含开环式控制及闭环式控制。
现有技术中揭示了双叶片旋转式直驱方式的快门，运动主体为永磁铁，采用改变线圈组内部电流方向产生磁场方向变化，吸附永磁铁直线运动，但对速度未有明确体现。现有技术中还公开了一种电磁直线运动驱动结构，但该结构的应用工况为相机领域，通光孔径直径小于10mm，且相机工况的光强能量较低，并不适用于光刻机。
现有技术中还提出一种采用旋转电机作为驱动的单叶片的旋转式快门， 并采用闭环控制进行曝光开闭位置控制，快门最小开闭时间(从快门开始打开到完全关闭所需的最小时间)在150ms～170ms之间，在光源辐照强度为2000mW/cm 2的工况下，采用该旋转式快门可实现的最小曝光剂量为300mj。但是，此快门面临的主要问题如下：
(1)对于小于300mj的工艺剂量需要通过照度衰减结构的能量衰减方式实现小剂量曝光；
(2)由于开闭时间的限制，小剂量曝光产率存在比较明显劣势；
(3)由于照度衰减机构的存在以及快门开闭速度的限制，导致单位时间内光源利用率降低。
发明内容
本发明提供一种快门装置及其控制方法、光刻机及其曝光剂量控制方法，以减小快门开闭时间，提高小剂量曝光产率并提高光源利用率。
为解决上述技术问题，本发明提供一种快门装置，包括：挡光单元和音圈电机，其中，所述音圈电机包括永磁模块、驱动导轨模块和线圈结构，所述线圈结构设置在所述驱动导轨模块上，所述永磁模块在所述驱动导轨模块内部产生磁场，所述挡光单元包括两个快门叶片，所述快门叶片与所述线圈结构连接，所述线圈结构通电后产生与所述驱动导轨模块磁场方向相反或相同的磁场，使所述线圈结构沿所述驱动导轨模块正向或反向运动，带动两个快门叶片打开或关闭。
作为优选，所述永磁模块包括对称布置的两组永磁铁组，每组永磁铁组包括两块永磁铁，所述驱动导轨模块设于所述两块永磁铁之间，所述线圈结构包括两个线圈，一个线圈连接一个快门叶片且对应一组永磁铁组。
作为优选，所述驱动导轨模块采用铁芯。
作为优选，所述驱动导轨模块为弧形或者半圆形。
作为优选，所述两个快门叶片剪刀式铰接，且两个快门叶片之间在关闭状态下存在重叠。
作为优选，所述快门叶片采用铝制叶片。
作为优选，所述快门叶片表面经过黑色阳极氧化工艺处理。
作为优选，所述快门装置还包括罩设在音圈电机和挡光单元外部的罩壳，所述罩壳上与挡光单元对应位置处开设有通光孔。
作为优选，所述罩壳上设有冷却气入口，用于通入压缩空气对所述音圈电机和挡光单元进行冷却。
作为优选，所述快门叶片的直径大于所述通光孔的直径。
作为优选，所述快门叶片与所述线圈结构之间还设置有轴承转轴组件。
作为优选，所述轴承转轴组件包括：轴承座、安装在所述轴承座上的转轴、设在所述转轴上的轴承以及与所述轴承配合的轴套，所述快门叶片套设在所述转轴上并与线圈结构连接。
作为优选，所述转轴与所述轴承之间、所述轴承与所述轴套之间过渡配合。
作为优选，所述轴承采用双深沟球轴承。
作为优选，所述快门装置还包括位置探测器和位置探测片，所述位置探测器安装在所述轴承座上，所述位置探测片安装在所述轴套上且相对于快门叶片具有固定的位置。
作为优选，所述快门叶片的重心靠近所述转轴的中心，且偏向于快门叶片的圆弧形边缘一侧。
作为优选，所述永磁模块和驱动导轨模块安装固定在轴承座上。
本发明还提供如上所述的快门装置的控制方法，包括：根据所需的光斑 大小确定音圈电机的输出力；根据音圈电机的输出力确定由控制板卡向线圈结构输出的电流，其中，所述控制板卡向线圈结构输出正方向电流可控制快门叶片加速，所述控制板卡向线圈结构输出反方向电流可控制快门叶片减速，通过打开加速、打开减速、关闭加速和关闭减速四个速率控制阶段实现所述快门叶片的开闭，同时设定快门叶片处于打开加速、打开减速、关闭加速和关闭减速状态时的通电时间。
作为优选，所述方法还包括由所述控制板卡向线圈结构输出远小于控制快门叶片加速的正向电流及控制快门叶片减速的反向电流的电流，使快门叶片处于静止状态。
作为优选，根据所需的光斑大小确定音圈电机的输出力包括：根据所需的光斑大小确定单个快门叶片的旋转行程，根据该旋转行程计算开闭过程中快门叶片所需的推力，进而确定音圈电机的输出力。
作为优选，所述方法还包括：优化所述控制板卡向线圈结构输出的电流峰值，对所述快门叶片进行S型速度曲线控制。
本发明还提供一种包括上述快门装置的光刻机。
本发明还提供一种应用于所述的光刻机的曝光剂量控制方法，包括：接收曝光剂量指令，根据所述曝光剂量确定所述音圈电机的输出力，根据所述音圈电机的输出力确定控制板卡向线圈结构输出的电流和通电时间，其中，所述控制板卡向线圈结构输出正向电流使所述快门装置进行打开加速动作，加速结束后所述控制板卡向线圈结构输出反向电流使所述快门装置进行打开减速动作；减速电流结束后，所述线圈结构控制板卡输出保持电流进入等待阶段；根据能量时间积分判定条件等待关闭命令下发，关闭命令下发后，所述控制板卡向线圈结构输出正向电流使所述快门装置进行关闭加速动作，加速结束后所述控制板卡向线圈结构输出反向电流使得所述快门装置进行关闭 减速动作，从而完成单次曝光剂量控制过程。
与现有技术相比，本发明具有以下优点：本发明通过采用两组快门叶片配合，可以减小快门叶片行程；另一方面采用可以提供大扭矩的音圈电机，两者配合，使得本发明的光刻机曝光快门装置可以实现以下技术指标：单叶片开闭角度达20°，通光直径为40mm，最小开闭时间为28.4ms，大大提高了快门叶片的开闭时间，而且单个快门叶片的驱动平均功率15.3W；照度工况2500mW/cm 2，快门叶片处光功率为170W时的最小曝光剂量为80mj，小剂量曝光产率至少提升了3倍，无需使用照度衰减机构，提高了单位时间内的光源利用率。
附图说明
图1为本发明实施例1中快门装置的结构示意图；
图2为本发明实施例1中音圈电机的结构示意图；
图3为本发明实施例1中轴承转轴组件的结构示意图；
图4为本发明实施例1中快门叶片质心位置示意图；
图5为本发明实施例1中快门叶片与罩壳之间的位置关系图；
图6为本发明实施例1中快门叶片速率控制示意图；
图7为本发明实施例1中快门装置的开环电流控制原理示意图；
图8为本发明实施例1中光刻机曝光过程能量探测示意图；
图9为本发明实施例2中快门叶片优化速率控制示意图。
图中所示：100-音圈电机、110-永磁模块、111-永磁铁、120-驱动导轨模块、130-线圈、200-快门叶片、300-轴承转轴组件、310-轴承座、320-转轴、330-轴承、340-轴套、400-位置探测器、350-位置探测片、500-罩壳、510-通光孔径。
具体实施方式
为使本发明的上述目的、特征和优点能够更加明显易懂，下面结合附图对本发明的具体实施方式做详细的说明。需说明的是，本发明附图均采用简化的形式且均使用非精准的比例，仅用以方便、明晰地辅助说明本发明实施例的目的。
实施例1
如图1-5所示，本发明的光刻机曝光快门装置，包括：罩壳500、设置在所述罩壳500内的挡光单元、轴承转轴组件300、音圈电机100以及位置探测模块。罩壳500也即是光刻机曝光快门装置的总体外形尺寸例如为160mm×50mm×200mm。其中，所述挡光单元包括两个快门叶片200，所述音圈电机100通过所述轴承转轴组件300控制所述快门叶片200动作，使所述快门叶片200绕转轴320旋转。
请重点参照图1-2，所述音圈电机100包括：永磁模块110、驱动导轨模块120和线圈结构，其中，所述永磁模块110包括：对称布置的两组永磁铁组1101、1102，每组永磁铁组中包含两块永磁铁111。所述驱动导轨模块120采用铁芯，该铁芯贯穿两组永磁铁组1101、1102并设置在两块永磁铁111之间，所述线圈结构包括两个线圈130，所述两个线圈130设置在所述铁芯上并与对应的快门叶片200连接。具体地，一组永磁铁组对应一个线圈130，一个线圈130连接一个快门叶片200，4个永磁铁111组成的两组永磁铁组1101、1102在铁芯内部产生顺铁芯方向的磁场，线圈130通电后，线圈130的磁场方向与铁芯内部磁场方向相反或相同，通过改变线圈130内电流的方向，便可以控制线圈130在铁芯上进行加减速运动。
所述音圈电机100还包括安装座140，用于固定永磁铁组1101、1102及驱动导轨模块120。需要说明的是，所述驱动导轨模块120为弧形或者半圆形，本实施例将所述安装座140和所述永磁模块110也对应设置为弧形或半圆形，便于驱动所述两组快门叶片200动作。因此，本实施例的图2仅用作对音圈电机100结构的辅助说明，不应对音圈电机100的具体形状做约束限定。
请重点参照图1和图3，所述轴承转轴组件300包括：轴承座310、安装在所述轴承座310上的转轴320、设在所述转轴320上的轴承330以及与所述轴承330过渡配合的轴套340，两个快门叶片200套在转轴320上后与各自对应的线圈130连接，套在转轴320上的快门叶片200依次通过轴承330、轴套340安装在轴承座310上，所述转轴320与所述轴承330之间、所述轴承330与轴套340之间均采用过渡配合，可以极大程度减小快门叶片200的轴向摆动量。作为优选，所述永磁模块110和驱动导轨模块120安装固定在轴承座310上，如图1所示。
作为优选，所述轴承330采用双深沟球轴承，与采用单轴承结构相比，可以有效减小轴承座310与转轴320高速运动过程中的晃动。
如图5所示，所述罩壳500上与挡光单元也即是快门叶片200对应的位置处开设有通光孔510，且所述罩壳500上设有冷却气入口，通过该冷却气入口通入小流量的压缩空气，对线圈130和快门叶片200进行散热处理，规避了由于热影响导致线圈130内部电流不稳的风险，同时提高了快门叶片200的长期可靠性。为了进一步保证快门叶片200的耐热性，本发明采用散热系数较耐热不锈钢更优、转动惯量更小的铝制叶片，该铝制叶片与上述的小流量压缩空气辅助配合，实现快门叶片200的冷却散热。
请参照图1至图5，本发明的两个快门叶片200采用剪刀式铰接方式连接，进一步的，在未曝光状态下，为有效减小两快门叶片200之间的缝隙带来的 散射光和反射光进入照明系统中，两个快门叶片200存在重叠。具体为，当快门叶片200的间隙(图1中垂直纸面方向的距离)为2mm时，设计重叠宽度(图1中以d表示)为8mm，增加了杂光在两个快门叶片200之间的反射次数，进一步的，该快门叶片200需要采用硬质黑色阳极氧化工艺进行处理，使快门叶片200的表面反射率小于6％，可以有效吸收杂散光；同时控制快门叶片200与罩壳500之间的间距≤2mm，并使得快门叶片200的直径较通光孔510的孔径单边≥4mm，从而减小罩壳500上通光孔510的边缘散射光影响。如图1所示，通光孔510的半径为r，两快门叶片重合后的半径为R，则要求R-r≥4mm。
作为优选，如图4所示，所述快门叶片200的重心C位于所述快门叶片200上转轴320的下方，且偏向于快门叶片200圆弧侧，使得快门叶片200的重力距大于轴承330的摩擦阻力距，使得快门叶片200在异常断电状态下，可以自行处于关闭挡光状态，避免紫外光长时间光照对工件台或硅片造成影响。
作为优选，所述位置探测模块包括位置探测器400和位置探测片350，位置探测器400有两个，分别安装在转轴320两侧的所述轴承座310上，位置探测片350有两个，均安装在两个快门叶片200中任意一个快门叶片200连接的轴套340上，两个位置探测片350跟随快门叶片200转动而转动，位置探测器400与位置探测片350的位置一一对应，用于识别快门叶片200的打开和关闭。本实施例中，如图1所示，两个位置探测片350均安装在图中显示的左边的快门叶片200的轴套340上，两个快门叶片200为关闭状态时，右边的位置探测器400可探测到右边的位置探测片350的位置，并由右边的位置探测器400反馈信号状态‘1’，左边的位置探测器400不可探测到左边的位置探测片350的位置，因而左边的位置探测器400反馈信号状态‘0’， 两个位置探测器400组合反馈信号为‘10’，表示两个所述快门叶片200为关闭状态。同理，当两个快门叶片200打开时，左边的快门叶片200顺时针转动，右边的快门叶片200逆时针转动，同时两个位置探测片350也相应地沿顺时针转动，使得右边的位置探测片350脱离右边的位置探测器，使得右边的位置探测器400不可探测到右边的位置探测片350，右边的位置探测器400反馈信号状态‘0’，左边的位置探测器400可探测到左边的位置探测片350，左边的位置探测器400反馈信号状态‘1’，两个位置探测器400反馈信号为‘01’，表示两个快门叶片200为打开状态。以上描述的仅为位置探测器400与位置探测片350的一种示意性设置位置及开闭状态探测方法。本领域技术人员容易理解的是，图1中左右两个位置探测片350的设置位置也可互换，即两个位置探测片350均安装在图中显示的右边的快门叶片200的轴套340上，两个快门叶片200关闭状态下，左边的位置探测器400能够探测到左边的位置探测片350，右边的位置探测器无法探测到右边的位置探测片350；在两个快门叶片200打开状态下，则刚好相反。此外，也可以采用状态‘0’来表示探测到位置探测片350，采用状态‘1’来表示未探测到位置探测片350。除了以上描述的方式之外，还可以采用其它位置设置方式及开闭状态探测方式来实现本发明，凡事根据位置探测器400与位置探测片350之间的探测状态来反映快门叶片开闭状态的实施方式均属于本申请的保护范围。
由上可知，本实施例通过采用两个快门叶片200配合，可以减小快门叶片200的行程；另一方面采用可以提供大扭矩的音圈电机100，两者配合，使得本发明的光刻机曝光快门装置可以实现以下技术指标：单个快门叶片200的开闭角度达20°，通光直径为40mm，单个快门叶片200的驱动平均功率15.3W时，最小开闭时间达28.4ms，通过缩小工作行程的方式大大减小了开闭时间；光源辐照强度为2500mW/cm 2的工况下，快门叶片200处，光功率 为170W时的最小曝光剂量为80mj，与现有技术相比，小剂量曝光产率至少提升了3倍，无需使用照度衰减机构，提高了单位时间内的光源利用率。
如图6所示，为本发明的光刻机曝光快门装置的打开、关闭运动示意图，即快门叶片的速率控制示意图，其运动形式主要包括打开加速过程、打开减速过程、关闭加速过程和关闭减速过程。
参照图1至图5，本发明还提供一种光刻机曝光快门装置的控制方法，本发明对快门装置进行开环电流控制，具体包括：
首先，根据曝光时所需的光斑大小来确定单个快门叶片200的旋转行程，根据该旋转行程计算开闭过程中快门叶片200所需的推力，进而确定音圈电机100的输出力。具体通过以下公式实现：
L＝0.5·ξ·t 2...............................公式1
M＝J·ξ...............................公式2
M＝F·l...............................公式3
其中，L为单个快门叶片200的旋转行程，最小开闭需求时间t为30ms(即，期望快门从开始打开到完全关闭的最小时间t不超过30ms)，单个快门叶片200的转动惯量J为0.000042Kg·m 2；M为转动力矩大小，ξ为快门叶片200的角速度，l是线圈130的力臂长度。
由下述公式计算快门装置开闭过程中，单个快门叶片200所需的推力F大小，即音圈电机100的输出力F大小：
F＝M/l＝2·J·L/(t 2·l)≈13N
另，考虑到摩擦力等因素，确定音圈电机100的输出力F大小为14N。
根据音圈电机100的输出力确定线圈130中所需通入的电流方向及大小，并可通过控制板卡(未图示)输出相应的电流给线圈130，其中快门叶片状态为静止时，控制板卡输出正方向电流I1时，快门叶片200打开，控制板卡输 出反向电流I2时则快门叶片200关闭；在快门叶片200打开或关闭过程中，控制板卡输出正方向电流I1时，快门叶片200处于打开加速或关闭加速过程，控制板卡输出反向电流I2时，快门叶片200处于打开减速或关闭减速过程，同时设定快门叶片200处于打开加速、打开减速、关闭加速和关闭减速状态时的通电时间t1、t2、t3和t4的大小，进而控制快门装置的打开过程和关闭过程，当然，t1+t2+t3+t4≤30ms，如图7所示。无动作时，控制板卡的输出电流远小于正、反向电流，使快门叶片200处于静止状态。
通过上述方式获得的快门装置的电气参数主要包含：单个线圈130的电阻＜6Ω，线圈130内电流＜5A，功率＜22W。
如图8所示，为曝光过程能量探测示意图。快门剂量曝光控制流程包括：接收曝光剂量指令，控制板卡输出正、反向电流使光刻机曝光快门装置依次进行打开加速、打开减速动作；减速电流结束后，控制板卡输出保持电流进入等待阶段，所述保持电流指远小于正、反向电流，使快门叶片200处于静止状态(图中所示为保持于打开状态)；根据能量时间积分判定条件等待关闭命令下发，关闭命令下发后，控制板卡输出正、反向电流使得快门叶片200进行关闭加速、关闭减速动作。
实施例2
当光刻机曝光快门装置的电功率小于20W时，可以通过优化控制板卡的输出电流的峰值，提高快门叶片200的开闭速度，实现在光源辐照强度为为3000mW/cm 2的工况下，最小开闭时间达20ms。通过比较图9和图6可发现，本实施例与实施例1的区别在于，本实施例在实施例1的基础上，对控制板卡进行了优化，对挡光单元，即快门叶片200，进行S型速度曲线控制，如此可以减小快门叶片200在打开位置及关闭位置的振动频率及幅值，进而更加 有效保证曝光剂量的精度及重复性。
显然，本领域的技术人员可以对发明进行各种改动和变型而不脱离本发明的精神和范围。这样，倘若本发明的这些修改和变型属于本发明权利要求及其等同技术的范围之内，则本发明也意图包括这些改动和变型在内。

Claims (23)

  1. 一种快门装置，其特征在于，包括：挡光单元和音圈电机，其中，所述音圈电机包括永磁模块、驱动导轨模块和线圈结构，所述线圈结构设置在所述驱动导轨模块上，所述永磁模块在所述驱动导轨模块内部产生磁场，所述挡光单元包括两个快门叶片，所述快门叶片与所述线圈结构连接，所述线圈结构通电后产生与所述驱动导轨模块磁场方向相反或相同的磁场，使所述线圈结构沿所述驱动导轨模块正向或反向运动，带动两个快门叶片打开或关闭。
  2. 如权利要求1所述的快门装置，其特征在于，所述永磁模块包括对称布置的两组永磁铁组，每组永磁铁组包括两块永磁铁，所述驱动导轨模块设于所述两块永磁铁之间，所述线圈结构包括两个线圈，一个线圈连接一个快门叶片且对应一组永磁铁组。
  3. 如权利要求1或2所述的快门装置，其特征在于，所述驱动导轨模块采用铁芯。
  4. 如权利要求1或2所述的快门装置，其特征在于，所述驱动导轨模块为弧形或者半圆形。
  5. 如权利要求1所述的快门装置，其特征在于，所述两个快门叶片剪刀式铰接，且两个快门叶片之间在关闭状态下存在重叠。
  6. 如权利要求1所述的快门装置，其特征在于，所述快门叶片采用铝制叶片。
  7. 如权利要求1所述的快门装置，其特征在于，所述快门叶片表面经过黑色阳极氧化工艺处理。
  8. 如权利要求1所述的快门装置，其特征在于，所述快门装置还包括罩 设在音圈电机和挡光单元外部的罩壳，所述罩壳上与挡光单元对应位置处开设有通光孔。
  9. 如权利要求8所述的快门装置，其特征在于，所述罩壳上设有冷却气入口，用于通入压缩空气对所述音圈电机和挡光单元进行冷却。
  10. 如权利要求8所述的快门装置，其特征在于，所述快门叶片的直径大于所述通光孔的直径。
  11. 如权利要求1所述的快门装置，其特征在于，所述快门叶片与所述线圈结构之间还设置有轴承转轴组件。
  12. 如权利要求11所述的快门装置，其特征在于，所述轴承转轴组件包括：轴承座、安装在所述轴承座上的转轴、设在所述转轴上的轴承以及与所述轴承配合的轴套，所述快门叶片套设在所述转轴上并与线圈结构连接。
  13. 如权利要求12所述的快门装置，其特征在于，所述转轴与所述轴承之间、所述轴承与所述轴套之间过渡配合。
  14. 如权利要求12所述的快门装置，其特征在于，所述轴承采用双深沟球轴承。
  15. 如权利要求12所述的快门装置，其特征在于，所述快门装置还包括位置探测器和位置探测片，所述位置探测器安装在所述轴承座上，所述位置探测片安装在所述轴套上且相对于快门叶片具有固定的位置。
  16. 如权利要求12所述的快门装置，其特征在于，所述快门叶片的重心靠近所述转轴的中心，且偏向于快门叶片的圆弧形边缘一侧。
  17. 如权利要求12所述的快门装置，其特征在于，所述永磁模块和驱动导轨模块安装固定在轴承座上。
  18. 一种应用于权利要求1至17任一所述的快门装置的控制方法，其特征在于，包括：
    根据所需的光斑大小确定音圈电机的输出力；
    根据音圈电机的输出力确定由控制板卡向线圈结构输出的电流，
    其中，所述控制板卡向线圈结构输出正方向电流可控制快门叶片加速，所述控制板卡向线圈结构输出反方向电流可控制快门叶片减速，通过打开加速、打开减速、关闭加速和关闭减速四个速率控制阶段实现所述快门叶片的开闭，同时设定快门叶片处于打开加速、打开减速、关闭加速和关闭减速状态时的通电时间。
  19. 如权利要求18所述的控制方法，其特征在于，还包括由所述控制板卡向线圈结构输出远小于控制快门叶片加速的正向电流及控制快门叶片减速的反向电流的电流，使快门叶片处于静止状态。
  20. 如权利要求18所述的控制方法，其特征在于，根据所需的光斑大小确定音圈电机的输出力包括：根据所需的光斑大小确定单个快门叶片的旋转行程，根据该旋转行程计算开闭过程中快门叶片所需的推力，进而确定音圈电机的输出力。
  21. 如权利要求18所述的控制方法，其特征在于，还包括：优化所述控制板卡向线圈结构输出的电流峰值，对所述快门叶片进行S型速度曲线控制。
  22. 一种光刻机，包括如权利要求1至17中任一所述的快门装置。
  23. 一种应用于权利要求22所述的光刻机的曝光剂量控制方法，其特征在于，包括：接收曝光剂量指令，根据所述曝光剂量确定所述音圈电机的输出力，根据所述音圈电机的输出力确定控制板卡向线圈结构输出的电流和通电时间，其中，所述控制板卡向线圈结构输出正向电流使所述快门装置进行打开加速动作，加速结束后所述控制板卡向线圈结构输出反向电流使所述快门装置进行打开减速动作；减速电流结束后，所述线圈结构控制板卡输出 保持电流进入等待阶段；根据能量时间积分判定条件等待关闭命令下发，关闭命令下发后，所述控制板卡向线圈结构输出正向电流使所述快门装置进行关闭加速动作，加速结束后所述控制板卡向线圈结构输出反向电流使得所述快门装置进行关闭减速动作，从而完成单次曝光剂量控制过程。
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CN113037978B (zh) * 2021-03-12 2023-05-02 新思考电机有限公司 快门驱动装置、快门、拍摄装置、电子元件
TWI804212B (zh) * 2022-02-25 2023-06-01 大立光電股份有限公司 可控光圈、微型相機模組與電子裝置

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SG11201906706UA (en) 2019-08-27
TW201842409A (zh) 2018-12-01
EP3575861B1 (en) 2022-10-05
EP3575861A1 (en) 2019-12-04
EP3575861A4 (en) 2020-02-12
CN108345157B (zh) 2019-07-23
JP2020505642A (ja) 2020-02-20
CN108345157A (zh) 2018-07-31
KR102259532B1 (ko) 2021-06-02
US20190391463A1 (en) 2019-12-26
KR20190102292A (ko) 2019-09-03
US10983415B2 (en) 2021-04-20
TWI658338B (zh) 2019-05-01
JP6909858B2 (ja) 2021-07-28

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