SG11201906706UA - Shutter device and control method therefor, mask aligner and exposure dose control method therefor - Google Patents

Shutter device and control method therefor, mask aligner and exposure dose control method therefor

Info

Publication number
SG11201906706UA
SG11201906706UA SG11201906706UA SG11201906706UA SG11201906706UA SG 11201906706U A SG11201906706U A SG 11201906706UA SG 11201906706U A SG11201906706U A SG 11201906706UA SG 11201906706U A SG11201906706U A SG 11201906706UA SG 11201906706U A SG11201906706U A SG 11201906706UA
Authority
SG
Singapore
Prior art keywords
control method
method therefor
assembly
guide track
coil assembly
Prior art date
Application number
SG11201906706UA
Inventor
Zhiyong Jiang
Fuping Zhang
Yanfei Wang
Original Assignee
Shanghai Micro Electronics Equipment Group Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shanghai Micro Electronics Equipment Group Co Ltd filed Critical Shanghai Micro Electronics Equipment Group Co Ltd
Publication of SG11201906706UA publication Critical patent/SG11201906706UA/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B9/00—Exposure-making shutters; Diaphragms
    • G03B9/08—Shutters
    • G03B9/10—Blade or disc rotating or pivoting about axis normal to its plane
    • G03B9/18—More than two members
    • G03B9/22—More than two members each moving in one direction to open and then in opposite direction to close, e.g. iris type
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/005—Diaphragms
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/02—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the intensity of light
    • G02B26/023—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the intensity of light comprising movable attenuating elements, e.g. neutral density filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B9/00—Exposure-making shutters; Diaphragms
    • G03B9/08—Shutters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B9/00—Exposure-making shutters; Diaphragms
    • G03B9/08—Shutters
    • G03B9/10—Blade or disc rotating or pivoting about axis normal to its plane
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B9/00—Exposure-making shutters; Diaphragms
    • G03B9/08—Shutters
    • G03B9/10—Blade or disc rotating or pivoting about axis normal to its plane
    • G03B9/14—Two separate members moving in opposite directions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B9/00—Exposure-making shutters; Diaphragms
    • G03B9/58—Means for varying duration of "open" period of shutter
    • G03B9/60—Means for varying duration of "open" period of shutter by varying speed of movement of obturating members
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B9/00—Exposure-making shutters; Diaphragms
    • G03B9/58—Means for varying duration of "open" period of shutter
    • G03B9/62—Means for varying duration of "open" period of shutter by varying interval of time between end of opening movement and beginning of closing movement
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70975—Assembly, maintenance, transport or storage of apparatus
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K33/00—Motors with reciprocating, oscillating or vibrating magnet, armature or coil system
    • H02K33/12—Motors with reciprocating, oscillating or vibrating magnet, armature or coil system with armatures moving in alternate directions by alternate energisation of two coil systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Environmental & Geological Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Power Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Shutters For Cameras (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Operating, Guiding And Securing Of Roll- Type Closing Members (AREA)

Abstract

Disclosed are a shutter device and a control method therefor, a mask aligner and an exposure dose control method therefor. The shutter device comprises: a light blocking unit and a voice coil motor (), wherein the voice coil motor (100) comprises a permanent magnet module (110), a guide track assembly (120) and a coil assembly (130). The coil assembly (130) is arranged on the guide track assembly (120). The permanent magnet module (110) generates a magnetic field inside the guide track assembly (120). The light blocking unit comprises two shutter blades (200). The shutter blades (200) are connected to the coil assembly (130). After being energised, the coil assembly (130) generates magnetic fields the opposite of or the same as the magnetic field in the guide track assembly (120), so that the coil assembly (130) moves forwards or reversely along the guide track assembly (120) to drive the opening or closing of the two shutter blades (200). By means of directly connecting the coil assembly (130) of the voice coil motor (100) to the light blocking unit, the opening and closing time of the shutter blades (200) is greatly reduced, thus increasing a small-dose exposure yield and increasing the light source utilisation rate in unit time. 20
SG11201906706UA 2017-01-25 2018-01-25 Shutter device and control method therefor, mask aligner and exposure dose control method therefor SG11201906706UA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201710061013.3A CN108345157B (en) 2017-01-25 2017-01-25 Shutter device and its control method, litho machine and its exposure dose control method
PCT/CN2018/074089 WO2018137676A1 (en) 2017-01-25 2018-01-25 Shutter device and control method therefor, mask aligner and exposure dose control method therefor

Publications (1)

Publication Number Publication Date
SG11201906706UA true SG11201906706UA (en) 2019-08-27

Family

ID=62962438

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201906706UA SG11201906706UA (en) 2017-01-25 2018-01-25 Shutter device and control method therefor, mask aligner and exposure dose control method therefor

Country Status (8)

Country Link
US (1) US10983415B2 (en)
EP (1) EP3575861B1 (en)
JP (1) JP6909858B2 (en)
KR (1) KR102259532B1 (en)
CN (1) CN108345157B (en)
SG (1) SG11201906706UA (en)
TW (1) TWI658338B (en)
WO (1) WO2018137676A1 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112782938B (en) * 2019-11-05 2022-10-14 上海微电子装备（集团）股份有限公司 Movable slit device and photoetching system
CN113037978B (en) * 2021-03-12 2023-05-02 新思考电机有限公司 Shutter driving device, shutter, imaging device, and electronic component
TWI804212B (en) * 2022-02-25 2023-06-01 大立光電股份有限公司 Controllable aperture stop, compact camera module and electronic device

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH558542A (en) * 1973-07-19 1975-01-31 Sinar Ag Schaffhausen LOCKING DEVICE FOR PHOTOGRAPHIC CAMERA.
US4265530A (en) * 1979-06-05 1981-05-05 Polaroid Corporation Shutter blade drive system
JPS564127A (en) * 1979-06-22 1981-01-17 Canon Inc Electromagnetic drive shutter
US4839679A (en) * 1987-06-18 1989-06-13 General Electric Corp. Dual voice coil shutter
CN1049918A (en) * 1989-08-31 1991-03-13 袁凯鸿 Camera shutter actuating device
JP2856584B2 (en) 1991-11-27 1999-02-10 キヤノン株式会社 Camera with shutter device
US5706120A (en) * 1996-04-24 1998-01-06 Eastman Kodak Company Device for controlling an amount of light allowed to reach a photosensitive surface
GB9714134D0 (en) * 1997-07-05 1997-09-10 Lumonics Ltd Method and apparatus for actuating a shutter
US6046836A (en) * 1998-03-06 2000-04-04 Electro-Optical Products Corporation Low frequency optical shutter
JP3862438B2 (en) * 1998-12-28 2006-12-27 キヤノン株式会社 Scanning exposure apparatus, scanning exposure method, and device manufacturing method
US7513702B2 (en) * 2005-11-16 2009-04-07 Va, Inc. Non-contact shutter activation system and method
JP5154766B2 (en) * 2006-04-24 2013-02-27 キヤノン電子株式会社 Optical path switching device and camera incorporating the same
US7771132B2 (en) * 2006-08-04 2010-08-10 Tamron Co., Ltd. Shutter unit, shutter unit with built-in lens, and imaging apparatus
CN102073192B (en) * 2009-11-23 2015-09-09 Lg伊诺特有限公司 Shutter device
CN102087476A (en) * 2009-12-08 2011-06-08 上海微电子装备有限公司 Shutter device for exposure subsystem of photoetching machine
CN102540633A (en) * 2011-12-27 2012-07-04 中国科学院长春光学精密机械与物理研究所 Quick opening and retaining control system for electromagnetic mechanical shutter
JP6297584B2 (en) * 2012-11-26 2018-03-20 ソルラブス、インコーポレイテッド Bistable electromagnetically controlled shutter
CN105807572B (en) * 2014-12-31 2018-03-30 上海微电子装备（集团）股份有限公司 A kind of self-damping shutter device for exposure subsystem of photoetching machine
CN108663871B (en) * 2017-03-31 2021-06-25 上海微电子装备（集团）股份有限公司 Shutter device
US10771710B2 (en) * 2018-10-22 2020-09-08 Raytheon Company Shutter assembly for managing light relative to a photosensitive device

Also Published As

Publication number Publication date
TW201842409A (en) 2018-12-01
KR20190102292A (en) 2019-09-03
JP2020505642A (en) 2020-02-20
TWI658338B (en) 2019-05-01
EP3575861A4 (en) 2020-02-12
EP3575861B1 (en) 2022-10-05
CN108345157B (en) 2019-07-23
US10983415B2 (en) 2021-04-20
CN108345157A (en) 2018-07-31
EP3575861A1 (en) 2019-12-04
KR102259532B1 (en) 2021-06-02
WO2018137676A1 (en) 2018-08-02
JP6909858B2 (en) 2021-07-28
US20190391463A1 (en) 2019-12-26

Similar Documents

Publication Publication Date Title
SG11201906706UA (en) Shutter device and control method therefor, mask aligner and exposure dose control method therefor
CA3000674A1 (en) Feedback system for pitch-adjustable blades of aircraft bladed rotor
WO2014133849A3 (en) Electromagnetically actuated multi-leaf collimator
MX2023009602A (en) Medical devices, systems and methods utilizing permanent magnet and magnetizable feature.
PH12017500028A1 (en) Magnetic substance holding device
MX2017015898A (en) Eyewear with magnetic track for electronic wearable device.
MY186139A (en) Coil assembly for magnetic resonance imaging
NZ726603A (en) Zoom lens
MY182469A (en) Fishing reel and magnetic seal device therefor
MX2016009354A (en) Flush mount active grille shutter and actuator.
RU2012118402A (en) ELECTRIC GENERATOR
WO2020109744A3 (en) Adjustable force device
TW200638151A (en) An electromagentic actuated adjusting device for camera lens
TW200951690A (en) System and method of controlling cooling gate
TWM533761U (en) Optical image stabilization assembly and electronic device having the same
GB201105676D0 (en) A device for enhancing closure of a window or door
WO2014180737A3 (en) Motor and method for driving a pump
ES1135956U (en) Electroiman provided with noise damper system with bi-stable drive (Machine-translation by Google Translate, not legally binding)
JP2015220014A (en) Magnetic field generation device comprising magnetic field variation mechanism for arbitrarily changing magnetic field at magnetic field generation position, and magnetic field adjustment method
NZ724385A (en) Voice coil motor and focusing lens
WO2017027524A3 (en) High voltage relay
GB2557908A (en) Ventilators
DE60324838D1 (en) ELECTROMAGNETIC VALVE CONTROL DEVICE WITH A PERMANENT MAGNET
GR20130100261A (en) Motor's mechanism for the autonomous operation of a steady magnet pole
BR112019008937A2 (en) magnetic coupling system and method for balancing a magnetic coupler