WO2018065483A1 - Circuit électronique de puissance - Google Patents
Circuit électronique de puissance Download PDFInfo
- Publication number
- WO2018065483A1 WO2018065483A1 PCT/EP2017/075247 EP2017075247W WO2018065483A1 WO 2018065483 A1 WO2018065483 A1 WO 2018065483A1 EP 2017075247 W EP2017075247 W EP 2017075247W WO 2018065483 A1 WO2018065483 A1 WO 2018065483A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- solder
- layer
- power electronics
- carrier
- electronics circuit
- Prior art date
Links
- 229910000679 solder Inorganic materials 0.000 claims abstract description 71
- 239000002245 particle Substances 0.000 claims abstract description 51
- 125000006850 spacer group Chemical group 0.000 claims abstract description 32
- 229910052751 metal Inorganic materials 0.000 claims description 6
- 239000002184 metal Substances 0.000 claims description 6
- 239000000919 ceramic Substances 0.000 claims description 3
- 239000011248 coating agent Substances 0.000 claims description 3
- 238000000576 coating method Methods 0.000 claims description 3
- 238000001816 cooling Methods 0.000 claims description 2
- 239000004065 semiconductor Substances 0.000 abstract description 3
- 230000008092 positive effect Effects 0.000 abstract description 2
- 150000001875 compounds Chemical class 0.000 abstract 2
- 239000004020 conductor Substances 0.000 description 11
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 9
- 229910052802 copper Inorganic materials 0.000 description 9
- 239000010949 copper Substances 0.000 description 9
- 239000000463 material Substances 0.000 description 8
- 229910052782 aluminium Inorganic materials 0.000 description 7
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- 229910010293 ceramic material Inorganic materials 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 238000005476 soldering Methods 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 229910000881 Cu alloy Inorganic materials 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229910052738 indium Inorganic materials 0.000 description 2
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000010285 flame spraying Methods 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 239000012811 non-conductive material Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L24/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L24/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
- H01L21/4814—Conductive parts
- H01L21/4871—Bases, plates or heatsinks
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
- H01L2224/29001—Core members of the layer connector
- H01L2224/29099—Material
- H01L2224/29198—Material with a principal constituent of the material being a combination of two or more materials in the form of a matrix with a filler, i.e. being a hybrid material, e.g. segmented structures, foams
- H01L2224/29199—Material of the matrix
- H01L2224/292—Material of the matrix with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
- H01L2224/29001—Core members of the layer connector
- H01L2224/29099—Material
- H01L2224/29198—Material with a principal constituent of the material being a combination of two or more materials in the form of a matrix with a filler, i.e. being a hybrid material, e.g. segmented structures, foams
- H01L2224/29199—Material of the matrix
- H01L2224/292—Material of the matrix with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
- H01L2224/29201—Material of the matrix with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of less than 400°C
- H01L2224/29209—Indium [In] as principal constituent
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
- H01L2224/29001—Core members of the layer connector
- H01L2224/29099—Material
- H01L2224/29198—Material with a principal constituent of the material being a combination of two or more materials in the form of a matrix with a filler, i.e. being a hybrid material, e.g. segmented structures, foams
- H01L2224/29199—Material of the matrix
- H01L2224/292—Material of the matrix with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
- H01L2224/29201—Material of the matrix with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of less than 400°C
- H01L2224/29211—Tin [Sn] as principal constituent
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
- H01L2224/29001—Core members of the layer connector
- H01L2224/29099—Material
- H01L2224/29198—Material with a principal constituent of the material being a combination of two or more materials in the form of a matrix with a filler, i.e. being a hybrid material, e.g. segmented structures, foams
- H01L2224/29298—Fillers
- H01L2224/29299—Base material
- H01L2224/293—Base material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
- H01L2224/29338—Base material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
- H01L2224/29347—Copper [Cu] as principal constituent
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
- H01L2224/29001—Core members of the layer connector
- H01L2224/29099—Material
- H01L2224/29198—Material with a principal constituent of the material being a combination of two or more materials in the form of a matrix with a filler, i.e. being a hybrid material, e.g. segmented structures, foams
- H01L2224/29298—Fillers
- H01L2224/29299—Base material
- H01L2224/293—Base material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
- H01L2224/29338—Base material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
- H01L2224/29355—Nickel [Ni] as principal constituent
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
- H01L2224/29001—Core members of the layer connector
- H01L2224/29099—Material
- H01L2224/29198—Material with a principal constituent of the material being a combination of two or more materials in the form of a matrix with a filler, i.e. being a hybrid material, e.g. segmented structures, foams
- H01L2224/29298—Fillers
- H01L2224/29399—Coating material
- H01L2224/294—Coating material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
- H01L2224/29438—Coating material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
- H01L2224/29447—Copper [Cu] as principal constituent
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
- H01L2224/29001—Core members of the layer connector
- H01L2224/29099—Material
- H01L2224/29198—Material with a principal constituent of the material being a combination of two or more materials in the form of a matrix with a filler, i.e. being a hybrid material, e.g. segmented structures, foams
- H01L2224/29298—Fillers
- H01L2224/29399—Coating material
- H01L2224/294—Coating material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
- H01L2224/29438—Coating material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
- H01L2224/29455—Nickel [Ni] as principal constituent
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/8312—Aligning
- H01L2224/83136—Aligning involving guiding structures, e.g. spacers or supporting members
- H01L2224/83138—Aligning involving guiding structures, e.g. spacers or supporting members the guiding structures being at least partially left in the finished device
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/8338—Bonding interfaces outside the semiconductor or solid-state body
- H01L2224/83399—Material
- H01L2224/834—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
- H01L2224/83417—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 400°C and less than 950°C
- H01L2224/83424—Aluminium [Al] as principal constituent
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/8338—Bonding interfaces outside the semiconductor or solid-state body
- H01L2224/83399—Material
- H01L2224/834—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
- H01L2224/83438—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
- H01L2224/83447—Copper [Cu] as principal constituent
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/838—Bonding techniques
- H01L2224/83801—Soldering or alloying
- H01L2224/83815—Reflow soldering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
- H01L23/36—Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
- H01L23/373—Cooling facilitated by selection of materials for the device or materials for thermal expansion adaptation, e.g. carbon
- H01L23/3736—Metallic materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L24/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L24/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L24/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/30—Technical effects
- H01L2924/35—Mechanical effects
- H01L2924/351—Thermal stress
Definitions
- Soldered carrier wherein the carrier may be made of insulating material such as plastic or in particular ceramic.
- materials with high specific conductivity are used, for example copper or aluminum.
- the pairing of the component material and the material of the conductor track or of the carrier can cause mechanical stresses, due to the different thermal expansion coefficients.
- there are strong temperature fluctuations which thus can lead to high voltages and in particular to detachment depending on the material pairing.
- solder at least one power component of a power electronics circuit by means of a solder layer, which has spacer particles distributed in solder composition, and the solder layer, which connects the at least one power component to the carrier, is at least 100 ⁇ m thick. Due to the thickness, the shear stresses in the solder layer are reduced, which result from different thermal expansion of the carrier and the power component. It results in a lower stress at temperature changes compared to thinner solder layers, whereby the reliability of the solder joint is increased.
- the solder layer or its thickness can be realized in a simple manner and relatively precisely during the production process.
- the power electronics circuit described here has a carrier.
- the carrier in particular comprises an insulator layer and at least one conductor track layer.
- the insulator layer may be made of a ceramic material or a plastic.
- the printed conductors are in particular copper or aluminum printed conductors.
- the surface of the carrier is formed by the surfaces of the conductor tracks, as well as by the surface of the iso ⁇ lations stressess (at the locations where no conductor tracks are arranged). On this surface is at least one
- the continuous solder layer is a solid body (ab ⁇ seen from a possibly occurring blowholes or gas proportion of not more than 1% and preferably not more than 1 L).
- the continuous solder layer extends from the
- the solder layer extends over the entire volume, which is defined by the surface of the carrier, the contact surface of the power device and the Side surfaces of the volume, which begin at the outer edges of the power component or the contact surface and aligned to the surface of the wearer.
- the distance particles are distributed in the solder mass. In other words, is located in the space between the spacer particles solder mass with a volume fraction of at least 95% or 99% or 99, 9% (depending on the void fraction).
- the distance particles float in the solder mass or are surrounded by a continuous mass of solder.
- the solder mass and the spacer particles fill the entire area between the power component and the surface.
- the solder layer has a thickness that is at least 100 ym.
- the distance between the surface of the carrier and the power device is at least 100 ym, with the solder mass extending along the entire distance of the solder layer.
- a thickness of the solder layer of at least 100 ⁇ m preferably at least 200 ⁇ m or 300 ⁇ m leads to an increase in height, which has a positive effect in favor of the service life.
- the thickness of the solder layer is at least 100 ym or 200 ym min ⁇ least and preferably at least 250 ym or more.
- a specific embodiment provides that the thickness of the solder layer is at least 300 .mu.m, specific From ⁇ EMBODIMENTS also a thickness of the solder layer of 300 ym ( ⁇ 10-25%) provide.
- the spacer particles are provided with a mass fraction of at least 1% (based on the entire solder layer) in this. Preferably, the mass fraction is at least 1.8 or 2%, with specific embodiments providing a mass fraction of 2%. The percentages of the mass fraction can be provided with a tolerance of ⁇ 10% to ⁇ 25%.
- the spacer particles are made of a metal or have a metal coating.
- the spacer particles are in ⁇ particular solid.
- the spacer particles may in particular be made of copper or of a solid alloy or may have a coating of a copper alloy.
- the spacer particles have a surface that is well wettable with solder, as is the case with copper or nickel. The surface of the spacer particles may thus be made of nickel or the spacer particle is made of nickel. This also applies to nickel alloys.
- the spacer particles are preferably the same size; in other words, the volume of the spacer particles does not vary by more than 50%, preferably 10% or more preferably 5%.
- the spacer particles are in particular spherical or ⁇ We sentlichen spherical.
- the volume of the spacer particles which deviates from a sphere inscribed in the spacer particles is not more than 30%, preferably 15% or particularly preferably 10 or 5% of the total volume of the spacer particles.
- substantially spherical (relative to the spacer particles) may mean that the volume which deviates from an inscribed in the particle ball speaks not more than 10% or 5% of the total volume of the particle ent ⁇ .
- the particle size is preferably at least 50 ym, at least 80 ym, at least 100 ym or at least 120 ym In the case of substantially spherical spacer particles, this corresponds to the ball diameter and may also correspond to the diameter of a ball inscribed in the corresponding particle.
- the particle size may have an upper limit, for example, 300, 200, 150 or 125 ym.
- all spacer particles have substantially the same particle size (corresponding to a maximum deviation of the size of all Particles of a solder layer of not more than 50%, 25%, 10% or 5%).
- the mass fraction of the spacer particles in the solder layer is 2%.
- the distance particles are in this case spherical and the ball ⁇ diameter is at least 80 ym and not more than 100 ym.
- the spacer particles are made of copper.
- the solder mass between distance particles is a common solder material, for example with 96.5% tin, 3% silver and 0.3% copper.
- soldering materials can be used with a tin content of at least 90% or 95%. Preference is given to using solder compositions with an indium portion.
- the carrier can be cold-gas sprayed and in particular have cold gas-sprayed layers.
- the carrier may comprise a cold gas-sprayed conductive layer. This forms in particular a conductor track structure.
- the cold gas sprayed layer ⁇ forms the surface.
- the cold gas-sprayed conductive layer is in particular a layer of copper or of aluminum or of a copper alloy or an aluminum alloy.
- the use of cold gas-sprayed layers simplifies production. At the same time allows, through the solder layer as described herein, that the cold gas sprayed layer (in particular at the locations where a Leis ⁇ processing component is soldered) a reduction in the mechanical stresses by different bathausdeh- .
- the thickness of the solder layer in particular results in a stable structure, wherein the cold-gas-sprayed, conductive layer forms conductor tracks or a conductor track structure.
- the carrier preferably has a cold gas-sprayed, electrically insulating layer. This is located on the side of the conductive layer which is opposite to the surface.
- the kaltgasge- is injected, electrically conductive layer between the electrically insulating layer and assigns the at least one component being ⁇ .
- the electrically conductive layer is arranged on the electrically insulating layer, wherein the components are applied to the electrically conductive layer by means of the solder joint described here.
- Layer may alternatively be produced by a thermal spray process such as flame spraying.
- the heat sink or the heat release layer is electrically conductive and in particular made of metal.
- the electrically insulating layer is applied, on which in turn is the electrically conductive layer.
- the electrically insulating layer is located between the heat sink and the conductive layer. Therefore, conductive heat sinks can also be provided, wherein the insulating layer serves to enable the electrically conductive layer to form a printed conductor structure (and is not short-circuited by the heat sink.)
- Both the electrically insulating layer and the electrically conductive layer, ie the printed conductor layer, are
- the electrically insulating layer may be made of a ceramic material.
- the carrier has a heat sink or a heat release layer of ceramic or plastic, in particular of a non-conductive material.
- the carrier may comprise a cold gas sprayed conductive layer, in particular the layer which forms the Lei ⁇ terbahn. This is formed on the heat sink.
- the cold gas sprayed conductive layer forms the conductive path ⁇ structure. Furthermore, this forms a surface on which the at least one power component is soldered (by means of the solder layer described here). In this case, to ⁇ additional electrically insulating layer is necessary because of the cooling body itself does not conduct and the conductive layer may be applied as cold gas sprayed layer preferably directly on the heat sink.
- FIG. 1 serves for a more detailed explanation of the solder connection described here.
- FIG. 1 shows a detail of a power electronic circuit L with a carrier and a power component 4, which is mounted on the carrier by means of a solder layer 3.
- the detail A shows the solder joint described here in more detail.
- the power electronics circuit L comprises a heat sink 1 made of aluminum. On this a cold gas sprayed, iso-regulating ⁇ layer 2a is applied. On the electrically insulating layer 2a, in turn, an electrically conductive, kaltgasge ⁇ sprayed layer 2b is arranged.
- the heat sink 1 can be made of aluminum, wherein the layer 2 a can be made of a ceramic material and the layer 2 b is made of copper. The layers 2a and 2b are cold-gas sprayed.
- the cooler 1 can be made by means of an aluminum casting method .
- the electrically conductive layer 2b (as the uppermost layer of the carrier) forms the surface 0.
- the support comprises in particular ⁇ sondere the elements having the reference numerals 1, 2a and 2b, and further forming the surface from 0.
- a power component 4 is mounted on the surface 0 via a solder layer 3.
- the component 4 is in particular a semiconductor component and can be present, for example, as a packaged or unhoused chip.
- the component 4 can be in particular a power ⁇ transistor or a power diode or a power TRIAC.
- the solder layer 3 comprises spacer particles 3a, which are embedded in a solder mass 3b.
- Figure 1 gives no sizes ⁇ relationships; rather, the particle size of the Abstandpumble 3a may be smaller than half, one third or one quarter of the layer thickness of the solder layer 3. Apart from that, the particle size at least a quarter, one third or half of the thickness of the solder layer 3 correspond.
- the solder layer 3 obtained by melting of the solder mass 3b, the figure 1 also (re ⁇ sultierend in a taper of the solder layer to the component down) represents the conventional surface effect, which occurs when solder mass liquefied on a solder surface (corresponding to the surface 0) applied becomes.
- solder layer 3 is continuous between the outer edges of the solder layer. Between the spacer particles 3a is solder mass. The space between the spacer particles is completely filled with solder mass 3b between the outer edges of the solder layer.
- the heat sink 1 is made of aluminum in the example shown.
- the solder layer thickness is about 300 ym. It corresponds to the distance between the power device 4 and the surface 0.
- the spacer particles 3a are made of copper.
- the spacer particles 3a are also spherical. In addition, the distance particles 3a have a size of 80 to 100 ym, which corresponds in particular to the ball diameter.
- the mass fraction of the spacer particles 3a within the solder layer 3 is about 2%.
- the power device 4 may be a MOSFET or an IGBT.
- the power electronics circuit L is in particular a drive circuit for an electric drive of a motor vehicle or is an engine control of an electric machine which forms the generator, the starter or a start generator.
Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
Abstract
L'invention concerne un circuit électronique de puissance (L) muni d'un support (1+2a+2b) qui présente une surface (O). Sur le support (1+2a+2b) est brasé au moyen d'une couche de brasure continue (3) au moins un composant de puissance (4) (en particulier un composant semi-conducteur présent sous la forme d'une puce encapsulée ou non encapsulée). La couche de brasure (3) présente des particules d'écartement (33a) et une matière de brasage (3b). Les particules d'écartement (3a) sont réparties dans la matière de brasage (3b). La couche de brasure (3) présente une épaisseur d'au moins 100 µm. Cette épaisseur permet de réduire dans la couche de brasure (3) les contraintes de cisaillement qui sont produites par la différence entre la dilatation thermique du support (1+2a+2b) et celle du composant de puissance (4). On obtient ainsi par rapport à des couches de brasure plus minces une moindre contrainte en cas de variation de la température, et donc une augmentation de la fiabilité de l'assemblage par brasage On obtient en particulier pour des surfaces (O) pulvérisées à froid une rugosité relativement élevée, de sorte qu'une épaisseur de la couche de brasure (3) d'au moins 100 µm se traduit par une structure en hauteur qui a des effets positifs sur la durée de vie.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102016219565.4A DE102016219565A1 (de) | 2016-10-07 | 2016-10-07 | Leistungselektronikschaltung |
DE102016219565.4 | 2016-10-07 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2018065483A1 true WO2018065483A1 (fr) | 2018-04-12 |
Family
ID=60043186
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2017/075247 WO2018065483A1 (fr) | 2016-10-07 | 2017-10-04 | Circuit électronique de puissance |
Country Status (2)
Country | Link |
---|---|
DE (1) | DE102016219565A1 (fr) |
WO (1) | WO2018065483A1 (fr) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20210013175A1 (en) * | 2018-03-29 | 2021-01-14 | Danfoss Silicon Power Gmbh | Method of assembling a semiconductor power module component and a semiconductor power module with such a module component and manufacturing system therefor |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102018208844B3 (de) | 2018-06-05 | 2019-10-02 | Continental Automotive Gmbh | Kühlkörper, Leistungselektronikmodul mit einem Kühlkörper und Verfahren zur Herstellung des Kühlkörpers |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05243293A (ja) * | 1992-02-28 | 1993-09-21 | Nec Kansai Ltd | マウンタ |
EP0795891A2 (fr) * | 1996-03-14 | 1997-09-17 | D-Tech GmbH Antriebstechnik und Mikroelektronik | Soudure de puces semi-conductrices |
DE10045783A1 (de) * | 2000-05-08 | 2001-11-22 | Ami Doduco Gmbh | Verfahren zum Herstellen von Werkstücken, welche der Leitung von elektrischem Strom dienen und mit einem überwiegend metallischen Material beschichtet sind |
JP2005129886A (ja) * | 2003-10-03 | 2005-05-19 | Fuji Electric Holdings Co Ltd | 半導体装置およびその製造方法 |
JP2006073554A (ja) * | 2004-08-31 | 2006-03-16 | Sanyo Electric Co Ltd | 回路装置およびその製造方法 |
JP2012028433A (ja) * | 2010-07-21 | 2012-02-09 | Nec Network Products Ltd | 電子部品の実装方法 |
WO2016016140A1 (fr) * | 2014-07-28 | 2016-02-04 | Continental Automotive Gmbh | Support de circuit, module électronique, procédé servant à fabriquer un support de circuit |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0347693A (ja) * | 1989-07-13 | 1991-02-28 | Tamura Seisakusho Co Ltd | ソルダーペースト |
JP4302607B2 (ja) * | 2004-01-30 | 2009-07-29 | 株式会社デンソー | 半導体装置 |
DE102006023088A1 (de) * | 2006-05-16 | 2007-07-26 | Infineon Technologies Ag | Leistungshalbleiterbauteil und Verfahren zu seiner Herstellung |
JP2009050900A (ja) * | 2007-08-28 | 2009-03-12 | Toyota Motor Corp | 粒子入りはんだ及びその製造方法 |
JP2011228604A (ja) * | 2010-04-23 | 2011-11-10 | Honda Motor Co Ltd | 回路基板の製造方法及び回路基板 |
-
2016
- 2016-10-07 DE DE102016219565.4A patent/DE102016219565A1/de not_active Ceased
-
2017
- 2017-10-04 WO PCT/EP2017/075247 patent/WO2018065483A1/fr active Application Filing
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05243293A (ja) * | 1992-02-28 | 1993-09-21 | Nec Kansai Ltd | マウンタ |
EP0795891A2 (fr) * | 1996-03-14 | 1997-09-17 | D-Tech GmbH Antriebstechnik und Mikroelektronik | Soudure de puces semi-conductrices |
DE10045783A1 (de) * | 2000-05-08 | 2001-11-22 | Ami Doduco Gmbh | Verfahren zum Herstellen von Werkstücken, welche der Leitung von elektrischem Strom dienen und mit einem überwiegend metallischen Material beschichtet sind |
JP2005129886A (ja) * | 2003-10-03 | 2005-05-19 | Fuji Electric Holdings Co Ltd | 半導体装置およびその製造方法 |
JP2006073554A (ja) * | 2004-08-31 | 2006-03-16 | Sanyo Electric Co Ltd | 回路装置およびその製造方法 |
JP2012028433A (ja) * | 2010-07-21 | 2012-02-09 | Nec Network Products Ltd | 電子部品の実装方法 |
WO2016016140A1 (fr) * | 2014-07-28 | 2016-02-04 | Continental Automotive Gmbh | Support de circuit, module électronique, procédé servant à fabriquer un support de circuit |
Non-Patent Citations (1)
Title |
---|
-: "Gas dynamic cold spray", WIKIPEDIA, 4 October 2016 (2016-10-04), XP055438912, Retrieved from the Internet <URL:https://en.wikipedia.org/w/index.php?title=Gas_dynamic_cold_spray&oldid=742526152> [retrieved on 20180108] * |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20210013175A1 (en) * | 2018-03-29 | 2021-01-14 | Danfoss Silicon Power Gmbh | Method of assembling a semiconductor power module component and a semiconductor power module with such a module component and manufacturing system therefor |
Also Published As
Publication number | Publication date |
---|---|
DE102016219565A1 (de) | 2018-04-12 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE102005008491B4 (de) | Leistungs-Halbleitervorrichtung und Verfahren zu ihrer Herstellung | |
DE102005047567B3 (de) | Leistungshalbleitermodul mit Isolationszwischenlage und Verfahren zu seiner Herstellung | |
DE102011079708B4 (de) | Trägervorrichtung, elektrische vorrichtung mit einer trägervorrichtung und verfahren zur herstellung dieser | |
EP2456589B1 (fr) | Connection sans plomb à haute temperature | |
EP1493188A2 (fr) | Composant electronique comportant au moins une puce a semiconducteurs et des contacts par billes et procede de fabrication | |
EP2791949A1 (fr) | Composant électrique et procédé de fabrication d'un composant électrique | |
DE102012211952B4 (de) | Leistungshalbleitermodul mit mindestens einem stressreduzierenden Anpasselement | |
WO2003001594A2 (fr) | Module haute tension et son procede de production | |
DE4132947C2 (de) | Elektronische Schaltungsanordnung | |
WO2018065483A1 (fr) | Circuit électronique de puissance | |
DE10010461A1 (de) | Vorrichtung zum Verpacken elektronischer Bauteile mittels Spritzgußtechnik | |
DE102011076774A1 (de) | Baugruppe mit einem Träger und einem Kühlkörper | |
DE102018208844B3 (de) | Kühlkörper, Leistungselektronikmodul mit einem Kühlkörper und Verfahren zur Herstellung des Kühlkörpers | |
DE102018207554A1 (de) | Kontaktanordnung, vorzugsweise für eine Leistungselektronik | |
DE102015112451B4 (de) | Leistungshalbleitermodul | |
DE102015100868B4 (de) | Integrierte Schaltung und Verfahren zum Herstellen einer integrierten Schaltung | |
DE102013212398A1 (de) | Schaltungsvorrichtung und Verfahren zum Herstellen einer Schaltungsvorrichtung zur Steuerung eines Getriebes eines Fahrzeugs | |
DE102005036563B4 (de) | Elektronisches Bauteil | |
WO2020078778A1 (fr) | Ensemble de composant semi-conducteur, procédé pour sa fabrication ainsi que dispositif de dissipation de chaleur | |
EP2193544B1 (fr) | Dispositif pour refroidir des composants électroniques | |
WO2020120287A1 (fr) | Support, module comprenant un support et procédé pour la fabrication d'un support | |
DE102017211330A1 (de) | Toleranzausgleichselement für Schaltbilder | |
DE10146854B4 (de) | Elektronisches Bauteil mit wenigstens einem Halbleiterchip und Verfahren zur Herstellung eines elektronischen Bauteils mit wenigstens einem Halbleiterchip | |
DE102017200504A1 (de) | Elektronische Komponente und Verfahren zur Herstellung einer elektronischen Komponente | |
DE102017209083B4 (de) | Leiterplattenanordnung mit Mikroprozessor-Bauelement, elektronisches Steuergerät und Verfahren zur Herstellung einer Leiterplattenanordnung |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 17781077 Country of ref document: EP Kind code of ref document: A1 |
|
NENP | Non-entry into the national phase |
Ref country code: DE |
|
122 | Ep: pct application non-entry in european phase |
Ref document number: 17781077 Country of ref document: EP Kind code of ref document: A1 |