WO2018065067A1 - Appareil pour transporter un substrat, système pour traiter un substrat, et procédé de transport de substrat - Google Patents

Appareil pour transporter un substrat, système pour traiter un substrat, et procédé de transport de substrat Download PDF

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Publication number
WO2018065067A1
WO2018065067A1 PCT/EP2016/074050 EP2016074050W WO2018065067A1 WO 2018065067 A1 WO2018065067 A1 WO 2018065067A1 EP 2016074050 W EP2016074050 W EP 2016074050W WO 2018065067 A1 WO2018065067 A1 WO 2018065067A1
Authority
WO
WIPO (PCT)
Prior art keywords
transport line
linear transport
substrate support
moveable substrate
linear
Prior art date
Application number
PCT/EP2016/074050
Other languages
English (en)
Inventor
Enrico Boscolo Marchi
Giorgio Cellere
Original Assignee
Applied Materials Italia S.R.L.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Italia S.R.L. filed Critical Applied Materials Italia S.R.L.
Priority to PCT/EP2016/074050 priority Critical patent/WO2018065067A1/fr
Publication of WO2018065067A1 publication Critical patent/WO2018065067A1/fr

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67715—Changing the direction of the conveying path
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67161—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers
    • H01L21/67173—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers in-line arrangement

Definitions

  • Embodiments of the present disclosure relate to an apparatus for transportation of a substrate, a system for processing of a substrate, and a method for transportation of a substrate.
  • Embodiments of the present disclosure particularly relate to an apparatus for transportation of a substrate used in the manufacture of a solar cell, a system for production of solar cells, and a method for transportation of a substrate used in the manufacture of a solar cell.
  • Embodiments of the present disclosure further relate to apparatuses and methods for returning moveable substrate supports after the moveable substrate supports have travelled through one or more process stations arranged along a linear transport line.
  • Solar cells are photovoltaic (PV) devices that convert sunlight directly into electrical power.
  • PV photovoltaic
  • a system for production of solar cells can use moveable substrate supports for transporting the substrates along a transport line.
  • One or more process stations can be arranged along the transport line for processing of the substrates.
  • the moveable substrate supports travelling along the transport line can limit a throughput of the system.
  • an apparatus for transportation of a substrate includes a first linear transport line configured for transportation of a moveable substrate support in a first direction, a second linear transport line configured for transportation of a moveable substrate support in a second direction different from the first direction, and a transfer arrangement for transferring the moveable substrate support at least from the first linear transport line to the second linear transport line.
  • a system for processing of a substrate includes the apparatus for transportation according to the embodiments described herein, and one or more first process stations provided at the first linear transport line and/or one or more second process stations provided at the second linear transport line.
  • a method for transportation of a substrate includes transporting a moveable substrate support along a first linear transport line in a first direction, wherein one or more first process stations are arranged along the first linear transport line, transferring the moveable substrate support from the first linear transport line to a second linear transport line, and transporting the moveable substrate support along the second linear transport line in a second direction different from the first direction.
  • Embodiments are also directed at apparatuses for carrying out the disclosed method and include apparatus parts for performing each described method aspect. These method aspects may be performed by way of hardware components, a computer programmed by appropriate software, by any combination of the two or in any other manner. Furthermore, embodiments according to the disclosure are also directed at methods for operating the described apparatus. The methods for operating the described apparatus include method aspects for carrying out every function of the apparatus.
  • FIG. 1 shows a schematic top view of an apparatus for transportation of a substrate according to embodiments described herein;
  • FIG. 2 shows a schematic top view of an apparatus for transportation of a substrate according to further embodiments described herein;
  • FIG. 3 shows a schematic view of an apparatus for transportation of a substrate to yet further embodiments described herein;
  • FIG. 4 shows a schematic view of an apparatus for transportation of a substrate according to other embodiments described herein;
  • FIGs. 5A to C show examples of arrangements of linear transport lines and process stations according to embodiments described herein;
  • FIG. 6 shows a flowchart of a method for transportation of a substrate according to embodiments described herein.
  • moveable substrate supports can be used for transportation of substrates or wafers along a transport line.
  • the present disclosure provides a return path ("recirculation") for the moveable substrate supports such that the moveable substrate supports having travelled through one or more process stations can return to a start position and travel again along the transport line.
  • a movement pattern of the moveable substrate supports can be improved and/or a throughput of a system for substrate processing can be increased.
  • FIG. 1 shows a schematic top view of an apparatus 100 for transportation of a substrate 10 according to embodiments described herein.
  • the substrate 10 can be used in the manufacture of a solar cell.
  • the present disclosure is not limited thereto and the embodiments of the present disclosure can be used for transportation of other substrates.
  • the apparatus 100 includes a first linear transport line 110 configured for transportation of a moveable substrate support 20, such as a shuttle, in a first direction 1, a second linear transport line 120 configured for transportation of the moveable substrate support 20 in a second direction 2 different from the first direction 1, and a transfer arrangement 130 for transferring the moveable substrate support 20 from the first linear transport line 110 to the second linear transport line 120 and/or from the second linear transport line 120 to the first linear transport line 110.
  • the first linear transport line 110 and the second linear transport line 120 can extend essentially parallel to each other.
  • One or more first process stations 140 can be provided at the first linear transport line 110.
  • the moveable substrate support 20 is a shuttle.
  • the moveable substrate support 20, and particularly the shuttle can be configured to support and transfer the substrate 10, e.g., along the first linear transport line 110 and optionally through the one or more first process stations 140.
  • the moveable substrate support 20 can include a support and/or a printing nest, wherein the printing nest provides the support for the substrate 10.
  • the first direction 1 and the second direction are opposite directions.
  • the first direction 1 can be a forward direction and the second direction 2 can be a return direction.
  • the first linear transport line 110 can be a forward transport line and the second linear transport line 120 can be a return transport line.
  • the first direction 1 and/or the second direction 2 can be essentially horizontal directions.
  • the first linear transport line 110 and the second linear transport line 120 are arranged in an essentially horizontal plane.
  • the second linear transport line 120 is arranged next to the first linear transport line 110, for example, in the essentially horizontal plane.
  • the first linear transport line 110 is configured for transportation of the moveable substrate support 20 along a first transport path, such as a linear transport path, lying in the essentially horizontal plane.
  • the second linear transport line 120 can be configured for transportation of the moveable substrate support 20 along a second transport path, such as a linear transport path, in the essentially horizontal plane.
  • the "horizontal direction” or “horizontal orientation” relates to a substantially horizontal orientation e.g. of movement of the moveable substrate support along the respective transport lines, wherein a deviation of a few degrees, e.g. up to 10° or even up to 15°, from an exact horizontal movement is still considered as “substantially horizontal”.
  • the vertical direction 3 can be substantially parallel to the force of gravity.
  • the transfer arrangement 130 is configured for transferring the moveable substrate support 20 from the first linear transport line 110 to the second linear transport line 120 and/or from the second linear transport line 120 to the first linear transport line 110.
  • the transfer arrangement 130 includes a displacement device configured for displacing the moveable substrate support 20.
  • the transfer arrangement 130 is configured for detaching the moveable substrate support 20 from the first linear transport line 110, moving the moveable substrate support 20 from the first linear transport line 110 to the second linear transport line 120, and attaching the moveable substrate support 20 to the second linear transport line 120.
  • the present disclosure is not limited thereto and other transfer arrangements can be used that are configured for moving the moveable substrate support 20 between the first linear transport line 110 and the second linear transport line 120.
  • a system for processing of a substrate can include the apparatus 100 and the one or more first process stations 140 provided at the first linear transport line 110 and/or one or more second process stations (reference numeral "142" in FIG. 2) at the second linear transport line 120.
  • FIG. 1 exemplarily illustrates one first process station 140 provided at the first linear transport line 110.
  • the present disclosure is not limited thereto and more than one first process stations 140, such as multiple first process stations, can be provided at the first linear transport line 110.
  • the multiple process stations can be sequentially arranged along the first linear transport line 110.
  • the one or more first process stations 140 and/or the one or more second process stations are selected from the group including: a substrate loading station, a substrate unloading station, a printing station, an alignment station, a buffer station, an inspection station, a heating station, and any combinations thereof.
  • the substrate loading station can be configured for loading a substrate, such as an unprocessed substrate, on the moveable substrate support 20 which is to be transported along the first linear transport line 110.
  • the substrate unloading station can be configured for unloading a substrate, such as a processed substrate, from the moveable substrate support 20, for example, after the moveable substrate support 20 has travelled along the first linear transport line 110 and before the moveable substrate support 20 is transferred from the first linear transport line 110 to the second linear transport line 120.
  • the system is configured for substrate processing, such as screen printing, inkjet printing, laser processing (e.g., laser scribing), flexo printing, gravure printing, tampography, laser transfer printing, and the like.
  • the system can be configured for substrate processing using techniques capable to transfer a pattern into or onto the substrate.
  • the system can be configured for printing, such as screen printing.
  • the printing station may include one or more printing heads and one or more screen devices for screen printing of patterns such as fingers and/or busbars on the substrate 10 for the production of a solar cell.
  • the screen device defines a pattern or features corresponding to a structure to be printed on the substrate 10, wherein the pattern or features may include at least one of holes, slots, incisions or other apertures.
  • the system includes one or more process locations.
  • the one or more process locations can be provided by the above-mentioned one or more first process stations 140 and/or the one or more second process stations.
  • the moveable substrate support 20 can move, e.g., stepwise, between the one or more process locations.
  • the moveable substrate support 20 can move stepwise along the first linear transport line 110, wherein the number of steps, i.e., a number n of process locations, can be 3 or more.
  • the present disclosure is not limited thereto and any suitable number of process locations can be provided along the first linear transport line 110 and/or the second linear transport line 120.
  • a number n of process locations can be provided at the first linear transport line 110 and optionally a number of m process locations can be provided at the second linear transport line 120.
  • n and m can be equal. In other implementations, n and m can be different.
  • substrate processing and/or substrate handling can be performed, such as at least one of printing and inspection of the substrate 10 and/or of line patterns printed on the substrate 10.
  • a first process location can be for inspection and an optional alignment of the substrate 10
  • a second process location following the first process location can be a printing location
  • a third process location following the second process location can be another inspection location for inspection of the line patterns printed on the substrate 10.
  • a first process location of the one or more process locations at the first linear transport line 110 can be a substrate loading location.
  • the substrate loading location can be provided by a respective substrate loading station.
  • a last process location of the one or more process locations at the first linear transport line 110 can be a substrate unloading location.
  • the substrate unloading location can be provided by a respective substrate unloading station.
  • the substrate unloading location can be provided between the first process station 140 and the transfer arrangement 130.
  • the (processed) substrate 10 can be removed or unloaded from the moveable substrate support 20 before the moveable substrate support 20 is transferred from the first linear transport line 110 to the second linear transport line 120.
  • the second linear transport line 120 is configured for transportation of empty moveable substrate supports, i.e., moveable substrate supports having no substrate positioned thereon.
  • the empty moveable substrate supports can be returned to a start position, and particularly to the substrate loading location such that another substrate can be loaded onto the moveable substrate support 20 which can then undergo processing while being transported along the first linear transport line 110.
  • the first linear transport line 110 can include a first track or first guide rail and/or the second linear transport line 120 can include a second track second guide rail.
  • the moveable substrate support 20 can be configured to move along the respective tracks or guide rails.
  • the moveable substrate support 20 can be configured for supporting and transporting the substrate 10 along the respective tracks or guide rails.
  • the first linear transport line 110 and/or the second linear transport line 120 is provided by respective tracks or guide rails.
  • the apparatus 100 further includes one or more drive devices configured for moving the moveable substrate support 20 along the first linear transport line 110 and/or the second linear transport line 120.
  • a first drive device also referred to as "forward transfer mechanism” of the one or more drive devices can be configured for moving the moveable substrate support 20 along the first linear transport line 110 in the first direction 1.
  • a second drive device also referred to as "backward transfer mechanism" of the one or more drive devices can be configured for moving the moveable substrate support 20 along the second linear transport line 120 and the second direction 2.
  • the same drive device can be used for moving the moveable substrate support 20 along both the first linear transport line 110 and the second linear transport line 120.
  • the same drive device can be used as a forward transfer mechanism and a back transfer mechanism or recirculation/return mechanism.
  • the one or more drive devices can be selected from the group consisting of a linear motor, a belt-driven motor, a pneumatic device, and any combination thereof.
  • the first linear transport line 110 and the second linear transport line 120 can be operated independently or synchronously.
  • the apparatus 100 can be configured for transportation of a plurality of moveable substrate supports. The plurality of moveable substrate supports can move in a synchronized or un-synchronized manner along the first linear transport line 110 and the second linear transport line 120.
  • FIG. 2 shows a schematic top view of an apparatus 200 for transportation of a substrate 10 e.g. used in the manufacture of a solar cell according to further embodiments described herein.
  • the apparatus of FIG. 2 is similar to apparatus 100 shown in FIG 1, and a description of similar or identical aspects is not repeated.
  • the transfer arrangement is configured for transferring the moveable substrate support 20 from the second linear transport line 120 to the first linear transport line 110.
  • the transfer arrangement includes a first transfer unit 131 configured for transferring the moveable substrate support 20 from the first linear transport line 110 to the second linear transport line 120.
  • the transfer arrangement 130 can include a second transfer unit 133 configured for transferring the moveable substrate support 20 from the second linear transport line 120 to the first linear transport line 110.
  • the first transfer unit 131 and the second transfer unit 133 can be spaced apart from each other with one or more process stations, such as the one or more first process stations 140 and/or the one or more second process stations 142, arranged between the first transfer unit 131 and the second transfer unit 133.
  • the first linear transport line 110 and the second linear transport line 120 can extend at least partially, and specifically entirely, between the first transfer unit 131 and the second transfer unit 133.
  • the first linear transport line 110, the second linear transport line 120, the first transfer unit 131, and the second transfer unit 133 can be configured to provide a loop-shaped or ring-shaped transport path for the moveable substrate support 20.
  • the moveable substrate support 20 can be recirculated, for example, after the processed substrate has been unloaded from the moveable substrate support 20, and transferred to the first linear transport line 110 for transportation of another substrate along the first linear transport line 110.
  • the first linear transport line 110 includes a first end portion and a second end portion opposite the first portion.
  • the second linear transport line 120 can include another first end portion and another second end portion opposite the other first end portion.
  • One or more process stations such as the one or more first process stations 140, can be arranged between the first end portion and the second end portion of the first linear transport line 110.
  • one or more second process stations 142 can be arranged along the second linear transport line 120.
  • One or more process stations, such as the one or more second process stations 142 can be arranged between the other first end portion and the other second end portion of the second linear transport line 120.
  • the first transfer unit 131 connects the first end portion of the first linear transport line 110 and the other first end portion of the second linear transport line 120 for transferring the moveable substrate support 20 from the first linear transport line 110 to the second linear transport line 120, and/or vice versa.
  • the second transfer unit 133 connects the second end portion of the first linear transport line 110 and the other second end portion of the second linear transport line 120 for transferring the moveable substrate support 20 from the second linear transport line 120 to the first linear transport line 110, and/or vice versa.
  • the first transfer unit 131 and/or the second transfer unit 133 includes a connection transport line configured for transportation of the moveable substrate support 20 between the first linear transport line 110 and the second linear transport line 120.
  • the first transfer unit 131 can include a first connection transport line configured for transportation of the moveable substrate support 20 at least from the first linear transport line 110 to the second linear transport line 120.
  • the second transfer unit 133 can include a second connection transport line configured for transportation of the moveable substrate support 20 at least from the second linear transport line 120 at least to the first linear transport line 110.
  • the transfer arrangement 130 includes a displacement device configured for detaching the moveable substrate support 20 from the first linear transport line 110, moving the moveable substrate support 20 from the first linear transport line 110 to the second linear transport line 120, and attaching the moveable substrate support 20 to the second linear transport line 120.
  • the first transfer unit 131 can have a first displacement device and/or the second transfer unit 133 can have a second displacement device.
  • the second displacement device can be configured for detaching the moveable substrate support 20 from the second linear transport line 120, moving the moveable substrate support 20 from the second linear transport line 120 to the first linear transport line 110, and attaching the moveable substrate support 20 to the first linear transport line 110.
  • the displacement device can be configured for mechanically gripping the moveable substrate support 20 for moving the moveable substrate support 20 between the first linear transport line 110 and the second linear transport line 120.
  • the displacement device can particularly be configured for laterally displacing the moveable substrate support 20 from the first linear transport line 110 to the second linear transport line 120 and/or from the second linear transport line 120 to the first linear transport line 110.
  • the displacement device can include a robot arm configured for gripping the moveable substrate support 20 for transportation of the moveable substrate support 20 between the first linear transport line 110 and the second linear transport line 120.
  • the transfer arrangement 130 includes a flipper device configured for inverting an orientation of the moveable substrate support 20.
  • the flipper device can be configured for moving the moveable substrate support 20 from the first linear transport line 110 to the second linear transport line 120 and/or from the second linear transport line 120 to the first linear transport line 110 by flipping or flipping movement of the moveable substrate support 20.
  • FIG. 3 shows a schematic view of an apparatus 200 for transportation of a substrate 10 e.g. used in the manufacture of a solar cell according to yet further embodiments described herein.
  • the first linear transport line 210 and the second linear transport line 220 are arranged in an essentially vertical pline.
  • the second linear transport line 220 is arranged below the first linear transport line 210, for example, in the essentially vertical pline.
  • the first linear transport line 210 is arranged above the second linear transport line 220 when seen from the side.
  • the first linear transport line 210 is configured for transportation of the moveable substrate support 20 along a linear transport path, such as a linear horizontal transport path.
  • the second linear transport line 220 can be configured for transportation of the moveable substrate support 20 along a linear transport path, such as a linear horizontal transport path.
  • the first linear transport line 210 and/or the second linear transport line 220 can include, or be, linear rails or linear tracks.
  • the transfer arrangement 230 can be configured for vertically moving the moveable substrate support 20 between the first linear transport line 210 and the second linear transport line 220.
  • the moveable substrate support 20 can be moved by a downward movement from the first linear transport line 210 to the second linear transport line 220.
  • the moveable substrate support 20 can be moved by an upward movement from the second linear transport line 220 to the first linear transport line 210.
  • FIG. 4 shows a schematic view of an apparatus 250 for transportation of a substrate e.g. used in the manufacture of a solar cell according to other embodiments described herein.
  • the transfer arrangement of the apparatus 250 can include the first transfer unit 231 and the second transfer unit 233 as described with respect to FIG. 2.
  • the second linear transport line 220 includes a linear track having a first side and a second side opposite the first side.
  • the second linear transport line 220 can be configured for transportation of the moveable substrate support 20 on the first side and/or the second side of the linear track.
  • the first side can be an upper side (or top side) of the second linear transport line 220 e.g. when seen from the side.
  • the second side can be a lower side of the second linear transport line 220.
  • a plurality of moveable substrate supports can simultaneously move on the first side and the second side. A number of moveable substrate supports that can be transported by the second linear transport line 220 can be increased.
  • the first linear transport line 210 can include another linear track having another first side and another second side opposite the other first side.
  • the first linear transport line 210 can be configured for transportation of the moveable substrate support 20 on the other first side and/or the other second side of the linear track.
  • the other first side can be an upper side (or top side) of the first linear transport line 210 e.g. when seen from the side.
  • the other second side can be a lower side of the first linear transport line 210.
  • a plurality of moveable substrate supports can simultaneously move on the other first side and the other second side. A number of moveable substrate supports that can be transported and/or processed can be increased.
  • FIGs. 5 A to C show examples of arrangements of linear transport line(s) and process stations according to embodiments described herein.
  • FIG. 5A shows an example of a multi-line arrangement 300 with dual side access.
  • the multi-line arrangement 300 can include the apparatus for transportation according to the embodiments described herein.
  • the exemplary multi-line arrangement 300 includes the first linear transport line 310 and the second linear transport line 320, which can be arranged in parallel.
  • One or more first process stations 340 are provided at the first linear transport line 310 and one or more second process stations 342 are provided at the second linear transport line 320.
  • At least one first process station of the one or more first process stations 340 and at least one second process station of the one or more second process stations 342 are arranged next or adjacent to each other.
  • the at least one first process station can be accessed from a first side of the multi-line arrangement 300 as indicated with the upper arrow.
  • the at least one second process station can be accessed from a second side of the multi-line arrangement 300 opposite the first side as indicated with the lower arrow.
  • FIG. 5B shows another example of a multi-line arrangement 400 with single side access.
  • the multi-line arrangement 400 can include the apparatus for transportation according to the embodiments described herein.
  • the exemplary multi-line arrangement 400 includes the first linear transport line 310 and the second linear transport line 320, which can be arranged in parallel.
  • One or more first process stations 440 are provided at the first linear transport line 310 and one or more second process stations 442 are provided at the second linear transport line 320.
  • At least one first process station of the one or more first process stations 440 and at least one second process station of the one or more second process stations 442 are arranged offset with respect to each other along the first direction 1, which can be a transport direction provided by the first linear transport line 310. Both the at least one first process station and the at least one second process station can be accessed from the same side of the multi-line arrangement 400 as indicated with the lower arrows.
  • FIG. 5C shows an example of a single-line arrangement 500.
  • the single-line arrangement 500 can include the apparatus for transportation according to embodiments described herein.
  • the exemplary single-line arrangement 500 includes the first linear transport line 510.
  • Two or more process stations such as a first process station 540 and a second process station 542, are provided at the first linear transport line 510.
  • the one or more process stations can be sequentially arranged along the first linear transport line 510, for example, in the first direction 1.
  • the two or more process stations can be accessed from the same side of the single-line arrangement 500, as indicated with the lower arrows.
  • FIG. 6 shows a flowchart of a method 600 for transportation of a substrate e.g. used in the manufacture of a solar cell according to embodiments described herein.
  • the method 600 can be implemented using the apparatus and system according to the present disclosure.
  • the method 600 includes in block 610 a transporting of a moveable substrate support along a first linear transport line in a first direction, in block 620 a transferring of the moveable substrate support from the first linear transport line to a second linear transport line, and in block 630 a transporting of the moveable substrate support along the second linear transport line in a second direction different from the first direction.
  • One or more first process stations such as one or more printing stations and/or one or more inspection stations, can be arranged along the first linear transport line.
  • the moveable substrate support can be recirculated or returned using the second linear transport line, for example, after a substrate that has been processed during its movement along the first linear transport line has been unloaded from the moveable substrate support.
  • the method 600 further includes a transferring of the moveable substrate support from the second linear transport line to the first linear transport line, and a transporting of the moveable substrate support along the first linear transport line in the first direction.
  • the moveable substrate support can be moved forward along the first linear transport line from a start position, which can be the substrate loading location, to an end position, which can be at or after the substrate unloading location, and can then be returned to the start position using the second linear transport line.
  • the present disclosure provides a return path for the moveable substrate supports such that the moveable substrate supports having travelled through one or more process stations can return to a start position and travel again along the transport line.
  • a movement pattern of the moveable substrate supports can be improved and/or a throughput of a system for substrate processing can be increased.

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

L'invention concerne un appareil (100) pour le transport d'un substrat (10). L'appareil (100) comprend une première ligne de transport linéaire (110) configurée pour le transport d'un support de substrat mobile (20) dans une première direction (1), une seconde ligne de transport linéaire (120) configurée pour le transport du support de substrat mobile (20) dans une seconde direction (2) différente de la première direction (1), et un système de transfert (130) pour transférer le support de substrat mobile (20) au moins de la première ligne de transport linéaire (110) à la deuxième ligne de transport linéaire (120).
PCT/EP2016/074050 2016-10-07 2016-10-07 Appareil pour transporter un substrat, système pour traiter un substrat, et procédé de transport de substrat WO2018065067A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
PCT/EP2016/074050 WO2018065067A1 (fr) 2016-10-07 2016-10-07 Appareil pour transporter un substrat, système pour traiter un substrat, et procédé de transport de substrat

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/EP2016/074050 WO2018065067A1 (fr) 2016-10-07 2016-10-07 Appareil pour transporter un substrat, système pour traiter un substrat, et procédé de transport de substrat

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WO2018065067A1 true WO2018065067A1 (fr) 2018-04-12

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Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009164426A (ja) * 2008-01-08 2009-07-23 Shimadzu Corp プラズマｃｖｄ装置
US20150179395A1 (en) * 2012-02-14 2015-06-25 Ulvac, Inc. Ion beam irradiation device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009164426A (ja) * 2008-01-08 2009-07-23 Shimadzu Corp プラズマｃｖｄ装置
US20150179395A1 (en) * 2012-02-14 2015-06-25 Ulvac, Inc. Ion beam irradiation device

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