WO2018000983A1 - 触控屏及其制作方法、显示装置 - Google Patents

触控屏及其制作方法、显示装置 Download PDF

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WO2018000983A1
WO2018000983A1 PCT/CN2017/085127 CN2017085127W WO2018000983A1 WO 2018000983 A1 WO2018000983 A1 WO 2018000983A1 CN 2017085127 W CN2017085127 W CN 2017085127W WO 2018000983 A1 WO2018000983 A1 WO 2018000983A1
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pattern layer
auxiliary
layer
manufacturing
graphene
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English (en)
French (fr)
Inventor
曾亭
谢涛峰
杜彪
李可丰
颜亮
胡海峰
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BOE Technology Group Co Ltd
Hefei Xinsheng Optoelectronics Technology Co Ltd
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BOE Technology Group Co Ltd
Hefei Xinsheng Optoelectronics Technology Co Ltd
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Priority to US15/561,792 priority Critical patent/US20180246606A1/en
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    • GPHYSICS
    • G06COMPUTING OR CALCULATING; COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0443Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a single layer of sensing electrodes
    • GPHYSICS
    • G06COMPUTING OR CALCULATING; COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • GPHYSICS
    • G06COMPUTING OR CALCULATING; COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F1/00Details not covered by groups G06F3/00 - G06F13/00 and G06F21/00
    • G06F1/16Constructional details or arrangements
    • G06F1/1613Constructional details or arrangements for portable computers
    • G06F1/1633Constructional details or arrangements of portable computers not specific to the type of enclosures covered by groups G06F1/1615 - G06F1/1626
    • G06F1/1637Details related to the display arrangement, including those related to the mounting of the display in the housing
    • G06F1/1643Details related to the display arrangement, including those related to the mounting of the display in the housing the display being associated to a digitizer, e.g. laptops that can be used as penpads
    • GPHYSICS
    • G06COMPUTING OR CALCULATING; COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/0412Digitisers structurally integrated in a display
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2201/00Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
    • G02F2201/12Constructional arrangements not provided for in groups G02F1/00 - G02F7/00 electrode
    • GPHYSICS
    • G06COMPUTING OR CALCULATING; COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices

Definitions

  • Embodiments of the present disclosure relate to a touch screen, a method of fabricating the same, and a display device.
  • the Touch Screen Panel With the rapid development of display technology, the Touch Screen Panel has gradually spread throughout people's lives.
  • the touch screen can be divided into: resistive, capacitive, infrared and surface acoustic wave, electromagnetic, vibration wave induction and frustrated total internal reflection optical induction.
  • the capacitive touch screen has become a new favorite in the industry due to its high sensitivity, long life and high light transmittance.
  • OGS One Glass Solution
  • touch screen is a technology that directly forms a capacitive touch sensor on a protective glass.
  • a piece of glass plays a dual role in protecting glass and touch sensors.
  • the main weakness of OGS technology lies in The glass substrate is not hard enough to break the screen.
  • OPS One Plastic Solution
  • OPS mainly prepares the touch sensor on a transparent plastic substrate, and finally connects the touch sensor to the display module to form a plastic cover.
  • OPS technology lies in cost savings, which can be achieved on wearable touch, but the current difficulty is that the plastic substrate is not resistant to high temperatures, and it is relatively soft and difficult to operate during production.
  • Embodiments of the present disclosure provide a method of fabricating a touch screen, comprising: forming an auxiliary film layer on a first substrate, wherein the auxiliary film layer includes a catalyst capable of accelerating a rate of graphene formation reaction; An auxiliary film layer to obtain an auxiliary pattern layer having a first pattern; a graphene pattern layer formed on the auxiliary pattern layer, the graphene pattern layer having a second pattern; a base film formed on the graphene pattern layer; And removing the first substrate and the auxiliary pattern layer.
  • the second pattern is substantially identical to the first pattern.
  • the graphene pattern layer is configured as a touch electrode layer.
  • preparing a graphene pattern layer on the auxiliary pattern layer comprises: growing graphene on the auxiliary pattern layer by a chemical vapor deposition method at a temperature ranging from 900 to 1100 ° C Pattern layer.
  • the base film is a flexible plastic base film
  • forming a base film on the graphene pattern layer includes: dissolving a powdered plastic in an organic solvent to form a solution; coating the solution On the graphene pattern layer; drying the solution to form the base film.
  • the removing the first substrate and the auxiliary pattern layer comprises: immersing at least the auxiliary pattern layer in a ferric chloride solution to cause the first substrate and the auxiliary pattern layer Detached from the graphene pattern layer.
  • the material of the auxiliary film layer includes a metal or a metal compound.
  • the material of the auxiliary film layer comprises one or more selected from the group consisting of gold, silver, copper, zinc, iron, cobalt, and nickel.
  • the auxiliary film layer is a copper film or a nickel film, and the auxiliary film layer has a thickness of 300 nm to 500 nm.
  • the first substrate is a quartz substrate or an alumina substrate.
  • the flexible base film comprises a polyacrylic plastic.
  • the fabricating method further includes transferring the base film and the graphene pattern layer thereon onto the flexible substrate after removing the first substrate and the auxiliary pattern layer.
  • Another embodiment of the present disclosure provides a touch screen manufactured by the above manufacturing method, comprising: a graphene pattern layer configured as a touch electrode layer.
  • Another embodiment of the present disclosure provides a display device including the above touch screen.
  • the manufacturing method of the touch screen provided by the embodiment of the present disclosure is easy to operate and can save cost.
  • FIG. 1 is a flowchart of a method for fabricating a touch screen according to an embodiment of the present disclosure
  • FIG. 2 is a schematic diagram of a manufacturing process of a touch screen according to an embodiment of the present disclosure.
  • Graphene is a two-dimensional crystal composed of carbon atoms and having only one atomic thickness. Graphene materials can be made very thin, while graphene materials are also tough materials with a breaking strength 200 times higher than steel. At the same time, the graphene material has good elasticity, and the stretching range can reach 20% of its own size.
  • the most promising application of graphene is to become a substitute for silicon, making ultra-micro transistors for the production of future supercomputers. By replacing silicon with graphene, computer processors can run hundreds of times faster.
  • graphene is almost completely transparent, absorbing only 2.3% of light. On the other hand, it is very dense, and even the smallest gas atoms (deuterium atoms) cannot penetrate.
  • Embodiments of the present disclosure relate to the use of graphene materials on touch products.
  • an embodiment of the present disclosure provides a method for manufacturing a touch screen, as shown in FIG. 1 and FIG. 2, including:
  • the auxiliary film layer 11 includes a catalyst capable of accelerating the rate of graphene formation reaction.
  • the first substrate 10 is selected from a hard substrate that is resistant to high temperatures and is easy to handle, such as a quartz substrate or an alumina substrate.
  • the catalyst required for preparing graphene may be a metal or a metal compound such as one or more of gold, silver, copper, zinc, iron, cobalt, nickel, but should not be limited to the above, as long as it can satisfy the graphite
  • the olefin is grown, and in step 103, the auxiliary pattern layer 11' can be used to grow the desired graphene pattern layer 12.
  • depositing an auxiliary film layer 11 on the first substrate 10 may include depositing a 300 nm to 500 nm Cu film or a Ni film as the auxiliary film layer 11 on the quartz substrate or the aluminum oxide substrate.
  • the auxiliary film layer 11 is patterned by a patterning process to obtain an auxiliary pattern layer.
  • the patterning process includes the step of patterning the film layer, for example, a common photolithography process, also known as a yellow light process, which may include: cleaning and drying, coating, spin coating, soft baking, and alignment exposure. , post-baking, developing, Hard baking, etching, testing and other steps.
  • the auxiliary film layer 11 is patterned.
  • a pattern of a photoresist (similar to a touch electrode pattern of a single-layer structure of OGS) is formed by exposure and development, and a corresponding touch pattern of the auxiliary pattern layer 11' is etched by a corresponding etching solution.
  • the touch pattern formed on the auxiliary film layer is consistent with the pattern of the touch electrode layer capable of implementing the touch function.
  • a graphene pattern layer 12 is formed on the patterned auxiliary pattern layer 11'. Since the auxiliary pattern layer 11' includes a catalyst required for preparing graphene, in the induced catalysis of the catalyst, graphene is formed only in a place where a catalyst is distributed, and finally, patterned graphite is directly formed on the auxiliary pattern layer 11'.
  • the olefin pattern layer 12, that is, the graphene pattern layer 12 has a touch pattern substantially identical to the auxiliary pattern layer 11'.
  • this step may be performed by directly growing the graphene pattern layer 12 on the auxiliary pattern layer 11' formed of a Cu thin film or a Ni thin film by a CVD (Chemical Vapor Deposition) method at a temperature ranging from 900 to 1100 °C.
  • CVD Chemical Vapor Deposition
  • the base film 13 is coated on the graphene pattern layer 12, and the implementation is not limited.
  • the flexible base film 13 may be a flexible plastic base film such as a polyacrylic plastic.
  • the flexible base film 13 is formed as a substrate of the graphene pattern layer 12, so that the subsequent steps of transferring the graphene pattern layer can be performed, and the touch flexibility can also be achieved.
  • the flexible base film in this step may be a plastic base film.
  • this step may be performed by dissolving the powdered plastic in an organic solvent to form a solution, and coating the solution in the above step 103. A graphene pattern layer 12 is obtained; and then dried to form a flexible base film 13.
  • the process conditions may be: dissolving a solution of an acid plastic (PMMA) powder and an organic solvent into a solution, and coating the same on the first substrate 10 on which the graphene touch pattern is formed, and the thickness of the coating is 0.4 ⁇ . 0.7mm.
  • PMMA acid plastic
  • the first substrate 10 and the auxiliary film layer 11 are removed.
  • the auxiliary film layer 11 and the first substrate 10 are removed, and the implementation manner is not limited.
  • the first substrate 10 subjected to the steps 101 to 104 may be immersed in the ferric chloride solution to peel off the first substrate 10 and the auxiliary film layer 11 from the graphene pattern layer 12, and the immersion time is according to the auxiliary film layer 11.
  • determining the concentration of the ferric chloride solution for example, soaking for more than ten hours, in order to be able to etch away the auxiliary film layer 11 to remove the first substrate 10.
  • a flexible base film 13 is obtained (for example, polymethyl methacrylate, polymethyl methacrylate, PMMA) and patterned graphene cover (Cover Lens).
  • Steps 104 and 105 transfer the graphene pattern layer from the first substrate 10 to the transparent flexible base film 13 for flexibility, and solve the problem of poor operation when the plastic substrate is fabricated.
  • the transfer process is not limited to the above, and can be implemented, for example, by:
  • step 104 a thinner post-cure is applied (ie, a thin flexible base film 13 is formed), and then the immersion in the ferric chloride solution for more than ten hours to etch away the auxiliary film layer 11 is carried out.
  • the flexible base film of the patterned graphene is transferred onto a pre-prepared flexible substrate.
  • a touch electrode is prepared by using a graphene material, and the process is optimized to implement OPS, a single-layer graphene touch pattern is prepared, and the graphene touch pattern is transferred from the first substrate 10 to the flexible base.
  • the touch and cover protection functions can solve the problem of high cost of OGS tempered glass, and provide a good solution in the field of wearable touch and flexible touch.
  • the embodiment of the present disclosure further provides a touch screen prepared by the above manufacturing method according to the claim, the touch screen comprising a graphene pattern layer 12 having a touch pattern.
  • the touch screen can realize flexible display, and at the same time, higher transmittance can be obtained due to the use of graphene material.
  • the embodiment of the present disclosure further provides a display device including the touch screen described above.
  • the display device can achieve flexible display while also achieving higher display quality due to the use of graphene material.
  • the display device may be any product or component having a display function, such as a liquid crystal panel, an electronic paper, an OLED panel, a mobile phone, a tablet computer, a television, a display, a notebook computer, a digital photo frame, a navigator, and the like.

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  • Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Human Computer Interaction (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Carbon And Carbon Compounds (AREA)

Abstract

一种触控屏及其制作方法、显示装置。该触控屏的制作方法,包括:在第一基板(10)上形成辅助膜层(11),其中,辅助膜层(11)包括能够加快石墨烯形成反应的速率的催化剂;图形化所述辅助膜层(11)以获得具有第一图案的辅助图案层(11');在辅助图案层(11')上形成石墨烯图案层(12),石墨烯图案层(12)具有第二图案;在石墨烯图案层(12)上形成基膜(13);以及去除第一基板(10)以及辅助图案层(11')。该触控屏的制作方法易于操作且能够节省成本。

Description

触控屏及其制作方法、显示装置 技术领域
本公开实施例涉及一种触控屏及其制作方法、显示装置。
背景技术
随着显示技术的飞速发展,触控屏(Touch Screen Panel)已经逐渐遍及人们的生活中。目前,按照工作原理触控屏可以分为:电阻式、电容式、红外线式以及表面声波式、电磁式、振波感应式以及受抑全内反射光学感应式等。其中,电容式触控屏凭借高灵敏度、长寿命、高透光率等优点,成为业内为新宠。
OGS(One Glass Solution,单玻璃方案)触控屏是在保护玻璃上直接形成电容式触控传感器的一种技术,一块玻璃同时起到保护玻璃和触摸传感器的双重作用,OGS技术的主要弱势在于玻璃基板硬度不够,不抗摔容易碎屏。OPS(One Plastic Solution,单塑料板方案)技术可以解决这一问题,OPS主要将触控传感器制备在透明的塑料基板上,最后将触控传感器与显示模组连接,形成塑料盖板,OPS技术优势在于节约成本,可在可穿戴触控上得到实现,但目前的困难是塑料基板不耐高温,并且在制作时由于比较软不好操作。
发明内容
本公开的实施例提供一种触控屏的制作方法,包括:在第一基板上形成辅助膜层,其中,所述辅助膜层包括能够加快石墨烯形成反应的速率的催化剂;图形化所述辅助膜层以获得具有第一图案的辅助图案层;在所述辅助图案层上形成石墨烯图案层,所述石墨烯图案层具有第二图案;在所述石墨烯图案层上形成基膜;以及去除所述第一基板以及所述辅助图案层。
在一个示例中,所述第二图案与所述第一图案实质上一致。
在一个示例中,所述石墨烯图案层构造为触摸电极层。
在一个示例中,在所述辅助图案层上制备石墨烯图案层,包括:采用化学气相沉积法在900~1100℃的温度范围内在所述辅助图案层上生长石墨烯 图案层。
在一个示例中,所述基膜为柔性塑料基膜,所述在所述石墨烯图案层上形成基膜,包括:将粉末状塑料溶解于有机溶剂中以形成溶液;将所述溶液涂布在所述石墨烯图案层上;烘干所述溶液,以形成所述基膜。
在一个示例中,所述去除所述第一基板以及所述辅助图案层,包括:通过在三氯化铁溶液中浸泡至少所述辅助图案层,使所述第一基板以及所述辅助图案层自所述石墨烯图案层上脱离。
在一个示例中,所述辅助膜层的材料包括金属或金属化合物。
在一个示例中,所述辅助膜层的材料包括选自下述组中的一种或几种:金、银、铜、锌、铁、钴、镍。
在一个示例中,所述辅助膜层为铜膜或者镍膜,所述辅助膜层的厚度为300nm~500nm。
在一个示例中,所述第一基板为石英基板或氧化铝基板。
在一个示例中,所述柔性基膜包括聚丙烯酸类塑料。
在一个示例中,所述制作方法还包括:去除所述第一基板以及所述辅助图案层之后,将所述基膜及其上的石墨烯图案层转移到柔性基板上。
本公开另一实施例提供一种采用上述制作方法制成的触控屏,包括:石墨烯图案层,构造为触控电极层。
本公开又一实施例提供一种显示装置,包括上述的触控屏。本公开实施例提供的触控屏的制作方法易于操作且能够节省成本。
附图说明
为了更清楚地说明本公开实施例的技术方案,下面将对实施例的附图作简单地介绍,显而易见地,下面描述中的附图仅仅涉及本公开实施例的一些实施例,而非对本公开实施例的限制。
图1为本公开实施例提供的触控屏的制作方法流程图;
图2为本公开实施例提供的触控屏的制作过程示意图。
具体实施方式
为使本公开实施例的目的、技术方案和优点更加清楚,下面将结合本公 开实施例的附图,对本公开实施例的技术方案进行清楚、完整地描述。显然,所描述的实施例是本公开实施例的一部分实施例,而不是全部的实施例。基于所描述的本公开实施例的实施例,本领域普通技术人员在无需创造性劳动的前提下所获得的所有其他实施例,都属于本公开实施例保护的范围。
实施例
石墨烯(Graphene)是由碳原子组成的只有一层原子厚度的二维晶体。石墨烯材料可以做的很薄,同时石墨烯材料也是强韧的材料,断裂强度比钢材还要高200倍。同时石墨烯材料又有很好的弹性,拉伸幅度能达到自身尺寸的20%。石墨烯目前最有潜力的应用是成为硅的替代品,制造超微型晶体管,用来生产未来的超级计算机。用石墨烯取代硅,计算机处理器的运行速度将会快数百倍。另外,石墨烯几乎是完全透明的,只吸收2.3%的光。另一方面,它非常致密,即使是最小的气体原子(氦原子)也无法穿透。这些特征使得它非常适合作为透明电子产品的原料,如透明的触摸显示屏、发光板和太阳能电池板。
本公开实施例涉及一种石墨烯材料在触控产品上的应用。例如,本公开的实施例提供一种触控屏的制作方法,如图1和图2所示,包括:
101、在第一基板10上沉积辅助膜层11;
其中,辅助膜层11包括能够加快石墨烯形成反应的速率的催化剂。第一基板10选择耐高温易操作的硬质基板如石英基板或氧化铝基板等。制备石墨烯所需要的催化剂可以为金属或金属化合物,例如金、银、铜、锌、铁、钴、镍中的一种或几种,但不应限制于上述几种,只要能满足促使石墨烯生长,在步骤103中利用辅助图案层11’能够生长符合要求的石墨烯图案层12即可。
例如,本步骤中,在第一基板10上沉积一层辅助膜层11可包括:在石英基板或氧化铝基板上沉积300nm~500nm Cu薄膜或者Ni薄膜作为辅助膜层11。
102、图形化辅助膜层11以获得辅助图案层;
例如,通过构图工艺,图形化辅助膜层11以获得辅助图案层。所述构图工艺包括使膜层图案化的步骤,例如可以是通常的光刻工艺,又称黄光工艺,可以包括:清洗烘干、涂底、旋涂光刻胶、软烘、对准曝光、后烘、显影、 硬烘、刻蚀、检测等步骤。在本步骤中,对辅助膜层11进行图案化。例如,通过曝光显影形成光刻胶的图形(类似于单层结构的OGS的触控电极图形),再采用相应的刻蚀液刻蚀出对应的辅助图案层11’的触控图形。此处所述在辅助膜层制作出的触控图形,与触控电极层的能实现触控功能的图形一致。
103、在辅助图案层11’上制备石墨烯图案层12;
本步骤中,在图案化的辅助图案层11’上制备石墨烯图案层12。由于辅助图案层11’包括制备石墨烯所需要的催化剂,在该催化剂的诱导催化作用,石墨烯仅在有催化剂分布的地方成膜,因此最终,辅助图案层11’上直接形成图案化的石墨烯图案层12,即石墨烯图案层12具有与辅助图案层11’实质一致的触控图形。
示例性地,本步骤可以执行为:采用CVD(化学气相沉积)法在900~1100℃温度范围内,在Cu薄膜或者Ni薄膜形成的辅助图案层11’上直接生长出石墨烯图案层12。
104、在石墨烯图案层12上形成基膜13;
本步骤中,例如,在石墨烯图案层12上覆一层基膜13,实现方式不做限定。所述柔性基膜13可以是柔性塑料基膜,例如聚丙烯酸类塑料。本步骤中,柔性基膜13形成为石墨烯图案层12的衬底,从而可以执行转移石墨烯图案层的后续步骤,也可以实现触控柔性化。示例性地,本步骤中所述柔性基膜可以为塑料基膜,对应地,本步骤可以执行为:将粉末状塑料溶解于有机溶剂中形成溶液,并将该溶液涂布在经过上述步骤103获得石墨烯图案层12上;然后进行烘干,形成柔性基膜13。例如,工艺条件可以是:采用酸类塑料(PMMA)粉末与有机溶剂溶解成溶液,将其涂布在其上形成有石墨烯触控图形的第一基板10上,涂布的厚度在0.4~0.7mm。
105、去除第一基板10以及辅助膜层11。
本步骤中,将辅助膜层11以及第一基板10去除,实现方式不做限定。例如,可以将经历过步骤101~104的第一基板10在三氯化铁溶液中浸泡,使第一基板10以及辅助膜层11自石墨烯图案层12上剥离,浸泡时间根据辅助膜层11以及三氯化铁溶液浓度确定,例如需浸泡十多个小时以上,以能够刻蚀掉辅助膜层11去掉第一基板10为准。经过三氯化铁溶液浸泡,即获得覆盖有柔性基膜13(例如,聚甲基丙烯酸甲酯,polymethyl methacrylate, PMMA)及图形化石墨烯的盖板(Cover Lens)。
步骤104和步骤105将石墨烯图案层从第一基板10转移至透明的柔性基膜13上,用以实现柔性化,并解决塑料基板制作时不好操作的问题。转移过程并不限于以上所述方式,例如,还可以通过下述方式实现:
步骤104中,涂布较薄的后固化(即形成较薄的柔性基膜13),然后同样采用在三氯化铁溶液中浸泡十多个小时以刻蚀掉辅助膜层11,取出覆盖有图形化石墨烯的柔性基膜转移在预先制备好的柔性基板上。
本公开实施例中,采用石墨烯材料制备触摸电极,并对其工艺过程进行优化来实现OPS,制备单层石墨烯触控图形,并将石墨烯触控图形从第一基板10转移在柔性基膜(例如透明塑料)上,实现触控及盖板保护功能,可以解决目前OGS强化玻璃成本高的问题,同时在可穿戴触控及柔性触控领域提供一种很好的解决方案。
本公开实施例还提供一种采用权利要求上述制作方法制成的触控屏,该触控屏包括具有触控图形的石墨烯图案层12。所述的触控屏可以实现柔性显示,同时还由于使用了石墨烯材料,从而可获得更高的透过率。
本公开实施例还提供一种显示装置,其包括上述的触控屏。所述显示装置可以实现柔性显示,同时还由于使用了石墨烯材料,从而可获得更高的显示品质。所述显示装置可以为:液晶面板、电子纸、OLED面板、手机、平板电脑、电视机、显示器、笔记本电脑、数码相框、导航仪等任何具有显示功能的产品或部件。
在本公开实施例中,所述各步骤的序号并不用于限定各步骤的先后顺序,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,对各步骤的先后变化也在本公开实施例的保护范围之内。
以上所述仅是本公开实施例的示范性实施方式,而非用于限制本公开实施例的保护范围,本公开实施例的保护范围由所附的权利要求确定。
本申请要求于2016年6月29日递交的中国专利申请第201610499991.1号的优先权,在此全文引用上述中国专利申请公开的内容以作为本申请的一部分。

Claims (14)

  1. 一种触控屏的制作方法,包括:
    在第一基板上形成辅助膜层,其中,所述辅助膜层包括能够加快石墨烯形成反应的速率的催化剂;
    图形化所述辅助膜层以获得具有第一图案的辅助图案层;
    在所述辅助图案层上形成石墨烯图案层,所述石墨烯图案层具有第二图案;
    在所述石墨烯图案层上形成基膜;以及
    去除所述第一基板以及所述辅助图案层。
  2. 根据权利要求1所述的制作方法,其中,所述第二图案与所述第一图案实质上一致。
  3. 根据权利要求1或2所述的制作方法,其中,所述石墨烯图案层构造为触摸电极层。
  4. 根据权利要求1至3中任一项所述的制作方法,其中,在所述辅助图案层上制备石墨烯图案层,包括:
    采用化学气相沉积法在900~1100℃的温度范围内在所述辅助图案层上生长石墨烯图案层。
  5. 根据权利要求1至4中任一项所述的制作方法,其中,所述基膜为柔性塑料基膜,所述在所述石墨烯图案层上形成基膜,包括:
    将粉末状塑料溶解于有机溶剂中以形成溶液;
    将所述溶液涂布在所述石墨烯图案层上;
    烘干所述溶液,以形成所述基膜。
  6. 根据权利要求1至5中任一项所述的制作方法,其中,所述去除所述第一基板以及所述辅助图案层,包括:
    通过在三氯化铁溶液中浸泡至少所述辅助图案层,使所述第一基板以及所述辅助图案层自所述石墨烯图案层上脱离。
  7. 根据权利要求1至6中任一项所述的制作方法,其中,所述辅助膜层的材料包括金属或金属化合物。
  8. 根据权利要求1至7中任一项所述的制作方法,其中,所述辅助膜层 的材料包括选自下述组中的一种或几种:金、银、铜、锌、铁、钴、镍。
  9. 根据权利要求1至8中任一项所述的制作方法,其中,所述辅助膜层为铜膜或者镍膜,所述辅助膜层的厚度为300nm~500nm。
  10. 根据权利要求1至9中任一项所述的制作方法,其中,所述第一基板为石英基板或氧化铝基板。
  11. 根据权利要求1至10中任一项所述的制作方法,其中,所述柔性基膜包括聚丙烯酸类塑料。
  12. 根据权利要求1至11中任一项所述的制作方法,还包括:
    去除所述第一基板以及所述辅助图案层之后,将所述基膜及其上的石墨烯图案层转移到柔性基板上。
  13. 一种采用权利要求1至12中任一项所述制作方法制成的触控屏,包括:石墨烯图案层,构造为触控电极层。
  14. 一种显示装置,包括:权利要求13所述的触控屏。
PCT/CN2017/085127 2016-06-29 2017-05-19 触控屏及其制作方法、显示装置 Ceased WO2018000983A1 (zh)

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