WO2017206694A1 - 一种清洁设备及清洁方法 - Google Patents

一种清洁设备及清洁方法 Download PDF

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Publication number
WO2017206694A1
WO2017206694A1 PCT/CN2017/083972 CN2017083972W WO2017206694A1 WO 2017206694 A1 WO2017206694 A1 WO 2017206694A1 CN 2017083972 W CN2017083972 W CN 2017083972W WO 2017206694 A1 WO2017206694 A1 WO 2017206694A1
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WIPO (PCT)
Prior art keywords
substrate
cleaning
residue
expansion
cleaning apparatus
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PCT/CN2017/083972
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English (en)
French (fr)
Inventor
井杨坤
刘飞
徐志伟
车晓盼
陈传辉
Original Assignee
京东方科技集团股份有限公司
合肥京东方光电科技有限公司
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Application filed by 京东方科技集团股份有限公司, 合肥京东方光电科技有限公司 filed Critical 京东方科技集团股份有限公司
Priority to US15/576,542 priority Critical patent/US10710126B2/en
Publication of WO2017206694A1 publication Critical patent/WO2017206694A1/zh

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/02—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by distortion, beating, or vibration of the surface to be cleaned
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0064—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by temperature changes
    • B08B7/0071—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by temperature changes by heating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0064—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by temperature changes
    • B08B7/0092—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by temperature changes by cooling
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/133711—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by organic films, e.g. polymeric films
    • G02F1/133723—Polyimide, polyamide-imide
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1316—Methods for cleaning the liquid crystal cells, or components thereof, during manufacture: Materials therefor

Definitions

  • the present disclosure relates to the field of manufacture of displays, and more particularly to a cleaning apparatus and cleaning method.
  • LCD liquid crystal display
  • the PI film coating process of the Array substrate and the CF substrate is a very important one-step process.
  • the coating apparatus in the related art mainly includes: an equipment frame, a transfer plate, a roller, a roller shaft, and a table.
  • the workbench is used for placing a glass substrate (such as an Array substrate, a CF substrate). After the glass substrate is placed on the workbench, the transfer plate wrapped on the roller is in contact with the glass substrate; at this time, the transmission function of the table is utilized. The glass substrate is driven on the flow line of the table, and the roller is also rotated at the same time, so that the PI liquid on the transfer plate is coated on the glass substrate to form a PI film.
  • the wiping work of the foreign matter on the transfer plate is performed by the worker into the coating device for wiping. This method does not ensure that the residue of the transfer plate is completely removed, which may affect the subsequent coating of the PI film. quality.
  • the technical problem to be solved by the present disclosure is to provide a cleaning device and a cleaning method capable of effectively removing residues left after the substrate is manually cleaned.
  • an embodiment of the present disclosure provides a cleaning apparatus for removing residues on a substrate, including:
  • an excitation device for generating an excitation source of the deformation device, causing the deformation device to deform under the action of the excitation source, thereby causing the substrate to vibrate to drop the residue.
  • the deformation device is an elastic cavity
  • the excitation source is a gas or a liquid
  • the excitation device is configured to transport a gas or a liquid into the elastic cavity to deform the elastic cavity, and drive the The substrate vibrates to detach the residue.
  • the deformation device is an expansion membrane, and the expansion membrane has a coefficient of expansion that varies with temperature, and the excitation source is used to change the temperature of the expansion membrane;
  • the expansion film is thermally expanded and contracted under the action of the excitation source, thereby driving the substrate to vibrate to peel off the residue.
  • At least a portion of the expanded film is made of plastic fibers.
  • the plastic fiber is polyhexamethylene adipamide fiber.
  • the surface of the expansion membrane is formed with a suction cup structure and is adsorbed on the substrate by the suction cup structure.
  • the excitation source is a gas
  • the excitation device comprises: a temperature control unit configured to perform a thermal cycle treatment on the substrate having the expansion film by outputting a gas of different temperatures.
  • the cleaning apparatus includes: an electrostatic device facing the substrate for ionizing the substrate and the residue such that the substrate and the residue carry charges of the same polarity.
  • the cleaning device comprises: a cleaning chamber, the excitation device and a substrate having the deformation device are located in the cleaning chamber;
  • the air circulation portion is located on the wall of the cleaning chamber for discharging the gas output from the temperature control portion to maintain gas flow inside and outside the cleaning chamber.
  • the cleaning device further comprises: a drain tank in the cleaning chamber for discharging residues falling off the substrate.
  • the two sides of the expansion film are respectively fixedly connected to the two sides of the substrate, and two sides of the expansion film that are fixedly connected to the two sides of the substrate are Made of plastic fiber.
  • the expansion film is fixedly connected to the substrate by a gel.
  • the suction cup structure is in an edge region of the expanded membrane.
  • the cleaning device further includes: at least two opposite electrostatic devices, wherein the electrostatic device faces the substrate for ionizing the substrate and the residue to cause the substrate and the substrate The residue carries a charge of the same polarity.
  • the temperature control portion is on a wall of the cleaning chamber opposite to the air circulation portion.
  • the electrostatic devices are respectively on the chamber walls on both sides perpendicular to the cavity wall having the gas flow circulation portion.
  • the cleaning device further includes: a bracket inside the cleaning chamber, wherein the bracket is between the temperature control portion and the air circulation portion, and includes a plurality of vertically arranged Support plate, where
  • the support plate is for placing the substrate having the expansion film
  • the support plate is perpendicular to the chamber wall having the air circulation portion.
  • embodiments of the present disclosure also provide a cleaning method for removing residue from a substrate.
  • the substrate has a deformation device, the deformation device can be deformed under the action of an excitation source; the cleaning method comprises:
  • the deformation device is an expansion film, and the expansion film has a coefficient of expansion that changes with temperature; generating an excitation source of the deformation device includes: performing thermal cycle processing on the substrate to which the expansion film is attached And causing the expansion film to expand and contract, thereby causing the substrate to deform and peeling off the residue.
  • the excitation source is a gas
  • the excitation device comprises:
  • the temperature control unit is configured to perform a thermal cycle treatment on the substrate having the expansion film by outputting a gas of a different temperature, and to blow off the residue.
  • the technical solution of the present disclosure has a deformation device on the substrate, and controls the deformation device to deform under the action of the excitation source, and the deformation process can gently move the substrate to generate vibration, so as to make the residue on the surface of the substrate without damaging the substrate. Peel off to achieve a cleansing effect.
  • FIG. 1 is a schematic structural view of a PI film coating apparatus in the related art
  • FIG. 2 is a schematic structural view of a cleaning device of the present disclosure
  • Figure 3 is an expanded membrane of the present disclosure provided with a wash-sucking disc structure
  • FIG. 4 is a detailed structural diagram of the cleaning device of the present disclosure.
  • the structure of the coating apparatus in the related art is as shown in FIG. 1, and mainly includes an apparatus frame 11, a transfer plate 12, a roller (not directly shown in the drawing), a roller shaft 13, and a table 14.
  • the roller shaft 13 is fixed on the side wall of the equipment frame 11, and the rotation of the roller shaft 13 drives the roller of the connection thereof to rotate, and the rectangular transfer plate 12 in FIG. 1 is wrapped on the side surface of the roller;
  • the panel 12 is supported by a flexible material having small pits (about 15 ⁇ m deep) on the surface, arranged in a grid, having a density of about 400 Line/inch (line/inch) and a small pit having an angle of 45.
  • the purpose is to uniformly coat the PI liquid on the transfer sheet 12.
  • the working table 14 is used for placing a glass substrate (such as an Array substrate, a CF substrate). After the glass substrate is placed on the table 14, the transfer plate 12 wrapped on the roller is in contact with the glass substrate; In the transmission function of the 14th, the glass substrate is driven on the flow line of the table 14, and the roller is also rotated at the same time, so that the PI liquid on the transfer plate 12 is coated on the glass substrate to form a PI film.
  • a glass substrate such as an Array substrate, a CF substrate
  • the sample (Dummy) glass substrate is placed, and the PI film is coated on the Dummy glass substrate, first examined by an inspection machine, and then performed on a Mac/Mic (micro/macro) microscope device. Observe and see if the coating of the PI film is uniform and whether there is any defect caused by foreign matter. If there is a defect due to foreign matter, it is necessary to wipe the transfer plate to remove foreign matter on the transfer plate, and then perform an observation effect on the Dummy glass substrate until the Array substrate and the CF substrate are loaded without any abnormality. At present, the wiping work of the foreign matter on the transfer plate is performed by the worker into the coating device for wiping. This method does not ensure that the residue of the transfer plate is completely removed, which may affect the subsequent coating of the PI film. quality.
  • the present disclosure provides a problem that a substrate (such as a transfer plate) has a residue after manual cleaning. A solution.
  • some embodiments of the present disclosure provide a cleaning apparatus for removing residue on a substrate.
  • the surface of the substrate 21 is attached with a deformation device 22 (the deformation device 22 can be attached to the surface on which the substrate is not provided with a functional pattern), and the deformation device 22 can be deformed by the excitation source.
  • the cleaning apparatus of some embodiments of the present disclosure includes:
  • the excitation device 23 is configured to generate an excitation source of the deformation device 22 to deform the deformation device 22, thereby causing the substrate 21 to vibrate and to remove the residue from the substrate 21.
  • the deformation generated by the deformation device can achieve a large amplitude of vibration, thereby enabling effective removal of residue on the substrate.
  • the vibration generated by the deformation mode is soft, so that damage to the structure of the substrate and the functional pattern formed on the surface of the substrate can be avoided.
  • a transfer plate such as a PI film coating apparatus has a high cleaning requirement, and after the manual cleaning, some particulate matter remains on the transfer plate, so the cleaning device of the embodiment can be further used.
  • the secondary cleaning of the transfer plate after manual cleaning does not damage the mesh friction surface on the transfer plate, which ensures the process quality of the PI film and is beneficial to improve the yield of the display product.
  • the above deformation device can have many implementations.
  • the deformation device of some embodiments of the present disclosure may be an elastic cavity, and the corresponding excitation source is a gas or a liquid, and the excitation device deforms the elastic cavity by conveying a gas or a liquid into the elastic cavity.
  • the substrate vibrates.
  • the deformation device of some embodiments of the present disclosure is an expansion film, and the expansion film has a coefficient of expansion that changes with temperature, and the corresponding excitation source is a temperature, and the excitation device controls the thermal expansion and contraction of the expansion film by temperature adjustment, thereby driving The substrate vibrates.
  • the deformation mode adopted in the embodiment it can be known that all the technical solutions for causing the substrate to vibrate and fall off the residue by the deformation of the deformation device should fall within the protection scope of the present disclosure.
  • the expanded film of some embodiments of the present disclosure may be made of plastic fibers having good expansion characteristics, such as polyhexamethylene adipamide fibers.
  • the expansion film 22 is formed with a suction cup structure 221 on the side to which the transfer sheet is attached, and the expansion film 22 of some embodiments of the present disclosure is adsorbed on the transfer sheet by the suction cup structure 221 on one side thereof.
  • the suction cup structure of some embodiments of the present disclosure is only used in FIG. 3 for illustrative purposes.
  • the suction cup structure of some embodiments of the present disclosure may be a plurality of groove structures uniformly distributed on one side of the expansion film, and the groove structure is squeezed in the internal air by pressing the expansion film on the transfer plate. After the release, the vacuum was adsorbed on the transfer plate.
  • the expanded film of some embodiments of the present disclosure corresponds to the shape of the transfer sheet and is rectangular.
  • the two sides of the expanded film are respectively fixed to the two sides of the transfer plate.
  • the expansion film is deformed, and the two side edges of the transfer plate are continuously pulled to cause the two sides of the transfer plate to be lifted, thereby vibrating and dropping the residue.
  • one side of the expanded membrane may be inactively attached to the transfer sheet while the other side may be attracted to the transfer sheet by a suction cup structure.
  • the area of the suction cup structure can be further appropriately set according to the strength of the transfer plate.
  • the expansion film can have a large-area suction cup structure, and can be almost completely adsorbed on the transfer plate, thereby causing a relatively strong vibration of the transfer plate during the process of thermal expansion and contraction. A better cleaning effect can be obtained; or, for a low-strength transfer plate, a suction cup structure can be provided in the edge region of the expansion film, and only the edge of the expansion film can drive the transfer plate to vibrate, thereby reducing damage to the transfer plate. .
  • expansion film of some embodiments of the present disclosure may also be fixed to the transfer plate directly by the colloid without providing a suction cup structure.
  • the expanded film of some embodiments of the present disclosure may be partially made of plastic fibers or entirely made of plastic fibers.
  • the two sides of the expansion film for connection with the transfer plate may be made of plastic fibers, and when temperature control is performed, the expansion film mainly undergoes thermal expansion and contraction on both sides, thereby improving the transfer of the transfer plate. effect.
  • the cleaning apparatus of some embodiments of the present disclosure has a cleaning chamber in which a temperature control portion 41 (i.e., the above-described excitation device), a bracket 42 and airflow are disposed. Ring portion 43. among them,
  • the bracket 42 has a plurality of support plates 44 arranged in the vertical direction, and each of the support plates 44 can hold the transfer plate 45 to which the inflation film is attached.
  • the bracket 42 is disposed between the temperature control portion 41 and the airflow circulation portion 43, and the support plate 44 is perpendicular to the chamber wall where the airflow circulation portion 43 is disposed.
  • the temperature control portion 41 is provided on the side of the holder 42 to supply a gas of a different temperature (generally air) to the transfer sheet 45 housed in the holder 42 in the direction indicated by the arrow in Fig. 4, so that the transfer sheet 45 provided with the expansion film is provided. It is subjected to cyclic processing of alternating hot and cold.
  • a gas of a different temperature generally air
  • the air circulation portion 43 is provided on the wall of the cleaning chamber for discharging the gas output from the temperature control portion 41 to maintain the fluidity of the gas inside and outside the cleaning chamber.
  • the temperature control portion 41 is disposed on a cavity wall of the cleaning chamber opposite to the airflow circulation portion 43.
  • the cleaning chamber of some embodiments of the present disclosure is further provided with an electrostatic device 46 facing the transfer plate 45 for generating an electrostatic field, the static electricity
  • the field is capable of ionizing the transfer plate 45 and its surface residue so that the transfer plate 45 and the residue carry charges of the same polarity and then repel each other.
  • the electrostatic device 46 may be an electrode structure, and a strong electrostatic field may be generated by energizing the electrode structure.
  • the cleaning device includes at least two oppositely disposed electrostatic devices 46 that are respectively disposed on the chamber walls on both sides perpendicular to the cavity wall in which the airflow circulation portion 43 is disposed. .
  • the drain tank 47 in the cleaning chamber for discharging the residue which is detached from the transfer sheet.
  • the drain tank may be a water tank disposed under the transfer plate 45, and the residue on the transfer plate 45 falls into the water tank after falling off, so that the running water in the water tank removes the residue, thereby preventing the residue. Re-evaporation into the cleaning chamber.
  • the expansion film is thermally expanded and contracted by means of blowing, and the residue on the transfer plate can be blown off to a certain extent, thereby improving the cleaning effect of the transfer plate.
  • the transfer plate By setting the electrostatic field, the transfer plate can carry the same charge as its residue, thereby repelling each other and being easy to fall off.
  • the plurality of transfer plates to be cleaned can be held in the vertical direction by the bracket, and the temperature control portion can simultaneously output air to the plurality of transfer plates to be cleaned from the side of the bracket, thereby improving the cleaning efficiency, and for the large production line High work efficiency corresponds to high productivity.
  • the wind from the lateral direction can also blow off the residue on the transfer plate, which is more conducive to cleaning.
  • the operator can directly store the holder holding the transfer plate in the warehouse and wait for the next printing of the PI film.
  • some embodiments of the present disclosure also provide a cleaning method for removing residue on a substrate.
  • the substrate is provided with a deformation device capable of deforming under the action of the excitation source, and some embodiments of the cleaning method of the present disclosure include:
  • the excitation source of the deformation device is generated, and the deformation device is deformed by the excitation source to drive the substrate to vibrate to detach the residue on the substrate.
  • the method of the embodiment deforms the deformation device by the excitation source.
  • the deformation device can gently move the substrate to generate vibration, thereby removing the residue on the surface of the substrate without damaging the substrate, so as to achieve cleaning. effect.
  • the deformation device may be an expansion membrane having a coefficient of expansion that varies with temperature.
  • the substrate provided with the expansion film may be subjected to a thermal cycle treatment to control thermal expansion and contraction of the expansion film, thereby causing the substrate to vibrate to detach the residue on the substrate.
  • some embodiments of the present disclosure may output a gas of different temperatures to the substrate provided with the expansion film, so that the expansion film is subjected to a thermal cycle treatment, which has the advantage that the substrate can be further blown off by the wind. Residues for better cleaning results.

Abstract

一种清洁设备和清洁方法。其中，清洁设备用于去除基板上的残留物，该清洁设备包括设置在基板（21）上的形变装置（22）；激励装置（23），用于生成形变装置（22）的激励源，使形变装置（22）在激励源作用下发生形变，从而带动基板（21）振动，以脱落基板上的残留物。

Description

一种清洁设备及清洁方法
相关申请的交叉引用
本申请主张在2016年6月1日在中国提交的中国专利申请号No.201610384100.8的优先权，其全部内容通过引用包含于此。
技术领域
本公开涉及显示器的制作领域，特别是一种清洁设备及清洁方法。
背景技术
随着平板显示技术的不断发展，液晶显示器(LCD，Liquid Crystal Display)已成功应用于便携式电脑(Notebook)、监控器(Monitor)、电视机(TV)等显示设备中。目前，LCD已成为信息显示的主流产品，其显示品质随着制造工艺技术的进步而不断优化。
在LCD面板的生产过程中，为了使液晶分子能够正确的取向，需要在阵列(Array)基板和彩膜(CF，Color Filter)基板的表面涂上一层聚酰亚胺(PI，Polyimide)膜，然后在PI膜上进行摩擦(Rubbing)工艺，以实现液晶分子的取向。因此，Array基板与CF基板的PI膜涂布(Coater)工艺是非常重要的一步工艺。
相关技术中的涂布设备主要包括：设备框架、转印板、辊轮、辊轴和工作台。工作台上用于放置玻璃基板(如Array基板、CF基板)，在玻璃基板放置在工作台上后，包裹在辊轮上的转印板与玻璃基板接触；此时，借助工作台的传动功能，玻璃基板在工作台的流水线上传动，辊轮也同时转动，从而将转印板上的PI液涂布在玻璃基板上，形成PI膜。目前对转印板上异物的擦拭工作都是由工作人员进到涂布设备里进行擦拭，这种方法并不能保证彻底将转印板的残留物去除干净，可能会影响后续PI膜涂布的质量。
发明内容
本公开要解决的技术问题是提供一种清洁设备及清洁方法，能够有效去除基板在经人工清洗后所留下的残留物。
为解决上述技术问题，本公开的实施例提供一种清洁设备，用于去除基板上的残留物，包括：
在所述基板上的形变装置；
激励装置，用于生成所述形变装置的激励源，使所述形变装置在所述激励源作用下发生形变，从而带动所述基板振动，以脱落所述残留物。
可选地，所述形变装置为弹性腔体，所述激励源为气体或液体；所述激励装置用于向所述弹性腔体内输送气体或液体，使该弹性腔体发生形变，带动所述基板振动，以脱落所述残留物。
可选地，所所述形变装置为膨胀膜，且该膨胀膜具有随温度变化的膨胀系数，所述激励源用于改变所述膨胀膜的温度；
其中，所述膨胀膜在所述激励源作用下热胀冷缩，进而带动所述基板发生振动，以脱落所述残留物。
可选地，所述膨胀膜至少一部分由塑料纤维制成。
可选地，所述塑料纤维为聚己二酰己二胺纤维。
可选地，所述膨胀膜表面形成有吸盘结构，并通过该吸盘结构吸附在所述基板上。
可选地，所述激励源为气体，所述激励装置包括：温度控制部，用于通过输出不同温度的气体，对具有所述膨胀膜的基板进行冷热循环处理。
可选地，所述清洁设备包括：正对所述基板的静电装置，用于对所述基板和所述残留物电离，使所述基板和所述残留物携带相同极性的电荷。
可选地，所述清洁设备包括：清洁腔室，所述激励装置以及具有所述形变装置的基板位于所述清洁腔室内；
气流循环部，位于所述清洁腔室的腔壁上，用于排出温度控制部输出的气体，以保持清洁腔室内外的气体流动性。
可选地，所述清洁设备还包括：在该清洁腔室内的排污槽，用于排放从所述基板脱落的残留物。
可选地，所述膨胀膜的两个侧边分别与所述基板的两个侧边固定连接，并且所述膨胀膜的与所述基板的两个侧边固定连接的两个侧边由所述塑料纤维制成。
可选地，所述膨胀膜与所述基板通过胶体固定连接。
可选地，所述吸盘结构在所述膨胀膜的边缘区域。
可选地，所述清洁设备还包括：至少两个相对的静电装置，其中，所述静电装置正对所述基板，用于对所述基板和所述残留物电离，使所述基板和所述残留物携带相同极性的电荷。
可选地，所述温度控制部在与所述气流循环部相对的所述清洁腔室的腔壁上。
可选地，所述静电装置分别在与具有所述气流循环部的腔壁垂直的两侧腔壁上。
可选地，所述清洁设备还包括：在所述清洁腔室内部的支架，其中，所述支架在所述温度控制部和所述气流循环部之间，且包括多个沿竖直方向排列的支撑板，其中，
所述支撑板用于放置具有所述膨胀膜的所述基板；
所述支撑板垂直于具有所述气流循环部的所述腔壁。
另一方面，本公开的实施例还提供一种清洁方法，用于去基板上的残留物。其中所述基板上具有形变装置，所述形变装置能够在激励源作用下发生形变；所述清洁方法包括：
生成所述形变装置的激励源，使所述形变装置在所述激励源作用下发生形变，从而带动所述基板振动，以脱落所述残留物。
可选地，所述形变装置为膨胀膜，所述膨胀膜具有随温度变化的膨胀系数；生成所述形变装置的激励源，包括：对贴附有所述膨胀膜的基板进行冷热循环处理，使所述膨胀膜热胀冷缩进而带动所述基板发生形变，脱落所述残留物。
可选地，所述激励源为气体，所述激励装置包括：
温度控制部，用于通过输出不同温度的气体，对具有所述膨胀膜的所述基板进行冷热循环处理，并吹落所述残留物。
本公开的上述技术方案的有益效果如下：
本公开的技术方案在基板上具有形变装置，并控制形变装置在激励源作用下产生形变，该形变过程能够轻柔地带动基板产生振动，从而在不损伤基板的前提下，使基板表面的残留物脱落下来，以达到清洁效果。
附图说明
图1为相关技术中的PI膜涂布设备的结构示意图；
图2为本公开的清洁设备的结构示意图；
图3为本公开的设置有洗吸盘结构的膨胀膜；
图4为本公开的清洁设备的详细结构示意图。
具体实施方式
相关技术中的涂布设备的结构如图1所示，主要包括：设备框架11、转印板12、辊轮(图中未直接示出)、辊轴13和工作台14。其中，辊轴13固定在设备框架11的侧壁上，辊轴13的转动带动其连接的辊轮转动，图1中矩形的转印板12是包裹在辊轮的侧表面上的；转印板12由柔性材料支撑，表面上设有小坑(约15μm深)，成网状排布，排布的密度大约为400Line/inch(线/英寸)，小坑的倾斜角度为45。，目的是使PI液在转印板12上涂布均匀。工作台14上用于放置玻璃基板(如Array基板、CF基板)，在玻璃基板放置在工作台14上后，包裹在辊轮上的转印板12与玻璃基板接触；此时，借助工作台14的传动功能，玻璃基板在工作台14的流水线上传动，辊轮也同时转动，从而将转印板12上的PI液涂布在玻璃基板上，形成PI膜。
如果PI膜上有异物或PI膜涂布不均匀，就会严重影响LCD面板的画面品质，而且还会造成严重的物料浪费。通常在投入Array基板和CF基板前，先投入样品(Dummy)玻璃基板，在Dummy玻璃基板上涂布PI膜，先通过检查机进行检查，然后在Mac/Mic(微观/宏观)显微镜设备上进行观察，看PI膜涂布的是否均匀，是否有异物导致的不良。如果有异物导致的不良，则需要对转印板进行擦拭，清除转印板上的异物，再进行Dummy玻璃基板投入观察效果，直到没有异常再进行Array基板和CF基板的投入。目前对转印板上异物的擦拭工作都是由工作人员进到涂布设备里进行擦拭，这种方法并不能保证彻底将转印板的残留物去除干净，可能会影响后续PI膜涂布的质量。
为使本公开要解决的技术问题、技术方案和优点更加清楚，下面将结合附图及具体实施例进行详细描述。
针对目前基板(如转印板)在人工清洗后存在残留物的问题，本公开提供 一种解决方案。
一方面，本公开的一些实施例提供一种清洁设备，用于去除基板上的残留物。
如图2所示，基板21表面贴附有形变装置22(形变装置22可选贴附在基板不设置功能图案的表面上)，该形变装置22可以在激励源作用下发生形变。
对应地，本公开的一些实施例的清洁设备包括：
激励装置23，用于生成该形变装置22的激励源，使形变装置22发生形变，从而带动基板21振动，将残留物从基板21上脱落下来。
在本公开的一些实施例中，利用形变装置产生的形变可以实现较大的振动幅度，从而能够有效脱落基板上的残留物。同时，这种形变方式产生的振动较为柔和，因此能够避免对基板的结构以及基板表面已形成的功能图形带来损伤。
在涉及到实际应用中，像PI膜涂布设备的转印板就具有很高的清洁要求，在人工清洗过后，转印板上仍然会残留一些颗粒物，因此采用本实施例的清洁装置可以进一步对人工清洗后的转印板进行二次清洁，且不会破坏转印板上的网状摩擦表面，这保证了PI膜的工艺质量，有益于提高显示产品的良品率。
当然，在具体实施过程中，上述形变装置可以有很多种实现方式。例如，本公开的一些实施例的形变装置可以为弹性腔体，对应的激励源为气体或液体，上述激励装置通过向弹性腔体内输送气体或液体，使该弹性腔体发生形变，带动所述基板振动。或者本公开的一些实施例的形变装置为膨胀膜，且该膨胀膜具有随温度变化的膨胀系数，对应的激励源为温度，上述激励装置通过温度调整，控制膨胀膜热胀冷缩，进而带动所述基板发生振动。不管本实施例采用何种形变方式，可以知道到是，但凡是通过形变装置的形变带动基板振动脱落残留物的技术方案都应属于本公开的保护范围。
下面以脱落转印板的残留物为例，对本公开的一些实施例采用膨胀膜的方案进行详细介绍。
本公开的一些实施例的膨胀膜至少一部分可以由具有良好膨胀特性的塑料纤维制成，如聚己二酰己二胺纤维。如图3所示，膨胀膜22在贴附转印板的一侧形成有吸盘结构221，本公开的一些实施例的膨胀膜22通过其一侧的吸盘结构221吸附在转印板上。
当然需要给予说明的是，图3中仅用于示例性介绍本公开的一些实施例的吸盘结构。在实际应用中，本公开的一些实施例的吸盘结构可以是均匀分布在膨胀膜一侧的多个凹槽结构，通过按压在转印板上的膨胀膜，使凹槽结构在内部空气被挤出后，真空吸附在转印板上。
进一步地，本公开的一些实施例的膨胀膜与转印板的形状相对应，均为矩形。其中，膨胀膜的两个侧边分别与转印板的两个侧边相固定。在进行冷热交替的处理时，膨胀膜发生形变，不断对转印板的两个侧边进行扯动，使转印板两个侧边发生翘起，从而振动脱落残留物。公开的一些实施例中，膨胀膜的一侧边可以非活动固定在转印板，而另一侧边则可以通过吸盘结构吸附在转印板上。在发生形变的过程中，膨胀膜设置有吸盘结构的一侧会向另一侧不断靠拢或远离，这使得膨胀膜对转印板扯动的力度与方向会根据形变发生变化，从而提高了残留物的脱落效果。
当然，上述实现方式仅用于示例性介绍本公开的一些实施例的膨胀膜。在实际应用中，还可以进一步根据转印板的强度来合理设置吸盘结构的面积。例如针对高强度的转印板，膨胀膜可以具有大面积的吸盘结构，能够几乎完全吸附在转印板上，从而在热胀冷缩的过程中，带动转印板发生较强烈的振动，以获得更好的清洁效果；或者，针对低强度的转印板，则可以在膨胀膜的边缘区域设置吸盘结构，只让膨胀膜的边缘带动转印板振动，从而降低对转印板带来损伤。
这里需要给予说明的是，作为其他可行方案，本公开的一些实施例的膨胀膜也可以不设置吸盘结构，直接通过胶体与转印板固定。
此外，本公开的一些实施例的膨胀膜可以是部分由塑料纤维制成，也可以是全部由塑料纤维制成。作为示例性介绍，膨胀膜用于与转印板连接的两侧可以由塑料纤维制成，在进行温度控制时，膨胀膜主要是两侧发生热胀冷缩，从而提高拉拽转印板的效果。
下面结合一个实际应用对本公开的一些实施例的清洁设备的整体设计进行详细介绍。
如图4所示，本公开的一些实施例的清洁设备具有一清洁腔室，在该清洁腔室内部设置有温度控制部41(即本文上述的激励装置)、支架42以及气流循 环部43。其中，
支架42具有多个在竖直方向上排列的支撑板44，每一支撑板44可盛放贴附有膨胀膜的转印板45。
如图4所示，本公开的一些实施例中，支架42设置于温度控制部41和气流循环部43之间，支撑板44垂直于设置气流循环部43的腔壁。
温度控制部41设置在支架42侧面，按照图4箭头所示的方向，向支架42盛放的转印板45输送不同温度的气体(一般为空气)，使得设置有膨胀膜的转印板45受到冷热交替的循环处理。
气流循环部43设置在清洁腔室的腔壁上，用于排出温度控制部41输出的气体，以保持清洁腔室内外的气体流动性。
如图4所示，在本公开的一些实施例中，温度控制部41设置在与气流循环部43相对的清洁腔室的腔壁上。
此外，为进一步加速残留物从转印板上脱落，本公开的一些实施例的清洁腔室内还设置有正对转印板45的静电装置46，该静电装置46用于产生静电场，该静电场能够对转印板45及其表面残留物进行电离，使转印板45和残留物携带相同极性的电荷后相互排斥。在具体的实际应用中，上述静电装置46可以是电极结构，通过对该电极结构进行通电可以产生强静电场。
如图4所示，在本公开的一些实施例中，所述清洁设备包括至少两个相对设置的静电装置46，其分别设置在与设置气流循环部43的腔壁垂直的两侧腔壁上。
进一步地，实际应用中，还可以在清洁腔室设置排污槽47，该排污槽47用于排放从转印板脱落的残留物。可选地，排污槽可以是水槽，设置在转印板45的下方，转印板45上的残留物在脱落后掉入水槽中，使得水槽内的流水将残留物带走，从而防止残留物再挥发到清洁腔室中。
综上所述，本公开的实际应用具有以下优点：
1)通过吹风的方式使膨胀膜热胀冷缩，在一定程度上可以吹走转印板上的残留物，从而提高转印板清洁效果。
2)通过设置的静电场可以使转印板与其残留物携带相同电荷，从而相互排斥，易于脱落。
3)通过支架可以在竖直方向上盛放多个待清洁的转印板，温度控制部从支架侧边可以同时对多个待清洁的转印板输出空气，提高了清洁效率，对于大生产线，高工作效率对应高稼动率。此外，来自侧向的风力还能够将转印板上的残留物吹落，更有益于清洁。
4)在清洁完成后，操作人员可直接将盛放有转印板的支架放在仓库中进行保存，等待下次印刷PI薄膜时使用。
另一方面，本公开的一些实施例还提供一种清洁方法，用于去除基板上的残留物。其中，基板上设置有形变装置，该形变装置能够在激励源作用下发生形变，本公开的一些实施例清洁方法包括：
生成形变装置的激励源，使该形变装置在激励源作用下发生形变，从而带动所基板振动，以脱落基板上的残留物。
本实施例的方法通过激励源使形变装置发生形变，在形变过程中，形变装置能够轻柔地带动基板产生振动，从而在不损伤基板的前提下，使基板表面的残留物脱落下来，以达到清洁效果。
在具体实现中，上述形变装置可以是膨胀膜，该膨胀膜具有随温度变化的膨胀系数。其中，本公开的一些实施例可以对设置有所述膨胀膜的基板进行冷热循环处理，控制所述膨胀膜热胀冷缩，进而带动所述基板发生振动，以脱落基板上的残留物。
当然，作为可选方案，本公开的一些实施例可以对设置有膨胀膜的基板输出不同温度的气体，以使膨胀膜受到冷热循环处理，该方案的优点是可以进一步借助风力吹走基板上的残留物，从而实现更好的清洁效果。
显然，本公开的一些实施例的清洁方法与本公开的清洁装置相对应，因此均能够实现相同的技术效果。
以上所述是本公开的可选实施方式，应当指出，对于本技术领域的普通技术人员来说，在不脱离本公开所述原理的前提下，还可以作出若干改进和润饰，这些改进和润饰也应视为本公开的保护范围。

Claims (20)

  1. 一种清洁设备，用于去除基板上的残留物，包括：
    在所述基板上的形变装置；
    激励装置，用于生成所述形变装置的激励源，使所述形变装置在所述激励源作用下发生形变，从而带动所述基板振动，以脱落所述残留物。
  2. 根据权利要求1所述的清洁设备，其中，
    所述形变装置为弹性腔体，所述激励源为气体或液体；
    所述激励装置用于向所述弹性腔体内输送所述气体或液体，使所述弹性腔体发生形变，带动所述基板振动，以脱落所述残留物。
  3. 根据权利要求1所述的清洁设备，其中，
    所述形变装置为膨胀膜，且所述膨胀膜具有随温度变化的膨胀系数，所述激励源是用于改变所述膨胀膜的温度；
    其中，所述膨胀膜在所述激励源作用下热胀冷缩，进而带动所述基板发生振动，以脱落所述残留物。
  4. 根据权利要求3所述的清洁设备，其中，
    所述膨胀膜至少一部分由塑料纤维制成。
  5. 根据权利要求4所述的清洁设备，其中，
    所述塑料纤维为聚己二酰己二胺纤维。
  6. 根据权利要求3所述的清洁设备，其中，
    所述膨胀膜表面形成有吸盘结构，并通过所述吸盘结构吸附在所述基板上。
  7. 根据权利要求3所述的清洁设备，其中，
    所述激励源为气体，所述激励装置包括：
    温度控制部，用于通过输出不同温度的气体，对具有所述膨胀膜的所述基板进行冷热循环处理。
  8. 根据权利要求1所述的清洁设备，还包括：
    正对所述基板的静电装置，用于对所述基板和所述残留物电离，使所述基板和所述残留物携带相同极性的电荷。
  9. 根据权利要求7所述的清洁设备，还包括：
    清洁腔室，所述装置温度控制部以及具有所述形变装置的基板位于所述清洁腔室内；
    气流循环部，位于所述清洁腔室的腔壁上，用于排出所述温度控制部输出的所述不同温度的气体，以保持所述清洁腔室内外的气体流动性。
  10. 根据权利要求9所述的清洁设备，还包括：
    在所述清洁腔室内的排污槽，用于排放从所述基板脱落的所述残留物。
  11. 根据权利要求4所述的清洁设备，其中，所述膨胀膜的两个侧边分别与所述基板的两个侧边固定连接，并且所述膨胀膜的与所述基板的两个侧边固定连接的两个侧边由所述塑料纤维制成。
  12. 根据权利要求3所述的清洁设备，其中，所述膨胀膜与所述基板通过胶体固定连接。
  13. 根据权利要求6所述的清洁设备，其中，所述吸盘结构在所述膨胀膜的边缘区域。
  14. 根据权利要求9所述的清洁设备，还包括：
    至少两个相对的静电装置，其中，所述静电装置正对所述基板，用于对所述基板和所述残留物电离，使所述基板和所述残留物携带相同极性的电荷。
  15. 根据权利要求9所述的清洁设备，其中，所述温度控制部在与所述气流循环部相对的所述清洁腔室的腔壁上。
  16. 根据权利要求14所述的清洁设备，其中，所述静电装置分别在与具有所述气流循环部的腔壁垂直的两侧腔壁上。
  17. 根据权利要求9所述的清洁设备，还包括：
    在所述清洁腔室内部的支架，其中，所述支架在所述温度控制部和所述气流循环部之间，且包括多个沿竖直方向排列的支撑板，其中，
    所述支撑板用于放置具有所述膨胀膜的所述基板；
    所述支撑板垂直于具有所述气流循环部的所述腔壁。
  18. 一种清洁方法，用于去除基板上的残留物，其中，所述基板上具有形变装置，所述形变装置能够在激励源作用下发生形变；所述清洁方法包括：
    生成所述形变装置的激励源，使所述形变装置在所述激励源作用下发生形变，从而带动所述基板振动，以脱落所述残留物。
  19. 根据权利要求18所述的清洁方法，其中，
    所述形变装置为膨胀膜，所述膨胀膜具有随温度变化的膨胀系数；
    生成所述形变装置的激励源，包括：
    对具有所述膨胀膜的基板进行冷热循环处理，控制所述膨胀膜热胀冷缩，进而带动所述基板发生振动，以脱落所述残留物。
  20. 根据权利要求19所述的清洁方法，其中，所述激励源为气体，所述激励装置包括：
    温度控制部，用于通过输出不同温度的气体，对具有所述膨胀膜的所述基板进行冷热循环处理，并吹落所述残留物。
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