WO2017175778A1 - 隔壁形成用脂肪族ポリカーボネート樹脂、隔壁材料、基板及びその製造方法、配線基板の製造方法、並びに、配線形成方法 - Google Patents
隔壁形成用脂肪族ポリカーボネート樹脂、隔壁材料、基板及びその製造方法、配線基板の製造方法、並びに、配線形成方法 Download PDFInfo
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- polycarbonate resin
- aliphatic polycarbonate
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- wiring
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G64/00—Macromolecular compounds obtained by reactions forming a carbonic ester link in the main chain of the macromolecule
- C08G64/02—Aliphatic polycarbonates
- C08G64/0208—Aliphatic polycarbonates saturated
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G64/00—Macromolecular compounds obtained by reactions forming a carbonic ester link in the main chain of the macromolecule
- C08G64/02—Aliphatic polycarbonates
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G64/00—Macromolecular compounds obtained by reactions forming a carbonic ester link in the main chain of the macromolecule
- C08G64/20—General preparatory processes
- C08G64/30—General preparatory processes using carbonates
- C08G64/302—General preparatory processes using carbonates and cyclic ethers
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G64/00—Macromolecular compounds obtained by reactions forming a carbonic ester link in the main chain of the macromolecule
- C08G64/20—General preparatory processes
- C08G64/32—General preparatory processes using carbon dioxide
- C08G64/34—General preparatory processes using carbon dioxide and cyclic ethers
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L69/00—Compositions of polycarbonates; Compositions of derivatives of polycarbonates
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0313—Organic insulating material
- H05K1/032—Organic insulating material consisting of one material
- H05K1/0326—Organic insulating material consisting of one material containing O
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/12—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns
- H05K3/1208—Pretreatment of the circuit board, e.g. modifying wetting properties; Patterning by using affinity patterns
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/12—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns
- H05K3/1258—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns by using a substrate provided with a shape pattern, e.g. grooves, banks, resist pattern
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/01—Dielectrics
- H05K2201/0137—Materials
- H05K2201/0166—Polymeric layer used for special processing, e.g. resist for etching insulating material or photoresist used as a mask during plasma etching
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/09—Shape and layout
- H05K2201/09818—Shape or layout details not covered by a single group of H05K2201/09009 - H05K2201/09809
- H05K2201/09909—Special local insulating pattern, e.g. as dam around component
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/05—Patterning and lithography; Masks; Details of resist
- H05K2203/0502—Patterning and lithography
- H05K2203/0545—Pattern for applying drops or paste; Applying a pattern made of drops or paste
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/11—Treatments characterised by their effect, e.g. heating, cooling, roughening
- H05K2203/1131—Sintering, i.e. fusing of metal particles to achieve or improve electrical conductivity
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/11—Treatments characterised by their effect, e.g. heating, cooling, roughening
- H05K2203/1173—Differences in wettability, e.g. hydrophilic or hydrophobic areas
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0011—Working of insulating substrates or insulating layers
- H05K3/0017—Etching of the substrate by chemical or physical means
- H05K3/0023—Etching of the substrate by chemical or physical means by exposure and development of a photosensitive insulating layer
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/12—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns
- H05K3/1241—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns by ink-jet printing or drawing by dispensing
- H05K3/125—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns by ink-jet printing or drawing by dispensing by ink-jet printing
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/12—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns
- H05K3/1283—After-treatment of the printed patterns, e.g. sintering or curing methods
Definitions
- the present invention relates to an aliphatic polycarbonate resin for forming a partition, a partition material, a substrate and a manufacturing method thereof, a manufacturing method of a wiring substrate, and a wiring forming method.
- aliphatic polycarbonate resins synthesized from raw materials containing carbon dioxide and an epoxy compound have been actively studied from the viewpoint of carbon dioxide resources, and various uses have been found. Since the aliphatic polycarbonate resin has a characteristic that the thermal decomposition temperature is low, application to ceramic binders and metal inks has been studied using its properties (for example, Patent Documents 1 and 2). In addition, since the aliphatic polycarbonate resin is easily removed by heating or light with a short wavelength (for example, irradiation with vacuum ultraviolet rays or soft X-rays), the aliphatic polycarbonate resin should be used as a positive resist resin for the partition wall material. (For example, Patent Document 3 and Patent Document 4) have also been studied.
- the aliphatic polycarbonate resin as the partition wall material positive resist resin, it is possible to manufacture a wiring board to be incorporated in an electronic component or the like.
- a wiring material including, for example, metal ink is provided in the grooves.
- the aliphatic polycarbonate resin is removed and the ink is cured and sintered. Thereby, a wiring board is formed.
- an object of the present invention is to provide an aliphatic polycarbonate resin which is excellent in water repellency and suitable for forming a partition wall in the production of a wiring board. Furthermore, an object of the present invention is to provide a partition material, a substrate, a manufacturing method thereof, a manufacturing method of a wiring substrate, and a wiring forming method.
- the present inventors have found that the above object can be achieved by setting the repeating structural unit contained in the aliphatic polycarbonate to a specific structure, thereby completing the present invention. It came to.
- R 1 , R 2 , R 3 and R 4 each independently represent a hydrogen atom, an alkyl group having 1 or more carbon atoms, an alkoxyalkyl group having 2 or more carbon atoms, an aryl group or an aryloxyalkyl group. And at least one of R 1 , R 2 , R 3 and R 4 represents an alkyl group having 2 or more carbon atoms, an alkoxyalkyl group having 2 or more carbon atoms, an aryl group or an aryloxyalkyl group. 1 , R 2 , R 3 and R 4 may be the same or different) And a structural unit represented by An aliphatic polycarbonate resin having a contact angle with water of 75 ° or more. Item 2. Item 5. The aliphatic polycarbonate resin according to Item 1, wherein the content of the structural unit represented by the formula (1) is 5% by mass or more based on the total mass of all the structural units. Item 3. The following general formula (2):
- the aliphatic polycarbonate resin for forming a partition wall according to the present invention is superior in water repellency performance to a conventional aliphatic polycarbonate resin, and when a partition wall is formed by using as a partition wall material, a water-based ink is desired with high accuracy. Can only stay in the part.
- R 1 , R 2 , R 3 and R 4 each independently represent a hydrogen atom, an alkyl group having 1 or more carbon atoms, an alkoxyalkyl group having 2 or more carbon atoms, an aryl group or an aryloxyalkyl group. And at least one of R 1 , R 2 , R 3 and R 4 represents an alkyl group having 2 or more carbon atoms, an alkoxyalkyl group having 2 or more carbon atoms, an aryl group or an aryloxyalkyl group. 1 , R 2 , R 3 and R 4 may be the same or different)
- the contact angle with respect to water is 75 degrees or more.
- the aliphatic polycarbonate resin for forming the partition walls may be simply referred to as “aliphatic polycarbonate resin”.
- the above-mentioned aliphatic polycarbonate resin contains a structural unit having a specific structure, so that the water repellency is superior to conventional aliphatic polycarbonate resins. Therefore, according to the aliphatic polycarbonate resin, when the partition wall is formed by using as the partition wall material, the water-based ink can be kept only in a desired portion with high accuracy.
- the type of the alkyl group having 1 or more carbon atoms as R 1 , R 2 , R 3 and R 4 may be either linear or branched, and the alkyl group is one You may have the above substituent.
- Specific examples of the alkyl group having 1 or more carbon atoms include, for example, methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, sec-butyl group, tert-butyl group, n-pentyl group, n -Hexyl group, n-heptyl group, n-octyl group, n-nonyl group, n-decyl group, n-undecyl group, n-dodecyl group and the like.
- the upper limit of the carbon number of the alkyl group having 1 or more carbon atoms is preferably 30 carbon atoms and 20 carbon atoms from the viewpoint of easy control of the reaction during the production of the aliphatic polycarbonate resin. Is more preferable.
- the type of the alkoxyalkyl group having 2 or more carbon atoms as R 1 , R 2 , R 3 and R 4 may be either linear or branched, and an alkoxyalkyl group May have one or more substituents.
- the alkoxyalkyl group is preferably an alkoxymethyl group.
- the upper limit of the carbon number of the alkoxyalkyl group having 2 or more carbon atoms is not particularly limited, but the upper limit is preferably 30 carbon atoms from the viewpoint of easy control of the reaction during the production of the aliphatic polycarbonate resin. More preferably, it is 20.
- the kind of aryl group as R 1 , R 2 , R 3 and R 4 usually has 6 or more carbon atoms.
- the aryl group may have a substituent.
- Specific examples of the aryl group include a phenyl group, a toluyl group, an indenyl group, a naphthyl group, and a tetrahydronaphthyl group.
- the upper limit of the carbon number of the aryl group is preferably 30 carbon atoms and more preferably 20 carbon atoms from the viewpoint that the reaction during the production of the aliphatic polycarbonate resin is easy to control.
- the kind of aryloxyalkyl group as R 1 , R 2 , R 3 and R 4 usually has 7 or more carbon atoms.
- the aryloxyalkyl group may have a substituent.
- the oxyalkyl part of the aryloxyalkyl group may be either linear or branched, and may have a substituent.
- aryloxyalkyl group a substituted or unsubstituted aryloxymethyl group is preferable, and specific examples thereof include a phenoxymethyl group, a toluyloxymethyl group, an indenyloxymethyl group, a naphthyloxymethyl group, and a tetrahydronaphthyloxymethyl group.
- the upper limit of the carbon number of the aryloxyalkyl group is preferably 30 carbon atoms and more preferably 20 carbon atoms from the viewpoint of maintaining the stability of the aliphatic polycarbonate resin and the stability during production. preferable.
- R 1 , R 2 , R 3 and R 4 is an alkyl group having 2 or more carbon atoms, an alkoxyalkyl group having 2 or more carbon atoms, an aryl group or an aryloxyalkyl group. is there.
- the aliphatic polycarbonate resin has excellent water repellency.
- R 1 , R 2 , R 3 and R 4 When at least one of R 1 , R 2 , R 3 and R 4 is an alkyl group having 2 or more carbon atoms, the alkyl group preferably has 4 or more carbon atoms, preferably 8 or more. More preferred. Thereby, the water repellency of the aliphatic polycarbonate resin can be further improved.
- the alkyl group When at least one of R 1 , R 2 , R 3 and R 4 is an alkoxyalkyl group having 2 or more carbon atoms, the alkyl group preferably has 2 or more carbon atoms, preferably 4 or more. More preferably. Thereby, the water repellency of the aliphatic polycarbonate resin can be further improved.
- the aliphatic polycarbonate resin according to the present invention constitutes the main chain even when it has an aryl group or an aryloxyalkyl group as at least one of R 1 , R 2 , R 3 and R 4. It must be an aliphatic polycarbonate resin in the sense that it does not have an aromatic ring as an atomic group.
- the aliphatic polycarbonate resin of the present embodiment may be formed of only the structural unit represented by the above formula (1), or other structural units other than the structural unit represented by the above formula (1). It may be formed including.
- the content of the structural unit represented by the above formula (1) is preferably 5% by mass or more with respect to the total mass of all the structural units, and is 10% by mass or more. More preferably. In this case, the aliphatic polycarbonate resin tends to have more excellent water repellency.
- the upper limit of the content of the structural unit represented by the above formula (1) is from the viewpoint that the aliphatic polycarbonate resin can be easily produced, with respect to the total mass of all the structural units constituting the aliphatic polycarbonate resin. It is preferable that it is 50 mass%.
- the content of the structural unit represented by the above formula (2) is preferably 50% by mass or more based on the total mass of all the structural units. In this case, the aliphatic polycarbonate resin can be produced efficiently.
- the upper limit is preferably less than 95% by mass, and more preferably less than 90% by mass.
- the mass average molecular weight of the aliphatic polycarbonate resin of this embodiment is preferably 50000 or more, more preferably 100000 or more, from the viewpoint of rectangular holding power when used as a partition wall material. Further, from the viewpoint of avoiding a decrease in handleability due to a decrease in the solubility of the aliphatic polycarbonate resin in the solvent, the weight average molecular weight of the aliphatic polycarbonate resin is preferably 1000000 or less, more preferably 500000 or less.
- the contact angle of the aliphatic polycarbonate resin of this embodiment with respect to water is 75 ° or more. In this case, the aliphatic polycarbonate resin exhibits a desired water repellency.
- the contact angle of the aliphatic polycarbonate resin with respect to water is preferably 80 ° or more. The contact angle is usually less than 180 ° (eg, less than 150 °).
- the contact angle in this specification is defined by a value measured by the following procedure.
- the aliphatic polycarbonate resin of the present embodiment is dissolved in acetone so as to have a concentration of 2.5% by mass
- the glass substrate is immersed in the obtained solution, and then the glass substrate (solution on the surface is pulled up from the solution).
- a glass substrate to which is attached) is dried at 25 ° C. for 24 hours to prepare a sample for contact angle measurement.
- one drop of distilled water is dropped with a microsyringe so that the droplet diameter is 2 mm, and the contact angle is measured.
- This measurement is performed in an environment of a temperature of 25 ° C. and a humidity of 50% RH.
- Such contact angle can be measured using a commercially available contact angle meter.
- the aliphatic polycarbonate resin of the present embodiment can be used by, for example, dissolving it in a solvent capable of dissolving the aliphatic polycarbonate resin.
- Solvents that can dissolve the aliphatic polycarbonate resin include, for example, toluene, ethyl acetate, butyl acetate, isopropyl alcohol, methyl isobutyl ketone, acetone, methyl ethyl ketone, N-methyl-2-pyrrolidone, ethylene glycol ethyl ether, ethylene glycol monobutyl ether , Ethylene glycol monoethyl ether acetate, diethylene glycol monoethyl ether, diethylene glycol monomethyl ether, diethylene glycol monoisobutyl ether, trimethylpentanediol monoisobutyrate, ethyl carbitol, butyl carbitol, ethyl carbitol acetate, butyl carbitol acetate, terpineol, Terpineol acetate, dihydroterpineol, dihydro Over terpineo
- N-methyl-2-pyrrolidone, terpineol, terpineol acetate, ethyl carbitol acetate, butyl carbitol acetate, texanol, and propylene carbonate are used from the viewpoint that they have a moderately high boiling point and are easily volatilized uniformly during sintering. preferable.
- these organic solvents may be used independently and may use 2 or more types together.
- the amount of the solvent used is preferably 100 to 100 parts by weight with respect to 100 parts by weight of the aliphatic polycarbonate resin from the viewpoint of easy handling of the resulting solution (the solution of the aliphatic polycarbonate resin of the present invention).
- the amount is 2000 parts by mass, more preferably 200-1500 parts by mass, and still more preferably 300-1000 parts by mass.
- Examples of the method for producing the aliphatic polycarbonate resin of the present embodiment include a method in which an epoxide and carbon dioxide are subjected to a polymerization reaction in the presence of a metal catalyst.
- an aliphatic polycarbonate resin having a structural unit represented by the formula (1) and further having a structural unit represented by the formula (2) as required is obtained.
- Examples of the epoxide used for forming the structural unit represented by the formula (1) include 1-butene oxide (1-butylene oxide), 1-pentene oxide, 2-pentene oxide, 1-hexene oxide, 1-octene. Oxide, 1-decene oxide, 1-undecene oxide, 1-dodecene oxide, ⁇ -olefin oxide having 13 or more carbon atoms (for example, 13 to 20 carbon atoms), cyclopentene oxide, cyclohexene oxide, ethyl glycidyl ether, n- Examples thereof include propyl glycidyl ether, n-butyl glycidyl ether, alkyl glycidyl ether having 5 or more carbon atoms (for example, 10 to 20 carbon atoms), styrene oxide, 3-phenylpropylene oxide, 3-naphthylpropylene oxide, and phenylglycidyl ether.In addition, these
- Examples of the epoxide used for forming the structural unit represented by the formula (2) include ethylene oxide, propylene oxide, 2-butene oxide, and isobutylene oxide. Of these, ethylene oxide and propylene oxide are preferable from the viewpoint of high reactivity. In addition, these epoxides may be used independently and may use 2 or more types together.
- the metal catalyst examples include a zinc-based catalyst, an aluminum-based catalyst, a chromium-based catalyst, and a cobalt-based catalyst.
- zinc-based catalysts are preferable because they have high polymerization activity and wide substrate versatility in the polymerization reaction of epoxide and carbon dioxide.
- Examples of zinc-based catalysts include organic zinc catalysts such as zinc acetate, diethyl zinc, and dibutyl zinc; primary amines, divalent phenols (benzene diols), aromatic dicarboxylic acids, aromatic hydroxy acids, aliphatic dicarboxylic acids, fatty acids And an organic zinc catalyst obtained by reacting a compound such as a group monocarboxylic acid with a zinc compound.
- organic zinc catalysts an organic zinc catalyst obtained by reacting a zinc compound, an aliphatic dicarboxylic acid and an aliphatic monocarboxylic acid is preferable because it has higher polymerization activity, and zinc oxide, glutaric acid and acetic acid are preferred.
- An organozinc catalyst obtained by reacting is more preferable.
- a reaction solvent may be used as necessary.
- Various organic solvents can be used as the reaction solvent.
- the organic solvent include aliphatic hydrocarbon solvents such as pentane, hexane, octane, decane, and cyclohexane; aromatic hydrocarbon solvents such as benzene, toluene, and xylene; methylene chloride, chloroform, carbon tetrachloride, 1, Halogenated hydrocarbons such as 1-dichloroethane, 1,2-dichloroethane, ethyl chloride, trichloroethane, 1-chloropropane, 2-chloropropane, 1-chlorobutane, 2-chlorobutane, 1-chloro-2-methylpropane, chlorobenzene, bromobenzene Solvents; ether solvents such as dimethoxyethane, tetrahydrofuran, 2-methyltetrahydrofur
- the amount of the reaction solvent used is preferably 100 to 10,000 parts by mass with respect to 100 parts by mass of the epoxide, from the viewpoint of allowing the reaction to proceed smoothly.
- a metal catalyst for example, an epoxide, a metal catalyst, and a cocatalyst, a reaction solvent, etc. are charged in an autoclave, and after mixing these, carbon dioxide is mixed.
- a metal catalyst for example, an epoxide, a metal catalyst, and a cocatalyst, a reaction solvent, etc.
- the amount of carbon dioxide used in the polymerization reaction is preferably 1 to 10 mol, more preferably 1 to 5 mol, and still more preferably 1 to 3 mol with respect to 1 mol of epoxide.
- the working pressure of carbon dioxide used in the polymerization reaction is preferably 0.1 MPa or more, more preferably 0.2 MPa or more, and even more preferably 0.5 MPa or more, from the viewpoint of allowing the reaction to proceed smoothly. From the viewpoint of obtaining a suitable effect, it is preferably 20 MPa or less, more preferably 10 MPa or less, and still more preferably 5 MPa or less.
- water-based ink such as metal ink conventionally used for forming wiring can be used.
- Mass average molecular weight of aliphatic polycarbonate resin (Mw) An N, N-dimethylformamide solution having an aliphatic polycarbonate resin concentration of 0.5% by mass was prepared and measured using a high performance liquid chromatograph. After the measurement, the weight average molecular weight of the aliphatic polycarbonate resin was calculated by comparing with polystyrene having a known weight average molecular weight measured under the same conditions.
- the measurement conditions are Column: GPC column (trade name of Showa Denko KK, Shodex OHPac SB-800 series) Column temperature: 40 ° C Eluent: 0.03 mol / L Lithium bromide-N, N-dimethylformamide solution Flow rate: 0.65 mL / min It was.
- Example 1 The inside of a 1 L-capacity autoclave system equipped with a stirrer, a gas introduction tube and a thermometer was previously replaced with a nitrogen atmosphere, and then 39.1 g of a slurry liquid containing the organozinc catalyst obtained in Production Example 1 (45 mmol of organozinc catalyst) ), 192.4 g of dimethyl carbonate, 26.1 g (450 mmol) of propylene oxide and 4.71 g (47 mmol) of 1-hexene oxide. Next, the temperature was raised to 60 ° C. with stirring, and then carbon dioxide was added, and carbon dioxide was charged until the inside of the reaction system became 1.0 MPa. The polymerization reaction was carried out for 10 hours while supplying carbon dioxide consumed by the reaction.
- the content of n-butyl group and the remaining hydrogen atom was 13.5% by mass.
- Example 2 Polymerization was carried out in the same manner as in Example 1 except that the amount of 1-hexene oxide was changed to 14.6 g (146 mmol) to obtain 54.7 g of an aliphatic polycarbonate resin.
- the content of n-butyl group and the remaining hydrogen atom was 32.0% by mass.
- Example 3 Polymerization was carried out in the same manner as in Example 1 except that the amount of 1-hexene oxide was changed to 45.0 g (450 mmol) and the polymerization time was 24 hours to obtain 75.3 g of an aliphatic polycarbonate resin.
- the content of n-butyl group and the remaining hydrogen atom was 41.0% by mass.
- Example 8 Polymerization was carried out in the same manner as in Example 1 except that 1-hexene oxide was changed to 6.8 g (48 mmol) of butyl glycidyl ether to obtain 45.8 g of an aliphatic polycarbonate resin.
- the content of n-butoxymethyl group and the remaining hydrogen atom was 13.2% by mass.
- Example 9 Polymerization was carried out in the same manner as in Example 1 except that 1-hexene oxide was changed to 12.3 g (48 mmol) of Denacol EX-192 (mixture of alkyl glycidyl ether having 11 to 15 side chain carbon atoms) manufactured by Nagase ChemteX Corporation. As a result, 34.7 g of an aliphatic polycarbonate resin was obtained.
- Table 2 shows the contact angle of water and thermal decomposition start temperature of the aliphatic polycarbonate resin obtained in each example.
- content (% by mass) indicates the content of the structural unit represented by the formula (1) with respect to the total mass of all the structural units in the aliphatic polycarbonate resin.
- second epoxide refers to the epoxide used to form the structural unit represented by the formula (1).
- the aliphatic polycarbonate resin for forming a partition wall according to the present invention is superior in water repellency performance to a conventional aliphatic polycarbonate resin, and when a partition wall is formed by using as a partition wall material, a water-based ink is desired with high accuracy. Can only stay in the part. Therefore, if the aliphatic polycarbonate resin for partition formation according to the present invention is used, a wiring board having highly controlled fine wiring can be easily formed, and the obtained wiring board can be incorporated into various electronic components. Can do.
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- Polymers & Plastics (AREA)
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Abstract
Description
項1.隔壁形成用の脂肪族ポリカーボネート樹脂であって、
下記一般式(1):
で表される構成単位を含み、かつ、
水に対する接触角が75°以上である、脂肪族ポリカーボネート樹脂。
項2.上記式(1)で表される構成単位の含有量が、全構成単位の総質量に対して5質量%以上である、項1記載の脂肪族ポリカーボネート樹脂。
項3.下記一般式(2):
で表される構成単位をさらに含む、項1又は2に記載の脂肪族ポリカーボネート樹脂。
項4.項1~3のいずれか1項に記載の脂肪族ポリカーボネート樹脂を含む、隔壁材料。
項5.項1~3のいずれか1項に記載の脂肪族ポリカーボネート樹脂で形成された隔壁を有する、基板。
項6.項5に記載の基板の製造方法であって、
前記脂肪族ポリカーボネート樹脂を含む隔壁材料の塗膜を設けて隔壁を形成する工程を具備する、基板の製造方法。
項7.項5に記載の基板を用いて形成される配線基板の製造方法であって、
前記基板上に配線材料を設けて配線を形成する工程を具備する、配線基板の製造方法。
項8.前記基板に溝を形成する工程と、
前記溝に配線材料を設けて配線を形成する工程と、
を具備する、項7に記載の配線基板の製造方法。
項9.項4に記載の隔壁材料を使用して配線を形成させる、配線形成方法。
下記一般式(1):
で表される構成単位を含み、かつ、水に対する接触角が75°以上である。以下、隔壁形成用の脂肪族ポリカーボネート樹脂を単に「脂肪族ポリカーボネート樹脂」ということがある。
で表される構成単位をさらに含むことができる。
脂肪族ポリカーボネート樹脂の濃度が0.5質量%であるN,N-ジメチルホルムアミド溶液を調製し、高速液体クロマトグラフを用いて測定した。測定後、同一条件で測定した質量平均分子量が既知のポリスチレンと比較することにより、脂肪族ポリカーボネート樹脂の質量平均分子量を算出した。測定条件は、
カラム:GPCカラム(昭和電工株式会社の商品名、Shodex OHPac SB-800シリーズ)カラム温度:40℃
溶出液:0.03mol/L臭化リチウム-N,N-ジメチルホルムアミド溶液
流速:0.65mL/min
とした。
脂肪族ポリカーボネート樹脂を樹脂濃度が2.5質量%になるようにアセトンに溶解させ、得られた溶液にガラス基板を浸した。その後、このガラス基板を溶液中から取り出して25℃で24時間、乾燥することで、脂肪族ポリカーボネート樹脂をコーティングしたガラス基板を作製した。このガラス基板上に、液滴径が2mmになるように、蒸留水をマイクロシリンジで1滴落とし、協和界面科学社製接触角計「CA-S 150型」を用いて、接触角を目視で測定した。この測定は、温度25℃、湿度50%RHの環境下で行った。
日立ハイテクサイエンス社製「TG/DTA7220」を用い、窒素雰囲気下、10℃/minの昇温速度で室温から500℃まで昇温して、熱分解開始温度を測定した。熱分解開始温度は、試験加熱開始前の質量を通る横軸に平行な線と、分解曲線における屈曲点間の勾配が最大となるように引いた接線との交点とした。
攪拌機、窒素ガス導入管、温度計、ディーンスターク管および還流冷却管を備えた0.3L容の四つ口フラスコに、酸化亜鉛7.73g(95mmol)、グルタル酸12.3g(100mmol)、酢酸0.114g(2mmol)およびトルエン76.0gを仕込んだ。次に、反応系内に50mL/minの流量で窒素を流しながら、55℃まで昇温し、同温度で4時間攪拌して反応させた。その後、110℃まで昇温し、さらに同温度で2時間攪拌して共沸脱水させ水分を除去した後、室温まで冷却して、有機亜鉛触媒を含むスラリー液を得た。
攪拌機、ガス導入管および温度計を備えた1L容量のオートクレーブの系内をあらかじめ窒素雰囲気に置換した後、製造例1により得られた有機亜鉛触媒を含むスラリー液39.1g(有機亜鉛触媒を45mmol含む)、炭酸ジメチル192.4g、プロピレンオキシド26.1g(450mmol)および1-ヘキセンオキシド4.71g(47mmol)を仕込んだ。次に、攪拌下、60℃に昇温し、その後、二酸化炭素を加え、反応系内が1.0MPaとなるまで二酸化炭素を充填した。反応により消費される二酸化炭素を補給しながら10時間重合反応を行った。反応終了後、オートクレーブを冷却して脱圧し、ろ過した後、減圧乾燥して脂肪族ポリカーボネート樹脂41.3gを得た。得られた脂肪族ポリカーボネート樹脂の質量平均分子量は318000(Mw/Mn=7.91)であり、式(1)で表される構成単位(R1、R2、R3、R4のうち1つがn-ブチル基、残りが水素原子)の含有量は13.5質量%であった。
1-ヘキセンオキシドの量を14.6g(146mmol)に変えた以外は、実施例1と同様に重合を行い、脂肪族ポリカーボネート樹脂を54.7g得た。得られた脂肪族ポリカーボネート樹脂の質量平均分子量は186000(Mw/Mn=10.61)であり、式(1)で表される構成単位(R1、R2、R3、R4のうち1つがn-ブチル基、残りが水素原子)の含有量は32.0質量%であった。
1-ヘキセンオキシドの量を45.0g(450mmol)に変え、重合時間を24時間にした以外は、実施例1と同様に重合を行い、脂肪族ポリカーボネート樹脂を75.3g得た。得られた脂肪族ポリカーボネート樹脂の質量平均分子量は152000(Mw/Mn=5.22)であり、式(1)で表される構成単位(R1、R2、R3、R4のうち1つがn-ブチル基、残りが水素原子)の含有量は41.0質量%であった。
エポキシドとしてプロピレンオキシドのみを用いて(すなわち、1-ヘキセンオキシドを使用しなかった)、実施例1と同様に重合を行い、脂肪族ポリカーボネート樹脂40.0gを得た。得られた脂肪族ポリカーボネート樹脂の質量平均分子量は、301000(Mw/Mn=8.31)であった。
エポキシドとして1-ブテンオキシド32.4g(450mmol)のみを用いた以外は、実施例1と同様に重合を行い、脂肪族ポリカーボネート樹脂41.7gを得た。得られた脂肪族ポリカーボネート樹脂の質量平均分子量は、435000(Mw/Mn=12.41)であり、式(1)で表される構成単位(R1、R2、R3、R4のうち1つがエチル基、残りが水素原子)の含有量は100質量%であった。
1-ヘキセンオキシドを1-デセンオキシド7.6g(48mmol)に変えた以外は、実施例1と同様に重合を行い、脂肪族ポリカーボネート樹脂を38.5g得た。得られた脂肪族ポリカーボネート樹脂の質量平均分子量は270000(Mw/Mn=10.08)であり、式(1)で表される構成単位(R1、R2、R3、R4のうち1つがn-オクチル基、残りが水素原子)の含有量は16.2質量%であった。
1-ヘキセンオキシドをDIC社製エポサイザーM24(側鎖炭素数10~12のα-オレフィンエポキシドの混合物)11.9g(48mmol)に変えた以外は、実施例1と同様に重合を行い、脂肪族ポリカーボネート樹脂を38.7g得た。得られた脂肪族ポリカーボネート樹脂の質量平均分子量は199000(Mw/Mn=6.91)であり、式(1)で表される構成単位(R1、R2、R3、R4のうち1つが長鎖アルキル基、残りが水素原子)の含有量は10.5質量%であった。
1-ヘキセンオキシドをDIC社製エポサイザーM68(側鎖炭素数14~16のα-オレフィンエポキシドの混合物)14.3g(48mmol)に変えた以外は、実施例1と同様に重合を行い、脂肪族ポリカーボネート樹脂を40.2g得た。得られた脂肪族ポリカーボネート樹脂の質量平均分子量は276000(Mw/Mn=11.70)であり、式(1)で表される構成単位(R1、R2、R3、R4のうち1つが長鎖アルキル基、残りが水素原子)の含有量は26.2質量%であった。
1-ヘキセンオキシドをブチルグリシジルエーテル6.8g(48mmol)に変えた以外は、実施例1と同様に重合を行い、脂肪族ポリカーボネート樹脂を45.8g得た。得られた脂肪族ポリカーボネート樹脂の質量平均分子量は328000(Mw/Mn=10.31)であり、式(1)で表される構成単位(R1、R2、R3、R4のうち1つがn-ブトキシメチル基、残りが水素原子)の含有量は13.2質量%であった。
1-ヘキセンオキシドをナガセケムテックス社製デナコールEX-192(側鎖炭素数11~15のアルキルグリシジルエーテルの混合物)12.3g(48mmol)に変えた以外は、実施例1と同様に重合を行い、脂肪族ポリカーボネート樹脂を34.7g得た。得られた脂肪族ポリカーボネート樹脂の質量平均分子量は210000(Mw/Mn=8.62)であり、式(1)で表される構成単位(R1、R2、R3、R4のうち1つが長鎖アルキルオキシメチル基、残りが水素原子)の含有量は19.9質量%であった。
1-ヘキセンオキシドをアルケマ社製vikolox-18(1-オクタデセンオキシド)12.8g(48mmol)に変えた以外は、実施例1と同様に重合を行い、脂肪族ポリカーボネート樹脂を40.1g得た。得られた脂肪族ポリカーボネート樹脂の質量平均分子量は159000(Mw/Mn=11.07)であり、式(1)で表される構成単位(R1、R2、R3、R4のうち1つがn-ヘキサデシル基、残りが水素原子)の含有量は20.7質量%であった。
1-ヘキセンオキシドをアルケマ社製vikolox-18(1-オクタデセンオキシド)2.7g(10mmol)に変えた以外は、実施例1と同様に重合を行い、脂肪族ポリカーボネート樹脂を41.4g得た。得られた脂肪族ポリカーボネート樹脂の質量平均分子量は298000(Mw/Mn=10.41)であり、式(1)で表される構成単位(R1、R2、R3、R4のうち1つがn-ヘキサデシル基、残りが水素原子)の含有量は5.8質量%であった。
用いるすべてのエポキシドをスチレンオキシド54.2g(450mmol)のみに変えた以外は、実施例1と同様に重合を行い、脂肪族ポリカーボネート樹脂を20.2g得た。得られた脂肪族ポリカーボネート樹脂の質量平均分子量は212000(Mw/Mn=11.84)であり、式(1)で表される構成単位(R1、R2、R3、R4のうち1つがフェニル基、残りが水素原子)の含有量は100質量%であった。
Claims (9)
- 上記式(1)で表される構成単位の含有量が、全構成単位の総質量に対して5質量%以上である、請求項1記載の脂肪族ポリカーボネート樹脂。
- 請求項1~3のいずれか1項に記載の脂肪族ポリカーボネート樹脂を含む、隔壁材料。
- 請求項1~3のいずれか1項に記載の脂肪族ポリカーボネート樹脂で形成された隔壁を有する、基板。
- 請求項5に記載の基板の製造方法であって、
前記脂肪族ポリカーボネート樹脂を含む隔壁材料の塗膜を設けて隔壁を形成する工程を具備する、基板の製造方法。 - 請求項5に記載の基板を用いて形成される配線基板の製造方法であって、
前記基板上に配線材料を設けて配線を形成する工程を具備する、配線基板の製造方法。 - 前記基板に溝を形成する工程と、
前記溝に配線材料を設けて配線を形成する工程と、
を具備する、請求項7に記載の配線基板の製造方法。 - 請求項4に記載の隔壁材料を使用して配線を形成させる、配線形成方法。
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JP2018510626A JP6926068B2 (ja) | 2016-04-08 | 2017-04-05 | 隔壁形成用脂肪族ポリカーボネート樹脂、隔壁材料、基板及びその製造方法、配線基板の製造方法、並びに、配線形成方法 |
CN201780021057.1A CN108884218B (zh) | 2016-04-08 | 2017-04-05 | 隔壁形成用脂肪族聚碳酸酯树脂、隔壁材料、基板及其制造方法、布线基板的制造方法以及布线形成方法 |
EP17779156.3A EP3441417A4 (en) | 2016-04-08 | 2017-04-05 | ALIPHATIC POLYCARBONATE RESIN FOR MANUFACTURING A PARTITION, SEPARATING MATERIAL, SUBSTRATE AND PRODUCTION METHOD THEREFOR, MANUFACTURING METHOD FOR CIRCUIT SUBSTRATE AND CIRCUIT MANUFACTURING METHOD |
KR1020187028601A KR102314711B1 (ko) | 2016-04-08 | 2017-04-05 | 격벽 형성용 지방족 폴리카보네이트 수지, 격벽 재료, 기판 및 그 제조 방법, 배선 기판의 제조 방법 및 배선 형성 방법 |
US16/091,798 US11142611B2 (en) | 2016-04-08 | 2017-04-05 | Aliphatic polycarbonate resin for forming partition, partition material, substrate and production method therefor, production method for wiring substrate, and wiring forming method |
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JP2008285545A (ja) * | 2007-05-16 | 2008-11-27 | Tokyo Univ Of Science | ポリカーボネートの製造方法及びポリカーボネート |
JP2011190367A (ja) * | 2010-03-15 | 2011-09-29 | Toudai Tlo Ltd | 脂肪族ポリカルボナートおよびその製造方法 |
JP2013155213A (ja) * | 2012-01-26 | 2013-08-15 | Sumitomo Seika Chem Co Ltd | 高分子固体電解質および高分子固体電解質フィルム |
JP2014185260A (ja) * | 2013-03-25 | 2014-10-02 | Tokyo Univ Of Agriculture & Technology | 結晶性を有する二酸化炭素/エポキシド共重合体及びその製造方法 |
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WO2022209775A1 (ja) * | 2021-03-29 | 2022-10-06 | 住友精化株式会社 | フィルム及びその調製用材料 |
Also Published As
Publication number | Publication date |
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KR20180133407A (ko) | 2018-12-14 |
EP3441417A1 (en) | 2019-02-13 |
CN108884218A (zh) | 2018-11-23 |
TWI744307B (zh) | 2021-11-01 |
JP6926068B2 (ja) | 2021-08-25 |
US11142611B2 (en) | 2021-10-12 |
TW201807013A (zh) | 2018-03-01 |
US20190119440A1 (en) | 2019-04-25 |
EP3441417A4 (en) | 2019-10-30 |
KR102314711B1 (ko) | 2021-10-20 |
CN108884218B (zh) | 2021-01-29 |
JPWO2017175778A1 (ja) | 2019-02-14 |
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