WO2017160129A2 - Procédé de polissage de feuille stratifiée et dispositif de polissage de feuille stratifiée pour mettre en œuvre celui-ci - Google Patents

Procédé de polissage de feuille stratifiée et dispositif de polissage de feuille stratifiée pour mettre en œuvre celui-ci Download PDF

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Publication number
WO2017160129A2
WO2017160129A2 PCT/KR2017/002952 KR2017002952W WO2017160129A2 WO 2017160129 A2 WO2017160129 A2 WO 2017160129A2 KR 2017002952 W KR2017002952 W KR 2017002952W WO 2017160129 A2 WO2017160129 A2 WO 2017160129A2
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WO
WIPO (PCT)
Prior art keywords
polishing
target block
polishing target
processing
processing unit
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PCT/KR2017/002952
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English (en)
Korean (ko)
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WO2017160129A3 (fr
Inventor
강흥석
박명진
이종화
심민석
안덕근
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(주)이티에스
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Publication of WO2017160129A2 publication Critical patent/WO2017160129A2/fr
Publication of WO2017160129A3 publication Critical patent/WO2017160129A3/fr

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B9/00—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor
    • B24B9/02—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground
    • B24B9/06—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain
    • B24B9/08—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain of glass
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B29/00—Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B29/00—Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents
    • B24B29/02—Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents designed for particular workpieces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B57/00—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents
    • B24B57/02—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents for feeding of fluid, sprayed, pulverised, or liquefied grinding, polishing or lapping agents

Definitions

  • the present invention relates to a laminating sheet polishing method and a laminating sheet polishing apparatus for performing the same, and more particularly, to a laminating method and apparatus for laminating and polishing a sheet to be polished.
  • electronic devices such as smart phones, laptops and PDAs are equipped with a small camera and a touch sensor.
  • Small cameras and touch sensors provided in electronic devices are easily damaged by shock, and thin glass is used as a cover glass to prevent them.
  • the polishing process uses a method in which a person polishes thin glass individually one by one.
  • a person polishes thin glass individually one by one.
  • productivity decreases and labor costs increase.
  • the cover glass applied to the rear surface of the smart phone is made of a flat shape having a length longer than the width as shown in FIG. 1.
  • planar shape is not symmetrical, there is a problem in that side processing is difficult with a polishing method or a polishing apparatus for processing a cover glass having a square or circular planar shape.
  • An object of the present invention is to provide a laminated sheet polishing method for automatically polishing a polishing target block in which a plurality of polishing target sheets are stacked in recognition of the above trends and necessities, and a laminated sheet polishing apparatus for performing the same.
  • the present invention has been created in order to achieve the object of the present invention as described above, the present invention, the plurality of polishing target sheet 40 is laminated in the stacking direction in the height direction (L), width (W) and height
  • a sheet polishing method is disclosed.
  • the supplied grinding target block 40 is fixed and moved to a first machining position in which a first side processing unit 124 for grinding the side surface of the polishing target block 40 by relative rotation is installed. And a second machining position moving step, and a rotation machining step of rotating the polishing target block 40 about a rotation axis parallel to the lamination direction at the first machining position.
  • the first processing step may further include a distance adjusting step of adjusting a distance between the polishing target block 40 and the first side processing unit 124 according to the rotation of the polishing target block 40.
  • a second side processing part 224 is installed to fix the polishing target block 40 polished in the first processing step to polish the side surface of the polishing target block 40 by relative linear movement.
  • the linear polishing step may include a linear reciprocating step of linearly moving the polishing target block 40 along the longitudinal direction of the polishing target block 40 based on the second processing position.
  • a plurality of polishing target sheets 30 are laminated in a stacking direction in a height direction to laminate a polishing sheet block 40 having a length L, a width W, and a height H.
  • the second processing unit 200 may be supplied with the polishing target block 40 polished by the second processing unit 200 to polish the side surface of the polishing target block 40 by a relative linear movement perpendicular to the stacking direction.
  • the first processing unit 100 may include a first jig unit 110 for fixing the supplied polishing target block 40 to move to a first processing position, and installed at the first processing position to block the polishing target block ( 40 may include a first side processing part 120 which polishes the side surfaces parallel to the lamination direction by relative rotation about a rotation axis parallel to the lamination direction.
  • the first jig unit 110 a first gripper 111 for fixing the polishing target block 40, a rotary shaft coupled to the first gripper to rotate about the rotation axis, the first gripper 111 And it may include a first jig moving unit for moving the rotary shaft to the first machining position.
  • the first jig unit 110 the distance control to adjust the distance between the polishing block 40 and the first side processing unit 120 in accordance with the rotation of the polishing block 40 by the rotary shaft.
  • Means 130 may be included.
  • the distance adjusting means 130 is coupled to one side of the rotary shaft, the cam to rotate together in accordance with the rotation of the rotary shaft in contact with the fixing member 134 fixed to the first side processing unit 120 side It includes a member 132, the planar shape of the cam member 132 may correspond to the planar shape of the polishing target block (40).
  • the second side processing unit 220 may be installed at a position to polish the side surface of the polishing target block 40 by a relative linear movement perpendicular to the stacking direction.
  • the second side processing part 220 is coupled to the rotating shaft 222 parallel to the stacking direction of the polishing target block 40 fixed to the second jig part 210 and the rotating shaft 222 in a radial direction. It may include a plurality of protruding brush fibers 224.
  • the plurality of polishing target sheet 40 is laminated in the stacking direction in the height direction laminating the polishing target block 40 having a length (L), width (W) and height (H)
  • a sheet polishing apparatus comprising: support portions (510, 900) for supporting a polishing target block (40); It may include a side processing unit 520 for polishing the edge of each of the sheet to be polished 30 by friction with respect to the side of the polishing target block 40 supported by the support (510, 900).
  • the side processing unit 520 may include a blush unit 524 that is rubbed with the polishing target block 40 by a relative movement with respect to the polishing target block 40 supported by the support units 510 and 900. .
  • the blush 524 may be rubbed with the side surface of the polishing target block 40 by at least one of linear movement and rotational movement with respect to the side surface of the polishing target block 40.
  • the side processing unit for processing the polishing target block in contact with the side surface of the polishing target block is coupled to the rotating shaft parallel to the lamination direction of the polishing target block, and the rotating shaft It is composed of a plurality of brush fibers protruding in the radial direction has the advantage that can be precisely processed on the side of the sheet to be polished without damaging the sheet to be polished even when the thickness of the sheet to be constituting the polishing block is very thin have.
  • the laminated sheet polishing method and the laminated sheet polishing apparatus according to the present invention has the advantage that the production cost is reduced by reducing the labor cost by automating the machining process for polishing the side of the polishing target block.
  • the laminated sheet polishing method and the laminated sheet polishing apparatus according to the present invention when processing the side surface of the polishing target block by the relative rotation in the first processing step, the side value of processing the center of the polishing target block and the side of the polishing target block By providing a distance adjusting means for adjusting the distance between the study, there is an advantage that can be performed in the side processing even for the polishing target sheet having a length longer than the width.
  • FIG. 2 is a perspective view illustrating an example of a polishing target block in which a plurality of laminated sheets are stacked and a polishing target block after external appearance processing.
  • 3A is a perspective view illustrating another embodiment of a polishing target block in which a plurality of laminated sheets are stacked.
  • FIG. 3B is a perspective view illustrating a polishing target block after external processing as the polishing target block of FIG. 3A.
  • Figure 4a is a partial perspective view showing a laminated sheet polishing apparatus according to a first embodiment of the present invention.
  • FIG. 4B is a side view of the laminated sheet polishing apparatus of FIG. 4A.
  • Figure 4c is a plan view showing a state of polishing the polishing target block in the lamination sheet polishing apparatus of Figure 4a.
  • Figure 5 is a partial plan view showing a side pressure control method in the lamination sheet polishing apparatus of Figure 4a.
  • 6A and 6B are a side view and a plan view, respectively, showing a side processing part of a laminated sheet polishing apparatus according to another embodiment of the present invention.
  • FIG. 7 is a schematic plan view showing a part of a laminated sheet polishing apparatus according to an embodiment of the present invention.
  • FIG. 8 is a view showing the operation of the laminated sheet polishing apparatus of FIG.
  • FIG. 9 is an enlarged view showing a part of the configuration of the laminated sheet polishing apparatus of FIG. 3 in an enlarged manner.
  • FIG. 10 is a view for explaining the principle of operation of the lamination sheet polishing apparatus of FIG.
  • FIG. 11 is a schematic plan view showing a part of another configuration of a laminated sheet polishing apparatus according to an embodiment of the present invention.
  • FIG. 13 is a perspective view showing a part of a laminated sheet polishing apparatus according to an embodiment of the present invention.
  • Laminated sheet polishing apparatus is a device for polishing the side surface of the polishing target block 40 in which a plurality of polishing target sheet 30 is laminated, wherein the polishing is polishing, roughing, drawing and chamfering It includes all the processes necessary for processing the object sheet 30, and is not limited to a specific processing process.
  • the laminated sheet may sandwich the laminated thin film and the polishing target sheet 30 between two upper and lower protective sheets to form a sandwich structure. That is, the laminated sheet may include a protective sheet at the top and bottom of the stack.
  • the cutting target block 40 is cut through the cutting means, in order to be processed into a predetermined shape according to the purpose can be the outer surface processing on the side of the stacking direction of the polishing target block 40.
  • the side processing unit 520 may be supported by the fixed support 528 to face the support 510.
  • the fixed support 526 is a configuration for supporting the side processing portion 520 to face the support portion 510 is possible in a variety of configurations.
  • the abrasive 412 may correspond to a powder containing abrasive particles or a liquid containing abrasive particles used for a grinding process such as cutting or smoothing a surface of metal or glass.
  • the abrasive 412 may include at least one of cesium powder and ceramic powder, but is not limited thereto.
  • the abrasive 412 may be finely cut or finely crushed to the side of the polishing target block 40, and the fine particles cut off from the polishing target block 40 may be removed by the rotating brush part 524. have.
  • the laminated sheet polishing apparatus includes a polishing liquid 422 to the brush part so that the abrasive 412 made of powder is included in the brush part 524 and the side surface of the polishing target block 40 is smoothly polished.
  • a polishing liquid supply unit 420 to supply to 524 may be further included.
  • the polishing liquid 422 may be mixed with the abrasive 412 as a liquid material containing water or an oil component.
  • a mixture 526 mixed with the provided abrasive 412 or the polishing liquid 422 may be attached to the brush part 524.
  • the brush unit 524 to which the mixture 526 is attached may be rotated with respect to the rotation shaft 521 in contact with the polishing target block 40 by the side pressure control unit 540 described later.
  • the linear support part 550 may support the support part 510 and the motor 530 linearly in a horizontal direction toward the side processing part 520. Accordingly, the side pressure control unit 540 coupled with the linear support 550 may move the polishing target block 40 back and forth in the center direction of the horizontal cross section of the side processing unit 520.
  • the side pressure control unit 540 may use a spring or hydraulic pressure to move the polishing target block 40 forward and backward. That is, the side pressure control unit 540 may move the polishing target block 40 back and forth by a spring or hydraulic pressure.
  • the side pressure control unit 540 may utilize various pressurization systems that are not limited to spring or hydraulic pressure, as long as the polishing target block 40 may move forward and backward.
  • the side pressure control unit 540 may move the pressing member 546 back and forth by adjusting the flow and amount of gas or fluid in the cylinder 524 which will be described later. At this time, the pressing member 546 is connected to the connecting member 512, the polishing target block 40 can be moved back and forth in accordance with the movement of the pressing member 546.
  • the cylinder 524 may control the pressure applied to the side processing portion 520 by the polishing target block 40 by generating a restoring force through a spring or hydraulic pressure.
  • the side pressure control unit 540 may maintain the pressure applied to the side processing unit 520 by the polishing target block 40 at a preset set pressure. As another example, the side pressure control unit 540 may maintain the pressure applied to the side processing unit 520 by the polishing target block 40 within a preset set pressure range.
  • the side pressure control unit 540 is disposed on a straight line with the side processing unit 520 and the polishing target block 40 to move the pressing member 544 linearly (in the direction of the arrow), thereby processing the side processing unit 520 and the polishing target block.
  • the pressure between the 40 can be adjusted.
  • the polishing target block 40 connected indirectly through the pressing member 544 and the connecting member 512 also moves in the left direction. Accordingly, the pressure of the object to be polished 40 against the side processing portion 520 is increased.
  • the pressing member 544 moves in the right arrow direction
  • the polishing target block 40 connected indirectly through the pressing member 544 and the connecting member 512 also moves in the right direction. Accordingly, the pressure of the object to be polished 40 against the side processing portion 520 is reduced.
  • the side pressure control unit 540 may move the polishing target block 40 in a straight line (arrow direction) to control the pressure applied to the side processing unit 520 by the polishing target block 40, thereby causing micro cracks.
  • the polishing process can be automated without defects.
  • the jig 900 may include a plurality of jig grooves that may be stably placed at an upper end thereof in a state in which a portion of the side of the polishing target block 40 is exposed to the outside. Therefore, the plurality of polishing target blocks 40 may be disposed in each of the plurality of jig grooves.
  • the side processing unit 520 may be disposed on the top of the jig 900 to process the exposed side surface of the object to be polished 40 disposed on the jig 900.
  • the side processing unit 520 may rotate about the rotation shaft 521 to process the exposed side surface of the polishing target block 40.
  • the side processing unit 520 as shown in Figure 6a and 6b, may be processed to the side of the plurality of polishing target block 40 by moving in a straight line in the direction of the arrow.
  • the plurality of polishing target blocks 40 may be rearranged on the jig 900 so that the unprocessed side surface is exposed to the outside when machining of the exposed surface is completed.
  • the side polishing step may include an abrasive providing step of providing the abrasive 412 to the brush part 524.
  • the side polishing step may include a polishing liquid providing step of providing the polishing liquid 422 to the brush part 524.
  • the side grinding step may include a side processing unit rotating step of rotating the side processing unit 520 with respect to the longitudinal axis of rotation (521).
  • the laminated sheet polishing apparatus according to the second embodiment is particularly useful for polishing (especially, side chamfering) side surfaces parallel to the stacking direction of the object to be polished 40 whose length L is greater than the width W. .
  • the polishing target sheets 30 are stacked in a stacking direction in a height direction to have a length L, a width W, and a height H. 1.
  • a second processing part 200 which receives the polishing target block 40 polished from the first processing part 100 and polishes the side surface of the polishing target block 40 by relative linear movement. .
  • the first processing unit 100 may be configured to polish the side surfaces parallel to the stacking direction of the polishing target block 40 by relative rotation about a rotation axis parallel to the stacking direction.
  • the first processing unit 100 may polish all or part of the side surfaces parallel to the stacking direction of the polishing target block 40.
  • the first processing unit 100 may include a first jig unit 110 moving to a first processing position by fixing the supplied polishing target block 40 and a first processing unit. It may include a first side processing portion 120 is installed at the processing position to polish the side surface parallel to the lamination direction of the polishing target block 40 by relative rotation around the rotation axis parallel to the lamination direction.
  • the first jig unit 110 may include a first gripper 111 for fixing the polishing target block 40 at a predetermined first fixed position. have.
  • the first gripper 111 drives a movement of at least one of a pair of support members to support a pair of support members for supporting each of the opposing surfaces of the block to be polished and a pair of support members. It may include a first gripper driving unit (not shown).
  • the first jig unit includes a first polishing target block frame unit 150 supporting the plurality of polishing target blocks 40 before the plurality of polishing target blocks 40 are fixed between the pair of supporting members. can do.
  • the first polishing object block frame part 150 includes a plurality of polishing object blocks 40 arranged in a line along the stacking direction of the polishing object block 40. It supports, and is configured to be removed after the plurality of polishing target block 40 is fixed by a pair of supporting members can be configured in various ways.
  • the first jig portion 110, the first jig moving portion for moving the first gripper 111 and the rotating shaft fixed to the polishing target block 40 from the first fixed position to the first processing position where the polishing process is performed may further include (not shown).
  • the first jig moving part may be configured as a mechanical system such as a spring or a pressure system such as hydraulic / pneumatic, but is not limited thereto.
  • the first jig moving part is configured to move the first gripper 111 and the rotary shaft between the first fixed position and the first machining position is possible in various configurations.
  • the first jig moving part may further include a guide part (not shown) for guiding a moving path of the first gripper 111 and the rotary shaft.
  • the first side processing part 120 is installed at a first processing position and polishes the side surfaces parallel to the lamination direction of the polishing target block 40 by relative rotation about a rotation axis parallel to the lamination direction. Configuration is possible.
  • the brush fibers 124 may be provided along the outer circumferential surface of the cylindrical body portion 310 formed in the center of the coupling sphere 311 is coupled to the rotating shaft 122 .
  • the brush fibers 124 may be rubbed by relative rotation in a state in which the brush fibers 124 overlap with a predetermined portion of the side surface of the polishing target block 40 moved to the first processing position.
  • the polishing target sheet 30 stacked on the polishing target block 40 is ultra-thin (for example, , 0.3t or less), there is an advantage that the processing (chamfering) of the side surface of the polishing target sheet 30 can be performed without breaking or chipping the side of the polishing target sheet 30.
  • first side processing part 120 may include abrasive particles 50 bonded or attached to the brush fibers 124, as shown in FIG. 13.
  • the first processing unit 100 may further include an abrasive supply unit 140 for supplying an abrasive including abrasive particles 50 to the brush fibers 124.
  • the first fixed position is fixed at a predetermined position, but the first processing position does not mean a fixed specific position (a block to be polished ( 40 is conceptually defined as the position of the first gripper 111 for fixing the object 40 to be polished when the machining is made, it is not fixed to a specific position can be defined in a certain range.
  • a block to be polished 40 is conceptually defined as the position of the first gripper 111 for fixing the object 40 to be polished when the machining is made, it is not fixed to a specific position can be defined in a certain range.
  • the polishing target block 40 to be processed has a planar shape whose length L is longer than the width W, as shown in FIG. 3B, the polishing target block 40 by the first gripper 111 is formed. Since the distance from the rotation center C1 to the side to be processed is not kept constant, the polishing target block 40 fixed to the first gripper 111 rotates with respect to the rotation center C1. The distance between 40 and the first side processing portion 120 needs to be adjusted.
  • the first jig part 110 is subject to the polishing target block 40 and the first side processing portion 120 according to the rotation of the polishing target block 40 by the rotation driving unit 112. It may further include a distance adjusting means 130 for adjusting the distance between.
  • the distance adjusting means 130 in the side processing process of the polishing target block 40, in conjunction with the rotation of the polishing target block 40 by the rotation driving unit 112, the polishing target block 40 and the first side processing unit Various configurations are possible with the configuration to adjust the distance between the 120.
  • cam member 132 may be rotated in a supported state in contact with the fixing member 134 installed on the first side processing unit 120 in the polishing target block 40 process.
  • the cam member 132 may be maintained in contact with the fixing member 134 by being moved and pressed toward the fixing member 134 by the first jig moving part.
  • the fixing member 134 is fixed to the first side processing unit 120 side to support a side of the cam member 132 can be configured in various ways.
  • the fixing member 134 is preferably made of a metal material to minimize the friction generated between the cam member by the rotation of the cam member 132 and to minimize wear caused by the friction.
  • the fixing member 134 is preferably in linear contact with the cam member for stable support of the cam member 132 and minimization of the friction surface.
  • the fixing member 134 may be installed at various positions as long as the first side processing part 120 side.
  • the planar shape of the cam member 132 is configured to form a closed curve rather than a circular shape so that the distance between the object to be polished 40 and the first side processing part 120 can be adjusted according to the rotation of the cam member 132. Can be.
  • the planar shape of the object to be polished 40 is a pair of linear regions 131 corresponding to the longitudinal direction and facing each other and the width direction as shown in Figure 3c and curved both ends of the linear region
  • the planar shape of the cam member 132 may be formed in a shape corresponding to the planar shape of the object to be polished 40, as shown in FIG. 10. have.
  • the first jig moving portion, the first gripper 111 and the rotary shaft by pressing a predetermined pressing force toward the first side processing unit 120 in a state in which the cam member 132 is in close contact with the fixing member 134 It is preferred to be configured to maintain.
  • the rotation center C1 of the polishing target block 40 may be moved between the imaginary lines L1 and L2 in the vertical direction, and thus the rotation center C1 and the first rotation center of the polishing target block 40. Since the distance between the center of rotation (C2) of the side processing portion can be adjusted, the present invention has the advantage that can be performed by automated processing even for the polishing target block 40 of the shape shown in Figure 3b.
  • the second processing part 200 may process the side surface to be polished into a planar shape by polishing the side surface of the polishing object block 40 by relative linear movement.
  • the second processing part 200 is particularly useful for processing the linear region 31 of the sheet 30 to be polished shown in FIGS. 3B and 3C.
  • the two-processing part 200 can process the side surface part which is not processed by the 1st processing part 100, ie, the linear area
  • the second processing unit 200 fixes the polishing target block 40 supplied from the first processing unit 100 to move to the second processing position 210.
  • a second side processing portion 220 installed at a second processing position to polish the side surface of the polishing target block 40 by a relative linear movement perpendicular to the stacking direction of the polishing target block 40.
  • the second jig unit 210, the second gripper 211 for fixing the polishing target block 40, and the second gripper 211 is moved to the second machining position and linear reciprocating around the second machining position It may include a second jig moving unit (not shown) to move.
  • the second gripper 211 is configured to fix the polishing target block 40 at a preset second fixed position.
  • the second gripper 211 may include a pair of support members for supporting each of the pair of opposing surfaces except for the side surface of the polishing target block 40 and a pair of support members for adjusting a distance between the pair of support members. It may include a second gripper driving unit (not shown) for driving the movement of at least one of the pair of support members.
  • the second gripper driving unit may be configured by a pressure system such as hydraulic pressure or pneumatic pressure, but is not limited thereto. Various driving systems may be applied as long as the second gripper driving unit may drive movement of the support member.
  • At least one polishing target block 40 may be fixed between the pair of supporting members, but a plurality of polishing target blocks 40 are preferably fixed to improve productivity.
  • the second jig unit 210, the second polishing target block frame portion for supporting the plurality of polishing block 40 before the plurality of polishing block 40 is fixed between the pair of supporting members ( 250).
  • the second polishing object block frame part 250 includes a plurality of polishing object blocks 40 arranged in a line along a direction perpendicular to the stacking direction of the polishing object block 40.
  • Various configurations are possible with the configuration supporting them.
  • the second polishing target block frame part 250 may have a protrusion 252 formed on an upper surface thereof to form a gap between the plurality of polishing target blocks 40.
  • the second jig moving part is configured to move the second gripper holding the polishing target block 40 at the second fixed position to the second machining position and to process the polishing target block 40 by relative linear movement. This is possible.
  • the second jig moving part may be configured as a mechanical system such as a spring or a pressure system such as hydraulic / pneumatic.
  • the second jig moving unit moves the second gripper 211 between the second fixed position and the second machining position to start the machining process, and the polishing target block 40 during the machining of the polishing target block 40.
  • the second gripper 211 is fixed to the relative linear movement in the direction perpendicular to the stacking direction with respect to the second machining position is possible in various configurations.
  • the second jig moving part may further include a guide part 212 for guiding a movement path of the second gripper.
  • the second side processing part 220 is installed at a second processing position to polish the side surface of the polishing target block 40 by a relative linear movement perpendicular to the stacking direction of the polishing target block 40. It is possible.
  • the second side machining part 220 is fixed to the second machining position when the grinding target block 40 moves linearly reciprocally perpendicular to the lamination direction with respect to the second machining position by the second jig moving part. It is preferred to be installed.
  • the second side processing part 220 includes a rotating shaft 222 parallel to a stacking direction of the polishing target block 40 fixed to the second jig part 210, and a rotating shaft. Coupled to 222 and may include a plurality of radially protruding brush fibers (224).
  • the second side processing unit 220 may further include a rotation driving unit 226 for rotating the brush fibers 224 around the rotation shaft 222 at the center of rotation (M).
  • the second side processing unit 220 which may be configured in the same manner as the first side processing unit 120 described above will be omitted in the overlapping range.
  • each side sequentially corresponding to the pair of linear region 31 separately I can process it.
  • the polishing target block (2) is processed by the second side processing unit 220. Since the pressure exerted on the side surface 40 varies depending on the position (side portion), unintended bending may be formed in the linear region 31 of the block 40 to be polished.
  • the first processing unit 100 or the first processing unit 100 or the second processing unit 200 in consideration of the unintentional bending may be formed by the processing in the first processing unit 100 or It can be solved through the external processing for the polishing target block 40 that is performed before the processing by the two processing unit 200.
  • the linear region 31 may be convexly processed when the external shape of the object to be polished 40 is polished.
  • planar shape of the final block 40 to be polished may be formed as close as possible to the linear shape set in advance.
  • the straight region 31 is protruded outwardly from the center portion, that is, convexly outwardly compared to the edge portion based on the planar shape of the polishing target block 40.
  • the linear region 31 of the planar shape of the polishing target block 40 finally calculated through the side processing (chamfering processing) by the second processing unit 200 is formed as close as possible to the preset linear shape. Can be.
  • the second processing unit 200 may be configured to adjust the processing depth of the side of the polishing target block 40 during the processing.
  • the second processing unit 200 may close the distance between the polishing target block 40 and the second side processing unit 220 according to the machining portion of the polishing target block 40 to polish the polishing target block 40.
  • the second side processing portion 220 By applying a pressure to the second side processing portion 220 by the process depth of the side of the polishing target block 40 can be adjusted.
  • the second machining part 200 controls the rotational speed of the second side machining part 220 in accordance with the machining part of the grinding target block 40 to reduce the machining depth of the side surface of the grinding target block 40. I can regulate it.

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)

Abstract

La présente invention concerne un procédé de polissage de feuille stratifiée et un dispositif de polissage de feuille stratifiée destinée à mettre en œuvre ce dernier et, plus particulièrement, un procédé de polissage pour stratifier des feuilles à polir et pour polir celles-ci et un dispositif associé. La présente invention concerne un procédé de polissage de feuille stratifiée pour stratifier une pluralité de feuilles (40) à polir dans la direction de hauteur en tant que direction de stratification et pour polir un bloc (40) à polir ayant une longueur (L), une largeur (W) et une hauteur (L), le procédé de polissage de feuille stratifiée étant caractérisé en ce qu'il comprend : une première étape de traitement consistant à polir une surface latérale du bloc (40) à polir, qui est parallèle à la direction de stratification, au moyen d'une rotation relative autour d'un axe de rotation parallèle à la direction de stratification ; et une seconde étape de traitement consistant à polir la surface latérale du bloc (40) à polir au moyen d'un déplacement linéaire relatif perpendiculaire à la direction de stratification, après la première étape de traitement.
PCT/KR2017/002952 2016-03-17 2017-03-17 Procédé de polissage de feuille stratifiée et dispositif de polissage de feuille stratifiée pour mettre en œuvre celui-ci WO2017160129A2 (fr)

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CN109986434A (zh) * 2018-01-03 2019-07-09 Lpt株式会社 手机用玻璃边框抛光系统
CN110328590A (zh) * 2019-06-03 2019-10-15 岑俭雄 一种用于精密加工机床的多轴联动抛光机构
CN110900312A (zh) * 2018-09-14 2020-03-24 蔡赞峰 一种精密毛刷研磨抛光工艺
CN111070019A (zh) * 2019-12-25 2020-04-28 东莞市晶博光电有限公司 一种缩短玻璃盖板棱抛加工时间和稳定棱抛尺寸的方法
CN113070741A (zh) * 2021-04-13 2021-07-06 蓝思科技（长沙）有限公司 抛光ag玻璃的方法、亮度渐变的ag玻璃和手机

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JP3915374B2 (ja) * 2000-06-27 2007-05-16 坂東機工株式会社 ガラス板の皮膜層除去方法及びその装置並びにその装置を具備したガラス板の加工装置
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CN110900312A (zh) * 2018-09-14 2020-03-24 蔡赞峰 一种精密毛刷研磨抛光工艺
CN109514410A (zh) * 2018-12-26 2019-03-26 东莞市金太阳精密技术有限责任公司 一种用于手机中框的叠抛机
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CN110328590A (zh) * 2019-06-03 2019-10-15 岑俭雄 一种用于精密加工机床的多轴联动抛光机构
CN110328590B (zh) * 2019-06-03 2021-02-05 深圳市高郭氏精密机械有限公司 一种用于精密加工机床的多轴联动抛光机构
CN111070019A (zh) * 2019-12-25 2020-04-28 东莞市晶博光电有限公司 一种缩短玻璃盖板棱抛加工时间和稳定棱抛尺寸的方法
CN113070741A (zh) * 2021-04-13 2021-07-06 蓝思科技（长沙）有限公司 抛光ag玻璃的方法、亮度渐变的ag玻璃和手机
CN113070741B (zh) * 2021-04-13 2022-06-21 蓝思科技（长沙）有限公司 抛光ag玻璃的方法、亮度渐变的ag玻璃和手机

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KR20170108888A (ko) 2017-09-27
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