WO2017160129A2 - Laminated sheet polishing method and laminated sheet polishing device for performing same - Google Patents

Abstract

The present invention relates to a laminated sheet polishing method and a laminated sheet polishing device for performing the same and, more particularly, to a polishing method for laminating sheets to be polished and polishing the same and a device therefor. The present invention provides a laminated sheet polishing method for laminating a plurality of sheets (40) to be polished in the height direction as the laminating direction and polishing a block (40) to be polished having a length (L), a width (W), and a height (L), the laminated sheet polishing method being characterized by comprising: a first processing step of polishing a side surface of the block (40) to be polished, which is parallel with the laminating direction, by means of a relative rotation about an axis of rotation parallel with the laminating direction; and a second processing step of polishing the side surface of the block (40) to be polished by means of a relative linear movement perpendicular to the laminating direction, after the first processing step.

Description

Laminated sheet polishing method and laminating sheet polishing apparatus performing the same

The present invention relates to a laminating sheet polishing method and a laminating sheet polishing apparatus for performing the same, and more particularly, to a laminating method and apparatus for laminating and polishing a sheet to be polished.

In general, electronic devices such as smart phones, laptops and PDAs are equipped with a small camera and a touch sensor. Small cameras and touch sensors provided in electronic devices are easily damaged by shock, and thin glass is used as a cover glass to prevent them.

On the other hand, thin film glass has to go through the polishing process on the outer edge in order to be applied to the product. Conventionally, the polishing process uses a method in which a person polishes thin glass individually one by one. However, such an individual polishing method has a problem in that productivity decreases and labor costs increase.

In addition, as the dual camera module 11 is built in the smart phone 1 recently, the cover glass applied to the rear surface of the smart phone is made of a flat shape having a length longer than the width as shown in FIG. 1.

In this case, since the planar shape is not symmetrical, there is a problem in that side processing is difficult with a polishing method or a polishing apparatus for processing a cover glass having a square or circular planar shape.

SUMMARY OF THE INVENTION An object of the present invention is to provide a laminated sheet polishing method for automatically polishing a polishing target block in which a plurality of polishing target sheets are stacked in recognition of the above trends and necessities, and a laminated sheet polishing apparatus for performing the same.

The present invention has been created in order to achieve the object of the present invention as described above, the present invention, the plurality of polishing target sheet 40 is laminated in the stacking direction in the height direction (L), width (W) and height A lamination sheet polishing method for polishing a polishing target block 40 having (H), the side of which is parallel to the stacking direction of the polishing target block 40 by a relative rotation about a rotation axis parallel to the stacking direction. A first processing step of grinding, and a second processing step of grinding the side of the polishing target block 40 by a relative linear movement perpendicular to the stacking direction after the first processing step. A sheet polishing method is disclosed.

In the first processing step, the supplied grinding target block 40 is fixed and moved to a first machining position in which a first side processing unit 124 for grinding the side surface of the polishing target block 40 by relative rotation is installed. And a second machining position moving step, and a rotation machining step of rotating the polishing target block 40 about a rotation axis parallel to the lamination direction at the first machining position.

The first processing step may further include a distance adjusting step of adjusting a distance between the polishing target block 40 and the first side processing unit 124 according to the rotation of the polishing target block 40.

In the second processing step, a second side processing part 224 is installed to fix the polishing target block 40 polished in the first processing step to polish the side surface of the polishing target block 40 by relative linear movement. A moving step of moving to the second machining position, and the linear polishing step of grinding the side surface of the polishing target block 40 by a relative linear movement perpendicular to the stacking direction of the polishing target block 40.

The linear polishing step may include a linear reciprocating step of linearly moving the polishing target block 40 along the longitudinal direction of the polishing target block 40 based on the second processing position.

According to the present invention, a plurality of polishing target sheets 30 are laminated in a stacking direction in a height direction to laminate a polishing sheet block 40 having a length L, a width W, and a height H. The first processing unit 100 and the first processing unit 100 for polishing the side surface parallel to the stacking direction of the polishing target block 40 by a relative rotation about the rotation axis parallel to the stacking direction, The second processing unit 200 may be supplied with the polishing target block 40 polished by the second processing unit 200 to polish the side surface of the polishing target block 40 by a relative linear movement perpendicular to the stacking direction.

The first processing unit 100 may include a first jig unit 110 for fixing the supplied polishing target block 40 to move to a first processing position, and installed at the first processing position to block the polishing target block ( 40 may include a first side processing part 120 which polishes the side surfaces parallel to the lamination direction by relative rotation about a rotation axis parallel to the lamination direction.

The first jig unit 110, a first gripper 111 for fixing the polishing target block 40, a rotary shaft coupled to the first gripper to rotate about the rotation axis, the first gripper 111 And it may include a first jig moving unit for moving the rotary shaft to the first machining position.

The first jig unit 110, the distance control to adjust the distance between the polishing block 40 and the first side processing unit 120 in accordance with the rotation of the polishing block 40 by the rotary shaft. Means 130 may be included.

The distance adjusting means 130 is coupled to one side of the rotary shaft, the cam to rotate together in accordance with the rotation of the rotary shaft in contact with the fixing member 134 fixed to the first side processing unit 120 side It includes a member 132, the planar shape of the cam member 132 may correspond to the planar shape of the polishing target block (40).

The first side processing part 120 is coupled to the rotating shaft 122 parallel to the stacking direction of the polishing target block 40 fixed to the first jig part 110 and the rotating shaft 122 in a radial direction. It may include a plurality of protruding brush fibers (124).

The second processing unit 200, the second jig unit 210 to be moved to the second processing position by fixing the polishing target block 40 supplied from the first processing unit 100, the second processing The second side processing unit 220 may be installed at a position to polish the side surface of the polishing target block 40 by a relative linear movement perpendicular to the stacking direction.

The second jig unit 210 may move the second gripper 211 and the second gripper 211 to the second machining position to fix the polishing target block 40, and to change the second machining position. It may include a second jig moving unit for linear reciprocating movement to the center.

The second side processing part 220 is coupled to the rotating shaft 222 parallel to the stacking direction of the polishing target block 40 fixed to the second jig part 210 and the rotating shaft 222 in a radial direction. It may include a plurality of protruding brush fibers 224.

In another aspect, the present invention, the plurality of polishing target sheet 40 is laminated in the stacking direction in the height direction laminating the polishing target block 40 having a length (L), width (W) and height (H) A sheet polishing apparatus, comprising: support portions (510, 900) for supporting a polishing target block (40); It may include a side processing unit 520 for polishing the edge of each of the sheet to be polished 30 by friction with respect to the side of the polishing target block 40 supported by the support (510, 900).

The side processing unit 520 may include a blush unit 524 that is rubbed with the polishing target block 40 by a relative movement with respect to the polishing target block 40 supported by the support units 510 and 900. .

The blush 524 may be rubbed with the side surface of the polishing target block 40 by at least one of linear movement and rotational movement with respect to the side surface of the polishing target block 40.

Laminated sheet polishing method and laminating sheet polishing apparatus according to the present invention, by polishing the side surface of the polishing target block laminated a plurality of polishing target sheet can be polished the side surface of the plurality of polishing target sheet at a time, the productivity is improved have.

In addition, the laminated sheet polishing method and the laminated sheet polishing apparatus according to the present invention, the side processing unit for processing the polishing target block in contact with the side surface of the polishing target block is coupled to the rotating shaft parallel to the lamination direction of the polishing target block, and the rotating shaft It is composed of a plurality of brush fibers protruding in the radial direction has the advantage that can be precisely processed on the side of the sheet to be polished without damaging the sheet to be polished even when the thickness of the sheet to be constituting the polishing block is very thin have.

In addition, the laminated sheet polishing method and the laminated sheet polishing apparatus according to the present invention has the advantage that the production cost is reduced by reducing the labor cost by automating the machining process for polishing the side of the polishing target block.

In addition, the laminated sheet polishing method and the laminated sheet polishing apparatus according to the present invention, when processing the side surface of the polishing target block by the relative rotation in the first processing step, the side value of processing the center of the polishing target block and the side of the polishing target block By providing a distance adjusting means for adjusting the distance between the study, there is an advantage that can be performed in the side processing even for the polishing target sheet having a length longer than the width.

1 is a perspective view illustrating an electronic device in which a laminated sheet polished in a laminated sheet polishing apparatus according to an embodiment of the present invention is applied to a cover glass of a camera module.

FIG. 2 is a perspective view illustrating an example of a polishing target block in which a plurality of laminated sheets are stacked and a polishing target block after external appearance processing.

3A is a perspective view illustrating another embodiment of a polishing target block in which a plurality of laminated sheets are stacked.

FIG. 3B is a perspective view illustrating a polishing target block after external processing as the polishing target block of FIG. 3A.

3C is a plan view of the polishing target block of FIG. 3B.

Figure 4a is a partial perspective view showing a laminated sheet polishing apparatus according to a first embodiment of the present invention.

4B is a side view of the laminated sheet polishing apparatus of FIG. 4A.

Figure 4c is a plan view showing a state of polishing the polishing target block in the lamination sheet polishing apparatus of Figure 4a.

Figure 5 is a partial plan view showing a side pressure control method in the lamination sheet polishing apparatus of Figure 4a.

6A and 6B are a side view and a plan view, respectively, showing a side processing part of a laminated sheet polishing apparatus according to another embodiment of the present invention.

7 is a schematic plan view showing a part of a laminated sheet polishing apparatus according to an embodiment of the present invention.

8 is a view showing the operation of the laminated sheet polishing apparatus of FIG.

FIG. 9 is an enlarged view showing a part of the configuration of the laminated sheet polishing apparatus of FIG. 3 in an enlarged manner.

10 is a view for explaining the principle of operation of the lamination sheet polishing apparatus of FIG.

11 is a schematic plan view showing a part of another configuration of a laminated sheet polishing apparatus according to an embodiment of the present invention.

12 is a view showing the operation of the laminated sheet polishing apparatus of FIG.

13 is a perspective view showing a part of a laminated sheet polishing apparatus according to an embodiment of the present invention.

Hereinafter, the laminating sheet polishing apparatus according to the present invention will be described with reference to the accompanying drawings.

Laminated sheet polishing apparatus according to the present invention is a device for polishing the side surface of the polishing target block 40 in which a plurality of polishing target sheet 30 is laminated, wherein the polishing is polishing, roughing, drawing and chamfering It includes all the processes necessary for processing the object sheet 30, and is not limited to a specific processing process.

For example, the polishing by the laminated sheet polishing apparatus is a process of removing the sharp portion by polishing the edge, that is, the corner portion of the sheet to be polished 30, and may be represented by a so-called chamfering process.

The polishing target sheet 30 may be a protective glass (cover glass) such as tempered glass for protecting a lens, a touch screen, or the like of the camera module, and a sheet requiring a finishing process to remove sharp parts on the side surface. All members can be the object.

In particular, the polishing target sheet 30 is useful for processing thin sheets having a thickness of 0.3 mm or less.

The polishing target block 40 is a block formed by stacking the polishing target sheets 30 as illustrated in FIGS. 2 to 3C, and various structures are possible according to the stacked structure of the polishing target sheets 30.

In particular, the polishing target block 40 may be divided into a plurality of polishing target blocks 40 by dividing a lamination sheet in which a large number of sheets to be plane-divided into a plurality of polishing target sheets 30 are cut using a cutting means such as a rotary cutter. )

The laminated sheet may include a protective sheet 10, a thin film and a polishing target sheet 30.

The laminated sheet may have a structure in which the thin film and the polishing target sheet 30 are alternately stacked. In this case, the thin film and the polishing target sheet 30 may be bonded to each other through an adhesive.

The conventional laminated sheet used a method of laminating a separate processing glass between the polishing target sheet 30, there is a problem that the thickness of the entire laminated sheet is thick and the layer spacing is uneven, so that the polishing efficiency is reduced.

On the other hand, the present invention, by using a thin film instead of the processing glass in the laminated sheet 1 to form a thin thickness of the laminated sheet and to form a uniform layer spacing can improve the polishing efficiency.

The laminated sheet may sandwich the laminated thin film and the polishing target sheet 30 between two upper and lower protective sheets to form a sandwich structure. That is, the laminated sheet may include a protective sheet at the top and bottom of the stack.

As shown in FIGS. 2A and 2B, the polishing target block 40 has a protective sheet stacked on the upper and lower surfaces, and the bonding sheet 30 is bonded to bond the polishing sheet 30 between the polishing sheet 30. Layers (at least one of adhesive and thin film) may be laminated.

The polishing target block 40 may be configured in a block shape having a length L, a width W, and a height H, as shown in FIGS. 2 and 3B.

At this time, the planar shape of the polishing target block 40 can be a variety of shapes, such as circular and square, depending on the application of the polishing target sheet (30).

As an example, the polishing target block 40 may be formed in a planar shape of a square having the same length L and width W as shown in FIG. 2.

As another example, the polishing target sheet 30 of the polishing target block 40 may be formed in a planar shape of an oval or rectangular shape having a length L longer than a width W, as shown in FIGS. 3A and 3B. Can be.

On the other hand, the cutting target block 40 is cut through the cutting means, in order to be processed into a predetermined shape according to the purpose can be the outer surface processing on the side of the stacking direction of the polishing target block 40.

For example, the polishing target block 40 having finished the external processing may have rounded side edges as shown in FIGS. 2 and 3B.

Meanwhile, in the case of the polishing target block 40 having a planar length L greater than the width W, as illustrated in FIG. 2C, the side edges may be roundly polished to have an elliptical planar shape.

Specifically, the planar shape of the polishing target block 40 corresponds to the longitudinal direction (L) and corresponds to a pair of linear regions 31 and the width direction (W) facing each other, and both ends of the straight portion are curved. It may be composed of a pair of curved areas 32 connected to.

In addition, since the plurality of polishing target sheets 30 stacked on the polishing target block 40 may have sharp portions at each corner, chamfering of the side surface of the polishing target block 40 may be additionally performed. Do.

On the other hand, in the lamination sheet polishing apparatus according to the present invention, the lamination direction of the object to be polished polishing block 40 having a length (L), width (W) and height (H) by laminating the height direction in the lamination direction Various configurations are possible with a device that polishes (parallel processing or chamfering processing, etc.) side surfaces in parallel with each other.

Hereinafter, the laminating sheet polishing apparatus according to the first embodiment of the present invention will be described in detail with reference to FIGS. 4A to 6B.

The laminated sheet polishing apparatus according to the first embodiment is particularly useful for polishing (especially, side chamfering) side surfaces parallel to the stacking direction of the polishing target block 40 having the same length L and width W. .

Laminated sheet polishing apparatus according to the present invention, as shown in Figures 4a to 6b, the support portion (510, 900) for supporting a polishing target block 40 is laminated a plurality of polishing target sheet 30; It may include a side processing unit 520 for polishing the edge of each of the sheet to be polished 30 by friction with respect to the polishing object block 40 supported by the support (510, 900).

The support parts 510 and 900 may be configured to support the polishing target block 40 in which the plurality of polishing target sheets 30 are stacked.

In particular, the support parts 510 and 900 may have various structures, such as the structure shown in FIGS. 4A to 4C or the structure shown in FIGS. 6A and 6B according to the support structure thereof.

In detail, the support part 510 supports the polishing object block 40 by pressing the upper and lower surfaces (part of the protective sheet 10) of the polishing object block 40 as illustrated in FIGS. 4A to 4C. can do.

For example, the support part 510 may be a pair of jigs that support the polishing target block 40 by pressing the surfaces of the upper and lower protection sheets 10 without slipping the polishing target block 40 without slipping. Can be configured.

At this time, the support portion 510, any one of a pair of jigs are moved in the longitudinal direction of the polishing target block 40 by the linear drive unit 530 driven by hydraulic, pneumatic, etc., the polishing target block 40 Can be fixed.

The linear driving unit 530 is a structure for linearly moving any one of the pair of jigs in the longitudinal direction of the polishing target block 40 by one of the pair of jigs by hydraulic pressure, pneumatic or the like. 512 may be fixedly installed.

On the other hand, the support portion 510, the upper and lower surfaces of the polishing target block 40 in the state fixed by the longitudinal axis of the polishing target block 40 to rotate the rotating drive unit (not shown) It can rotate by.

The rotation driving unit is configured to rotate the polishing target block 40 using the longitudinal direction of the polishing target block 40 as the rotation axis in a state in which the upper and lower surfaces of the polishing target block 40 are pressed and fixed. Do.

Here, the rotation driving unit is used as a rotation driving source for the relative rotation of the side processing unit 520 to be described later, or when the polishing processing of a part of the side by the side processing unit 520 is completed, by rotating the polishing target block 40 The polishing target block 40 may be rotated such that the portion not polished is positioned toward the side processing portion 520.

The side processing unit 520 may be configured to polish the edges of the respective polishing target sheets 30 by friction with respect to the polishing target block 40 supported by the supporting units 510 and 900.

The side processing unit 520 may process the polishing target block 40 by rotating or linearly moving. For example, as shown in FIG. 4, the side processing unit 520 may rotate with respect to the longitudinal axis of rotation 521. The side processing unit 520 may generate a frictional force by rotating the rotary shaft 521 in contact with the polishing target block 40 to process the side surface of the polishing target block 40.

In particular, the side processing unit 520, the polishing target block 40 by the relative movement with respect to the polishing target block 40 supported on the support (510, 900) to enable the processing of the polishing target sheet 30 of a thin thickness. It is preferable to include a blush 524 rubbing with).

The blush unit 524 may be configured similarly or identically to the first side processing unit 120 and the second side processing unit 220 which will be described later, and thus further detailed description thereof will be omitted.

The side processing unit 520 may be supported by the fixed support 528 to face the support 510.

The fixed support 526 is a configuration for supporting the side processing portion 520 to face the support portion 510 is possible in a variety of configurations.

In particular, the fixed support 526, the support member 526 for supporting the side processing portion 520 is installed to be movable in the vertical direction may be configured to be able to adjust the vertical position of the side processing portion 520.

At this time, the fixed support 526, a guide portion 527 for guiding the vertical movement of the support member 526 may be installed.

And the vertical movement of the support member 526 with respect to the fixed support 526, having a separate up and down drive unit (not shown) is automatically moved up or down by various methods, such as being moved up and down manually Can be moved.

Meanwhile, the multilayer sheet polishing apparatus may further include an abrasive supply unit 410 supplying an abrasive 412 including abrasive particles to the brush unit 524.

The abrasive 412 may correspond to a powder containing abrasive particles or a liquid containing abrasive particles used for a grinding process such as cutting or smoothing a surface of metal or glass. The abrasive 412 may include at least one of cesium powder and ceramic powder, but is not limited thereto. The abrasive 412 may be finely cut or finely crushed to the side of the polishing target block 40, and the fine particles cut off from the polishing target block 40 may be removed by the rotating brush part 524. have.

In addition, the laminated sheet polishing apparatus includes a polishing liquid 422 to the brush part so that the abrasive 412 made of powder is included in the brush part 524 and the side surface of the polishing target block 40 is smoothly polished. A polishing liquid supply unit 420 to supply to 524 may be further included. In this case, the polishing liquid 422 may be mixed with the abrasive 412 as a liquid material containing water or an oil component.

4A to 6B, the abrasive supply unit 410 and the abrasive liquid supply unit 420 are connected to the abrasive 412 supply system and implemented as a nozzle to spray the abrasive 412 onto the brush unit 524. The abrasive 412 can be provided.

Referring to FIG. 13, a mixture 526 mixed with the provided abrasive 412 or the polishing liquid 422 may be attached to the brush part 524. The brush unit 524 to which the mixture 526 is attached may be rotated with respect to the rotation shaft 521 in contact with the polishing target block 40 by the side pressure control unit 540 described later.

As shown in FIGS. 4A to 4C, the side pressure control unit 540 is indirectly connected through the polishing target block 40 and the connecting member 512 to control the pressure applied to the polishing target block 40. can do. At this time, the side pressure control unit 540 may be combined with a linear support 550 to be described later disposed on a straight line connecting the center of the horizontal cross section of the side processing unit 520 and the horizontal cross section of the polishing target block 40. have.

The linear support part 550 may support the support part 510 and the motor 530 linearly in a horizontal direction toward the side processing part 520. Accordingly, the side pressure control unit 540 coupled with the linear support 550 may move the polishing target block 40 back and forth in the center direction of the horizontal cross section of the side processing unit 520.

In this case, the side pressure control unit 540 may use a spring or hydraulic pressure to move the polishing target block 40 forward and backward. That is, the side pressure control unit 540 may move the polishing target block 40 back and forth by a spring or hydraulic pressure. However, the side pressure control unit 540 may utilize various pressurization systems that are not limited to spring or hydraulic pressure, as long as the polishing target block 40 may move forward and backward.

The side pressure control unit 540 may include a cylinder 542, a fixing member 544, and a pressing member 546.

In this case, the side pressure control unit 540 may press the support part 510 and the motor 530 toward the side processing part 520 by using the pressure member 544.

For example, the side pressure control unit 540 may move the pressing member 546 back and forth by adjusting the flow and amount of gas or fluid in the cylinder 524 which will be described later. At this time, the pressing member 546 is connected to the connecting member 512, the polishing target block 40 can be moved back and forth in accordance with the movement of the pressing member 546.

For example, the cylinder 524 may generate a restoring force according to the displacement of the pressing member 546, including a tube for adjusting the flow of the spring or the internal fluid.

That is, the cylinder 524 may control the pressure applied to the side processing portion 520 by the polishing target block 40 by generating a restoring force through a spring or hydraulic pressure.

Therefore, the side pressure control unit 540 may maintain the pressure applied to the side processing unit 520 by the polishing target block 40 at a preset set pressure. As another example, the side pressure control unit 540 may maintain the pressure applied to the side processing unit 520 by the polishing target block 40 within a preset set pressure range.

The side pressure control unit 540 is disposed on a straight line with the side processing unit 520 and the polishing target block 40 to move the pressing member 544 linearly (in the direction of the arrow), thereby processing the side processing unit 520 and the polishing target block. The pressure between the 40 can be adjusted.

More specifically, when the pressing member 544 moves in the left arrow direction, the polishing target block 40 connected indirectly through the pressing member 544 and the connecting member 512 also moves in the left direction. Accordingly, the pressure of the object to be polished 40 against the side processing portion 520 is increased. On the contrary, when the pressing member 544 moves in the right arrow direction, the polishing target block 40 connected indirectly through the pressing member 544 and the connecting member 512 also moves in the right direction. Accordingly, the pressure of the object to be polished 40 against the side processing portion 520 is reduced.

That is, the side pressure control unit 540 may move the polishing target block 40 in a straight line (arrow direction) to control the pressure applied to the side processing unit 520 by the polishing target block 40, thereby causing micro cracks. The polishing process can be automated without defects.

Hereinafter, the side processing unit 520 according to another embodiment of the present invention will be described with reference to FIGS. 6A to B.

6A and 6B, the laminated sheet polishing apparatus may include a jig 900 which may arrange and fix the plurality of polishing target blocks 40 spaced apart from each other.

The jig 900 may include a plurality of jig grooves that may be stably placed at an upper end thereof in a state in which a portion of the side of the polishing target block 40 is exposed to the outside. Therefore, the plurality of polishing target blocks 40 may be disposed in each of the plurality of jig grooves.

As shown in FIG. 9, the side processing unit 520 may be disposed on the top of the jig 900 to process the exposed side surface of the object to be polished 40 disposed on the jig 900. The side processing unit 520 may rotate about the rotation shaft 521 to process the exposed side surface of the polishing target block 40. In addition, the side processing unit 520, as shown in Figure 6a and 6b, may be processed to the side of the plurality of polishing target block 40 by moving in a straight line in the direction of the arrow. The plurality of polishing target blocks 40 may be rearranged on the jig 900 so that the unprocessed side surface is exposed to the outside when machining of the exposed surface is completed.

Specifically, the laminated sheet polishing apparatus according to the present invention having the configuration as described above, the support step of supporting the polishing target block 40, the plurality of polishing target sheet 30 is laminated to the support (510, 900); And a side polishing step of grinding the edges of the respective polishing target sheets 30 by friction with respect to the polishing target block 40 supported by the supporting portions 510 and 900, wherein the side polishing step comprises: the supporting portion 510 And the edges of the respective polishing target sheets 30 by rubbing the polishing target block 40 by the blush 524 by relative movement with respect to the polishing target block 40 supported by, 900. The polishing of the sheet to be polished may be performed by the lamination sheet polishing method.

The side polishing step may include an abrasive providing step of providing the abrasive 412 to the brush part 524.

The side polishing step may include a polishing liquid providing step of providing the polishing liquid 422 to the brush part 524.

The side grinding step may include a side processing unit rotating step of rotating the side processing unit 520 with respect to the longitudinal axis of rotation (521).

Hereinafter, the laminating sheet polishing apparatus according to the second embodiment of the present invention will be described in detail with reference to FIGS. 7 to 12.

The laminated sheet polishing apparatus according to the second embodiment is particularly useful for polishing (especially, side chamfering) side surfaces parallel to the stacking direction of the object to be polished 40 whose length L is greater than the width W. .

In the laminated sheet polishing apparatus, as shown in FIGS. 7 to 12, the polishing target sheets 30 are stacked in a stacking direction in a height direction to have a length L, a width W, and a height H. 1. A laminated sheet polishing apparatus for polishing a target block 40, the first processing part 100 polishing a side surface parallel to the stacking direction of the target block 40 by relative rotation about a rotation axis parallel to the stacking direction. And a second processing part 200 which receives the polishing target block 40 polished from the first processing part 100 and polishes the side surface of the polishing target block 40 by relative linear movement. .

The first processing unit 100 may be configured to polish the side surfaces parallel to the stacking direction of the polishing target block 40 by relative rotation about a rotation axis parallel to the stacking direction.

The first processing unit 100 may polish all or part of the side surfaces parallel to the stacking direction of the polishing target block 40.

For example, as illustrated in FIG. 7, the first processing unit 100 may include a first jig unit 110 moving to a first processing position by fixing the supplied polishing target block 40 and a first processing unit. It may include a first side processing portion 120 is installed at the processing position to polish the side surface parallel to the lamination direction of the polishing target block 40 by relative rotation around the rotation axis parallel to the lamination direction.

The first jig unit 110 may be configured to support a pair of opposing surfaces except for the side to be polished of the polishing target block 40 to fix the polishing target block 40.

For example, as illustrated in FIGS. 7 and 8, the first jig unit 110 may include a first gripper 111 for fixing the polishing target block 40 at a predetermined first fixed position. have.

The first gripper 111 drives a movement of at least one of a pair of support members to support a pair of support members for supporting each of the opposing surfaces of the block to be polished and a pair of support members. It may include a first gripper driving unit (not shown).

The first gripper driving unit may be configured by a pressure system such as hydraulic pressure or pneumatic pressure, but is not limited thereto. Various driving systems may be applied as long as the first gripper driving unit may drive movement of the support member.

At least one polishing target block 40 may be fixed between the pair of supporting members, but a plurality of polishing target blocks 40 are preferably fixed to improve productivity.

In this case, the first jig unit includes a first polishing target block frame unit 150 supporting the plurality of polishing target blocks 40 before the plurality of polishing target blocks 40 are fixed between the pair of supporting members. can do.

As shown in FIGS. 8 and 9, the first polishing object block frame part 150 includes a plurality of polishing object blocks 40 arranged in a line along the stacking direction of the polishing object block 40. It supports, and is configured to be removed after the plurality of polishing target block 40 is fixed by a pair of supporting members can be configured in various ways.

In addition, the first jig unit 110 is coupled to the first gripper 111, the rotation shaft rotates about the rotation axis (C1) parallel to the stacking direction of the polishing target block 40, the rotation of the rotation shaft It may include a rotation driving unit 112 for driving.

The rotary drive unit 112 is configured to drive the rotation of the rotary shaft is possible in a variety of configurations.

For example, the rotation driving unit 112 may be configured of a belt and a drive pulley structure coupled with the rotation shaft.

On the other hand, the first jig portion 110, the first jig moving portion for moving the first gripper 111 and the rotating shaft fixed to the polishing target block 40 from the first fixed position to the first processing position where the polishing process is performed. It may further include (not shown).

The first jig moving part may be configured as a mechanical system such as a spring or a pressure system such as hydraulic / pneumatic, but is not limited thereto.

The first jig moving part is configured to move the first gripper 111 and the rotary shaft between the first fixed position and the first machining position is possible in various configurations.

The first jig moving part may further include a guide part (not shown) for guiding a moving path of the first gripper 111 and the rotary shaft.

The first side processing part 120 is installed at a first processing position and polishes the side surfaces parallel to the lamination direction of the polishing target block 40 by relative rotation about a rotation axis parallel to the lamination direction. Configuration is possible.

For example, as shown in FIG. 13, the first side processing part 120 includes a rotating shaft 122 parallel to a stacking direction of the polishing target block 40 fixed to the first jig part 111, and a rotating shaft. Coupled to 122 and may include a plurality of radially protruding brush fibers (124).

In this case, the first side processing unit 120 may further include a rotation driving unit 126 for rotating the brush fibers 124 about the rotation shaft 122.

And, the brush fibers 124, as shown in Figure 13, may be provided along the outer circumferential surface of the cylindrical body portion 310 formed in the center of the coupling sphere 311 is coupled to the rotating shaft 122 .

The brush fibers 124 may be rubbed by relative rotation in a state in which the brush fibers 124 overlap with a predetermined portion of the side surface of the polishing target block 40 moved to the first processing position.

In the laminated sheet polishing apparatus according to the present invention, since the side surfaces of the polishing target block 40 are polished on the brush fibers 124, the polishing target sheet 30 stacked on the polishing target block 40 is ultra-thin (for example, , 0.3t or less), there is an advantage that the processing (chamfering) of the side surface of the polishing target sheet 30 can be performed without breaking or chipping the side of the polishing target sheet 30.

In addition, the first side processing part 120 may include abrasive particles 50 bonded or attached to the brush fibers 124, as shown in FIG. 13.

In this case, the first processing unit 100 may further include an abrasive supply unit 140 for supplying an abrasive including abrasive particles 50 to the brush fibers 124.

The abrasive supply unit 140 may be configured in the same manner as the abrasive supply unit 410 to the polishing liquid supply unit 420 of the laminated sheet polishing apparatus according to the first embodiment, a detailed description thereof will be omitted.

On the other hand, in the first processing unit 100 having the above-described configuration, it is preferable that the first fixed position is fixed at a predetermined position, but the first processing position does not mean a fixed specific position (a block to be polished ( 40 is conceptually defined as the position of the first gripper 111 for fixing the object 40 to be polished when the machining is made, it is not fixed to a specific position can be defined in a certain range.

That is, the first machining position may vary depending on the portion of the side of the polishing target block 40 or the side surface processing diagram.

In particular, when the polishing target block 40 to be processed has a planar shape whose length L is longer than the width W, as shown in FIG. 3B, the polishing target block 40 by the first gripper 111 is formed. Since the distance from the rotation center C1 to the side to be processed is not kept constant, the polishing target block 40 fixed to the first gripper 111 rotates with respect to the rotation center C1. The distance between 40 and the first side processing portion 120 needs to be adjusted.

Accordingly, as shown in FIG. 11, the first jig part 110 is subject to the polishing target block 40 and the first side processing portion 120 according to the rotation of the polishing target block 40 by the rotation driving unit 112. It may further include a distance adjusting means 130 for adjusting the distance between.

The distance adjusting means 130, in the side processing process of the polishing target block 40, in conjunction with the rotation of the polishing target block 40 by the rotation driving unit 112, the polishing target block 40 and the first side processing unit Various configurations are possible with the configuration to adjust the distance between the 120.

For example, the distance adjusting means 130 is coupled to one side of the rotation shaft of the first jig part 110, the rotation shaft in contact with the fixing member 134 fixed to the first side processing unit 120 side. It may include a cam member 132 to rotate together in accordance with the rotation.

Since the cam member 132 is coupled to one side of the rotation shaft of the first jig part 110, the cam member 132 is moved toward the fixing member 134 by the first jig moving part, and the rotation shaft is in contact with the fixing member 134. Can be rotated together.

On the other hand, the center of rotation (C1) of the cam member 132 may be coupled to one side of the rotary shaft to match the center of rotation (C1) of the polishing target block 40 fixed to the first jig portion (110).

In addition, the cam member 132 may be rotated in a supported state in contact with the fixing member 134 installed on the first side processing unit 120 in the polishing target block 40 process.

In this case, the cam member 132 may be maintained in contact with the fixing member 134 by being moved and pressed toward the fixing member 134 by the first jig moving part.

At this time, the fixing member 134 is fixed to the first side processing unit 120 side to support a side of the cam member 132 can be configured in various ways.

The fixing member 134 is preferably made of a metal material to minimize the friction generated between the cam member by the rotation of the cam member 132 and to minimize wear caused by the friction.

In addition, the fixing member 134 is preferably in linear contact with the cam member for stable support of the cam member 132 and minimization of the friction surface.

The fixing member 134 may be installed at various positions as long as the first side processing part 120 side.

The planar shape of the cam member 132 is configured to form a closed curve rather than a circular shape so that the distance between the object to be polished 40 and the first side processing part 120 can be adjusted according to the rotation of the cam member 132. Can be.

In one embodiment, the planar shape of the object to be polished 40 is a pair of linear regions 131 corresponding to the longitudinal direction and facing each other and the width direction as shown in Figure 3c and curved both ends of the linear region In the case of a pair of curved regions 132 connected to each other, the planar shape of the cam member 132 may be formed in a shape corresponding to the planar shape of the object to be polished 40, as shown in FIG. 10. have.

At this time, the first jig moving portion, the first gripper 111 and the rotary shaft by pressing a predetermined pressing force toward the first side processing unit 120 in a state in which the cam member 132 is in close contact with the fixing member 134 It is preferred to be configured to maintain.

In this case, the rotation center C1 of the polishing target block 40 may be moved between the imaginary lines L1 and L2 in the vertical direction, and thus the rotation center C1 and the first rotation center of the polishing target block 40. Since the distance between the center of rotation (C2) of the side processing portion can be adjusted, the present invention has the advantage that can be performed by automated processing even for the polishing target block 40 of the shape shown in Figure 3b.

Specifically, according to the rotation of the cam member 132, only the curved region 32 except for the linear region 31 of the polishing target block 40 having the length (L), width (W) and height (H). This can be processed.

The second processing unit 200 is supplied with the polishing target block 40 polished by the first processing unit 100 to sequentially polish the side surfaces of the polishing target block 40 by relative linear movement. Configuration is possible.

Here, the second processing part 200 may process the side surface to be polished into a planar shape by polishing the side surface of the polishing object block 40 by relative linear movement.

That is, the second processing part 200 is particularly useful for processing the linear region 31 of the sheet 30 to be polished shown in FIGS. 3B and 3C.

Specifically, when the area of the curved region 32 except for the linear region 31 of the target block 40 having the width W and the height H is processed in the first processing unit 100, The two-processing part 200 can process the side surface part which is not processed by the 1st processing part 100, ie, the linear area | region 31. FIG.

As shown in FIG. 11, the second processing unit 200 fixes the polishing target block 40 supplied from the first processing unit 100 to move to the second processing position 210. And a second side processing portion 220 installed at a second processing position to polish the side surface of the polishing target block 40 by a relative linear movement perpendicular to the stacking direction of the polishing target block 40. .

The second jig unit 210, the second gripper 211 for fixing the polishing target block 40, and the second gripper 211 is moved to the second machining position and linear reciprocating around the second machining position It may include a second jig moving unit (not shown) to move.

The second gripper 211 is configured to fix the polishing target block 40 at a preset second fixed position.

For example, the second gripper 211 may include a pair of support members for supporting each of the pair of opposing surfaces except for the side surface of the polishing target block 40 and a pair of support members for adjusting a distance between the pair of support members. It may include a second gripper driving unit (not shown) for driving the movement of at least one of the pair of support members.

The second gripper driving unit may be configured by a pressure system such as hydraulic pressure or pneumatic pressure, but is not limited thereto. Various driving systems may be applied as long as the second gripper driving unit may drive movement of the support member.

At least one polishing target block 40 may be fixed between the pair of supporting members, but a plurality of polishing target blocks 40 are preferably fixed to improve productivity.

At this time, the second jig unit 210, the second polishing target block frame portion for supporting the plurality of polishing block 40 before the plurality of polishing block 40 is fixed between the pair of supporting members ( 250).

As illustrated in FIG. 12, the second polishing object block frame part 250 includes a plurality of polishing object blocks 40 arranged in a line along a direction perpendicular to the stacking direction of the polishing object block 40. Various configurations are possible with the configuration supporting them.

The second polishing target block frame part 250 may have a protrusion 252 formed on an upper surface thereof to form a gap between the plurality of polishing target blocks 40.

In addition, the second polishing target block frame part 250 is preferably installed at a second fixed position.

The second jig moving part is configured to move the second gripper holding the polishing target block 40 at the second fixed position to the second machining position and to process the polishing target block 40 by relative linear movement. This is possible.

For example, the second jig moving part may be configured as a mechanical system such as a spring or a pressure system such as hydraulic / pneumatic.

The second jig moving unit moves the second gripper 211 between the second fixed position and the second machining position to start the machining process, and the polishing target block 40 during the machining of the polishing target block 40. The second gripper 211 is fixed to the relative linear movement in the direction perpendicular to the stacking direction with respect to the second machining position is possible in various configurations.

The second jig moving part may further include a guide part 212 for guiding a movement path of the second gripper.

The second side processing part 220 is installed at a second processing position to polish the side surface of the polishing target block 40 by a relative linear movement perpendicular to the stacking direction of the polishing target block 40. It is possible.

The second side machining part 220 is fixed to the second machining position when the grinding target block 40 moves linearly reciprocally perpendicular to the lamination direction with respect to the second machining position by the second jig moving part. It is preferred to be installed.

For example, as shown in FIG. 13, the second side processing part 220 includes a rotating shaft 222 parallel to a stacking direction of the polishing target block 40 fixed to the second jig part 210, and a rotating shaft. Coupled to 222 and may include a plurality of radially protruding brush fibers (224).

In this case, the second side processing unit 220 may further include a rotation driving unit 226 for rotating the brush fibers 224 around the rotation shaft 222 at the center of rotation (M).

The second side processing unit 220, which may be configured in the same manner as the first side processing unit 120 described above will be omitted in the overlapping range.

On the other hand, when processing the side surface of the polishing target block 40 shown in Figs. 3b and 3c, the second side processing unit 220, each side sequentially corresponding to the pair of linear region 31 separately I can process it.

By the way, when the second processing unit 200 processes the sides corresponding to the linear region 31 of the polishing target block 40 by relative linear movement, the polishing target block (2) is processed by the second side processing unit 220. Since the pressure exerted on the side surface 40 varies depending on the position (side portion), unintended bending may be formed in the linear region 31 of the block 40 to be polished.

When the bending is formed in the straight region 31 of the polishing target sheet 30 to be processed in a straight line, there is a problem that does not satisfy the standards that can be installed in other members, such as the smart phone 1, as shown in FIG.

In one aspect, the above-described problem, the first processing unit 100 or the first processing unit 100 or the second processing unit 200 in consideration of the unintentional bending may be formed by the processing in the first processing unit 100 or It can be solved through the external processing for the polishing target block 40 that is performed before the processing by the two processing unit 200.

For example, when the side processing (chamfering) by the second processing unit 200, the difference in the processing depth with respect to the linear region 31 is generated, so that the linear region 31 of the block 40 to be polished is formed concave. In order to prevent this, the linear region 31 may be convexly processed when the external shape of the object to be polished 40 is polished.

Accordingly, the planar shape of the final block 40 to be polished may be formed as close as possible to the linear shape set in advance.

That is, it is preferable that the straight region 31 is protruded outwardly from the center portion, that is, convexly outwardly compared to the edge portion based on the planar shape of the polishing target block 40.

Accordingly, the linear region 31 of the planar shape of the polishing target block 40 finally calculated through the side processing (chamfering processing) by the second processing unit 200 is formed as close as possible to the preset linear shape. Can be.

In another aspect, the second processing unit 200 may be configured to adjust the processing depth of the side of the polishing target block 40 during the processing.

For example, the second processing unit 200 may close the distance between the polishing target block 40 and the second side processing unit 220 according to the machining portion of the polishing target block 40 to polish the polishing target block 40. By applying a pressure to the second side processing portion 220 by the process depth of the side of the polishing target block 40 can be adjusted.

As another example, the second machining part 200 controls the rotational speed of the second side machining part 220 in accordance with the machining part of the grinding target block 40 to reduce the machining depth of the side surface of the grinding target block 40. I can regulate it.

 In other words, the processing depth of the part to be processed by the second side processing part 220 having a high rotational speed among the side surfaces of the block 40 to be polished is processed by the second side processing part 220 having a relatively low rotational speed. Since the depth can be formed deeper than the processing depth of the site, the degree of processing according to the processing area of the linear region 31 of the polishing target block 40 can be controlled. In detail, the second processing unit 200 makes the rotational speed of the second side processing unit 220 slower at the center side of the straight region 31 so that the center side of the straight region 31 is processed deeper than the outer side. Can be prevented.

As another example, the second processing unit 200 may adjust the side processing depth of the polishing target block 40 by controlling the processing time by the second side processing unit 220.

In other words, the processing depth of the region where the machining time by the second side machining portion 220 is long among the side surfaces of the polishing target block 40 is that of the region where the machining time by the second side machining portion 220 is relatively short. Can be formed deeper. Specifically, the linear moving speed of the second gripper 211 by the second jig moving part of the second processing part 200 is made faster at the center side of the straight area 31 so that the center side of the straight area 31 is outside. It can prevent processing deeper.

Unexplained reference numeral 240 is an abrasive supply unit to the polishing liquid supply unit, it may be configured in the same manner as the first processing unit (100).

Meanwhile, in the lamination sheet polishing method performed in the lamination sheet polishing apparatus according to the second embodiment, a plurality of polishing target sheets 30 are laminated in the height direction in the lamination direction so that the length L, the width W, and the height ( A lamination sheet polishing method for polishing a polishing target block 40 having H), wherein a side surface parallel to the lamination direction of the polishing object block 40 is ground by a relative rotation about a rotation axis parallel to the lamination direction. The first processing step and, after the first processing step, may include a second processing step of polishing the side surface of the polishing target block 40 by a relative linear movement perpendicular to the stacking direction.

In the first processing step, the first grinding target block 40 is fixed to move to the first machining position in which the first side processing unit 120 for grinding the side of the polishing target block 40 by relative rotation is installed. And a second machining position shifting step, and a rotation machining step of rotating the polishing target block 40 around the rotation axis parallel to the stacking direction at the first machining position.

In this case, the first processing step may further include a distance adjusting step of adjusting the distance between the polishing target block 40 and the first side processing unit 120 according to the rotation of the polishing target block 40. .

In the second processing step, a second side processing unit 220 is installed to fix the polishing target block 40 polished in the first processing step to polish the side surface of the polishing target block 40 by relative linear movement. A moving step of moving to a machining position and a linear polishing step of grinding the side of the polishing target block 40 by a relative linear movement perpendicular to the stacking direction of the polishing target block 40.

The linear polishing step may include a linear reciprocating step of linearly moving the polishing target block 40 along a direction perpendicular to the stacking direction of the polishing target block 40 based on the second processing position.

Since the above has been described only with respect to some of the preferred embodiments that can be implemented by the present invention, the scope of the present invention, as is well known, should not be construed as limited to the above embodiments, the present invention described above It will be said that both the technical idea and the technical idea which together with the base are included in the scope of the present invention.

Claims (16)

1. A plurality of polishing target sheets 40 are laminated in a stacking direction in a height direction, and a lamination sheet polishing method for polishing a polishing target block 40 having a length L, a width W, and a height H,

   A first processing step of grinding the side surfaces parallel to the stacking direction of the polishing target block 40 by relative rotation about a rotation axis parallel to the stacking direction;

   And a second processing step of polishing the side surface of the polishing target block 40 by a relative linear movement perpendicular to the stacking direction after the first processing step.
2. The method according to claim 1,

   The first processing step,

   A second machining position moving step of fixing the supplied abrasive object block 40 to a first machining position where a first side machining part 124 for polishing the side surface of the abrasive object block 40 by relative rotation is installed; ,

   And a rotation processing step of rotating the polishing target block (40) around the rotation axis parallel to the lamination direction at the first machining position.
3. The method according to claim 2,

   The first processing step,

   And a distance adjusting step of adjusting a distance between the polishing target block (40) and the first side processing portion (124) according to the rotation of the polishing target block (40).
4. The method according to claim 1,

   The second processing step,

   Fixing the polishing target block 40 polished in the first processing step to move the side of the polishing target block 40 to a second machining position in which the second side processing portion 224 is polished by relative linear movement. Moving steps,

   And a linear polishing step of polishing the side surface of the polishing target block (40) by a relative linear movement perpendicular to the stacking direction of the polishing target block (40).
5. The method according to claim 4,

   The linear polishing step,

   And a linear reciprocating step of linearly moving the polishing target block (40) along the longitudinal direction of the polishing target block (40) based on the second processing position.
6. A plurality of polishing target sheets 30 are laminated sheet polishing apparatus for laminating the height direction in the lamination direction to polish the polishing target block 40 having a length (L), width (W) and height (H),

   A first processing part 100 for polishing a side surface parallel to the lamination direction of the polishing target block 40 by relative rotation about a rotation axis parallel to the lamination direction;

   The second processing unit 200 receives the polishing target block 40 polished from the first processing unit 100 and polishes the side surface of the polishing target block 40 by a relative linear movement perpendicular to the stacking direction. Laminated sheet polishing apparatus comprising a.
7. The method according to claim 6,

   The first processing unit 100,

   A first jig part 110 fixed to the polishing target block 40 and moved to a first machining position;

   And a first side processing part 120 installed at the first processing position to polish a side surface parallel to the stacking direction of the polishing target block 40 by relative rotation about a rotation axis parallel to the stacking direction. Laminated sheet polishing apparatus, characterized in that.
8. The method according to claim 7,

   The first jig unit 110,

   A first gripper 111 for fixing the polishing target block 40;

   A rotation shaft coupled to the first gripper to rotate about the rotation axis;

   Laminating sheet polishing apparatus comprising a first jig moving unit for moving the first gripper (111) and the rotary shaft to the first processing position.
9. The method according to claim 8,

   The first jig unit 110,

   It characterized in that it comprises a distance adjusting means 130 for adjusting the distance between the polishing target block 40 and the first side processing unit 120 in accordance with the rotation of the polishing target block 40 by the rotary shaft. Laminated sheet polishing apparatus.
10. The method according to claim 9,

    The distance adjusting means 130,

    Is coupled to one side of the rotary shaft, in contact with the fixing member 134 is fixed to the first side processing unit 120 side includes a cam member 132 to rotate together in accordance with the rotation of the rotary shaft,

    Laminated sheet polishing apparatus, characterized in that the planar shape of the cam member 132 corresponds to the planar shape of the polishing target block (40).
11.  The method according to claim 7,

    The first side processing unit 120,

    A rotating shaft 122 parallel to the stacking direction of the polishing target block 40 fixed to the first jig unit 110;

    Laminated sheet polishing apparatus, characterized in that it comprises a plurality of brush fibers 124 coupled to the rotating shaft 122 and protruding in the radial direction.
12. The method according to claim 6,

    The second processing unit 200,

    A second jig unit 210 fixed to the object to be polished 40 supplied from the first processing unit 100 and moved to a second processing position;

    And a second side processing unit (220) installed at the second processing position to polish the side surface of the polishing target block (40) by relative linear movement perpendicular to the stacking direction.
13. The method according to claim 12,

    The second jig unit 210,

    A second gripper 211 fixing the polishing target block 40;

    Laminating sheet polishing apparatus comprising a second jig moving unit for moving the second gripper (211) to the second machining position and linear reciprocating movement around the second machining position.
14. The method according to claim 12,

    The second side processing unit 220,

    A rotating shaft 222 parallel to the stacking direction of the polishing target block 40 fixed to the second jig portion 210;

    Laminated sheet polishing apparatus, characterized in that it comprises a plurality of brush fibers 224 coupled to the rotating shaft 222 and protruding in the radial direction.
15. A plurality of sheets to be polished are laminated sheet polishing apparatus for laminating the height direction in the lamination direction to polish the abrasive block 40 having a length (L), width (W) and height (H),

    Support parts (510, 900) for supporting the polishing target block 40;

    It includes a side processing unit 520 for polishing the edge of each of the polishing sheet 30 by the friction on the side of the polishing block 40 supported by the support (510, 900),

    The side processing unit 520,

    Laminated sheet polishing apparatus, characterized in that it comprises a blush portion (524) which is rubbed with the polishing target block 40 by the relative movement with respect to the polishing target block (40) supported by the support (510, 900).
16. The method according to claim 15,

    The blush unit 524,

    Laminated sheet polishing apparatus, characterized in that the friction with the side surface of the polishing target block 40 by at least one of the linear movement and the rotational movement with respect to the side of the polishing target block (40).

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