WO2017150335A1 - Procédé de fabrication de moule de lentille et moule de lentille - Google Patents

Procédé de fabrication de moule de lentille et moule de lentille Download PDF

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Publication number
WO2017150335A1
WO2017150335A1 PCT/JP2017/006855 JP2017006855W WO2017150335A1 WO 2017150335 A1 WO2017150335 A1 WO 2017150335A1 JP 2017006855 W JP2017006855 W JP 2017006855W WO 2017150335 A1 WO2017150335 A1 WO 2017150335A1
Authority
WO
WIPO (PCT)
Prior art keywords
aluminum
layer
optical curved
inverted optical
mold
Prior art date
Application number
PCT/JP2017/006855
Other languages
English (en)
Japanese (ja)
Inventor
美穂 山田
箕浦　潔
隆裕 中原
Original Assignee
シャープ株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by シャープ株式会社 filed Critical シャープ株式会社
Priority to CN201780014173.0A priority Critical patent/CN108699721B/zh
Priority to JP2018503087A priority patent/JP6581287B2/ja
Publication of WO2017150335A1 publication Critical patent/WO2017150335A1/fr

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00—Moulds or cores; Details thereof or accessories therefor
    • B29C33/38—Moulds or cores; Details thereof or accessories therefor characterised by the material or the manufacturing process
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C25D11/06—Anodisation of aluminium or alloys based thereon characterised by the electrolytes used
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C25D11/12—Anodising more than once, e.g. in different baths
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C25D11/16—Pretreatment, e.g. desmutting
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C25D11/18—After-treatment, e.g. pore-sealing
    • C25D11/24—Chemical after-treatment
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/118—Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses

Definitions

  • the base material is an aluminum base material formed of an Al—Mg—Si based aluminum alloy and subjected to mechanical mirror finishing.
  • the release processing step is disclosed in, for example, Patent Document 8 by the present applicant.
  • the mold release treatment step for example, a step of preparing a mold release agent containing a fluorine compound having releasability and a solvent, and a solvent capable of dissolving the fluorine compound on the surface of the moth-eye mold 50A are provided. And a step of applying a release agent to the surface of the moth-eye mold 50A by a spray coating method.
  • the non-uniformity of the fine recess 18p formed on the inverted optical curved surface 22 of the lens mold 100A can be suppressed. That is, unevenness in the diameter and / or depth of the fine recess 18p formed in the inverted optical curved surface 22 of the lens mold 100A can be suppressed.
  • FIGS. FIG. 5 and FIG. 6 are graphs each showing an example of a change in voltage in the process of forming the porous alumina layer 18.
  • an aluminum substrate 12 formed of an Al—Mg—Si based aluminum alloy for example, JIS A6063
  • JIS A6063 an aluminum substrate 12 formed of an Al—Mg—Si based aluminum alloy
  • the porous alumina layer 18 is brought into contact with an alumina etchant to etch a predetermined amount, thereby enlarging the opening of the fine recess 18p.
  • etching is performed for 20 minutes using a phosphoric acid aqueous solution (10 mass%, 30 ° C.).
  • the method for manufacturing a lens mold according to the second embodiment is different from the method for manufacturing the lens mold 100A in that a flat aluminum substrate 10Ap is used.
  • the columnar or cylindrical aluminum substrate 10A is used as described above.
  • a lens mold 100C having a plurality of inverted optical curved surfaces 22 on the surface may be produced by combining a plurality of lens molds 100A.
  • the lens mold 100A in which fine concave portions are uniformly formed in the inverted optical curved surface 22 can be selected and combined the manufacturing variation of the lens mold may be more effectively suppressed. There is.

Abstract

L'invention concerne un procédé de fabrication d'un moule de lentille ayant au moins une surface incurvée optique inversée (22) sur sa surface, comprenant (a) une étape consistant à préparer un matériau à base d'aluminium (10A) ayant une pluralité de surfaces incurvées optiques inversées (22) sur sa surface ou une étape consistant à préparer un matériau de base de moule (10B), qui est un matériau de base de moule (10B) comprenant un matériau de base (12) et une couche d'aluminium (16) supportée sur le matériau de base et ayant une pluralité de surfaces incurvées optiques inversées (22) sur sa surface, (b) une étape consistant à former une couche d'alumine poreuse (18) ayant une pluralité de creux minuscules (18p) par anodisation de la surface du matériau de base en aluminium ou d'une couche d'aluminium, et (c) une étape consistant à agrandir la pluralité de creux minuscules (18p) dans la couche d'alumine poreuse par la mise en contact de la couche d'alumine poreuse avec un fluide d'attaque chimique.
PCT/JP2017/006855 2016-03-02 2017-02-23 Procédé de fabrication de moule de lentille et moule de lentille WO2017150335A1 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
CN201780014173.0A CN108699721B (zh) 2016-03-02 2017-02-23 透镜用模具的制造方法及透镜用模具
JP2018503087A JP6581287B2 (ja) 2016-03-02 2017-02-23 レンズ用型の製造方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016-040259 2016-03-02
JP2016040259 2016-03-02

Publications (1)

Publication Number Publication Date
WO2017150335A1 true WO2017150335A1 (fr) 2017-09-08

Family

ID=59742990

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2017/006855 WO2017150335A1 (fr) 2016-03-02 2017-02-23 Procédé de fabrication de moule de lentille et moule de lentille

Country Status (3)

Country Link
JP (1) JP6581287B2 (fr)
CN (1) CN108699721B (fr)
WO (1) WO2017150335A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3498889A1 (fr) * 2017-12-12 2019-06-19 Koninklijke Philips N.V. Dispositif et procédé d'oxydation anodisé d'un élément d'anode pour un réseau de rayons x incurvé, système de production d'un réseau de rayons x incurvé et réseau de rayons x incurvé

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111013994B (zh) * 2019-12-05 2021-08-27 上海交通大学 一种接触式聚焦型医用压电超声换能器及制备方法
CN114273874B (zh) * 2021-12-25 2024-04-23 苏州亿成电子科技有限公司 便于加工的光学镜头模具及其制备工艺

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WO2006059686A1 (fr) * 2004-12-03 2006-06-08 Sharp Kabushiki Kaisha Materiau empechant la reflexion, element optique, dispositif d’affichage, procede de fabrication d’une matrice et procede de fabrication d’un materiau empechant la reflexion a l’aide de la matrice
WO2009147858A1 (fr) * 2008-06-06 2009-12-10 シャープ株式会社 Film antireflet, élément optique comprenant le film antireflet, matrice, procédé de fabrication de matrice et procédé de fabrication de film antireflet
WO2010125795A1 (fr) * 2009-04-30 2010-11-04 シャープ株式会社 Moule et procédé de fabrication de celui-ci
WO2010128662A1 (fr) * 2009-05-08 2010-11-11 シャープ株式会社 Procédé pour former une couche anodisée, procédé de fabrication d'un moule et moule
WO2012029570A1 (fr) * 2010-08-30 2012-03-08 シャープ株式会社 Procédés de formation de couche anodisée et de fabrication de moule
JP2014102311A (ja) * 2012-11-19 2014-06-05 Seiko Epson Corp マイクロレンズアレイ基板、マイクロレンズアレイ基板の製造方法、電気光学装置、電子機器
JP2014217951A (ja) * 2013-05-01 2014-11-20 株式会社リコー 平型部品製造方法、平型部品製造装置、及び金型
WO2015159797A1 (fr) * 2014-04-14 2015-10-22 シャープ株式会社 Moule, procédé de fabrication d'un moule, film antireflet et procédé de fabrication d'un film antireflet
WO2015163018A1 (fr) * 2014-04-22 2015-10-29 シャープ株式会社 Membrane polymère synthétique ayant une surface douée d'une activité stérilisante, stratifié pourvu de ladite membrane polymère synthétique, procédé de stérilisation utilisant la surface de la membrane polymère synthétique, procédé de réactivation de la surface de la membrane polymère synthétique, moule utilisable dans la fabrication de la membrane polymère synthétique, et procédé de fabrication du moule
JP2015187637A (ja) * 2014-03-26 2015-10-29 大日本印刷株式会社 反射防止物品、画像表示装置、反射防止物品の製造方法、反射防止物品の賦型用金型、及び賦型用金型の製造方法

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JP4649222B2 (ja) * 2004-03-31 2011-03-09 キヤノン株式会社 結像レンズの製造方法
US20070235342A1 (en) * 2004-10-01 2007-10-11 Canon Kabushiki Kaisha Method for manufacturing nanostructure
EP1785748A1 (fr) * 2005-11-10 2007-05-16 C.R.F. Società Consortile per Azioni Structure nanométrique antireflet à base d'alumine anodique poreuse, et procédé pour sa fabrication
JP5276830B2 (ja) * 2007-11-13 2013-08-28 公益財団法人神奈川科学技術アカデミー インプリント用モールドの製造方法
WO2012137664A1 (fr) * 2011-04-01 2012-10-11 シャープ株式会社 Procédé de fabrication d'un moule

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006059686A1 (fr) * 2004-12-03 2006-06-08 Sharp Kabushiki Kaisha Materiau empechant la reflexion, element optique, dispositif d’affichage, procede de fabrication d’une matrice et procede de fabrication d’un materiau empechant la reflexion a l’aide de la matrice
WO2009147858A1 (fr) * 2008-06-06 2009-12-10 シャープ株式会社 Film antireflet, élément optique comprenant le film antireflet, matrice, procédé de fabrication de matrice et procédé de fabrication de film antireflet
WO2010125795A1 (fr) * 2009-04-30 2010-11-04 シャープ株式会社 Moule et procédé de fabrication de celui-ci
WO2010128662A1 (fr) * 2009-05-08 2010-11-11 シャープ株式会社 Procédé pour former une couche anodisée, procédé de fabrication d'un moule et moule
WO2012029570A1 (fr) * 2010-08-30 2012-03-08 シャープ株式会社 Procédés de formation de couche anodisée et de fabrication de moule
JP2014102311A (ja) * 2012-11-19 2014-06-05 Seiko Epson Corp マイクロレンズアレイ基板、マイクロレンズアレイ基板の製造方法、電気光学装置、電子機器
JP2014217951A (ja) * 2013-05-01 2014-11-20 株式会社リコー 平型部品製造方法、平型部品製造装置、及び金型
JP2015187637A (ja) * 2014-03-26 2015-10-29 大日本印刷株式会社 反射防止物品、画像表示装置、反射防止物品の製造方法、反射防止物品の賦型用金型、及び賦型用金型の製造方法
WO2015159797A1 (fr) * 2014-04-14 2015-10-22 シャープ株式会社 Moule, procédé de fabrication d'un moule, film antireflet et procédé de fabrication d'un film antireflet
WO2015163018A1 (fr) * 2014-04-22 2015-10-29 シャープ株式会社 Membrane polymère synthétique ayant une surface douée d'une activité stérilisante, stratifié pourvu de ladite membrane polymère synthétique, procédé de stérilisation utilisant la surface de la membrane polymère synthétique, procédé de réactivation de la surface de la membrane polymère synthétique, moule utilisable dans la fabrication de la membrane polymère synthétique, et procédé de fabrication du moule

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3498889A1 (fr) * 2017-12-12 2019-06-19 Koninklijke Philips N.V. Dispositif et procédé d'oxydation anodisé d'un élément d'anode pour un réseau de rayons x incurvé, système de production d'un réseau de rayons x incurvé et réseau de rayons x incurvé
CN111601915A (zh) * 2017-12-12 2020-08-28 皇家飞利浦有限公司 用于对用于弧形x射线光栅的阳极元件的阳极氧化的设备和方法、用于产生弧形x射线光栅的系统以及弧形x射线光栅

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Publication number Publication date
JPWO2017150335A1 (ja) 2018-12-13
JP6581287B2 (ja) 2019-09-25
CN108699721B (zh) 2021-02-19
CN108699721A (zh) 2018-10-23

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