WO2017150240A1 - 固体撮像素子、駆動方法、および電子機器 - Google Patents
固体撮像素子、駆動方法、および電子機器 Download PDFInfo
- Publication number
- WO2017150240A1 WO2017150240A1 PCT/JP2017/006077 JP2017006077W WO2017150240A1 WO 2017150240 A1 WO2017150240 A1 WO 2017150240A1 JP 2017006077 W JP2017006077 W JP 2017006077W WO 2017150240 A1 WO2017150240 A1 WO 2017150240A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- pixel
- logarithmic
- pixels
- signal
- solid
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims abstract description 86
- 238000006243 chemical reaction Methods 0.000 claims abstract description 197
- 238000003384 imaging method Methods 0.000 claims description 72
- 239000000758 substrate Substances 0.000 claims description 25
- 230000003321 amplification Effects 0.000 claims description 24
- 238000003199 nucleic acid amplification method Methods 0.000 claims description 24
- 238000012546 transfer Methods 0.000 claims description 23
- 238000009792 diffusion process Methods 0.000 claims description 10
- 229910044991 metal oxide Inorganic materials 0.000 claims description 8
- 239000004065 semiconductor Substances 0.000 claims description 8
- 150000004706 metal oxides Chemical class 0.000 claims description 7
- 238000005516 engineering process Methods 0.000 abstract description 6
- 230000009466 transformation Effects 0.000 abstract 2
- 230000000875 corresponding effect Effects 0.000 description 19
- HKIGPMUNBXIAHY-UHFFFAOYSA-N ethyl 1-(3-cyano-3,3-diphenylpropyl)-4-phenylpiperidine-4-carboxylate;(8-methyl-8-azabicyclo[3.2.1]octan-3-yl) 3-hydroxy-2-phenylpropanoate;sulfuric acid;hydrochloride Chemical compound Cl.OS(O)(=O)=O.CN1C(C2)CCC1CC2OC(=O)C(CO)C1=CC=CC=C1.C1CC(C(=O)OCC)(C=2C=CC=CC=2)CCN1CCC(C#N)(C=1C=CC=CC=1)C1=CC=CC=C1 HKIGPMUNBXIAHY-UHFFFAOYSA-N 0.000 description 19
- 238000010586 diagram Methods 0.000 description 18
- 230000004048 modification Effects 0.000 description 12
- 238000012986 modification Methods 0.000 description 12
- 230000003287 optical effect Effects 0.000 description 9
- 230000006870 function Effects 0.000 description 7
- 238000012545 processing Methods 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 4
- 230000035945 sensitivity Effects 0.000 description 4
- 238000003786 synthesis reaction Methods 0.000 description 4
- 238000010030 laminating Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 230000009471 action Effects 0.000 description 1
- 230000003796 beauty Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 210000004204 blood vessel Anatomy 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 230000002596 correlated effect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 230000036541 health Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 210000004761 scalp Anatomy 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000009966 trimming Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N25/00—Circuitry of solid-state image sensors [SSIS]; Control thereof
- H04N25/50—Control of the SSIS exposure
- H04N25/57—Control of the dynamic range
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N25/00—Circuitry of solid-state image sensors [SSIS]; Control thereof
- H04N25/50—Control of the SSIS exposure
- H04N25/57—Control of the dynamic range
- H04N25/571—Control of the dynamic range involving a non-linear response
- H04N25/573—Control of the dynamic range involving a non-linear response the logarithmic type
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N25/00—Circuitry of solid-state image sensors [SSIS]; Control thereof
- H04N25/50—Control of the SSIS exposure
- H04N25/57—Control of the dynamic range
- H04N25/571—Control of the dynamic range involving a non-linear response
- H04N25/575—Control of the dynamic range involving a non-linear response with a response composed of multiple slopes
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N25/00—Circuitry of solid-state image sensors [SSIS]; Control thereof
- H04N25/70—SSIS architectures; Circuits associated therewith
- H04N25/71—Charge-coupled device [CCD] sensors; Charge-transfer registers specially adapted for CCD sensors
- H04N25/75—Circuitry for providing, modifying or processing image signals from the pixel array
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N25/00—Circuitry of solid-state image sensors [SSIS]; Control thereof
- H04N25/70—SSIS architectures; Circuits associated therewith
- H04N25/76—Addressed sensors, e.g. MOS or CMOS sensors
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N25/00—Circuitry of solid-state image sensors [SSIS]; Control thereof
- H04N25/70—SSIS architectures; Circuits associated therewith
- H04N25/76—Addressed sensors, e.g. MOS or CMOS sensors
- H04N25/77—Pixel circuitry, e.g. memories, A/D converters, pixel amplifiers, shared circuits or shared components
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N25/00—Circuitry of solid-state image sensors [SSIS]; Control thereof
- H04N25/70—SSIS architectures; Circuits associated therewith
- H04N25/76—Addressed sensors, e.g. MOS or CMOS sensors
- H04N25/78—Readout circuits for addressed sensors, e.g. output amplifiers or A/D converters
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N25/00—Circuitry of solid-state image sensors [SSIS]; Control thereof
- H04N25/70—SSIS architectures; Circuits associated therewith
- H04N25/79—Arrangements of circuitry being divided between different or multiple substrates, chips or circuit boards, e.g. stacked image sensors
Definitions
- the present disclosure relates to a solid-state imaging device, a driving method, and an electronic device, and more particularly, to a solid-state imaging device, a driving method, and an electronic device that can capture a wide dynamic range image with higher image quality.
- Patent Document 1 discloses a solid-state imaging device having low noise and high sensitivity and a wide dynamic range by using an integral type logarithmic conversion circuit.
- the conventional solid-state imaging device has a configuration in which the logarithmic conversion circuit is arranged inside the pixel, it is difficult to optimize the size and characteristics of the transistors that constitute the logarithmic conversion circuit. For this reason, it is required to optimize the size and characteristics of the transistors constituting the logarithmic conversion circuit and to capture a wide dynamic range image with high image quality.
- the present disclosure has been made in view of such a situation, and makes it possible to capture a wide dynamic range image with higher image quality.
- the solid-state imaging device has a pixel area in which a plurality of pixels that perform photoelectric conversion are disposed, and a logarithmic readout method in which a pixel signal changes approximately logarithmically according to the amount of light received by the pixel.
- a logarithmic conversion circuit that reads out a pixel signal from the pixel includes at least a circuit area.
- a driving method includes a pixel region in which a plurality of pixels that perform photoelectric conversion are disposed, and a logarithmic readout method in which a pixel signal changes approximately logarithmically according to the amount of light received by the pixel.
- a logarithmic conversion circuit that reads a pixel signal from the pixel includes at least a circuit area to be arranged, when reading a pixel signal from the pixel by the logarithmic reading method
- a MOS Metal-Oxide
- An electronic apparatus includes a pixel area in which a plurality of pixels that perform photoelectric conversion are disposed, and a logarithmic readout method in which a pixel signal changes approximately logarithmically according to the amount of light received by the pixel.
- a logarithmic conversion circuit that reads out a pixel signal from the pixel includes a solid-state imaging device having at least a circuit region.
- a plurality of pixels that perform photoelectric conversion are arranged in the pixel region.
- at least a logarithmic conversion circuit that reads out a pixel signal from the pixel by a logarithmic readout method in which the pixel signal changes approximately logarithmically according to the amount of light received by the pixel is disposed.
- an image with a wide dynamic range can be taken with higher image quality.
- FIG. 25 is a diagram for describing reading of a pixel signal in the basic circuit configuration of the pixel in FIG. 24. It is a block diagram showing an example of composition of an embodiment of an imaging device to which this art is applied. It is a figure which shows the usage example which uses an image sensor.
- FIG. 1 is a block diagram illustrating a configuration example of an embodiment of an image sensor to which the present technology is applied.
- the imaging device 11 includes a pixel region 13 in which a plurality of pixels 12 that perform photoelectric conversion are arranged in an array, and a circuit that performs driving for reading out pixel signals from the pixels 12.
- the circuit area 14 is configured.
- the image sensor 11 is, for example, a CMOS (Complementary Metal Metal Oxide Semiconductor) image sensor.
- the pixel 12 photoelectrically converts the received light and outputs a pixel signal at a level corresponding to the amount of light.
- the pixel region 13 is a light receiving surface that receives light collected by an optical system (not shown), and an image of a subject formed on the light receiving surface is formed by a plurality of pixels 12 arranged in an array in the pixel region 13. Imaged.
- the circuit area 14 is an area in which a vertical drive circuit, a horizontal drive circuit, and the like for driving the pixels 12 are provided.
- a vertical drive circuit for example, an AD (Analog-to-Digital) conversion circuit 31 and a logarithmic conversion circuit 32 shown in FIG. Is placed.
- AD Analog-to-Digital
- the imaging element 11 may have a configuration in which the pixel region 13 and the circuit region 14 are formed on the same chip, or may have a configuration in which the pixel region 13 and the circuit region 14 are formed on different chips. Good.
- FIG. 2 is a circuit diagram showing an example of a basic circuit configuration of the pixel 12 of FIG.
- the pixel 12 arranged in the pixel region 13 includes a photodiode 21, a transfer transistor 22, an FD (Floating Diffusion) unit 23, an amplification transistor 24, a selection transistor 25, and a reset transistor 26. Is done.
- the AD conversion circuit 31 and the logarithmic conversion circuit 32 provided in the circuit region 14 are connected to the pixel 12 through the signal line 33 and the signal line 34, respectively.
- a current source 35 for reading out a pixel signal from the pixel 12 to the AD conversion circuit 31 is connected to the signal line 33, and a source follower is formed by the amplification transistor 24 and the current source 35.
- the photodiode 21 is a photoelectric conversion unit that converts incident light into electric charge by photoelectric conversion and accumulates the light.
- the anode terminal is grounded and the cathode terminal is connected to the transfer transistor 22.
- the transfer transistor 22 is driven according to the transfer signal TRG, and when the transfer transistor 22 is turned on, the charge accumulated in the photodiode 21 is transferred to the FD unit 23.
- the FD portion 23 is a floating diffusion region having a predetermined storage capacity connected to the gate electrode of the amplification transistor 24, and stores the charge transferred from the photodiode 21 via the transfer transistor 22.
- the amplification transistor 24 outputs a pixel signal of a level corresponding to the charge accumulated in the FD unit 23 (that is, the potential of the FD unit 23) to the signal line 33 via the selection transistor 25.
- the FD unit 23 is connected to the gate electrode of the amplification transistor 24, the FD unit 23 and the amplification transistor 24 convert the charge generated in the photodiode 21 into a pixel signal having a level corresponding to the charge. It functions as a part.
- the selection transistor 25 is driven in accordance with the selection signal SEL.
- the selection transistor 25 is turned on, the pixel signal output from the amplification transistor 24 is ready to be output to the signal line 33, and the pixel signal is output from the pixel 12.
- the selected state is assumed.
- the reset transistor 26 is driven according to the reset signal RST.
- the FD unit 23 is connected to the logarithmic conversion circuit 32 via the signal line 34.
- the AD conversion circuit 31 is connected to the selection transistor 25 via a signal line 33, AD converts the pixel signal output from the amplification transistor 24 via the selection transistor 25, and supplies the signal to a subsequent circuit (not shown).
- the logarithmic conversion circuit 32 is connected to the reset transistor 26 by a signal line 34, and can switch a readout method for reading a pixel signal from the pixel 12 between a linear mode and a logarithmic mode.
- the linear mode is a readout method in which a pixel signal that changes linearly according to the amount of light received by the pixel 12 is read from the pixel 12, and the logarithmic mode is logarithmic according to the amount of light received by the pixel 12. This is a readout method in which a pixel signal that changes to is read out from the pixel 12.
- the vertical axis is the sensor output (linear axis)
- the horizontal axis is the incident light intensity (logarithmic axis)
- the logarithmic conversion circuit 32 reads out the pixel signal from the pixel 12 by linear readout and the logarithmic readout.
- the pixel signal to be displayed is indicated by a solid line.
- the enable signal LOGEN see FIG. 4 to be described later
- linear reading is performed
- the enable signal LOGEN is at a high level
- logarithmic reading is performed. Are read and used.
- linear readout and logarithmic readout may be switched at the point P1 based on the intensity of incident light.
- the intensity of incident light is low, linear readout is performed, and
- logarithmic readout may be used.
- the image sensor 11 can seamlessly switch between linear readout and logarithmic readout by the logarithmic conversion circuit 32 without changing the pixel characteristics of the pixels 12.
- FIGS. 4 and 5 are diagrams showing an example of the circuit configuration of the logarithmic conversion circuit 32.
- FIG. 4A shows a first circuit configuration example of the logarithmic conversion circuit 32.
- the logarithmic conversion circuit 32A is configured by combining an NMOS (N-channel Metal-Oxide Semiconductor) transistor 41 and a switch 42.
- the source of the NMOS transistor 41 is connected to the reset transistor 26 (FIG. 2) by a signal line 34, and the drain and gate of the NMOS transistor 41 are connected to the power supply VLOG.
- the switch 42 is arranged so as to connect between the signal line 34 and the power supply VR, and opens and closes according to an inverted enable signal XLOGEN obtained by inverting an enable signal LOGEN that enables logarithmic signal reading.
- the logarithmic conversion circuit 32A is configured, and when reading out the pixel signal from the pixel 12, it is possible to seamlessly switch between the linear mode and the logarithmic mode in accordance with the inversion enable signal XLOGEN.
- the switch 42 in the linear mode, the switch 42 is turned on when the inversion enable signal XLOGEN becomes Hi level, and the power source VR is connected to the pixel 12 via the switch 42, so that the amount of light received by the pixel 12 is increased. A pixel signal that changes linearly is read out. Further, in the logarithmic mode, the switch 42 is turned off when the inversion enable signal XLOGEN becomes a low level, and the power supply VLOG is connected to the pixel 12 via the diode-connected NMOS transistor 41, so that the pixel 12 A pixel signal that changes logarithmically according to the amount of received light is read out.
- FIG. 4B shows a second circuit configuration example of the logarithmic conversion circuit 32.
- the logarithmic conversion circuit 32B is configured by combining a PMOS (P-channel-Metal-Oxide Semiconductor) transistor 43 and a switch.
- the source and gate of the PMOS transistor 43 are connected to the reset transistor 26 (FIG. 2) by a signal line 34, and the drain of the PMOS transistor 43 is connected to the power supply VLOG.
- the switch 42 is arranged so as to connect between the signal line 34 and the power supply VR, and opens and closes according to an inverted enable signal XLOGEN obtained by inverting an enable signal LOGEN that enables logarithmic signal reading.
- the logarithmic conversion circuit 32B is configured, and when reading out the pixel signal from the pixel 12, it is possible to seamlessly switch between the linear mode and the logarithmic mode in accordance with the inversion enable signal XLOGEN.
- the switch 42 in the linear mode, the switch 42 is turned on when the inversion enable signal XLOGEN becomes Hi level, and the power source VR is connected to the pixel 12 via the switch 42, so that the amount of light received by the pixel 12 is increased. A pixel signal that changes linearly is read out.
- the switch 42 In the logarithmic mode, the switch 42 is turned off when the inversion enable signal XLOGEN becomes a low level, and the power supply VLOG is connected to the pixel 12 via the diode-connected PMOS transistor 43, so that the pixel 12 A pixel signal that changes logarithmically according to the amount of received light is read out.
- FIG. 4C shows a third circuit configuration example of the logarithmic conversion circuit 32.
- the logarithmic conversion circuit 32C is configured by combining an NMOS transistor 41, a switch 42, and a switch 44.
- the source of the NMOS transistor 41 is connected to the reset transistor 26 (FIG. 2) via the switch 44 by the signal line 34, and the drain and gate of the NMOS transistor 41 are connected to the power supply VLOG.
- the switch 42 is arranged so as to connect between the signal line 34 and the power source VR, and opens and closes according to an inverted enable signal XLOGEN obtained by inverting an enable signal that enables logarithmic signal reading.
- the switch 44 is arranged so as to connect between the NMOS transistor 41 and the signal line 34, and opens and closes according to an enable signal LOGEN that enables reading of logarithmic signals.
- the logarithmic conversion circuit 32C is configured, and when the pixel signal is read from the pixel 12, the linear mode and the logarithmic mode can be switched seamlessly according to the enable signal LOGEN and the inverted enable signal XLOGEN.
- the switch 42 in the linear mode, the switch 42 is turned on when the inverted enable signal XLOGEN becomes Hi level, and the switch 44 is turned off when the enable signal LOGEN becomes Low level.
- the power supply VR is connected to the pixel 12 via the switch 42, whereby a pixel signal that changes linearly according to the amount of light received by the pixel 12 is read out.
- the switch 42 is turned off when the inverted enable signal XLOGEN goes low, while the switch 44 is turned on when the enable signal LOGEN goes high.
- the power supply VLOG is connected to the pixel 12 via the diode-connected NMOS transistor 41, whereby a pixel signal that changes logarithmically according to the amount of light received by the pixel 12 is read out.
- FIG. 4D shows a fourth circuit configuration example of the logarithmic conversion circuit 32.
- the logarithmic conversion circuit 32D is configured by combining a PMOS transistor 43, a switch 42, and a switch 44.
- the source and gate of the PMOS transistor 43 are connected to the reset transistor 26 (FIG. 2) by the signal line 34 via the switch 44, and the drain of the PMOS transistor 43 is connected to the power supply VLOG.
- the switch 42 is arranged so as to connect between the signal line 34 and the power supply VR, and opens and closes according to an inverted enable signal XLOGEN obtained by inverting an enable signal LOGEN that enables logarithmic signal reading.
- the switch 44 is arranged so as to connect between the NMOS 43 and the signal line 34, and opens and closes according to an enable signal LOGEN that enables reading of logarithmic signals.
- the logarithmic conversion circuit 32D is configured, and when reading out the pixel signal from the pixel 12, the linear mode and the logarithmic mode can be switched seamlessly according to the enable signal LOGEN and the inverted enable signal XLOGEN.
- the switch 42 in the linear mode, the switch 42 is turned on when the inverted enable signal XLOGEN becomes Hi level, and the switch 44 is turned off when the enable signal LOGEN becomes Low level.
- the power supply VR is connected to the pixel 12 via the switch 42, whereby a pixel signal that changes linearly according to the amount of light received by the pixel 12 is read out.
- the switch 42 is turned off when the inverted enable signal XLOGEN goes low, while the switch 44 is turned on when the enable signal LOGEN goes high.
- the power supply VLOG is connected to the pixel 12 via the diode-connected PMOS transistor 43, whereby a pixel signal that changes logarithmically according to the amount of light received by the pixel 12 is read out.
- the logarithmic conversion circuit 32C shown in FIG. 4C has a configuration example in which the switch 44 is arranged on the source side of the NMOS transistor 41. However, the switch 44 is connected between the drain of the NMOS transistor 41 and the power supply VLOG. You may employ
- FIG. 5 shows a fifth circuit configuration example of the logarithmic conversion circuit 32.
- the logarithmic conversion circuit 32E is configured by combining two NMOS transistors 41-1 and 41-2, a switch 42, and two switches 44-1 and 44-2.
- the source of the NMOS transistor 41-1 is connected to the reset transistor 26 (FIG. 2) by the signal line 34 via the switch 44-1, and the drain and gate of the NMOS transistor 41-1 are connected to the power supply VLOG. ing.
- the source of the NMOS transistor 41-2 is connected to the reset transistor 26 (FIG. 2) via the switch 44-2 by the signal line 34, and the drain and gate of the NMOS transistor 41-2 are connected to the power supply VLOG. It is connected to the.
- the switch 42 is arranged so as to connect between the signal line 34 and the power supply VR, and opens and closes according to an inverted enable signal XLOGEN obtained by inverting an enable signal LOGEN that enables logarithmic signal reading.
- the switch 44-1 is arranged so as to connect between the NMOS transistor 41-1 and the signal line 34, and opens and closes according to the first enable signal LOGEN1 that enables logarithmic signal reading.
- the switch 44-2 is arranged so as to connect between the NMOS transistor 41-2 and the signal line 34, and opens and closes according to a second enable signal LOGEN2 that enables reading of logarithmic signals.
- the logarithmic conversion circuit 32E configured in this manner is provided with two NMOS transistors 41-1 and 41-2, and by switching the switches 44-1 and 44-2, the dynamics of the pixel signal read from the pixel 12 is changed. The range can be changed.
- the logarithmic conversion circuit 32E can include a trimming function in order to make the diode characteristics uniform by the NMOS transistors 41-1 and 41-2.
- the logarithmic conversion circuit 32 is not limited to the circuit configuration examples as shown in FIGS. 4 and 5, and other circuit configurations can be adopted. Further, the power supply VR and the power supply VLOG may be the same power supply in addition to being different power supplies as shown in the figure. Further, in addition to a two-stage configuration including two NMOS transistors 41-1 and 41-2 as in the logarithmic conversion circuit 32E, a multi-stage configuration including two or more NMOS transistors 41 may be employed.
- the logarithmic conversion circuit 32 is arranged in the circuit area 14 (that is, outside the pixel area 13), so that the size and type of the transistors constituting the logarithmic conversion circuit 32 are designed. The degree of freedom can be improved.
- FIG. 6A shows an example of a drive signal when reading out a pixel signal from the pixel 12 in the linear mode
- FIG. 6B shows a drive signal when reading out the pixel signal from the pixel 12 in the logarithmic mode. An example of is shown.
- the low level enable signal LOGEN is supplied to the logarithmic conversion circuit 32.
- the switch 42 shown in FIG. 4C is turned on (inverted enable signal XLOGEN: Hi level). ) And the switch 44 is turned off.
- the selection signal SEL becomes Hi level
- the reset signal RST becomes a pulsed Hi level and the FD unit 23 is reset
- the AD conversion circuit 31 reads out the pixel signal (reset signal) at the reset level and performs AD conversion.
- the transfer signal TRG becomes Hi level in a pulse shape, and charges are transferred from the photodiode 21 to the FD unit 23, and the AD conversion circuit 31 has a pixel signal (level) corresponding to the amount of light received by the photodiode 21 ( (Optical signal) is read and AD conversion is performed.
- the selection signal SEL is set to the low level
- reading of the pixel signal from the pixel 12 is completed.
- the Hi level enable signal LOGEN is supplied to the logarithmic conversion circuit 32.
- the switch 42 shown in FIG. 4C is turned off (inverted enable signal XLOGEN: Low level).
- the switch 44 is turned on.
- the Hi level reset signal RST and the transfer signal TRG are always supplied to the pixel 12.
- FIG. 7A shows a first modification of the pixel 12
- FIG. 7B shows a second modification of the pixel 12.
- the same reference numerals are given to the same components as those of the pixel 12 in FIG. 7
- the pixel 12A is common to the pixel 12 of FIG. 2 in that it includes a photodiode 21, a transfer transistor 22, an FD portion 23, an amplification transistor 24, a selection transistor 25, and a reset transistor 26. It has a configuration.
- the pixel 12A is different from the pixel 12 of FIG. 2 in that the reset transistor 26 is connected to the power supply VDD, and the cathode terminal of the photodiode 21 is connected to the logarithmic conversion circuit 32 via the logarithmic switching transistor 27. It has a configuration.
- the logarithmic switching transistor 27 is driven according to the logarithmic switching signal LSW.
- the transfer transistor 22 is turned on together with the logarithmic switching transistor 27, the FD unit 23 is connected to the logarithmic conversion circuit 32.
- the pixel 12 ⁇ / b> B is common to the pixel 12 of FIG. 2 in that it includes a photodiode 21, a transfer transistor 22, an FD portion 23, an amplification transistor 24, a selection transistor 25, and a reset transistor 26. It has a configuration.
- the pixel 12B is different from the pixel 12 in FIG. 2 in that the reset transistor 26 is connected to the power supply VDD and the FD unit 23 is connected to the logarithmic conversion circuit 32 via the logarithmic switching transistor 27. ing.
- the logarithmic switching transistor 27 is driven according to the logarithmic switching signal LSW, and the FD unit 23 is connected to the logarithmic conversion circuit 32 when the logarithmic switching transistor 27 is turned on.
- linear readout and logarithmic readout are seamlessly performed without changing the pixel characteristics of the pixels 12A and 12B by the logarithmic conversion circuit 32, similarly to the pixel 12 in FIG. Can be switched.
- FIG. 8A shows an example of a drive signal when reading out the pixel signal from the pixels 12A and 12B in the linear mode
- FIG. 8B shows reading out the pixel signal from the pixels 12A and 12B in the logarithmic mode.
- An example of the driving signal is shown.
- the low level logarithmic switching signal LSW is supplied to the logarithmic switching transistor 27, and the logarithmic switching transistor 27 is turned off.
- pixel signals are read from the pixels 12A and 12B by the same driving as described with reference to FIG.
- the Hi level logarithmic switching signal LSW is supplied to the logarithmic switching transistor 27, and the logarithmic switching transistor 27 is turned on.
- the linear mode pixel signals are read out from the pixels 12A and 12B by the same driving as described with reference to FIG.
- FIG. 9 is a diagram showing a first arrangement example of the logarithmic conversion circuit 32 for one column of the pixels 12 arranged in an array in the pixel region 13.
- a plurality of logarithmic conversion circuits 32 corresponding to the number of pixels 12 arranged in one column are arranged for one column of pixels 12. That is, the image sensor 11 switches the linear mode and logarithmic mode for the N pixels 12-1 to 12-N provided in one column of the pixel region 13, respectively, corresponding to the N logarithmic conversion circuits 32-1 to 32-1. 32-N can be configured.
- FIG. 10 is a diagram showing a second arrangement example of the logarithmic conversion circuit 32 for one column of the pixels 12 arranged in an array in the pixel region 13.
- one logarithmic conversion circuit 32 is arranged for one column of the pixels 12. That is, the imaging device 11 is configured such that one logarithmic conversion circuit 32 performs switching between the linear mode and the logarithmic mode for the N pixels 12-1 to 12-N provided in one column of the pixel region 13. Can do.
- an arrangement in which one logarithmic conversion circuit 32 is provided for each predetermined number of pixels 12 among a plurality of pixels 12 arranged in one column is employed. May be. In this case, the linear mode and the logarithmic mode can be switched for each predetermined number of pixels 12.
- one pixel 12 when one pixel 12 is connected among a predetermined number of pixels 12 connected to one logarithmic conversion circuit 32, one pixel signal is logarithmically converted.
- an optical signal is added. can do.
- the connection of the pixel 12 includes a state where the transfer transistor 22 and the reset transistor 26 are turned on, a state where only the logarithmic switching transistor 27 is turned on, and a state where the logarithmic switching transistor 27 and the transfer transistor 22 are turned on. That is, the photodiode 21 and the logarithmic conversion circuit 32 are connected.
- the imaging device 11 is provided with the pixel region 13 and the circuit region 14 on different substrates, and these substrates are connected to each other using TSV (Through-Silicon Via), micro-bump, Cu-Cu connection, or the like.
- TSV Through-Silicon Via
- micro-bump micro-bump
- Cu-Cu connection or the like.
- a laminated structure can be adopted.
- FIG. 11 is a diagram illustrating a first configuration example of the image sensor 11 adopting a laminated structure.
- the image sensor 11A is configured by laminating a pixel substrate 51A and a circuit substrate 52A.
- a plurality of pixels 12 are arranged in an array on the pixel substrate 51A in the same manner as the imaging device 11 in FIG. 1, and a pixel unit 53 is configured by a predetermined number of pixels 12 as shown in the lower left.
- the circuit board 52A is provided with a circuit block 54 for each pixel unit 53 of the pixel substrate 51A, and the circuit block 54 can be configured such that only the logarithmic conversion circuit 32 is disposed.
- the circuit block 54 may have a configuration in which the AD conversion circuit 31 and the logarithmic conversion circuit 32 corresponding to the pixel unit 53 are arranged.
- the image sensor 11A configured as described above can switch between the linear mode and the logarithmic mode for each pixel unit 53 by the logarithmic conversion circuit 32 arranged in the circuit block 54.
- FIG. 12 is a diagram illustrating a second configuration example of the image sensor 11 adopting a laminated structure.
- the image sensor 11B is configured by laminating a pixel substrate 51B and a circuit substrate 52B.
- a plurality of pixels 12 are arranged in an array on the pixel substrate 51B in the same manner as the image sensor 11 of FIG.
- the imaging device 11B configured as described above can switch between the linear mode and the logarithmic mode for each pixel 12 by the logarithmic conversion circuit 32 disposed in the circuit block 54.
- the image sensor 11 may be configured by stacking two or more substrates.
- a logarithmic conversion circuit 32 is formed on the pixel substrate 51 in a region other than the pixel region 13 where the pixels 12 are formed, for example, in the peripheral portion of the pixel substrate 51. It is good also as such a structure.
- the pixel 12A may be configured in the same manner as the pixel 12 in FIG. 2, and the circuit block 54A may be configured to include only the logarithmic conversion circuit 32.
- the pixel 12B is configured in the same manner as the pixel 12 in FIG. 2, and the circuit block 54B is configured to include the AD conversion circuit 31 and the logarithmic conversion circuit 32. it can.
- the pixel 12C has a configuration in which the photodiode 21, the transfer transistor 22, the FD unit 23, the amplification transistor 24, and the selection transistor 25 are arranged, and the circuit block 54C has an AD conversion.
- the circuit 31, the logarithmic conversion circuit 32, and the reset transistor 26 can be arranged.
- the pixel 12D has a configuration in which the photodiode 21, the transfer transistor 22, and the FD unit 23 are arranged, and the circuit block 54D includes an AD conversion circuit 31, a logarithmic conversion circuit 32, The amplification transistor 24, the selection transistor 25, and the reset transistor 26 can be arranged.
- the pixel 12E has a configuration in which the photodiode 21, the transfer transistor 22, the FD unit 23, the amplification transistor 24, and the reset transistor 26 are arranged, and the circuit block 54E includes an AD converter.
- the circuit 31, the logarithmic conversion circuit 32, and the selection transistor 25 can be arranged.
- the elements constituting the pixel 12 and the circuit block 54 can be appropriately disposed in each, and other than the arrangement example as shown in FIG. An arrangement may be employed.
- FIG. 14A shows a first modification of the logarithmic mode readout method. That is, a reset signal is output when the enable signal LOGEN is at a low level, and an optical signal is output logarithmically when the enable signal LOGEN is at a high level. Therefore, as shown in FIG. 14A, it is possible to drive in a logarithmic mode reading method in which a reset signal is read first and then a logarithmic signal is read as an optical signal. With the logarithmic mode readout method as shown in FIG. 14A, it is possible to realize a CDS (Correlated Double Sampling) operation that removes noise (including offset) of the grounded drain circuit used for pixel signal readout.
- CDS Correlated Double Sampling
- FIG. 14B shows a second modification of the logarithmic mode readout method.
- the offset of the circuit can be removed by subtracting the output (analog domain, digital domain, or both) by the logarithmic mode readout method as shown in FIG. 14B.
- FIG. 15 for example, as shown in FIG. 9 described above, a plurality of logarithmic conversion circuits corresponding to the number of pixels 12 arranged in one column for one column of pixels 12. A method for reading a pixel signal in the image sensor 11 in which 32 is arranged will be described.
- a readout method in which pixels 12 from which pixel signals are read out in a linear mode and pixels 12 from which pixel signals are read out in a logarithmic mode are arranged for each column of pixels 12.
- the pixel signal can be read out.
- a readout method in which the pixels 12 from which the pixel signals are read out in the linear mode and the pixels 12 from which the pixel signals are read out in the logarithmic mode are arranged for each row of the pixels 12.
- the pixel signal can be read out.
- the pixels 12 from which the pixel signals are read out in the linear mode and the pixels 12 from which the pixel signals are read out in the logarithmic mode are in a checkered pattern (that is, one column and one row of the pixels 12).
- the pixel signals can be read out in such a reading manner that they are arranged alternately. It is known that such a readout method improves the spatial frequency.
- the image sensor 11 may use the two images as independent ones, or obtain an image with less noise and a wide dynamic range by combining the two images. be able to.
- the readout method described with reference to FIG. 15 can be realized by configuring the image sensor 11 so that pixel signals can be read out in all the pixels 12 in the linear mode or logarithmic mode. This is an application example of the imaging device 11 configured as described above.
- the pixel unit 53 from which the pixel signal is read out in the linear mode is not hatched, and the pixel signal is read out in the logarithmic mode.
- the pixel unit 53 is hatched.
- the pixel unit 53 from which the pixel signal is read out in the linear mode and the pixel unit 53 from which the pixel signal is read out in the logarithmic mode are arranged in a checkered pattern (that is, the pixel unit 53).
- the pixel signals can be read out in such a reading system that they are arranged alternately in each column and row.
- an image having a wide dynamic range and an image having a small noise can be identical. Can be acquired at the timing.
- the image sensor 11 may use the two images as independent ones, or obtain an image with less noise and a wide dynamic range by combining the two images. be able to.
- a readout method in which pixel units 53 from which pixel signals are read out in a linear mode and pixel units 53 from which pixel signals are read out in a logarithmic mode are regularly arranged (for example, one column or one row).
- a reading method that is randomly arranged may be employed.
- all the pixels 12 included in the pixel unit 53 are configured such that pixel signals are read out only in either the linear mode or the logarithmic mode, and the pixel signals are read out in combination with the linear mode or the logarithmic mode. You may do it.
- the readout method described here can be realized by configuring the image sensor 11A so that the pixel signals can be read out in all the pixels 12 in the linear mode or logarithmic mode.
- the pixel 12 from which the pixel signal is read out in the linear mode is not hatched, and the pixel 12 from which the pixel signal is read out in the logarithmic mode. Is hatched.
- the pixels 12 from which the pixel signals are read out in the linear mode and the pixels 12 from which the pixel signals are read out in the logarithmic mode are arranged in a checkered pattern (that is, one column of the pixels 12).
- the pixel signals can be read out in such a reading manner that they are arranged alternately in each row.
- the image sensor 11 may use the two images as independent ones, or obtain an image with less noise and a wide dynamic range by combining the two images. be able to.
- a readout method in which the pixels 12 from which the pixel signals are read out in the linear mode and the pixels 12 from which the pixel signals are read out in the logarithmic mode are regularly arranged may be adopted.
- the readout method described here can be realized by configuring the image sensor 11B so that the pixel signals can be read out in all the pixels 12 in the linear mode or logarithmic mode. This is an application example of the image sensor 11B configured as described above.
- the pixel 12 (or pixel unit 53) from which the pixel signal is read out in the linear mode and the pixel 12 (or pixel unit 53) from which the pixel signal is read out in the logarithmic mode. ) May be switched.
- the pixel signal is read out in logarithmic mode at the time of automatic exposure operation when capturing an image, and the mode is switched to linear mode when capturing an image.
- control it is possible to perform control to read out the pixel signal.
- Such control is optimal for determining an optimal exposure condition because the logarithmic mode has a wide dynamic range, and the linear mode is suitable for the photographing mode because there is little noise.
- the pixel 12X shown in FIG. 17 has a two-pixel shared structure in which two photodiodes 21a and 21b share the FD portion 23, the amplification transistor 24, the selection transistor 25, and the reset transistor 26. .
- a plurality of logarithmic conversion circuits 32 corresponding to the number of pixels 12X arranged in one column are arranged for one column of pixels 12X. That is, switching of the linear mode and logarithmic mode for the N pixels 12X-1 to 12X-N provided in one column of the pixel region 13 is performed by the corresponding N logarithmic conversion circuits 32-1 to 32-N. Is called.
- the pixel 12Y shown in FIG. 18 has a two-pixel sharing structure, similarly to the pixel 12X of FIG. Then, similarly to the stacked structure as described above with reference to FIG. 12, a circuit block 54 having the logarithmic conversion circuit 32 is provided on the circuit substrate 52 for each pixel 12Y disposed on the pixel substrate 51. it can.
- FIG. 19 corresponds to an area of m ⁇ n pixels 12 (1, 1) to 12 (m, n) arranged so as to have m rows in the vertical direction and n columns in the horizontal direction.
- a configuration in which the circuit block 54 having the logarithmic conversion circuit 32 is arranged on the circuit board 52 is shown.
- the logarithmic conversion circuit 32 can be shared by a predetermined number (m ⁇ n) of pixels 12 arranged in a predetermined region.
- the configuration in which the logarithmic conversion circuit 32 is shared by the pixels 12X or 12Y having the pixel sharing structure and the configuration in which the logarithmic conversion circuit 32 is shared by the plurality of pixels 12 are not limited to the illustrated example.
- the configuration can be freely adopted.
- FIG. 20 shows a configuration example of a pixel sharing structure using photodiodes 21 of different sizes.
- the pixel 12Z shown in FIG. 20 uses a pixel sharing structure using a small size photodiode 21S-1 and a large size photodiode 21L-1.
- the imaging device 11 can be configured to perform, for example, HDR (High Dynamic Range) synthesis.
- a photodiode 21 having an intermediate size may be combined.
- the present technology can be applied to a configuration in which the photodiodes 21 having different sizes are employed for the pixels 12 in the pixels 12 that do not use the pixel sharing structure. Furthermore, the present technology can be applied to a configuration in which the sensitivity of each pixel 12 is changed by making each pixel 12 have different optical characteristics (transmission characteristics) such as a color filter and an antireflection film.
- the image pickup device 11 can be made by dividing the pixel region 13 and the circuit region 14 to select an optimum transistor type (for example, changing the power source type, that is, changing the gate oxide film, Change the threshold, or remove the restrictions of NMOS and PMOS).
- an optimum transistor type for example, changing the power source type, that is, changing the gate oxide film, Change the threshold, or remove the restrictions of NMOS and PMOS.
- the image pickup device 11 can individually manufacture the pixel substrate 51 and the circuit substrate 52, the process itself can be changed and optimized. Furthermore, since the image sensor 11 can read a pixel signal as the pixel 12 having a high dynamic range, in the HDR method using the sensitivity difference by changing the pixel size, the HDR is equal to or higher than the conventional one without increasing the pixel size ratio. Synthesis is possible. In other words, even in HDR synthesis in which the exposure time is controlled for each pixel 12 or for each frame, even if the exposure ratio is small or the number of frames is reduced, the HDR synthesis equivalent to or higher than the conventional one can be easily implemented. Can do.
- FIG. 21 is a circuit diagram showing a configuration example of a pixel that performs only logarithmic readout.
- the pixel 121 includes a photodiode 21 and a selection transistor 25, and the pixel 121 only performs logarithmic readout.
- the pixel 121 has a connection configuration in which the cathode terminal of the photodiode 21 is connected to the AD conversion circuit 31 via the selection transistor 25 and directly connected to the logarithmic conversion circuit 32.
- the pixel 121 does not need the current source 35 as shown in FIG. 2, and reads the charge generated in the photodiode 21 to the AD conversion circuit 31 via the signal line 33 using the photodiode 21 as a current source. be able to. That is, when the selection transistor 25 is turned on, the pixel 121 can output a pixel signal in which the charge generated in the photodiode 21 changes logarithmically to the AD conversion circuit 31.
- the pixel 121 configured in this way has a configuration in which the transfer transistor 22, the FD unit 23, the amplification transistor 24, the selection transistor 25, and the reset transistor 26 are deleted as compared with the pixel 12 of FIG.
- the function of the reset transistor 26 is provided in the switch 42 (see FIG. 4) in the logarithmic conversion circuit 32. Accordingly, the pixel 121 can be reduced in pixel area and can be easily designed compared to the pixel 12 in FIG.
- the pixel 121 does not need to include the current source 35 for driving the amplification transistor 24 as compared with the pixel 12 of FIG. 2, and does not require a source follower by the amplification transistor 24 and the current source 35. Yes. Therefore, the pixel 121 can reduce noise by reducing those circuits, and can reduce power consumption. Further, the circuit design of the AD conversion circuit 31 is facilitated for the pixel 121.
- the enable signal LOGEN supplied to the logarithmic conversion circuit 32 is always at the Hi level, and the inverted enable signal XLOGEN supplied to the logarithmic conversion circuit 32 is at the Low level. Become. Then, charges are continuously transferred from the photodiode 21 to the AD conversion circuit 31 while the selection signal SEL is at the Hi level. As a result, the charge photoelectrically converted in the photodiode 21 flows logarithmically into the diode-connected transistor (for example, the NMOS transistor 41 in FIG. 4A or the PMOS transistor 43 in FIG. 4B), thereby changing logarithmically.
- the pixel signal to be read can be read out.
- FIG. 23 is a diagram illustrating an arrangement example of the logarithmic conversion circuit 32 for one column of the pixels 121 arranged in an array in the pixel region 13.
- a plurality of logarithmic conversion circuits 32 corresponding to the number of pixels 121 arranged in one column are arranged for one column of pixels 121. That is, the imaging device 11 includes N logarithmic conversion circuits 32-1 to 32-N corresponding to N pixels 121-1 to 121-N provided in one column of the pixel region 13, respectively. Can be configured.
- the logarithmic readout of the pixel signal can be performed for each pixel 121.
- these logarithmic conversion circuits 32 are arranged in the circuit region 14 that is outside the pixel region 13. As a result, the image sensor 11 can improve the degree of freedom in designing the size and type of the transistors constituting the logarithmic conversion circuit 32.
- the N logarithmic conversion circuits 32a-1 to 32a-N have a configuration in which a switch 42 that controls connection with the power supply VR according to the inverted enable signal XLOGEN is shared.
- the switch 42 has a function of resetting the charge generated in the pixel 121.
- the circuit configuration of the logarithmic conversion circuit 32 described above with reference to FIG. 4 is configured to include the switch 42 in any of the configuration examples, and the N logarithmic conversion circuits 32a-1 to 32a-N include the switch 42. By using them in common, they can be placed outside them. In other words, the logarithmic conversion circuits 32a-1 to 32a-N have a configuration in which the switch 42 is not disposed in the circuit configuration of the logarithmic conversion circuit 32 shown in FIG.
- the image sensor 11 can reduce the circuit area.
- the configuration in which the switch 42 is shared such as the N logarithmic conversion circuits 32a-1 to 32a-N, can be applied not only to the pixel 121 but also to the pixel 12. .
- FIG. 25 is a circuit diagram showing a modification of the basic circuit configuration of the pixel 12 of FIG. Note that, in the basic circuit configuration of the pixel 12 illustrated in FIG. 25, the same reference numerals are given to configurations common to those in FIG. 2, and detailed descriptions thereof are omitted.
- the pixel 12 is configured in the same manner as in FIG. 2, and includes an AD conversion circuit 31, a logarithmic conversion circuit 32, and a current source 35.
- a switch 141 is added so as to prescribe the signal line 33 and the signal line 34, and a switch 142 and a switch 143 are added to the signal line 33.
- the switch 142 connects the pixel 12 to a connection point between the signal line 33 and the switch 141, and the switch 142 connects the connection point between the signal line 33 and the AD conversion circuit 31 and the current source 35.
- the switch 141 opens and closes in accordance with a logarithmic mode signal LOGMODE instructing a mode for reading out the logarithmic signal, and the switch 142 and the switch 143 open and close in accordance with an inverted logarithmic mode signal XLOGMODE obtained by inverting the logarithmic mode signal LOGMODE.
- FIG. 26A shows an example of a drive signal when reading a pixel signal from the pixel 12 in the linear mode
- FIG. 26B shows a drive signal when reading the pixel signal from the pixel 12 in the logarithmic mode. An example of is shown.
- the logarithmic mode signal LOGMODE at the low level is supplied to the switch 141, and the inverted logarithmic mode signal XLOGMODE at the high level is supplied to the switch 142 and the switch 143. Therefore, in the linear mode, the switch 141 is turned off and the switch 142 and the switch 143 are turned on.
- connection configuration is substantially the same as in FIG. 2, and a pixel signal can be read from the pixel 12 as in the linear mode described above with reference to FIG.
- a low-level logarithmic mode signal LOGMODE is supplied to the switch 141, and a Hi-level inverted logarithmic mode signal XLOGMODE is supplied to the switch 142 and the switch 143. Therefore, in the linear mode, the switch 141 is turned off and the switch 142 and the switch 143 are turned on. Therefore, in the linear mode, the switch 141 is turned on, and the switches 142 and 143 are turned off. In the logarithmic mode, the Hi level reset signal RST and the transfer signal TRG are always supplied to the pixel 12.
- the photodiode 21 is directly connected to the AD conversion circuit 31 and the logarithmic conversion circuit 32 as in the pixel 121 of FIG. . Further, in this case, the switch 143 is turned off so that the current source 35 is not connected. As a result, the charge photoelectrically converted in the photodiode 21 flows into the diode-connected transistor of the logarithmic conversion circuit 32 (for example, the NMOS transistor 41 in FIG. 4A or the PMOS transistor 43 in FIG. 4B). The pixel signal that changes logarithmically can be read out to the AD conversion circuit 31.
- connection configuration is substantially the same as that of the pixel 121 of FIG. 21, and a pixel signal can be read from the pixel 12 as in the logarithmic mode described above with reference to FIG.
- the imaging device 11 as described above is applied to various electronic devices such as an imaging system such as a digital still camera and a digital video camera, a mobile phone having an imaging function, or other devices having an imaging function. can do.
- FIG. 27 is a block diagram illustrating a configuration example of an imaging device mounted on an electronic device.
- the imaging apparatus 201 includes an optical system 202, an imaging element 203, a signal processing circuit 204, a monitor 205, and a memory 206, and can capture still images and moving images.
- the optical system 202 includes one or more lenses, guides image light (incident light) from a subject to the image sensor 203, and forms an image on a light receiving surface (sensor unit) of the image sensor 203.
- the image sensor 11 described above is applied as the image sensor 203.
- the image sensor 203 electrons are accumulated for a certain period according to the image formed on the light receiving surface via the optical system 202. Then, a signal corresponding to the electrons accumulated in the image sensor 203 is supplied to the signal processing circuit 204.
- the signal processing circuit 204 performs various signal processing on the pixel signal output from the image sensor 203.
- An image (image data) obtained by performing signal processing by the signal processing circuit 204 is supplied to the monitor 205 and displayed, or supplied to the memory 206 and stored (recorded).
- the imaging apparatus 201 configured as described above, since the imaging element 11 described above is applied, imaging with a wide dynamic range is possible. Therefore, when the illuminance of the subject is sufficiently within the range, The exposure control accuracy can be improved, and an image with an appropriate exposure can be taken reliably.
- FIG. 28 is a diagram showing a usage example in which the above-described image sensor is used.
- the image sensor described above can be used in various cases for sensing light such as visible light, infrared light, ultraviolet light, and X-ray as follows.
- Devices for taking images for viewing such as digital cameras and mobile devices with camera functions
- Devices used for traffic such as in-vehicle sensors that capture the back, surroundings, and interiors of vehicles, surveillance cameras that monitor traveling vehicles and roads, and ranging sensors that measure distances between vehicles, etc.
- Equipment used for home appliances such as TVs, refrigerators, air conditioners, etc. to take pictures and operate the equipment according to the gestures ⁇ Endoscopes, equipment that performs blood vessel photography by receiving infrared light, etc.
- Equipment used for medical and health care ⁇ Security equipment such as security surveillance cameras and personal authentication cameras ⁇ Skin measuring instrument for photographing skin and scalp photography Such as a microscope to do beauty Equipment used for sports-Equipment used for sports such as action cameras and wearable cameras for sports applications-Used for agriculture such as cameras for monitoring the condition of fields and crops apparatus
- this technique can also take the following structures.
- a solid-state imaging device comprising: a logarithmic conversion circuit that reads out a pixel signal from the pixel by a logarithmic readout method in which a pixel signal changes approximately logarithmically according to the amount of light received by the pixel.
- the logarithmic conversion circuit switches between the logarithmic readout method and the linear readout method in which the pixel signal changes substantially linearly according to the amount of light received by the pixel when reading out a pixel signal from the pixel.
- the solid-state image sensor as described in 1).
- the solid-state imaging device according to (1) or (2), wherein the logarithmic conversion circuit is connected via a predetermined transistor to a floating diffusion region to which charges generated in the photoelectric conversion unit of the pixel are transferred.
- the logarithmic conversion circuit reads a pixel signal from the pixel by the linear readout method
- the logarithmic conversion circuit supplies a power supply voltage to the pixel via a switch, and when the pixel signal is read from the pixel by the logarithmic readout method.
- the solid-state imaging device according to any one of (1) to (3), wherein a power supply voltage is supplied to the pixel through a circuit in which MOS (Metal-Oxide Semiconductor) transistors are connected in a diode manner.
- MOS Metal-Oxide Semiconductor
- the logarithmic conversion circuit is arranged for each column of the pixels arranged in the pixel region in a number corresponding to the number of the pixels in the column.
- One said logarithmic conversion circuit is arrange
- the solid-state image sensor in any one of said (1)-(3).
- the solid-state imaging device according to any one of (1) to (7), wherein the solid-state imaging element includes a stacked structure in which a pixel substrate on which the pixel region is formed and a circuit substrate on which the circuit region is formed are stacked.
- the solid-state imaging device wherein one logarithmic conversion circuit is disposed on the circuit board corresponding to one pixel formed on the pixel substrate.
- one logarithmic conversion circuit is disposed on the circuit board in correspondence with a pixel unit including the plurality of pixels formed on the pixel substrate.
- the pixel of the linear readout method and the pixel of the logarithmic readout method are arranged for each pixel unit including a plurality of the pixels.
- (1) to (13) Solid-state image sensor.
- the pixel signal is read by the logarithmic readout method at the time of an automatic exposure operation when an image is captured, and the pixel signal is read by the linear readout method at the time of capturing an image. Any one of (1) to (14) The solid-state imaging device described.
- the pixel is A photoelectric conversion unit that converts incident light into charges by photoelectric conversion and stores the charge; and A first transistor configured to connect the first signal line and the photoelectric conversion unit, and the pixel is selected to output a pixel signal;
- An AD conversion circuit that performs AD (Analog to Digital) conversion on a pixel signal output via the first signal line using the pixel as a current source;
- the solid-state imaging device according to any one of (1) to (15), wherein the photoelectric conversion unit is directly connected to the logarithmic conversion circuit via a second signal line.
- the logarithmic conversion circuit is arranged in a number corresponding to the number of the pixels in the column for each column of the pixels arranged in the pixel region.
- the solid-state imaging device wherein the plurality of logarithmic conversion circuits connected to the pixels arranged in one column in the pixel region commonly use a switch that resets the charge generated in the pixels.
- the pixel is A photoelectric conversion unit that converts incident light into charges by photoelectric conversion and stores the charge; and A transfer transistor for transferring charges accumulated in the photoelectric conversion unit; A floating diffusion region for accumulating charges transferred through the transfer transistor; An amplification transistor that outputs a pixel signal of a level corresponding to the charge accumulated in the floating diffusion region; A selection transistor that connects a first signal line and the amplification transistor, and the pixel is selected to output a pixel signal; A reset transistor for connecting the floating diffusion region to the logarithmic conversion circuit via a second signal line; Comprising A current source constituting the amplification transistor and a source follower; An AD conversion circuit that AD converts a pixel signal output from the pixel via the first signal line, and the solid-state imaging device according to any one of
- a first switch disposed between the first signal line and the second signal line; A second switch disposed between the pixel and a connection point of the first signal line and the first switch; A third switch disposed between a connection point of the first signal line and the AD conversion circuit and the current source;
- MOS Metal-Oxide Semiconductor
- a solid-state imaging device having at least a circuit region in which a logarithmic conversion circuit that reads out a pixel signal from the pixel by a logarithmic readout method in which a pixel signal changes approximately logarithmically according to the amount of light received by the pixel is provided.
- Electronic equipment provided.
Landscapes
- Engineering & Computer Science (AREA)
- Multimedia (AREA)
- Signal Processing (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Nonlinear Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Transforming Light Signals Into Electric Signals (AREA)
Abstract
Description
・自動停止等の安全運転や、運転者の状態の認識等のために、自動車の前方や後方、周囲、車内等を撮影する車載用センサ、走行車両や道路を監視する監視カメラ、車両間等の測距を行う測距センサ等の、交通の用に供される装置
・ユーザのジェスチャを撮影して、そのジェスチャに従った機器操作を行うために、TVや、冷蔵庫、エアーコンディショナ等の家電に供される装置
・内視鏡や、赤外光の受光による血管撮影を行う装置等の、医療やヘルスケアの用に供される装置
・防犯用途の監視カメラや、人物認証用途のカメラ等の、セキュリティの用に供される装置
・肌を撮影する肌測定器や、頭皮を撮影するマイクロスコープ等の、美容の用に供される装置
・スポーツ用途等向けのアクションカメラやウェアラブルカメラ等の、スポーツの用に供される装置
・畑や作物の状態を監視するためのカメラ等の、農業の用に供される装置
(1)
光電変換を行う複数の画素が配置される画素領域と、
前記画素が受光した光の光量に応じて画素信号が略対数的に変化する対数読み出し方式により、前記画素から画素信号を読み出す対数変換回路が、少なくとも配置される回路領域と
を備える固体撮像素子。
(2)
前記対数変換回路は、前記画素から画素信号を読み出す際に、前記対数読み出し方式と、前記画素が受光した光の光量に応じて画素信号が略直線的に変化する直線読み出し方式とを切り替える
上記(1)に記載の固体撮像素子。
(3)
前記対数変換回路は、前記画素の光電変換部で発生した電荷が転送される浮遊拡散領域に所定のトランジスタを介して接続される
上記(1)または(2)に記載の固体撮像素子。
(4)
前記対数変換回路は、前記画素から前記直線読み出し方式により画素信号を読み出す場合には、スイッチを介して前記画素に電源電圧を供給し、前記画素から前記対数読み出し方式により画素信号を読み出す場合には、MOS(Metal-Oxide Semiconductor)トランジスタをタイオード接続した回路を介して前記画素に電源電圧を供給する
上記(1)から(3)までのいずれかに記載の固体撮像素子。
(5)
前記対数変換回路は、前記画素領域に配置される前記画素の列ごとに、その列の前記画素の個数に応じた個数で配置される
上記(1)から(3)までのいずれかに記載の固体撮像素子。
(6)
前記対数変換回路は、前記画素領域に配置される前記画素の列ごとに、1個ずつ配置される
上記(1)から(3)までのいずれかに記載の固体撮像素子。
(7)
前記画素領域に配置される所定数の前記画素に対応して、1つの前記対数変換回路が配置される
上記(1)から(6)までのいずれかに記載の固体撮像素子。
(8)
前記画素領域が形成される画素基板と、前記回路領域が形成される回路基板とが積層される積層構造により構成される
上記(1)から(7)までのいずれかに記載の固体撮像素子。
(9)
前記画素基板に形成される1つの前記画素に対応して、前記回路基板に1つの前記対数変換回路が配置される
上記(8)に記載の固体撮像素子。
(10)
前記画素基板に形成される複数の前記画素からなる画素ユニットに対応して、前記回路基板に1つの前記対数変換回路が配置される
上記(8)に記載の固体撮像素子。
(11)
前記画素領域において、前記直線読み出し方式の前記画素と前記対数読み出し方式の前記画素とが、前記画素の1列ごとに配置される
上記(1)から(10)までのいずれかに記載の固体撮像素子。
(12)
前記画素領域において、前記直線読み出し方式の前記画素と前記対数読み出し方式の前記画素とが、前記画素の1行ごとに配置される
上記(1)から(11)までのいずれかに記載の固体撮像素子。
(13)
前記画素領域において、前記直線読み出し方式の前記画素と前記対数読み出し方式の前記画素とが、前記画素の1列および1行ごとに互い違いに配置される
上記(1)から(12)までのいずれかに記載の固体撮像素子。
(14)
前記画素領域において、前記直線読み出し方式の前記画素と前記対数読み出し方式の前記画素とが、複数の前記画素からなる画素ユニットごとに配置される
上記(1)から(13)までのいずれかに記載の固体撮像素子。
(15)
画像を撮像する際の自動露出動作の時に、前記対数読み出し方式により画素信号を読み出し、画像を撮像する時に、前記直線読み出し方式により画素信号を読み出す
上記(1)から(14)までのいずれかに記載の固体撮像素子。
(16)
前記画素は、
入射した光を光電変換により電荷に変換して蓄積する光電変換部と、
第1の信号線と前記光電変換部とを接続し、前記画素が画素信号を出力するために選択された状態とする選択トランジスタと
を有して構成され、
前記画素を電流源として、前記第1の信号線を介して出力される画素信号をAD(Analog to Digital)変換するAD変換回路をさらに備え、
第2の信号線を介して、前記光電変換部が直接的に前記対数変換回路に接続される
上記(1)から(15)までのいずれかに記載の固体撮像素子。
(17)
前記対数変換回路は、前記画素領域に配置される前記画素の列ごとに、その列の前記画素の個数に応じた個数で配置される
上記(16)に記載の固体撮像素子。
(18)
前記画素領域において1列に配置される前記画素に接続される複数の前記対数変換回路が、前記画素で発生した電荷をリセットするスイッチを共通して用いる
上記(17)に記載の固体撮像素子。
(19)
前記画素は、
入射した光を光電変換により電荷に変換して蓄積する光電変換部と、
前記光電変換部に蓄積されている電荷を転送する転送トランジスタと、
前記転送トランジスタを介して転送されてくる電荷を蓄積する浮遊拡散領域と、
前記浮遊拡散領域に蓄積されている電荷に応じたレベルの画素信号を出力する増幅トランジスタと、
第1の信号線と前記増幅トランジスタとを接続し、前記画素が画素信号を出力するために選択された状態とする選択トランジスタと、
前記浮遊拡散領域を、第2の信号線を介して前記対数変換回路に接続するリセットトランジスタと、
を有して構成され、
前記増幅トランジスタとソースフォロワを構成する電流源と、
前記第1の信号線を介して前記画素から出力される画素信号をAD変換するAD変換回路と
上記(1)から(15)までのいずれかに記載の固体撮像素子。
(20)
前記第1の信号線および前記第2の信号線の間に配置される第1のスイッチと、
前記画素と、前記第1の信号線および前記第1のスイッチの接続点との間に配置される第2のスイッチと、
前記第1の信号線および前記AD変換回路の接続点と、前記電流源との間に配置される第3のスイッチと
をさらに備え、
前記対数読み出し方式により前記画素から画素信号を読み出すとき、前記第1のスイッチがオンとなり、前記第2のスイッチおよび前記第3のスイッチがオフとなる
上記(19)に記載の固体撮像素子。
(21)
前記画素が受光した光の光量に応じて画素信号が略直線的に変化する直線読み出し方式により前記画素から画素信号を読み出すとき、前記第1のスイッチがオフとなり、前記第2のスイッチおよび前記第3のスイッチがオンとなる
上記(20)に記載の固体撮像素子。
(22)
光電変換を行う複数の画素が配置される画素領域と、
前記画素が受光した光の光量に応じて画素信号が略対数的に変化する対数読み出し方式により、前記画素から画素信号を読み出す対数変換回路が、少なくとも配置される回路領域と
を備える固体撮像素子の駆動方法において、
前記画素から前記対数読み出し方式により画素信号を読み出す場合には、MOS(Metal-Oxide Semiconductor)トランジスタをタイオード接続した回路を介して前記画素に電源電圧を供給する
駆動方法。
(23)
光電変換を行う複数の画素が配置される画素領域と、
前記画素が受光した光の光量に応じて画素信号が略対数的に変化する対数読み出し方式により、前記画素から画素信号を読み出す対数変換回路が、少なくとも配置される回路領域と
を有する固体撮像素子を備える電子機器。
Claims (23)
- 光電変換を行う複数の画素が配置される画素領域と、
前記画素が受光した光の光量に応じて画素信号が略対数的に変化する対数読み出し方式により、前記画素から画素信号を読み出す対数変換回路が、少なくとも配置される回路領域と
を備える固体撮像素子。 - 前記対数変換回路は、前記画素から画素信号を読み出す際に、前記対数読み出し方式と、前記画素が受光した光の光量に応じて画素信号が略直線的に変化する直線読み出し方式とを切り替える
請求項1に記載の固体撮像素子。 - 前記対数変換回路は、前記画素の光電変換部で発生した電荷が転送される浮遊拡散領域に所定のトランジスタを介して接続される
請求項1に記載の固体撮像素子。 - 前記対数変換回路は、前記画素から前記直線読み出し方式により画素信号を読み出す場合には、スイッチを介して前記画素に電源電圧を供給し、前記画素から前記対数読み出し方式により画素信号を読み出す場合には、MOS(Metal-Oxide Semiconductor)トランジスタをタイオード接続した回路を介して前記画素に電源電圧を供給する
請求項1に記載の固体撮像素子。 - 前記対数変換回路は、前記画素領域に配置される前記画素の列ごとに、その列の前記画素の個数に応じた個数で配置される
請求項1に記載の固体撮像素子。 - 前記対数変換回路は、前記画素領域に配置される前記画素の列ごとに、1個ずつ配置される
請求項1に記載の固体撮像素子。 - 前記画素領域に配置される所定数の前記画素に対応して、1つの前記対数変換回路が配置される
請求項1に記載の固体撮像素子。 - 前記画素領域が形成される画素基板と、前記回路領域が形成される回路基板とが積層される積層構造により構成される
請求項1に記載の固体撮像素子。 - 前記画素基板に形成される1つの前記画素に対応して、前記回路基板に1つの前記対数変換回路が配置される
請求項8に記載の固体撮像素子。 - 前記画素基板に形成される複数の前記画素からなる画素ユニットに対応して、前記回路基板に1つの前記対数変換回路が配置される
請求項8に記載の固体撮像素子。 - 前記画素領域において、前記直線読み出し方式の前記画素と前記対数読み出し方式の前記画素とが、前記画素の1列ごとに配置される
請求項1に記載の固体撮像素子。 - 前記画素領域において、前記直線読み出し方式の前記画素と前記対数読み出し方式の前記画素とが、前記画素の1行ごとに配置される
請求項1に記載の固体撮像素子。 - 前記画素領域において、前記直線読み出し方式の前記画素と前記対数読み出し方式の前記画素とが、前記画素の1列および1行ごとに互い違いに配置される
請求項1に記載の固体撮像素子。 - 前記画素領域において、前記直線読み出し方式の前記画素と前記対数読み出し方式の前記画素とが、複数の前記画素からなる画素ユニットごとに配置される
請求項1に記載の固体撮像素子。 - 画像を撮像する際の自動露出動作の時に、前記対数読み出し方式により画素信号を読み出し、画像を撮像する時に、前記直線読み出し方式により画素信号を読み出す
請求項1に記載の固体撮像素子。 - 前記画素は、
入射した光を光電変換により電荷に変換して蓄積する光電変換部と、
第1の信号線と前記光電変換部とを接続し、前記画素が画素信号を出力するために選択された状態とする選択トランジスタと
を有して構成され、
前記画素を電流源として、前記第1の信号線を介して出力される画素信号をAD(Analog to Digital)変換するAD変換回路をさらに備え、
第2の信号線を介して、前記光電変換部が直接的に前記対数変換回路に接続される
請求項1に記載の固体撮像素子。 - 前記対数変換回路は、前記画素領域に配置される前記画素の列ごとに、その列の前記画素の個数に応じた個数で配置される
請求項16に記載の固体撮像素子。 - 前記画素領域において1列に配置される前記画素に接続される複数の前記対数変換回路が、前記画素で発生した電荷をリセットするスイッチを共通して用いる
請求項17に記載の固体撮像素子。 - 前記画素は、
入射した光を光電変換により電荷に変換して蓄積する光電変換部と、
前記光電変換部に蓄積されている電荷を転送する転送トランジスタと、
前記転送トランジスタを介して転送されてくる電荷を蓄積する浮遊拡散領域と、
前記浮遊拡散領域に蓄積されている電荷に応じたレベルの画素信号を出力する増幅トランジスタと、
第1の信号線と前記増幅トランジスタとを接続し、前記画素が画素信号を出力するために選択された状態とする選択トランジスタと、
前記浮遊拡散領域を、第2の信号線を介して前記対数変換回路に接続するリセットトランジスタと、
を有して構成され、
前記増幅トランジスタとソースフォロワを構成する電流源と、
前記第1の信号線を介して前記画素から出力される画素信号をAD変換するAD変換回路と
をさらに備える請求項1に記載の固体撮像素子。 - 前記第1の信号線および前記第2の信号線の間に配置される第1のスイッチと、
前記画素と、前記第1の信号線および前記第1のスイッチの接続点との間に配置される第2のスイッチと、
前記第1の信号線および前記AD変換回路の接続点と、前記電流源との間に配置される第3のスイッチと
をさらに備え、
前記対数読み出し方式により前記画素から画素信号を読み出すとき、前記第1のスイッチがオンとなり、前記第2のスイッチおよび前記第3のスイッチがオフとなる
請求項19に記載の固体撮像素子。 - 前記画素が受光した光の光量に応じて画素信号が略直線的に変化する直線読み出し方式により前記画素から画素信号を読み出すとき、前記第1のスイッチがオフとなり、前記第2のスイッチおよび前記第3のスイッチがオンとなる
請求項20に記載の固体撮像素子。 - 光電変換を行う複数の画素が配置される画素領域と、
前記画素が受光した光の光量に応じて画素信号が略対数的に変化する対数読み出し方式により、前記画素から画素信号を読み出す対数変換回路が、少なくとも配置される回路領域と
を備える固体撮像素子の駆動方法において、
前記画素から前記対数読み出し方式により画素信号を読み出す場合には、MOS(Metal-Oxide Semiconductor)トランジスタをタイオード接続した回路を介して前記画素に電源電圧を供給する
駆動方法。 - 光電変換を行う複数の画素が配置される画素領域と、
前記画素が受光した光の光量に応じて画素信号が略対数的に変化する対数読み出し方式により、前記画素から画素信号を読み出す対数変換回路が、少なくとも配置される回路領域と
を有する固体撮像素子を備える電子機器。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US16/080,153 US10811447B2 (en) | 2016-03-04 | 2017-02-20 | Solid-state imaging device, driving method, and electronic equipment |
KR1020187024028A KR102641558B1 (ko) | 2016-03-04 | 2017-02-20 | 고체 촬상 소자, 구동 방법, 및 전자 기기 |
CN201780013750.4A CN108702469B (zh) | 2016-03-04 | 2017-02-20 | 固体摄像器件、固体摄像器件驱动方法和电子设备 |
JP2018503039A JP6922889B2 (ja) | 2016-03-04 | 2017-02-20 | 固体撮像素子、駆動方法、および電子機器 |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016041697 | 2016-03-04 | ||
JP2016-041697 | 2016-03-04 | ||
JP2016160653 | 2016-08-18 | ||
JP2016-160653 | 2016-08-18 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2017150240A1 true WO2017150240A1 (ja) | 2017-09-08 |
Family
ID=59743999
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2017/006077 WO2017150240A1 (ja) | 2016-03-04 | 2017-02-20 | 固体撮像素子、駆動方法、および電子機器 |
Country Status (5)
Country | Link |
---|---|
US (1) | US10811447B2 (ja) |
JP (1) | JP6922889B2 (ja) |
KR (1) | KR102641558B1 (ja) |
CN (1) | CN108702469B (ja) |
WO (1) | WO2017150240A1 (ja) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110191296A (zh) * | 2018-02-23 | 2019-08-30 | 豪威科技股份有限公司 | 具有经划分位线的cmos图像传感器 |
WO2019239887A1 (ja) * | 2018-06-12 | 2019-12-19 | ソニーセミコンダクタソリューションズ株式会社 | 撮像素子、制御方法、および電子機器 |
WO2020110537A1 (ja) * | 2018-11-29 | 2020-06-04 | ソニーセミコンダクタソリューションズ株式会社 | 固体撮像素子、および、撮像装置 |
US11962926B2 (en) | 2020-08-14 | 2024-04-16 | Alpsentek Gmbh | Image sensor with configurable pixel circuit and method |
US12047702B2 (en) | 2020-06-26 | 2024-07-23 | Beijing Ruisizhixin Technology Co., Ltd. | Delta image sensor with digital pixel storage |
US12052524B2 (en) | 2020-06-26 | 2024-07-30 | Beijing Ruisizhixin Technology Co., Ltd | Delta image sensor with externally writeable digital pixel storage |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102163717B1 (ko) * | 2018-11-13 | 2020-10-08 | 실리콘 디스플레이 (주) | 센서 화소, 이를 포함하는 지문 및 이미지 센서 및 그 구동 방법 |
US10755070B2 (en) | 2017-12-12 | 2020-08-25 | Silicon Display Technology | Sensor pixel, fingerprint and image sensor including the same, and driving method thereof |
CN111372015B (zh) * | 2018-12-26 | 2021-06-18 | 比亚迪半导体股份有限公司 | 线性-对数响应像素电路和图像传感器 |
WO2021085694A1 (ko) * | 2019-11-01 | 2021-05-06 | 엘지전자 주식회사 | 이미지 센서, 및 이를 구비하는 카메라, 전자 기기 |
KR20220097967A (ko) * | 2019-11-29 | 2022-07-08 | 엘지전자 주식회사 | 방사선 디텍터 및 이를 이용한 방사선 촬영 방법 |
JP2023040318A (ja) * | 2020-02-26 | 2023-03-23 | ソニーセミコンダクタソリューションズ株式会社 | 撮像回路および撮像装置 |
US11356623B2 (en) * | 2020-06-01 | 2022-06-07 | City University Of Hong Kong | System and method for processing an image |
WO2021261069A1 (ja) * | 2020-06-26 | 2021-12-30 | ソニーセミコンダクタソリューションズ株式会社 | 固体撮像装置 |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2006064629A1 (ja) * | 2004-12-17 | 2006-06-22 | Konica Minolta Holdings, Inc. | 撮像装置及び撮像方法 |
WO2006129460A1 (ja) * | 2005-06-03 | 2006-12-07 | Konica Minolta Holdings, Inc. | 撮像装置 |
JP2006352804A (ja) * | 2005-06-20 | 2006-12-28 | Konica Minolta Holdings Inc | 撮像装置 |
JP2007189405A (ja) * | 2006-01-12 | 2007-07-26 | Konica Minolta Holdings Inc | 撮像装置及び撮像方法 |
JP2008028474A (ja) * | 2006-07-18 | 2008-02-07 | Konica Minolta Holdings Inc | 固体撮像装置 |
JP2010263647A (ja) * | 2004-05-28 | 2010-11-18 | Konica Minolta Holdings Inc | 撮像装置及び撮像方法 |
JP2012257193A (ja) * | 2011-05-13 | 2012-12-27 | Sony Corp | 画像処理装置、撮像装置、および画像処理方法、並びにプログラム |
WO2015111389A1 (en) * | 2014-01-21 | 2015-07-30 | Sony Corporation | Imaging device and electronic apparatus |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002170982A (ja) * | 2000-12-01 | 2002-06-14 | Honda Motor Co Ltd | 光センサ回路 |
KR100501622B1 (ko) * | 2001-07-03 | 2005-07-18 | 세이코 엡슨 가부시키가이샤 | 전기 광학 장치의 구동 방법, 구동 회로, 전기 광학 장치및 전자기기 |
JP2003347533A (ja) * | 2002-05-30 | 2003-12-05 | Honda Motor Co Ltd | イメージセンサ |
US7372495B2 (en) * | 2002-08-23 | 2008-05-13 | Micron Technology, Inc. | CMOS aps with stacked avalanche multiplication layer and low voltage readout electronics |
US7443427B2 (en) * | 2002-08-23 | 2008-10-28 | Micron Technology, Inc. | Wide dynamic range linear-and-log active pixel |
JP2005039447A (ja) * | 2003-07-18 | 2005-02-10 | Minolta Co Ltd | 撮像装置 |
JP3723563B2 (ja) * | 2004-04-07 | 2005-12-07 | 廣津 総吉 | 半導体撮像素子 |
US7605398B2 (en) * | 2005-08-26 | 2009-10-20 | National Chung Cheng University | Apparatus of high dynamic-range CMOS image sensor and method thereof |
JP2008263546A (ja) * | 2007-04-13 | 2008-10-30 | Konica Minolta Holdings Inc | 固体撮像装置、固体撮像装置の駆動方法、及びこれを用いた撮像システム |
JP2008306439A (ja) * | 2007-06-07 | 2008-12-18 | Konica Minolta Holdings Inc | 撮像素子および撮像装置 |
US7924333B2 (en) * | 2007-08-17 | 2011-04-12 | Aptina Imaging Corporation | Method and apparatus providing shared pixel straight gate architecture |
JP5915031B2 (ja) * | 2011-08-31 | 2016-05-11 | ソニー株式会社 | 撮像装置および撮像方法、並びに電子機器 |
CN102538988B (zh) * | 2012-02-08 | 2014-05-07 | 南京邮电大学 | 一种单光子雪崩二极管成像器件的淬灭与读出电路 |
CN103533259B (zh) * | 2013-09-29 | 2016-06-22 | 长春长光辰芯光电技术有限公司 | 线性-对数响应图像传感器像素及其信号转移控制方法 |
JP6676316B2 (ja) * | 2014-09-12 | 2020-04-08 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
CN105227870B (zh) * | 2015-09-21 | 2018-08-31 | 天津大学 | 大动态范围线性-对数响应cmos图像传感器 |
-
2017
- 2017-02-20 WO PCT/JP2017/006077 patent/WO2017150240A1/ja active Application Filing
- 2017-02-20 US US16/080,153 patent/US10811447B2/en active Active
- 2017-02-20 JP JP2018503039A patent/JP6922889B2/ja active Active
- 2017-02-20 KR KR1020187024028A patent/KR102641558B1/ko active IP Right Grant
- 2017-02-20 CN CN201780013750.4A patent/CN108702469B/zh active Active
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010263647A (ja) * | 2004-05-28 | 2010-11-18 | Konica Minolta Holdings Inc | 撮像装置及び撮像方法 |
WO2006064629A1 (ja) * | 2004-12-17 | 2006-06-22 | Konica Minolta Holdings, Inc. | 撮像装置及び撮像方法 |
WO2006129460A1 (ja) * | 2005-06-03 | 2006-12-07 | Konica Minolta Holdings, Inc. | 撮像装置 |
JP2006352804A (ja) * | 2005-06-20 | 2006-12-28 | Konica Minolta Holdings Inc | 撮像装置 |
JP2007189405A (ja) * | 2006-01-12 | 2007-07-26 | Konica Minolta Holdings Inc | 撮像装置及び撮像方法 |
JP2008028474A (ja) * | 2006-07-18 | 2008-02-07 | Konica Minolta Holdings Inc | 固体撮像装置 |
JP2012257193A (ja) * | 2011-05-13 | 2012-12-27 | Sony Corp | 画像処理装置、撮像装置、および画像処理方法、並びにプログラム |
WO2015111389A1 (en) * | 2014-01-21 | 2015-07-30 | Sony Corporation | Imaging device and electronic apparatus |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110191296A (zh) * | 2018-02-23 | 2019-08-30 | 豪威科技股份有限公司 | 具有经划分位线的cmos图像传感器 |
CN110191296B (zh) * | 2018-02-23 | 2021-05-25 | 豪威科技股份有限公司 | 具有经划分位线的cmos图像传感器 |
WO2019239887A1 (ja) * | 2018-06-12 | 2019-12-19 | ソニーセミコンダクタソリューションズ株式会社 | 撮像素子、制御方法、および電子機器 |
WO2020110537A1 (ja) * | 2018-11-29 | 2020-06-04 | ソニーセミコンダクタソリューションズ株式会社 | 固体撮像素子、および、撮像装置 |
US11582406B2 (en) | 2018-11-29 | 2023-02-14 | Sony Semiconductor Solutions Corporation | Solid-state image sensor and imaging device |
US12047702B2 (en) | 2020-06-26 | 2024-07-23 | Beijing Ruisizhixin Technology Co., Ltd. | Delta image sensor with digital pixel storage |
US12052524B2 (en) | 2020-06-26 | 2024-07-30 | Beijing Ruisizhixin Technology Co., Ltd | Delta image sensor with externally writeable digital pixel storage |
US11962926B2 (en) | 2020-08-14 | 2024-04-16 | Alpsentek Gmbh | Image sensor with configurable pixel circuit and method |
Also Published As
Publication number | Publication date |
---|---|
JP6922889B2 (ja) | 2021-08-18 |
US20190051680A1 (en) | 2019-02-14 |
KR20180116280A (ko) | 2018-10-24 |
US10811447B2 (en) | 2020-10-20 |
JPWO2017150240A1 (ja) | 2019-01-10 |
CN108702469B (zh) | 2021-09-17 |
KR102641558B1 (ko) | 2024-02-28 |
CN108702469A (zh) | 2018-10-23 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6922889B2 (ja) | 固体撮像素子、駆動方法、および電子機器 | |
US11375145B2 (en) | Solid-state imaging device, method for driving solid-state imaging device, and electronic apparatus | |
KR102547435B1 (ko) | 촬상 소자, 촬상 방법, 및 전자 기기 | |
US9888199B2 (en) | Solid-state imaging device, imaging device, and signal reading method | |
US11470276B2 (en) | Imaging element, driving method, and electronic device | |
WO2016158439A1 (ja) | 固体撮像素子、撮像装置、並びに電子機器 | |
US20130092820A1 (en) | Solid-state imaging device and imaging device | |
WO2016199588A1 (ja) | 撮像素子および駆動方法、並びに電子機器 | |
JP6873905B2 (ja) | 固体撮像装置および電子機器 | |
CN108293100B (zh) | 摄像元件、摄像方法和电子设备 | |
JP7005493B2 (ja) | 固体撮像素子および固体撮像素子の動作方法、撮像装置、並びに電子機器 | |
TWI831995B (zh) | 固體攝像元件及電子機器 | |
US10848700B2 (en) | Imaging device with switch circuit | |
US11743619B2 (en) | Solid-state imaging element and electronic device including a shared structure for pixels for sharing an AD converter | |
JP2016187072A (ja) | イメージセンサ、処理方法、及び、電子機器 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
WWE | Wipo information: entry into national phase |
Ref document number: 2018503039 Country of ref document: JP |
|
ENP | Entry into the national phase |
Ref document number: 20187024028 Country of ref document: KR Kind code of ref document: A |
|
NENP | Non-entry into the national phase |
Ref country code: DE |
|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 17759706 Country of ref document: EP Kind code of ref document: A1 |
|
122 | Ep: pct application non-entry in european phase |
Ref document number: 17759706 Country of ref document: EP Kind code of ref document: A1 |