WO2017141748A1 - Élément électroluminescent organique, dispositif d'éclairage, source de lumière surfacique et dispositif d'affichage - Google Patents

Élément électroluminescent organique, dispositif d'éclairage, source de lumière surfacique et dispositif d'affichage Download PDF

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WO2017141748A1
WO2017141748A1 PCT/JP2017/004176 JP2017004176W WO2017141748A1 WO 2017141748 A1 WO2017141748 A1 WO 2017141748A1 JP 2017004176 W JP2017004176 W JP 2017004176W WO 2017141748 A1 WO2017141748 A1 WO 2017141748A1
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layer
organic
light
uneven
light emitting
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English (en)
Japanese (ja)
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玲子 吉成
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凸版印刷株式会社
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/85—Arrangements for extracting light from the devices
    • H10K50/858—Arrangements for extracting light from the devices comprising refractive means, e.g. lenses
    • G—PHYSICS
    • G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F9/00—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
    • G09F9/30—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/02—Details
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/02—Details
    • H05B33/04—Sealing arrangements, e.g. against humidity
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/805—Electrodes

Definitions

  • the present invention relates to an organic EL element, an illumination device, a planar light source, and a display device.
  • organic EL element utilizing an organic electroluminescence (EL) phenomenon, which is an electroluminescence phenomenon of an organic material
  • EL organic electroluminescence
  • the organic EL element has advantages such as surface light emission, low-temperature operation, cost reduction, weight reduction, and flexible element fabrication.
  • An organic EL element generally includes an organic EL layer including a light emitting layer containing an organic light emitting material, and an anode and a cathode provided on both surfaces of the organic EL layer, respectively.
  • the organic EL element is composed of an anode made of a transparent conductive material such as ITO (Indium Tin Oxide), which is sequentially formed on a transparent substrate such as a glass substrate, an organic EL layer including a light emitting layer, and a metal.
  • ITO Indium Tin Oxide
  • a cathode is provided.
  • the organic EL element is a bottom emission type element in which light is extracted from the substrate side, or a top emission type element in which a cathode, an organic EL layer, and an anode are sequentially formed on the substrate, and light is extracted from the side opposite to the substrate side. There are elements.
  • the organic EL element has advantages such as low viewing angle dependency, low power consumption, and extremely thin devices, but also has a problem of low light extraction efficiency.
  • the light extraction efficiency is the ratio of the light energy emitted from the light extraction surface (for example, the substrate surface in the case of the bottom emission type) to the atmosphere with respect to the light energy emitted from the light emitting layer. For example, light emitted from the light-emitting layer is emitted in all directions, so that most of the light enters a waveguide mode in which total reflection is repeated at the interface between multiple layers with different refractive indexes. As a result, the light extraction efficiency decreases.
  • Patent Document 1 discloses a light collecting layer including a light collecting structure such as a microlens and a transparent resin that covers the light collecting structure.
  • Patent Document 1 a material having a higher refractive index than the light condensing structure is used as the transparent resin.
  • a condensing layer on a glass substrate, total reflection occurring on the surface of the glass substrate is suppressed, and the light extraction efficiency is improved.
  • Patent Document 2 discloses a method of providing a one-dimensional or two-dimensional periodic fine structure on the surface of a metal layer (cathode).
  • the periodic microstructure functions as a diffraction grating. Thereby, the energy lost as surface plasmons on the cathode surface is extracted as light, and the light extraction efficiency is improved.
  • JP 2003-86353 A Japanese Patent No. 4762542
  • An object of the present invention is to provide an organic EL element having both high light extraction efficiency and high light emission uniformity, as well as an illumination device, a planar light source, and a display device.
  • an organic EL element includes a light-transmitting substrate and a plurality of uneven portions that are light-transmitting and are formed on a surface opposite to the substrate.
  • a structure layer having at least two types of regions of a concavo-convex region made of and a flat region made of a flat portion, a first electrode layer having light transmittance, a functional layer including a light emitting layer, and a second electrode layer, They are stacked in this order.
  • a lighting device, a planar light source, and a display device include at least part of the above-described organic EL element.
  • an organic EL element having both high light extraction efficiency and high light emission uniformity, as well as a lighting device, a planar light source, and a display device can be realized.
  • the organic EL element 10 includes a structural layer 12, a barrier layer 13, a first electrode layer 14, a functional layer 15, and a second layer on one surface side of a light transmissive substrate 11.
  • the electrode layer 16 is laminated in this order.
  • the light transmissive substrate 11 is a substrate of the organic EL element 10 and has light transmittance.
  • the structural layer 12 is light transmissive and formed on the surface on the barrier layer 13 side in the stacking direction (refers to the surface opposite to the surface facing the light transmissive substrate 11 side, and so on). It has an uneven area and a planar area.
  • the barrier layer 13 is light transmissive and prevents moisture and the like from entering.
  • the first electrode layer 14 is light transmissive and serves as an anode.
  • the functional layer 15 includes a light emitting layer.
  • the second electrode layer 16 is a counter electrode of the first electrode layer 14.
  • the light transmittance here means the property (translucency) which is transparent.
  • the light transmission in this specification means having light transmission at least in the wavelength of visible light region.
  • the light transmissive substrate 11, the structural layer 12, the barrier layer 13, and the first electrode layer 14 constitute a light extraction substrate 20.
  • the light extraction substrate 20 has a concavo-convex region 21 and a planar region 22 formed by a plurality of concavo-convex portions 23 formed in the structural layer 12. That is, a plurality of uneven portions 23 are formed in the uneven region 21.
  • the planar area 22 is composed of a planar portion (flat surface).
  • the organic EL element 10 according to this embodiment is provided on the surface opposite to the surface on which the structural layer 12 of the light transmissive substrate 11 is formed (the back surface side of the light transmissive substrate 11).
  • the light extraction lens layer 30 is provided.
  • each part which comprises the organic EL element 10 is demonstrated in detail.
  • the light transmissive substrate 11 may be a plate-like member that transmits in the visible light region, and there is no particular limitation on the type of glass, plastic, or the like.
  • Preferred examples of the light transmissive substrate 11 include a glass plate, a polymer plate, and a resin film.
  • the glass plate include soda-lime glass, barium / strontium-containing glass, lead glass, aluminosilicate glass, borosilicate glass, barium borosilicate glass, and quartz.
  • polymer plate examples include polycarbonate, acrylic, polyethylene terephthalate, polyether sulfide, and polysulfone.
  • resin film examples include polyesters such as polyethylene terephthalate (PET) and polyethylene naphthalate (PEN), polyethylene, polypropylene, cellophane, cellulose diacetate, cellulose triacetate, cellulose acetate butyrate, cellulose acetate propionate (CAP), Cellulose esters such as cellulose acetate phthalate (TAC) and cellulose nitrate or derivatives thereof, polyvinylidene chloride, polyvinyl alcohol, polyethylene vinyl alcohol, syndiotactic polystyrene, polycarbonate, norbornene resin, polymethylpentene, polyether ketone, polyimide , Polyethersulfone (PES), polyphenylene sulfide, polysulfones, Li, polyether ketone imide, polyamide, fluorocarbon resin, nylon, polymethyl
  • the surface of the resin film may be formed with an inorganic film, an organic film, or a hybrid film of both, and the water vapor permeability (25 ⁇ 0.5 ° C.) measured by a method according to JIS K 7129-1992.
  • Relative humidity (90 ⁇ 2)% RH) is preferably 0.01 g / (m 2 ⁇ 24 h) or less, and further, oxygen measured by a method according to JIS K 7126-1987.
  • It is a high barrier film having a permeability of 1.0 ⁇ 10 ⁇ 3 cm 3 / (m 2 ⁇ 24 h ⁇ atm) or less and a water vapor permeability of 1.0 ⁇ 10 ⁇ 3 g / (m 2 ⁇ 24 h) or less.
  • the water vapor permeability is more preferably 1.0 ⁇ 10 ⁇ 5 g / (m 2 ⁇ 24 h) or less.
  • any material having a function of suppressing intrusion of moisture, oxygen, or the like that causes deterioration of the organic EL element 10 may be used.
  • silicon oxide, silicon dioxide, silicon nitride, or the like is used. Can do.
  • stacking order of an inorganic layer and an organic layer It is preferable to laminate
  • the method for forming the barrier film is not particularly limited.
  • a plasma CVD (Chemical Vapor Deposition) method, a laser CVD method, a thermal CVD method, a coating method, or the like can be used, but the atmospheric pressure plasma polymerization method described in JP-A-2004-68143 is used. Those are particularly preferred.
  • a light extraction lens layer 30 is appropriately provided as a light scattering or condensing layer on the surface of the light transmissive substrate 11 opposite to the surface on which the structural layer 12 is formed (the back surface side of the light transmissive substrate 11).
  • the light extraction lens layer 30 includes a light transmissive sheet 31 having light transmissive properties, and a lens layer 32 provided on the surface of the light transmissive sheet 31.
  • the lens layer 32 may be formed by forming the surface of the light transmissive sheet 31 in a microlens array-like structure, or may use a so-called condensing sheet. Thereby, the light extraction lens layer 30 can collect light in a specific direction, for example, in the front direction with respect to the light emitting surface of the element to increase the luminance in the specific direction.
  • Examples of the resin material constituting the light extraction lens layer 30 include low density or high density polyethylene, ethylene-propylene copolymer, ethylene-butene copolymer, ethylene-hexene copolymer, and ethylene-octene copolymer.
  • Polyolefin resins such as ethylene-norbornene copolymer, ethylene-domon copolymer, polypropylene, ethylene-vinyl acetate copolymer, ethylene-methyl methacrylate copolymer, ionomer resin; polyethylene terephthalate, polybutylene terephthalate, polyethylene Polyester resins such as phthalates; nylon-6, nylon-6,6, metaxylenediamine-adipic acid condensation polymers; amide resins such as polymethylmethacrylamide; acrylic resins such as polymethylmethacrylate; polystyrene Styrene-acrylonitrile resins such as styrene-acrylonitrile copolymer, styrene-acrylonitrile-butadiene copolymer, and polyacrylonitrile; Hydrophobized cellulose resins such as cellulose triacetate and cellulose diacetate; polyvinyl chloride, polyvinylidene chloride, polyfluoride Hal
  • the light extraction lens layer 30 may further improve the light scattering effect by adding fine particles to the resin material described above.
  • fine particles contained in the light extraction lens layer 30 inorganic fine particles or organic fine particles can be used.
  • the fine particles include acrylic particles, styrene particles, styrene acrylic particles and cross-linked products thereof, melamine-formalin condensate particles, polyurethane particles, polyester particles, silicone particles, fluorine particles, and copolymers thereof.
  • Clay compound particles such as smectite, kaolinite, talc, silica, titanium oxide, alumina, silica alumina, zirconia, zinc oxide, barium oxide, inorganic oxide particles such as strontium oxide, calcium carbonate, barium carbonate, barium chloride, sulfuric acid Examples thereof include inorganic fine particles such as barium, barium nitrate, barium hydroxide, aluminum hydroxide, strontium carbonate, strontium chloride, strontium sulfate, strontium nitrate, strontium hydroxide, and glass particles.
  • the structural layer 12 is light transmissive and is provided on the surface opposite to the light emitting surface of the light transmissive substrate 11 (the bonding surface of the light extraction lens layer 30 shown in FIG. 1).
  • the structure layer 12 has an uneven region in which a plurality of uneven portions 23 are formed and a planar region including a flat portion on the surface on the first electrode layer 14 side. That is, in the structural layer 12, a part of the surface of the structural layer 12 on the first electrode layer 14 side is at least one uneven region, and the remaining part is a planar region.
  • Each concavo-convex portion 23 is formed so as to have either a concave shape or a convex shape with respect to the plane portion.
  • each concavo-convex portion 23 is formed as a mountain shape (convex shape) or a valley shape (concave shape) with respect to the plane portion.
  • grooved part 23 is not limited to a mountain shape or a trough shape,
  • a cylindrical shape or a cone shape may be a hemisphere.
  • the shape in plan view is not limited to a circle. Further, it is not necessary that the shapes and dimensions of the uneven portions 23 are the same.
  • the shape of the first electrode layer 14 formed on the structural layer 12 becomes the shape of the surface of the structural layer 12.
  • the surface of the second electrode layer 16 on the functional layer 15 side follows the surface shape of the first electrode layer 14. Inverted uneven regions and planar regions in which the uneven portions are also inverted are formed. Plasmon absorption can be suppressed by the inversion uneven region formed on the surface of the second electrode layer 16 on the functional layer 15 side. Further, since a part of the emitted light is reflected by the planar region formed on the second electrode layer 16, the light extraction efficiency is improved.
  • the area ratio of the uneven area to the area of the planar area of the structural layer 12 is preferably in the range of 1/4 to 10/1.
  • the area ratio is smaller than 1 ⁇ 4, the plurality of uneven portions 23 in the uneven region is small, and the optical effect may not be reflected in the light extraction efficiency.
  • the area ratio is larger than 10/1, the planar area is small, the reflectivity of the second electrode is significantly lowered, and the light extraction efficiency may be reduced as a result.
  • the height H of the plurality of uneven portions 23 in the uneven region of the structural layer 12 is preferably 50 nm or more and 800 nm or less.
  • the height H of the plurality of concavo-convex portions 23 is an absolute value of a change in the layer thickness direction with respect to the plane portion. For example, when the concavo-convex portion 23 is formed in a concave shape, it is the distance in the total thickness direction from the flat portion to the concave bottom portion of the concave shape in a side view.
  • the ratio (H / D) of the height H to the width D of the plurality of uneven portions 23 in the uneven region is preferably in the range of 1/5 to 8/5. This is because it is easy to configure each layer on the structural layer 12.
  • the “ratio of the height H to the width D of the concavo-convex portion 23” The ratio of the height H to the width D of the recesses constituting
  • the “ratio of the height H to the width D of the concavo-convex portion 23” The ratio of the height H with respect to the width D of the concavo-convex portion 23”
  • the ratio of the height H with respect to the width D of the convex part to comprise is said.
  • the concave / convex portion 23 has a shape in which the inclined surface is raised or a fine surface to surface
  • the shape of the boundary becomes clear, or the period of the unevenness is fine, and the top part and the groove part are shaped like dots. Therefore, in particular, when a sputtering method or a vapor deposition method is selected as a method for forming at least one of the first electrode layer 14, the functional layer 15, and the second electrode layer 16 on the structural layer 12, the same as the peripheral portion thereof. It is difficult to form a uniform film.
  • region 21 is larger than the width
  • the uneven width can be maintained at about the emission wavelength, and the light emitted from the functional layer 15 travels to the second electrode layer 16 side.
  • the effect of re-radiation by the conversion of the surface plasmon in the second electrode layer 16 can be obtained. That is, if it is smaller than 300 nm, light is confined because it is smaller than the emission wavelength, and if it is larger than 2 ⁇ m, propagation of surface plasmon occurs, and it attenuates without re-emission.
  • a resin is preferable.
  • the resin include low density or high density polyethylene, ethylene-propylene copolymer, ethylene-butene copolymer, ethylene-hexene copolymer, ethylene-octene copolymer, ethylene-norbornene copolymer, ethylene -Polyolefin resins such as domon copolymer, polypropylene, ethylene-vinyl acetate copolymer, ethylene-methyl methacrylate copolymer, ionomer resin; polyester resins such as polyethylene terephthalate, polybutylene terephthalate, polyethylene naphthalate; nylon- 6, Nylon-6,6, Metaxylenediamine-Adipic acid condensation polymer; Amide resin such as polymethylmethacrylamide; Acrylic resin such as polymethylmethacrylate; Polystyrene, Styrene-acrylonitrile copolymer Styrene-acrylonitrile
  • fine particles may be added to adjust the refractive index and have a light scattering effect, and particles composed of inorganic fine particles or organic fine particles can be used.
  • the barrier layer 13 is a layer having a function of suppressing intrusion of moisture, oxygen, or the like that causes deterioration of the organic EL element 10, and a surface on the side opposite to the surface on the light transmissive substrate 11 side of the structural layer 12 as necessary. And at least one of them.
  • FIG. 1 illustrates the case where the barrier layer 13 is provided only on the surface of the structural layer 12 opposite to the surface on the light transmissive substrate 11 side.
  • the barrier layer 13 is not essential, but is preferably provided. By providing the barrier layer 13, the adhesion between the structural layer 12 and the first electrode layer 14 is improved.
  • the barrier layer 13 is present between the structural layer 12 and the first electrode layer 14, so that the first electrode layer 14 is not affected by the outgas from the structural layer 12 when the first electrode layer 14 is formed. This is because the film quality of the first electrode layer 14 is improved. By improving the film quality of the first electrode layer 14, initial defects (for example, dark spots) of the organic EL element 10 can be reduced. For this reason, by providing the barrier layer 13, the temporal stability of the organic EL element 10 can be improved.
  • the barrier layer 13 for example, silicon oxide, silicon dioxide, silicon nitride or the like is used.
  • the method for forming the barrier layer 13 is not particularly limited.
  • a polymerization method, a plasma CVD method, a laser CVD method, a thermal CVD method, a coating method, or the like can be used, but it is preferable that a film can be continuously formed by a formation method combined with a transparent electrode to be laminated next.
  • the thickness of the barrier layer 13 is, for example, 2 nm or more and 50 nm or less, preferably 2 nm or more and 20 nm or less. By providing the barrier layer 13, the effect of preventing intrusion of moisture and the like can be obtained.
  • the barrier layer 13 is preferably a relatively thick film. Optically, when the refractive index of the barrier layer 13 is lower than the refractive index of the structural layer 12, a thin film is preferable in order to suppress reduction by total reflection light. However, if it is thinner than 2 nm, it cannot be formed uniformly on the surface of the structural layer 12, which is not preferable.
  • first electrode layer 14 and the second electrode layer 16 will be described.
  • description will be made assuming that the first electrode layer 14 is an anode and the second electrode layer 16 is a cathode. However, actually, it is not limited to these examples.
  • First electrode layer anode
  • a metal, an alloy, a metal oxide, a conductive compound, or a mixture thereof is mentioned suitably, for example.
  • conductive oxide such as antimony or fluorine doped (added) tin oxide (ATO, FTO), tin oxide, zinc oxide, indium oxide, indium tin oxide (ITO), indium zinc oxide (IZO), etc.
  • Metal such as conductive metal oxide, gold, silver, chromium and nickel, and a mixture or laminate of these metals and conductive metal oxide, inorganic conductive materials such as copper iodide and copper sulfide, polyaniline, polythiophene, Examples thereof include organic conductive materials such as polypyrrole, and laminates of these with ITO.
  • a conductive metal oxide is preferable as the material of the anode, and ITO is particularly preferable from the viewpoint of productivity, high conductivity, transparency, and the like.
  • the anode may be, for example, (1) a wet method such as a printing method or a coating method, (2) a physical method such as a vacuum deposition method, a sputtering method, or an ion plating method, or (3) a chemical method such as CVD or plasma CVD method. It can be formed on the substrate in accordance with a method appropriately selected from known methods such as a method in consideration of suitability with the material constituting the anode. For example, when ITO is selected as the anode material, the anode can be formed according to a direct current or high frequency sputtering method, a vacuum deposition method, an ion plating method, or the like.
  • the patterning for forming the anode may be performed by chemical etching using photolithography or the like, or may be performed by physical etching using a laser or the like. Further, it may be performed by vacuum deposition, sputtering or the like with overlapping masks, or by a lift-off method or a printing method.
  • the transmittance be greater than 10%, and the sheet resistance as the anode is preferably several hundred ⁇ / ⁇ or less.
  • the film thickness depends on the material, it is usually in the range of 10 nm to 1000 nm, preferably in the range of 10 nm to 200 nm.
  • cathode As a material of the cathode which is the second electrode layer 16, for example, a metal having a small work function (4 eV or less) (referred to as an electron injecting metal), an alloy electroconductive compound, and a mixture thereof are preferably exemplified.
  • cathode materials include sodium, sodium-potassium alloy, magnesium, lithium, magnesium / copper mixture, magnesium / silver mixture, magnesium / aluminum mixture, magnesium / indium mixture, aluminum / aluminum oxide (Al 2 O 3 ) mixture, Indium, lithium / aluminum mixtures, rare earth metals and the like can be mentioned.
  • a cathode material a mixture of an electron injectable metal and a second metal which is a stable metal having a larger work function value than this, for example, magnesium / silver Preference is given to mixtures, magnesium / aluminum mixtures, magnesium / indium mixtures, aluminum / aluminum oxide (Al 2 O 3 ) mixtures, lithium / aluminum mixtures, aluminum and the like.
  • the cathode can be produced by forming a thin film made of a cathode material by a known method such as vapor deposition or sputtering.
  • the sheet resistance as the cathode is preferably several hundred ⁇ / ⁇ or less, and the film thickness is usually in the range of 10 nm to 5 ⁇ m, preferably 50 nm to 200 nm.
  • the functional layer 15 is a layer including a light emitting layer, and is a layer provided between the first electrode layer 14 and the second electrode layer 16.
  • the first electrode layer 14, the functional layer 15, and the second electrode layer 16 can have various laminated structures.
  • the laminated structure of the 1st electrode layer 14, the functional layer 15, and the 2nd electrode layer 16 is demonstrated concretely.
  • the following layer configurations a) to p) are shown.
  • the first electrode layer 14 is an anode
  • the second electrode layer 16 is a cathode. That is, all layers between the anode and the cathode are the functional layer 15.
  • the symbol “/” indicates that the layers sandwiching the symbol “/” are stacked adjacent to each other.
  • the configuration of the functional layer 15 and the laminated structure of the first electrode layer 14, the functional layer 15, and the second electrode layer 16 are not limited to the following layer configurations a) to p).
  • Anode / light emitting layer / cathode b) Anode / hole injection layer / light emitting layer / cathode c) Anode / hole injection layer / light emitting layer / electron injection layer / cathode d) Anode / hole injection layer / light emitting layer / Electron transport layer / cathode e) Anode / hole injection layer / emission layer / electron transport layer / electron injection layer / cathode f) Anode / hole transport layer / emission layer / cathode g) Anode / hole transport layer / emission layer / Electron injection layer / cathode h) anode / hole transport layer / light emitting layer / electron transport layer / cathode i) anode / hole transport layer / light emitting layer / electron transport layer / electron injection layer / cathode j) anode / hole Injection layer / hole transport layer
  • the light emitting layer is a layer that emits light by recombination of electrons and holes (holes) moving from the electrode, injection layer, or transport layer, and the light emitting portion may be in the layer of the light emitting layer. It may be the interface between the light emitting layer and the adjacent layer.
  • the total thickness of the light emitting layers is not particularly limited, but is preferably 2 nm or more and 5 ⁇ m or less, more preferably 2 nm or more and 200 nm or less, and particularly preferably 10 nm or more and 20 nm or less. This is because the uniformity of the film and the application of an unnecessary high voltage during light emission are prevented, and the stability of the emission color with respect to the drive current is improved.
  • the light emitting layer is at least one of a blue light emitting layer, a green light emitting layer, and a red light emitting layer.
  • the blue light emitting layer has a light emission maximum wavelength in the range of 430 nm to 480 nm
  • the green light emitting layer has a light emission maximum wavelength in the range of 510 nm to 550 nm
  • the red light emitting layer has a light emission maximum wavelength in the range of 600 nm to 640 nm. It is preferable that it is a monochromatic light emitting layer.
  • the light emitting layer may be a layer formed by laminating these light emitting layers of at least three colors (blue light emitting layer, green light emitting layer, red light emitting layer) to form a white light emitting layer. Further, when a plurality of light emitting layers are stacked, a non-light emitting intermediate layer may be provided between the light emitting layers.
  • the light emitting layer of the organic EL element 10 according to this embodiment is preferably a white light emitting layer. That is, this embodiment is particularly effective when the light emitting layer of the organic EL element 10 is a white light emitting layer. Moreover, it is preferable that the illuminating device, planar light source, and display apparatus which concern on this embodiment contain a white light emitting layer. Therefore, it is preferable that the lighting device, the planar light source, and the display device according to the present embodiment have at least a part of the organic EL element 10 whose light emitting layer is a white light emitting layer.
  • the light emitting layer contains a light emitting host compound and a light emitting dopant compound such as a phosphorescent dopant or a fluorescent dopant.
  • Examples of the luminescent host compound include those having a basic skeleton such as a carbazole derivative, a triarylamine derivative, an aromatic derivative, a nitrogen-containing heterocyclic compound, a thiophene derivative, a furan derivative, an oligoarylene compound, or a carboline derivative or diaza. And carbazole derivatives.
  • fluorescent dopant compounds include coumarin dyes, pyran dyes, cyanine dyes, croconium dyes, squalium dyes, oxobenzanthracene dyes, fluorescein dyes, rhodamine dyes, pyrylium dyes, perylene dyes, Examples thereof include stilbene dyes, polythiophene dyes, and rare earth complex phosphors.
  • the injection layer is a layer provided between the electrode and the organic layer as necessary for lowering the driving voltage and improving the light emission luminance.
  • the injection layer includes a hole injection layer (anode buffer layer) and an electron injection layer (cathode buffer layer).
  • the hole injection layer is provided between the anode and the light emitting layer (for example, the above-described layer configurations b), c), d), e)), or the anode and the hole transport layer. (For example, between the layer configurations j), k), l), and m)) described above.
  • the electron injection layer is provided between the cathode and the light emitting layer (for example, layer configurations (c), g), k), n)), or between the cathode and the electron transport layer (for example, a layer). Provided in configurations e), i), m), and p)).
  • a phthalocyanine buffer layer typified by copper phthalocyanine
  • an oxide buffer layer typified by vanadium oxide, an amorphous carbon buffer layer, or a conductive polymer such as polyaniline (emeraldine) or polythiophene
  • the electron injection layer include a metal buffer layer typified by strontium and aluminum, an alkali metal compound buffer layer typified by lithium fluoride, an alkaline earth metal compound buffer layer typified by magnesium fluoride, and aluminum oxide.
  • An oxide buffer layer represented by The hole injection layer and the electron injection layer are desirably very thin films, and the film thickness is preferably in the range of 0.1 nm to 5 ⁇ m, although depending on the material.
  • the blocking layer is a layer provided as necessary in addition to the basic constituent layer of the organic compound thin film.
  • the blocking layer includes a hole blocking layer and an electron blocking layer.
  • the hole blocking layer has a function of an electron transport layer in a broad sense.
  • the hole blocking layer is made of a hole blocking material that has a function of transporting electrons but has a very small ability to transport holes, and recombines electrons and holes by blocking holes while transporting electrons. Probability can be improved.
  • the structure of the electron carrying layer mentioned later can be used as a hole-blocking layer as needed.
  • the film thicknesses of the hole blocking layer and the electron transport layer are preferably 3 nm or more and 100 nm or less, and more preferably 5 nm or more and 30 nm or less.
  • the hole blocking layer preferably contains the carbazole derivative, carboline derivative or diazacarbazole derivative mentioned as the host compound.
  • the electron blocking layer has a function of a hole transport layer in a broad sense.
  • the electron blocking layer is made of a material that has a function of transporting holes but has a very small ability to transport electrons, and improves the probability of recombination of electrons and holes by blocking electrons while transporting holes. be able to.
  • the structure of the positive hole transport layer mentioned later can be used as an electron blocking layer as needed.
  • the transport layer is a layer provided as necessary for transporting holes or electrons.
  • the transport layer includes a hole transport layer and an electron transport layer.
  • the hole transport layer is made of a hole transport material having a function of transporting holes.
  • the hole injection layer and the electron blocking layer described above are included in the hole transport layer in a broad sense.
  • the hole transport layer can be provided as a single layer or a plurality of layers.
  • the hole transport material has any one of hole injection or transport and electron barrier properties, and may be either organic or inorganic.
  • hole transport materials include triazole derivatives, oxadiazole derivatives, imidazole derivatives, polyarylalkane derivatives, pyrazoline derivatives and pyrazolone derivatives, phenylenediamine derivatives, arylamine derivatives, amino-substituted chalcone derivatives, oxazole derivatives, styrylanthracene derivatives.
  • the hole transport layer contains one or more of the above-described hole transport materials.
  • the hole transport layer is formed by thinning the above-described hole transport material by a known method such as a vacuum deposition method, a spin coating method, a casting method, a printing method including an ink jet method, or an LB method.
  • a vacuum deposition method such as a vacuum deposition method, a spin coating method, a casting method, a printing method including an ink jet method, or an LB method.
  • limiting in particular about the film thickness of a positive hole transport layer Usually, 5 nm or more and about 5 micrometers or less, Preferably they are 5 nm or more and 200 nm or less.
  • the electron transport layer is made of an electron transport material having a function of transporting electrons.
  • the electron injection layer and hole blocking layer described above are included in the electron transport layer in a broad sense.
  • the electron transport layer can be provided as a single layer or a plurality of layers.
  • the electron transport layer is provided adjacent to the cathode side of the light emitting layer.
  • Any electron transport material (also serving as a hole blocking material) used for the electron transport layer may have a function of transmitting electrons injected from the cathode to the light emitting layer. For example, any one of conventionally known compounds can be selected and used.
  • the electron transport material examples include nitro-substituted fluorene derivatives, diphenylquinone derivatives, thiopyrandioxide derivatives, carbodiimides, fluorenylidenemethane derivatives, anthraquinodimethane and anthrone derivatives, oxadiazole derivatives, and the like.
  • a thiadiazole derivative in which the oxygen atom of the oxadiazole ring is substituted with a sulfur atom, or a quinoxaline derivative having a quinoxaline ring known as an electron-withdrawing group can also be used as an electron transport material.
  • a polymer material in which these materials are introduced into a polymer chain or these materials are used as a polymer main chain can also be used.
  • a metal complex of an 8-quinolinol derivative such as tris (8-quinolinol) aluminum (Alq), tris (5,7-dichloro-8-quinolinol) aluminum, tris (5,7-dibromo- 8-quinolinol) aluminum, tris (2-methyl-8-quinolinol) aluminum, tris (5-methyl-8-quinolinol) aluminum, bis (8-quinolinol) zinc (Znq), etc.
  • a metal complex in which In, Mg, Cu, Ca, Sn, Ga, or Pb is replaced can also be used as an electron transporting material.
  • metal-free or metal phthalocyanine, or a material whose terminal is substituted with an alkyl group or a sulfonic acid group can be preferably used.
  • the distyrylpyrazine derivatives exemplified as the material for the light emitting layer can also be used as the electron transporting material.
  • inorganic semiconductors such as n-type-Si and n-type-SiC can also be used as the electron transport material.
  • the electron transport layer contains one or more materials among the electron transport materials described above. Further, an electron transport layer having a high n property doped with impurities can also be used.
  • the electron transport layer is formed by thinning the above-described electron transport material by a known method such as a vacuum deposition method, a spin coating method, a casting method, a printing method including an ink jet method, or an LB method.
  • a vacuum deposition method such as a vacuum deposition method, a spin coating method, a casting method, a printing method including an ink jet method, or an LB method.
  • a vacuum deposition method such as a vacuum deposition method, a spin coating method, a casting method, a printing method including an ink jet method, or an LB method.
  • the display area of the organic EL element 10 is covered and sealed with a sealing member.
  • the sealing means include a method of bonding the sealing member, the electrode, and the support substrate with an adhesive.
  • the sealing member should just be arrange
  • the sealing member include a glass plate, a polymer plate / film, and a metal plate / film.
  • Examples of the glass plate include soda-lime glass, barium / strontium-containing glass, lead glass, aluminosilicate glass, borosilicate glass, barium borosilicate glass, and quartz.
  • Examples of the polymer plate include polycarbonate, acrylic, polyethylene terephthalate, polyether sulfide, and polysulfone.
  • Examples of the metal plate include those made of one or more metals or alloys selected from the group consisting of stainless steel, iron, copper, aluminum, magnesium, nickel, zinc, chromium, titanium, molybdenum, silicon, germanium, and tantalum.
  • Examples of the adhesive used for sealing include photo-curing and thermosetting adhesives having reactive vinyl groups of acrylic acid oligomers and methacrylic acid oligomers, and moisture-curing types such as 2-cyanoacrylates. Mention may be made of adhesives. Moreover, heat
  • coating of the adhesive agent to a sealing part may use commercially available dispenser, and may print like screen printing.
  • an inert gas such as nitrogen or argon, or an inert liquid such as fluorinated hydrocarbon or silicon oil is injected in the gas phase and the liquid phase.
  • an inert gas such as nitrogen or argon, or an inert liquid such as fluorinated hydrocarbon or silicon oil is injected in the gas phase and the liquid phase.
  • the gap between the sealing member and the display area of the organic EL element 10 can be evacuated.
  • a hygroscopic compound can also be enclosed inside the sealing member. Examples of the hygroscopic compound include metal oxides (for example, sodium oxide, potassium oxide, calcium oxide, barium oxide, magnesium oxide, aluminum oxide) and sulfates (for example, sodium sulfate, calcium sulfate, magnesium sulfate, cobalt sulfate).
  • metal halides eg calcium chloride, magnesium chloride, cesium fluoride, tantalum fluoride, cerium bromide, magnesium bromide, barium iodide, magnesium iodide etc.
  • perchloric acids eg perchloric acid Barium, magnesium perchlorate, etc.
  • sulfates, metal halides, and perchloric acids are preferably anhydrous salts.
  • the organic EL element 10 can be used as a display device, a display, or various light sources.
  • lighting devices home lighting, interior lighting
  • clock and liquid crystal backlights billboard advertisements, traffic lights, light sources of optical storage media, light sources of electrophotographic copying machines, light sources of optical communication processors, light Examples include a light source of a sensor.
  • An example of the light source is a planar light source.
  • the use of the organic EL element 10 is not limited to this, it can be effectively used especially as a backlight of a liquid crystal display device and a light source for illumination.
  • the configuration example of the illumination device includes a light transmissive substrate 11, a structural layer 12, a first electrode (anode) 14, a functional layer 15, and a second electrode (cathode) 16 from the light emission side.
  • a hygroscopic member 1202, and a sealing member 1204. 3 is an external connection terminal.
  • the configuration from the light transmissive substrate 11 to the second electrode (cathode) 16 corresponds to the organic EL element 10 described above.
  • the planar light source of this embodiment can also be set as the structure similar to an illuminating device.
  • manufacture of the illuminating device and planar light source of this embodiment can be implemented by adding a well-known process to the manufacturing method of the above-mentioned organic EL element.
  • the anode part of the lighting device or the planar light source may include a driving part such as a silicon driving substrate.
  • the display device has a light transmissive substrate 11, a color filter layer (for example, RGB color filter layer) 102, a structural layer 12, a first electrode (anode) 14 and a function from the display side of the device.
  • a layer 15 and a second electrode (cathode) 16 are included.
  • portions other than the color filter layer 102 correspond to the above-described organic EL element.
  • the display device according to this embodiment can be manufactured by adding a known process to the above-described method for manufacturing an organic EL element.
  • the color filter layer 102 can be formed using any conventionally known method such as a spin coating method or a vapor deposition method.
  • each uneven portion 23 in the uneven region of the structural layer 12 is selected to have a concave shape or a convex shape in each condition, and according to the height H, it becomes a circular peak or valley in plan view.
  • the width D (corresponding to the diameter of the circle) was formed.
  • the uneven portions 23 are randomly arranged, and the average distance L between the uneven portions 23 is determined by measuring images of the uneven portions 23 at 10 positions of the uneven regions using a scanning probe microscope. The value which can be calculated by measuring the interval of any adjacent convex shape or concave shape of 10 or more points and obtaining the average was adopted.
  • Example 1 (Production of light extraction substrate) First, a light extraction substrate in which the light transmissive substrate 11, the structure layer 12, and the light transmissive first electrode layer 14 are laminated in this order is manufactured. As the light-transmitting substrate 11, a washed alkali-free glass plate having a thickness of 0.7 mm and a size of 30 mm ⁇ 40 mm was used.
  • a UV (ultraviolet) curable acrylic resin is formed as a first layer with a film thickness of 2 ⁇ m by a spin coater and heated on a hot plate at 90 ° C. for 2 minutes to form a resin layer. Formed. Subsequently, after laminating the surface of the resin layer coated and formed on the light-transmitting substrate 11 so as to press a film plate having a planar region and a fine concavo-convex pattern region (concavo-convex region), it is 150 mJ / cm 2 with a UV lamp.
  • an ITO layer which is a transparent electrode, is formed on the surface of the structural layer 12 as a light transmissive first electrode layer 14 (anode) by a sputtering method so as to have a thickness of 150 nm, and then patterned. went.
  • a hole transport layer On the surface of the first electrode layer 14, a hole transport layer, a light-emitting layer, and an electron transport layer were laminated as an organic layer of the functional layer 15 by an evaporation method.
  • the hole transport layer was formed with a thickness of 35 nm using 4,4 ′, 4 ′′ -tris (9-carbazole) triphenylamine.
  • the light-emitting layer includes a layer having a thickness of 15 nm using 4,4 ′, 4 ′′ -tris (9-carbazole) triphenylamine doped with a tris (2-phenylpyridinato) iridium (III) complex, and tris ( It was formed with a 15 nm thick layer using 1,3,5-tris (N-phenylbenzimidazol-2-yl) benzene doped with 2-phenylpyridinato) iridium (III) complex.
  • the electron transport layer was formed with a thickness of 65 nm using 1,3,5-tris (N-phenylbenzimidazol-2-yl) benzene. Furthermore, a lithium fluoride layer (thickness: 1.5 nm) was deposited as an electron injection layer on the surface of the organic layer. Thereby, the functional layer 15 including the light emitting layer was formed. Finally, a metal electrode (aluminum, thickness: 50 nm) was formed on the surface of the functional layer 15 by a vapor deposition method.
  • a prism lens sheet in which a lens surface (lens layer 32) having a hemispherical microlens having a diameter of 5 ⁇ m and a cross prism structure having a vertical angle of 89 degrees with a pitch of 5 ⁇ m is formed on the surface of the PET film (light-transmitting sheet 31).
  • a prism lens sheet was bonded to the light-transmitting substrate 11 through an adhesive to form a light extraction lens layer 30.
  • the prism lens sheet is bonded to the rear surface of the surface of the light transmissive substrate 11 where the structural layer 12 is formed so that the rear surface of the lens surface faces the light transmissive substrate 11, and the lens surface becomes the front surface. I did it. Thereby, as shown in FIG.
  • the structural layer 12, the first electrode layer 14, the functional layer 15, and the second electrode layer 16 are laminated in this order on the surface (one surface) of the light transmissive substrate 11.
  • the organic EL element 10 in which the light extraction lens layer 30 was formed on the other surface was obtained.
  • Example 2 On the surface of the structural layer 12, an uneven region having a convex circular mountain having a height of H100 nm and a width of D100 nm and having an average distance L of 400 nm is represented by a ratio of the total area of the uneven region to the total area / The total area ratio of the planar regions was 20% / 80%.
  • the shape of the surface of the structural layer 12 was confirmed with a scanning probe microscope. Except this, it carried out similarly to Example 1, and created the organic EL element 10.
  • Example 3 On the surface of the structural layer 12, an uneven region having a convex circular mountain having a height of H100 nm and a width of D100 nm and having an average distance L of 400 nm is represented by a ratio of the total area of the uneven region to the total area / The total area ratio of the planar regions was 91% / 9%.
  • the shape of the surface of the structural layer 12 was confirmed with a scanning probe microscope. Except this, it carried out similarly to Example 1, and created the organic EL element 10.
  • a concave / convex area having a pattern of concave circular peaks with a height of H50 nm and a width of D250 nm and an average distance L between the peaks of 300 nm is a ratio of the total area of the concave / convex areas / plane.
  • the total area ratio was 50% / 50%.
  • the shape of the surface of the structural layer 12 was confirmed with a scanning probe microscope. Except this, it carried out similarly to Example 1, and created the organic EL element 10.
  • Example 5 On the surface of the structural layer 12, a concave / convex region having a pattern of concave circular ridges having a height of H100 nm and a width of D250 nm and having an average distance L between the ridges of 400 nm, a ratio of the total area of the concavo-convex regions to the total area / plane The total area ratio was 50% / 50%.
  • the shape of the surface of the structural layer 12 was confirmed with a scanning probe microscope. Except this, it carried out similarly to Example 1, and created the organic EL element 10.
  • FIG. 1 The shape of the surface of the structural layer 12 was confirmed with a scanning probe microscope. Except this, it carried out similarly to Example 1, and created the organic EL element 10.
  • a concave / convex area having a height of H250 nm and a width of D400 nm and having a pattern in which the average distance L between the peaks is 600 nm is a ratio of the total area of the concave / convex area / plane.
  • the total area ratio was 50% / 50%.
  • the shape of the surface of the structural layer 12 was confirmed with a scanning probe microscope. Except this, it carried out similarly to Example 1, and created the organic EL element 10.
  • Example 7 On the surface of the structural layer 12, an uneven region having a convex circular mountain having a height of H500 nm and a width of D500 nm and having an average distance L between the peaks of 1000 nm is defined as a ratio of the total area of the uneven region to the total area / The total area ratio of the planar regions was 50% / 50%.
  • the shape of the surface of the structural layer 12 was confirmed with a scanning probe microscope. Except this, it carried out similarly to Example 1, and created the organic EL element 10.
  • the shape of the surface of the structural layer 12 was confirmed with a scanning probe microscope. Except this, it carried out similarly to Example 1, and created the organic EL element 10.
  • a UV curable acrylic resin was formed as a first layer with a film thickness of 2 ⁇ m by a spin coater, and heated on a hot plate at 90 ° C. for 2 minutes to form a resin layer. Thereafter, the light-transmitting substrate 11 on which the resin layer was formed was placed in an N 2 purged box and irradiated with a UV lamp at 150 mJ / cm 2 to form a structural layer 12 with high smoothness. Except this, it carried out similarly to Example 1, and created the organic EL element 10.
  • FIG. 1 a UV curable acrylic resin
  • a current density of 20 mA / cm 2 from a direct current (DC) power source was applied to each of the organic EL elements 10 of Examples 1 to 8 and Comparative Examples 1 to 5.
  • the constant radiant current was applied, the total emitted radiant flux was measured with an integrating sphere, and the light extraction efficiency was determined based on the measurement result.
  • the current is increased by increasing the voltage when the above-described constant current is applied to each of the organic EL elements 10 of Examples 1 to 8 and Comparative Examples 1 to 5.
  • the case where the value increased was evaluated as “no short” (good), and the case where the current value did not increase even when the voltage was raised was evaluated as “short” (defective).
  • the light extraction efficiency ratio indicates the light extraction efficiency of the organic EL element 10 including the light transmissive substrate 11 in which the first structural layer 12 of Comparative Example 1 has no uneven region and the planar region is 100%.
  • the standard was 1.00.
  • the light extraction efficiencies of Examples 1 to 8 and Comparative Examples 2 to 5 are expressed as relative values to the light extraction efficiency of the organic EL element 10 of Comparative Example 1.
  • the light extraction effect is 1.50 or more.
  • the organic EL elements 10 of Examples 1 to 8 it was confirmed that the light extraction efficiency showed a high value from 1.52 to 1.78. Thus, it was found that the light extraction efficiency was improved in the organic EL elements 10 of Examples 1 to 4 as compared with the organic EL element 10 of Comparative Example 1.
  • the concavo-convex shape formed on the surface of the second electrode layer 16 on the functional layer 15 side by forming the convex portion or the concave portion in the structural layer 12 has a good balance between suppression of plasmon absorption and reflection of light emission.
  • the extraction efficiency is estimated to have improved.
  • the organic EL elements 10 of Examples 1 to 8 were good without any short circuit. This is because the height H with respect to the unevenness width D is not too high, the film quality of the first electrode layer 14 made of the ITO film is uniformly formed, and the organic layer including the light emitting layer is further uniformly formed thereon. It is presumed that a defect in which the second electrode layer 16 and the first electrode layer 14 thereon are partially in contact did not occur.
  • Comparative Example 2 the light extraction efficiency was the same as in Comparative Example 1, and no effect was obtained. Moreover, no short circuit occurred. This is presumed that the effect of improving the light extraction efficiency could not be obtained because the surface layer of the structural layer 12 had few uneven regions and many planar regions. In Comparative Example 3, the light extraction efficiency showed a slightly high value of 1.40. Moreover, no short circuit occurred. This is because the concavo-convex region of the structural layer 12 has a certain effect on the suppression of plasmon absorption and the reflection of light emission. However, since the planar region is small, reflection from the emitted light is small, and as a result, overall It is estimated that the improvement in efficiency is not sufficient.
  • Comparative Example 4 the light extraction efficiency was the same as in Comparative Example 1, and no effect was obtained. Moreover, no short circuit occurred. This is presumed that the effect of improving the light extraction efficiency could not be obtained because the surface layer of the structural layer 12 had few uneven regions and many planar regions. In Comparative Example 5, the light extraction efficiency was lower than in Comparative Example 1, and no effect was obtained. In addition, a current leak occurred from the start of the measurement, and short-circuited after the measurement. This is because the height H of the concavo-convex portion 23 of the concavo-convex region on the surface of the structural layer 12 is very large with respect to the width D, and thus the shape becomes a standing shape.
  • the formation of the deposited film was not progressed, and it was thinner than the peripheral functional layer 15 or was missing. Since the first electrode layer 14 is exposed to the second electrode layer 16 side and a minute bipolar electrode energization region is generated, an excessive current flows, and a short circuit occurs later to cause a light emission failure, and the light emission region is uniform. It is presumed that no carriers (charge carriers) such as electrons or holes flow in the light, resulting in a decrease in luminous efficiency.
  • the organic EL element 10 includes the structural layer 12, the light-transmissive first electrode layer 14, the functional layer 15 including the light-emitting layer, the first layer on the light-transmissive substrate 11. Two electrode layers 16 are laminated in this order. Further, the structure layer 12 is provided with an uneven region and a planar region. Thereby, it turned out that the light extraction efficiency of the organic EL element 10 can be improved, light emission unevenness can be reduced, and light emission quality can be improved.
  • the organic EL device of the present invention can suppress uneven light emission and obtain good stability over time while maintaining good light extraction efficiency. For this reason, the organic EL element of the present invention is suitable for various uses such as a display, a planar light source, and a lighting device that require uniform light emission, and can contribute to energy saving.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Electroluminescent Light Sources (AREA)

Abstract

L'invention concerne un élément électroluminescent (EL) organique qui présente un rendement d'extraction de lumière élevé et une grande uniformité d'émission ; un dispositif d'éclairage ; une source de lumière surfacique ; et un dispositif d'affichage. Cet élément EL organique (10) est obtenu par stratification séquentielle, dans l'ordre suivant : d'un substrat transmettant la lumière (11) ; d'une couche structurale (12) qui présente au moins deux micro-régions comprenant une région à creux et saillies, qui est composée d'une pluralité de parties en creux et en saillie (23) formées sur une surface qui est du côté opposé à la surface côté substrat (11), et une région plate qui est composée d'une partie plate ; d'une première couche d'électrode transmettant la lumière (14) ; d'une couche fonctionnelle (15) qui comporte une couche électroluminescente ; et d'une seconde couche d'électrode (16). À cet égard, l'élément EL organique (10) peut comprendre une couche barrière (13) qui est disposée entre la couche structurale (12) et la première couche d'électrode. L'élément EL organique (10) peut en outre comprendre une couche de lentille d'extraction de lumière (30) qui est disposée sur une surface du substrat (11), ladite surface étant du côté opposé à la surface sur laquelle est formée la couche structurale (12).
PCT/JP2017/004176 2016-02-18 2017-02-06 Élément électroluminescent organique, dispositif d'éclairage, source de lumière surfacique et dispositif d'affichage WO2017141748A1 (fr)

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WO2014057647A1 (fr) * 2012-10-11 2014-04-17 パナソニック株式会社 Élément électroluminescent organique et dispositif d'éclairage
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JP2015191787A (ja) * 2014-03-28 2015-11-02 旭化成イーマテリアルズ株式会社 有機エレクトロルミネッセンス素子用基板、有機エレクトロルミネッセンス素子、照明装置及び表示装置

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Publication number Priority date Publication date Assignee Title
JP2009140915A (ja) * 2007-11-14 2009-06-25 Canon Inc 発光装置
US20100157453A1 (en) * 2008-12-09 2010-06-24 Tpo Displays Corp. Display device and electrical apparatus
WO2012147759A1 (fr) * 2011-04-27 2012-11-01 Ｊｘ日鉱日石エネルギー株式会社 Substrat transparent d'extraction de lumière pour éléments électroluminescents organiques et éléments électroluminescents organiques mis en œuvre avec ceux-ci
WO2014057647A1 (fr) * 2012-10-11 2014-04-17 パナソニック株式会社 Élément électroluminescent organique et dispositif d'éclairage
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