WO2017121065A1 - 液晶显示面板及其制作方法 - Google Patents

液晶显示面板及其制作方法 Download PDF

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Publication number
WO2017121065A1
WO2017121065A1 PCT/CN2016/084737 CN2016084737W WO2017121065A1 WO 2017121065 A1 WO2017121065 A1 WO 2017121065A1 CN 2016084737 W CN2016084737 W CN 2016084737W WO 2017121065 A1 WO2017121065 A1 WO 2017121065A1
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WIPO (PCT)
Prior art keywords
insulating layer
organic insulating
disposed
layer
black matrix
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/CN2016/084737
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English (en)
French (fr)
Inventor
郝思坤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TCL China Star Optoelectronics Technology Co Ltd
Original Assignee
Shenzhen China Star Optoelectronics Technology Co Ltd
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Application filed by Shenzhen China Star Optoelectronics Technology Co Ltd filed Critical Shenzhen China Star Optoelectronics Technology Co Ltd
Priority to US15/318,364 priority Critical patent/US20180059494A1/en
Publication of WO2017121065A1 publication Critical patent/WO2017121065A1/zh
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136209—Light shielding layers, e.g. black matrix, incorporated in the active matrix substrate, e.g. structurally associated with the switching element
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133345—Insulating layers
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136286—Wiring, e.g. gate line, drain line
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/1368—Active matrix addressed cells in which the switching element is a three-electrode device
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136222—Colour filters incorporated in the active matrix substrate
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136231—Active matrix addressed cells for reducing the number of lithographic steps
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2201/00—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
    • G02F2201/12—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00 electrode
    • G02F2201/121—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00 electrode common or background

Definitions

  • the present invention relates to the field of liquid crystal display panels, and in particular, to a liquid crystal display panel and a method of fabricating the same.
  • Liquid crystal display is one of the most widely used flat panel displays, and has gradually become a widely used electronic device such as mobile phones, personal digital assistants (PDAs), digital cameras, computer screens or laptop screens with high-resolution color screens. monitor.
  • PDAs personal digital assistants
  • LCDs liquid crystal display
  • LCDs liquid crystal display
  • the liquid crystal cell of the conventional liquid crystal display has three parts: an array substrate (Array substrate), a liquid crystal layer, and a color filter substrate (CF substrate).
  • the Array substrate carries a panel drive circuit, and the CF substrate carries a black matrix, a color filter, and a photoresist gap (Photo Spacer).
  • the BOA technology uses a color filter on the Array substrate. This technology can reduce the transmittance of the Array substrate and the CF substrate due to the deviation of the alignment between the Array substrate and the CF substrate after the glass is formed into a box. In recent years, the surface TV has developed rapidly.
  • the BOA technology can solve the problem that the shading area is mismatched due to the misalignment of the upper and lower substrates, and avoids the problems of penetrating rate drop and color shift caused by the bending process of the panel, which has been paid attention to.
  • Figure 1 shows the existing BOA structure.
  • this figure shows the data line in the pixel electrode (Data Section structure diagram at line).
  • a device layer 11 is provided on the glass substrate 10 (Device Layers), the structure of the device layer 11 is a common TFT process, such as a-Si, IGZO, LTPS, and the like.
  • the data line 12 has an inorganic insulating layer 13 thereon, such as SiNx or SiO2, and an inorganic insulating layer 14 (PFA) and a transparent electrode layer 15 (for example, indium tin oxide ITO) are disposed on the inorganic insulating layer 13.
  • black matrix 16 BM
  • the upper surface of the black matrix 16 protrudes from the upper surface of the transparent electrode layer 15, forming a convex structure.
  • the convex structure may cause poor alignment of the liquid crystal, and the formation of the black matrix 16 requires an increase in the mask, which is disadvantageous for process simplification.
  • the technical problem to be solved by the present invention is to provide a liquid crystal display panel and a method of fabricating the same, which can prevent the poor alignment of the liquid crystal caused by the convex structure and simplify the production process.
  • the present invention provides a liquid crystal display panel including a substrate, a device layer disposed on the substrate, a data line disposed on a surface of the device layer, and a surface of the device layer and/or a surface of the data line
  • the organic insulating layer wherein the organic insulating layer has a trench corresponding to the data line, the trench width is greater than the data line width, and a black matrix is disposed in the trench, the black matrix
  • the surface of the organic insulating layer is flush with the surface of the organic insulating layer
  • the liquid crystal display panel further includes an inorganic insulating layer and a color filter layer disposed on the surface of the device layer and covering the data line
  • the organic insulating layer is disposed on a surface of the inorganic insulating layer, and the color filter layer is disposed between the inorganic insulating layer and the organic insulating layer, and a common electrode is disposed on a surface of the organic insulating layer.
  • the present invention also provides a liquid crystal display panel comprising a substrate, a device layer disposed on the substrate, a data line disposed on a surface of the device layer, and an organic insulating layer disposed on a surface of the device layer and/or a surface of the data line
  • the organic insulating layer has a trench corresponding to the data line, and a black matrix is disposed in the trench, and a surface of the black matrix is flush with a surface of the organic insulating layer.
  • a color filter layer is disposed on the surface of the device layer and covers the data line, and the organic insulating layer is disposed on the surface of the color filter layer.
  • an inorganic insulating layer is disposed on the surface of the device layer and covers the data line, and the organic insulating layer is disposed on the surface of the inorganic insulating layer.
  • a color filter layer is disposed, the color filter layer being disposed between the inorganic insulating layer and the organic insulating layer.
  • the surface of the organic insulating layer is provided with a common electrode.
  • the groove width is greater than the data line width.
  • the device layer is a thin film transistor layer.
  • the present invention also provides a method for fabricating a liquid crystal display panel, comprising the steps of: (a) providing a substrate on which a device layer, a data line, and a surface of the device layer are disposed, and/or An organic insulating layer on the surface of the data line; step (b), forming a trench on the organic insulating layer, the trench corresponding to the data line; step (c), in the trench and the organic insulating The surface of the layer forms a black matrix; in step (d), the black matrix of the surface of the organic insulating layer is removed such that the surface of the black matrix in the trench is flush with the surface of the organic insulating layer.
  • the black matrix of a specific thickness is removed by a dry etching or a positive black matrix photoresist mask such that the surface of the black matrix in the trench and the surface of the organic insulating layer Flush.
  • the black matrix of the surface of the organic insulating layer is removed by an overetching method to avoid a black matrix remaining on the surface of the organic insulating layer.
  • the invention has the advantages that the convex structure formed by the black matrix on the glass substrate is removed, the liquid crystal alignment failure caused by the convex structure is prevented, the mask of the black matrix is omitted, the number of the photomasks used for production is saved, and the production process is simplified.
  • FIG. 1 is a schematic structural view of a conventional BOA type liquid crystal display panel
  • FIG. 2 is a schematic structural view of a first embodiment of a liquid crystal display panel of the present invention
  • FIG. 3 is a schematic structural view of a second embodiment of a liquid crystal display panel of the present invention.
  • FIG. 4 is a schematic structural view of a third embodiment of a liquid crystal display panel of the present invention.
  • FIG. 5 is a schematic structural view of a fourth embodiment of a liquid crystal display panel of the present invention.
  • FIG. 6 is a schematic view showing the steps of a method for fabricating a liquid crystal display panel of the present invention.
  • FIGS. 7A-7E are process flow diagrams of a method of fabricating a liquid crystal display panel of the present invention.
  • a liquid crystal display panel of the present invention includes a substrate 20, a device layer 21 disposed on the substrate 20, a data line 22 disposed on a surface of the device layer 21, and a surface disposed on the device layer 21 and/or Or an organic insulating layer 23 on the surface of the data line 22.
  • the organic insulating layer 23 has a trench 24 corresponding to the data line 22.
  • the organic insulating layer 23 is disposed on the surface of the device layer 21, and the data line 22 is disposed in the trench 24.
  • a black matrix 25 is disposed within the trench 24 and covers the data line 22.
  • the trench 24 has a width greater than a width of the data line 22.
  • the surface of the black matrix 25 is flush with the surface of the organic insulating layer 23, so that the black matrix 25 does not have a convex structure formed on the surface of the organic insulating layer 23, so that poor alignment of the liquid crystal caused by the convex structure can be prevented.
  • a common electrode 26 is provided on the surface of the organic insulating layer 23.
  • the common electrode 26 may be a transparent electrode such as an ITO electrode.
  • the structure of the device layer 21 is a common TFT process such as a-Si, IGZO, LTPS, and the like.
  • the substrate 20 may be a glass substrate.
  • the liquid crystal display panel further includes a color filter layer 27.
  • the color filter layer 27 is disposed on the surface of the device layer 21 and covers the data line 22, and the organic insulating layer 23 is disposed on the surface of the color filter layer 27.
  • the color filter layer 27 is a commonly used structure in the art, and a structure thereof can be obtained by those skilled in the art from the prior art, and details are not described herein.
  • the liquid crystal display panel further includes an inorganic insulating layer 28 disposed on the surface of the device layer 21 and covering the The data line 22, the organic insulating layer 23 is disposed on the surface of the inorganic insulating layer 28.
  • the inorganic insulating layer 28 may be SiNx or SiO2.
  • the liquid crystal display panel includes a color filter layer 27 and an inorganic insulating layer 28, and the color filter layer 27 is disposed on the inorganic insulating layer. Between the layer 28 and the organic insulating layer 23.
  • the present invention also provides a method for fabricating a liquid crystal display panel. Referring to FIG. 6, the manufacturing method includes the following steps:
  • Step S60 providing a substrate on which the device layer, the data line, and the organic insulating layer disposed on the surface of the device layer and/or the surface of the data line are sequentially disposed; Step S61, forming on the organic insulating layer a trench, the trench corresponding to the data line; step S62, forming a black matrix in the trench and the surface of the organic insulating layer; and step S63, removing a black matrix on the surface of the organic insulating layer, so that the trench The surface of the inner black matrix is flush with the surface of the organic insulating layer.
  • FIGS. 7A-7E are process flow diagrams of a method of fabricating a liquid crystal display panel of the present invention.
  • a substrate 60 is provided, and a device layer 61, a data line 62, and an organic insulating layer 63 disposed on the surface of the device layer 61 and/or the surface of the data line 62 are sequentially disposed on the substrate 60.
  • the organic insulating layer 63 is disposed on the surface of the device layer 61 and covers the data line 62.
  • an inorganic insulating layer and/or a color filter layer may be further included, and the inorganic insulating layer and/or the color filter layer are disposed on the surface of the device layer 61. And covering the data line 62, the organic insulating layer 63 is disposed on the surface of the inorganic insulating layer and/or the color filter layer.
  • a trench 64 is formed on the organic insulating layer 63, and the trench 64 corresponds to the data line 62.
  • the organic insulating layer 63 covers the data line 62, the data line 62 is disposed in the trench 64 after the trench 64 is formed.
  • a method of forming the trenches 64 can be obtained by those skilled in the art from the prior art.
  • a black matrix 65 is formed in the trench 64 and on the surface of the organic insulating layer 63.
  • the black matrix 65 can be formed by deposition or the like, which is well known to those skilled in the art. Due to the presence of the trench 64, the black matrix 65 at the trench is thicker, and the black matrix 65 is thinner where the organic insulating layer 63 has no trench.
  • the black matrix 65 on the surface of the organic insulating layer 63 is removed such that the surface of the black matrix 65 in the trench 64 is flush with the surface of the organic insulating layer 63.
  • the black matrix 65 of a specific thickness may be removed by dry etching, thereby removing the black matrix 95 on the surface of the organic insulating layer 63.
  • the black matrix 65 at the trench is overetched, and therefore, ideally, the surface of the black matrix 65 in the trench 64 and the organic insulating layer 63 The surface is flush, and in fact, the surface of the black matrix 65 in the trench 64 is slightly lower than the surface of the organic insulating layer 63.
  • the black matrix 65 can also be removed using a positive black matrix photoresist method.
  • the black matrix 65 is irradiated with a specific dose of UV light, and the upper black matrix 65 is exposed.
  • the black matrix 65 is not exposed to light in the depth of the trench 64, and then the upper layer BM is removed, leaving only the black matrix 65 at the trench.
  • step S63 a step S64 is further included to form a common electrode 66 on the surface of the organic insulating layer 63.
  • the liquid crystal display panel provided by the present invention removes the black matrix formed on the organic insulating layer by the black matrix of the liquid crystal panel, thereby removing the convex structure formed by the black matrix on the glass substrate and preventing the convexity.
  • the liquid crystal alignment caused by the structure is poor, the mask of the black matrix is omitted, and the number of masks used for production is saved.
  • a trench is provided on the organic insulating layer in advance, and a black matrix is formed in the trench, thereby removing the convex structure formed by the black matrix on the glass substrate, and preventing the liquid crystal caused by the convex structure. Poor alignment, eliminating the mask of the black matrix, saving the number of masks used in production.

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Liquid Crystal (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

一种液晶显示面板及其制作方法，所述液晶显示面板包括基板（20,60）、设置在所述基板（20，60）上的装置层（21，61）、设置在装置层（21，61）表面的数据线（22，62）及设置在所述装置层（21，61）表面和/ 或数据线（22，62）表面的有机绝缘层（23，63），所述有机绝缘层（23，63）具有一对应所述数据线（22，62）的沟槽（24，64），一黑色矩阵（25，65）设置在所述沟槽（24，64）内，所述黑色矩阵（25，65）的表面与所述有机绝缘层（23，63）的表面平齐。去除玻璃基板（20，60）上面黑色矩阵（25，65）形成的凸起结构，防止凸起结构引起的液晶配向不良；省掉黑色矩阵（25，65）的光罩，节省生产使用的光罩数目，简化生产制程。

Description

液晶显示面板及其制作方法 技术领域
本发明涉及液晶显示面板领域，尤其涉及一种液晶显示面板及其制作方法。
 背景技术
液晶显示器是目前使用最广泛的一种平板显示器，已经逐渐成为各种电子设备如移动电话、个人数字助理(PDA)、数字相机、计算机屏幕或笔记本电脑屏幕所广泛应用具有高分辨率彩色屏幕的显示器。随着液晶显示器技术的发展进步，人们对液晶显示器的显示品质，外观设计等提出了更高的要求。
随着人们对液晶显示器的显示品质提出更高的要求，BOA(Black Matrix on Array，黑色矩阵贴附于阵列基板)技术日益受到人们的重视。传统液晶显示器的液晶盒有三部分组成：阵列基板（Array基板）、液晶层、彩膜基板（CF基板）。Array基板载有面板驱动电路，CF基板载有黑色矩阵、彩色滤光片、光阻间隙（Photo Spacer）。BOA技术把彩色滤光片做在Array基板上，该技术可以减小玻璃成盒后，由于Array基板和CF基板对位偏差造成的穿透率下降，大视角色偏等缺陷。近年来，曲面电视迅猛发展，BOA技术可以解决上下基板错位导致遮光区域不匹配的问题，避免面板弯曲过程中，造成的穿透率下降和色偏等问题，受到了人们的重视。
图1为现有的BOA 结构。参见图1，此图所示为像素电极中数据线（Data line）处的剖面结构图。在玻璃基板10上设置有装置层11（Device Layers），所述装置层11的结构为常见的TFT制程，如a-Si、IGZO、LTPS等。数据线12上面有无机绝缘层13，所述无机绝缘层13例如为SiNx或SiO2，在无机绝缘层13上设置有有机绝缘层14（PFA）、透明电极层15（例如为氧化铟锡ITO）及黑色矩阵16（BM）。现有的BOA 结构，其黑色矩阵16的上表面突出于透明电极层15的上表面，形成凸起结构。该凸起结构会引起液晶配向不良，且形成黑色矩阵16需要增加光罩，不利于工艺简化。
 技术问题
本发明所要解决的技术问题是，提供一种液晶显示面板及其制作方法，既能够防止凸起结构引起的液晶配向不良，又能够简化生产制程。
 技术解决方案
为了解决上述问题，本发明提供了一种液晶显示面板，包括基板、设置在所述基板上的装置层、设置在装置层表面的数据线及设置在所述装置层表面和/或数据线表面的有机绝缘层，其中，所述有机绝缘层具有一对应所述数据线的沟槽，所述沟槽宽度大于所述数据线宽度，一黑色矩阵设置在所述沟槽内，所述黑色矩阵的表面与所述有机绝缘层的表面平齐，所述液晶显示面板还包括一无机绝缘层及一彩色滤光层，所述无机绝缘层设置在所述装置层表面，并覆盖所述数据线，所述有机绝缘层设置在所述无机绝缘层表面上，所述彩色滤光层设置在所述无机绝缘层与所述有机绝缘层之间，在所述有机绝缘层表面设置有公共电极。
本发明还提供了一种液晶显示面板，包括基板、设置在所述基板上的装置层、设置在装置层表面的数据线及设置在所述装置层表面和/或数据线表面的有机绝缘层，所述有机绝缘层具有一对应所述数据线的沟槽，一黑色矩阵设置在所述沟槽内，所述黑色矩阵的表面与所述有机绝缘层的表面平齐。
进一步，还包括一彩色滤光层，所述彩色滤光层设置在所述装置层表面，并覆盖所述数据线，所述有机绝缘层设置在所述彩色滤光层表面上。
进一步，还包括一无机绝缘层，所述无机绝缘层设置在所述装置层表面，并覆盖所述数据线，所述有机绝缘层设置在所述无机绝缘层表面上。
进一步，还包括一彩色滤光层，所述彩色滤光层设置在所述无机绝缘层与所述有机绝缘层之间。
进一步，所述有机绝缘层表面设置有公共电极。
进一步，所述沟槽宽度大于所述数据线宽度。
进一步，所述装置层为薄膜晶体管层。
本发明还提供一种液晶显示面板的制作方法，包括如下步骤：步骤（a），提供一基板、在所述基板上依次设置有装置层、数据线及设置在所述装置层表面和/或数据线表面的有机绝缘层；步骤（b），在所述有机绝缘层上形成沟槽，所述沟槽对应所述数据线；步骤（c），在所述沟槽内及所述有机绝缘层表面形成黑色矩阵；步骤（d），去除所述有机绝缘层表面的黑色矩阵，使得沟槽内的黑色矩阵的表面与所述有机绝缘层的表面平齐。
进一步，在步骤（d）中，采用干法刻蚀或正型黑色矩阵光阻掩膜的方法，去除特定厚度的黑色矩阵，使得沟槽内的黑色矩阵的表面与所述有机绝缘层的表面平齐。
进一步，在步骤（d）中，采用过刻蚀的方法去除所述有机绝缘层表面的黑色矩阵，以避免在所述有机绝缘层表面残留黑色矩阵。
 有益效果
本发明的优点在于，去除玻璃基板上面黑色矩阵形成的凸起结构，防止凸起结构引起的液晶配向不良；省掉黑色矩阵的光罩，节省生产使用的光罩数目，简化生产制程。
 附图说明
图1是现有的BOA型液晶显示面板的结构示意图；
图2是本发明液晶显示面板的第一具体实施方式的结构示意图；
图3是本发明液晶显示面板的第二具体实施方式的结构示意图；
图4是本发明液晶显示面板的第三具体实施方式的结构示意图；
图5是本发明液晶显示面板的第四具体实施方式的结构示意图；
图6是本发明液晶显示面板制作方法的步骤示意图；
图7A~图7E是本发明液晶显示面板制作方法的工艺流程图。
 本发明的最佳实施方式
下面结合附图对本发明提供的液晶显示面板及其制作方法的具体实施方式做详细说明。
参见图2所示，本发明一种液晶显示面板包括基板20、设置在所述基板20上的装置层21、设置在装置层21表面的数据线22及设置在所述装置层21表面和/或数据线22表面的有机绝缘层23。
所述有机绝缘层23具有一对应所述数据线22的沟槽24。在本第一具体实施方式中，所述有机绝缘层23设置在所述装置层21的表面，所述数据线22设置在所述沟槽24内。
一黑色矩阵25设置在所述沟槽24内，并覆盖所述数据线22，优选地，所述沟槽24宽度大于所述数据线22的宽度。所述黑色矩阵25的表面与所述有机绝缘层23的表面平齐，使得黑色矩阵25并未在有机绝缘层23的表面形成的凸起结构，从而能够防止凸起结构引起的液晶配向不良。
进一步，在所述有机绝缘层23表面设置有公共电极26。所述公共电极26可以为透明电极，例如ITO电极。所述装置层21的结构为常见的TFT制程，如a-Si、IGZO、LTPS等。所述基板20可以为玻璃基板。
参见图3，在本发明液晶显示面板的第二具体实施方式中，所述液晶显示面板还包括一彩色滤光层27。所述彩色滤光层27设置在所述装置层21表面，并覆盖所述数据线22，所述有机绝缘层23设置在所述彩色滤光层27表面上。所述彩色滤光层27为本领域常用结构，本领域技术人员从现有技术中可获得其结构，本文不再赘述。
参见图4，在本发明液晶显示面板的第三具体实施方式中，所述液晶显示面板还包括一无机绝缘层28，所述无机绝缘层28设置在所述装置层21表面，并覆盖所述数据线22，所述有机绝缘层23设置在所述无机绝缘层28表面上。所述无机绝缘层28可以为SiNx或SiO2。
参见图5，在本发明液晶显示面板的第四具体实施方式中，所述液晶显示面板包括一彩色滤光层27及一无机绝缘层28，所述彩色滤光层27设置在所述无机绝缘层28与所述有机绝缘层23之间。
本发明还提供一种液晶显示面板的制作方法，参见图6，所述制作方法包括如下步骤：
步骤S60、提供一基板、在所述基板上依次设置有装置层、数据线及设置在所述装置层表面和/或数据线表面的有机绝缘层；步骤S61，在所述有机绝缘层上形成沟槽，所述沟槽对应所述数据线；步骤S62，在所述沟槽内及所述有机绝缘层表面形成黑色矩阵；步骤S63，去除所述有机绝缘层表面的黑色矩阵，使得沟槽内的黑色矩阵的表面与所述有机绝缘层的表面平齐。
图7A~图7E是本发明液晶显示面板制作方法的工艺流程图。
参见步骤S60及图7A，提供一基板60、在所述基板60上依次设置有装置层61、数据线62及设置在所述装置层61表面和/或数据线62表面的有机绝缘层63。在本具体实施方式中，所述有机绝缘层63设置在所述装置层61表面并覆盖所述数据线62。
在其他具体实施方式中，还可以包括无机绝缘层和/或彩色滤光层（附图中未标示），所述无机绝缘层和/或彩色滤光层设置在所述所述装置层61表面并覆盖所述数据线62，所述有机绝缘层63设置在无机绝缘层和/或彩色滤光层表面。
参见步骤S61及图7B，在所述有机绝缘层63上形成沟槽64，所述沟槽64对应所述数据线62。在本具体实施方式中，由于所述有机绝缘层63覆盖所述数据线62，因此，在形成沟槽64后，所述数据线62设置在所述沟槽64内。本领域技术人员可从现有技术中获取形成沟槽64的方法。
参见步骤S62及图7C，在所述沟槽64内及所述有机绝缘层63表面形成黑色矩阵65。所述黑色矩阵65可以采用沉积等本领域技术人员熟知的方法形成。由于沟槽64的存在，在沟槽处的黑色矩阵65较厚，在有机绝缘层63无沟槽处，黑色矩阵65较薄。
参见步骤S63及图7D，去除所述有机绝缘层63表面的黑色矩阵65，使得沟槽64内的黑色矩阵65的表面与所述有机绝缘层63的表面平齐。
在该步骤中，可以采用干法刻蚀的方法，去除特定厚度的黑色矩阵65，进而去除有机绝缘层63表面的黑色矩阵95。进一步，为了防止有机绝缘层63表面黑色矩阵65残留，沟槽处的黑色矩阵65要过刻蚀，因此，理想状态下，沟槽64内的黑色矩阵65的表面与所述有机绝缘层63的表面平齐，实际上，沟槽64内的黑色矩阵65的表面略低于所述有机绝缘层63的表面。
在该步骤中，还可以使用正型黑色矩阵光阻法去除黑色矩阵65。首先对黑色矩阵65照射特定剂量UV光，使上层黑色矩阵65感光，沟槽64深处黑色矩阵65不感光，然后去掉上层BM，仅剩余沟槽处黑色矩阵65。
在步骤S63之后，进一步还包括一步骤S64，在所述有机绝缘层63表面形成公共电极66。
综上所述，本发明提供的液晶显示面板，通过将该液晶面板的黑色矩阵设于在有机绝缘层上预先形成的沟槽内部，从而去除玻璃基板上面黑色矩阵形成的凸起结构，防止凸起结构引起的液晶配向不良，省掉黑色矩阵的光罩，节省生产使用的光罩数目。本发明提供的液晶显示面板的制作方法，预先在有机绝缘层上设置沟槽，并在沟槽中形成黑色矩阵，从而去除玻璃基板上面黑色矩阵形成的凸起结构，防止凸起结构引起的液晶配向不良，省掉黑色矩阵的光罩，节省生产使用的光罩数目。
以上所述仅是本发明的优选实施方式，应当指出，对于本技术领域的普通技术人员，在不脱离本发明原理的前提下，还可以做出若干改进和润饰，这些改进和润饰也应视为本发明的保护范围。

Claims (12)

  1. 一种液晶显示面板，包括基板、设置在所述基板上的装置层、设置在装置层表面的数据线及设置在所述装置层表面和/或数据线表面的有机绝缘层，其中，所述有机绝缘层具有一对应所述数据线的沟槽，所述沟槽宽度大于所述数据线宽度，一黑色矩阵设置在所述沟槽内，所述黑色矩阵的表面与所述有机绝缘层的表面平齐，所述液晶显示面板还包括一无机绝缘层及一彩色滤光层，所述无机绝缘层设置在所述装置层表面，并覆盖所述数据线，所述有机绝缘层设置在所述无机绝缘层表面上，所述彩色滤光层设置在所述无机绝缘层与所述有机绝缘层之间，在所述有机绝缘层表面设置有公共电极。
  2. 根据权利要求1所述的液晶显示面板，其中，所述装置层为薄膜晶体管层。
  3. 一种液晶显示面板，包括基板、设置在所述基板上的装置层、设置在装置层表面的数据线及设置在所述装置层表面和/或数据线表面的有机绝缘层，其中，所述有机绝缘层具有一对应所述数据线的沟槽，一黑色矩阵设置在所述沟槽内，所述黑色矩阵的表面与所述有机绝缘层的表面平齐。
  4. 根据权利要求3所述的液晶显示面板，其中，还包括一彩色滤光层，所述彩色滤光层设置在所述装置层表面，并覆盖所述数据线，所述有机绝缘层设置在所述彩色滤光层表面上。
  5. 根据权利要求3所述的液晶显示面板，其中，还包括一无机绝缘层，所述无机绝缘层设置在所述装置层表面，并覆盖所述数据线，所述有机绝缘层设置在所述无机绝缘层表面上。
  6. 根据权利要求5所述的液晶显示面板，其中，还包括一彩色滤光层，所述彩色滤光层设置在所述无机绝缘层与所述有机绝缘层之间。
  7. 根据权利要求3所述的液晶显示面板，其中，在所述有机绝缘层表面设置有公共电极。
  8. 根据权利要求3所述的液晶显示面板，其中，所述沟槽宽度大于所述数据线宽度。
  9. 根据权利要求3所述的液晶显示面板，其中，所述装置层为薄膜晶体管层。
  10. 一种液晶显示面板的制作方法，其中，包括如下步骤：
    步骤（a），提供一基板、在所述基板上依次设置有装置层、数据线及设置在所述装置层表面和/或数据线表面的有机绝缘层；
    步骤（b），在所述有机绝缘层上形成沟槽，所述沟槽对应所述数据线；
    步骤（c），在所述沟槽内及所述有机绝缘层表面形成黑色矩阵；
    步骤（d），去除所述有机绝缘层表面的黑色矩阵，使得沟槽内的黑色矩阵的表面与所述有机绝缘层的表面平齐。
  11. 根据权利要求10所述的制作方法，其中，在步骤（d）中，采用干法刻蚀或正型黑色矩阵光阻掩膜的方法，去除特定厚度的黑色矩阵，使得沟槽内的黑色矩阵的表面与所述有机绝缘层的表面平齐。
  12. 根据权利要求10所述的制作方法，其中，在步骤（d）中，采用过刻蚀的方法去除所述有机绝缘层表面的黑色矩阵，以避免在所述有机绝缘层表面残留黑色矩阵。
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Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101673017A (zh) * 2009-10-28 2010-03-17 友达光电股份有限公司 主动元件阵列基板及其制造方法
CN202013464U (zh) * 2011-03-28 2011-10-19 京东方科技集团股份有限公司 一种彩膜基板、液晶面板及显示设备
US8350994B1 (en) * 1996-12-03 2013-01-08 Lg Display Co., Ltd. Method of manufacturing a liquid crystal display
CN104614893A (zh) * 2015-03-03 2015-05-13 京东方科技集团股份有限公司 一种显示基板及其制作方法、显示装置
CN105093654A (zh) * 2015-08-27 2015-11-25 京东方科技集团股份有限公司 阵列基板及其制作方法和显示装置
CN105446041A (zh) * 2016-01-11 2016-03-30 深圳市华星光电技术有限公司 液晶显示面板及其制作方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104749816B (zh) * 2015-04-14 2017-11-10 京东方科技集团股份有限公司 一种显示基板的制作方法、显示基板和显示装置

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8350994B1 (en) * 1996-12-03 2013-01-08 Lg Display Co., Ltd. Method of manufacturing a liquid crystal display
CN101673017A (zh) * 2009-10-28 2010-03-17 友达光电股份有限公司 主动元件阵列基板及其制造方法
CN202013464U (zh) * 2011-03-28 2011-10-19 京东方科技集团股份有限公司 一种彩膜基板、液晶面板及显示设备
CN104614893A (zh) * 2015-03-03 2015-05-13 京东方科技集团股份有限公司 一种显示基板及其制作方法、显示装置
CN105093654A (zh) * 2015-08-27 2015-11-25 京东方科技集团股份有限公司 阵列基板及其制作方法和显示装置
CN105446041A (zh) * 2016-01-11 2016-03-30 深圳市华星光电技术有限公司 液晶显示面板及其制作方法

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