WO2017088748A1 - 摆动式回转炉及其活动隔板组件 - Google Patents

摆动式回转炉及其活动隔板组件 Download PDF

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Publication number
WO2017088748A1
WO2017088748A1 PCT/CN2016/106868 CN2016106868W WO2017088748A1 WO 2017088748 A1 WO2017088748 A1 WO 2017088748A1 CN 2016106868 W CN2016106868 W CN 2016106868W WO 2017088748 A1 WO2017088748 A1 WO 2017088748A1
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WIPO (PCT)
Prior art keywords
baffle
movable
drum
partition
opening
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PCT/CN2016/106868
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English (en)
French (fr)
Inventor
姜良政
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姜良政
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Publication date
Application filed by 姜良政 filed Critical 姜良政
Publication of WO2017088748A1 publication Critical patent/WO2017088748A1/zh

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    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B7/00—Rotary-drum furnaces, i.e. horizontal or slightly inclined
    • F27B7/20—Details, accessories, or equipment peculiar to rotary-drum furnaces
    • F27B7/30—Arrangements of partitions

Definitions

  • the invention relates to the technical field of environmental protection, energy and chemical equipment, in particular to an active partition assembly of a swing type rotary kiln. It also relates to an oscillating rotary furnace comprising the movable baffle assembly.
  • the existing rotary kiln usually consists of a drum, a burner and a furnace tail.
  • the burner and the furnace end are fixedly and rotatably connected around the two ends of the drum, and are statically sealed with the two ends of the drum.
  • the drum is driven by an external drive. Perform a continuous single direction of rotation.
  • the drum of the existing rotary kiln Since the drum of the existing rotary kiln is continuously rotated in a single direction, it is impossible to install other devices for the process reaction on the outer peripheral wall of the drum, because other devices need to be connected to external equipment through wires or pipes, and can only be installed in the burner and the furnace. At the end, the internal process of the drum can not be effectively completed, and the outer wall of the drum can not be connected with the external pipeline.
  • the fluid material can not directly enter and exit from the outer wall of the drum, and can only enter and exit at the burner head and the furnace tail, which is not conducive to the control of the material in the middle position of the rotary kiln.
  • a patent application file filed on the same day as the present application provides an oscillating rotary kiln which has not been previously provided.
  • the oscillating rotary kiln can only make the drum around the swing axis by the driving device, the supporting device and the oscillating control device.
  • the reciprocating swing is performed within a certain angle range, so that a pipe, a wire, and the like which can move in a certain angle range can be directly disposed on the outer wall of the drum, and the device is favorable for the process reaction, and the pipe and the wire are not wound on the drum, and the interference roller The situation of sports.
  • the material can form a solid phase zone and a gas phase zone in the drum.
  • the reaction temperatures of the processes are different, and sometimes the gas phase zone is required.
  • Partial separation to achieve partitioning, that is, allowing solid materials to pass, while gas phase materials in the gas phase zone Partial partitioning, limiting the convection between the different processes of the gas phase material in the drum, and increasing the temperature gradient between the zones; and for some processes with different reaction conditions between each other, the gas phase zone needs to be completely separated.
  • segmentation that is, the gas phase material cannot flow between different processes of the drum, and the solid material can.
  • the reaction time and degree of the materials in different processes in the drum are different, and the flow speed of the solid materials in the drum is certain, which is not conducive to the control of each process.
  • an object of the present invention to provide an active baffle assembly for an oscillating rotary kiln to partition different processes within the oscillating rotary kiln to meet the reaction requirements of different processes.
  • Another object of the present invention is to provide an oscillating rotary kiln comprising the movable baffle assembly, which is capable of integrally performing process reactions of a plurality of different working conditions in the oscillating rotary kiln, thereby simplifying the apparatus.
  • the present invention provides the following technical solutions:
  • An active baffle assembly for an oscillating rotary kiln comprising:
  • a partition for fixing in a drum of the oscillating rotary kiln the partition being provided with an opening, the opening being located in a moving area of the solid material in the drum;
  • a movable baffle disposed parallel to a surface of the partition plate and abutting against a side surface of the partition plate, the movable baffle being movable relative to the partition plate for closing an opening of the partition plate;
  • a movable link one end of which is connected to the movable baffle and the other end of which can pass through the wall of the drum;
  • a link driving device is disposed on the drum cylinder and drivingly connected to the movable link.
  • a sealing device is further provided, and the sealing device is disposed at a position of the wall of the drum cylinder passing through the movable link.
  • the partition plate is further provided with a gas phase through hole.
  • the position of the gas phase through hole on the partition is such that when the movable shutter does not close the opening of the partition, the movable shutter closes the Gas phase through hole,
  • the position of the gas phase through hole on the partition plate is such that when the movable baffle does not close the opening of the partition plate, the movable baffle does not close the gas phase through hole.
  • a link stabilizing member is further disposed, and the link stabilizing member is disposed on the partition and is sleeved on a periphery of the movable link.
  • the sealing device is a packing sealing device.
  • the link driving device is a manual driving device or an automatic driving device
  • the automatic driving device and the detecting control device are connected by wires.
  • a position sensor for detecting a position of the movable shutter in the drum is further included, and the position sensor is connected to the detection control device by a wire.
  • the outer surface of the partition plate is further provided with an outer heat insulating layer, and/or the inner portion of the partition plate is further provided with a heat insulating interlayer.
  • the present invention also provides an oscillating rotary kiln, comprising a drum, further comprising at least one movable partition assembly and/or at least one fixed partition according to any of the above; the fixed partition is fixed to the drum And an opening is disposed in the fixed partition, and the opening is located in a moving area of the solid material in the drum.
  • the above-mentioned oscillating rotary kiln further comprising a baffle dam fixed to a solid phase region of the drum for increasing solidity on a side of the baffle weir facing away from the discharge end of the drum The stacking height and residence time of the material.
  • the baffle ⁇ is disposed on a side of the fixed baffle facing the discharge end corresponding to the fixed baffle, and the baffle ⁇ is fixedly spaced
  • the opening position of the board is set.
  • the height of the baffle raft is higher than the opening height of the fixed baffle for partially or completely immersing the opening of the fixed baffle in the solid material.
  • a movable baffle assembly is further included, and the movable baffle assembly includes:
  • a movable baffle that blocks solid materials in the solid phase region of the drum
  • a lifting rod having one end connected to the movable baffle and the other end passing through the wall of the drum;
  • the lifting drive device is disposed on the drum cylinder and connected to the lift drive.
  • the movable baffle assembly further includes a lifting rod stabilizing member fixed to the inner wall of the drum and movably sleeved on the lifting The periphery of the pole.
  • the lifting drive device is an automatic lifting drive device or a manual lifting drive device, and the automatic lifting drive device and the detection control device are connected by wires.
  • the movable baffle assembly further includes a position sensor for detecting a position of the movable baffle in the drum, the position sensor and the detecting control device Connected by wires.
  • an outer heat insulating layer is further disposed on both side plates of the fixed partition, and/or the inner portion of the fixed partition is further provided with a heat insulating interlayer.
  • each of the segmented baffle sets comprising at least two of the fixed partitions disposed adjacent to each other a plate and at least one baffle, and the openings of the fixed baffles of each of the segmented baffle sets are offset from each other, each of the fixed baffles in each of the segmented baffle sets being adjacent One side of the fixed partition of the discharge end facing the discharge end is disposed adjacent to the baffle, and the baffle is disposed corresponding to an opening position of the fixed baffle. The height is higher than the opening height of the fixed partition.
  • each of the segmented baffle sets comprising at least one of the movable baffles disposed adjacent to each other
  • Each of the fixed partitions in the baffle set and a side of the baffle of each of the movable baffle sets facing the discharge end are disposed adjacent to the baffle; or each of the segments is separated
  • the baffle plate of the plate set is disposed only on a side of the segmented baffle group adjacent to the discharge end; and the baffle plate is disposed corresponding to the opening position, and the height of the baffle plate is higher than the The height of the opening.
  • each of the segmented baffle sets comprising at least two of the movable partitions disposed adjacent to each other Board assembly
  • each of the segmented baffle sets further includes at least one baffle, and the openings of the movable baffle assembly of each of the segmented baffle sets are offset from each other Providing the baffle adjacent to a side of each of the movable baffle assemblies or one of the movable baffle assemblies adjacent to the discharge end facing the discharge end And, the baffle ⁇ is disposed corresponding to an opening position of the movable baffle assembly, the baffle ⁇ having a height higher than an opening height of the movable baffle assembly.
  • the inner diameter of the partial process section cylinder of the drum is larger than the inner diameter of the remaining process section cylinders for increasing the stacking height and residence time of the solid material in the part of the process section.
  • the process section in which the inner diameter of the drum is increased only increases the inner diameter of the cylinder corresponding to the moving area of the solid material in the process section.
  • the angle between the partition surface of the movable partition plate assembly and the plate surface of the fixed partition plate and the axis of the drum is 45 to 135.
  • an angle between a plate surface of the movable baffle and an axis of the drum is 45 to 135.
  • the movable baffle assembly of the oscillating rotary kiln comprises a partition plate, a movable baffle, a movable connecting rod, a sealing device and a connecting rod driving device, wherein the partition plate is fixed in the drum, and the partition plate is arranged on the drum
  • An opening in the moving area of the solid material, the movable baffle is arranged in parallel and closely adjacent to the plate surface of the baffle, and the movable baffle is driven by the connecting rod driving device on the drum cylinder, and the movable connecting rod is driven by the movable connecting rod passing through the wall of the drum
  • the plate moves relative to the partition plate, and the opening of the partition plate can be closed and opened.
  • the opening of the plate can realize the partitioning of the drum, and the opening size of the partition plate can be adjusted by the movable baffle to meet the reaction conditions in each process section, and the solid can be controlled.
  • the oscillating rotary kiln provided by the invention adopts the movable partition assembly of the invention, so that it is better The process of completing a plurality of different working conditions in an oscillating rotary furnace is realized.
  • FIG. 1 is a schematic structural view of an active baffle assembly of an oscillating rotary kiln according to an embodiment of the present invention
  • FIG. 2 is a side view of the movable partition assembly in a closed state according to an embodiment of the present invention
  • FIG. 3 is a schematic side view showing an active partition plate assembly in an open state according to an embodiment of the present invention
  • FIG. 4 is a side view showing another movable partition plate assembly in an open state according to an embodiment of the present invention.
  • FIG. 5 is a schematic structural view of a cylinder of a swing type rotary furnace according to an embodiment of the present invention.
  • Figure 6 is a cross-sectional view taken along line C-C of Figure 5;
  • Figure 7 is a schematic cross-sectional view taken along line D-D of Figure 5;
  • FIG. 8 is a schematic structural view of a movable baffle of an oscillating rotary kiln according to an embodiment of the present invention.
  • FIG. 9 is a side view of the movable baffle assembly in a blocking state according to an embodiment of the present invention.
  • FIG. 10 is a side view showing a movable shutter assembly in an unblocked state according to an embodiment of the present invention
  • FIG. 11 is a schematic diagram of an arrangement of an active partition plate assembly for segmentation according to an embodiment of the present invention.
  • FIG. 12 is a schematic view showing the arrangement of a fixed partition plate and a baffle plate of an oscillating rotary kiln according to an embodiment of the present invention
  • Figure 13 is a cross-sectional view taken along line E-E of Figure 12;
  • Figure 14 is a cross-sectional view taken along line F-F of Figure 12;
  • Figure 15 is a schematic cross-sectional view of the G-G of Figure 12;
  • 16 is a schematic view showing the arrangement of a segmented baffle set of a swing type rotary kiln according to an embodiment of the present invention
  • FIG. 17 is a schematic structural view of a concentric oscillating rotary furnace according to an embodiment of the present invention.
  • FIG. 18 is a schematic structural view of a second concentric oscillating rotary furnace according to an embodiment of the present invention.
  • FIG. 19 is a schematic structural view of a third concentric oscillating rotary kiln according to an embodiment of the present invention.
  • FIG. 20 is a schematic structural view of an eccentric oscillating rotary furnace according to an embodiment of the present invention.
  • 21 is a schematic structural view of a second eccentric oscillating rotary kiln according to an embodiment of the present invention.
  • FIG. 22 is a schematic structural view of a third eccentric oscillating rotary kiln according to an embodiment of the present invention.
  • FIG. 23 is a schematic structural view of a driving device and a supporting device of a fourth eccentric oscillating rotary kiln according to an embodiment of the present invention.
  • FIG. 24 is a schematic structural view of a driving device and a supporting device of a fifth eccentric oscillating rotary kiln according to an embodiment of the present invention.
  • 25 is a schematic diagram of a swinging process of a swinging rotary furnace according to an embodiment of the present invention.
  • FIG. 26 is a schematic structural view of an eccentric oscillating rotary kiln in a cylinder according to an embodiment of the present invention.
  • 1 is a feeding device
  • 2 is a drum
  • 201 is a drum material outlet
  • 3 is a carrier ring
  • 4 is a ring gear
  • 5 is a movable conduit assembly
  • 501 is a branch
  • 502 is a rotary joint
  • 6 It is a discharging device
  • 7 is a turning plate
  • 8 is a temperature sensor
  • 9 is an electric control cabinet
  • 10 is a power component
  • 11 is a driving gear
  • 12 is a supporting wheel
  • 13 is a movable chain
  • 14 is a fixed partition
  • 141 is
  • the partition plate 142 is a movable baffle
  • 143 is a movable link
  • 144 is a link stabilizing member
  • 145 is a sealing device
  • 146 is a link driving device
  • 147 is a second gas phase through hole
  • 148 is a second gas phase through hole
  • 149 is the opening
  • 15 is the counterweight balance block
  • 16 is the support
  • the core of the invention is to provide an active baffle assembly for an oscillating rotary kiln that is capable of partitioning different processes within the oscillating rotary kiln to meet the reaction requirements of different processes.
  • the invention also provides an oscillating rotary kiln comprising the movable baffle assembly, which can better complete the process reaction of a plurality of different working conditions in the oscillating rotary kiln, and simplifies the equipment and the process.
  • the movable partition assembly of the present invention is applied to the swing type rotary furnace, and can be applied to the swing type rotary furnace protected by the present application, and can be applied to another swing type applied for on the same day as the present invention.
  • the oscillating rotary kiln to be protected by the present invention is complementary to another oscillating rotary kiln which is applied for on the same day.
  • the following is a brief introduction to another oscillating rotary kiln applied for on the same day, the oscillating The rotary kiln includes a drum 2, a feeding device 1, a discharging device 6, a driving device, a supporting device, a swing control device, and a detection control device.
  • the two ends of the drum 2 are respectively a feeding end and a discharging end
  • the end faces of the feeding end and the discharging end are closed, and the feeding end is higher than the discharging end, preferably,
  • the angle between the axis B of the drum 2 and the horizontal plane is 1 to 15 degrees.
  • the material in the drum 2 can be slowly slid by the self-weight from the feeding end to the discharging end, which is more convenient for discharging, and the sliding speed is moderate, which is subject to the completion of various processes.
  • the feeding end of the drum 2 is provided with a feeding port, the axis of the feeding port is coincident with the rotation axis A of the rotary furnace, and the feeding device 1 is rotated and sealed with the feeding port, and the sealing method can adopt the dynamic sealing of the packing sealing, mechanical sealing, etc.
  • the cross-sectional area of the feed port is smaller than the cross-sectional area of the feed end, the cross-section is a plane perpendicular to the axis of the drum 2, the feeding device 1 is fixed, and the drum 2 is rotatable relative to the feeding device 1 between
  • the conveying axis of the feeding device 1 i.e., the axis of rotation of the drum 2 relative to the feeding device 1, i.e., the axis of the feed port
  • the discharging device 6 is connected to the discharging end of the drum 2, and the position of the swinging rotary furnace and the discharging device 6 is rotated and sealed with each other to be the drum material outlet 201, and the material is discharged from the drum material outlet 201.
  • the axis of the outlet 201 coincides with the axis of rotation A of the rotary kiln.
  • the driving device is disposed outside the drum 2 for driving the drum 2 to reciprocate around the rotation axis A of the oscillating rotary kiln.
  • the supporting device is disposed outside the drum 2 for rotating the supporting drum 2 to reciprocate around the rotational axis A of the swinging rotary kiln.
  • the swing control device is disposed outside the drum 2, and is connected to the driving device through a wire for controlling the action of the driving device.
  • the arc and the frequency of the reciprocating swing of the drum 2 are controlled by controlling the driving device.
  • the arc of the drum 2 reciprocates It is preferably 60 to 360, more preferably 180 to 270.
  • the material is conveyed to the drum 2 through the feeding device 1.
  • the drum 2 controls the driving device by the oscillating control device, and the oscillating driving device drives the drum 2 Reciprocatingly swinging, the drum 2 is rotatably supported by the supporting device. Under the inclined angle of the drum 2 and the reciprocating swing of the drum 2, the material gradually moves toward the discharge end along the zigzag trajectory, and the corresponding process is completed in the drum 2. Finally, it is discharged from the discharge device 6.
  • the drum 2 of the oscillating rotary kiln adopts a reciprocating oscillating structure, and the drum 2 reciprocates only in a certain arc, and does not perform continuous rotation in a single direction, so that it can be directly on the drum 2
  • the normal swing of the drum 2 is more conducive to the treatment of materials such as garbage, sludge, biomass, inorganic compounds, low rank coal, oil shale, and sludge.
  • the two ends of the drum of the present invention are closed, and the feeding device 1 and the discharging device 6 and the rotating end of the drum 2 are sealed.
  • the surface is greatly reduced, and the sealing can be performed by a common sealing member, and the sealing is simple, and the sealing performance is improved.
  • the oscillating rotary kiln in this embodiment further includes a movable duct assembly 5 connected to the drum 2 for fluid material or heat source to enter and exit the drum.
  • the movable duct assembly 5 itself can be bent and turned. Or, the number of the movable duct assemblies 5 is determined according to actual process requirements, and is not specifically limited herein. Since the drum 2 reciprocates only within a certain arc, it does not connect in a single direction.
  • the rotation is continued, so that the movable duct assembly 5 which can be bent, turned or rotated can be directly mounted on the drum 2, and the movable duct assembly 5 is not wound on the drum 2 due to the swing of the drum 2, restricting the swing of the drum 2, through the activity
  • the conduit assembly 5, the fluid medium can be directly in and out of the drum 2, which is more conducive to the handling of the material.
  • the movable duct assembly 5 is directly disposed on the drum 2, and the fluid material and the heat source can directly enter and exit the drum 2, and do not need to pass through the burner head and the furnace tail as in the prior art, and therefore, do not pass through the sealing surface surrounding the drum 2.
  • the leakage of the fluid material is reduced, and the sealing performance of the rotary furnace is further improved.
  • the oscillating rotary kiln in the present invention has two structural forms, as shown in FIG. 15 to FIG. 24, and the oscillating rotary kiln in FIGS. 15-17 and 23 is a concentric oscillating rotary kiln, that is, the rotation of the oscillating rotary kiln.
  • the axis A coincides with the axis B of the drum 2, and the oscillating rotary kiln in FIGS.
  • the rotation axis A of the oscillating rotary kiln does not coincide with the axis B of the drum 2, and the drum 2
  • the axis B reciprocally oscillates about the rotation axis A of the eccentric oscillating rotary kiln;
  • the eccentric oscillating rotary furnace is divided into two forms according to the position of the rotation axis A, one is an eccentric oscillating rotary kiln in the cylinder as shown in FIG.
  • the rotation axis A of the swing rotary furnace is located inside the drum 2; the other is the outer eccentric swing rotary furnace shown in FIG.
  • the rotation axis A of the outer eccentric swing rotary furnace is located outside the drum 2, this embodiment
  • the axis of rotation A is located below the exterior of the drum 2 to facilitate the placement of the support means, the drive means and the movable conduit assembly 5.
  • the structures of the concentric oscillating rotary kiln, the eccentric oscillating rotary kiln in the cylinder and the eccentric oscillating rotary kiln outside the cylinder are substantially similar, but differ in the shape of the drum 2, the driving device, the supporting device, and the discharging device 6.
  • the eccentric oscillating rotary kiln is further provided with a counterweight weighting block 15, preferably, the center of gravity axis of the counterweight weighting block 15 and the center of gravity axis of the drum 2 are opposite to the axis of rotation of the oscillating rotary kiln
  • an embodiment of the present invention provides an active baffle assembly applied to an oscillating rotary kiln, hereinafter referred to as an active baffle assembly, which includes a baffle 141, a movable baffle 142, and a movable connecting rod. 143 and a link driving device 146; wherein the partition plate 141 is fixed in the drum 2 of the swing type rotary kiln, the partition 141 is provided with an opening 149, and the opening 149 is located in the moving area of the solid material in the drum 2.
  • the solid material can pass through the partition 141 through the opening 149, and the angle between the plate surface of the partition plate 141 and the axis of the drum 2 is 45° to 135°, that is, within a range of positive and negative inclination of 45° of 90°. More preferably, it is 85° to 95°; the movable baffle 142 is disposed parallel to the plate surface of the partition plate 141 and abutting against the one side surface of the partition plate 141 to maintain the seal between the movable baffle 142 and the partition plate 141, and the movable block The plate 142 is movable relative to the partition 141 for closing the opening 149 of the partition 141.
  • the movable baffle 142 is sized to completely cover the opening 149 of the partition 141; one end of the movable link 143 is connected to the movable baffle 142. Fixedly connected or hinged, the other end of the movable link 143 can pass through the wall of the drum 2 and is connected to the link driving device 146 on the cylinder of the drum 2, and the movable link 143 is driven by the link driving device 146 at the drum 2 Wear it inside and out.
  • the working process of the above movable partition assembly is as follows: as shown in FIGS. 2 and 3, when the solid material is required to pass through the opening 149 of the partition 141, the movable link 143 is driven by the link driving device 146 to move away from the partition 141.
  • the opening 149 moves on one side, thereby driving the movable baffle 142 to move away from the opening 149 of the partition 141, the opening of the partition 141 is opened, and the solid material in the drum 2 is oscillated under the reciprocating swing of the inclined drum 2 when the opening 149 is swung.
  • the solid material passes through the partition 141 through the opening 149 and enters the subsequent drum section.
  • the opening of the partition opening 149 is controlled to control the flow of the solid material.
  • the purpose of speed When the opening 149 is swung to a higher position, the solid material falls along the wall of the tube and cannot pass through the opening 149. At this time, the opening 149 communicates the gas phase region on both sides of the partition plate 141, and the gas phase material can pass through the opening 149, and the drum 2 can be seen to reciprocate.
  • the movable partition assembly with the opening 149 open allows the solid phase material and the gas phase material to pass, realizing the partitioning of the drum 2.
  • the movable link 143 When it is necessary to prevent the material from passing through the partition opening 149, the movable link 143 is pushed by the link driving device 146 to move to the side close to the partition opening 149, thereby pushing the movable baffle 142 to close the partition opening 149 by controlling The time when the movable baffle 142 closes the partition opening 149 realizes the residence time and the stack height of the drum section of the solid phase material before the movable partition assembly, and meets the process requirements of different processes.
  • the movable partition assembly further includes a sealing device 145 disposed at a position of the cylinder wall of the drum 2 passing through the movable link 143, and the movable link 143 is passed through the sealing device 145.
  • the sealing gap with the cylinder wall of the drum 2 is sealed to prevent the material in the drum 2 from leaking from the place, thereby further ensuring the stability of the working environment in the drum 2.
  • the sealing device 145 may employ a packing sealing device, a mechanical sealing device, or the like. Of course, it is also possible not to provide the sealing device 145 through the movable link 143.
  • the fitting precision with the drum 2 achieves a certain seal, but the sealing effect without the sealing device 145 is good.
  • the partition plate 141 is further provided with a gas phase through hole for the communication of the gas phase material in the gas phase region of the drum to meet the requirements of certain processes.
  • the two gas phase through holes are divided into a first gas phase through hole 147.
  • the movable baffle 142 does not close the opening 149 of the partition plate 141, the movable baffle The first gas phase through hole 147 is closed; the other is the second gas phase through hole 148.
  • the movable baffle 142 does not close the opening 149 of the partition 141, the movable baffle 142 does not close the second gas phase through hole 148.
  • a first vapor phase through hole 147 or a second gas phase through hole 148 may be disposed on the partition plate 141.
  • the first gas phase through hole 147 is disposed on the partition 141, the first gas phase through hole 147 is simultaneously closed when the movable baffle 142 opens the partition opening 149, and the gas phase material is prevented from passing through the first gas phase through hole 147, thereby improving the partition. 141 partition effect. If the second vapor phase through hole 148 is provided in the partition 141, the gas phase material can always pass through the second gas phase through hole 148 regardless of whether the movable baffle 142 opens the partition opening 149, and is suitable for some processes that require gas phase circulation.
  • the movable partition assembly further includes a link stabilizing member 144, and the connecting rod stabilizing member 144 is disposed on the partition 141, specifically a ring-shaped limiting structure, and is movable.
  • the outer periphery of the movable link 143 is sleeved on the periphery of the movable link 143 to prevent the movable link 143 from moving to the periphery during the movement due to the reciprocal swing of the drum 2, thereby improving the movement of the movable shutter 142.
  • the stability and accuracy enable the flapper 142 to effectively close the bulkhead opening 149.
  • the link stabilizing member 144 may not be provided, but the stationary movement of the movable link 143 and the link driving device 146 may be achieved.
  • the link driving device 146 is a manual driving device or an automatic driving device, and the automatic driving device and the detecting control device of the oscillating rotary kiln are connected by wires. Since the movable partition assembly is applied to the oscillating rotary kiln, the link driving device 146 on the drum 2 can be connected to the detection control device outside the drum 2 by wires without entanglement of the wires. The automatic drive is controlled by the detection control device controlling the link driving device 146, saving labor. Further, the movable bulkhead assembly further includes a position sensor for detecting the position of the movable shutter 142 within the drum 2, the position sensor being connected to the detection control device by a wire.
  • the position information of the movable baffle 142 is detected by the position sensor, and the position information is transmitted to the detection control device to detect
  • the control device controls the automatic drive to drive or stop based on the position information to cause the flapper 142 to reach the designated position. Automated control of the active bulkhead assembly is achieved.
  • an insulating layer is provided on the outside and/or inside of the partition 141. That is, an outer thermal insulation layer is disposed on the two sides of the partition plate 141, or a thermal insulation interlayer is disposed in the partition plate 141, or an outer thermal insulation layer and a thermal insulation interlayer are simultaneously provided to realize temperature isolation of the two process segments to better complete The reaction of the respective process sections.
  • the embodiment of the invention further provides an oscillating rotary kiln, which is partitioned or segmented on the basis of another oscillating rotary kiln applied for on the same day, capable of swinging in one swing A number of processes are better accomplished in a rotary furnace.
  • the basic structure of another oscillating rotary kiln applied on the same day as the application has been described above, and will not be described herein.
  • the oscillating rotary kiln in the present application further includes at least one of the above embodiments.
  • the movable baffle assembly and/or the at least one fixed baffle 14; that is, at least one movable baffle assembly may be separately provided in the drum 2, or at least one fixed baffle 14 may be separately provided, or both.
  • the fixed partition plate 14 is fixed in the drum 2, and the fixed partition plate 14 is provided with an opening 149.
  • the opening 149 is located in the moving area of the solid material in the drum 2, and has the same structure as the partition plate 141 of the movable partition plate assembly, and the fixed partition plate is fixed.
  • the angle between the plate surface of 14 and the axis of the drum 2 is 45 to 135, and the angle is more preferably 85 to 95.
  • the oscillating rotary kiln of the present application can divide the drum 2 by a separately disposed fixed partition 14, partially restrict the convection of the gas phase material in the gas phase region, maintain a temperature gradient, and allow the solid phase material to pass through the opening.
  • the oscillating rotary kiln of the present application performs the division of the drum 2 by the movable partition assembly.
  • the opening 149 of the partition 141 is opened by the movable baffle 142, and the movable baffle assembly for partitioning may also be provided with the first vapor phase through hole 147 or the second gas phase through hole 149 on the partition plate 141.
  • the movable baffle assembly controls the movable baffle 142 according to actual process requirements. By controlling the closing and opening of the baffle opening 149 or controlling the opening degree, the stacking height of the solid material in the drum section before the movable baffle assembly can be controlled. Residence time to meet different process needs. It is also possible to perform the partitioning in the segmented drum 2 by the combination of the movable partition plate assembly and the fixed partition plate 14, which is set according to different process requirements, and is not specifically limited herein.
  • the oscillating rotary kiln uses an active baffle assembly and/or a fixed baffle 14, it can be more It is better to partition the different processes in the drum 2 to better meet the reaction conditions of the various processes.
  • the oscillating rotary kiln further includes a baffle cymbal 21 fixed to the solid phase region of the drum 2, and the baffle cymbal 21 has a certain height, and the baffle cymbal 21 has a plate surface.
  • the angle between the axis of the drum 2 and the axis of the drum 2 is 45° to 135°, and the angle is more preferably 85° to 95° for increasing the accumulation of solid materials on the side of the baffle weir 21 facing away from the discharge end of the drum 2.
  • the height and the residence time that is, the accumulation height and the residence time of the solid material of the upstream drum section of the baffle ⁇ 2 are blocked by the baffle ⁇ 21 when the solid material reaches the baffle ⁇ 21, only when the height of the solid material
  • the height of the baffle ⁇ 21 is higher, the solid material can continue to move to the downstream drum section, thereby increasing the stacking height and residence time of the solid material, and meeting the reaction requirements of certain processes.
  • the baffle plate 21 is disposed on the side of the fixed partition plate 14 facing the discharge end corresponding to the fixed partition plate 14, and the baffle plate 21 is disposed corresponding to the opening 149 of the fixed partition plate 14, that is, the baffle plate 21 It is preferably located behind the opening 149 of a certain fixed partition 14.
  • the material located before the fixed baffle 14 increases the stacking height of the solid material while being partitioned, which is more favorable for the process reaction.
  • the baffle cassette 21 can also be used alone.
  • the height of the baffle 21 is higher than the height of the opening 149 of the fixed partition 14.
  • the purpose of this arrangement is that the solid material accumulates in front of the baffle 21 after passing through the opening 149 of the fixed partition 14 until the opening 149 is partially or completely blocked, thereby improving the partitioning effect of the fixed partition 14.
  • the oscillating rotary kiln in this embodiment further includes a movable baffle assembly including a movable baffle 211, a lifting rod 212, and a second sealing device 214.
  • the lifting drive device 215 wherein the angle between the plate surface of the movable baffle 211 and the axis of the drum 2 is 45° to 135°, the angle is more preferably 85° to 95°, and one end of the lifting rod 212 is movable.
  • the baffle weir 211 is connected, the other end passes through the wall of the drum 2, and is connected to the lifting drive 215, and a second sealing device 214 is disposed at a position where the lifting rod 212 passes through the drum 2.
  • a circumferential limiting structure is arranged at a position where the lifting rod 212 is connected with the drum 2.
  • the lifting rod 212 is a non-round rod, and the hole on the drum 2 that cooperates with the lifting rod 212 is a non-round hole;
  • the rod 212 is a round rod, and a positioning groove is arranged on the round rod along the axial direction thereof, and a portion corresponding to the drum 2 is provided with a positioning protrusion.
  • the lifting rod 212 is driven by the lifting and lowering device 215 to move up and down in the drum 2, and then
  • the movable baffle 211 is lifted and lowered in the solid phase region, and the movable baffle 211 can block in the solid phase region of the drum 2, and has the same function as the baffle plate 21, in order to increase the solid material in front of the movable baffle ⁇ 211.
  • the movable baffle assembly further includes a lifting rod stabilizing member 213, and the lifting rod stabilizing member 213 is fixed on the inner wall of the drum 2, and specifically includes a rod member and at least one ring-shaped limiting member fixed on the rod member, lifting The rod stabilizing member 213 is movably sleeved on the outer periphery of the elevating rod 212 to restrict the movement of the elevating rod 212 to the periphery, which can improve the stability and the movement accuracy of the movable baffle 211 during the swing of the drum 2.
  • the lifting rod stabilizing member 213 may not be provided, but the fixing between the lifting rod 212 and the elevation driving device 215 may be stabilized.
  • the elevation driving device 215 is an automatic lifting driving device or a manual lifting driving device, and the automatic lifting driving device and the detecting control device are connected by wires.
  • the movable baffle assembly further includes a position sensor for detecting the position of the movable baffle 211 in the drum 2, the position sensor and the detecting control device are connected by wires, and the position sensor will position the movable baffle 211 It is transmitted to the detection control device, and the detection control device controls the driving and stopping of the elevation driving device 215 to improve the movement accuracy of the movable shutter 211 and realize automatic control.
  • the difference between the movable baffle assembly and the movable baffle assembly is that there is no partition 141, and only the solid phase material can be blocked, and the movable baffle assembly can be combined with the movable baffle assembly, the fixed baffle 14, and the baffle plate 21
  • the setting is set according to the specific process requirements, and is not specifically limited herein.
  • the outer insulating layer and/or the fixed partition 14 are disposed on both sides of the fixed partition 14 to be provided with a heat insulating interlayer, and the outer insulating layer and/or the insulating interlayer may be applied to adjacent processes.
  • the situation of larger temperature difference improves the partitioning effect.
  • an movable baffle assembly can also be used to segment the drum 2 in cooperation with the baffle 21, and at this time, the partition plate 141 of the movable baffle assembly does not have a gas-permeable through hole, and the movable baffle assembly passes through the movable baffle assembly.
  • the automatic driving device, the position sensor of the swing control device and the detecting control device realize segmentation, specifically: the baffle plate 21 is disposed on a side of the movable baffle assembly facing the discharge end, and the baffle plate 21 corresponds to the movable baffle assembly
  • the opening 149 of the partition 141 is disposed at a position, and the height of the baffle 21 is higher than the opening of the partition 141 Port 149 height.
  • the position sensor detects the swing position information of the drum 2, and when it is detected that the drum 2 is swung to the lower position of the opening 149 of the partition 141, the solid material is located at the position of the opening 149, and the position sensor transmits the position information to the detection.
  • the control device controls the automatic drive of the movable bulkhead assembly to open the opening 149, and the solid material can pass through the opening 149, since the side of the opening 149 facing the discharge end is blocked by the baffle 21 disposed adjacent to the opening 149 Only when the solid material has a higher accumulation height at the opening 149 than the baffle ⁇ 21, the opening 149 is always filled with the solid material during the passage of the solid material through the opening 149, and therefore, the opening 149 can only allow the solid material to pass.
  • the gas phase material cannot pass through the opening 149; when the position sensor detects that the swinging rotary furnace is swung to the upper position (ie, the gas phase region) of the opening 149 of the partition 141, the solid material is located at a lower position of the drum 2, and the opening 149 The gas phase zone on both sides of the partition 141 can be connected. At this time, the position sensor transmits the position information to the detection control device. Detecting an automatic control means controls drive means, the opening 149 is closed to prevent gas communication area.
  • the fixed baffle 14 can also be disposed in the segmented drum segment in the movable baffle assembly and the baffle plate 21 to realize the partitioning in the segmented drum 2, and the setting is performed according to different process requirements, and no specificity is made here. limited.
  • segmentation of the drum 2 can also be achieved by the following types of segmented baffles:
  • the oscillating rotary kiln comprises at least one segmented baffle set disposed within the drum 2, each segmented baffle set comprising at least two fixed baffles 14 and at least one baffle ⁇ 21, with a segmented baffle set below
  • the fixed partition 14 and the baffle 21 in the segmented baffle set are disposed adjacent to each other, and the openings 149 of the fixed baffle 14 are offset from each other.
  • FIGS. 12-16 show three fixed baffles. 14
  • the fixed partition 14 can also be used in combination of two, four or more.
  • a side of each of the fixed partitions 14 facing the discharge end is disposed adjacent to a baffle 21, and the baffle 21 is disposed corresponding to the opening 149 of the fixed partition 14, and the height of the baffle 21 is higher than the height of the opening 149.
  • only one side of the fixed partition 14 facing the discharge end near the discharge end (shown as the rightmost side of each segmented partition group) is provided with a baffle ⁇ 21, and the baffle ⁇ 21
  • the opening 149 of the partition 14 is fixed in position, and the height of the baffle 21 is higher than the height of the opening 149 of the fixed partition 14.
  • the three fixed partitions 14 and one baffle 21 are combined as an example.
  • the second fixed partition When the solid material passes through the opening 149 of the first fixed partition 14, the second fixed partition is used.
  • the opening 149 of the 14 is offset from the opening 149 of the first fixed partition 14.
  • the opening 149 of the second fixed partition 14 When the opening 149 of the first fixed partition 14 is swung into the gas phase region, the opening 149 of the second fixed partition 14 is located in the solid phase region.
  • the solid material falls to the opening 149 of the second fixed partition 14, the solid material passes through the opening 149 of the second fixed partition 14, the drum 2 continues to swing, and the opening 149 of the second fixed partition 14 swings to the gas phase
  • the solid material falls to the opening 149 of the third fixed partition 14
  • the solid material passes through the opening 149 of the third fixed partition 14, and the baffle ⁇ 21 is disposed behind the opening 149 of the third fixed partition 14.
  • the solid material is deposited at the opening 149 of the third fixed partition 14 to close the opening 149 of the third fixed partition 14 to form a certain sealing effect on the opening 149 of the fixed partition 14 by the solid material itself.
  • three 149 given partition opening 14 has at least one closed, the gas phase material can not pass through the opening 149, by allowing only solid material, thereby achieving a segment of the drum 2.
  • a baffle ⁇ 21 is disposed between the adjacent fixed partitions 14 , and the segmentation of the drum 2 can also be achieved. The principle is the same as above, and details are not described herein again.
  • a movable baffle assembly can be used on the far right side of the plurality of fixed partitions 14 instead of the baffle cover 21, in order to achieve the same function as the baffle cover 21, the movable baffle assembly always blocks in the solid phase region. .
  • each of the segmented baffle groups may also be composed of at least one movable baffle assembly disposed adjacent to each other, at least one fixed partition 14 and at least one baffle 21, the activity
  • the gas barrier through holes are not provided in the partition plate 141 of the partition plate assembly, and the movable partition plate assembly of each of the segmented partition plate groups and the opening 149 of the fixed partition plate 14 are offset from each other.
  • a segmented baffle set is taken as an example.
  • Each of the fixed baffles 14 of the segmented baffle set and the side of the baffle 141 of each movable baffle assembly facing the discharge end are disposed adjacent to each other.
  • the plate ⁇ 21; or the baffle ⁇ 21 is only disposed on the side of the segmented baffle group near the discharge end (shown as the rightmost side in the figure), and if the rightmost side is the movable baffle assembly, the baffle ⁇ 21 is set Behind the movable partition plate assembly, if the rightmost side is the fixed partition 14 , the baffle plate 21 is disposed behind the fixed partition 14 .
  • the baffle ⁇ 21 is disposed corresponding to the position of the opening 149, and the height of the baffle ⁇ 21 is higher than the height of the opening 149.
  • the working principle is the same as the combination of the plurality of fixed partitions 14, and will not be described herein again.
  • the present invention Compared with the combination of the plurality of fixed partitions 14, the present invention
  • the opening and closing or opening of the movable shutter 142 can be controlled, and the solid materials in the drum section before the segmented partition group are controlled while the segmentation is performed. Residence time to meet process requirements. It is also possible to provide a movable baffle assembly only on the far right side of the segmented baffle set, instead of the baffle 21, the movable baffle assembly is always blocked in the solid phase zone, and segmentation is also possible.
  • each of the segmented baffle groups may also be composed of only a plurality of movable baffle assemblies. That is, each segmented baffle set includes at least two movable baffle assemblies disposed adjacent one another. Taking a segmented baffle group as an example, regardless of the angle at which the drum 2 is swung, through the alternate opening and closing of the opening 149 of the movable baffle assembly, and ensuring that at least one opening is closed, the gas phase material cannot pass the sub-point.
  • the opening 149 of the segment separator group allows only solid material to pass through, achieving segmentation.
  • each of the segmented baffle sets when each of the segmented baffle sets is composed of a plurality of movable baffle assemblies, it can also be used in conjunction with the baffle cassettes 21. That is, each of the segmented baffle sets includes at least two movable baffle assemblies and at least one baffle 21 disposed adjacent to each other, and the openings 149 of the movable baffle assembly of each of the segmented baffle sets are offset from each other, maintaining a partition The opening 149 of the plate 141 is opened, and a segmented baffle group is taken as an example.
  • each movable baffle assembly facing the discharge end is adjacent to a baffle ⁇ 21; or only one activity near the discharge end
  • a baffle 21 is disposed adjacent to a side of the baffle assembly facing the discharge end.
  • the baffle ports 21 of the above two cases are disposed corresponding to the opening 149 of the movable baffle assembly, and the height of the baffle plate 21 is higher than the height of the opening 149 of the movable baffle assembly.
  • the working principle is the same as that of the segmented baffle group composed of a plurality of fixed partitions, and details are not described herein again.
  • segmented baffles can be used in any combination in a swing type rotary kiln.
  • the inner diameter of the partial process section cylinder of the drum 2 is larger than the inner diameter of the remaining process section cylinders for increasing the accumulation of solid materials in the part of the process section. Height and length of stay.
  • the process section of the C-C section in Fig. 5 is the diameter expansion process section, and the outer diameter of the process section where the C-C section is located is larger than the outer diameter of the process section where the D-D section is located.
  • the inner diameter of the cylinder corresponding to the solid material moving region of the process section is shown in Fig. 6 to increase only the inner diameter of the lower portion of the cylinder of the drum 2 (i.e., the cylinder of the solid phase zone).
  • the expanded diameter roller structure may be separately used in the process section, or may be combined with the baffle ⁇ 21 and the movable baffle ⁇ component, which is to be blocked.
  • the plate 21 or the movable baffle assembly is disposed on the variable diameter step of the expanding process section near the discharge end.
  • the expanded roller structure, the baffle plate 21, and the segmented baffle group may be disposed in one process section at the same time, or may be disposed in different process sections in any combination, such as segmentation.
  • the baffle set is disposed in the expanded diameter process section, and the baffle plate 21 of the segmented baffle set can be replaced by the variable diameter step of the expanded diameter process section, as long as the height of the variable path step is higher than the opening of the segmented baffle set 149 The height can be, as shown in FIG.
  • the material at the opening 149 is blocked by the variable step; or the baffle plate 21 of the segmented baffle set is placed on the variable step, by the baffle 21 and The variable steps collectively block the solid material at the opening 149. It is set according to the specific process requirements, and is not specifically limited herein.
  • the oscillating rotary kiln of the present invention divides or segments different processes in the drum 2 by various zoning and segmentation methods, and can better realize the reaction of each process.
  • the above division and segmentation methods are applicable to the concentric oscillating rotary furnace, the eccentric oscillating rotary furnace in the cylinder and the eccentric oscillating rotary furnace outside the cylinder.
  • the drum 2 of the concentric swing rotary kiln is preferably cylindrical, closed at both ends, and the feeding device 1 and the discharging device 6 are respectively rotationally and sealingly connected to the end faces of the both ends of the drum 2.
  • the embodiment provides a driving device and a supporting device for a concentric oscillating rotary kiln.
  • the driving device is a concentric gear ring gear driving device
  • the supporting device is a concentric roller support device; wherein, the concentric roller
  • the support ring supporting device comprises at least two sets of support rings 3 and a support wheel 12, and the support ring 3 is fixed on the outer peripheral wall of the drum 2.
  • the axis of the support ring 3 coincides with the axis B of the drum 2, and the outer ring surface of the support ring 3 is supported.
  • the wheel 12 contacts the support, the roller 12 is located below the support ring 3, the rotation axis position of the roller 12 is fixed, and one support ring 3 corresponds to at least one support roller 12, preferably two support rollers 12, for supporting the roller 2.
  • Rotating, the two sets of the support ring 3 and the idler 12 are preferably disposed near the ends of the drum 2, and the support is more stable.
  • Concentric gear ring gear drive The at least one set of the ring gear 4, the driving gear 11 and the power component 10 are fixed.
  • the ring gear 4 is fixed on the outer peripheral wall of the drum 2.
  • the axis of the ring gear 4 coincides with the axis B of the drum 2, and the ring gear 4 meshes with the driving gear 11.
  • the driving gear 11 is drivingly connected with the power component 10, and the power component 10 may be a motor or a hydraulic motor. If the power component 10 is a motor, the driving gear 11 and the motor are driven and connected through a speed reducer. If the power component 10 is a hydraulic motor, the driving gear is driven. 11 can be connected directly to the hydraulic motor or via a gearbox.
  • the power component 10 and the swing control device are connected by wires, and the swing control device controls the rotation direction of the power member 10, and the power member 10 drives the drive gear 11 to reciprocate, thereby driving the ring gear 4 and the drum 2 to reciprocate around the rotation axis A.
  • the ring gear 4 can be composed of the support ring 3 and the toothed ring, that is, the toothed ring is fixed on either side of the support ring 3 perpendicular to its axis, and the toothed ring rotates together with the support ring 3 to form the ring gear 4 Therefore, the manufacture of the ring gear 4 can utilize the support ring 3, which reduces manufacturing difficulty and manufacturing cost, and the support ring 3 to which the toothed ring is fixed can continue to be supported with the support roller 12; or the toothed ring is fixed on the support ring.
  • a ring gear 4 is formed on the outer ring.
  • the structure of the ring gear 4 is particularly suitable for use in eccentric oscillating rotary kiln, as is the concentric oscillating rotary kiln.
  • the ring gear 4 can also be manufactured separately, as a unitary structure.
  • this embodiment provides a driving device and a supporting device for another concentric oscillating rotary furnace.
  • the driving device is a concentric push rod driving device
  • the supporting device is a concentric supporting roller supporting device; wherein the concentric supporting bracket
  • the ring supporting device comprises at least one set of support ring 3 and the supporting wheel 12; the supporting ring 3 is fixed on the outer peripheral wall of the drum 2, and the axis of the supporting ring 3 coincides with the axis B of the drum 2; the outer ring surface of the supporting wheel 12 is supported
  • the ring 3 supports the contact, the idler 12 is located at the lower portion of the support ring 3, and the position of the support roller 12 is fixed differently for rotating the support support ring 3; one support ring 3 preferably meshes with the two support rollers 12, more preferably including
  • the two sets of the support ring 3 and the support wheel 12 are respectively located at the two ends of the drum 2, and the support is more stable.
  • the concentric push rod driving device includes at least one telescopic cylinder 19, and the telescopic rod of the telescopic cylinder 19 is hinged with the drum 2.
  • the fixed end of the telescopic cylinder 19 is hinged with the fixed table, and the drum 2 is reciprocally oscillated by the expansion and contraction of the telescopic rod.
  • the outer wall of the drum 2 is provided with a hinge frame 20, and the hinge frame 20 projects outward in the radial direction of the drum 2.
  • the telescopic rod of the telescopic cylinder 19 is hinged to the outer end of the hinge frame 20, so that the telescopic rod can be prevented from being stretched.
  • the roller 2 was encountered during the process.
  • two telescopic cylinders 19 are preferably used, and the two articulated frames 20 are correspondingly arranged, and the two articulated frames 20 are arranged symmetrically with respect to the axis B of the drum 2.
  • the telescopic rods of the two telescopic cylinders 19 are respectively connected with the upper and lower hinge frames.
  • the telescopic rods of the two telescopic cylinders 19 are respectively hinged to the drum 2
  • the lines between the two fixed stages are horizontally arranged and symmetrical with respect to the axis of rotation A of the concentric oscillating rotary kiln, and the reciprocating oscillation of the drum 2 is realized by the alternating expansion and contraction of the two telescopic cylinders 19.
  • the number of the telescopic cylinders 19 may be one, three or more.
  • the position of the telescopic cylinders 19 is arranged according to actual conditions, and is not limited to the form exemplified in the embodiment, as long as the reciprocating swing of the drum 2 can be realized. Just fine.
  • the present embodiment provides a driving device and a supporting device for a third concentric oscillating rotary kiln.
  • the driving device is at least one set of concentric idler ring supporting devices
  • the supporting device is a plurality of sets of concentric supporting ring support.
  • the device includes a support ring 3 and a support roller 12, and the support ring 3 is fixed on the outer peripheral wall of the drum 2, and the axis of the support ring 3 coincides with the axis B of the drum 2;
  • the outer ring surface of the support 12 is in contact with the support ring 3, and the support roller 12 is located at the lower portion of the support ring 3.
  • the position of the support roller 12 is fixed differently for rotating the support support ring 3; one support ring 3 is preferably coupled to the two support rollers 12 In conjunction with the support, more preferably, two sets of the support ring 3 and the support roller 12 are included, and are respectively located at both ends of the drum 2, and the support is more stable.
  • the concentric roller support device includes a support ring 3, a support roller 12 and a power component 10, and the support ring 3 is fixed on the outer peripheral wall of the drum 2, and the axis of the support ring 3 coincides with the axis B of the drum 2;
  • the outer ring surface is in contact with the support ring 3, the support wheel 12 is located at the lower part of the support ring 3, and the position of the support wheel 12 is fixed differently for rotating the support support ring 3; one support ring 3 preferably cooperates with the two support rollers 12
  • the power component 10 is drivingly connected to the idler 12, and the power component 10 drives the roller 12 to reciprocately rotate.
  • the static friction between the roller 12 and the support ring 3 drives the support ring 3 to reciprocate and swing, thereby causing the drum 2 to reciprocate.
  • This embodiment provides a swing control device for a specific concentric swing rotary furnace, which includes a position sensor and an electric control cabinet 9.
  • the position sensor is fixed on the drum 2 or the supporting device for monitoring the arc of the reciprocating swing of the drum 2, and sends the position information of the swinging of the drum 2 to the electric control cabinet 9; the electric control cabinet 9 and the position sensor and the driving device pass
  • the electric wire control cabinet 9 is configured to receive the position information of the position sensor.
  • the position information is the limit position of the rotation of the drum 2, that is, when the maximum swinging arc of the drum 2 in one direction is reached
  • the electric control cabinet 9 controls the motor 10 to change the rotation direction.
  • the electric control cabinet controls the telescopic direction of the telescopic cylinder 19 to realize the reciprocating swing of the control drum 2.
  • the arc of the reciprocating oscillation of the concentric oscillating rotary furnace is generally 90° to 360°, and the optimum angle ranges from 180° to 270°.
  • the swing control device only controls the drive device through a program
  • the action sets the number of revolutions and speed of the drive gear 11 or the idler 12 in one direction, or sets the stroke and speed of the telescopic cylinder 19, the number of revolutions or strokes and the swing of the drum 2
  • the swing control device automatically controls the motor 10
  • the direction of rotation is changed, or the telescopic cylinder 19 is controlled to change the direction of expansion and contraction, and the reciprocating oscillation of the drum 2 is achieved, and a defined swinging arc is achieved.
  • the swing control device can also adopt other structural forms as long as the reference point drift of the drum 2 to reciprocate in a certain arc range and the drum swing does not occur can be realized.
  • the embodiment provides a driving device and a supporting device for an eccentric oscillating rotary kiln.
  • the driving device is an eccentric gear ring gear driving device
  • the supporting device is a supporting roller supporting device
  • the supporting roller supporting device is only Applicable to the eccentric oscillating rotary furnace outside the cylinder, so the driving device and the supporting device combined with the supporting roller supporting device are only suitable for the eccentric oscillating rotary furnace outside the cylinder;
  • the eccentric gear ring gear driving device comprises the ring gear 4, the driving gear 11 and the power
  • the ring gear 4 is fixed on the outer wall of the drum 2, and the axis of the ring gear 4 coincides with the rotation axis A of the eccentric oscillating rotary furnace, the ring gear 4 meshes with the driving gear 11, and the driving gear 11 is drivingly connected with the power component 10.
  • the power component 10 is the same as the concentric oscillating rotary kiln, and will not be described herein.
  • the power component 10 is connected to the swing control device wire, the swing control device controls the rotation direction of the power component 10, the power component 10 drives the drive gear 11 to rotate, and the drive gear 11 drives the ring gear 4 and the drum 2 to reciprocate around the rotation axis A of the eccentric swing rotary furnace. swing.
  • the support roller supporting device comprises at least two sets of support frames 17 and support rollers 16, wherein the support frame 17 is fixed, the support roller 16 is rotatably coupled to the support frame 17, and the rotation axis of the support roller 16 and the rotation of the eccentric oscillating rotary kiln
  • the axis A coincides, the bottom of the drum 2 is fixedly coupled to the support roller 16, and the counterweight weight 15 is fixed to the support roller 16, preferably, the center of gravity axis of the counterweight weight 15 is eccentrically oscillated with the center of gravity of the drum 2
  • the axis of rotation A is symmetrically arranged, and the two sets of support frames 17 and support rollers 16 are preferably disposed adjacent to the ends of the drum 2, respectively, to make the support more stable.
  • this embodiment provides a driving device and a supporting device for another eccentric oscillating rotary kiln.
  • the driving device is an eccentric gear ring gear driving device
  • the supporting device is an eccentric idler ring supporting device, the driving device and
  • the combination of the supporting devices can be applied to the eccentric oscillating rotary kiln in the cylinder and the eccentric oscillating rotary kiln outside the cylinder.
  • the eccentric gear ring gear driving device comprises a ring gear 4, a driving gear 11 and a power component 10
  • the eccentric gear ring gear driving device in this embodiment is the same as the eccentric gear ring gear driving device in FIG. 20, and details are not described herein again.
  • the eccentric idler support device includes at least two sets of support rings 3 and a support wheel 12, and the support ring 3 is fixed on the outer peripheral wall of the drum 2, and the axis of the support ring 3 coincides with the rotation axis A of the eccentric oscillating rotary kiln, one support
  • the ring 3 is in contact with at least one of the supporting rollers 12 for supporting the rotation of the supporting ring 3.
  • the supporting ring 3 is provided with a counterweight balancing block 15, and preferably, the center of gravity of the counterweight balancing block 15 is relatively eccentric with the center of gravity of the drum 2.
  • the axis of rotation A of the oscillating rotary kiln is arranged symmetrically. As shown in FIG. 21 and FIG.
  • the ring gear and the support ring may be partially circular or full-circular, that is, the ring gear 4 and the support ring 3 are circular plate structures, and the insert roller 2 is processed on the circular plate.
  • the arcuate notches or round holes, the outer edges of the ring gear 4 and the ring 3 exceed the axis of the drum 2 and approach or exceed the edge of the drum 2 to increase the fixing strength.
  • the driving device and the supporting device of the third eccentric oscillating rotary kiln are provided in the embodiment.
  • the driving device is an eccentric supporting roller supporting device
  • the supporting device is a plurality of sets of eccentric supporting roller driving devices, at least
  • the combination of the driving device and the supporting device can be applied to the eccentric oscillating rotary furnace outside the cylinder and the eccentric oscillating rotary furnace in the cylinder; wherein each set of eccentric idler support device comprises the support ring 3 and the support roller 12,
  • the ring 3 is fixed on the outer peripheral wall of the drum 2, the axis of the support ring 3 coincides with the rotation axis A of the eccentric oscillating rotary furnace, the support wheel 12 is in contact with the outer ring surface of the support ring 3, and the axis of the support roller 12 is fixed.
  • the eccentric idler ring drive device comprises a support ring 3, a support roller 12 and a power component 10, and the power component 10 is drivingly connected with the support roller 12, and the power component 10 drives the support roller 12 to reciprocately rotate, between the support roller 12 and the support ring 3
  • the static friction causes the support ring 3 to reciprocate and swing, thereby causing the drum 2 to reciprocate.
  • the weight 3 is provided on the support ring 3, and preferably, the center of gravity axis of the weight balance block 15 is symmetrically arranged with respect to the axis of gravity of the drum 2 with respect to the axis of rotation A of the eccentric oscillating rotary kiln.
  • the embodiment provides a driving device and a supporting device for a fourth eccentric oscillating rotary kiln.
  • the driving device is an eccentric push rod driving device
  • the supporting device is an eccentric supporting roller supporting device, the driving device and the supporting device.
  • the combination of the device can be applied to the eccentric oscillating rotary furnace outside the cylinder and the eccentric oscillating rotary kiln in the cylinder; wherein the eccentric idler support device comprises at least two sets of the support ring 3 and the support roller 12, and the support ring 3 is fixed on the outer wall of the drum 2.
  • the axis of the support ring 3 coincides with the rotation axis A of the eccentric oscillating rotary furnace, and the outer ring surface of the support ring 3 is in contact with the at least one idler 12 for supporting the rotation of the support ring 3, and the support ring 3 is provided with a weight balance block 15, preferably, the center of gravity axis of the weight balance block 15 is symmetrically arranged with respect to the axis of gravity of the drum 2 with respect to the axis of rotation A of the eccentric oscillating rotary kiln.
  • the eccentric push rod driving device includes a telescopic cylinder 19, and the number of the telescopic cylinders 19 is preferably two, symmetrically arranged on both sides of the drum 2, the end of the telescopic rod of the telescopic cylinder 19 is hinged with the bracket 3, and the telescopic cylinder 19 is fixed.
  • the end is hinged to the fixed table, and the two points of the telescopic rods of the two telescopic cylinders 19 and the bracket 3 are symmetrical with respect to the vertical diameter of the bracket 3, and the fixed ends of the two telescopic cylinders 19 are located at the same same as the two hinge points of the fixed table.
  • the expansion and contraction of the telescopic rods of the two telescopic cylinders 19 causes the support ring 3 to reciprocately rotate, thereby driving the drum 2 to reciprocate.
  • the number of the telescopic cylinders 19 may also be one, two, three or more. The position of the telescopic cylinder 19 is determined according to the actual situation as long as the drum 2 can be reciprocally oscillated.
  • this embodiment provides a driving device and a supporting device for a fifth eccentric oscillating rotary kiln.
  • the driving device is an eccentric push rod driving device
  • the supporting device is a supporting roller supporting device
  • the supporting device adopts a supporting roller supporting device.
  • the combination of the driving device and the supporting device is only applicable to the outer eccentric oscillating rotary drum; wherein the supporting roller supporting device comprises at least two sets of support frames 17 and supporting rollers 16, which are the same as the supporting roller supporting device in FIG. This will not be repeated here.
  • the counterweight weight 15 is fixed to the support roller 16, and preferably, the center of gravity axis of the counterweight weight 15 is symmetrically arranged with respect to the axis of gravity of the drum 2 with respect to the axis of rotation A of the eccentric slewing furnace.
  • the eccentric push rod driving device comprises an articulated frame 20 and at least one telescopic cylinder 19.
  • the telescopic cylinders 19 are preferably two, symmetrically arranged on both sides of the drum 2, the articulated frame 20 is fixed on the support roller 19, and the two telescopic cylinders 19 are telescopic
  • the rods are respectively hinged with the two ends of the hinge frame 20, and the torque is increased by the hinge frame 20.
  • the fixed ends of the telescopic cylinders 19 are hinged to the fixed table, and the fixed ends of the two telescopic cylinders 19 are located at the same horizontal line as the two hinge points of the fixed table.
  • the expansion and contraction of the telescopic rods of the two telescopic cylinders 19 causes the support roller 16 to reciprocally rotate, thereby driving the drum 2 to reciprocate.
  • the number of the telescopic cylinders 19 may also be one, three or more.
  • the position of the telescopic cylinder 19 is determined according to the actual situation as long as the drum 2 can be reciprocally oscillated.
  • the telescopic cylinder 19 may be an electric telescopic cylinder, a hydraulic telescopic cylinder or a pneumatic telescopic cylinder.
  • the telescopic cylinder 19 is connected to the control device, and the expansion and contraction of the telescopic cylinder 19 is controlled by the control device to realize the reciprocating oscillation of the drum 2.

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Abstract

一种摆动式回转炉的活动隔板组件以及包含该活动隔板组件的摆动式回转炉，包括：隔板（141），用于固定于滚筒（2）内，隔板（141）上设置有开口（149），开口（149）位于滚筒（2）内的固体物料运动区域内；活动挡板（142），平行于隔板（141）的板面并紧贴隔板的一侧板面设置，活动挡板（142）可相对隔板（141）移动，用于封闭隔板（141）的开口（149）；活动连杆（143），一端连接于活动挡板（142）上，另一端可穿过滚筒（2）的筒壁；连杆驱动装置（146），设置于滚筒（2）筒体上且与活动连杆（143）驱动连接。本活动隔板组件中，活动挡板（142）由连杆驱动装置（146）驱动，通过活动连杆（143）带动活动挡板（142）相对隔板（141）移动，封闭或打开开口（149），开口（149）打开可实现滚筒的分区，通过活动挡板调节隔板（141）的开口（149）大小，可以控制固体物料在活动隔板组件之前的工艺段内的停留时间。

Description

摆动式回转炉及其活动隔板组件
本申请要求于2015年11月27日提交中国专利局、申请号为201510848877.0、发明名称为“摆动式回转炉及其活动隔板组件”的中国专利申请的优先权，其全部内容通过引用结合在本申请中。
技术领域
本发明涉及环保、能源、化工设备技术领域，特别涉及一种摆动式回转炉的活动隔板组件。还涉及一种包含该活动隔板组件的摆动式回转炉。
背景技术
在环保、能源、化工生产中，有些物料的转化过程往往需要经过热解、气化、碳化、活化、反应、冷却等流程，而这些流程一般依靠不同的回转炉来进行。现有的回转炉通常由滚筒、炉头和炉尾组成，其中，炉头和炉尾固定不动地环绕滚筒的两端转动密封连接，与滚筒的两端做动静密封，滚筒通过外部驱动装置进行连续地单一方向的旋转。由于现有的回转炉的滚筒连续沿单一方向旋转，无法在滚筒外周壁上安装其它用于工艺反应的装置，因为其它装置需要通过导线或管道与外部设备连接，只能安装在炉头和炉尾，导致滚筒内部工艺不能有效完成，滚筒外壁也不能与外部管道连接，流体物料不能直接从滚筒外壁进出，只能在炉头和炉尾进出，不利于物料在回转炉的中间位置的控制。
为解决上述问题，与本申请同日申请的一篇专利申请文件提供了一种之前没有的摆动式回转炉，摆动式回转炉通过驱动装置、支撑装置、摆动控制装置使滚筒绕摆动轴线只能在一定角度范围内进行往复摆动，从而可以在滚筒外壁上直接设置能够在一定角度范围内活动的管道、导线等有有利于工艺反应的装置，而不会发生管道、导线缠绕在滚筒上，干涉滚筒运动的情况。由于摆动式回转炉在一定角度范围内往复摆动，因此，物料可以在滚筒内形成固相区和气相区，对于某些工艺的组合，各工艺的反应温度有所不同，有时候需要将气相区进行部分分隔，实现分区，即允许固体物料通过，而对气相区的气相物料进 行部分隔断，限制气相物料在滚筒内的不同工艺之间的对流，提高分区之间的温度梯度；而对于某些彼此之间反应工况差异较大的工艺，则需要将气相区进行完全分隔，实现分段，即气相物料不能在滚筒的不同工艺之间流动，而固体物料可以。此外，物料在滚筒内不同工艺之间的反应时间和程度不同，而固体物料在滚筒内的流动速度是一定的，不利于各工艺的控制。
综上所述，如何解决摆动式回转炉内的不同工艺之间的分区，成为了本领域技术人员亟待解决的问题。
发明内容
有鉴于此，本发明的目的在于提供一种摆动式回转炉的活动隔板组件，以对摆动式回转炉内的不同工艺之间进行分区，满足不同工艺的反应要求。
本发明的另一个目的在于提供一种包含该活动隔板组件的摆动式回转炉，能够在该摆动式回转炉一体式完成多种不同工况条件的工艺反应，简化了设备。
为达到上述目的，本发明提供以下技术方案：
一种摆动式回转炉的活动隔板组件，包括：
隔板，用于固定于所述摆动式回转炉的滚筒内，所述隔板上设置有开口，所述开口位于所述滚筒内的固体物料运动区域内；
活动挡板，平行于所述隔板的板面并紧贴所述隔板的一侧板面设置，所述活动挡板可相对所述隔板移动，用于封闭所述隔板的开口；
活动连杆，一端连接于所述活动挡板上，另一端可穿过所述滚筒的筒壁；
连杆驱动装置，设置于所述滚筒筒体上且与所述活动连杆驱动连接。
优选的，在上述的活动隔板组件中，还包括密封装置，所述密封装置设置于所述滚筒筒壁的穿过所述活动连杆的位置。
优选的，在上述的活动隔板组件中，所述隔板上还设置有气相通孔。
优选的，在上述的活动隔板组件中，所述气相通孔在所述隔板上的位置为当所述活动挡板不封闭所述隔板的开口时，所述活动挡板封闭所述气相通孔， 或者所述气相通孔在所述隔板上的位置为当所述活动挡板不封闭所述隔板的开口时，所述活动挡板不封闭所述气相通孔。
优选的，在上述的活动隔板组件中，还包括连杆稳定部件，所述连杆稳定部件设置于所述隔板上，且活动套设于所述活动连杆的外围。
优选的，在上述的活动隔板组件中，所述密封装置为填料密封装置。
优选的，在上述的活动隔板组件中，所述连杆驱动装置为手动驱动装置或自动驱动装置，所述自动驱动装置与检测控制装置通过导线连接。
优选的，在上述的活动隔板组件中，还包括用于检测所述活动挡板在所述滚筒内的位置的位置传感器，所述位置传感器与所述检测控制装置通过导线连接。
优选的，在上述的活动隔板组件中，所述隔板的两侧板面上还设置有外保温层，和/或所述隔板的内部还设置有保温夹层。
本发明还提供了一种摆动式回转炉，包括滚筒，还包括至少一个如以上任一项所述的活动隔板组件和/或至少一个固定隔板；所述固定隔板固定于所述滚筒内，且所述固定隔板上设置有开口，所述开口位于所述滚筒内的固体物料运动区域内。
优选的，在上述的摆动式回转炉中，还包括固定于所述滚筒的固相区的挡板堰，用于增加位于所述挡板堰的背向所述滚筒出料端一侧的固体物料的堆积高度和停留时间。
优选的，在上述的摆动式回转炉中，所述挡板堰对应所述固定隔板地设置于该固定隔板的面向所述出料端的一侧，且所述挡板堰对应该固定隔板的开口位置设置。
优选的，在上述的摆动式回转炉中，所述挡板堰的高度高于所述固定隔板的开口高度，用于固体物料部分或全部淹没所述固定隔板的开口。
优选的，在上述的摆动式回转炉中，还包括活动挡板堰组件，所述活动挡板堰组件包括：
活动挡板堰，可阻挡所述滚筒的固相区内的固体物料；
升降杆，一端与所述活动挡板堰连接，另一端可穿过所述滚筒的筒壁；
第二密封装置，设置于所述滚筒筒壁的穿过所述升降杆的位置；
升降驱动装置，设置于所述滚筒筒体上且与所述升降驱动连接。
优选的，在上述的摆动式回转炉中，所述活动挡板堰组件还包括升降杆稳定部件，所述升降杆稳定部件固定于所述滚筒的内壁上，且活动地套设于所述升降杆的外围。
优选的，在上述的摆动式回转炉中，所述升降驱动装置为自动升降驱动装置或手动升降驱动装置，所述自动升降驱动装置与检测控制装置通过导线连接。
优选的，在上述的摆动式回转炉中，所述活动挡板堰组件还包括用于检测所述活动挡板在所述滚筒内的位置的位置传感器，所述位置传感器与所述检测控制装置通过导线连接。
优选的，在上述的摆动式回转炉中，所述固定隔板的两侧板面上还设置有外保温层，和/或所述固定隔板的内部还设置有保温夹层。
优选的，在上述的摆动式回转炉中，还包括设置于所述滚筒内的至少一个分段隔板组，每个所述分段隔板组包括相互邻近设置的至少两个所述固定隔板和至少一个挡板堰，且每个所述分段隔板组的所述固定隔板的开口彼此相互错开，每个所述分段隔板组中的每个所述固定隔板或靠近所述出料端的一个所述固定隔板的面向所述出料端的一侧邻近设置有所述挡板堰，且所述挡板堰对应该固定隔板的开口位置设置，所述挡板堰的高度高于所述固定隔板的开口高度。
优选的，在上述的摆动式回转炉中，还包括设置于所述滚筒内的至少一个分段隔板组，每个所述分段隔板组包括相互邻近设置的至少一个所述活动隔板组件、至少一个所述固定隔板和至少一个挡板堰，每个所述分段隔板组的所述活动隔板组件和所述固定隔板的开口彼此相互错开，每个所述分段隔板组中的每个所述固定隔板和每个所述活动隔板组的隔板的面向所述出料端的一侧邻近设置有所述挡板堰；或者每个所述分段隔板组的所述挡板堰只设置于所述分段隔板组的靠近所述出料端的一侧；且所述挡板堰对应开口位置设置，所述挡板堰的高度高于所述开口的高度。
优选的，在上述的摆动式回转炉中，还包括设置于所述滚筒内的至少一个分段隔板组，每个所述分段隔板组包括相互邻近设置的至少两个所述活动隔板组件
优选的，在上述的摆动式回转炉中，每个所述分段隔板组还包括至少一个挡板堰，每个所述分段隔板组的所述活动隔板组件的开口彼此相互错开，每个所述分段隔板组中的每个所述活动隔板组件或靠近所述出料端的一个所述活动隔板组件的面向所述出料端的一侧邻近设置有所述挡板堰，且所述挡板堰对应该活动隔板组件的开口位置设置，所述挡板堰的高度高于所述活动隔板组件的开口高度。
优选的，在上述的摆动式回转炉中，所述滚筒的部分工艺段筒体的内径大于其余工艺段筒体的内径，用于增加固体物料在该部分工艺段内的堆积高度和停留时间。
优选的，在上述的摆动式回转炉中，所述滚筒的内径增大的工艺段只增大该工艺段的固体物料移动区域所对应的筒体内径。
优选的，在上述的摆动式回转炉中，所述活动隔板组件的隔板和所述固定隔板的板面与所述滚筒的轴线之间的夹角均为45°～135°。
优选的，在上述的摆动式回转炉中，所述活动挡板堰的板面与所述滚筒的轴线之间的夹角为45°～135°。
与现有技术相比，本发明的有益效果是：
本发明提供的摆动式回转炉的活动隔板组件中，包括隔板、活动挡板、活动连杆、密封装置和连杆驱动装置，隔板固定于滚筒内，隔板上设置有位于滚筒的固体物料运动区域内的开口，活动挡板平行且紧贴隔板的板面设置，活动挡板由滚筒筒体上的连杆驱动装置驱动，通过穿过滚筒筒壁的活动连杆带动活动挡板相对隔板移动，可对隔板的开口进行封闭和打开，开口打开可实现滚筒的分区，通过活动挡板调节隔板的开口大小，可满足各个工艺段内的反应工况，可以控制固体物料在活动隔板组件之前的工艺段内的停留时间，对各个工艺段的反应进行有效精确的控制。
本发明提供的摆动式回转炉采用了本发明中的活动隔板组件，因此，更好 地实现了在一个摆动式回转炉内完成多个不同工况的工艺。
附图说明
为了更清楚地说明本发明实施例或现有技术中的技术方案，下面将对实施例或现有技术描述中所需要使用的附图作简单地介绍，显而易见地，下面描述中的附图仅仅是本发明的实施例，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据提供的附图获得其他的附图。
图1为本发明实施例提供的一种摆动式回转炉的活动隔板组件的结构示意图；
图2为本发明实施例提供的一种活动隔板组件处于封闭状态时的侧视示意图；
图3为本发明实施例提供的一种活动隔板组件处于打开状态时的侧视示意图；
图4为本发明实施例提供的另一种活动隔板组件处于打开状态时的侧视示意图；
图5为本发明实施例提供的一种摆动式回转炉的筒体结构示意图；
图6为图5中的C-C截面示意图；
图7为图5中的D-D截面示意图；
图8为本发明实施例提供的一种摆动式回转炉的活动挡板堰的结构示意图；
图9为本发明实施例提供的一种活动挡板堰组件处于阻挡状态时的侧视示意图；
图10为本发明实施例提供的一种活动挡板堰组件处于未阻挡状态时的侧视示意图；
图11为本发明实施例提供的一种活动隔板组件用于分段时的布置示意图；
图12为本发明实施例提供的一种摆动式回转炉的固定隔板和挡板堰的布置示意图；
图13为图12中的E-E截面示意图；
图14为图12中的F-F截面示意图；
图15为图12中的G-G截面示意图；
图16为本发明实施例提供的一种摆动式回转炉的分段隔板组的布置示意图；
图17为本发明实施例提供的一种同心摆动回转炉的结构示意图；
图18为本发明实施例提供的第二种同心摆动回转炉的结构示意图；
图19为本发明实施例提供的第三种同心摆动回转炉的结构示意图；
图20为本发明实施例提供的一种偏心摆动回转炉的结构示意图；
图21为本发明实施例提供的第二种偏心摆动回转炉的结构示意图；
图22为本发明实施例提供的第三种偏心摆动回转炉的结构示意图；
图23为本发明实施例提供的第四种偏心摆动回转炉的驱动装置和支撑装置的结构示意图；
图24为本发明实施例提供的第五种偏心摆动回转炉的驱动装置和支撑装置的结构示意图；
图25为本发明实施例提供的一种摆动回转炉的摆动过程示意图；
图26为本发明实施例提供的一种筒内偏心摆动回转炉的结构示意图。
在图1-图26中，1为进料装置、2为滚筒、201为滚筒物料出口、3为托圈、4为齿圈、5为活动导管组件、501为分管、502为旋转接头、6为出料装置、7为翻料板、8为温度传感器、9为电控柜、10为动力部件、11为主动齿轮、12为托轮、13为活动链条、14为固定隔板、141为隔板、142为活动挡板、143为活动连杆、144为连杆稳定部件、145为密封装置、146为连杆驱动装置、147为第二气相通孔、148为第二气相通孔、149为开口、15为配重平衡块、16为支撑辊、17为支撑架、18为直通式旋转接头、19为伸缩缸、20为铰接架、21为挡板堰、211为活动挡板堰、212为升降杆、213为升降杆稳定部件、214为第二密封装置、215为升降驱动装置、A为回转炉的转动轴线、B为滚筒的轴线。
具体实施方式
本发明的核心是提供了一种摆动式回转炉的活动隔板组件，能够对摆动式回转炉内的不同工艺之间进行分区，满足不同工艺的反应要求。
本发明还提供一种包含该活动隔板组件的摆动式回转炉，能够更好地在该摆动式回转炉内一体式完成多种不同工况条件的工艺反应，简化了设备和工艺。
下面将结合本发明实施例中的附图，对本发明实施例中的技术方案进行清楚、完整地描述，显然，所描述的实施例仅仅是本发明一部分实施例，而不是全部的实施例。基于本发明中的实施例，本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例，都属于本发明保护的范围。
需要说明的是，本发明中的活动隔板组件应用于摆动式回转炉，除了可应用于本申请所保护的摆动式回转炉中，还可以应用到与本发明同日申请的另一种摆动式回转炉中，本发明所要保护的摆动式回转炉是对与之同日申请的另一种摆动式回转炉的补充，下面对同日申请的另一种摆动式回转炉进行简单的介绍，该摆动式回转炉包括滚筒2、进料装置1、出料装置6、驱动装置、支撑装置、摆动控制装置和检测控制装置。
如图15-图24所示，其中，滚筒2的两端分别是进料端和出料端，进料端和出料端的端面均封闭，且进料端高于出料端，优选地，滚筒2的轴线B与水平面之间的夹角为1°～15°。物料在滚筒2中可以依靠自重由进料端向出料端自行慢慢滑动，更加方便出料，且滑行速度适中，以完成各项工艺为准。
滚筒2进料端设置有进料口，进料口的轴线与回转炉的转动轴线A重合，进料装置1与进料口进行转动密封连通，密封方式可以采用填料密封、机械密封等动静密封方式，进料口的横截面积小于进料端的横截面积，横截面为垂直于滚筒2轴线的平面，进料装置1固定不动，滚筒2可相对进料装置1转动，两者之间为动静密封，进料装置1的输送轴线(即滚筒2相对进料装置1转动的轴线，也即进料口的轴线)与回转炉的转动轴线A重合。
出料装置6连通设置于滚筒2的出料端，摆动式回转炉中与出料装置6相互转动密封配合的位置为滚筒物料出口201，物料从滚筒物料出口201排出 滚筒2或出料装置6，滚筒物料出口201的横截面积小于出料端的横截面积，滚筒物料出口201的轴线与回转炉的转动轴线A重合，出料装置6的输送轴线(即滚筒物料出口201的轴线)与回转炉的转动轴线A重合。
驱动装置设置于滚筒2的外部，用于驱动滚筒2绕摆动式回转炉的转动轴线A往复摆动。
支撑装置设置于滚筒2的外部，用于转动支撑滚筒2绕摆动式回转炉的转动轴线A往复摆动。
摆动控制装置设置于滚筒2的外部，与驱动装置通过导线连接，用于控制驱动装置动作，通过控制驱动装置进而控制滚筒2往复摆动的弧度和频率，本实施例中，滚筒2往复摆动的弧度优选为60°～360°，更优选为180°～270°。
上述摆动式回转炉在工作时，如图15所示，通过进料装置1向滚筒2中输送物料，物料进入滚筒2后，滚筒2通过摆动控制装置控制驱动装置动作，摆动驱动装置驱动滚筒2往复摆动，滚筒2由支撑装置转动支撑，在滚筒2的倾斜角度作用下，以及滚筒2的往复摆动下，物料沿之字形轨迹逐渐向出料端移动，并在滚筒2内完成相应的工艺处理，最后从出料装置6中排出。
与现有技术中的回转炉相比，摆动式回转炉的滚筒2采用往复摆动结构，滚筒2只在一定弧度内往复摆动，并不做单一方向的连续旋转，因此，可以在滚筒2上直接安装需要与外部设备通过导线连接的传感器、电加热器或需要与外部设备通过管道连接的换热夹套等用于工艺处理的装置，且导线和管道不会缠绕在滚筒2上，不会阻碍滚筒2的正常摆动，更有利于垃圾、污泥、生物质、无机化合物、低阶煤、油页岩、油泥等物料的处理。相对于现有技术中固定炉头和炉尾环绕滚筒的敞口两端的外圆周转动连接，本发明中的滚筒的两端封闭，进料装置1和出料装置6与滚筒2两端的转动密封面大大减小，可以采用普通的密封件进行密封，密封简单，提高了密封性能。
如图15-图24所示，本实施例中的摆动式回转炉还包括连通设置于滚筒2上的用于流体物料或热源进出滚筒的活动导管组件5，活动导管组件5自身可以弯曲、转折或旋转，活动导管组件5的数量根据实际的工艺需求来确定，在此不做具体限定。由于滚筒2只在一定弧度内往复摆动，并不做单一方向的连 续旋转，因此，可以在滚筒2上直接安装自身能够弯曲、转折或旋转的活动导管组件5，活动导管组件5不会因为滚筒2的摆动缠绕在滚筒2上，限制滚筒2的摆动，通过活动导管组件5，流体介质可以直接在滚筒2上进出，这样更有利于物料的处理。并且在滚筒2上直接设置活动导管组件5，流体物料和热源可以直接进出滚筒2，不需要像现有技术中那样，必须经过炉头和炉尾，因此，不会经过环绕滚筒2的密封面，减少了流体物料的泄漏，进一步提高了回转炉的密封性能。
本发明中的摆动式回转炉有两种结构形式，如图15-图24所示，图15-图17、图23中的摆动式回转炉为同心摆动回转炉，即摆动式回转炉的转动轴线A与滚筒2的轴线B重合，图18-图22、图24中的摆动式回转炉为偏心摆动回转炉，即摆动式回转炉的转动轴线A与滚筒2的轴线B不重合，滚筒2的轴线B绕偏心摆动回转炉的转动轴线A往复摆动；偏心摆动回转炉按照转动轴线A的位置分为两种形式，一种是如图24所示的筒内偏心摆动回转炉，筒内偏心摆动回转炉的转动轴线A位于滚筒2内部；另一种是如图18-图22所示的筒外偏心摆动回转炉，筒外偏心摆动回转炉的转动轴线A位于滚筒2外部，本实施例优选转动轴线A位于滚筒2的外部下方，便于支撑装置、驱动装置和活动导管组件5的设置。同心摆动回转炉、筒内偏心摆动回转炉和筒外偏心摆动回转炉的结构大体相似，只是在滚筒2形状、驱动装置、支撑装置、出料装置6上有所不同。
如图18和图20所示，进一步地，偏心摆动回转炉还设置有配重平衡块15，优选地，配重平衡块15的重心轴线和滚筒2的重心轴线相对摆动式回转炉的转动轴线A对称布置，用于滚筒2摆动时，提供平衡滚筒2的重力和惯性力，使滚筒2摆动更加省力，平稳。
如图1-图3所示，本发明实施例提供了一种应用于摆动式回转炉的活动隔板组件，以下简称活动隔板组件，其包括隔板141、活动挡板142、活动连杆143和连杆驱动装置146；其中，隔板141用于固定于摆动式回转炉的滚筒2内，隔板141上设置有开口149，开口149位于滚筒2内的固体物料运动区域 内，固体物料可通过开口149通过隔板141，隔板141的板面与滚筒2轴线之间的夹角为45°～135°，即在90°的正负倾斜45°范围内，夹角更优选为85°～95°；活动挡板142平行于隔板141的板面并紧贴隔板141的一侧板面设置，保持活动挡板142与隔板141之间的密封，活动挡板142可相对隔板141移动，用于封闭隔板141的开口149，活动挡板142的大小可完全覆盖隔板141的开口149；活动连杆143的一端连接于活动挡板142上，可固定连接或者铰接，活动连杆143的另一端可穿过滚筒2的筒壁，并与滚筒2筒体上的连杆驱动装置146连接，通过连杆驱动装置146驱动活动连杆143在滚筒2内穿进穿出。
上述活动隔板组件的工作过程是：如图2和图3所示，当需要固体物料穿过隔板141的开口149时，通过连杆驱动装置146驱动活动连杆143向远离隔板141的开口149一侧移动，进而带动活动挡板142从隔板141的开口149处移开，隔板141开口被打开，滚筒2内的固体物料在倾斜的滚筒2的往复摆动下，当开口149摆动到较低位置时，固体物料由开口149处穿过隔板141，进入后续的滚筒段内，通过控制活动挡板142的移动距离，控制隔板开口149的开度，达到控制固体物料的流动速度的目的。当开口149摆动到较高位置时，固体物料沿筒壁下落，不能通过开口149，此时，开口149将隔板141两侧的气相区连通，气相物料可通过开口149，可见滚筒2在往复摆动过程中，开口149打开的活动隔板组件能够允许固相物料和气相物料通过，实现了滚筒2的分区。当需要阻止物料穿过隔板开口149时，则通过连杆驱动装置146推动活动连杆143向靠近隔板开口149的一侧移动，进而推动活动挡板142将隔板开口149封闭，通过控制活动挡板142封闭隔板开口149的时间，实现固相物料在该活动隔板组件之前的滚筒段的停留时间和堆积高度，满足不同工艺的工艺需求。
在本实施例中，如图1所示，活动隔板组件还包括密封装置145，密封装置145设置于滚筒2筒壁的穿过活动连杆143的位置，通过密封装置145将活动连杆143与滚筒2筒壁之间的配合间隙进行密封，防止滚筒2内物料从该处泄露，进一步保证滚筒2内的工况环境的稳定。密封装置145可采用填料密封装置、机械密封装置等。当然，还可以不设置密封装置145，通过活动连杆143 与滚筒2的配合精度实现一定的密封，只是没有密封装置145的密封效果好。
如图4所示，在本实施例中，隔板141上还设置有气相通孔，用于滚筒气相区的气相物料的连通，以满足某些工艺的需求。
具体地，根据气相通孔在隔板141上的位置分为两种气相通孔，一种是第一气相通孔147，当活动挡板142不封闭隔板141的开口149时，活动挡板142封闭第一气相通孔147；另一种是第二气相通孔148，当活动挡板142不封闭隔板141的开口149时，活动挡板142也不封闭第二气相通孔148。隔板141上可以设置第一气相通孔147或第二气相通孔148。如果隔板141上设置第一气相通孔147，则在活动挡板142打开隔板开口149时同时封闭第一气相通孔147，阻止气相物料穿过第一气相通孔147，可以提高隔板141分区效果。如果隔板141上设置第二气相通孔148，则不管活动挡板142是否打开隔板开口149，气相物料始终能够通过第二气相通孔148，适用于某些需要保持气相流通的工艺。
如图1-图4所示，在本实施例中，活动隔板组件还包括连杆稳定部件144，连杆稳定部件144设置于隔板141上，具体为圈状的限位结构，且活动套设于活动连杆143的外围，对活动连杆143的外围进行限位，防止因滚筒2的往复摆动使活动连杆143在移动的过程中向外围移动，进而提高活动挡板142的移动的稳定性和准确性，使活动挡板142能够对隔板开口149进行有效封闭。当然，也可以不设置连杆稳定部件144，而是通过活动连杆143与连杆驱动装置146的固定实现稳定移动。
在本实施例中，连杆驱动装置146为手动驱动装置或自动驱动装置，自动驱动装置与摆动式回转炉的检测控制装置通过导线连接。由于活动隔板组件应用于摆动式回转炉，因此，滚筒2上的连杆驱动装置146可以通过导线与滚筒2外部的检测控制装置连接，而不会发生导线的缠绕。通过检测控制装置控制连杆驱动装置146进行自动驱动，节省人力。进一步地，活动隔板组件还包括用于检测活动挡板142在滚筒2内的位置的位置传感器，位置传感器与检测控制装置通过导线连接。工作时，在活动挡板142在移动的过程中，通过位置传感器检测活动挡板142的位置信息，并将位置信息传递给检测控制装置，检测 控制装置根据位置信息控制自动驱动装置进行驱动或停止，使活动挡板142到达指定位置。实现了活动隔板组件的自动化控制。
在本实施例中，对于某些相邻工艺段的温度差异较大的情况，在隔板141的外部和/或内部设置有保温层。即在隔板141的两侧板面上设置外保温层，或者在隔板141内设置保温夹层，或者同时设置外保温层和保温夹层，实现两个工艺段的温度隔离，以更好地完成各自工艺段的反应。
本发明实施例还提供了一种摆动式回转炉，该摆动式回转炉在与之同日申请的另一种摆动式回转炉的基础上，对滚筒2进行了分区或分段，能够在一个摆动式回转炉中更好地完成多个工艺。与申请同日申请的另一种摆动式回转炉的基本结构已在上文描述，在此不再赘述，在此基础上，本申请中的摆动式回转炉还包括至少一个以上全部实施例所描述的活动隔板组件和/或至少一个固定隔板14；即可以在滚筒2内单独设置至少一个活动隔板组件，或者单独设置至少一个固定隔板14，或者两者同时设置。固定隔板14固定于滚筒2内，且固定隔板14上设置有开口149，开口149位于滚筒2内的固体物料运动区域内，结构与活动隔板组件的隔板141结构相同，固定隔板14的板面与滚筒2的轴线之间的夹角为45°～135°，夹角更优选为85°～95°。
如图5所示，本申请中的摆动式回转炉可以通过单独设置的固定隔板14进行滚筒2的分区，部分限制气相区的气相物料的对流，保持温度梯度，允许固相物料通过开口。
如图1和图4所示，本申请中的摆动式回转炉通过活动隔板组件进行滚筒2的分区。分区时，利用活动挡板142打开隔板141的开口149即可实现，且用于分区的活动隔板组件还可以在隔板141上设置第一气相通孔147或第二气相通孔149。活动隔板组件根据实际的工艺需求对活动挡板142进行控制，通过控制隔板开口149的关闭和打开或控制开度可以控制位于活动隔板组件之前的滚筒段内的固体物料的堆积高度和停留时间，以满足不同的工艺需求。还可通过活动隔板组件和固定隔板14的组合设置，实现在分段的滚筒2内进行分区，根据不同的工艺需要进行设置，在此不做具体限定。
由于摆动式回转炉采用了活动隔板组件和/或固定隔板14，因此，可以更 好地在滚筒2内针对不同的工艺进行分区，以更好地满足各工艺的反应条件。
如图5和图7所示，摆动式回转炉还包括挡板堰21，挡板堰21固定于滚筒2的固相区内，挡板堰21具有一定的高度，挡板堰21的板面与滚筒2轴线之间的夹角为45°～135°，夹角更优选为85°～95°，用于增加位于挡板堰21的背向滚筒2出料端一侧的固体物料的堆积高度和停留时间，即增加挡板堰2的上游滚筒段的固体物料的堆积高度和停留时间，由于固体物料在到达挡板堰21时，被挡板堰21阻挡，只能当固体物料的高度高于挡板堰21的高度时，固体物料才可以继续向下游滚筒段移动，从而提高了固体物料的堆积高度和停留时间，满足了某些工艺的反应需求。
进一步地，挡板堰21对应固定隔板14地设置于该固定隔板14的面向出料端的一侧，且挡板堰21对应该固定隔板14的开口149位置设置，即挡板堰21优选地位于某个固定隔板14的开口149之后。通过固定隔板14与挡板堰21的配合，使得位于该固定隔板14之前的物料在进行分区的同时增加固体物料的堆积高度，更有利于工艺的反应。当然，挡板堰21还可以单独使用。
更进一步地，如果挡板堰21与固定隔板14配合使用，则挡板堰21的高度高于固定隔板14的开口149高度。这样设置的目的是，固体物料在经过固定隔板14的开口149后，在挡板堰21前堆积，直至开口149被部分或全部封堵，从而提高了固定隔板14的分区效果。
如图8-图10所示，进一步地，本实施例中的摆动式回转炉还包括活动挡板堰组件，活动挡板堰组件包括活动挡板堰211、升降杆212、第二密封装置214和升降驱动装置215；其中，活动挡板堰211的板面与滚筒2轴线之间的夹角为45°～135°，夹角更优选为85°～95°，升降杆212的一端与活动挡板堰211连接，另一端穿过滚筒2的筒壁后与升降驱动装置215连接，在升降杆212穿过滚筒2的位置设置有第二密封装置214。为了防止升降杆212转动，在升降杆212与滚筒2连接的位置设置周向限位结构，如升降杆212为非圆杆，滚筒2上与升降杆212配合的孔为非圆孔；或者升降杆212为圆杆，在圆杆上沿其轴向设置定位槽，滚筒2上与之配合的部位设置有定位凸起。
工作时，通过升降驱动装置215驱动升降杆212在滚筒2内升降，进而带 动活动挡板堰211在固相区内升降，活动挡板堰211可阻挡于滚筒2的固相区内，作用与挡板堰21相同，都是为了增加固体物料在活动挡板堰211前的滚筒段内的堆积高度和停留时间。当活动挡板堰211通过升降驱动装置215升起后，活动挡板堰211离开固相区，固体物料可以从活动挡板堰211的下方通过。活动挡板堰组件可以更好地对固体物料的流通进行灵活控制。
进一步地，活动挡板堰组件还包括升降杆稳定部件213，升降杆稳定部件213固定于滚筒2的内壁上，具体包括一个杆件和固定于杆件上的至少一个圈状限位件，升降杆稳定部件213活动地套设于升降杆212的外围，限制升降杆212向外围移动，能够提高活动挡板堰211在滚筒2摆动过程中的稳定性和移动准确性。当然，也可以不设置升降杆稳定部件213，而是通过升降杆212与升降驱动装置215之间的固定实现稳定。
在本实施例中，升降驱动装置215为自动升降驱动装置或手动升降驱动装置，自动升降驱动装置与检测控制装置通过导线连接。
更进一步地，活动挡板堰组件还包括用于检测活动挡板堰211在滚筒2内的位置的位置传感器，位置传感器与检测控制装置通过导线连接，位置传感器将活动挡板堰211的位置信息传递给检测控制装置，检测控制装置控制升降驱动装置215驱动和停止，提高活动挡板堰211的移动精度，实现自动化控制。
活动挡板堰组件与活动隔板组件的区别是没有隔板141，只能对固相物料进行阻挡，活动挡板堰组件可以和活动隔板组件、固定隔板14、挡板堰21任意组合设置，根据具体工艺需求进行设定，在此不做具体限定。
在本实施例中，固定隔板14的两侧板面上设置有外保温层和/或固定隔板14的内部设置有保温夹层，设置外保温层和/或保温夹层可适用于相邻工艺的温差较大的情况，改善分区效果。
如图11所示，一个活动隔板组件还可以配合挡板堰21对滚筒2进行分段，此时的活动隔板组件的隔板141上不开设气相通孔，则通过活动隔板组件的自动驱动装置、摆动控制装置的位置传感器和检测控制装置实现分段，具体为：挡板堰21设置于活动隔板组件的面向出料端的一侧，挡板堰21对应该活动隔板组件的隔板141的开口149位置设置，挡板堰21的高度高于隔板141的开 口149高度。工作时，位置传感器检测滚筒2的摆动位置信息，当检测到滚筒2摆动到隔板141的开口149位于较低位置时，此时固体物料位于开口149位置，位置传感器将此位置信息传递给检测控制装置，检测控制装置控制活动隔板组件的自动驱动装置驱动，将开口149打开，固体物料可以通过开口149，由于开口149的面向出料端的一侧被邻近开口149设置的挡板堰21阻挡，只有当固体物料在开口149处的堆积高度高于挡板堰21时才能通过，因此固体物料通过开口149的过程中，开口149始终被固体物料充满，因此，开口149只能允许固体物料通过，而气相物料无法通过开口149；当位置传感器检测到摆动式回转炉摆动到隔板141的开口149位于较高位置(即气相区)时，固体物料位于滚筒2的较低位置，而开口149可将隔板141两侧的气相区连通，此时，位置传感器将此位置信息传递给检测控制装置，检测控制装置控制自动驱动装置驱动，将开口149关闭，阻止气相区连通。可见，活动隔板组件在和挡板堰21配合时，通过位置传感器、检测控制装置可以只允许固体物料通过，而不允许气相物料通过，活动隔板组件实现了对滚筒2的分段。
还可在活动隔板组件和挡板堰21配合进行分段的滚筒段内设置固定隔板14，实现在分段的滚筒2内进行分区，根据不同的工艺需要进行设置，在此不做具体限定。
如图12-图16所示，滚筒2的分段还可以通过以下几种分段隔板组实现：
摆动式回转炉包括设置于滚筒2内的至少一个分段隔板组，每个分段隔板组包括至少两个固定隔板14和至少一个挡板堰21，下面以一个分段隔板组为例进行说明，该分段隔板组中的固定隔板14和挡板堰21相互邻近设置，固定隔板14的开口149彼此相互错开，图12-图16给出了三个固定隔板14配合使用的情况，当然，固定隔板14还可以两个、四个或更多个配合使用。每个固定隔板14的面向出料端的一侧邻近设置有一个挡板堰21，挡板堰21对应固定隔板14的开口149设置，且挡板堰21的高度高于开口149的高度。或者只在靠近出料端(图中显示为每个分段隔板组的最右侧)的一个固定隔板14的面向出料端的一侧邻近设置一个挡板堰21，且挡板堰21对应该固定隔板14的开口149位置设置，挡板堰21的高度高于固定隔板14的开口149的高度。 如图12-15所示，以三个固定隔板14和一个挡板堰21配合为例进行说明，当固体物料通过第一个固定隔板14的开口149后，由于第二个固定隔板14的开口149与第一个固定隔板14的开口149错开，当第一个固定隔板14的开口149摆动到气相区时，第二个固定隔板14的开口149位于固相区内，固体物料下落至第二个固定隔板14的开口149处，固体物料通过第二个固定隔板14的开口149，滚筒2继续摆动，当第二个固定隔板14的开口149摆动到气相区时，固体物料下落至第三个固定隔板14的开口149处，固体物料通过第三个固定隔板14的开口149，由于第三个固定隔板14的开口149后方设置有挡板堰21，因此，固体物料在第三个固定隔板14的开口149处堆积，将第三个固定隔板14的开口149封闭，从而通过固体物料自身对固定隔板14的开口149形成一定的封闭作用，不管滚筒2摆动到什么角度，三个固定隔板14的开口149至少有一个封闭，气相物料不能通过开口149，而只允许固体物料通过，从而实现了滚筒2的分段。当然，如图15所示，在相邻固定隔板14之间均设置一个挡板堰21，同样能够实现滚筒2的分段，原理同上，在此不再赘述。此外，在多个固定隔板14的最右侧还可以使用活动挡板堰组件替代挡板堰21，为了实现与挡板堰21相同的功能，活动挡板堰组件一直阻挡于固相区内。
如图16所示，在本实施例中，每个分段隔板组还可以由相互邻近设置的至少一个活动隔板组件、至少一个固定隔板14和至少一个挡板堰21组成，该活动隔板组件的隔板141上不设置气相通孔，每个分段隔板组的活动隔板组件和固定隔板14的开口149彼此相互错开。下面以一个分段隔板组为例进行说明，分段隔板组中的每个固定隔板14和每个活动隔板组件的隔板141的面向出料端的一侧均邻近设置有一个挡板堰21；或者挡板堰21只设置于分段隔板组的靠近出料端的一侧(图中显示为最右侧)，如果最右侧为活动隔板组件，则挡板堰21设置于该活动隔板组件的后方，如果最右侧为固定隔板14，则挡板堰21设置于该固定隔板14的后方。且上述两种设置中，挡板堰21均对应开口149位置设置，挡板堰21的高度高于开口149的高度。工作原理和多个固定隔板14的组合相同，在此不再赘述，相比于多个固定隔板14的组合，本 实施例中由于设置有活动隔板组件，因此，可以控制活动挡板142的开启和闭合或开度，在进行分段的同时，控制位于分段隔板组之前的滚筒段内的固体物料的停留时间，满足工艺需求。还可以只在该分段隔板组的最右侧设置活动挡板堰组件，替代挡板堰21，活动挡板堰组件一直阻挡于固相区内，同样能够实现分段。
如图16所示，在本实施例中，每个分段隔板组还可以只由多个活动隔板组件组成。即每个分段隔板组包括相互邻近设置的至少两个活动隔板组件。以一个分段隔板组为例进行说明，不管滚筒2摆动到什么角度，通过活动隔板组件的开口149的交替打开和封闭，并且保证至少有一个开口封闭，则气相物料就不能通过该分段隔板组的开口149，而只允许固体物料通过，实现了分段。
进一步地，当每个分段隔板组由多个活动隔板组件组成时，还可以与挡板堰21配合使用。即每个分段隔板组包括相互邻近设置的至少两个活动隔板组件和至少一个挡板堰21，且每个分段隔板组的活动隔板组件的开口149彼此相互错开，保持隔板141的开口149打开，以一个分段隔板组为例进行说明，每个活动隔板组件的面向出料端的一侧均邻近设置一个挡板堰21；或者只在靠近出料端的一个活动隔板组件的面向出料端的一侧邻近设置有一个挡板堰21。且上述两种情况中的挡板堰21均对应该活动隔板组件的开口149位置设置，挡板堰21的高度高于活动隔板组件的开口149的高度。其工作原理和多个固定隔板组成的分段隔板组相同，在此不再赘述。还可以只在该分段隔板组的最右侧活动隔板组件之后设置活动挡板堰组件，替代挡板堰21，活动挡板堰组件一直阻挡于固相区，同样能够实现分段。
以上三种分段隔板组可以任意组合应用于摆动式回转炉中。
如图5、图12和图16所示，在本实施例中，滚筒2的部分工艺段筒体的内径大于其余工艺段筒体的内径，用于增加固体物料在该部分工艺段内的堆积高度和停留时间。图5中的C-C截面所在的工艺段为扩径工艺段，C-C截面所在的工艺段的外径大于D-D截面所在工艺段的外径。优选地，由于不等径滚筒的设置的目的是通过增大固体物料移动区域的容积来提高固体物料的堆积高度和停留时间，因此，在本实施例中，滚筒2的内径增大的工艺段只增大该 工艺段的固体物料移动区域所对应的筒体内径，在图6中显示为，只增大滚筒2的筒体下部(即固相区筒体)的内径。
如图5和图12所示，对于需要增加固体物料堆积高度的工艺段，可以在该工艺段单独采用扩径滚筒结构，也可以和挡板堰21、活动挡板堰组件组合设置，即将挡板堰21或活动挡板堰组件设置于扩径工艺段的靠近出料端的一端变径台阶上。
如图12和图16所示，扩径滚筒结构、挡板堰21、和分段隔板组可以同时设置在一个工艺段内，也可以任意组合地设置于不同的工艺段内，如分段隔板组设置于扩径工艺段内，且分段隔板组的挡板堰21可以通过扩径工艺段的变径台阶替代，只要变径台阶的高度高于分段隔板组的开口149的高度即可，如图11所示，通过变径台阶对开口149处的物料进行封闭阻挡；或者将分段隔板组的挡板堰21设置于变径台阶上，由挡板堰21和变径台阶共同阻挡开口149处的固体物料。根据具体工艺需要进行设置，在此不做具体限定。
本发明中的摆动式回转炉采用多种分区、分段方式对滚筒2内的不同工艺进行分区或分段，能够更好地实现各个工艺的反应。以上的分区、分段方式均适用于同心摆动回转炉、筒内偏心摆动回转炉和筒外偏心摆动回转炉。
为了更好地理解摆动式回转炉的支撑装置和驱动装置，以下对其进行描述：
同心摆动回转炉的滚筒2优选为圆筒状，两端封闭，进料装置1和出料装置6分别于滚筒2的两端的端面转动密封连接。如图17所示，本实施例提供了一种同心摆动回转炉的驱动装置和支撑装置，驱动装置为同心齿轮齿圈驱动装置，支撑装置为同心托轮托圈支撑装置；其中，同心托轮托圈支撑装置包括至少两组托圈3和托轮12，托圈3固定在滚筒2的外周壁上，托圈3的轴线与滚筒2的轴线B重合，托圈3的外圈表面与托轮12接触支撑，托轮12位于托圈3的下方，托轮12的转轴位置固定不动，一个托圈3至少对应一个托轮12，优选为两个托轮12，用于支撑滚筒2的转动，两组托圈3和托轮12优选地设置在靠近滚筒2两端的位置，支撑更加平稳。同心齿轮齿圈驱动装置 包括至少一组齿圈4、主动齿轮11和动力部件10，齿圈4固定在滚筒2的外周壁上，齿圈4的轴线与滚筒2的轴线B重合，齿圈4与主动齿轮11啮合，主动齿轮11与动力部件10传动连接，动力部件10可以是电机或液压马达，动力部件10如果是电机，则主动齿轮11与电机通过减速机传动连接，动力部件10如果是液压马达，则主动齿轮11可以直接与液压马达连接或通过减速机传动连接。动力部件10与摆动控制装置通过导线连接，摆动控制装置控制动力部件10的转动方向，通过动力部件10驱动主动齿轮11往复转动，进而驱动齿圈4和滚筒2绕转动轴线A往复摆动。优选地，齿圈4可以由托圈3和齿形圈组成，即在托圈3的与其轴线垂直的任一侧面上固定齿形圈，齿形圈随托圈3一起转动，形成齿圈4，这样齿圈4的制造可以利用托圈3，降低了制造难度和制造成本，同时固定有齿形圈的托圈3还可以继续与托轮12配合支撑；或者齿形圈固定在托圈的外圈上，形成齿圈4。这种齿圈4的结构形式特别适用于偏心摆动回转炉，同心摆动回转炉同样使用。当然，齿圈4还可以单独制造，为一体结构。
如图18所示，本实施例提供了另一种同心摆动回转炉的驱动装置和支撑装置，驱动装置为同心推杆驱动装置，支撑装置为同心托轮托圈支撑装置；其中同心托轮托圈支撑装置包括至少一组托圈3和托轮12；托圈3固定在滚筒2的外周壁上，且托圈3的轴线与滚筒2的轴线B重合；托轮12的外圈表面与托圈3支撑接触，托轮12位于托圈3的下部，托轮12的位置固定不同，用于转动支撑托圈3；一个托圈3优选地与两个托轮12啮合，更优选地，包括两组托圈3和托轮12，且分别位于滚筒2两端，支撑更加稳定。同心推杆驱动装置包括至少一个伸缩缸19，伸缩缸19的伸缩杆与滚筒2铰接，伸缩缸19的固定端与固定台铰接，通过伸缩杆的伸缩，带动滚筒2往复摆动。具体地，滚筒2的外壁上设置有铰接架20，铰接架20沿滚筒2的径向向外伸出，伸缩缸19的伸缩杆铰接于铰接架20的外端，从而可以避免伸缩杆在伸缩的过程中碰到滚筒2。本实施例优选采用两个伸缩缸19，铰接架20相应为两个，且两个铰接架20相对滚筒2的轴线B上下对称布置，两个伸缩缸19的伸缩杆分别与上下两个铰接架20铰接，两个伸缩缸19的伸缩杆分别铰接于位于滚筒2 两侧的固定台上，两个固定台之间的连线水平布置且相对同心摆动回转炉的转动轴线A对称，通过两个伸缩缸19的交替伸缩实现滚筒2的往复摆动。当然，伸缩缸19的数量还可以是一个、三个或者更多个，伸缩缸19的位置根据实际情况进行布置，并不局限于本实施例所列举的形式，只要能够实现滚筒2的往复摆动即可。
如图19所示，本实施例提供了第三种同心摆动回转炉的驱动装置和支撑装置，驱动装置为至少一组同心托轮托圈驱动装置，支撑装置为多组同心托轮托圈支撑装置；其中，每组同心托轮托圈支撑装置包括托圈3和托轮12，托圈3固定在滚筒2的外周壁上，且托圈3的轴线与滚筒2的轴线B重合；托轮12的外圈表面与托圈3支撑接触，托轮12位于托圈3的下部，托轮12的位置固定不同，用于转动支撑托圈3；一个托圈3优选地与两个托轮12配合支撑，更优选地，包括两组托圈3和托轮12，且分别位于滚筒2两端，支撑更加稳定。同心托轮托圈驱动装置包括托圈3、托轮12和动力部件10，托圈3固定在滚筒2的外周壁上，且托圈3的轴线与滚筒2的轴线B重合；托轮12的外圈表面与托圈3支撑接触，托轮12位于托圈3的下部，托轮12的位置固定不同，用于转动支撑托圈3；一个托圈3优选地与两个托轮12配合支撑，动力部件10与托轮12传动连接，动力部件10驱动托轮12往复转动，通过托轮12与托圈3之间的静摩擦力带动托圈3往复摆动，进而使滚筒2往复摆动。
本实施例提供了一种具体的同心摆动回转炉的摆动控制装置，其包括位置传感器和电控柜9。其中，位置传感器固定在滚筒2或支撑装置上，用于监测滚筒2的往复摆动的弧度，并向电控柜9发送滚筒2摆动的位置信息；电控柜9与位置传感器和驱动装置均通过导线连接，电控柜9用于接收位置传感器的位置信息，当位置信息为滚筒2摆动的极限位置时，即达到滚筒2单方向最大摆动弧度时，电控柜9控制电机10改变转动方向，或者电控柜控制伸缩缸19的伸缩方向，实现控制滚筒2往复摆动。同心摆动回转炉的往复摆动的弧度一般为90°～360°，最佳角度范围在180°～270°之间。
或者采用另一种摆动控制装置，该摆动控制装置只通过程序控制驱动装置 的动作，程序设定好驱动装置的主动齿轮11或托轮12在单方向转动的转数和速度，或程序设定好伸缩缸19的行程和速度，转数或行程均与滚筒2摆动弧度之间满足一定关系，当滚筒2在单方向摆动达到预设位置时(对应主动齿轮11或托轮12在该方向的转数，或对应伸缩缸19的行程)，摆动控制装置自动控制电机10改变转动方向，或者控制伸缩缸19改变伸缩方向，实现滚筒2的往复摆动，并达到限定的摆动弧度。当然，摆动控制装置还可以采用其他结构形式，只要能够实现滚筒2在一定弧度范围内往复摆动且不发生滚筒摆动的基准点漂移即可。
如图20所示，具体地，本实施例提供了一种偏心摆动回转炉的驱动装置和支撑装置，驱动装置为偏心齿轮齿圈驱动装置，支撑装置为支撑辊支撑装置，支撑辊支撑装置只适用于筒外偏心摆动回转炉，因此与支撑辊支撑装置组合的驱动装置和支撑装置只适用于筒外偏心摆动回转炉；其中，偏心齿轮齿圈驱动装置包括齿圈4、主动齿轮11和动力部件10，齿圈4固定在滚筒2的外壁上，且齿圈4的轴线与偏心摆动回转炉的转动轴线A重合，齿圈4与主动齿轮11啮合，主动齿轮11与动力部件10传动连接，动力部件10和同心摆动回转炉的相同，在此不再赘述。动力部件10与摆动控制装置导线连接，摆动控制装置控制动力部件10的转动方向，动力部件10带动主动齿轮11转动，主动齿轮11驱动齿圈4和滚筒2绕偏心摆动回转炉的转动轴线A往复摆动。支撑辊支撑装置包括至少两组支撑架17和支撑辊16，其中，支撑架17固定不动，支撑辊16转动连接在支撑架17上，且支撑辊16的转动轴线与偏心摆动回转炉的转动轴线A重合，滚筒2的底部与支撑辊16固定连接，且配重平衡块15固定在支撑辊16上，优选地，配重平衡块15的重心轴线与滚筒2的重心轴线相对偏心摆动回转炉的转动轴线A对称布置，两组支撑架17和支撑辊16优选地分别靠近滚筒2的两端设置，使支撑更加平稳。
如图21所示，本实施例提供了另一种偏心摆动回转炉的驱动装置和支撑装置，驱动装置为偏心齿轮齿圈驱动装置，支撑装置为偏心托轮托圈支撑装置，该驱动装置和支撑装置的组合可适用于筒内偏心摆动回转炉和筒外偏心摆动回转炉。其中，偏心齿轮齿圈驱动装置包括齿圈4、主动齿轮11和动力部件 10，本实施例中的偏心齿轮齿圈驱动装置与图20中的偏心齿轮齿圈驱动装置相同，在此不再赘述。偏心托轮托圈支撑装置包括至少两组托圈3和托轮12，托圈3固定于滚筒2的外周壁上，且托圈3的轴线与偏心摆动回转炉的转动轴线A重合，一个托圈3与至少一个托轮12接触支撑，用于支撑托圈3转动，托圈3上设置有配重平衡块15，优选地，配重平衡块15的重心轴线与滚筒2的重心轴线相对偏心摆动回转炉的转动轴线A对称布置。如图21和图23所示，齿圈和托圈可以是部分圆或整圆结构，即齿圈4和托圈3为圆形板结构，在圆形板上加工出用于嵌装滚筒2的弧形缺口或圆孔，齿圈4和托圈3的外边缘超过滚筒2的轴线并接近或超过滚筒2的边缘，以提高固定强度。
如图22所示，本实施例提供了第三种偏心摆动回转炉的驱动装置和支撑装置，驱动装置为偏心托轮托圈驱动装置，支撑装置为多组偏心托轮托圈驱动装置，至少为两组，该驱动装置和支撑装置的组合可适用于筒外偏心摆动回转炉和筒内偏心摆动回转炉；其中，每组偏心托轮托圈支撑装置包括托圈3和托轮12，托圈3固定于滚筒2的外周壁上，托圈3的轴线与偏心摆动回转炉的转动轴线A重合，托轮12与托圈3的外圈表面接触支撑，托轮12的轴线固定不动，用于转动支撑托圈3；一个托圈3的外圈表面优选地与两个托轮12接触支撑，更优选地，包括两组托圈3和托轮12，且分别位于滚筒2两端，支撑更加稳定。偏心托轮托圈驱动装置包括托圈3、托轮12和动力部件10，动力部件10与托轮12传动连接，动力部件10驱动托轮12往复转动，通过托轮12与托圈3之间的静摩擦力带动托圈3往复摆动，进而使滚筒2往复摆动。托圈3上设置有配重平衡块15，优选地，配重平衡块15的重心轴线与滚筒2的重心轴线相对偏心摆动回转炉的转动轴线A对称布置。
如图23所示，本实施例提供了第四种偏心摆动回转炉的驱动装置和支撑装置，驱动装置为偏心推杆驱动装置，支撑装置为偏心托轮托圈支撑装置，该驱动装置和支撑装置的组合可适用于筒外偏心摆动回转炉和筒内偏心摆动回转炉；其中，偏心托轮托圈支撑装置包括至少两组托圈3和托轮12，托圈3固定在滚筒2外壁上，且托圈3的轴线与偏心摆动回转炉的转动轴线A重合，托圈3的外圈表面与至少一个托轮12接触支撑，用于支撑托圈3转动，托圈 3上设置有配重平衡块15，优选地，配重平衡块15的重心轴线与滚筒2的重心轴线相对偏心摆动回转炉的转动轴线A对称布置。偏心推杆驱动装置包括伸缩缸19，伸缩缸19的数量优选为两个，对称布置在滚筒2的两侧，伸缩缸19的伸缩杆的端部与托圈3铰接，且伸缩缸19的固定端与固定台铰接，两个伸缩缸19的伸缩杆与托圈3铰接的两点相对托圈3的竖直径向对称，两个伸缩缸19的固定端与固定台的两个铰接点位于同一水平线上，通过两个伸缩缸19的伸缩杆的交替伸缩，带动托圈3往复转动，进而带动滚筒2往复摆动。当然，伸缩缸19的数量还可以是一个、二个、三个或者更多个。伸缩缸19的位置根据实际情况确定，只要能够保证滚筒2能够往复摆动即可。
如图24所示，本实施例提供了第五种偏心摆动回转炉的驱动装置和支撑装置，驱动装置为偏心推杆驱动装置，支撑装置为支撑辊支撑装置，由于支撑装置采用支撑辊支撑装置，则该驱动装置和支撑装置的组合只适用于筒外偏心摆动回转炉；其中，支撑辊支撑装置包括至少两组支撑架17和支撑辊16，与图23中的支撑辊支撑装置相同，在此不再赘述。配重平衡块15固定在支撑辊16上，优选地，配重平衡块15的重心轴线与滚筒2的重心轴线相对偏心摆动回转炉的转动轴线A对称布置。偏心推杆驱动装置包括铰接架20和至少一个伸缩缸19，伸缩缸19优选为两个，对称布置在滚筒2的两侧，铰接架20固定于支撑辊19上，两个伸缩缸19的伸缩杆分别与铰接架20的两端铰接，通过铰接架20增大转矩，伸缩缸19的固定端与固定台铰接，两个伸缩缸19的固定端与固定台的两个铰接点位于同一水平线上，通过两个伸缩缸19的伸缩杆的交替伸缩，带动支撑辊16往复转动，进而带动滚筒2往复摆动。当然，伸缩缸19的数量还可以是一个、三个或者更多个。伸缩缸19的位置根据实际情况确定，只要能够保证滚筒2能够往复摆动即可。
本实施例中，伸缩缸19可以是电动伸缩缸、液压伸缩缸或气动伸缩缸。伸缩缸19与控制装置连接，通过控制装置控制伸缩缸19的伸缩，实现滚筒2的往复摆动。
本说明书中各个实施例采用递进的方式描述，每个实施例重点说明的都是与其他实施例的不同之处，各个实施例之间相同相似部分互相参见即可。
对所公开的实施例的上述说明，使本领域专业技术人员能够实现或使用本发明。对这些实施例的多种修改对本领域的专业技术人员来说将是显而易见的，本文中所定义的一般原理可以在不脱离本发明的精神或范围的情况下，在其它实施例中实现。因此，本发明将不会被限制于本文所示的这些实施例，而是要符合与本文所公开的原理和新颖特点相一致的最宽的范围。

Claims (26)

  1. 一种摆动式回转炉的活动隔板组件，其特征在于，包括：
    隔板(141)，用于固定于所述摆动式回转炉的滚筒(2)内，所述隔板(141)上设置有开口(149)，所述开口(149)位于所述滚筒(2)内的固体物料运动区域内；
    活动挡板(142)，平行于所述隔板(141)的板面并紧贴所述隔板(141)的一侧板面设置，所述活动挡板(142)可相对所述隔板(141)移动，用于封闭所述隔板(141)的开口；
    活动连杆(143)，一端连接于所述活动挡板(142)上，另一端可穿过所述滚筒(2)的筒壁；
    连杆驱动装置(146)，设置于所述滚筒(2)筒体上且与所述活动连杆(143)驱动连接。
  2. 根据权利要求1所述的活动隔板组件，其特征在于，还包括密封装置(145)，所述密封装置(145)设置于所述滚筒(2)筒壁的穿过所述活动连杆(143)的位置。
  3. 根据权利要求1所述的活动隔板组件，其特征在于，所述隔板(141)上还设置有气相通孔。
  4. 根据权利要求3所述的活动隔板组件，其特征在于，所述气相通孔在所述隔板(141)上的位置为当所述活动挡板(143)不封闭所述隔板(141)的开口(149)时，所述活动挡板(143)封闭所述气相通孔，或者所述气相通孔在所述隔板(141)上的位置为当所述活动挡板(143)不封闭所述隔板(141)的开口(149)时，所述活动挡板(143)不封闭所述气相通孔。
  5. 根据权利要求1所述的活动隔板组件，其特征在于，还包括连杆稳定部件(144)，所述连杆稳定部件(144)设置于所述隔板(141)上，且活动套设于所述活动连杆(143)的外围。
  6. 根据权利要求1所述的活动隔板组件，其特征在于，所述密封装置(145)为填料密封装置。
  7. 根据权利要求1所述的活动隔板组件，其特征在于，所述连杆驱动装 置(146)为手动驱动装置或自动驱动装置，所述自动驱动装置与所述摆动式回转炉的检测控制装置通过导线连接。
  8. 根据权利要求7所述的活动隔板组件，其特征在于，还包括用于检测所述活动挡板(143)在所述滚筒(2)内的位置的位置传感器，所述位置传感器与所述检测控制装置通过导线连接。
  9. 根据权利要求1-8任一项所述的活动隔板组件，其特征在于，所述隔板(141)的两侧板面上还设置有外保温层，和/或所述隔板(141)的内部还设置有保温夹层。
  10. 一种摆动式回转炉，包括滚筒(2)，其特征在于，还包括至少一个如权利要求1-9任一项所述的活动隔板组件和/或至少一个固定隔板(14)；所述固定隔板(14)固定于所述滚筒(2)内，且所述固定隔板(14)上设置有开口(149)，所述开口(149)位于所述滚筒(2)内的固体物料运动区域内。
  11. 根据权利要求10所述的摆动式回转炉，其特征在于，还包括固定于所述滚筒(2)的固相区的挡板堰(21)，用于增加位于所述挡板堰(21)的背向所述滚筒(2)出料端一侧的固体物料的堆积高度和停留时间。
  12. 根据权利要求11所述的摆动式回转炉，其特征在于，所述挡板堰(21)对应所述固定隔板(14)设置于该固定隔板(14)的面向所述出料端的一侧，且所述挡板堰(21)对应该固定隔板(14)的开口(149)位置设置。
  13. 根据权利要求12所述的摆动式回转炉，其特征在于，所述挡板堰(21)的高度高于所述固定隔板(14)的开口高度，用于固体物料部分或全部淹没所述固定隔板(14)的开口(149)。
  14. 根据权利要求10所述的摆动式回转炉，其特征在于，还包括活动挡板堰组件，所述活动挡板堰组件包括：
    活动挡板堰(211)，可阻挡所述滚筒(2)的固相区内的固体物料；
    升降杆(212)，一端与所述活动挡板堰(211)连接，另一端可穿过所述滚筒(2)的筒壁；
    第二密封装置(214)，设置于所述滚筒(2)筒壁的穿过所述升降杆(212)的位置；
    升降驱动装置(215)，设置于所述滚筒(2)筒体上且与所述升降杆(212)驱动连接。
  15. 根据权利要求14所述的摆动式回转炉，其特征在于，所述活动挡板堰组件还包括升降杆稳定部件(213)，所述升降杆稳定部件(213)固定于所述滚筒(2)的内壁上，且活动地套设于所述升降杆(212)的外围。
  16. 根据权利要求15所述的摆动式回转炉，其特征在于，所述升降驱动装置(215)为自动升降驱动装置或手动升降驱动装置，所述自动升降驱动装置与检测控制装置通过导线连接。
  17. 根据权利要求16所述的摆动式回转炉，其特征在于，所述活动挡板堰组件还包括用于检测所述活动挡板(211)在所述滚筒(2)内的位置的位置传感器，所述位置传感器与所述检测控制装置通过导线连接。
  18. 根据权利要求10所述的摆动式回转炉，其特征在于，所述固定隔板(14)的两侧板面上还设置有外保温层，和/或所述固定隔板(14)的内部还设置有保温夹层。
  19. 根据权利要求10-18任一项所述的摆动式回转炉，其特征在于，还包括设置于所述滚筒(2)内的至少一个分段隔板组，每个所述分段隔板组包括相互邻近设置的至少两个所述固定隔板(14)和至少一个挡板堰(21)，且每个所述分段隔板组的所述固定隔板(14)的开口(149)彼此相互错开，每个所述分段隔板组中的每个所述固定隔板(14)或靠近所述出料端的一个所述固定隔板(14)的面向所述出料端的一侧邻近设置有所述挡板堰(21)，且所述挡板堰(21)对应该固定隔板(14)的开口(149)位置设置，所述挡板堰(21)的高度高于所述固定隔板(14)的开口(149)的高度。
  20. 根据权利要求10-18任一项所述的摆动式回转炉，其特征在于，还包括设置于所述滚筒(2)内的至少一个分段隔板组，每个所述分段隔板组包括相互邻近设置的至少一个所述活动隔板组件、至少一个所述固定隔板(14)和至少一个挡板堰(21)，每个所述分段隔板组的所述活动隔板组件和所述固定隔板(14)的开口(149)彼此相互错开，每个所述分段隔板组中的每个所述固定隔板(14)和每个所述活动隔板组件的隔板(141)的面向所述出料端的 一侧均邻近设置有所述挡板堰(21)；或者每个所述分段隔板组的所述挡板堰(21)只设置于所述分段隔板组的靠近所述出料端的一侧；且所述挡板堰(21)对应开口(149)位置设置，所述挡板堰(21)的高度高于所述开口(149)的高度。
  21. 根据权利要求10-18任一项所述的摆动式回转炉，其特征在于，还包括设置于所述滚筒(2)内的至少一个分段隔板组，每个所述分段隔板组包括相互邻近设置的至少两个所述活动隔板组件。
  22. 根据权利要求21所述的摆动式回转炉，其特征在于，每个所述分段隔板组还包括至少一个挡板堰(21)，每个所述分段隔板组的所述活动隔板组件的开口(149)彼此相互错开，每个所述分段隔板组中的每个所述活动隔板组件或靠近所述出料端的一个所述活动隔板组件的面向所述出料端的一侧邻近设置有所述挡板堰(21)，且所述挡板堰(21)对应该活动隔板组件的开口(149)位置设置，所述挡板堰(21)的高度高于所述活动隔板组件的开口(149)的高度。
  23. 根据权利要求10-18任一项所述的摆动式回转炉，其特征在于，所述滚筒(2)的部分工艺段筒体的内径大于其余工艺段筒体的内径，用于增加固体物料在该部分工艺段内的堆积高度和停留时间。
  24. 根据权利要求23所述的摆动式回转炉，其特征在于，所述滚筒(2)的内径增大的工艺段只增大该工艺段的固体物料移动区域所对应的筒体内径。
  25. 根据权利要求10-18任一项所述的摆动式回转炉，其特征在于，所述活动隔板组件的隔板(141)和所述固定隔板(14)的板面与所述滚筒(2)的轴线之间的夹角均为45°～135°。
  26. 根据权利要求14-17任一项所述的摆动式回转炉，其特征在于，所述活动挡板堰(211)的板面与所述滚筒(2)的轴线之间的夹角为45°～135°。
PCT/CN2016/106868 2015-11-27 2016-11-23 摆动式回转炉及其活动隔板组件 WO2017088748A1 (zh)

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