WO2017082043A1 - 光学式検体検出システム - Google Patents
光学式検体検出システム Download PDFInfo
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- WO2017082043A1 WO2017082043A1 PCT/JP2016/081592 JP2016081592W WO2017082043A1 WO 2017082043 A1 WO2017082043 A1 WO 2017082043A1 JP 2016081592 W JP2016081592 W JP 2016081592W WO 2017082043 A1 WO2017082043 A1 WO 2017082043A1
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- dielectric member
- excitation light
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- metal film
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
- G01N21/64—Fluorescence; Phosphorescence
- G01N21/645—Specially adapted constructive features of fluorimeters
- G01N21/648—Specially adapted constructive features of fluorimeters using evanescent coupling or surface plasmon coupling for the excitation of fluorescence
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/55—Specular reflectivity
- G01N21/552—Attenuated total reflection
- G01N21/553—Attenuated total reflection and using surface plasmons
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
- G01N21/64—Fluorescence; Phosphorescence
- G01N21/6428—Measuring fluorescence of fluorescent products of reactions or of fluorochrome labelled reactive substances, e.g. measuring quenching effects, using measuring "optrodes"
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/04—Prisms
Definitions
- the present invention relates to a surface plasmon resonance apparatus applying a surface plasmon resonance (SPR) phenomenon, and surface plasmon excitation based on the principle of surface plasmon excitation enhanced fluorescence spectroscopy (SPFS).
- SPR surface plasmon resonance
- SPFS surface plasmon excitation enhanced fluorescence spectroscopy
- the present invention relates to an optical specimen detection system that detects a measurement target substance contained in a sensor chip using an enhanced fluorescence measurement device or the like.
- SPFS device based on the principle of surface plasmon excitation enhanced fluorescence spectroscopy (SPFS) using surface plasmon resonance (SPR) phenomenon, analyte detection can be performed with higher accuracy than SPR equipment.
- SPFS device The surface plasmon excitation enhanced fluorescence spectrometer (hereinafter referred to as “SPFS device”) is also one of such specimen detection devices.
- surface plasmon excitation enhanced fluorescence spectroscopy SPFS
- surface plasmon light is applied to the surface of the metal film under the condition that excitation light such as laser light emitted from a light source attenuates total reflection (ATR) on the surface of the metal film.
- excitation light such as laser light emitted from a light source attenuates total reflection (ATR) on the surface of the metal film.
- ATR total reflection
- FIG. 13 is a schematic configuration diagram for explaining the configuration of a conventional SPFS system.
- a conventional SPFS system 100 includes a prism-shaped dielectric member 102 having a substantially trapezoidal vertical cross-sectional shape, a metal film 104 formed on a horizontal upper surface 102 a of the dielectric member 102, and an upper surface of the metal film 104.
- a sensor chip 114 including a flow path forming member 110 that forms a flow path 108 and a flow path lid member 112 so as to surround the reaction layer 106, and the sensor chip 114 includes SPFS.
- a sensor chip loading unit 116 of the apparatus 101 is loaded.
- the reaction layer 106 of the sensor chip 114 has a solid phase film for capturing an analyte labeled with a fluorescent substance, and the analyte liquid containing the analyte is sent to the flow path 108, whereby the analyte is collected. Can be fixed on the metal film 104.
- the light receiving unit 120 of the SPFS device 101 is used to measure the intensity of the fluorescence 118 emitted by the fluorescent material excited by the surface plasmon light (dense wave) generated on the metal film 104. Is arranged.
- a light source 122 of the SPFS device 101 is disposed on one side surface (incident surface 102 b) below the dielectric member 102, and excitation light 124 irradiated from the light source 122. Enters the incident surface 102b of the dielectric member 102 from below the outer side of the dielectric member 102, and irradiates the metal film 104 formed on the upper surface 102a of the dielectric member 102 through the dielectric member 102.
- surface plasmon light (dense wave) is generated on the surface of the metal film 104 by irradiating the excitation light 124 from the light source 122 toward the metal film 104.
- the fluorescent substance that labels the analyte is excited by light (dense wave), and the fluorescence 118 emits light.
- the fluorescence 118 is detected by the light receiving unit 120, and the amount of the analyte is calculated based on the light amount of the fluorescence 118.
- the light amount of the fluorescence 118 is about 10 orders of magnitude lower than the excitation light amount, so that even if the excitation light 124 is incident on the light receiving unit 120 even slightly, the S / N deteriorates and the detection accuracy deteriorates. Therefore, it is important to reduce stray light.
- the excitation light 124 is incident from the incident surface 102 b of the dielectric member 102, reflected by the metal film 104, and emitted from the output surface 102 c of the dielectric member 102.
- the exit surface reflected light 124 b when the exit surface reflected light 124 b enters the channel lid member 112, the exit surface reflected light 124 b becomes light that guides the inside of the channel lid member 112. If present, autofluorescence in the flow path lid member 112 is detected, leading to deterioration of S / N.
- the exit surface reflected light 124b usually has a light amount of about 4% of the excitation light 124, and is a sufficiently large amount of light with respect to the fluorescence 118. Therefore, it can be said to be stray light to be removed.
- Patent Document 1 In order to remove such stray light, in Patent Document 1, as shown in FIG. 14, a light absorbing portion 126 that absorbs the metal film reflected light reflected by the metal film 104 is provided in the optical path of the dielectric member 102. Yes.
- excitation light is provided by providing an excitation light cut filter (wavelength filter) 128 for removing scattered light and reflected light inside the sensor chip 114 on the upper surface of the sensor chip 114. 124 is cut.
- excitation light cut filter wavelength filter
- the light absorption unit 126 does not absorb 100% of the reflected light from the metal film, and a minute amount of reflected light exists in the light absorption unit 126. The stray light could not be completely removed.
- An object of the present invention is to provide an optical sample detection system capable of measuring a sample with high accuracy.
- the present invention was invented in order to solve the above-described problems in the prior art, and in order to realize at least one of the above-described objects, an optical sample reflecting one aspect of the present invention.
- the detection system includes a dielectric member, A metal film adjacent to the top surface of the dielectric member; A reaction layer adjacent to an upper surface of the metal film; A lid member disposed on the upper surface of the reaction layer, and a sensor chip, Chip holding means for holding the sensor chip; A light projecting unit that irradiates the metal film with excitation light through the dielectric member, and detects the specimen by irradiating the metal film with the excitation light through the dielectric member
- a sample detection system comprising: In the optical path cross section of the excitation light, the width of the lid member is larger than the width of the dielectric member, After the excitation light is reflected on the exit surface of the dielectric member, the exit surface reflected light exiting the dielectric member is configured not to enter the lid member within the measurement scan angle of the excitation light.
- the exit surface reflected light derived from the excitation light having a larger amount of light than fluorescence is designed not to enter the lid member, the exit surface reflected light is not guided into the lid member, The S / N can be greatly improved, and the specimen can be measured with high accuracy.
- FIG. 1 is a schematic view schematically showing an outline of an SPFS system which is an embodiment of the optical analyte detection system of the present invention.
- FIG. 2 is a schematic bottom view of a part of the SPFS system of FIG. 1 viewed from the bottom side.
- FIG. 3 is a schematic cross-sectional view showing an example of a sensor chip.
- FIG. 4 is a schematic cross-sectional view showing another example of the sensor chip.
- FIG. 5 is a schematic diagram illustrating an example of the optical configuration of the light projecting unit in the SPFS system of the present embodiment.
- FIG. 6 is a flowchart for explaining the flow of measurement in the SPFS system of this embodiment.
- FIG. 7 is a schematic diagram showing an example of the shape of the dielectric member in the SPFS system of the present embodiment.
- FIG. 8 is a graph showing the relationship between the incident angle of the excitation light and the exit angle of the exit surface reflected light.
- FIG. 9 shows the relationship between the incident angle of the excitation light when the measurement scanning angle of the excitation light is changed from 60 ° to 72 °, and the exit angle of the exit surface reflected light and the reflection angle of the incident surface reflected light. It is a graph.
- FIG. 10 shows the relationship between the incident angle of the excitation light when the measurement scan angle of the excitation light is 61 ° to 73 °, and the exit angle of the exit surface reflected light and the reflection angle of the incident surface reflected light. It is a graph.
- FIG. 11 is a schematic bottom view showing still another example of the sensor chip.
- FIG. 12 is a schematic view schematically showing another example of the SPFS system which is an aspect of the optical analyte detection system of the present invention.
- FIG. 13 is a schematic diagram for explaining the configuration of a conventional SPFS system.
- FIG. 14 is a schematic diagram for explaining the configuration of the sensor chip disclosed in Patent Document 1.
- FIG. 15 is a schematic diagram for explaining the configuration of the SPFS system disclosed in Patent Document 2.
- FIG. 1 is a schematic view schematically showing an outline of an SPFS system which is an embodiment of the optical analyte detection system of the present invention
- FIG. 2 is a schematic view showing a part of the SPFS system of FIG. is there.
- the directions of “up” and “down” are defined in the state of FIG.
- the SPFS system 10 of this embodiment includes a prism-shaped dielectric member 12 having a substantially trapezoidal vertical cross-sectional shape, a metal film 14 formed on a horizontal upper surface 12a of the dielectric member 12, and an upper surface of the metal film 14. And a sensor chip 24 including a flow path forming member 20 that forms a flow path 18 and a flow path lid member 22 so as to surround the reaction layer 16. Are loaded in the chip loading section 26 of the SPFS device 11.
- the reaction layer 16 of the sensor chip 24 has a solid phase film for thinning the analyte labeled with the fluorescent substance, and the analyte liquid containing the analyte is sent to the flow path 18, thereby the analyte. Can be fixed on the metal film 14.
- the solid phase film is one in which a ligand for capturing an analyte is immobilized, for example, a SAM (Self-Assembled Monolayer) and a solid phase layer formed on the SAM. Can be configured.
- a ligand for capturing an analyte for example, a SAM (Self-Assembled Monolayer) and a solid phase layer formed on the SAM. Can be configured.
- solid phase layer examples include glucose, carboxymethylated glucose, and vinyl esters, acrylic esters, methacrylic esters, olefins, styrenes, crotonic esters, itaconic diesters, malee, and the like.
- hydrophilic polymers such as dextran and dextran derivatives and vinyl esters, acrylic esters, methacrylic esters, olefins, styrenes, crotonic esters, itaconic diesters, maleic diesters, fumaric acid Jie
- the dielectric member 12 is not particularly limited as long as it is a material that is optically transparent at least with respect to the excitation light 40. However, in order to obtain a sensor chip that is inexpensive and excellent in handleability, it is injection molded. It is formed from the resin material.
- Examples of the resin material forming the dielectric member 12 include polyesters such as polyethylene terephthalate (PET) and polyethylene naphthalate, polyolefins such as polyethylene (PE) and polypropylene (PP), cyclic olefin copolymer (COC), and cyclic.
- polyesters such as polyethylene terephthalate (PET) and polyethylene naphthalate
- polyolefins such as polyethylene (PE) and polypropylene (PP)
- PP polypropylene
- COC cyclic olefin copolymer
- Polycyclic olefins such as olefin polymer (COP), vinyl resins such as polyvinyl chloride and polyvinylidene chloride, polystyrene, polyether ether ketone (PEEK), polysulfone (PSF), polyether sulfone (PES), polycarbonate ( PC), polyamide, polyimide, acrylic resin, triacetyl cellulose (TAC), and the like can be used.
- COP olefin polymer
- vinyl resins such as polyvinyl chloride and polyvinylidene chloride
- PEEK polyether ether ketone
- PSF polysulfone
- PES polyether sulfone
- PC polycarbonate
- PC polyamide
- polyimide acrylic resin
- TAC triacetyl cellulose
- the metal film 14 is not particularly limited, but is preferably made of at least one metal selected from the group consisting of gold, silver, aluminum, copper, and platinum, and more preferably made of gold. Furthermore, you may comprise from the alloy of these metals.
- such a metal is suitable as the metal film 14 because it is stable against oxidation and has an increased electric field enhancement effect by surface plasmon light (dense wave) as described later.
- the method for forming the metal film 14 is not particularly limited, and examples thereof include sputtering, vapor deposition (resistance heating vapor deposition, electron beam vapor deposition, etc.), electrolytic plating, electroless plating, and the like. It is done.
- the sputtering method or the vapor deposition method is used because it is easy to adjust the thin film formation conditions.
- the thickness of the metal film 14 is not particularly limited, but is preferably in the range of 5 nm to 500 nm. From the viewpoint of the electric field enhancing effect, more preferably, gold: 20 nm to 70 nm, silver: 20 nm to 70 nm, aluminum: 10 to 50 nm, copper: 20 to 70 nm, platinum: 20 to 70 nm, and alloys thereof: It is desirable to be within the range of 10 to 70 nm.
- the thickness of the metal film 14 is within the above range, surface plasmon light (dense wave) is likely to be generated, which is preferable. Moreover, if it is the metal film 14 which has such thickness, a shape will not be specifically limited.
- an acrylic pressure-sensitive adhesive sheet in which flow path grooves having a predetermined width and a predetermined length are punched can be used as the flow path forming member 20, for example.
- the thickness of such an acrylic pressure-sensitive adhesive sheet is not particularly limited, but is preferably about 0.1 mm.
- the flow path lid member 22 is not particularly limited as long as it is a material having translucency with respect to the excitation light 40 and the fluorescence 48, but the same resin material as that of the dielectric member 12 described above is used. Can be used.
- the channel lid member 22 is provided with a sample inlet 28 and a sample outlet 30 for sending the sample liquid containing the analyte through the channel 18. By connecting the sample inlet 28 and the sample outlet 30 by a circulating liquid feeding means such as a pump, the sample liquid can be circulated in one direction.
- a liquid reservoir 32 is provided at the sample discharge port 30, and for example, the sample liquid is injected into the sample inlet 28 using a pipette or the like, and the aspiration and injection of the sample liquid are repeated with the pipette.
- the sample liquid can be reciprocated in the pipette, the flow path 18 and the liquid reservoir 32, and the analyte in the sample liquid is quickly and efficiently captured by the ligand immobilized on the solid phase membrane. It will be.
- the reaction efficiency between the analyte and the solid phase membrane is increased even with a small amount of sample liquid, and the detection accuracy of the analyte can be improved. it can.
- the reaction layer 16 is provided in the flow path 18 and the sample liquid is sent to the flow path 18.
- the sample liquid is retained in the well portion 19.
- a well lid member 23 is used as the lid member instead of the flow path lid member 22.
- the width of the flow path lid member 22 is designed to be larger than the width of the dielectric member 12 in the optical path cross section of the excitation light 40.
- the holding region 34 can be provided in the flow path lid member 22, and the sensor chip 24 is configured so that the holding region 34 and the chip holding means 36 of the chip loading unit 26 are in contact with each other.
- the loading unit 26 can be loaded.
- the “optical path cross section” means an optical path of the excitation light 40 (a metal film reflected light 40a, which will be described later, and an exit surface reflection) when the excitation light 40 is irradiated from the light projecting unit 38 toward the metal film 14. It means a cross section that coincides with a plane including the optical path of the light 40c.
- a light projecting unit 38 of the SPFS device 11 that irradiates the excitation light 40 is provided on one side surface below the sensor chip 24.
- the light projecting unit 38 is irradiated with a light source composed of, for example, an LD (Laser Diode), an LED (Light Emitting Diode), an HID (High Intensity Discharge) lamp, and the like.
- a collimating lens that converts the reflected light into a parallel light beam.
- FIG. 5 is a schematic diagram illustrating an example of an optical configuration of the light projecting unit 38 in the SPFS system 10 of the present embodiment.
- the optical system of the light projecting unit 38 includes an LD (laser diode) 54 as a light source, a collimating lens 56 for collimating light emitted from the LD 54, and the metal film 14 of the sensor chip 24.
- the excitation light 40 emitted from such a light projecting unit 38 is substantially parallel light.
- the emission wavelength of the LD 54 includes at least a wavelength that generates surface plasmons on the metal film 14.
- the amount of light emitted from the LD 54 changes depending on the measurement environment temperature or the like, and therefore it is necessary to measure the absolute light amount as the light amount correlated with the amount of the subject. In this case, accurate measurement cannot be performed.
- an APC (Auto Power Control) optical system 64 is provided in the light projecting unit 38 in order to keep the emitted light quantity of the light projecting unit 38 constant.
- an APC photodiode 66 and a beam splitter 68 that reflects a part of the excitation light 40 emitted from the aperture 62 to the APC photodiode 66 and emits the remaining light to the metal film 14 are provided. It is an optical system.
- the amount of light reflected by the beam splitter 68 is detected by the APC photodiode 66, and the input current value of the LD 54 is fed back according to the detected amount of light so that the detected amount of light of the APC photodiode 66 becomes constant. That is, control is performed by a control unit (not shown) so that the amount of light emitted from the light projecting unit 38 is constant.
- the beam splitter 68 is desirably formed of, for example, a high refractive index material having a refractive index of 1.6 or more, and the incident angle of the excitation light 40 to the beam splitter 68 is desirably small, for example, 40 ° The following is desirable.
- the optical element such as the LD 54 and the collimating lens 56 in the light projecting unit 38 is decentered due to environmental changes and changes with time, so that the incident angle of the excitation light 40 to the beam splitter 68 changes. Even if it does, since the variation
- the light projecting unit 38 includes an irradiation angle variable mechanism (not shown) so that the incident angle of the excitation light 40 on the metal film 14 can be changed within a predetermined measurement scanning angle range.
- the measurement scanning angle means that the excitation light 40 is emitted from the light projecting unit 38 and the light receiving unit 50 measures scattered light such as fluorescence 48 or plasmon scattered light, or both fluorescence 48 and scattered light.
- the emission angle of the excitation light 40 that scans and emits the light projecting unit 38 (the zero reference for the angle is a perpendicular to the plane of the metal film 14).
- the plasmon scattered light is light scattered by the surface plasmon itself generated on the metal film 14, and its wavelength is equal to the wavelength of the excitation light 40. Note that when the emission angle of the excitation light 40 is scanned, the angle at which the amount of plasmon scattered light is maximized is the enhancement angle, and strong fluorescence intensity due to surface plasmons is obtained at angles near this enhancement angle.
- the enhancement angle depends on the shape and refractive index of the dielectric member 12 in the sensor chip 24, the material and film thickness of the metal film 14, the fluid refractive index in the flow path 18, etc. Considering this, it is desirable to obtain an optimal enhancement angle for each measurement.
- the excitation light 40 is irradiated from the light projecting unit 38 toward the incident surface 12 b of the dielectric member 12 and is incident on the metal film 14 adjacent to the upper surface of the dielectric member 12.
- the fluorescence 48 emitted from the fluorescent material excited by the surface plasmon light (dense wave) generated on the metal film 14 is detected by the light receiving unit 50 provided above the sensor chip 24.
- a photodiode that is a light receiving element for receiving scattered light (plasmon scattered light) or fluorescence 48 generated by surface plasmons, a lens for condensing the photodiode, An excitation light cut filter for cutting light having the wavelength of the excitation light 40 is provided.
- the excitation light cut filter When measuring the fluorescence 48, the excitation light cut filter is installed on the optical path in the light receiving unit 50.
- the plasmon scattered light can be incident on the photodiode while at least a part of the light path in the light receiving unit 50 is retracted.
- the excitation light cut filter is, for example, a bandpass filter made of a dielectric multilayer film, and is installed at a position where the fluorescence 48 becomes a substantially parallel light beam in the optical path in the light receiving unit 50.
- the light receiving element is not limited to a photodiode as long as it can measure the amount of received light, such as a photomultiplier tube or an avalanche photodiode (APD).
- a photodiode such as a photomultiplier tube or an avalanche photodiode (APD).
- the excitation light 40 the light reflected by the metal film 14 (metal film reflected light 40 a) is emitted from the emission surface 12 c of the dielectric member 12.
- a part of the metal film reflected light 40a is reflected by the emission surface 12c, and this emission surface reflected light 40b depends on the incident angle of the excitation light 40 to the metal film 14, The light travels straight toward the incident surface 12b, and exits from the dielectric member 12 through the incident surface 12b.
- the exit surface reflected light 40b is configured not to enter the flow path lid member 22 within the measurement scanning angle. Specifically, by configuring as follows, the exit surface reflected light 40b can be prevented from entering the channel lid member 22 within the measurement scanning angle.
- FIG. 6 is a flowchart for explaining the flow of measurement in the SPFS system of this embodiment.
- the sensor chip 24 is prepared and attached to the chip loading unit 26 of the SPFS system 10.
- the sensor chip 24 is replaced and disposable for each specimen of the biochemical test.
- As a specimen, blood or the like is generally used.
- the enhancement angle is measured.
- the emission angle of the excitation light 40 emitted from the light projecting unit 38 is scanned, the plasmon scattered light is detected by the light receiving unit 50, and the enhancement angle is obtained.
- an excitation light cut filter used in fluorescence measurement described later is retracted from the optical path in the light receiving unit 50.
- plasmon scattered light having the same wavelength as the excitation light 40 can reach the light receiving element in the light receiving unit 50, and the light amount of the plasmon scattered light can be measured by the light receiving unit 50.
- an excitation light cut filter is arranged in the optical path of the light receiving unit 50, the excitation light 40 is irradiated from the light projecting unit 38, the light quantity detected by the light receiving unit 50 is measured, and this light quantity is calculated as an optical blank value. Record as (oB). At this time, the angle of the light projecting unit 38 is set so that the emission angle of the excitation light 40 becomes the enhancement angle obtained by the enhancement angle measurement.
- a fluorescence labeling reaction (secondary reaction) is performed by introducing a fluorescence labeling solution into the flow path 18 and contacting and binding the fluorescence labeled antibody contained in the fluorescence labeling solution to the analyte. This adds a fluorescent label to the analyte. Thereafter, the inside of the flow path 18 is washed to remove excess fluorescently labeled antibody.
- the angle of the light projecting unit 38 is set so that the emission angle of the excitation light 40 becomes an enhancement angle, and the excitation light 40 is placed in the state where the excitation light cut filter is disposed on the optical path in the light receiving unit 50.
- the fluorescence signal value (S) detected by the light receiving unit 50 is measured.
- operations such as movement of the sensor chip 24 and the excitation light cut filter, introduction of the sample liquid into the flow path 18, suction, and washing may be performed manually by the measurer or the SPFS system.
- 10 may have a drive mechanism and a control mechanism which are automatically performed.
- the SPFS system 10 may be provided with a recording means for recording the measurement result and an output means for outputting the result.
- FIG. 7 is a schematic diagram showing an example of the shape of the dielectric member in the SPFS system of the present embodiment.
- the incident surface 12b and the exit surface 12c are smooth surfaces, and the angle formed between the upper surface 12a adjacent to the metal film 14 of the dielectric member 12 and the incident surface 12b.
- ⁇ a and the angle ⁇ b formed by the upper surface 12 a adjacent to the metal film 14 of the dielectric member 12 and the emission surface 12 c are the same angle, in the embodiment shown in FIG. 7, ⁇ a and ⁇ The angle is different from b .
- ⁇ a is smaller than ⁇ b .
- the metal film reflected light 40a is reflected by the emission surface 12c, then reflected by the upper surface 12a, and emitted from the incident surface 12b.
- the outgoing surface reflected light 40b reflected by the upper surface 12a does not travel toward the flow path lid member 22, so that the outgoing surface reflected light 40b does not enter the flow path lid member 22 within the measurement scanning angle.
- ⁇ a is an angle larger than ⁇ b and an obtuse angle.
- the metal film reflected light 40a is reflected from the emission surface 12c and then emitted from the bottom surface 12d.
- the exit surface reflected light 40b can be prevented from entering the flow path lid member 22.
- the output surface 12c may be comprised by the several surface, and in this case, if (theta) a is an angle larger than (theta) b , FIG.7 (b) ), The exit surface reflected light 40b can be prevented from entering the flow path lid member 22.
- the bottom surface 12d of the dielectric member 12 be a scattering surface or a non-planar surface so that the outgoing surface reflected light 40b does not go from the bottom surface 12d to the incident surface 12b.
- the outgoing surface reflected light 40b is more horizontal than the horizontal at the incident surface 12b.
- the light is emitted to the bottom surface side, and the outgoing surface reflected light 40b can be prevented from entering the flow path lid member 22.
- n 1 is the refractive index of the dielectric member 12
- n 0 is the refractive index of the incident surface 12 b of the dielectric member 12 on the excitation light incident side
- ⁇ is the incident angle of the excitation light 40 to the metal film 14.
- the incident surface 12b of the dielectric member 12 when the excitation light 40 is incident, a part of the excitation light 40 is reflected on the incident surface 12b. If such incident surface reflected light 40c enters the channel lid member 22, the same problem as the exit surface reflected light 40b as described above occurs, and therefore the incident surface reflected light 40c becomes the channel lid member 22. It is better not to enter.
- the emission angle ⁇ c of the exit surface reflected light 40b on the entrance surface 12b and the reflection angle ⁇ d of the entrance surface reflected light 40c on the entrance surface 12b are configured to match. It is preferable.
- FIG. 9 shows that the measurement scanning angle of the excitation light 40 is 60 ° to 72 °
- 2 shows the relationship between the emission angle ⁇ c and the reflection angle ⁇ d of the incident surface reflected light 40 c .
- FIG. 10 shows that the measurement scanning angle of the excitation light 40 is 61 ° to 73 °
- 2 shows the relationship between the emission angle ⁇ c and the reflection angle ⁇ d of the incident surface reflected light 40 c .
- a cutout portion 22 a may be provided in a part of the flow path lid member 22 in the cross section of the optical path of the excitation light 40.
- the outgoing surface reflected light 40b emitted from the dielectric member 12 may be reflected on, for example, the wall surface of the SPFS system 10 and cause stray light. For this reason, as shown in FIG. 1, a light shielding member 52 is provided for absorbing the outgoing surface reflected light 40 b emitted from the incident surface 12 b of the dielectric member 12 or reflecting it in a direction that has no influence. Is preferred.
- FIG. 12 is a schematic view schematically showing another example of the SPFS system which is an aspect of the optical analyte detection system of the present invention. Since the SPFS system 10 of this embodiment has basically the same configuration as that of the SPFS system 10 shown in FIG. 1, the same reference numerals are given to the same components and the detailed description thereof is omitted. .
- the sensor chip 24 includes a reagent well 42 formed of a material that is transparent to the excitation light 40.
- the reagent well 42 is a container for storing, for example, a sample liquid or a chemical liquid.
- the sensor chip 24 is loaded into a sensor chip loading hole 44 provided in the reagent well 42.
- the sensor chip 24 and the reagent are loaded by loading the sensor chip 24 into the sensor chip loading hole 44 so that the holding region 34 of the flow path lid member 22 and the holding portion 44a of the sensor chip loading hole 44 are in contact with each other.
- the positional relationship with the well 42 can be kept constant.
- the positional relationship between the sensor chip 24 and the light projecting unit 38 is fixed by loading the chip loading unit 26 so that the holding region 46 of the reagent well 42 and the chip holding unit 36 of the chip loading unit 26 are in contact with each other. Measurement error can be reduced.
- the exit surface reflected light 40b is within the measurement scanning angle of the excitation light 40, and the flow path lid member 22 is used.
- the shape of the dielectric member 12 such as the angles of ⁇ a and ⁇ b can be designed so that the exit surface reflected light 40 b does not enter the reagent well 42.
- a cutout portion 42 a may be provided in a part of the reagent well 42 in the optical path cross section of the excitation light 40.
- the present invention has been described above, but the present invention is not limited to this.
- the SPFS system is taken as an example of one embodiment of the optical specimen detection system.
- various modifications can be made without departing from the object of the present invention, such as being applicable to other aspects such as an SPR system.
- the present invention performs specimen detection with high accuracy and speed in a field that requires high accuracy detection, such as a clinical test such as blood test using surface plasmon excitation enhanced fluorescence spectroscopy (SPFS). be able to.
- SPFS surface plasmon excitation enhanced fluorescence spectroscopy
- SPFS system 11 SPFS apparatus 12 Dielectric member 12a Upper surface 12b Incident surface 12c Output surface 12d Bottom surface 14 Metal film 16 Reaction layer 18 Channel 20 Channel formation member 22 Channel lid member 22a Notch 24 Sensor chip 26 Chip loading part 28 Specimen inlet 30 Specimen outlet 32 Liquid reservoir 34 Holding area 36 Chip holding means 38 Projection unit 40 Excitation light 40a Metal film reflected light 40b Emission surface reflected light 40c Incident surface reflected light 42 Reagent well 42a Notch 44 Sensor chip loading Hole 44a Holding portion 46 Holding region 48 Fluorescence 50 Light receiving unit 52 Light shielding member 54 LD (Laser diode) 56 Collimating lens 58 Polarizing plate 60 Short pass filter 62 Aperture 64 APC optical system 66 APC photodiode 68 Beam splitter 100 SPFS system 101 SPFS device 102 Dielectric member 102a Upper surface 102b Incident surface 102c Output surface 104 Metal film 106 Reaction layer 108 Flow
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Abstract
Description
このような検体検出装置の一つとして、ナノメートルレベルなどの微細領域中で電子と光が共鳴することにより、高い光出力を得る現象(表面プラズモン現象(SPR:Surface Plasmon Resonance))を応用し、例えば、生体内の極微少なアナライトの検出を行うようにした表面プラズモン共鳴装置(以下、「SPR装置」と言う)が挙げられる。
従来のSPFSシステム100は、鉛直断面形状が略台形であるプリズム形状の誘電体部材102と、この誘電体部材102の水平な上面102aに形成された金属膜104と、金属膜104の上面に形成された反応層106と、反応層106を囲繞するように流路108を形成する流路形成部材110及び流路蓋部材112とからなるセンサーチップ114を備えており、このセンサーチップ114は、SPFS装置101のセンサーチップ装填部116に装填されている。
さらに、特許文献1のように、流路蓋部材112の幅が、誘電体部材102の幅よりも大きい場合には、上述したように、発生した迷光が流路蓋部材112に入射することで、測定精度に大きな影響を及ぼしていた。
前記誘電体部材の上面に隣接する金属膜と、
前記金属膜の上面に隣接する反応層と、
前記反応層の上面に配置される蓋部材と、を備えたセンサーチップと、
前記センサーチップを保持するためのチップ保持手段と、
前記金属膜に前記誘電体部材を介して励起光を照射する投光ユニットと、を備え、前記金属膜に前記誘電体部材を介して前記励起光を照射することで検体の検出を行う光学式検体検出システムであって、
前記励起光の光路断面において、前記蓋部材の幅が、前記誘電体部材の幅よりも大きく、
前記励起光が前記誘電体部材の出射面に反射した後、前記誘電体部材外に出射する出射面反射光が、前記励起光の測定走査角度内において、前記蓋部材に入射しないように構成される。
図1は、本発明の光学式検体検出システムの一態様であるSPFSシステムの概略を模式的に示す概略図、図2は、図1のSPFSシステムの一部を底面側から見た概略図である。
なお、本明細書では、図1の状態において、「上」、「下」の方向を規定する。
なお、流路蓋部材22には、アナライトを含む検体液を流路18の送液するための検体流入口28及び検体排出口30を備えている。この検体流入口28と検体排出口30とを、例えば、ポンプなどの循環送液手段によって接続することで、検体液を一方向に循環送液することができる。
なお、本明細書において「光路断面」とは、投光ユニット38から金属膜14に向かって励起光40を照射した場合に、励起光40の光路(後述する金属膜反射光40a、出射面反射光40cの光路を含む)を含む面と一致する断面を意味している。
投光ユニット38は、例えば、LD(Laser Diode:レーザーダイオード)やLED(Light Emitting Diode:発光ダイオード)、HID(High Intensity Discharge)ランプ(高輝度放電ランプ)などからなる光源と、光源から照射された光を平行光束とするコリメートレンズなどを含んで構成される。
図5に示すように、投光ユニット38の光学系は、光源であるLD(レーザーダイオード)54と、LD54から出射した光をコリメートするためのコリメートレンズ56と、センサーチップ24の金属膜14へ照射する励起光40をP偏光とするための偏光板58と、LD54の散乱光や迷光が受光ユニット50により検出されないように一部の波長の光をカットするためのショートパスフィルター60と、金属膜14への照射スポットサイズを規制するためのアパーチャー62とを備えている。
ここで、測定走査角度とは、投光ユニット38から励起光40を出射し、受光ユニット50で蛍光48またはプラズモン散乱光などの散乱光、もしくは蛍光48と散乱光の両方を計測している間に、投光ユニット38を走査し出射する励起光40の出射角度(角度のゼロ基準は、金属膜14平面の垂線)を言う。
具体的には、以下のように構成することによって、出射面反射光40bが、測定走査角度内において、流路蓋部材22に入射しないようにできる。
図6は、本実施例のSPFSシステムにおける測定の流れを説明するフローチャートである。
図1に示す実施例では、誘電体部材12において、入射面12bと出射面12cがそれぞれ平滑面であり、誘電体部材12の金属膜14に隣接する上面12aと、入射面12bとがなす角度θaと、誘電体部材12の金属膜14に隣接する上面12aと、出射面12cとがなす角度θbとが同じ角度になっているが、図7に示す実施例では、θaとθbとが異なる角度となっている。
このように切欠部22aを設けることによって、流路蓋部材22に保持領域34を設けることができるとともに、出射面反射光40bが流路蓋部材22に入射することがない。
この実施例のSPFSシステム10は、基本的には、図1に示すSPFSシステム10と同様な構成であるため、同一の構成部材には同一の符号を付して、その詳細な説明を省略する。
試薬ウェル42は、例えば、検体液や薬液などが収容される容器である。センサーチップ24は、試薬ウェル42に設けられたセンサーチップ装填孔44に装填される。
また、図12に示すように、励起光40の光路断面において、試薬ウェル42の一部に切欠部42aを設けることもできる。
このように切欠部42aを設けることによって、試薬ウェル42に保持領域46を設けることができるとともに、出射面反射光40bが試薬ウェル42に入射することがない。
11 SPFS装置
12 誘電体部材
12a 上面
12b 入射面
12c 出射面
12d 底面
14 金属膜
16 反応層
18 流路
20 流路形成部材
22 流路蓋部材
22a 切欠部
24 センサーチップ
26 チップ装填部
28 検体流入口
30 検体排出口
32 液溜部
34 保持領域
36 チップ保持手段
38 投光ユニット
40 励起光
40a 金属膜反射光
40b 出射面反射光
40c 入射面反射光
42 試薬ウェル
42a 切欠部
44 センサーチップ装填孔
44a 保持部
46 保持領域
48 蛍光
50 受光ユニット
52 遮光部材
54 LD(レーザーダイオード)
56 コリメートレンズ
58 偏光板
60 ショートパスフィルター
62 アパーチャー
64 APC用光学系
66 APC用フォトダイオード
68 ビームスプリッタ
100 SPFSシステム
101 SPFS装置
102 誘電体部材
102a 上面
102b 入射面
102c 出射面
104 金属膜
106 反応層
108 流路
110 流路形成部材
112 流路蓋部材
114 センサーチップ
116 センサーチップ装填部
118 蛍光
120 受光ユニット
122 光源
124 励起光
124b 出射面反射光
126 光吸収部
128 励起光カットフィルタ
Claims (16)
- 誘電体部材と、
前記誘電体部材の上面に隣接する金属膜と、
前記金属膜の上面に隣接する反応層と、
前記反応層の上面に配置される蓋部材と、を備えたセンサーチップと、
前記センサーチップを保持するためのチップ保持手段を有するチップ装填部と、
前記金属膜に前記誘電体部材を介して励起光を照射する投光ユニットと、を備え、前記金属膜に前記誘電体部材を介して前記励起光を照射することで検体の検出を行う光学式検体検出システムであって、
前記励起光の光路断面において、前記蓋部材の幅が、前記誘電体部材の幅よりも大きく、
前記励起光が前記誘電体部材の出射面に反射した後、前記誘電体部材外に出射する出射面反射光が、前記励起光の測定走査角度内において、前記蓋部材に入射しないように構成されている光学式検体検出システム。 - 前記誘電体部材の入射面と出射面が、それぞれ平滑面であり、
前記誘電体部材の前記金属膜に隣接する面と前記入射面とがなす角度θaと、
前記誘電体部材の前記金属膜に隣接する面と前記出射面とがなす角度θbと、が異なる請求項1に記載の光学式検体検出システム。 - 前記誘電体部材の前記金属膜に隣接する面と前記出射面とがなす角度θbが、前記誘電体部材の前記金属膜に隣接する面と前記入射面とがなす角度θaよりも大きい請求項2に記載の光学式検体検出システム。
- 前記励起光の測定走査角度内において、前記入射面における前記出射面反射光の出射角度と、前記入射面における前記励起光の反射角度とが一致する請求項1から4のいずれかに記載の光学式検体検出システム。
- 前記出射面反射光が、前記出射面から前記入射面に向けて直進し、前記誘電体部材外へ出射するように構成されている請求項1から5のいずれかに記載の光学式検体検出システム。
- 前記蓋部材の保持領域と、前記チップ保持手段とが接することで、前記センサーチップと前記投光ユニットとの位置決めがなされる請求項1から6のいずれかに記載の光学式検体検出システム。
- 前記センサーチップが、試薬ウェルをさらに備える請求項1から7のいずれかに記載の光学式検体検出システム。
- 前記試薬ウェルが、前記励起光に対して透光性を有する素材により形成されており、
前記出射面反射光が、前記励起光の測定走査角度内において、前記試薬ウェルに入射しないように構成されている請求項8に記載の光学式検体検出システム。 - 前記試薬ウェルの保持領域と、前記チップ保持手段とが接することで、前記センサーチップと前記投光ユニットとの位置決めがなされる請求項8または9に記載の光学式検体検出システム。
- 前記励起光の光路断面において、前記試薬ウェルの一部に切欠部を有する請求項8から10のいずれかに記載の光学式検体検出システム。
- 前記励起光の光路断面において、前記蓋部材の一部に切欠部を有する請求項1から11のいずれかに記載の光学式検体検出システム。
- 前記誘電体部材の底面が散乱面である請求項1から12のいずれかに記載の光学式検体検出システム。
- 前記誘電体部材の底面が非平面である請求項1から13のいずれかに記載の光学式検体検出システム。
- 前記出射面反射光の光量が、前記励起光の光量の2%よりも大きい請求項1から14のいずれかに記載の光学式検体検出システム。
- 前記光学式検体検出システムが、遮光部材をさらに備え、
前記入射面から出射した前記出射面反射光が、前記遮光部材に照射されるように構成されている請求項1から15のいずれかに記載の光学式検体検出システム。
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