WO2017073429A1 - Dispositif de mesure de gaz et procédé de mesure de gaz - Google Patents

Dispositif de mesure de gaz et procédé de mesure de gaz Download PDF

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Publication number
WO2017073429A1
WO2017073429A1 PCT/JP2016/080966 JP2016080966W WO2017073429A1 WO 2017073429 A1 WO2017073429 A1 WO 2017073429A1 JP 2016080966 W JP2016080966 W JP 2016080966W WO 2017073429 A1 WO2017073429 A1 WO 2017073429A1
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Prior art keywords
gas
concentration
gas cloud
cloud
processing unit
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PCT/JP2016/080966
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English (en)
Japanese (ja)
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土屋　信介
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コニカミノルタ株式会社
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Publication of WO2017073429A1 publication Critical patent/WO2017073429A1/fr

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/35—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
    • G01N21/3504—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light for analysing gases, e.g. multi-gas analysis
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/35—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
    • G01N21/359—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light using near infrared light

Definitions

  • the present invention relates to a gas measuring apparatus and a gas measuring method for measuring a predetermined gas located in a space, such as a leaked gas leaked into the space, and in particular, a gas capable of measuring a gas concentration / thickness product at one measurement point.
  • the present invention relates to a measuring apparatus and a gas measuring method.
  • Patent Document 1 discloses a technique for obtaining a concentration thickness product.
  • P B -P A ⁇ exp ( ⁇ ( ⁇ ) ct) S ( ⁇ ) [B (T back — B, ⁇ ) ⁇ B (T back — A , ⁇ )] d ⁇ (1)
  • P A is the amount of infrared rays are observed by an infrared camera at the location A
  • B (T back_A, ⁇ ) is the background radiation amount of infrared rays at a point A (T back_A is the background temperature at the location A , ⁇ is the wavelength)
  • P B is the amount of infrared radiation observed by the infrared camera at location B
  • B (T back — B, ⁇ ) is the amount of background radiation infrared at location B (T back — B is location B)
  • S ( ⁇ ) is the transmittance of the optical system
  • ct is the gas concentration-thickness product (c is the concentration
  • t is the thickness
  • ⁇ is the background radiation.
  • ⁇ ( ⁇ ) is the gas
  • the present invention has been made in view of the above-described circumstances, and an object thereof is to provide a gas measuring device and a gas measuring method capable of measuring a gas concentration thickness product at one measurement point.
  • the gas measuring device and the gas measuring method according to the present invention determine the amount of infrared rays at one location in a gas cloud formed of a predetermined gas in a space based on an infrared image, and determine the amount of infrared rays obtained and the gas temperature of the gas cloud. Based on the above, the concentration thickness product of the gas cloud is obtained. Therefore, the gas measuring device and the gas measuring method according to the present invention can measure the gas concentration / thickness product at one measurement point.
  • FIG. 1 is a block diagram illustrating a configuration of a gas measurement device according to an embodiment.
  • Drawing 2 is a mimetic diagram for explaining the use situation of the gas measuring device in an embodiment.
  • FIG. 3 is a diagram showing a characteristic curve of transmittance with respect to wavelength in methane gas as an example.
  • the horizontal axis in FIG. 3 is the wavelength ⁇ expressed in nm, and the vertical axis is the transmittance ⁇ .
  • FIG. 4 is a diagram showing a characteristic curve of spectral radiance with respect to wavelength in methane gas as an example.
  • the horizontal axis in FIG. 4 is the wavelength ⁇ expressed in nm
  • the vertical axis is the spectral radiance expressed in W / m 2 / Sr / nm.
  • the gas measurement device extracts a gas cloud image region of a gas cloud formed with a predetermined gas in a space from an infrared image of a predetermined target region, and the concentration thickness of the extracted gas cloud image region in the gas cloud It is a device that calculates the product. More specifically, the gas measurement device according to the embodiment includes an infrared image acquisition unit that acquires an infrared image of a target region, and a predetermined gas in the space based on the infrared image of the target region acquired by the infrared image acquisition unit.
  • a gas cloud processing unit that extracts a gas cloud image region of the formed gas cloud, a gas cloud temperature acquisition unit that acquires a gas temperature of the gas cloud, and an infrared image acquisition unit that determines the amount of infrared rays at one location in the gas cloud And a concentration / thickness product processing unit that calculates the concentration / thickness product of the gas cloud based on the determined infrared amount and the gas temperature detected by the gas cloud temperature acquisition unit.
  • the target region may be arbitrary, but is preferably a region including a gas storage unit that stores gas such as a gas pipe (pipe) or a gas tank, and in this case, the gas cloud is the gas storage unit. It is a gas cloud formed by the leaked gas of the gas leaking from.
  • the gas measuring device D in the present embodiment includes a control processing unit 4, an interface unit (IF unit) 7, and a storage unit 8, and in the example illustrated in FIG. 1. Furthermore, an infrared imaging unit 1, a visible imaging unit 2, a gas cloud temperature detection unit 3, an input unit 5, and a display unit 6 are provided.
  • the infrared imaging unit 1 is an apparatus that is connected to the control processing unit 4 and images the target region in the infrared under the control of the control processing unit 4 and generates an infrared image of the target region.
  • the infrared imaging unit 1 is, for example, an imaging optical system that forms an infrared optical image (infrared optical image) of a target region on a predetermined imaging surface, and a light receiving surface that is aligned with the imaging surface.
  • An infrared image sensor that converts an infrared optical image of the target region into an electrical signal, and an infrared image processing unit that generates infrared image data by performing image processing on the output of the infrared image sensor.
  • Such as a camera Such as a camera.
  • the infrared imaging unit 1 outputs an infrared image (infrared image data) of the target area to the control processing unit 4.
  • the visible imaging unit 2 is an apparatus that is connected to the control processing unit 4 and that visually captures a target region under the control of the control processing unit 4 and generates a visible image of the target region.
  • the visible imaging unit 2 is, for example, an imaging optical system that forms an optical image of a target region (optical image of visible light) on a predetermined imaging surface, and a light receiving surface that is aligned with the imaging surface, An image sensor that converts an optical image of the target region into an electrical signal, and a visible camera that includes a visible image processing unit that generates visible image data by performing image processing on the output of the image sensor.
  • the visible imaging unit 2 outputs a visible image (visible image data) of the target area to the control processing unit 4.
  • the gas cloud temperature detection unit 3 is an apparatus that is connected to the control processing unit 4 and detects the gas temperature of the gas cloud formed with a predetermined gas in the space under the control of the control processing unit 4.
  • the gas cloud temperature detection unit 3 includes, for example, a temperature sensor that detects an atmospheric temperature (atmospheric temperature).
  • the gas temperature is regarded as the atmospheric temperature.
  • the temperature sensor includes, for example, a thermistor and its peripheral circuit.
  • the gas cloud temperature detection unit 3 outputs the detected gas temperature (atmospheric temperature in the present embodiment) to the control processing unit 4.
  • the input unit 5 is connected to the control processing unit 4, and executes measurement of gas such as input of various commands such as a command for instructing start of a measurement operation for measuring gas and input of an identifier of a target region, for example.
  • Is a device for inputting various necessary data to the gas measuring device D for example, a plurality of input switches, keyboards and mice assigned with predetermined functions.
  • the display unit 6 is connected to the control processing unit 4, and commands and data input from the input unit 5 as well as the gas cloud, concentration thickness product, concentration measured by the gas measuring device D under the control of the control processing unit 4.
  • a device that outputs a risk level described later for example, a display device such as a CRT (Cathode Ray Tube) display, a liquid crystal display, and an organic EL (Electroluminescence) display.
  • CTR Cathode Ray Tube
  • LCD Organic EL
  • a touch panel may be configured from the input unit 5 and the display unit 6.
  • the input unit 5 is a position input device that detects and inputs an operation position such as a resistance film type or a capacitance type.
  • a position input device is provided on the display surface of the display device, one or more input content candidates that can be input to the display device are displayed, and the user touches the display position where the input content to be input is displayed. Then, the position is detected by the position input device, and the display content displayed at the detected position is input to the gas measurement device D as the operation input content of the user.
  • the gas measuring device D that is easy to handle for the user is provided.
  • the IF unit 7 is a circuit that is connected to the control processing unit 4 and inputs / outputs data to / from an external device according to the control of the control processing unit 4.
  • an interface circuit of an RS-232C that is a serial communication system
  • the IF unit 7 is a communication card or the like that communicates by wire or wirelessly, and may communicate with an external device such as a server device via a communication network such as an Ethernet environment (Ethernet is a registered trademark). Is).
  • the storage unit 8 is a circuit that is connected to the control processing unit 4 and stores various predetermined programs and various predetermined data under the control of the control processing unit 4.
  • the various predetermined programs include, for example, a space based on a control program for controlling each part of the gas measuring device D according to the function of each part, or an infrared image of the target area generated by the infrared imaging unit 1.
  • a gas cloud processing program for extracting a gas cloud image region of a gas cloud formed with a predetermined gas, a concentration / thickness product processing program for determining a concentration / thickness product of the gas cloud, and the concentration / thickness product processing program A concentration processing program for determining the concentration of the gas cloud based on the concentration / thickness product of the gas cloud, or an index representing the degree of danger based on the concentration / thickness product of the gas cloud determined by the concentration / thickness product processing program.
  • a risk processing program for determining the risk, a visible image of the target region generated by the visible imaging unit 2, a gas cloud image region extracted by the gas cloud processing program, A display for displaying on the display unit 6 the concentration thickness product of the gas cloud determined by the concentration thickness product processing program, the concentration of the gas cloud determined by the concentration processing program, and the degree of danger determined by the risk processing program.
  • a control processing program such as a processing program is included.
  • the various predetermined data includes data necessary for executing each program.
  • the storage unit 8 includes, for example, a ROM (Read Only Memory) that is a nonvolatile storage element, an EEPROM (Electrically Erasable Programmable Read Only Memory) that is a rewritable nonvolatile storage element, and the like.
  • the storage unit 8 includes a RAM (Random Access Memory) serving as a working memory of the so-called control processing unit 4 that stores data generated during the execution of the predetermined program.
  • the storage unit 8 may include a hard disk having a relatively large
  • the control processing unit 4 controls each part of the gas measuring device D according to the function of each part, and obtains and displays the concentration thickness product, concentration and risk in a gas cloud formed of a predetermined gas in the space. Circuit.
  • the control processing unit 4 includes, for example, a CPU (Central Processing Unit) and its peripheral circuits.
  • the control processing unit 4 includes a control unit 41, a gas cloud processing unit 42, a concentration / thickness product processing unit 43, a concentration processing unit 44, a risk level processing unit 45, and a display processing unit 46 by executing a control processing program. Functionally configured.
  • the control part 41 is for controlling each part of the gas measuring device D according to the function of each part.
  • the gas cloud processing unit 42 extracts a gas cloud image region of a gas cloud formed with a predetermined gas in the space based on the infrared image of the target region generated by the infrared imaging unit 1.
  • the gas measurement device D can capture the infrared image and the visible image in the target region with the infrared imaging unit 1 and the visible imaging unit 2, respectively.
  • the imaging direction of the infrared imaging unit 1 and the imaging direction of the visible imaging unit 2 are fixedly arranged toward the target area.
  • the infrared imaging unit 1 arranged in this manner images infrared rays (background radiation infrared rays and background radiation infrared rays) radiated (radiated) by individual objects (background objects) OB present in the target region. Then, as shown in FIG.
  • background radiation Infrared rays reach the infrared imaging unit 1 via the gas cloud GS.
  • the gas cloud GS absorbs a part of the background radiation infrared rays at the wavelength of the absorption line unique to the gas, and radiates infrared rays according to the temperature of the gas cloud GS itself.
  • the amount of absorption with respect to the background radiation infrared ray follows the concentration of the gas cloud GS and the thickness of the gas cloud GS.
  • the gas cloud processing unit 42 extracts, for example, a pixel region having a luminance value change amount per unit time that is equal to or less than a predetermined determination threshold value Dth from the infrared image of the target region.
  • a gas cloud image region of the gas cloud GS can be extracted.
  • the concentration / thickness product processing unit 43 obtains the concentration / thickness product of the gas cloud.
  • the concentration / thickness product processing unit 43 obtains an infrared ray amount at one location in the gas cloud based on the infrared image generated by the infrared imaging unit 1, and obtains the obtained infrared ray amount and the gas cloud temperature detection unit 3.
  • the concentration-thickness product of the gas cloud is obtained based on the gas temperature detected in step (b). More specifically, as described above, the concentration / thickness product processing unit 43 absorbs a part of the background radiation infrared ray at the wavelength of the absorption line specific to the gas and emits infrared rays corresponding to the temperature of the gas cloud GS itself.
  • the concentration thickness product of the gas cloud is obtained.
  • B (T back , ⁇ ) is the amount of infrared radiation (background radiation amount) radiated (radiated) in the background, is a function of the background temperature T back and wavelength ⁇
  • B (T g , ⁇ ) is gas It is the amount of infrared radiation (gas radiation infrared radiation amount, gas radiation infrared radiation amount) radiated (radiated) by the gas of the cloud GS, and is a function of the gas temperature Tg and the wavelength ⁇ .
  • the function forms (forms of function graphs) in the functions of ⁇ g ( ⁇ , ct), B (T back , ⁇ ) and B (T g , ⁇ ) are known in advance.
  • the transmittance ⁇ for the wavelength ⁇ in methane gas is the characteristic curve shown in FIG. 3
  • the spectral radiance for the wavelength ⁇ in methane gas is the characteristic curve shown in FIG.
  • the amount of gas radiation infrared rays is obtained based on the spectral radiance.
  • the background radiation infrared ray amount is obtained based on the black body radiation with the background object regarded as a black body.
  • the integrals of Equations 2 and 3 are executed over the observed infrared wavelength range.
  • the gas measuring device D obtains the infrared ray amount P, the background temperature T back and the gas temperature T g for one place in the gas cloud image region, and the concentration / thickness product processing unit 43 calculates the value of the concentration / thickness product ct using Equation 2.
  • the concentration / thickness product ct at which both sides of Equation 2 are the same may be obtained as the concentration / thickness product ct of the gas cloud GS.
  • the concentration / thickness product processing unit 43 assigns the value of the concentration / thickness product ct to Equation 3
  • the concentration thickness product ct at which both sides of 3 are the same may be obtained as the concentration thickness product ct of the gas cloud GS.
  • the background temperature T back may be obtained based on the luminance value (outside area luminance value) of the image in the vicinity of the gas cloud image area in the target area and outside the gas cloud image area, and includes the wavelength of the absorption line.
  • a region corresponding to the gas cloud image region in the infrared image of the target region obtained by attaching the band-pass filter having a non-infrared wavelength range to the transmission wavelength band to the infrared imaging unit 1 through the band-pass filter. May be obtained based on the brightness value (region brightness value).
  • a correspondence relationship (first conversion temperature correspondence relationship) between the out-of-region luminance value of the infrared image and the temperature (background temperature T back ) is stored in advance in the storage unit 8 as one of the various predetermined data.
  • the stored gas measurement device D uses the control processing unit 4 to obtain the background temperature T back corresponding to the out-of-region luminance value of the image outside the gas cloud image region from the first conversion temperature correspondence relationship.
  • a correspondence relationship (second conversion temperature correspondence relationship) between the region luminance value of the infrared image and the temperature (background temperature T back ) is stored in advance in the storage unit 8 as one of the various predetermined data, and gas measurement is performed.
  • the device D uses the control processing unit 4 to obtain the background temperature T back corresponding to the region luminance value of the region corresponding to the gas cloud image region from the second converted temperature correspondence relationship.
  • the concentration processing unit 44 obtains the length of the horizontal line passing through the one place in the gas cloud (the lateral width of the gas cloud at the one place), and the obtained horizontal line.
  • the concentration of the gas cloud is obtained from the concentration / thickness product of the gas cloud obtained by the concentration / thickness product processing unit 43 using the length of the gas cloud as the thickness of the gas cloud. That is, the concentration is obtained as an average concentration by dividing the concentration-thickness product by the thickness.
  • the risk level processing unit 45 calculates a risk level that is an index representing the degree of risk (for example, toxicity, explosiveness, etc.) with respect to the gas cloud concentration / thickness product determined by the concentration / thickness product processing unit 43. More specifically, a correspondence relationship (risk degree correspondence relationship) between the concentration thickness product of the gas cloud and the risk level (risk level correspondence relationship) is stored in advance in the storage unit 8 as one of the various predetermined data, and the risk level processing unit 45 is The degree of risk for the concentration thickness product ct of the gas cloud obtained by the concentration / thickness product processing unit 43 is obtained from the risk correspondence relationship.
  • a low density risk product “ct” that is equal to or less than a preset first risk determination threshold Gth1 is associated with “low risk” and the first risk determination threshold Gth1
  • the density thickness product ct exceeding the preset second risk determination threshold Gth2 is associated with the medium risk “medium risk”
  • the density exceeding the second risk determination threshold Gth2 “High risk level” with high risk is associated with the thickness product ct.
  • the risk processing unit 45 is based on the concentration determined by the concentration processing unit 44 and the lower explosion limit concentration that is the lowest concentration at which the gas explodes.
  • the explosion risk which is an index representing the degree of explosion risk, is obtained as the risk. More specifically, a correspondence relationship (explosion risk correspondence relationship) between the concentration of the gas cloud and the explosion risk (explosion risk correspondence) is stored in advance in the storage unit 8 as one of the various predetermined data. Then, the explosion risk for the gas cloud concentration c obtained by the concentration processing unit 44 is obtained from the explosion risk correspondence relationship.
  • the lower explosive concentration is, for example, the lower explosive limit that is the lowest concentration that causes combustible gas to mix with air and cause an explosion upon ignition, and the explosive risk correspondence relationship is set in advance.
  • the concentration c below the first risk determination threshold Gth1 (for example, 5% LEL or the like) is associated with “explosion risk 0” having no danger, and is set in advance exceeding the first risk determination threshold Gth1.
  • the concentration c below the second risk determination threshold Gth2 (for example, 10% LEL) is associated with “explosion risk 1” having a low risk, and is set in advance exceeding the second risk determination threshold Gth2.
  • the concentration c equal to or lower than the third risk determination threshold Gth3 (for example, 20% LEL) is associated with “explosion risk 2”, which is a medium risk, and the third risk determination threshold.
  • a concentration c that exceeds Gth3 and is equal to or less than a preset fourth risk determination threshold Gth4 (for example, 30% LEL) is associated with “explosion risk 3” having a high risk, and the fourth risk determination threshold.
  • Concentration c exceeding Gth4 is associated with dangerous “explosion caution”.
  • the degree of risk is classified into a plurality of stages, for example, three stages, five stages, and the like according to the concentration.
  • the minimum explosion concentration (lower explosion limit) c is 5% in the air, and the 5% concentration corresponds to 100% LEL. For this reason, for example, in methane gas, the concentration of 2.5% is 50% LEL, and the concentration of 1% is 20% LEL.
  • the display processing unit 46 includes a visible image of the target region generated by the visible imaging unit 2, a gas cloud image region extracted by the gas cloud processing unit 42, and a concentration / thickness product of the gas cloud obtained by the concentration / thickness product processing unit 43.
  • the concentration of the gas cloud determined by the concentration processing unit 44 and the risk level determined by the risk level processing unit 45 are displayed on the display unit 6. More specifically, the display processing unit 46 superimposes the gas cloud image region extracted by the gas cloud processing unit 42 on the visible image of the target region generated by the visible imaging unit 2 and displays it on the display unit 6.
  • the concentration-thickness product, the concentration, and the risk level are displayed on the display unit 6 in association with the gas cloud image region.
  • the gas measuring device D includes the infrared imaging unit 1, the visible imaging unit 2, the gas cloud temperature detection unit 3, the control processing unit 4, the input unit 5, the display unit 6, the IF unit 7, and the storage unit 8.
  • a single unit may be configured.
  • the infrared imaging unit 1 corresponds to an example of an infrared image acquisition unit that acquires an infrared image of a target region
  • the gas cloud temperature detection unit 3 is a gas cloud temperature acquisition unit that acquires the gas temperature of the gas cloud. It corresponds to an example.
  • the gas measurement device D includes a sensor unit configured by combining the infrared imaging unit 1, the visible imaging unit 2, and the gas cloud temperature detection unit 3, the control processing unit 4, the input unit 5, and the display unit 6.
  • the IF unit 7 and the storage unit 8 may be configured as a single unit, and may include a main body unit that is communicably connected to the sensor unit by wire or wirelessly.
  • the IF unit 7 corresponds to another example of an infrared image acquisition unit that acquires an infrared image of the target region, and further corresponds to another example of a gas cloud temperature acquisition unit that acquires the gas temperature of the gas cloud.
  • the display unit 6 may be further separated in a state where it is communicably connected by wire or wireless so that it can be monitored at a remote place, and may be arranged at a remote place.
  • FIG. 5 is a flowchart illustrating the operation of the gas measurement device according to the embodiment.
  • FIG. 6 is a schematic diagram for explaining a display screen of the gas measurement device according to the embodiment.
  • Such a gas measuring device D is arranged with the imaging direction of the infrared imaging unit 1 and the imaging direction of the visible imaging unit 2 facing the target area, and when a power switch (not shown) is turned on by the user (operator).
  • the control processing unit 4 executes initialization of each necessary unit, and by executing the control processing program, the control processing unit 4 includes the control unit 41, the gas cloud processing unit 42, the concentration / thickness product processing unit 43, and the concentration processing.
  • the unit 44, the risk level processing unit 45, and the display processing unit 46 are functionally configured.
  • the gas measuring apparatus D captures and acquires an infrared image of the target area by imaging the target area with the infrared imaging unit 1.
  • the infrared image (image data of the infrared image) of the target area is output from the infrared imaging unit 1 to the control processing unit 4 (S1).
  • the gas measuring device D captures and captures the target area with the visible imaging unit 2, and generates and acquires a visible image of the target area.
  • the visible image of the target area (image data of the visible image) is output from the visible imaging unit 2 to the control processing unit 4 (S2).
  • the gas measuring device D determines whether or not a gas cloud GS formed of a predetermined gas is generated in the space of the target region by the control processing unit 4 (S3).
  • the control processing unit 4 causes the gas cloud processing unit 42 to extract a gas cloud image region of the gas cloud GS based on the infrared image of the target region generated by the infrared imaging unit 1.
  • the control processing unit 4 determines that the gas cloud GS is not generated, and executes a process S10 described later.
  • the control processing unit 4 determines that the gas cloud GS is generated, and executes the next process S4.
  • the gas measuring apparatus D by the gas cloud temperature detection unit 3 (in the present embodiment the atmospheric temperature) gas temperature Gasukumo GS is obtained by detecting the T g.
  • This gas temperature (atmospheric temperature) Tg is output from the gas cloud temperature detection unit 3 to the control processing unit 4.
  • the gas measuring device D obtains the background temperature T back based on the infrared image of the target area generated by the infrared imaging unit 1 by the control processing unit 4 (S5). More specifically, for example, the control processing unit 4 obtains an out-of-region luminance value of an image in the vicinity of the gas cloud image region and outside the gas cloud image region, and calculates the background temperature T back corresponding to the out-of-region luminance value. Obtained from the first conversion temperature correspondence stored in advance in the storage unit 8.
  • control processing unit 4 is configured such that the gas cloud image region in the infrared image of the target region obtained by the infrared imaging unit 1 through a bandpass filter whose transmission wavelength band is an infrared wavelength range not including the wavelength of the absorption line. It obtains a region luminance value of the region corresponding to, determined from pre-stored second conversion temperature relationship background temperature T back corresponding to the area luminance value in the storage unit 8.
  • processing S4 and processing S5 may be executed with their processing order interchanged with each other, or may be executed in parallel (in parallel processing).
  • the gas measuring apparatus D uses the concentration / thickness product processing unit 43 to generate an infrared image of the gas cloud image region generated by the infrared imaging unit 1 by using the infrared amount of one location in the gas cloud GS extracted by the gas cloud processing unit 42.
  • the concentration thickness product ct of the gas cloud GS is obtained based on the obtained infrared amount and the gas temperature detected by the gas cloud temperature detection unit 3 (S6).
  • the gas measuring device D obtains the length of the horizontal line passing through the one place in the gas cloud GS in the gas cloud image region extracted by the gas cloud processing unit 42 by the concentration processing unit 44, and the obtained horizontal line.
  • the concentration c of the gas cloud GS is obtained from the concentration / thickness product ct of the gas cloud GS obtained by the concentration / thickness product processor 43 with the length of the gas cloud GS as the thickness (S7). More specifically, the concentration processing unit 44 calculates the concentration c of the gas cloud GS by dividing the concentration / thickness product ct of the gas cloud GS determined by the concentration / thickness product processing unit 43 by the thickness.
  • the gas measuring device D obtains the degree of risk with respect to the concentration / thickness product ct of the gas cloud GS obtained by the concentration / thickness product processing unit 43 by the risk processing unit 45 (S8). More specifically, in the present embodiment, the risk level processing unit 45 determines the concentration c obtained in step S6 by the concentration processing unit 44 based on the concentration thickness product ct of the gas cloud GS obtained by the concentration thickness product processing unit 43. Is determined from the explosion risk correspondence relationship.
  • the gas measuring device D obtains the visible image of the target region generated by the visible imaging unit 2, the gas cloud image region extracted by the gas cloud processing unit 42, and the concentration / thickness product obtained by each of the above-described processes.
  • Degree) is displayed on the display unit 6 by the display processing unit 46 (S9). More specifically, the display processing unit 46 aligns and superimposes the gas cloud image region extracted by the gas cloud processing unit 42 on the visible image of the target region generated by the visible imaging unit 2. Displayed on the display unit 6, the concentration-thickness product ct, the concentration c, and the explosion risk are displayed on the display unit 6 in association with a predetermined location in the gas cloud image region.
  • FIG. 6 shows how to obtain the thickness of the gas cloud GS, but it may be omitted in the display of each information.
  • one predetermined spot SP in the gas cloud GS is set in the gas cloud image region extracted in each of the processes S1 to S3.
  • the predetermined one spot SP in the gas cloud GS is set to the geometric gravity center position in the gas cloud image region.
  • the predetermined one spot SP in the gas cloud GS is set in the vicinity of a gas leak point (leak position) in the gas cloud image region as shown in FIG.
  • the leak location can be estimated, for example, by tracing a plurality of time-series gas cloud image regions back in time. Further, for example, the leakage location (leakage position) is obtained, for example, by obtaining a plurality of optical flows in the gas cloud GS based on a plurality of gas cloud image regions continuous in time series, and tracing the plurality of optical flows back in time. Can be estimated. Then, the concentration thickness product ct, the concentration c, and the explosion risk degree are determined for each of the predetermined locations SP by each of the processes S4 to S8.
  • the concentration processing unit 44 obtains the length Wx of the horizontal line SL passing through the one spot SP in the gas cloud GS as shown in FIG.
  • the actual length of the region shown in one pixel is stored in advance in the storage unit 8 as one of the various predetermined data, the number of pixels of the horizontal line SL in the gas image region is counted, and the counted number of pixels.
  • step S9 the display processing unit 46 adds the gas cloud image of the gas cloud GS extracted by the gas cloud processing unit 42 to the visible image of the target area generated by the visible imaging unit 2, as shown in FIG. The regions are aligned and superimposed and displayed on the display unit 6. Then, as shown in FIG. 6, the display processing unit 46 displays the predetermined one spot SP on the display unit 6, and associates this with the concentration thickness product ct (in the example shown in FIG. 6, 6% LEL ⁇ m), concentration c (6% LEL in the example shown in FIG. 6), and explosion risk (“explosion risk 1” in the example shown in FIG. 6) are displayed on the display unit 6.
  • concentration thickness product ct in the example shown in FIG. 6, 6% LEL ⁇ m
  • concentration c 6% LEL in the example shown in FIG. 6
  • explosion risk explosion risk 1
  • the risk processing unit 45 further determines whether or not the concentration obtained by the concentration processing unit 44 is equal to or higher than a warning determination threshold Ath for determining execution of the warning, and obtained by the concentration processing unit 44.
  • the display processing unit 46 changes the display color of the explosion risk, for example, to a color different from a normal display color (display color when no warning is accompanied) or an explosion risk.
  • the warning is executed in a display form such as blinking the degree.
  • the concentration obtained by the concentration processing unit 44 is equal to or higher than the warning determination threshold Ath, the warning is not executed.
  • the warning may be executed with a sound such as a warning sound or a warning voice message.
  • step S ⁇ b> 10 the gas measuring device D determines whether or not the input processing unit 5 has accepted the end of the measurement operation by the user, and inputs the end of the measurement operation. If it is received by the unit 5 (Yes), the process ends, and if the end of the measurement operation is not received by the input unit 5 (No), the process returns to the process S1.
  • the gas measuring device D in this embodiment and the gas measuring method mounted on the gas measuring device D calculate the concentration thickness product of the gas cloud based on the amount of infrared rays at one location in the gas cloud GS and the gas temperature. Since the required concentration / thickness product processing unit 43 is provided, the concentration / thickness product of gas can be measured at one measurement point.
  • the gas measuring apparatus D and the gas measuring method use the above-described relational expression, it is possible to preferably measure the gas concentration thickness product at one measurement point.
  • the gas measuring device D and the gas measuring method constitute the gas cloud temperature detecting unit 3 using a temperature sensor that detects the temperature of the atmosphere, the gas temperature can be detected more easily.
  • the user can determine the risk of the gas cloud GS by referring to the risk obtained by the risk processing unit 45.
  • an explosion risk can be obtained as the risk.
  • the gas measuring device D and the gas measuring method can warn of the risk of explosion by displaying the explosion risk level on the display unit 6.
  • the concentration processing unit 44 Since the gas measuring device D and the gas measuring method include the concentration processing unit 44, the concentration of the gas cloud GS can be measured.
  • the gas measurement device is formed of a predetermined gas in a space based on an infrared image acquisition unit that acquires an infrared image of a target region and the infrared image of the target region acquired by the infrared image acquisition unit
  • a gas cloud processing unit that extracts a gas cloud image region of the gas cloud, a gas cloud temperature acquisition unit that acquires a gas temperature of the gas cloud, and an infrared image acquisition unit that acquires an infrared amount at one location in the gas cloud
  • a concentration-thickness product processing unit that obtains the concentration-thickness product of the gas cloud based on the obtained infrared amount and the gas temperature detected by the gas cloud temperature acquisition unit.
  • the infrared image acquisition unit is an interface unit that receives input of data from an external device, and the interface unit captures an image of a target region in infrared as the external device.
  • An infrared image of the target area is input from an infrared imaging unit that generates an infrared image of the area.
  • the infrared image acquisition unit is an infrared imaging unit that captures an infrared region of the target region and generates an infrared image of the target region.
  • the gas cloud temperature acquisition unit is an interface unit that receives data input from an external device, and the interface unit detects a gas temperature of the gas cloud.
  • the gas cloud temperature acquisition unit is a gas cloud temperature detection unit that detects a gas temperature of the gas cloud.
  • Such a gas measuring device includes a concentration / thickness product processing unit that obtains the concentration / thickness product of the gas cloud based on the amount of infrared rays at one location in the gas cloud and its gas temperature, Concentration thickness product can be measured.
  • the concentration-thickness product processing unit includes an amount of infrared rays absorbed by the gas cloud and an amount of infrared rays radiated from the gas cloud.
  • the concentration-thickness product of the gas cloud is obtained based on the obtained amount of infrared rays and the gas temperature acquired by the gas cloud temperature acquisition unit.
  • the relational expression is such that an infrared ray amount at one place in the gas cloud is P, and the absorption rate of the gas is a function ⁇ g ( ⁇ , ct) of a wavelength ⁇ and a concentration thickness product ct.
  • the amount of infrared rays radiated (radiated) in the background is a function B (T back , ⁇ ) of the background temperature T back and the wavelength ⁇ , and the amount of infrared rays radiated by the gas of the gas cloud
  • (gas radiation infrared ray amount) is a function B (T g , ⁇ ) of the gas temperature T g and the wavelength ⁇
  • P ⁇ [ ⁇ g ( ⁇ , ct) B (T back , ⁇ ) + (1 ⁇ ⁇ g ( ⁇ , ct)) B (T g, ⁇ )] d ⁇ ( where integral ⁇ is executed) over the wavelength range of the observed infrared.
  • the gas concentration thickness product can be preferably measured at one measurement point.
  • the gas cloud temperature acquisition unit is a temperature sensor that detects the temperature of the atmosphere.
  • Such a gas measuring device constitutes the gas cloud temperature acquisition unit using a temperature sensor that detects the temperature of the atmosphere, the gas temperature can be detected more easily.
  • the unit is further provided.
  • such a gas measuring device further includes the risk processing unit
  • the user refers to the risk (eg, toxicity risk or explosive risk) obtained by the risk processing unit.
  • the danger of the gas cloud can be determined.
  • the length of the horizontal line passing through the one place in the gas cloud is obtained, and the concentration-thickness product processing unit is defined by using the obtained length of the horizontal line as the thickness of the gas cloud.
  • Such a gas measuring device further includes a concentration processing unit, the concentration of the gas cloud can be measured.
  • the risk processing unit may determine an explosion risk based on the concentration obtained by the concentration processing unit and an explosion lower limit concentration that is a minimum concentration at which the gas explodes.
  • An explosion risk level which is an index representing the degree, is obtained as the risk level.
  • the lower explosion limit concentration is a lower explosive limit (Low Explosive Limit) which is a lowest concentration at which a combustible gas mixes with air and causes an explosion upon ignition.
  • Such a gas measuring device can determine the explosion risk as the risk.
  • the gas measurement method includes an infrared image acquisition step of acquiring an infrared image of a target region, and a space based on the infrared image of the target region acquired in the infrared image acquisition step.
  • a gas cloud processing unit for extracting a gas cloud image region of a gas cloud formed of a predetermined gas; a gas cloud temperature acquisition step for acquiring a gas temperature of the gas cloud; and an infrared ray amount at one location in the gas cloud
  • a concentration-thickness product processing step for obtaining a concentration-thickness product of the gas cloud based on the infrared amount obtained in the infrared image acquisition step and the gas temperature detected in the gas cloud temperature acquisition step.
  • Such a gas measuring method includes a concentration / thickness product treatment step for obtaining a concentration / thickness product of the gas cloud based on the amount of infrared rays at one location in the gas cloud and the gas temperature, the gas is measured at one measurement point. Concentration thickness product can be measured.
  • a gas measuring device and a gas measuring method can be provided.

Abstract

La présente invention concerne un dispositif de mesure de gaz et un procédé de mesure de gaz qui utilisent une image infrarouge pour déterminer la quantité de rayonnement infrarouge un emplacement dans un nuage de gaz qui a été formé dans un espace à partir d'un gaz prescrit et utilisent la quantité déterminée de rayonnement infrarouge et la température de gaz du nuage de gaz pour déterminer un produit concentration-épaisseur pour le nuage de gaz. Le dispositif de mesure de gaz et le procédé de mesure de gaz peuvent ainsi mesurer un produit concentration-épaisseur pour un gaz à un point de mesure unique.
PCT/JP2016/080966 2015-10-29 2016-10-19 Dispositif de mesure de gaz et procédé de mesure de gaz WO2017073429A1 (fr)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6693609B1 (ja) * 2018-11-28 2020-05-13 コニカミノルタ株式会社 ガス流量推定装置、ガス流量推定方法、及び、ガス流量推定プログラム
WO2020110411A1 (fr) * 2018-11-28 2020-06-04 コニカミノルタ株式会社 Dispositif, procédé et programme d'estimation de débit de gaz

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001505308A (ja) * 1996-12-03 2001-04-17 グラハム トーマス コンサルタンツ リミテッド ガスのイメージング方法及び装置
JP2009174990A (ja) * 2008-01-24 2009-08-06 Nec Corp ガス測定装置およびガス測定方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001505308A (ja) * 1996-12-03 2001-04-17 グラハム トーマス コンサルタンツ リミテッド ガスのイメージング方法及び装置
JP2009174990A (ja) * 2008-01-24 2009-08-06 Nec Corp ガス測定装置およびガス測定方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6693609B1 (ja) * 2018-11-28 2020-05-13 コニカミノルタ株式会社 ガス流量推定装置、ガス流量推定方法、及び、ガス流量推定プログラム
WO2020110411A1 (fr) * 2018-11-28 2020-06-04 コニカミノルタ株式会社 Dispositif, procédé et programme d'estimation de débit de gaz

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