Classifications

• • C—CHEMISTRY; METALLURGY
  • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
  • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
  • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
  • C09D5/24—Electrically-conducting paints
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
  • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
  • B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
  • B05D5/12—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain a coating with specific electrical properties
• • C—CHEMISTRY; METALLURGY
  • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
  • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
  • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
  • C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
  • C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
  • C08G73/1039—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors comprising halogen-containing substituents
• • C—CHEMISTRY; METALLURGY
  • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
  • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
  • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
  • C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
  • C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
  • C08G73/1042—Copolyimides derived from at least two different tetracarboxylic compounds or two different diamino compounds
• • C—CHEMISTRY; METALLURGY
  • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
  • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
  • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
  • C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
  • C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
  • C08G73/1067—Wholly aromatic polyimides, i.e. having both tetracarboxylic and diamino moieties aromatically bound
• • C—CHEMISTRY; METALLURGY
  • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
  • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
  • C09D179/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen, with or without oxygen, or carbon only, not provided for in groups C09D161/00 - C09D177/00
  • C09D179/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
  • C09D179/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
  • H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
  • H01B1/20—Conductive material dispersed in non-conductive organic material
  • H01B1/22—Conductive material dispersed in non-conductive organic material the conductive material comprising metals or alloys
• • H—ELECTRICITY
  • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
  • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
  • H05K1/00—Printed circuits
  • H05K1/02—Details
  • H05K1/09—Use of materials for the conductive, e.g. metallic pattern
  • H05K1/092—Dispersed materials, e.g. conductive pastes or inks
  • H05K1/095—Dispersed materials, e.g. conductive pastes or inks for polymer thick films, i.e. having a permanent organic polymeric binder
• • H—ELECTRICITY
  • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
  • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
  • H05K3/00—Apparatus or processes for manufacturing printed circuits
  • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
  • H05K3/102—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by bonding of conductive powder, i.e. metallic powder
• • C—CHEMISTRY; METALLURGY
  • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
  • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
  • C08K3/00—Use of inorganic substances as compounding ingredients
  • C08K3/02—Elements
  • C08K3/08—Metals
  • C08K2003/085—Copper
• • H—ELECTRICITY
  • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
  • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
  • H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
  • H05K2201/01—Dielectrics
  • H05K2201/0137—Materials
  • H05K2201/0154—Polyimide
• • H—ELECTRICITY
  • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
  • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
  • H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
  • H05K2201/02—Fillers; Particles; Fibers; Reinforcement materials
  • H05K2201/0203—Fillers and particles
  • H05K2201/0242—Shape of an individual particle
  • H05K2201/0245—Flakes, flat particles or lamellar particles
• • H—ELECTRICITY
  • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
  • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
  • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
  • H05K2203/11—Treatments characterised by their effect, e.g. heating, cooling, roughening
  • H05K2203/1157—Using means for chemical reduction

Definitions

• the invention is directed to the photonic curing of a polymer thick film (PTF) copper conductor composition for use in many different applications.
• PTF copper conductor composition is used as a screen-printed conductor on a thin film substrate such as a polyimide.
• the PTF copper conductor functions as a grid electrode. This composition may further be used for any other application where conductivity (low resistivity) is required.
• This invention is directed to a polymer thick film copper conductor composition for use in electronic devices.
• PTF silver conductors are quite prevalent in electronic circuitry as the conductor of choice due to the low resistivity ( ⁇ 50 milliohms/sq) and the reliability of silver. The price of silver is high and it is therefore becoming expensive to use in circuitry.
• This invention provides a polymer thick film copper conductor composition comprising:
• wt% are based on the total weight of the polymer thick film copper conductor composition.
• all of the resin is polyimide resin.
• the reducing agent is selected from the group consisting of glycerol, ethylene glycol, diethylene glycol and mixtures thereof.
• the viscosity stabilizing agent is an organic acid such as oleic acid, stearic acid or mixtures thereof.
• the polymer thick film copper conductor composition can be cured by photonic sintering.
• This invention also provides a method for forming an electrical conductor in an electrical circuit, comprising:
• composition of the invention
• composition onto said substrate; and d) subjecting said polymer thick film copper conductor composition to photonic sintering to form said electrical conductor.
• the method further comprises a step of drying the thick film copper conductor composition, wherein this step is carried out following step (c) but before step (d).
• the composition is processed at a time and temperature necessary to remove all solvent. Photonic sintering after drying reduces the resistivity.
• the invention also provides an electrical device comprising an electrical conductor formed using the polymer thick film copper conductor composition of the invention or formed by any of the embodiments of the above described method.
• Figure 1 illustrates the serpentine screen printed paste pattern used in the Comparative Experiment and the Examples. DETAILED DESCRIPTION OF INVENTION
• a thick film composition comprises a functional phase that imparts appropriate electrically functional properties to the composition.
• the functional phase comprises electrically
• Organics as used herein comprise polymer, resin or binder components of the thick film composition. These terms may be used interchangeably and they all mean the same thing.
• the polymer thick film conductor copper composition is a polymer thick film copper conductor composition comprising a copper powder dispersed in an organic medium comprising a polymer resin and a solvent.
• the components used in this embodiment of the polymer thick film conductor copper composition are discussed below.
• weight percent is written as wt%.
• the electrically functional powder in the polymer thick film copper conductor composition is a copper conductor powder
• the particle diameter and shape of the copper powder are particularly important and have to be appropriate to the application method.
• the particles are spherical in shape.
• the particles are in flake form.
• the particles are irregular in shape.
• the particle size distribution of the copper particles is also critical with respect to the effectiveness of the invention.
• the particle size is in the range of 1 to 100 ⁇ .
• the average particle size is 0.2 to 10 ⁇ .
• the surface area/mass ratio of the copper particles is in the range of 0.2 to 3.0 m 2 /g.
• the copper particles have a flake form.
• the polymer thick film copper conductor composition is comprised of 60 to 95 wt% copper powder, wherein the wt% is based on the total weight of the polymer thick film copper conductor composition.
• metals include: gold, silver, nickel, aluminum, platinum, palladium, molybdenum, tungsten, tantalum, tin, indium, lanthanum, gadolinium, boron, ruthenium, cobalt, titanium, yttrium, europium, gallium, sulfur, zinc, silicon, magnesium, barium, cerium, strontium, lead, antimony, conductive carbon, and combinations thereof and others common in the art of thick film
• the additional metal(s) may comprise up to about 1 .0 percent by weight of the total composition.
• the copper powder is typically mixed with an organic medium (vehicle) by mechanical mixing to form a paste-like composition, called "paste", having suitable consistency and rheology for printing.
• the organic medium must be one in which the solids are dispersible with an adequate degree of stability.
• the rheological properties of the organic medium must be such that they lend good application properties to the composition. Such properties include: dispersion of solids with an adequate degree of stability, good application of composition, appropriate viscosity, thixotropy, appropriate wettability of the substrate and the solids, a good drying rate, and dried film strength sufficient to withstand rough handling.
• the organic medium comprises a solution of resin in organic solvent(s).
• at least half of the resin, by weight, is polyimide resin.
• all of the resin is polyimide resin.
• the polyimide resin is represented by formula I: I
• X is C(CH 3 ) 2 , 0, S(0) 2 , C(CF 3 ) 2 , 0-Ph-C(CH 3 ) 2 -Ph-0, O-Ph-0- or a mixture of two or more of C(CH 3 ) 2 , 0, S(0) 2 , C(CF 3 ) 2 , 0-Ph-C(CH 3 ) 2 -Ph- 0, O-Ph-0-;
• Y is a diamine component or a mixture of diamine components selected from the group consisting of:m-phenylenediamine (MPD), 3,4'- diaminodiphenyl ether (3,4'-ODA), 4,4'-diamino-2,2'- bis(trifluoromethyl)biphenyl (TFMB), 3,3'-diaminodiphenyl sulfone (3,3 - DDS), 4,4'-(Hexafluoroisopropylidene)bis(2-aminophenol) (6F-AP), bis-(4- (4-aminophenoxy)phenyl)sulfone (BAPS), 9,9-bis(4-aminophenyl)fluorene (FDA); 2,3,5,6-tetramethyl-1 ,4-phenylenediamine (DAM), 2,2-bis[4-(4- aminophenoxyphenyl)]propane (BAPP), 2,2-bis[4-(4- aminophenoxy
• Y is not m-phenylenediamine (MPD), bis-(4-(4- aminophenoxy)phenyl)sulfone (BAPS) and 3,4'-diaminodiphenyl ether (3,4'-ODA); BAPP, APB-133, or bisaniline-M;
• Y is not 3,3'-diaminodiphenyl sulfone (3,3'-DDS); iii. if X is S(0) 2 , then Y is not 3,3'-diaminodiphenyl sulfone (3,3'-DDS); iii. if X is C(CF 3 ) 2 , then Y is not m-phenylenediamine (MPD), bis-(4-(4- aminophenoxy)phenyl)sulfone (BAPS), 9,9-bis(4-aminophenyl)fluorene (FDA), or 3,3'-diaminodiphenyl sulfone (3,3'-DDS); and
• the polyimide can be prepared in the dry and powdered state by reacting monomers 2,2'-Bis(trifluoromethyl)-4,4'- diamino biphenyl (TFMB), 2,2Bis(3-aminG ⁇ 4 ⁇
• Hexafluoroisopropylidenebis-phthalic dianhydride. (6-FDA). in a ratio of 33/10/57 (TFMB/6F-AP/6-FDA) through the well-known process of first making polyamic acid in ⁇ , ⁇ -Dimethylacetamide (DMAC) solvent, controlling the molecular weight of said polyamic acid with end-capping additives, then chemically imidizing and precipitating the polyimide polymer using methanol neat additions to the DMAC solution. The precipitate was washed several times with methanol neat, filtered and then dried at approximately 200°C to form a dry and handleable powder and to reduce DMAC residuals to below 0.1 % weight. The resulting powder can be dried and stored at room temperature or dissolved in a solvent in preparation for forming the paste composition.
• DMAC ⁇ , ⁇ -Dimethylacetamide
• the polymer thick film copper conductor composition is comprised of 4 to 35 wt% organic medium, wherein the wt% is based on the total weight of the polymer thick film copper conductor composition.
• the organic medium is comprised of 2-7 wt% resin at least half of which, by weight, is polyimide resin, wherein the wt% is based on the total weight of the polymer thick film copper conductor composition
• Copper powder will generally possess an outer oxide layer consisting of cupric oxide, cuprous oxide, copper hydroxide, or a mixture of two or more of these oxides.
• the oxide layer is an insulator and can thus inhibit the performance of the copper powder as a conductor.
• the paste composition contains organic compounds that are capable of reducing the copper oxide layer to copper metal during the photonic sintering process.
• Organic compounds suited for this include alcohols with no base properties.
• the polymer thick film copper conductor composition is comprised of 0.25 to 3 2 wt% reducing agent comprising an alcohol with no base properties, wherein the wt% is based on the total weight of the polymer thick film copper conductor composition.
• the reducing agent is selected from the group consisting of glycerol, ethylene glycol, diethylene glycol and mixtures thereof.
• the polymer thick film copper conductor composition is comprised of 0.0 to 2 wt% viscosity stabilizing agent comprising a carboxylic acid containing compound.
• the viscosity stabilizing agent is an organic acid selected from the group consisting of oleic acid, stearic acid and mixtures thereof.
• the polymer thick film paste composition is deposited on a substrate typical of those used in electric devices.
• a substrate typical of those used in electric devices.
• the substrate is impermeable to gases and moisture.
• the substrate can be a sheet of flexible material.
• the flexible material can be an impermeable material such as a polyimide film, e.g. Kapton®.
• the material can also be a polyester, e.g. polyethylene terephthalate, or a composite material made up of a combination of plastic sheet with optional metallic or dielectric layers deposited thereupon.
• the substrate can be alumina, aluminum or any material that can withstand the process temperature.
• the deposition of the polymer thick film conductive composition is performed preferably by screen printing, although other deposition techniques such as stencil printing, syringe dispensing or coating techniques can be utilized. In the case of screen-printing, the screen mesh size controls the thickness of deposited thick film.
• the deposited thick film conductive composition may be dried, i.e., the solvent is evaporated, by exposure to heat, e.g. at 130°C for minutes.
• Photonic sintering uses light to provide high-temperature sintering.
• a flash lamp is used to provide the source of light and is operated with a short on time of high power and a duty cycle ranging from a few hertz to tens of hertz.
• the photonic sintering step is brief, typically less than I minute.
• Photonic sintering may also be referred to as photonic curing. Examples of commercial manufacturers of photonic sintering equipment include NovaCentrix Corp. (Austin, TX) and Xenon Corp
• the photonic sintering of the deposited thick film conductor composition provides conductors with low resistivity.
• the deposited thick film conductor composition prior to the photonic sintering, is dried by exposure to heat at low temperatures, typically for 5-10 min at 80°C. In another embodiment, the deposited thick film conductor composition is not dried prior to photonic sintering.
• the substrates Kapton® (500HPP-ST) and the unclad FR-4 substrates were obtained from DuPont® and Moog Components, respectively, and used as received after cut into 2.5" x 3.5" sizes.
• the low loss Itera substrates were obtained from Isola through Insulectro.
• the polyimide resin used in the Examples was prepared as described above by reacting TFMB, 8F-AP and 6-FDA. in a ratio of 33/10/57.
• the SAC alloy with a composition of Sn96.5%Ag3.0%Cu0.5% was used for solder wetting test. Either Alpha 61 1 or Kester 952 flux was used. In the solder wetting test the cured samples were typically dipped for 3 - 10 seconds into the SAC alloy pot that was kept at 225 - 250°C.
• a screen printable PTF Cu conductor composition was prepared using copper flakes having an average particle size of 4 micron.
• An organic medium was prepared by dissolving a polyimide resin from St. Jean having a number average molecular weight of approximately 135,000 in a mixture of the solvents, butylcarbitol acetate, dibasic esters (DBE-3) and diethyl adipate.
• the organic medium contained 26 wt% resin, 31 wt% butylcarbitol acetate, 1 1 wt% dibasic esters (DBE-3) and 31 wt% diethyl adipate., wherein the wt% are based on the total weight of the organic medium.
• the copper powder was then dispersed in the organic medium.
• the components of the PTF copper conductor composition were:
• wt% are based on the total weight of the composition.
• the components were combined and mixed for 60 seconds in a Thinky-type mixer. However the paste became gelled shortly and was not suitable to be used in a screen printing process.
• a PTF copper conductor paste was also prepared using
• a screen printable PTF Cu conductor composition was prepared using copper flakes having an average particle size of 4 micron.
• An organic medium was prepared by dissolving a Nichigo TP 249 polyester resin from Nippon Gohsei, Japan, in a mixture of the solvents, butylcarbitol acetate, dibasic esters (DBE-3) and diethyl adipate.
• the organic medium contained 26 wt% resin, 31 wt% butylcarbitol acetate, 1 1 wt% dibasic esters (DBE-3) and 31 wt% diethyl adipate, wherein the wt% are based on the total weight of the organic medium.
• the copper powder was then dispersed in the organic medium.
• the components were combined and mixed for 60 seconds in a Thinky-type mixer.
• the composition was used to screen print a 600 square serpentine pattern on Kapton® film.
• the serpertine patteren printed on Kapton® substrate is shown in Fig. 1 .
• the dried serpentine patterns were then subjected to photonic sintering.
• a PulseForge 3200 sintering unit manufactured by NovaCentrix (Austin, TX) was employed. The unit was operated in an arbitrary mode. The process settings were as follows: pulse voltage: 230 V, A pulse composing of five micropulses: 200, 100, 1500, 1500, and 1500 sec to give energy equal to 3.3 J/cm 2 , overlap factor: 2.2, web speed: 25 FPM. After processing, the measured line resistance was 50 ⁇ . The average conductor thickness over the 600 square pattern was determined to be 1 1.4 pm using a prof i lorn eter,. Therefore the resistivity was calculated to be 38 mO/a/mil.
• a screen printable PTF Cu conductor composition was prepared using copper flakes having an average particle size of 4 micron.
• An organic medium was prepared by dissolving a Nichigo TP 249 polyester resin from Nippon Gohsei, Japan, in a mixture of the solvents, butylcarbitol acetate, dibasic esters (DBE-3) and diethyl adipate.
• the organic medium contained 40 wt% resin, 30 wt% butylcarbitol acetate, and 30 wt% diethyl adipate, wherein the wt% are based on the total weight of the organic medium.
• the copper powder was then dispersed in the organic medium.
• the components of the PTF copper conductor composition were:
• the components were combined and mixed for 60 seconds in a Thinky-type mixer.
• the composition was used to screen print a 600 square serpentine pattern on Kapton® film.
• the serpertine patteren printed on Kapton® substrate is shown in Fig. 1. Using a 325 mesh stainless steel screen, several patterns were printed, and the copper paste was dried at 80°C for 10 min. The samples yielded no measurable resistance.
• the dried serpentine patterns were then subjected to photonic sintering.
• a PulseForge 3200 sintering unit manufactured by NovaCentrix (Austin, TX) was employed. The unit was operated in an arbitrary mode. The process settings were as follows: pulse voltage: 215 V, A pulse composing of five micropulses: 200, 100, 1500, 1500, and 1500 sec to give energy equal to 2.8 J/cm 2 , overlap factor: 2.2, web speed: 25 FPM. After processing, the measured line resistance was 47 ⁇ . The average conductor thickness over the 600 square pattern was determined to be 10.4 pm using a prof i lorn eter,. Therefore the resistivity was calculated to be 19.6 mQ/a/mil.
• a PTF copper conductor composition was prepared using copper flake (CI-4000F, Ames Goldsmith Corp, South Glen Falls, NY) having an average particle size of 4 ⁇ .
• An organic medium was prepared by dissolving a phenoxy resin (PKHH® resin from InChem Corp) having a number average molecular weight of approximately 20,000 in the solvent, Dowanol® DPM dipropylene glycol methyl ether ((Dow Chemical Co., Midland, Ml).
• the organic medium contained 20 wt% resin and 80 wt% solvent, wherein the wt% are based on the total weight of the organic medium.
• the copper powder was then dispersed in the organic medium.
• the components of the PTF copper conductor composition were:
• the components were combined and mixed for 60 seconds in a Th inky-type mixer.
• the composition was used to screen print a 600 square serpentine pattern on Kapton® film.
• the serpertine patteren printed on Kapton® substrate is shown in Fig. 1. Using a 325 mesh stainless steel screen, several patterns were printed, and the copper paste was dried at 80°C for 10 min. The samples yielded no measurable resistance.
• the dried serpentine patterns were then subjected to photonic sintering.
• a PulseForge 3200 sintering unit manufactured by NovaCentrix (Austin, TX) was employed. The unit was operated in an arbitrary mode. The process settings were as follows: pulse voltage: 230 V, A pulse composing of five micropulses: 200, 100, 1500, 1500, and 1500 sec to give energy equal to 3.3 J/cm 2 , overlap factor: 2.2, web speed: 25 FPM. After processing, the measured line resistance was 68 ⁇ . The average conductor thickness over the 600 square pattern was determined to be 9.4 ⁇ using a profilometer. Therefore the resistivity was calculated to be 42.6
• Solder wettability was tested in the manner described above using these samples. The samples showed poor solder leach resistance. For an example, a sample dipped in the SAC alloy pot for 3 seconds showed about 25% delamination (line breaks)..
• a screen printable PTF Cu conductor composition was prepared using copper flakes having an average particle size of 4 micron.
• An organic medium was prepared by dissolving a polyimide resin from St. Jean having a number average molecular weight of approximately 135,000 in a mixture of the solvents, butylcarbitol acetate, dibasic esters (DBE-3) and diethyl adipate.
• the organic medium contained 26 wt% resin, 31 wt% butylcarbitol acetate, 1 1 wt% dibasic esters (DBE-3) and 31 wt% diethyl adipate., wherein the wt% are based on the total weight of the organic medium.
• the copper powder was then dispersed in the organic medium.
• the components of the PTF copper conductor composition were:
• wt% are based on the total weight of the composition.
• the components were combined and mixed for 60 seconds in a Thinky-type mixer.
• the composition was used to screen print a 600 square serpentine pattern on Kapton® film.
• the serpertine patteren printed on Kapton® substrate is shown in Fig. 1.
• Using a 325 mesh stainless steel screen several patterns were printed, and the copper paste was dried at 80°C for 10 min. The samples yielded no measurable resistance.
• the dried serpentine patterns were then subjected to photonic sintering.
• a PulseForge 3200 sintering unit manufactured by NovaCentrix (Austin, TX) was employed. The unit was operated in an arbitrary mode.
• the process settings were as follows: pulse voltage: 230 V, A pulse composing of five micropulses: 200, 100, 1500, 1500, and 1500 psec to give energy equal to 3.3 J/cm 2 , overlap factor: 2.2, web speed: 25 FPM.
• the measured line resistance was 32.6 ⁇ .
• the average conductor thickness over the 600 square pattern was determined to be 9.8 pm using a profilometer. Therefore the resistivity was calculated to be 21 .2 mO/a/mil.
• Solder wettability and solder leach resistance was tested in the manner described above using the samples. As examples, a sample with a resistance of 33 ⁇ dipped in the solder pot for 10 seconds showed no solder wetting and a resistance of 30.2 ⁇ after dipped in the SAC pot for 10 seconds. In contrast about 40% solder wetting was observed from the sample dipped in the solder pot for 3 seconds, however, the sample dipped for 5 seconds showed no solder wetting. No defects such as voids or line delamination were detected from any of the samples.
• composition was also used to screen print a 600 square serpentine pattern on 0.028 inch-thick FR-4 and 0.030 inch-thick Itera substrates. Using a 325 mesh stainless steel screen, several patterns were printed, and the copper paste was dried at 80°C for 10 min. The samples yielded no measurable resistance.
• the dried serpentine patterns were then subjected to photonic sintering using the same profile used for curing the samples prepared on Kapton® substrates. After processing, the measured line resistance was 41.5 ⁇ on FR-4, and 59.6 ⁇ on Itera. The average conductor thickness over the 600 square pattern was determined to be 1 1 .2 m on FR-4 and 1 1.4 pm on Itera using a profilometer, which gave the calculated resistivity of 31 and 45 ⁇ / ⁇ / ⁇ , respectively.
• a screen printable PTF Cu conductor composition was prepared using copper flakes having an average particle size of 4 micron.
• An organic medium was prepared by dissolving a polyimide resin from St. Jean having a number average molecular weight of approximately 135,000 in a mixture of the solvents, butylcarbitol acetate, dibasic esters (DBE-3) and diethyl adipate.
• the organic medium contained 26 wt% resin, 31 wt% butylcarbitol acetate, 1 1 wt% dibasic esters (DBE-3) and 31 wt% diethyl adipate., wherein the wt% are based on the total weight of the organic medium.
• the copper powder was then dispersed in the organic medium.
• the components of the PTF copper conductor composition were:
• wt% are based on the total weight of the composition.
• the components were combined and mixed for 60 seconds in a Thinky-type mixer.
• the composition was used to screen print a 600 square serpentine pattern on Kapton® film.
• the serpertine patteren printed on Kapton® substrate is shown in Fig. 1. Using a 325 mesh stainless steel screen, several patterns were printed, and the copper paste was dried at 80°C for 10 min. The samples yielded no measurable resistance.
• the dried serpentine patterns were then subjected to photonic sintering.
• a PulseForge 3200 sintering unit manufactured by NovaCentrix (Austin, TX) was employed. The unit was operated in an arbitrary mode. The process settings were as follows: pulse voltage: 230 V, A pulse composing of five micropulses: 200, 100, 1500, 1500, and 1500 sec to give energy equal to 3.3 J/cm 2 , overlap factor: 2.2, web speed: 25 FPM. After processing, the measured line resistance was 33.6 ⁇ . The average conductor thickness over the 600 square pattern was determined to be 9.6 pm using a profilometer,. Therefore the resistivity was calculated to be 21.5 mO/a/mil.
• Solder wettability and solder leach resistance was tested in the manner described above using the samples. As examples, a sample with 29.2 ⁇ showed no solder wetting and resistance of
• solder wetting about 50 and 20% solder wetting were observed from the samples dipped in the solder pot for 3 or 5 seconds, respectively. No defects such as delamination or voids were observed from the solder- dipped samples.
• a screen printable PTF Cu conductor composition was prepared using copper flakes having an average particle size of 4 micron.
• a polyimide organic medium was prepared by dissolving a polyimide resin (27 wt%) from St. Jean having a number average molecular weight of approximately 135,000 in a mixture of the solvents, butylcarbitol acetate (31 wt%), dibasic esters (DBE-3, 1 1 wt%) and diethyl adipate (31 wt%).
• a phenoxy organic medium was prepared by dissolving a phenoxy resin (PKHH® resin from InChem Corp, 20 wt%) in Dowanol® DPM (80%), wherein the wt% are based on the total weight of the organic medium. The copper powder was then dispersed in the organic medium.
• the components of the PTF copper conductor composition were:
• the components were combined and mixed for 60 seconds in a Th inky-type mixer.
• the composition was used to screen print a 600 square serpentine pattern on Kapton® film.
• the serpertine pattern printed on Kapton® substrate is shown in Fig. 1 .
• the dried serpentine patterns were then subjected to photonic sintering.
• a PulseForge 3200 sintering unit manufactured by NovaCentrix (Austin, TX) was employed. The unit was operated in an arbitrary mode. The process settings were as follows: pulse voltage: 230 V, A pulse composing of five micropulses: 200, 100, 1500, 1500, and 1500 sec to give energy equal to 3.3 J/cm 2 , overlap factor: 2.2, web speed: 25 FPM. After processing, the measured line resistance was 44 ⁇ . The average conductor thickness over the 600 square pattern was determined to be 10 pm using a profilometer,. Therefore the resistivity was calculated to be 26.3 mO/a/mil.
• Solder wettability and solder leach resistance was tested in the manner described above using the samples. As examples, a sample with 46.9 ⁇ showed over 90% solder wetting a resistance of 25.8 ⁇ after dipped in the SAC pot for 3 seconds with no defects formed, and the samples dipped for 5 or 10 seconds showed 60 - 80% solder wetting but minor defects such as delamination or voids.
• a screen printable PTF Cu conductor composition was prepared using copper flakes having an average particle size of 4 micron.
• An organic medium was prepared by dissolving a polyimide resin from St.
• the organic medium contained 26 wt% resin, 31 wt% butylcarbitol acetate, 1 1 wt% dibasic esters (DBE-3) and 31 wt% diethyl adipate., wherein the wt% are based on the total weight of the organic medium.
• the copper powder was then dispersed in the organic medium.
• the components of the PTF copper conductor composition were:
• wt% are based on the total weight of the composition.
• the components were combined and mixed for 60 seconds in a Thinky-type mixer.
• the composition was used to screen print a 600 square serpentine pattern on Kapton® film.
• the serpertine patteren printed on Kapton® substrate is shown in Fig. 1. Using a 325 mesh stainless steel screen, several patterns were printed, and the copper paste was dried at 80°C for 10 min. The samples yielded no measurable resistance.
• the dried serpentine patterns were then subjected to photonic sintering.
• a PulseForge 3200 sintering unit manufactured by NovaCentrix (Austin, TX) was employed. The unit was operated in an arbitrary mode. The process settings were as follows: pulse voltage: 230 V, A pulse composing of five micropulses: 200, 100, 1500, 1500, and 1500 sec to give energy equal to 3.3 J/cm 2 , overlap factor: 2.2, web speed: 25 FPM. After processing, the measured line resistance was 39.8 ⁇ . The average conductor thickness over the 600 square pattern was determined to be 8.3 pm using a profilometer,. Therefore the resistivity was calculated to be 22 Solder wettability and solder leach resistance was tested in the manner described above using the samples. As examples, a sample with 40.2 ⁇ showed about 40% solder wetting with a

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