WO2016173113A1 - 平面显示面板及制作方法 - Google Patents

平面显示面板及制作方法 Download PDF

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Publication number
WO2016173113A1
WO2016173113A1 PCT/CN2015/082821 CN2015082821W WO2016173113A1 WO 2016173113 A1 WO2016173113 A1 WO 2016173113A1 CN 2015082821 W CN2015082821 W CN 2015082821W WO 2016173113 A1 WO2016173113 A1 WO 2016173113A1
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WO
WIPO (PCT)
Prior art keywords
substrate
spacers
display panel
flat display
auxiliary
Prior art date
Application number
PCT/CN2015/082821
Other languages
English (en)
French (fr)
Inventor
吴川
王金杰
Original Assignee
深圳市华星光电技术有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 深圳市华星光电技术有限公司 filed Critical 深圳市华星光电技术有限公司
Priority to US14/768,001 priority Critical patent/US10095068B2/en
Publication of WO2016173113A1 publication Critical patent/WO2016173113A1/zh

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/1368—Active matrix addressed cells in which the switching element is a three-electrode device
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
    • H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
    • H01L27/1218—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition or structure of the substrate
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
    • H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
    • H01L27/1248—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition or shape of the interlayer dielectric specially adapted to the circuit arrangement
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
    • H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
    • H01L27/1259—Multistep manufacturing methods
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
    • H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
    • H01L27/1259—Multistep manufacturing methods
    • H01L27/1262—Multistep manufacturing methods with a particular formation, treatment or coating of the substrate
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133302—Rigid substrates, e.g. inorganic substrates
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13396—Spacers having different sizes
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13398—Spacer materials; Spacer properties
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136222—Colour filters incorporated in the active matrix substrate
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136286—Wiring, e.g. gate line, drain line
    • G02F1/136295—Materials; Compositions; Manufacture processes

Definitions

  • the present invention relates to the field of liquid crystal display technology, and in particular, to a flat display panel and a manufacturing method thereof.
  • a plurality of main spacers having a relatively high height and a plurality of auxiliary spacers having a relatively high height are generally disposed between the upper and lower substrates in the liquid crystal display panel to maintain a distance between the upper and lower substrates of the liquid crystal display panel to form a certain space. Fill the liquid crystal.
  • the following two methods are generally used: the first one is to realize spacers of different heights by different light intensities of photomask technology; the second is to use etching technology to Describe spacers of different heights.
  • the existing two methods have drawbacks, for example, the first method is costly, and the second method is difficult to accurately control the disadvantages of the main spacer and the auxiliary spacer.
  • no fixing means is provided between the main spacer and the auxiliary spacer and the lower substrate, when the panel is deformed or bent, the upper and lower substrates easily slide each other, causing a risk of light leakage of the liquid crystal display panel.
  • the technical problem to be solved by the present invention is to provide a flat display panel and a manufacturing method thereof, which can simplify the manufacturing method and reduce the production cost.
  • a technical solution adopted by the present invention is to provide a flat display panel, which includes:
  • the second substrate disposed opposite to the first substrate, wherein the second substrate is provided with a material layer, and the material layer is provided with a plurality of grooves;
  • the plurality of spacers include a plurality of main spacers and a plurality of auxiliary spacers, the plurality of auxiliary spacers respectively facing an area where the plurality of grooves are located, and the plurality of main spacers are respectively oriented An area in which the plurality of grooves are not located, and the main spacer and the auxiliary spacer are in a height uniform to be supported by the main spacer when the flat display panel is not pressed, and in the plane The display panel is further supported by the auxiliary spacer when pressed;
  • the first substrate is a counter substrate
  • the second substrate is a thin film transistor (thin film transistor, TFT) array substrate
  • the spacer is made of a material having elastic properties.
  • the material layer is a color resist layer.
  • a groove is disposed at a position corresponding to each sub-pixel of the color resist layer.
  • a groove is disposed at a position corresponding to the plurality of sub-pixels of the color resist layer.
  • the height of the plurality of grooves is h1, wherein the h1 is equal to ⁇ h, and the ⁇ h is when the flat display panel is in a non-pressing state, the plurality of main spacers and the plurality of auxiliary The difference in height formed between the spacers.
  • the height of the plurality of grooves is h2, wherein the h2 is greater than ⁇ h, and the ⁇ h is when the flat display panel is in a non-pressing state, the plurality of main spacers and the plurality of auxiliary The difference in height formed between the spacers.
  • a flat display panel which includes:
  • the second substrate disposed opposite to the first substrate, wherein the second substrate is provided with a material layer, and the material layer is provided with a plurality of grooves;
  • the plurality of spacers include a plurality of main spacers and a plurality of auxiliary spacers, the plurality of auxiliary spacers respectively facing an area where the plurality of grooves are located, and the plurality of main spacers are respectively oriented An area in which the plurality of grooves are not located, and the main spacer and the auxiliary spacer are in a height uniform to be supported by the main spacer when the flat display panel is not pressed, and in the plane The display panel is further supported by the auxiliary spacer when pressed.
  • the first substrate is a counter substrate
  • the second substrate is a thin film transistor (thin film transistor, TFT) array substrate.
  • the material layer is a color resist layer.
  • a groove is disposed at a position corresponding to each sub-pixel of the color resist layer.
  • a groove is disposed at a position corresponding to the plurality of sub-pixels of the color resist layer.
  • the height of the plurality of grooves is h1, wherein the h1 is equal to ⁇ h, and the ⁇ h is when the flat display panel is in a non-pressing state, the plurality of main spacers and the plurality of auxiliary The difference in height formed between the spacers.
  • the height of the plurality of grooves is h2, wherein the h2 is greater than ⁇ h, and the ⁇ h is when the flat display panel is in a non-pressing state, the plurality of main spacers and the plurality of auxiliary The difference in height formed between the spacers.
  • another technical solution adopted by the present invention is to provide a method for manufacturing a flat display panel, the method comprising:
  • the plurality of spacers comprise a plurality of main spacers and a plurality of auxiliary spacers, and the main spacers and the auxiliary spacers are highly uniform;
  • the planar display panel is formed by facing the area where the plurality of grooves are not located, wherein the flat display panel is supported by the main spacer when not pressed, and the flat display panel is subjected to Further support is further performed by the auxiliary spacer when pressed.
  • the first substrate is a counter substrate
  • the second substrate is a thin film transistor (thin film transistor, TFT) array substrate.
  • the material layer is a color resist layer.
  • the invention has the beneficial effects that a plurality of main spacers and a plurality of auxiliary spacers having the same height are disposed between the first substrate and the second substrate of the flat display panel of the present invention, and the second substrate is different from the prior art.
  • the upper material layer is provided with a plurality of grooves, wherein the plurality of auxiliary spacers respectively face the region where the plurality of grooves are located, and the plurality of main spacers respectively face the region where the plurality of grooves are located to be displayed on the plane
  • the panel is not pressed, it is supported by the main spacer, and when the flat display panel is pressed, it is further supported by the auxiliary spacer. In this way, not only the manufacturing method is simplified, but also the production cost is reduced.
  • the auxiliary spacer can be locked in the groove on the material layer, so that the first substrate and the second substrate are not easily slid relative to each other, thereby avoiding planar display. There is a risk of light leakage on the panel.
  • FIG. 1 is a schematic cross-sectional view showing an embodiment of a flat display panel of the present invention.
  • FIG. 2 is a schematic cross-sectional view showing an embodiment of the flat display panel of the present invention in a pressed state.
  • FIG. 3 is a schematic cross-sectional view showing another embodiment of the flat display panel of the present invention in a pressed state.
  • FIG. 4 is a flow chart showing an embodiment of a method of fabricating a flat display panel of the present invention.
  • FIG. 1 is a cross-sectional structural view showing an embodiment of a flat display panel of the present invention.
  • the flat display panel 100 includes a first substrate 10, a second substrate 20, and a plurality of spacers 30.
  • the second substrate 20 is disposed opposite to the first substrate 10.
  • the first substrate 10 and the second substrate 20 may be any existing composition for the glass substrate, the opposite substrate, the color filter substrate, the thin film transistor array substrate, the color filter integrated on the thin film transistor array substrate, and the like.
  • the substrate of the flat display panel 100 may be any existing composition for the glass substrate, the opposite substrate, the color filter substrate, the thin film transistor array substrate, the color filter integrated on the thin film transistor array substrate, and the like.
  • the material layer 22 is disposed on the second substrate 20, and the material layer 22 is provided with a plurality of grooves 222.
  • the material layer 22 may be a material layer that can be formed on the second substrate 20, such as a color resist layer or a common electrode layer.
  • a plurality of spacers 30 are disposed on the first substrate 10 and facing the second substrate 20 to space the first substrate 10 and the second substrate 20 to maintain the distance between the first substrate 10 and the second substrate 20 of the flat display panel 100. Thereby a certain space is formed for filling the liquid crystal.
  • the spacer 30 can be made of various materials having elastic properties such as plastic-based acrylic resin fine particles, glass-based rod-shaped particles, or silicone-based spherical particles.
  • the plurality of spacers 30 include a plurality of primary spacers 32 and a plurality of secondary spacers 34, the heights of the primary spacers 32 and the secondary spacers 34 being identical. It is to be understood that the main spacer 32 and the auxiliary spacer 34 may be made of various materials having elastic properties such as plastic-based acrylic resin fine particles, glass-based rod-shaped particles, or silicone-based spherical particles.
  • the plurality of main spacers 32 respectively face a region of the material layer 22 where the plurality of recesses 222 are located, and the plurality of auxiliary spacers 34 respectively face the region where the plurality of recesses 222 on the material layer 22 are located.
  • the flat display panel 100 When the flat display panel 100 is in the non-pressing state, the flat display panel 100 is supported by the main spacer 32. At this time, the main spacer 32 is in a compressed state under the force of gravity of the first substrate 10, and the auxiliary spacer 34 is in a compressed state. Since the corresponding material layer 22 on the second substrate 20 is provided with a groove, the auxiliary spacer 34 is in an uncompressed state, that is, a free state.
  • the main spacers 32 are further compressed by the external pressing force, and the auxiliary spacers 34 are respectively locked in the plurality of grooves 222 on the material layer 22, so that the flat display is performed.
  • the panel 100 is further supported by the secondary spacers 34, at which point the secondary spacers 34 can be in a compressed state.
  • a plurality of main spacers and a plurality of auxiliary spacers having a uniform height are disposed between the first substrate and the second substrate of the flat display panel of the present invention, and a plurality of grooves are disposed on the material layer on the second substrate, wherein
  • the auxiliary spacers respectively face the region where the plurality of grooves are located, and the plurality of main spacers respectively face the region where the plurality of grooves are located, so as to be supported by the main spacer when the flat display panel is not pressed, and displayed in the plane When the panel is pressed, it is further supported by the auxiliary spacer.
  • the auxiliary The spacers can be locked in the grooves on the material layer, so that the first substrate and the second substrate are not easily slid relative to each other, thereby avoiding the risk of light leakage of the flat display panel.
  • the first substrate 10 is a counter substrate
  • the second substrate 20 is a thin film transistor array substrate
  • the material layer 22 is a color resist layer.
  • FIG. 2 is a cross-sectional structural diagram of an embodiment of the flat display panel of the present invention in a pressed state.
  • the color resist layer 22 is provided with a position corresponding to the sub-pixel a, the sub-pixel b, and the sub-pixel c.
  • the recess 222 because the plurality of auxiliary spacers 34 respectively face the region where the plurality of recesses 222 on the material layer 22 are located, the corresponding relationship between the auxiliary spacers 34 and the color resist layer 22 is one sub-pixel corresponding to one auxiliary spacer. .
  • a recess 222 is disposed at a position corresponding to the plurality of sub-pixels of the color resist layer 22. Since the plurality of auxiliary spacers 34 respectively face the region where the plurality of grooves 222 on the material layer 22 are located, the corresponding relationship between the auxiliary spacers 34 and the color resist layer 22 is a plurality of sub-pixels corresponding to one auxiliary spacer.
  • the height of the plurality of grooves is h1, wherein h1 is equal to ⁇ h, and ⁇ h is formed between the plurality of main spacers and the plurality of auxiliary spacers when the flat display panel is in a non-pressing state.
  • the height difference when the flat display panel is in a non-pressed state, the height of the main spacer when in the compressed state and the height of the auxiliary spacer when the auxiliary spacer is in the uncompressed state.
  • FIG. 3 is a cross-sectional structural diagram of another embodiment of the flat display panel of the present invention in a pressed state, and the height of the plurality of grooves may be h2, wherein H2 is greater than ⁇ h, and ⁇ h is a height difference formed between the plurality of main spacers and the plurality of auxiliary spacers when the flat display panel is in a non-pressed state.
  • the flat display panel of the present embodiment not only simplifies the manufacturing method but also reduces the production cost, and further provides a groove at a position corresponding to each sub-pixel of the color resist layer to correspond to the auxiliary spacer and the color resist layer.
  • the relationship is that one sub-pixel corresponds to one auxiliary spacer.
  • the density of the auxiliary spacer formed on the first substrate can be further increased, and when the display panel is pressed, that is, when the flat display panel is deformed or bent, A plurality of auxiliary spacers can be trapped in the grooves on the material layer, so that the first substrate and the second substrate are more difficult to slide relative to each other, further reducing the risk of light leakage of the flat display panel.
  • the height of the groove of the flat display panel of the present invention is greater than or equal to ⁇ h.
  • the auxiliary spacer can be supported only when the flat display panel is in the pressed state, and the auxiliary spacer is prevented from being in the flat display panel. It is also in a compressed state when it is not pressed, prolonging the service life of the auxiliary spacer, thereby prolonging the service life of the flat display panel.
  • FIG. 4 is a flowchart of an embodiment of a method for fabricating a flat display panel of the present invention.
  • the production method includes the following steps:
  • the first substrate may be a glass substrate, a counter substrate, a color filter substrate, a thin film transistor array substrate, a color filter integrated on a thin film transistor array substrate, or the like, any existing substrate for forming a flat display panel. .
  • S102 forming a plurality of spacers on the first substrate, wherein the plurality of spacers comprise a plurality of main spacers and a plurality of auxiliary spacers, and the heights of the main spacers and the auxiliary spacers are identical.
  • the plurality of spacers may be made of various materials having elastic properties such as plastic-based acrylic resin fine particles, glass-based rod-shaped particles, or silicone-based spherical particles.
  • S103 providing a glass substrate, forming a material layer on one side of the glass substrate, and forming a plurality of grooves on the material layer corresponding to the plurality of auxiliary spacers, thereby forming a second substrate.
  • the material layer may be a material layer which can be formed on the glass substrate, such as a color resist layer or a common electrode layer.
  • S104 The first substrate and the second substrate pair formed with the plurality of spacers are arranged such that the plurality of auxiliary spacers respectively face the region where the plurality of grooves are located, and the plurality of main spacers respectively face the non-multiple grooves.
  • the plurality of spacers formed on the first substrate face the second substrate to partition the first substrate and the second substrate, and maintain the first substrate of the flat display panel and The distance of the second substrate, thereby forming a space for filling the liquid crystal.
  • the flat display panel When the flat display panel is in a non-pressing state, the flat display panel is supported by the main spacer. At this time, the main spacer is in a compressed state under the force of gravity of the first substrate, and the auxiliary spacer is corresponding to the second A groove is provided on the material layer on the substrate such that the auxiliary spacer is in an uncompressed state.
  • the main spacer When the flat display panel is pressed, the main spacer is further compressed due to the external pressing force, and the auxiliary spacers are respectively locked in the plurality of grooves on the material layer, so that the flat display panel is further supplemented by the auxiliary
  • the spacer is further supported, at which point the secondary spacer can be in a compressed state.
  • the main spacers and the auxiliary spacers are disposed at the same height, and different heights of the spacers are not required by the different light intensities of the photomask technology, and the main spacers are not required to be accurately controlled.
  • the step difference between the auxiliary spacer and the auxiliary spacer is simple, and the production cost is low, and the economic benefit of the enterprise is improved, and the panel can be widely used in enterprise production.
  • the first substrate is a counter substrate
  • the second substrate is a thin film transistor array substrate.
  • the material layer is a color resist layer.
  • step S103 further comprising forming a plurality of grooves on the region corresponding to the plurality of auxiliary spacers on the color resist layer, and providing a groove at a position corresponding to each of the sub-pixels of the color resist layer, so as to make the auxiliary interval
  • the correspondence between the object and the color resist layer is one sub-pixel corresponding to one auxiliary spacer.
  • step S103 further comprising, in step S103, forming a plurality of grooves on a region of the color resist layer corresponding to the plurality of auxiliary spacers, and setting a position on the color resist layer corresponding to the plurality of sub-pixels
  • the groove is such that the corresponding relationship between the auxiliary spacer and the color resist layer is a plurality of sub-pixels corresponding to one auxiliary spacer.
  • step S103 further comprising setting a height of the plurality of grooves to h1, wherein h1 is equal to ⁇ h, and ⁇ h is when the flat display panel is in a non-pressing state, between the plurality of main spacers and the plurality of auxiliary spacers The height difference formed. Specifically, when the flat display panel is in a non-pressed state, the height of the main spacer when in the compressed state and the height of the auxiliary spacer when the auxiliary spacer is in the uncompressed state.
  • step S103 further comprising, in step S103, setting a height of the plurality of grooves to h2, wherein h2 is greater than ⁇ h, and ⁇ h is a plurality of main spacers when the flat display panel is in a non-pressing state.
  • h2 is greater than ⁇ h
  • ⁇ h is a plurality of main spacers when the flat display panel is in a non-pressing state.
  • the main spacers and the auxiliary spacers are disposed at the same height, and different heights of the spacers are not required to achieve spacers of different heights, and there is no need to precisely control the difference between the main spacers and the auxiliary spacers.
  • the flat display panel is simple in manufacturing method, has low production cost, and improves economic benefits of the enterprise, and can be widely used in enterprise production.
  • a groove is disposed at a position corresponding to each sub-pixel of the color resist layer, so that the corresponding relationship between the auxiliary spacer and the color resist layer is one sub-pixel corresponding to one auxiliary spacer, thereby improving the first
  • the second substrate is less likely to slide relative to each other, further reducing the risk of light leakage of the flat display panel.
  • the height of the groove is greater than or equal to ⁇ h.
  • the auxiliary spacer can be supported only when the flat display panel is in the pressed state, thereby avoiding the auxiliary spacer.
  • the flat display panel is also in a compressed state when it is not pressed, extending the service life of the auxiliary spacer, thereby prolonging the service life of the flat display panel.

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Abstract

一种平面显示面板（100）及制造方法。平面显示面板（100）包括第一基板（10）；第二基板（20），与第一基板（10）相对设置，第二基板（20）上设置有具有多个凹槽（222）的材料层（22）；多个间隔物（30），设置在第一基板（10）上且朝向第二基板（20）以间隔第一基板（10）与第二基板（20）；其中，多个间隔物（30）包括多个主间隔物（32）和多个辅间隔物（34），多个辅间隔物（34）分别朝向多个凹槽（222）所在的区域，而多个主间隔物（32）分别朝向非多个凹槽（222）所在的区域，且主间隔物（32）和辅间隔物（34）的高度一致，以使平面显示面板（100）在非按压时通过主间隔物（32）进行支撑，而在平面显示面板（100）受到按压时进一步通过辅间隔物（34）进行进一步地支撑。通过这种方式，能够简化制造方法，降低生产成本。

Description

平面显示面板及制作方法
【技术领域】
本发明涉及液晶显示技术领域，特别是涉及一种平面显示面板及制作方法。
【背景技术】
液晶显示面板中上下两个基板之间通常设置有具有较高高度的多个主间隔物和较低高度的多个辅间隔物，以维持液晶显示面板上下两片基板的距离从而形成一定空间用于填充液晶。
为形成不同高度的主间隔物和辅间隔物，目前通常采用以下两种方法：第一种是通过光掩膜技术的不同光线强度来实现不同高度的间隔物；第二种是通过蚀刻技术来刻画出不同高度的间隔物。然而，现有的两种方法均存有弊端，例如第一种方法成本较高，第二种方法难以精确地掌控主间隔物和辅间隔物的段差等弊端。而且，由于主间隔物与辅间隔物与下基板之间没有设定任何固定装置，当面板出现形变或弯曲时，上下基板容易相互滑动，导致液晶显示面板出现漏光等风险。
【发明内容】
本发明主要解决的技术问题是提供一种平面显示面板及制造方法，能够简化制造方法，降低生产成本。
为解决上述技术问题，本发明采用的一种技术方案是：提供一种平面显示面板，其包括：
第一基板；
第二基板，与所述第一基板相对设置，其中，所述第二基板上设置有材料层，且所述材料层上设置有多个凹槽；
多个间隔物，设置在所述第一基板上且朝向所述第二基板以间隔所述第一基板与所述第二基板；
其中，所述多个间隔物包括多个主间隔物和多个辅间隔物，所述多个辅间隔物分别朝向所述多个凹槽所在的区域，而所述多个主间隔物分别朝向非所述多个凹槽所在的区域，且所述主间隔物和所述辅间隔物高度一致，以在所述平面显示面板非按压时通过所述主间隔物进行支撑，而在所述平面显示面板受到按压时进一步通过所述辅间隔物进行进一步地支撑；
其中，所述第一基板为对向基板，而所述第二基板为薄膜晶体管(thin film transistor, TFT)阵列基板；间隔物由具有弹性性能的材质制成。
其中，所述材料层是色阻层。
其中，在所述色阻层对应每个子像素的位置上均设置一个凹槽。
其中，在所述色阻层对应多个子像素的位置上设置一个凹槽。
其中，所述多个凹槽的高度是h1，其中，所述h1等于Δh，所述Δh是当所述平面显示面板处于非按压状态时，所述多个主间隔物和所述多个辅间隔物之间形成的高度差。
其中，所述多个凹槽的高度是h2，其中，所述h2大于Δh，所述Δh是当所述平面显示面板处于非按压状态时，所述多个主间隔物和所述多个辅间隔物之间形成的高度差。
为解决上述技术问题，本发明采用的另一种技术方案是：提供一种平面显示面板，其包括：
第一基板；
第二基板，与所述第一基板相对设置，其中，所述第二基板上设置有材料层，且所述材料层上设置有多个凹槽；
多个间隔物，设置在所述第一基板上且朝向所述第二基板以间隔所述第一基板与所述第二基板；
其中，所述多个间隔物包括多个主间隔物和多个辅间隔物，所述多个辅间隔物分别朝向所述多个凹槽所在的区域，而所述多个主间隔物分别朝向非所述多个凹槽所在的区域，且所述主间隔物和所述辅间隔物高度一致，以在所述平面显示面板非按压时通过所述主间隔物进行支撑，而在所述平面显示面板受到按压时进一步通过所述辅间隔物进行进一步地支撑。
其中，所述第一基板为对向基板，而所述第二基板为薄膜晶体管(thin film transistor, TFT)阵列基板。
其中，所述材料层是色阻层。
其中，在所述色阻层对应每个子像素的位置上均设置一个凹槽。
其中，在所述色阻层对应多个子像素的位置上设置一个凹槽。
其中，所述多个凹槽的高度是h1，其中，所述h1等于Δh，所述Δh是当所述平面显示面板处于非按压状态时，所述多个主间隔物和所述多个辅间隔物之间形成的高度差。
其中，所述多个凹槽的高度是h2，其中，所述h2大于Δh，所述Δh是当所述平面显示面板处于非按压状态时，所述多个主间隔物和所述多个辅间隔物之间形成的高度差。
为解决上述技术问题，本发明采用的又一种技术方案是：提供一种平面显示面板的制作方法，该方法包括：
提供第一基板；
在所述第一基板上形成多个间隔物，其中，所述多个间隔物包括多个主间隔物和多个辅间隔物，且所述主间隔物和所述辅间隔物高度一致；
提供玻璃基板，在所述玻璃基板的一侧上形成材料层，在所述材料层上对应所述多个辅间隔物的区域形成多个凹槽，从而形成第二基板；
将形成有所述多个间隔物的所述第一基板和所述第二基板对组，使所述多个辅间隔物分别朝向所述多个凹槽所在的区域，所述多个主间隔物分别朝向非所述多个凹槽所在的区域，从而形成所述平面显示面板，其中，所述平面显示面板在非按压时通过所述主间隔物进行支撑，而所述平面显示面板在受到按压时进一步通过所述辅间隔物进行进一步地支撑。
其中，所述第一基板为对向基板，而所述第二基板为薄膜晶体管(thin film transistor, TFT)阵列基板。
其中，所述材料层是色阻层。
本发明的有益效果是：区别于现有技术的情况，本发明平面显示面板第一基板和第二基板之间设置高度一致的多个主间隔物和多个辅间隔物，且在第二基板上的材料层上设置有多个凹槽，其中，多个辅间隔物分别朝向多个凹槽所在的区域，而多个主间隔物分别朝向非多个凹槽所在的区域，以在平面显示面板非按压时通过主间隔物进行支撑，而在平面显示面板受到按压时进一步通过辅间隔物进行进一步地支撑，通过这种方式，不仅简化制造方法，而且还降低生产成本。而且在该平面显示面板受到按压，即平面显示面板出现形变或弯曲时，辅间隔物能卡制在材料层上的凹槽内，使得第一基板和第二基板不易相对滑动，从而避免平面显示面板出现漏光等风险。
【附图说明】
图1是本发明平面显示面板的一实施方式的截面结构示意图。
图2是本发明平面显示面板处于按压状态时的一实施方式的截面结构示意图。
图3是本发明平面显示面板处于按压状态时的另一实施方式的截面结构示意图。
图4是本发明平面显示面板的制作方法的一实施方式的流程图。
【具体实施方式】
下面结合附图和实施方式对本发明进行详细说明。
请参阅图1，图1是本发明平面显示面板的一实施方式的剖视结构示意图。
平面显示面板100包括第一基板10、第二基板20以及多个间隔物30。
第二基板20与第一基板10相对设置。第一基板10和第二基板20可为玻璃基板、对向基板、彩色滤光片基板、薄膜晶体管阵列基板、彩色滤光片整合在薄膜晶体管阵列基板上的基板等任何现有的用于组成平面显示面板100的基板。
其中，第二基板20上设置有材料层22，且该材料层22上设置有多个凹槽222。其中，材料层22可为色阻层或公共电极层等各种可形成在第二基板20上的材料层。
多个间隔物30，设置在第一基板10上且朝向第二基板20，以间隔第一基板10与第二基板20，维持平面显示面板100的第一基板10和第二基板20的距离，从而形成一定空间用于填充液晶。间隔物30可由塑料系的压克力树脂微粒子、玻璃系的棒状粒子或硅氧系球状粒子等各种具有弹性性能的材质制成。
多个间隔物30包括多个主间隔物32和多个辅间隔物34，主间隔物32和辅间隔物34的高度一致。可以理解的，主间隔物32和辅间隔物34可由塑料系的压克力树脂微粒子、玻璃系的棒状粒子或硅氧系球状粒子等各种具有弹性性能的材质制成。
多个主间隔物32分别朝向材料层22上非多个凹槽222所在的区域，多个辅间隔物34分别朝向材料层22上的多个凹槽222所在的区域。
当平面显示面板100处于非按压状态时，平面显示面板100通过主间隔物32进行支撑，此时，主间隔物32在第一基板10的重力的作用力下处于压缩状态，而辅间隔物34因其对应的第二基板20上材料层22上设置有凹槽，使得该辅间隔物34处于非压缩状态，即自由状态。
当平面显示面板100受到按压时，因外界按压力的作用，主间隔物32进一步地被压缩，而辅间隔物34则分别卡制在材料层22上的多个凹槽222内，使得平面显示面板100进一步地通过辅间隔物34进行进一步地支撑，此时该辅间隔物34可处于压缩状态。
本发明平面显示面板第一基板和第二基板之间设置高度一致的多个主间隔物和多个辅间隔物，且在第二基板上的材料层上设置有多个凹槽，其中，多个辅间隔物分别朝向多个凹槽所在的区域，而多个主间隔物分别朝向非多个凹槽所在的区域，以在平面显示面板非按压时通过主间隔物进行支撑，而在平面显示面板受到按压时进一步通过辅间隔物进行进一步地支撑，通过这种方式，不仅简化制造方法，而且还降低生产成本；而且在该平面显示面板受到按压，即平面显示面板出现形变或弯曲时，辅间隔物能卡制在材料层上的凹槽内，使得第一基板和第二基板不易相对滑动，从而避免平面显示面板出现漏光等风险。
进一步地，第一基板10为对向基板，第二基板20为薄膜晶体管阵列基板。更进一步地，材料层22为色阻层。
其中，在色阻层22对应每个子像素的位置上均设置一个凹槽222。具体地如图2所示，图2是本发明平面显示面板处于按压状态时的一实施方式的截面结构示意图，色阻层22对应子像素a、子像素b和子像素c的位置上均设有一凹槽222，由于多个辅间隔物34分别朝向材料层22上的多个凹槽222所在的区域，因此辅间隔物34与色阻层22上的对应关系为一个子像素对应一个辅间隔物。
可以理解的，在其他一些实施方式中，在色阻层22对应多个子像素的位置上设置一个凹槽222。由于多个辅间隔物34分别朝向材料层22上的多个凹槽222所在的区域，因此辅间隔物34与色阻层22上的对应关系为若干个子像素对应一个辅间隔物。
进一步地，请参阅图2，多个凹槽的高度为h1，其中，h1等于Δh，Δh是当平面显示面板处于非按压状态时，多个主间隔物和多个辅间隔物之间形成的高度差。具体的，当平面显示面板处于非按压的状态时，主间隔物处于压缩状态时的高度与辅间隔物处于未压缩状态时的高度的高度差。
可以理解的，在其他一些实施方式中，请参阅图3，图3是本发明平面显示面板处于按压状态时的另一实施方式的截面结构示意图，多个凹槽的高度可为h2，其中，h2大于Δh，Δh是当平面显示面板处于非按压状态时，多个主间隔物和多个辅间隔物之间形成的高度差。
本实施方式的平面显示面板不仅简化了制造方法还降低了生产成本，而且进一步地在色阻层对应每个子像素的位置上均设置一个凹槽，以使辅间隔物与色阻层上的对应关系为一个子像素对应一个辅间隔物，通过这种方式可进一步地提升第一基板上形成的辅间隔物的密度，在该平面显示面板受到按压，即平面显示面板出现形变或弯曲时，更多的辅间隔物能卡制在材料层上的凹槽内，使得第一基板和第二基板更加不易相对滑动，进一步地降低平面显示面板出现漏光等风险。此外，本发明的平面显示面板的凹槽的高度大于等于Δh，通过这种方式，能够使的辅间隔物只有在平面显示面板处于按压状态时才能起支撑作用，避免辅间隔物在平面显示面板在非按压时也处于压缩状态，延长辅间隔物的使用寿命，进而延长该平面显示面板的使用寿命。
另外，本发明还提供一种平面显示面板的制作方法，请参阅图4，图4是本发明平面显示面板的制作方法的一实施方式的流程图。该制作方法包括如下步骤：
S101：提供第一基板。
该第一基板可为玻璃基板、对向基板、彩色滤光片基板、薄膜晶体管阵列基板、彩色滤光片整合在薄膜晶体管阵列基板上的基板等任何现有的用于组成平面显示面板的基板。
S102：在第一基板上形成多个间隔物，其中，多个间隔物包括多个主间隔物和多个辅间隔物，且主间隔物和辅间隔物的高度一致。
多个间隔物可由塑料系的压克力树脂微粒子、玻璃系的棒状粒子或硅氧系球状粒子等各种具有弹性性能的材质制成。
S103：提供玻璃基板，在玻璃基板的一侧上形成材料层，在材料层上对应多个辅间隔物的区域形成多个凹槽，从而形成第二基板。
材料层可为色阻层或公共电极层等各种可形成在玻璃基板上的材料层。
S104：将形成有多个间隔物的第一基板和第二基板对组，使多个辅间隔物分别朝向多个凹槽所在的区域，多个主间隔物分别朝向非多个凹槽所在的区域，从而形成平面显示面板，其中，平面显示面板在非按压时通过主间隔物进行支撑，而平面显示面板在受到按压时进一步通过辅间隔物进行进一步地支撑。
第一基板和第二基板对组后，形成在第一基板上的多个间隔物多个间隔物朝向第二基板，以间隔第一基板与第二基板，维持平面显示面板的第一基板和第二基板的距离，从而形成一定空间用于填充液晶。
当平面显示面板处于非按压状态时，平面显示面板通过主间隔物进行支撑，此时，主间隔物在第一基板的重力的作用力下处于压缩状态，而辅间隔物因其对应的第二基板上材料层上设置有凹槽，使得该辅间隔物处于非压缩状态。
当平面显示面板受到按压时，因外界按压力的作用，主间隔物进一步地被压缩，而辅间隔物则分别卡制在材料层上的多个凹槽内，使得平面显示面板进一步地通过辅间隔物进行进一步地支撑，此时该辅间隔物可处于压缩状态。
本发明的平面显示面板的制造方法中将主间隔物和辅间隔物的设置为相同高度，无需通过光掩膜技术的不同光线强度来实现不同高度的间隔物，而且也无需精确控制主间隔物和辅间隔物的段差，该平面显示面板的制作方法简单，且生产成本较低，提升企业的经济效益，可广泛应用于企业生产中。
进一步地，第一基板为对向基板，第二基板为薄膜晶体管阵列基板。更进一步地，材料层为色阻层。
进一步地，在步骤S103中进一步包括在色阻层上对应多个辅间隔物的区域形成多个凹槽，且在色阻层对应每个子像素的位置上均设置一个凹槽，以使得辅间隔物与色阻层上的对应关系为一个子像素对应一个辅间隔物。
可以理解的，在其他一些实施方式中，在步骤S103中进一步包括在色阻层上对应多个辅间隔物的区域形成多个凹槽，且在色阻层对应多个子像素的位置上设置一个凹槽，以使得辅间隔物与色阻层上的对应关系为若干个子像素对应一个辅间隔物。
进一步地，在步骤S103中进一步包括设置多个凹槽的高度为h1，其中，h1等于Δh，Δh是当平面显示面板处于非按压状态时，多个主间隔物和多个辅间隔物之间形成的高度差。具体的，当平面显示面板处于非按压的状态时，主间隔物处于压缩状态时的高度与辅间隔物处于未压缩状态时的高度的高度差。
可以理解的，在其他一些实施方式中，在步骤S103中进一步包括设置多个凹槽的高度为h2，其中，h2大于Δh，Δh是当平面显示面板处于非按压状态时，多个主间隔物和多个辅间隔物之间形成的高度差。
本实施方式中将主间隔物和辅间隔物的设置为相同高度，无需通过光掩膜技术的不同光线强度来实现不同高度的间隔物，而且也无需精确控制主间隔物和辅间隔物的段差，该平面显示面板的制作方法简单，且生产成本较低，提升企业的经济效益，可广泛应用于企业生产中。而且通过在色阻层对应每个子像素的位置上均设置一个凹槽，以使辅间隔物与色阻层上的对应关系为一个子像素对应一个辅间隔物，通过这种方式可提升第一基板上形成的辅间隔物的密度，在该平面显示面板受到按压，即平面显示面板出现形变或弯曲时，更多的辅间隔物能卡制在材料层上的凹槽内，使得第一基板和第二基板更加不易相对滑动，进一步地降低平面显示面板出现漏光等风险。另外，本发明的平面显示面板制造方法中将凹槽的高度大于等于Δh，通过这种方式，能够使的辅间隔物只有在平面显示面板处于按压状态时才能起支撑作用，避免辅间隔物在平面显示面板在非按压时也处于压缩状态，延长辅间隔物的使用寿命，进而延长该平面显示面板的使用寿命。
以上所述仅为本发明的实施方式，并非因此限制本发明的专利范围，凡是利用本发明说明书及附图内容所作的等效结构或等效流程变换，或直接或间接运用在其他相关的技术领域，均同理包括在本发明的专利保护范围内。

Claims (16)

  1. 一种平面显示面板，其中，包括：
    第一基板；
    第二基板，与所述第一基板相对设置，其中，所述第二基板上设置有材料层，且所述材料层上设置有多个凹槽；
    多个间隔物，设置在所述第一基板上且朝向所述第二基板以间隔所述第一基板与所述第二基板；
    其中，所述多个间隔物包括多个主间隔物和多个辅间隔物，所述多个辅间隔物分别朝向所述多个凹槽所在的区域，而所述多个主间隔物分别朝向非所述多个凹槽所在的区域，且所述主间隔物和所述辅间隔物高度一致，以在所述平面显示面板非按压时通过所述主间隔物进行支撑，而在所述平面显示面板受到按压时进一步通过所述辅间隔物进行进一步地支撑；
    其中，所述第一基板为对向基板，而所述第二基板为薄膜晶体管(thin film transistor, TFT)阵列基板；间隔物由具有弹性性能的材质制成。
  2. 根据权利要求1所述的平面显示面板，其中，所述材料层是色阻层。
  3. 根据权利要求2所述的平面显示面板，其中，在所述色阻层对应每个子像素的位置上均设置一个凹槽。
  4. 根据权利要求2所述的平面显示面板，其中，在所述色阻层对应多个子像素的位置上设置一个凹槽。
  5. 根据权利要求1所述的平面显示面板，其中，所述多个凹槽的高度是h1，其中，所述h1等于Δh，所述Δh是当所述平面显示面板处于非按压状态时，所述多个主间隔物和所述多个辅间隔物之间形成的高度差。
  6. 根据权利要求1所述的平面显示面板，其中，所述多个凹槽的高度是h2，其中，所述h2大于Δh，所述Δh是当所述平面显示面板处于非按压状态时，所述多个主间隔物和所述多个辅间隔物之间形成的高度差。
  7. 一种平面显示面板，其中，包括：
    第一基板；
    第二基板，与所述第一基板相对设置，其中，所述第二基板上设置有材料层，且所述材料层上设置有多个凹槽；
    多个间隔物，设置在所述第一基板上且朝向所述第二基板以间隔所述第一基板与所述第二基板；
    其中，所述多个间隔物包括多个主间隔物和多个辅间隔物，所述多个辅间隔物分别朝向所述多个凹槽所在的区域，而所述多个主间隔物分别朝向非所述多个凹槽所在的区域，且所述主间隔物和所述辅间隔物高度一致，以在所述平面显示面板非按压时通过所述主间隔物进行支撑，而在所述平面显示面板受到按压时进一步通过所述辅间隔物进行进一步地支撑。
  8. 根据权利要求7所述的平面显示面板，其中，所述第一基板为对向基板，而所述第二基板为薄膜晶体管(thin film transistor, TFT)阵列基板。
  9. 根据权利要求8所述的平面显示面板，其中，所述材料层是色阻层。
  10. 根据权利要求9所述的平面显示面板，其中，在所述色阻层对应每个子像素的位置上均设置一个凹槽。
  11. 根据权利要求9所述的平面显示面板，其中，在所述色阻层对应多个子像素的位置上设置一个凹槽。
  12. 根据权利要求7所述的平面显示面板，其中，所述多个凹槽的高度是h1，其中，所述h1等于Δh，所述Δh是当所述平面显示面板处于非按压状态时，所述多个主间隔物和所述多个辅间隔物之间形成的高度差。
  13. 根据权利要求7所述的平面显示面板，其中，所述多个凹槽的高度是h2，其中，所述h2大于Δh，所述Δh是当所述平面显示面板处于非按压状态时，所述多个主间隔物和所述多个辅间隔物之间形成的高度差。
  14. 一种平面显示面板的制作方法，其中，所述方法包括：
    提供第一基板；
    在所述第一基板上形成多个间隔物，其中，所述多个间隔物包括多个主间隔物和多个辅间隔物，且所述主间隔物和所述辅间隔物高度一致；
    提供玻璃基板，在所述玻璃基板的一侧上形成材料层，在所述材料层上对应所述多个辅间隔物的区域形成多个凹槽，从而形成第二基板；
    将形成有所述多个间隔物的所述第一基板和所述第二基板对组，使所述多个辅间隔物分别朝向所述多个凹槽所在的区域，所述多个主间隔物分别朝向非所述多个凹槽所在的区域，从而形成所述平面显示面板，其中，所述平面显示面板在非按压时通过所述主间隔物进行支撑，而所述平面显示面板在受到按压时进一步通过所述辅间隔物进行进一步地支撑。
  15. 根据权利要求14所述的制作方法，其中，所述第一基板为对向基板，而所述第二基板为薄膜晶体管(thin film transistor, TFT)阵列基板。
  16. 根据权利要求15所述的制作方法，其中，所述材料层是色阻层。
PCT/CN2015/082821 2015-04-27 2015-06-30 平面显示面板及制作方法 WO2016173113A1 (zh)

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