WO2016104764A1 - Rouleau de film stratifié et son procédé de production - Google Patents

Rouleau de film stratifié et son procédé de production Download PDF

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Publication number
WO2016104764A1
WO2016104764A1 PCT/JP2015/086364 JP2015086364W WO2016104764A1 WO 2016104764 A1 WO2016104764 A1 WO 2016104764A1 JP 2015086364 W JP2015086364 W JP 2015086364W WO 2016104764 A1 WO2016104764 A1 WO 2016104764A1
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WIPO (PCT)
Prior art keywords
refractive index
ultra
low refractive
index layer
film roll
Prior art date
Application number
PCT/JP2015/086364
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English (en)
Japanese (ja)
Inventor
裕宗 春田
武本　博之
大輔 服部
恒三 中村
Original Assignee
日東電工株式会社
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Filing date
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Priority claimed from JP2015176206A external-priority patent/JP6604781B2/ja
Application filed by 日東電工株式会社 filed Critical 日東電工株式会社
Priority to US15/539,928 priority Critical patent/US11505667B2/en
Priority to CN201580071024.9A priority patent/CN107148350B/zh
Priority to EP15873332.9A priority patent/EP3235638B1/fr
Priority to KR1020177018505A priority patent/KR102577830B1/ko
Publication of WO2016104764A1 publication Critical patent/WO2016104764A1/fr

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
    • B05D7/24—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials for applying particular liquids or other fluent materials
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04—Coating
    • C08J7/043—Improving the adhesiveness of the coatings per se, e.g. forming primers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00—Layered products comprising a layer of synthetic resin
    • B32B27/06—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
    • B32B37/14—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the properties of the layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B5/00—Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts
    • B32B5/18—Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts characterised by features of a layer of foamed material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/02—Physical, chemical or physicochemical properties
    • B32B7/023—Optical properties
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04—Coating
    • C08J7/0427—Coating with only one layer of a composition containing a polymer binder
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04—Coating
    • C08J7/046—Forming abrasion-resistant coatings; Forming surface-hardening coatings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2551/00—Optical elements
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2483/00—Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen, or carbon only; Derivatives of such polymers
    • C08J2483/04—Polysiloxanes

Definitions

  • the present invention relates to a laminated film roll and a method for producing the same.
  • the gap between the two substrates becomes an air layer.
  • the air layer formed between the substrates functions as, for example, a low refractive layer that totally reflects light.
  • members such as a prism, a polarizing film, and a polarizing plate are arranged with a certain distance so that an air layer serving as a low refractive index layer is provided between the members. Yes.
  • each member in order to form an air layer in this way, each member must be arranged with a certain distance, and therefore, the members cannot be stacked in order, which takes time for manufacturing.
  • Non-Patent Document 1 there is an application example of a void layer in which no firing treatment is performed (for example, see Non-Patent Document 1).
  • the film strength of the obtained void layer is inferior, impact resistance cannot be imparted, and there is still a problem that continuous production cannot be performed with a roll-shaped product.
  • this invention aims at provision of the elongate laminated film roll containing the ultra-low-refractive-index layer whose refractive index is 1.20 or less which can become a substitute of an air layer, for example.
  • the laminated film roll of the present invention is characterized in that an ultra-low refractive index layer having a refractive index of 1.20 or less is laminated on a resin film.
  • the laminated film of the present invention is formed by laminating an ultra-low refractive index layer having a refractive index of 1.20 or less on a resin film.
  • scratch resistance by Bencott (registered trademark) showing film strength. It is characterized by having a property of 60 to 100% and a folding resistance of 100 times or more according to the MIT test showing flexibility.
  • the method for producing a laminated film roll of the present invention includes a step of producing a liquid containing one or more types of structural units forming a fine void structure, a step of coating the liquid on a resin film, and a coating process. And a step of drying the liquid.
  • the optical member of the present invention includes an ultra-low refractive index layer in the laminated film roll or laminated film of the present invention.
  • the laminated film roll of the present invention exhibits the above-mentioned characteristics, for example, realizes an ultra-low refractive index with a refractive index of 1.20 or less that can be substituted for an air layer, and is continuous in a roll-shaped product. Production is possible. For this reason, in order to obtain an ultra-low refractive index, it is not necessary to provide an air layer by arranging a plurality of members with a certain distance, and the ultra-low refractive index layer of the present invention is arranged at a desired site. As a result, ultra-low refractive index property can be imparted, and continuous production at low cost is possible. For this reason, the laminated
  • FIG. 1 is a process cross-sectional view schematically showing an example of a method for forming an ultra-low refractive index layer 20 on a resin film 10 in the present invention.
  • Drawing 2 is a figure showing typically a part of process in a manufacturing method of a lamination film roll of the present invention, and an example of an apparatus used therefor.
  • Drawing 3 is a figure showing typically a part of process in a manufacturing method of a lamination film roll of the present invention, and another example of an apparatus used therefor.
  • FIG. 4 is a process cross-sectional view schematically showing another example of a method for forming an ultra-low refractive index layer on a substrate in the present invention.
  • FIG. 1 is a process cross-sectional view schematically showing an example of a method for forming an ultra-low refractive index layer 20 on a resin film 10 in the present invention.
  • Drawing 2 is a figure showing typically a part of process in a manufacturing method of a lamination film roll of the present invention, and an
  • FIG. 5 is a diagram schematically showing a part of steps in the method for producing an ultra-low refractive index layer of the present invention and still another example of an apparatus used therefor.
  • FIG. 6 is a diagram schematically showing a part of steps in the method for producing an ultra-low refractive index layer of the present invention and still another example of an apparatus used therefor.
  • FIG. 7 is a process cross-sectional view schematically showing still another example of a method for forming an ultra-low refractive index layer on a substrate in the present invention.
  • FIG. 8 is a diagram schematically showing a part of steps in the method for producing an ultra-low refractive index layer of the present invention and still another example of an apparatus used therefor.
  • FIG. 9 is a diagram schematically showing a part of steps in the method for producing an ultra-low refractive index layer of the present invention and still another example of an apparatus used therefor.
  • the ultralow refractive index layer has a scratch resistance of 60 to 100% due to Bencot (registered trademark) indicating the film strength, and is bent according to the MIT test indicating flexibility.
  • the number of times is 100 times or more.
  • one type or a plurality of types of structural units forming a fine void structure may be chemically bonded.
  • the structural units may include, for example, a direct bond or an indirect bond.
  • the said 1 type or multiple types of structural unit should just be chemically couple
  • the structural units are “indirectly bonded” means that the structural units are bonded to each other through a small amount of a binder component equal to or less than the structural unit amount.
  • the structural units are “directly bonded” means that the structural units are directly bonded without using a binder component or the like.
  • the bond between the structural units may include a hydrogen bond or a covalent bond.
  • the structural unit may have, for example, a structure having at least one of a particle shape, a fiber shape, and a flat plate shape.
  • the particulate and flat structural units may be made of an inorganic substance, for example.
  • the constituent element of the particulate structural unit may include at least one element selected from the group consisting of Si, Mg, Al, Ti, Zn, and Zr, for example.
  • the structure (structural unit) that forms the particles may be a real particle or a hollow particle, and specifically includes silicone particles, silicone particles having fine pores, silica hollow nanoparticles, silica hollow nanoballoons, and the like.
  • the fibrous structural unit is, for example, a nanofiber having a diameter of nanometer, and specifically includes cellulose nanofiber and alumina nanofiber.
  • Examples of the plate-like structural unit include nanoclay, specifically, nano-sized bentonite (for example, Kunipia F [trade name]) and the like.
  • the fibrous structural unit is not particularly limited, but for example, from the group consisting of carbon nanofiber, cellulose nanofiber, alumina nanofiber, chitin nanofiber, chitosan nanofiber, polymer nanofiber, glass nanofiber, and silica nanofiber. It may be at least one fibrous material selected.
  • the ultra-low refractive index layer is a porous body containing fine pore particles.
  • the shape of the “particles” is not particularly limited, and may be, for example, spherical or non-spherical.
  • the fine pore particles may be, for example, sol-gel beaded particles, nanoparticles (hollow nanosilica / nanoballoon particles), nanofibers, or the like, as described above.
  • the ultra-low refractive index layer has a porosity of 40% or more.
  • the laminated film roll of the present invention has, for example, a pore size of 2 to 200 nm.
  • the laminated film roll of the present invention has a thickness of 0.01 to 100 ⁇ m.
  • the laminated film roll of the present invention has, for example, a haze indicating transparency of less than 5%.
  • the method for producing a laminated film roll of the present invention further includes, for example, a step of adding a catalyst for chemically bonding the fine pore particles to the liquid in the step of preparing the liquid.
  • the catalyst is a catalyst that promotes cross-linking between microporous particles.
  • the ultra-low refractive index layer is formed by directly bonding the structural units.
  • the ultra-low refractive index layer is formed by indirectly bonding the structural units.
  • the ultra-low refractive index layer is formed so that the bonds between the structural units include hydrogen bonds or covalent bonds.
  • the structural unit is a structural unit having at least one shape selected from the group consisting of particles, fibers, and flat plates.
  • the particulate and flat structural units may be made of an inorganic substance, for example.
  • the constituent element of the particulate structural unit may include at least one element selected from the group consisting of Si, Mg, Al, Ti, Zn, and Zr.
  • the structural unit may be, for example, a fine pore particle.
  • the laminated film roll of the present invention is obtained by laminating an ultra-low refractive index layer having a refractive index of 1.20 or less on a resin film.
  • an ultra-low refractive index layer having a refractive index of 1.20 or less is laminated on a resin film, and scratch resistance by Bencott (registered trademark) showing film strength. It may be a laminated film having a property of 60 to 100% and a folding resistance of 100 times or more according to the MIT test showing flexibility.
  • the resin film is not particularly limited, and types of the resin include, for example, polyethylene terephthalate (PET), acrylic, cellulose acetate propionate (CAP), cycloolefin polymer (COP), triacetate (TAC), polyethylene naphthalate.
  • types of the resin include, for example, polyethylene terephthalate (PET), acrylic, cellulose acetate propionate (CAP), cycloolefin polymer (COP), triacetate (TAC), polyethylene naphthalate.
  • thermoplastic resins having excellent transparency such as (PEN), polyethylene (PE), and polypropylene (PP).
  • the ultra-low refractive index layer (hereinafter also referred to as “the ultra-low refractive index layer of the present invention”) in the laminated film roll or laminated film of the present invention may be directly laminated on, for example, the resin film, You may laminate
  • the present invention when the ultra-low refractive index layer of the present invention is formed on the resin film, the present invention includes, for example, the ultra-low refractive index layer and the resin film, and the ultra-low refractive index layer is formed on the resin film. It can also be said to be a low-refractive material characterized in that a low-refractive index layer is laminated and has the above characteristics.
  • the ultra low refractive index layer of the present invention has a scratch resistance of 60 to 100% due to Bencot (registered trademark) indicating film strength. Since the present invention has such a film strength, for example, it is resistant to physical impact during winding or use during production.
  • the lower limit of the scratch resistance is, for example, 60% or more, 80% or more, 90% or more, and the upper limit thereof is, for example, 100% or less, 99% or less, 98% or less, and the range is For example, they are 60 to 100%, 80 to 99%, 90 to 98%.
  • the scratch resistance by Bencot showing film strength is 60 to 100%, and the MIT test showing flexibility.
  • the folding endurance by is 100 times or more.
  • the scratch resistance can be measured by the following method, for example, when the ultra-low refractive index layer contains silicon (Si).
  • the said ultra-low-refractive-index layer contains elements other than silicon (Si)
  • it can measure according to the following method, for example.
  • a void layer (ultra-low refractive index layer of the present invention) applied and formed on an acrylic film is sampled in a circular shape having a diameter of about 15 mm.
  • silicon is identified with fluorescent X-rays (manufactured by Shimadzu Corporation: ZSX Primus II), and the Si coating amount (Si 0 ) is measured.
  • the gap layer on the acrylic film is cut to 50 mm ⁇ 100 mm from the vicinity sampled, and fixed to a glass plate (thickness 3 mm), and then according to Bencott (registered trademark). Perform a sliding test.
  • the sliding condition is a weight of 100 g and 10 reciprocations.
  • the residual amount of Si (Si 1 ) after the scratch test is measured by sampling and fluorescent X measurement in the same manner as in (1) above from the gap layer after sliding.
  • the ultralow refractive index layer of the present invention has a folding resistance of 100 times or more according to the MIT test showing flexibility. Since this invention has such flexibility, it is excellent in the handleability at the time of winding, use, etc. at the time of continuous manufacture.
  • the lower limit of the folding endurance number is, for example, 100 times or more, 500 times or more, 1000 times or more, and the upper limit is not particularly limited, for example, 10,000 times or less, and the range is, for example, 100 10000 times, 500 times to 10000 times, 1000 times to 10000 times.
  • the flexibility means, for example, ease of deformation of the substance.
  • the folding endurance by the MIT test can be measured by the following method, for example.
  • the void layer (the ultra-low refractive index layer of the present invention) was cut into a 20 mm ⁇ 80 mm strip, and then attached to an MIT folding tester (manufactured by Tester Sangyo Co., Ltd .: BE-202) with a load of 1.0 N. Call.
  • the chuck part that embeds the gap layer uses R 2.0 mm, performs the folding endurance up to 10,000 times, and sets the number of times when the gap layer is broken as the number of folding endurances.
  • the film density is not particularly limited, and the lower limit thereof is, for example, 1 g / cm 3 or more, 10 g / cm 3 or more, 15 g / cm 3 or more, and the upper limit thereof.
  • the range thereof is, for example, 5 to 50 g / cm 3 or 10 to 40 g / cm. 3, 15 ⁇ 30g / cm 3 , a 1 ⁇ 2.1g / cm 3.
  • the lower limit of the porosity based on the film density is, for example, 50% or more, 70% or more, 85% or more, and the upper limit thereof is, for example, 98%. Below, it is 95% or less, and the range is, for example, 50 to 98%, 70 to 95%, 85 to 95%.
  • the film density can be measured by the following method, for example, and the porosity can be calculated as follows based on the film density, for example.
  • the ultra-low refractive index layer of the present invention has a pore structure, and the pore size refers to the major axis diameter of the major axis and minor axis of the void (hole). To do.
  • a preferable pore size is, for example, 2 nm to 500 nm.
  • the lower limit of the void size is, for example, 2 nm or more, 5 nm or more, 10 nm or more, 20 nm or more, and the upper limit thereof is, for example, 500 nm or less, 200 nm or less, 100 nm or less, and the range thereof is, for example, 2 nm to 500 nm, 5 nm to 500 nm, 10 nm to 200 nm, and 20 nm to 100 nm. Since a preferable void size is determined depending on the use of the void structure, for example, it is necessary to adjust the void size to a desired void size according to the purpose.
  • the void size can be evaluated by the following method, for example.
  • the void size can be quantified by a BET test method. Specifically, 0.1 g of a sample (ultra-low refractive index layer of the present invention) is put into a capillary of a specific surface area measuring device (Micromeritic: ASAP2020), and then dried under reduced pressure at room temperature for 24 hours. The gas in the void structure is degassed. The adsorption isotherm is drawn by adsorbing nitrogen gas to the sample, and the pore distribution is obtained. Thereby, the gap size can be evaluated.
  • the ultra-low refractive index layer of the present invention may have, for example, a pore structure (porous structure) as described above, and may be, for example, an open cell structure in which the pore structure is continuous.
  • the open cell structure means, for example, that the pore structure is three-dimensionally connected in the ultra-low refractive index layer (for example, a porous silicone material) of the present invention. It can be said that it is continuous.
  • the porous body has an open cell structure, it is possible to increase the porosity occupied in the bulk body, but when using closed cell particles such as hollow silica, the open cell structure is formed. Can not.
  • the ultra-low refractive index layer of the present invention has a three-dimensional dendritic structure when, for example, silica sol particles (a pulverized product of a gel-like silicon compound that forms a sol) are used.
  • the dendritic particles settle and deposit, so that an open cell structure can be easily formed.
  • the ultra-low refractive index layer of the present invention more preferably forms a monolith structure in which the open cell structure has a plurality of pore distributions.
  • the monolith structure refers to, for example, a structure in which nano-sized fine voids exist and a hierarchical structure that exists as an open cell structure in which the nano voids are aggregated.
  • a structure in which nano-sized fine voids exist and a hierarchical structure that exists as an open cell structure in which the nano voids are aggregated In the case of forming the monolith structure, for example, it is possible to achieve both film strength and high porosity by providing a high porosity with coarse open-cell voids while providing film strength with fine voids.
  • the monolith structure can be formed by controlling the particle size distribution of the pulverized silica sol particles to a desired size.
  • the haze showing transparency is not particularly limited, and the upper limit thereof is, for example, less than 5%, preferably less than 3%.
  • the lower limit is, for example, 0.1% or more and 0.2% or more, and the range is, for example, 0.1% or more and less than 5%, or 0.2% or more and less than 3%.
  • the haze can be measured by, for example, the following method.
  • the void layer (ultra low refractive index layer of the present invention) is cut into a size of 50 mm ⁇ 50 mm, and set in a haze meter (Murakami Color Research Laboratory Co., Ltd .: HM-150) to measure haze.
  • the refractive index is generally the ratio of the transmission speed of the wavefront of light in a vacuum to the propagation speed in the medium is called the refractive index of the medium.
  • the upper limit of the refractive index of the ultra-low refractive index layer of the present invention is, for example, 1.20 or less and 1.15 or less, and the lower limit thereof is, for example, 1.05 or more, 1.06 or more, 1.07.
  • the ranges are, for example, 1.05 to 1.20, 1.06 to 1.20, and 1.07 to 1.15.
  • the refractive index means a refractive index measured at a wavelength of 550 nm unless otherwise specified.
  • the measuring method of a refractive index is not specifically limited, For example, it can measure with the following method.
  • the sample is set in an ellipsometer (manufactured by JA Woollam Japan: VASE), the refractive index is measured under the conditions of a wavelength of 500 nm and an incident angle of 50 to 80 degrees, and the average value is taken as the refractive index.
  • the adhesive peel strength showing adhesion to the resin film is not particularly limited, and the lower limit is, for example, 1 N /
  • the upper limit is, for example, 30 N / 25 mm or less, 20 N / 25 mm or less, 10 N / 25 mm or less, and the range thereof is, for example, 1 to 30 N / 25 mm. 2 to 20 N / 25 mm, 3 to 10 N / 25 mm.
  • the method for measuring the adhesive peel strength is not particularly limited, and can be measured, for example, by the following method.
  • a void layer (ultra low refractive index layer of the present invention) on the resin film (for example, acrylic film)
  • sampling is performed in a strip shape of 50 mm ⁇ 140 mm, and the sample is fixed to a stainless steel plate with a double-sided tape.
  • An acrylic adhesive layer (thickness 20 ⁇ m) is bonded to a PET film (T100: manufactured by Mitsubishi Plastics Film Co., Ltd.), and the adhesive tape piece cut to 25 mm ⁇ 100 mm is bonded to the gap layer, and the PET film Laminate.
  • the sample is chucked on a tensile tester (manufactured by Shimadzu Corporation: AG-Xplus) so that the distance between chucks is 100 mm, and then a tensile test is performed at a tensile speed of 0.3 m / min.
  • the average test force obtained from the 50 mm peel test is defined as the peel strength.
  • the thickness of the ultra-low refractive index layer of the present invention is not particularly limited, and the lower limit thereof is, for example, 0.01 ⁇ m or more, 0.05 ⁇ m or more, 0.1 ⁇ m or more, 0.3 ⁇ m or more, and the upper limit thereof is, for example, 100 ⁇ m or less, 80 ⁇ m or less, 50 ⁇ m or less, 10 ⁇ m or less, and the range is, for example, 0.01 to 100 ⁇ m.
  • the ultra-low refractive index layer of the present invention includes, for example, a pulverized product of a gel compound as described above, and the pulverized product is chemically bonded to each other.
  • the form of chemical bonding (chemical bonding) between the pulverized products is not particularly limited, and specific examples of the chemical bonding include, for example, cross-linking.
  • the method of chemically bonding the pulverized products will be described in detail in the production method of the present invention.
  • the gel form of the gel compound is not particularly limited. “Gel” generally refers to a solidified state in which a solute has a structure in which it loses independent motility due to interaction and aggregates.
  • a wet gel includes a dispersion medium and a solute has a uniform structure in the dispersion medium.
  • a xerogel is a network structure in which the solvent is removed and the solute has voids.
  • the gel compound may be, for example, a wet gel or a xerogel.
  • Examples of the gel compound include a gelled product obtained by gelling a monomer compound.
  • examples of the gel silicon compound include gelled products in which the monomer silicon compounds are bonded to each other, and specific examples include gelled products in which the monomer silicon compounds are bonded to each other through hydrogen bonding or intermolecular force bonding.
  • Examples of the bond include a bond by dehydration condensation. The gelation method will be described later in the production method of the present invention.
  • the volume average particle diameter showing the particle size variation of the pulverized product is not particularly limited, and the lower limit thereof is, for example, 0.10 ⁇ m or more, 0.20 ⁇ m or more, 0.40 ⁇ m or more.
  • the upper limit is, for example, 2.00 ⁇ m or less, 1.50 ⁇ m or less, 1.00 ⁇ m or less, and the range is, for example, 0.10 ⁇ m to 2.00 ⁇ m, 0.20 ⁇ m to 1.50 ⁇ m, or 0.40 ⁇ m. ⁇ 1.00 ⁇ m.
  • the particle size distribution can be measured by, for example, a particle size distribution evaluation apparatus such as a dynamic light scattering method or a laser diffraction method, and an electron microscope such as a scanning electron microscope (SEM) or a transmission electron microscope (TEM). .
  • a particle size distribution evaluation apparatus such as a dynamic light scattering method or a laser diffraction method
  • an electron microscope such as a scanning electron microscope (SEM) or a transmission electron microscope (TEM).
  • the particle size distribution showing the particle size variation of the pulverized product is not particularly limited.
  • particles having a particle size of 0.4 ⁇ m to 1 ⁇ m are 50 to 99.9% by weight, 80 to 99.8% by weight, 90 to 90%. It is 99.7% by weight, or particles having a particle size of 1 ⁇ m to 2 ⁇ m are 0.1 to 50% by weight, 0.2 to 20% by weight, and 0.3 to 10% by weight.
  • the particle size distribution can be measured by, for example, a particle size distribution evaluation apparatus or an electron microscope.
  • the kind of the gel compound is not particularly limited.
  • the gel compound include a gel silicon compound.
  • the gel compound is a gel silicon compound will be described as an example, but the present invention is not limited thereto.
  • the cross-linking is, for example, a siloxane bond.
  • the siloxane bond include T2 bond, T3 bond, and T4 bond shown below.
  • T2 bond T2 bond
  • T3 bond T4 bond
  • T4 bond T4 bond
  • the ultra-low refractive index layer of the present invention has a siloxane bond, for example, it may have any one kind of bond, any two kinds of bonds, or all three kinds of bonds. May be.
  • the siloxane bonds the greater the ratio of T2 and T3, the more flexible and the expected properties of the gel can be expected, but the film strength becomes weaker.
  • T4 ratio in the siloxane bond is large, the film strength is easily developed, but the void size becomes small and the flexibility becomes brittle. For this reason, for example, it is preferable to change the ratio of T2, T3, and T4 according to the application.
  • the contained silicon atoms have a siloxane bond.
  • the proportion of unbonded silicon atoms (that is, residual silanol) among all silicon atoms contained in the ultra-low refractive index layer is, for example, less than 50%, 30% or less, or 15% or less.
  • the monomer silicon compound is not particularly limited.
  • the silicon compound of the monomer include a compound represented by the following formula (1).
  • the gelled silicon compound is a gelled product in which monomeric silicon compounds are bonded to each other by hydrogen bonding or intermolecular force bonding as described above, the monomers of formula (1) are bonded to each other through, for example, each hydroxyl group. it can.
  • X is 2, 3 or 4
  • R 1 is a linear or branched alkyl group.
  • the carbon number of R 1 is, for example, 1-6, 1-4, 1-2.
  • Examples of the linear alkyl group include a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, and a hexyl group.
  • Examples of the branched alkyl group include an isopropyl group and an isobutyl group.
  • X is, for example, 3 or 4.
  • the silicon compound represented by the formula (1) include a compound represented by the following formula (1 ′) in which X is 3.
  • R 1 is the same as in the above formula (1), and is, for example, a methyl group.
  • the silicon compound is tris (hydroxy) methylsilane.
  • X is 3, the silicon compound is, for example, a trifunctional silane having three functional groups.
  • silicon compound represented by the formula (1) examples include a compound in which X is 4.
  • the silicon compound is, for example, a tetrafunctional silane having four functional groups.
  • the silicon compound of the monomer may be, for example, a hydrolyzate of a silicon compound precursor.
  • the silicon compound precursor is not particularly limited as long as it can generate the silicon compound by hydrolysis, and specific examples thereof include a compound represented by the following formula (2).
  • R 1 and R 2 are each a linear or branched alkyl group, R 1 and R 2 may be the same or different, R 1 s may be the same as or different from each other when X is 2. R 2 may be the same as or different from each other.
  • X and R 1 are, for example, the same as X and R 1 in the formula (1).
  • R 2 is, for example, can be exemplified for R 1 is incorporated in the formula (1).
  • the silicon compound precursor represented by the formula (2) include compounds represented by the following formula (2 ′) in which X is 3.
  • R 1 and R 2 are the same as those in the formula (2), respectively.
  • the silicon compound precursor is trimethoxy (methyl) silane (hereinafter also referred to as “MTMS”).
  • the silicon compound of the monomer is preferably the trifunctional silane from the viewpoint of excellent low refractive index, for example.
  • the silicon compound as the monomer is preferably the tetrafunctional silane from the viewpoint of excellent strength (for example, scratch resistance).
  • the silicon compound of the said monomer used as the raw material of the said gel-like silicon compound only 1 type may be used and 2 or more types may be used together, for example.
  • the silicon compound of the monomer for example, only the trifunctional silane may be included, only the tetrafunctional silane may be included, or both the trifunctional silane and the tetrafunctional silane may be included.
  • other silicon compounds may be included.
  • the ratio is not particularly limited and can be set as appropriate.
  • the ultra-low refractive index layer of the present invention may contain, for example, a catalyst for chemically bonding one type or a plurality of types of structural units forming the fine void structure.
  • the content of the catalyst is not particularly limited, but is, for example, 0.01 to 20% by weight, 0.05 to 10% by weight with respect to the weight of one or more kinds of structural units forming the fine void structure. Or 0.1 to 5% by weight.
  • the ultra-low refractive index layer of the present invention may further contain, for example, a crosslinking aid for indirectly bonding one type or plural types of structural units forming the fine void structure.
  • a crosslinking aid for indirectly bonding one type or plural types of structural units forming the fine void structure.
  • the content of the crosslinking aid is not particularly limited.
  • the content of the crosslinking aid is 0.01 to 20% by weight, 0.05 to 15% with respect to the weight of one or more kinds of structural units forming the fine void structure. % By weight, or 0.1 to 10% by weight.
  • the form of the ultra-low refractive index layer of the present invention is not particularly limited, but a film shape is usual.
  • the ultra-low refractive index layer of the present invention is, for example, a roll body.
  • the ultra-low refractive index layer of the present invention may further include a resin film as described above, for example, and the ultra-low refractive index layer may be formed on the long resin film.
  • another long film may be laminated on the laminated film of the present invention, and another long resin film (on the laminated film of the present invention including the resin film and the ultra-low refractive index layer).
  • a form wound on a roll body after laminating a slip sheet, a release film, a surface protective film, etc. may be used.
  • the manufacturing method of the laminated film roll of the present invention is not particularly limited, for example, it can be manufactured by the manufacturing method of the present invention shown below.
  • the method for producing a laminated film roll of the present invention includes a step of producing a liquid containing fine pore particles, a step of applying the liquid onto a resin film, and a step of drying the applied liquid.
  • the liquid containing the fine pore particles (hereinafter sometimes referred to as “fine pore particle-containing liquid”) is not particularly limited, and is, for example, a suspension containing the fine pore particles.
  • the ultra-low refractive index layer is a porous body (preferably a silicone porous material) containing a pulverized product of a gel-like compound.
  • the present invention can also be carried out in the same manner when the fine pore particles are other than the pulverized product of the gel compound.
  • the ultra-low refractive index layer is, for example, a porous body in which fine pore particles are chemically bonded, and in the ultra-low refractive index layer forming step, for example, The fine pore particles are chemically bonded to each other.
  • the microporous particles are, for example, silicon compound microporous particles, and the porous body is a silicone porous body.
  • the fine pore particles of the silicon compound include, for example, a pulverized body of a gel-like silica compound.
  • As another form of the ultra-low refractive index layer there is a void layer made of a fibrous material such as nanofiber, and the fibrous material is entangled to form a layer including voids.
  • the manufacturing method is the same as that of the fine pore particles.
  • a void layer using hollow nanoparticles and nanoclay, and a void layer formed using hollow nanoballoons and magnesium fluoride are also included.
  • these ultra-low refractive index layers may be a void layer made of a single constituent material, or may be a void layer made of a plurality of constituent materials.
  • the form of the gap layer may be a single form or a plurality of gap layers.
  • the porous void layer in which the fine pore particles are chemically bonded to each other will be mainly described.
  • an ultra-low refractive index layer exhibiting an excellent low refractive index is formed.
  • the reason is estimated as follows, for example, but the present invention is not limited to this estimation.
  • the pulverized product used in the production method of the present invention is obtained by pulverizing the gel silicon compound, the three-dimensional structure of the gel silicon compound before pulverization is dispersed in a three-dimensional basic structure. It has become. And in the manufacturing method of this invention, the precursor of the porous structure based on the said three-dimensional basic structure is formed by apply
  • the said ultra-low refractive index layer finally obtained can show the low refractive index which functions to the same extent as an air layer, for example.
  • the new three-dimensional structure is fixed in order to chemically bond the pulverized products.
  • the ultra-low refractive index layer finally obtained has a structure having voids, but can maintain sufficient strength and flexibility.
  • the ultra-low refractive index layer obtained by the production method of the present invention is useful, for example, as a substitute for the air layer, in terms of the function of low refractive index, and in strength and flexibility. is there.
  • the ultra-low refractive index layer obtained by the production method of the present invention can exhibit low refractive properties that function to the same extent as the air layer, for example, only by being disposed at a target site. Therefore, as described above, for example, an optical member can be imparted with low refractive index that functions to the same extent as the air layer more easily and simply than the formation of the air layer.
  • the production method of the present invention can use the explanation of the ultra-low refractive index layer of the present invention unless otherwise specified.
  • the description of the porous structure of the present invention can be used for the gel compound and the pulverized product thereof, the monomer compound and the precursor of the monomer compound.
  • the production method of the present invention includes a step of producing a liquid containing fine pore particles as described above.
  • the fine pore particles are a pulverized product of a gel compound
  • the pulverized product can be obtained, for example, by pulverizing the gel compound.
  • the three-dimensional structure of the gel-like compound is destroyed and dispersed into the three-dimensional basic structure.
  • the gelation of the monomer compound can be performed, for example, by hydrogen bonding or intermolecular force bonding of the monomer compounds.
  • Examples of the monomer compound include a silicon compound represented by the formula (1) described in the ultra-low refractive index layer of the present invention.
  • the monomers of the formula (1) can be hydrogen bonded or intermolecularly bonded via, for example, each hydroxyl group.
  • the silicon compound may be a hydrolyzate of the silicon compound precursor.
  • the silicon compound precursor represented by the formula (2) described in the ultra-low refractive index layer of the invention is used.
  • the body may be produced by hydrolysis.
  • the method for hydrolysis of the monomer compound precursor is not particularly limited, and can be performed, for example, by a chemical reaction in the presence of a catalyst.
  • the catalyst include acids such as oxalic acid and acetic acid.
  • an aqueous solution of oxalic acid is slowly dropped and mixed in a mixed solution (for example, suspension) of the silicon compound and dimethyl sulfoxide in a room temperature environment, and then stirred for about 30 minutes. Can be done.
  • a mixed solution for example, suspension
  • hydrolyzing the silicon compound precursor for example, by completely hydrolyzing the alkoxy group of the silicon compound precursor, further heating and immobilization after gelation / aging / void structure formation, It can be expressed efficiently.
  • the gelation of the monomer compound can be performed, for example, by a dehydration condensation reaction between the monomers.
  • the dehydration condensation reaction is preferably performed, for example, in the presence of a catalyst.
  • the catalyst include acid catalysts such as hydrochloric acid, oxalic acid, and sulfuric acid, and ammonia, potassium hydroxide, sodium hydroxide, ammonium hydroxide, and the like.
  • a dehydration condensation catalyst such as a base catalyst.
  • the dehydration condensation catalyst is particularly preferably a base catalyst.
  • the amount of the catalyst added to the monomer compound is not particularly limited, and the catalyst is, for example, 0.1 to 10 mol, 0.05 to 7 mol, relative to 1 mol of the monomer compound. 0.1 to 5 moles.
  • the gelation of the monomer compound is preferably performed in a solvent, for example.
  • the ratio of the monomer compound in the solvent is not particularly limited.
  • the solvent include dimethyl sulfoxide (DMSO), N-methylpyrrolidone (NMP), N, N-dimethylacetamide (DMAc), dimethylformamide (DMF), ⁇ -butyllactone (GBL), acetonitrile (MeCN), ethylene Examples thereof include glycol ethyl ether (EGEE).
  • DMSO dimethyl sulfoxide
  • NMP N-methylpyrrolidone
  • DMAc N, N-dimethylacetamide
  • DMF dimethylformamide
  • GBL ⁇ -butyllactone
  • MeCN acetonitrile
  • EGEE glycol ethyl ether
  • one type of solvent may be used, or two or more types may be used in combination.
  • the solvent used for the gelation is also referred to as “gelling solvent”.
  • the gelation conditions are not particularly limited.
  • the treatment temperature for the solvent containing the monomer compound is, for example, 20-30 ° C., 22-28 ° C., 24-26 ° C., and the treatment time is, for example, 1-60 minutes, 5-40 minutes, 10-30. Minutes.
  • the process conditions in particular are not restrict
  • the gel-like compound obtained by the gelation is preferably subjected to an aging treatment after the gelation reaction.
  • the aging treatment for example, by further growing primary particles of a gel having a three-dimensional structure obtained by gelation, it is possible to increase the size of the particles themselves.
  • the contact state of the contacting neck portion can be increased from point contact to surface contact.
  • the gel subjected to the aging treatment as described above for example, increases the strength of the gel itself, and as a result, can improve the strength of the three-dimensional basic structure after pulverization.
  • the pore size of the void structure in which the three-dimensional basic structure is deposited can be prevented from shrinking due to solvent volatilization during the drying process.
  • the aging treatment can be performed, for example, by incubating the gel compound at a predetermined temperature for a predetermined time.
  • the predetermined temperature is not particularly limited, and the lower limit thereof is, for example, 30 ° C or higher, 35 ° C or higher, 40 ° C or higher, and the upper limit thereof is, for example, 80 ° C or lower, 75 ° C or lower, 70 ° C or lower.
  • the range is, for example, 30 to 80 ° C., 35 to 75 ° C., 40 to 70 ° C.
  • the predetermined time is not particularly limited, and the lower limit thereof is, for example, 5 hours or more, 10 hours or more, 15 hours or more, and the upper limit thereof is, for example, 50 hours or less, 40 hours or less, 30 hours or less.
  • the range is, for example, 5 to 50 hours, 10 to 40 hours, 15 to 30 hours.
  • the optimum conditions for aging are mainly the conditions under which, for example, the increase in the silica primary particle size and the increase in the contact area of the neck portion can be obtained.
  • the same solvent as the gelation treatment can be used.
  • the aging treatment can be performed as it is on the reaction product after the gel treatment (that is, the solvent containing the gel compound).
  • the number of moles of residual silanol groups contained in the gel (the gel-like compound, for example, the gel-like silicon compound) after the aging treatment after gelation is, for example, the added raw material (for example, the monomer compound precursor)
  • the lower limit is, for example, 50% or more, 40% or more, 30% or more
  • the upper limit is, for example, 1% or less, 3% or less, 5% or less
  • the range is, for example, 1 to 50%, 3 to 40%, or 5 to 30%.
  • the lower the number of moles of residual silanol groups For the purpose of increasing the hardness of the gel, for example, the lower the number of moles of residual silanol groups, the better. If the number of moles of silanol groups is too high, for example, there is a possibility that the void structure cannot be maintained before the precursor of the porous silicone material is crosslinked. On the other hand, if the number of moles of silanol groups is too low, for example, in the step of preparing the fine pore particle-containing liquid (for example, suspension) and / or the subsequent step, the pulverized product of the gel compound cannot be crosslinked, There is a possibility that sufficient film strength cannot be imparted.
  • a silanol group for example, when a silicon compound as a monomer is modified with various reactive functional groups, the same phenomenon can be applied to each functional group.
  • the obtained gel compound is pulverized.
  • the gel compound in the gelling solvent may be pulverized as it is, or after the gelation solvent is replaced with another solvent, A pulverization treatment may be applied to the gel compound.
  • the catalyst used in the gelation reaction and the solvent used remain after the ripening process, causing the gelation of the liquid over time (pot life) and a decrease in the drying efficiency during the drying process, It is preferable to substitute the above solvent.
  • the other solvent is also referred to as a “grinding solvent”.
  • the solvent for grinding is not particularly limited, and for example, an organic solvent can be used.
  • the organic solvent include solvents having a boiling point of 130 ° C. or lower, a boiling point of 100 ° C. or lower, and a boiling point of 85 ° C. or lower. Specific examples include isopropyl alcohol (IPA), ethanol, methanol, butanol, propylene glycol monomethyl ether (PGME), methyl cellosolve, acetone, dimethylformamide (DMF) and the like.
  • the pulverizing solvent may be, for example, one type or a combination of two or more types.
  • the combination of the gelling solvent and the grinding solvent is not particularly limited, and examples thereof include a combination of DMSO and IPA, DMSO and ethanol, DMSO and methanol, and a combination of DMSO and butanol.
  • a more uniform coating film can be formed, for example, in coating film formation described below.
  • the method for pulverizing the gel compound is not particularly limited, and can be performed by, for example, an ultrasonic homogenizer, a high-speed rotation homogenizer, a pulverizer using other cavitation phenomenon, or a pulverizer that obliquely collides liquids with high pressure.
  • a device for performing media grinding such as a ball mill physically destroys the void structure of the gel at the time of grinding, whereas a cavitation type grinding device preferable for the present invention such as a homogenizer is, for example, a gel-less system.
  • the relatively weakly bonded silica particle bonding surface already contained in the three-dimensional structure is peeled off with a high shear force.
  • the obtained sol three-dimensional structure can hold, for example, a void structure having a certain range of particle size distribution, and can re-create the void structure by deposition during coating and drying.
  • the conditions for the pulverization are not particularly limited.
  • the gel can be pulverized without volatilizing the solvent by instantaneously applying a high-speed flow.
  • the work amount is excessive, for example, the sol particles become finer than the desired particle size distribution, and the void size deposited after coating and drying becomes fine, which may not satisfy the desired porosity. .
  • a liquid (for example, a suspension) containing the fine pore particles can be produced. Furthermore, after producing the liquid containing the fine pore particles or during the production process, a catalyst containing the fine pore particles and the catalyst is produced by adding a catalyst that chemically bonds the fine pore particles to each other. can do.
  • the amount of the catalyst to be added is not particularly limited, but is 0.01 to 20% by weight, 0.05 to 10% by weight, for example, with respect to the weight of the fine pore particles (for example, a pulverized product of the gel-like silicon compound). Alternatively, the content is 0.1 to 5% by weight.
  • the fine pore particles can be chemically bonded in a bonding step described later.
  • the catalyst may be, for example, a catalyst that promotes cross-linking between the microporous particles.
  • a chemical reaction for chemically bonding the fine pore particles it is preferable to use a dehydration condensation reaction of residual silanol groups contained in silica sol molecules. By promoting the reaction between the hydroxyl groups of the silanol group with the catalyst, it is possible to form a continuous film that cures the void structure in a short time.
  • the catalyst include a photoactive catalyst and a thermally active catalyst. According to the photoactive catalyst, for example, the fine pore particles can be chemically bonded (for example, crosslinked) without being heated. According to this, for example, since shrinkage due to heating hardly occurs, a higher porosity can be maintained.
  • a substance that generates a catalyst may be used.
  • the catalyst may be a crosslinking reaction accelerator
  • the catalyst generator may be a substance that generates the crosslinking reaction accelerator.
  • a substance that generates a catalyst by light photocatalyst generator
  • a substance that generates water thermally active catalyst
  • the photocatalyst generator is not particularly limited, and examples thereof include a photobase generator (a catalyst that generates a basic catalyst by light irradiation), a photoacid generator (a substance that generates an acidic catalyst by light irradiation), and the like.
  • a photobase agent is preferred.
  • Examples of the photobase generator include 9-anthrylmethyl N, N-diethylcarbamate (trade name WPBG-018), (E) -1- [3- (2- Hydroxyphenyl) -2-propenoyl] piperidine ((E) -1- [3- (2-hydroxyphenyl) -2-propenoyl] piperidine, trade name WPBG-027), 1- (anthraquinone-2-yl) ethyl imidazolecarboxy Rate (1- (anthraquinon-2-yl) ethyl imidazolecarboxylate, trade name WPBG-140), 2-nitrophenylmethyl 4-methacryloyloxypiperidine-1-carboxylate (trade name WPBG-165), 1,2-diisopropyl- 3- [bis (dimethylamino) methylene] guanidium 2- (3-benzoylphenyl) propionate (trade name WPBG-266), 1 , 2-dicy
  • the trade names including “WPBG” are trade names of Wako Pure Chemical Industries, Ltd.
  • Examples of the photoacid generator include aromatic sulfonium salts (trade name SP-170: ADEKA), triarylsulfonium salts (trade name CPI101A: San Apro), and aromatic iodonium salts (trade name Irgacure 250: Ciba Japan). Company).
  • the catalyst for chemically bonding the fine pore particles is not limited to the photoactive catalyst, and may be a thermally active catalyst such as urea.
  • the catalyst that chemically bonds the fine pore particles examples include a base catalyst such as potassium hydroxide, sodium hydroxide, and ammonium hydroxide, and an acid catalyst such as hydrochloric acid, acetic acid, and oxalic acid. Of these, base catalysts are preferred.
  • the catalyst for chemically bonding the fine pore particles is used, for example, by adding to the sol particle liquid (for example, suspension) containing the pulverized product (fine pore particles) immediately before coating, or the catalyst. Can be used as a mixed solution mixed with a solvent.
  • the mixed liquid may be, for example, a coating liquid that is directly added and dissolved in the sol particle liquid, a solution in which the catalyst is dissolved in a solvent, or a dispersion liquid in which the catalyst is dispersed in a solvent.
  • the solvent is not particularly limited, and examples thereof include various organic solvents, water, and a buffer solution.
  • the microporous particles are a pulverized product of a gel-like silicon compound obtained from a silicon compound containing at least a trifunctional or lower saturated bond functional group
  • a crosslinking aid for indirectly bonding the fine pore particles may be added during the production process.
  • the cross-linking aid enters between the particles, and the particles and the cross-linking aid interact or bond with each other, so that it is possible to bond particles that are slightly apart from each other and efficiently increase the strength. It becomes possible.
  • the crosslinking aid a polycrosslinked silane monomer is preferable.
  • the multi-crosslinked silane monomer has, for example, an alkoxysilyl group having 2 or more and 3 or less, the chain length between alkoxysilyl groups may be 1 to 10 carbon atoms, and an element other than carbon May also be included.
  • crosslinking aid examples include bis (trimethoxysilyl) ethane, bis (triethoxysilyl) ethane, bis (trimethoxysilyl) methane, bis (triethoxysilyl) methane, bis (triethoxysilyl) propane, bis (Trimethoxysilyl) propane, bis (triethoxysilyl) butane, bis (trimethoxysilyl) butane, bis (triethoxysilyl) pentane, bis (trimethoxysilyl) pentane, bis (triethoxysilyl) hexane, bis (tri Methoxysilyl) hexane, bis (trimethoxysilyl) hexane, bis (trimethoxysilyl) hexane, bis (trimethoxysilyl) hexane, bis (trimethoxysilyl) -N-butyl-N-propyl-ethane-1
  • the production method of the present invention includes a step of coating the fine pore particle-containing liquid (for example, suspension) on the resin film.
  • the coating for example, various coating methods described later can be used, and the present invention is not limited thereto.
  • membrane) of the said porous body can be formed by applying the solvent containing the said ground material directly to the said base material.
  • the precursor of the porous body can also be referred to as a coating layer, for example.
  • the said porous body precursor ie, the precursor of the said porous body before the coupling
  • membrane or precursor layer
  • membrane or precursor layer
  • the solvent (hereinafter also referred to as “coating solvent”) is not particularly limited, and for example, an organic solvent can be used.
  • the organic solvent include solvents having a boiling point of 130 ° C. or lower. Specific examples include, for example, IPA, ethanol, methanol, butanol and the like, and the same solvents as the grinding solvent can be used.
  • the solvent for pulverization including the pulverized product of the gel compound may be used as it is. Good.
  • the sol-like pulverized material dispersed in the solvent (hereinafter, also referred to as “sol particle liquid”) is preferably applied onto the substrate.
  • the sol particle liquid of the present invention can be continuously formed into a void layer having a film strength of a certain level or more by performing chemical crosslinking by a bonding step after coating and drying on a substrate. It is.
  • the “sol” in the present invention refers to a state in which the silica sol particles having a nano three-dimensional structure retaining a part of the void structure are dispersed in a solvent and exhibit fluidity by pulverizing the three-dimensional structure of the gel.
  • the concentration of the pulverized product in the solvent is not particularly limited, and for example, 0.3 to 50% (v / v), 0.5 to 30% (v / v), 1.0 to 10% (v / v) v).
  • concentration of the pulverized product is too high, for example, the fluidity of the sol particle solution is remarkably lowered, and there is a possibility that aggregates and coating streaks are generated during coating.
  • concentration of the pulverized product is too low, for example, not only does it take a considerable amount of time to dry the solvent of the sol particle liquid, but also the residual solvent immediately after drying increases, so the porosity decreases. There is a possibility that.
  • the physical properties of the sol are not particularly limited.
  • the shear viscosity of the sol is, for example, a viscosity of 100 cPa ⁇ s or less, a viscosity of 10 cPa ⁇ s or less, and a viscosity of 1 cPa ⁇ s or less at a shear rate of 10001 / s. If the shear viscosity is too high, for example, coating streaks may occur, and problems such as a decrease in the transfer rate of gravure coating may be observed. On the other hand, when the shear viscosity is too low, for example, the wet coating thickness at the time of coating cannot be increased, and a desired thickness may not be obtained after drying.
  • the amount of the pulverized material applied to the substrate is not particularly limited, and can be appropriately set according to, for example, the desired thickness of the silicone porous body.
  • the amount of the pulverized material applied to the base material is, for example, 0.01 to 60000 ⁇ g per 1 m 2 of the base material. 0.1 to 5000 ⁇ g and 1 to 50 ⁇ g.
  • the preferable coating amount of the sol particle liquid is, for example, related to the concentration of the liquid, the coating method, etc., and thus it is difficult to define it uniquely. Is preferred.
  • the production method of the present invention includes a step of drying the coated fine pore particle-containing liquid (porous body precursor (coating film)).
  • the drying treatment for example, not only the solvent (the solvent contained in the sol particle liquid) in the precursor of the porous body is removed, but also the sol particles are settled and deposited during the drying treatment to form a void structure.
  • the purpose is to form.
  • the drying treatment temperature is, for example, 50 to 250 ° C., 60 to 150 ° C., 70 to 130 ° C.
  • the drying treatment time is, for example, 0.1 to 30 minutes, 0.2 to 10 minutes, 0 .3-3 minutes.
  • the drying process temperature and time are preferably lower and shorter in relation to, for example, continuous productivity and high porosity.
  • the substrate is a resin film
  • the substrate is extended in a drying furnace by being close to the glass transition temperature of the substrate, and formed immediately after coating. Defects such as cracks may occur in the void structure.
  • the conditions are too loose, for example, since the residual solvent is included at the time of leaving the drying furnace, there is a possibility that defects in appearance such as scratches will occur when rubbing with the roll in the next process. is there.
  • the drying treatment may be, for example, natural drying, heat drying, or vacuum drying.
  • the drying method is not particularly limited, and for example, a general heating means can be used.
  • the heating means include a hot air fan, a heating roll, and a far infrared heater.
  • heat drying when it is premised on industrial continuous production, it is preferable to use heat drying.
  • a solvent having a low surface tension is preferable for the purpose of suppressing the generation of shrinkage stress accompanying the solvent volatilization during drying and the cracking phenomenon of the void layer (the silicone porous body).
  • the solvent include, but are not limited to, lower alcohols typified by isopropyl alcohol (IPA), hexane, perfluorohexane, and the like.
  • the drying treatment may be, for example, natural drying, heat drying, or vacuum drying.
  • the drying method is not particularly limited, and for example, a general heating means can be used.
  • the heating means include a hot air fan, a heating roll, and a far infrared heater.
  • heat drying when it is premised on industrial continuous production, it is preferable to use heat drying.
  • a solvent having a low surface tension is preferable for the purpose of suppressing the generation of shrinkage stress accompanying the solvent volatilization during drying and the cracking phenomenon of the void layer (the silicone porous body).
  • the solvent examples include, but are not limited to, lower alcohols typified by isopropyl alcohol (IPA), hexane, perfluorohexane, and the like. Further, a small amount of a perfluoro-based surfactant or a silicon-based surfactant may be added to the IPA or the like to reduce the surface tension.
  • IPA isopropyl alcohol
  • hexane hexane
  • perfluorohexane perfluorohexane
  • silicon-based surfactant may be added to the IPA or the like to reduce the surface tension.
  • the three-dimensional structure of the pulverized material in the precursor of the porous body is fixed.
  • fixing by conventional sintering for example, high temperature treatment at 200 ° C. or higher induces dehydration condensation of silanol groups and formation of siloxane bonds.
  • various additives that catalyze the above dehydration condensation reaction for example, when the base material is a resin film, the base material is relatively low at around 100 ° C. without causing damage to the base material.
  • a void structure can be continuously formed and immobilized at a drying temperature and a short processing time of less than a few minutes.
  • the method of chemically bonding is not particularly limited, and can be appropriately determined according to, for example, the type of the gel silicon compound.
  • the chemical bonding can be performed by, for example, chemical cross-linking between the pulverized products, and, for example, inorganic particles such as titanium oxide are added to the pulverized product. In this case, it is conceivable to chemically cross-link the inorganic particles and the pulverized product.
  • a biocatalyst such as an enzyme is supported, a site other than the catalytic active site and the pulverized product may be chemically crosslinked.
  • the present invention can be applied to, for example, not only a void layer (silicone porous body) formed by the sol particles but also an organic-inorganic hybrid void layer, a host guest void layer, and the like, but is not limited thereto.
  • the bonding can be performed, for example, by a chemical reaction in the presence of a catalyst that chemically bonds the pulverized products (microporous particles) with each other according to the type of the pulverized product of the gel compound.
  • the catalyst may be, for example, a catalyst that promotes cross-linking between microporous particles.
  • a chemical reaction in the present invention it is preferable to utilize a dehydration condensation reaction of residual silanol groups contained in silica sol molecules. By promoting the reaction between the hydroxyl groups of the silanol group with the catalyst, it is possible to form a continuous film that cures the void structure in a short time.
  • the catalyst examples include base catalysts such as potassium hydroxide, sodium hydroxide and ammonium hydroxide, and acid catalysts such as hydrochloric acid, acetic acid and oxalic acid, but are not limited thereto.
  • the catalyst for the dehydration condensation reaction is particularly preferably a base catalyst.
  • a photoacid generator catalyst, a photobase generator catalyst, a photoacid generator, a photobase generator, or the like that exhibits catalytic activity when irradiated with light (for example, ultraviolet rays) can also be preferably used.
  • the photoacid generator catalyst, photobase generator catalyst, photoacid generator, and photobase generator are not particularly limited, and are, for example, as described above.
  • the catalyst can be added to the fine pore particle-containing liquid (for example, a suspension of the pulverized product (fine pore particles)) in the step of preparing the fine pore particle-containing liquid.
  • the catalyst is added to a sol particle liquid (for example, suspension) containing the pulverized product (microporous particles) immediately before coating, or the catalyst is mixed with a solvent. It is preferable to use it as a mixed liquid.
  • the mixed liquid may be, for example, a coating liquid that is directly added and dissolved in the sol particle liquid, a solution in which the catalyst is dissolved in a solvent, or a dispersion liquid in which the catalyst is dispersed in a solvent.
  • the solvent is not particularly limited, and examples thereof include water and a buffer solution as described above.
  • the chemical reaction in the presence of the catalyst is performed (occurs).
  • the chemical reaction is performed, for example, by irradiating or heating the coating film containing the catalyst previously added to the sol particle liquid (for example, suspension), or spraying the catalyst on the coating film. Then, light irradiation or heating, or light irradiation or heating while spraying on the catalyst can be performed.
  • the catalyst is a photoactive catalyst
  • the ultra-low refractive index layer can be formed by chemically bonding the microporous particles by light irradiation.
  • the ultra-low refractive index layer can be formed by chemically bonding the fine pore particles by heating.
  • Integrated light intensity in the light irradiation is not particularly limited, @ in 360nm terms, for example, 200 ⁇ 800mJ / cm 2, 250 ⁇ 600mJ / cm 2 or 300 ⁇ 400mJ / cm 2,. From the viewpoint of preventing the irradiation amount from being insufficient and the decomposition due to light absorption of the catalyst generator from proceeding and preventing the effect from becoming insufficient, an integrated light amount of 200 mJ / cm 2 or more is good. Further, from the viewpoint of preventing the base material under the void layer from being damaged and generating thermal wrinkles, an integrated light amount of 800 mJ / cm 2 or less is good.
  • the conditions for the heat treatment are not particularly limited, and the heating temperature is, for example, 50 to 250 ° C., 60 to 150 ° C., 70 to 130 ° C., and the heating time is, for example, 0.1 to 30 minutes, 0.2 to 10 minutes and 0.3 to 3 minutes.
  • the step of drying the coated sol particle liquid (for example, suspension) may also serve as a step of performing a chemical reaction in the presence of the catalyst. That is, in the step of drying the coated sol particle liquid (for example, suspension), the pulverized material (microporous particles) may be chemically bonded to each other by a chemical reaction in the presence of the catalyst. .
  • the pulverized product (fine pore particles) may be further bonded to each other by further heating the coating film after the drying step.
  • the chemical reaction in the presence of the catalyst may occur in the step of preparing the microporous particle-containing liquid (for example, suspension) and the step of applying the microporous particle-containing liquid. Is done.
  • this assumption does not limit the present invention in any way.
  • the solvent used for example, a solvent having a low surface tension is preferable for the purpose of suppressing the generation of shrinkage stress accompanying the solvent volatilization during drying and the cracking phenomenon of the void layer. Examples thereof include, but are not limited to, lower alcohols typified by isopropyl alcohol (IPA), hexane, perfluorohexane, and the like.
  • the ultra-low refractive index layer (laminated film roll) of the present invention can be produced, but the production method of the present invention is not limited to this.
  • the obtained ultra-low refractive index layer (laminated film roll) of the present invention may be referred to as a strength improving step (hereinafter referred to as “aging step”) in which the strength is improved by, for example, treatment such as heat aging. ) May be performed.
  • aging step the strength improving step
  • the ultra-low refractive index layer of the present invention may be heated.
  • the temperature in the aging step is, for example, 40 to 80 ° C., 50 to 70 ° C., 55 to 65 ° C.
  • the reaction time is, for example, 5 to 30 hours, 7 to 25 hours, or 10 to 20 hours.
  • the adhesive peel strength can be improved while suppressing the shrinkage of the ultra-low refractive index layer, and both high porosity and strength can be achieved.
  • the catalyst contained in the ultra-low refractive index layer of the present invention allows chemical bonding (for example, crosslinking reaction) between the microporous particles. ) Is considered to further improve the strength.
  • the microporous particles are microporous particles of a silicon compound (for example, a pulverized product of a gel-like silica compound), and residual silanol groups (OH groups) are present in the ultra-low refractive index layer, The residual silanol groups are considered to be chemically bonded to each other by a crosslinking reaction.
  • the catalyst contained in the ultra-low refractive index layer of the present invention is not particularly limited.
  • the catalyst used in the coupling step may be used, or the photobase generation catalyst used in the coupling step is generated by light irradiation.
  • the basic substance, the acidic substance generated by light irradiation, etc. may be used as the photoacid generating catalyst used in the binding step.
  • this description is illustrative and does not limit the present invention.
  • an adhesive layer may be further formed on the ultra-low refractive index layer of the present invention (adhesive layer forming step).
  • the adhesive layer may be formed by applying (coating) a pressure-sensitive adhesive or an adhesive onto the ultra-low refractive index layer of the present invention.
  • the ultra-low refractive index of the present invention is obtained by laminating the adhesive layer side of the adhesive tape or the like on which the adhesive layer is laminated on a substrate on the ultra-low refractive index layer of the present invention.
  • the adhesive layer may be formed on the layer. In this case, the base material such as the adhesive tape may be left as it is or may be peeled off from the adhesive layer.
  • adheresive and “adhesive layer” refer to, for example, an agent or layer premised on re-peeling of the adherend.
  • adheresive and “adhesive layer” refer to, for example, an agent or a layer that does not assume re-peeling of the adherend.
  • pressure-sensitive adhesive and “adhesive” are not necessarily clearly distinguished, and “pressure-sensitive adhesive layer” and “adhesive layer” are not necessarily clearly distinguished.
  • the adhesive or adhesive which forms the said adhesive layer is not specifically limited, For example, a general adhesive or adhesive etc. can be used.
  • the pressure-sensitive adhesive or adhesive examples include acrylic-based, vinyl alcohol-based, silicone-based, polyester-based, polyurethane-based, and polyether-based adhesives, rubber-based adhesives, and the like.
  • the adhesive agent comprised from the water-soluble crosslinking agent of vinyl alcohol polymers, such as glutaraldehyde, melamine, and oxalic acid, etc. are mentioned. These pressure-sensitive adhesives and adhesives may be used alone or in combination (for example, mixing, lamination, etc.).
  • the thickness of the adhesive layer is not particularly limited, and is, for example, 0.1 to 100 ⁇ m, 5 to 50 ⁇ m, 10 to 30 ⁇ m, or 12 to 25 ⁇ m.
  • the ultra-low refractive index layer of the present invention is reacted with the adhesive layer to form an intermediate layer disposed between the ultra-low refractive index layer of the present invention and the adhesive layer.
  • Good intermediate layer forming step.
  • the intermediate layer makes it difficult for the ultra-low refractive index layer of the present invention and the adhesive layer to peel off, for example.
  • the reason (mechanism) is unknown, but is presumed to be due to, for example, the throwing property (throwing effect) of the intermediate layer.
  • the anchoring property (an anchoring effect) is that the interface is firmly fixed in the vicinity of the interface between the void layer and the intermediate layer because the intermediate layer is embedded in the void layer.
  • a phenomenon effect).
  • the reaction between the ultra-low refractive index layer of the present invention and the adhesive layer is not particularly limited, but may be a reaction by catalytic action, for example.
  • the catalyst may be, for example, a catalyst contained in the ultra low refractive index layer of the present invention.
  • the catalyst used in the coupling step may be used, the photobase generation catalyst used in the coupling step is a basic substance generated by light irradiation, and the photoacid generation catalyst used in the coupling step is light.
  • An acidic substance generated by irradiation may be used.
  • the reaction between the ultra-low refractive index layer of the present invention and the adhesive layer may be, for example, a reaction in which a new chemical bond is generated (for example, a crosslinking reaction).
  • the reaction temperature is, for example, 40 to 80 ° C., 50 to 70 ° C., 55 to 65 ° C.
  • the reaction time is, for example, 5 to 30 hours, 7 to 25 hours, or 10 to 20 hours.
  • middle layer formation process may serve as the said intensity
  • the ultra-low refractive index layer of the present invention thus obtained may be further laminated with another film (layer) to form a laminated structure including the porous structure.
  • each component may be laminated via, for example, a pressure-sensitive adhesive or an adhesive.
  • the lamination may be performed by continuous processing using a long film (so-called Roll to Roll, etc.). May be laminated with batch processing.
  • FIG. 2 after forming the silicone porous body (ultra-low refractive index layer), a step of pasting and winding a protective film is shown, but when laminating to another functional film, The above method may be used, or after coating and drying another functional film, the silicone porous body (ultra low refractive index layer) on which the film has been formed may be bonded immediately before winding.
  • the illustrated film forming method is merely an example, and the present invention is not limited thereto.
  • the base material may be the resin film described above in the description of the ultra-low refractive index layer of the present invention.
  • the ultra-low refractive index layer of the present invention can be obtained by forming the ultra-low refractive index layer on the substrate.
  • the present invention can be achieved by laminating the ultra-low refractive index layer on the resin film described above in the description of the ultra-low refractive index layer of the present invention after forming the ultra-low refractive index layer on the substrate. An ultra-low refractive index layer is obtained.
  • FIG. 1 is a cross-sectional view schematically showing an example of steps in a method for forming the ultra-low refractive index layer on the substrate.
  • the ultra low refractive index layer is formed by applying a sol particle solution 20 ′′ of the pulverized product of the gel compound onto a substrate 10, a sol particle solution 20.
  • '' Is dried to form a coating film 20 ′, which is a precursor layer of the ultra-low refractive index layer, a coating film forming step (drying step) (2), and a chemical treatment (
  • a chemical treatment step for example, a cross-linking treatment step
  • the ultra-low refractive index layer 20 can be formed on the substrate 10 as shown.
  • the method for forming the ultra-low refractive index layer may or may not include steps other than the steps (1) to (3) as appropriate.
  • the coating method of the sol particle liquid 20 '' is not particularly limited, and a general coating method can be adopted.
  • the coating method include a slot die method, a reverse gravure coating method, a micro gravure method (micro gravure coating method), a dip method (dip coating method), a spin coating method, a brush coating method, a roll coating method, and flexographic printing.
  • the extrusion coating method, the curtain coating method, the roll coating method, the micro gravure coating method and the like are preferable from the viewpoints of productivity, coating film smoothness, and the like.
  • the coating amount of the sol particle liquid 20 ′′ is not particularly limited, and can be appropriately set so that, for example, the thickness of the ultra low refractive index layer 20 is appropriate.
  • the thickness of the ultra low refractive index layer 20 is not particularly limited, and is as described above, for example.
  • the sol particle liquid 20 " is dried (that is, the dispersion medium contained in the sol particle liquid 20" is removed) to form a coating film (precursor layer) 20 '.
  • the conditions for the drying treatment are not particularly limited and are as described above.
  • the coating film 20 ′ containing the catalyst for example, a photoactive catalyst or a thermally active catalyst such as KOH
  • the ultra-low refractive index layer 20 is formed by chemically bonding (for example, crosslinking) the pulverized materials in the processed film 20 ′.
  • the light irradiation or heating conditions in the chemical treatment step (3) are not particularly limited and are as described above.
  • the resin film as the substrate 10
  • the ultra-low refractive index layer 20 can be directly laminated on the resin film (substrate 10).
  • FIG. 2 schematically shows an example of a slot die coating apparatus and a method for forming the ultra-low refractive index layer using the same.
  • FIG. 2 is a cross-sectional view, hatching is omitted for easy viewing.
  • each step in the method using this apparatus is performed while the substrate 10 is conveyed in one direction by a roller.
  • the conveyance speed is not particularly limited, and is, for example, 1 to 100 m / min, 3 to 50 m / min, or 5 to 30 m / min.
  • a coating process (1) for coating the base material 10 with the sol particle liquid 20 ′′ is performed on the coating roll 102 while the base material 10 is fed out and conveyed from the feed roller 101, and then the oven zone.
  • the process proceeds to the drying step (2).
  • a preliminary drying process is performed after a coating process (1) and prior to a drying process (2).
  • the preliminary drying step can be performed at room temperature without heating.
  • the heating means 111 is used.
  • the heating means 111 as described above, a hot air fan, a heating roll, a far infrared heater, or the like can be used as appropriate.
  • the drying step (2) may be divided into a plurality of steps, and the drying temperature may be increased as the subsequent drying step is performed.
  • the chemical treatment step (3) is performed in the chemical treatment zone 120.
  • the chemical treatment step (3) for example, when the dried coating film 20 ′ includes a photoactive catalyst, light irradiation is performed by lamps (light irradiation means) 121 disposed above and below the base material 10.
  • lamps (light irradiation means) 121 disposed above and below the base material 10.
  • a hot air fan 121 disposed above and below the substrate 10 using a hot air fan (heating means) instead of the lamp (light irradiation device) 121.
  • This cross-linking treatment causes chemical bonding between the pulverized products in the coating film 20 ′, and the ultra-low refractive index layer 20 is cured and strengthened.
  • the chemical treatment step (3) is performed after the drying step (2).
  • the drying step (2) may also serve as the chemical treatment step (3).
  • the chemical treatment step (3) may be further performed to further strengthen the chemical bond between the pulverized products.
  • Bonding may occur in the step prior to the drying step (2) (for example, a preliminary drying step, a coating step (1), a step of preparing a coating liquid (for example, a suspension), etc.) Bonding may occur in the step prior to the drying step (2).
  • the laminate in which the ultra low refractive index layer 20 is formed on the base material 10 is wound up by the winding roll 105.
  • the ultra-low refractive index layer 20 can be laminated directly on the resin film (base material 10).
  • the super low refractive index layer 20 of the laminate is covered and protected with a protective sheet fed from the roll 106.
  • the protective sheet instead of the protective sheet, another layer formed of a long film may be laminated on the ultra-low refractive index layer 20.
  • FIG. 3 schematically shows an example of a micro gravure method (micro gravure coating method) coating apparatus and a method for forming the ultra-low refractive index layer using the same.
  • the hatch is abbreviate
  • each step in the method using this apparatus is performed while the substrate 10 is conveyed in one direction by a roller, as in FIG.
  • the conveyance speed is not particularly limited, and is, for example, 1 to 100 m / min, 3 to 50 m / min, or 5 to 30 m / min.
  • a coating step (1) for coating the base material 10 with the sol particle liquid 20 ′′ is performed while the base material 10 is fed out and conveyed from the feed roller 201.
  • the coating of the sol 20 particle liquid ′′ is performed using a liquid reservoir 202, a doctor (doctor knife) 203, and a micro gravure 204 as shown in the figure.
  • the sol particle liquid 20 ′′ stored in the liquid reservoir 202 is attached to the surface of the microgravure 204, and further, the substrate 10 is controlled by the microgravure 204 while being controlled to a predetermined thickness by the doctor 203. Apply to the surface.
  • the microgravure 204 is merely an example, and the present invention is not limited to this, and any other coating means may be used.
  • a drying step (2) is performed. Specifically, as shown in the drawing, the base material 10 coated with the sol particle liquid 20 ′′ is conveyed into the oven zone 210 and heated by the heating means 211 in the oven zone 210 to be heated to the sol particle liquid 20 ′. 'Dry.
  • the heating means 211 may be the same as that shown in FIG. Further, for example, by dividing the oven zone 210 into a plurality of sections, the drying step (2) may be divided into a plurality of steps, and the drying temperature may be increased as the subsequent drying step is performed.
  • the chemical treatment step (3) is performed in the chemical treatment zone 220.
  • the chemical treatment step (3) for example, when the dried coating film 20 ′ includes a photoactive catalyst, light irradiation is performed by lamps (light irradiation means) 221 disposed above and below the substrate 10.
  • lamps (light irradiation means) 221 disposed above and below the substrate 10.
  • a hot air fan (heating means) is used instead of the lamp (light irradiation device) 221 and is arranged below the base material 10 ( The substrate 10 is heated by the heating means 221.
  • the pulverized material in the coating film 20 ′ is chemically bonded to each other, and the ultra-low refractive index layer 20 is formed.
  • the laminate in which the porous structure 20 is formed on the substrate 10 is wound up by the winding roll 251.
  • the ultra-low refractive index layer 20 can be directly laminated on the resin film (substrate 10). Thereafter, for example, another layer may be laminated on the laminate. Further, before the laminate is taken up by the take-up roll 251, for example, another layer may be laminated on the laminate.
  • the strength improving step (aging step) (4) is performed after the chemical treatment step (for example, the crosslinking treatment step) (3) for forming the ultra-low refractive index layer 20, the strength improving step (aging step) (4) is performed.
  • the method is the same as that shown in FIGS.
  • the strength improving step (aging step) (4) the strength of the ultra-low refractive index layer 20 is improved to obtain the ultra-low refractive index layer 21 with improved strength.
  • the strength improving step (aging step) (4) is not particularly limited, and is as described above, for example.
  • FIG. 5 is a schematic view showing another example of the coating apparatus of the slot die method and the method of forming the ultra-low refractive index layer using the slot die method.
  • this coating apparatus has a strength improving zone (aging zone) 130 for performing a strength improving step (aging step) (4) immediately after the chemical processing zone 120 for performing the chemical processing step (3).
  • the strength improvement step (aging step) (4) is performed in the strength improvement zone (aging zone) 130 to improve the adhesive peel strength of the ultra low refractive index layer 20 to the resin film 10. In this way, the ultra-low refractive index layer 21 with improved adhesive peel strength is formed.
  • the strength improving step (aging step) (4) is performed, for example, by heating the ultra-low refractive index layer 20 as described above using hot air fans (heating means) 131 arranged above and below the base material 10. Also good. Although heating temperature, time, etc. are not specifically limited, For example, it is as above-mentioned. Thereafter, similarly to FIG. 3, the laminated film in which the ultralow refractive index layer 21 is formed on the substrate 10 is wound up by the winding roll 105.
  • FIG. 6 is a schematic view showing another example of the coating apparatus of the micro gravure method (micro gravure coating method) and the method for forming the porous structure using the same, as shown in FIG.
  • this coating apparatus has a strength improving zone (aging zone) 230 for performing a strength improving step (aging step) (4) immediately after the chemical processing zone 220 for performing chemical processing step (3).
  • the strength improvement step (aging step) (4) is performed in the strength improvement zone (aging zone) 230 to improve the adhesive peel strength of the ultra low refractive index layer 20 to the resin film 10. In this way, the ultra-low refractive index layer 21 with improved adhesive peel strength is formed.
  • the strength improving step (aging step) (4) is performed, for example, by heating the ultra-low refractive index layer 20 as described above using the hot air blower (heating means) 231 disposed above and below the base material 10. Also good. Although heating temperature, time, etc. are not specifically limited, For example, it is as above-mentioned. Thereafter, similarly to FIG. 3, the laminated film in which the ultralow refractive index layer 21 is formed on the substrate 10 is wound up by the winding roll 251.
  • FIGS. 7 to 9 show another example of the continuous treatment process in the method for forming the ultra-low refractive index layer of the present invention.
  • this method uses an adhesive layer on the ultra-low refractive index layer 20 after the chemical treatment process (for example, the crosslinking process) (3) for forming the ultra-low refractive index layer 20.
  • Adhesive layer coating step (adhesive layer forming step) (4) for coating 30 and an intermediate layer for forming the intermediate layer 22 by reacting the ultra-low refractive index layer 20 with the adhesive layer 30 Forming step (5). Except for these, the method of FIGS. 7 to 9 is the same as the method shown in FIGS. In FIG.
  • the intermediate layer forming step (5) also serves as a step of improving the strength of the ultra-low refractive index layer 20 (strength improving step), and after the intermediate layer forming step (5), the ultra-low refractive index.
  • the refractive index layer 20 is changed to an ultra-low refractive index layer 21 with improved strength.
  • this invention is not limited to this,
  • the ultra-low-refractive-index layer 20 does not need to change after an intermediate
  • the adhesive layer coating step (adhesive layer forming step) (4) and the intermediate layer forming step (5) are not particularly limited, and are as described above, for example.
  • FIG. 8 is a schematic diagram showing still another example of a slot die coating apparatus and a method for forming the ultra-low refractive index layer using the slot die coating apparatus.
  • this coating apparatus has an adhesive layer coating zone 130a for performing the adhesive layer coating step (4) immediately after the chemical processing zone 120 for performing the chemical processing step (3).
  • the intermediate layer forming zone (aging zone) 130 disposed immediately after the adhesive layer coating zone 130a is obtained by the hot air blower (heating means) 131 disposed above and below the base material 10, and the strength of FIG.
  • the same heat treatment as in the improvement zone (aging zone) 130 can be performed. That is, in the apparatus of FIG.
  • the adhesive or adhesive is applied onto the ultra-low refractive index layer 20 by the adhesive layer coating means 131a in the adhesive layer coating zone 130a.
  • An adhesive is applied (coated), and an adhesive layer coating process (adhesive layer forming process) (4) for forming the adhesive layer 30 is performed.
  • bonding such as a pressure-sensitive adhesive tape having the adhesive layer 30 may be used.
  • the intermediate layer forming step (aging step) (5) is performed in the intermediate layer forming zone (aging zone) 130, and the ultra-low refractive index layer 20 and the adhesive layer 30 are reacted to form the intermediate layer 22.
  • the ultra-low refractive index layer 20 becomes the ultra-low refractive index layer 21 with improved strength.
  • the heating temperature, time, etc. by the hot air fan (heating means) 131 are not specifically limited, For example, it is as above-mentioned.
  • FIG. 9 is a schematic diagram showing still another example of a micro gravure method (micro gravure coating method) coating apparatus and a method for forming the porous structure using the same.
  • this coating apparatus has an adhesive layer coating zone 230a for performing the adhesive layer coating step (4) immediately after the chemical processing zone 220 for performing the chemical processing step (3).
  • the intermediate layer forming zone (aging zone) 230 disposed immediately after the adhesive layer coating zone 230a is obtained from the strength shown in FIG.
  • the same heat treatment as that of the improvement zone (aging zone) 230 can be performed. That is, in the apparatus of FIG.
  • the adhesive or adhesive is applied onto the ultra-low refractive index layer 20 by the adhesive layer coating means 231a in the adhesive layer coating zone 230a.
  • An adhesive is applied (coated), and an adhesive layer coating process (adhesive layer forming process) (4) for forming the adhesive layer 30 is performed.
  • bonding such as a pressure-sensitive adhesive tape having the adhesive layer 30 may be used.
  • an intermediate layer forming step (aging step) (5) is performed in the intermediate layer forming zone (aging zone) 230, and the ultra low refractive index layer 20 and the adhesive layer 30 are reacted to form the intermediate layer 22.
  • the ultra-low refractive index layer 20 becomes the ultra-low refractive index layer 21 with improved strength.
  • the heating temperature, time, and the like by the hot air fan (heating means) 231 are not particularly limited, and are as described above, for example.
  • the optical member of the present invention includes the ultra-low refractive index layer of the present invention.
  • the optical member of the present invention is characterized by including the ultra-low refractive index layer of the present invention, and other configurations are not limited at all.
  • the optical member of the present invention may further include other layers in addition to the ultra-low refractive index layer of the present invention, for example.
  • the optical member of the present invention includes the ultra low refractive index layer of the present invention as a low reflection layer.
  • the optical member of the present invention is characterized by including the low reflection layer of the present invention, and other configurations are not limited at all.
  • the optical member of the present invention may further include other layers in addition to the ultra-low refractive index layer of the present invention, for example.
  • the optical member of the present invention has a roll shape, for example.
  • the ultra-low refractive index layer of the present invention was manufactured as follows.
  • the aging-treated gel-like silicon compound was crushed into granules of several mm to several cm using a spatula. Thereto, 40 g of IPA was added, stirred gently, and then allowed to stand at room temperature for 6 hours to decant the solvent and catalyst in the gel. The same decantation treatment was repeated three times to complete the solvent replacement. Then, the gel silicon compound in the mixed solution was pulverized (high pressure medialess pulverization). The pulverization process (high-pressure medialess pulverization) was performed using a homogenizer (trade name UH-50, manufactured by SMT Co.). The pulverization was performed for 2 minutes under the following conditions.
  • the gelled silicon compound in the mixed solution was pulverized by the pulverization treatment, so that the mixed solution became a sol solution of the pulverized product.
  • a dynamic light scattering nanotrack particle size analyzer manufactured by Nikkiso Co., Ltd., UPA-EX150 type
  • 0.50 to It 0.70.
  • a 0.3 wt% KOH aqueous solution was prepared, and 0.02 g of KOH was added to 0.5 g of the sol solution to prepare a coating solution.
  • the coating liquid is applied to the surface of a polyethylene terephthalate (PET) resin film (100 m long) by a bar coating method to form a coating film. Formed. The application was 6 ⁇ L of the sol solution per 1 mm 2 of the surface of the substrate.
  • the coating film is treated at a temperature of 100 ° C. for 1 minute to complete the formation of a porous silicone precursor and the cross-linking reaction between the pulverized materials in the precursor to obtain a roll body in the winding process. It was. Thereby, the 1-micrometer-thick silicone porous body roll which the said grinding
  • Example 2 In the gelation of the raw material silicon compound precursor MTMS, the amount of ammonia water as the catalyst is reduced to 0.09 g, and the incubation in the aging step is changed to 20 hours at 40 ° C. and 2 hours at room temperature. Except that the conditions were relaxed, a porous silicone material was formed in the same manner as in Example 1, and various characteristics were confirmed.
  • the obtained ultra-low refractive index layer of Example 1 having a thickness of 1 ⁇ m has a refractive index of 1.3 or less and a refractive index equivalent to that of the air layer, unlike the comparative example. I was able to confirm. Furthermore, by performing the bonding treatment, it was possible to suppress the generation of scratches when the roll body was wound up, and it was possible to obtain a long film having a good roll appearance. Moreover, although the said ultra-low-refractive-index layer has the space
  • the ultra-low refractive index layer of the present invention was produced as follows.
  • Example 2 First, in the same manner as in Example 1, the “(1) Gelation of silicon compound” and “(2) Aging treatment” were performed. Next, instead of the 0.3 wt% KOH aqueous solution, an IPA (isopropyl alcohol) solution of 1.5 wt% photobase generating catalyst (Wako Pure Chemical Industries, Ltd .: trade name WPBG266) is used as the sol particle liquid. Except having added, it carried out similarly to Example 1 and performed the said (3) grinding
  • IPA isopropyl alcohol
  • Example 2 Thereafter, in the same manner as in Example 1, the above-mentioned “(4) Formation of coating film and formation of silicone porous body roll” was performed.
  • the dried porous material thus obtained was irradiated with UV.
  • the UV irradiation was light having a wavelength of 360 nm, and the light irradiation amount (energy) was 500 mJ. Further, after UV irradiation, heat aging at 60 ° C. was performed for 22 hours to form an ultra-low refractive index layer (silicone porous material roll) of this example.
  • Example 4 Except that heat aging was not performed after UV irradiation, the same operation as in Example 2 was performed to form an ultra-low refractive index layer of this example.
  • Example 5 The same as in Example 2 except that after adding the IPA solution of the photobase generation catalyst, 0.018 g of 5 wt% bis (trimethoxy) silane was added to 0.75 g of the sol solution to prepare a coating solution. Thus, the ultra-low refractive index layer of this example was formed.
  • Example 6 The same procedure as in Example 2 was performed except that the amount of the photobase generation catalyst IPA solution added was 0.054 g with respect to 0.75 g of the sol solution. Formed.
  • Example 7 In the same manner as in Example 2, after UV irradiation of the porous body after drying, before the heat aging, the pressure-sensitive adhesive side of the PET film coated with a pressure-sensitive adhesive (adhesive layer) on one side was changed to the porous surface. After affixing to the body at room temperature, it was heat-aged at 60 ° C. for 22 hours. Except this, the same operation as in Example 2 was performed to form the ultra-low refractive index layer of this example.
  • Example 8 Except that heat aging was not performed after the PET film was pasted, the same operation as in Example 6 was performed to form an ultra-low refractive index layer of this example.
  • Example 9 The same as in Example 6 except that after adding the IPA solution of the photobase generating catalyst, 0.018 g of 5% by weight of bis (trimethoxy) silane was added to 0.75 g of the sol solution to adjust the coating solution. Thus, the ultra-low refractive index layer of this example was formed.
  • Example 10 The same procedure as in Example 6 was performed except that the amount of the photobase generation catalyst IPA solution added was 0.054 g with respect to 0.75 g of the sol solution. Formed.
  • Tables 2 and 3 below show the results of measuring the refractive index, adhesive peel strength, and haze of the ultralow refractive index layers of Examples 3 to 10 by the methods described above. However, in the adhesive peel strength measurement of Examples 7 to 10, since these laminated film rolls were already in a state where the PET film and the adhesive layer were bonded, the application of the PET film and the acrylic adhesive was omitted. .
  • the ultra-low refractive index layer of the present invention can easily realize a low refractive index that can be an alternative to the air layer, for example, by exhibiting the above-described characteristics. For this reason, in order to obtain a low refractive index, it is not necessary to provide an air layer by arranging a plurality of members with a certain distance, and the ultra low refractive index layer of the present invention is arranged at a desired site. Thus, low refractive properties can be imparted. For this reason, the ultra-low refractive index layer of the present invention is useful for optical members that require a low refractive index, for example.

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Wood Science & Technology (AREA)
  • Laminated Bodies (AREA)

Abstract

　La présente invention a pour objet de fournir un nouvel élément présentant une faible réfringence à la place d'une couche d'air, par exemple. La présente invention concerne un long rouleau de film stratifié, caractérisé en ce que ledit rouleau est obtenu par stratification d'une couche présentant un indice de réfraction ultra-faible inférieur ou égal à 1,20 sur un film de résine. La présente invention concerne en outre un procédé de production d'un long rouleau de film stratifié, ledit procédé étant caractérisé en ce qu'il comprend : une étape de préparation d'une solution contenant des particules microporeuses ; une étape de revêtement d'un film de résine avec ladite solution ; et une étape de séchage de ladite solution revêtue.
PCT/JP2015/086364 2014-12-26 2015-12-25 Rouleau de film stratifié et son procédé de production WO2016104764A1 (fr)

Priority Applications (4)

Application Number Priority Date Filing Date Title
US15/539,928 US11505667B2 (en) 2014-12-26 2015-12-25 Laminated film roll and method of producing the same
CN201580071024.9A CN107148350B (zh) 2014-12-26 2015-12-25 层叠膜卷材及其制造方法
EP15873332.9A EP3235638B1 (fr) 2014-12-26 2015-12-25 Rouleau de film stratifié et son procédé de production
KR1020177018505A KR102577830B1 (ko) 2014-12-26 2015-12-25 적층 필름 롤 및 그 제조 방법

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JP2014-266784 2014-12-26
JP2014266784 2014-12-26
JP2015-152968 2015-07-31
JP2015152968 2015-07-31
JP2015176206A JP6604781B2 (ja) 2014-12-26 2015-09-07 積層フィルムロールおよびその製造方法
JP2015-176206 2015-09-07

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WO2018008534A1 (fr) * 2016-07-04 2018-01-11 日東電工株式会社 Procédé de fabrication de stratifié optique et corps intermédiaire stratifié optique
JP2018124409A (ja) * 2017-01-31 2018-08-09 日東電工株式会社 導光板方式液晶ディスプレイ用光学シート、導光板方式液晶ディスプレイ用バックライトユニット、および導光板方式液晶ディスプレイ
WO2023189556A1 (fr) * 2022-03-31 2023-10-05 日東電工株式会社 Stratifié optique, procédé de production de stratifié optique, élément optique et procédé de production d'élément optique

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CN112771413B (zh) * 2018-09-28 2023-04-28 日东电工株式会社 双面带粘合剂层的光学层叠体

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WO2018008534A1 (fr) * 2016-07-04 2018-01-11 日東電工株式会社 Procédé de fabrication de stratifié optique et corps intermédiaire stratifié optique
JP2018001633A (ja) * 2016-07-04 2018-01-11 日東電工株式会社 光学積層体の製造方法、および光学積層体中間体
CN109476119A (zh) * 2016-07-04 2019-03-15 日东电工株式会社 光学层叠体的制造方法、以及光学层叠体中间体
CN109476119B (zh) * 2016-07-04 2021-11-02 日东电工株式会社 光学层叠体的制造方法、以及光学层叠体中间体
JP2018124409A (ja) * 2017-01-31 2018-08-09 日東電工株式会社 導光板方式液晶ディスプレイ用光学シート、導光板方式液晶ディスプレイ用バックライトユニット、および導光板方式液晶ディスプレイ
US11402569B2 (en) 2017-01-31 2022-08-02 Nitto Denko Corporation Optical sheet for light guide plate type liquid crystal display, backlight unit for light guide plate type liquid crystal display, and light guide plate type liquid crystal display
WO2023189556A1 (fr) * 2022-03-31 2023-10-05 日東電工株式会社 Stratifié optique, procédé de production de stratifié optique, élément optique et procédé de production d'élément optique

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CN107148350A (zh) 2017-09-08

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